TW200907491A - Antireflection film, polarizing plate using the same, and image display - Google Patents

Antireflection film, polarizing plate using the same, and image display Download PDF

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Publication number
TW200907491A
TW200907491A TW97111081A TW97111081A TW200907491A TW 200907491 A TW200907491 A TW 200907491A TW 97111081 A TW97111081 A TW 97111081A TW 97111081 A TW97111081 A TW 97111081A TW 200907491 A TW200907491 A TW 200907491A
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Taiwan
Prior art keywords
refractive index
group
film
index layer
antireflection film
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TW97111081A
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Chinese (zh)
Inventor
Daisuke Doi
Toshiyuki Ikeda
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Konica Minolta Opto Inc
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Publication of TW200907491A publication Critical patent/TW200907491A/en

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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11Anti-reflection coatings
    • G02B1/111Anti-reflection coatings using layers comprising organic materials
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133502Antiglare, refractive index matching layers

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Polarising Elements (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Laminated Bodies (AREA)

Abstract

Disclosed is an antireflection film which is excellent in adhesion between layers, while being improved in abrasion resistance, antistatic properties, and uneven coating during production. This antireflection film is also excellent in chemical resistance under high temperature high humidity conditions. Also disclosed are a polarizing plate having excellent visibility, which uses the antireflection film, and an image display.; Specifically disclosed is an antireflection film comprising a high refractive index layer and a low refractive index layer, wherein the high refractive index layer is formed by coating a coating liquid containing a conductive particle, an alkoxylated ionizing radiation curable resin having 1-3 carbon atoms and/or an ionizing radiation curable resin having a dioxane structure, and an organosilicon compound represented by the general formula (1) below, a hydrolysis product thereof or a polycondensation product thereof. R'nSi(OR)4-n (1) In the formula, R' represents a vinyl group, an amino group, an epoxy group, a chlorine group, a methacryloxy group, an acryloxy group or an isocyanate group; R represents an alkyl group; and n represents the number of substitution.

Description

200907491 九、發明說明 【發明所屬之技術領域】 本發明係關於防反射薄膜、使用其之偏光板、及圖像 顯不裝置者。 【先前技術】 一般防反射薄膜爲,如陰極管顯示裝置(CRT)、電 漿顯示器(PDP )、電致發光顯示器(ELD )或液晶顯示 裝置(LCD )之影像顯示裝置中,因可防止外光反射所引 起的對比降低或像之雜影攝入,藉由多層薄膜之光干涉, 具有減低反射率之功能,而配置於顯示器之最表面。 一般反射防止爲於透明薄膜基材上直接、或介著其他 層,形成比底層的折射率還低之低折射率層下進行。又, 若傷到光學物品之表面時,會使得顯示板的辨識性變差, 故於防反射薄膜賦予硬化性能。且,塑質所成之光學物品 係爲絶緣性,故藉由靜電等使其帶電,欲防止於表面附著 灰塵所引起的顯示板之辨識性變差,期待賦予防靜電性能 〇 專利文獻1及專利文獻2中記載,作爲賦予這些硬化 性能及防靜電性能之方法,於透明薄膜基材上形成硬塗佈 層,其上形成含有金屬氧化物之防靜電層,進一步於上面 形成比底層的折射率還低之低折射率層,製造防反射薄膜 之方法。 又,近年來,對於防反射薄膜之使用環境有室外或室 -4- 200907491 内等種種形式。特別要求室外使用的大畫面用途下可使用 平面性或硬度或耐擦傷性優良,且對於環境變化具有優良 之光學薄膜。過去的光學薄膜,特別無法得到廣寬度、薄 膜下平面性優良者,對於耐擦傷性或環境變化之耐久性( 具體爲高溫高濕下之耐藥品性)亦未充分。 專利文獻3中記載,高濕環境下抑制於防反射薄膜内 之水蒸氣浸透,欲防止基材之尺寸變化等防反射薄膜的劣 化,於硬塗佈層與低折射率層之間,作爲水蒸氣遮斷性金 屬氧化物層將氧化矽層藉由真空蒸鍍法設有防反射薄膜。 又’透明薄膜基材上形成硬塗佈層,其上以高折射率 層、低折射率層之順序形成所成之層合結構的防反射薄膜 中’高折射率層與低折射率層之折射率差過大時,反射光 譜會成V字形狀,於可見光區之短波長區或長波長區之反 射率會過高’故有著於防反射薄膜產生顏色之問題。 專利文獻4中揭示,以抑制防反射薄膜之著色爲目的 ’形成導電性金屬氧化物與折射率減低化物質、及電離放 射線硬化型樹脂所成之防靜電層的方法。 〔專利文獻1〕特開2002-267804號公報 〔專利文獻2〕特開2006-35624號公報 〔專利文獻3〕特開2〇〇7_3672號公報 〔專利文獻4〕特開2005-292510號公報 【發明內容】 發明所要解決的課題 -5- 200907491 然而,專利文獻1中,透明塑質薄膜之單面上’以硬 塗佈層、防靜電層及低折射率層之順序將硬塗佈層作爲透 明塑質薄膜側進行依序層合所成的防反射薄膜中’防靜電 層之折射率作爲1 . 6 0〜1.7 5,低折射率層之反射率作爲 1.4 0以下。 又,專利文獻2中揭示,於透明基材上的至少單面上 ,設有具有紫外線硬化性及金屬氧化物粒子之高折射率層 ,該層上設有具有熱硬化性之低折射率層,將高折射率層 之折射率作爲1 . 5〜2.5,低折射率層之反射率作爲1.2 5〜 1.4 5之範圍。 如此,作爲防靜電劑含有金屬氧化物之防靜電層,一 般爲折射率較高,於透明基材上以硬塗佈層、防靜電層、 低折射率層之順序層合時’因防靜電層與低折射率層之折 射率差會使反射率波形成爲V字,可見光區中之短波長、 及長波長區中之反射率會變高’作爲反射色強烈出現藍、 紅色。 作爲如此可見光區中之反射色以藍或紅色較爲顯著時 ,生產時會因微小的塗佈膜厚不均而使反射色不均更顯著 ,損害到消費者之快適辨識性,故如專利文獻1及2之防 反射薄膜中有欠缺實用性之部分。 欲得到快適辨識性’作爲可見光區中無反射色的色調 之狀態,成爲所謂之自然色下’必須使生產時的微小塗佈 膜厚不均難以顯著。欲使可見光區中之反射色被控制爲自 然色,有著減少含於防靜電層中之金屬氧化物粒子量而減 -6 - 200907491 低防靜電層之折射率的手段,但金屬氧化物粒子之減低會 引起薄膜本身的防靜電性劣化之問題,於現今未有自然色 、防靜電性雙方皆優良者。 又’專利文獻3所記載的防反射薄膜之製造上必要的 真空蒸鍍法中’龐大的真空系蒸鍍裝置爲不可欠缺,故近 年來有著無法一次大量生產被要求廣寬度之防反射薄膜的 問題,又由成本面來看,生產效率並未充分。且,專利文 獻3所記載之防反射薄膜中’於硬塗佈層使用作爲有機膠 黏劑之丙烯酸樹脂’故有著硬塗佈層與水蒸氣遮斷性之氧 化矽層之層間密著性並分充分之問題。 又,專利文獻4所記載的防反射薄膜之製造方法中, 防靜電層與其上的低折射率層之密著性並非充分,故有著 對於環境變化之耐久性劣化的問題。 本發明之目的爲解決上述過去技術之問題,提供一種 各層間之密著性優良,硬度、耐擦性、防靜電性、及生產 時之塗佈不均得到改善,且高溫高濕下之耐藥品性優良的 防反射薄膜、使用該防反射薄膜之辨識性優良的偏光板、 圖像顯示裝置。 本發明發現提供下述構成之防反射薄膜、偏光板、及 圖像顯示裝置,可達到上述目的。 申請專利範圍第1項之發明爲一種防反射薄膜,其爲 透明薄膜基材上具有硬塗佈層、折射率比透明薄膜基材更 高之高折射率層、與折射率比透明薄膜基材更低之低折射 率層的防反射薄膜中’其特徵爲高折射率層係由塗佈含有 200907491 至少1種之導電性粒子、辛φ , M 5 & 丨土权卞主少1種之經碳數1〜3 基化的電離放射線硬化型樹脂及/或具有二噁烷結 離放射線硬化型樹脂、以及下述一般式(^ )所示 矽化合物或其水解物或其縮聚物的塗佈液而形成; R ’ n s i ( OR ) 4·η _·. ( 1 ) 式中’ R’爲至少1種選自乙烯基、胺基、環氧基、 、甲基丙細氧基、丙烯氧基、及異氰酸酯基所成群 代基’ R爲院基,η爲取代數。 申請專利範圍第2項之發明爲,如申請專利範 項所記載之防反射薄膜,其中該高折射率層的折 1.6 0以下。 申請專利範圍第3項之發明爲,如申請專利範 項或第2項所記載之防反射薄膜,其中至少1種經 〜3的烷氧基化的電離放射線硬化型樹脂及/或具有 結構之電離放射線硬化型樹脂係爲含有分子中具有 個可聚合之不飽和鍵的丙烯酸系化合物者。 申請專利範圍第4項之發明爲,如申請專利範 項〜第3項中任一項所記載之防反射薄膜,其中該 粒子爲至少1種選自氧化銻、氧化錫、氧化鋅、含 化銦(ΙΤΟ )、含銻之氧化錫(ΑΤΟ )、及銻酸鋅 中之導電性粒子。 申請專利範圍第5項之發明爲一種防反射薄膜 的烷氧 構之電 之有機 氯代基 中的取 圍第1 射率爲 圍第1 碳數1 —·嚼焼 1或2 圍第1 導電性 錫之氧 所成群 ,其爲 -8 - 200907491 透明薄膜基材上以折射率比該透明薄膜基材更高之高折射 率層、與折射率比該透明薄膜基材更低之低折射率層之順 序進行靥合所成的防反射薄膜,其特徵爲高折射率層係由 塗佈含有(a )導電性粒子、與(b )與導電性粒子的組成 相異的無機粒子之塗佈液而形成,低折射率層係由塗佈含 有具有外殻層且内部爲多孔質或空洞之中空二氧化矽系粒 子的塗佈液而形成。 申請專利範圍第6項之發明爲,如申請專利範圍第5 項所記載之防反射薄膜,其中該低折射率層係由塗佈含有 下述一般式(2)所不有機砂化合物或其水解物或其縮聚 物 '與具有外殻層且内部爲多孔質或空洞之中空二氧化砂 系粒子的塗佈液而形成;200907491 IX. Description of the Invention [Technical Field] The present invention relates to an antireflection film, a polarizing plate using the same, and an image display device. [Prior Art] A general anti-reflection film is an image display device such as a cathode tube display device (CRT), a plasma display (PDP), an electroluminescence display (ELD), or a liquid crystal display device (LCD). The contrast reduction caused by light reflection or the like of the image is absorbed by the light of the multilayer film, and has the function of reducing the reflectance, and is disposed on the outermost surface of the display. The general reflection prevention is carried out under a low refractive index layer which is formed on the transparent film substrate directly or via another layer and has a refractive index lower than that of the underlayer. Further, when the surface of the optical article is damaged, the visibility of the display panel is deteriorated, so that the antireflection film imparts hardening properties. In addition, since the optical article made of plastic is insulative, it is charged by static electricity or the like, and the visibility of the display panel caused by adhesion of dust on the surface is prevented from being deteriorated, and it is expected to impart antistatic performance. Patent Document 2 discloses that as a method for imparting these curing properties and antistatic properties, a hard coat layer is formed on a transparent film substrate, an antistatic layer containing a metal oxide is formed thereon, and a refraction of the underlayer is further formed thereon. A method of manufacturing an antireflection film by using a low refractive index layer having a low rate. Further, in recent years, the use environment of the antireflection film has various forms such as outdoor or chamber -4-200907491. In particular, it is required to use an optical film excellent in flatness or hardness or scratch resistance and excellent in environmental change under large-screen use for outdoor use. In the past, in particular, those having excellent wide-width and low-film properties have not been able to obtain durability against scratch resistance or environmental change (specifically, chemical resistance under high temperature and high humidity). Patent Document 3 discloses that water vapor permeation in the antireflection film is suppressed in a high-humidity environment, and deterioration of the antireflection film such as dimensional change of the substrate is prevented, and water is used as a water between the hard coat layer and the low refractive index layer. Vapor Interruptive Metal Oxide Layer The antimony oxide layer is provided with an antireflection film by vacuum evaporation. Further, a hard coating layer is formed on the transparent film substrate, and the high refractive index layer and the low refractive index layer are formed in the antireflection film of the laminated structure in the order of the high refractive index layer and the low refractive index layer. When the refractive index difference is too large, the reflection spectrum will be in a V shape, and the reflectance in the short-wavelength region or the long-wavelength region in the visible light region will be too high, so that the color of the antireflection film is generated. Patent Document 4 discloses a method of forming an antistatic layer made of a conductive metal oxide, a refractive index-reducing material, and an ionizing radiation-curable resin for the purpose of suppressing the coloration of the antireflection film. [Patent Document 1] JP-A-2006-35624 (Patent Document 3) JP-A-2006-35624 (Patent Document 4) JP-A-2005-292510 Disclosure of the Invention Problems to be Solved by the Invention-5-200907491 However, in Patent Document 1, a hard coating layer is used as a hard coating layer, an antistatic layer, and a low refractive index layer on one surface of a transparent plastic film. In the antireflection film formed by sequentially laminating the transparent plastic film side, the refractive index of the antistatic layer is 1.60 to 1.7, and the reflectance of the low refractive index layer is 1.40 or less. Further, Patent Document 2 discloses that a high refractive index layer having ultraviolet curability and metal oxide particles is provided on at least one surface of a transparent substrate, and a low refractive index layer having thermosetting property is provided on the layer. The refractive index of the high refractive index layer is set to 1.5 to 2.5, and the reflectance of the low refractive index layer is set to be in the range of 1.2 5 to 1.4 5 . Thus, the antistatic layer containing a metal oxide as an antistatic agent generally has a high refractive index and is laminated on the transparent substrate in the order of a hard coating layer, an antistatic layer, and a low refractive index layer. The difference in refractive index between the layer and the low refractive index layer causes the reflectance waveform to be V-shaped, and the short-wavelength in the visible light region and the reflectance in the long-wavelength region become high. Blue and red appear strongly as reflected colors. When the reflection color in the visible light region is more pronounced in blue or red, the unevenness of the reflection color is more remarkable due to the uneven thickness of the coating film during production, which impairs the consumer's quick identification, so as a patent. There is a lack of practicality in the antireflection films of Documents 1 and 2. In order to obtain a fast recognizability as a state of a color tone having no reflection color in the visible light region, it is a so-called natural color, and it is difficult to make the film thickness unevenness at the time of production difficult. In order to control the reflected color in the visible light region to be a natural color, there is a means for reducing the amount of metal oxide particles contained in the antistatic layer and reducing the refractive index of the low antistatic layer of -6 - 200907491, but the metal oxide particles The problem of deteriorating the antistatic property of the film itself is reduced, and it is excellent in both natural color and antistatic property. Further, in the vacuum vapor deposition method required for the production of the antireflection film described in Patent Document 3, a bulky vacuum vapor deposition device is indispensable, and in recent years, it has been impossible to mass-produce an antireflection film having a wide width at a time. The problem is, by cost, the production efficiency is not sufficient. Further, in the antireflection film described in Patent Document 3, the use of an acrylic resin as an organic binder in the hard coat layer has the interlayer adhesion between the hard coat layer and the water vapor barrier ruthenium oxide layer. A full problem. Further, in the method for producing an antireflection film described in Patent Document 4, the adhesion between the antistatic layer and the low refractive index layer is not sufficient, so that the durability against environmental changes is deteriorated. The object of the present invention is to solve the above problems of the prior art, and to provide an excellent adhesion between layers, hardness, rub resistance, antistatic property, and uneven coating unevenness during production, and resistance to high temperature and high humidity. An antireflection film excellent in chemical properties, a polarizing plate excellent in visibility of the antireflection film, and an image display device. The present inventors have found that an antireflection film, a polarizing plate, and an image display device having the following constitutions can be provided, and the above object can be attained. The invention of claim 1 is an antireflection film which has a hard coating layer on a transparent film substrate, a higher refractive index layer than a transparent film substrate, and a refractive index ratio transparent film substrate. In the antireflection film of the lower low refractive index layer, it is characterized in that the high refractive index layer is coated with at least one kind of conductive particles containing 200907491, and sim φ , M 5 & An ionizing radiation-curable resin having a carbon number of 1 to 3 and/or a dioxane-isolated radiation-curable resin, and a bismuth compound represented by the following general formula (^) or a hydrolyzate thereof or a polycondensate thereof Formed by a liquid; R ' nsi ( OR ) 4·η _·. (1) where 'R' is at least one selected from the group consisting of vinyl, amine, epoxy, methyl propoxy, propylene The oxy group and the isocyanate group are represented by a group of 'R', and η is a substitution number. The invention of claim 2 is the antireflection film according to the application of the patent specification, wherein the high refractive index layer has a fold of 1.6 or less. The invention of claim 3, wherein the at least one of the alkoxylated ionizing radiation-curable resin and/or the structure thereof is at least one selected from the group consisting of the anti-reflection film described in the patent application or the second aspect. The ionizing radiation-curable resin is one containing an acrylic compound having a polymerizable unsaturated bond in its molecule. The anti-reflection film according to any one of the preceding claims, wherein the particles are at least one selected from the group consisting of cerium oxide, tin oxide, zinc oxide, and containing. Conductive particles in indium (yttrium), antimony-containing tin oxide (yttrium), and zinc antimonate. The invention of claim 5 is an alkoxy structure of an antireflection film in which the first fluorination ratio of the first chlorinated group is the first carbon number 1 - the chew 焼 1 or 2 is the first conductive a group of oxygen of tin, which is a high refractive index layer on a transparent film substrate having a refractive index higher than that of the transparent film substrate, and a lower refractive index than a transparent film substrate. The antireflection film formed by kneading in the order of the rate layer is characterized in that the high refractive index layer is coated by coating inorganic particles containing (a) conductive particles and (b) different from the composition of the conductive particles. The cloth liquid is formed, and the low refractive index layer is formed by applying a coating liquid containing hollow ceria-based particles having an outer shell layer and having a porous or void inside. The invention of claim 6 is the antireflection film of claim 5, wherein the low refractive index layer is coated with a non-organic sand compound of the following general formula (2) or hydrolyzed thereof a substance or a polycondensate thereof; and a coating liquid of a hollow silica sand-based particle having an outer shell layer and having a porous or void inside;

Si ( OR) 4 ... ( 2) 式中,R爲烷基。 申5R專利範圍第7項之發明爲’如申請專利範圍第5 項或第0項所記載之防反射薄膜,其中該高折射率層係由 塗佈含有(a )導電性粒子、(b )與導電性粒子之組成相 異的無機粒子、(c)電離放射線硬化型樹脂、跑(d)下 述一般式(1)所示之有機矽化合物或其水解物或其縮聚 物之塗佈液而形成,折射率爲1 .6 0以下者; R,nSi ( OR) 200907491 式中,R’爲至少1種選自乙烯基、胺基、環氧基、氯代基 、甲基丙烯氧基、丙烯氧基、及異氰酸酯基所成群中的取 代基,R爲烷基,η爲取代數。 申請專利範圍第8項之發明爲,如申請專利範圍第5 項〜第7項中任一項所記載之防反射薄膜,其中該導電性 粒子爲至少1種選自氧化銻、氧化錫、氧化鋅、含錫之氧 化銦(ΙΤΟ )、含銻之氧化錫(ΑΤΟ )、及銻酸鋅所成群 中之導電性粒子’該無機粒子爲至少1種選自中空二氧化 矽、膠體二氧化矽、及氟化鎂所成群中之無機粒子。 申請專利範圍第9項之發明爲,如申請專利範圍第8 項所記載之防反射薄膜,其中該導電性粒子爲含銻之氧化 錫(ΑΤΟ)、及/或錬酸鋅。 申請專利範圍第1 0項之發明爲,如申請專利範圍第8 項所記載之防反射薄膜,其中該無機粒子爲中空二氧化矽 〇 申請專利範圍第1〗項之發明爲,如申請專利範圍第7 項〜第1 0項中任一項所記載之防反射薄膜,其中該電離 放射線硬化型樹脂含有分子中具有2個以上可聚合之不飽 和鍵之丙烯酸系化合物。 申請專利範圍第1 2項之發明爲,如申請專利範圍第5 項〜第1 1項中任一項所記載之防反射薄膜,其中該低折 射率層含有至少含有1個與膠黏劑具有反應性之基的聚矽 氧烷化合物。 -10- 200907491 申請專利範圍第1 3項之發明爲一種偏光板,其特徵 爲於一面使用如申請專利範圍第1項〜第1 2項中任一項 所記載之防反射薄膜。 申請專利範圍第1 4項之發明爲一種圖像顯示裝置, 其特徵爲於一面使用如申請專利範圍第1項〜第1 2項中 任一項所記載之反射薄膜。 申請專利範圍第1 5項之發明爲一種圖像顯示裝置, 其特徵爲使用如申請專利範圍第1 3項所記載之偏光板。 申請專利範圍第i項之發明爲一種防反射薄膜,其爲 透明薄膜基材上具有硬塗佈層、折射率比透明薄膜基材更 高之高折射率層、與折射率比透明薄膜基材更低之低折射 率層的防反射薄膜中,其特徵爲高折射率層係由塗佈含有 至少1種之導電性粒子、至少1種之經碳數1〜3的烷氧 基化的電離放射線硬化型樹脂及/或具有二噁烷結構之電 離放射線硬化型樹脂、以及下述一般式(1 )所示之有機 矽化合物或其水解物或其縮聚物的塗佈液而形成; R5nSi ( OR ) 4-n …(1 ) 式中’R’爲至少1種選自乙烯基、胺基、環氧基、氯代基 、甲基丙烯氧基、丙烯氧基、及異氰酸酯基所成群中的取 代基’ R爲院基,η爲取代數。 所謂申請專利範圍第1項的發明爲,防反射薄膜可達 到各層間密著性優良,硬度、耐擦性、及防靜電性皆得到 -11 - 200907491 改善,且高溫高濕下之耐藥品性優良之效果。 申請專利範圍第2項之發明爲,如申請專利範圍第1 項所記載之防反射薄膜,其中該高折射率層的折射率爲 1.60以下者,所謂申請專利範圍第2項的發明爲,防反射 薄膜達到生產時之塗佈不均得到改善之效果。又,生產時 之塗佈不均得到改善,於可見光區中之反射色可被抑制爲 自然色,於後述之鉛筆硬度試驗中實質上難以辨識傷痕之 效果。 申請專利範圍第3項之發明爲,如申請專利範圍第1 項或第2項所記載之防反射薄膜,其中經碳數1〜3的烷 氧基化的電離放射線硬化型樹脂及/或具有二噁烷結構之 電離放射線硬化型樹脂係爲含有分子中具有1或2個可聚 合之不飽和鍵的丙烯酸系化合物者,所謂申請專利範圍第 3項的發明爲,防反射薄膜達到各層間之密著性優良,硬 度、耐擦性、及防靜電性皆得到改善,且高溫高濕下之耐 藥品性優良之效果。 申請專利範圍第4項之發明爲,如申請專利範圍第1 項〜第3項中任一項所記載之防反射薄膜,其中該導電性 粒子爲至少1種選自氧化銻、氧化錫、氧化鋅、含錫之氧 化銦(ITO )、含銻之氧化錫(ΑΤΟ )、及銻酸鋅所成群 中之導電性粒子’所謂申請專利範圍第4項的發明爲,防 反射薄膜達到各層間之密著性優良,硬度、耐擦性、及防 靜電性皆得到改善,且高溫高濕下之耐藥品性優良之效果 -12- 200907491 申請專利範圍第5項之發明爲一種防反射薄膜,其爲 透明薄膜基材上以折射率比該透明薄膜基材更高之高折射 率層、與折射率比該透明薄膜基材更低之低折射率層之順 序進行層合所成的防反射薄膜’其特徵爲高折射率層係由 塗佈含有(a )導電性粒子、與(b )與導電性粒子的組成 相異的無機粒子之塗佈液而形成’低折射率層係由塗佈含 有具有外殻層且内部爲多孔質或空洞之中空二氧化矽系粒 子的塗佈液而形成’故所謂申請專利範圍第5項的發明爲 ,防反射薄膜達到耐擦傷性或密著性、及硬度得到改善, 且於高溫高濕下之耐藥品性亦優良之效果。 申請專利範圍第6項之發明爲,如申請專利範圍第5 項所記載之防反射薄膜,其中該低折射率層係由塗佈含有 下述一般式(2)所示有機矽化合物或其水解物或其縮聚 物、與具有外殻層且内部爲多孔質或空洞之中空二氧化矽 系粒子的塗佈液而形成;Si ( OR) 4 ( 2) wherein R is an alkyl group. The invention of claim 7 is the antireflection film of claim 5, wherein the high refractive index layer is coated with (a) conductive particles, (b) Inorganic particles different from the composition of the conductive particles, (c) ionizing radiation-curable resin, and coating liquid of (d) an organic hydrazine compound represented by the following general formula (1) or a hydrolyzate thereof or a polycondensate thereof And formed, the refractive index is less than 1.60; R, nSi (OR) 200907491 wherein R' is at least one selected from the group consisting of a vinyl group, an amine group, an epoxy group, a chloro group, a methacryloxy group. a substituent in a group of a propyleneoxy group and an isocyanate group, wherein R is an alkyl group and η is a substitution number. The antireflection film according to any one of the items of the present invention, wherein the conductive particles are at least one selected from the group consisting of cerium oxide, tin oxide, and oxidation. Conductive particles in a group of zinc, tin-containing indium oxide (yttrium), antimony-containing tin oxide (strontium), and zinc antimonate. The inorganic particles are at least one selected from the group consisting of hollow ceria and colloidal dioxide. Inorganic particles in the group of strontium and magnesium fluoride. The invention of claim 9 is the antireflection film according to claim 8, wherein the conductive particles are antimony-containing tin oxide (or antimony) and/or zinc antimonate. The invention of claim 10 is the antireflection film according to claim 8, wherein the inorganic particle is the invention of the hollow cerium oxide patent application scope No. 1 The antireflection film according to any one of the present invention, wherein the ionizing radiation-curable resin contains an acrylic compound having two or more polymerizable unsaturated bonds in the molecule. The anti-reflection film according to any one of the above-mentioned claims, wherein the low refractive index layer contains at least one and an adhesive agent. Reactive base polyoxyalkylene compound. 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 The invention of claim 14 is an image display device characterized by using a reflective film as described in any one of the first to the second aspect of the invention. The invention of claim 15 is an image display device characterized by using a polarizing plate as described in claim 13 of the patent application. The invention of claim i is an antireflection film which is a transparent film substrate having a hard coating layer, a higher refractive index layer than a transparent film substrate, and a refractive index specific transparent film substrate. The antireflection film of the lower low refractive index layer is characterized in that the high refractive index layer is ionized by coating alkoxylation containing at least one of conductive particles and at least one carbon number of 1 to 3. a radiation-curable resin and/or an ionizing radiation-curable resin having a dioxane structure, and a coating liquid of an organic hydrazine compound represented by the following general formula (1) or a hydrolyzate thereof or a polycondensate thereof; R5nSi ( OR ) 4-n (1) where 'R' is a group of at least one selected from the group consisting of a vinyl group, an amine group, an epoxy group, a chloro group, a methacryloxy group, a propyleneoxy group, and an isocyanate group. The substituent 'R' is a hospital base and η is a substitution number. The invention of claim 1 is that the antireflection film can achieve excellent adhesion between layers, hardness, rub resistance, and antistatic property are all improved by -11 - 200907491, and chemical resistance under high temperature and high humidity. Excellent effect. The invention of claim 2 is the antireflection film according to claim 1, wherein the high refractive index layer has a refractive index of 1.60 or less, and the invention of claim 2 is an anti-reflection film. The reflective film is improved in coating unevenness at the time of production. Further, the coating unevenness at the time of production is improved, and the reflection color in the visible light region can be suppressed to a natural color, and it is substantially difficult to recognize the effect of the flaw in the pencil hardness test described later. The invention of claim 3, wherein the antireflection film according to claim 1 or 2, wherein the alkoxylated ionizing radiation-curable resin having a carbon number of 1 to 3 and/or The ionizing radiation-curable resin having a dioxane structure is one containing an acrylic compound having one or two polymerizable unsaturated bonds in the molecule, and the invention of claim 3 is that the antireflection film reaches between the layers. Excellent adhesion, improved hardness, rub resistance, and antistatic properties, and excellent chemical resistance under high temperature and high humidity. The antireflection film according to any one of the above-mentioned claims, wherein the conductive particles are at least one selected from the group consisting of cerium oxide, tin oxide, and oxidation. The invention relates to the conductive particles in the group of zinc, tin-containing indium oxide (ITO), antimony-containing tin oxide (strontium), and zinc antimonate. The invention of claim 4 is that the antireflection film reaches between the layers. Excellent adhesion, hardness, rub resistance, and antistatic property are improved, and the chemical resistance under high temperature and high humidity is excellent. -12-200907491 The invention of claim 5 is an antireflection film. It is an anti-reflection layer formed on a transparent film substrate by laminating a high refractive index layer having a higher refractive index than the transparent film substrate and a lower refractive index layer having a lower refractive index than the transparent film substrate. The film is characterized in that the high refractive index layer is formed by applying a coating liquid containing (a) conductive particles and (b) inorganic particles different in composition from the conductive particles to form a low refractive index layer. Cloth contains a shell layer and interior In the invention of the fifth aspect of the patent application, the anti-reflection film is scratch-resistant or adhesive, and the hardness is improved, and the temperature is high. The drug resistance under high humidity is also excellent. The invention of claim 6 is the antireflection film of claim 5, wherein the low refractive index layer is coated with an organic cerium compound represented by the following general formula (2) or hydrolyzed. a material or a polycondensate thereof, and a coating liquid of hollow ceria-based particles having an outer shell layer and having a porous or void inside;

Si ( OR ) 4 ... ( 2 ) 式中,R爲烷基。 所謂申請專利範圍第6項的發明爲,防反射薄膜達到 耐擦傷性、或密著性、及硬度得到改善,且高溫高濕下之 耐藥品性亦優良之效果。 申請專利範圍第7項之發明爲,如申請專利範圍第5 項或第6項所記載之防反射薄膜,其中該高折射率層係由 -13- 200907491 塗佈含有(a )導電性粒子、(b )與導電性粒子之組成相 異的無機粒子、(c )電離放射線硬化型樹脂、與(d )下 述一般式(1)所示之有機矽化合物或其水解物或其縮聚 物之塗佈液而形成,折射率爲1.60以下者; R5nSi ( OR) 4-n ... ( 1 ) 式中,R’爲至少1種選自乙烯基、胺基、環氧基、氯代基 、甲基丙烯氧基、丙烯氧基、及異氰酸酯基所成群中的取 代基,R爲烷基,η爲取代數。 所謂申請專利範圍第7項的發明爲,防反射薄膜可達 到耐擦傷性、或密著性、及硬度得到改善,且於高溫高濕 下之耐藥品性亦優良的效果。 申請專利範圍第8項之發明爲,如申請專利範圍第5 項〜第7項中任一項所記載之防反射薄膜,其中該導電性 粒子爲至少1種選自氧化銻、氧化錫、氧化鋅、含錫之氧 化銦(ΙΤΟ )、含銻之氧化錫(ΑΤΟ )、及銻酸鋅所成群 中之導電性粒子,該無機粒子爲至少1種選自中空二氧化 矽、膠體二氧化矽、及氟化鎂所成群中之無機粒子’故所 謂申請專利範圍第8項的發明爲,防反射薄膜可達到各層 間之密著性優良,硬度、耐擦性、及防靜電性得到改善’ 且高溫高濕下之耐藥品性亦優良的效果。 申請專利範圍第9項之發明爲’如申請專利範圍第8 項所記載之防反射薄膜’其中該導電性粒子爲含鍊之氧化 -14- 200907491 錫(ΑΤΟ )、及/或銻酸鋅,故所謂申請專利範圍第9項的 發明爲可達到耐擦傷性或密著性、及硬度得到改善,防靜 電性優良,且低成本之效果。 申請專利範圍第1 0項之發明爲,如申請專利範圍第8 項所記載之防反射薄膜,其中該無機粒子爲中空二氧化矽 ’故所謂申請專利範圍第1 0項的發明爲可達到高折射率 層之折射率調整範圍變的較廣,容易抑制防反射薄膜之著 色的效果。 申請專利範圍第1 1項之發明爲,如申請專利範圍第7 項〜第1 〇項中任一項所記載之防反射薄膜,其中該電離 放射線硬化型樹脂含有分子中具有2個以上可聚合之不飽 和鍵之丙烯酸系化合物,故所謂申請專利範圍第1 1項的 發明爲可達到高折射率層之膜強度優良,防反射薄膜之硬 度、耐擦性、密著性優良之效果。 申請專利範圍第1 2項之發明爲,如申請專利範圍第5 項〜第Π項中任一項所記載之防反射薄膜,其中該低折 射率層含有至少含有丨個與膠黏劑具有反應性之基的聚矽 氧烷化合物,故申請專利範圍第1 2項的發明爲,防反射 薄膜可達到耐藥品性或防污性優良之效果。 申請專利範圍第1 3項之發明爲一種偏光板,其特徵 爲於一面使用如申請專利範圍第1項〜第1 2項中任一項 所記載之防反射薄膜,故申請專利範圍第1 3項之偏光板 的發明爲可達到耐擦傷性、或密著性、及硬度得到改善、 高溫高濕下之耐藥品性亦優良之效果。 -15- 200907491 申請專利範圍第1 4項之發明爲一種圖像顯示裝置, 其特徵爲於一面使用如申請專利範圍第1項〜第12項中 任一項所記載之反射薄膜,故申請專利範圍第1 4項之圖 像顯示裝置的發明爲可達到耐擦傷性、或密著性、及硬度 得到改善、高溫高濕下之耐藥品性亦優良之效果。 申請專利範圍第1 5項之發明爲一種圖像顯示裝置, 其特徵爲使用如申請專利範圍第1 3項所記載之偏光板, 故所謂申請專利範圍第1 5項之圖像顯示裝置爲可達到不 用在意光之雜影攝入,且辨識性優良,又耐擦傷性、或密 著性、及硬度得到改善、高溫高濕下之耐藥品性亦優良的 效果。 實施發明的較佳形態 繼續,說明本發明之實施形態,但本發明未受到這些 限定。 又,本文中所謂「(甲基)丙烯酸酯」之記載爲表示 「甲基丙烯酸酯或丙烯酸酯」。 一般防反射薄膜之防反射層爲,由透明薄膜基材側將 折射率相異的2層以高折射率層/低折射率層之順序進行 層合所得,由減少反射率的觀點來看爲佳。 本發明之防反射薄膜的第1實施形態爲,一種防反射 薄膜,其爲透明薄膜基材上具有硬塗佈層、折射率比透明 薄膜基材更高之高折射率層、與折射率比透明薄膜基材更 低之低折射率層的防反射薄膜中,其特徵爲高折射率層係 -16- 200907491 由塗佈含有至少1種之導電性粒子、至少1種經碳數1〜 的烷氧基化的電離放射線硬化型樹脂及/或具有二1^ @ $ 構之電離放射線硬化型樹脂、以及下述一般式(1) m $ 之有機矽化合物或其水解物或其縮聚物的塗佈液而形成; R5nSi ( OR) 4-n ... ( 1 ) 式中,R,爲至少1種選自乙烯基、胺基、環氧基、氯代基 、甲基丙烯氧基、丙烯氧基、及異氰酸酯基所成群中的取 代基,R爲烷基,η爲取代數。 而本實施形態之防反射薄膜爲,該防反射薄膜之高折 射率層的折射率以1 . 6 0以下爲佳。 而本實施形態之防反射薄膜爲,含有經碳數1〜3的 烷氧基化之電離放射線硬化型樹脂及/或具有二噁烷結構 之電離放射線硬化型樹脂含有分子中具有1或2個可聚合 之不飽和鍵的丙烯酸系化合物者爲佳。 且’本實施形態之防反射薄膜爲,前述導電性粒子爲 至少1種選自氧化銻、氧化錫、氧化鋅、含錫之氧化銦( ΙΤΟ)、含銻之氧化錫(ΑΤΟ)、及銻酸鋅所成群中之導 電性粒子爲佳。 又’本發明的防反射薄膜之第2實施形態爲,透明薄 膜基材上以折射率比該透明薄膜基材還高之高折射率層、 與折射率比該透明薄膜基材還低之低折射率層之順序進行 層合所成之防反射薄膜,該高折射率層係由塗佈含有(a -17- 200907491 )導電性粒子、與(b)與導電性粒子之組成相異的M _ 粒子之塗佈液而形成,低折射率層係由塗佈含有A % ^ ^ 且内部爲多孔質或空洞之中空二氧化矽系粒子的塗彳布 形成者。 本實施形態之防反射薄膜爲’該低折射率層係由^《布 含有下述一般式(2)所示有機矽化合物或其水解物或其 縮聚物、與具有外殻層且内部爲多孔質或空洞之 * -^1 — ¢1 化矽系粒子的塗佈液而形成者爲佳。Si ( OR ) 4 ( 2 ) wherein R is an alkyl group. According to the invention of claim 6, the antireflection film has an effect of improving scratch resistance, adhesion, and hardness, and excellent chemical resistance under high temperature and high humidity. The invention of claim 7 is the antireflection film of claim 5, wherein the high refractive index layer is coated with (a) conductive particles, 13-200907491, (b) inorganic particles different from the composition of the conductive particles, (c) an ionizing radiation-curable resin, and (d) an organic hydrazine compound represented by the following general formula (1) or a hydrolyzate thereof or a polycondensate thereof Formed by a coating liquid, having a refractive index of 1.60 or less; R5nSi(OR) 4-n (1) wherein R' is at least one selected from the group consisting of a vinyl group, an amine group, an epoxy group, and a chloro group. a substituent in a group of a methacryloxy group, a propyleneoxy group, and an isocyanate group, wherein R is an alkyl group and η is a substitution number. According to the invention of claim 7, the antireflection film has an effect of improving scratch resistance, adhesion, and hardness, and excellent chemical resistance under high temperature and high humidity. The antireflection film according to any one of the items of the present invention, wherein the conductive particles are at least one selected from the group consisting of cerium oxide, tin oxide, and oxidation. Conductive particles in a group of zinc, tin-containing indium oxide (yttrium), antimony-containing tin oxide (yttrium), and zinc antimonate, the inorganic particles being at least one selected from the group consisting of hollow ceria, colloidal dioxide The invention relates to inorganic particles in the group of magnesium fluoride. Therefore, the invention of claim 8 is that the antireflection film can achieve excellent adhesion between layers, and hardness, scratch resistance, and antistatic property are obtained. It has an excellent effect of improving the chemical resistance under high temperature and high humidity. The invention of claim 9 is the 'antireflection film as described in claim 8, wherein the conductive particles are chain-containing oxidized-14-200907491 tin (ΑΤΟ), and/or zinc silicate, Therefore, the invention of claim 9 is a scratch-resistant or adhesive property, and the hardness is improved, the antistatic property is excellent, and the effect is low. The invention of claim 10 is the antireflection film of claim 8, wherein the inorganic particles are hollow ceria, so that the invention of claim 10 is achievable The refractive index adjustment range of the refractive index layer becomes wider, and the effect of coloring of the antireflection film is easily suppressed. The anti-reflection film according to any one of the preceding claims, wherein the ionizing radiation-curable resin contains two or more polymerizable molecules in the molecule. The acrylic compound having an unsaturated bond is an invention which is excellent in film strength of the high refractive index layer and excellent in hardness, abrasion resistance and adhesion of the antireflection film. The anti-reflection film according to any one of the preceding claims, wherein the low refractive index layer contains at least one of which reacts with an adhesive. Since the invention relates to a polyoxyalkylene compound, the invention of claim 12 is that the antireflection film can achieve an excellent effect of chemical resistance or antifouling property. The invention of claim 13 is a polarizing plate characterized in that the antireflection film described in any one of the first to the second aspects of the invention is applied to one side of the patent application. The invention of the polarizing plate of the present invention is excellent in scratch resistance, adhesion, and hardness, and excellent in chemical resistance under high temperature and high humidity. -15-200907491 The invention of claim 14 is an image display device characterized in that a reflective film as described in any one of claims 1 to 12 is used on one side, so that the patent is applied. According to the invention of the image display device of the first aspect, the scratch resistance, the adhesion, and the hardness are improved, and the chemical resistance under high temperature and high humidity is also excellent. The invention of claim 15 is an image display device characterized by using a polarizing plate as described in claim 13 of the patent application, so that the image display device of claim 15 is applicable. It achieves the effect of not being ingested by the smattering of the smattering, and is excellent in recognition, scratch resistance, adhesion, and hardness, and excellent in chemical resistance under high temperature and high humidity. BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described. However, the present invention is not limited thereto. Further, the term "(meth) acrylate" as used herein means "methacrylate or acrylate". The antireflection layer of the general antireflection film is obtained by laminating two layers having different refractive indices from the side of the transparent film substrate in the order of the high refractive index layer/low refractive index layer, and is reduced from the viewpoint of reducing the reflectance. good. The first embodiment of the antireflection film of the present invention is an antireflection film which is a high refractive index layer having a hard coating layer on a transparent film substrate, a refractive index higher than that of the transparent film substrate, and a refractive index ratio The antireflection film of the lower refractive index layer of the transparent film substrate is characterized in that the high refractive index layer-16-200907491 is coated with at least one kind of conductive particles and at least one carbon number of 1~ An alkoxylated ionizing radiation-curable resin and/or an ionizing radiation-curable resin having a structure of the following formula: (1) m $ of an organic hydrazine compound or a hydrolyzate thereof or a polycondensate thereof Formed by a coating liquid; R5nSi(OR) 4-n (1) wherein R is at least one selected from the group consisting of a vinyl group, an amine group, an epoxy group, a chloro group, and a methacryloxy group. The substituent in the group of the acryloxy group and the isocyanate group, R is an alkyl group, and η is a substitution number. In the antireflection film of the present embodiment, the refractive index of the high refractive index layer of the antireflection film is preferably 1.60 or less. In the antireflection film of the present embodiment, the ionizing radiation-curable resin containing alkoxylated carbon atoms of 1 to 3 and/or the ionizing radiation-curable resin having a dioxane structure have 1 or 2 molecules. An acrylic compound which is a polymerizable unsaturated bond is preferred. Further, in the antireflection film of the present embodiment, the conductive particles are at least one selected from the group consisting of cerium oxide, tin oxide, zinc oxide, tin-containing indium oxide (yttrium), antimony-containing tin oxide (yttrium), and antimony. Conductive particles in the group of zinc acid are preferred. Further, in the second embodiment of the antireflection film of the present invention, the high refractive index layer having a refractive index higher than that of the transparent film substrate and having a refractive index lower than that of the transparent film substrate is lower on the transparent film substrate. An antireflection film formed by laminating the refractive index layers in an order of coating the conductive particles containing (a -17- 200907491) and (b) different from the composition of the conductive particles _ The coating liquid of the particles is formed, and the low refractive index layer is formed by coating a coated cloth containing hollow cerium oxide particles containing A % ^ ^ and having a porous or void inside. The antireflection film of the present embodiment is characterized in that the low refractive index layer contains an organic hydrazine compound represented by the following general formula (2) or a hydrolyzate thereof or a polycondensate thereof, and has an outer shell layer and is porous inside. * -11 - ¢1 of the quality or void is preferably formed by the coating liquid of the cerium-based particles.

Si ( OR) 4 ... ( 2 ) 式中,R爲烷基,較佳爲碳數1〜4的烷基。 而本貫施形%5之防反射薄膜中’高折射率層係由塗佈 含有(a )導電性粒子、(b )與導電性粒子之組成相異的 無機粒子、(c )電離放射線硬化型樹脂、與(d )下述一 般式(丨)所示之有機砂化合物或其水解物或其縮聚物之 塗佈液而形成,折射率以1 _60以下爲佳。 式中’ R,爲至少、i種選自乙烯基、胺基、環氧基、氯代基 、甲基丙烯氧基、丙烯氧基、及異氰酸酯基所成群中之取 代基,R爲烷基,η爲取代數。 導電性粒子爲至少 且,本實施形態之防反射薄膜爲 -18- 200907491 1種選自氧化銻 '氧化錫、氧化鋅、含錫之氧化銦(ITO )、含銻之氧化錫(ΑΤΟ )、及銻酸鋅所成群中之導電性 粒子,無機粒子爲至少1種選自中空二氧化矽、膠體二氧 化矽、及氟化鎂所成群中之無機粒子爲佳。其中,亦以導 電性粒子爲含銻之氧化錫(ΑΤΟ )、及/或銻酸鋅時爲較佳 ,無機粒子以中空二氧化矽爲較佳。 而本實施形態之防反射薄膜中,電離放射線硬化型樹 脂爲含有分子中具有2個以上的可聚合之不飽和鍵的丙烯 酸系化合物者爲佳。又,本實施形態之防反射薄膜中,低 折射率層爲含有具有至少1個與膠黏劑之反應性的基之聚 矽氧烷化合物者爲佳。 (高折射率層) 繼續,對於比透明樹脂薄膜之折射率還高之高折射率 層做說明。所謂本發明之高折射率層爲,比透明薄膜基材 之折射率還高之層。作爲高折射率層之較佳折射率爲, 2 3 °C下波長5 5 0 run測定中以1 . 5〜2 · 2之範圍爲佳。由抑制 防反射薄膜的著色之觀點來看,以1.50〜1.60之範圍爲特 佳。調整高折射率層之折射率的手段可由導電性粒子種類 、添加量控制’故以下所說明之導電性粒子的折射率以 1.60〜2.60爲佳,1.65〜2.50爲更佳。 又’高折射率層之膜厚由作爲光學干涉層之特性來看 以5nm〜Ιμηι爲佳’以10nm〜〇·3μιη爲較佳,以30nm〜 0.2 μ m爲最佳。 -19- 200907491 繼續’對於使用於調整高折射率層之折射率的導電性 粒子做說明。 本發明中所使用之導電性粒子爲至少1種選自氧化銻 、氧化錫、氧化鋅、含錫之氧化銦(I τ Ο )、含銻之氧化 錫(ΑΤΟ )、及銻酸鋅所成群中之導電性粒子。 氧化鈦或氧化鋁、氧化锆等上述以外之組成的粒子因 無導電或不足’故將這些作爲主成分之塗膜無法表現充分 的防靜電性能,故未含於本發明之導電性粒子。 這些導電性粒子之一次粒子的平均粒徑爲1 〇nm〜 200nm之範圍,20〜150nm爲較佳,30〜100nm爲特別佳 。導電性粒子之平均粒子徑可藉由掃描電子顯微鏡(SEM )等電子顯微鏡照片進行測定,利用動態散光法或靜態散 光法等藉由粒度分佈計等進行測定。粒徑過小時容易凝集 ,使得分散性惡化。粒徑過大時霧値會顯著提高而不佳。 導電性粒子之形狀以米粒狀、球形狀、立方體狀、紡錘形 狀、針狀或不定形狀爲佳。 導電性粒子可藉由有機化合物進行表面處理。導電性 粒子之表面藉由有機化合物進行表面修飾時,可提高有機 溶劑中之分散安定性,容易控制分散粒徑的同時,亦可經 時性地抑制凝集、沈澱。因此,較佳有機化合物之表面修 飾量對於金屬氧化物粒子而言爲〇 · 1〜5質量%,較佳爲 0.5〜3質量%。使用於表面處理之有機化合物的例子,含 有多元醇、院醇胺、硬脂酸、砂院偶合劑及鈦酸酯偶合劑 。其中以後述矽烷偶合劑爲佳。亦可組合2種以上之表面 -20- 200907491 處理。 導電性粒子的使用量以高折射率層中5質量%〜8 5質 量%爲佳,10〜80質量%爲較佳,20〜75質量%爲最佳。 使用量若過少,無法得到所望折射率或本發明的效果,過 多時,會產生膜強度之劣化等。 上述導電性粒子爲,分散於媒體之分散體狀態下,以 使用於形成高折射率層之塗佈液方式提供。作爲金屬氧化 物粒子之分散媒體,使用沸點爲60〜1 7(TC之液體爲佳。 作爲分散溶劑之具體例,可舉出水、醇類(例如,甲醇、 乙醇、異丙醇、丁醇、苯甲醇類)、酮(例如,丙酮、甲 基乙基酮、甲基異丁基酮、環己酮)、_醇類(例如,二 丙酮醇類)、酯(例如,乙酸甲酯、乙酸乙酯、乙酸丙基 、乙酸丁基、甲酸甲基、甲酸乙酯、甲酸丙基、甲酸丁基 )、脂肪族烴(例如,己烷、環己烷)、鹵化烴(例如, 二氯甲烷、氯仿、四氯化碳)、芳香族烴(例如,苯、甲 苯、二甲苯)、醯胺(例如,二甲基甲醯胺、二甲基乙酿 胺、η -甲基耻略院酮)、醚(例如,二乙醚、二卩惡院、四 氫呋喃)、醚醇類(例如,1 -甲氧基-2 -丙醇)、丙二醇單 甲醚、丙二醇單甲醚乙酸酯。其中亦以甲苯、二甲苯、甲 基乙基酮、甲基異丁基酮、環己酮及丁醇爲特佳。 又,導電性粒子可使用分散機而分散於媒體中。作爲 分散機之例子,可舉出磨砂硏磨機(例如,附針Ϊ朱研;jg胃 )、高速葉輪式硏磨機、石英片硏磨機、輥硏磨機、攪拌 球磨機及膠體硏磨機。以磨砂硏磨機及高速葉輪式研ijgg -21 - 200907491 爲特佳。又’可實施預備分散處理。作爲使用於預備分散 處理之分散機例,可舉出球硏磨機、三根輥硏磨機、捏合 機及擠壓機。含有分散劑較佳。 進一步可含有具有核心/殻結構之導電性粒子。殼可 形成於核心周圍1層,欲進一步提高耐光性可形成複數層 。核心爲藉由殻完全覆蓋者爲佳。 有關本發明之高折射率層中,可含有前述導電性粒子 之組成相異的無機粒子。本發明中所使用的無機粒子爲至 少1種選自中空二氧化矽、膠體二氧化矽、及氟化鎂所成 群中之無機粒子。無機粒子之使用量於高折射率層中以i 質量%〜30質量%爲佳,3〜25質量%爲較佳,5〜20質量 %爲最佳。使用量若過少時,無法得到所望耐擦傷性或密 著性、硬度、高溫高濕下之耐藥品性等本發明效果,過多 時會產生膜強度之劣化等。 又,高折射率層中含有電離放射線硬化型樹脂作爲導 電性粒子之膠黏劑時,可提高塗膜之製膜性或物理特性。 本發明之經碳數1〜3的烷氧基化之電離放射線硬化 型樹脂及/或具有二噁烷結構之電離放射線硬化型樹脂爲 ’該電離放射線硬化型樹脂之結構中含有環氧甲烷、環氧 乙烷、環氧丙烷及/或1,3 -二噁烷、1,4 -二噁烷結構者,作 爲前述經碳數1〜3的烷氧基化之電離放射線硬化型樹脂 及/或具有二噁烷結構之電離放射線硬化型樹脂,可使用 具有藉由如紫外線或電子線之電離放射線的照射,直接、 或受到光聚合啓始劑之作用而間接地產生聚合反應的官能 -22- 200907491 基之單體或寡聚物爲佳。 作爲如此電離放射線硬化型樹脂,可舉出甲氧基聚乙 一醇丙稀酸酯、甲氧基聚乙二醇甲基丙烯酸酯、乙氧基化 苯基丙烯酸酯、乙氧基化苯基甲基丙烯酸酯 '乙氧基化2_ 甲基-1,3丙烷二醇二丙烯酸酯、乙氧基化2_甲基_丨,3丙院 一醇一甲基丙烯酸酯、乙氧基化雙酚A二丙烯酸酯、乙氧 基化丙氧基化雙酚A二甲基丙烯酸酯、乙氧基化三羥甲基 丙烷三丙烯酸酯、乙氧基化三羥甲基丙烷三甲基丙烯酸酯 、乙氧基化季戊四醇四丙烧酸酯、丙氧基化二三經甲基丙 烷四丙烯酸酯、丙氧基化季戊四醇四丙烯酸酯、二噁院二 醇二丙烯酸酯、二噁烷二醇二甲基丙烯酸酯爲佳,而具有 1個或2個藉由如紫外線或電子線之電離放射線的照射下 直接、或受到光聚合啓始劑之作用後間接產生聚合反應之 官能基者爲特佳。 又,作爲本發明中之前述電離放射線硬化型樹脂,可 使用具有2個以上藉由如紫外線或電子線之電離放射線照 射下直接、或受到光聚合啓始劑之作用後間接地產生聚合 反應之官能基的單體或寡聚物。作爲官能基爲如具有(甲 基)丙烯醯氧基等之不飽和雙鍵之基,可舉出環氧基、矽 烷醇基等。其中亦以使用具有不飽和雙鍵2個以上之自由 基聚合性單體或寡聚物爲佳。視必要亦可組合光聚合啓始 劑。作爲如此電離放射線硬化型樹脂’可使用多元醇丙儲 酸酯、環氧基丙烯酸酯、尿烷丙烯酸酯、聚酯丙儲酸酯或 彼等混合物。例如可舉出多官能丙烯酸酯化合物等,以選 -23- 200907491 自季戊四醇多官能丙烯酸酯、二季戊四醇多官能丙稀酸酯 、季戊四醇多官能甲基丙烯酸酯、及二季戊四醇多官能甲 基丙烯酸酯所成之化合物爲佳。其中,所謂多官能丙稀酸 酯化合物爲,分子中具有2個以上丙烯醯氧基及/或甲基 丙烯醯氧基之化合物。 作爲多官能丙烯酸酯化合物之單體,例如可舉出乙二 醇二丙烯酸酯、二乙二醇二丙烯酸酯、1,6 -己二醇二丙烯 酸酯、新戊基二醇二丙烯酸酯、三羥甲基丙烷三丙烯酸醋 、三羥甲基乙烷三丙烯酸酯、四羥甲基甲烷三丙烯酸酯、 四羥甲基甲烷四丙烯酸酯、五甘油三丙烯酸酯、季戊四醇 二丙烯酸酯、季戊四醇三丙烯酸酯、季戊四醇四丙烯酸酯 '甘油三丙烯酸酯、二季戊四醇三丙烯酸酯、二季戊四醇 四丙烯酸酯、二季戊四醇五丙烯酸酯、二季戊四醇六丙烯 酸醋 '參(丙稀酿氧基乙基)二聚異氰酸酯、乙二醇二甲 基丙烯酸酯、二乙二醇二甲基丙烯酸酯、U-己二醇二甲 基丙烯酸酯、新戊基二醇二甲基丙烯酸酯、三羥甲基丙焼 三甲基丙烯酸酯、三羥甲基乙烷三甲基丙烯酸酯、四羥甲 基甲烷三甲基丙烯酸酯、四羥甲基甲烷四甲基丙烯酸酯、 五甘油三甲基丙烯酸酯、季戊四醇二甲基丙烯酸酯、季戊 四醇三甲基丙烯酸酯、季戊四醇四甲基丙烯酸酯、甘油三 甲基丙烯酸酯、二季戊四醇三甲基丙烯酸酯、二季戊四醇 四甲基丙稀酸酯、一季戊四醇五甲基丙稀酸醋、二季戊四 醇六甲基丙嫌酸酯爲較佳。這些化合物可各單獨使用或混 合2種以上使用。又’亦可爲上述單體之2聚物、3聚物 -24- 200907491 等寡聚物。 電離放射線硬化型樹脂之添加量於高折射率組成物, 固體成分中之15質量%以上未達50質量%爲佳。 欲促進電離放射線硬化型樹脂之硬化,含有質量比爲 1: 2〜1: 1〇的光聚合啓始劑與分子中具有2個以上可聚 合之不飽和鍵的丙烯基系化合物爲佳。 本發明之防反射薄膜的高折射率層中所含之經碳數1 〜3的院氧基化之電離放射線硬化型樹脂及/或具有二Π惡院 結構之電離放射線硬化型樹脂可各單體下使用亦可混合使 用。 此時的混合比率爲質量比下爲1 : 99〜99 : 1,較佳爲 20: 80〜80: 20,更佳爲 30: 70〜70: 30之範圍。較佳 範圍内特可提高濕熱試驗後之耐溶劑性及密著性。 本發明之防反射薄膜的高折射率中所含之電離放射線 硬化型樹脂與導電性粒子之混合比率爲,於固體成分下以 1: 3〜5: 3之範圍爲佳,較佳爲1: 1.5〜1·6: 1,更佳爲 1 .5 : 1.2〜1 .5 : 1。該範圍以外時,例如導電性粒子過少 時,不會有密著性,且無本發明之效果,使得防靜電性劣 化,導電性粒子過多時,防反射薄膜之生產時,粒子會脫 落,會附著於塗工中之薄膜表面,造成外觀故障之原因而 不佳。 作爲光聚合啓始劑,具體可舉出乙醯苯、二苯甲酮、 羥基二苯甲酮、米希勒酮、α-胺肟酯、噻噸酮等及彼等之 衍生物,但無特別限定。 -25- 200907491 本發明之防反射薄膜的高折射率層中所含之 式(1 )所示之有機矽化合物或其水解物或其縮 到塗膜製膜性或物理特性而含有。 R,nSi ( OR ) [n ...(!) 式中,R’爲至少1種選自乙嫌基、胺基、環氧基 、甲基丙煤氧基、丙稀氧基、及異氰酸酯基所成 代基’ R爲院基’ n爲取代數。 作爲上述一般式(1 )所示之有機砂化合物 物或其縮聚物之具體例,可舉出' 甲基三甲氧基 基三乙氧基矽烷、甲基三甲氧基乙氧基矽烷、甲 基矽烷、甲基三丁氧基矽烷、乙基三甲氧基矽烷 乙氧基矽烷、乙烯三甲氧基矽烷、乙烯三乙氧基 烯三乙酸基矽烷、乙烯三甲氧基乙氧基矽烷、苯 基矽烷、苯基三乙氧基矽烷、苯基三乙酸基矽院 基三甲氧基矽烷、γ-氯丙基三乙氧基矽烷、γ-氯 酸基矽烷、3,3,3-三氟丙基三甲氧基矽烷、γ-環 丙基三甲氧基矽烷、γ-環氧丙氧基丙基三乙氧基 (β-環氧丙氧基乙氧基)丙基三甲氧基矽烷、β 氧基環己基)乙基三甲氧基矽烷、β-(3,4-環氧 )乙基三乙氧基砂院、γ -丙儲醯氧基丙基三甲氧 γ-甲基丙烯醯氧基丙基三甲氧基矽烷、γ-胺基丙 基矽烷、γ -胺基丙基三乙氧基矽烷、γ -氫硫基丙 下述一般 聚物爲達 、氯代基 群中之取 或其水解 矽烷、甲 基三乙酸 、乙基三 矽烷、乙 基三甲氧 、γ-氯丙 丙基三乙 氧丙氧基 矽烷、γ -•(3,4-環 基環己基 基矽烷、 基三甲氧 基三甲氧 -26- 200907491 基矽烷、γ -氫硫基丙基三乙氧基矽烷、Ν-β-(胺基乙基)_ γ-胺基丙基三甲氧基矽烷、及Ρ-氰基乙基三乙氧基砂院、 二甲基二甲氧基矽烷、苯基甲基二甲氧基矽烷、二甲基二 乙氧基矽烷、苯基甲基二甲氧基矽烷、二甲基二乙氧基砂 烷、苯基甲基二乙氧基矽院、γ-環氧丙氧基丙基甲基二乙 氧基矽烷、γ-環氧丙氧基丙基甲基二甲氧基矽烷、γ_環氧 丙氧基丙基苯基二乙氧基砂院、γ-氯丙基甲基二乙氧基砂 院、—·甲基一乙酸基砂丨兀 γ -丙嫌酿氧基丙基甲基二甲氧 基砂院、γ -丙稀酿興基丙基甲基一乙氧基砂院、γ_甲基丙 烯醯氧基丙基甲基二甲氧基砂院、γ-甲基丙烯醯氧基丙基 甲基二乙氧基矽烷、γ-氫硫基丙基甲基二甲氧基砂院、γ_ 氫硫基丙基甲基二乙氧基矽烷、γ -胺基丙基甲基二甲氧基 矽烷、γ-胺基丙基甲基二乙氧基矽烷、甲基乙烯二甲氧基 矽烷、及甲基乙烯二乙氧基矽烷等。 其中分子内具有雙鍵之乙烯三甲氧基矽烷、乙嫌三乙 氧基矽烷、乙烯三乙酸基矽烷、乙烯三甲氧基乙氧基矽烷 、γ-丙烯醯氧基丙基三甲氧基矽烷、及γ-甲基丙烯醯氧基 丙基三甲氧基矽烷爲佳’作爲對矽具有2取代的烷基以γ _ 丙烯醯氧基丙基甲基一甲氧基矽烷、γ_丙烯醯氧基丙基甲 基二乙氧基矽烷、γ -甲基丙烯醯氧基丙基甲基二甲氧基矽 烷、γ -甲基丙烯醯氧基丙基甲基二乙氧基矽烷、甲基乙烯 二甲氧基矽烷、及甲基乙烯二乙氧基矽烷爲佳,γ·丙烯醯 氧基丙基三甲氧基矽院、及γ-甲基丙烯醯氧基丙基三甲氧 基矽烷、γ -丙烯醯氧基丙基甲基二甲氧基矽烷、γ -丙烯醯 -27- 200907491 氧基西基电為·— 基一乙氧基矽烷、γ-甲基丙烯醯氧基丙基甲基 ~甲 (hi _ 及γ-甲基丙烯醯氧基丙基甲基二乙氧基矽 院爲特佳。 用2種類以上的上述一般式(1)所示之有機矽 ° Μ ¥水解物或其縮聚物。除上述所示有機矽化合物 $ g 7_R ¥物或其縮聚物以外,亦可使用其他有機矽化合物 $ g 7ic Μ物或其縮聚物。其他有機矽化合物或其水解物或 $ ϋ $ % ’可舉出原矽酸的烷酯(例如,原矽酸甲基、原 砍酸乙酯、原矽酸η_丙基、原矽酸卜丙基、原矽酸η_丁基 、原砂酸sec-丁基、原矽酸t-丁基)及其水解物。 ^佈高折射率層時使用有機溶劑爲佳。作爲有機溶劑 ,例如可舉出醇類(例如,甲醇、乙醇、丙醇、異丙醇、 丁醇、異丁醇、第二丁醇、第三丁醇、戊醇、己醇、環己 醇、苯甲醇類等)、多元醇類(例如,乙二醇、二乙二醇 、三乙二醇、聚乙二醇、丙二醇、二丙二醇、聚丙二醇、 丁二醇、己二醇、戊二醇、甘油、己三醇、硫撐二乙醇等 )、多元醇類醚類(例如,乙二醇單甲醚、乙二醇單乙醚 、乙二醇單丁醚、二乙二醇單甲醚、二乙二醇單甲醚、二 乙二醇單丁醚、丙二醇單甲醚、丙二醇單丁醚、乙二醇單 甲醚乙酸酯、三乙二醇單甲醚、三乙二醇單乙醚、乙二醇 單苯醚、丙二醇單苯醚等)、胺類(例如’乙醇胺、二乙 醇胺、三乙醇胺、N-甲基二乙醇胺、N-乙基二乙醇胺、嗎 琳、N_乙基嗎啉、伸乙基二胺、二伸乙基二胺、三伸乙基 四胺、四伸乙基五胺、聚乙嫌亞胺、五甲基二伸乙基三胺 -28- 200907491 、四甲基伸丙基二胺等)、醯胺類(例如,甲醯胺、N,N -二甲基甲醯胺、Ν,Ν-二甲基乙醯胺等)、雜環類(例如, 2-吡咯烷酮、Ν-甲基-2-吡咯烷酮、環己基吡咯烷酮、2-噁 唑酮、1,3 -二甲基-2-咪唑二酮等)、亞碾類(例如,二甲 基亞颯等)、砸類(例如,環丁楓等)、尿素、乙腈、丙 酮等,特別以醇類、多元醇類、多元醇類醚類爲佳。 高折射率層爲使用上述組成物凹版塗佈機、浸漬塗佈 機、逆塗佈機、線圈棒塗佈機、塑模塗佈機、或噴霧塗佈 、噴射塗佈等於透明樹脂薄膜、或硬塗佈層表面上塗佈爲 濕膜厚 0.1〜1 00 μηι,塗佈後經加熱乾燥後,視必要經硬 化而形成。硬化步驟可使用如後述之低折射率層所記載之 内容。 又,欲使乾膜厚成爲上述膜厚時以塗佈組成物之固體 成分濃度來調整。 (低折射率層) 繼續,對本發明之防反射薄膜的低折射率層做說明。 本發明中之防反射薄膜的低折射率層爲,比透明薄膜 基材之折射率還低的層稱爲低折射率層。作爲具體折射率 ,以23°C、波長550nm下爲1.30〜1.45範圍者爲佳。又 ,低折射率層之膜厚由作爲光學干涉層之特性來看,以 5nm 〜0·5μηι 爲佳,10nm 〜0.3μπι 爲較佳,30nm 〜0.2μηι 爲更佳。 本發明之防反射薄膜的低折射率層含有中空粒子,作 -29- 200907491 爲低折射率化之光學干涉層之特性來看爲佳。又,本發明 之防反射薄膜的低折射率層爲,内部含有多孔質或空洞之 至少1種中空二氧化矽系粒子者爲較佳。 中空粒子爲,(1 )多孔質粒子與設置於該多孔質粒 子表面之被覆層所成之複合粒子、或(2)内部具有空洞 ’且内容物由溶劑、氣體或多孔質物質所塡充之空洞粒子 〇 且’空洞粒子爲内部具有空洞之粒子,空洞係由粒子 壁所包圍。空洞内塡充調製時所使用之溶劑、氣體或多孔 質物質等内容物。如此中空微粒子之平均粒徑爲5〜 200nm,較佳爲1 0〜7 0 nm。中空粒子之粒徑以變動係數爲 1〜4 0 %之單分散者爲佳。 本發明所使用的中空粒子之平均粒徑可藉由掃描電子 顯微鏡(SEM )等由電子顯微鏡照片測定。藉由利用動態 散光法或靜態散光法等之粒度分佈計等進行測定。 本發明所使用的中空粒子之平均粒徑可配合所形成之 低折射率層的透明包膜厚度作適宜選擇,透明包膜之膜厚 的3/2〜1/10爲佳,較佳爲2/3〜1/10。其中中空粒子因低 折射率層之形成,以分散於適當的媒體之狀態下爲佳。 作爲分散媒,以水、醇類(例如甲醇、乙醇、異丙醇 )、及酮(例如甲基乙基酮、甲基異丁基酮)、酮醇類( 例如二丙酮醇類)、伸丙基單甲醚、丙二醇單甲醚乙酸酯 等爲佳。 複合粒子的被覆層之厚度或空洞粒子之粒子壁厚度爲 -30- 200907491 1〜40nm,較佳爲1〜2 〇 nm,更佳爲 時,被覆層之厚度未達lnm時,有時 塗佈液成分容易進入複合粒子之内部 少’無法得到低折射率化之充分效果 若超過2〇nm時,塗佈液成分不會進 多孔性(細孔容積)降低,有時無法 分效果。 又,空洞粒子的情況,粒子壁之 時無法維持粒子形狀,又即使厚度超 現低折射率化之充分效果。 複合粒子的被覆層或空洞粒子之 主成分時爲佳。又,亦可含有二氧化 可舉出 Al2〇3、 B2O3、 Ti〇2、 Zr〇2、 Sb203、Mo03、Zn02、W03 等。作爲 質粒子,可舉出二氧化矽所成者、二 外之無機化合物所成者、CaF2、NaF 成者。其中特別以二氧化矽與二氧化 之複合氧化物所成之多孔質粒子爲佳 作爲二氧化矽以外之無機化合: B 2 〇 3 ' T i 0 2 ' Z r 0 2 ' S η Ο 2 ' Ce〇2、Ρ Ζη02、W03等1種或2種以上。如此 化矽以Si02作代表,二氧化矽以外 物換算(ΜΟχ)時的莫耳比MOx/SiO 佳爲0.001〜0.3之範圍。 2〜15nm。複合粒子 無法完全包覆粒子, ,使内部之多孔性減 。又,被覆層的厚度 入内部,複合粒子之 得到低折射率化之充 厚度未達lnm時,有 丨過 20nm,亦無法實 粒子壁以二氧化矽爲 矽以外之成分,具體 S η Ο 2 ' Ce〇2、Ρ 2 〇 3 ' 構成複合粒子之多孔 氧化矽與二氧化矽以 、NaAlF6、MgF 等所 矽以外的無機化合物 〇 物,可舉出 A1203、 2〇3、S b 2 0 3 ' M0O3、 多孔質粒子中,二氧 之無機化合物以氧化 2 爲 0.0001〜1.〇 ,較 -31 - 200907491 難以得到多孔質粒子的莫耳比MOx/Si〇2未達o.oooi 者’即使得到其細孔容積亦較小’無法得到折射率較低的 粒子。又’多孔質粒子的莫耳比M〇x/Si〇2若超過1.〇,二 氧化矽之比率會變小,故細孔容積變大,且難以得到折射 率較低者。 如此多孔質丨_11子之細孔谷積爲爲〇 · 1〜1 . 5 m 1 / g,較佳 爲0.2〜1.5ml/g之範圍。細孔容積未達〇.iml/g時,無法 得到折射率充分降低的粒子,若超過1.5ml/g時,粒子的 強度會降低,所得之包膜的強度會減低。 且,如此多孔質粒子的細孔容積可藉由水銀壓入法求 得。又,作爲空洞粒子之内容物,可舉出使用於粒子調製 時的溶劑、氣體、多孔質物質等。溶劑中可含有空洞粒子 調製時所使用的粒子前驅體之未反應物、使用之觸媒等。 又,作爲多孔質物質,可舉出多孔質粒子所例舉的化 合物所成者。這些内容物可爲單一成分所成者,亦可爲複 數成分之混合物。 作爲如此中空粒子的製造方法’例如可採用特開平7-1 3 3 1 05號公報之段落號碼〔0010〕〜〔〇〇33〕所揭示的複 合氧化物膠體粒子之調製方法。具體之複合粒子係由二氧 化矽、二氧化矽以外的無機化合物所成時,藉由實施以下 第1步驟〜第3步驟,可製造出中空粒子。 (第1步驟:多孔質粒子前驅體之調製) 第1步驟中’預先各別調製出二氧化矽原料與二氧化 -32- 200907491 矽以外的無機化合物原料之鹼水溶液、或調製出二氧化矽 原料與二氧化矽以外的無機化合物原料之混合水溶液,配 合將此水溶液作爲目的的複合氧化物之複合比率,於 pHIO以上的鹼水溶液中—邊攪拌—邊徐徐添加調製出多 孔質粒子前驅體。 作爲二氧化矽原料,可使用鹼金屬、銨或有機鹼之矽 酸鹽。作爲鹼金屬的矽酸鹽,可使用矽酸鈉(水玻璃)或 矽酸鉀。作爲有機鹼可舉出四乙基銨鹽等第4級銨鹽、單 乙醇胺、二乙醇胺、三乙醇胺等胺類。且,銨之矽酸鹽或 有機鹼之矽酸鹽中亦含有矽酸液中添加氨、第4級銨氫氧 化物、胺化合物等之鹼性溶液。 又,作爲二氧化矽以外的無機化合物之原料,可使用 鹼可溶之無機化合物。具體可舉出選自 Al、B、Ti、Zr、 Sn、Ce、P、Sb、Mo、Zn、W等的元素之氧化酸、該氧化 酸之鹼金屬鹽或鹼土類金屬鹽、銨鹽、第4級銨鹽。更具 體爲鋁酸鈉、四硼酸鈉、碳酸鍩銨、銻酸鉀、錫酸鉀、鋁 矽酸鈉、鉬酸鈉、硝酸鈽銨、燐酸鈉。 雖與這些水溶液之添加的同時,混合水溶液之pH値 會產生變化,將該pH値控制於所定範圍的操作並非特別 必要。水溶液最終爲依據無機氧化物之種類、及其混合比 率而決定其pH値。此時水溶液之添加速度並無特別限定 。又’於複合氧化物粒子之製造時,種粒子之分散液可作 爲出發原料使用。 作爲該種粒子,雖無特別限定,可使用si〇2、Al2〇3 -33- 200907491 、Ti02或Zr02等無機氧化物或彼等複合氧化物之粒子, 一般可使用彼等溶膠。且藉由上述製造方法所得之多孔質 粒子前驅體分散液亦可作爲種粒子分散液使用。 使用種粒子分散液時,將種粒子分散液的PH調整爲 1 〇以上後,於該種粒子分散液中將上述化合物之水溶液於 鹼水溶液中攪拌下添加。此時,並非必須進行分散液pH 控制。使用如此的種粒子時,容易控制所調製之多孔質粒 子的粒徑,可得到粒度均一者。 上述二氧化矽原料、及無機化合物原料具有於鹼較高 的溶解度。然而,以該溶解度之較大pH區域混合兩者時 ,或降低矽酸離子、及鋁酸離子等氧化酸離子之溶解度, 析出這些複合物而成長爲粒子、或引起種粒子上析出的粒 子成長。因此,於粒子之析出、成長時,無須進行如過去 方法之p Η控制。 第1步驟中之二氧化矽與二氧化矽以外的無機化合物 之複合比率,對於二氧化矽之無機化合物換算爲氧化物( Μ〇χ ) ’其MO x/Si02之莫耳比爲0.05〜2.0,較佳爲0.2 〜2.0之範圍内。該範圍内’二氧化矽的比率越小,多孔 質粒子之細孔容積越增大。然而,莫耳比即使超過2.0, 多孔質粒子的細孔容積幾乎不會增加。另一方面,莫耳比 未達〇 _ 〇 5時,細孔容積會變小。 調製空洞粒子時,MOx/Si〇2之莫耳比以0.25〜2.0之 範圍内爲佳。 -34- 200907491 (第2步驟:自多孔質粒子除去二氧化矽以外之無機化合 物) 第2步驟中,自第1步驟所得之多孔質粒子前驅體, 將二氧化矽以外的無機化合物(矽與氧以外之元素)之至 少一部份經選擇地除去。作爲具體之除去方法,將多孔質 粒子前驅體中的無機化合物使用無機酸或有機酸進行溶解 除去、或與陽離子交換樹脂接觸後進行離子交換除去。 且’第1步驟所得之多孔質粒子前驅體係爲矽與無機 化合物構成元素介著氧而結合之網目結構粒子。藉由如此 自多孔質粒子前驅體除去無機化合物(矽與氧以外之元素 ),可得到一層多孔質中細孔容積較大的多孔質粒子。又 ,使自多孔質粒子前驅體除去無機氧化物(矽與氧以外之 元素)之量變多,即可調製出空洞粒子。 又,自多孔質粒子前驅體除去二氧化矽以外的無機化 合物之前,於由第1步驟所得之多孔質粒子前驅體分散液 中添加將含有二氧化矽之鹼金屬鹽經脫鹼所得之氟含有取 代烷基之矽烷化合物的矽酸液或有機矽化合物或其水解物 或其縮聚物,形成二氧化矽保護膜者爲佳。二氧化矽保護 膜的厚度爲0.5〜40nm’較佳爲0.5〜15nm之厚度即可。 且,即使形成二氧化矽保護膜’該步驟之保護膜爲多孔質 ’厚度較爲薄’故可將上述二氧化砂以外的無機化合物自 多孔質粒子前驅體中除去。 藉由形成如此二氧化矽保護膜’保持粒子形狀下,將 上述之二氧化矽以外的無機化合物’可自多孔質粒子前驅 -35- 200907491 體中除去。又,形成後述二氧化矽被覆層時,多孔質粒子 之細孔不會因被覆層而被堵塞,因此不會降低細孔容積, 可形成後述之二氧化矽被覆層。且,除去之無機化合物的 量較少時,粒子不會被破壞,並非必須形成保護膜。 又,調製空洞粒子時,形成該二氧化矽保護膜爲佳。 調製空洞粒子時,除去無機化合物時,可得到由二氧化矽 保護膜、二氧化矽保護膜内之溶劑、與未溶解之多孔質固 體成分所成之空洞粒子的前驅體,於空洞粒子之前驅體中 形成後述之被覆層時,所形成之被覆層成爲粒子壁而形成 空洞粒子。 欲形成上述二氧化矽保護膜時所添加之二氧化矽源的 量,於可保持粒子形狀之範圍內較少爲佳。二氧化砂源的 量過多時,二氧化矽保護膜會過厚,而難以自多孔質粒子 前驅體除去二氧化矽以外的無機化合物。 作爲使用於二氧化矽保護膜形成用之水解性有機矽化 合物或其水解物或其縮聚物,可使用下述一般式(1 1 )所 示烷氧基矽烷。Si (OR) 4 (2) wherein R is an alkyl group, preferably an alkyl group having 1 to 4 carbon atoms. In the %5 antireflection film, the 'high refractive index layer is coated with inorganic particles containing (a) conductive particles, (b) different from the composition of conductive particles, and (c) ionizing radiation hardening. The resin is formed of a coating liquid of (d) an organic sand compound represented by the following general formula (丨) or a hydrolyzate thereof or a polycondensate thereof, and preferably has a refractive index of 1 to 60 or less. Wherein 'R, is at least one substituent selected from the group consisting of a vinyl group, an amine group, an epoxy group, a chloro group, a methacryloxy group, a propyleneoxy group, and an isocyanate group, and R is an alkane. Base, η is the substitution number. At least the conductive particles of the present embodiment are -18-200907491, one type selected from the group consisting of yttrium oxide 'tin oxide, zinc oxide, tin-containing indium oxide (ITO), and antimony-containing tin oxide (ΑΤΟ). The conductive particles in the group of zinc citrate and the inorganic particles are preferably at least one inorganic particle selected from the group consisting of hollow cerium oxide, colloidal cerium oxide, and magnesium fluoride. Among them, it is preferable that the conductive particles are tin oxide containing antimony (strontium) and/or zinc antimonate, and the inorganic particles are preferably hollow ceria. In the antireflection film of the present embodiment, the ionizing radiation-curable resin is preferably an acrylic compound containing two or more polymerizable unsaturated bonds in the molecule. Further, in the antireflection film of the present embodiment, the low refractive index layer is preferably a polyoxynitride compound containing a group having at least one reactive group with an adhesive. (High refractive index layer) Continuing, a description will be given of a high refractive index layer which is higher than the refractive index of the transparent resin film. The high refractive index layer of the present invention is a layer having a higher refractive index than that of the transparent film substrate. The preferred refractive index of the high refractive index layer is preferably in the range of 1.5 to 2 · 2 in the measurement of the wavelength of 5 5 0 at 25 ° C. From the viewpoint of suppressing the coloration of the antireflection film, it is preferably in the range of 1.50 to 1.60. The means for adjusting the refractive index of the high refractive index layer can be controlled by the type and amount of the conductive particles. Therefore, the refractive index of the conductive particles described below is preferably 1.60 to 2.60, more preferably 1.65 to 2.50. Further, the film thickness of the high refractive index layer is preferably 5 nm to Ιμηι as the characteristics of the optical interference layer, and is preferably 10 nm to 〇3 μm, and more preferably 30 nm to 0.2 μm. -19- 200907491 Continuing' Description of conductive particles used to adjust the refractive index of the high refractive index layer. The conductive particles used in the present invention are at least one selected from the group consisting of cerium oxide, tin oxide, zinc oxide, tin-containing indium oxide (I τ Ο ), cerium-containing tin oxide (cerium), and zinc silicate. Conductive particles in the group. Since the particles having a composition other than the above, such as titanium oxide, aluminum oxide or zirconium oxide, are not conductive or insufficient, the coating film containing these components as a main component does not exhibit sufficient antistatic property, and thus is not contained in the conductive particles of the present invention. The average particle diameter of the primary particles of these conductive particles is in the range of 1 〇 nm to 200 nm, preferably 20 to 150 nm, and particularly preferably 30 to 100 nm. The average particle diameter of the conductive particles can be measured by an electron microscope photograph such as a scanning electron microscope (SEM), and measured by a particle size distribution meter or the like by a dynamic astigmatism method or a static astigmatism method. When the particle diameter is too small, aggregation tends to occur, and the dispersibility is deteriorated. When the particle size is too large, the haze will be significantly improved. The shape of the conductive particles is preferably a rice grain shape, a spherical shape, a cubic shape, a spindle shape, a needle shape or an indefinite shape. The conductive particles can be surface-treated by an organic compound. When the surface of the conductive particles is surface-modified with an organic compound, the dispersion stability in the organic solvent can be improved, and the dispersed particle diameter can be easily controlled, and aggregation and precipitation can be suppressed over time. Therefore, the surface modification amount of the preferred organic compound is 〇1 to 5% by mass, preferably 0.5 to 3% by mass, based on the metal oxide particles. Examples of the organic compound used for the surface treatment include a polyol, a hospital alcohol amine, a stearic acid, a sand compound coupling agent, and a titanate coupling agent. The decane coupling agent described later is preferred. It is also possible to combine more than two types of surfaces -20- 200907491. The amount of the conductive particles used is preferably 5% by mass to 5% by mass in the high refractive index layer, more preferably 10 to 80% by mass, and most preferably 20 to 75% by mass. If the amount used is too small, the desired refractive index or the effect of the present invention cannot be obtained, and when it is too large, deterioration of film strength or the like occurs. The conductive particles are provided in a dispersion state in a medium, and are provided as a coating liquid for forming a high refractive index layer. As a dispersion medium of the metal oxide particles, a liquid having a boiling point of 60 to 17 (TC) is preferably used. Specific examples of the dispersion solvent include water and alcohol (for example, methanol, ethanol, isopropanol, butanol). , benzyl alcohol), ketones (eg, acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone), _ alcohols (eg, diacetone alcohols), esters (eg, methyl acetate, Ethyl acetate, propyl acetate, butyl acetate, methyl formate, ethyl formate, propyl formate, butyl formate), aliphatic hydrocarbons (eg, hexane, cyclohexane), halogenated hydrocarbons (eg, dichloro) Methane, chloroform, carbon tetrachloride), aromatic hydrocarbons (eg, benzene, toluene, xylene), decylamine (eg, dimethylformamide, dimethylacetamide, η-methyl shame Ketone), ether (for example, diethyl ether, dioxins, tetrahydrofuran), ether alcohols (for example, 1-methoxy-2-propanol), propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate. It is also excellent in toluene, xylene, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone and butanol. The conductive particles can be dispersed in the medium using a dispersing machine. Examples of the dispersing machine include a sanding honing machine (for example, a needle ΪZhuyan; jg stomach), a high-speed impeller honing machine, and a quartz honing machine. Machine, roller honing machine, agitating ball mill and colloid honing machine. It is especially suitable for grinding honing machine and high-speed impeller type ijgg -21 - 200907491. It can also be used for pre-dispersion treatment. Examples of the machine include a ball honing machine, a three-roll honing machine, a kneader, and an extruder. It is preferable to contain a dispersing agent. Further, it may contain conductive particles having a core/shell structure. The shell may be formed around the core 1 In order to further improve the light resistance, a plurality of layers may be formed. The core is preferably completely covered by the shell. The high refractive index layer of the present invention may contain inorganic particles having different compositions of the conductive particles. The inorganic particles used are at least one inorganic particle selected from the group consisting of hollow ceria, colloidal ceria, and magnesium fluoride. The inorganic particles are used in the high refractive index layer at i mass% to 30%. The amount % is preferably 3 to 25% by mass, preferably 5 to 20% by mass. When the amount used is too small, the scratch resistance or adhesion, hardness, high temperature and high humidity resistance cannot be obtained. When the effect of the present invention is too large, the film strength is deteriorated, etc. When the high refractive index layer contains an ionizing radiation-curable resin as an adhesive of the conductive particles, the film forming property or physical properties of the coating film can be improved. The alkoxylated ionizing radiation-curable resin having a carbon number of 1 to 3 and/or the ionizing radiation-curable resin having a dioxane structure of the present invention contains the epoxy methane in the structure of the ionizing radiation-curable resin. In the case of ethylene oxide, propylene oxide, and/or 1,3-dioxane or 1,4-dioxane, the alkoxylated ionizing radiation-curable resin having a carbon number of 1 to 3 and/or Or an ionizing radiation-curable resin having a dioxane structure, which can be indirectly used to cause polymerization by irradiation with ionizing radiation such as ultraviolet rays or electron rays, directly or by a photopolymerization initiator. - 200907491 base Preferably monomers or oligomers. Examples of such an ionizing radiation-curable resin include methoxypolyethylene glycol acrylate, methoxy polyethylene glycol methacrylate, ethoxylated phenyl acrylate, and ethoxylated phenyl group. Acrylate 'ethoxylated 2-methyl-1,3 propanediol diacrylate, ethoxylated 2-methyl-oxime, 3-propanol mono- methacrylate, ethoxylated bisphenol A diacrylate, ethoxylated propoxylated bisphenol A dimethacrylate, ethoxylated trimethylolpropane triacrylate, ethoxylated trimethylolpropane trimethacrylate, Ethoxylated pentaerythritol tetrapropionate, propoxylated di-trimethylpropane tetraacrylate, propoxylated pentaerythritol tetraacrylate, dioxol diol diacrylate, dioxane diol The acrylate is preferred, and one or two functional groups which are indirectly generated by irradiation with ionizing radiation such as ultraviolet rays or electron beams or which are indirectly subjected to polymerization by the action of a photopolymerization initiator are particularly preferred. In addition, as the ionizing radiation-curable resin in the present invention, it is possible to indirectly generate a polymerization reaction by using two or more kinds of irradiation by ionizing radiation such as ultraviolet rays or electron beams, or by a photopolymerization initiator. A functional monomer or oligomer. The functional group is a group having an unsaturated double bond such as a (meth)acryl oxime group, and examples thereof include an epoxy group and a stanol group. Further, it is preferred to use a free radical polymerizable monomer or oligomer having two or more unsaturated double bonds. The photopolymerization initiator may also be combined as necessary. As such an ionizing radiation-curable resin, a polyol cyanate, an epoxy acrylate, a urethane acrylate, a polyester cyanate or a mixture thereof can be used. For example, a polyfunctional acrylate compound, etc. may be mentioned, and it is selected from -23-200907491 from pentaerythritol polyfunctional acrylate, dipentaerythritol polyfunctional acrylate, pentaerythritol polyfunctional methacrylate, and dipentaerythritol polyfunctional methacrylate. The compound formed is preferred. Here, the polyfunctional acrylate compound is a compound having two or more acryloxy groups and/or methacryloxy groups in the molecule. Examples of the monomer of the polyfunctional acrylate compound include ethylene glycol diacrylate, diethylene glycol diacrylate, 1,6-hexanediol diacrylate, neopentyl glycol diacrylate, and three. Hydroxymethylpropane triacrylate, trimethylolethane triacrylate, tetramethylol methane triacrylate, tetramethylol methane tetraacrylate, pentaglycerol triacrylate, pentaerythritol diacrylate, pentaerythritol triacrylate Ester, pentaerythritol tetraacrylate, glycerol triacrylate, dipentaerythritol triacrylate, dipentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate vinegar (propylene oxyethyl) dimeric isocyanate, Ethylene glycol dimethacrylate, diethylene glycol dimethacrylate, U-hexanediol dimethacrylate, neopentyl glycol dimethacrylate, trimethylolpropionate trimethyl Acrylate, trimethylolethane trimethacrylate, tetramethylol methane trimethacrylate, tetramethylol methane tetramethacrylate, pentaglyceryl trimethyl propylene Ester, pentaerythritol dimethacrylate, pentaerythritol trimethacrylate, pentaerythritol tetramethacrylate, glycerol trimethacrylate, dipentaerythritol trimethacrylate, dipentaerythritol tetramethyl acrylate, pentaerythritol Pentamethyl acrylate vinegar and dipentaerythritol hexamethyl propyl acrylate are preferred. These compounds may be used alone or in combination of two or more. Further, it may be an oligomer such as a 2-mer or a 3-mer of the above monomers -24-200907491. The amount of the ionizing radiation-curable resin to be added is preferably a high refractive index composition, and 15% by mass or more of the solid content is less than 50% by mass. In order to promote the hardening of the ionizing radiation-curable resin, a photopolymerization initiator having a mass ratio of 1:2 to 1:1 Å and a propylene-based compound having two or more polymerizable unsaturated bonds in the molecule are preferred. The ionized radiation-curable resin having a carbon number of 1 to 3 contained in the high refractive index layer of the antireflection film of the present invention and/or the ionizing radiation curable resin having a structure of a dioxin can be used individually. It can also be used in combination under body. The mixing ratio at this time is a ratio of 1:99 to 99:1, preferably 20:80 to 80:20, more preferably 30:70 to 70:30. The solvent resistance and adhesion after the damp heat test are particularly improved within the preferred range. The mixing ratio of the ionizing radiation-curable resin and the conductive particles contained in the high refractive index of the antireflection film of the present invention is preferably in the range of 1:3 to 5:3, more preferably 1: in the solid content. 1.5~1·6: 1, more preferably 1. 5: 1.2~1.5: 1. When the amount of the conductive particles is too small, the adhesion does not occur, and the effect of the present invention is not obtained, and the antistatic property is deteriorated. When the conductive particles are too large, the particles may fall off during the production of the antireflection film. Adhesion to the surface of the film in the coating process is not good for the cause of the appearance failure. Specific examples of the photopolymerization initiator include acetophenone, benzophenone, hydroxybenzophenone, michelone, α-amine oxime ester, thioxanthone, and the like, but none of them Specially limited. -25-200907491 The organic ruthenium compound represented by the formula (1) or a hydrolyzate thereof contained in the high refractive index layer of the antireflection film of the present invention or a film-forming property or physical property thereof is contained. R, nSi ( OR ) [n ... (!) wherein R' is at least one selected from the group consisting of an ethyl group, an amine group, an epoxy group, a methyl propyl oxy group, a propyleneoxy group, and an isocyanate. The base of the base 'R is the base' n is the substitution number. Specific examples of the organic sand compound or the polycondensate thereof represented by the above general formula (1) include 'methyltrimethoxytriethoxydecane, methyltrimethoxyethoxydecane, and methyl group. Decane, methyl tributoxydecane, ethyltrimethoxydecane ethoxy decane, ethylene trimethoxy decane, ethylene triethoxy olefin triacetoxy decane, ethylene trimethoxy ethoxy decane, phenyl decane , phenyl triethoxy decane, phenyl triacetate decyl trimethoxy decane, γ-chloropropyl triethoxy decane, γ-chloro decane, 3,3,3-trifluoropropyl Trimethoxydecane, γ-cyclopropyltrimethoxydecane, γ-glycidoxypropyltriethoxy (β-glycidoxyethoxy)propyltrimethoxydecane, β-oxyl Cyclohexyl)ethyltrimethoxydecane, β-(3,4-epoxy)ethyltriethoxylate, γ-propyl hydroxypropyltrimethoxy γ-methylpropenyloxypropyl Trimethoxy decane, γ-aminopropyl decane, γ-aminopropyl triethoxy decane, γ-hydrothiopropyl, the following general polymer is obtained from the chloro group or Decane, methyltriacetic acid, ethyltrioxane, ethyltrimethoxy, gamma-chloropropylpropyltriethoxypropoxydecane, γ-•(3,4-cyclocyclohexyldecane, thioloxy) Trimethyloxo-26- 200907491 decyl, γ-hydrothiopropyltriethoxydecane, Ν-β-(aminoethyl)_γ-aminopropyltrimethoxydecane, and Ρ-cyano Ethyl triethoxy sand, dimethyl dimethoxy decane, phenyl methyl dimethoxy decane, dimethyl diethoxy decane, phenyl methyl dimethoxy decane, dimethyl Diethoxy oxatane, phenylmethyldiethoxy oxime, γ-glycidoxypropylmethyldiethoxy decane, γ-glycidoxypropylmethyldimethoxy矽, γ_glycidoxypropyl phenyl diethoxylate, γ-chloropropylmethyldiethoxy sand, - methyl-acetic acid-based 丨兀-- Propyl propyl methyl dimethoxy sand, γ-acrylic propyl propyl methyl ethoxy sand, γ methacryloxypropyl methyl dimethoxy sand, γ -Methyl propylene methoxy propyl methyl diethoxy decane, γ-hydrogen Thiopropylmethyldimethoxylate, γ-hydrothiopropylmethyldiethoxydecane, γ-aminopropylmethyldimethoxydecane, γ-aminopropylmethyldi Ethoxy decane, methyl ethylene dimethoxy decane, and methyl ethylene diethoxy decane, etc. Among them, ethylene trimethoxy decane having a double bond in the molecule, B triethoxy decane, ethylene triacetate Decane, ethylene trimethoxyethoxy decane, γ-propylene methoxy propyl trimethoxy decane, and γ-methyl propylene methoxy propyl trimethoxy decane are preferred as a 2 substituted alkane Based on γ _ propylene methoxy propyl methyl monomethoxy decane, γ propylene methoxy propyl methyl diethoxy decane, γ - methyl propylene methoxy propyl methyl dimethoxy Preferably, decane, γ-methacryloxypropylmethyldiethoxydecane, methylethylenedimethoxydecane, and methylethylenediethoxydecane, γ·acryloxypropyltrimethyl Oxime, and γ-methacryloxypropyltrimethoxydecane, γ-propylene methoxypropylmethyldimethoxydecane, γ-propylene -27- 200907491 Oxyxy ketone is ·- ethoxy methoxy decane, γ-methyl propylene methoxy propyl methyl group ~ (hi _ and γ-methyl propylene methoxy propyl methyl group II Ethoxy oxime is especially good. Two or more types of organic hydrazines represented by the above general formula (1) or a polycondensate thereof are used. In addition to the above-mentioned organic hydrazine compound $g 7_R ¥ or its polycondensate, other organic hydrazine compound $ g 7ic quinone or its polycondensate may also be used. Other organic hydrazine compounds or hydrolyzates thereof or ϋ $ % ' may be exemplified by alkyl esters of ortho-decanoic acid (for example, methyl ortho-decanoate, ethyl ortho-decanoate, ruthenium decanoate, propyl decanoate) , ruthenium decanoate, sec-butyl orthosilicate, t-butyl orthosilicate, and hydrolyzate thereof. It is preferred to use an organic solvent when the high refractive index layer is coated. As the organic solvent, for example, an alcohol (for example, methanol, ethanol, propanol, isopropanol, butanol, isobutanol, second butanol, third butanol, pentanol, hexanol, cyclohexanol) may be mentioned. , benzyl alcohol, etc.), polyols (for example, ethylene glycol, diethylene glycol, triethylene glycol, polyethylene glycol, propylene glycol, dipropylene glycol, polypropylene glycol, butanediol, hexanediol, pentane Alcohols, glycerol, hexanetriol, thiodiethanol, etc.), polyol ethers (eg, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether) , diethylene glycol monomethyl ether, diethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monobutyl ether, ethylene glycol monomethyl ether acetate, triethylene glycol monomethyl ether, triethylene glycol single Ethyl ether, ethylene glycol monophenyl ether, propylene glycol monophenyl ether, etc.), amines (eg 'ethanolamine, diethanolamine, triethanolamine, N-methyldiethanolamine, N-ethyldiethanolamine, morphine, N_ethyl Morpholine, Ethyldiamine, Diethyldiamine, Tri-ethyltetramine, Tetraethylidene, Polyethylidene -28- 200907491, tetramethyl propyl diamine, etc.), guanamines (for example, formamide, N,N-dimethylformamide, hydrazine, hydrazine-dimethylacetamide, etc.), Heterocyclics (for example, 2-pyrrolidone, oxime-methyl-2-pyrrolidone, cyclohexylpyrrolidone, 2-oxazolone, 1,3-dimethyl-2-imidazolidone, etc.), sub-millings (for example) , dimethyl hydrazine, etc.), hydrazines (for example, cyclazone, etc.), urea, acetonitrile, acetone, etc., particularly preferably alcohols, polyols, and polyol ethers. The high refractive index layer is a gravure coater, a dip coater, a reverse coater, a coil bar coater, a die coater, or a spray coating or a spray coating using the above composition, which is equal to a transparent resin film, or The surface of the hard coat layer is applied to a wet film thickness of 0.1 to 100 μm, and after coating, it is dried by heating, and then formed as necessary. The hardening step can be described as described in the low refractive index layer described later. Further, when the dry film thickness is to be the above film thickness, the solid content concentration of the coating composition is adjusted. (Low Refractive Index Layer) Next, the low refractive index layer of the antireflection film of the present invention will be described. The low refractive index layer of the antireflection film of the present invention is a layer having a lower refractive index than that of the transparent film substrate, and is referred to as a low refractive index layer. The specific refractive index is preferably in the range of 1.30 to 1.45 at 23 ° C and 550 nm. Further, the film thickness of the low refractive index layer is preferably 5 nm to 0.5 μm, more preferably 10 nm to 0.3 μm, and more preferably 30 nm to 0.2 μm, as the characteristics of the optical interference layer. The low refractive index layer of the antireflection film of the present invention contains hollow particles, and it is preferable that -29-200907491 is a characteristic of an optical interference layer having a low refractive index. Further, the low refractive index layer of the antireflection film of the present invention is preferably one having at least one type of hollow ceria particles containing a porous or void therein. The hollow particles are (1) composite particles formed by a porous particle and a coating layer provided on the surface of the porous particle, or (2) having a cavity therein, and the contents are filled with a solvent, a gas or a porous substance. The hollow particles are 〇 and the 'empty particles are particles with voids inside, and the voids are surrounded by the walls of the particles. The contents of the solvent, gas, or porous substance used in the preparation of the cavity are filled. The hollow fine particles have an average particle diameter of 5 to 200 nm, preferably 10 to 70 nm. The particle size of the hollow particles is preferably a monodisperse having a coefficient of variation of from 1 to 40%. The average particle diameter of the hollow particles used in the present invention can be measured by an electron micrograph by a scanning electron microscope (SEM) or the like. The measurement is carried out by using a particle size distribution meter such as a dynamic astigmatism method or a static astigmatism method. The average particle diameter of the hollow particles used in the present invention can be appropriately selected in accordance with the transparent coating thickness of the formed low refractive index layer, and the film thickness of the transparent envelope is preferably 3/2 to 1/10, preferably 2 /3~1/10. Among them, the hollow particles are preferably dispersed in a suitable medium due to the formation of a low refractive index layer. As the dispersing medium, water, alcohols (for example, methanol, ethanol, isopropanol), and ketones (for example, methyl ethyl ketone, methyl isobutyl ketone), ketone alcohols (for example, diacetone alcohol), and Propyl monomethyl ether, propylene glycol monomethyl ether acetate, and the like are preferred. The thickness of the coating layer of the composite particles or the particle wall thickness of the void particles is -30-200907491 1 to 40 nm, preferably 1 to 2 〇 nm, and more preferably, when the thickness of the coating layer is less than 1 nm, coating may be performed. When the liquid component is less likely to enter the inside of the composite particle, the effect of the low refractive index is not obtained. When the thickness exceeds 2 〇 nm, the coating liquid component does not decrease in porosity (pore volume), and the effect may not be obtained. Further, in the case of the void particles, the particle shape cannot be maintained at the time of the particle wall, and even if the thickness exceeds the sufficient effect of lowering the refractive index. It is preferable that the coating of the composite particles or the main component of the void particles is preferable. Further, examples of the oxidation include Al2?3, B2O3, Ti?2, Zr?2, Sb203, Mo03, Zn02, W03 and the like. Examples of the particles include those obtained by cerium oxide, those obtained by inorganic compounds, and CaF2 and NaF. Among them, a porous particle composed of a composite oxide of cerium oxide and a dioxide is preferable as an inorganic compound other than cerium oxide: B 2 〇 3 ' T i 0 2 ' Z r 0 2 ' S η Ο 2 ' One type or two or more types of Ce〇2, Ζ 02 02 02, and W03. Such a ruthenium is represented by SiO 2 , and the molar ratio MOx/SiO in the conversion of ruthenium dioxide is preferably in the range of 0.001 to 0.3. 2 to 15 nm. The composite particles cannot completely coat the particles, and the internal porosity is reduced. Further, when the thickness of the coating layer is inside, and the thickness of the composite particles which is obtained by lowering the refractive index is less than 1 nm, the thickness of the coating layer is not more than 20 nm, and the solid particle wall cannot be made of cerium oxide as a component other than cerium, specifically S η Ο 2 ' Ce〇2, Ρ 2 〇3 ' The porous cerium oxide and the cerium oxide constituting the composite particles, and the inorganic compound cerium other than cerium, such as NaAlF6 or MgF, may be exemplified by A1203, 2〇3, and S b 2 0 3 'M0O3, in the porous particles, the inorganic compound of dioxane is oxidized 2 to 0.0001~1. 〇, compared with -31 - 200907491 It is difficult to obtain the molar ratio of the porous particles MOx/Si〇2 to o.oooi' even if It is also found that the pore volume is also small, and it is impossible to obtain particles having a lower refractive index. Further, when the molar ratio of the porous particles exceeds 1. 〇, the ratio of cerium oxide becomes small, so that the pore volume becomes large, and it is difficult to obtain a refractive index lower. The pore volume of the porous crucible _11 is in the range of 〇 1 to 1.5 m 1 / g, preferably in the range of 0.2 to 1.5 ml/g. When the pore volume is less than im.iml/g, particles having a sufficiently lowered refractive index cannot be obtained. When the pore volume exceeds 1.5 ml/g, the strength of the particles is lowered, and the strength of the obtained coating is lowered. Further, the pore volume of such a porous particle can be obtained by a mercury intrusion method. Further, examples of the content of the void particles include a solvent, a gas, a porous substance, and the like which are used in particle preparation. The solvent may contain void particles, unreacted materials of the particle precursor used for preparation, and a catalyst to be used. Further, examples of the porous material include those exemplified as the porous particles. These contents may be a single component or a mixture of plural components. As a method for producing the hollow particles, for example, a method of preparing composite oxide colloidal particles disclosed in paragraphs [0010] to [33] of JP-A-7-11-3015. When the specific composite particles are made of an inorganic compound other than cerium oxide or cerium oxide, hollow particles can be produced by performing the following first steps to third steps. (1st step: preparation of porous particle precursor) In the first step, the raw material of the raw material of the inorganic compound other than the raw material of the antimony dioxide and the non-oxidized -32-200907491 is prepared in advance, or the ceria is prepared. A mixed aqueous solution of a raw material and an inorganic compound raw material other than cerium oxide, and a composite ratio of the aqueous solution as the intended composite oxide are added to the aqueous alkali solution of pH IO or more, and the porous precursor precursor is gradually added thereto. As the raw material of cerium oxide, an alkali metal, ammonium or organic base phthalate can be used. As the alkali metal citrate, sodium citrate (water glass) or potassium citrate can be used. The organic base may, for example, be a fourth-order ammonium salt such as a tetraethylammonium salt or an amine such as monoethanolamine, diethanolamine or triethanolamine. Further, the ammonium citrate or the organic acid citrate also contains an alkaline solution of ammonia, a fourth-order ammonium hydroxide, an amine compound or the like in the citric acid solution. Further, as a raw material of an inorganic compound other than cerium oxide, an alkali-soluble inorganic compound can be used. Specific examples thereof include an oxidizing acid of an element selected from the group consisting of Al, B, Ti, Zr, Sn, Ce, P, Sb, Mo, Zn, and W, an alkali metal salt of the oxidizing acid, an alkaline earth metal salt, and an ammonium salt. Grade 4 ammonium salt. More preferred are sodium aluminate, sodium tetraborate, ammonium cerium carbonate, potassium citrate, potassium stannate, sodium citrate, sodium molybdate, cerium ammonium nitrate, sodium citrate. Although the pH of the mixed aqueous solution changes with the addition of these aqueous solutions, it is not particularly necessary to control the pH to a predetermined range. The aqueous solution ultimately determines its pH based on the type of inorganic oxide and its mixing ratio. The rate of addition of the aqueous solution at this time is not particularly limited. Further, in the production of composite oxide particles, a dispersion of seed particles can be used as a starting material. The particles are not particularly limited, and inorganic oxides such as si 〇 2, Al 2 〇 3 - 33 to 200907491, TiO 2 or ZrO 2 or particles of the composite oxides thereof can be used, and generally, they can be used. Further, the porous particle precursor dispersion obtained by the above production method can also be used as a seed particle dispersion. When the seed particle dispersion is used, the pH of the seed particle dispersion is adjusted to 1 Torr or more, and then an aqueous solution of the above compound is added to the aqueous alkali solution with stirring in the dispersion of the particles. At this time, it is not necessary to carry out dispersion pH control. When such a seed particle is used, it is easy to control the particle size of the prepared porous particle, and a uniform particle size can be obtained. The above-mentioned ceria raw material and inorganic compound raw material have a high solubility in alkali. However, when the two are mixed in a large pH region of the solubility, the solubility of oxidized acid ions such as citrate ions and aluminate ions is lowered, and these complexes are precipitated to grow into particles or cause growth of particles precipitated on the seed particles. . Therefore, it is not necessary to perform p Η control as in the past method when the particles are precipitated and grown. The composite ratio of the inorganic compound other than the cerium oxide and the cerium oxide in the first step is converted to the oxide ( Μ〇χ ) of the inorganic compound of the cerium oxide, and the molar ratio of MO x / SiO 2 is 0.05 to 2.0. Preferably, it is in the range of 0.2 to 2.0. The smaller the ratio of cerium oxide in this range, the larger the pore volume of the porous particles. However, even if the molar ratio exceeds 2.0, the pore volume of the porous particles hardly increases. On the other hand, when the molar ratio is less than _ 〇 〇 5, the pore volume becomes small. When modulating the void particles, the molar ratio of MOx/Si〇2 is preferably in the range of 0.25 to 2.0. -34-200907491 (Second step: removal of inorganic compound other than cerium oxide from porous particles) In the second step, the porous precursor precursor obtained from the first step is an inorganic compound other than cerium oxide (矽At least a portion of the element other than oxygen is selectively removed. As a specific removal method, the inorganic compound in the porous particle precursor is dissolved or removed by using a mineral acid or an organic acid, or is contacted with a cation exchange resin, and then subjected to ion exchange and removal. Further, the porous particle precursor system obtained in the first step is a mesh structure particle in which an element of an inorganic compound is bonded to oxygen via an inorganic compound. By thus removing the inorganic compound (the element other than cerium and oxygen) from the porous particle precursor, a porous particle having a large pore volume in the porous body can be obtained. Further, by removing the amount of the inorganic oxide (the element other than cerium and oxygen) from the porous particle precursor, the void particles can be prepared. Further, before removing the inorganic compound other than cerium oxide from the porous particle precursor, the fluorine-containing content obtained by subjecting the alkali metal salt containing cerium oxide to alkali removal is added to the porous particle precursor dispersion obtained in the first step. A ruthenium acid solution or an organic hydrazine compound which is a substituted decane compound of an alkyl group, or a hydrolyzate thereof or a polycondensate thereof is preferred to form a cerium oxide protective film. The thickness of the cerium oxide protective film may be 0.5 to 40 nm', preferably 0.5 to 15 nm. Further, even if the protective film of the step is formed, the protective film of the step is porous, and the inorganic compound other than the above-mentioned silica sand can be removed from the porous precursor of the porous particles. By forming such a cerium oxide protective film 'in a particle shape, the above inorganic compound other than cerium oxide can be removed from the porous particle precursor -35-200907491. Further, when the ceria coating layer to be described later is formed, the pores of the porous particles are not clogged by the coating layer, so that the pore volume can be formed without forming a ceria coating layer to be described later. Further, when the amount of the inorganic compound to be removed is small, the particles are not destroyed, and it is not necessary to form a protective film. Further, when the void particles are prepared, it is preferable to form the ceria protective film. When the void particles are prepared, when the inorganic compound is removed, a precursor of the void particles formed by the cerium oxide protective film, the solvent in the cerium oxide protective film, and the undissolved porous solid component can be obtained. When a coating layer to be described later is formed in the body, the formed coating layer becomes a particle wall to form void particles. The amount of the ceria source to be added in order to form the above-mentioned ceria protective film is preferably less in the range in which the particle shape can be maintained. When the amount of the silica sand source is too large, the cerium oxide protective film is too thick, and it is difficult to remove inorganic compounds other than cerium oxide from the porous particle precursor. As the hydrolyzable organic phosphonium compound for forming a ceria protective film or a hydrolyzate thereof or a polycondensate thereof, the alkoxydecane represented by the following general formula (1 1 ) can be used.

RnSi ( OR5 ) 4-n ... (11) 式中,R與R’表不院基、方基、乙稀基、丙嫌基等煙基, η表示〇、1、2或3。特別以使用經氟取代之四甲氧基矽 院、四乙氧基砂烷、四異丙氧基砂院等四垸氧基砂院爲佳 -36- 200907491 作爲添加方法,將於這些烷氧基矽烷、純水、及醇類 之混合溶液中添加作爲觸媒之少量鹼或酸的溶液,添加於 多孔質粒子之分散液中,將於烷氧基矽烷、純水、及醇類 之混合溶液中添加作爲觸媒之少量鹼或酸的溶液,添加於 多孔質粒子之分散液中,將烷氧基矽烷經水解所生成之矽 酸聚合物附著於無機氧化物粒子之表面上。 此時,可將烷氧基矽烷、醇類、觸媒同時添加於分散 液中。作爲鹼觸媒,可使用氨、鹼金屬之氫氧化物、胺類 。又,作爲酸觸媒,可使用各種無機酸與有機酸。 多孔質粒子前驅體之分散媒爲單獨水、或對於有機溶 劑而言水之比率較高時,可使用矽酸液而形成二氧化矽保 護膜。使用矽酸液時,分散液中添加所定量的矽酸液,同 時加入鹼使矽酸液附著於多孔質粒子表面上。且,亦可並 用矽酸液與上述烷氧基矽烷製作出二氧化矽保護膜。 (第3步驟:二氧化矽被覆層之形成) 第3步驟中,於第2步驟所調製之多孔質粒子分散液 (空洞粒子時爲空洞粒子前驅體分散液)中,藉由添加具 有含有氟取代烷基之矽烷化合物的水解性有機矽化合物或 矽酸液等,將粒子表面以水解性有機矽化合物或矽酸液等 聚合物進行包覆而形成二氧化矽被覆層。 且,所謂砍酸液爲,將水玻璃等驗金屬砂酸鹽之水溶 液經離子交換處理後成爲脫鹼的矽酸之低聚合物水溶液。 使用於被覆層形成用的有機矽化合物或矽酸液之添加 -37- 200907491 量僅爲可將膠體粒子表面充分包覆程度即可,最後所得之 二氧化矽被覆層的厚度爲1〜4〇nm,較佳爲可成爲1〜 20nm之量,添加於多孔質粒子(空洞粒子時爲空洞粒子 前驅體)分散液中。又,形成二氧化矽保護膜時,二氧化 矽保護膜與二氧化矽被覆層的合計厚度爲1〜40nm,較佳 爲成爲1〜20nm之範圍的量下添加有機矽化合物或矽酸液 〇 接者,加熱處理形成被覆層之粒子的分散液。藉由加 熱處理,多孔質粒子的情況爲,包覆多孔質粒子表面的二 氧化矽被覆層經緻密化,得到多孔質粒子藉由二氧化矽被 覆層包覆的複合粒子之分散液。又,空洞粒子前驅體時, 所形成之被覆層經緻密化而成爲空洞粒子壁,得到具有内 部經溶劑、氣體或多孔質固體成分塡充的空洞之空洞粒子 的分散液。 此時的加熱處理溫度僅爲可堵塞二氧化矽被覆層之微 細孔的程度即可’並無特別限定,以8 0〜3 0 0 °C之範圍爲 佳。加熱處理溫度未達8 0 °C時,有時完全堵塞二氧化砂被 覆層的微細孔而無法進行緻密化,又處理時間必須較長。 且加熱處理溫度超過3〇0°C下進行長時間處理時,會成爲 徽密粒子,而無法得到低折射率化之效果。. 如此所得之中空二氧化矽系粒子的折射率於未達K 4 2 時較低。可堆測爲如此中空二氧化矽系粒子雖保持多孔質 粒子内部之多孔性’但因内部爲空洞,故使得折射率變低 -38- 200907491 又’作爲由添加於塗佈組成物時的穩定性之觀點的中 空粒子,表面具有烴主鏈的聚合物以共價鍵方式結合的中 空粒子爲佳。 繼續’對於具有烴主鏈之聚合物易共價鍵方式結合的 中空粒子作說明。所謂具有烴主鏈之聚合物爲,直接共價 鍵、或中空二氧化矽系粒子表面的二氧化矽與具有烴主鏈 的聚合物之間介著結合劑,將二氧化矽與結合劑以共價鍵 方式結合,亦可言爲結合劑與聚合物以共價鍵方式結合。 作爲結合劑使用偶合劑爲較佳。 具有烴主鏈之聚合物以共價鍵方式結合的中空粒子可 藉由(1)將中空二氧化矽系粒子表面以未處理、或偶合 劑等進行處理之狀態下,使中空二氧化矽系粒子表面與具 有可形成共價鍵的官能基之聚合物進行反應,於中空二氧 化矽系粒子表面使聚合物進行接枝的方法、或(2 )將中 空二氧化矽系粒子表面以未處理、或偶合劑等進行處理之狀 態下’自中空二氧化矽系粒子表面聚合單體而使聚合物鏈 生長’使其進行表面接枝之方法等而製造。作爲具體之製 造方法’可使用特開2006-257308號公報所記載的方法。 上述製造方法中,由提高表面修飾率之觀點來看,自 中空二氧化矽系粒子表面聚合單體而使聚合物鏈生長,使 其表面接枝的方法爲佳。以含有具有聚合啓始能、或連鎖 移動能的官能基之偶合劑使中空二氧化矽系粒子進行表面 處理後’聚合單體,使聚合物鏈生長的使其表面接枝之方 法更佳。將具有聚合啓始能或連鎖移動能之官能基,作爲 -39- 200907491 導入中空二氧化矽系粒子所使用的表面處理劑(偶合劑) ’使用烷氧基金屬化合物(例如鈦偶合劑、烷氧基矽烷化 合物(矽烷偶合劑))爲佳。 中空二氧化矽系粒子可含有平均粒徑相異的2種以上 中空二氧化矽系粒子。 繼續’對於形成内部爲多孔質或空洞之至少爲中空二 氧化矽系粒子以外的低折射率層時所使用的塗佈組成物做 說明。 將低折射率層之表面(膜面)pH控制於2〜7時,可 抑制低層折率層内之反應,由高濕度下之防反射薄膜的耐 久性提高之觀點來看爲佳。較佳爲低折射率層之表面(膜 面)pH爲2.0〜4_0。形成低折射率層之組成物中,欲控 制低折射率層之表面(膜面)pH,添加至少一種具有 pKa2〜7範圍之pKa値的化合物爲佳。 且,pKa爲下述酸解離反應中之酸解離定數,其爲Ka 之對數値,pKa= -l〇glDKa所示數値。 HA ——〔 H+〕 〔 A·〕RnSi ( OR5 ) 4-n (11) wherein R and R' represent a ketone group such as a yard group, a square group, an ethylene group or a propyl group, and η represents 〇, 1, 2 or 3. In particular, it is preferable to use a fluorine-substituted tetramethoxy fluorene, tetraethoxy silane, tetraisopropoxy sand or the like, and a tetra-oxygen sand courtyard is preferably used as an additive method, and these alkoxylates will be used. A solution of a small amount of a base or an acid as a catalyst added to a mixed solution of a decane, a pure water, and an alcohol, added to a dispersion of porous particles, and a mixture of alkoxy decane, pure water, and an alcohol A solution of a small amount of a base or an acid as a catalyst is added to the solution, and is added to the dispersion of the porous particles, and the decanoic acid polymer obtained by hydrolyzing the alkoxydecane is attached to the surface of the inorganic oxide particles. In this case, alkoxydecane, an alcohol, and a catalyst may be simultaneously added to the dispersion. As the base catalyst, ammonia, an alkali metal hydroxide or an amine can be used. Further, as the acid catalyst, various inorganic acids and organic acids can be used. When the dispersion medium of the porous particle precursor is water alone or when the ratio of water to the organic solvent is high, a ruthenium acid solution can be used to form a ruthenium dioxide protective film. When a citric acid solution is used, a predetermined amount of citric acid solution is added to the dispersion, and a base is added to adhere the citric acid solution to the surface of the porous particle. Further, a cerium oxide protective film may be produced by using a citric acid solution together with the above alkoxy decane. (Step 3: Formation of ruthenium dioxide coating layer) In the third step, the porous particle dispersion (the cavity particle precursor dispersion in the case of void particles) prepared in the second step is added with fluorine. The surface of the particles is coated with a polymer such as a hydrolyzable organic hydrazine compound or a citric acid solution to form a cerium oxide coating layer, in place of a hydrolyzable organic hydrazine compound or a citric acid solution of a decane compound of an alkyl group. Further, the slashing acid solution is obtained by subjecting an aqueous solution of a metal oxide such as water glass to an alkali-removed low-polymer aqueous solution of citric acid by ion exchange treatment. The addition of the organic cerium compound or the ceric acid solution for forming the coating layer -37-200907491 is only sufficient to coat the surface of the colloidal particles sufficiently, and the thickness of the cerium oxide coating layer finally obtained is 1 to 4 〇. The nm, preferably in an amount of from 1 to 20 nm, is added to the dispersion of the porous particles (the hollow particle precursor in the case of void particles). When the cerium oxide protective film is formed, the total thickness of the cerium oxide protective film and the cerium oxide coating layer is 1 to 40 nm, and it is preferable to add an organic cerium compound or a ceric acid cerium in an amount of 1 to 20 nm. Then, the dispersion of the particles forming the coating layer is heat-treated. By the heat treatment, in the case of the porous particles, the ceria coating layer covering the surface of the porous particles is densified to obtain a dispersion of the composite particles in which the porous particles are coated with the ceria coating layer. Further, in the case of a void particle precursor, the formed coating layer is densified to become a void particle wall, and a dispersion liquid having voids inside the cavity filled with a solvent, a gas or a porous solid component is obtained. The heat treatment temperature at this time is not particularly limited as long as it can block the pores of the ceria coating layer, and is preferably in the range of 80 to 300 °C. When the heat treatment temperature is less than 80 °C, the fine pores of the silica sand coating layer may be completely blocked, and the densification may not be performed, and the treatment time must be long. When the heat treatment temperature exceeds 3 〇 0 ° C for a long period of time, it becomes a dense particle, and the effect of lowering the refractive index cannot be obtained. The refractive index of the hollow cerium oxide-based particles thus obtained is lower when it is less than K 4 2 . It can be piled up such that the hollow ceria-based particles maintain the porosity inside the porous particles, but the internal refractive index is low, so that the refractive index is lowered -38-200907491 and as a stability when added to the coating composition From the viewpoint of the hollow particles of the nature, it is preferred that the polymer having a hydrocarbon main chain on its surface is a covalently bonded hollow particle. Continuing' the description of the hollow particles in which the polymer having a hydrocarbon backbone is easily covalently bonded. The polymer having a hydrocarbon main chain is a direct covalent bond, or a cerium oxide on the surface of the hollow cerium oxide-based particles and a polymer having a hydrocarbon main chain, and a binder is added to the cerium oxide and the binder. Covalent bonding means that it can also be said that the binding agent and the polymer are covalently bonded. It is preferred to use a coupling agent as a binder. The hollow particles in which the polymer having a hydrocarbon main chain is covalently bonded can be made into a hollow cerium oxide system by (1) treating the surface of the hollow cerium oxide-based particles with an untreated or a coupling agent. a method in which a particle surface is reacted with a polymer having a functional group capable of forming a covalent bond, a polymer is grafted on the surface of the hollow ceria-based particle, or (2) the surface of the hollow ceria-based particle is untreated In the state in which the coupling agent or the like is treated, a method of "polymerizing a monomer from the surface of the hollow ceria-based particle to grow a polymer chain" to carry out surface grafting or the like is produced. As a specific production method, the method described in JP-A-2006-257308 can be used. In the above production method, from the viewpoint of improving the surface modification ratio, a method of polymerizing a monomer from the surface of the hollow ceria-based particles to grow a polymer chain and grafting the surface thereof is preferred. It is preferred to polymerize the monomer after the surface treatment of the hollow ceria-based particles with a coupling agent having a functional group having a polymerization initiation energy or a chain-transporting ability, and to grow the polymer chain to graft the surface. A functional group having a polymerization initiation energy or a chain shifting energy as a surface treatment agent (coupling agent) used for introducing hollow cerium oxide-based particles to -39-200907491 'using an alkoxy metal compound (for example, a titanium coupling agent, an alkane) A oxydecane compound (decane coupling agent) is preferred. The hollow ceria-based particles may contain two or more kinds of hollow ceria-based particles having different average particle diameters. The coating composition used in the case of forming a low refractive index layer other than the hollow ceria-based particles which are porous or void inside is described. When the pH of the surface (film surface) of the low refractive index layer is controlled to 2 to 7, the reaction in the low layer folding layer can be suppressed, and it is preferable from the viewpoint of improving the durability of the antireflection film under high humidity. Preferably, the surface (film surface) of the low refractive index layer has a pH of 2.0 to 4_0. In the composition for forming the low refractive index layer, it is preferred to add at least one compound having a pKa 范围 in the range of pKa 2 to 7 to control the pH of the surface (film surface) of the low refractive index layer. Further, pKa is the acid-dissociation number in the acid dissociation reaction described below, which is the logarithm of Ka and the number of pKa = -l〇glDKa. HA ——[ H+〕 〔 A·〕

Ka=〔 H+〕 〔 A·〕/〔 HA〕 其中,Η +表示酸性種,表示共軛鹼。 作爲具有至少1種pKa2〜7之範圍的pKa値之具體化 合物,可舉出脂肪族二元酸、或下述一般式(3)所示咪 唑、或其衍生物。特別爲將下述一般式(3 )所示咪π坐或 其衍生物含於低折射率層形成組成物時,即使於過度S苛 之耐久試驗後,亦可發揮本發明之目的效果故較佳。 -40- ZUUW/4^1Ka = [H+] [A·]/[HA] wherein Η+ represents an acid species and represents a conjugate base. The specific compound of pKa 具有 having at least one of pKa 2 to 7 may, for example, be an aliphatic dibasic acid or an imidazole represented by the following general formula (3) or a derivative thereof. In particular, when the following formula (3) is used to form a composition of a low refractive index layer, the effect of the present invention can be exerted even after an excessive S stress durability test. good. -40- ZUUW/4^1

(R1 ) nA(R1) nA

行取代之碳數l〜 個時可互爲相同或 相異。R1所示胺基可由1或2個甲基或乙基進行取代。又 ,烷基及烯基中可由碳數1〜3的烷基進行取代。n爲1〜 3的整數。A表示咪唑基。 繼續,以下爲上述一般式(3)所示咪唑、或其衍生 物之具體例’但未限定於彼等。又,咪唑或其衍生物可使 用購得之販賣品。 1 -甲基咪唑 2 -甲基咪唑 4 -甲基咪唑 4_(2_經基乙基)咪哩 4- (2-胺基乙基)咪口坐 2- (2-經基乙基)咪哩 2 _乙基咪唑 2 _乙烯咪唑 4-丙基咪唑 2,4 -二甲基咪U坐 2-氯咪唑 4,5 -二(2 -經基乙基)咪π坐 咪唑 -41 - 200907491 作爲脂肪族二元酸,可舉出甲酸、丙酸、丙二酸、琥 珀酸、酒石酸、蘋果酸、馬來酸、富馬酸、戊二酸、己二 酸、乙酸等,彼等中以乙酸爲佳。 脂肪族二元酸或上述一般式(3 )所示咪唑或其衍生 物爲低折射率層塗佈組成物中含0.05〜10.0質量%,但由 塗佈組成物之安定性等點來看較佳。 本發明之低折射率層中含有觸媒者爲佳。作爲觸媒, 可舉出鹽酸、硫酸、硝酸等無機酸類、草酸、乙酸、甲酸 、甲烷磺酸等有機酸類、氫氧化鈉、氫氧化鉀、氨等無機 鹼類、三乙胺、吡啶等有機鹼類、三異丙氧基鋁、四丁氧 基锆等金屬烷氧化物類、後述之金屬螯合化合物等,其中 以酸觸媒及金屬螯合化合物爲佳。 酸觸媒使用鹽酸、硫酸、草酸、乙酸、鄰苯二甲酸等 爲佳。作爲金屬螯合化合物’可使用選自Zr、Ti、A1之 金屬作爲中心金屬之螯合化合物,但無特別限定。 作爲具體例,可舉出三-η-丁氧基乙基乙醯乙酸酯鉻、 二-η-丁氧基雙(乙基乙醯乙酸酯)锆、η-丁氧基參(乙基 乙醯乙酸酯)鉻、肆(η -丙基乙醯乙酸酯)鉻、肆(乙醯 基乙醯乙酸酯)锆、肆(乙基乙醯乙酸酯)鉻等锆螯合化 合物、二異丙氧基雙(乙基乙醯乙酸酯)鈦、二異丙氧基 雙(乙醯基乙酸酯)鈦、二異丙氧基雙(乙醯基丙酮)鈦 等鈦螯合化合物、二異丙氧基乙基乙醯乙酸酯鋁、二異丙 氧基乙醯丙酮鹽銘、異丙氧基雙(乙基乙酿乙酸酯)銘、 異丙氧基雙(乙醯丙酮鹽)鋁、參(乙基乙醯乙酸酯)鋁 -42- 200907491 、參(乙醯丙酮鹽)鋁、單乙醯丙酮鹽雙(乙基乙 酯)鋁等鋁螯合化合物等。 這些金屬螯合化合物中,可使用三_n_丁氧基乙 乙酸酯鉻、二異丙氧基乙基乙醯乙酸酯鋁、參(乙 乙酸酯)鋁爲特佳。又,這些金屬螯合化合物可單 用。 形成低折射率層之塗佈組成物中,含有有機溶 。作爲具體之有機溶劑的例子,可舉出醇類(例如 、乙醇、異丙醇、丁醇、苯甲醇類)、酮(例如, 甲基乙基酮、甲基異丁基酮、環己酮)、酯(例如 甲酯、乙酸乙酯、乙酸丙基、乙酸丁基、甲酸甲基 乙酯、甲酸丙基、甲酸丁基)'脂肪族烴(例如, 環己烷)、鹵化烴(例如,二氯甲烷、氯仿、四氯 、芳香族烴(例如,苯、甲苯、二甲苯)、醯胺( 二甲基甲醯胺、二甲基乙醯胺、η-甲基吡咯烷酮) 例如,二乙醚、二噁烷、四氫呋喃)、醚醇類(例 甲氧基-2-丙醇)、丙二醇單甲醚、丙二醇單甲醚乙 其中以甲苯、二甲苯、甲基乙基酮、甲基異丁基酮 酮、及丁醇爲特佳。 形成低折射率層之塗佈組成物中之固體成分濃 〜4質量%爲佳,固體成分濃度爲4質量%以下時, 生塗佈不均,1質量%以上時可減輕乾燥負荷。 形成低折射率層之塗佈組成物中,含有氟系或 烷系界面活性劑時爲佳。含有上述界面活性劑時’ 醯乙酸 基乙醯 基乙醯 獨或並 劑爲佳 ,甲醇 丙酮、 ,乙酸 、甲酸 己院、 化碳) 例如, 、醚( 如,1-酸酯。 、環己 度以1 不易產 聚矽氧 可減低 -43- 200907491 塗佈不均且可提高膜表面之防污性爲有效。 作爲氟系界面活性劑,將含有全氟烷基之單體、寡聚 物、聚合物作爲母核者,可舉出聚環氧乙烷烷醚、聚環氧 乙烷烷基烯丙基醚、聚環氧乙烷等衍生物等。 氟系界面活性劑使用販賣品時,例如可舉出 SurflonS-381、同 S-3 82、同 SC-101、同 SC-102、同 SC-103、同 SC-104 (旭硝子股份有限公司製)、FluoradFC-430 、 同 FC-431、同 FC-173 ( Fluorochemicals 住友 3M 製)、EFTOPEF352、同EF301、同EF303 (新秋田化成股 份有限.公司製)、修貝格夫亞8 0 3 5、同8 03 6 (修貝格滿 公司製)、ΒΜ1000、ΒΜ1100(ΒΜ·亥米公司製)、 MegafaceF-171 '同F-470 (大日本墨水化學工業股份有限 公司製)等。 氟系界面活性劑的含氟比率爲〇 . 〇 5〜2質量%,較佳 爲0. 1〜1質量%。上述氟系界面活性劑可倂用1種或2種 以上。 繼續,對於聚矽氧烷界面活性劑做說明。 聚矽氧烷界面活性劑’依據結合於矽原子之有機基的 種類,而大槪分爲純聚矽氧烷油與改性聚矽氧烷油。 其中,所謂純聚矽氧烷油爲,將甲基、苯基、氫原子 作爲取代基而結合者。所g胃改性聚砂氧院油爲具有由純聚 矽氧烷油以二次衍生的構成部分者。一方面,亦可由聚砂 氧烷油之反應性來分類。綜合上述如以下。 -44 - 200907491 (聚矽氧烷油) 1 .純聚矽氧烷油 1 -1.非反應性聚砂氧院油:二甲基、甲基苯基取代等 〇 1 -2 •反應性聚矽氧烷油:甲基氫取代等。 2 .改性聚矽氧烷油 於一甲基聚矽氧烷油中導入各式各樣有機基所產生的 改性聚矽氧烷油。 2 -1 ·非反應性聚砂氧烷油:院基、烷基/芳烷基、烷基 /聚醚、聚醚、高級脂肪酸酯取代等。 烷基/芳烷基改性聚矽氧烷油爲,將二甲基聚矽氧烷 油之甲基一部份由長鏈烷基或苯基烷基取代之聚矽氧烷油 〇 聚醚改性聚矽氧烷油爲,將親水性聚氧伸烷基導入於 疏水性二甲基聚矽氧烷之聚矽氧烷系高分子界面活性劑。 高級脂肪酸改性聚砂氧院油爲,將二甲基聚砂氧院油 之甲基一部份由高級脂肪酸醋取代的聚砂氧院油。 胺基改性聚矽氧烷油爲’具有將聚矽氧烷油之甲基一 部份由胺基烷基取代之結構的聚_氧@ 。 環氧基改性聚矽氧烷油爲,具有將聚矽氧烷油之甲基 一部份由含有環氧基之烷基取代之結構的聚矽氧烷油。 羧基改性或醇類改性聚矽氧院油爲,具有將聚矽氧烷 油之甲基一部份由含有羧基或羥基之院基取代之結構的聚 -45 - 200907491 砂氧院油。 其中,可添加聚醚改性聚矽氧烷油。聚醚改性聚矽氧 烷油之數平均分子量,例如爲1,000〜100,000,較佳爲 2,000〜50,000,數平均分子量未達1,〇〇〇時,塗膜之乾燥 性會降低,相反地數平均分子量若超過100,000時,於塗 膜表面表容易外滲。 作爲具體商品,可舉出L-45、 L-9300、 FZ-3704、 FZ-3703 、 FZ-3720 、 FZ-3786 、 FZ-3501 、 FZ-3504 、 FZ-3508 、FZ-3705 、 FZ-3707 、 FZ-3710 、 FZ-3750 、 FZ-3760 、 FZ-3785、FZ-3785 ' Y-7499 (日本 unicar股份有限公司製) 、KF96L 、 KF96 、 KF96H 、 KF99 、 KF54 ' KF965 、 KF968 、KF56、KF99 5、KF351、KF351A、KF3 5 2、KF35 3、 KF354 、 KF355 、 KF615 ' KF618 、 KF945 、 KF6004 、 FL100 (信越化學工業股份有限公司製)、界面活性劑BYK系 列、BYK-300/302、BYK-3 06、BYK-3 07、BYK-310、 BYK-315 ' BYK-3 20、BYK-322、BYK-323、BYK-325 > BYK-3 3 0、BYK-331、BYK-3 3 3、BYK-3 3 7、BYK-340、 BYK-3 44、BYK-3 70、BYK-3 75、BYK-3 77、B YK- 3 52、 BYK-3 54、BYK-3 5 5/3 5 6、B YK - 3 5 8 N/3 6 1 N、BYK-3 5 7、 BYK-390、BYK-3 92、BYK-UV3 5 00、B YK-UV3 5 1 0 > B YK-UV3 5 70、BYK-Silclean3 700 ( BYK Japan 公司製)、 XC96-723 、 YF3800 、 XF3905 、 YF3057 、 YF3807 、 YF3802 、YF3897 (GE東芝聚矽氧烷公司製)等。 又,聚矽氧烷界面活性劑爲,將聚矽氧烷油的甲基一 -46- 200907491 部份由親水性基取代之界面活性劑。取代位置爲 油之支鏈、兩末端、單末端、兩末端支鏈等。作 基可舉出聚醚、聚甘油、吡咯烷酮、甜菜鹼、硫 酸鹽、4級鹽等。 作爲聚砍氧院界面活性劑,疏水基爲由二甲 院、親水基爲聚氧伸垸基所構成之非離子界面活 〇 非離子界面活性劑爲,不具有水溶液中解離 基的界面活性劑之總稱,除具有疏水基以外,亦 親水性基之多元醇類的羥基、又具有聚氧伸烷基 氧乙烷)等作爲親水基者。親水性爲隨著醇類性 的增加,又隨著聚氧伸烷基鏈(聚環氧乙烷鏈) 增強。使用疏水基爲由二甲基聚矽氧烷、親水基 烷基所構成之非離子界面活性劑時,會提高上述 層之不均或膜表面之防污性。可推測爲由聚甲基 成之疏水基配向於表面時,可形成難被污染的膜丨 作爲非離子界面活性劑之具體例,例如可舉 烷界面活性劑 SILWET L-77、L-720、L-700 1、 L-7604 、 Y-7006 、 FZ-2101 、 FZ-2104 、 FZ-2105 、 、FZ-2118 、 FZ-2120 、 FZ-2122 、 FZ-2123 、 FZ-2 2154 、 FZ-2161 、 FZ-2162 、 FZ-2163 、 FZ-2164 、 、FZ-2191 ' SUPERSILWET SS-280 1、SS-28 02、 、SS-2804、SS-2805 (日本unicar股份有限公司· 這些作爲疏水基係由二甲基聚矽氧烷所構成 聚矽氧烷 爲親水性 酸鹽、磷 基聚矽氧 性劑爲佳 成離子之 具有作爲 鏈(聚環 羥基數目 之加長而 爲聚氧伸 低折射率 矽氧烷所 复面。 出聚矽氧 L-7002 、 FZ-21 1 0 130、 FZ-FZ-2 1 66 SS-2803 裂)等。 ,親水基 -47- 200907491 係由聚氧伸烷基所構成之非離子系界面活性劑的較佳結構 ,以二甲基聚矽氧烷結構部分與聚氧伸烷基鏈成交互重複 結合之直鏈狀嵌段共聚物爲佳。由塗佈形成低折射率層之 塗佈組成物時的不均抑制或塗平性來看較佳。作爲這些具 體例,例如可舉出聚矽氧烷界面活性劑A B N S IL W E T F Z -2203、FZ-2207、FZ-220 8、FZ-2222 (日本 unicar 股份有 限公司製)等。 形成低折射率層之塗佈組成物中,由更嚴苛條件下之 耐久試驗後可容易發揮本發明目的效果之觀點來看,含有 以下說明之反應性改性聚矽氧烷樹脂(亦稱爲反應性改性 聚矽氧烷油)者爲佳。 2 - 2 ·反應性改性聚矽氧烷油:胺基、環氧基、羧基、 醇類取代等。 作爲反應性改性聚矽氧烷樹脂,可舉出於聚矽氧烷之 支鏈、單末端或兩末端上以胺基、環氧基、羧基、羥基、 甲基丙烯基、氫硫基、酚等進行取代之反應性型改性聚矽 氧烷樹脂。作爲胺基改性聚矽氧烷樹脂,具體可舉出反?-860,KF-861,X-22-161A、X-22-161B (以上,信越化學工 業股份有限公司製)、FM-33 1 1,FM-3 325 (以上,chisso 股份有限公司製),作爲環氧基改性聚矽氧烷樹脂可舉出 KF-105 、 X-22-163A 、 X-22-163B 、 KF-101 、 KF-1001 (以 上’信越化學工業股份有限公司製),作爲聚醚改性聚矽 氧烷樹脂’可舉出X-22-4272、X-22-4952,作爲羧基改性 聚矽氧院樹脂,可舉出X-22-3701E、X-22-371〇(以上, -48 - 200907491 信越化學工業股份有限公司製),作爲甲醇改性聚 樹脂,可舉出 KF-600 1、KF-6003 (以上,信越化 股份有限公司製),作爲甲基丙烯酸改性聚矽氧烷 舉出X-22-1 64C (以上,信越化學工業股份有限公 ,作爲氫硫基改性聚矽氧烷樹脂,可舉出KF-200 1 ,信越化學工業股份有限公司製),作爲酚改性聚 樹脂可舉出X-22-1821 (以上,信越化學工業股份 司製)等。作爲羥基改性聚矽氧烷樹脂可舉出FM-FM-442 1、FM-DA2 1,FM-DA26 (以上,chisso 股份 司製)。其他亦含有單末端反應性聚矽氧烷樹脂之 170DX、X-22-2426、X-22-176F (信越化學工業股 公司製)等。 上述界面活性劑可與其他界面活性劑倂用,又 與適當的磺酸鹽系、硫酸酯鹽系、磷酸酯鹽系等陰 面活性劑並用,且亦可與具有聚環氧乙烷鏈親水基 、醚酯型等非離子界面活性劑等倂用。上述界面活 添加量爲,低折射率層塗佈組成物中爲0.05〜3.0 時,不僅可提高塗膜之撥水、撥油性、防污性,亦 對於表面耐擦傷性之效果故較佳。 形成低折射率層之塗佈組成物中可含有其他二 粒子。其中作爲其他二氧化矽粒子,雖無特別限定 舉出膠體二氧化矽等。作爲膠體二氧化矽之具體例 氧化矽以膠體狀分散於水或有機溶劑者,雖無特別 爲球狀、針狀或珠子群狀。 矽氧烷 學工業 樹脂可 司製) (以上 矽氧烷 有限公 4411、 有限公 X-22- 份有限 例如可 離子界 之醚型 性劑之 質量% 可發揮 氧化矽 ,但可 ,將二 限定可 -49- 200907491 膠體二氧化矽之平均粒徑以50〜3 OOnm之範圍爲佳, 變動係數以1〜40%之單分散者爲佳。平均粒徑可由掃描 電子顯微鏡(SEM )等藉由電子顯微鏡照片測定。亦可利 用動態散光法或靜態散光法等由粒度分佈計等測定。 膠體二氧化矽可爲被販賣者,例如可舉出日產化學工 業公司的Snowtex系列、觸媒化成工業公司的Cataloid-S 系列、B ay er公司的雷巴西爾系列等。又,以氧化鋁溶膠 或氫氧化鋁進行陽離子改性之膠體二氧化矽或二氧化矽的 一次粒子以2價以上的金屬離子進行粒子間之結合後,連 結成珠子群狀的珠子群狀膠體二氧化矽亦佳。珠子群狀膠 體二氧化矽可舉出日產化學工業公司的SnowtexAK系列 、SnowtexPS系歹[|、SnowtexUP系列等,具體可舉出IPS-ST-L (異丙醇分散、粒子徑40〜50nm、固體成分30%) 、MEK-ST-MS ( 甲基乙基酮分散、粒子徑17〜23nm、固 體成分35 )等。 低折射率層形成塗佈組成物中含有膠體二氧化矽時, 對於低折射率層中之固體成分爲10〜60質量%,且30〜 60質量%時由膜強度之觀點來看較佳。 又,低折射率層形成塗佈組成物中對於低折射率層中 之固體成分含有5〜80質量%之膠黏劑爲佳。膠黏劑爲, 黏著中空二氧化矽粒子等粒子’具有維持含有空隙之低折 射率層的結構之功能。膠黏劑的使用量不僅可塡充空隙, 亦可維持低折射率層之強度下進行調整。 作爲膠黏劑,可舉出烷氧基金屬化合物、及其水解物 -50- 200907491 或其縮聚物’又可舉出聚乙稀醇、聚環氧乙院、聚甲基甲 基丙烯酸酯、聚甲基丙烯酸酯、二乙醯基纖維素、三乙酸 基纖維素、硝基纖維素、聚酯、醇酸樹脂、氟丙烯酸酯、 含氟聚合物等。作爲氟聚合物,例如可舉出氟烯烴類(例 如氟乙烯、亞乙烯氟化物、四氟乙烯、全氟辛基乙烯、六 氟丙烯、全氟-2,2-二甲基-1,3-二氧雜環戊烯等(甲基)丙 烯酸之部分或完全氟化烷酯衍生物類(例如V I S C Ο A T 6 F Μ (大阪有機化學製)或Μ-2020 (大金製)等)、完全或 部分氟化乙烯醚類等。其中較佳爲全氟烯烴類,由折射率 、溶解性、透明性、取得性等觀點來看以六氟丙烯爲特佳 〇 又,作爲院氧基金屬化合物,特別爲前述之高折射率 層項所說明的有機矽化合物或其水解物或其縮聚物’,對於 中空二氧化矽粒子之膠黏劑的特性優良之觀點來看爲較佳 〇 低折射率層中可含有下述一般式(4)所示化合物或 其螯合化合物,可改善硬度等物性。When the number of carbon atoms replaced by a row is one or the same, they may be the same or different. The amine group represented by R1 may be substituted by 1 or 2 methyl groups or ethyl groups. Further, the alkyl group and the alkenyl group may be substituted by an alkyl group having 1 to 3 carbon atoms. n is an integer of 1 to 3. A represents an imidazolyl group. Continuing, the following is a specific example of the imidazole represented by the above general formula (3) or a derivative thereof, but is not limited thereto. Further, imidazole or a derivative thereof can be used as a commercially available product. 1-methylimidazole 2-methylimidazole 4-methylimidazole 4_(2_ylidylethyl)imidate 4-(2-aminoethyl) piazole 2-(2-ylethylethyl)哩2 _ethylimidazole 2 _vinylimidazole 4-propylimidazole 2,4- dimethylimidine U sitting 2-chloroimidazole 4,5-di(2-propylethyl) pi-s-imidazole-41 - 200907491 Examples of the aliphatic dibasic acid include formic acid, propionic acid, malonic acid, succinic acid, tartaric acid, malic acid, maleic acid, fumaric acid, glutaric acid, adipic acid, acetic acid, and the like. Acetic acid is preferred. The aliphatic dibasic acid or the imidazole or the derivative thereof represented by the above general formula (3) is 0.05 to 10.0% by mass in the low refractive index coating composition, but is considered from the viewpoint of the stability of the coating composition. good. It is preferred that the low refractive index layer of the present invention contains a catalyst. Examples of the catalyst include inorganic acids such as hydrochloric acid, sulfuric acid, and nitric acid; organic acids such as oxalic acid, acetic acid, formic acid, and methanesulfonic acid; inorganic bases such as sodium hydroxide, potassium hydroxide, and ammonia; and organic compounds such as triethylamine and pyridine. A metal alkoxide such as a base, aluminum triisopropoxide or zirconium tetrabutoxide, a metal chelate compound to be described later, and the like, and an acid catalyst and a metal chelate compound are preferred. The acid catalyst is preferably hydrochloric acid, sulfuric acid, oxalic acid, acetic acid or phthalic acid. As the metal chelate compound, a chelate compound selected from a metal of Zr, Ti, and A1 as a center metal can be used, but it is not particularly limited. Specific examples thereof include chromium tris-n-butoxyethylacetate acetate, zirconium di-n-butoxy bis(ethylacetamidine acetate), and η-butoxy ginseng (B). Zirconium chelates such as chromium, yttrium (y-propylacetate acetate) chromium, yttrium (ethenylacetate acetate) zirconium, lanthanum (ethyl acetoacetate) chromium a compound, diisopropoxy bis(ethylacetamidine acetate) titanium, diisopropoxy bis(acetamidoacetate) titanium, diisopropoxy bis(ethyl decyl acetonate) titanium, etc. Titanium chelate compound, aluminum diisopropoxyethylacetate acetate, diisopropoxyacetamidine salt, isopropoxy bis(ethyl ethyl acetate), isopropoxy Double (acetamidine acetone) aluminum, ginseng (ethylacetamidine acetate) aluminum-42-200907491, ginseng (acetamidine acetone) aluminum, monoethyl hydrazine acetone bis(ethyl ethyl ester) aluminum and other aluminum chelate Compounds and the like. Among these metal chelating compounds, chromium tris-butoxyacetate, aluminum diisopropoxyethylacetate acetate, and aluminum ginseng (ethylene acetate) are particularly preferred. Further, these metal chelate compounds can be used alone. The coating composition forming the low refractive index layer contains an organic solvent. Specific examples of the organic solvent include alcohols (for example, ethanol, isopropanol, butanol, benzyl alcohol) and ketones (for example, methyl ethyl ketone, methyl isobutyl ketone, and cyclohexanone). ) ester (eg methyl ester, ethyl acetate, propyl acetate, butyl acetate, methyl ethyl formate, propyl formate, butyl formate) 'aliphatic hydrocarbon (eg cyclohexane), halogenated hydrocarbon (eg , dichloromethane, chloroform, tetrachloro, aromatic hydrocarbons (for example, benzene, toluene, xylene), decylamine (dimethylformamide, dimethylacetamide, η-methylpyrrolidone), for example, two Ethyl ether, dioxane, tetrahydrofuran), ether alcohols (such as methoxy-2-propanol), propylene glycol monomethyl ether, propylene glycol monomethyl ether, among which toluene, xylene, methyl ethyl ketone, methyl Butyl ketone ketone and butanol are particularly preferred. The solid content of the coating composition in which the low refractive index layer is formed is preferably 4% by mass or more, and when the solid content concentration is 4% by mass or less, uneven coating is caused, and when it is 1% by mass or more, the drying load can be reduced. It is preferred that the coating composition forming the low refractive index layer contains a fluorine-based or an alkane-based surfactant. When the above surfactant is contained, 'p-acetoxyethyl hydrazide oxime is preferred, methanol acetonide, acetic acid, formic acid, carbon, etc.), for example, ether (eg, 1-ester., cyclohexyl) Degree of 1 is not easy to produce polyoxyl oxide can be reduced -43- 200907491 It is effective to coat unevenly and improve the antifouling property of the film surface. As a fluorine-based surfactant, a monomer and oligomer containing perfluoroalkyl group Examples of the polymer as a core may include derivatives such as polyethylene oxide alkyl ether, polyethylene oxide alkyl allyl ether, and polyethylene oxide. When a fluorine-based surfactant is used as a commercial product, For example, Surflon S-381, the same S-3 82, the same SC-101, the same SC-102, the same SC-103, the same SC-104 (made by Asahi Glass Co., Ltd.), Fluorad FC-430, and FC-431 , with FC-173 (Fluorochemicals Sumitomo 3M system), EFTOPEF352, with EF301, with EF303 (New Akita Chemical Co., Ltd.), Xiubeigefu 8 0 3 5, same as 8 03 6 System), ΒΜ1000, ΒΜ1100 (ΒΜ·Hemi Company), MegafaceF-171 'With F-470 (Greater Japan Ink Chemistry) The fluorine-containing surfactant has a fluorine-containing ratio of 5% to 2% by mass, preferably 0.1 to 1% by mass. The above-mentioned fluorine-based surfactant may be used in one type or More than two. Continued, for the description of polyoxyalkylene surfactants. Polyoxane surfactants are based on the type of organic groups bonded to ruthenium atoms, and are divided into pure polyoxane oils and modified Polypyroxane oil. The pure polydecane oil is a combination of a methyl group, a phenyl group and a hydrogen atom as a substituent. Alkane oil is a component of secondary derivatization. On the one hand, it can also be classified by the reactivity of polyoxalic acid oil. The above is as follows. -44 - 200907491 (polyoxane oil) 1. Pure polyoxymethane Oil 1-1. Non-reactive polysalination oil: dimethyl, methylphenyl substituted, etc. 〇1 -2 • Reactive polyoxane oil: methyl hydrogen substitution, etc. 2. Modified polyoxyl A modified polyoxyalkylene oil produced by introducing a wide variety of organic groups into a monomethylpolyoxane oil. 2 -1 · Non-reactive poly sand Alkane oil: hospital base, alkyl/aralkyl group, alkyl/polyether, polyether, higher fatty acid ester substitution, etc. Alkyl/aralkyl modified polyoxyalkylene oil is dimethyl polyfluorene The methyl group of the oxyalkyl oil is partially substituted by a long-chain alkyl group or a phenylalkyl group, and the polysiloxane-modified polysiloxane is used to introduce a hydrophilic polyoxyalkylene group into the hydrophobic group. Polyoxymethane-based polymer surfactant of dimethyl polyoxane. The high-grade fatty acid modified poly-xyloxy oil is a part of the methyl group of dimethyl polyoxalate oil replaced by higher fatty acid vinegar Poly sand oxide oil. The amine-modified polyoxyalkylene oil is a poly-oxygen@ having a structure in which a methyl group of a polyoxyalkylene oil is partially substituted with an aminoalkyl group. The epoxy group-modified polyoxyalkylene oil is a polyoxyalkylene oil having a structure in which a part of a methyl group of a polysiloxane oil is substituted with an alkyl group having an epoxy group. The carboxy-modified or alcohol-modified polyxanthene oil is a poly-45 - 200907491 sand oxide oil having a structure in which a methyl group of a polyoxyalkylene oil is partially substituted by a hospital group containing a carboxyl group or a hydroxyl group. Among them, polyether modified polyoxyalkylene oil can be added. The number average molecular weight of the polyether modified polyoxyalkylene oil is, for example, 1,000 to 100,000, preferably 2,000 to 50,000, and the number average molecular weight is less than 1. When dry, the drying property of the coating film is lowered. When the number average molecular weight exceeds 100,000, the surface of the coating film is easily extravasated. Specific products include L-45, L-9300, FZ-3704, FZ-3703, FZ-3720, FZ-3786, FZ-3501, FZ-3504, FZ-3508, FZ-3705, and FZ-3707. , FZ-3710, FZ-3750, FZ-3760, FZ-3785, FZ-3785 'Y-7499 (made by Nippon Unicar Co., Ltd.), KF96L, KF96, KF96H, KF99, KF54 'KF965, KF968, KF56, KF99 5. KF351, KF351A, KF3 5 2. KF35 3, KF354, KF355, KF615 'KF618, KF945, KF6004, FL100 (manufactured by Shin-Etsu Chemical Co., Ltd.), surfactant BYK series, BYK-300/302, BYK- 3 06, BYK-3 07, BYK-310, BYK-315 'BYK-3 20, BYK-322, BYK-323, BYK-325 > BYK-3 3 0, BYK-331, BYK-3 3 3. BYK-3 3 7, BYK-340, BYK-3 44, BYK-3 70, BYK-3 75, BYK-3 77, B YK- 3 52, BYK-3 54, BYK-3 5 5/3 5 6 , B YK - 3 5 8 N/3 6 1 N, BYK-3 5 7, BYK-390, BYK-3 92, BYK-UV3 5 00, B YK-UV3 5 1 0 > B YK-UV3 5 70 , BYK-Silclean3 700 (manufactured by BYK Japan), XC96-723, YF3800, XF3905, YF3057, YF3807, YF3802, YF3897 (GE Toshiba) Alumoxane Silicon Co., Ltd.). Further, the polyoxyalkylene surfactant is a surfactant in which a methyl-46-200907491 portion of the polyoxyalkylene oil is substituted with a hydrophilic group. The substitution position is a branch of oil, two ends, a single end, two end branches, and the like. Examples of the compound include polyether, polyglycerin, pyrrolidone, betaine, sulfate, and a 4-grade salt. As a surfactant of polycapsule, the hydrophobic group is a nonionic interfacial active nonionic surfactant composed of a compound of a dimethyl ketone and a hydrophilic group, and a surfactant which does not have a dissociation group in an aqueous solution. In general, a hydroxyl group having a hydrophilic group and a polyoxyalkylene oxide having a hydrophilic group are used as a hydrophilic group. Hydrophilicity increases with the increase in alcoholicity and with the polyoxyalkylene chain (polyethylene oxide chain). When the hydrophobic group is a nonionic surfactant composed of dimethylpolysiloxane or a hydrophilic alkyl group, the unevenness of the above layer or the antifouling property of the film surface is enhanced. It is presumed that when the hydrophobic group formed of a polymethyl group is aligned on the surface, a membrane which is difficult to be contaminated can be formed as a specific example of the nonionic surfactant, and examples thereof include an alkane surfactant SILWET L-77 and L-720. L-700 1, L-7604, Y-7006, FZ-2101, FZ-2104, FZ-2105, FZ-2118, FZ-2120, FZ-2122, FZ-2123, FZ-2 2154, FZ-2161 , FZ-2162, FZ-2163, FZ-2164, and FZ-2191 ' SUPERSILWET SS-280 1, SS-28 02, SS-2804, SS-2805 (Japan Unicar Co., Ltd. Polyoxymethane composed of dimethyl polyoxane is a hydrophilic acid salt, and a phosphorus-based polyoxygenating agent is a good ion having a chain (the number of polycyclic hydroxyl groups is elongated and the polyoxygen is low refractive index 矽) The surface of the oxyalkylene is condensed. The condensed oxygen O-L-7002, FZ-21 1 0 130, FZ-FZ-2 1 66 SS-2803 cracked, etc., the hydrophilic group -47- 200907491 is composed of polyoxyalkylene A preferred structure of the nonionic surfactant constituting the linear block copolymerization in which the dimethyl polyoxyalkylene moiety and the polyoxyalkylene chain are alternately and repeatedly bonded. Preferably, it is preferable from the viewpoint of unevenness suppression or leveling property in coating a coating composition for forming a low refractive index layer. As these specific examples, for example, a polyoxyalkylene surfactant ABNS IL WETFZ - 2203, FZ-2207, FZ-220 8, FZ-2222 (manufactured by Nippon Unicar Co., Ltd.), etc. The coating composition forming the low refractive index layer can be easily used after the endurance test under more severe conditions. From the viewpoint of the effects of the object of the invention, it is preferred to include a reactive modified polyoxyalkylene resin (also referred to as a reactive modified polyoxyalkylene oil) described below. 2 - 2 · Reactive modified polyoxyl Alkane oil: amine group, epoxy group, carboxyl group, alcohol group, etc. As the reactive modified polyoxyalkylene resin, it may be exemplified by a branched chain of polyoxyalkylene, an amine group at one end or both ends, A reactive type modified polyoxyalkylene resin substituted with an epoxy group, a carboxyl group, a hydroxyl group, a methacryl group, a thiol group, a phenol or the like. Specific examples of the amine-modified polyoxyalkylene resin are reversed. -860, KF-861, X-22-161A, X-22-161B (above, Shin-Etsu Chemical Industry Co., Ltd. )), FM-33 1 1, FM-3 325 (above, chisso Co., Ltd.), as the epoxy-modified polyoxyalkylene resin, KF-105, X-22-163A, X-22 -163B, KF-101, KF-1001 (above 'Shin-Etsu Chemical Co., Ltd.), as a polyether modified polyoxyalkylene resin', X-22-4272, X-22-4952, as a carboxyl group The modified polyxanthene resin may, for example, be X-22-3701E or X-22-371 (above, -48 - 200907491, manufactured by Shin-Etsu Chemical Co., Ltd.), and as the methanol-modified poly resin, KF may be mentioned. -600 1. KF-6003 (above, Shin-Etsu Chemical Co., Ltd.), X-22-1 64C as a methacrylic acid modified polyoxane (above, Shin-Etsu Chemical Co., Ltd., as a thiol group) The modified polyoxyalkylene resin may, for example, be KF-200 1 , manufactured by Shin-Etsu Chemical Co., Ltd., and the phenol-modified poly resin may be X-22-1821 (above, Shin-Etsu Chemical Co., Ltd.). . Examples of the hydroxy-modified polyoxyalkylene resin include FM-FM-442 1, FM-DA2 1, and FM-DA26 (all manufactured by Chisso Co., Ltd.). Others include 170DX, X-22-2426, and X-22-176F (manufactured by Shin-Etsu Chemical Co., Ltd.) which are single-end reactive polyoxyalkylene resins. The above surfactant may be used in combination with other surfactants, and may be used in combination with an appropriate sulfonate, sulfate, phosphate or the like, and may also have a polyethylene oxide chain hydrophilic group. A nonionic surfactant such as an ether ester type is used. When the amount of the interface active addition is 0.05 to 3.0 in the low refractive index layer coating composition, not only the water repellency, the oil repellency, and the antifouling property of the coating film but also the surface scratch resistance are improved. The coating composition forming the low refractive index layer may contain other two particles. The other cerium oxide particles are not particularly limited, and colloidal cerium oxide or the like is exemplified. Specific Example of Colloidal Cerium Oxide The cerium oxide is dispersed in water or an organic solvent in a colloidal form, and is not particularly spherical, needle-like or bead-like.矽 烷 学 工业 工业 ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( -49- 200907491 The average particle size of colloidal cerium oxide is preferably in the range of 50 to 300 nm, and the coefficient of variation is preferably 1 to 40%. The average particle diameter can be obtained by scanning electron microscopy (SEM) or the like. The electron micrograph can be measured by a particle size distribution meter or the like by a dynamic astigmatism method or a static astigmatism method, etc. Colloidal cerium oxide can be sold to a person, for example, the Snowtex series of Nissan Chemical Industries Co., Ltd., and the catalytic chemical industry company. Cataloid-S series, Rayer's series of Bayer er., etc. Further, primary particles of colloidal ceria or cerium oxide modified by alumina sol or aluminum hydroxide are metal ions of two or more valences. After the combination of the particles, the group of colloidal cerium oxide which is connected to the group of beads is also preferred. The group of colloidal cerium dioxide of the bead group can be cited as the Snowtex AK series of Nissan Chemical Industries Co., Ltd. SnowtexPS system [|, SnowtexUP series, etc., specifically IPS-ST-L (isopropyl alcohol dispersion, particle diameter 40~50nm, solid content 30%), MEK-ST-MS (methyl ethyl ketone dispersion, When the coating composition of the low refractive index layer contains colloidal ceria, the solid content in the low refractive index layer is 10 to 60% by mass, and 30 to 60% by mass. The particle diameter is 17 to 23 nm, and the solid content is 35. The % is preferably from the viewpoint of film strength. Further, it is preferred that the low refractive index layer is formed into a coating composition containing 5 to 80% by mass of the solid content in the low refractive index layer. The particles such as the hollow hollow cerium oxide particles have a function of maintaining the structure of the low refractive index layer containing the voids. The amount of the adhesive can be adjusted not only to fill the voids but also to maintain the strength of the low refractive index layer. Examples of the adhesive include a metal alkoxide compound, and a hydrolyzate thereof, 50 to 200907491 or a polycondensate thereof, and polyethylene glycol, polyepoxyethylene, polymethyl methacrylate, and poly Methacrylate, diethyl cellulose, triacetate cellulose Nitrocellulose, polyester, alkyd resin, fluoroacrylate, fluoropolymer, etc. Examples of the fluoropolymer include fluoroolefins (for example, vinyl fluoride, vinylidene fluoride, tetrafluoroethylene, perfluoro) Partial or fully fluorinated alkyl ester derivatives of (meth)acrylic acid such as octylethylene, hexafluoropropylene, perfluoro-2,2-dimethyl-1,3-dioxole (eg, VISC®) AT 6 F Μ (made by Osaka Organic Chemicals Co., Ltd.) or Μ-2020 (made by Daikin), etc., wholly or partially fluorinated vinyl ethers, etc. Among them, perfluoroolefins are preferred, which are refractive index, solubility, and transparency. From the viewpoints of availability and the like, hexafluoropropylene is particularly preferred, and the organometallic compound described in the above-mentioned high refractive index layer or its hydrolyzate or its polycondensate It is preferable that the low-refractive-index layer contains the compound represented by the following general formula (4) or its chelate compound from the viewpoint of the characteristics of the adhesive of the hollow cerium oxide particles being excellent, and physical properties such as hardness can be improved.

AnMBx-n ... ( 4 ) 式中,Μ表示金屬原子’ A表示可水解之官能基或具有可 水解官能基之烴基,B表示金屬原子Μ經共價鍵或離子鍵 之原子團。X表示金屬原子Μ之原子價’ η表不2以上’ X 以下的整數。 -51 - 200907491 作爲可水解之官能基A,例如可舉出烷氧基、氯原子 等的鹵素、酯基、醯胺基等。 上述式(4)之所屬金屬化合物中,含有具有2個以 上具有直接鍵結於金屬原子的烷氧基的烷氧化物、或其螯 合化合物。作爲較佳金屬化合物,可舉出欽院氧化物、銷 烷氧化物或彼等螯合化合物。 作爲形成配位於游離金屬化合物之螯合化合物之較佳 螯合化劑,可舉出二乙醇胺、三乙醇胺等烷醇胺類、乙二 醇、二乙二醇、丙二醇等二醇類、乙醯基丙酮、乙醯乙酸 乙酯等分子量1萬以下者。藉由使用這些螯合化劑,可形 成對於水分混入等亦安定,且於塗膜之補強效果亦優良之 螯合化合物。上述螯合化合物之添加量,於低折射率層中 調整爲0.3〜5質量%爲佳。未達0.3質量%時使得耐擦傷 性不足’超過5質量。/。時有著使耐光性劣化之傾向。 低折射率層可使用凹版塗佈機、浸漬塗佈機、逆塗佈 機、線圈棒塗佈機、塑模塗佈機、噴射法等公知方法,塗 佈形成低折射率層之上述塗佈組成物,塗佈後經加熱乾燥 ,視必要進行硬化處理後形成。 塗佈量以濕膜厚度爲〇 · 〇 5〜1 0 0 μιη爲恰當,較佳爲 〇·1〜50μιη。又’塗佈組成物之固體成分濃度調整至乾膜 厚爲上述膜壓。 又’形成低折射率層後,亦可含有於溫度5 〇〜1 6 (TC 下進行加熱處理之步驟。加熱處理之期間可藉由所設定之 溫度而做適宜決定即可,例如僅爲50t,較佳爲3天以上 -52- 200907491 且未達3 0天之期間,僅爲1 60 °C下1 〇.分鐘以上1天以下 範圍爲佳。 作爲硬化方法,藉由加熱使其熱硬化之方法、藉由紫 外線等光照射使其硬化之方法等。使其熱硬化時,加熱溫 度以 50〜3 00°C爲佳,較佳爲60〜2 5 0 °C,更佳爲 80〜 150°C。藉由光照射使其硬化時,照射光之曝光量以 10mJ/cm2 〜10J/cm2 爲佳,以 100mJ/cm2 〜500mJ/cm2 爲較 佳。 其中作爲經照射之光波長區,並無特別限定,但以具 有紫外線區域之波長者爲佳。具體可使用低壓水銀燈、中 壓水銀燈、高壓水銀燈、超高壓水銀燈、碳極電弧燈、金 屬鹵素燈、氙氣燈等。照射條件依燈光而不同,但活性線 之照射量,一般爲 5〜500mJ/cm2,較佳爲 5〜150mJ/cm2 ’特佳爲 20 〜100mJ/cm2。 (硬塗佈層:活性線硬化樹脂層) 本發明之防反射薄膜中透明樹脂薄膜與防反射層之間 設有作爲硬塗佈層含有活性線硬化樹脂之層時,可於防反 射薄膜之處理性或防反射薄膜成爲後述偏光板時的步驟中 ,不容易受傷害而較佳。 所謂活性線硬化樹脂層爲,藉由如紫外線或電子線之 活性線(以下亦稱爲活性能量線)照射,經由交聯反應等 而硬化之樹脂爲主成分所成之層。作爲活性線硬化樹脂, 使用含有具有乙烯性不飽和雙鍵之單體的成分爲佳,藉由 -53- 200907491 照射如紫外線或電子線之活性線,使其硬化而形成 硬化樹脂層。作爲活性線硬化樹脂可舉出以紫外線 樹脂或電子線硬化性樹脂等作爲代表者,但藉由紫 射後經硬化之樹脂爲佳。 作爲紫外線硬化性樹脂,例如使用紫外線硬化 丙烯酸酯系樹脂、紫外線硬化型聚酯丙烯酸酯系樹 外線硬化型環氧基丙烯酸酯系樹脂、紫外線硬化型 丙儲酸酯系樹脂、或紫外線硬化型環氧基樹脂等爲 中亦以紫外線硬化型丙烯酸酯系樹脂爲佳。 作爲紫外線硬化型尿烷丙烯酸酯系樹脂,一般 多元醇與異氰酸酯單體、或預聚物進行反應所得之 ’再進一步與具有2-羥基乙基丙烯酸酯、2-羥基乙 丙儲酸酯(以下丙烯酸酯中含有甲基丙烯酸酯者係 燒酸酯表示)、2 -羥基丙基丙烯酸酯等羥基之丙烯 Φ體進行反應後可容易得到。例如可使用特開 1 5 1 1 1 〇號公報所記載者。 例如’使用與優尼迪克17-806 (大日本墨水股 公司製)100份與C0R0NETL (日本聚尿烷股份有 製)1份之混合物等爲佳。 作爲紫外線硬化型聚酯丙烯酸酯系樹脂,一般 將聚酯多元醇與2 -羥基乙基丙烯酸酯、2 -羥基丙烯 單體進行反應而容易形成者,可使用特開昭5 9 -1 5 1 公報所記載者。 作爲紫外線硬化型環氧基丙烯酸酯系樹脂之具 活性線 硬化性 外線照 型尿烷 脂、紫 多元醇 佳,其 爲聚酯 生成物 基甲基 僅以丙 酸酯系 昭 59- 份有限 限公司 可舉出 酸酯系 112號 體例, -54- 200907491 可舉出將環氧基丙烯酸酯作爲寡聚物,於此添加反應性稀 釋劑、光聚合啓始劑,並使其反應後所生成者,可使用如 特開平1 - 1 05 73 8號公報所記載者。 作爲紫外線硬化型多元醇丙烯酸酯系樹脂之具體例, 可舉出三羥甲基丙烷三丙烯酸酯、二三羥甲基丙烷四丙烯 酸酯、季戊四醇三丙烯酸酯、季戊四醇四丙烯酸酯、二季 戊四醇六丙烯酸酯、烷基改性二季戊四醇五丙烯酸酯等。 作爲這些紫外線硬化性樹脂之光聚合啓始劑,具體可 舉出苯並異及其衍生物、乙醯苯、二苯甲酮、經基二苯甲 酮、米希勒酮、α_胺肟酯、噻噸酮等及彼等之衍生物。可 同時使用光增感劑。上述光聚合啓始劑亦可作爲光增感劑 使用。又’環氧基丙烯酸酯系光聚合啓始劑之使用時,可 使用η-丁胺、三乙胺、三_η_丁基膦等增感劑。使用於紫 外線硬化樹脂組成物之光聚合啓始劑或光增感劑對於該組 成物100質量份而言爲0_1〜15質量份,較佳爲1〜10質 量份。 作爲樹脂單體,例如作爲不飽和雙鍵爲其中一單體時 ’可舉出甲基丙烯酸酯、乙基丙烯酸酯、丁基丙烯酸酯、 苯甲基丙烯酸酯、環己基丙烯酸酯、乙酸乙烯酯、苯乙烯 等一般單體。又作爲具有2個以上不飽和雙鍵之單體,可 舉出乙二醇二丙烯酸酯、丙二醇二丙烯酸酯、二乙烯苯、 1,4 -環己烷二丙烯酸酯、;!,4_環己基二甲基二丙烯酸酯、 三羥甲基丙烷三丙烯酸酯、季戊四醇四丙烯酯等。作爲販 賣品可利用 AdekoptomerKR.BY 系列:KR-400、KR-410 -55- 200907491 、KR- 5 5 0、KR-5 66、KR-567、BY-3 20B (旭電化股份有限 公司製);KoeihardA-1 01-KK、A-l (H-WS、C-3 02、C-401 -N > C-501、M-101、M-102、T-102、D-102、NS- 1 01 、FT-102Q8 ' MAG -1 - P2 0、AG-106、M-101-C (廣榮化學 股份有限公司製);SecabeamPHC2210(S) 、PHCX-9( K-3 ) 、PHC2213、DP-10、DP-20、DP-30、P 1 000 > P 1 1 00 、P 1 200、P 1 3 0 0、P 1 400 ' P 1 5 00、P 1 600、SCR90 0 (大日 精化工業股份有限公司製);KRM703 3、KRM703 9、 KRM7130 ' KRM7131、UVECRYL2920 1、UVECRYL2 9202 (塑模胞.UCB股份有限公司製);RC-5015、RC-5016、 RC-5 020、RC-5 03 1、RC-5100、RC-5102、RC-5120、RC-5122、RC-5152、RC-5171、RC-5180、RC-5181 (大日本 墨水化學工業股份有限公司製):歐雷克斯N〇_3 40克力 亞(中國塗料股份有限公司製);山拉多H-601、RC-750 .、RC-700、RC-600、RC-500、RC-611、RC-612 (三洋化 成工業股份有限公司製);SP-1509、SP-1507 (昭和高分 子股份有限公司製);RCC-1 5C ( Grace Japan股份有限公 司製)、亞羅尼克斯 M-6100、M-8030、M-8060 (東亞合 成股份有限公司製)等適宜選擇者。又,作爲具體化合物 例子’可舉出三羥甲基丙烷三丙烯酸酯、二三羥甲基丙烷 四丙烯酸酯、季戊四醇三丙烯酸酯、季戊四醇四丙烯酸酯 、二季戊四醇六丙烯酸酯、二噁烷二醇丙烯酸酯、乙氧基 化丙烯酸酯、烷基改性二季戊四醇五丙烯酸酯等。 又’硬化樹脂層中欲調整耐傷性、潤滑性或或折射率 -56- 200907491 可含有無機化合物或有機化合物之粒子。 作爲無機粒子,可舉出氧化矽、氧化鈦、氧化鋁、氧 化錫 '氧化銦、IT 0、氧化鋅、氧化锆、氧化鎂、碳酸鈣 、碳酸鈣、滑石 '黏土、燒成陶土、燒成矽酸鈣、水和矽 酸鈣、矽酸鋁、矽酸鎂及磷酸鈣。特別使用氧化矽、氧化 鈦、氧化鋁、氧化锆、氧化鎂等爲佳。作爲有機粒子可添 加聚甲基丙烯酸甲基丙烯酸酯樹脂粉末、丙烯基苯乙烯系 樹脂粉末、聚甲基甲基丙烯酸酯樹脂粉末、矽系樹脂粉末 、聚苯乙烯系樹脂粉末、聚碳酸酯樹脂粉末、苯並鳥糞胺 系樹脂粉末、三聚氰胺系樹脂粉末、聚烯烴系樹脂粉末、 聚酯系樹脂粉末、聚醯胺系樹脂粉末、聚醯亞胺系樹脂粉 末、或聚氟化乙烯系樹脂粉末等。較佳粒子可舉出交聯聚 苯乙烯粒子(例如,綜硏化學製SX-130H、SX-200H、SX-350H)、聚甲基甲基丙烯酸酯系粒子(例如,綜硏化學製 MX 1 50、MX300 )。 作爲這些粒子之平均粒徑以0.01〜5μηι爲佳,0.1〜 5·〇μηι爲較佳,0.1〜4·0μηι爲更佳,將此添加於形成硬塗 佈層之塗佈組成物時由組成物穩定性來看爲佳。 又’亦可含有粒徑相異的2種以上微粒子。紫外線硬 化性樹脂與粒子之比率對於樹脂1 〇〇質量份而言,添加至 〇 · 1〜3 0質量份時爲佳。 又,硬塗佈層可使用凹版塗佈機、浸漬塗佈機、逆塗 佈機、線圈棒塗佈機、塑模塗佈機、噴射法等公知方法, 塗佈形成硬塗佈層之塗佈組成物,塗佈後進行加熱乾燥, -57- 200907491 經UV硬化處理後而形成。塗佈量以濕膜厚爲0.1〜40μιη 者爲佳,較佳爲0.5〜30μιη。又,作爲乾膜厚以平均膜厚 爲0.1〜30μιη,較佳爲1〜20μηι。 作爲UV硬化處理之光源,僅可產生紫外線之光源即 可並無限定。例如,可使用低壓水銀燈、中壓水銀燈、高 壓水銀燈、超高壓水銀燈、碳極電弧燈、金屬鹵素燈、氙 氣燈等。照射條件依各燈而相異,但活性線之照射量一般 爲5〜500mJ/cm2’較佳爲5〜150mJ/cm2,特佳爲20〜 1 00mJ/cm2 ° 又’照射活性線時,於薄膜之搬送方向賦予張力下進 行爲佳’更佳爲於寬方向賦予張力下進行。所賦予之張力 以3 0〜3 0 ON/m爲佳。賦予張力之方法並無特別限定,亦 可於背輥上於搬送方向賦予張力,或以拉幅器於寬方向、 或2軸方向上賦予張力。藉此可得到平面性更優良之薄膜 〇 硬塗佈層所形成之塗佈組成物中可含有溶劑。作爲含 於塗佈組成物之有機溶劑,例如可舉出烴類(甲苯、二甲 苯)、醇類(甲醇、乙醇、異丙醇、丁醇、環己醇)、酮 類(丙酮、甲基乙基酮、甲基異丁基酮)、酯類(乙酸甲 醋、乙酸乙酯、乳酸甲基)、二醇醚類,亦可適宜地選自 其他有機溶劑、或這些混合物。 作爲有機溶劑,以丙二醇單烷醚(烷基之碳原子數爲 Ϊ〜4)或丙二醇單烷醚乙酸酯(烷基之碳原子數爲1〜4) 等爲佳。又’作爲有機溶劑之含有量爲塗佈組成物中5〜 -58- 200907491 80質量%者爲佳。 硬塗佈層爲JIS B 060 1所規定之中心線平均粗度(Ra )爲0.001〜0·1μηι之透明硬塗佈層、或添加粒子等之Ra 調整爲0 . 1〜1 μ m之防眩性硬塗佈層爲佳。中心線平均粗 度(Ra )係以光干涉式之表面粗度測定器進行測定爲佳, 例如可使用WYKO公司製非接觸表面微細形狀計測裝置「 WYKO NT-2000」進行測定。 且’硬塗佈層中可含有低折射率層所記載之上述聚矽 氧烷系界面活性劑或聚氧醚化合物爲佳。欲提高這些塗佈 性’對於塗佈液中之固體成分成分而言,添加0 · 0 1〜3質 量%範圍之這些成分爲佳。 作爲聚氧醚化合物,例如可舉出聚環氧乙烷烷醚、聚 環氧乙烷月桂基醚、聚環氧乙烷十六烷基醚、聚環氧乙烷 硬脂醯醚等聚環氧乙烷烷醚化合物、聚環氧乙烷壬基苯醚 、聚環氧乙烷辛基苯醚等聚氧烷基苯醚化合物、聚氧伸烷 基烷醚、聚環氧乙烷高級醇類醚、聚環氧乙烷辛基月桂基 醚等。作爲聚環氧乙烷烷醚之販賣品,可舉出EMULGEN 1108、EMULGEN 1118S-70(以上,花王公司製),作爲 聚環氧乙烷月桂基醚之販賣品,可舉出EMULGEN 103、 EMULGEN HUP 、EMULGEN 105 、 EMULGEN 106 ' EMULGEN 108 、 EMULGEN 1 09P 、 EMULGEN 120 ' EMULGEN 1 23 P 、EMULGEN 147 、 EMULGEN 150 、 EMULGEN 1 3 0K (以上,花王公司製),作爲聚環氧乙烷 十六烷基醚之販賣品,可舉出 EMULGEN 210P、 -59- 200907491 EMULGEN 220 (以上,花王公司製),作爲聚環氧乙烷硬 脂醯醚之販賣品,可舉出 EMULGEN 220、EMULGEN 3 06P (以上,花王公司製),作爲聚氧伸烷基烷醚之販賣 品’可舉出 EMULGEN LS-106、EMULGEN LS-110、 EMULGEN LS-114、EMULGEN MS-110 (以上,花王公司 製),作爲聚環氧乙烷高級醇類醚之販賣品,可舉出 EMULGEN 705,EMULGEN 707、EMULGEN 709 等。 這些非離子性的聚氧醚化合物之中較佳者爲聚環氧乙 烷油基醚化合物,下述一般式(5 )所示之化合物。 C18H35-〇 ( C2H40 ) nH ... ( 5 ) 式中,η表示2〜40。 對於油基部分之環氧乙烷的平均加成個數(η)爲2〜 40,較佳爲2〜10。又,一般式(5)之化合物係由環氧乙 烷與油醇進行反應而得。 作爲具體的商品,可舉出EMULGEN 404〔聚環氧乙 烷(4 )油基醚〕、EMULGEN 408〔聚環氧乙烷(8)油基 醚〕、EMULGEN 409P〔聚環氧乙烷(9)油基醚〕、 EMULGEN 420〔聚環氧乙烷(13)油基醚〕、EMULGEN 430〔聚環氧乙烷(30)油基醚〕(以上,花王公司製) 、日本油脂製NOFABLEEAO-9905 (聚環氧乙烷(5)油基 醚)等。 且()表示η之數字。非離子性的聚氧醚化合物可單 -60- 200907491 獨或2種以上倂用。 聚矽氧烷界面活性劑與聚氧醚化合物之硬塗佈 有質量比爲 1·0: 1.0〜0.10: 1.0,更佳爲 0.70 0.20 : 1.0,以前述質量比下含有時可得到本發明之 較佳。 硬塗佈層中之非離子性的聚氧醚化合物與聚砂 面活性劑之較佳含有量爲兩者總含有量下0.1質量 質量%爲佳,更佳爲、0.2質量%〜4 · 0質量%,以 下添加時可使硬塗佈層於安定下存在。 又,亦可並用上述氟界面活性劑、丙烯酸系共 乙炔二醇系化合物或非離子性界面活性劑、自由基 之非離子性界面活性劑等。 作爲非離子性界面活性劑,可舉出聚環氧乙院 酸酯、聚環氧乙烷單硬脂酸酯、聚環氧乙烷單油脂 聚氧烷酯化合物、山梨醇酐單月桂酸酯、山梨醇酐 酸酯、山梨醇酐單油脂酸酯等山梨醇酐酯化合物等 作爲乙炔二醇系化合物,可舉出 Surfynol Surfynol 104PA、Surfynol 420、Surfynol 440、Di (以上,日信化學工業股份有限公司製)等。 作爲自由基聚合性之非離子性界面活性劑,例 出「RMA-564」、「RMA-56 8」、「RMA-1114」〔 商品名、日本乳化劑股份有限公司製〕等聚氧伸院 苯醚(甲基)丙烯酸酯系聚合性界面活性劑等。 又,硬塗佈層可具有2層以上之重層結構。其 :層中含 :1 · 0 〜 .效果故 氧烷界 % 〜8.0 該範圍 聚物、 聚合性 單月桂 酸酯等 單硬脂 〇 1 04E、 η ο 1 6 0 4 丨如可舉 以上, :基烷基 中1層 -61 - 200907491 ’例如爲含有導電性粒子、共軛系導電性聚合物、或離子 性聚合物之所謂防靜電層,又作爲對於種種之顯示元件的 色補正用過濾器’可含有具有色調調整功能之色調調整劑 (染料或顏料等)’又亦可使其含有電磁波遮斷劑或紅外 線吸收劑等而具有種種功能。 (背塗佈層) 本發明的防反射薄膜中,於設有硬塗佈層的則與反面 上設有背塗佈層時亦佳。背塗佈層爲,欲橋正設有防反射 層所產生的捲曲而設置者。即,將設有背塗佈層之面成爲 内側並使其具有彎曲之性質下可平衡彎曲情況。且,背塗 佈層較佳爲塗佈設置成可兼具結塊防止層,此時,背塗佈 層塗佈組成物中可添加具有結塊防止功能之無機化合物或 有機化合物之粒子爲佳。 作爲添加於背塗佈層之粒子的無機化合物例子,可舉 出二氧化矽、二氧化鈦、氧化鋁、氧化锆、碳酸鈣、碳酸 鈣、滑石、黏土、燒成陶土、燒成矽酸鈣、氧化錫、氧化 銦、氧化鋅、ITO、水和矽酸鈣、矽酸鋁、矽酸鎂及磷酸 鈣。 這些粒子,例如可使用 AerosilR972 ' R972V、R974 、R812、 200、 200V、 300、 R202、 0X50、 TT600(以上 日本Aerosil (股)製)、斯風斯達ΚΕ-Ρ10、同ΚΕ-Ρ30、 同 KE-P50、同 KE-P100、同 KE-P150、同 KE-P2 5 0 (以上 ,日本觸媒股份公司製)的商品名。 -62- 200907491 作爲有機化合物之例子,可舉出聚矽氧烷樹脂、氟樹 脂及丙烯基樹脂。以聚矽氧烷樹脂爲佳,特別爲具有三次 兀的網狀結構者爲佳,例如可舉出Tospearl 103、同 105、同108、同120、同145、同3120及同240(以上東 芝聚矽氧烷(股)製)之商品名。 其中以 Aerosil200V、AerosilR9 72V、斯風斯達 KE-P30、同KE-P50、及同KE-P100可保持較低霧値,而具有 結塊防止效果,故爲特佳。本發明所使用的防反射薄膜爲 ,活性能量線硬化樹脂層之裏面側的動摩擦係數爲〇. 9以 下,特別以〇 . 1〜0 · 9者爲佳。 含於背塗佈層之粒子,對於膠黏劑而言以0.1〜5 〇質 量%爲佳,ο · 1〜1 〇質量%爲較佳。設有背塗佈層時的霧値 之增加以1 %以下爲佳,0.5 %以下爲較佳’ 0.0〜0 · 1 %爲特 佳。 作爲背塗佈層之塗佈所使用的溶劑’例如可舉出二嚼 烷、丙酮、甲基乙基酮、甲基異丁基酮、N,N-二甲基甲醯 胺、乙酸甲酯 '乙酸乙酯、三氯伸乙基、二氯甲院、伸乙 基氯化物、四氯乙烷、三氯乙烷、氯仿、水、甲醇、乙醇 、η -丙醇、i -丙醇、n-丁醇、環己酮、環己醇、丙一 _單 甲醚、丙二醇單乙醚、或烴類(甲苯、二甲苯)等’可適 宜組合使用。 作爲背塗佈層之膠黏劑所用之樹脂’例如可舉出氯化 乙烯-乙酸乙烯酯共聚物、氯化乙烯樹脂、乙酸乙稀醋樹 脂、乙酸乙烯酯與乙烯醇類之共聚物、經部分水解之氯化 -63- 200907491 乙烯-乙酸乙烯酯共聚物、氯化乙烯-氯化亞乙烯共聚物、 氯化乙烯-丙烯醯基共聚物、乙烯乙烯醇類共聚物、氯化 聚氯化乙烯、乙烯-氯化乙烯共聚物、乙烯-乙酸乙烯酯共 聚物等乙烯系聚合體或共聚物、硝基纖維素、纖維素乙酸 酯丙酸酯(較佳爲乙醯基取代度丨.8〜2.3、丙醯基取代度 0.1〜1 ·0 )、二乙醯基纖維素、纖維素乙酸酯丁酸酯樹脂 等纖維素衍生物、馬來酸及/或丙烯酸之共聚物、丙烯酸 酯共聚物、丙烯醯基-苯乙烯共聚物、氯化聚乙烯、丙燃 醯基-氯化聚乙烯苯乙烯共聚物、甲基甲基丙烯酸酯-丁二 烯苯乙烯共聚物、丙烯酸樹脂、聚乙烯醇樹脂、聚乙稀,縮 醛樹脂、聚乙烯丁縮醛樹脂、尿烷樹脂、聚酯聚尿烷樹脂 、聚醚聚尿烷樹脂、聚碳酸酯聚尿烷樹脂、聚酯樹脂、_ 醚樹脂、聚醯胺樹脂、胺基樹脂、苯乙烯丁二烯樹脂、τ 二烯丙烯醯基樹脂等橡膠系樹脂、聚矽氧烷系樹脂、氣系 樹脂等,但未限定於此。 例如作爲丙烯酸樹脂,可舉出 ACRYPETMD、Vjj、 MF、V (三菱Rayon股份有限公司製)、亥巴錄M-4〇〇3 、 M-4005 ' M- 4006 ' M-4202 、 M-5000 、 M- 5 00 1 、M-45〇1 ( 根上工業 股份有限公司製) 、台亞那 路 BR-50、BR_52 ' BR-53 ' BR- 60、BR-64、BR -73、BR- -75 、BR _77 ' BR- 79 、BR-80 、BR-82、BR-83、 BR-85、 BR -87、 B R-8 8、 BR-90 ' BR -93 、BR-95、BR- 1 00、BR-1 丨 01 ' BR- 102、Br_ 105、BR- 1 ( 36、 BR-107、BR-10 8、BR-1 12、 BR- 113、 115、BR-116、BR-117、BR-118 等(三菱 Rayon 股份有限 200907491 公司製)之丙烯基及甲基丙烯酸系單體作爲原料所製造之 各種均聚物以及共聚物等販賣品,可適宜地選自其中較佳 者。 例如,作爲膠黏劑所使用的樹脂,以使用纖維素二乙 酸酯、纖維素乙酸酯丙烯酸酯等纖維素酯與丙烯酸樹脂之 膠漿爲佳,使用由丙烯酸樹脂所成之粒子,使其成爲粒子 與膠黏劑之折射率差爲未達〇〜0.02之透明性高的背塗佈 層。 將這些塗佈組成物使用凹版塗佈機、浸漬塗佈機、逆 塗佈機、線圈棒塗佈機、塑模塗佈機、或噴霧塗佈、噴射 塗佈等,於透明樹脂薄膜的表面上塗佈至濕膜厚1〜 ΙΟΟμιη爲佳,特佳爲5〜30μιη。 又,塗佈後進行加熱乾燥,視必要藉由硬化處理,可 形成背塗佈層。硬化處理可使用低折射率層所記載之内容 〇 背塗佈層可分爲2次以上進行塗佈。背塗佈層因可改 善與偏光子之黏著性而亦可兼具易黏著層。 如上述各層藉由塗佈而形成時,透明樹脂薄膜可於寬 度1,4〜4m下捲取成輥狀之狀態而重複進行,進行上述塗 佈’並進行乾燥.硬化處理後,捲取成輥狀爲佳。又,層 合防反射層後,捲成輥狀之狀態下進行50〜1 6(TC之加熱 處理的製造方法而製造,由將防反射薄膜進行長尺塗佈時 的效率性或穩定性來看較佳。加熱處理期間可藉由所設定 之溫度做適宜決定’例如於5 0 °C下,較佳爲進行3天以上 -65- 200907491 未達3 0天之期間,1 6 0 °C下1 0分鐘以上,1天以下之範圍 爲佳。一般欲使捲外部、捲中央部、捲芯部的加熱處理效 果不會偏差’設定於較低溫度爲佳,於5 0〜6 0 °C附近進行 7天程度者爲佳。 欲使加熱處理於安定下進行,必須於溫濕度可調整之 場所進行’於無灰塵之無塵等加熱處理室下進行爲佳。 將防反射薄膜捲取成輥狀時,作爲捲核心,僅爲圓筒 上之的核心即可,可爲任種材質,但較佳爲中空塑質核心 ,作爲塑質材料以可耐住加熱處理溫度之耐熱性塑質即可 ’可舉出酚樹脂、二甲苯樹脂、三聚氰胺樹脂、聚酯樹脂 、環氧基樹脂等樹脂。又,藉由玻璃纖維等塡充材之經強 化熱硬化性樹脂爲佳。對於這些捲核心之捲數,以1 00捲 以上爲佳’ 500捲以上爲更佳,捲厚以5cm以上爲佳 (防反射薄膜之反射率) 本發明的防反射薄膜之反射率可藉由分光光度計進行 測定。此時,試品測定側之裏面經粗面化處理後,使用黑 色噴霧進行光吸收處理後,測定可見光區( 400〜700nm) 之反射光。反射率越低越佳,可見光區之波長中的平均値 以2.5%以下爲佳,最低反射率以1.5%以下較佳。且,反 射率若爲2.5 %以下時可作爲本發明之防反射薄膜。 可見光的波長區中,具有平坦形狀之反射光譜爲佳。 又,施予抗反射處理之顯示裝置表面的反射色相,因 防反射膜之设計上可見光區中的短波長區或長波長區之反 -66- 200907491 射率較高,故多半染成紅或藍色,但反射光之色調依用途 而有不同要求,使用於薄型電視等最表面時,被要求爲自 然色調。 此場合,一般較佳反射色相範圍爲XYZ表色系( CIE1931 表色系)上, 〇·17$χ$〇·33、0_10$y$0.33。 高折射率層與低折射率層之膜厚爲考慮到各層之折射 率所造成的反射率、反射光之色調,可依據常法進行計算 求得。 於塗佈各層前進行表面處理爲佳。作爲表面處理方法 ,可舉出洗淨法、鹼處理法、面電漿處理法、高頻率放電 電漿法、電子束法、離子束法、濺射法、酸處理、電暈處 理法、大氣壓發光放電電漿法等。 所謂電暈處理爲,大氣壓下,電極間外加1 kV以上高 電壓’使其放電下進行之處理,可使用春日電機股份有限 公司或股份有限公司Toy 〇電機等販賣的裝置進行。電暈 放電處理之強度爲,取決於電極間距離、每單位面積之輸 出、發生器之頻率數。 電暈處理裝置的一方電極(A電極)可使用販賣品, 但材質可選自鋁、不鏽鋼等。另一方爲要包住塑質薄膜的 電極(B電極),且欲使電暈處理可安定且均勻下實施的 對於A電極之一定距離上所設置之輥電極。此亦可使用一 般購得者,材質爲鋁、不鏽鋼、及彼等金屬所製作之輥上 可使陶瓷、聚矽氧烷、EPT橡膠、海普龍橡膠等作爲裏襯 (lining)之輕爲佳。 -67- 200907491 使用於本發明的電暈處理之頻率數爲20kHz以上 100kHz以下之頻率數’以30〜60kHz之頻率數爲佳。頻 率數降低時,電暈處理之均一性會劣化,而產生電暈處理 不均。又,頻率數過大時’進行高輸出之電暈處理時,雖 無特別問題,但實施低輸出之電暈處理時,難以進行安定 之處理,結果會產生處理不均。 電暈處理的輸出爲 1〜5W.min./m2,以 2〜 4W · min./m2之輸出爲佳。電極與薄膜之距離爲5mm以上 5 0mm以下,但較佳爲l〇mm以上35mm以下。間隙過開 時’欲維持一定輸出而必須要高電壓,容易產生不均。又 ,間隙過於狹隘時,外加電壓會過低,而容易產生不均。 且,搬運薄膜進行連續處理時,電極上會接觸到薄膜而產 生擦傷。 作爲鹼處理方法,將硬塗佈層經塗佈設置的薄膜浸漬 於鹼水溶液之方法即可,並無特別限定。 作爲鹼水溶液,可使用氫氧化鈉水溶液、氫氧化鉀水 溶液、氨水溶液等,其中以氫氧化鈉水溶液爲佳。 鹼水溶液之鹼濃度,例如氫氧化鈉濃度以〇· 1〜25質 量%爲佳,0.5〜15質量%爲較佳。鹼處理溫度一般爲1〇〜 80°C,較佳爲20〜60°C。 鹼處理時間爲5秒〜5分鐘,較佳爲3 0秒〜3分鐘。 鹼處理後之薄膜以酸性水中和後’以水充分洗淨爲佳。 (透明樹脂薄膜) -68- 200907491 對於本發明所使用的透明樹脂薄膜所成之透明薄膜基 材做說明。 作爲透明薄膜基材,可舉出製造容易、與活性線硬化 型樹脂層之黏著性良好、其爲光學各向同性、光學透明等 較佳要件。 其中所謂透明爲,可見光透過率6 0%以上者,較佳爲 8 0 %以上,特佳爲9 0 %以上。 僅具有上述性質者即可’並無特別限定,例如可舉出 纖維素二乙酸酯薄膜、纖維素三乙酸酯薄膜、纖維素乙酸 酯丙酸酯薄膜、纖維素乙酸酯丁酸酯薄膜等纖維素酯系薄 膜、聚酯系薄膜、聚碳酸酯系薄膜、聚丙烯酸酯系薄膜、 聚颯(亦含聚醚颯)系薄膜、聚乙烯對苯二甲酸酯、聚乙 烯萘酸酯等聚酯薄膜、聚乙烯薄膜、聚丙烯薄膜、玻璃紙 、聚氯化亞乙烯薄膜、聚乙烯醇薄膜、伸乙基乙烯醇類薄 膜、間規(syndiotactic )聚苯乙烯系薄膜、環烯烴聚合 物薄膜(亞頓(JSR公司製)、ZE0NEX、ΖΕ0Ν0Α (以上 ’曰本ΖΕΟΝ公司製))、聚乙烯縮醛、聚甲基戊烯薄膜 、聚醚酮薄膜、聚醚酮亞胺薄膜、聚醯胺薄膜、氟樹脂薄 膜、尼龍薄膜、聚甲基甲基丙烯酸酯薄膜、丙烯基薄膜或 玻璃板等。 其中’以纖維素酯系薄膜、聚碳酸酯系薄膜、聚颯( 含聚醚楓)系薄膜、環烯烴聚合物薄膜爲佳,本發明中, 特別以纖維素酯系薄膜(例如,Konicaminolta tak、製品 名 KC8UX2MW、KC4UX、KC5UX、KC4UY、KC8UY、 -69- 200907491 KC12UR、KC4UEW、KC8UCR-3、KC8UCR-4、KC8UCR-5 、KC4FR-1、KC4FR-2 ( Konicaminolta opt 股份有限公司 製)由製造上、成本面、透明性、黏著性等觀點來看爲佳 〇 這些薄膜可爲熔融流延製膜所製造之薄膜、或由溶液 流延製膜所製造之薄膜。 作爲透明薄膜基材,使用纖維素酯系薄膜(以下亦稱 爲纖維素酯薄膜)爲佳。作爲纖維素酯,以纖維素乙酸酯 、纖維素乙酸酯丁酸酯、纖維素乙酸酯丙酸酯爲佳,其中 亦以纖維素乙酸酯丁酸酯、纖維素乙酸酯酞酸酯、纖維素 乙酸酯丙酸酯爲較佳。 特別爲,乙醯基的取代度以X表示’丙醯基或丁醯基 的取代度以Y表示時’使用X與γ爲下述範圍之纖維素 酯薄膜爲較佳。 2.3 SX+ YS3.0 0_1 ‘ YS2.0 特別以 2.5SX+YS2.9 3SYS1.2 時爲佳。 以下,對於較佳透明樹脂薄膜之纖維素酯薄膜做詳細 說明。 纖維素酯薄膜爲,欲得到熱處理所引起的基材變形較 少,平面性優良的防反射薄膜,藉由陽電子消滅壽命法( Positron annihilation lifetime)所求得之自由體積半徑以 0.250〜〇.310nm爲佳。且,全自由體積參數爲I0〜2_〇之 -70- 200907491 纖維素酯薄膜者爲較佳。 且,所謂上述自由體積表示未佔據透明樹脂薄膜之分 子鏈的空隙部分。此可使用陽電子消滅壽命法進行測定。 具體爲測定將陽電子射入於試料後至消滅的時間’由該消 滅壽命可非破壞性下觀察到原子空孔或自由體積之尺寸、 數濃度等相關情報。 (藉由陽電子消滅壽命法之自由體積半徑與全自由體積參 數之測定) 於下述測定條件下測定陽電子消滅壽命與相對強度。 (測定條件) 陽電子線源:22NaCl (強度1.85MBq) γ線檢測器:塑質製閃爍器+光電子增倍管 裝置時間分解能:290ps 測定溫度:2 3 °C 總計數:100萬計 試料尺寸:20mmxl5mm 將切成20mmxl5mm之試料切片作成20片重豐’其 約2mm厚度。試料於測定前進行24小時真空乾燥。 照射面積:約ΙΟηιηιφ 每1通道之時間·_ 23.3ps/ch 依據上述測定條件’實施陽電子消滅壽命測定’藉由 非線形最小二乘法進行3成分解析,由消滅壽命較小者作 -71 - 200907491 爲τι、τ2、τ3 ’對應此將強度者作爲川,:[2,l3 (川+ ι2 + ι3 = 10 0%)。 由最長壽命之平均消滅壽命τ3,求得使用下述式之自 由體積半徑R3 ( nm )。對應τ3於空孔之陽電子消滅,可 推測τ3越大空孔尺寸越大。 — (1/2) 〔1-{R3/(R>3 + 0-166) } + ( 1 /2 π ) sin { ( R3 + 0.166) } 〕-1 其中,0.166 (nm)相當於自空孔壁所浸出之電子層厚度 〇 且,全自由體積參數Vp藉由下述式求得。 V3- { ( 4/3 ) π ( R3 ) 3 } ( nm3 )AnMBx-n (wherein Μ represents a metal atom 'A' represents a hydrolyzable functional group or a hydrocarbyl group having a hydrolyzable functional group, and B represents a metal atom via a covalent bond or an ionic bond. X represents an atomic valence of the metal atom ’ η represents an integer of 2 or more and less than X. -51 - 200907491 Examples of the hydrolyzable functional group A include a halogen such as an alkoxy group or a chlorine atom, an ester group, and a guanamine group. The metal compound of the above formula (4) contains an alkoxide having two or more alkoxy groups directly bonded to a metal atom, or a chelate compound thereof. The preferred metal compound may be a cerium oxide, a pin oxide or a chelating compound. Preferred examples of the chelating agent for forming a chelating compound to be a free metal compound include alkanolamines such as diethanolamine and triethanolamine, glycols such as ethylene glycol, diethylene glycol and propylene glycol, and acetamidine. A molecular weight of 10,000 or less such as acetone or ethyl acetate. By using these chelating agents, it is possible to form a chelate compound which is also stable in the incorporation of moisture and the like, and which is excellent in the reinforcing effect of the coating film. The amount of the above chelate compound to be added is preferably adjusted to 0.3 to 5% by mass in the low refractive index layer. When the amount is less than 0.3% by mass, the scratch resistance is insufficient to exceed 5 mass. /. There is a tendency to deteriorate light resistance. The low refractive index layer can be applied by coating a low refractive index layer by a known method such as a gravure coater, a dip coater, a reverse coater, a coil bar coater, a die coater, or a spray method. The composition is dried by heating after application, and is formed after hardening treatment as necessary. The coating amount is suitably 湿 〜 5 〜 1 0 0 μηη, preferably 〇·1 to 50 μιη. Further, the solid content concentration of the coating composition was adjusted to a dry film thickness of the above film pressure. Further, after forming the low refractive index layer, it may be further subjected to a heat treatment step at a temperature of 5 〇 to 16 (TC). The heat treatment period may be appropriately determined by the set temperature, for example, only 50t. Preferably, it is more than 3 days -52-200907491 and it is less than 30 days at 1 60 °C, preferably less than 1 minute and less than 1 day. As a hardening method, it is thermally hardened by heating. The method is a method of hardening by light irradiation such as ultraviolet rays, etc. When it is thermally cured, the heating temperature is preferably 50 to 300 ° C, preferably 60 to 250 ° C, more preferably 80 to 80 °. 150 ° C. When it is hardened by light irradiation, the exposure amount of the irradiation light is preferably 10 mJ/cm 2 to 10 J/cm 2 , and preferably 100 mJ/cm 2 to 500 mJ/cm 2 , wherein as the wavelength region of the irradiated light, It is not particularly limited, but it is preferably a wavelength having an ultraviolet region. Specifically, a low-pressure mercury lamp, a medium-pressure mercury lamp, a high-pressure mercury lamp, an ultra-high pressure mercury lamp, a carbon arc lamp, a metal halide lamp, a xenon lamp, etc. can be used. Different, but the exposure of the active line is generally 5 500 mJ/cm 2 , preferably 5 to 150 mJ/cm 2 'exceptably 20 to 100 mJ/cm 2 . (Hard coating layer: active wire hardening resin layer) Between the transparent resin film and the antireflection layer in the antireflection film of the present invention When the layer containing the active-ray-curable resin as the hard coat layer is provided, it is preferable that the anti-reflection film is not easily damaged during the step of forming the polarizing plate described later. The layer is a layer composed of a resin which is cured by a crosslinking reaction or the like by irradiation with an active line such as ultraviolet rays or electron beams (hereinafter also referred to as an active energy ray), and is used as a layer of the active ray-curable resin. The monomer of the ethylenically unsaturated double bond is preferably a component, and is irradiated with an active line such as ultraviolet rays or electron beams by -53 to 200907491 to form a hardened resin layer. The active wire hardening resin may be an ultraviolet resin. Or an electron ray-curable resin or the like is preferable, but it is preferably a resin which is hardened by a fluorescing, and as an ultraviolet curable resin, for example, an ultraviolet ray-curable acrylate resin is used. Ultraviolet-curing polyester acrylate-based external hardening epoxy acrylate resin, ultraviolet curable acrylate acid-based resin, or ultraviolet-curable epoxy resin, etc. It is preferred that the ultraviolet curable urethane acrylate resin is obtained by reacting a polyol with an isocyanate monomer or a prepolymer. Further, it has a 2-hydroxyethyl acrylate and a 2-hydroxyethyl acrylate acid. An ester (hereinafter referred to as a methacrylate ester-containing acrylate in an acrylate) or a hydroxy propylene Φ such as a 2-hydroxypropyl acrylate can be easily obtained by a reaction. For example, those described in the Japanese Patent Publication No. 1 5 1 1 1 can be used. For example, it is preferable to use a mixture with 100 parts of Unidick 17-806 (manufactured by Dainippon Ink Co., Ltd.) and 1 part of C0R0NETL (manufactured by Nippon Polyurethane Co., Ltd.). As an ultraviolet curable polyester acrylate-based resin, a polyester polyol is generally reacted with a 2-hydroxyethyl acrylate or a 2-hydroxy propylene monomer to form an easily formed one, and it is possible to use a special opening 59 9 -1 5 1 The person stated in the communique. As an ultraviolet curable epoxy acrylate-based resin, it is preferably an active-curable external-line type urethane ester or a purple polyhydric alcohol, and the polyester-forming group methyl group is limited to a propionate-based group of only 59 parts. The company may be exemplified by the ester type No. 112, and -54-200907491 may be an epoxy acrylate as an oligomer, and a reactive diluent, a photopolymerization initiator may be added thereto, and the reaction may be carried out after the reaction. For example, those described in Japanese Laid-Open Patent Publication No. Hei No. Hei. Specific examples of the ultraviolet curable polyol acrylate resin include trimethylolpropane triacrylate, ditrimethylolpropane tetraacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, and dipentaerythritol hexaacrylate. Ester, alkyl modified dipentaerythritol pentaacrylate, and the like. Specific examples of the photopolymerization initiator of these ultraviolet curable resins include benzo and its derivatives, acetophenone, benzophenone, benzophenone, michelone, and α-amine oxime. Esters, thioxanthone, etc. and their derivatives. A photosensitizer can be used at the same time. The above photopolymerization initiator can also be used as a photosensitizer. Further, when the epoxy group-based photopolymerization initiator is used, a sensitizer such as η-butylamine, triethylamine or tri-n-butylphosphine can be used. The photopolymerization initiator or the photosensitizer used in the ultraviolet curable resin composition is 0 to 15 parts by mass, preferably 1 to 10 parts by mass, per 100 parts by mass of the composition. As the resin monomer, for example, when the unsaturated double bond is one of the monomers, methacrylate, ethyl acrylate, butyl acrylate, phenyl methacrylate, cyclohexyl acrylate, vinyl acetate may be mentioned. , general monomers such as styrene. Further, examples of the monomer having two or more unsaturated double bonds include ethylene glycol diacrylate, propylene glycol diacrylate, divinylbenzene, 1,4-cyclohexane diacrylate, and the like. Hexyl dimethyl diacrylate, trimethylolpropane triacrylate, pentaerythritol tetra acrylate, and the like. As a sales item, AdekoptomerKR.BY series can be used: KR-400, KR-410 -55-200907491, KR- 5 50, KR-5 66, KR-567, BY-3 20B (made by Asahi Kasei Co., Ltd.); KoeihardA-1 01-KK, Al (H-WS, C-3 02, C-401 -N > C-501, M-101, M-102, T-102, D-102, NS-1 01, FT-102Q8 'MAG -1 - P2 0, AG-106, M-101-C (manufactured by Kwong Wing Chemical Co., Ltd.); SecabeamPHC2210(S), PHCX-9(K-3), PHC2213, DP-10, DP-20, DP-30, P 1 000 > P 1 1 00 , P 1 200, P 1 3 0 0, P 1 400 'P 1 5 00, P 1 600, SCR90 0 (Dayi Jinghua Industry Co., Ltd. Company system); KRM703 3, KRM703 9, KRM7130 'KRM7131, UVECRYL2920 1, UVECRYL2 9202 (manufactured by UCB Co., Ltd.); RC-5015, RC-5016, RC-5 020, RC-5 03 1. RC-5100, RC-5102, RC-5120, RC-5122, RC-5152, RC-5171, RC-5180, RC-5181 (made by Dainippon Ink Chemical Industry Co., Ltd.): Orex N〇_ 3 40 gram (made by China National Coatings Co., Ltd.); Shan Lado H-601, RC-750 ., RC-700, RC-600, RC-500, RC-611, RC-612 ( Yanghuacheng Industrial Co., Ltd.); SP-1509, SP-1507 (made by Showa Polymer Co., Ltd.); RCC-1 5C (made by Grace Japan Co., Ltd.), Alonix M-6100, M-8030 M-8060 (made by Toagosei Co., Ltd.), etc. Further, examples of specific compounds include trimethylolpropane triacrylate, ditrimethylolpropane tetraacrylate, and pentaerythritol triacrylate. , pentaerythritol tetraacrylate, dipentaerythritol hexaacrylate, dioxane diol acrylate, ethoxylated acrylate, alkyl modified dipentaerythritol pentaacrylate, etc. Also in the 'hardened resin layer to adjust the damage resistance, lubrication Or the refractive index -56-200907491 may contain particles of an inorganic compound or an organic compound. Examples of the inorganic particles include cerium oxide, titanium oxide, aluminum oxide, tin oxide 'indium oxide, IT 0, zinc oxide, zirconium oxide, and the like. Magnesium oxide, calcium carbonate, calcium carbonate, talc 'clay, calcined clay, calcined calcium citrate, water and calcium citrate, aluminum citrate, magnesium citrate and calcium phosphate. In particular, cerium oxide, titanium oxide, aluminum oxide, zirconium oxide, magnesium oxide or the like is preferably used. Polymethacrylic acid methacrylate resin powder, acryl styrene resin powder, polymethyl methacrylate resin powder, oxime resin powder, polystyrene resin powder, polycarbonate resin may be added as the organic particles. Powder, benzoguanamine resin powder, melamine resin powder, polyolefin resin powder, polyester resin powder, polyamine resin powder, polyimide resin powder, or polyvinyl fluoride resin Powder, etc. Preferred examples of the particles include crosslinked polystyrene particles (for example, SX-130H, SX-200H, and SX-350H manufactured by K.K.) and polymethylmethacrylate particles (for example, MX 1 manufactured by Kokusai Chemical Co., Ltd.) 50, MX300). The average particle diameter of these particles is preferably 0.01 to 5 μηι, 0.1 to 5·〇ηηι is preferable, and 0.1 to 4·0 μηι is more preferable, and this is added to the composition of the coating composition for forming the hard coating layer. The stability of the material is better. Further, it is also possible to contain two or more kinds of fine particles having different particle diameters. The ratio of the ultraviolet curable resin to the particles is preferably from 1 to 30 parts by mass based on 1 part by mass of the resin. Further, the hard coat layer can be applied by a known method such as a gravure coater, a dip coater, a reverse coater, a coil bar coater, a die coater, or a spray method to form a hard coat layer. The cloth composition was heated and dried after coating, and -57-200907491 was formed by UV hardening treatment. The coating amount is preferably from 0.1 to 40 μm, and preferably from 0.5 to 30 μm. Further, the dry film thickness has an average film thickness of 0.1 to 30 μm, preferably 1 to 20 μm. As a light source for the UV curing treatment, a light source that can generate only ultraviolet rays is not limited. For example, a low pressure mercury lamp, a medium pressure mercury lamp, a high pressure mercury lamp, an ultra high pressure mercury lamp, a carbon arc lamp, a metal halide lamp, a xenon lamp, or the like can be used. The irradiation conditions differ depending on the respective lamps, but the irradiation amount of the active rays is generally 5 to 500 mJ/cm 2 ', preferably 5 to 150 mJ/cm 2 , particularly preferably 20 to 100 mJ/cm 2 °, and when the active line is irradiated, It is preferable to carry out the tension in the direction in which the film is conveyed, and it is preferable to carry out the tension in the width direction. The tension imparted is preferably 3 0 to 3 0 ON/m. The method of imparting the tension is not particularly limited, and the tension may be applied to the transporting direction on the back roller or the tension may be applied in the width direction or the two-axis direction by the tenter. Thereby, a film having better planarity can be obtained. The coating composition formed of the hard coat layer can contain a solvent. Examples of the organic solvent to be contained in the coating composition include hydrocarbons (toluene, xylene), alcohols (methanol, ethanol, isopropanol, butanol, cyclohexanol), and ketones (acetone, methyl group). Ethyl ketone, methyl isobutyl ketone), esters (methyl acetate, ethyl acetate, methyl lactate), glycol ethers may also be suitably selected from other organic solvents or mixtures thereof. The organic solvent is preferably propylene glycol monoalkyl ether (the number of carbon atoms of the alkyl group is Ϊ~4) or propylene glycol monoalkyl ether acetate (the number of carbon atoms of the alkyl group is 1 to 4). Further, the content of the organic solvent is preferably from 5 to -58 to 200907491 in the coating composition of 80% by mass. The hard coat layer is a transparent hard coat layer having a center line average roughness (Ra) of 0.001 to 0·1 μηι specified in JIS B 060 1 or an additive particle, and the Ra is adjusted to 0.1 to 1 μm. A glare hard coat layer is preferred. The center line average roughness (Ra) is preferably measured by a light interference type surface roughness measuring device, and can be measured, for example, by using a non-contact surface fine shape measuring device "WYKO NT-2000" manufactured by WYKO Co., Ltd. Further, the hard coat layer may preferably contain the above-mentioned polyoxyalkylene-based surfactant or polyoxyether compound described in the low refractive index layer. It is preferable to add these components in the range of 0·0 1 to 3 % by mass for the solid component in the coating liquid. Examples of the polyoxy ether compound include polyepoxides such as polyethylene oxide alkyl ether, polyethylene oxide lauryl ether, polyethylene oxide cetyl ether, and polyethylene oxide stearyl ether. a polyoxyalkyl phenyl ether compound such as an oxyethane alkyl ether compound, a polyethylene oxide nonyl phenyl ether or a polyethylene oxide octyl phenyl ether; a polyoxyalkylene alkyl ether; a polyethylene oxide higher alcohol Ethers, polyethylene oxide octyl lauryl ether, and the like. EMULGEN 1108, EMULGEN 1118S-70 (above, Kao Corporation), and as a commercial item of polyethylene oxide lauryl ether, EMULGEN 103, EMULGEN are mentioned as a commercial item of the polyethylene oxide alkyl ether. HUP, EMULGEN 105, EMULGEN 106 'EMULGEN 108, EMULGEN 1 09P, EMULGEN 120 ' EMULGEN 1 23 P , EMULGEN 147 , EMULGEN 150 , EMULGEN 1 3 0K (above, Kao Corporation), as polyethylene oxide hexadecane For the sale of the ethers, EMULGEN 210P, -59-200907491 EMULGEN 220 (above, Kao Corporation), as a sale of polyethylene oxide stearyl ether, EMULGEN 220, EMULGEN 3 06P ( In the above, as a sales item of polyoxyalkylene alkyl ether, EMULGEN LS-106, EMULGEN LS-110, EMULGEN LS-114, and EMULGEN MS-110 (above, Kao Corporation) can be cited as Commercial products of polyethylene oxide higher alcohol ethers include EMULGEN 705, EMULGEN 707, EMULGEN 709, and the like. Among these nonionic polyoxyether compounds, preferred are polyepoxyethylene oleyl ether compounds, and compounds represented by the following general formula (5). C18H35-〇 ( C2H40 ) nH (5) where η represents 2 to 40. The average number (η) of ethylene oxide added to the oil-based portion is from 2 to 40, preferably from 2 to 10. Further, the compound of the general formula (5) is obtained by reacting ethylene oxide with oleyl alcohol. Specific products include EMULGEN 404 [polyethylene oxide (4) oleyl ether], EMULGEN 408 [polyethylene oxide (8) oleyl ether], and EMULGEN 409P [polyethylene oxide (9). ) oleyl ether], EMULGEN 420 [polyethylene oxide (13) oleyl ether], EMULGEN 430 [polyethylene oxide (30) oleyl ether] (above, Kao Corporation), NOFABLEEAO from Japan Oils and Fats 9905 (polyethylene oxide (5) oleyl ether) and the like. And () represents the number of η. The nonionic polyoxyether compound can be used alone or in combination of two or more. The hard coating of the polyoxyalkylene surfactant and the polyoxyether compound has a mass ratio of 1.0·1.0 to 0.10:1.0, more preferably 0.70 0.20:1.0, and the present invention can be obtained by the above-mentioned mass ratio. Preferably. The content of the nonionic polyoxyether compound and the poly-sand surfactant in the hard coat layer is preferably 0.1% by mass, more preferably 0.2% by mass to 4% by weight of the total content of both. % by mass, the hard coating layer may be present under stability when added. Further, the above-mentioned fluorine surfactant, acrylic acetylene glycol compound, nonionic surfactant, free radical nonionic surfactant, or the like may be used in combination. Examples of the nonionic surfactant include polyepoxylate, polyethylene oxide monostearate, polyethylene oxide monooleate polyoxyalkylate compound, and sorbitan monolaurate. Examples of the acetylene glycol compound such as a sorbitan ester compound such as sorbitan ester or sorbitan monooleate include Surfynol Surfynol 104PA, Surfynol 420, Surfynol 440, and Di (above, Nisshin Chemical Industry Co., Ltd.) Ltd.) and so on. As a radically polymerizable nonionic surfactant, polyoxyl extensions such as "RMA-564", "RMA-56 8", and "RMA-1114" (trade name, manufactured by Japan Emulsifier Co., Ltd.) are exemplified. A phenyl ether (meth) acrylate-based polymerizable surfactant or the like. Further, the hard coat layer may have a double layer structure of two or more layers. It is: the layer contains: 1 · 0 〜. Effect oxyalkylene boundary % ~ 8.0 The range of the monoester, monounsaturated monolaurate such as mono-stearic acid ester 104E, η ο 1 6 0 4 One layer of the alkyl group-61 - 200907491 'For example, it is a so-called antistatic layer containing conductive particles, a conjugated conductive polymer, or an ionic polymer, and is used as a color correction filter for various display elements. The device 'may contain a color tone adjusting agent (dye, pigment, etc.) having a color tone adjusting function, and may have various functions including an electromagnetic wave blocking agent or an infrared ray absorbing agent. (Back Coating Layer) In the antireflection film of the present invention, it is also preferable to provide a hard coat layer and a back coat layer on the reverse side. The back coating layer is provided for the curl generated by the antireflection layer to be bridged. That is, the surface provided with the back coating layer is made to have an inner side and has a curved property to balance the bending. Further, the back coating layer is preferably coated so as to have an agglomeration preventing layer. In this case, it is preferable to add an inorganic compound or an organic compound particle having a blocking preventing function to the coating composition of the back coating layer. . Examples of the inorganic compound added to the particles of the back coating layer include ceria, titania, alumina, zirconia, calcium carbonate, calcium carbonate, talc, clay, calcined clay, calcined calcium citrate, and oxidation. Tin, indium oxide, zinc oxide, ITO, water and calcium citrate, aluminum citrate, magnesium citrate and calcium phosphate. For these particles, for example, Aerosil R972 'R972V, R974, R812, 200, 200V, 300, R202, 0X50, TT600 (above Japanese Aerosil Co., Ltd.), 斯風斯达ΚΕ-Ρ10, ΚΕ-Ρ30, and KE can be used. -P50, the same as KE-P100, KE-P150, and KE-P2 5 0 (above, manufactured by Nippon Shokubai Co., Ltd.). -62-200907491 Examples of the organic compound include polyoxyalkylene resin, fluororesin, and propylene-based resin. Preferably, the polyoxyalkylene resin is used, and particularly preferably a network having a triple enthalpy structure, and examples thereof include Tospearl 103, the same 105, the same 108, the same 120, the same 145, the same 3120, and the same 240 (the above Toshiba The trade name of 矽 烷 ( (). Among them, Aerosil 200V, AerosilR9 72V, Stork KE-P30, KE-P50, and KE-P100 can maintain a low haze and have a blocking effect, which is particularly good. The antireflection film used in the present invention is such that the dynamic friction coefficient of the inner side of the active energy ray-curable resin layer is 〇. 9 or less, particularly preferably 〇 1 to 0 · 9. The particles contained in the back coating layer are preferably 0.1 to 5 Å by mass for the adhesive, and ο 1 to 1 〇 by mass. The increase in haze when the back coating layer is provided is preferably 1% or less, and preferably 0.5% or less is preferably '0.0 to 0 · 1%. Examples of the solvent used for the coating of the back coating layer include dichethane, acetone, methyl ethyl ketone, methyl isobutyl ketone, N, N-dimethylformamide, and methyl acetate. 'ethyl acetate, trichloroethylene ethyl, dichloromethyl, ethyl chloride, tetrachloroethane, trichloroethane, chloroform, water, methanol, ethanol, η-propanol, i-propanol, N-butanol, cyclohexanone, cyclohexanol, mono-monomethyl ether, propylene glycol monoethyl ether, or hydrocarbons (toluene, xylene), etc. may be suitably used in combination. Examples of the resin used as the adhesive of the back coating layer include a vinyl chloride-vinyl acetate copolymer, a vinyl chloride resin, a vinyl acetate resin, a copolymer of vinyl acetate and a vinyl alcohol, and a copolymer. Partially hydrolyzed chlorinated-63- 200907491 Ethylene-vinyl acetate copolymer, chlorinated ethylene-vinylidene copolymer, chlorinated ethylene-acrylonitrile-based copolymer, ethylene vinyl alcohol copolymer, chlorinated polychlorinated Ethylene polymer or copolymer such as ethylene, ethylene-vinyl chloride copolymer, ethylene-vinyl acetate copolymer, nitrocellulose, cellulose acetate propionate (preferably acetyl group substitution degree 丨. a cellulose derivative such as 8 to 2.3, a propylene group substitution degree of 0.1 to 1 ·0), a diacetyl cellulose, a cellulose acetate butyrate resin, a copolymer of maleic acid and/or acrylic acid, or acrylic acid Ester copolymer, acrylonitrile-styrene copolymer, chlorinated polyethylene, propylene fluorenyl-chlorinated polyethylene styrene copolymer, methyl methacrylate-butadiene styrene copolymer, acrylic resin, Polyvinyl alcohol resin, polyethylene, acetal resin, Vinyl butyral resin, urethane resin, polyester polyurethane resin, polyether polyurethane resin, polycarbonate polyurethane resin, polyester resin, _ ether resin, polyamide resin, amine resin, benzene A rubber-based resin such as an ethylene-butadiene resin or a τ-diene acryl-based resin, a polyoxyalkylene-based resin, or a gas-based resin is not limited thereto. Examples of the acrylic resin include ACRYPETMD, Vjj, MF, V (manufactured by Mitsubishi Rayon Co., Ltd.), Hibak M-4〇〇3, M-4005 'M-4006 'M-4202, M-5000, M- 5 00 1 , M-45〇1 (made by Gensei Industrial Co., Ltd.), Taiana Road BR-50, BR_52 'BR-53' BR-60, BR-64, BR-73, BR--75 , BR _77 'BR-79, BR-80, BR-82, BR-83, BR-85, BR-87, B R-8 8, BR-90 'BR-93, BR-95, BR- 1 00 , BR-1 丨01 'BR-102, Br_105, BR-1 (36, BR-107, BR-10 8, BR-1 12, BR-113, 115, BR-116, BR-117, BR- 118, etc. (available as a raw material such as a propylene group or a methacrylic monomer which is manufactured by Mitsubishi Rayon Co., Ltd., Ltd., and a methacrylic monomer), which are various raw materials and copolymers, can be suitably selected from among them. The resin used for the adhesive is preferably a cellulose ester such as cellulose diacetate or cellulose acetate acrylate, or a gel of an acrylic resin, and a particle made of an acrylic resin is used as a particle. The difference in refractive index from the adhesive is a back coating layer having a high transparency of less than 0.02. The coating composition is a gravure coater, a dip coater, a reverse coater, a coil bar coater, a die coater, or Spray coating, spray coating, or the like is preferably applied to the surface of the transparent resin film to a wet film thickness of 1 to ΙΟΟμηη, particularly preferably 5 to 30 μm. Further, after application, heat drying is performed, and hardening is performed as necessary. The back coating layer can be formed. The hardening treatment can be carried out by using the low refractive index layer. The back coating layer can be applied in two or more times. The back coating layer can also improve the adhesion to the polarizer. When the above layers are formed by coating, the transparent resin film can be repeatedly wound up in a roll shape at a width of 1, 4 to 4 m, and the above coating is carried out and dried. After the hardening treatment, it is preferably rolled into a roll shape. After laminating the antireflection layer, the film is rolled into a roll and then produced by a manufacturing method of 50 to 16 (heat treatment of TC), and the antireflection film is used. It is better in terms of efficiency or stability in long-length coating. Heating The period of time can be determined by the set temperature, for example, at 50 ° C, preferably for more than 3 days -65-200907491 for less than 30 days, at 110 ° C for more than 10 minutes The range below 1 day is better. Generally, it is preferable to set the heat treatment effect on the outer portion of the roll, the center portion of the roll, and the core portion to be 'different'. It is preferable to set it at a lower temperature, and it is preferably carried out at a temperature of about 5 to 60 ° C for 7 days. In order to allow the heat treatment to be carried out under stability, it is preferable to carry out the treatment in a place where the temperature and humidity can be adjusted, in a dust-free dust-free heat treatment chamber. When the anti-reflection film is wound into a roll shape, the core of the roll may be only the core on the cylinder, and may be any material, but is preferably a hollow plastic core, which is resistant to heating as a plastic material. The heat-resistant plastic material of the treatment temperature may be a resin such as a phenol resin, a xylene resin, a melamine resin, a polyester resin or an epoxy resin. Further, it is preferred to use a enamel-filled material such as glass fiber to strengthen the thermosetting resin. For the number of rolls of these roll cores, it is preferable that more than 100 rolls are more than '500 rolls or more, and the roll thickness is preferably 5 cm or more (reflectance of the antireflection film). The reflectance of the antireflection film of the present invention can be improved by The spectrophotometer was used for the measurement. At this time, the inside of the sample measurement side was subjected to roughening treatment, and then light absorption treatment was performed using a black spray, and then the reflected light in the visible light region (400 to 700 nm) was measured. The lower the reflectance, the better, and the average 値 in the wavelength of the visible light region is preferably 2.5% or less, and the lowest reflectance is preferably 1.5% or less. Further, when the reflectance is 2.5% or less, it can be used as the antireflection film of the present invention. In the wavelength region of visible light, a reflection spectrum having a flat shape is preferred. Moreover, the reflected hue of the surface of the display device subjected to the anti-reflection treatment is mostly dyed red or because the anti-reflection film is designed to have a high transmittance in the short-wavelength region or the long-wavelength region in the visible light region, and the anti-66-200907491 is high. Blue, but the color of the reflected light has different requirements depending on the application. When used on the outermost surface such as a thin TV, it is required to be a natural color. In this case, it is generally preferable that the range of the reflected hue is on the XYZ color system (CIE1931 color system), 〇·17$χ$〇·33, 0_10$y$0.33. The film thickness of the high refractive index layer and the low refractive index layer is a reflectance and a color tone of the reflected light in consideration of the refractive index of each layer, and can be calculated by a usual method. It is preferred to carry out surface treatment before coating each layer. Examples of the surface treatment method include a washing method, an alkali treatment method, a surface plasma treatment method, a high frequency discharge plasma method, an electron beam method, an ion beam method, a sputtering method, an acid treatment, a corona treatment method, and an atmospheric pressure. Luminous discharge plasma method, etc. The corona treatment is a process in which a high voltage of 1 kV or more is applied between the electrodes under atmospheric pressure to discharge it, and it can be carried out using a device sold by Kasuga Electric Co., Ltd. or a Toys Co., Ltd. The intensity of the corona discharge treatment depends on the distance between the electrodes, the output per unit area, and the frequency of the generator. A commercially available product may be used for one electrode (A electrode) of the corona treatment device, but the material may be selected from aluminum, stainless steel, or the like. The other is an electrode (B electrode) to be wrapped around the plastic film, and the roller electrode to be placed at a certain distance from the A electrode to be stabilized and uniformly performed by the corona treatment. This can also be used as a lining for ceramics, polyoxyalkylene, EPT rubber, Heplon rubber, etc. on rollers made of aluminum, stainless steel, and other metals. good. -67-200907491 The number of frequencies used for the corona treatment of the present invention is 20 kHz or more. The number of frequencies below 100 kHz is preferably a frequency of 30 to 60 kHz. When the frequency is lowered, the uniformity of corona treatment is deteriorated, and corona treatment is uneven. Further, when the number of frequencies is too large, there is no particular problem in performing corona treatment with high output. However, when corona treatment with low output is performed, it is difficult to perform stable treatment, and as a result, processing unevenness occurs. The output of the corona treatment is 1 to 5 W.min./m2, and the output of 2 to 4 W · min./m2 is preferred. The distance between the electrode and the film is 5 mm or more and 50 mm or less, but preferably 1 mm or more and 35 mm or less. When the gap is too open, it is necessary to maintain a certain output and must have a high voltage, which is prone to unevenness. Also, when the gap is too narrow, the applied voltage will be too low, and it is prone to unevenness. Further, when the film is continuously processed, the film is in contact with the film to cause scratches. The alkali treatment method is not particularly limited as long as the film to which the hard coat layer is applied is immersed in an aqueous alkali solution. As the aqueous alkali solution, an aqueous sodium hydroxide solution, a potassium hydroxide aqueous solution, an aqueous ammonia solution or the like can be used, and among them, an aqueous sodium hydroxide solution is preferred. The alkali concentration of the aqueous alkali solution, for example, the concentration of sodium hydroxide is preferably 〇1 to 255% by mass, and preferably 0.5 to 15% by mass. The alkali treatment temperature is usually from 1 Torr to 80 ° C, preferably from 20 to 60 ° C. The alkali treatment time is from 5 seconds to 5 minutes, preferably from 30 seconds to 3 minutes. The film after the alkali treatment is preferably washed with water and then thoroughly washed with water. (Transparent Resin Film) -68-200907491 A transparent film substrate made of a transparent resin film used in the present invention will be described. The transparent film substrate is preferably a material which is easy to manufacture, has good adhesion to the active wire-curable resin layer, and is optically isotropic and optically transparent. The transparent portion is preferably a light transmittance of 60% or more, preferably 80% or more, and particularly preferably 90% or more. The above properties are not particularly limited, and examples thereof include a cellulose diacetate film, a cellulose triacetate film, a cellulose acetate propionate film, and a cellulose acetate butyric acid. A cellulose ester film such as an ester film, a polyester film, a polycarbonate film, a polyacrylate film, a poly(polyether fluorene) film, polyethylene terephthalate or polyethylene naphthalene Polyester film such as acid ester, polyethylene film, polypropylene film, cellophane, polyvinyl chloride film, polyvinyl alcohol film, ethyl vinyl alcohol film, syndiotactic polystyrene film, cycloolefin Polymer film (ADEN (manufactured by JSR), ZE0NEX, ΖΕ0Ν0Α (above 'Benmoto Co., Ltd.)), polyvinyl acetal, polymethylpentene film, polyether ketone film, polyether ketimide film, Polyamide film, fluororesin film, nylon film, polymethyl methacrylate film, acryl film or glass plate. Among them, a cellulose ester-based film, a polycarbonate-based film, a polyfluorene-containing film, and a cycloolefin polymer film are preferred. In the present invention, a cellulose ester-based film is particularly used (for example, Konicaminolta tak). Product name KC8UX2MW, KC4UX, KC5UX, KC4UY, KC8UY, -69- 200907491 KC12UR, KC4UEW, KC8UCR-3, KC8UCR-4, KC8UCR-5, KC4FR-1, KC4FR-2 (manufactured by Konicaminolta opt Co., Ltd.) From the viewpoints of the upper surface, the cost surface, the transparency, the adhesion, etc., these films may be films produced by melt casting film formation or films produced by solution casting film formation. A cellulose ester-based film (hereinafter also referred to as a cellulose ester film) is preferred. As the cellulose ester, cellulose acetate, cellulose acetate butyrate, and cellulose acetate propionate are preferred. Among them, cellulose acetate butyrate, cellulose acetate phthalate, cellulose acetate propionate are also preferred. In particular, the degree of substitution of the ethyl ketone group is represented by X as 'propyl sulfonate or When the degree of substitution of Dingji is expressed as Y A cellulose ester film having X and γ in the following ranges is preferred. 2.3 SX+ YS3.0 0_1 ' YS2.0 is particularly preferably 2.5SX+YS2.9 3SYS1.2. Hereinafter, for a preferred transparent resin film The cellulose ester film is described in detail. The cellulose ester film is an antireflection film which is less deformed by a substrate and has excellent planarity due to heat treatment, and is freely obtained by a Positron annihilation lifetime. The volume radius is preferably 0.250 to 〇.310 nm, and the full free volume parameter is preferably I0~2_〇-70-200907491 cellulose ester film. Moreover, the above free volume means that the transparent resin film is not occupied. The void portion of the molecular chain. This can be measured by the positron emission extinction method. Specifically, the time from the injection of the positron to the sample to the eradication is determined. The size of the atomic pore or free volume can be observed nondestructively by the extinction life. Relevant information such as the concentration and concentration. (Measurement of the free volume radius and the full free volume parameter by the annihilation method of the positive electron method) The positive electron elimination is determined under the following measurement conditions. Life and relative strength. (Measurement conditions) Positive electron source: 22NaCl (strength 1.85MBq) γ-ray detector: plastic scintillator + photoelectron multiplier device Time decomposition energy: 290ps Measurement temperature: 2 3 °C Total count: 100 Million sample size: 20mmxl5mm The sample cut into 20mmxl5mm was made into 20 pieces of weight, which was about 2mm thick. The sample was vacuum dried for 24 hours before the measurement. Irradiation area: about ΙΟηιηιφ time per channel·_ 23.3 ps/ch According to the above measurement conditions 'Implementation of positive electron elimination life measurement', the 3-component analysis is performed by the nonlinear least squares method, and the one with the smaller lifetime is made -71 - 200907491 Τι, τ2, τ3 ' corresponds to this strength as the Sichuan,: [2, l3 (chuan + ι2 + ι3 = 10 0%). From the average life expectancy τ3 of the longest life, the free volume radius R3 (nm) of the following formula was obtained. Corresponding to the annihilation of the positron electrons of τ3 in the holes, it is presumed that the larger the τ3 is, the larger the pore size is. — (1/2) 〔1-{R3/(R>3 + 0-166) } + ( 1 /2 π ) sin { ( R3 + 0.166) } 〕-1 where 0.166 (nm) is equivalent to self-empty The thickness of the electron layer leached by the pore walls is 〇, and the full free volume parameter Vp is obtained by the following formula. V3- { ( 4/3 ) π ( R3 ) 3 } ( nm3 )

Vp = I3 ( %) XV3 ( nm3) 其中,I3 ( % )相當於空孔之相對數濃度,故Vp相當於相 對空孔量。 將以上測定重複2次,求得其平均値。 陽電子消滅壽命法爲、例如 MATERIAL STAGE ν ο 1.4 ,Ν ο . 5 2 0 0 4 ρ21-25、To ray Research Center THE TRC NEWS No.80 ( Jul.2002 ) p20-22、「分析」(1 9 8 8,ρρ·Η· 20)中記載「藉由陽電子消滅法之高分子自由體積的評估 ,可參考此。 -72- 200907491 纖維素酯薄膜中之自由體積半徑爲0.250〜0.315 nm, 較佳爲0.250〜0.310 nm’更佳範圍爲0.285〜0.305 nm。自 由體積半徑未達0_250nm。自由體積半徑爲〇.25〇〜 0 · 3 1 5 n m時’封於熱處理之基材變形較小,可得到平面性 優良的防反射薄膜。 作爲形成纖維素酯薄膜之纖維素酯的原料,並無特別 限定’可舉出綿花棉絨、木材紙漿(來自針葉樹,來自闊 葉樹)、洋麻等。又這些所得之纖維素酯可由任意比率下 混合使用。這些纖維素酯爲,醯基化劑作爲酸肝(乙酸酐 '丙酸酐、丁酸酐)時,使用如乙酸之有機酸或二氯甲烷 等有機溶劑,使用如硫酸之質子性觸媒與纖維素原料進行 反應而得到。 醯基化劑爲酸氯化物(CH3C0C1 ' C2H5C0C1、 CsHtCOCI )之情況時’作爲觸媒可使用如胺之鹼性化合物 進行反應。具體可參考特開平1 0 - 4 5 8 0 4號公報所記載的 方法等進行合成。 又,本發明所使用的纖維素酯爲,配合各取代度混合 上述醯基化劑量而進行反應者,纖維素酯中這些醯基化劑 與纖維素分子之羥基進行反應。纖維素分子爲葡萄糖單位 爲多數連結者所成,葡萄糖單位上有3個羥基。於該3個 羥基上醯基被衍生之數目稱爲取代度(莫耳% )。例如, 例如纖維素三乙酸酯爲,葡萄糖單位之3個羥基皆與乙醯 基結合(實際上爲2 · 6〜3 . 0 )。 醯基的取代度之測定方法可依據ASTM-D8 17-96之規 -73- 200907491 定進行測定。 纖維素酯之數平均分子量爲5 0000〜25 0000,成型時 的機械性強度較強,且成爲適度膠漿黏度而較佳,更佳爲 80000〜150000 ° 纖維素酯薄膜爲,可藉由一般稱爲溶液流延製膜法’ 將纖維素酯溶解液(膠漿),例如由無限地移送的無端金 屬輸送帶或轉動的金屬轉筒之流延用支持體上,進行加壓 塑模使膠漿流延(進行澆鑄)製膜的方法而製造。 作爲使用於膠漿調製的有機溶劑,可溶解纖維素酯, 並具有適當沸點者爲佳,例如可舉出二氯甲烷、乙酸甲酯 、乙酸乙酯、乙酸戊基、乙醯乙酸甲酯、丙酮、四氫呋喃 、:1,3-二氧雜戊環、1,4-二噁烷、環己酮、甲酸乙酯、 2,2,2-三氟乙醇、2,2,3,3-四氟-1-丙醇、1,3-二氟-2-丙醇、 1,1,1,3,3,3-六氟-2-甲基-2-丙醇、1,1,1,3,3,3-六氟-2-丙醇 、2,2,3,3,3-五氟-1-丙醇、硝基乙烷、1,3-二甲基-2-咪唑 二酮等,但亦可舉出二氯甲烷等有機鹵化合物、二氧雜戊 環衍生物、乙酸甲酯、乙酸乙酯、丙酮、乙醯乙酸甲酯等 爲佳有機溶劑(即,良溶劑)。 又,如下述製膜步驟所示’自溶劑蒸發步驟中於流延 用支持體上所形成之網狀物(web )(膠漿膜)乾燥溶劑 時,由防止網狀物中之發泡的觀點來看’作爲所使用的有 機溶劑之沸點以3 0〜8 0 °C爲佳’例如上述所記載的良溶劑 之沸點爲二氯甲烷(沸點4〇,4°C )、乙酸甲酯(沸點 5 6.3 2 °C )、丙酮(沸點56.3°〇)、乙酸乙酯(沸點 -74- 200907491 7 6.8 2 °C )等。 上述良溶劑中,以具有優良溶解性之二氯甲烷或乙酸 甲酯爲佳。 上述有機溶劑以外,亦可含有0.1〜40質量。/。之碳原 子數1〜4的醇類爲佳。特佳爲含有5〜30質量%之上述醇 類。 此爲將上述膠漿於流延用支持體上進行流延後,溶劑 開始蒸發的醇類比率變多時,網狀物(膠漿膜)會凝膠化 ,網狀物可穩定地由流延用支持體進行剝離,作爲凝膠化 溶劑使用、或彼等比率較少時,可扮演促進非氯系有機溶 劑的纖維素酯之溶解的角色。 作爲碳原子數1〜4的醇類,可舉出甲醇、乙醇、n-丙醇、iso-丙醇、η-丁醇、sec· 丁醇、tert-丁醇等。 這些溶劑中,由膠漿穩定性佳、沸點亦較低、乾燥性 亦佳、且無毒性等觀點來看,以乙醇爲佳。較佳爲使用對 於二氯甲烷70〜95質量%而言,含有乙醇5〜30質量%之 溶劑。取代二氯甲烷可使用乙酸甲酯。此時,可藉由冷卻 溶解法調製出膠漿。 纖維素酯薄膜中可含有下述可塑劑者爲佳。作爲可塑 劑,例如可使用磷酸酯系可塑劑、多元醇類酯系可塑劑、 鄰苯二甲酸酯系可塑劑、偏苯三酸酯系可塑劑、均苯四甲 酸系可塑劑、乙醇酸酯系可塑劑、檸檬酸酯系可塑劑、聚 酯系可塑劑、脂肪酸酯系可塑劑、多元羧酸酯系可塑劑等 爲佳。 -75- 200907491 其中,亦以多元醇類酯系可塑劑、鄰苯二甲酸酯系可 塑劑、檸檬酸酯系可塑劑、脂肪酸酯系可塑劑、乙醇酸酯 系可塑劑、多元羧酸酯系可塑劑等爲佳。特別以使用多元 醇類酯系可塑劑爲佳,可安定地得到硬塗佈層之鉛筆硬度 爲4H以上者故較佳。 多元醇類酯系可塑劑爲2元以上之脂肪族多元醇類與 單羧酸之酯所成之可塑劑,分子内具有芳香環或環烷基環 者爲佳。較佳爲2〜20元之脂肪族多元醇類酯。 多元醇類如下一般式(6)所示。 R1- ( OH ) η ... ( 6 ) 式中,R1表示η價有機基,η表示2以上之正整數,OH 基表示醇類性、及/或酚性羥基。 作爲較佳多元醇類之例子,例如可舉出如以下者,但 本發明並未限定於此。 可舉出核糖醇、阿糖醇、乙二醇、二乙二醇、三乙二 醇、四乙二醇、1,2-丙烷二醇、1,3 -丙烷二醇、二丙二醇 、三丙二醇、1,2-丁 二醇、1,3-丁 二醇、1,4·丁二醇、二丁 二醇、1,2,4 -丁三醇、1,5 -戊二醇、1,6 -己二醇、己三醇、 半乳糖醇、甘露糖醇、3 -甲基戊烷-1,3,5 -三醇、頻哪醇、 山梨糖醇、三羥甲基丙烷、三羥甲基乙烷、木糖醇等。特 別以三乙二醇、四乙二醇、二丙二醇、三丙二醇、山梨糖 醇、三羥甲基丙烷、木糖醇爲佳。 -76- 200907491 作爲使用於多元醇類酯之單羧酸,並無特別限定,可 使用公知之脂肪族單羧酸、脂環族單羧酸、芳香族單羧酸 等。使用脂環族單羧酸、芳香族單羧酸時可提高透濕性、 保留性故較佳。 作爲較佳單羧酸之例子,可舉出以下者,但本發明未 限定於此。 作爲脂肪族單羧酸,使用具有碳數1〜3 2之直鏈或支 鏈的脂肪酸爲佳。碳數爲1〜2 0時爲更佳,1〜1 0時爲特 佳。含有乙酸時,與纖維素酯之相溶性會增加而較佳,亦 可混合乙酸與其他單羧酸後使用。 作爲較佳脂肪族單羧酸,可舉出乙酸、丙酸、丁酸、 戊酸、己酸、庚酸、辛酸、壬酸、癸酸、2 -乙基-己烷酸、 十一烷基酸、月桂酸、十三烷基酸、肉豆蔻酸、十五烷基 酸、棕櫚酸、十七烷基酸、硬脂酸、十九烷基酸、花生酸 、山箭酸、巴西棕櫚酸、蠟酸、二十七烷基酸、二十八烷 基酸、三十烷基酸、三十二烷基酸等飽和脂肪酸、十一碳 烯酸、油酸、山梨酸、亞油酸、亞麻酸、花生浸烯酸等不 飽和脂肪酸等。 作爲較佳脂環族單羧酸之例子,可舉出環戊烷羧酸、 環己烷羧酸、環辛烷羧酸、或彼等衍生物。 作爲較佳芳香族單羧酸之例子,可舉出安息香酸、甲 苯酸等安息香酸之苯環上導入1〜3個的烷基、甲氧基或 乙氧基等者、烷氧基、聯苯基羧酸、萘羧酸、萘滿羧酸等 具有2個以上的苯環之芳香族單羧酸、或彼等衍生物,特 -77- 200907491 別以安息香酸爲佳。 多元醇類酯之分子量雖無特別限定’但以3 00〜1500 爲佳,350〜750爲更佳。分子量越大,揮發越困難而不佳 ,由與透濕性、纖維素酯之相溶性的觀點來看以較小爲佳 〇 使用於多元醇類酯之羧酸可爲1種類、或2種以上之 混合亦可。又,多元醇類中之OH基可全部酯化、或一部 份維持Ο Η基。 以下例舉出多元醇類酯之具體化合物。Vp = I3 ( %) XV3 ( nm3 ) where I3 ( % ) corresponds to the relative concentration of the holes, so Vp is equivalent to the relative amount of holes. The above measurement was repeated twice to obtain an average enthalpy. The method of eliminating the life of the positron is, for example, MATERIAL STAGE ν ο 1.4 , ο ο . 5 2 0 0 4 ρ21-25, To ray Research Center THE TRC NEWS No. 80 ( Jul. 2002 ) p20-22, "Analysis" (1 9 8 8, ρρ·Η· 20) It is described in the evaluation of the free volume of the polymer by the positive electron elimination method. -72- 200907491 The free volume radius in the cellulose ester film is 0.250 to 0.315 nm, preferably The range of 0.250~0.310 nm is better than 0.285~0.305 nm. The free volume radius is less than 0-250 nm. When the free volume radius is 〇.25〇~ 0 · 3 1 5 nm, the substrate sealed by heat treatment has less deformation. An antireflection film having excellent planarity is obtained. The raw material of the cellulose ester forming the cellulose ester film is not particularly limited, and examples thereof include cotton linters, wood pulp (from conifers, from broadleaf trees), and kenaf. The obtained cellulose ester can be used in combination at any ratio. These cellulose esters are, as a sour acid (acetic anhydride 'propionic anhydride, butyric anhydride), an organic solvent such as acetic acid or an organic solvent such as dichloromethane. Use as The acid protonic catalyst is obtained by reacting with a cellulose raw material. When the thiolating agent is an acid chloride (CH3C0C1 'C2H5C0C1, CsHtCOCI), the reaction can be carried out using a basic compound such as an amine as a catalyst. The cellulose ester used in the present invention is a compound obtained by mixing the above-mentioned thiolated amount with each degree of substitution, and the cellulose is synthesized by the method described in the above-mentioned Japanese Patent Publication No. Hei 10 - 4 5 8 0. These thiolation agents in the ester react with the hydroxyl groups of the cellulose molecules. The cellulose molecules are formed by a majority of the glucose units, and the glucose unit has three hydroxyl groups. The number of the thiol groups derived from the three hydroxyl groups is called Is the degree of substitution (% by mole). For example, for cellulose triacetate, the three hydroxyl groups of the glucose unit are all bonded to the ethyl group (actually 2 · 6 to 3.0). The measurement method can be determined according to ASTM-D8 17-96 -73-200907491. The average molecular weight of cellulose ester is 50,000~25 0000, the mechanical strength during molding is strong, and it becomes a moderate glue viscosity. And more More preferably, it is an 80,000 to 150,000 ° cellulose ester film, which can be transferred by a generally known solution casting film method, a cellulose ester solution (glue), for example, an endless metal conveyor belt that is infinitely transferred. The metal drum is cast on a support by a method in which a press mold is used to form a film by casting (casting) a paste. As the organic solvent used for the preparation of the dope, it is preferred to dissolve the cellulose ester and have an appropriate boiling point, and examples thereof include dichloromethane, methyl acetate, ethyl acetate, amyl acetate, and methyl acetoxyacetate. Acetone, tetrahydrofuran,: 1,3-dioxolane, 1,4-dioxane, cyclohexanone, ethyl formate, 2,2,2-trifluoroethanol, 2,2,3,3-tetra Fluor-1-propanol, 1,3-difluoro-2-propanol, 1,1,1,3,3,3-hexafluoro-2-methyl-2-propanol, 1,1,1, 3,3,3-hexafluoro-2-propanol, 2,2,3,3,3-pentafluoro-1-propanol, nitroethane, 1,3-dimethyl-2-imidazolidone For example, an organic halogen compound such as dichloromethane, a dioxolane derivative, methyl acetate, ethyl acetate, acetone or methyl acetacetate may be mentioned as a preferred organic solvent (that is, a good solvent). Further, when the solvent is dried in a web (slurry film) formed on the casting support in the solvent evaporation step as shown in the following film forming step, the viewpoint of preventing foaming in the web is considered. It is preferable that the boiling point of the organic solvent to be used is preferably from 30 to 80 ° C. For example, the boiling point of the good solvent described above is dichloromethane (boiling point 4 〇, 4 ° C), methyl acetate (boiling point). 5 6.3 2 °C), acetone (boiling point 56.3 ° 〇), ethyl acetate (boiling point -74-200907491 7 6.8 2 °C). Among the above good solvents, dichloromethane or methyl acetate having excellent solubility is preferred. In addition to the above organic solvent, it may contain 0.1 to 40 mass. /. The alcohol having 1 to 4 carbon atoms is preferred. It is particularly preferred to contain 5 to 30% by mass of the above alcohol. When the ratio of the alcohol in which the solvent starts to evaporate after the above-mentioned dope is cast on the casting support, the mesh (slurry film) gels and the web can be stably cast. When it peels by a support, it is used as a gelation solvent, or when it is few ratio, it can play the role which accelerates the dissolution of the cellulose ester of a non-chlorine-type organic solvent. Examples of the alcohol having 1 to 4 carbon atoms include methanol, ethanol, n-propanol, iso-propanol, η-butanol, sec. butanol, and tert-butanol. Among these solvents, ethanol is preferred from the viewpoints of good stability of the paste, low boiling point, good drying property, and no toxicity. It is preferred to use a solvent containing 5 to 30% by mass of ethanol for 70 to 95% by mass of methylene chloride. Instead of dichloromethane, methyl acetate can be used. At this time, the dope can be prepared by a cooling dissolution method. The cellulose ester film may preferably contain the following plasticizer. As the plasticizer, for example, a phosphate-based plasticizer, a polyol ester-based plasticizer, a phthalate-based plasticizer, a trimellitate-based plasticizer, a pyromellitic acid-based plasticizer, and glycolic acid can be used. An ester plasticizer, a citric acid ester plasticizer, a polyester plasticizer, a fatty acid ester plasticizer, a polycarboxylic acid ester plasticizer or the like is preferred. -75- 200907491 Among them, polyol ester-based plasticizers, phthalate-based plasticizers, citrate-based plasticizers, fatty acid ester-based plasticizers, glycolate-based plasticizers, polycarboxylic acids An ester plasticizer or the like is preferred. In particular, it is preferred to use a polyol ester-based plasticizer, and it is preferable to obtain a hard coat layer having a pencil hardness of 4H or more. The polyol ester-based plasticizer is a plasticizer composed of an ester of a polyhydric alcohol of 2 or more and a monocarboxylic acid, and preferably has an aromatic ring or a cycloalkyl ring in the molecule. It is preferably an aliphatic polyol ester of 2 to 20 members. The polyols are represented by the following general formula (6). R1-(OH) η (6) wherein R1 represents an η-valent organic group, η represents a positive integer of 2 or more, and OH represents an alcoholic group and/or a phenolic hydroxyl group. Examples of preferred polyhydric alcohols include, for example, the following, but the present invention is not limited thereto. Examples thereof include ribitol, arabitol, ethylene glycol, diethylene glycol, triethylene glycol, tetraethylene glycol, 1,2-propanediol, 1,3-propanediol, dipropylene glycol, and tripropylene glycol. 1,2-butanediol, 1,3-butanediol, 1,4-butanediol, dibutylene glycol, 1,2,4-butanetriol, 1,5-pentanediol, 1, 6-hexanediol, hexanetriol, galactitol, mannitol, 3-methylpentane-1,3,5-triol, pinacol, sorbitol, trimethylolpropane, trihydroxyl Methyl ethane, xylitol, and the like. In particular, triethylene glycol, tetraethylene glycol, dipropylene glycol, tripropylene glycol, sorbitol, trimethylolpropane or xylitol is preferred. -76-200907491 The monocarboxylic acid to be used for the polyol ester is not particularly limited, and a known aliphatic monocarboxylic acid, alicyclic monocarboxylic acid, aromatic monocarboxylic acid or the like can be used. When an alicyclic monocarboxylic acid or an aromatic monocarboxylic acid is used, moisture permeability and retention are improved, which is preferable. The following examples of preferred monocarboxylic acids include the following, but the present invention is not limited thereto. As the aliphatic monocarboxylic acid, a fatty acid having a linear or branched carbon number of 1 to 3 2 is preferably used. It is more preferable when the carbon number is from 1 to 2 0, and particularly preferably from 1 to 10 0. When acetic acid is contained, the compatibility with the cellulose ester is increased, and it is preferred to use acetic acid and other monocarboxylic acids. Preferred examples of the aliphatic monocarboxylic acid include acetic acid, propionic acid, butyric acid, valeric acid, caproic acid, heptanoic acid, caprylic acid, capric acid, capric acid, 2-ethyl-hexane acid, and undecyl group. Acid, lauric acid, tridecyl acid, myristic acid, pentadecyl acid, palmitic acid, heptadecanoic acid, stearic acid, nonadecyl acid, arachidic acid, sylvestic acid, carnauba , waxy acid, heptadecyl acid, octadecanoic acid, tridecyl acid, tridecyl acid and other saturated fatty acids, undecylenic acid, oleic acid, sorbic acid, linoleic acid, Unsaturated fatty acids such as linolenic acid and arachidonic acid. Examples of preferred alicyclic monocarboxylic acids include cyclopentanecarboxylic acid, cyclohexanecarboxylic acid, cyclooctanecarboxylic acid, and derivatives thereof. Examples of the preferred aromatic monocarboxylic acid include a 1 to 3 alkyl group, a methoxy group or an ethoxy group, and an alkoxy group, which are introduced into a benzene ring of benzoic acid such as benzoic acid or toluic acid. An aromatic monocarboxylic acid having two or more benzene rings, such as a phenylcarboxylic acid, a naphthalenecarboxylic acid or a naphthyl carboxylic acid, or a derivative thereof, and particularly preferably a benzoic acid. The molecular weight of the polyol ester is not particularly limited, but it is preferably from 300 to 1500, more preferably from 350 to 750. The larger the molecular weight, the more difficult it is to volatilize. From the viewpoint of compatibility with moisture permeability and cellulose ester, the carboxylic acid used for the polyol ester may be one type or two types. The above mixture is also possible. Further, the OH groups in the polyols may be all esterified or partially maintained in the oxime group. Specific compounds of the polyol esters are exemplified below.

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-87 200907491 〔化 1 1〕-87 200907491 〔化1 1〕

乙醇酸酯系可塑劑雖無特別限定,但以烷基鄰苯二醯 基烷基乙醇酸酯類爲佳。作爲烷基鄰苯二醯基烷基乙醇酸 酯類,例如可舉出甲基鄰苯二醯基甲基乙醇酸酯、乙基鄰 苯二醯基乙基乙醇酸酯、丙基鄰苯二醯基丙基乙醇酸酯、 丁基鄰苯二醯基丁基乙醇酸酯、辛基鄰苯二醯基辛基乙醇 酸酯、甲基鄰苯二醯基乙基乙醇酸酯、乙基鄰苯二醯基甲 基乙醇酸酯、乙基鄰苯二醯基丙基乙醇酸酯、甲基鄰苯二 醯基丁基乙醇酸酯、乙基鄰苯二醯基丁基乙醇酸酯、丁基 鄰苯二醯基甲基乙醇酸酯、丁基鄰苯二醯基乙基乙醇酸酯 、丙基鄰苯二醯基丁基乙醇酸酯、丁基鄰苯二醯基丙基乙 醇酸酯、甲基鄰苯二醯基辛基乙醇酸酯、乙基鄰苯二醯基 -88- 200907491 辛基乙醇酸酯、辛基鄰苯二醯基甲基乙醇酸酯、辛基鄰苯 二醯基乙基乙醇酸酯等。 作爲鄰苯二甲酸酯系可塑劑,可舉出二乙基酞酸酯、 二甲氧基乙基酞酸酯、二甲基酞酸酯、二辛基酞酸酯、二 丁基酞酸酯、二-2-乙基己基酞酸酯、二辛基酞酸酯、二環 己基酞酸酯、二環己基對苯二甲酸酯等。 作爲檸檬酸酯系可塑劑,可舉出檸檬酸乙醯基三甲酯 、檸檬酸乙醯基三乙酯、檸檬酸乙醯基三丁酯等。 作爲脂肪酸酯系可塑劑,可舉出油酸丁基、蓖麻醇酸 甲基乙醯基、癸二酸二丁基等。 亦可使用多元羧酸酯系可塑劑。具體爲將特開2002 -265639號公報之段落號碼〔0015〕〜〔 0020〕所記載的多 元羧酸酯作爲可塑劑之一而添加爲佳。 又,作爲其他可塑劑,可使用磷酸酯系可塑劑,並可 舉出三苯基磷酸酯、三甲酚磷酸酯、甲酚二苯基磷酸酯、 辛基二苯基磷酸酯、二苯基聯苯基磷酸酯、三辛基磷酸酯 '三丁基磷酸酯等。 其他亦可含有特開2003- 1 2859號所記載的丙烯基聚 合物等佳。 <丙烯基聚合物> 纖維素酯薄膜爲含有對於延伸方向顯示負配向複折射 性之重量平均分子量5 00以上3 0000以下的丙烯基聚合物 者爲佳。 -89- 200907491 以該聚合物之重量平均分子量爲500以上30000以下 者控制該聚合物之組成時’可使纖維素酯與該聚合物之相 溶性良好。 特別對於丙烯基聚合物、於支鏈具有芳香環之丙烯基 聚合物或於支鏈具有環己基之丙烯基聚合物,較佳爲重量 平均分子量爲500以上1 0000以下者即可,除上述以外, 製膜後之纖維素酯薄膜的透明性優良,透濕度亦極低,可 顯示作爲防反射薄膜之優良性能。 該聚合物因重量平均分子量爲500以上30000以下, 可考慮爲寡聚物至低分子量聚合物之間者。合成如此聚合 物,於一般聚合中難以控制分子量,可望使用一種不會使 分子量過大之方法下儘可能控制分子量之方法。 作爲相關聚合方法,可使用如過氧化枯烯或氫過氧化 第三丁基之過氧化物聚合啓始劑的方法、使用比一般聚合 還多量的聚合啓始劑之方法、使用聚合啓始劑以外的氫硫 基化合物或四氯化碳等連鎖移動劑之方法、使用聚合啓始 劑以外如苯並喹啉或二硝基苯之聚合停止劑的方法、具有 特開2000- 1 289 1 1號公報或同2000-3 448 23號公報所記載 的1個硫醇基與2級羥基之化合物' 或使用並用該化合物 與有機金屬化合物之聚合觸媒之嵌段聚合方法等。上述皆 可適用’但特別以該公報所記載的方法爲佳。 且,所謂丙烯基聚合物爲,不具有含芳香環或環己基 之單體單位的丙烯酸或甲基丙烯酸烷酯之均聚物或共聚物 。所謂支鏈上具有芳香環之丙烯基聚合物爲’必須含有具 -90- 200907491 有芳香環之丙烯酸或甲基丙烯酸酯單體單位之丙烯基聚合 物。 又,所謂支鏈上具有環己基之丙烯基聚合物爲’含有 具有環己基之丙烯酸或甲基丙烯酸酯單體單位的丙烯基聚 合物。 作爲不具有芳香環及環己基之丙烯酸酯單體,例如可 舉出丙烯酸甲酯、丙烯酸乙酯、丙烯酸丙基(i-、η-)、 丙烯酸丁酯(n-、i-、s-、t-)、丙烯酸戊基(n-、i-、s-)、丙烯酸己基(n-、i-)、丙烯酸庚基(n-、i-)、丙烯 酸辛基(n-、i-)、丙烯酸壬基、丙烯酸肉豆蔻 基(n-、i-)、丙烯酸(2-乙基己基)、丙烯酸(ε-己內 酯)、丙烯酸(2 -羥基乙基)、丙烯酸(2 -羥基丙基)、 丙烯酸(3 -羥基丙基)、丙烯酸(4 -羥基丁基)、丙烯酸 (2-羥基丁基)、丙烯酸(2-甲氧基乙基)、丙烯酸(2- 乙氧基乙基)等、或將上述丙烯酸酯改爲甲基丙烯酸酯者 〇 丙烯基聚合物爲上述單體之均聚物或共聚物,具有丙 烯酸甲酯單體單位30質量。/〇以上者爲佳,又,具有甲基丙 烯酸甲酯單體單位40質量%以上者爲更佳。特別以丙烯酸 甲酯或甲基丙烯酸甲酯之均聚物爲佳。 作爲具有芳香環之丙烯酸或甲基丙烯酸酯單體,例如 可舉出丙烯酸苯基、甲基丙烯酸苯基、丙烯酸(2或4 -氯 苯基)、甲基丙烯酸(2或4-氯苯基)、丙烯酸(2或3 或4-乙氧基羰基苯基)、甲基丙烯酸(2或3或4-乙氧基 -91 - 200907491 羰基苯基)、丙烯酸(〇或m或p-甲苯基)、甲基丙烯酸 (〇或m或p -甲苯基)、丙烯酸苯甲酯、甲基丙烯酸苯甲 酯、丙烯酸苯乙酯、甲基丙烯酸苯乙酯、丙烯酸(2-萘基 )等,使用丙烯酸苯甲酯、甲基丙烯酸苯甲酯、丙烯酸苯 乙酯、甲基丙烯酸苯乙基爲佳。 支鍵上具有方香環之丙燒基聚合物中,含具有芳香環 之丙烯酸或甲基丙烯酸酯單體單位爲20〜40質量%,且具 有丙烯酸或甲基丙烯酸甲酯單體單位50〜80質量%爲佳。 該聚合物中,含具有羥基之丙烯酸或甲基丙烯酸酯單體單 位2〜2 0質量%爲佳。 作爲具有環己基之丙烯酸酯單體,例如可舉出丙烯酸 環己酯、甲基丙烯酸環己酯、丙烯酸(4-甲基環己基)、 甲基丙烯酸(4 -甲基環己基)、丙烯酸(4 -乙基環己基) 、甲基丙烯酸(4 -乙基環己基)等,以使用丙烯酸環己酯 及甲基丙烯酸環己酯爲佳。 支鏈上具有環己基之丙烯基聚合物中,含具有環己基 之丙烯酸或甲基丙烯酸酯單體單位20〜40質量%,且以 50〜80質量%爲佳。又,該聚合物中含具有羥基之丙烯酸 或甲基丙烯酸酯單體單位2〜20質量%爲佳。 聚合上述乙烯性不飽和單體所得之聚合物、丙烯基聚 合物、支鏈上具有芳香環之丙烯基聚合物及支鏈上具有環 己基之丙烯基聚合物皆與纖維素樹脂之相溶性優良。 這些具有羥基之丙烯酸或甲基丙烯酸酯單體並非均聚 物,係爲共聚物之構成單位。此時,較佳爲具有羥基之丙 -92- 200907491 烯酸或甲基丙烯酸酯單體單位於丙烯基聚合物中之含有量 爲2〜2 0質量%爲佳。 又,亦可使用於支鏈具有羥基之聚合物。作爲具有羥 基之單體單位,與前述之單體同樣,但以丙烯酸或甲基丙 烯酸酯爲佳,例如可舉出丙烯酸(2 -羥基乙基)、丙烯酸 (2-羥基丙基)、丙烯酸(3-羥基丙基)、丙烯酸(4-羥 基丁基)、丙烯酸(2-羥基丁基)、丙烯酸-P-羥基甲基苯 基、丙烯酸-P- ( 2-羥基乙基)苯基、或這些丙烯酸取代爲 甲基丙烯酸者,較佳爲丙烯酸-2 -羥基乙基及甲基丙烯酸_ 2 -羥基乙基。聚合物中具有羥基之丙烯酸酯或甲基丙烯酸 酯單體單位於聚合物中之含有量爲2〜20質量%時爲佳, 較佳爲2〜1 0質量%。 如前述,聚合物爲含有具有上述羥基之單體單位2〜 20質量%者,必然與纖維素酯之相溶性、保留性、尺寸安 定性優良,透濕度不僅小,且作爲偏光板保護薄膜與偏光 子之黏著性特優,具有提高偏光板之耐久性的效果。 使丙烯基聚合物之主鏈的至少一方末端上具有羥基之 方法,特別爲使主鏈末端上具有羥基之方法即可,並無特 別限定,可舉出使用具有如偶氮雙(2-羥基乙基丁酸酯) 之羥基的自由基聚合啓始劑之方法、使用具有如2-氫硫基 乙醇之羥基的連鎖移動劑之方法、使用具有羥基之聚合停 止劑的方法、藉由活性離子聚合使末端具有羥基之方法、 如特開2000-128911號公報或特開2000-344823號公報之 具有一個硫醇基與2級之羥基之化合物、或使用倂用該化 -93 - 200907491 合物與有機金屬化合物之聚合觸媒的聚合方法等而得 到,特別以該公報所記載的方法爲佳° 有關該公報記載之方法所製作之聚合物作爲綜硏化學 公司製之ACTFLOW·系列被販賣’且適用於本發明。上 述之於末端具有羥基之聚合物及/或於支鏈具有羥基之聚 合物,於本發明中,對於纖維素酯之聚合物相溶性、透明 性有顯著提高之效果。 且,作爲對於延伸方向顯示負配向複折射性之乙烯性 不飽和單體,使用苯乙烯類之聚合物時可表現負折射性故 較佳。作爲苯乙烯類,例如,苯乙烯、甲基苯乙烯、二甲 基苯乙烯、三甲基苯乙烯、乙基苯乙烯、異丙基苯乙烯、 氯甲基苯乙烯、甲氧基苯乙稀、乙酸基苯乙稀、氯苯乙稀 、二氯苯乙烯、溴苯乙烯、乙烯安息香酸甲酯等,但並限 定於此。 可與作爲前述不飽和乙烯性單體所舉例之單體進行共 聚合,且以控制複折射性之目的下,可使用2種以上之上 述聚合物溶解於纖維素酯中而使用。 且,纖維素酯薄膜爲含有將分子内不具有芳香環與親 水性基之乙烯性不飽和單體Xa與分子内不具有芳香環, 而具有親水性基之乙烯性不飽和單體Xb經共聚合所得之 重量平均分子量5 000以上30000以下的聚合物X,與較 佳爲不具有芳香環之乙烯性不飽和單體Ya經聚合所得之 重量平均分子量500以上3000以下的聚合物Y。 -94- 200907491 (聚合物X、聚合物Y) 本發明所使用的聚合物X爲,將分子内不具有芳香環 與親水性基之乙烯性不飽和單體Xa、與分子内不具有芳 香環而具有親水性基之乙烯性不飽和單體Xb經共聚合後 所得之重量平均分子量5000以上,30000以下的聚合物。 較佳爲,Xa爲分子内不具有芳香環與親水性基之丙 燦基或甲基丙烯酸單體’ Xb爲分子内不具有芳香環,而 具有親水性基之丙烯基或甲基丙烯酸單體。 聚合物X如下述一般式(7)所示。 -(Xa) m- C Xb) η- ( Xc) ρ- ... ( 7 ) 更佳爲下述一般式(8)所示之聚合物。 -〔CH2-C ( -R1) ( -C02R2)〕m_〔 CH2-C ( -R3) (-C02R4-0H ) - ) n- [ Xc ] p- ... ( 8 ) (式中,Ri、R3表示H或CH3。R2表示碳數i〜12的烷 基、環烷基。r4表示-CH2-、_c2h4•或_C3h6_。Xe表示於 Xa、Xb可聚合之單體單位。!!及p表示莫耳組成比。 但,m#〇' η參〇、k參〇、m+n+p=1〇〇)。 本發明中,作爲構成丙烯酸系聚合物X之單體單位的 單體可舉出下述,但不限定於此^ 丙烯酸系聚合物X中’所謂親水性基爲具有淫基、環 -95- 200907491 氧乙烷連鎖之基。 分子内不具有芳香環與親水性基之乙烯性不飽和單體 Xa,例如可舉出丙烯酸甲酯、丙烯酸乙酯、丙烯酸丙基( i-、n-)、丙烯酸丁酯(n-、i-、s-、t-)、丙烯酸戊基( n-、i-、s-)、丙烯酸己基(n-、i-)、丙烯酸庚基(n-、 i-)、丙烯酸辛基(n-、i-)、丙烯酸壬基(n-、i-)、丙 烯酸肉豆蔻基(n-、i-)、丙烯酸(2 -乙基己基)、丙烯 酸(ε -己內酯)等、或將上述丙烯酸酯改爲甲基丙烯酸酯 者。 其中,以丙烯酸甲酯、丙烯酸乙酯、甲基丙烯酸甲酯 、甲基丙烯酸乙酯、甲基丙烯酸丙基(i-、η-)爲佳。 分子内不具有芳香環,具有親水性基之乙烯性不飽和 單體Xb,作爲具有羥基之單體單位,以丙烯酸或甲基丙 稀酸酯爲佳,例如可舉出丙烯酸(2-羥基乙基)、丙稀酉变 (2-羥基丙基)、丙烯酸(3-羥基丙基)、丙烯酸(4-翔 基丁基)、丙烯酸(2 -羥基丁基)、或將這些丙烯酸取代 爲甲基丙烯酸者,較佳爲丙烯酸(2 -羥基乙基)、及甲基 丙稀酸(2_羥基乙基)、丙烯酸(2_羥基丙基)'丙燦酸 (3 -羥基丙基)。 作爲Xc ’僅爲Xa、Xb以外者,且可共聚合之乙烯性 不飽和單體即可’並無特別限定,但具有芳香環者爲佳。The glycolate plasticizer is not particularly limited, but an alkylphthalic acid alkyl glycolate is preferred. Examples of the alkylphthalic acid alkyl glycolate include methyl phthalyl methyl glycolate, ethyl phthalic acid ethyl glycolate, and propyl phthalate. Mercaptopropyl glycolate, butyl phthalyl butyl glycolate, octyl phthalyl octyl glycolate, methyl phthalyl ethyl glycolate, ethyl Benzoyl methyl glycolate, ethyl phthalyl propyl glycolate, methyl phthalyl butyl glycolate, ethyl phthalate butyl glycolate, butyl O-phthalyl methyl glycolate, butyl phthalyl ethyl glycolate, propyl phthalyl butyl glycolate, butyl phthalyl propyl glycolate , methylphthalic acid octyl glycolate, ethyl phthalic acid-88-200907491 octyl glycolate, octyl phthalyl methyl glycolate, octyl phthalate Ethyl glycolate or the like. Examples of the phthalate-based plasticizer include diethyl phthalate, dimethoxyethyl phthalate, dimethyl phthalate, dioctyl phthalate, and dibutyl phthalic acid. Ester, di-2-ethylhexyl decanoate, dioctyl phthalate, dicyclohexyl decanoate, dicyclohexyl terephthalate, and the like. Examples of the citrate-based plasticizer include ethoxylated trimethyl citrate, ethionyl triethyl citrate, and ethyl tributyl citrate. Examples of the fatty acid ester-based plasticizer include butyl oleate, ricinoleic acid methyl ethyl sulfonate, and dibutyl sebacate. A polycarboxylic acid ester type plasticizer can also be used. Specifically, it is preferred to add the polycarboxylate described in paragraph numbers [0015] to [0202] of JP-A-2002-265639 as one of plasticizers. Further, as other plasticizers, a phosphate-based plasticizer can be used, and examples thereof include triphenyl phosphate, tricresol phosphate, cresol diphenyl phosphate, octyl diphenyl phosphate, and diphenyl linkage. Phenyl phosphate, trioctyl phosphate 'tributyl phosphate, and the like. Other examples include the propylene-based polymer described in JP-A-2003-12858. <Propylene-based polymer> The cellulose ester film is preferably a propylene-based polymer containing a weight average molecular weight of from 500 to 30,000 or more which exhibits a negative complex birefringence in the extending direction. -89-200907491 When the weight average molecular weight of the polymer is 500 or more and 30,000 or less, when the composition of the polymer is controlled, the cellulose ester can be made compatible with the polymer. In particular, the propylene-based polymer, the propylene-based polymer having an aromatic ring in a branched chain or the propylene-based polymer having a cyclohexyl group in a branched chain may preferably have a weight average molecular weight of 500 or more and 1,000,000 or less, in addition to the above. The cellulose ester film after film formation is excellent in transparency and extremely low in moisture permeability, and can exhibit excellent performance as an antireflection film. The polymer has a weight average molecular weight of 500 or more and 30,000 or less, and can be considered as an oligomer to a low molecular weight polymer. The synthesis of such a polymer makes it difficult to control the molecular weight in general polymerization, and it is expected to use a method of controlling the molecular weight as much as possible without excessive molecular weight. As a related polymerization method, a method of using a peroxide polymerization initiator such as cumene peroxide or a third butyl hydroperoxide, a method of using a polymerization initiator other than a general polymerization, and a polymerization initiator are used. a method of using a chain mobilizing agent such as a sulfhydryl compound or carbon tetrachloride, or a method of using a polymerization stopper such as benzoquinoline or dinitrobenzene other than a polymerization initiator, and having a special opening 2000-1 289 1 1 A method of blocking a compound of a thiol group and a secondary hydroxy group described in JP-A-2000-3448-23, or a block polymerization method using a polymerization catalyst of the compound and an organometallic compound. The above is applicable, but it is particularly preferable to use the method described in the publication. Further, the propylene-based polymer is a homopolymer or copolymer of acrylic acid or alkyl methacrylate which does not have a monomer unit containing an aromatic ring or a cyclohexyl group. The propylene-based polymer having an aromatic ring on the branch is a propylene-based polymer which must contain an acrylic or methacrylic monomer unit having an aromatic ring of -90-200907491. Further, the propylene-based polymer having a cyclohexyl group on the branched chain is a propylene-based polymer containing an acrylic acid or methacrylic acid ester monomer unit having a cyclohexyl group. Examples of the acrylate monomer having no aromatic ring or cyclohexyl group include methyl acrylate, ethyl acrylate, propyl acrylate (i-, η-), and butyl acrylate (n-, i-, s-, T-), pentyl acrylate (n-, i-, s-), hexyl acrylate (n-, i-), heptyl acrylate (n-, i-), octyl acrylate (n-, i-), Acrylic acid acrylate, acrylic acid myristyl (n-, i-), acrylic acid (2-ethylhexyl), acrylic acid (ε-caprolactone), acrylic acid (2-hydroxyethyl), acrylic acid (2-hydroxypropyl) ), acrylic acid (3-hydroxypropyl), acrylic acid (4-hydroxybutyl), acrylic acid (2-hydroxybutyl), acrylic acid (2-methoxyethyl), acrylic acid (2-ethoxyethyl) Or, the above acrylate is changed to a methacrylate. The propylene-based polymer is a homopolymer or a copolymer of the above monomers, and has a methyl acrylate monomer unit of 30 mass. The above is preferable, and it is more preferable that the monomer having methyl methacrylate is 40% by mass or more. In particular, a homopolymer of methyl acrylate or methyl methacrylate is preferred. Examples of the acrylic or methacrylic ester monomer having an aromatic ring include phenyl acrylate, phenyl methacrylate, acrylic acid (2 or 4-chlorophenyl), and methacrylic acid (2 or 4-chlorophenyl). ), acrylic acid (2 or 3 or 4-ethoxycarbonylphenyl), methacrylic acid (2 or 3 or 4-ethoxy-91 - 200907491 carbonyl phenyl), acrylic acid (〇 or m or p-tolyl) ), methacrylic acid (〇 or m or p-tolyl), benzyl acrylate, benzyl methacrylate, phenylethyl acrylate, phenylethyl methacrylate, acrylic acid (2-naphthyl), etc. Preferably, benzyl acrylate, benzyl methacrylate, phenylethyl acrylate or phenethyl methacrylate is preferred. In the propylene group-containing polymer having a square ring on the branch, the monomer having acrylic or methacrylic acid having an aromatic ring is 20 to 40% by mass, and has an acrylic acid or methyl methacrylate monomer unit of 50 to 80 mass. % is better. In the polymer, it is preferred that the monomer having acrylic acid or methacrylic acid having a hydroxyl group is 2 to 20% by mass. Examples of the acrylate monomer having a cyclohexyl group include cyclohexyl acrylate, cyclohexyl methacrylate, acrylic acid (4-methylcyclohexyl), methacrylic acid (4-methylcyclohexyl), and acrylic acid ( 4-Ethylcyclohexyl), methacrylic acid (4-ethylcyclohexyl), etc., preferably cyclohexyl acrylate and cyclohexyl methacrylate are used. The propylene-based polymer having a cyclohexyl group in the branch contains 20 to 40% by mass of the monomer unit of the acrylic acid or methacrylate having a cyclohexyl group, and preferably 50 to 80% by mass. Further, the polymer preferably contains 2 to 20% by mass of the acrylic acid or methacrylic acid monomer unit having a hydroxyl group. The polymer obtained by polymerizing the above ethylenically unsaturated monomer, the propylene-based polymer, the propylene-based polymer having an aromatic ring on the branch, and the propylene-based polymer having a cyclohexyl group on the branch are excellent in compatibility with the cellulose resin. . These acrylic or methacrylic acid ester monomers having a hydroxyl group are not homopolymers and are constituent units of the copolymer. In this case, it is preferred that the content of the C-92-200907491 olefinic acid or methacrylic acid ester monomer having a hydroxyl group in the propylene-based polymer is preferably 2 to 20% by mass. Further, it can also be used for a polymer having a hydroxyl group in a branched chain. The monomer unit having a hydroxyl group is the same as the above-mentioned monomer, but preferably acrylic acid or methacrylate, and examples thereof include (2-hydroxyethyl) acrylate, (2-hydroxypropyl) acrylate, and acrylic acid (for example). 3-hydroxypropyl), (4-hydroxybutyl) acrylate, (2-hydroxybutyl) acrylate, P-hydroxymethylphenyl acrylate, P-(2-hydroxyethyl) phenyl acrylate, or These acrylic acid are substituted with methacrylic acid, preferably 2-hydroxyethyl acrylate and -2-hydroxyethyl methacrylate. The content of the acrylate or methacrylate monomer having a hydroxyl group in the polymer is preferably from 2 to 20% by mass, preferably from 2 to 10% by mass. As described above, the polymer is 2 to 20% by mass of the monomer unit having the above-mentioned hydroxyl group, and is inevitably excellent in compatibility with cellulose ester, retention, dimensional stability, and low moisture permeability, and is used as a polarizing plate protective film and The polarizer has excellent adhesion and has the effect of improving the durability of the polarizing plate. The method of providing a hydroxyl group in at least one terminal of the main chain of the propylene-based polymer is not particularly limited, and a method of providing a hydroxyl group at the terminal of the main chain is not particularly limited, and examples thereof include using azobis(2-hydroxyl group). A method of radically polymerizing a starting agent for a hydroxyl group of ethyl butyrate, a method using a chain shifting agent having a hydroxyl group such as 2-hydrothioethanol, a method using a polymerization stopper having a hydroxyl group, and a reactive ion A method of polymerizing a terminal having a hydroxyl group, a compound having a thiol group and a hydroxyl group of 2, or a compound of the formula - 93-200907491, which is disclosed in JP-A-2000-128911 or JP-A-2000-344823 It is obtained by a polymerization method of a polymerization catalyst of an organometallic compound, and the like, and it is preferable to use the method described in the above-mentioned publication. The polymer produced by the method described in the above-mentioned publication is sold as the ACTFLOW series manufactured by the Kyoritsu Chemical Co., Ltd. It is also applicable to the present invention. In the present invention, the polymer having a hydroxyl group at the terminal and/or the polymer having a hydroxyl group in the branched chain has an effect of remarkably improving the compatibility and transparency of the polymer of the cellulose ester. Further, as the ethylenically unsaturated monomer exhibiting a negative alignment birefringence in the extending direction, it is preferred to use a styrene-based polymer to exhibit negative refractive properties. As styrene, for example, styrene, methyl styrene, dimethyl styrene, trimethyl styrene, ethyl styrene, isopropyl styrene, chloromethyl styrene, methoxy styrene , but not limited to, acetic acid styrene, chlorostyrene, dichlorostyrene, bromostyrene, methyl benzoic acid methyl ester, and the like. It is possible to copolymerize with the monomer exemplified as the unsaturated ethylenic monomer, and to use two or more kinds of the above polymer to be dissolved in the cellulose ester for the purpose of controlling the birefringence. Further, the cellulose ester film contains an ethylenically unsaturated monomer Xa having no aromatic ring and a hydrophilic group in the molecule, and an ethylenically unsaturated monomer Xb having a hydrophilic group in the molecule and having a hydrophilic group. The polymer X obtained by polymerization and having a weight average molecular weight of 5,000 or more and 30,000 or less is preferably a polymer Y having a weight average molecular weight of 500 or more and 3000 or less obtained by polymerization of the ethylenically unsaturated monomer Ya having no aromatic ring. -94-200907491 (Polymer X, Polymer Y) The polymer X used in the present invention is an ethylenically unsaturated monomer Xa having no aromatic ring and hydrophilic group in the molecule, and no aromatic ring in the molecule. The polymer having a weight average molecular weight of 5,000 or more and 30,000 or less obtained by copolymerization of the hydrophilic group-containing ethylenically unsaturated monomer Xb. Preferably, Xa is a propylene group or a methacrylic monomer having no aromatic ring and a hydrophilic group in the molecule. Xb is a propylene or methacrylic monomer having a hydrophilic group and having a hydrophilic group. . The polymer X is represented by the following general formula (7). - (Xa) m - C Xb) η - ( Xc) ρ - ( 7 ) More preferably, it is a polymer represented by the following general formula (8). -[CH2-C ( -R1) ( -C02R2)]m_[ CH2-C ( -R3) (-C02R4-0H ) - ) n- [ Xc ] p- ( 8 ) (wherein Ri, R3 represents H or CH3. R2 represents an alkyl group having a carbon number of i to 12, and a cycloalkyl group. r4 represents -CH2-, _c2h4• or _C3h6_. Xe represents a monomer unit which can be polymerized in Xa and Xb. Indicates the molar composition ratio. However, m#〇' η 〇 〇, k 〇 〇, m+n+p=1〇〇). In the present invention, the monomer constituting the monomer unit of the acrylic polymer X is as follows. However, the present invention is not limited thereto. The acrylic polymer X has a so-called hydrophilic group having a thiol group and a ring-95- 200907491 Oxygen ethane linkage base. Examples of the ethylenically unsaturated monomer Xa having no aromatic ring and hydrophilic group in the molecule include methyl acrylate, ethyl acrylate, propyl acrylate (i-, n-), and butyl acrylate (n-, i). -, s-, t-), pentyl acrylate (n-, i-, s-), hexyl acrylate (n-, i-), heptyl acrylate (n-, i-), octyl acrylate (n- , i-), fluorenyl acrylate (n-, i-), acrylic myristate (n-, i-), acrylic acid (2-ethylhexyl), acrylic acid (ε-caprolactone), etc., or The acrylate is changed to methacrylate. Among them, methyl acrylate, ethyl acrylate, methyl methacrylate, ethyl methacrylate, and propyl methacrylate (i-, η-) are preferred. The ethylenically unsaturated monomer Xb having no aromatic ring and having a hydrophilic group in the molecule, and as the monomer unit having a hydroxyl group, acrylic acid or methyl acrylate is preferable, and for example, acrylic acid (2-hydroxyethyl) is exemplified. Base, acetonitrile (2-hydroxypropyl), acrylic acid (3-hydroxypropyl), acrylic acid (4-c-butylbutyl), acrylic acid (2-hydroxybutyl), or substituted with acrylic acid The acrylate is preferably acrylic acid (2-hydroxyethyl), methyl methacrylate (2-hydroxyethyl), acrylic acid (2-hydroxypropyl) 'propionic acid (3-hydroxypropyl). The Xc' is only a part other than Xa or Xb, and the ethylenically unsaturated monomer which can be copolymerized is not particularly limited, but it is preferably an aromatic ring.

Xa、Xb及XC之莫耳組成比爪:η以99: 1〜65: 35 之範圍爲佳,更佳爲95 : 5〜75 : 25之範圍。Xc的ρ爲〇 10 ° Xc爲複數單體單位即可。 -96- 200907491The moir composition ratio of Xa, Xb and XC is preferably in the range of 99:1 to 65:35, more preferably 95:5 to 75:25. The ρ of Xc is 〇 10 ° Xc is a plural monomer unit. -96- 200907491

Xa之莫耳組成比過多時’與纖維素醋之相溶性會改 善,但會使薄膜厚度方向滞留値(Rt )値變大。Xb之莫 耳組成比過多時,上述相溶性變差使厚度方向滯留値(Rt )減低之效果會提高。又’ Xb之莫耳組成比若超過上述 範圍時,製膜時會有出現霧之傾向,由Xa、Xb之莫耳組 成比之設定來達到這些最適化。 聚合物X之分子量爲重量平均分子量5000以上 30000以下,更佳爲8000以上25000以下。 重量平均分子量若爲5 0 00以上時,可得到纖維素酯 薄膜於高溫高濕下的尺寸變化較少,作爲偏光板保護薄膜 之彎曲較少等優點故較佳。重量平均分子量爲3 0000以内 時’與纖維素酯之相溶性會更提高,可抑制高溫高濕下之 外滲,以及製膜直後之霧產生。 聚合物X之重量平均分子量可由公知分子量調節方法 進行調整。作爲如此分子量調節方法,例如可舉出添加四 氯化碳、月桂基硫醇、硫代二醇酸辛基等連鎖移動劑之方 法等。又’聚合溫度一般爲室溫至130 t:,較佳爲50 T:至 100 °C下進行’但可調整該溫度或聚合反應時間。 繼續’聚合物Y爲,將不具有芳香環之乙烯性不飽和 單體Ya經聚合所得之重量平均分子量5〇〇以上,3000以 下的聚合物。 其中,聚合物Y之重量平均分子量爲5〇〇以上時,會 減少聚合物之殘存單體’故較佳。又,聚合物γ之重量平 均分子量爲3 0 00以下時,可維持厚度方向滯留値(Rt ) -97- 200907491 値之降低性能故較佳。When the molar composition ratio of Xa is too large, the compatibility with cellulose vinegar is improved, but the film thickness direction 値(Rt) 値 becomes large. When the molar composition ratio of Xb is too large, the above-mentioned compatibility is deteriorated, and the effect of reducing the thickness direction enthalpy (Rt) is improved. Further, when the molar composition ratio of Xb exceeds the above range, fogging tends to occur during film formation, and the composition of Xa and Xb is set to achieve these optimization. The molecular weight of the polymer X is a weight average molecular weight of 5,000 or more and 30,000 or less, more preferably 8,000 or more and 25,000 or less. When the weight average molecular weight is 500 or more, the cellulose ester film can be obtained with less dimensional change under high temperature and high humidity, and is preferable because it has less advantages such as less bending of the polarizing plate protective film. When the weight average molecular weight is less than 30,000, the compatibility with the cellulose ester is improved, and the extravasation under high temperature and high humidity can be suppressed, and the mist generated immediately after the film formation can be suppressed. The weight average molecular weight of the polymer X can be adjusted by a known molecular weight adjustment method. As such a method of adjusting the molecular weight, for example, a method of adding a chain shifting agent such as carbon tetrachloride, lauryl mercaptan or octyl thioglycolate may be mentioned. Further, the polymerization temperature is usually from room temperature to 130 t:, preferably from 50 T: to 100 °C, but the temperature or polymerization time can be adjusted. The polymer Y is a polymer having a weight average molecular weight of 5 Å or more and 3,000 or less obtained by polymerizing the ethylenically unsaturated monomer Ya having no aromatic ring. Among them, when the weight average molecular weight of the polymer Y is 5 Å or more, the residual monomer of the polymer is reduced, which is preferable. Further, when the weight average molecular weight of the polymer γ is 300 or less, it is preferable to maintain the reduction in the thickness direction enthalpy (Rt) -97 to 200907491.

Ya較佳爲不具有芳香環之丙烯基或甲基丙烯酸單體 〇 聚合物Y爲下述一般式(9)所示。 -(Ya) k- ( Yb) q- ... ( 9 ) 更佳爲爲下述一般式(l〇)所示聚合物。 -〔CH2-C ( -R5) ( -C〇2R6)〕k-〔 Yb〕q-…(1 0 ) (式中,R5表示H或CH3〇R6表示碳數1〜12的烷基或 環烷基。Yb表示可與Ya共聚合之單體單位。k及q表示 莫耳組成比。但,k^O、k+q=l〇〇)。Ya is preferably a propylene group or a methacrylic monomer having no aromatic ring. 聚合物 Polymer Y is represented by the following general formula (9). -(Ya) k-( Yb) q- (9 ) More preferably, it is a polymer represented by the following general formula (l〇). -[CH2-C(-R5)(-C〇2R6)]k-[Yb]q-...(1 0 ) (wherein R5 represents H or CH3〇R6 represents an alkyl group or a ring having 1 to 12 carbon atoms; Alkyl group. Yb represents a monomer unit copolymerizable with Ya. k and q represent a molar composition ratio. However, k^O, k+q=l〇〇).

Yb僅爲可與Ya進行共聚合之乙烯性不飽和單體即可 ,並無特別限定。Yb可爲複數。k+q=100,q較佳爲〇 〜3 0。 構成將不具有芳香環之乙烯性不飽和單體經聚合所得 之聚合物Y之乙烯性不飽和單體Ya,作爲丙烯酸酯,例 如可舉出丙烯酸甲酯、丙烯酸乙酯、丙烯酸丙基(i-、η-)、丙嫌酸丁酯(n-、i-、s-、t-)、丙稀酸戊基(n-、i-、s-)、丙烯酸己基(n-、i-)、丙烯酸庚基(n-、i-)、 丙烯酸辛基(n-、i-)、丙烯酸壬基(n-、i-)、丙烯酸肉 豆蔻基(n-、i-)、丙烯酸環己酯、丙烯酸(2_乙基己基 -98- 200907491 )、丙烯酸(ε -己內酯)、丙烯酸(2 -羥基乙基)、丙烯 酸(2-羥基丙基)、丙烯酸(3-羥基丙基)、丙烯酸(4-羥基丁基)、丙烯酸(2 -羥基丁基),作爲甲基丙烯酸酯 可舉出將上述丙烯酸酯改變爲甲基丙烯酸酯者;作爲不飽 和酸’例如可舉出丙烯酸、甲基丙烯酸、馬來酸酐、巴豆 酸、衣康酸等。Yb is only an ethylenically unsaturated monomer copolymerizable with Ya, and is not particularly limited. Yb can be plural. k+q=100, q is preferably 〇~3 0. The ethylenically unsaturated monomer Ya of the polymer Y obtained by polymerizing an ethylenically unsaturated monomer having no aromatic ring, and examples of the acrylate include methyl acrylate, ethyl acrylate, and propyl acrylate (i). -, η-), butyl butyl acrylate (n-, i-, s-, t-), pentyl acrylate (n-, i-, s-), hexyl acrylate (n-, i-) , heptyl acrylate (n-, i-), octyl acrylate (n-, i-), fluorenyl acrylate (n-, i-), acrylic myristyl (n-, i-), cyclohexyl acrylate Acrylic acid (2-ethylhexyl-98-200907491), acrylic acid (ε-caprolactone), acrylic acid (2-hydroxyethyl), acrylic acid (2-hydroxypropyl), acrylic acid (3-hydroxypropyl), Acrylic acid (4-hydroxybutyl), acrylic acid (2-hydroxybutyl), the methacrylate is exemplified by changing the above acrylate to methacrylate; and as the unsaturated acid, for example, acrylic acid, A Acrylic acid, maleic anhydride, crotonic acid, itaconic acid, and the like.

Yb僅爲與Ya可共聚合之乙烯性不飽和單體即可’並 無特別限定,作爲乙烯酯,例如可舉出乙酸乙烯酯、丙酸 乙烯酯、丁酸乙烯酯、戊酸乙烯酯、三甲基乙酸乙烯酯、 己酸乙烯酯、癸酸乙烯酯、月桂酸乙烯酯、肉豆蔻酸乙烯 酯、棕櫚酸乙烯酯、硬脂酸乙烯酯、環己烷羧酸乙烯酯、 辛基酸乙烯酯、甲基丙烯酸乙烯酯、巴豆酸乙烯酯、山梨 酸乙烯酯、桂皮酸乙烯酯等爲佳。Yb可爲複數。 合成聚合物X、及聚合物γ時,一般聚合中難以控制 分子量’可望使用不會使分子量過大之方法下,儘可能控 制分子量之方法。 作爲聚合物X、及聚合物Y的聚合方法,可使用如過 氧化枯烯或氫過氧化第三丁基之過氧化物聚合啓始劑的方 法、使用比一般聚合還多量的聚合啓始劑之方法、聚合啓 始劑以外使用其他氫硫基化合物或四氯化碳等連鎖移動劑 之方法、使用除聚合啓始劑以外如苯並喹啉或二硝基苯之 聚合停止劑的方法、更如特開2000- 1 2 8 9 1 1號公報或特開 2000-3 44 823號公報之具有一個硫醇基與2級之羥基之化 合物、或使用倂用該化合物與有機金屬化合物之聚合觸媒 -99- 200907491 的嵌段聚合方法等。 聚合物Y爲,將分子中具有硫醇基與2 物作爲連鎖移動劑使用的聚合方法爲佳。此 的末端上會具有聚合觸媒及連鎖移動劑所引 醚。藉由該末端殘基,可調整聚合物γ與纖 性。 聚合物X及聚合物Y之羥基價以3 0〜1 〕爲佳。 其中’羥基價之測定可依據JIS K 0070 。該羥基價定義爲,將試料lg進行乙醯基 與羥基結合之乙酸所需的氫氧化鉀mg數。 X g (約1 g )以燒瓶精準稱取後,於此正確地 試藥(於乙酸酐20ml中加入吡啶使其成爲 2 0ml。於燒瓶口裝上空氣冷卻管,於95〜1 中進行加熱。經1小時3 0分鐘後冷卻,由 入純水1 ml ’將乙酸酐分解成乙酸。其次使 裝置以〇.5mol/L氫氧化鉀乙醇溶液進行滴 定曲線的變曲點作爲終點。且作爲空白試驗 下進行滴定,求得滴定曲線之變曲點。羥基 算出。 羥基價={ (B-C) xfx 28.05/x}Yb is not particularly limited as long as it is an ethylenically unsaturated monomer copolymerizable with Ya. Examples of the vinyl ester include vinyl acetate, vinyl propionate, vinyl butyrate, and vinyl valerate. Trimethyl vinyl acetate, vinyl hexanoate, vinyl decanoate, vinyl laurate, vinyl myristate, vinyl palmitate, vinyl stearate, vinyl cyclohexanecarboxylate, octyl acid Vinyl ester, vinyl methacrylate, vinyl crotonate, vinyl sorbate, vinyl cinnamate, etc. are preferred. Yb can be plural. When the polymer X and the polymer γ are synthesized, it is difficult to control the molecular weight in the polymerization. It is expected to use a method of controlling the molecular weight as much as possible without excessive molecular weight. As the polymerization method of the polymer X and the polymer Y, a method of using a peroxide polymerization initiator such as cumene peroxide or a third butyl hydroperoxide, and using a polymerization initiator other than the general polymerization can be used. a method of using a chain shifting agent such as another hydrosulfide compound or carbon tetrachloride other than a polymerization initiator, and a method of using a polymerization stopper such as benzoquinoline or dinitrobenzene other than a polymerization initiator, Further, a compound having a thiol group and a hydroxyl group of the second order, or a polymerization of the compound and the organometallic compound using hydrazine, is disclosed in JP-A-2000- 1 2 8 9 1 1 or JP-A-2000-3 44 823 Catalyst-99-200907491 Block polymerization method, etc. The polymer Y is preferably a polymerization method in which a thiol group and a compound in the molecule are used as a chain shifting agent. At the end of this, there will be an ether derived from a polymerization catalyst and a chain transfer agent. The polymer γ and the fiber can be adjusted by the terminal residue. The valence of the hydroxyl groups of the polymer X and the polymer Y is preferably from 3 to 10%. Wherein the determination of the hydroxyl number can be based on JIS K 0070. The hydroxyl value is defined as the number of mg of potassium hydroxide required for the sample lg to be subjected to acetic acid in which an ethyl group is bonded to a hydroxyl group. After X g (about 1 g) was accurately weighed in a flask, the reagent was correctly tested (add pyridine to 20 ml of acetic anhydride to make it into 20 ml. Install an air cooling tube at the mouth of the flask and heat it in 95~1. After 1 hour and 30 minutes, it was cooled, and the acetic anhydride was decomposed into acetic acid by 1 ml of pure water. Secondly, the device was measured as the end point of the titration curve of the titration curve of 〇.5 mol/L potassium hydroxide ethanol solution. The titration was carried out under the blank test, and the curve of the titration curve was obtained. The hydroxyl group was calculated. The hydroxyl value = { (BC) xfx 28.05/x}

(式中,B表示使用於空白試驗之〇_5mol/L 級羥基之化合 時,聚合物 Y 起的羥基、硫 維素酯之相溶 50 [ mgKOH/g (1 992 )進行 化時,欲中和 具體爲將試料 加入乙醯基化 ,400ml 者) 0 0 °c之甘油浴 空氣冷卻管加 用電位差滴定 定,所得之滴 爲未放入試料 價如以下式子 l· D 氫氧化鉀乙醇 -100- 200907491 溶'液的量(ml)、(:表示使用於滴定之0.5 mo 1/L的氫氧化 鉀乙醇溶液量(m 1 ) 、f表示0 · 5 m ο 1 / L氫氧化鉀乙醇溶液 之因數、D表示酸價、又28 〇5表示氫氧化鉀之im〇1量 56.1 1 的 1 /2 ) 聚合物X與聚合物γ之纖維素酯薄膜中的含有量以 滿足下述式(i)、式(ii)之範圍者爲佳。聚合物X之含 有量作爲xg (質量% =聚合物χ之質量/纖維素酯之質量 χ10〇)、聚合物Υ的含有量作爲3^(質量%), 式(i) 5 各 Xg+yg$35(質量 0/〇) 式(ii) 0.05gyg/ ( xg + yg) ^0.4 式(i )之較佳範圍爲1 〇〜2 5質量%。 且’聚合物之重量平均分子量Mw可使用凝膠滲透層 析法進行測定。 測定條件如以下所示。 溶劑: 二氯甲烷(In the formula, when B is used in the combination of the 〇5 mol/L hydroxy group in the blank test, when the hydroxyl group and the sulphate ester from the polymer Y are 50 [mgKOH/g (1 992), The neutralization is specifically to add the sample to the acetylation, 400 ml of the 0 0 °c glycerin bath air cooling tube plus the potentiometric titration, the resulting drop is not placed in the sample price as the following formula l· D potassium hydroxide Ethanol-100- 200907491 The amount of solution (ml), (: indicates the amount of potassium hydroxide ethanol solution (m 1 ) used for titration of 0.5 mo 1 / L, f represents 0 · 5 m ο 1 / L oxidized The factor of potassium ethanol solution, D represents the acid value, and another 28 〇5 represents the amount of potassium hydroxide, the amount of im 〇1 56.1 1 of 1 /2) the content of the polymer X and the cellulose ester film of the polymer γ to meet the next The range of the formula (i) and the formula (ii) is preferred. The content of the polymer X is xg (% by mass = mass of the polymer oxime / mass of the cellulose ester χ 10 〇), and the content of the polymer ruthenium is 3 (% by mass), and each of the formula (i) 5 is Xg + yg $35 (mass 0/〇) Formula (ii) 0.05gyg/(xg + yg) ^0.4 The preferred range of the formula (i) is 1 〇 to 2 5 mass%. Further, the weight average molecular weight Mw of the polymer can be measured by a gel permeation chromatography method. The measurement conditions are as follows. Solvent: dichloromethane

管柱: Shodex K806、 K805、 K803G (使用連接3根昭和電工股份有限公司製)Pillar: Shodex K806, K805, K803G (use 3 connections to Showa Denko Co., Ltd.)

管柱溫度:2 5 °C 試料濃度:〇 · 1質量% 檢測器:RI Model 504 ( GLScience 公司製) 幫浦: L6000 (日立製作所股份有限公司製) 流量·· l.Oml/minColumn temperature: 2 5 °C Sample concentration: 〇 · 1% by mass Detector: RI Model 504 (manufactured by GLScience) Pump: L6000 (manufactured by Hitachi, Ltd.) Flow · · l.Oml/min

校對曲線:標準聚苯乙烯S T K 使用standard聚苯乙烯(Tosoh股份有限公司製) -101 - 200907491Proofreading curve: Standard polystyrene S T K using standard polystyrene (Tosoh Corporation) -101 - 200907491

Mw= 1,000,000〜5 00之13個試品所得之校對曲線。13個 試品幾乎使用相等間隔。 聚合物X與聚合物Y的總量僅爲5質量%以上’即可 對厚度方向的滯留値(Rt)的降低發揮充分作用。又’總 量爲3 6質量%以下時與偏光子PV A的黏著性良好。 聚合物X與聚合物Y可作爲構成如後述之膠漿液的 素材而直接添加、溶解、或溶解於預先溶解纖維素酯之有 機溶劑後添加於膠漿液。 纖維素酯薄膜中之上述可塑劑的總含有量’對於固體 成分總量而言,以5〜20質量%爲佳,6〜16質量%爲更佳 ,特佳爲8〜13質量%。又,2種可塑劑之含有量各至少 爲1質量%以上,較佳爲各含有2質量%以上。 含有多元醇類酯系可塑劑1〜1 5質量%爲佳,特別以 3〜11質量%爲佳。多元醇類酯系可塑劑之含有量若過少 會產生平面性劣化,若過多時容易外滲。多元醇類酯系可 塑劑與其他可塑劑之質量比率以1 : 4〜4 : 1之範圍爲佳 ’以1 : 3〜3 : 1爲更佳。可塑劑之添加量過多或過少亦 容易使薄膜變形而不佳。 (溶液流延製膜法) 纖維素酯薄膜之藉由溶液流延製膜法的製造爲,藉由 將纖維素酯、及添加劑溶解於溶劑中調製出膠漿的步驟、 將膠漿於輸送帶狀或滾筒狀之金屬支持體上進行流延之步 驟、將經流延之膠漿作爲網狀物(web )進行乾燥之步驟 -102 - 200907491 、由金屬支持體進行剝離之步驟、進行延伸或寬保持之步 驟、進一步進行乾燥之步驟、捲取經加工後的薄膜之步驟 而進行。 首先,對於調製膠漿的步驟做說明。膠獎中的纖維素 酯濃度爲,濃度較高時於金屬支持體上流延後之乾燥負荷 可減低故較佳,但纖維素酯之濃度若過高時過濾時的負荷 會增加,使過瀘純度變差。作爲可使其兩立之濃度,以10 〜3 5質量%爲佳,更佳爲1 5〜2 5質量%。 膠漿所使用的溶劑可單獨使用或倂用2種以上’但纖 維素酯之良溶劑與弱溶劑經混合後使用時由生產效率的觀 點來看較佳,良溶劑較多時,由纖維素酯的溶解性之觀點 來看較佳。良溶劑與弱溶劑之混合比率的較佳範圍爲’良 溶劑7 0〜9 8質量%,弱溶劑2〜3 0質量%。所謂良溶劑、 弱溶劑爲,可單獨溶解所使用之纖維素酯者定義爲良溶劑 、單獨下可膨潤或無法溶解者定義爲弱溶劑。因此,藉由 纖維素酯的醯基取代度,可改變爲良溶劑或弱溶劑,例如 將丙酮作爲溶劑使用時,纖維素酯之乙酸酯(乙醯基取代 度2.4 )、纖維素乙酸酯丙酸酯成爲良溶劑,纖維素之乙 酸酯(乙醯基取代度2.8 )成爲弱溶劑。 本發明所使用的良溶劑雖無特別限定,可舉出二氯甲 烷等有機鹵化合物或二氧雜戊環類、丙酮、乙酸甲酯、乙 醯乙酸甲酯等。特佳可舉出二氯甲烷或乙酸甲酯。 又’本發明所使用的弱溶劑雖無特別限定,例如可使 用甲醇、乙醇、η-丁醇、環己烷、環己酮等。又,膠漿中 -103- 200907491 含有水0.0 1〜2質量%者爲佳。 調製上述膠發時’作爲纖維素酯之溶解 一般方法。組合加熱與加壓時,可於常壓下 行加熱。以溶劑於常壓下的沸點以上且加壓 沸騰之溫度範圍內一邊加熱’一邊攪拌溶解 膠或稱爲mamaco (結塊)之塊狀未溶解物 佳。又,將纖維素酯與弱溶劑混合成爲濕潤 再添加良溶劑進行溶解之方法亦佳。 加壓可藉由壓入氮氣等惰性氣體的方法 使溶劑之蒸氣壓上昇的方法進行。加熱由外 ,例如外套型者因容易控制溫度故較佳。 添加溶劑之加熱溫度,較高時由纖維素 觀點來看較佳,加熱溫度若過高時,因必須 使生產性變差。較佳加熱溫度爲4 5〜1 2 0 °C, 爲佳,70°C〜l〇5°C爲較佳。又,壓力可調整 溶劑不會沸騰之程度。 又,亦可使用冷卻溶解法,藉此乙酸甲 溶解纖維素酯。 繼續,將該纖維素酯溶液使用濾紙等適 過濾。作爲過濾材,欲除去不溶物等以絶對 者爲佳,但絶對過濾精度過小時’容易產生 問題。因此以絶對過濾精度爲〇.〇〇8mm以下 0.001〜0.008mm之濾材者爲較佳,0.003〜 材者爲更佳。 方法,可使用 於沸點以上進 下不會使溶劑 時’可防止凝 的發生,故較 或膨潤後,可 、或藉由加熱 部進行者爲佳 酯之溶解性的 的壓力過大而 以 60 〜11〇°。 至設定溫度下 酯等溶劑中可 當過濾材進行 過濾精度較小 過濾材阻塞的 的濾材爲佳, 〇.〇〇6mm 之濾 -104- 200907491 濾材之材質並無特別限定,可使用 烯、鐵佛龍(註冊商標)等塑質製之濾 屬製濾材因無纖維脫落等而較佳。藉由 纖維素酯的雜質,特別爲除去、減低亮 本說明書中,所謂亮點異物爲使2 交尼科耳狀態,其間設置纖維素酯薄膜 照射光,由另一方偏光板側進行觀察時 光漏的點(異物),徑爲0.01mm以上 /em2以下爲佳。較佳爲1 〇〇個/cm2以下 以下’特佳爲〇〜10個/cm2以下。又, 點亦少爲佳。 膠漿的過濾可藉由一般方法進行, 沸點以上,且加壓下溶劑不會沸騰之溫 一邊過濾之方法,可減低過濾前後之濾 的上昇而較佳。較佳溫度爲4 5〜1 2 0。(: 佳,4 5〜5 5 °C更佳。 濾壓較小爲佳。濾壓以1.6MPa以 以下時爲較佳,l.OMPa以下時爲更佳。 繼續對於膠漿的流延做說明。 流延(澆鑄)步驟中的金屬支持體 面加工者爲佳,作爲金屬支持體,使用 鑄物進行表面鍍敷加工的轉筒爲佳。 澆鑄寬度可爲1〜4m。流延步驟之 溫度設定爲-50 °C〜溶劑沸騰不發泡之溫 一般的濾材,聚丙 材、或不鏽鋼等金 過濾,含於原料之 點異物而較佳。 片偏光板配置成正 ,自一方偏光板側 ,見到自反對側的 之亮點數以200個 ,更佳爲50個/m2 ’ 0.01mm以下之亮 於溶劑之常壓下的 度範圍內一邊加熱 壓差(稱爲差壓) ,以4 5〜7 (TC爲較 下時爲佳,1 .2 Μ P a 以可對表面進行鏡 以不鏽鋼輸送帶或 金屬支持體的表面 度以下。溫度較高 -105- 200907491 時可使網狀物之乾燥速度加快故較佳,若過高時’網狀物 會發泡、或會使平面性劣化。作爲較佳金屬支持體溫度以 0〜100 °C爲適宜,以5〜30 °c爲更佳。又,藉由冷卻可使 網狀物(web )凝膠化,以含有大量殘留溶劑之狀態下自 金屬支持體剝離亦爲較佳方法。 控制金屬支持體之溫度的方法,雖無特別限定,但可 使用吹入溫風或冷風之方法、或將溫水與金屬支持體裏側 接觸之方法。使用溫水時,可有效率地進行熱之傳達,故 金屬支持體的溫度到達一定之時間較短而較佳。使用溫風 時,考慮到溶劑之蒸發潛熱會使網狀物之溫度降低,使用 溶劑沸點以上之溫風可防止發泡下,亦可使用比目的溫度 還高之風。特別爲自流延至剝離之間,改變金屬支持體之 溫度、及乾燥風之溫度,而有效率地進行乾燥爲佳。 欲使纖維素酯薄膜顯示良好平面性,自金屬支持體剝 離網狀物時的殘留溶劑量以1 0〜1 5 0質量%爲佳,更佳爲 20〜40質量%或60〜130質量%,特佳爲20〜30質量%或 7 0〜1 2 0質量%。 本發明中,殘留溶劑量定義如下述式。 殘留溶劑量(質量%) ={(M-N) /N}xl〇〇 其中’ Μ爲網狀物或薄膜於製造中或製造後的任意時 點所採取之試料質量,Ν爲Μ於1 1 5。(:下進行1小時加熱 後之質量。 -106- 200907491 又,纖維素酯薄膜之乾燥步驟中,將網狀物自金屬支 持體剝離後進行乾燥,使殘留溶劑量爲1質量%以下者爲 佳,更佳爲0.1質量%以下,特佳爲0〜0.0 1質量%以下。 薄膜乾燥步驟中,一般採用以輥乾燥方式(將配置於 上下的多數輥使網狀物(web )交互通過並乾燥之方式) 或拉幅器方式搬送網狀物下進行乾燥之方式。 欲製造本發明之使用於防眩性薄膜的纖維素酯薄膜時 ,自金屬支持體剝離後之網狀物殘留溶劑量較多處馬上於 搬送方向進行延伸,且以將網狀物之兩端以壓板等夾住之 拉幅器方式於寬方向進行延伸爲特佳。於縱方向、橫方向 之兩者的較佳延伸倍率爲1 .01〜1 .3倍,更佳爲1 .05〜 1.15倍爲更佳。藉由縱方向及橫方向延伸,使面積成爲 1 .12〜1 .44倍時爲佳,成爲1 .15〜1·32倍爲更佳。此可藉 由縱方向之延伸倍率X橫方向的的延伸倍率求得。縱方向 與橫方向之延伸倍率皆爲未達1 .0 1倍下形成硬塗佈層時 的紫外線照射會引起平面性劣化。 欲於剝離後馬上於縱方向延伸,藉由剝離張力及其後 之搬送張力進行延伸爲佳。例如剝離張力爲2 1 ON/m以上 下進行剝離爲佳,特佳爲220〜3 OON/m。 乾燥網狀物(web )之手段並無特別限定,一般可藉 由熱風、紅外線、加熱輥、微波等進行,但由簡便之觀點 來看,進行熱風者爲佳。 網狀物的乾燥步驟中之乾燥溫度爲30〜20CTC以段階 性提高方式進行爲佳,50〜1 80 °C之範圍下進行時,可使 -107- 200907491 尺寸安定性良好而更佳。 纖維素酯薄膜的膜厚並無特別限定以10〜200μιη爲佳 。特別爲1 〇〜7 〇 μηι之薄膜薄膜中,難得到平面性與耐擦 傷性優良的防反射薄膜,而本發明可得到平面性與耐擦傷 性皆優良的薄膜之防反射薄膜,且生產性亦優良,故纖維 素酯薄膜之膜厚以10〜70μπι爲特佳。更佳爲20〜60μηι。 最佳爲35〜60μηι。又,又亦可使用藉由共流延法之多層 構成的纖維素酯薄膜。纖維素酯爲多層構成的情況下亦具 有含紫外線吸收劑與可塑劑之層,此可爲核心層、表面層 、或其雙方。 本發明的防反射薄膜爲寬度lm以上,以使用寬度1.4 〜4m者爲佳。特佳爲1 .4〜3m。超過4m時則搬送困難。 又,可使用設有纖維素酯薄膜之硬塗佈層的面中心線平均 粗度(Ra )爲0.001〜Ιμιη者。 (熔融流延製膜法) 纖維素酯薄膜亦可藉由溶融流延製膜法而形成較佳。 未使用溶液流延製膜法中所使用的溶劑(例如二氯甲 烷等),藉由加熱熔融的熔融流延之成形法,更詳細可分 類爲熔融壓出成形法、加壓成形法、吹塑法、射出成形法 、吹氣成形法、延伸成形法等。彼等中’欲得到具有優良 的機械性強度及表面精度等之纖維素酯薄膜,以熔融壓出 法爲佳。 將纖維素酯及添加劑之混合物進行熱風乾燥或真空乾 -108 - 200907491 燥後進行熔融壓出’經T型塑模壓出成薄膜狀,藉由靜電 外加法等使其密著於冷卻轉筒,並使其冷卻固化,得到未 延伸薄膜。冷卻轉筒之溫度維持於9 0〜1 5 0 °c爲佳。 纖維素樹脂與其他視必要所添加的安定化劑等添加劑 ,可於熔融前進行混合爲佳。纖維素樹脂與安定化劑於最 初混合更佳。混合可使用混合機等進行,又亦可於纖維素 樹脂調製過程中混合。使用混合機時,可使用V型混合機 、圓錐螺旋型混合機、水平圓筒型混合機等、亨舍爾攪拌 機、螺帶式混合機等一般混合機。 如上述將薄膜構成材料混合後,將該混合物可使用壓 出機經直接熔融而製膜’但一旦將薄膜構成材料進行顆粒 化後’可將該顆粒以壓出機經熔融後製膜。又,薄膜構成 材料爲含有熔點相異的複數材料時,僅於可熔融熔點較低 的材料的溫度下,一旦製作成所謂的米通半熔融物,再將 半熔融物投入於壓出機中而製膜。於薄膜構成材料若含有 容易熱分解之材料時,以減少熔融次數爲目的下,未製造 顆粒下進行直接製膜的方法、或如上述作成如米通之半熔 融物後再製膜之方法爲佳。 壓出機可使用可購得之種種壓出機,但以熔融混煉壓 出機爲佳,單軸壓出機或2軸壓出機皆可。由薄膜構成材 料未製造顆粒下進行直接製膜時,因適當的混煉度爲必要 ,故使用2軸壓出機爲佳’亦可爲單軸壓出機、或將螺旋 形狀變更爲Maddock型、Unimelt型、Dulmage等混煉型 之螺旋可得到適度混煉,故可使用。作爲薄膜構成材料, -109- 200907491 一旦使用顆粒或米通半熔融物時’可使用單軸壓出機,亦 可使用2軸壓出機。 壓出機内、及壓出後之冷卻步驟可由氮氣等惰性氣體 取代、或藉由減壓可降低氧濃度爲佳。 壓出機内的薄膜構成材料之熔融溫度,依據薄膜構成 材料之黏度或吐出量、製造之薄片厚度等其較佳條件相異 ,但一般而言對於薄膜之玻璃轉移溫度(Tg ),以Tg以 上,Tg+100°c以下,較佳爲Tg+10°C以上,Tg+90°C以 下。具體爲熔融壓出時之溫度以150〜3 00°c爲佳,特佳爲 180〜270 °C之範圍。更佳爲200〜250 °C之範圍。 壓出時之熔融黏度爲10〜100000泊,較佳爲100〜 10000 泊。 又,壓出機内之薄膜構成材料的滯留時間較短爲佳, 5分鐘以内爲佳,較佳爲3分鐘以内,更佳爲2分鐘以內 。滞留時間易受控於壓出機1之種類、壓出條件,但藉由 調整材料之供給量或L/D、螺旋轉動數、螺旋溝之深度等 可縮短滞留時間。 以上述壓出機壓出薄膜狀,藉由靜電外加法等密著於 冷卻轉筒,並使其冷卻固化,得到未延伸薄膜。冷卻轉筒 之溫度維持於9 0〜1 5 0 °C爲佳。 本發明所使用的纖維素酯薄膜係以於寬方向或製膜方 向進行延伸製膜之薄膜爲特佳。 將由前述冷卻轉筒剝離所得之未延伸薄膜介著複數輥 群及/或紅外線加熱器等加熱裝置,於纖維素酯之玻璃轉 -110- 200907491 移溫度(Tg )至Tg+ 100°c的範圍内進行加熱,進行一段 或多段縱延伸爲佳。 繼續,將如上述所得之往縱方向延伸的纖維素酯薄膜 進行橫延伸,且施予熱處理爲佳。 熱處理爲玻璃轉移溫度(Tg ) -20 °C〜延伸溫度之範 圍内,一'般於搬運下進彳了 0.5〜300秒爲佳。 經熱處理之薄膜,一般冷卻至玻璃轉移溫度(Tg )以 下,切斷薄膜兩端之壓板把持部分後捲取。又,冷卻爲每 秒1 0 0 °c以下之冷卻速度下徐徐自最終熱處理溫度冷卻至 玻璃轉移溫度(Tg)爲佳。 冷卻之手段並無特別限定,可使用過去公知之手段進 行,特別爲以複數溫度區域中依序冷卻下,進行此處理時 可使薄膜之尺寸安定性提高故較佳。且,冷卻速度爲,最 終熱處理溫度以τ 1表示,薄膜自最終熱處理溫度到達Tg 之時間以t表示時,由(T 1 -.Tg ) /t所求之値。 纖維素酯薄膜使用紫外線吸收劑爲佳。 作爲紫外線吸收劑,波長3 70nm以下的紫外線之吸收 能優良,且由良好液晶顯示性之觀點來看,以波長4 0 0 n m 以上之可見光吸收較少者爲佳。 作爲紫外線吸收劑之具體例,例如可舉出氧基二苯甲 酮系化合物、苯並三哩系化合物、水楊酸醋系化合物、二 苯甲酮系化合物、氰基丙烯酸酯系化合物、三嗪系化合物 、鎳錯鹽系化合物等。但不限定於此。 作爲苯並三唑系紫外線吸收劑,例如可舉出下述之紫 -111 - 200907491 外線吸收劑的具體例,但本發明並未限定於此。 UV-1: 2- (2,-羥基- 5’-甲基苯基)苯並三唑 1^-2:2-(2,-經基-3,,5,-二-。忖-丁基苯基)苯並三 口坐 11¥-3:2-(2’-羥基-3’4^卜丁基-5’-甲基苯基)苯並 三唑 1^-4:2-(2’-羥基-3’,5’-二461:卜丁基苯基)-5-氯苯 並三唑 1;¥-5:2-(2’-羥基-3’-(3”,4”,5”,6”-四氫酞醯亞胺甲 基)-5’-甲基苯基)苯並三唑 UV-6: 2,2-伸甲基雙(4- ( 1,1,3,3-四甲基丁基)-6-(2H -苯並三唑-2-基)酚) 11¥-7:2-(2,-羥基-3’46 1^-丁基-5’-甲基苯基)-5-氯 苯並三唑 UV-8 : 2- ( 2H -苯並三唑-2-基)-6-(直鏈及支鏈月桂 基)-4-甲基酚(TINUVIN171、Ciba 製) UV-9 :辛基-3-〔 3-tert-丁基-4-羥基-5-(氯- 2H-苯並 三唑-2-基)苯基〕丙酸酯與2-乙基己基-3-〔3^1^-丁基-4-羥基-5- ( 5-氯-2H-苯並三唑-2-基)苯基〕丙酸酯之混合 物(TINUVIN 1 09、Ciba 製) 又,作爲二苯甲酮系紫外線吸收劑可舉出下述具體例 ,但本發明並未限定於此。 1^-10:2,4-二羥基二苯甲酮 UV-11 : 2,2’-二經基-4-甲氧基二苯甲酮 -112 - 200907491 UV-12: 2-羥基-4-甲氧基-5-磺基二苯甲酮 UV-13:雙(2-甲氧基-4-羥基-5-苯甲醯基苯基甲烷) 作爲較佳的紫外線吸收劑,以透明性高,具有防止偏 光板或液晶劣化之效果的優良苯並三唑系紫外線吸收劑或 二苯甲酮系紫外線吸收劑爲佳,較少著色的苯並三唑系紫 外線吸收劑爲特佳。又,作爲販賣品,可舉出TINUVIN 326、TINUVIN 109、TINUVIN 171、TINUVIN 900、 TINUVIN 928、TINUVIN 3 60 (皆爲 Ciba Specialty Chemicals 公司製)、LA31(旭電化公司製)、 Sumisorb2 5 0 (住友化學公司製)、RUVA-100 (大塚化學 製)。 又,特開200 1 - 1 8 7825號公報所記載之分配係數爲 9.2以上之紫外線吸收劑,可提高長尺薄膜之面品質,且 亦具有優良塗佈性。特別使用分配係數爲1 〇. 1以上之紫 外線吸收劑時爲佳。 又,欲對於纖維素酯薄膜賦予潤滑性,可使用含前述 活性線硬化型樹脂的塗佈層所記載之相同粒子。 作爲粒子,其爲無機化合物的例子,可舉出二氧化矽 、二氧化鈦、氧化鋁、氧化鍩、碳酸鈣、碳酸鈣、滑石、 黏土、燒成陶土、燒成砂酸鈣、水和矽酸鈣、砍酸鋁、矽 酸鎂及磷酸鈣。粒子以含有矽者之濁度較低而較佳,特別 以二氧化矽爲佳。 粒子的一次粒子之平均粒子徑以5〜5 Onm爲佳,更佳 爲7〜20nm。其中含有作爲主要粒徑0.05〜0·3μιη之2次 -113- 200907491 凝集體爲佳。含有量以0.05〜1質量%爲佳,特佳爲0.1〜 0 _ 5質量%。 二氧化矽之粒子,例如可使用以AerosilR972、R972V 、R974 、 R812 、 200 、 200V 、 300 、 R202 、 0X50 、 TT600 (以上曰本Aerosil股份有限公司製)之商品名販賣之粒 子。 氧化鍩之粒子,例如可使用以A e r 〇 s i 1R 9 7 6及R 8 1 1 ( 以上,日本Aerosil股份有限公司製)之商品名販賣者。 作爲粒子使用聚合物粒子時,作爲聚合物的例子,可 舉出聚矽氧烷樹脂、氟樹脂及丙烯酸樹脂。聚矽氧烷樹脂 爲佳,特別以具有三次元網狀結構者爲佳,例如,可使用 以 Tospearll03、同 105、同 108、同 120、同 145、同 3 120及同240 (以上東芝聚矽氧烷股份有限公司製)的商 品名販買者。 其中亦以 Aerosil200V、AerosilR972V可維持較低濁 度下,具有降低摩擦係數之效果,故爲特佳。 又,纖維素酯薄膜中亦可含有以下所說明之劣化防止 劑爲佳。繼續對劣化防止劑作說明。 (劣化防止劑) 所謂劣化防止劑爲,高分子因熱或氧、水分、酸等所 造成的分解可藉由化學作用抑制之材料。本發明之光學薄 膜,熔融流延法時特別爲2 0 0 °C以上高溫下成形’故其爲 容易產生高分子分解•劣化之系統’將劣化防止劑含於光 -114- 200907491 學薄膜中者爲佳。 使用光學薄膜之氧化防止'分解 制或禁止光或熱所引起的自由基種基 未解明之分解反應’且抑制著色或分 或材料分解所引起的揮發成分生成之 作爲劣化防止劑’例如可舉出抗 定劑、酸捕捉劑、金屬惰性化劑等’ 些記載於特開平3- 1 992 0 1號公報、转 報、特開平5 - 1 9 4 7 8 9號公報、特開2 特開平6-1〇7854號公報等。彼等中 的,可於光學薄膜中含有作爲劣化防 佳。 薄膜形成材料中的劣化防止劑可 由薄膜的透明性所添加之量對於形成 基材樹脂1 00重量%而言,劣化防止: 量%以上1 0質量%以下爲佳,較佳焉 質量%以下,更佳爲0.2質量%以上2 薄膜形成材料以迴避材料之變質 將構成之材料分割爲1種或複數種顆 提高加熱時熔融物之混合性或相溶性 膜的光學均一性。 (抗氧化劑) 又,纖維素酯薄膜中含有以下所 所產生的酸捕捉、抑 因之分解反應等包含 子量降低爲主的變質 劣化防止劑。 氧化劑、受阻胺光安 但並未限定於此。這 F開平5 - 1 9 0 7 0 7 3號公 p 5-271471 號公報、 ,欲達到本發明之目 止劑之抗氧化劑者爲 選擇至少1種以上, 透明基材薄膜之透明 劑之添加量以〇 . 0 1質 I 〇 · 1質量%以上5.0 .〇質量%以下。 或吸濕性爲目的,可 丨粒而保存。顆粒化可 、或可確保所得之薄 說明之抗氧化劑爲佳 -115 - 200907491 。作爲抗氧化劑,僅爲可抑制氧所引起的薄膜形成材料劣 化的化合物即可,並無特別限定,其中可舉出酚系抗氧化 劑、磷系抗氧化劑、硫磺系抗氧化劑、烷基自由基捕捉劑 、過氧化物分解劑、氧掃除劑等。其中亦以酚系抗氧化劑 、磷系抗氧化劑、烷基自由基捕捉劑爲佳’組合酚系抗氧 化劑與磷系抗氧化劑之兩者爲佳,組合酚系抗氧化劑與磷 系抗氧化劑與烷基自由基捕捉劑之3者爲最佳。藉由添加 這些化合物,不僅不會降低透明性、耐熱性等’可防止熔 融成型時之熱或熱氧化劣化等所造成的成形體著色或強度 降低。這些抗氧化劑可各單獨、或組合2種以上使用’其 添加量以不損害本發明之目的的範圍下適宜選擇’對於本 發明之纖維素酯的質量而言,以〇. 〇 1質量%以上1 0質量% 以下爲佳,較佳爲0 . 1質量%以上5 _ 0質量%以下’更佳爲 0.2質量%以上2.0質量%以下。 (酚系抗氧化劑) 酚系化合物爲已知化合物’對-1- 丁基酚、對_ ( 1,1 ,3,3 -四甲基丁基)酚等的烷基取代酚以外’例如可舉 出美國專利第4,83 9,405號說明書之第I2〜14攔所記載的 2,6-二烷基酚衍生物化合物、所謂之受阻酚系化合物’其 中以受阻酚系化合物爲佳。 作爲受阻酚酚系化合物之具體例’可舉出n-十八院基 3-(3,5-二-1-丁基-4-羥基苯基)_丙酸酯、11-十八院基3-(3,5-二-卜丁基-4-羥基苯基)-乙酸酯、11-十八烷基3,5_ -116 - 200907491 二_t_ 丁基-4-羥基苯甲酸酯、n-己基3,5-二-t-丁基-4-羥基 苯基苯甲酸酯、η-月桂基3,5-二-t-丁基-4-羥基苯基苯甲酸 酯、新-月桂基3-(3,5-二-t-丁基-4-羥基苯基)乙酸酯、 月桂基β( 3,5 - _-丁基-4-經基苯基)丙酸醋、乙基α-( 4 -經基-3, 5 - 一>-1; -丁基苯基)異丁酸醋、十八院基α-( 4 -經 基-3,5-二-t-丁基苯基)異丁酸酯、十八烷基α- ( 4-羥基- 3.5- 一~-t -丁基-4 -經基苯基)丙酸醋、2- ( η -羊基硫)乙基 3, 5-二-t-丁基-4-羥基-苯甲酸酯、2- (η-辛基硫)乙基3, 5-—-t -丁基-4-經基-本基乙讎酸醋、2- ( η -十八院基硫)乙 基3,5-二-t-丁基-4-羥基苯基乙酸酯、2- ( η-十八烷基硫) 乙基3,5-二-t-丁基-4-羥基-苯甲酸酯、2- (2-羥基乙基硫 )乙基3,5-二-t-丁基-4-羥基苯甲酸酯、二乙基二醇雙-( 3.5- 二-t-丁基-4-羥基-苯基)丙酸酯、2- ( η-十八烷基硫) 乙基3- (3,5-二-t-丁基-4-羥基苯基)丙酸酯、硬脂醯胺 N,N-雙-〔伸乙基3-(3,5-二-t-丁基-4-羥基苯基)丙酸酯 〕、η-丁基亞胺Ν,Ν-雙-〔伸乙基3- ( 3,5-二-t-丁基-4-羥 基苯基)丙酸酯〕、2-(2 -硬脂醯氧基乙基硫)乙基3,5-二-t-丁基-4-羥基苯甲酸酯、2- ( 2-硬脂醯氧基乙基硫)乙 基7-(3-甲基-5-t-丁基-4-羥基苯基)庚酸酯、1,2-丙二醇 雙-〔3-(3,5-二-t-丁基-4-羥基苯基)丙酸酯〕、乙二醇 雙-〔3- ( 3,5-二-t-丁基-4-羥基苯基)丙酸酯〕、新戊基 二醇雙-〔3- ( 3,5-二-t-丁基-4-羥基苯基)丙酸酯〕、乙 二醇雙-(3,5-二-t-丁基-4-羥基苯基乙酸酯)、甘油-1-n-十八烷酸酯-2,3-雙-(3,5-二-t-丁基-4-羥基苯基丙烯酸酯 -117- 200907491 )、季戊四醇-肆-〔3- ( 3,,5,-二-t-丁基-4,-羥基苯基)丙 酸酯〕、1,1,1-三羥甲基乙烷-參-〔3- ( 3,5-二-t-丁基_4_ 羥基苯基)丙酸酯〕、山梨糖醇六-〔3-(3,5-二-t-丁基-4-羥基苯基)丙酸酯〕、2-羥基乙基7-(3-甲基- 5-t 丁基-4-羥基苯基)丙酸酯、2-硬脂醯氧基乙基7-(3-甲基-丁基-4-羥基苯基)庚酸酯、1,6-n-己二醇雙〔(3\5’_二_ t-丁基-4-羥基苯基)丙酸酯〕、季戊四醇-肆(3,5-二-t-丁 基_4_羥基氫肉桂酸酯)。上述型式的酚化合物,例如可由 Ciba Specialty Chemicals 購得之「IRG AN 0X1076」及「 IRGANOX 1 0 1 0」之商品名購得。 (磷系抗氧化劑) 作爲磷系抗氧化劑,可舉出亞磷酸酯系化合物、及亞 膦酸酯系化合物。作爲亞磷酸酯系化合物之具體例,可舉 出三苯基亞磷酸酯、二苯基異癸基亞磷酸酯、苯基二-異 癸基亞憐酸醋、參(壬基苯基)亞鱗酸醋、參(二-壬基 苯基)亞磷酸酯 '參(2,4-二-t-丁基苯基)亞磷酸酯、參 (2,4-二-t-丁基-5-甲基苯基)亞磷酸酯、10-( 3,5-二-u 丁基-4-羥基苯甲基)_9,10_二-氫_9_噁_1〇_磷酸菲_1〇_氧化 物、6-〔 3- ( 3-t-丁基-4-羥基-5 -甲基苯基)丙氧基〕. 2,4,8,1〇-四-t- 丁基二-苯並〔d,f〕 〔 1.3.2 〕 dioxaphosphepine、十三烷基亞磷酸酯等單亞磷酸酯系化 合物;4,4’-亞丁基-雙(3-甲基_6_t_丁基苯基-二-十三烷基 亞磷酸酯)、4,4,-異亞丙基_雙(苯基-二-烷基((:12〜 -118- 200907491 C15)亞磷酸酯)等二-亞磷酸酯系化合物等。上述型式的 亞磷酸酯系化合物,例如可使用由住友化學股份有限公胃 購得之「SumilizerGP」、由旭電化工業股份有限公司購得 之「ADK STAB PEP-24G」、「ADK STAB PEP-36」、「 ADK STAB 3010」、「ADK S TAB HP 1 0」及「ADK STAB 2 1 1 2」之商品名。 作爲亞膦酸酯系化合物之具體例,可舉出二甲基-苯 基亞膦酸酯、二-t-丁基-苯基亞膦酸酯、二苯基-苯基亞膦 酸酯、二-(4-戊基-苯基)-苯基亞膦酸酯、二-(2-t-丁 基-苯基)-苯基亞膦酸酯、二-(2_甲基-3-戊基-苯基)-苯 基亞膦酸酯、二-(2-甲基-4-辛基-苯基)-苯基亞膦酸酯 、二-(3 -丁基-4-甲基-苯基)-苯基亞隣酸酯、二-(3 -己 基-4-乙基-苯基)-苯基亞膦酸酯、二-(2,4,6-三甲基苯基 )-苯基亞膦酸酯、二-(2,3-二甲基-4-乙基-苯基)-苯基 亞膦酸酯、二-(2,6-二乙基-3-丁基苯基)-苯基亞膦酸酯 、二-(2,3 -二丙基-5-丁基苯基)-苯基亞膦酸酯、二-( 2,4,6-三4-丁基苯基)-苯基亞膦酸酯、雙(2,4-二-1-丁基-5 -甲基苯基)聯苯基-4-基-亞膦酸酯、雙(2,4-二- t- 丁基-5-甲基苯基)-4’-(雙(2,4-二-t-丁基-5-甲基苯氧基)膦 )聯苯基-4-基-亞膦酸酯、肆(2,4-二-t-丁基-苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,5-二-t-丁基-苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(3,5-二-1-丁基-苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,3,4-三甲基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,3-二甲基-5-乙基-苯基 -119- 200907491 )-4,4’-亞聯苯基二-亞膦酸酯、肆(2,3-二甲基-4-丙基苯 基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,3-二甲基-5-t-丁 基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,5-二甲基-4-t-丁基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,3_二乙 基-5-甲基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,6-二 乙基-4-甲基苯基)-4,4’-亞聯苯基二·亞膦酸酯、肆( 2.4.5- 三乙基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,6-二乙基-4-丙基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆( 2.5- 二乙基-6-丁基苯基)-4,4’·亞聯苯基二-亞膦酸酯、肆 (2,3-二乙基- 5-t-丁基苯基)-4,4’-亞聯苯基二-亞膦酸酯 、肆(2,5-二乙基- 6-t-丁基苯基)-4,4’-亞聯苯基二-亞膦 酸酯、肆(2,3-二丙基-5-甲基苯基)-4,4’-亞聯苯基二-亞 膦酸酯、肆(2,6-二丙基-4-甲基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,6-二丙基-5-乙基苯基)-4,4’-亞聯苯基 二-亞膦酸酯、肆(2,3-二丙基-6-丁基苯基)-4,4’-亞聯苯 基二-亞膦酸酯、肆(2,6-二丙基-5-丁基苯基)-4,4’-亞聯 苯基二-亞膦酸酯、肆(2,3-二丁基-4-甲基苯基)-4,4’-亞 聯苯基二-亞膦酸酯、肆(2,5-二丁基-3-甲基苯基)-4,4’_ 亞聯苯基二-亞膦酸酯、肆(2,6-二丁基-4-甲基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,4-二-t-丁基-3-甲基苯 基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,4-二-t-丁基-5-甲 基本基)_4,4’-亞聯本基一-亞隣酸醋、肆(2,4 - 一^-t -丁基-6-甲基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,5_二-t-丁基-3-甲基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,5- -120- 200907491 二-t_ 丁基_4_甲基苯基)_4,4’_亞聯苯基二-亞膦酸酯、肆( 2,5-二-t-丁基-6-甲基苯基)-4,4’-亞聯苯基二-亞膦酸酯、 肆(2,6-二-t-丁基-3-甲基苯基)-4,4’-亞聯苯基二-亞膦酸 酯、肆(2,6-二-t-丁基-4-甲基苯基)-4,4’-亞聯苯基二-亞 膦酸酯、肆(2,6-二-t-丁基-5-甲基苯基)-4,4’-亞聯苯基 二-亞膦酸酯、肆(2,3-二丁基-4-乙基苯基)-4,4’-亞聯苯 基二-亞膦酸酯、肆(2,4-二丁基-3-乙基苯基)-4,4’-亞聯 苯基二-亞膦酸酯、肆(2,5-二丁基-4 -乙基苯基)-4,4’-亞 聯苯基二-亞膦酸酯、肆(2,4-二-t-丁基-3-乙基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,4-二-t-丁基-5-乙基苯 基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,4-二-t-丁基-6-乙 基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,5-二-t-丁基-3 -乙基本基)-4,4’-亞聯本基_ -亞滕酸醋、肆(2,5 - 一. -1 -丁基-4-乙基苯基)-4,4’-亞聯苯基二-亞膦酸酯、肆(2,5-二-t_ 丁基_6_乙基苯基)—4,4’-亞聯苯基二-亞膦酸酯、肆( 2,6-二-t-丁基-3-乙基苯基)-4,4’-亞聯苯基二-亞膦酸酯、 肆(2,6-二-t-丁基-4-乙基苯基)-4,4’-亞聯苯基二-亞膦酸 酯、肆(2,6-二-t-丁基-5-乙基苯基)-4,4’-亞聯苯基二-亞 膦酸酯、肆(2,3,4-三丁基苯基)-4,4’-亞聯苯基二-亞膦 酸酯、肆(2,4,6-三-t-丁基苯基)-4,4’-亞聯苯基二-亞膦 酸酯等。上述型式的磷系化合物,例如可使用由 Ciba Specialty Chemicals 股份有限公司購得之「IRGAFOSP-EPQ」、由堺化學工業股份有限公司購得之「GSY-P101」 商品名。 -121 - 200907491 作爲磷系抗氧化劑’以亞膦酸酯系化合物爲佳’其中 亦以肆(2,4-二-t-丁基-苯基)-4,4’-亞聯苯基二-亞膦酸酯 等4,4’-亞聯苯基二-亞膦酸酯化合物爲佳’特佳者爲肆( 2,4-二-t-丁基-5-甲基苯基)-4,4’-亞聯苯基二-亞膦酸酯。 (烷基自由基捕捉劑) 纖維素酯薄膜中含有以下說明之烷基自由基捕捉劑爲 佳。其中所謂烷基自由基捕捉劑爲,具有使烷基自由基快 速反應之基,且與烷基自由基進行反應後不會引起後續反 應之賦予安定生成物的化合物。 作爲烷基自由基捕捉劑可使用由住友化學股份有限公 司購得之「SumilizerGM」、「SumilizerGS」之商品名。 (受阻胺光安定劑) 纖維素酯薄膜中,作爲薄膜形成材料的熱熔融時之劣 化防止劑、又由對於製造後作爲偏光子保護薄膜被曝曬的 外光或液晶顯示器之背光的光而言之劣化防止劑,添加受 阻胺光安定劑(HALS )化合物時爲佳。作爲受阻胺光安 定劑,例如含有美國專利第4,6 1 9,9 5 6號說明書之第5〜 11欄及美國專利第4,8 3 9,4〇5號說明書之第3〜5欄所記 載的2,2,6,6 -四院基峨卩定化合物、或這些酸加成鹽或這些 與金屬化合物之錯合物。 作爲受阻胺光安定劑之具體例,例如可舉出雙( 2,2,6,6-四甲基-4-哌啶)癸二酸酯、雙(2,2,6,6_四甲基· -122- 200907491 4-哌啶)琥珀酸酯、雙(1,2,2,6,6-五甲基-4-哌啶)癸二 酸酯、雙(N-辛氧基- 2,2,6,6-四甲基-4-哌啶)癸二酸酯、 雙(N-苯甲氧基2,2,6,6-四甲基_4_哌啶)癸二酸酯、雙( N-環己氧基 2,2,6,6 -四甲基-4_哌啶)癸二酸酯、雙( 1.2.2.6.6- 五甲基-4-哌啶)2-(3,5-二-t-丁基-4-羥基苯甲 基)-2-丁基丙二酸酯、雙(1-丙烯醯-2,2,6,6-四甲基-4-哌 啶)2,2-雙(3,5-二-t-丁基-4-羥基苯甲基)-2-丁基丙二酸 酯、雙(1,2,2,6,6-五甲基-4-哌啶)癸二酸酯、2,2,6,6-四 甲基-4-哌啶甲基丙烯酸酯、4-〔 3- ( 3,5-二-t-丁基-4-羥基 苯基)丙醯基氧基〕-1-〔 2- ( 3- ( 3,5-二-t-丁基-4-羥基苯 基)丙醯基氧基)乙基〕-2,2,6,6-四甲基哌啶、2-甲基- 2- (2,2,6,6-四甲基-4-峨啶)胺基-N- ( 2,2,6,6-四甲基-4-哌 啶)丙醯胺、肆(2,2,6,6 -四甲基-4-哌啶)1,2,3,4-丁四羧 酸酯、肆(1,2,2,6,6-五甲基-4-哌啶)1,2,3,4-丁四羧酸酯 等。 又,可爲高分子型之化合物,作爲具體例可舉出 N,N’,N”,N”’-肆-〔4,6-雙-〔丁基-(N-甲基-2,2,6,6-四甲 基哌啶4-基)胺基〕-三嗪-2-基〕-4,7-二-氮雜癸烷基-1,10-二胺、二 丁胺與 1,3,5-三嗪 N,N’-雙(2,2,6,6-四甲 基-4-哌啶)-1,6 -六伸甲基二胺與N-( 2,2,6,6 -四甲基- 4-哌啶)丁胺之縮聚物、二丁胺與1,3 ,5-三嗪與Ν,Ν’-雙( 2.2.6.6- 四甲基-4-哌啶)丁胺之縮聚物、聚〔{( 1,1,3,3- 四甲基丁基)胺基-1,3,5-三嗪2,4-二-基} { (2,2,6,6-四 甲基-4-哌啶)亞胺}六伸甲基{( 2,2,6,6-四甲基-4-哌啶 -123- 200907491 )亞胺} 〕、1,6-己烷二胺-N,N’-雙(2,2,6,6-四甲 啶)與嗎啉-2,4,6-三氯-1,3,5-三嗪之縮聚物、聚〔 啉代-s-三卩秦2,4-二-基)〔(2,2,6,6-四甲基-4-脈旋 〕-六伸甲基〔(2,2,6,6 -四甲基-4-哌啶)亞胺〕〕 環介著三嗪骨架以複數結合的高分子量HALS ;號 甲基與 4 -羥基-2,2,6,6-四甲基-1-哌啶乙醇的聚 1,2,3,4-丁四羧酸與1,2,2,6,6-五甲基-4-哌啶醇與3 2 -羥基-1,1-二甲基乙基)-2,4,8,10 -四噁-螺-〔5,5 烷之混合酯化物等哌啶環介著酯鍵結合之化合物等 未限定於此。 其中亦以二丁胺與1,3,5-三嗪與ν,Ν,-雙(2,2 甲基-4 -哌啶)丁胺之縮聚物、聚〔{( 1,1 , 3,3 -四 基)胺基-1,3,5-二曉 2,4-^ —-基} { (2,2,6,6-四甲: 啶)亞胺}六伸甲基{ (2,2,6,6 -四甲基-4-哌啶) 〕、琥珀酸二甲基與4-羥基- 2,2,6,6 -四甲基-1-哌啶 聚合物等數平均分子量(Μη)爲2,000〜5,000者爲 上述型式的受阻胺化合物,例如可使用白 Specialty Chemicals 購得之「TINUVIN144」 TINUVIN770」、由旭電化工業股份有限公司購 ADK STAB LA-52」之商品名。 受阻胺光安定劑對於本發明相關纖維素酯之質 ,以添加〇. 1〜1 〇質量%時爲佳,較佳爲添加0.2〜 %,更佳爲添加0 · 5〜2質量%。這些可倂用2種以」 基-4-哌 (6-嗎 )亞胺 等哌啶 珀酸二 合物、 ,9-雙( 〕十一 ,但並 ,6,6 -四 甲基丁 基-4-哌 亞胺} 乙醇的 佳。 & Ciba 及 「 得之「 量而言 5質量 -124- 200907491 (酸捕捉劑) 纖維素酯薄膜中,酸捕捉劑於高溫環境下,因可抑制 藉由酸而促進分解,故含於其中爲佳。作爲酸捕捉劑,僅 爲與酸進行反應後使酸成惰性化之化合物即可,並無限定 ,其中亦以美國專利第4,1 3 7,2〇1號說明書所記載之具有 環氧基之化合物爲佳。 作爲如此酸捕捉劑之環氧化合物於該技術分野中爲已 知物,含有種種聚二醇之二環氧丙醚,特別爲每聚二醇1 莫耳中約8〜40莫耳之環氧乙烷等經縮合衍生之聚二醇、 甘油之二環氧丙醚等金屬環氧化合物(例如,氯化乙烯聚 合物組成物中,與氯化乙烯聚合物組成物同時自過去即被 利用者)、環氧化醚縮合生成物、雙酚A之二環氧丙醚( 即,4,4’-二羥基二苯基二甲基甲烷)、環氧化不飽和脂肪 酸酯(特別爲2〜22個碳原子之脂肪酸的4〜2個程度之 碳原子的烷基酯(例如,丁基環氧基硬脂酸酯)等)、及 種種環氧化長鏈脂肪酸甘油三酸酯等(例如,環氧化大豆 油、環氧化亞麻仁油等)之組成物作爲代表例之環氧化植 物油及其他不飽和天然油(彼等有時稱爲環氧化天然甘油 酯或不飽和脂肪酸,這些脂肪酸爲一般含有12〜22個碳 原子)。又,作爲購得之含有環氧基的環氧化物樹脂化合 物,亦可使用EPON 81 5C或其他環氧化醚寡聚物縮合生 成物。 且作爲可使用於上述以外之酸捕捉劑,含有氧雜環丁 烷化合物或噁唑啉化合物、或鹼土類金屬之有機酸鹽或乙 -125- 200907491 醯丙酮鹽錯合物、特開平5 - 1 947 8 8號公報之段落〔006 8 〕〜〔0105〕所記載者。 本發明中,酸捕捉劑對於本發明相關纖維素酯之質量 而言以添加0 · 1〜1 0質量%爲佳,以添加0.2〜5質量%較 佳’以添加〇 . 5〜2質量%爲更佳。這些可併用2種以上。 且’酸捕捉劑有時稱爲酸掃去劑、酸捕獲劑' 酸除去 劑等,於本發明中皆可使用。 (金屬惰性劑) 纖維素酯薄膜中含有金屬惰性劑亦佳。所謂金屬惰性 劑,表示氧化反應中作爲啓始劑或觸媒作用之金屬離子惰 性化的化合物’可舉出醯肼系化合物、草酸二醯胺系化合 物、三唑系化合物等,例如可舉出N,N,-雙〔3_ ( 3,5·二-t-丁基-4-羥基苯基)丙醯基〕肼、2-羥基乙基草酸二酶胺 、2 -羥基-N- ( 1H-1,2,4 -三唑-3-基)苯甲醯胺、N_ ( 5- tert-丁基-2·乙氧基苯基)-Ν,-(2·乙基苯基)草酸醯胺等 〇 金屬惰性劑對於透明基材薄膜之樹脂i 〇〇質量%而言 ,以0.0002〜2質量。/。添加量爲佳,較佳爲〇.〇〇〇5〜2質 量%之添加量,更佳爲0 · 〇 〇 1〜1質量%之添加量。這些可 倂用2種以上。 (其他添加劑) 纖維素酯薄膜中作爲其他添加劑,例如添加染料、顏 -126- 200907491 料、螢光體'二色性色素、滯溜値控制劑、折射率 、氣體透過抑制劑、抗菌劑、生分解性賦予劑等。 而作爲將這些添加劑含於纖維素酯之方法,可 料直接以固體或液體的形式混合,經加熱熔融後混 一熔融物後,經流延後形成光學薄膜之方法、或預 有材料使用溶劑等溶解成均一溶液後,除去溶劑, 劑與纖維素酯薄膜之混合物下含有亦佳。 (偏光板) 對於使用本發明之防反射薄膜的偏光板作說明 偏光板可由一般方法製作。本發明之偏光板爲 發明之防眩性抗反射薄膜的裏面側進行鹼化處理, 理之防反射薄膜於碘溶液中浸漬延伸所製作之偏光 少一面上,使用完全鹼化型聚乙烯醇水溶液進行貼 。另一面,亦使用該防反射薄膜,亦可使用其他偏 護薄膜。 對於本發明之防眩性抗反射薄膜,使用於另一 光板保護薄膜爲,具有面内方向滯留値(R〇) Μ 70nm,厚度方向滯留値(R〇爲100〜400nm之相 光學補償薄膜(相位差薄膜)者爲佳。 且,滯留値R〇、Rt可使用自動複折射率計進 。例如,使用KOBRA-21ADH (王子計測機器股份 司製),於溫度23t,濕度55%RH之環境中,於 590nm下求得。 調整劑 將各材 煉成均 先將所 以添加 ,將本 將經處 膜的至 合爲佳 光板保 面之偏 & 20〜 位差的 行測定 有限公 波長爲 -127- 200907491 這些可藉由例如特開2 0 0 2 - 7 1 9 5 7號公報、特開2 0 0 3 -1704 92號公報等所記載的方法來製作。又使用兼具具有將 盤狀液晶等液晶化合物經配向所形成之光學異方層的光學 補償薄膜之偏光板保護薄膜爲佳。例如可藉由特開2 0 0 3 -98 3 4 8號公報所記載的方法而形成光學異方性層。或面内 方向滯留値(R〇)爲0〜5nm,厚度方向滯留値(Rt)爲-20〜+20nm之無配向薄膜亦可。 藉由與本發明的抗反射薄膜經組合使用,可得到平面 性優且具有安定之視野角擴大效果的偏光板。 作爲使用於裏面側之偏光板保護薄膜,作爲販賣品的 纖維素酯薄膜,使用 KC8UX2MW、KC4UX、KC5UX、 KC4UY、KC8UY、KC12UR、KC4UEW、KC8UCR-3、 KC8UCR-4 、 KC8UCR-5 、 KC4FR-1 、 KC4FR-2 (Mw = proofreading curve from 13 samples of 1,000,000~5 00. The 13 samples used almost equal intervals. The total amount of the polymer X and the polymer Y is only 5% by mass or more, which is sufficient for the reduction of the enthalpy (Rt) in the thickness direction. Further, when the total amount is 36% by mass or less, the adhesion to the polarizer PV A is good. The polymer X and the polymer Y can be directly added, dissolved, or dissolved in an organic solvent in which a cellulose ester is previously dissolved, and added to the dope as a material constituting a slurry as described later. The total content of the above-mentioned plasticizer in the cellulose ester film is preferably 5 to 20% by mass, more preferably 6 to 16% by mass, even more preferably 8 to 13% by mass, based on the total amount of the solid content. Further, the content of the two kinds of plasticizers is at least 1% by mass or more, and preferably 2% by mass or more. The polyol ester-based plasticizer is preferably 1 to 15% by mass, particularly preferably 3 to 11% by mass. When the content of the polyol ester-based plasticizer is too small, planarity is deteriorated, and when it is too large, it is easy to be extravasated. The mass ratio of the polyol ester-based plasticizer to the other plasticizer is preferably in the range of 1:4 to 4:1, and more preferably 1:3 to 3:1. If the amount of the plasticizer added is too large or too small, the film may be easily deformed. (solution casting film forming method) The cellulose ester film is produced by a solution casting film forming method in which a cellulose ester and an additive are dissolved in a solvent to prepare a dope, and the dope is transported. a step of casting on a metal support having a strip shape or a roll shape, and a step of drying the cast paste as a web -102 - 200907491, a step of peeling off from a metal support, and extending The step of maintaining the width, the step of further drying, and the step of winding up the processed film are carried out. First, the steps of preparing the glue are explained. The concentration of the cellulose ester in the plasticity is preferably such that the drying load after casting on the metal support can be reduced when the concentration is high, but if the concentration of the cellulose ester is too high, the load during filtration increases. The purity is deteriorated. The concentration which can be made two is preferably 10 to 35 mass%, more preferably 15 to 25 mass%. The solvent used in the dope may be used singly or in combination of two or more types. However, when a good solvent of a cellulose ester and a weak solvent are used after mixing, it is preferable from the viewpoint of production efficiency, and when the amount of a good solvent is large, cellulose is used. The viewpoint of the solubility of the ester is preferred. The mixing ratio of the good solvent to the weak solvent is preferably in the range of 7 to 98% by mass of the good solvent and 2 to 30% by mass of the weak solvent. The term "good solvent" or "weak solvent" is defined as a good solvent in which the cellulose ester used alone is dissolved, and a weak solvent in the case where it is swellable or insoluble. Therefore, the degree of substitution of the thiol group of the cellulose ester can be changed to a good solvent or a weak solvent. For example, when acetone is used as a solvent, the cellulose ester of the cellulose ester (acetamyl substitution degree 2. 4), cellulose acetate propionate becomes a good solvent, cellulose acetate (acetamyl substitution degree 2. 8) Become a weak solvent. The good solvent to be used in the present invention is not particularly limited, and examples thereof include an organic halogen compound such as methylene chloride or a dioxapentane group, acetone, methyl acetate, methyl ethyl acetate or the like. Particularly preferred are dichloromethane or methyl acetate. Further, the weak solvent used in the present invention is not particularly limited, and for example, methanol, ethanol, η-butanol, cyclohexane or cyclohexanone can be used. Also, in the glue -103- 200907491 contains water 0. 0 1 to 2% by mass is preferred. When the above-mentioned gel is prepared, it is used as a general method for dissolving a cellulose ester. When combined heating and pressurization, heating can be carried out under normal pressure. It is preferable to stir the dissolving gum or the undissolved matter called mamaco (caking) while heating the solvent at a temperature higher than the boiling point of the normal pressure and boiling. Further, it is also preferred to mix the cellulose ester with a weak solvent to make it wet, and to add a good solvent for dissolution. The pressurization can be carried out by a method of increasing the vapor pressure of the solvent by injecting an inert gas such as nitrogen. Heating is good, for example, a jacket type is preferred because it is easy to control the temperature. The heating temperature at which the solvent is added is preferably from the viewpoint of cellulose at a high temperature, and if the heating temperature is too high, productivity must be deteriorated. Preferably, the heating temperature is from 4 5 to 1 2 ° ° C, preferably from 70 ° C to 10 ° C. Also, the pressure can be adjusted to the extent that the solvent does not boil. Further, a cooling dissolution method may be used, whereby cellulose acetate is dissolved in the cellulose acetate. Further, the cellulose ester solution is suitably filtered using a filter paper or the like. As the filter material, it is preferable to remove the insoluble matter or the like, but the absolute filtration accuracy is too small, which is a problem. Therefore, the absolute filtration accuracy is 〇. 〇〇 8mm or less 0. 001~0. 008mm filter material is better, 0. 003~ The material is better. The method can be used for the boiling point or higher and does not cause the solvent to prevent the occurrence of coagulation. Therefore, the pressure after the swelling or the swelling of the ester can be excessively increased by 60 〜 11〇°. In the solvent such as ester at the set temperature, it is better to filter the filter material. The filter material is blocked by the filter material, 〇. 〇〇6mm filter -104- 200907491 The material of the filter material is not particularly limited, and it is preferable to use a filter material made of plastic such as olefin or Teflon (registered trademark) because no fiber is detached. The impurities of the cellulose ester are particularly removed or reduced. In the present specification, the so-called bright foreign matter is in the state of 2 Nichols, and the cellulose ester film is irradiated with light, and the light is leaked when viewed from the other polarizing plate side. Point (foreign matter), the diameter is 0. 01mm or more /em2 or less is preferred. It is preferably 1 〇〇/cm 2 or less, and particularly preferably 〇 10 pieces/cm 2 or less. Also, the points are also less good. The filtration of the dope can be carried out by a general method, and the method of filtering at a temperature above the boiling point and under the pressure of boiling without boiling the solvent can preferably reduce the increase in filtration before and after the filtration. The preferred temperature is 4 5 to 1 2 0. (: Good, 4 5~5 5 °C is better. Filter pressure is better. Filter pressure is 1. 6MPa or less is preferred, l. It is more preferable when it is below OMPa. Continue to explain the casting of the glue. The metal support surface processor in the casting (casting) step is preferred, and as the metal support, it is preferable to use a casting for surface plating. The casting width can be 1 to 4 m. The temperature of the casting step is set to -50 °C - the temperature at which the solvent is boiled and not foamed. Generally, the filter medium, polypropylene, or stainless steel is filtered, and the foreign matter contained in the raw material is preferred. The polarizing plate is arranged to be positive, from the side of one polarizing plate, the number of bright spots seen from the opposite side is 200, more preferably 50/m2 ’ 0. Brightness below 01mm The pressure difference (called differential pressure) is heated within the range of the solvent at normal pressure, preferably 4 5 to 7 (TC is lower, preferably 1). 2 Μ P a to mirror the surface below the surface of the stainless steel conveyor belt or metal support. When the temperature is higher -105-200907491, the drying speed of the web can be increased, so that the web is foamed or the flatness is deteriorated if it is too high. The temperature of the preferred metal support is preferably 0 to 100 ° C, more preferably 5 to 30 ° C. Further, it is also preferable to gel the web by cooling and to peel off from the metal support in a state containing a large amount of residual solvent. The method of controlling the temperature of the metal support is not particularly limited, but a method of blowing warm air or cold air or a method of bringing warm water into contact with the inner side of the metal support can be used. When warm water is used, heat can be efficiently transmitted, so that the temperature of the metal support reaches a certain period of time and is preferable. When using warm air, the temperature of the network may be lowered in consideration of the latent heat of evaporation of the solvent, and the use of warm air above the boiling point of the solvent may prevent foaming or use a wind higher than the target temperature. In particular, it is preferable to carry out drying efficiently from the time of self-casting to peeling, changing the temperature of the metal support, and the temperature of the dry wind. In order to make the cellulose ester film exhibit good planarity, the residual solvent amount when the mesh is peeled off from the metal support is preferably from 10 to 150% by mass, more preferably from 20 to 40% by mass or from 60 to 130% by mass. , particularly preferably 20 to 30% by mass or 7 0 to 1 2 0% by mass. In the present invention, the amount of residual solvent is defined as the following formula. The amount of residual solvent (% by mass) = {(M - N) / N} xl 〇〇 where Μ is the mass of the sample taken at any point during or after manufacture of the mesh or film, and Ν is 11. (: The mass after heating for 1 hour. -106-200907491 In the drying step of the cellulose ester film, the mesh is peeled off from the metal support and dried, and the residual solvent amount is 1% by mass or less. Better, better is 0. 1% by mass or less, particularly preferably 0 to 0. 0 1% by mass or less. In the film drying step, it is generally carried out by a roll drying method (a method in which a plurality of rolls disposed on the upper and lower sides are passed through a web and dried by a web) or a tenter method to carry out drying under a mesh. When the cellulose ester film used in the anti-glare film of the present invention is to be produced, the amount of residual solvent remaining in the mesh after peeling from the metal support is immediately extended in the transport direction, and the ends of the mesh are It is particularly preferable to extend in the width direction by a tenter clamped by a press plate or the like. The preferred stretching ratio of both the longitudinal direction and the lateral direction is 1. 01~1. 3 times, more preferably 1 . 05~ 1. 15 times better. Extend the area by 1 by extending in the longitudinal direction and the lateral direction. 12~1. 44 times is better, become 1 . 15~1·32 times is better. This can be obtained by the stretching ratio in the longitudinal direction of the stretching magnification X in the horizontal direction. The extension ratios in the longitudinal direction and the horizontal direction are all less than one. Ultraviolet irradiation at the time of forming a hard coat layer at 0 times causes flatness deterioration. It is preferable to extend in the longitudinal direction immediately after peeling, and it is preferable to extend by the peeling tension and the conveyance tension thereafter. For example, the peeling tension is preferably 2 1 ON/m or more, and the peeling is preferably carried out, and particularly preferably 220 to 3 OON/m. The means for drying the web is not particularly limited, and it can be generally carried out by hot air, infrared rays, heating rolls, microwaves, etc., but from the viewpoint of convenience, it is preferable to carry out hot air. The drying temperature in the drying step of the web is preferably 30 to 20 CTC in a stepwise manner, and when it is carried out in the range of 50 to 180 ° C, the dimensional stability of -107 to 200907491 can be made better and better. The film thickness of the cellulose ester film is not particularly limited to 10 to 200 μm. In particular, in the film film of 1 〇 to 7 〇μηι, it is difficult to obtain an antireflection film excellent in planarity and scratch resistance, and the present invention can provide an antireflection film of a film excellent in both planarity and scratch resistance, and is productive. It is also excellent, so the film thickness of the cellulose ester film is particularly preferably 10 to 70 μm. More preferably 20~60μηι. The best is 35~60μηι. Further, a cellulose ester film composed of a plurality of layers of a co-casting method may also be used. In the case where the cellulose ester has a multilayer structure, it also has a layer containing an ultraviolet absorber and a plasticizer, which may be a core layer, a surface layer, or both. The antireflection film of the present invention has a width of lm or more and a width of 1. 4 ~ 4m is better. Very good for 1 . 4~3m. When it exceeds 4m, it is difficult to transport. Further, the average center-to-center thickness (Ra) of the surface of the hard coating layer provided with the cellulose ester film can be 0. 001~Ιμιη. (Melt Cast Film Forming Method) The cellulose ester film can also be preferably formed by a melt casting film forming method. The solvent used in the solution casting film forming method (for example, methylene chloride or the like) is not specifically classified into a melt extrusion molding method, a pressure molding method, or a blowing method by a melt-melt casting method by heating and melting. Plastic method, injection molding method, air blowing method, extension molding method, and the like. Among them, a cellulose ester film having excellent mechanical strength and surface precision is preferable, and a melt extrusion method is preferred. Mixing the cellulose ester and the additive by hot air drying or vacuum drying -108 - 200907491 After drying, the melt extrusion is carried out by a T-die to form a film, which is adhered to the cooling drum by electrostatic addition or the like. And allowed to cool and solidify to obtain an unstretched film. It is preferred that the temperature of the cooling drum is maintained at 90 to 150 °C. The cellulose resin and other additives such as stabilizers to be added as needed may be preferably mixed before melting. The cellulose resin and the stabilizer are preferably blended at the beginning. The mixing can be carried out using a mixer or the like, or it can be mixed in the cellulose resin preparation process. When a mixer is used, a general mixer such as a V-type mixer, a conical spiral type mixer, a horizontal cylinder type mixer, a Henschel mixer, or a ribbon mixer can be used. After the film constituting material is mixed as described above, the mixture can be directly melted using an extruder to form a film. 'But once the film constituting material is granulated, the granules can be melted by an extruder to form a film. Further, when the film constituent material contains a plurality of materials having different melting points, the so-called rice pass semi-molten is produced only at the temperature of the material having a lower melt melting point, and the semi-melt is introduced into the extruder. And film making. When the film constituting material contains a material which is easily thermally decomposed, it is preferably a method of directly forming a film without granules for the purpose of reducing the number of times of melting, or a method of forming a film such as a semi-melt of rice tong as described above. . A variety of commercially available extruders can be used as the extruder, but a melt-kneading extruder is preferred, and a single-axis extruder or a 2-axis extruder can be used. When the film constituent material is directly formed into a film without granules, it is necessary to use a two-axis extruder because the appropriate kneading degree is necessary. It may be a uniaxial extruder or a spiral shape may be changed to Maddock type. The spirals of the mixed type such as Unimelt type and Dulmage can be moderately kneaded, so they can be used. As a film constituting material, -109- 200907491 When a granule or a rice pass semi-melt is used, a uniaxial extruder can be used, and a 2-axis extruder can also be used. The cooling step in the extruder and after the extrusion may be replaced by an inert gas such as nitrogen or the pressure may be lowered to reduce the oxygen concentration. The melting temperature of the film constituent material in the extruder varies depending on the viscosity or the amount of the film constituent material, the thickness of the sheet to be produced, and the like, but generally, the glass transition temperature (Tg) of the film is Tg or more. , Tg + 100 ° C or less, preferably Tg + 10 ° C or more, Tg + 90 ° C or less. Specifically, the temperature at the time of melt extrusion is preferably 150 to 300 ° C, particularly preferably 180 to 270 ° C. More preferably in the range of 200 to 250 °C. The melt viscosity at the time of extrusion is 10 to 100,000 poise, preferably 100 to 10,000 poise. Further, the residence time of the film constituent material in the extruder is preferably shorter, preferably within 5 minutes, preferably within 3 minutes, more preferably within 2 minutes. The residence time is easily controlled by the type and extrusion condition of the extruder 1, but the residence time can be shortened by adjusting the supply amount of the material or the L/D, the number of spiral rotations, the depth of the spiral groove, and the like. The film was taken out by the above-mentioned extruder, adhered to the cooling drum by electrostatic addition or the like, and cooled and solidified to obtain an unstretched film. The temperature of the cooling drum is preferably maintained at 90 to 150 °C. The cellulose ester film used in the present invention is particularly preferably a film which is formed by stretching in a wide direction or in a film forming direction. The unstretched film obtained by peeling off the cooling drum is placed in a heating device such as a plurality of rolls and/or an infrared heater, and the glass of the cellulose ester is transferred from -110 to 200907491 to a temperature of Tg + 100 °c. Heating is preferably carried out for one or more lengthwise extensions. Further, the cellulose ester film extending in the longitudinal direction obtained as described above is transversely stretched, and heat treatment is preferably carried out. The heat treatment is in the range of glass transition temperature (Tg) -20 °C~extension temperature, and it is generally carried out under transport. 5 to 300 seconds is better. The heat-treated film is generally cooled to a temperature below the glass transition temperature (Tg), and the holding portion of the platen at both ends of the film is cut and then taken up. Further, it is preferable that the cooling is cooled from the final heat treatment temperature to the glass transition temperature (Tg) at a cooling rate of less than 1 0 ° C per second. The means for cooling is not particularly limited, and it can be carried out by a conventionally known means, and in particular, it is preferably cooled in a plurality of temperature regions in order to improve the dimensional stability of the film when the treatment is carried out. Further, the cooling rate is such that the final heat treatment temperature is represented by τ 1 and the time from the final heat treatment temperature to the Tg is represented by t, by (T 1 -. Tg) /t ask for it. The cellulose ester film is preferably an ultraviolet absorber. As the ultraviolet ray absorbing agent, ultraviolet ray having a wavelength of 3 to 70 nm or less is excellent in absorption energy, and from the viewpoint of good liquid crystal display properties, it is preferable to absorb less visible light having a wavelength of 4 0 0 n or more. Specific examples of the ultraviolet absorber include an oxybenzophenone compound, a benzotriazine compound, a salicylic acid vinegar compound, a benzophenone compound, a cyanoacrylate compound, and the like. A azine compound, a nickel stear salt compound, or the like. However, it is not limited to this. Specific examples of the benzotriazole-based ultraviolet absorber include the following violet-111 - 200907491 external absorbent, but the present invention is not limited thereto. UV-1: 2-(2,-hydroxy-5'-methylphenyl)benzotriazole 1^-2:2-(2,-carbyl-3,5,-di-.indole-butyl Phenyl) benzotriene sits 11 ¥-3:2-(2'-hydroxy-3'4^dibutyl-5'-methylphenyl)benzotriazole 1^-4:2-(2'- Hydroxy-3',5'-di 461:dibutylphenyl)-5-chlorobenzotriazole 1;¥-5:2-(2'-hydroxy-3'-(3",4",5", 6"-tetrahydrofurfurimide methyl)-5'-methylphenyl)benzotriazole UV-6: 2,2-extended methyl bis(4-( 1,1,3,3-tetra Methylbutyl)-6-(2H-benzotriazol-2-yl)phenol) 11¥-7:2-(2,-hydroxy-3'46 1^-butyl-5'-methylbenzene -5-chlorobenzotriazole UV-8 : 2-( 2H -benzotriazol-2-yl)-6-(linear and branched lauryl)-4-methylphenol (TINUVIN171, Ciba UV-9 : Octyl-3-[ 3-tert-butyl-4-hydroxy-5-(chloro-2H-benzotriazol-2-yl)phenyl]propionate with 2-ethyl Mixture of hexyl-3-[3^1^-butyl-4-hydroxy-5-(5-chloro-2H-benzotriazol-2-yl)phenyl]propionate (TINUVIN 1 09, Ciba) Further, examples of the benzophenone-based ultraviolet absorber include the following specific examples, but the present invention It is not limited thereto. 1^-10: 2,4-dihydroxybenzophenone UV-11 : 2,2'-di-trans--4-methoxybenzophenone-112 - 200907491 UV-12: 2-hydroxy-4 -Methoxy-5-sulfobenzophenone UV-13: bis(2-methoxy-4-hydroxy-5-benzhydrylphenylmethane) as a preferred UV absorber for transparency A benzotriazole-based ultraviolet absorber or a benzophenone-based ultraviolet absorber having a high effect of preventing deterioration of a polarizing plate or a liquid crystal is preferable, and a less colored benzotriazole-based ultraviolet absorber is particularly preferable. Further, as a commercial item, TINUVIN 326, TINUVIN 109, TINUVIN 171, TINUVIN 900, TINUVIN 928, TINUVIN 3 60 (all manufactured by Ciba Specialty Chemicals Co., Ltd.), LA31 (made by Asahi Kasei Co., Ltd.), and Sumisorb 2 5 0 (Sumitomo) Chemical company), RUVA-100 (manufactured by Otsuka Chemical Co., Ltd.). Further, the distribution coefficient described in JP-A-200 1 - 1 8 7825 is 9. The ultraviolet absorber of 2 or more can improve the surface quality of the long-length film and also has excellent coating properties. The special use distribution coefficient is 1 〇.  More preferably 1 or more ultraviolet absorbers. Further, in order to impart lubricity to the cellulose ester film, the same particles described in the coating layer containing the above-mentioned active wire-curable resin can be used. Examples of the inorganic compound which is a particle include cerium oxide, titanium oxide, aluminum oxide, cerium oxide, calcium carbonate, calcium carbonate, talc, clay, calcined clay, calcined calcium silicate, water, and calcium citrate. , slash aluminum, magnesium citrate and calcium phosphate. It is preferred that the particles have a low turbidity, especially cerium oxide. The average particle diameter of the primary particles of the particles is preferably 5 to 5 Onm, more preferably 7 to 20 nm. It contains as the main particle size of 0. 2 times 05~0·3μιη -113- 200907491 Aggregate is better. The content is 0. 05~1% by mass is better, especially good is 0. 1 to 0 _ 5 mass%. For the particles of cerium oxide, for example, particles sold under the trade names of Aerosil R972, R972V, R974, R812, 200, 200V, 300, R202, 0X50, and TT600 (manufactured by A本 Aerosil Co., Ltd.) can be used. As the particles of cerium oxide, for example, trade names of sellers of A e r 〇 s i 1R 9 7 6 and R 8 1 1 (above, manufactured by Nippon Aerosil Co., Ltd.) can be used. When polymer particles are used as the particles, examples of the polymer include a polyoxyalkylene resin, a fluororesin, and an acrylic resin. Polyoxyalkylene resin is preferred, especially those having a three-dimensional network structure, for example, Tospearll03, the same 105, the same 108, the same 120, the same 145, the same 3 120 and the same 240 (above Toshiba Poly The name of the manufacturer of the manufacturer of Oxygen Co., Ltd.). Among them, Aerosil 200V and Aerosil R972V are particularly good at maintaining a low turbidity and having a friction coefficient lowering effect. Further, the cellulose ester film may preferably contain the deterioration inhibitor described below. The deterioration preventing agent will be described. (Deterioration Preventive Agent) The deterioration preventive agent is a material which is inhibited by chemical action due to decomposition of a polymer by heat, oxygen, moisture, acid or the like. The optical film of the present invention is formed at a high temperature of 200 ° C or higher in the melt casting method, so that it is a system which is prone to decomposition and deterioration of the polymer. The deterioration preventing agent is contained in the film of light-114-200907491 It is better. The use of the oxidation of the optical film prevents the decomposition reaction of the unresolved radical species caused by light or heat, and suppresses the formation of the volatile component caused by the coloring or the decomposition of the material. An anti-settling agent, an acid scavenger, a metal inerting agent, etc. are described in Japanese Unexamined Patent Publication No. Hei No. Hei No. Hei. No. Hei. No. Hei. No. Hei. No. 3, No. 1 992 0, No. 5 - 1 9 4 7 8 9 6-1〇7854, etc. Among them, it can be contained in the optical film as a deterioration prevention. The amount of the deterioration preventing agent in the film forming material to be added by the transparency of the film is preferably 100% by weight or less of the base resin, and more preferably 10% by mass or less, more preferably 焉% by mass or less. More preferably 0. 2% by mass or more 2 The film forming material is modified to avoid deterioration of the material. The material to be formed is divided into one type or a plurality of types to improve the optical uniformity of the mixed or compatible film of the melt during heating. (Antioxidant) The cellulose ester film contains a deterioration inhibitor which is mainly composed of an acid capture and a decomposition reaction which is caused by the following. The oxidizing agent and the hindered amine light are not limited thereto. In the case of the antioxidant of the target agent of the present invention, at least one or more of the transparent base film is added to the transparent agent. The amount is 〇.  0 1 quality I 〇 · 1% by mass or more 5. 0 . 〇% by mass or less. For the purpose of hygroscopicity, it can be preserved by granules. Granulation can or can ensure that the resulting thinner antioxidant is better -115 - 200907491. The antioxidant is not particularly limited as long as it can suppress deterioration of the thin film forming material by oxygen, and examples thereof include a phenolic antioxidant, a phosphorus antioxidant, a sulfur antioxidant, and an alkyl radical scavenging. Agent, peroxide decomposing agent, oxygen sweeping agent, and the like. Among them, phenolic antioxidants, phosphorus-based antioxidants, and alkyl radical scavengers are preferred as both a combination phenolic antioxidant and a phosphorus-based antioxidant, and a combination of a phenolic antioxidant and a phosphorus-based antioxidant and an alkane. The three radical scavengers are the best. By adding these compounds, it is possible to prevent the coloration or the strength of the molded body from being lowered due to heat or thermal oxidative degradation during the melt molding, without lowering the transparency, heat resistance and the like. These antioxidants may be used singly or in combination of two or more kinds, and the amount thereof is appropriately selected insofar as the object of the present invention is not impaired.  〇 1% by mass or more and 10% by mass or less is preferable, preferably 0.  1% by mass or more and 5 _0% by mass or less ‘more preferably 0. 2% by mass or more 2. 0% by mass or less. (Phenolic Antioxidant) The phenolic compound is a known compound other than an alkyl substituted phenol such as p--1-butylphenol or p-(1,1,3,3-tetramethylbutyl)phenol. The 2,6-dialkylphenol derivative compound described in the above-mentioned Japanese Patent No. 4,83, 405, the so-called hindered phenol compound, which is preferably a hindered phenol compound, is preferred. Specific examples of the hindered phenol phenol-based compound include n-eighteen yards of 3-(3,5-di-1-butyl-4-hydroxyphenyl)-propionate and 11-eighteen yards. 3-(3,5-di-bubutyl-4-hydroxyphenyl)-acetate, 11-octadecyl 3,5_-116 - 200907491 bis-t-butyl-4-hydroxybenzoate, n -hexyl 3,5-di-t-butyl-4-hydroxyphenylbenzoate, η-lauryl 3,5-di-t-butyl-4-hydroxyphenylbenzoate, new- Lauryl 3-(3,5-di-t-butyl-4-hydroxyphenyl)acetate, lauryl beta (3,5- _-butyl-4-phenylphenyl)propionic acid vinegar, Ethyl α-( 4 -transmethyl-3,5 -1)-1 -butylphenyl)isobutyric acid vinegar, 18-yard alpha-( 4 -pyridyl-3,5-di-t -butylphenyl)isobutyrate, octadecyl α- (4-hydroxy- 3. 5-mono-t-butyl-4-pyridylphenyl)propionic acid vinegar, 2-( η - argyl thio) ethyl 3, 5-di-t-butyl-4-hydroxy-benzoic acid Ester, 2-(η-octylsulfanyl)ethyl 3, 5-t-butyl-4-transpyridyl-mercaptoacetic acid vinegar, 2-( η-yttrium-ylthio)ethyl 3 ,5-di-t-butyl-4-hydroxyphenylacetate, 2-( η-octadecylsulfanyl)ethyl 3,5-di-t-butyl-4-hydroxy-benzoic acid Ester, 2-(2-hydroxyethylthio)ethyl 3,5-di-t-butyl-4-hydroxybenzoate, diethyl diol bis-( 3. 5-Di-t-butyl-4-hydroxy-phenyl)propionate, 2-( η-octadecylsulfanyl)ethyl 3-(3,5-di-t-butyl-4-hydroxyl Phenyl)propionate, stearylamine N,N-bis-[extended ethyl 3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate], η-butyl Iminoindole, fluorene-bis-[stretching ethyl 3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate], 2-(2-stearyloxyethyl sulfonate) Ethyl 3,5-di-t-butyl-4-hydroxybenzoate, 2-(2-stearyloxyethylthio)ethyl 7-(3-methyl-5-t- Butyl-4-hydroxyphenyl)heptanoate, 1,2-propanediol bis-[3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate], ethylene glycol double -[3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate], neopentyl glycol bis-[3-(3,5-di-t-butyl-4) -hydroxyphenyl)propionate], ethylene glycol bis-(3,5-di-t-butyl-4-hydroxyphenyl acetate), glycerol-1-n-octadecanoate-2 , 3-bis-(3,5-di-t-butyl-4-hydroxyphenylacrylate-117- 200907491), pentaerythritol-肆-[3-( 3,5,-di-t-butyl -4,-hydroxyphenyl)propionate], 1,1,1-trishydroxymethylethane-para-[3-(3,5-di- T-butyl_4_hydroxyphenyl)propionate], sorbitol hexa-[3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate], 2-hydroxyethyl 7-(3-methyl-5-t-butyl-4-hydroxyphenyl)propionate, 2-stearyloxyethyl 7-(3-methyl-butyl-4-hydroxyphenyl) )heptanoate, 1,6-n-hexanediol bis[(3\5'-di-t-butyl-4-hydroxyphenyl)propionate], pentaerythritol-antimony (3,5-di- T-butyl_4_hydroxyhydrocinnamate). The phenolic compound of the above type is commercially available, for example, from the trade names "IRG AN 0X1076" and "IRGANOX 1 0 1 0" available from Ciba Specialty Chemicals. (Phosphorus-based antioxidant) Examples of the phosphorus-based antioxidant include a phosphite-based compound and a phosphinate-based compound. Specific examples of the phosphite-based compound include triphenylphosphite, diphenylisodecylphosphite, phenyldi-isodecylsulfate, and decylphenyl Sour vinegar, ginseng (di-nonylphenyl) phosphite, ginseng (2,4-di-t-butylphenyl) phosphite, ginseng (2,4-di-t-butyl-5) -Methylphenyl)phosphite, 10-(3,5-di-ubutyl-4-hydroxybenzyl)_9,10-di-hydro_9_ox_1〇_phosphine phenanthrene _ oxide, 6-[ 3- ( 3-t-butyl-4-hydroxy-5 -methylphenyl) propoxy].  2,4,8,1〇-tetra-t-butyldi-benzo[d,f] 〔 1. 3. 2] a monophosphite compound such as dioxaphosphepine or tridecyl phosphite; 4,4'-butylene-bis(3-methyl-6-t-butylphenyl-di-tridecyl phosphite) a di-phosphite compound such as 4,4,-isopropylidene-bis(phenyl-di-alkyl ((12: -118-200907491 C15) phosphite), etc. As the phosphate ester compound, for example, "SumilizerGP" purchased from Sumitomo Chemical Co., Ltd., "ADK STAB PEP-24G", "ADK STAB PEP-36", "ADK", which is commercially available from Asahi Kasei Kogyo Co., Ltd., can be used. A trade name of STAB 3010", "ADK S TAB HP 1 0", and "ADK STAB 2 1 1 2". Specific examples of the phosphonite-based compound include dimethyl-phenylphosphinate, Di-t-butyl-phenylphosphinate, diphenyl-phenylphosphinate, bis-(4-pentyl-phenyl)-phenylphosphinate, di-(2-t -butyl-phenyl)-phenylphosphinate, bis-(2-methyl-3-pentyl-phenyl)-phenylphosphinate, bis-(2-methyl-4-octyl Phenyl-phenyl)-phenylphosphinate, bis-(3-butyl-4-methyl-phenyl)-phenyl Acid ester, bis-(3-hexyl-4-ethyl-phenyl)-phenylphosphinate, bis-(2,4,6-trimethylphenyl)-phenylphosphinate, two -(2,3-dimethyl-4-ethyl-phenyl)-phenylphosphinate, bis-(2,6-diethyl-3-butylphenyl)-phenylphosphinic acid Ester, bis-(2,3-dipropyl-5-butylphenyl)-phenylphosphinate, bis-(2,4,6-tri-4-butylphenyl)-phenylphosphine Acid ester, bis(2,4-di-1-butyl-5-methylphenyl)biphenyl-4-yl-phosphinate, bis(2,4-di-t-butyl-5 -Methylphenyl)-4'-(bis(2,4-di-t-butyl-5-methylphenoxy)phosphine)biphenyl-4-yl-phosphonite, hydrazine (2 ,4-di-t-butyl-phenyl)-4,4'-biphenylene di-phosphinate, bismuth (2,5-di-t-butyl-phenyl)-4,4 '-Biphenylene di-phosphinate, bismuth (3,5-di-1-butyl-phenyl)-4,4'-biphenylene di-phosphinate, bismuth (2, 3,4-Trimethylphenyl)-4,4'-biphenylene di-phosphinate, bismuth (2,3-dimethyl-5-ethyl-phenyl-119-200907491)- 4,4'-biphenylene di-phosphinate, bismuth (2,3-dimethyl-4-propylphenyl)-4,4'-biphenylene di-phosphinate , (2,3-dimethyl-5-t-butylphenyl)-4,4'-biphenylene di-phosphinate, bismuth (2,5-dimethyl-4-t -butylphenyl)-4,4'-biphenylene di-phosphinate, bismuth (2,3-diethyl-5-methylphenyl)-4,4'-biphenylene Di-phosphonite, bismuth (2,6-diethyl-4-methylphenyl)-4,4'-biphenylene diphosphinate, bismuth ( 2. 4. 5-triethylphenyl)-4,4'-biphenylene di-phosphinate, bismuth (2,6-diethyl-4-propylphenyl)-4,4'-Asialian Phenyl di-phosphonite, hydrazine ( 2. 5-Diethyl-6-butylphenyl)-4,4'·biphenylene di-phosphinate, bismuth (2,3-diethyl-5-t-butylphenyl)- 4,4'-biphenylene di-phosphinate, bismuth (2,5-diethyl-6-t-butylphenyl)-4,4'-biphenylene di-phosphinic acid Ester, hydrazine (2,3-dipropyl-5-methylphenyl)-4,4'-biphenylene di-phosphinate, hydrazine (2,6-dipropyl-4-methyl Phenyl)-4,4'-biphenylene di-phosphinate, bismuth (2,6-dipropyl-5-ethylphenyl)-4,4'-biphenylene di-- Phosphonate, bismuth (2,3-dipropyl-6-butylphenyl)-4,4'-biphenylene di-phosphinate, bismuth (2,6-dipropyl-5- Butylphenyl)-4,4'-biphenylene di-phosphinate, bismuth (2,3-dibutyl-4-methylphenyl)-4,4'-biphenylene - phosphonite, bismuth (2,5-dibutyl-3-methylphenyl)-4,4'-biphenylene di-phosphinate, bismuth (2,6-dibutyl- 4-methylphenyl)-4,4'-biphenylene di-phosphinate, bismuth (2,4-di-t-butyl-3-methylphenyl)-4,4'- Biphenylene di-phosphinate, bismuth (2,4-di-t-butyl-5-methylphenyl)_4,4'-thylene-based mono-ortho ,(2,4-di-t-butyl-6-methylphenyl)-4,4'-biphenylene di-phosphinate, bismuth (2,5-di-t-butyl) 3-methylphenyl)-4,4'-biphenylene di-phosphinate, bismuth (2,5--120-200907491 di-t-butyl-4-methylphenyl)_4 , 4'_biphenylene di-phosphinate, bismuth (2,5-di-t-butyl-6-methylphenyl)-4,4'-biphenylene di-phosphinic acid Ester, bismuth (2,6-di-t-butyl-3-methylphenyl)-4,4'-biphenylene di-phosphinate, bismuth (2,6-di-t-butyl) 4-methylphenyl)-4,4'-biphenylene di-phosphinate, bismuth (2,6-di-t-butyl-5-methylphenyl)-4,4 '-Biphenylene di-phosphinate, bismuth (2,3-dibutyl-4-ethylphenyl)-4,4'-biphenylene di-phosphinate, bismuth (2 ,4-dibutyl-3-ethylphenyl)-4,4'-biphenylene di-phosphinate, bismuth (2,5-dibutyl-4-ethylphenyl)-4 , 4'-biphenylene di-phosphinate, bismuth (2,4-di-t-butyl-3-ethylphenyl)-4,4'-biphenylene di-phosphinic acid Ester, anthracene (2,4-di-t-butyl-5-ethylphenyl)-4,4'-biphenylene di-phosphinate, anthracene (2,4-di-t-butyl) base -6-ethylphenyl)-4,4'-biphenylene di-phosphinate, bismuth (2,5-di-t-butyl-3-ethylethyl)-4,4'- Yalian Benji _ - Yateng vinegar, 肆 (2,5 - one.  -1 -butyl-4-ethylphenyl)-4,4'-biphenylene di-phosphinate, hydrazine (2,5-di-t-butyl-6-ethylphenyl)- 4,4'-biphenylene di-phosphinate, bismuth (2,6-di-t-butyl-3-ethylphenyl)-4,4'-biphenylene di-phosphine Acid ester, bismuth (2,6-di-t-butyl-4-ethylphenyl)-4,4'-biphenylene di-phosphinate, bismuth (2,6-di-t- Butyl-5-ethylphenyl)-4,4'-biphenylene di-phosphinate, bismuth (2,3,4-tributylphenyl)-4,4'-biphenyl Di-phosphonite, bismuth (2,4,6-tri-t-butylphenyl)-4,4'-biphenylene di-phosphinate, and the like. As the phosphorus-based compound of the above type, for example, "IRGAFOSP-EPQ" available from Ciba Specialty Chemicals Co., Ltd., and "GSY-P101" commercially available from Daiei Chemical Industry Co., Ltd. can be used. -121 - 200907491 As a phosphorus-based antioxidant, it is preferred to use a phosphonite-based compound, which is also a ruthenium (2,4-di-t-butyl-phenyl)-4,4'-biphenylene group. - 4,4'-biphenylene di-phosphonite compound such as phosphonite is preferred as 肆(2,4-di-t-butyl-5-methylphenyl)- 4,4'-biphenylene di-phosphinate. (Alkyl radical scavenger) The cellulose ester film preferably contains an alkyl radical scavenger described below. The alkyl radical scavenger is a compound which has a radical which reacts rapidly with an alkyl radical and which does not cause a subsequent reaction after reacting with an alkyl radical. As the alkyl radical scavenger, the trade names of "Sumilizer GM" and "Sumilizer GS" purchased by Sumitomo Chemical Co., Ltd. can be used. (Hindered Amine Light Stabilizer) In the cellulose ester film, as a film of a film forming material, a deterioration preventing agent during heat fusion, and a light for backlighting an external light or a liquid crystal display which is exposed as a polarizer protective film after manufacture The deterioration inhibitor is preferably added when a hindered amine light stabilizer (HALS) compound is added. As a hindered amine light stabilizer, for example, columns 5 to 11 of the specification of U.S. Patent No. 4,6,9,9,5, and columns 3 to 5 of the specification of U.S. Patent No. 4,8 3,4,5 The 2,2,6,6-fourth-based hydrazine compound, or the acid addition salt or the complex of these with a metal compound. Specific examples of the hindered amine light stabilizer include bis(2,2,6,6-tetramethyl-4-piperidine) sebacate and bis(2,2,6,6-tetramethyl Base ·122- 200907491 4-piperidine) succinate, bis(1,2,2,6,6-pentamethyl-4-piperidine) sebacate, bis(N-octyloxy-2 , 2,6,6-tetramethyl-4-piperidine) sebacate, bis(N-benzyloxy 2,2,6,6-tetramethyl-4-piperidine) sebacate , bis(N-cyclohexyloxy 2,2,6,6-tetramethyl-4_piperidine) sebacate, double (1. 2. 2. 6. 6-pentamethyl-4-piperidine) 2-(3,5-di-t-butyl-4-hydroxybenzyl)-2-butylmalonate, bis(1-propene oxime-2 , 2,6,6-tetramethyl-4-piperidine) 2,2-bis(3,5-di-t-butyl-4-hydroxybenzyl)-2-butylmalonate, Bis(1,2,2,6,6-pentamethyl-4-piperidine) sebacate, 2,2,6,6-tetramethyl-4-piperidine methacrylate, 4-[ 3-(3,5-Di-t-butyl-4-hydroxyphenyl)propanyloxy]-1-[2-(3-(3,5-di-t-butyl-4-hydroxyl) Phenyl)propanyloxy)ethyl]-2,2,6,6-tetramethylpiperidine, 2-methyl-2-(2,2,6,6-tetramethyl-4-indole Acryl)-amino-N-(2,2,6,6-tetramethyl-4-piperidine)propanamine, hydrazine (2,2,6,6-tetramethyl-4-piperidine) 1, 2,3,4-butanetetracarboxylate, hydrazine (1,2,2,6,6-pentamethyl-4-piperidine) 1,2,3,4-butanetetracarboxylate, and the like. Further, it may be a polymer type compound, and specific examples thereof include N,N',N",N"'-肆-[4,6-bis-[butyl-(N-methyl-2,2) ,6,6-tetramethylpiperidin-4-yl)amino]-triazin-2-yl]-4,7-di-azaindole-1,10-diamine, dibutylamine and 1 ,3,5-triazine N,N'-bis(2,2,6,6-tetramethyl-4-piperidine)-1,6-hexamethyldiamine and N-(2,2, a polycondensate of 6,6-tetramethyl- 4-piperidine)butylamine, dibutylamine and 1,3,5-triazine with hydrazine, Ν'-double (2. 2. 6. Polycondensate of 6-tetramethyl-4-piperidine)butylamine, poly[{( 1,1,3,3-tetramethylbutyl)amino-1,3,5-triazine 2,4- Bis-yl} { (2,2,6,6-tetramethyl-4-piperidine)imine}hexamethyl{(2,2,6,6-tetramethyl-4-piperidine-123 - 200907491 )imine}], 1,6-hexanediamine-N,N'-bis(2,2,6,6-tetramethylpyridine) and morpholine-2,4,6-trichloro-1 , 3,5-triazine polycondensate, poly[ phenyl---tris-methyl 2,4-di-yl) [(2,2,6,6-tetramethyl-4-pulse]-six Methyl [(2,2,6,6-tetramethyl-4-piperidinyl)imide]] is a complex of high molecular weight HALS; methyl and 4-hydroxy-2. Poly(1,2,3,4-butanetetracarboxylic acid) and 1,2,2,6,6-pentamethyl-4-piperidinol of 2,6,6-tetramethyl-1-piperidineethanol 3 2 -hydroxy-1,1-dimethylethyl)-2,4,8,10-tetraoxo-spiro-[5,5-alkane mixed esters and the like, piperidine ring, ester-bonded compound, etc. Not limited to this. Among them, a polycondensate of dibutylamine and 1,3,5-triazine with ν,Ν,-bis(2,2methyl-4-piperidyl)butylamine, poly[{( 1,1 , 3, 3-(tetrakis)amino-1,3,5-di 2,4-^--yl} { (2,2,6,6-tetramethyl: pyridine)imine}hexamethyl{{2 , 2,6,6-tetramethyl-4-piperidine)], dimethyl succinate and 4-hydroxy-2,2,6,6-tetramethyl-1-piperidine polymer (Μη) of 2,000 to 5,000 is a hindered amine compound of the above type, and for example, "TINUVIN 144" TINUVIN 770" available from White Specialty Chemicals, and ADK STAB LA-52 by Asahi Kasei Kogyo Co., Ltd. can be used. The hindered amine light stabilizer is added to the quality of the cellulose ester of the present invention.  1 to 1 〇 mass% is better, preferably 0. 2~%, more preferably 0. 5~2% by mass. These can be used in two kinds of piperidic acid dimers such as benzyl-4-piperidyl (6-?)imine, 9-bis(11), but also 6,6-tetramethylbutyl. -4-Phosphmine} Ethanol is preferred. & Ciba and "The amount of the product is 5 mass-124-200907491 (acid scavenger). In the cellulose ester film, the acid scavenger can be inhibited in a high temperature environment. The acid is preferably decomposed by the acid, and it is preferably contained therein. As the acid scavenger, the compound which is inert to the acid after the reaction with the acid is not limited, and the U.S. Patent No. 4, 1 3 The epoxy group-containing compound described in the specification of No. 7,2,1 is preferred. The epoxy compound as such an acid scavenger is known in the technical field and contains various polyglycol diglycidyl ethers. Particularly, it is a metal epoxy compound such as a condensation-derived polyglycol or a glycerol diglycidyl ether of about 8 to 40 moles of ethylene oxide per 1 gram of the polyglycol (for example, a chlorinated ethylene polymer) In the composition, the chlorinated ethylene polymer composition is used at the same time from the past), the epoxidized ether condensation product, bisphenol A Di-glycidyl ether (ie, 4,4'-dihydroxydiphenyldimethylmethane), epoxidized unsaturated fatty acid ester (especially 4 to 2 degrees of fatty acids of 2 to 22 carbon atoms) An alkyl ester of a carbon atom (for example, butyl epoxy stearate) or the like, and various epoxidized long-chain fatty acid triglycerides (for example, epoxidized soybean oil, epoxidized linseed oil, etc.) The composition is representative of epoxidized vegetable oils and other unsaturated natural oils (sometimes referred to as epoxidized natural glycerides or unsaturated fatty acids, which generally contain 12 to 22 carbon atoms). The epoxy group-containing epoxide resin compound may be an EPON 81 5C or other epoxidized ether oligomer condensation product, and may be used as an acid scavenger other than the above, and may contain an oxetane compound or The oxazoline compound or the organic acid salt of an alkaline earth metal or the one described in paragraphs [006 8] to [0105] of JP-A-125-200907491 醯Aketone salt complex, and JP-A-2005-947-8. In the present invention, an acid scavenger for this The quality of the cellulose ester of the invention is preferably 0. 1~1 0% by mass, and 0. 2 to 5 mass% is better to add 〇.  5 to 2% by mass is more preferable. These can be used in combination of 2 or more types. Further, the acid scavenger may be referred to as an acid scavenger, an acid scavenger, an acid scavenger or the like, and may be used in the present invention. (Metal Inert Agent) It is also preferred that the cellulose ester film contains a metal inert agent. The metal inert agent is a compound which is inactivated by a metal ion which acts as a starter or a catalyst in the oxidation reaction, and examples thereof include an anthraquinone compound, a ruthenium oxalate compound, a triazole compound, and the like, and examples thereof include, for example, a metal inert agent. N,N,-bis[3_(3,5·di-t-butyl-4-hydroxyphenyl)propanyl]anthracene, 2-hydroxyethyl oxalic acid diamine, 2-hydroxy-N- ( 1H -1,2,4-triazol-3-yl)benzamide, N_(5-tert-butyl-2.ethoxyphenyl)-oxime,-(2.ethylphenyl)phosphonium oxalate The ruthenium metal inert agent such as an amine is 0. 0002~2 quality. /. The amount of addition is preferably, preferably 〇. The amount of addition of 〇〇〇5 to 2% by mass is more preferably 0· 〇 〇 1 to 1% by mass. These can be used in two or more types. (Other additives) Other additives in the cellulose ester film, such as dyes, pigment-126-200907491, phosphor dichroic dye, stagnation control agent, refractive index, gas permeation inhibitor, antibacterial agent, A biodegradability imparting agent or the like. As a method of containing these additives in a cellulose ester, it may be directly mixed in the form of a solid or a liquid, and after heating and melting, a molten product is mixed, a method of forming an optical film after casting, or a solvent using a pre-material. After dissolving into a homogeneous solution, the solvent is removed, and the mixture of the agent and the cellulose ester film is also preferably contained. (Polarizing Plate) Description of Polarizing Plate Using the Antireflection Film of the Present Invention The polarizing plate can be produced by a general method. The polarizing plate of the present invention is subjected to an alkalization treatment on the inner side of the anti-glare anti-reflection film of the invention, and the anti-reflective film is immersed in an iodine solution to reduce the amount of polarized light, and a fully alkalized polyvinyl alcohol aqueous solution is used. Post it. On the other hand, the antireflection film is also used, and other protective films can also be used. The anti-glare anti-reflection film of the present invention is used for another light-plate protective film which has an in-plane direction retention 値(R〇) Μ 70 nm and a thickness direction retention 値 (R〇 is a phase optical compensation film of 100 to 400 nm ( It is preferable that the retardation film R値 and Rt can be used in an automatic complex refractometer. For example, using KOBRA-21ADH (manufactured by Oji Scientific Instruments Co., Ltd.), the environment is at a temperature of 23t and a humidity of 55% RH. In the case of 590 nm, the regulator adjusts each material to be added first, and the finite wavelength is determined by the deviation of the film from the surface of the film. -127-200907491 These can be produced by the method described in, for example, Japanese Patent Laid-Open Publication No. JP-A No. 2000-A No. H. Preferably, the liquid crystal compound such as a liquid crystal is a polarizing plate protective film of an optical compensation film of an optically different layer formed by alignment. For example, the optical film can be formed by the method described in JP-A-2000-98338. The anisotropic layer or the in-plane direction retention 値(R〇) is 0 5 nm, an unaligned film having a thickness direction of 値 (Rt) of -20 to +20 nm may be used. By combining with the antireflection film of the present invention, polarized light having excellent planarity and stable viewing angle expansion effect can be obtained. As a polarizing plate protective film used for the inside side, as a cellulose ester film for sale, KC8UX2MW, KC4UX, KC5UX, KC4UY, KC8UY, KC12UR, KC4UEW, KC8UCR-3, KC8UCR-4, KC8UCR-5, KC4FR are used. -1, KC4FR-2 (

Konicaminolta opt股份有限公司製)等爲佳。 偏光板之主要構成要素的偏光膜爲,僅通過一定方向 之偏波面的光之元件,現今已知的代表性偏光膜爲聚乙烯 醇系偏光薄膜,此有聚乙烯醇系薄膜中以碘染色所得者、 與將二色性染料經染色所得者,但不限定於何者。偏光膜 爲,將聚乙烯醇水溶液進行製膜,將此進行一軸延伸並染 色' 或經染色後進行一軸延伸後,較佳爲使用以硼化合物 進行耐久性處理者。偏光膜之膜厚爲5〜30μιη,較佳爲8 〜1 5 μηι之偏光膜。該偏光膜面上貼合本發明之抗反射薄 膜片面後形成偏光板。較佳爲使用完全鹼化聚乙烯醇等作 爲主成分之水系黏著劑進行貼合。 -128- 200907491 (圖像顯示裝置) 藉由將使用本發明的防反射薄膜面裝於影像顯示裝置 之鑑賞面側,可製造出種種辨識性優良的影像顯示裝置。 本發明中之防反射薄膜爲裝入偏光板中,以使用反射 型、透過型、半透過型LCD或TN型、STN型、OCB型、 HAN型、VA型(PVA型、MVA型)、IPS型等各種驅動 方式之LCD爲佳。又’本發明之防反射薄膜爲防反射層 的反射光之色不均顯著減少,又反射率較低、平面性優良 。可使用於電漿顯示器、場發射顯示器、有機EL顯示器 、無機EL顯不器、電子紙等各種顯示裝置。 特別爲將本發明之防反射薄膜作爲電漿顯示器之前面 板濾光器加工時,裝上的電槳顯示器爲無光干涉不均且具 有優良辨識性的影像顯示裝置。又,30吋以上之大畫面的 電漿顯影像顯不裝置中,具有色不均或波紋不均較少, 長時間鑑賞後眼睛亦不亦疲勞之效果。又,本發明的防反 射薄膜爲具有良好防靜電性者。 【實施方式】 〔實施例〕 以下說明本發明之實施例’但本發明未被限定於此。 實施例1 製造本發明之防反射薄膜時,首先製作透明薄膜基材 -129- 200907491 (膠漿組成物) 纖維素三乙酸酯(平均醋化度6 1 ·0% ) 三苯基磷酸酯 乙基鄰苯二醯基乙基乙醇酸酯 TINUVIN 109 ( Ciba Specialty Chemicals 股份有限公司製) TINUVIN 171 ( Ciba Specialty Chemicals 股份有限公司製) 100質量份 8質量份 2質量份 1質量份 1質量份 430質量份 甲醇 90質量份 將上述材料投入於密閉容器中,加壓下於溫度80 °C下 保溫,一邊攪拌一邊完全溶解後得到膠漿組成物。 繼續,將此膠漿組成物經過濾,冷卻後於溫度3 3 t下 保持,於不鏽鋼輸送帶上進行均一流延,蒸發溶劑至可剝 離後自不鏽鋼輸送帶剝離,以拉幅器於寬方向進行1 . 1倍 延伸後,以多數輥一邊搬送下進行乾燥,於兩端部設有高 度ΙΟμπι之痕刻並捲取,製作出透明纖維素三乙酸酯薄膜 所成之透明薄膜基材1。其中,透明薄膜基材1爲具有膜 厚80μηι、寬度l_5m、及長度3000m者。又,製作之透明 薄膜基材1的折射率爲1 .49。對於折射率之測定法如後述 〇 又,變更膜厚及長度以外,與上述情況同樣下,製作 出膜厚40 μηι、寬度1.5m、長度5000m之纖維素三乙酸酯 -130- 200907491 薄膜所成的透明薄膜基材2。又,所製作之透明薄膜基材 2的折射率爲1 . 4 9。 (硬塗佈層) 於上述透明薄膜基材將下述硬塗佈層用塗佈組成物1 進行膜塗佈,經80t乾燥後,將〇.2J/cm2之紫外線以高壓 水銀燈照射並使其硬化,製作出形成厚度6 μηι之硬塗佈層 1的硬塗佈薄膜1。 (硬塗佈層用塗佈組成物1) 季戊四醇三丙烯酸酯 30質量份 季戊四醇四丙烯酸酯 45質量份 尿烷丙烯酸酯 25質量份 (U-4HA、新中村化學工業股份有限公司製) 1- 羥基-環己基-苯基-酮 5質量份 (IRGACURE 184、Ciba Specialty Chemicals 股份有限公司製) 2- 甲基-1-〔4-(甲基硫)苯基〕-2-嗎啉代丙烷-1-酮 3質量份 (IRGACURE 907、Ciba Specialty Chemicals 股份有限公司製) 聚環氧乙烷油基醚 0.5質量份 (EMULGEN 404、花王股份有限公司製) 丙二醇單甲醚 10質量份 乙酸甲酯 45質量份 丙酮 45質量份 -131 - 200907491 且’將下述背塗佈層用塗佈組成物1進行膜塗佈至濕 膜厚14μηι’於80 °C下進行乾燥並捲取後設置背塗佈層。 (背塗佈層用塗佈組成物1 ) 一乙醯基纖維素 〇.6督量份 丙酮 35質量份 甲基乙基酮 35質量份 甲醇 35質量份 二氧化矽粒子之2%甲醇分散液 16質量份 (KE-P30,日本觸媒股份有限公司製) (防反射薄膜1的製作) 於上述製作之硬塗佈薄膜1上,以如下述高折射率層 ,再以低折射率層之順序進行防反射層的塗佈設置,製作 出防反射薄膜1。 (高折射率層1的製作) 於上述製作之硬塗佈薄膜1上,膜塗佈下述高折射率 層用塗佈組成物1,於50 °c下進行1分鐘乾燥’再以紫外 線0 . 1 J/cm2照射並使其硬化,設置厚度1 3 Onm之高折射率 層1。且,該高折射率層1之折射率爲1 ·5 7。 (高折射率層用塗佈組成物1 ) 60質量份 銻酸鋅溶膠 -132- 200907491 (CX-Z610M-F2、日產化學工業股份有限公司製) 8質量份 4質量份 2質量份 甲氧基聚乙二醇#1000丙烯酸酯 (NK-酯AM-230G、新中村化學X業股份有限公司製) 季戊四醇四丙烯酸酯 (NK酯A-TMMT、新中村化學工業股份有限公司製) 1-羥基·環己基-苯基-酮 (IRGACURE 184、Ciba Specialty Chemicals 股份有限公司製) 3-甲基丙烯醯氧基丙基三甲氧基矽烷 3質量份 (KBM-503、信越化學工業股份有限公司製) 聚氧伸烷基二甲基聚矽氧烷共聚物之10%丙二醇單甲醚液2質量份 (FZ-2207、DOW CORNING TORAY CO LTD 製) 丙二醇單甲醚 360質量份 異丙醇 360質量份 甲基乙基酮 200質量份 且,以下實施例中,構成防反射層之各層折射率可藉 由下述方法測定。 (折射率) 各折射率層之折射率爲,對於單獨下將各層塗佈於上 述製作之硬塗佈薄膜1上的經塗佈設置之試品’由分光光 度計之分光反射率的測定結果求得。分光光度計爲使用 U-4000型(日立製作所製),將試品測定側裏面經粗面 化處理後,以黑色噴霧進行光吸收處理,防止裏面之光反 -133- 200907491 射,於5度正反射之條件下測定可見光區(4 00nm〜 700nm )之反射率。 (低折射率層1的製作) 上述高折射率層1的表面上,塗佈下述低折射率層用 塗佈組成物1,進行5 0 °c之1分鐘乾燥,再將紫外線 O.lJ/cm2照射而使其硬化,且於120°C下進行1分鐘熱硬 化至厚度爲8 Onm而設置低折射率層1,製作出防反射薄 膜1。且,該低折射率層1的折射率爲1 .3 5。 (低折射率層用塗佈組成物1 ) 四乙氧基矽烷水解物1 90質量份 中空二氧化矽系粒子分散液1 30質量份 3-甲基丙烯醯氧基丙基三甲氧基矽烷 3質量份 (KBM-503、信越化學工業股份有限公司製) 甲醇改性聚矽氧烷樹脂之10%異丙基醇類液 〇.6質量份 (KF-6003、信越化學工業股份有限公司製) 鋁乙基乙醯乙酸酯二異丙酸酯之10%異丙醇液 6質量份 (ALCH,Kawaken Fine Chemicals 股份有限公司製) α-丁基-ω-〔3- (2,2-雙(羥基甲基)丁氧基)丙基〕 聚二甲基矽氧烷之10%異丙醇液 2質量份 (SignplanFM-DA21、chisso 股份有限公司製) 丙二醇單甲醚 450質量份 異丙醇 450質量份 -134- 200907491 (四乙氧基矽烷水解物1之調製) 混合四乙氧基矽烷2 3 0 g與乙醇4 4 0 g,於此添加2 °〆。乙 酸水溶液1 20g後,於25它之水浴中進行20小時攪拌後調 製出四乙氧基矽烷水解物1。 (中空二氧化矽系粒子分散液1之調製) 將平均粒徑5 nm、S i Ο 2濃度2 0質量%之二氧化矽溶膠 1 〇 〇 g、與純水1 9 0 0 g之混合物加溫至8 〇 °c。該反應母液之 p Η爲1 0.5 ’於同母液中同時添加作爲S丨〇 2之0.9 8質量% 矽酸鈉水溶液9 0 0 0 g、與作爲A12 Ο 3之1 . 0 2質量%鋁酸鈉 水溶液9000g。其間,將反應液之溫度保持於80°C。反應 液的p Η於添加後,上升至12.5,其後,幾乎無變化。添 加終了後,將反應液冷卻至室溫,以極限過濾膜洗淨調製 出固體成分濃度20質量%之Si02.Al203核粒子分散液。 (步驟a ) 於該核粒子分散液5 0 0 g中加入純水1 7 0 〇 g,並加溫至 9 8 °C,保持該溫度下,添加矽酸鈉水溶液以陽離子交換樹 脂進行脫鹼後所得之矽酸液(Si〇2濃度3.5質量%) 3 000g ,形成第1二氧化矽被覆層後得到核粒子之分散液。(步 驟b) 繼續,將以極限過濾膜進行洗淨後形成成爲固體成分 濃度1 3質量%之第1二氧化矽被覆層的核粒子分散液 5 0 0 g添加於純水1 1 2 5 g ’再滴入濃鹽酸(3 5.5 °/〇 )使其成 -135- 200907491 爲PH 1.0,進行脫鋁處理。 繼續,加入p Η3之鹽酸水溶液1 〇 L與純水5 L下,分 離溶解於極限過濾膜之鋁鹽,調製出除去形成第1二氧化 矽被覆層之核粒子的構成成分一部份的Si〇2 · αι2ο3多孔 質粒子之分散液(步驟c )。 將上述多孔質粒子分散液15〇〇g、與純水500g、乙醇 1 7 5 0 g、及2 8 %氨水6 2 6 g之混合液加溫至3 5。(:後,添加乙 基矽酸酯(S i Ο 2濃度2 8質量。/〇 ) 1 〇 4 g,將形成第1二氧 化砂被覆層之多孔質粒子的表面以乙基矽酸酯的水解縮聚 物進行被覆而形成第2二氧化矽被覆層。繼續,使用極限 過濾膜調製出溶劑由乙醇取代之固體成分濃度2 〇質量%的 中空二氧化砂系粒子分散液1。 該中空二氧化矽系粒子之第1二氧化矽被覆層厚度爲 3nm ’平均粒徑爲45nm,M0x/Si02 (莫耳比)爲0.0017 ’折射率爲1 .28 °其中平均粒徑爲經動態散光法進行測定 實施例2〜6 (防反射薄膜2〜6的製作) 與上述實施例1之情況同樣地,製造出防反射薄膜2 〜6 ’但與上述實施例1的情況之相異點爲,防反射薄膜2 〜6的製作中’取代高折射率層用塗佈組成物1之銻酸鋅 溶膠’使用高折射率用塗佈組成物2〜6的表2所記載之 粒子、及使欲表1所記載的透明薄膜基材1或透明薄膜基 -136- 200907491 材2。 實施例7 (防反射薄膜7的製作) 與上述實施例1之情況同樣地,製作防反射薄膜7, 但與上述實施例1的情況之相異點爲,防反射薄膜7的製 作中,取代高折射率層用塗佈組成物1,使用下述高折射 率層用塗佈組成物7、及使用透明薄膜基材2。 (高折射率層7的製作) 硬塗佈薄膜1上塗佈下述高折射率層用塗佈組成物7 ,於5(TC進行1分鐘乾燥,再將紫外線0.1J/cm2照射使其 硬化而設置厚度爲1 3 Onm之高折射率層7。且,該高折射 率層7之折射率爲1 . 5 8。 (高折射率層用塗佈組成物7 ) 銻酸鋅溶膠 60質量份 (CX-Z610M-F2、日產化學工業股份有限公司製) 二噁烷二醇二丙烯酸酯 12質量份 (NK酯A-DOG、新中村化學工業股份有限公司製) 1-羥基-環己基-苯基-酮 2質量份 (IRGACURE 184、Ciba Specialty Chemicals 股份有限公司製) 3-甲基丙烯醯氧基丙基三甲氧基矽烷 3質量份 (KBM-503、信越化學工業股份有限公司製) -137- 200907491 聚氧伸烷基二甲基聚矽氧烷共聚物之10%丙二醇單甲醚液2質量份 (FZ-2207、DOW CORNING TORAY CO LTD 製) 丙二醇單甲醚 360質量份 異丙醇 360質量份 甲基乙基酮 200質量份 實施例8〜1 2 (防反射薄膜8〜1 2的製作) 與上述實施例7之情況同樣下可製造出防反射薄膜8 〜1 2 ’但與上述實施例7之情況的相異點爲,於防反射薄 膜8〜1 2的製作中,取代高折射率層用塗佈組成物7中之 錄酸鋅溶膠’作爲高折射率層用塗佈組成物8〜1 2使用表 2所記載的粒子、及使用表1所記載的透明薄膜基材1或 透明薄膜基材2。 實施例1 3 (防反射薄膜1 3的製f乍) ± $ » 51例i之情況同樣地,可製造出防反射薄膜 1 3 ’但與上述實施例1之情況的相異點爲,防反射薄膜1 3 的製作中’取代高折射率層用塗佈組成物1,使用下述高 折射率層用塗佈組成物1 3。 (高折射率層1 3的製作> ϋ Μ ί布薄膜!上膜塗佈下述高折射率層用塗佈組成物 -138- 200907491 1 3,於5 0 °C下進行1分鐘乾燥’再將紫外線0 . 1 J /c m 2照射 使其硬化設置厚度爲130nm之高折射率層13°且’該高 折射率層1 3之折射率爲1 · 5 9 ° (高折射率層用塗佈組成物1 3 ) 銻酸鋅溶膠 (CX-Z610M-F2、日產化學工業股份有限公司製) 6〇質量份 乙氧基化2-甲基-1、3-丙烷二醇二丙烯酸醋 (NK酯A-IBD-2E、新中村化學工業股份有限公司製) 4質量份 二噁烷二醇二丙烯酸酯 (NK酯A-DOG、新中村化學工業股份有限公司製) 8質量份 1-羥基-環己基-苯基-酮 2質量份 (IRGACURE 184、Ciba Specialty Chemicals 股份有限公司製) 3-甲基丙烯醯氧基丙基三甲氧基矽烷 3質量份 (KBM-503、信越化學工業股份有限公司製) 聚氧伸烷基二甲基聚矽氧烷共聚物之10%丙二醇單甲醚液 (FZ-2207、DOW CORNING TORAY CO LTD 製) 2質量份 丙二醇單甲醚 360質量份 異丙醇 360質量份 甲基乙基酮 200質量份 實施例1 4〜1 8 (防反射薄膜1 4〜1 8的製作) 與上述實施例1 3之情況同樣下,製作防反射薄膜1 4 -139- 200907491 〜1 8 ’但與上述實施例1 3之場合的相異點爲,防反射薄 膜1 4〜1 8的製作中’取代高折射率層用塗佈組成物1 3中 之銻酸鋅溶膠,作爲高折射率層用塗佈組成物i 4〜丨8使 用表2所記載的粒子、及使用表1所記載的透明薄膜基材 1或透明薄膜基材2。 實施例1 9 (防反射薄膜19的製作) 與與上述實施例1之情況同樣地,製作防反射薄膜i 9 ’但與上述實施例1之場合的相異點爲,防反射薄膜1 9 的製作中’取代高折射率層用塗佈組成物1,使用下述高 折射率層用塗佈組成物1 9。 (局折射率層19的製作) 硬塗佈薄膜1上膜塗佈下述高折射率層用塗佈組成物 1 9 ’於5 0°C進行1分鐘乾燥,再以紫外線〇 _ 1 J /c m 2照射使 其硬化而設置厚度爲130nm之高折射率層19。且,該高 折射率層4之折射率爲1 . 6 0。 (高折射率層用塗佈組成物1 9 ) 銻酸鋅溶膠 60質量份 (CX-Z610M-F2、日產化學工業股份有限公司製) 乙氧基化三羥甲基丙烷三丙烯酸酯 丨2質量份 (NK酯A-TMPT-3EO、新中村化學工業股份有限公司製) -140- 200907491 季戊四醇四丙烯酸酯 8質量份 (NK酯A-TMMT、新中村化學工業股份有限公司製) 1-羥基-環己基-苯基-酮 2質量份 (IRGACURE 184、Ciba Specialty Chemicals 股份有限公司製) 3-甲基丙烯醯氧基丙基三甲氧基矽烷 3質量份 (KBM-503、信越化學工業股份有限公司製) 聚氧伸烷基二甲基聚矽氧烷共聚物之10%丙二醇單甲醚液2質量份 (FZ-2207、DOW CORNING TORAY CO LTD 製) 360質量份 360質量份 200質量份 丙二醇單甲醚 異丙醇 甲基乙基酮 實施例20〜24 (防反射薄膜20〜24的製作) 與上述實施例1 9之情況同樣下,製作防反射薄膜20 〜24,但與上述實施例1 9之情況的相異點爲,防反射薄 膜2 0〜24的製作中,取代高折射率層用塗佈組成物1 9之 銻酸鋅溶膠,作爲高折射率層用塗佈組成物20〜24使用 表2所記載的粒子、及使用表1所記載的透明薄膜基材1 或透明薄膜基材2。 比較例1 (比較防反射薄膜2 5的製作) 作爲比較,與與上述實施例1之情況同樣地,製造防 -141 - 200907491 反射薄膜2 5,但與上述實施例1之情況的相捏點 10拜點爲,防反 射薄膜2 5的製作中,取代高折射率層用塗佈組成物1 用下述高折射率層用塗佈組成物2 5。又與本發 Λ之相異點 爲’高折射率層用塗佈組成物25中使用非導 祖既fc/:子的 氧化鈦之溶膠。 (高折射率層2 5的製作) 於硬塗佈薄膜1上膜塗佈下述高折射率層陌& 牛增用塗佈組成 物2 5 ’於5 0 °C下進行1分鐘乾燥,再將犖巩n 外猓 0.1 J/cm2 照射使其硬化而設置厚度爲13〇nm之高折射率層 該局折射率層25之折射率爲1.64。 (高折射率層用塗佈組成物25 ) 60質量份 12質量份 氧化鈦之甲基異丁基酮分散液溶膠 (C.I.化成工業股份有限公司製) 乙氧基化雙酣A二丙嫌酸醋 (NK酯ABE-300、新中村化學工業股份有限公司製) 3-甲基丙烯醯氧基丙基三甲氧基矽烷 3質量份 (KBM-503、信越化學工業股份有限公司製) 1-羥基-環己基-苯基-酮 2質量份 (IRGACURE 184、Ciba Specialty Chemicals 股份有限公司製) 聚氧伸烷基二甲基聚矽氧烷共聚物之10%丙二醇單甲醚液2質量份 (FZ-2207、DOW CORNING TORAY CO LTD 製) 丙二醇單甲醚 360質量份 -142- 200907491 360質量份 200質量份 異丙醇 甲基乙基酮 比較例2 (比較防反射薄膜26的製作) 欲比較,與上述比較例1之情況同樣下,製作防反射 薄膜2 6,但與上述比較例1之情況的相異點爲,防反射薄 膜26的製作中,使用未添加高折射率層用塗佈組成物25 之粒子的高折射率層用塗佈組成物2 6。又,與本發明之相 異點爲,高折射率層用塗佈組成物26中不使用粒子。 (高折射率層26的製作) 於硬塗佈薄膜1上,膜塗佈下述高折射率層用塗佈組 成物26,於50°C下進行1分鐘乾燥,再將紫外線O.lJ/cm2 照射使其硬化而設置厚度爲130nm之高折射率層26。且 ,該高折射率層26之折射率爲1.58。 (高折射率層用塗佈組成物26 ) 乙氧基化雙酚A二丙烯酸酯 12質量份 (NK酯ABE-300、新中村化學工業股份有限公司製) 1 -經基-Ϊ哀己基-苯基-嗣 2質量份 (IRGACURE 184、Ciba Specialty Chemicals 股份有限公司製) 3-甲基丙烯醯氧基丙基三甲氧基矽烷 3質量份 (KBM-503、信越化學工業股份有限公司製) -143- 200907491 聚氧伸烷基二甲基聚矽氧烷共聚物之10%丙二醇單甲醚液 (FZ-2207、DOW CORNING TORAY CO LTD 製) 丙二醇單甲醚 異丙醇 甲基乙基酮 比較例3 (比較防反射薄膜27的製作) 欲比較,與與上述實施例1之情況同樣地 射薄膜27,但與上述實施例1的情況之相異點 薄膜2 7的製作中,取代高折射率層用塗佈組成 下述高折射率層用塗佈組成物27。又,與本發 爲,高折射率層用塗佈組成物2 7中,作爲膠 經碳數1〜3的烷氧基化之電離放射線硬化型彳 有二噁烷結構之電離放射線硬化型樹脂。 (高折射率層27的製作) 於硬塗佈薄膜1上膜塗佈下述高折射率層 物2 7,於5 (TC進行1分鐘乾燥,再將紫外線 射使其硬化而設置厚度爲1 3 Oiim之高折射率H 高折射率層27之折射率爲1.63。 (高折射率層用塗佈組成物27 ) 銦酸錫(ΙΤΟ) ·ΙΡΑ分散液液溶膠 2質量份 360質量份 360質量份 200質量份 ,製作防反 爲,防反射 物1,使用 明之相異點 黏劑不使用 對脂及/或具 用塗佈組成 0 · 1 J / c m 2 照 『27 。且該 60質量份 -144- 200907491 (觸媒化成工業股份有限公司製) 12質量份 2質量份 三羥甲基丙烷三丙烯酸酯 (NK酯A-TMPT、新中村化學工業股份有限公司製) 1-羥基-環己基-苯基-酮 (IRGACURE 184、Ciba Specialty Chemicals 股份有限公司製) 3-甲基丙烯醯氧基丙基三甲氧基矽烷 3質量份 (KBM-503、信越化學工業股份有限公司製) 聚氧伸烷基二甲基聚矽氧烷共聚物之1〇%丙二醇單甲醚液2質量份 (FZ-2207、DOW CORNING TORAY CO LTD 製) 丙二醇單甲醚 360質量份 異丙醇 360質量份 甲基乙基酮 200質量份 比較例4 (比較防反射薄膜2 8的製作) 欲做比較,與上述實施例1之情況同樣地’製作防反 射薄膜2 8,但與上述實施例1的情況之相異點爲’防反射 薄膜2 8的製作中,取代高折射率層用塗佈組成物1 ’使用 下述高折射率層用塗佈組成物2 8。又’與本發明之相異點 爲,高折射率層用塗佈組成物2 8中未使用前述一般式(1 )所示之有機矽化合物或其水解物或其縮聚物。 (高折射率層2 8的製作) 於硬塗佈薄膜1上膜塗佈下述高折射率層用塗佈組成 -145- 200907491 物28,於5〇°c下進行1分鐘乾燥,再將螌〜 ' 承外線 照射使其硬化而設置厚度爲1 3 Onm之高折备 率層 該高折射率層2 8之折射率爲1 . 5 8。 °-U/c 28 〇 (高折射率層用塗佈組成物2 8 ) 銻酸鋅溶膠 (CX-Z610M-F2、日產化學工業股份有限公司製) 甲氧基聚乙二醇#1000丙烯酸酯 (NK-醋AM-230G、新中村化學工業股份有限公司 60莺毚份 8實毚份 季戊四醇四丙烯酸酯 (NK酯A-TMMT、新中村化學工業股份有限公司製) 卜羥基-環己基-苯基-酮 4質量份 2質量份 (IRGACURE 184、Ciba Specialty Chemicals 股份有限公司製) 聚氧伸烷基二甲基聚矽氧烷共聚物之10%丙二醇單甲醚液2質量份 (FZ-2207、DOW CORNING TORAY CO LTD 製) 丙二醇單甲醚 異丙醇 甲基乙基酮 360質量份 360質量份 200質量份 -146- 200907491 sstei® if^fe sri ιηΓι ςε.ι ςε.ι 5ε.ι 5ε.ι >οε·ι «-ιε.ι ΙΛ1ΓΙ <ηΓι ΙΛΓΙ ςε.ι 5ΤΓΓ ςε.ι ΙΙΓΙε.1^τ ςε·Ι •ηΓΙ ςε·ι >ΓΙΓ1 5ε·1 sri ςε.ι ςε. 一 oz 一幽褂菡&^ lftffstettjltKonicaminolta opt Co., Ltd.) is preferred. The polarizing film which is a main component of the polarizing plate is a light element which passes only a polarizing surface in a certain direction. A representative polarizing film which is known today is a polyvinyl alcohol-based polarizing film, and the polyvinyl alcohol-based film is dyed with iodine. The obtained one is obtained by dyeing a dichroic dye, but is not limited thereto. The polarizing film is formed by forming a film of a polyvinyl alcohol aqueous solution, stretching it by one axis, and dyeing it or dyeing it to perform one-axis stretching, and it is preferred to use a boron compound for durability treatment. The film thickness of the polarizing film is 5 to 30 μm, preferably 8 to 15 μm. A polarizing plate is formed on the surface of the polarizing film to which the surface of the antireflection film of the present invention is bonded. It is preferred to use a water-based adhesive mainly composed of a fully alkalized polyvinyl alcohol as a main component. -128-200907491 (Image display device) By mounting the antireflection film surface of the present invention on the viewing surface side of the image display device, it is possible to manufacture various image display devices having excellent visibility. The antireflection film of the present invention is incorporated in a polarizing plate to use a reflective, transmissive, semi-transmissive LCD or TN type, STN type, OCB type, HAN type, VA type (PVA type, MVA type), IPS. LCDs of various driving modes such as the type are preferred. Further, the antireflection film of the present invention has a markedly reduced color unevenness of the reflected light of the antireflection layer, and has a low reflectance and excellent planarity. It can be used in various display devices such as plasma displays, field emission displays, organic EL displays, inorganic EL displays, and electronic paper. In particular, when the antireflection film of the present invention is processed as a front panel filter of a plasma display, the mounted electric paddle display is an image display device having no uneven light interference and excellent visibility. In addition, in the plasma display image display device of a large screen of 30 inches or more, the color unevenness or the unevenness of the ripples is small, and the eyes are not fatigued after a long time of appreciation. Further, the antireflection film of the present invention is one which has good antistatic properties. [Embodiment] [Embodiment] Hereinafter, an embodiment of the present invention will be described, but the present invention is not limited thereto. Example 1 When manufacturing the antireflection film of the present invention, first, a transparent film substrate was prepared -129-200907491 (glue composition) cellulose triacetate (average degree of acetification 6 1 ·0%) triphenyl phosphate Ethyl phthalate ethyl glycolate TINUVIN 109 (manufactured by Ciba Specialty Chemicals Co., Ltd.) TINUVIN 171 (manufactured by Ciba Specialty Chemicals Co., Ltd.) 100 parts by mass 8 parts by mass 2 parts by mass 1 part by mass 1 part by mass 430 90 parts by mass of methanol was placed in a sealed container, and the mixture was kept at a temperature of 80 ° C under pressure, and completely dissolved while stirring to obtain a dope composition. Continuing, the composition of the glue is filtered, cooled and maintained at a temperature of 3 3 t, and subjected to a first-class extension on a stainless steel conveyor belt, and the solvent is evaporated until peeled off from the stainless steel conveyor belt, with the tenter in the width direction. After stretching at a time of 1.1 times, the film was conveyed by a plurality of rolls and dried, and a mark of a height of ΙΟμπι was placed at both ends and wound up to prepare a transparent film substrate 1 made of a transparent cellulose triacetate film. . Among them, the transparent film substrate 1 has a film thickness of 80 μm, a width of l_5 m, and a length of 3000 m. Further, the refractive index of the produced transparent film substrate 1 was 1.49. The measurement method of the refractive index was as follows, and the film thickness and length were changed, and a cellulose triacetate-130-200907491 film having a film thickness of 40 μm, a width of 1.5 m, and a length of 5000 m was produced in the same manner as described above. The transparent film substrate 2 is formed. Further, the refractive index of the transparent film substrate 2 produced was 1.49. (Hard Coat Layer) The above-mentioned transparent film substrate was subjected to film coating with the coating composition 1 for a hard coating layer described below, and after drying at 80 t, ultraviolet rays of J.2 J/cm 2 were irradiated with a high pressure mercury lamp and allowed to be irradiated. After hardening, a hard coat film 1 having a hard coat layer 1 having a thickness of 6 μm was formed. (coating composition 1 for hard coat layer) pentaerythritol triacrylate 30 parts by mass pentaerythritol tetraacrylate 45 parts by mass urethane acrylate 25 parts by mass (U-4HA, manufactured by Shin-Nakamura Chemical Co., Ltd.) 1-hydroxyl -5 parts by mass of cyclohexyl-phenyl-ketone (IRGACURE 184, manufactured by Ciba Specialty Chemicals Co., Ltd.) 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinopropane-1 3 parts by mass of ketone (IRGACURE 907, manufactured by Ciba Specialty Chemicals Co., Ltd.) 0.5 parts by mass of polyethylene oxide oleyl ether (EMULGEN 404, manufactured by Kao Co., Ltd.) propylene glycol monomethyl ether 10 parts by mass of methyl acetate 45 mass Part of acetone 45 parts by mass -131 - 200907491 and 'coating the following back coating layer coating composition 1 to a wet film thickness of 14 μm to dry at 80 ° C and winding up to provide a back coating layer . (Coating composition for back coating layer 1) Ethyl phthalocyanine 〇 6 6 parts by weight of acetone 35 parts by mass of methyl ethyl ketone 35 parts by mass of methanol 35 parts by mass of 2% methanol dispersion of cerium oxide particles 16 parts by mass (KE-P30, manufactured by Nippon Shokubai Co., Ltd.) (Production of antireflection film 1) On the hard coated film 1 produced as described above, a high refractive index layer as described below and a low refractive index layer were used. The antireflection film 1 was produced by sequentially applying the antireflection layer. (Production of High Refractive Index Layer 1) On the hard coating film 1 prepared above, the following coating composition 1 for a high refractive index layer was applied to the film, and dried at 50 ° C for 1 minute. 1 J/cm2 was irradiated and hardened, and a high refractive index layer 1 having a thickness of 1 3 Onm was set. Further, the refractive index of the high refractive index layer 1 is 1 · 5 7 . (Coating Composition 1 for High Refractive Index Layer) 60 parts by mass of zinc silicate sol-132-200907491 (CX-Z610M-F2, manufactured by Nissan Chemical Industries, Ltd.) 8 parts by mass of 4 parts by mass of 2 parts by mass of methoxy group Polyethylene glycol #1000 acrylate (NK-ester AM-230G, manufactured by Shin-Nakamura Chemical X Co., Ltd.) Pentaerythritol tetraacrylate (NK ester A-TMMT, manufactured by Shin-Nakamura Chemical Co., Ltd.) 1-Hydroxy· Cyclohexyl-phenyl-ketone (IRGACURE 184, manufactured by Ciba Specialty Chemicals Co., Ltd.) 3 parts by mass of 3-methylpropenyloxypropyltrimethoxydecane (KBM-503, manufactured by Shin-Etsu Chemical Co., Ltd.) 2 parts by mass of 10% propylene glycol monomethyl ether solution of an alkylene dimethyl polysiloxane copolymer (FZ-2207, manufactured by DOW CORNING TORAY CO LTD) propylene glycol monomethyl ether 360 parts by mass of isopropanol 360 parts by mass 200 parts by mass of the ethyl ethyl ketone, and in the following examples, the refractive index of each layer constituting the antireflection layer can be measured by the following method. (Refractive Index) The refractive index of each refractive index layer is the measurement result of the spectral reflectance by the spectrophotometer for the coated sample which is applied to the hard coated film 1 prepared as described above separately. Seek. The spectrophotometer is a U-4000 type (manufactured by Hitachi, Ltd.), and after the surface of the sample is roughened, the light is absorbed by a black spray to prevent the light inside from being inverted at 133-200907491. The reflectance of the visible light region (400 nm to 700 nm) was measured under the condition of regular reflection. (Production of Low Refractive Index Layer 1) The surface of the high refractive index layer 1 is coated with the following coating composition 1 for a low refractive index layer, dried at 50 ° C for 1 minute, and then UV-O.lJ is applied. The film was hardened by irradiation with /cm2, and thermally cured at 120 ° C for 1 minute to a thickness of 8 Onm to provide the low refractive index layer 1 to produce the antireflection film 1. Further, the refractive index of the low refractive index layer 1 is 1.35. (Coating Composition 1 for Low Refractive Index Layer) Tetraethoxydecane Hydrolyzate 1 90 parts by mass of hollow ceria-based particle dispersion 1 30 parts by mass of 3-methylpropenyloxypropyltrimethoxydecane 3 (5 parts by weight of KBM-503, manufactured by Shin-Etsu Chemical Co., Ltd.) 10% isopropyl alcohol liquid of methanol-modified polysiloxane resin. 6 parts by mass (KF-6003, manufactured by Shin-Etsu Chemical Co., Ltd.) 6 parts by mass of 10% isopropanol solution of aluminum ethyl acetoacetate diisopropylate (ALCH, manufactured by Kawaken Fine Chemicals Co., Ltd.) α-butyl-ω-[3- (2,2-double (hydroxymethyl)butoxy)propyl] 2% isopropanol solution of polydimethyloxane 2 parts by mass (SignplanFM-DA21, manufactured by Chisso Co., Ltd.) propylene glycol monomethyl ether 450 parts by mass of isopropanol 450 parts by mass - 134 - 200907491 (Preparation of tetraethoxydecane hydrolyzate 1) Tetraethoxy decane 2 30 g and ethanol 4 40 g were mixed, and 2 ° 〆 was added thereto. After 12 g of an aqueous acetic acid solution, the tetraethoxy decane hydrolyzate 1 was prepared by stirring in a water bath of 25 hours for 20 hours. (Preparation of hollow cerium oxide-based particle dispersion 1) A mixture of cerium oxide sol 1 〇〇g having an average particle diameter of 5 nm and a concentration of 20 μ% of S i Ο 2 and 1 9000 g of pure water was added. Warm to 8 〇 °c. The reaction mother liquid has a p Η of 1 0.5 ′ in the same mother liquor as 0.98 mass% of sodium citrate aqueous solution of S丨〇2, and 900 g of sodium citrate as the A12 Ο3. A sodium aqueous solution of 9000 g. In the meantime, the temperature of the reaction liquid was maintained at 80 °C. After the addition of p Η of the reaction solution, it rose to 12.5, and thereafter, there was almost no change. After the completion of the addition, the reaction solution was cooled to room temperature, and washed with a limiting filtration membrane to prepare a SiO 2 .Al 203 core particle dispersion having a solid concentration of 20% by mass. (Step a) Adding 170 g of pure water to the nuclear particle dispersion of 500 g, and heating to 98 ° C, maintaining the temperature, adding sodium citrate aqueous solution to remove alkali by cation exchange resin Then, the obtained citric acid solution (Si〇2 concentration: 3.5% by mass) was 3 000 g, and a first cerium oxide coating layer was formed to obtain a dispersion of core particles. (Step b) Continuing, the core particle dispersion liquid of the first cerium oxide coating layer having a solid content concentration of 13% by mass is washed with a limit filtration membrane to be added to pure water 1 1 2 5 g. Then, concentrated hydrochloric acid (3 5.5 ° / 〇) was added dropwise to make -135-200907491 to pH 1.0, and dealumination was carried out. Then, the aluminum salt dissolved in the ultimate filtration membrane was separated by adding 1 〇L of p Η3 in hydrochloric acid and 5 L of pure water to prepare a part of Si which was removed from the constituents of the core particles forming the first cerium oxide coating layer. 〇2 · αι2ο3 dispersion of porous particles (step c). A mixture of 15 〇〇g of the above porous particle dispersion, 500 g of pure water, 1 750 g of ethanol, and 6 2 6 g of ammonia water was heated to 35. (: After adding ethyl phthalate (S i Ο 2 concentration 28 mass% / 〇) 1 〇 4 g, the surface of the porous seed of the first silica sand coating layer will be formed with ethyl phthalate The hydrolyzed polycondensate is coated to form a second cerium oxide coating layer. Further, a hollow silica sand-based particle dispersion 1 in which a solvent is replaced by ethanol and has a solid content concentration of 2 〇% by mass is prepared by using a limiting filtration membrane. The first cerium oxide coating layer of the lanthanoid particles has a thickness of 3 nm, an average particle diameter of 45 nm, and a M0x/SiO 2 (mol ratio) of 0.0017 Å. The refractive index is 1.28 °, wherein the average particle diameter is measured by dynamic astigmatism. Examples 2 to 6 (Production of Antireflection Films 2 to 6) Antireflection films 2 to 6' were produced in the same manner as in the above-described Example 1, but the difference from the case of the above-described Example 1 was that antireflection In the production of the films 2 to 6, 'the zinc silicate sol of the coating composition 1 for the high refractive index layer is replaced with the particles described in Table 2 for coating the compositions 2 to 6 for high refractive index, and The transparent film substrate 1 or the transparent film substrate-136-200907491 material 2 is described. (Example 7) (Preparation of the antireflection film 7) The antireflection film 7 was produced in the same manner as in the above-described Example 1, but the difference from the case of the above-described Example 1 was that the antireflection film 7 was replaced. The coating composition 1 for a high refractive index layer, the following coating composition 7 for a high refractive index layer, and the transparent film substrate 2 are used. (Preparation of high refractive index layer 7) Coating on hard coating film 1 The coating composition 7 for a high refractive index layer described below was dried at 1 TC for 1 minute, and then irradiated with ultraviolet rays of 0.1 J/cm 2 to be cured to provide a high refractive index layer 7 having a thickness of 1 3 Onm. The refractive index of the high refractive index layer 7 is 1.58. (The coating composition for high refractive index layer 7) 60 parts by mass of zinc silicate sol (CX-Z610M-F2, manufactured by Nissan Chemical Industry Co., Ltd.) 12 parts by mass of alkanediol diacrylate (NK ester A-DOG, manufactured by Shin-Nakamura Chemical Co., Ltd.) 2-hydroxy-cyclohexyl-phenyl-ketone 2 parts by mass (IRGACURE 184, manufactured by Ciba Specialty Chemicals Co., Ltd.) 3 parts by weight of 3-methacryloxypropyltrimethoxydecane (KBM-503, Shin-Etsu Chemical Co., Ltd.) -137- 200907491 10% propylene glycol monomethyl ether solution of polyoxyalkylene alkyl methacrylate copolymer (FZ-2207, manufactured by DOW CORNING TORAY CO LTD) Propylene glycol monomethyl 360 parts by mass of ether 360 parts by mass of methyl ethyl ketone 200 parts by mass of Examples 8 to 1 2 (Production of antireflection film 8 to 1 2) An antireflection film can be produced in the same manner as in the above-described Example 7. 8 to 1 2 ', but differs from the case of the above-described embodiment 7 in that, in the production of the antireflection film 8 to 12, instead of the zinc silicate sol in the coating composition 7 for high refractive index layer The particles described in Table 2 and the transparent film substrate 1 or the transparent film substrate 2 described in Table 1 were used for the coating composition 8 to 1 2 for the high refractive index layer. Example 1 3 (Production of antireflection film 13) ± $ » In the case of 51 cases i, an antireflection film 13' can be produced, but the difference from the case of the above-described first embodiment is that In the production of the reflective film 1 3 , the coating composition 1 for the high refractive index layer was replaced, and the coating composition 13 for the high refractive index layer described below was used. (Preparation of High Refractive Index Layer 13> ϋ Μ ί 膜 Film; Upper Film Coating The following coating composition for high refractive index layer -138-200907491 1 3, dried at 50 ° C for 1 minute' Further, ultraviolet rays were irradiated at 0.1 J /cm 2 to harden the high refractive index layer 13° having a thickness of 130 nm and the refractive index of the high refractive index layer 13 was 1 · 5 9 ° (coating of the high refractive index layer) Cloth composition 1 3 ) Zinc citrate sol (CX-Z610M-F2, manufactured by Nissan Chemical Industry Co., Ltd.) 6 parts by mass of ethoxylated 2-methyl-1, 3-propanediol diacrylate vinegar (NK Ester A-IBD-2E, manufactured by Shin-Nakamura Chemical Co., Ltd.) 4 parts by mass of dioxanediol diacrylate (NK ester A-DOG, manufactured by Shin-Nakamura Chemical Co., Ltd.) 8 parts by mass of 1-hydroxy- 2 parts by mass of cyclohexyl-phenyl-ketone (IRGACURE 184, manufactured by Ciba Specialty Chemicals Co., Ltd.) 3 parts by mass of 3-methylpropenyloxypropyltrimethoxydecane (KBM-503, Shin-Etsu Chemical Co., Ltd. 10% propylene glycol monomethyl ether solution of polyoxyalkylene alkyl methacrylate copolymer (FZ-2207, manufactured by DOW CORNING TORAY CO LTD) 2 parts by mass of propylene glycol monomethyl ether 360 parts by mass of isopropyl alcohol 360 parts by mass of methyl ethyl ketone 200 parts by mass Example 1 4 to 1 8 (Production of antireflection film 1 4 to 18) and the above Example 1 3 In the same manner, the antireflection film 1 4 - 139 - 200907491 to 18 ' is produced, but the difference from the case of the above embodiment 13 is that the antireflection film 14 to 18 is replaced with a high refractive index. The zinc silicate sol in the coating composition 13 was used, and the particles described in Table 2 were used as the coating composition i 4 to 丨8 for the high refractive index layer, and the transparent film substrate 1 described in Table 1 was used. Or the transparent film substrate 2. Example 1 9 (Production of the antireflection film 19) The antireflection film i 9 ' was produced in the same manner as in the above-described Example 1, but the difference from the case of the above-described Example 1 was In the production of the antireflection film 19, 'the coating composition 1 for the high refractive index layer was replaced, and the coating composition for the high refractive index layer described below was used. 19. (Preparation of the local refractive index layer 19) Hard coating film 1 The upper film is coated with the following coating composition for high refractive index layer 1 9 ', dried at 50 ° C for 1 minute, and then The high refractive index layer 19 having a thickness of 130 nm is provided by ultraviolet 〇 _ 1 J /cm 2 irradiation, and the refractive index of the high refractive index layer 4 is 1.60. Material 1 9 ) 60 parts by mass of zinc silicate sol (CX-Z610M-F2, manufactured by Nissan Chemical Industry Co., Ltd.) Ethoxylated trimethylolpropane triacrylate 丨 2 parts by mass (NK ester A-TMPT-3EO) , manufactured by Shin-Nakamura Chemical Industry Co., Ltd.) -140- 200907491 8 parts by mass of pentaerythritol tetraacrylate (manufactured by NK Ester A-TMMT, manufactured by Shin-Nakamura Chemical Co., Ltd.) 1-hydroxy-cyclohexyl-phenyl-ketone 2 (Igly, Manufactured by Ciba Specialty Chemicals Co., Ltd.) 3 parts by weight of 3-methylpropenyloxypropyltrimethoxydecane (KBM-503, manufactured by Shin-Etsu Chemical Co., Ltd.) 2 parts by mass of 10% propylene glycol monomethyl ether solution of a polyoxyalkylene copolymer (FZ-2207, manufactured by DOW CORNING TORAY CO LTD) 360 parts by mass of 360 parts by mass of 200 parts by mass of propylene glycol monomethyl ether isopropanol methyl ethyl Ketone Examples 20 to 24 (Production of Antireflection Films 20 to 24) In the case of the embodiment 1-9, the antireflection films 20 to 24 were produced. However, the difference from the case of the above-described embodiment 19 is that the antireflection film 20 to 24 is used instead of the high refractive index layer. The zinc silicate sol of the cloth composition of 19, the particles described in Table 2 were used as the coating compositions 20 to 24 for the high refractive index layer, and the transparent film substrate 1 or the transparent film substrate 2 described in Table 1 was used. . Comparative Example 1 (Preparation of Comparative Anti-Reflection Film 2 5) In comparison with the case of the above-described Example 1, the anti-141 - 200907491 reflective film 25 was produced, but the pinch point of the case of the above-described Example 1 was produced. In the production of the antireflection film 25, in place of the coating composition 1 for high refractive index layer, the composition 25 is coated with the following high refractive index layer. Further, the difference from the present invention is that a sol of a titanium oxide having a non-conductive ancestor fc/: is used in the coating composition 25 for a high refractive index layer. (Preparation of High Refractive Index Layer 25) The following high refractive index layer & beef additive coating composition 2 5 ' was applied to the hard coating film 1 to be dried at 50 ° C for 1 minute. Further, the outer refractive index of 0.1 J/cm 2 was irradiated to harden it to provide a high refractive index layer having a thickness of 13 〇 nm, and the refractive index of the local refractive index layer 25 was 1.64. (Coating Composition 25 for High Refractive Index Layer) 60 parts by mass of 12 parts by mass of methyl isobutyl ketone dispersion sol of titanium oxide (manufactured by CI Huacheng Industrial Co., Ltd.) ethoxylated biguanide A dipropylene acid Vinegar (NK ester ABE-300, manufactured by Shin-Nakamura Chemical Co., Ltd.) 3-Methyl propylene methoxy propyl trimethoxy decane 3 parts by mass (KBM-503, manufactured by Shin-Etsu Chemical Co., Ltd.) 1-hydroxyl - 2 parts by mass of cyclohexyl-phenyl-ketone (IRGACURE 184, manufactured by Ciba Specialty Chemicals Co., Ltd.) 2 parts by weight of 10% propylene glycol monomethyl ether solution of polyoxyalkylene alkyl methacrylate copolymer (FZ -2207, manufactured by DOW CORNING TORAY CO LTD) 360 parts by mass of propylene glycol monomethyl ether - 142 - 200907491 360 parts by mass of 200 parts by mass of isopropanol methyl ethyl ketone Comparative Example 2 (Comparison of antireflection film 26) For comparison, In the same manner as in the case of the above-mentioned Comparative Example 1, the antireflection film 2 6 was produced. However, the difference from the case of the above Comparative Example 1 is that the coating composition of the antireflection film 26 is used without the addition of the high refractive index layer. Coating composition for high refractive index layer of particles of substance 25 2 6. Further, the difference from the present invention is that no particles are used in the coating composition 26 for a high refractive index layer. (Preparation of High Refractive Index Layer 26) On the hard coat film 1, the following coating composition 26 for a high refractive index layer was applied to the film, and dried at 50 ° C for 1 minute, and then UV O.lJ/ The high refractive index layer 26 having a thickness of 130 nm was set by hardening by cm2 irradiation. Further, the high refractive index layer 26 has a refractive index of 1.58. (Coating composition 26 for high refractive index layer) 12 parts by mass of ethoxylated bisphenol A diacrylate (NK ester ABE-300, manufactured by Shin-Nakamura Chemical Co., Ltd.) 1 - Merid-based - Ϊ 己 基 - 2 parts by mass of phenyl-hydrazine (IRGACURE 184, manufactured by Ciba Specialty Chemicals Co., Ltd.) 3 parts by mass of 3-methylpropenyloxypropyltrimethoxydecane (KBM-503, manufactured by Shin-Etsu Chemical Co., Ltd.) - 143- 200907491 10% propylene glycol monomethyl ether solution of polyoxyalkylene dimethyl polysiloxane copolymer (FZ-2207, manufactured by DOW CORNING TORAY CO LTD) Comparison of propylene glycol monomethyl ether isopropanol methyl ethyl ketone Example 3 (Comparison of the preparation of the anti-reflection film 27) For comparison, the film 27 was irradiated in the same manner as in the case of the above-described first embodiment, but in the production of the contrast film 27 of the case of the first embodiment, the high refractive index was replaced. The coating layer of the high refractive index layer described below is composed of the coating layer of the rate layer. Further, in the present invention, the coating composition for a high refractive index layer is an ionizing radiation-curable resin having a dioxane structure, which is an alkoxylated ionizing radiation curing type having a carbon number of 1 to 3. . (Production of High Refractive Index Layer 27) The following high refractive index layer 2, 7 was applied onto the hard coated film 1 at 5 (TC was dried for 1 minute, and then ultraviolet rays were hardened to have a thickness of 1). 3 High refractive index of Oiim H The refractive index of the high refractive index layer 27 is 1.63. (Coating composition 27 for high refractive index layer) Tin indium (ΙΤΟ) · Antimony dispersion liquid sol 2 parts by mass 360 parts by mass 360 quality 200 parts by mass, anti-reflection, anti-reflection material 1, using a different point adhesive without using grease and/or coating composition 0 · 1 J / cm 2 according to "27. And the 60 parts by mass -144-200907491 (manufactured by Catalyst Chemical Industries, Ltd.) 12 parts by mass of 2 parts by mass of trimethylolpropane triacrylate (NK ester A-TMPT, manufactured by Shin-Nakamura Chemical Co., Ltd.) 1-hydroxy-cyclohexyl -Phenyl-ketone (IRGACURE 184, manufactured by Ciba Specialty Chemicals Co., Ltd.) 3-Methyl propylene methoxy propyl trimethoxy decane 3 parts by mass (KBM-503, manufactured by Shin-Etsu Chemical Co., Ltd.) 1〇% propylene glycol monomethyl ether solution of alkyl dimethyl polyoxyalkylene copolymer (FZ-2207, manufactured by DOW CORNING TORAY CO LTD) propylene glycol monomethyl ether 360 parts by mass of isopropyl alcohol 360 parts by mass methyl ethyl ketone 200 parts by mass Comparative Example 4 (Comparative production of antireflection film 28) In the same manner as in the above-described first embodiment, the antireflection film 2 8 was produced. However, in contrast to the case of the above-described first embodiment, in the production of the antireflection film 28, the coating composition for the high refractive index layer was replaced. The material 1' is coated with the coating composition 28 for the high refractive index layer described below. The difference from the present invention is that the above general formula (1) is not used in the coating composition for high refractive index layer 28. The organic hydrazine compound or a hydrolyzate thereof or a polycondensate thereof (Production of high refractive index layer 28) The following coating composition for high refractive index layer is applied to the hard coating film 1 by film-145-200907491 Drying at 5 ° ° C for 1 minute, and then irradiating the outer ring to make it hard to form a high-reproducibility layer having a thickness of 1 3 Onm. The refractive index of the high refractive index layer 28 is 1.5. 8. °-U/c 28 〇 (coating composition for high refractive index layer 2 8 ) zinc silicate sol (CX-Z610M-F2, Nissan Manufactured by Industrial Co., Ltd.) methoxypolyethylene glycol #1000 acrylate (NK-vinegar AM-230G, Xinzhongcun Chemical Industry Co., Ltd. 60 parts of 8 parts of pentaerythritol tetraacrylate (NK ester A-TMMT , manufactured by Shin-Nakamura Chemical Co., Ltd.) hydroxy-cyclohexyl-phenyl-ketone 4 parts by mass 2 parts by mass (IRGACURE 184, manufactured by Ciba Specialty Chemicals Co., Ltd.) 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-il izIMT 0寸 0寸 08 000 000 08 000 ^i— - ^(Nlflr s爾—一 II 一 m- ll^gls歡浮粕 ~fis— 9z踏嫩某赵捏~8S, -lzIsl嫩la^gr ~3¾. ss»— ~~fis— -147- 200907491 i?掛!lvki岖 〔<N嗽〕 1 Ο ζΛ 3-甲基丙烯醯氧基丙基三甲氧基砂烷 3-甲基丙烯醯氧基丙基三甲氧基矽烷 i 3-甲基丙烯醯氧基丙基三甲氧基矽烷 3-甲基丙烯醯氧基丙基三甲氧基矽烷 1 碱 HI Wi κ 祕 m 褰 涵 (A 3-甲基丙烯醯氧基丙基三甲氧基砂烷 3-甲基丙烯醯氧基丙基三甲氧基矽烷 摧 粒子種類 銻酸鋅 氧化銻 氧化鍚 氧化鋅 ΙΤΟ ΑΤΟ 銻酸鋅 1 氧化銻 氧化鍚 氧化鋅 ITO ΑΤΟ 銻酸鋅 氧化銻 氧化鍚 氧化鋅 ΙΤΟ ΑΤΟ 銻酸鋅 氧化銻 氧化鍚 氧化鋅 ΙΤΟ ΑΤΟ 氧化鈦 摧 ITO 銻酸鋅 膠黏劑種類 乙氧化苯基丙烯酸酯 二噁烷乙二醇二丙烯酸酯 乙氧化2-甲基-1,3-丙二醇二丙烯酸酯 1 丁 二噁烷乙二醇二丙烯酸酯 乙氧化三羥甲基丙烷三甲丙烯酸酯 1 丁 季戊四醇四丙烯酸酯 乙氧化雙酚A二丙烯酸酯 ! 乙氧化雙酚A二丙烯酸酯 氍 κ Π1 遯 稍 & 勧 in 乙氧化苯基丙烯酸酯 〇 :Ζ 高折射率層1 高折射率層2 高折射率層3 高折射率層4 高折射率層5 高折射率層6 1高折射率層7 | 高折射率層8 OS 幽 樹· 岖 高折射率層10 高折射率層11 高折射率層12 高折射率層13 高折射率層14 高折射率層15 高折射率層16 高折射率層17 高折射率層18 高折射率層19 高折射率層20 高折射率層21 高折射率層22 | 高折射率層23 高折射率層24 高折射率層25 高折射率層26 高折射率層27 高折射率層28 實施例1 實施例2 實施例3 實施例4 實施例5 實施例6 1實施例7 1 實施例8 實施例9 實施例10 實施例11 實施例12 實施例13 實施例14 實施例15 實施例16 實施例17 1 實施例18 實施例19 實施例20 實施例21 實施例22 實施例23 實施例24 比較例1 比較例2 比較例3 比較例4 -148- 200907491 (評估方法) 對於如上述所製作之各種防反射薄膜1〜28的 製造直後與濕熱試驗後藉由下述方法進行評估。其 試驗之條件爲溫度6(TC、及濕度90%RH下5〇〇小 得之結果歸納如下述表3所示。 (耐擦性) 於試料中,溫度25°C、濕度60%RH之環境下 本鋼絲絨股份有限公司製bonstar#0000的鋼絲絨 上荷重250g/cm2,進行1 〇次反覆時測定每1 cm寬 痕條數。且以賦予傷痕條數的荷重的部分中傷痕條 處進行測定。僅爲1 〇條/cm以下時’並無實用上的 但以5本/cm以下爲佳,3本/cm以下爲更佳。 (密著性) 依據Π S K 5 6 0 0,進行格子帶剝離試驗。於試 以切斷器切成1〇〇個格子’壓上黏著帶(曰東 No · 3 1 B )後之剝離於相同場所進行3次重複。其後 離後之試料表面以目視觀察’以以下基準進行評估 密著性評估基準 〇:完全未剝離 △:確認有剝離 X :全面剝離 試料, 中濕熱 時。所 ,於曰 (SW ) 度之傷 數較多 問題, 料表面 電工製 ,帶剝 -149- 200907491 (耐溶劑性) h η式料表面以含浸乙醇之^ e m c 〇 t進行1 0此往復強力 _ β # ’以目視進行觀察,依據以下基準進行評估。 耐溶劑性評估基準 〇:無變化 △:稍有剝離 χ :全面剝離 (鉛筆硬度) 將試料於溫度25°C、濕度60%RH之環境下進行2小 時調濕後’使用JIS S 6006所規定之試驗用鉛筆,依據 JIS K 5400所規定之鉛筆硬度評估法,使用ikg之錘子, 以各硬度的鉛筆改變下對5處進行隨意刮,測定產生一條 傷痕時的硬度。且於此之傷痕係爲塗膜的破裂、擦傷、及 凹陷而言。數値越高表示高硬度越高。 (防靜電性) 將試料於溫度2 5 °C、濕度6 0 % R Η之環境下進行2小 時調濕後,使用川口電氣股份有限公司製ΤΩ測定模型 V Ε - 3 0,測定表面比電阻値。測定爲將2根電極(與試料 銜接部分爲1 c m χ 5 c m )以間隔1 c m下平行地配置,於該電 極上接觸試料並測定’將測定値之5倍値作爲表面比電阻 値 Ω / e m2。 防靜電性評估基準 -150 - 200907491 〇:1 ·〇χ 1 OWQ/cn^ 以下 l-OMOHQ/cm2 以下 △:比 l_〇xl01C)n/cm2 大, :比 l.〇xl〇HQ/cm2 大 (塗佈不均) 於黑丙烯基板(KUrex ex日東樹脂工業股份有限公司-il izIMT 0 inch 0 inch 08 000 000 08 000 ^i — - ^(Nlflr sr - one II a m-ll^gls euphoric 粕 fi ~fis - 9z stepping a certain Zhao pinch ~ 8S, -lzIsl tender la^ Gr ~33⁄4. ss»- ~~fis- -147- 200907491 i?hang!lvki岖[<N嗽] 1 Ο ζΛ 3-Methyl propylene methoxypropyltrimethoxy sulane 3-methyl propylene醯oxypropyltrimethoxydecane i 3-methylpropenyloxypropyltrimethoxydecane 3-methylpropenyloxypropyltrimethoxydecane 1 base HI Wi κ 秘 m 褰涵(A 3 -Methyl propylene methoxy propyl trimethoxy sulphate 3-methyl propylene methoxy propyl trimethoxy decane catalyzed by the particle type zinc citrate cerium oxide cerium oxide zinc oxide ΙΤΟ ΑΤΟ zinc citrate 1 cerium oxide cerium oxide Zinc oxide ITO ΑΤΟ 锑 锑 锑 锑 锑 锑 锑 钖 钖 钖 ΑΤΟ 锑 锑 锑 锑 ITO ITO ITO ITO ITO 锑 锑 锑 锑 ITO ITO 乙 苯基 苯基 苯基 苯基 苯基 苯基 苯基 苯基 苯基Acrylate ethoxylated 2-methyl-1,3-propanediol diacrylate 1 butanediol ethylene glycol diacrylate ethoxylate Trimethylolpropane trimethacrylate 1 butyl pentaerythritol tetraacrylate ethoxylated bisphenol A diacrylate! ethoxylated bisphenol A diacrylate 氍κ Π1 遁 slightly & 勧in ethoxylated phenyl acrylate 〇:Ζ High refractive index layer 1 High refractive index layer 2 High refractive index layer 3 High refractive index layer 4 High refractive index layer 5 High refractive index layer 6 1 High refractive index layer 7 | High refractive index layer 8 OS 幽 · 岖 High refractive index Layer 10 High refractive index layer 11 High refractive index layer 12 High refractive index layer 13 High refractive index layer 14 High refractive index layer 15 High refractive index layer 16 High refractive index layer 17 High refractive index layer 18 High refractive index layer 19 High refractive index Layer 20 High refractive index layer 21 High refractive index layer 22 | High refractive index layer 23 High refractive index layer 24 High refractive index layer 25 High refractive index layer 26 High refractive index layer 27 High refractive index layer 28 Example 1 Example 2 Implementation Example 3 Example 4 Example 5 Example 6 1 Example 7 1 Example 8 Example 9 Example 10 Example 11 Example 12 Example 13 Example 14 Example 15 Example 16 Example 18 Example 19 Example 20 Example 21 Example 22 Example 23 Example 24 Comparative Example 1 Comparative Example 2 Comparative Example 3 Comparative Example 4 -148-200907491 (Evaluation Method) The test carried out after the wet heat, such as various anti-reflection film produced in the above production 1~28 straight assessed by the following method. The test conditions are as follows: temperature 6 (TC, and humidity 90% RH 5 〇〇 results are summarized as shown in Table 3 below. (Abrasion resistance) In the sample, the temperature is 25 ° C, the humidity is 60% RH Under the environment, the steel wool bonstar #0000 steel wool load of 250g/cm2 is measured, and the number of traces per 1 cm is measured when 1 time is repeated. When it is only 1 〇 / cm or less, it is not practical, but it is preferably 5 or less, and 3 / cm or less is preferable. (Adhesiveness) According to Π SK 5 6 0 0, The strip tape peeling test was carried out. After the test, the cutter was cut into 1 grids, and the adhesive tape (Zhongdong No. 3 1 B) was pressed and peeled off in the same place for 3 repetitions. The surface was visually observed. 'According to the following criteria, the adhesion evaluation criteria were evaluated. 完全: No peeling at all △: Confirmation of peeling X: Comprehensive peeling of the sample, moderate heat and humidity. The problem of the number of injuries in the 曰 (SW) degree is large. Material surface made of electrical, stripping -149- 200907491 (solvent resistance) h η type material surface is impregnated with ethanol ^ Emc 〇t performed 1 0 This reciprocating strength _ β # ' was visually observed and evaluated according to the following criteria. Solvent resistance evaluation standard 〇: No change △: Slight peeling 全面: Full peeling (pencil hardness) The sample was at temperature After conditioning for 2 hours in an environment of 25 ° C and a humidity of 60% RH, 'using a pencil for testing according to JIS S 6006, using a pencil hardness evaluation method according to JIS K 5400, using a hammer of IKg, for each hardness Five pencils were randomly scraped under the change of pencil, and the hardness at the time of producing a flaw was measured, and the damage was caused by cracking, scratching, and dent of the coating film. The higher the number, the higher the hardness. The sample was conditioned at a temperature of 2 5 ° C and a humidity of 60 % R 2 for 2 hours, and then the surface specific resistance 値 was measured using a Τ Ω measurement model V Ε - 3 0 manufactured by Kawaguchi Electric Co., Ltd. In order to arrange two electrodes (1 cm χ 5 cm to the sample portion) in parallel at intervals of 1 cm, the sample was contacted on the electrode and measured as '5 times 値 of the measured 値 as the surface specific resistance 値 Ω / e M2. Anti-static Evaluation criteria -150 - 200907491 〇:1 ·〇χ 1 OWQ/cn^ The following l-OMOHQ/cm2 The following △: is larger than l_〇xl01C)n/cm2, : l is larger than l.〇xl〇HQ/cm2 ( Uneven coating) on black acrylic substrate (KUrex ex Nitto Resin Industry Co., Ltd.

線直管螢光燈(FLR40S · D/M-X 成表側,配置於自地板 高度的天井部上將白天光 松下電器產業股份有限 公司製)40Wx2本作爲1組的螢光燈下,評估者在於試料 正面時自評估者頭上向後方,於天井部照射前述螢光燈。 使自試料對於桌子之垂直方向呈2 5。請協的螢光燈照入, 此時的試料之塗佈不均以以下基準進行評估。 塗佈不均評估基準 ◎:完全無觀察到於試料因塗佈所引起的色不均,故 可適用。 〇:觀察到極少之於試料因塗佈所引起的色不均,但 可適用。 △:觀察到於試料上因塗佈所引起的色不均,難言爲 可適用。 X :觀察到多數於試料上因塗佈所引起的色不均’難 言爲可適用。 -151 - 200907491Line straight tube fluorescent lamp (FLR40S · D/MX on the side of the table, placed on the patio from the floor height, will be made by Daylight Matsushita Electric Industrial Co., Ltd.) 40Wx2 as a group of fluorescent lamps, the evaluator is in the sample On the front side, the illuminator is illuminated from the top of the evaluator to the rear of the illuminator. The self-test material is 2 5 in the vertical direction of the table. In the case of the fluorescent lamp, the coating unevenness of the sample is evaluated by the following criteria. Coating unevenness evaluation standard ◎: It is not observed that the sample is uneven in color due to coating, so it is applicable. 〇: Very little is observed in the color unevenness caused by the coating, but it is applicable. △: Color unevenness due to coating on the sample was observed, and it was difficult to say that it was applicable. X: It is difficult to observe that most of the color unevenness due to coating on the sample is applicable. -151 - 200907491

US 佈不均 濕熱試驗後 1 1 1 1 1 剡 製造後 ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ 〇 〇 〇 〇 〇 X &lt;] X &lt;] a w 濕熱試驗後 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 o 〇 〇 〇 〇 〇 〇 X X &lt; &lt; 製造後 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 X X &lt; &lt; 鉛筆硬度 濕熱試驗後 X m X m X D: X (T) X co X E m X (T) X cn X m X CO K X m X ro X cn X X X m X (N X iN X (N X (N X (N X cs X H以下 H以下 製造後 X X X m X X X K m E m X X X m K m X X m X cn X m X m X (N X &lt;N (N X (N X (N X (N X 耐溶劑性 濕熱試驗後 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 &lt; &lt;] X X 製造後 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 &lt;1 &lt; 密著性 濕熱試驗後 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 &lt;] &lt;] X X 製造後 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 &lt; X 耐擦性(條/cm) 濕熱試驗後 ο O o O o O O O O O O O O O o o O O O 〇 〇 〇 o 〇 〇 o 製造後 ο o o o o o o o o o o o o o o o o o o o o o o o CN ο fS 實施例1 實施例2 實施例3 實施例4 實施例5 實施例6 i實施例7 I 實施例8 實施例9 實施例10 I實施例111 實施例12 實施例13 實施例14 實施例15 實施例16 |實施例17 實施例18 實施例19 實施例20 實施例21 實施例22 實施例23 實施例24 比較例1 比較例2 比較例3 比較例4 -152 - 200907491 由上述表3之結果得知,使用含有本發明之至少1種 導電性粒子、至少1種經碳數1〜3的烷氧基化之電離放 射線硬化型樹脂及/或具有二噁烷結構之電離放射線硬化 型樹脂、以及前述一般式(1)所示之有機矽化合物或其 水解物或其縮聚物的塗佈液經塗佈所形成之高折射率層的 實施例1〜24之防反射薄膜,與比較例1〜4之防反射薄 膜相比,具有良好之耐擦性、密著性、鉛筆硬度、防靜電 性、及塗佈不均。 實施例2 5 繼續,將各一片實施例1〜24、及比較例1〜4所製作 之各防反射薄膜1〜28、與纖維素酯系光學補償薄膜之 KC4FR-1 (Konicaminolta opt股份有限公司製)作爲偏光 板用保護薄膜使用’依據下述順序製作出偏光板1 0 1〜1 2 4 及比較用偏光板125〜128。 (偏光薄膜的製作) 於鹼化度99.95莫耳%、聚合度2400的聚乙烯醇(以 下簡稱爲PVA ) 100質量份中含浸甘油10質量份及水170 質量份者經熔融混煉、脫泡後,自T塑模於金屬輥上進行 熔融壓出而製膜。其後,經乾燥、熱處理後得到P V A薄 膜。所得之PVA薄膜爲平均厚度40μιη、水分率4.4%、薄 膜寬爲3m。 將該PVA薄膜以預備膨潤、染色、濕式法的一軸延 -153- 200907491 伸、固定處理、乾燥、熱處理之順序下進行連續性處理而 製作偏光薄膜。 即,將上述PV A薄膜於3 0 °c水中浸漬3 0秒後預備膨 潤,含浸於碘濃度〇.4g/L、碘化鉀濃度40g/L之35°C水溶 液中3分鐘。繼續,無硼酸濃度4%之5 0°C水溶液中以薄 膜相關張力700N/m之條件下進行一軸延伸至6倍’於碘 化鉀濃度40g/L、硼酸濃度40g/L、氯化鋅濃度l〇g/L之 3 01:水溶液中浸漬5分鐘而進行固定處理。其後’取出 PVA薄膜,進行40。(3之熱風乾燥,再進行100°C下之5分 鐘熱處理。所得之偏光薄膜爲平均厚度15Pm° (偏光板的製作) 繼續,因具下述步驟1〜步驟5 ’貼合偏光薄膜與偏 光板用保護薄膜,製作出偏光板1 〇 1〜1 2 8 ° 步驟 1 作爲偏光板用保護薄膜,將例1〜24、及比較例1〜4 所製作之前述纖維素酯薄膜於60 °C之2莫耳/L氫氧化鈉溶 液中浸漬90秒,再經水洗、乾燥後與偏光子貼合之側進 行驗化。 同樣地作爲反側之偏光板用保護薄膜’亦進行市販之 纖維素酯薄膜 KC8UCR-5(Konicaminolta opt (股)製: 相位差薄膜)的鹼化。 -154- 200907491 步驟2 將前述偏光子浸漬於固體成分2質量%的聚乙烯醇黏 著劑槽中1〜2秒。 步驟3 輕輕地擦拭於步驟2中附著於偏光子的過剩黏著劑, 將此載池於以步驟1進行處理之纖維素酯薄膜的鹼化面上 ,進一步作爲反側之偏光板保護薄膜,欲於步驟1所處理 之市販纖維素酯薄膜KC8UCR-5的鹼化面銜接偏光子而層 合,作爲偏光板。 步驟4 將於步驟3將纖維素酯薄膜與偏光子經層合之偏光板 以壓力20〜3 ON/cm2、搬送速度約2m/分鐘下進行貼合。 步驟5 於8 0 °C的乾燥機中將步驟4所製作之偏光板進行2分 鐘乾燥。 同樣地使用纖維素酯薄膜製造出偏光板。 (偏光板之評估) 使用上述所製作之偏光板101〜12 8實施以下評估。 (液晶顯示裝置的製作) -155- 200907491 將進行辨識性評估之液晶顯示裝置製作誠如下述。 圖1表示所製作之液晶顯示裝置的構成截面圖。圖 所示液晶顯示裝置60係以光反射板64、導光板65、光 散板66、偏光板70 (具有偏光散亂異方性之偏光板保 薄膜7 1 /利用藉由二色性物質之光吸收作用的二色性偏 薄膜72/偏光板保護薄膜73之構成)、液晶顯示板68 辨識側偏光板69的順序進行層合之構成,其具有背光 〇 剝開預先貼合富士通製15型液晶顯示器VL- 1 5 3 0 S 背光側偏光板,將上述製作之偏光板1 〇 1〜1 2 8各貼合 液晶胞之玻璃面。 此時,偏光板之貼合方向爲該偏光板之纖維素酯薄 面成爲背光側,且吸收軸面向與預先貼合之偏光板的同 方向上進行,各製作出液晶顯示裝置201〜228。 &lt;液晶顯示裝置之評估&gt; 將所製作之各液晶顯示裝置201〜22 8的異物數, 上述所製作之每偏光板1 〇〇片進行評估。 於偏光子兩面上使用市販之纖維素酯薄膜KC8UY 其他與偏光板同樣下作成欲比較異物之偏光板1 29。將 用於比較異物之偏光板貼合成吸收軸面向於與預先貼合 背光側的偏光板之同一方向,製作出液晶顯示裝置229 此時進行白色顯示成正面亮度爲200cd/m2。正面亮度由 光放射売度計 CS-1000 (konicaminolta sensing 公司製 擴 護 光 67 之 於 膜 對 使 於 〇 分 200907491 進行測定。 作爲液晶顯示裝置之異物評估’同一白色顯示條件下 所測定之各液晶顯示裝置的異物數’使用比較異物的偏光 板129,若比液晶顯示裝置229之異物數還低時表示其較 爲優良。 將所製作之各液晶顯示裝置201〜2 2 8的異物數對於 上述所製作之每偏光板1 〇〇片,以目視及光學顯微鏡計算 尺寸爲50μπι以上的異物故障數,換算成每lm2之個數。 異物故障的產生係以下述基準進行評估。 A :目視及光學顯微鏡下所觀察到的尺寸50μηι以上 之異物故障未達3個/m2 B :目視及光學顯微鏡所觀察到的尺寸50μηι以上之 異物故障爲3個/m2以上,未達5個/m2 C :目視及光學顯微鏡所觀察到的尺寸50μιη以上之 異物故障爲5個/m2以上,未達10個/m2 D :目視及光學顯微鏡所觀察到的尺寸50μηι以上之 異物故障爲1 0個/m2以上 評估結果爲,使用本發明之防反射薄膜1〜24、及偏 光板1 0 1〜1 24的液晶顯示裝置20 1〜224的辨識性評估皆 爲A。相對於此,使用欲比較異物的偏光板1 29之液晶顯 7Γ:裝置229及、比較之液晶顯示裝置225〜228爲c等級 〇 將如上述所得之液晶面板20 1〜227,配置於自地板爲 8〇cm之高度的桌子上,由地板3m高度之天井部,以白天 -157- 200907491 顏色光直管螢光燈(FLR40S · D/M-X、松下電器產業股份 有限公司製)4 0 W X 2根作爲1組,於1 . 5 m間隔下設置1 〇 組。 此時評估者在於液晶面板顯示面正面時,配置成於天 井部設置螢光燈使螢光可由評估者之頭上往後方照射。對 於液晶面板,自對桌子爲垂直之方向爲25。傾斜之方向攝 入螢光燈’並對於畫面之易見度(辨識性)依據下述等級 進行評估。 A:最爲接近的螢光燈之雜影攝入未令人在意,字形 尺寸爲8以下的文字亦可讀 B :附近的螢光燈之雜影攝入稍令人在意,但遠處則 不會令人在意,字形尺寸爲8以下之文字勉強可讀 C:遠處的螢光燈之雜影攝入令人在意,字形尺寸爲 8以下之文字難以閱讀 D:螢光燈之雜影攝入非常令人在意,雜影攝入部分 的字形尺寸爲8以下之文字無法閱讀 評估結果得知’使用本發明之防反射薄膜1〜24、及 偏光板1 〇 1〜1 24的液晶顯示裝置20 1〜224皆爲A等級, 比比較之液晶顯示裝置2 2 5〜2 2 8更具良好辨識性。 實施例3 1 (防反射薄膜3 1的製作) 於上述製作之硬塗佈薄膜1上,如下述以高折射率層 、再以低折射率層之順序方式將防反射層進行塗佈設置, -158- 200907491 製作出防反射薄膜。 (高折射率層3 1的製作) 於硬塗佈薄膜1上,膜塗佈下述高折射率層用塗佈組 成物31,於5(TC進行1分鐘乾燥,再將紫外線O.lJ/cm2 照射使其硬化而設置厚度爲1 3 Onm之高折射率層3 1。且 ,該高折射率層3 1之折射率爲1 . 5 6。 (高折射率層用塗佈組成物3 1 ) 銻酸鋅溶膠 60質量份 (CX-Z610M-F2、日產化學工業股份有限公司製) 中空二氧化矽系粒子分散液1 9質量份 丙氧基化二三羥甲基丙烷四丙烯酸酯 12質量份 (NK酯AD-TMP-4P、新中村化學工業股份有限公司製) 1-羥基-環己基-苯基-酮 2質量份 (IRGACURE 184、Ciba Specialty Chemicals 股份有限公司製) 3-丙烯氧基丙基三甲氧基矽烷 3質量份 (KBM-5103、信越化學工業股份有限公司製) 聚氧伸烷基二甲基聚矽氧烷共聚物之10%丙二醇單甲醚液2質量份 (FZ-2207、DOW CORNING TORAY CO LTD 製) 360質量份 360質量份 200質量份 丙二醇單甲醚 異丙醇 甲基乙基酮 -159- 200907491 (低折射率層3 1的製作) 於上述高折射率層31之表面上,膜塗佈 率層用塗佈組成物3 1,於50°C進行1分鐘乾 外線O.lJ/cm2照射而使其硬化,再於12(TC下 熱硬化,欲使厚度成爲8 Onm而設置低折射率J 防反射薄膜3 1。且,該低折射率層3 1之折射琴 (低折射率層用塗佈組成物3 1 ) 四乙氧基矽烷水解物31 中空二氧化矽系粒子分散液1 3-丙烯氧基丙基三甲氧基矽烷 (KBM-5103、信越化學工業股份有限公司製) 鋁乙基乙醯乙酸酯二異丙酸酯 (ALCH、Kawaken Fine Chemicals 股份有限公司製) α-丁基-ω-〔3- (2,2-雙(羥基甲基)丁氧基)丙基〕 聚二甲基矽氧烷之10%異丙醇液 (SignplanFM-DA21、chisso 股份有限公司製) 丙二醇單甲醚 異丙醇 (四乙氧基矽烷水解物3 1之調製) 混合四乙氧基矽烷23 0g、與乙醇440g,甘 乙酸水溶液1 2 0 g後,於2 5 t之水浴中進行2 0 調製四乙氧基矽烷水解物3 1。 下述低折射 燥,再將紫 隹行1分鐘 酔3 1,製作 i 爲 1 .35。 90質量份 3〇質量份 3質量份 1質量份 2質量份 450質量份 450質量份 ^此添加2 % 小時攪拌而 -160 - 200907491 (中空二氧化矽系粒子分散液31之調製) 於平均粒徑5nm、Si02濃度20質量%之二氧化矽溶膠 100g、與純水19〇〇g之混合物於80°C進行加溫。該反應母 液之PH爲1〇.5,於同母液中同時添加作爲Si02之0.98 質量%矽酸鈉水溶液9 0 0 0 g與作爲A12 ◦ 3之1 . 〇 2質量%鋁 酸鈉水溶液9000g。其間,將反應液之溫度保持於8〇t。 反應液之pH於添加後馬上上升至1 2 · 5,其後幾乎無變化 。添加終了後,將反應液冷卻至室溫,以極限過濾膜進行 洗淨調製出固體成分濃度20質量%之Si02 . Al2〇3核粒子 分散液。(步驟a ) 於該核粒子分散液 5 0 0g中加入純水1 700g,並於 9 8 °C進行加溫,保持該溫度下,添加將矽酸鈉水溶液以陽 離子交換樹脂進行脫鹼所得之矽酸液(Si02濃度3.5質量 % ) 3000g,得到形成第1二氧化矽被覆層之核粒子的分散 液。(步驟b) 繼續,於形成以極限過濾膜洗淨後成爲固體成分濃度 1 3質量%之第1二氧化矽被覆層的核粒子分散液5 0 0 g中 加入純水1125g,再滴入濃鹽酸(35.5%)使其pH 1.0後 進行脫鋁處理。 繼續,一邊加入pH3之鹽酸水溶液10L與純水5L, 一邊以極限過濾膜分離溶解之鋁鹽,調製出除去形成第1 二氧化矽被覆層之核粒子的構成成分一部份的 Si〇2 · Al2〇3多孔質粒子之分散液(步驟C)。 -161 - 200907491 將上述多孔質粒子分散液1 5 0 0 g、與純水5 0 0 g、乙醇 175 0g、及28%氨水626g之混合液加溫至35°C後,添加乙 基矽酸酯(Si02濃度28質量。/〇 ) 104g,將形成第1二氧 化矽被覆層之多孔質粒子的表面以乙基矽酸酯之水解縮聚 物被覆後形成第2二氧化矽被覆層。繼續,使用極限過濾 膜’調製出溶劑由乙醇取代的固體成分濃度20質量%之中 空二氧化砂系粒子分散液1。 該中空二氧化矽系粒子之第1二氧化矽被覆層的厚度 爲 3nm、平均粒徑爲 45nm、M0x/Si02(莫耳比)爲 0.0017、折射率爲1.28。其中該平均粒徑藉由動態散光法 測定。 實施例3 2〜4 8 (防反射薄膜32〜48的製作) 與上述實施例3 1之情況同樣下,製作出防反射薄膜 32〜48,與上述實施例3 1的情況之相異點爲,防反射薄 膜的製作中,使用表4、表5所記載的導電性粒子與無機 粒子、有機矽化合物、及電離放射線硬化型樹脂、及使用 透明薄膜基材丨或透明薄膜基材2。 比較例3 1〜3 3 (防反射薄膜4 9〜5 1的製作) 與上述實施例3 1之情況同樣下,製造防反射薄膜49 〜5 1 ’與上述實施例31的情況之相異點爲,防反射薄膜 -162- 200907491 的製作中使用表5所記載的導電性粒子與無機粒子、有機 矽化合物、及電離放射線硬化型樹脂。 且,作爲表4、表5所記載的導電性粒子及無機粒子 ,使用以下製品。 作爲導電性粒子使用以下製品。 銻酸鋅:甲醇分散溶膠(日產化學工業股份有限公司 製) 氧化銻:IP A分散溶膠(觸媒化成工業股份有限公司 製) 氧化錫:乙醇分散溶膠(C · I ·化成股份有限公司製) 氧化鋅:乙醇分散溶膠(C · I.化成股份有限公司製) IT Ο : IPA分散溶膠(觸媒化成工業股份有限公司製 ) ATO : IPA分散溶膠(觸媒化成工業股份有限公司製 ) 作爲無機粒子使用以下製品。 中空二氧化矽:前述中空二氧化矽系粒子分散液3 1 膠體二氧化矽:ΙΡΑ分散溶膠(日產化學工業股份有 限公司製) 氟化鎂:甲基異丁基酮分散溶膠(C.I.化成股份有限 公司製) 氧化鈦:甲基異丁基酮分散溶膠(C . I.化成工業股份 有限公司製) -163- 200907491After the US cloth uneven heat and humidity test, 1 1 1 1 1 剡 After the manufacture ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ 〇〇〇〇〇 X &lt;] X &lt;] aw Damp heat test After 〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇o 〇〇〇〇〇〇XX &lt;&lt; after manufacturing 〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇 〇〇〇〇〇〇XX &lt;&lt; pencil hardness after damp heat test X m X m XD: X (T) X co XE m X (T) X cn X m X CO KX m X ro X cn XXX m X ( NX iN X (NX (NX (NX cs XH below H manufactured below) XXX m XXXK m E m XXX m K m XX m X cn X m X m X (NX &lt;N (NX (NX (NX (NX) After the damp heat test 〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇&lt;&lt;] XX after manufacture〇〇〇〇〇〇〇〇〇〇〇〇〇〇 〇〇〇〇〇〇〇〇〇〇〇〇&lt;1 &lt; After the adhesion damp heat test〇〇〇 〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇&lt;] &lt;] XX After manufacture〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇〇 〇〇〇〇〇〇&lt; X rub resistance (bar/cm) after damp heat test ο O o O o OOOOOOOOO oo OOO 〇〇〇o 〇〇o After manufacture ο ooooooooooooooooooooo oo CN ο fS Example 1 Example 2 Implementation Example 3 Example 4 Example 5 Example 6 i Example 7 I Example 8 Example 9 Example 10 I Example 111 Example 12 Example 13 Example 14 Example 15 Example 16 Example 17 Example 18 Example 19 Example 20 Example 21 Example 22 Example 23 Example 24 Comparative Example 1 Comparative Example 2 Comparative Example 3 Comparative Example 4 -152 - 200907491 It is known from the results of Table 3 above that at least the present invention is used. One type of conductive particles, at least one ionized radiation-curable resin having alkoxylation of 1 to 3 carbon atoms, and/or an ionizing radiation-curable resin having a dioxane structure, and the general formula (1) It The antireflection film of Examples 1 to 24 in which the coating liquid of the organic cerium compound or the hydrolyzate or the polycondensate thereof was applied was coated with the high refractive index layer, and the antireflection film of Comparative Examples 1 to 4 had Good scratch resistance, adhesion, pencil hardness, antistatic properties, and uneven coating. Example 2 5 Continuing, each of the antireflection films 1 to 28 produced in Examples 1 to 24 and Comparative Examples 1 to 4, and KC4FR-1 (Konicaminolta opt Co., Ltd.) and the cellulose ester-based optical compensation film were used. As a protective film for a polarizing plate, 'the polarizing plates 1 0 1 to 1 2 4 and the comparative polarizing plates 125 to 128 were produced in the following order. (Production of Polarizing Film) 100 parts by mass of polyvinyl alcohol (hereinafter abbreviated as PVA) having a degree of alkalinity of 99.95 mol% and a degree of polymerization of 2400, 10 parts by mass of glycerin and 170 parts by mass of water are melt-kneaded and defoamed. Thereafter, the film was formed by melt-extrusion from a T mold on a metal roll. Thereafter, after drying and heat treatment, a P V A film was obtained. The obtained PVA film had an average thickness of 40 μm, a moisture content of 4.4%, and a film width of 3 m. The PVA film was subjected to continuous treatment in the order of preliminary swelling, dyeing, wet-type one-axis extension -153-200907491 stretching, fixing treatment, drying, and heat treatment to prepare a polarizing film. Namely, the PV A film was immersed in water at 30 ° C for 30 seconds, and then preliminarily immersed in an aqueous solution of 35 ° C having an iodine concentration of 4 4 g / L and a potassium iodide concentration of 40 g / L for 3 minutes. Continue, in a 50 °C aqueous solution without boric acid concentration of 4%, with a film-related tension of 700 N / m, one-axis extension to 6 times 'potassium iodide concentration 40g / L, boric acid concentration 40g / L, zinc chloride concentration l〇 g/L 3 01: The solution was immersed for 5 minutes in an aqueous solution for fixation. Thereafter, the PVA film was taken out and subjected to 40. (3, hot air drying, heat treatment at 100 ° C for 5 minutes. The obtained polarizing film has an average thickness of 15 Pm ° (production of polarizing plate) continues, with the following steps 1 to 5 'adhesive film and polarized light The protective film for a sheet was used to produce a polarizing plate 1 〇1 to 1 2 8 ° Step 1 As a protective film for a polarizing plate, the cellulose ester film produced in Examples 1 to 24 and Comparative Examples 1 to 4 was applied at 60 ° C. The immersion in the 2 mol/L sodium hydroxide solution for 90 seconds, followed by washing with water, drying, and testing with the side of the polarizer. Similarly, as a protective film for the polarizing plate of the opposite side, the cellulose is also commercially available. Alkalinization of the ester film KC8UCR-5 (manufactured by Konicaminolta opt): -154- 200907491 Step 2 The above-mentioned polarizer is immersed in a polyvinyl alcohol adhesive tank having a solid content of 2% by mass for 1 to 2 seconds. Step 3 Gently wipe the excess adhesive attached to the polarizer in step 2, and apply the carrier to the alkalized surface of the cellulose ester film treated in step 1, further as the reverse side polarizing plate protective film. , the marketer who wants to deal with step 1 The alkalized surface of the vitamin ester film KC8UCR-5 is bonded to the polarizer and laminated as a polarizing plate. Step 4 The polarizing plate in which the cellulose ester film and the polarizer are laminated in step 3 is subjected to a pressure of 20 to 3 ON/cm 2 . The transfer speed was carried out at about 2 m/min. Step 5 The polarizing plate prepared in the step 4 was dried in a dryer at 80 ° C for 2 minutes. Similarly, a polarizing plate was produced using a cellulose ester film. Evaluation of the board) The following evaluations were carried out using the polarizing plates 101 to 12 8 produced as described above. (Production of liquid crystal display device) -155-200907491 The liquid crystal display device for performing the visibility evaluation is as follows. A liquid crystal display device 60 is a light reflecting plate 64, a light guiding plate 65, a light diffusing plate 66, and a polarizing plate 70 (a polarizing plate protective film having a polarization dispersing anisotropy 7 1 / The configuration of the dichroic polarizing film 72/polarizing plate protective film 73 by the light absorbing effect of the dichroic substance and the liquid crystal display panel 68 identifying the side polarizing plate 69 are laminated, and the backlight is stripped. Open pre-fit Fujitsu 15-type liquid crystal display VL- 1 5 3 0 S backlight side polarizing plate, the polarizing plates 1 1 1~1 2 8 prepared above are respectively attached to the glass surface of the liquid crystal cell. At this time, the bonding direction of the polarizing plate is The thin surface of the cellulose ester of the polarizing plate was on the backlight side, and the absorption axis direction was performed in the same direction as the polarizing plate to be bonded in advance, and the liquid crystal display devices 201 to 228 were produced. <Evaluation of Liquid Crystal Display Device> The number of foreign matter of each of the liquid crystal display devices 201 to 22 8 was evaluated for each of the polarizing plates 1 produced as described above. The commercially available cellulose ester film KC8UY was used on both sides of the polarizer. Other polarized plates were used to make foreign matter similar to the polarizing plate 1 29 . The polarizing plate for comparing foreign matter was bonded to the absorption axis so as to face the same direction as the polarizing plate on the backlight side, and the liquid crystal display device 229 was produced in a white color so that the front luminance was 200 cd/m2. The front side brightness is measured by a light emission oximeter CS-1000 (Konicaminolta sensing company's expansion light 67 is measured by a film pair, and the measurement is performed on a liquid crystal display device. The number of foreign matter in the display device 'is a relatively large amount of the foreign matter-based polarizing plate 129, which is better than the number of foreign matter of the liquid crystal display device 229. The number of foreign matter of each of the liquid crystal display devices 201 to 2 2 produced is Each of the polarizing plates 1 produced was subjected to visual and optical microscopy to calculate the number of foreign matter failures of 50 μm or more, which was converted into the number per lm 2. The generation of foreign matter failures was evaluated on the basis of the following criteria: A: Visual and optical The foreign matter with a size of 50μηι or more observed under the microscope failed to reach 3/m2 B: The size of the foreign matter of 50μηι or more observed by visual observation and optical microscope is 3/m2 or more, less than 5/m2 C : Visual inspection And the foreign matter with a size of 50 μm or more observed by an optical microscope is 5/m2 or more, and less than 10/m2 D: visual and optical microscope The foreign matter failure of the size of 50 μm or more was found to be 10 / m 2 or more, and the evaluation results of the liquid crystal display devices 20 1 to 224 using the antireflection film 1 to 24 of the present invention and the polarizing plates 10 1 to 1 24 The evaluation is all A. In contrast, the liquid crystal display of the polarizing plate 1 29 to be compared with the foreign matter is used: the device 229 and the comparative liquid crystal display devices 225 to 228 are c-level, and the liquid crystal panel 20 1 obtained as described above is used. 227, disposed on a table with a height of 8〇cm from the floor, from the patio section with a height of 3m, with daytime -157-200907491 color light straight tube fluorescent lamp (FLR40S · D/MX, Matsushita Electric Industrial Co., Ltd. 4) W 0 2 as a group, set 1 〇 group at 1.5 m interval. At this time, the evaluator is placed on the front of the LCD panel display surface, and is configured to set the fluorescent lamp on the patio to make the illuminator available to the evaluator. For the liquid crystal panel, the vertical direction of the table is 25. The fluorescent light is taken in the direction of the tilting' and the visibility (identification) of the screen is evaluated according to the following levels. For the close proximity of fluorescent lights The intake is not noticeable, and the font size of 8 or less is also readable. B: The noise of the nearby fluorescent light is slightly noticeable, but it is not noticeable in the distance. The font size is 8 or less. The text is barely readable. C: The shadow of the fluorescent light in the distance is pleasant. The font size is 8 or less. It is difficult to read. D: The shadow of the fluorescent light is very interesting. The characters having a font size of 8 or less cannot be read. The results of the evaluation are as follows: 'The liquid crystal display devices 20 to 224 using the antireflection film 1 to 24 of the present invention and the polarizing plates 1 〇 1 to 1 24 are all A grades, and the comparison is compared. The liquid crystal display device 2 2 5 2 2 2 8 is more recognizable. Example 3 1 (Production of Antireflection Film 3 1 ) On the hard coat film 1 produced as described above, an antireflection layer was applied in the order of a high refractive index layer and a low refractive index layer as follows. -158- 200907491 An anti-reflective film was produced. (Production of High Refractive Index Layer 31) On the hard coat film 1, the following coating composition 31 for a high refractive index layer was applied to the film, and dried at 1 (TC for 1 minute, and then ultraviolet oxide. The high refractive index layer 31 having a thickness of 1 3 Onm is provided by hardening by cm2 irradiation, and the refractive index of the high refractive index layer 31 is 1.56. (The coating composition for high refractive index layer 3 1 60 parts by mass of zinc silicate sol (CX-Z610M-F2, manufactured by Nissan Chemical Industry Co., Ltd.) hollow cerium oxide-based particle dispersion liquid, 9 parts by mass, propoxylated ditrimethylolpropane tetraacrylate, 12 mass (N-hydroxy-cyclohexyl-phenyl-one 2 parts by mass (IRGACURE 184, manufactured by Ciba Specialty Chemicals Co., Ltd.) 3-propenyloxy group (manufactured by NK-ester AD-TMP-4P, manufactured by Shin-Nakamura Chemical Co., Ltd.) 3 parts by mass of propyltrimethoxydecane (KBM-5103, manufactured by Shin-Etsu Chemical Co., Ltd.) 2 parts by weight of 10% propylene glycol monomethyl ether solution of polyoxyalkylene alkyl methacrylate copolymer (FZ- 2207, manufactured by DOW CORNING TORAY CO LTD) 360 parts by mass of 360 parts by mass of 200 parts by mass of propylene glycol monomethyl ether isopropanol methyl b Ketone-159-200907491 (Production of Low Refractive Index Layer 31) On the surface of the above-mentioned high refractive index layer 31, the film coating rate layer was coated with the composition 31 at 1 degree at 50 ° C for 1 minute. .lJ/cm2 is hardened by irradiation, and then thermally hardened at 12 (TC), and a low refractive index J antireflection film 31 is set to have a thickness of 8 Onm. Moreover, the refractive index of the low refractive index layer 31 is Coating Composition for Low Refractive Index Layer 3 1 ) Tetraethoxydecane Hydrolysate 31 Hollow Cerium Oxide Particle Dispersion 1 3-Propoxypropyltrimethoxydecane (KBM-5103, Shin-Etsu Chemical Co., Ltd. Company made of aluminum ethyl acetonitrile acetate diisopropyl ester (ALCH, manufactured by Kawaken Fine Chemicals Co., Ltd.) α-butyl-ω-[3-(2,2-bis(hydroxymethyl)butoxide 10% isopropyl alcohol solution of polypropyl methoxide (SignplanFM-DA21, manufactured by Chisso Co., Ltd.) propylene glycol monomethyl ether isopropanol (modulation of tetraethoxy decane hydrolyzate 3 1) After mixing 23 g of tetraethoxy decane, 440 g with ethanol, and 120 g of an aqueous solution of glycine acetic acid, 20 0 tetraethoxy decane water was prepared in a 25 t water bath. The following is a low-refractive dryness, and the sable is further simmered for 3 minutes for 1 minute to produce i of 1.35. 90 parts by mass of 3 parts by mass of 3 parts by mass of 1 part by mass of 2 parts by mass of 450 parts by mass of 450 parts by mass. ^This addition 2% hourly stirring and -160 - 200907491 (modulation of hollow cerium oxide-based particle dispersion 31) 100 g of cerium oxide sol having an average particle diameter of 5 nm and a SiO 2 concentration of 20% by mass, and 19 〇〇g of pure water The mixture was warmed at 80 °C. The reaction mother liquid had a pH of 1 〇.5, and a 0.98 mass% sodium citrate aqueous solution of SiO 2 was added at the same time as 980 g of SiO 2 and 9000 g of an aqueous sodium aluminate solution as A 2 mass%. In the meantime, the temperature of the reaction liquid was maintained at 8 Torr. The pH of the reaction solution rose to 1 2 · 5 immediately after the addition, and there was almost no change thereafter. After the completion of the addition, the reaction solution was cooled to room temperature, and washed with a limiting filtration membrane to prepare a SiO 2 .Al 2 〇 3 core particle dispersion having a solid concentration of 20% by mass. (Step a) 1 700 g of pure water was added to 500 g of the core particle dispersion, and heating was carried out at 98 ° C. At this temperature, the sodium citrate aqueous solution was de-alkali obtained by cation exchange resin. The citric acid solution (SiO 2 concentration: 3.5% by mass) was 3000 g, and a dispersion liquid of the core particles forming the first ceria coating layer was obtained. (Step b) Continuing, 1125 g of pure water was added to the core particle dispersion liquid of the first ceria coating layer having a solid content concentration of 13% by mass after being washed with the limit filtration membrane, and then concentrated into 1125 g. Hydrochloric acid (35.5%) was subjected to dealumination treatment after pH 1.0. Further, while adding 10 L of a hydrochloric acid aqueous solution of pH 3 and 5 L of pure water, the dissolved aluminum salt was separated by a limiting filtration membrane to prepare Si 〇 2 which was a part of the constituents of the core particles forming the first cerium oxide coating layer. A dispersion of Al2〇3 porous particles (step C). -161 - 200907491 After heating the mixture of the above porous particle dispersion 1 500 g, pure water 500 g, ethanol 175 0 g, and 28% ammonia water 626 g to 35 ° C, ethyl citric acid was added. 104 g of the ester (SiO 2 concentration: 28 mass% / 〇), and the surface of the porous particle forming the first cerium oxide coating layer was coated with a hydrolyzed polycondensate of ethyl phthalate to form a second cerium oxide coating layer. Then, using the ultimate filtration membrane ???, a solid silica concentration of 20% by mass of the solvent was prepared by adding ethanol to the hollow silica sand-based particle dispersion 1. The first cerium oxide coating layer of the hollow cerium oxide-based particles had a thickness of 3 nm, an average particle diameter of 45 nm, a M0x/SiO 2 (molar ratio) of 0.0017, and a refractive index of 1.28. Wherein the average particle diameter is determined by dynamic astigmatism. [Example 3] 2 to 4 8 (Production of antireflection films 32 to 48) The antireflection films 32 to 48 were produced in the same manner as in the above-described Example 31, and the difference from the case of the above-described Example 31 was In the production of the antireflection film, the conductive particles and inorganic particles described in Tables 4 and 5, the organic ruthenium compound, and the ionizing radiation-curable resin, and the transparent film substrate 丨 or the transparent film substrate 2 are used. Comparative Example 3 1 to 3 3 (Production of Antireflection Films 49 to 5 1) The same as in the case of the above-described Example 3, the production of the antireflection film 49 to 5 1 ' is different from the case of the above-described Example 31 In the production of the antireflection film-162-200907491, the conductive particles described in Table 5, inorganic particles, an organic ruthenium compound, and an ionizing radiation-curable resin were used. Further, as the conductive particles and inorganic particles described in Tables 4 and 5, the following products were used. The following products were used as the conductive particles. Zinc citrate: methanol dispersion sol (manufactured by Nissan Chemical Industry Co., Ltd.) yttrium oxide: IP A dispersion sol (manufactured by Catalyst Chemical Industries, Ltd.) Tin oxide: ethanol dispersion sol (C · I · Chemical Co., Ltd.) Zinc Oxide: Ethanol Dispersion Sol (C·I. Chemical Co., Ltd.) IT Ο : IPA Dispersion Sol (manufactured by Catalyst Chemical Industries, Ltd.) ATO : IPA Dispersion Sol (manufactured by Catalyst Chemical Industries, Ltd.) The particles used the following products. Hollow cerium oxide: the above hollow cerium oxide-based particle dispersion 3 1 colloidal cerium oxide: cerium dispersion sol (produced by Nissan Chemical Industry Co., Ltd.) magnesium fluoride: methyl isobutyl ketone dispersion sol (CI Huacheng shares limited Company made) Titanium oxide: Methyl isobutyl ketone dispersion sol (C. I. Chemical Industry Co., Ltd.) -163- 200907491

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200907491 組。 此時評估者在於液晶面板顯示面正面時,配置成於天 井部設置螢光燈使螢光可由評估者之頭上往後方照射。對 於液晶面板,自對桌子爲垂直之方向爲2 5 °傾斜之方向攝 入螢光燈,並對於畫面之易見度(辨識性)依據下述等級 進行評估。 A:最爲接近的螢光燈之雜影攝入未令人在意,字形 尺寸爲8以下的文字亦可讀 B :附近的螢光燈之雜影攝入稍令人在意,但遠處則 不會令人在意,字形尺寸爲8以下之文字勉強可讀 C:遠處的螢光燈之雜影攝入令人在意,字形尺寸爲 8以下之文字難以閱讀 D:螢光燈之雜影攝入非常令人在意,雜影攝入部分 的字形尺寸爲8以下之文字無法閱讀 評估結果得知,使用防反射薄膜3 1〜4 8、及偏光板 1 3 1〜1 4 8之液晶面2 3 1〜2 4 8皆爲辨識性評估爲A者,與 比較液晶面板249〜25 1相比較,其具有更良好辨識性。 【圖式簡單說明】 〔圖1〕表示實施例所製作之液晶顯示裝置構成的截 面圖。 【主要元件符號說明】 60 :液晶顯示裝置 -172- 200907491 64 : 65 : 6 6: 67 : 68 : 69 : 70 : 71、 72 : 光反射板 導光板 光擴散板 背光 液晶顯示板 辨識側偏光板 偏光板 73 :偏光板保護薄膜 二色性偏光薄膜 -173-3-aminopropyltrimethoxysilane coupled It] Wi ffi- ili in ethylene trimethoxy decane twist · secret ill 遁ilmll P ii in 1E K] ffi- Μ &lt;π propyl trioxane propylene oxide Propyloxy alkoxypropyl decane NJ Η- m propyl propyl tridecyl propyl trioxane propylene oxy propoxy decane slightly secret m old secret m joint secret J | k 铿 m (N辄E E- I mm ΓΛ ΓΛ m N saa S aaa S as am Μ 遁遁遁遁 Μ EE IE E Ε E: K: IE Deputy booth i am butterfly am paste; om paste am paste Paste; iM paste am paste; ΪΜ paste am paste am 1 inch line hardened species &amp; cut fr翳B· pier fr翳d翳Ψ m ΐΤί| 11 ^ ΜΗ ^ rn| 1 1 ^ ni| 11 ^ 赖I 1 ^ Lai 1 1 ^ liil 11 ^ 1 1 ^ nl I ]1 ^ 辕J麄iii| 1 1 ^ nif 1 1 ^ Secret Secret iii Secret EK r IE E IE 黩&lt;]mi| Membrane!1 • N Secret - WL / m Secrets • ων m Secrets m Secrets 1 1 Creativity 11 _ U{UC minus 11 lang 1 1 _ 嘁 1 1 创11 Hall 蠊 1 1 Check fr Umi1 WNW 塭竑&gt;nr&gt; SlCl number MTt&gt; 壊驴驴驴t 氍氍»γγΓ&gt; ΜΤΓ ΜΤΓ&gt; 激 fTt*&gt; 壊臧嫲嘁 Secret reduction I! Transparent film thickness ig 〇§ gg Ο 〇g § r-^ rn (Ν ΓΛ m ro 寸 C^) Ό r- 〇〇〇\ _〇匡匡mm 辑 辑 辑 m ⁄ ⁄ ⁄ ⁄ ⁄ ⁄ ⁄ ⁄ ⁄ ⁄ ⁄ ⁄ ⁄ ⁄ ⁄ ⁄ ⁄ ⁄ ⁄ ⁄ ⁄ ⁄ ⁄ ⁄ ⁄ ⁄ ⁄ ⁄ ⁄ ⁄ ⁄ ⁄ ⁄ ⁄ ⁄ ⁄ ⁄ ⁄ -164- 200907491 Types of organic antimony compounds Ethylene trimethoxy sand court i 3-glycidoxypropyl trimethoxy decane slightly lig 1\1 甾111 (N 3-isocyanate propyl triethoxy decane 3- Propenyloxypropyltrimethoxy | decane 3-methacryloxypropyltrimethoxydecane 3-aminopropyltrimethoxydecaneethylenetrimethoxysane 3-glycidoxypropyltrimethoxy | Base decane E: _ Μ κι 黯ui (N 3-propenyloxypropyltrimethoxydecane ionizing radiation-curable resin ί mm propoxyditrimethylolpropane tetraacrylate propoxyditrimethylolpropane Tetraacrylate propoxyditrimethylolpropane tetraacrylate Oxidized ditrimethylolpropane tetraacrylate propoxyditrimethylolpropane IV, acrylate propoxyditrimethylolpropane tetraacrylate propoxyditrimethylolpropane tetraacrylate propane trioxide Methylpropane tetraacrylate propoxyditrimethylolpropane tetraacrylate propoxyditrimethylolpropane tetraacrylate 4-fluoroextended ethyl-6-fluoropropanyl copolymer inorganic particle type colloidal Yttrium oxide magnesium fluoride hollow cerium oxide colloidal cerium oxide magnesium fluoride hollow cerium oxide colloidal cerium oxide gasification magnesium hollow cerium oxide hollow cerium oxide titanium oxide cerium conductive particle type zinc oxide zinc oxide ITO ITO ITO 1_ ΑΤΟ ΑΤΟ 1 ΑΤΟ ____^^ Zinc phthalate transparent film substrate film thickness μηι § § § §§ § Example 41 Example 42 Example 43 Example 44 Example 45 Example 46 Real lung U47 Example 48 Comparative Example 31 Comparative Example 32 Comparative Example 33 165-200907491 (Evaluation method) For the samples of the various antireflection films 3 1 to 5 1 produced as described above, after the production and after the damp heat test Evaluated by the following method. The damp heat test was carried out under the conditions of a temperature of 60 ° C and a humidity of 95 % RH for 1 〇 〇 0 hours. The results obtained are summarized in Table 6 below. (Abrasion resistance) The sample was subjected to a load of 250 g/cm 2 in a steel wire (SW) of a temperature of 25 ° C and a humidity of 60% RH, and measured for a width of 1 cm per 1 reciprocating. The number of scars. Further, the number of the scars was measured at the point where the maximum number of scars in the portion to which the load was applied. There are no practical problems of only 10 pieces/cm or less, but 5 pieces/cm or less is preferable, and 3 pieces/cm or less is more preferable (adhesiveness). Strip stripping is performed according to ns K 5 600- 5 -6. test. On the surface of the sample, 100 grids were cut out with a cutter, and the adhesive tape (N 〇 . 3 1 B manufactured by Nitto Denko Corporation) was pressed, and the peeling operation was repeated three times at the same point. Thereafter, the surface of the sample after peeling was visually observed, and the evaluation was carried out according to the following criteria: Evaluation of the adhesion evaluation 〇: no peeling at all Δ: Determination of peeling X: total peeling 166-200907491 (solvent resistance) The surface of the sample was impregnated with ethanol After wiping, visual observation, and evaluation based on solvent resistance 〇: no change △: only slightly peeled off X: full peeling (pencil hardness) After the sample was conditioned at a temperature of 25 t and humidity, according to JIS K5 600 -: A hammer of 1 kg, the hardness of a flaw is measured by a pencil of each hardness. In the case of cracks, scratches, and dents. The number 値 b e m c 〇 t is performed 10 times reciprocally strongly. In the environment of 60% RH, 2 small -4 was subjected to random scraping test. Use the change to randomly scrape the 5 places, and the damage of the film is the break of the film. -167- 200907491 [Table 6] Refractive index scratch resistance of high refractive index layer (bar/cm) Adhesive solvent-resistant pencil hardness Example 31 1.56 After manufacturing 0 〇〇 3H After wet heat test 0 〇〇 3H Example 32 1.59 After manufacturing 0 〇〇 3H After wet heat test 0 〇〇 3H Example 33 1.58 After manufacturing 0 〇〇 3H After wet heat test 0 〇〇 3H Example 34 1.56 After manufacturing 0 〇〇 3H After wet heat test 0 〇〇 3H Implementation Example 35 1.59 After manufacturing 0 〇〇 3H After wet heat test 0 〇〇 3H Example 36 1.58 After manufacturing 0 〇〇 3H After wet heat test 0 〇〇 3H Example 37 1.56 After manufacturing 0 〇〇 3H After wet heat test 0 〇〇 3H Example 38 1.59 After manufacturing 0 〇〇 3H After wet heat test 0 〇〇 3H Example 39 1.58 After manufacturing 0 〇〇 3H After wet heat test 0 〇〇 3H Example 40 1.56 After manufacturing 0 〇〇 3H After wet heat test 0 〇〇 3H Example 41 1.59 After manufacturing 0 〇〇 3H After wet heat test 0 〇〇 3H Example 42 1.58 After manufacturing 0 〇〇 3H After damp heat test 0 〇〇 3H Example 43 1.56 After manufacturing 0 〇 〇3H After the damp heat test 0 〇〇 3H Example 44 1.59 After manufacturing 0 〇〇 3H After the damp heat test 0 〇〇 3H Example 45 1.58 After manufacturing 0 〇〇 3H After the damp heat test 0 〇〇 3H Example 46 1.56 After manufacturing 0 〇〇3H After damp heat test 0 〇〇3H Example 47 1.59 After manufacturing 0 〇〇3H After wet heat test 0 〇〇 3H Example 48 1.58 After manufacturing 0 〇〇 3H After damp heat test 0 〇〇 3H Comparative Example 31 1.64 After manufacture 0 〇〇2H After wet heat test 0 〇 Δ 2H Comparative Example 32 1.70 After manufacturing 2 〇〇 2H After damp heat test 10 △ △ 2H Comparative Example 33 1.57 After manufacturing 10 Δ Δ 后 After damp heat test 25 XX Η below -168- 200907491 The coated portion is reflected by the actual reflection of the film, and the resistance of the film is reduced. The refractive index layer is formed by coating a conductive particle and an inorganic particle cloth liquid having a composition different from that of the conductive particle to form a low refractive index layer, which is a coating containing an outer layer or an inner porous or open space. The coating liquid of the cerium-based particles was formed to form the antireflection film of the examples 3 to 4, which had good rub resistance, adhesion, and high temperature as compared with the anti-film of Comparative Examples 31 to 3 3 . Wet chemical resistance and pencil hardness. In particular, compared with the antireflection thin film of Comparative Example 3 containing conductive particles in the high refractive index layer, which has excellent excellent high temperature and high humidity, the chemical resistance and the pencil hardness are not contained in the high refractive index layer. When the conductive particles were compared with the two types of inorganic particles, Comparative Example 3 2 was found to have excellent rub resistance, typhoid properties under wetness, and erroneous pen hardness. Further, in Comparative Example 3 2, since the reflective film did not contain conductive particles, it did not have an antistatic property. Further, in the antireflection films of Comparative Examples 3 1 and 3 2, the high refractive index layer ratio was more than 1.60 Å, so that coloration was exhibited and it was not practically preferable. Further, in the case of using an ionizing radiation-curable resin component of a high refractive index layer, a comparative example of an acrylic compound having one or more unsaturated bonds is used. In comparison, it is found that the antireflection film of Examples 31 to 48 has Excellent rubbing property, adhesiveness, chemical resistance under high temperature and high humidity, and pencil hardness example 49. The reflective films 31 to 51 produced in Examples 31 to 48 and Comparative Examples 3 1 to 3 3 were continued. One piece of each of the cellulose ester-based optical compensation film of -169-200907491 KC4FR-1 (manufactured by Κ ο nicami η ο 11 a opt Co., Ltd.) was used as a protective film for a polarizing plate to produce a polarizing plate 1 3 1~ 1 4 8 and comparative polarizing plates 1 4 9~1 5 1. (Production of Polarizing Film) 100 parts by mass of polyvinyl alcohol (hereinafter abbreviated as PVA) having a degree of alkalinity of 99.95 mol% and a degree of polymerization of 2400, 10 parts by mass of the impregnated glycerin and 70 parts by mass of water are melted and kneaded. After the foaming, the film was formed by melt-extruding from a T-die on a metal roll. Thereafter, after drying and heat treatment, a PVA film was obtained. The obtained PV A film had an average thickness of 40 μm, a moisture content of 4.4%, and a film width of 3 m. The PVA film was subjected to continuous treatment in the order of one-axis stretching, fixing treatment, drying, and heat treatment by preliminary swelling, dyeing, and wet methods to prepare a polarizing film. Specifically, the PVA film was subjected to preliminary swelling by impregnation in water at 30 ° C for 30 seconds, and immersed in an aqueous solution of 35 ° C having an iodine concentration of 4 4 g / L and a potassium iodide concentration of 40 g / L for 3 minutes. Continue to extend to 6 times with a tension of 700 N/m in a 50 ° C aqueous solution having a boric acid concentration of 4%. The concentration of potassium iodide is 40 g/L, the concentration of boric acid is 40 g/L, and the concentration of zinc chloride is l. The mixture was immersed in a 30 ° C aqueous solution of 〇g/L for 5 minutes to carry out a fixing treatment. Thereafter, the PV A film was taken out, dried by hot air at 40 ° C, and heat-treated at 1 〇 〇 ° C for 5 minutes. The obtained polarizing film had an average thickness of 15 μm. (Preparation of a polarizing plate) -170-200907491 Continuing' The polarizing plates 131 to 151 were produced by bonding the polarizing film and the protective film for a polarizing plate in accordance with the following steps 1 to 5. Step 1: The optical compensation film and the antireflection film are immersed in a 2 mol/L sodium hydroxide solution at a temperature of 6 (TC for 90 seconds, washed with water, and dried. On the surface of the antireflection layer provided with the antireflection film) The film is protected by a peeling protective film (made of PET). Step 2: Continue, and apply the polarizing film to a 2% by mass solid polyvinyl alcohol adhesive bath for 1 to 2 seconds. Step 3: Steps 2 The excess adhesive attached to the polarizing film is lightly wiped off. 'This is sandwiched between the alkali-treated optical compensation film and the anti-reflection film in step 1. The step is as follows: Step 4: Rotate the roller at 20~ 3 Approximately 2 m/min speed is applied under a pressure of ON/cm2. Step 5: The sample prepared in the step 4 is dried in a dryer at 80 ° C for 2 minutes to prepare a polarizing plate. With the production of the liquid crystal display panel), the outermost polarizing plate of the commercially available liquid crystal display panel (VA type) was carefully peeled off, and the antireflection film prepared above was attached to the polarizing plate 1 3 1 to 1 5 1 to prepare a liquid crystal. Panel 2 3 1~2 5 1. Will be as above The liquid crystal panel 23 1 to 25 1 is placed on a table with a height of 8 〇cm from the floor, and is made of a 3 m-wide patio portion of the floor, with a daytime color light straight tube fluorescent lamp (FLR40S · D/MX, Matsushita Electric Industrial Co., Ltd. Ltd.) 40Wx2 roots as a group, set at 1l-171 - 200907491 at intervals of 1.5m. At this time, the evaluator is located in the front of the LCD panel display surface, and is configured to set the fluorescent lamp on the patio to make the fluorescent light The evaluator's head is illuminated to the rear. For the liquid crystal panel, the fluorescent lamp is taken in from the direction in which the table is inclined at a vertical angle of 25°, and the visibility (identifiability) of the screen is evaluated according to the following level. A: The shadow of the closest fluorescent light is not noticeable. The text with a font size of 8 or less is also readable. B: The noise of the nearby fluorescent light is slightly noticeable, but in the distance, It won't be noticeable. The font size is 8 or less. The text is barely readable. C: The shadow of the fluorescent light in the distance is very interesting. The font size is 8 or less. Difficult to read D: The shadow of the fluorescent light The intake is very interesting, the glyph of the part of the smudge intake The text with an inch of 8 or less cannot be read. The results of the evaluation are as follows: the antireflection film 3 1 to 4 8 and the liquid crystal surface 2 3 1 to 2 4 8 of the polarizing plate 1 3 1 to 1 4 8 are all evaluated as A. Compared with the comparative liquid crystal panels 249 to 25, it has better visibility. [Brief Description] Fig. 1 is a cross-sectional view showing the configuration of a liquid crystal display device produced in the embodiment. 60 : Liquid crystal display device -172- 200907491 64 : 65 : 6 6: 67 : 68 : 69 : 70 : 71, 72 : Light reflector light guide plate Light diffuser Backlit liquid crystal display panel Identification side Polarizer polarizer 73 : Polarizer Protective film dichroic polarizing film-173-

Claims (1)

200907491 十、申請專利範圍 1 - 一種防反射薄膜,其爲透明薄膜基材上具有硬塗 佈層、折射率比透明薄膜基材更高之高折射率層、與折射 率比透明薄膜基材更低之低折射率層的防反射薄膜中,其 特徵爲高折射率層係由塗佈含有至少丨種之導電性粒子、 至少1種之經碳數1〜3的烷氧基化之電離放射線硬化型 樹脂及/或具有二噁烷結構之電離放射線硬化型樹脂、以 及下述一般式(丨)所示之有機矽化合物或其水解物或其 縮聚物的塗佈液而形成; R,nSi ( OR ) 4-n ... ( 1 ) 式中’ R’爲至少丨種選自乙烯基、胺基、環氧基、氯代基 、甲基丙嫌氧基、丙烯氧基、及異氰酸酯基所成群中的取 代基’ R爲院基’ η爲取代數。 2.如申請專利範圍第1項之防反射薄膜,其中該高 折射率層的折射率爲1 6 〇以下。 3 ·如申請專利範圍第1項或第2項之防反射薄膜, 其中至少1種經碳數1〜3的烷氧基化之電離放射線硬化 型樹脂及/或具有二噁烷結構之電離放射線硬化型樹脂係 爲含有分子中具有1或2個可聚合之不飽和鍵的丙烯酸系 化合物者。 4.如申請專利範圍第1項〜第3項中任一項之防反 射薄膜’其中該導電性粒子爲至少丨種選自氧化銻、氧化 -174- 200907491 錫、氧化鋅、含錫之氧化銦(ITO )、含銻之氧化錫( ΑΤΟ )、及銻酸鋅所成群中之導電性粒子。 5 · —種防反射薄膜,其爲透明薄膜基材上以折射率 比該透明薄膜基材更高之高折射率層、與折射率比該透明 薄膜基材更低之低折射率層之順序進行層合所成的防反射 薄膜,其特徵爲高折射率層係由塗佈含有(a )導電性粒 子、與(b )與導電性粒子的組成相異的無機粒子之塗佈 液而形成,低折射率層係由塗佈含有具有外殼層且内部爲 多孔質或空洞之中空二氧化矽系粒子的塗佈液而形成。 6 ·如申請專利範圍第5項之防反射薄膜,其中該低 折射率層係由塗佈含有下述一般式(2 )所示有機矽化合 物或其水解物或其縮聚物、與具有外殻層且内部爲多孔質 或空洞之中空二氧化矽系粒子的塗佈液而形成; Si ( OR) 4 ... ( 2) 式中’ R爲烷基。 7.如申請專利範圍第5項或第6項之防反射薄膜, 其中該闻折射率層係由塗佈含有導電性粒子、 與導電性粒子之組成相異的無機粒子、(c )電離放射線 硬化型樹脂、與(d)下述一般式(1)所示之有機矽化合 物或其水解物或其縮聚物之塗佈液而形成,折射率爲1.60 以下者; -175- 200907491 R\Si ( OR) 4.n ... ( 1 ) 式中,R ’爲至少l種選自乙烯基、胺基、環氧基、氯代基 、甲基丙儲氧基、丙烯氧基、及異氰酸酯基所成群中的取 代基,R爲烷基,η爲取代數。 8 .如申請專利範圍第5項〜第7項中任一項之防反 射薄膜’其中該導電性粒子爲至少!種選自氧化銻、氧化 錫、氧化鋅、含錫之氧化銦(ΙΤ0 )、含銻之氧化錫( ΑΤΟ )、及銻酸鋅所成群中之導電性粒子,該無機粒子爲 至少1種選自中空二氧化矽、膠體二氧化矽、及氟化鎂所 成群中之無機粒子。 9 ·如申請專利範圍第8項之防反射薄膜,其中該導 電性粒子爲含銻之氧化錫(A Τ Ο )、及/或銻酸鋅。 1 0 _如申請專利範圍第8項之防反射薄膜,其中該無 機粒子爲中空二氧化矽。 11. 如申請專利範圍第7項〜第10項中任一項之防 反射薄膜’其中該電離放射線硬化型樹脂含有分子中具有 2個以上可聚合之不飽和鍵之丙烯酸系化合物。 12. 如申請專利範圍第5項〜第1 1項中任一項之防 反射薄膜’其中該低折射率層含有至少含有1個與膠黏劑 具有反應性之基的聚矽氧烷化合物。 1 3 · —種偏光板’其特徵爲於一面使用如申請專利範 圍第1項〜第1 2項中任一項之防反射薄膜。 14. 一種圖像顯示裝置,其特徵爲於一面使用如申請 -176- 200907491 專利範圍第1項〜第1 2項中任一項之反射薄膜。 15. 一種圖像顯示裝置,其特徵爲使用如申請專利範 圍第1 3項之偏光板。 -177-200907491 X. Patent Application No. 1 - An anti-reflection film which has a hard coating layer on a transparent film substrate, a higher refractive index layer than a transparent film substrate, and a refractive index than a transparent film substrate In the antireflection film of the low low refractive index layer, the high refractive index layer is characterized by coating an alkoxylated ionizing radiation containing at least one of the conductive particles and at least one carbon number of 1 to 3; a curable resin and/or an ionizing radiation curable resin having a dioxane structure, and a coating liquid of an organic hydrazine compound represented by the following general formula (丨) or a hydrolyzate thereof or a polycondensate thereof; R, nSi (OR) 4-n (1) where 'R' is at least one selected from the group consisting of vinyl, amine, epoxy, chloro, methyl propionate, propyleneoxy, and isocyanate The substituent 'R in the group of the base is the base' η is the substitution number. 2. The antireflection film of claim 1, wherein the high refractive index layer has a refractive index of 16 Å or less. 3. The antireflection film of claim 1 or 2, wherein at least one of the alkoxylated ionizing radiation hardening resin having a carbon number of 1 to 3 and/or ionizing radiation having a dioxane structure The curable resin is one containing an acrylic compound having one or two polymerizable unsaturated bonds in the molecule. 4. The antireflection film according to any one of claims 1 to 3 wherein the conductive particles are at least one selected from the group consisting of cerium oxide, oxidized -174-200907491 tin, zinc oxide, and tin-containing oxidation. Conductive particles in a group of indium (ITO), antimony-containing tin oxide (yttrium), and zinc antimonate. 5 - an antireflection film which is a high refractive index layer on a transparent film substrate having a higher refractive index than the transparent film substrate, and a lower refractive index layer having a lower refractive index than the transparent film substrate An antireflection film formed by laminating is characterized in that a high refractive index layer is formed by applying a coating liquid containing (a) conductive particles and (b) inorganic particles different in composition from conductive particles. The low refractive index layer is formed by applying a coating liquid containing hollow ceria-based particles having an outer shell layer and having a porous or void inside. 6. The antireflection film according to claim 5, wherein the low refractive index layer is coated with an organic cerium compound represented by the following general formula (2) or a hydrolyzate thereof or a polycondensate thereof, and has a shell The layer is formed by a coating liquid of porous or hollow hollow cerium oxide-based particles in the interior; Si (OR) 4 (2) wherein 'R is an alkyl group. 7. The antireflection film according to claim 5 or 6, wherein the viscous refractive index layer is coated with inorganic particles containing conductive particles different from those of conductive particles, and (c) ionizing radiation a curable resin, and (d) a coating liquid of an organic hydrazine compound represented by the following general formula (1) or a hydrolyzate thereof or a polycondensate thereof, having a refractive index of 1.60 or less; -175- 200907491 R\Si (OR) 4.n (1) wherein R' is at least one selected from the group consisting of a vinyl group, an amine group, an epoxy group, a chloro group, a methyl propyl storage group, a propylene group, and an isocyanate. The substituent in the group of groups, R is an alkyl group, and η is a substitution number. 8. The antireflection film according to any one of the items 5 to 7 wherein the conductive particles are at least! Conductive particles selected from the group consisting of cerium oxide, tin oxide, zinc oxide, tin-containing indium oxide (ΙΤ0), antimony-containing tin oxide (yttrium), and zinc antimonate, and the inorganic particles are at least one kind Inorganic particles selected from the group consisting of hollow ceria, colloidal ceria, and magnesium fluoride. 9. The antireflection film of claim 8, wherein the conductive particles are antimony-containing tin oxide (A Τ Ο ), and/or zinc silicate. 1 0 _ The antireflection film of claim 8, wherein the inorganic particles are hollow ceria. 11. The antireflection film according to any one of the items 7 to 10 wherein the ionizing radiation-curable resin contains an acrylic compound having two or more polymerizable unsaturated bonds in the molecule. 12. The antireflection film of any one of clauses 5 to 11, wherein the low refractive index layer contains a polyoxyalkylene compound containing at least one reactive group with an adhesive. 1 3 - A polarizing plate is characterized in that an antireflection film according to any one of items 1 to 12 of the patent application is used on one side. An image display apparatus characterized by using a reflective film according to any one of the first to the first aspect of the invention of the application of the invention. An image display apparatus characterized by using a polarizing plate as disclosed in claim 13 of the patent application. -177-
TW97111081A 2007-03-31 2008-03-27 Antireflection film, polarizing plate using the same, and image display TW200907491A (en)

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CN105934735B (en) * 2014-01-30 2019-05-31 日东电工株式会社 Double-sided transparent conductive film, wound body thereof, and touch panel
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