TW200905151A - Heat treatment equipment - Google Patents

Heat treatment equipment Download PDF

Info

Publication number
TW200905151A
TW200905151A TW097115911A TW97115911A TW200905151A TW 200905151 A TW200905151 A TW 200905151A TW 097115911 A TW097115911 A TW 097115911A TW 97115911 A TW97115911 A TW 97115911A TW 200905151 A TW200905151 A TW 200905151A
Authority
TW
Taiwan
Prior art keywords
heat treatment
gas
heat
chamber
catalyst
Prior art date
Application number
TW097115911A
Other languages
English (en)
Chinese (zh)
Inventor
Hisamitsu Tezen
Original Assignee
Espec Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Espec Corp filed Critical Espec Corp
Publication of TW200905151A publication Critical patent/TW200905151A/zh

Links

Classifications

    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27BFURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B17/00Furnaces of a kind not covered by any of groups F27B1/00 - F27B15/00
    • F27B17/0016Chamber type furnaces
    • F27B17/0025Chamber type furnaces specially adapted for treating semiconductor wafers
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27BFURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B17/00Furnaces of a kind not covered by any of groups F27B1/00 - F27B15/00
    • F27B17/0016Chamber type furnaces
    • F27B17/0083Chamber type furnaces with means for circulating the atmosphere
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27DDETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D7/00Forming, maintaining or circulating atmospheres in heating chambers
    • F27D7/02Supplying steam, vapour, gases or liquids
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27DDETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D7/00Forming, maintaining or circulating atmospheres in heating chambers
    • F27D7/04Circulating atmospheres by mechanical means
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27DDETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D7/00Forming, maintaining or circulating atmospheres in heating chambers
    • F27D7/02Supplying steam, vapour, gases or liquids
    • F27D2007/023Conduits
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27DDETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D7/00Forming, maintaining or circulating atmospheres in heating chambers
    • F27D7/04Circulating atmospheres by mechanical means
    • F27D2007/045Fans

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Furnace Details (AREA)
  • Waste-Gas Treatment And Other Accessory Devices For Furnaces (AREA)
TW097115911A 2007-05-22 2008-04-30 Heat treatment equipment TW200905151A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007135291A JP4630307B2 (ja) 2007-05-22 2007-05-22 熱処理装置

Publications (1)

Publication Number Publication Date
TW200905151A true TW200905151A (en) 2009-02-01

Family

ID=40100403

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097115911A TW200905151A (en) 2007-05-22 2008-04-30 Heat treatment equipment

Country Status (4)

Country Link
JP (1) JP4630307B2 (ja)
KR (1) KR101461675B1 (ja)
CN (1) CN101311659B (ja)
TW (1) TW200905151A (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010144939A (ja) * 2008-12-16 2010-07-01 Tohoku Univ 循環式の基板焼成炉
JP6076631B2 (ja) * 2012-07-12 2017-02-08 光洋サーモシステム株式会社 ヒータユニットおよび熱処理装置
JP6855687B2 (ja) * 2015-07-29 2021-04-07 東京エレクトロン株式会社 基板処理装置、基板処理方法及び基板処理装置のメンテナンス方法及び記憶媒体

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH087656Y2 (ja) * 1989-08-15 1996-03-04 千住金属工業株式会社 リフロー炉
JP2921139B2 (ja) * 1991-02-14 1999-07-19 松下電器産業株式会社 リフロー装置
JP3959141B2 (ja) * 1996-11-12 2007-08-15 エスペック株式会社 昇華物対策付き熱処理装置
JP3739233B2 (ja) * 1999-06-28 2006-01-25 光洋サーモシステム株式会社 排気型バッチ式オーブン
JP2001241862A (ja) * 1999-12-20 2001-09-07 Ngk Insulators Ltd 脱臭機能付き焼成炉
JP2005037024A (ja) * 2003-07-18 2005-02-10 Matsushita Electric Ind Co Ltd プラズマディスプレイパネルの焼成炉
JP2005071632A (ja) * 2003-08-25 2005-03-17 Fujitsu Hitachi Plasma Display Ltd プラズマディスプレイパネルの製造方法及びその装置
JP2006017357A (ja) * 2004-06-30 2006-01-19 Espec Corp 熱処理装置
JP4331784B2 (ja) * 2008-07-22 2009-09-16 株式会社フューチャービジョン 基板焼成炉の給排気方法

Also Published As

Publication number Publication date
KR101461675B1 (ko) 2014-11-13
CN101311659B (zh) 2011-07-13
JP2008292012A (ja) 2008-12-04
CN101311659A (zh) 2008-11-26
JP4630307B2 (ja) 2011-02-09
KR20080102972A (ko) 2008-11-26

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