TW200932362A - Positioning-type mask - Google Patents

Positioning-type mask Download PDF

Info

Publication number: TW200932362A
Authority: TW; Taiwan
Prior art keywords: positioning; mask; thin plate; substrate; area
Prior art date: 2008-01-21

Application number

TW97102193A

Other languages

English (en)

Chinese (zh)

Other versions

TWI362228B (2

Inventor

Sheng-Wei Chen

Hui-Lung Lai

Original Assignee

Chi Hsin Electronics Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2008-01-21

Filing date

2008-01-21

Publication date

2009-08-01

2008-01-21 Application filed by Chi Hsin Electronics Corp filed Critical Chi Hsin Electronics Corp

2008-01-21 Priority to TW97102193A priority Critical patent/TW200932362A/zh

2009-08-01 Publication of TW200932362A publication Critical patent/TW200932362A/zh

2012-04-11 Application granted granted Critical

2012-04-11 Publication of TWI362228B publication Critical patent/TWI362228B/zh

Links

239000000463 material Substances 0.000 claims abstract description 16
239000000758 substrate Substances 0.000 claims abstract description 15
239000002184 metal Substances 0.000 claims abstract description 11
238000002955 isolation Methods 0.000 claims description 13
230000008021 deposition Effects 0.000 claims description 10
238000007740 vapor deposition Methods 0.000 abstract description 5
238000004544 sputter deposition Methods 0.000 abstract description 4
239000010408 film Substances 0.000 description 10
238000000151 deposition Methods 0.000 description 8
238000000034 method Methods 0.000 description 6
238000005520 cutting process Methods 0.000 description 2
230000008020 evaporation Effects 0.000 description 2
238000001704 evaporation Methods 0.000 description 2
238000005477 sputtering target Methods 0.000 description 2
239000010409 thin film Substances 0.000 description 2
101100269850 Caenorhabditis elegans mask-1 gene Proteins 0.000 description 1
CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 1
239000000956 alloy Substances 0.000 description 1
229910045601 alloy Inorganic materials 0.000 description 1
238000010586 diagram Methods 0.000 description 1
238000005401 electroluminescence Methods 0.000 description 1
238000005530 etching Methods 0.000 description 1
239000011521 glass Substances 0.000 description 1
229910052500 inorganic mineral Inorganic materials 0.000 description 1
238000001459 lithography Methods 0.000 description 1
239000011707 mineral Substances 0.000 description 1
238000000206 photolithography Methods 0.000 description 1
239000002689 soil Substances 0.000 description 1
238000010025 steaming Methods 0.000 description 1

Landscapes

Electroluminescent Light Sources (AREA)
Physical Vapour Deposition (AREA)

TW97102193A 2008-01-21 2008-01-21 Positioning-type mask TW200932362A (en)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
TW97102193A TW200932362A (en)	2008-01-21	2008-01-21	Positioning-type mask

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
TW97102193A TW200932362A (en)	2008-01-21	2008-01-21	Positioning-type mask

Publications (2)

Publication Number	Publication Date
TW200932362A true TW200932362A (en)	2009-08-01
TWI362228B TWI362228B (2)	2012-04-11

Family

ID=44865565

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
TW97102193A TW200932362A (en)	2008-01-21	2008-01-21	Positioning-type mask

Country Status (1)

Country	Link
TW (1)	TW200932362A (2)

2008
- 2008-01-21 TW TW97102193A patent/TW200932362A/zh not_active IP Right Cessation

Also Published As

Publication number	Publication date
TWI362228B (2)	2012-04-11

Similar Documents

Publication	Publication Date	Title
JP6725890B2 (ja)	2020-07-22	蒸着マスクの製造方法、パターンの製造方法、及び有機半導体素子の製造方法
JP6035548B2 (ja)	2016-11-30	蒸着マスク
CN105358732B (zh)	2017-12-19	成膜掩模和成膜掩模的制造方法
TWI721170B (zh)	2021-03-11	蔽蔭遮罩沉積系統及其方法
TWI623632B (zh)	2018-05-11	蒸鍍用磁性掩模板的製作方法
JP7097821B2 (ja)	2022-07-08	シャドーマスク堆積システム及びその方法
KR20140090267A (ko)	2014-07-16	증착 마스크, 증착 마스크 장치의 제조 방법, 및 유기 반도체 소자의 제조 방법
CN107653436A (zh)	2018-02-02	掩膜板及其制作方法、蒸镀方法
JP2013083704A5 (ja)	2013-12-05	マスク、それに使用するマスク用部材、マスクの製造方法及び有機ｅｌ表示用基板の製造方法
CN104611668A (zh)	2015-05-13	用于掩膜板的框架和掩膜板
JP6658790B2 (ja)	2020-03-04	蒸着マスク、フレーム付き蒸着マスク、蒸着マスク準備体、蒸着マスクの製造方法、有機半導体素子の製造方法、有機ｅｌディスプレイの製造方法、及びパターンの形成方法
JP2014088594A (ja)	2014-05-15	蒸着マスク
JP4335865B2 (ja)	2009-09-30	シャドウマスクパターンの形成方法
TW200841765A (en)	2008-10-16	Mask frame assembly for thin film deposition of flat panel display and deposition apparatus using the same
JP2015017308A (ja)	2015-01-29	蒸着マスク、樹脂層付き金属マスク、および有機半導体素子の製造方法
WO2016106947A1 (zh)	2016-07-07	组合式掩模板及其制作方法
TW200539741A (en)	2005-12-01	Mask, method of manufacturing the same, method of forming thin film pattern, method of manufacturing electro-optical device and electronic equipment
JP6330377B2 (ja)	2018-05-30	基板付蒸着マスク装置の製造方法、基板付蒸着マスクおよびレジストパターン付基板
CN108374147A (zh)	2018-08-07	掩模组件的制造方法
KR102794838B1 (ko)	2025-04-16	새도우 마스크 제조 방법 및 새도우 마스크
CN113690396A (zh)	2021-11-23	掩膜组件及其制造方法、目标结构的制造方法、显示装置
CN104988458A (zh)	2015-10-21	一种带锥角开口掩模板的制作方法
JP2004152704A (ja)	2004-05-27	有機エレクトロルミネッセンス素子の製造方法
KR20090128006A (ko)	2009-12-15	마이크로 히터, 마이크로 히터 어레이, 그 제조 방법 및이를 이용한 패턴 형성 방법
JP2019173181A (ja)	2019-10-10	基板付蒸着マスク

Legal Events

Date	Code	Title	Description
2019-01-11	MM4A	Annulment or lapse of patent due to non-payment of fees