TW200913045A - Method for the treatment of silicon wafers, treatment liquid and silicon wafer - Google Patents

Method for the treatment of silicon wafers, treatment liquid and silicon wafer Download PDF

Info

Publication number: TW200913045A
Authority: TW; Taiwan
Prior art keywords: compound; treatment liquid; wafer; aliphatic; group
Prior art date: 2007-05-25

Application number

TW097116867A

Other languages

English (en)

Chinese (zh)

Inventor

Holger Froehlich

Original Assignee

Schmid Gmbh & Amp Co Geb

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2007-05-25

Filing date

2008-05-07

Publication date

2009-03-16

2008-05-07 Application filed by Schmid Gmbh & Amp Co Geb filed Critical Schmid Gmbh & Amp Co Geb

2009-03-16 Publication of TW200913045A publication Critical patent/TW200913045A/zh

Links

239000007788 liquid Substances 0.000 title claims abstract description 61
235000012431 wafers Nutrition 0.000 title claims abstract description 49
238000000034 method Methods 0.000 title claims abstract description 41
XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract 5
229910052710 silicon Inorganic materials 0.000 title claims abstract 5
239000010703 silicon Substances 0.000 title claims abstract 5
150000001875 compounds Chemical class 0.000 claims abstract description 22
239000000654 additive Substances 0.000 claims abstract description 13
-1 alicyclic hydroxy compound Chemical class 0.000 claims abstract description 12
230000000996 additive effect Effects 0.000 claims abstract description 11
125000001931 aliphatic group Chemical group 0.000 claims abstract description 10
FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 claims abstract description 6
239000000600 sorbitol Substances 0.000 claims abstract description 6
150000002440 hydroxy compounds Chemical class 0.000 claims abstract description 4
238000004519 manufacturing process Methods 0.000 claims abstract 3
GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 7
125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 7
229910052715 tantalum Inorganic materials 0.000 claims description 5
GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 5
150000001491 aromatic compounds Chemical group 0.000 claims description 3
235000000346 sugar Nutrition 0.000 claims description 3
150000004676 glycans Chemical class 0.000 claims description 2
125000005027 hydroxyaryl group Chemical group 0.000 claims description 2
150000002772 monosaccharides Chemical class 0.000 claims description 2
125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 2
229920001282 polysaccharide Polymers 0.000 claims description 2
239000005017 polysaccharide Substances 0.000 claims description 2
125000001424 substituent group Chemical group 0.000 claims description 2
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 2
HOSGXJWQVBHGLT-UHFFFAOYSA-N 6-hydroxy-3,4-dihydro-1h-quinolin-2-one Chemical group N1C(=O)CCC2=CC(O)=CC=C21 HOSGXJWQVBHGLT-UHFFFAOYSA-N 0.000 claims 1
ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims 1
BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 claims 1
229910052732 germanium Inorganic materials 0.000 claims 1
239000000463 material Substances 0.000 claims 1
AZQWKYJCGOJGHM-UHFFFAOYSA-N para-benzoquinone Natural products O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 claims 1
239000004575 stone Substances 0.000 claims 1
150000008163 sugars Chemical class 0.000 claims 1
150000003573 thiols Chemical class 0.000 claims 1
238000009736 wetting Methods 0.000 claims 1
KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 11
KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
239000003112 inhibitor Substances 0.000 description 6
238000005530 etching Methods 0.000 description 5
238000010924 continuous production Methods 0.000 description 4
239000003595 mist Substances 0.000 description 4
UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 3
125000003118 aryl group Chemical group 0.000 description 3
238000007598 dipping method Methods 0.000 description 3
229910052707 ruthenium Inorganic materials 0.000 description 3
QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
208000007976 Ketosis Diseases 0.000 description 2
UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
CZMRCDWAGMRECN-UGDNZRGBSA-N Sucrose Chemical compound O[C@H]1[C@H](O)[C@@H](CO)O[C@@]1(CO)O[C@@H]1[C@H](O)[C@@H](O)[C@H](O)[C@@H](CO)O1 CZMRCDWAGMRECN-UGDNZRGBSA-N 0.000 description 2
229930006000 Sucrose Natural products 0.000 description 2
150000001323 aldoses Chemical class 0.000 description 2
150000007824 aliphatic compounds Chemical class 0.000 description 2
MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
239000007864 aqueous solution Substances 0.000 description 2
125000004432 carbon atom Chemical group C* 0.000 description 2
239000013078 crystal Substances 0.000 description 2
238000011161 development Methods 0.000 description 2
230000018109 developmental process Effects 0.000 description 2
239000003205 fragrance Substances 0.000 description 2
238000010438 heat treatment Methods 0.000 description 2
ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 description 2
150000002576 ketones Chemical class 0.000 description 2
150000002584 ketoses Chemical class 0.000 description 2
239000000203 mixture Substances 0.000 description 2
238000005507 spraying Methods 0.000 description 2
239000005720 sucrose Substances 0.000 description 2
150000005846 sugar alcohols Chemical class 0.000 description 2
WUBNJKMFYXGQDB-UHFFFAOYSA-N 3,3-diphenyl-2-benzofuran-1-one Chemical compound C12=CC=CC=C2C(=O)OC1(C=1C=CC=CC=1)C1=CC=CC=C1 WUBNJKMFYXGQDB-UHFFFAOYSA-N 0.000 description 1
235000009917 Crataegus X brevipes Nutrition 0.000 description 1
235000013204 Crataegus X haemacarpa Nutrition 0.000 description 1
235000009685 Crataegus X maligna Nutrition 0.000 description 1
235000009444 Crataegus X rubrocarnea Nutrition 0.000 description 1
235000009486 Crataegus bullatus Nutrition 0.000 description 1
235000017181 Crataegus chrysocarpa Nutrition 0.000 description 1
235000009682 Crataegus limnophila Nutrition 0.000 description 1
235000004423 Crataegus monogyna Nutrition 0.000 description 1
240000000171 Crataegus monogyna Species 0.000 description 1
235000002313 Crataegus paludosa Nutrition 0.000 description 1
235000009840 Crataegus x incaedua Nutrition 0.000 description 1
LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
RFSUNEUAIZKAJO-ARQDHWQXSA-N Fructose Chemical compound OC[C@H]1O[C@](O)(CO)[C@@H](O)[C@@H]1O RFSUNEUAIZKAJO-ARQDHWQXSA-N 0.000 description 1
229930091371 Fructose Natural products 0.000 description 1
239000005715 Fructose Substances 0.000 description 1
WQZGKKKJIJFFOK-GASJEMHNSA-N Glucose Natural products OC[C@H]1OC(O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-GASJEMHNSA-N 0.000 description 1
UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
MKYBYDHXWVHEJW-UHFFFAOYSA-N N-[1-oxo-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propan-2-yl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(C(C)NC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 MKYBYDHXWVHEJW-UHFFFAOYSA-N 0.000 description 1
JPYHHZQJCSQRJY-UHFFFAOYSA-N Phloroglucinol Natural products CCC=CCC=CCC=CCC=CCCCCC(=O)C1=C(O)C=C(O)C=C1O JPYHHZQJCSQRJY-UHFFFAOYSA-N 0.000 description 1
229910000831 Steel Inorganic materials 0.000 description 1
150000001299 aldehydes Chemical class 0.000 description 1
125000000217 alkyl group Chemical group 0.000 description 1
230000009286 beneficial effect Effects 0.000 description 1
WQZGKKKJIJFFOK-VFUOTHLCSA-N beta-D-glucose Chemical compound OC[C@H]1O[C@@H](O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-VFUOTHLCSA-N 0.000 description 1
229910052797 bismuth Inorganic materials 0.000 description 1
JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
239000001913 cellulose Substances 0.000 description 1
229920002678 cellulose Polymers 0.000 description 1
230000008878 coupling Effects 0.000 description 1
238000010168 coupling process Methods 0.000 description 1
238000005859 coupling reaction Methods 0.000 description 1
238000010586 diagram Methods 0.000 description 1
238000004945 emulsification Methods 0.000 description 1
230000002349 favourable effect Effects 0.000 description 1
239000008103 glucose Substances 0.000 description 1
DOACSXJVHDTDSG-UHFFFAOYSA-N henicosan-11-one Chemical compound CCCCCCCCCCC(=O)CCCCCCCCCC DOACSXJVHDTDSG-UHFFFAOYSA-N 0.000 description 1
235000003642 hunger Nutrition 0.000 description 1
OAKJQQAXSVQMHS-UHFFFAOYSA-N hydrazine Substances NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 1
229910052739 hydrogen Inorganic materials 0.000 description 1
239000001257 hydrogen Substances 0.000 description 1
238000005470 impregnation Methods 0.000 description 1
230000003287 optical effect Effects 0.000 description 1
QCDYQQDYXPDABM-UHFFFAOYSA-N phloroglucinol Chemical compound OC1=CC(O)=CC(O)=C1 QCDYQQDYXPDABM-UHFFFAOYSA-N 0.000 description 1
229960001553 phloroglucinol Drugs 0.000 description 1
229920001223 polyethylene glycol Polymers 0.000 description 1
239000000843 powder Substances 0.000 description 1
230000000284 resting effect Effects 0.000 description 1
230000002441 reversible effect Effects 0.000 description 1
238000000926 separation method Methods 0.000 description 1
239000002689 soil Substances 0.000 description 1
239000007787 solid Substances 0.000 description 1
238000001179 sorption measurement Methods 0.000 description 1
239000007921 spray Substances 0.000 description 1
239000010959 steel Substances 0.000 description 1
238000003756 stirring Methods 0.000 description 1
125000003396 thiol group Chemical class [H]S* 0.000 description 1

Classifications

- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/70—Surface textures, e.g. pyramid structures
- H10F77/703—Surface textures, e.g. pyramid structures of the semiconductor bodies, e.g. textured active layers
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/121—The active layers comprising only Group IV materials
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

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Weting (AREA)
Photovoltaic Devices (AREA)

TW097116867A 2007-05-25 2008-05-07 Method for the treatment of silicon wafers, treatment liquid and silicon wafer TW200913045A (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
DE102007026081A DE102007026081A1 (de)	2007-05-25	2007-05-25	Verfahren zur Behandlung von Siliziumwafern, Behandlungsflüssigkeit und Siliziumwafer

Publications (1)

Publication Number	Publication Date
TW200913045A true TW200913045A (en)	2009-03-16

Family

ID=39874935

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
TW097116867A TW200913045A (en)	2007-05-25	2008-05-07	Method for the treatment of silicon wafers, treatment liquid and silicon wafer

Country Status (3)

Country	Link
DE (1)	DE102007026081A1 (de)
TW (1)	TW200913045A (de)
WO (1)	WO2008145231A2 (de)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
CN101635322B (zh) *	2009-08-26	2011-01-05	北京中联科伟达技术股份有限公司	一种多晶太阳能电池片的链式制绒的方法及装置
CN102696092A (zh) *	2009-12-23	2012-09-26	吉布尔·施密德有限责任公司	用于处理硅基底的方法和装置
CN103811583A (zh) *	2012-11-12	2014-05-21	北京北方微电子基地设备工艺研究中心有限责任公司	一种硅片制绒方法及硅片制绒装置

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Publication number	Priority date	Publication date	Assignee	Title
DE102008022282A1 (de)	2008-04-24	2009-10-29	Gebr. Schmid Gmbh & Co.	Einrichtung und Verfahren zur Behandlung von Silizium-Wafern oder flachen Gegenständen
DE102009012827A1 (de)	2009-03-03	2010-10-07	Gebr. Schmid Gmbh & Co.	Verfahren zur Texturierung von Siliziumwafern für Solarzellen und Behandlungsflüssigkeit dafür
DE102009028762A1 (de) *	2009-08-20	2011-03-03	Rena Gmbh	Verfahren zum Ätzen von Siliziumoberflächen
DE102011000861A1 (de) *	2011-02-22	2012-08-23	Rena Gmbh	Verfahren zum Behandeln eines Objekts, insbesondere eines Solarzellensubstrats, und Vorrichtung zur Durchführung des Verfahrens
DE102011084346A1 (de)	2011-10-12	2013-04-18	Schott Solar Ag	Verfahren zur Behandlung von Siliziumwafern, Behandlungsflüssigkeit und Siliziumwafer
DE102012107537A1 (de) *	2012-08-16	2014-05-22	Hanwha Q Cells Gmbh	Verfahren zur Oberflächenbehandlung eines monokristallinen Halbleiterwafers und Verfahren zur Herstellung einer monokristallinen Halbleiterwafer-Solarzelle
CN102916075A (zh) *	2012-09-27	2013-02-06	奥特斯维能源（太仓）有限公司	一种制绒深度稳定的方法
DE102014119090B4 (de)	2014-12-18	2022-12-01	Hanwha Q Cells Gmbh	In-line-Nassbankvorrichtung und Verfahren für die nasschemische Bearbeitung von Halbleiterwafern
DE102016105866B3 (de) *	2016-03-31	2017-07-06	Technische Universität Bergakademie Freiberg	Siliziumwafer, Verfahren zum Strukturieren eines Siliziumwafers und Solarzelle

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Publication number	Priority date	Publication date	Assignee	Title
US4941941A (en) *	1989-10-03	1990-07-17	International Business Machines Corporation	Method of anisotropically etching silicon wafers and wafer etching solution
DE19811878C2 (de) *	1998-03-18	2002-09-19	Siemens Solar Gmbh	Verfahren und Ätzlösung zum naßchemischen pyramidalen Texturätzen von Siliziumoberflächen
JP3948890B2 (ja) *	2000-08-09	2007-07-25	三洋電機株式会社	凹凸基板の製造方法、凹凸構造形成用界面活性剤並びに光起電力素子の製造方法
JP3740138B2 (ja) *	2003-06-25	2006-02-01	直江津電子工業株式会社	テクスチャー形成用エッチング液
JP4394693B2 (ja) *	2004-10-28	2010-01-06	三益半導体工業株式会社	半導体基板の製造方法及びエッチング液
CN1983644A (zh) *	2005-12-13	2007-06-20	上海太阳能科技有限公司	制作单晶硅太阳电池绒面的方法
JP4326545B2 (ja) *	2006-02-23	2009-09-09	三洋電機株式会社	凹凸基板の製造方法及び光起電力素子の製造方法

2007
- 2007-05-25 DE DE102007026081A patent/DE102007026081A1/de not_active Withdrawn
2008
- 2008-04-18 WO PCT/EP2008/003113 patent/WO2008145231A2/de not_active Ceased
- 2008-05-07 TW TW097116867A patent/TW200913045A/zh unknown

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
CN101635322B (zh) *	2009-08-26	2011-01-05	北京中联科伟达技术股份有限公司	一种多晶太阳能电池片的链式制绒的方法及装置
CN102696092A (zh) *	2009-12-23	2012-09-26	吉布尔·施密德有限责任公司	用于处理硅基底的方法和装置
CN102696092B (zh) *	2009-12-23	2017-05-31	吉布尔·施密德有限责任公司	用于处理硅基底的方法和装置
CN103811583A (zh) *	2012-11-12	2014-05-21	北京北方微电子基地设备工艺研究中心有限责任公司	一种硅片制绒方法及硅片制绒装置

Also Published As

Publication number	Publication date
WO2008145231A3 (de)	2009-04-02
DE102007026081A1 (de)	2008-11-27
WO2008145231A2 (de)	2008-12-04

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