TW201027140A - Polarization diffraction element and method for manufacturing the same - Google Patents

Polarization diffraction element and method for manufacturing the same Download PDF

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Publication number
TW201027140A
TW201027140A TW098141517A TW98141517A TW201027140A TW 201027140 A TW201027140 A TW 201027140A TW 098141517 A TW098141517 A TW 098141517A TW 98141517 A TW98141517 A TW 98141517A TW 201027140 A TW201027140 A TW 201027140A
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Taiwan
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substrate
compound
diffractive element
layer
polarizing diffractive
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TW098141517A
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Chinese (zh)
Inventor
Katsumi Itou
Atsuki Nagao
Ran Itou
Takuhiro Ushino
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Jsr Corp
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Priority claimed from JP2008317526A external-priority patent/JP5532597B2/en
Application filed by Jsr Corp filed Critical Jsr Corp
Publication of TW201027140A publication Critical patent/TW201027140A/en

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1814—Diffraction gratings structurally combined with one or more further optical elements, e.g. lenses, mirrors, prisms or other diffraction gratings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/12—Heads, e.g. forming of the optical beam spot or modulation of the optical beam
    • G11B7/135—Means for guiding the beam from the source to the record carrier or from the record carrier to the detector
    • G11B7/1353—Diffractive elements, e.g. holograms or gratings
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/12—Heads, e.g. forming of the optical beam spot or modulation of the optical beam
    • G11B7/135—Means for guiding the beam from the source to the record carrier or from the record carrier to the detector
    • G11B7/1372—Lenses

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Polarising Elements (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)

Abstract

An objective of this invention is to provide a method for manufacturing a polarization diffraction element, which is highly economic and capable of continuously producing polarization diffraction elements with excellent optical property. The invention also provides a polarization diffraction element made by this method. The polarization diffraction element of this invention is made by laminating, on at least one surface of a substrate (a) made of transparent resin (A), multiple layers according to the following sequence: a layer (B) with molecular alignment energy, a layer (LC) having construction units made of compounds (C) and continuously formed concave parts and convex parts, and a layer (LD) having construction units made of compounds (D) and continuously formed concave parts and convex parts that engage the concave parts and convex parts of the layer (LC). The layer (LC) has optical anisotropy and the layer (LD) has optical isotropy.

Description

201027140 六、發明說明： 【發明所屬之技術領域】 本發明係關於偏光性繞射元件及偏光性繞射元件之製 造方法。 【先前技術】 光碟裝置，基於非接觸、每單位體積之資訊量多、高 Φ 速讀取性、低成本等之理由，近年來成爲大幅伸長之光學 資訊記錄•再生裝置，爲活化該等特徵，已開發出各種記 錄介質。例如，對應於使預先記錄之資訊作爲聲音或畫面 或電腦用程式等而再生之壓縮光碟（CD)、雷射光碟（ LD ) 、CD-ROM、DVD-ROM等，以雷射僅寫入一次資訊、 可使相關資訊再生之CD-R、DVD-R等、可重複使資訊之記 錄再生之光磁碟（MO) 、DVD-RAM、DVD-RW等而開發 有光讀取裝置。 〇 該等光讀取裝置之光學系統係組裝用以實現裝置之小 型化或高性能化之各種光學零件而使用。例如，舉例爲作 爲光源之雷射、繞射格栅、波長板、半反射鏡（half mirror)、偏光性繞射元件、接物鏡等之代表性零件。 該等零件中，所謂的偏光性繞射元件係使直線偏光之 雷射光於前進路徑上透過，而返回路徑上則不透過，用以 阻斷所謂返回光之光學零件。至於偏光性繞射元件迄今爲 止已知有使用玻璃基板或塑膠基板製作者（例如，參照專 利文獻1及2) ’或使用鈮酸鋰等光學異向性之結晶基板製 -5- 201027140 作者（例如，參照專利文獻3 )。該等均係經歷光微影步 驟或蝕刻步驟而製造者。 不過，經例如上述之光微影步驟或蝕刻步驟製造時， 由於裝置之限制而無法使用薄片基板作爲基板。因此，實 際的情況是由於無法以所謂的批量處理製造，因而缺乏連 續生產性。另外，光微影步驟或蝕刻步驟爲以具有光阻劑 或藉由蝕刻去除之材料爲前提之步驟，依然有偏光性繞射 元件之製造步驟複雜，由成本或經濟性之觀點而言仍有問 @ 題。 [先前技術文獻] [專利文獻] [專利文獻1]特開平1 1 -0646 1 5號公報 [專利文獻2]特開2004-1 3 3074號公報 [專利文獻3]特開平1丨-295524號公報 ❹ 【發明內容】 [發明欲解決之課題] 本發明係鑑於上述之以往技術既有之課題而完成者， 因此本發明之目的係提供一種連續生產性優異、經濟性優 異、且所得偏光性繞射元件之光學特性亦優異之偏光性繞 射元件之製造方法，以及以該製造方法獲得之偏光性繞射 元件。 201027140 [解決課題之手段] 本發明人等爲達成上述課題而重複積極硏究之結果’ 發現利用特定之偏光性繞射元件之製造方法獲得之偏光性 繞射元件之光學特性優異。 又，發現該製造方法相較於過去之製造方法’由於不 需光微影步驟或蝕刻步驟，因此基材之限制少，連續生產 性優異，經濟性亦優異，因而完成本發明。而且，本發明 0 大致上分成樣態A及B兩類。 亦即，本發明（樣態A )之偏光性繞射元件爲在由透 明樹脂（A )所構成之基材（a )之至少一面上以下列順序 層合有下列各層而成：具有分子配向能之層（B)，連續 形成有凹部與凸部之具有源自化合物（C)之構造單位之 層（LC)，及具有與前述層（LC)之凹部及凸部嵌合之 連續凸部與凹部之由含有化合物（D)之組成物所形成之 層（LD)，前述層（LC)具有光學異向性，且前述層（ φ LD)具有光學同向性。 又，本發明之（樣態A )之偏光性繞射元件較好爲在 由透明樹脂（A )所構成之基材（a )之至少一面上以下列 順序層合有下列各層而成：具有分子配向能之層（B)， 連續形成有凹部與凸部之具有源自化合物（C)之構造單 位之層（LC)，具有與前述層（LC)之凹部及凸部嵌合 之連續凸部與凹部之由含有化合物（D)之組成物所形成 之層（LD)，及由透明樹脂（E)所構成之基材（e)，前 述層（LC)具有光學異向性，且前述層（LD)具有光學 201027140 同向性。 較好對前述基材（a)及具有分子配向能之層（B)施 以延伸處理。 亦較好對前述具有分子配向能之層（B)施以摩擦處 理。 前述具有分子配向能之層（B)較好係由包含選自（ 甲基）丙烯酸系化合物、聚醯亞胺、聚乙烯醇及聚胺基甲 酸酯之至少一種之組成物構成。 @ 前述具有分子配向能之層（B)亦較好爲由包含具有 以下式（1)表示之構造之聚合物之組成物所構成，且層 (B)爲藉由放射線照射而賦予分子配向能者： 【化1】 -R1—CH=CH——Z1——Ar1 ⑴ [式（I )中，R1 表示-C(0)0-、-CONH-、-CO_E_、未取代 ® 或具有選自鹵基、氛基及硝基之基之1，4 -伸苯基、或卩比陡- 2.5- 二基、嘧啶-2,5-二基、2,5-噻吩二基、2 5_伸呋喃基、 1，4-伸萘基、或2,6-伸萘基’ E表不未取代或具有選自鹵基 、氨基及硝基之基之1，4 -伸本基、或耻卩定_2 5 -二基、嚼1陡_ 2.5- 二基、2,5-噻吩二基、2,5-伸呋喃基、丨，4•伸萘基、或 2.6- 伸萘基’ Z1表示單鍵、未取代或具有選自鹵基、氰基 及硝基之基之1，4-伸苯基、或吡啶-2,5-二基、喷陡_2,5-二 基' 2,5-噻吩二基、2,5-伸呋喃基、反式·1>4伸環己基、 -8 - 201027140 反式-1,3-二噁烷-2,5-二基或1，4-哌啶基，Ari表示具有芳 香族環之一價基]。 前述化合物（C )較好包含紫外線硬化型液晶。 前述化合物（D)較好包含紫外線硬化型樹脂。 前述化合物（D)更好包含紫外線硬化型（甲基）丙 烯酸樹脂。 前述透明樹脂（A)較好包含環狀烯烴系樹脂。 0 前述透明樹脂（E)較好爲與透明樹脂（A)相同之樹 脂。 本發明（樣態A )之偏光性繞射元件之製造方法（第 一樣態）爲具有下列步驟之偏光性繞射元件之製造方法： (1)在由透明樹脂（A)所構成之基材（a)之至少一面 上形成具有分子配向能之層（B)，獲得基材（b)之步驟 ，（2)在由透明樹脂（E)所構成之基材（e)之一面上 ，利用轉印而形成連續形成有由含有化合物（D)之組成 φ 物所構成之凹部與凸部之圖型，獲得基材（f)之步驟， 及（3)透過含有化合物（C)之組成物使前述基材（b) 之具有分子配向能之層（B)與基材（f)之具有圖型之面 相對向地層合之步驟，其中由包含前述化合物（D)之組 成物所構成之圖型部份具有光學同向性，且源自包含前述 化合物（C)之組成物之部分具有光學異向性。 前述（3)之步驟較好爲將包含化合物（C)之組成物 塗佈於前述基材（b)之層（B)上，且使該塗佈面與前述 基材（f)之具有圖型之面相對向地層合之步驟。 -9 - 201027140 前述（3)之步驟較好爲將包含化合物（C)之組成物 塗佈於前述基材（f)之具有圖型之面上，使該塗佈面與 前述基材（b)之層（B)面相對向地層合之步驟。 在步驟（1)中，較好於形成層（B)之際進行延伸處 理。 本發明（樣態A )之偏光性繞射元件之製造方法（第 二樣態）之特徵爲具有下列步驟之偏光性繞射元件之製造 方法：（I)在由透明樹脂（A)所構成之基材（a)之至 ❹ 少一面上形成具有分子配向能之層（B)，獲得基材（b) 之步驟，（II)在基材（b)之層（B)上，利用轉印而形 成連續形成有由含有化合物（C)之組成物所構成之凹部 與凸部之圖型，獲得基材（c)之步驟，以及（III)在前 述基材（c)之具有圖型之面上塗佈包含化合物（D)之組 成物，使前述凹部至少由化合物（D)所塡充，獲得具有 塡充部之基材（d)之步驟，其中源自前述凸部之部分具 有光學異向性，源自前述塡充部之部分具有光學同向性。 〇 在步驟（I)中，較好於形成層（B)之際進行延伸處 理。 前述透明樹脂（A)與透明樹脂（E)較好爲相同之樹 脂。 較好具有於前述偏光性繞射元件之具有塡充部之面上 進一步設置由透明性樹脂（E)所構成之基材（e)之步驟 〇 前述基材（a)較好爲由透明樹脂（A)所構成之於長 -10- 201027140 度方向至少3m以上連續之輥形狀之基材。 本發明（樣態A )之偏光性繞射元件之製造方法（第 三樣態）之特徵爲具有以下步驟之偏光性繞射元件之製造 方法：（i) 於由透明樹脂（A)所構成之基材（a，）之 至少一面上，利用轉印而形成連續形成有由包含化合物（ C)之組成物所構成之凹部與凸部之圖型，而獲得基材（b )之步驟，及（ii)將包含化合物（D)之組成物塗佈於 φ 前述基材（b)之具有圖型之面上，使前述凹部至少由化 合物（D)所塡充，獲得具有塡充部之基材（c)之步驟， 其中前述基材（a’）之形成有圖型之面具有分子配向能， 源自前述凸部之部分具有光學異向性，且源自前述塡充部 之部分具有光學同向性。 較好具有在前述偏光性繞射元件之具有塡充部之面上 進一步設置由透明性樹脂（E)所構成之基材（e)之步驟 〇 φ 前述基材（a’）較好爲由透明樹脂（A)所構成之在 長度方向至少3m以上連續之輥形狀之基材。 亦即’本發明（樣態B)之天光性繞射元件之製造方 法之特徵爲其係包含下列步驟之偏光性繞射元件之製造方 法：（I )利用轉印在基板（a )之至少一面上形成連續形 成有凹部與凸部之圖型，獲得構件（b)之步驟，（11)使 前述凹部至少由化合物（C)所塡充，獲得具有塡充部之 構件（c )之步驟’及（IU )使構件（c )延伸，獲得構件 (d )之步驟’其中偏光性繞射元件中，源自前述凸部之 -11 - 201027140 部分及源自前述塡充部之部分之一方具有光學同向性’另 一方具有光學異向性。 連續形成有前述凹部與凸部之圖型較好係藉由直接轉 印於前述基板（a)之至少一面上而形成。 又，連續形成有前述凹部與凸部之圖型較好係將包含 化合物（B)之組成物塗佈於前述基板（a)上，獲得由該 組成物形成之塗膜後，轉印於該塗膜上所形成。 再者，以本發明（樣態B )之偏光性繞射元件之製造 參 方法獲得之偏光性繞射元件爲源自前述凸部之部分具有光 學同向性’源自前述塡充部之部分具有光學異向性，且源 自前述凸部之部分具有光學異向性，源自前述塡充部之部 分具有光學同向性。。 以本發明（樣態B )之偏光性繞射元件之製造方法獲 得之偏光性繞射元件爲源自前述凸部之部分具有光學同向 性’源自前述塡充部之部分具有光學異向性時，前述化合 物（C)較好爲具有光學異向性之紫外線硬化型液晶單體 ⑩ ，前述化.合物（B)較好爲紫外線硬化型（甲基）丙烯酸 單體。 以本發明（樣態B )之偏光性繞射元件之製造方法獲 得之偏光性繞射兀件爲源白前撒A却3W7 /Λ 0·*=·、,，=«·_201027140 VI. Description of the Invention: [Technical Field] The present invention relates to a method of manufacturing a polarizing diffractive element and a polarizing diffractive element. [Prior Art] The optical disc device has become an optical information recording/reproducing device with a large elongation in recent years based on non-contact, high information volume per unit volume, high Φ-speed readability, and low cost, in order to activate these features. Various recording media have been developed. For example, a compact disc (CD), a laser disc (LD), a CD-ROM, a DVD-ROM, etc., which are reproduced by using pre-recorded information as a sound or a screen or a computer program, are written only once in a laser. An optical reading device has been developed for CD-R, DVD-R, etc., which can reproduce related information, and optical disk (MO), DVD-RAM, DVD-RW, etc., which can repeatedly record and reproduce information.光学 The optical system of these optical reading devices is used to assemble various optical components for miniaturization or high performance of the device. For example, representative parts such as a laser as a light source, a diffraction grating, a wavelength plate, a half mirror, a polarizing diffractive element, and an objective lens are exemplified. Among these components, the so-called polarizing diffractive element transmits the linearly polarized laser light through the forward path and does not transmit through the return path to block the so-called return optical component. As for the polarizing diffractive element, a glass substrate or a plastic substrate manufacturer (for example, refer to Patent Documents 1 and 2) has been known, or an optically anisotropic crystal substrate such as lithium niobate is used. -5 - 201027140 For example, refer to Patent Document 3). These are all manufactured by a photolithography step or an etching step. However, when manufactured by, for example, the above-described photolithography step or etching step, the sheet substrate cannot be used as the substrate due to limitations of the device. Therefore, the actual situation is that it cannot be manufactured in a so-called batch process, and thus lacks continuous productivity. In addition, the photolithography step or the etching step is a step premised on a material having a photoresist or removed by etching, and the manufacturing steps of the polarizing diffractive element are still complicated, and it is still cost or economical. Ask @题. [PRIOR ART DOCUMENT] [Patent Document 1] Japanese Laid-Open Patent Publication No. JP-A No. Hei. No. Hei. SUMMARY OF THE INVENTION [Problem to be Solved by the Invention] The present invention has been made in view of the above-described problems of the prior art, and an object of the present invention is to provide an excellent productivity, excellent economy, and obtained polarization. A method of manufacturing a polarizing diffractive element having excellent optical characteristics of a diffractive element, and a polarizing diffractive element obtained by the manufacturing method. 201027140 [Means for Solving the Problems] The inventors of the present invention have repeatedly confirmed the results of the above-mentioned problems. The polarizing diffraction element obtained by the method for producing a specific polarizing diffractive element has excellent optical characteristics. Further, it has been found that the production method is superior to the conventional production method because the photolithography step or the etching step is not required, so that the substrate is less restricted, the continuous productivity is excellent, and the economy is excellent. Moreover, the present invention 0 is roughly classified into two types, A and B. That is, the polarizing diffractive element of the present invention (form A) is formed by laminating the following layers on at least one side of the substrate (a) composed of the transparent resin (A) in the following order: having molecular alignment The energy layer (B) is formed with a layer (LC) having a structural unit derived from the compound (C) and a continuous convex portion fitted to the concave portion and the convex portion of the layer (LC). The layer (LD) formed of the composition containing the compound (D) with the concave portion, the layer (LC) has optical anisotropy, and the layer (φ LD) has optical anisotropy. Further, the polarizing diffractive element of the aspect (A) of the present invention is preferably formed by laminating the following layers on at least one side of the substrate (a) composed of the transparent resin (A) in the following order: a layer (B) of a molecular alignment energy, a layer (LC) having a structure unit derived from the compound (C) continuously formed with a concave portion and a convex portion, and having a continuous convex shape fitted to the concave portion and the convex portion of the layer (LC) a layer (LD) formed of a composition containing the compound (D) and a substrate (e) composed of a transparent resin (E), and the layer (LC) has optical anisotropy, and the foregoing The layer (LD) has optical 201027140 isotropic. It is preferred to subject the substrate (a) and the layer (B) having molecular alignment energy to an extension treatment. It is also preferred to subject the aforementioned layer (B) having molecular alignment energy to a rubbing treatment. The layer (B) having the molecular alignment energy is preferably composed of a composition containing at least one selected from the group consisting of a (meth)acrylic compound, a polyimine, a polyvinyl alcohol, and a polyurethane. @ The layer (B) having the molecular aligning energy is also preferably composed of a composition comprising a polymer having a structure represented by the following formula (1), and the layer (B) imparts molecular aligning energy by radiation irradiation. [1] -R1—CH=CH——Z1——Ar1 (1) [In the formula (I), R1 represents -C(0)0-, -CONH-, -CO_E_, unsubstituted® or has a selected from Halogen, an aryl group and a nitro group 1,4 -phenylene, or anthracene steep -2.5-diyl, pyrimidine-2,5-diyl, 2,5-thiophenediyl, 2 5_ A furanyl group, a 1,4-naphthyl group, or a 2,6-anthranyl group, E, which is not unsubstituted or has a group selected from the group consisting of a halogen group, an amino group, and a nitro group, or a shame _2 5 -diyl, chew 1 steep _ 2.5-diyl, 2,5-thiophenediyl, 2,5-extended furanyl, anthracene, 4 • anthranyl, or 2.6-anthranyl 'Z1 a single bond, unsubstituted or having a 1,4-phenylene group selected from the group consisting of a halogen group, a cyano group and a nitro group, or a pyridine-2,5-diyl group, a spurred 2,5-diyl' 2 group, 5-thiophenediyl, 2,5-extended furyl, trans.1>4, cyclohexyl, -8 - 201027140 trans-1,3-dioxane-2,5-diyl or 1,4- Piperidinyl, Ari means Monovalent aromatic cyclic group one]. The above compound (C) preferably contains an ultraviolet curable liquid crystal. The above compound (D) preferably contains an ultraviolet curable resin. The above compound (D) preferably further contains an ultraviolet curable (meth)acrylic resin. The transparent resin (A) preferably contains a cyclic olefin resin. The transparent resin (E) is preferably the same resin as the transparent resin (A). The method for producing a polarizing diffractive element of the present invention (mode A) is a method for producing a polarizing diffractive element having the following steps: (1) a base composed of a transparent resin (A) a layer (B) having a molecular alignment energy on at least one side of the material (a), a step of obtaining the substrate (b), and (2) on one side of the substrate (e) composed of the transparent resin (E), a pattern in which a concave portion and a convex portion composed of a substance φ containing the compound (D) are continuously formed by transfer to obtain a substrate (f), and (3) a composition containing the compound (C) a step of laminating the layer (B) having the molecular alignment energy of the substrate (b) opposite to the patterned surface of the substrate (f), wherein the composition comprising the compound (D) comprises The pattern portion has optical anisotropy, and the portion derived from the composition containing the aforementioned compound (C) has optical anisotropy. The step (3) is preferably a step of applying a composition containing the compound (C) to the layer (B) of the substrate (b), and having the coated surface and the substrate (f) The step of laminating the surface of the type to the ground. -9 - 201027140 The step (3) is preferably a step of applying a composition comprising the compound (C) to the surface of the substrate (f) having the pattern, and the coated surface and the substrate (b) The step of layer (B) facing the layer. In the step (1), it is preferred to carry out the elongation treatment while forming the layer (B). The manufacturing method (second aspect) of the polarizing diffractive element of the present invention (pattern A) is characterized by the method for producing a polarizing diffractive element having the following steps: (I) consisting of a transparent resin (A) a substrate (a) having a layer (B) having a molecular alignment energy on one side to obtain a substrate (b), and (II) a layer (B) on the substrate (b) Printing forms a pattern in which a concave portion and a convex portion composed of a composition containing the compound (C) are continuously formed, a step of obtaining the substrate (c), and (III) having a pattern on the substrate (c) Coating the composition containing the compound (D) on the surface thereof, and filling the concave portion with at least the compound (D) to obtain a substrate (d) having a filling portion, wherein the portion derived from the convex portion has The optical anisotropy is derived from the portion of the aforementioned filling portion having optical anisotropy. 〇 In the step (I), it is preferred to carry out the elongation treatment while forming the layer (B). The transparent resin (A) and the transparent resin (E) are preferably the same resin. Preferably, the substrate (e) comprising a transparent resin (E) is further provided on the surface of the polarizing diffractive element having the squeezing portion, and the substrate (a) is preferably made of a transparent resin. (A) A substrate having a continuous roll shape of at least 3 m or more in the direction of length -10 to 201027140. The method for producing a polarizing diffractive element of the present invention (pattern A) is characterized by the method for producing a polarizing diffractive element having the following steps: (i) consisting of a transparent resin (A) a step of obtaining a substrate (b) by forming a pattern in which a concave portion and a convex portion composed of a composition containing the compound (C) are continuously formed on at least one surface of the substrate (a,) by transfer. And (ii) applying a composition containing the compound (D) to the surface of the substrate (b) having a pattern, and filling the concave portion with at least the compound (D) to obtain a filling portion. a step of the substrate (c), wherein the surface of the substrate (a') having the pattern has a molecular alignment energy, and the portion derived from the convex portion has optical anisotropy, and is derived from the portion of the aforementioned portion It has optical anisotropy. Preferably, the substrate (e) having the transparent resin (E) is further provided on the surface of the polarizing diffractive element having the squeezing portion, and the substrate (a') is preferably composed of the substrate (a'). A substrate made of a transparent resin (A) having a continuous roll shape of at least 3 m in the longitudinal direction. That is, the manufacturing method of the solar light diffraction element of the present invention (B) is characterized in that it comprises a method of manufacturing a polarizing diffractive element comprising the following steps: (I) utilizing at least a substrate (a) for transfer a step of forming a pattern in which a concave portion and a convex portion are continuously formed on one surface, a step of obtaining the member (b), and (11) a step of filling the concave portion with at least the compound (C) to obtain a member (c) having a filling portion 'and (IU) the step of extending the member (c) to obtain the member (d), wherein the polarizing diffractive element is derived from the portion of the convex portion -11 - 201027140 and one of the portions derived from the aforementioned filling portion It has optical anisotropy and the other side has optical anisotropy. The pattern in which the concave portion and the convex portion are continuously formed is preferably formed by directly transcribing on at least one surface of the substrate (a). Further, the pattern in which the concave portion and the convex portion are continuously formed is preferably such that a composition containing the compound (B) is applied onto the substrate (a), and a coating film formed of the composition is obtained, and then transferred onto the substrate. Formed on the film. Further, the polarizing diffractive element obtained by the manufacturing method of the polarizing diffractive element of the present invention (pattern B) has an optical homotropy from a portion derived from the convex portion' derived from the aforementioned portion of the filling portion It has an optical anisotropy, and a portion derived from the aforementioned convex portion has optical anisotropy, and a portion derived from the aforementioned expansion portion has optical anisotropy. . The polarizing diffractive element obtained by the method for producing a polarizing diffractive element of the present invention (pattern B) has optical anisotropy from a portion derived from the convex portion. 'The portion derived from the aforementioned filling portion has optical anisotropy In the case of the above, the compound (C) is preferably an ultraviolet curable liquid crystal monomer 10 having optical anisotropy, and the compound (B) is preferably an ultraviolet curable (meth)acrylic monomer. The polarizing diffractive element obtained by the method for producing a polarizing diffractive element of the present invention (pattern B) is sourced before the white but AW 3W7 / Λ 0·*=·,,, =«·_

，前述化合物（C 化合物（C )較好爲紫外線硬化型 更化型液晶單體 (甲基）丙稀酸 -12- 201027140 前述基板（a)較好爲由熱可塑性樹脂所構成。 前述基板（a)較好爲由環狀烯烴系樹脂所構成。 本發明（樣態B )之偏光性繞射元件係以上述偏光性 繞射元件之製造方法製造。 [發明效果] 依據本發明，可提供光學特性優異之偏光性繞射元件 φ ，及用以獲得該偏光性繞射元件之連續生產性優異且經濟 性優異之偏光性繞射元件之製造方法。 該偏光性繞射元件可較好地使用作爲組裝於光讀取裝 置等中之光學零件等。 【實施方式】 以下，針對本發明具體加以說明。本發明大致上分成 樣態A及樣態B，首先說明樣態A，接著說明樣態B。 ❹ <本發明之（樣態A) > [偏光性繞射元件] 本發明之偏光性繞射元件爲在由透明樹脂（A )所構 成之基材（a)之至少一面上依序層合下列之層：具有分 子配向能之層（B)，連續的形成凹部與凸部之具有源自 化合物（C)之構造單位之層（LC)，及具有與前述層（ LC)之凹部及凸部嵌合之連續凸部與凹部之由含有化合物 (D)之組成物形成之層（LD)，前述層（LC)具有光學 -13- 201027140 異向性，且前述層（LD)具有光學等向性 又，本發明之偏光性繞射元件較好爲在由透明樹脂（ A)所構成之基材（a)之至少一面上依序層合下列之層而 成：具有分子配向能之層（B)，連續形成有凹部與凸部 之具有源自化合物（C)之構造單位之層（LC)，具有與 前述層（LC)之凹部及凸部嵌合之連續凸部與凹部之具有 源自化合物（D)之構造單位之層（LD)，及由透明樹脂 (E)所構成之基材（e)，前述層（LC)具有光學異向性 @ ，且前述層（LD)具有光學等向性。 本發明之偏光性繞射元件爲利用例如後述之偏光性繞 射元件之製造方法（第一樣態、第二樣態）獲得之元件。 本發明之偏光性繞射元件可於面全體高度地控制偏光繞射 性能，且可較好地使用作爲組裝於光讀取裝置等中之光學 零件。該等使雷射光通過之光學零件中，爲了不使雷射光 通過時使雷射光歪斜，因此要求零件之平滑性。作爲此等 平滑性之指標雖利用透過波前像差（wavefront aberration ® )(全面RMS’Xrms)，但由本發明之製造方法獲得之偏 光性繞射元件，由於使用平滑之基材（a)，於其上塗佈 材料獲得表面平滑性，因而可確保充分之平滑性。本發明 之偏光性繞射元件之透過波前像差以例如DVD波長中光徑 2mm φ時之全面RMS値較好爲25ιηλ以下，更好爲20ιηλ以下 ，最好爲15ιηλ以下。全面RMS値超過25ιηλ時，由於射出之 雷射光歪斜，使光讀取裝置之讀取性能降低故而不佳。 本發明之偏光性繞射元件亦可對前述基材（a)及具 -14- 201027140 有分子配向能之層（B)施與延伸處理。 藉由利用延伸處理形成層（B)可賦予層 向能。經延伸處理所形成之層（B )具有分子 可對層合於該層上之層（LC)賦予光學異向性 延伸處理通常係在形成層（B)之際進行 理亦對基材（a)施與延伸處理。延伸處理之 好利用後述之偏光性繞射元件之製造方法（第 φ 二樣態）中詳述之方法進行》 本發明之偏光性繞射元件較好對具有前述 (B)施以摩擦處理。摩擦處理爲對具有分子 (B)賦予分子配向能之方法之一。又，摩擦 方法較好爲利用後述之偏光性繞射元件之製造 樣態、第二樣態）中詳述之方法進行。 本發明之偏光性繞射元件較好爲前述具有 之層（B)係由包含（甲基）丙烯酸系化合物 9 、聚乙烯醇及聚胺基甲酸酯之至少一種之組成 〇 又，前述具有分子配向能之層（B)亦較 具有以下式（I)表示之構造之聚合物之組成 且層（B )爲藉由放射線照射而賦予分子配向肯g 姻2】: -R1—CH=CH-Z1—Ar1 (I) (B)分子配 配向能，且 〇 ，該延伸處 具體方法較 一樣態、第 配向能之層 配向能之層 處理之具體 方法（第一 分子配向能 、聚醯亞胺 物所構成者 好爲由包含 物所構成， i者： -15- 201027140 [式（I)中，R1 表示 _c(〇)〇·、-CONH-、το·。、未取代 或具有選自鹵基、氰基及硝基之基之i，4_伸苯基、或吡啶-2,5-二基、嘧啶-2,5-二基、2,5-噻吩二基、2,5-伸呋喃基、 1，4-伸萘基、或2,6-伸萘基， E表示未取代或具有選自鹵基、氰基及硝基之基之 1，4-伸苯基、或吡啶-2,5_二基、嘧啶-2,5_二基、2,5噻吩 二基、2,5-伸呋喃基、ίο伸萘基、或2,6_伸萘基， Z1表示單鍵、未取代或具有選自鹵基、氰基及硝基之 參 基之1,4 -伸苯基、或吡啶-2,5_二基、嘧啶_2,5_二基、2,5_ 噻吩二基、2,5-伸呋喃基、反式1,4-伸環己基、反式-i，3-二嚼院-2,5 -二基或1，4 -哌淀基，The compound (C compound (C) is preferably an ultraviolet curing type liquid crystal monomer (methyl) acrylate 12-201027140. The substrate (a) is preferably composed of a thermoplastic resin. a) It is preferably composed of a cyclic olefin resin. The polarizing diffractive element of the present invention (pattern B) is produced by the above-described method for producing a polarizing diffractive element. [Effect of the Invention] According to the present invention, it is possible to provide A polarizing diffractive element φ having excellent optical characteristics, and a method for producing a polarizing diffractive element which is excellent in continuous productivity and excellent in economical efficiency in obtaining the polarizing diffractive element. The polarizing diffractive element can be preferably used. An optical component or the like incorporated in an optical reading device or the like is used. [Embodiment] Hereinafter, the present invention will be specifically described. The present invention is roughly divided into a mode A and a mode B, and first, a mode A will be described, and then a description will be given. State B. (Formation A) > [Polarizing Diffraction Element] The polarizing diffractive element of the present invention is at least one side of a substrate (a) composed of a transparent resin (A) On top of each other a layer (B) having a molecular alignment energy, a layer (LC) having a structural unit derived from the compound (C) continuously formed in the concave portion and the convex portion, and a concave portion and a convex portion having the layer (LC) a layer (LD) formed of a composition containing the compound (D), wherein the layer (LC) has optical anisotropy, and the layer (LD) has optical anisotropy. Further, the polarizing diffractive element of the present invention is preferably formed by laminating the following layers on at least one side of the substrate (a) composed of the transparent resin (A): a layer having molecular alignment energy ( B) a layer (LC) having a concave portion and a convex portion and having a structural unit derived from the compound (C), and having a continuous convex portion and a concave portion fitted to the concave portion and the convex portion of the layer (LC) a layer (LD) of a structural unit of the compound (D), and a substrate (e) composed of a transparent resin (E), the layer (LC) has an optical anisotropy @, and the layer (LD) has an optical The polarizing diffractive element of the present invention is a manufacturing method using, for example, a polarizing diffractive element described later. The polarizing diffractive element of the present invention can control the diffractive diffraction performance at a high level on the entire surface, and can be preferably used as an assembly in an optical reading device or the like. Optical parts. In the optical parts through which the laser light passes, the smoothness of the parts is required in order to prevent the laser light from being deflected when the laser light passes, and the wavefront aberration is used as an index of such smoothness. ® ) (Comprehensive RMS 'Xrms), but the polarizing diffractive element obtained by the manufacturing method of the present invention can ensure sufficient smoothness by using a smooth substrate (a) to obtain a surface smoothness by coating the material thereon. Sex. The transmission undulation aberration of the polarizing diffractive element of the present invention is, for example, a total RMS 时 of 2 mm φ in the DVD wavelength, preferably 25 ηηλ or less, more preferably 20 ηηλ or less, and most preferably 15 ηηλ or less. When the full RMS 値 exceeds 25 η λ, the readout performance of the optical reading device is degraded due to the skew of the emitted laser light. The polarizing diffractive element of the present invention may also be subjected to an extension treatment to the substrate (a) and the layer (B) having a molecular alignment energy of -14 to 201027140. The layerwise energy can be imparted by forming the layer (B) by the elongation treatment. The layer (B) formed by the stretching treatment has a molecule capable of imparting an optical anisotropic extension treatment to the layer (LC) laminated on the layer, usually at the time of forming the layer (B), and also on the substrate (a) ) application and extension processing. The stretching process is preferably carried out by the method described in the method for producing a polarizing diffractive element (the second φ dimorph) described later. The polarizing diffractive element of the present invention preferably has the above-mentioned (B) rubbing treatment. The rubbing treatment is one of the methods of imparting molecular aligning energy to the molecule (B). Further, the rubbing method is preferably carried out by a method as described in detail in the production state of the polarizing diffractive element described later and the second aspect. The polarizing diffractive element of the present invention preferably has the layer (B) having at least one of a (meth)acrylic compound 9, a polyvinyl alcohol, and a polyurethane, and the foregoing The layer of molecular aligning energy (B) is also composed of a polymer having a structure represented by the following formula (I) and the layer (B) is imparted to the molecule by radiation irradiation. 2]: -R1 - CH=CH -Z1—Ar1 (I) (B) The molecular matching of the energy, and 〇, the specific method of the specific method of the extension, the specific method of the layer of the alignment energy of the aligning energy layer (first molecular aligning energy, poly fluorene The composition of the amine is preferably composed of inclusions, i: -15- 201027140 [In the formula (I), R1 represents _c(〇)〇·, -CONH-, το·., unsubstituted or has an option i,4_phenylene, or pyridine-2,5-diyl, pyrimidine-2,5-diyl, 2,5-thiophenediyl, 2,5 from a halo, cyano and nitro group - a furanyl group, a 1,4-naphthyl group, or a 2,6-anthranyl group, and E represents a 1,4-phenylene group which is unsubstituted or has a group selected from a halogen group, a cyano group and a nitro group, or Pyridine-2,5-diyl, pyrimidine a 2,5-diyl group, a 2,5-thienyldiyl group, a 2,5-extended furanyl group, a phthalyl group, or a 2,6-strandyl group, and Z1 represents a single bond, unsubstituted or has a halogen group selected from 1,4 -phenylene, or pyridine-2,5-diyl, pyrimidine-2,5-diyl, 2,5-thiophenediyl, 2,5-extended furyl , trans 1,4-cyclohexylene, trans-i,3-diche-2,5-diyl or 1,4-piperidinyl,

Ar1表示具有芳香族環之—價基 前述包含選自（甲基）丙烯酸系化合物、聚醯亞胺、 聚乙烯醇及聚胺基甲酸酯之至少一種之組成物中所含（甲 基）丙烯酸系化合物列舉爲使於後述化合物（D )中所例 示之（甲基）丙烯酸酯化合物反應而成之聚合物等，聚醯 @ 亞胺列舉爲使四羧酸二酐與二胺反應獲得之聚醯胺酸經脫 水環化獲得者等’聚乙烯醇列舉爲聚乙烯醇之羥基經有機 基取代之改質聚乙烯醇等’聚胺基甲酸酯列舉爲使聚醚多 元醇與聚異氰酸酯反應而成之聚合物等。 其中，使後述之化合物（D)中所例示之（甲基）丙 烯酸酯化合物反應而成之聚合物較好爲紫外線硬化型之樹 脂，亦可於獲得預聚物之後使用於具有分子配向能之層（ B)中’亦可作爲單體或光聚合起始劑（光自由基產生劑 •16- 201027140 )等之組成物在基材（a)上形成具有分子配向能之層（b )。含有源自化合物（D)之構造單位之層一般係作爲光 學同向性材料使用，但藉由摩擦處理或延伸處理等，亦可 利用作爲具有分子配向能之層。該情況下，尤其是基材（ a)爲由包含後述之環狀烯烴系樹脂之透明樹脂（A)所構 成時，作爲（甲基）丙烯酸酯化合物，就與基材（a)之 密著性之觀點而言，較好包含含脂環式構造之單官能基單 φ 體或多官能基單體。 又’作爲於包含選自（甲基）丙烯酸系化合物、聚醯 亞胺、聚乙烯醇及聚胺基甲酸酯之至少一種之組成物中所 含之其他成分，在不損及目的物性之範圍內，就提升對於 基材（a)表面之接著性之觀點而言，亦可含有含官能性 矽烷之化合物、環氧化合物等。 於包含具有以前述式（I)表示之構造之聚合物之組 成物中所含之具有以前述式（I)表示之構造之聚合物並 φ 無特別限制，但可舉例爲例如側鏈上具有前述式（I )之 聚合物。該聚合物舉例爲例如特開2003-3〇7736、特開平6-28 74 53中所述之聚醯亞胺系聚合物或丙烯酸系聚合物等。 又，於包含具有以式（I)表示之構造之聚合物之組成物 中所含之其他成分，在不損及目的物性之範圍內，就提升 對於基材（a)表面之接著性之觀點而言，亦可含有含官 能性矽烷之化合物、環氧化合物等。 又，本發明之偏光性繞射元件中，具有分子配向能之 層（B)之厚度較好爲l~5000nm，更好爲5〜500nm，最好 -17- 201027140 爲 10~200nm 。 層（LC )較好爲由包含化合物（c )之組成.物形成。 通常係使用光學異向性材料作爲化合物（C)。又，前述 化合物（C)較好包含紫外線硬化型液晶。 再者’所謂包含化合物（C)之組成物爲具有光學異 向性之組成物，通常係使用光學異向性材料作爲化合物（ C) ° 前述光學異向性材料只要是具有光學異向性之材料則 @ 無特別限制’但較好使用液晶材料。液晶材料中就連續性 經濟地生產偏光性繞射元件之觀點而言，較好使用紫外線 硬化型液晶。 至於紫外線硬化型液晶並無特別限制，可使用於向列 型液晶、層列型液晶中導入至少一個以上之丙烯酸酯基及 /或甲基丙烯酸酯基者。 該紫外線硬化型液晶之例列舉爲在氧化偶氮（azoxy )系液晶、氰基聯苯系液晶、席夫氏（Schiff)系液晶、 @ 氰基苯酯系液晶、氰基苯基環己烷系液晶、苯甲酸苯酯系 液晶、環己烷羧酸苯酯系液晶、苯基嘧啶系液晶、苯基二 噁烷系液晶等之低分子液晶中導入一個以上之丙烯酸酯基 及/或甲基丙烯酸酯基之紫外線硬化型液晶。又，該等紫 外線硬化型液晶可單獨使用，亦可混合兩種以上使用。 前述含有化合物（C)之組成物，在紫外線硬化型液 晶本身具有流動性時’可僅爲紫外線硬化型液晶，亦可爲 含有紫外線硬化型液晶之混合物，爲了提高紫外線硬化型 18 - 201027140 液晶之塗佈性，亦可使用添加溶劑之溶液作爲組成物。此 時，使用之溶劑可適當的選擇不損及具有分子配向能之層 (B )之分子配向能者。使用添加溶劑之溶液作爲包含化 合物（C)之組成物時，將該組成物塗佈於基材（b)之層 (B )上之後，較好藉由加熱使溶劑揮發。此時，溶劑之 添加量相對於化合物（C ) 100質量％，較好爲1~500質量％ ，更好爲10〜400質量％，最好爲20〜3 00質量％。 @ 又，含有化合物（C)之組成物較好添加有光聚合起 始劑（光自由基產生劑）。光聚合起始劑可於使後述使（ 甲基）丙烯酸酯化合物聚合（硬化）時使用，且可使用與 光聚合起始劑（光自由基產生劑）相同者。 光聚合起始劑（光自由基產生劑）之添加量相對於本 發明之紫外線硬化型液晶之質量100質量％，較好爲10質量 %以下，更好爲5質量％以下，最好爲3質量％以下。添加量 超過1〇質量％時，由於無法忽視未反應之光聚合起始劑對 〇 於液晶轉移溫度等之偏光性繞射元件物性產生之影響故而 不佳。又，市售之包含化合物（C)之組成物舉例爲例如 Merck股份有限公司製造之LicrivueTM RMM727等。 層（LD )係由包含化合物（D )之組成物所形成。通 常使用光學同向性材料作爲化合物（D)。又，前述化合 物（D)較好包含紫外線硬化型樹脂。化合物（D)爲紫 外線硬化型樹脂時，由於可連續的生產本發明之偏光性繞 射元件故而較佳，且就容易獲得透明性或光學之同向性方 面而言’較好前述化合物（D)包含紫外線硬化型（甲基 • 19 ~ 201027140 )丙烯酸樹脂。 前述紫外線硬化型（甲基）丙烯酸樹脂較好使用藉由 使以下所示之（甲基）丙烯酸酯化合物聚合獲得之樹脂。 (甲基）丙烯酸酯化合物只要是分子內具有至少一個（甲 基）丙烯醯基者則無特別限制。例如作爲（甲基）丙烯酸 酯化合物，舉例爲單官能性基（甲基）丙烯酸酯化合物、 多官能基（甲基）丙烯酸酯化合物。 再者，本發明中所謂的（甲基）丙烯酸酯化合物係表 ❹ 示選自由丙烯酸酯化合物及甲基丙烯酸酯化合物所組成群 組之至少一種化合物，所謂的（甲基）丙烯醯基係表示選 自由丙烯醯基及甲基丙烯醯基所組成群組之至少一種基。 單官能基（甲基）丙烯酸酯化合物之具體例列舉爲（ 甲基）丙烯酸甲酯、（甲基）丙烯酸乙酯、丙烯酸2-苯氧 基乙酯、（甲基）丙烯酸丙酯、（甲基）丙烯酸異丙酯、 (甲基）丙烯酸丁酯、（甲基）丙烯酸異丁酯、（甲基） 丙烯酸第三丁酯、（甲基）丙烯酸戊酯、（甲基）丙烯酸 @ 戊酯、（甲基）丙烯酸異戊酯、（甲基）丙烯酸己酯、（ 甲基）丙烯酸庚酯、（甲基）丙烯酸辛酯、（甲基）丙烯 酸異辛酯、（甲基）丙烯酸2-乙基己酯、（甲基）丙烯酸 壬酯、（甲基）丙烯酸癸酯、（甲基）丙烯酸異癸酯、（ 甲基）丙烯酸十一烷酯、（甲基）丙烯酸十二烷酯、（甲 基）丙烯酸月桂酯、（甲基）丙烯酸硬脂酯、（甲基）丙 烯酸異硬脂酯等之（甲基）丙烯酸烷酯類； (甲基）丙烯酸羥基乙酯、（甲基）丙烯酸羥基丙酯 -20- 201027140 、（甲基）丙烯酸羥基丁酯等之（甲基）丙烯酸羥基烷酯 類； (甲基）丙烯酸苯氧基乙酯、（甲基）丙烯酸2-羥基-3 -苯氧基丙酯等之（甲基）丙嫌酸苯氧基院醋類； (甲基）丙烯酸甲氧基乙酯、（甲基）丙烯酸乙氧基 乙酯、（甲基）丙烯酸丙氧基乙酯、（甲基）丙烯酸丁氧 基乙酯、（甲基）丙烯酸甲氧基丁酯等之（甲基）丙烯酸 0 烷氧基烷酯類； 聚乙二醇單（甲基）丙烯酸酯、乙氧基二乙二醇（甲 基）丙烯酸酯 '甲氧基聚乙二醇（甲基）丙烯酸酯、苯氧 基聚乙二醇（甲基）丙烯酸酯、壬基苯氧基聚乙二醇（甲 基）丙烯酸酯等之聚乙二醇（甲基）丙烯酸酯類； 聚丙二醇單（甲基）丙烯酸酯、甲氧基聚丙二醇（甲 基）丙烯酸酯、乙氧基聚丙二醇（甲基）丙烯酸酯、壬基 苯氧基聚丙二醇（甲基）丙烯酸酯等之聚丙二醇（甲基） φ 丙烯酸酯類； (甲基）丙烯酸環己酯、（甲基）丙烯酸4-丁基環己 酯、（甲基）丙烯酸二環戊酯、（甲基）丙烯酸二環戊氧 基乙酯、（甲基）丙烯酸二環戊烯酯、（甲基）丙烯酸二 環戊烯氧基乙酯、（甲基）丙烯酸二環戊二烯酯、（甲基 )丙烯酸冰片酯、（甲基）丙烯酸異冰片酯、（甲基）丙 烯酸三環癸酯等之（甲基）丙烯酸環烷酯類·， (甲基）丙烯酸苄酯；（甲基）丙烯酸四氫糠酯等。 該等單官能基（甲基）丙烯酸酯化合物可單獨使用一種， -21 - 201027140 或可混合兩種以上使用。 又’多官能基（甲基）丙烯酸酯化合物之具體例舉例 爲乙二醇二（甲基）丙烯酸酯、二乙二醇二（甲基）丙烯 酸酯、四乙二醇二（甲基）丙烯酸酯、聚乙二醇二（甲基 )丙烯酸酯、1，4-丁二醇二（甲基）丙烯酸酯、n，6-己二 醇二（甲基）丙烯酸酯、新戊二醇二（甲基）丙烯酸酯等 之烷二醇二（甲基）丙烯酸酯類； 三羥甲基丙烷三（甲基）丙烯酸酯、三羥甲基丙烷三 0 羥基乙基三（甲基）丙烯酸酯、二-三羥甲基丙烷四（甲 基）丙烯酸酯、季戊四醇三（甲基）丙烯酸酯、季戊四醇 四（甲基）丙烯酸酯、二季戊四醇六（甲基）丙烯酸酯、 羥基特戊酸新戊二醇二（甲基）丙烯酸酯等之多價醇之聚 (甲基）丙烯酸酯類； 異脲氰酸酯三（甲基）丙烯酸酯、參（2-羥基乙基） 異脲氰酸酯二（甲基）丙烯酸酯、參（2-羥基乙基）異脲 氛酸酯三（甲基）丙烯酸酯等之異脲氰酸酯之聚（甲基） 〇 丙烯酸酯類： 三環癸二基二甲基二（甲基）丙烯酸酯等之環烷之聚 (甲基）丙烯酸酯類； 雙酚A之環氧乙烷加成物之二（甲基）丙烯酸酯、雙 酚A之環氧丙烷加成物之二（甲基）丙烯酸酯、雙酚A之 環氧烷加成物之二（甲基）丙烯酸酯、氫化雙酚A之環氧 乙烷加成物之二（甲基）丙烯酸酯、氫化雙酚A之環氧丙 烷加成物之二（甲基）丙烯酸酯、氫化雙酚A之環氧烷加 -22- 201027140 成物之二（甲基）丙烯酸酯、由雙酚A二縮水甘油醚與（ 甲基）丙烯酸獲得之（甲基）丙嫌酸酯等之雙酣A之（甲 基）丙烯酸酯衍生物類； 3,3,4,4,5,5,6,6-八氟辛烷二（甲基）丙烯酸酯、3-( 2-全氟己基）乙氧基-1，2-二（甲基）丙稀醢基丙院、N-正 丙基- N-2,3-二（甲基）丙嫌酿基丙基全氟辛基磺酿胺等之 含氟（甲基）丙烯酸酯類； 使具有以下之雙酚構造之聚合物（a)與有機聚異氰 酸酯（b)及含有羥基之（甲基）丙烯酸酯（c)反應獲得 之胺基甲酸酯（甲基）丙烯酸酯類； (a)至於具有雙酚構造之多元醇，列舉爲雙酚A之環 氧烷加成之二元醇、雙酚F之環氧烷加成之二元醇、氫化 雙酚A之環氧烷加成之二元醇、氫化雙酚F之環氧烷加成之 二元醇等。該等中，以雙酚A之環氧烷加成之二元醇較佳 。至於該等市售品，舉例爲例如日油（股）製造之DA-400 、DB-400等。 (I))至於有機聚異氰酸酯，以二異氰酸酯較佳，舉 例爲例如2,4-甲苯二異氰酸酯、2,6_甲苯二異氰酸酯、丨，3_ 二甲苯二異氰酸酯、丨，4_二甲苯二異氰酸酯、1&gt;5_萘二異 氰酸酯、間-苯二異氰酸酯、對-苯二異氰酸酯、3，3，_二甲 基-4，4’-—苯基甲烷二異氰酸酯、4,4，二苯基甲烷二異氰 酸酯、3，3’-二甲基苯二異氰酸酯、4,4，聯苯二異氰酸酯等 。該等中最佳者爲2,4-甲苯二異氰酸酯、2,6_甲苯二異氰 酸醋、1，3-二甲苯二異氰酸酯、i,4_二甲苯二異氰酸酯。 -23- 201027140 (C)至於含有羥基之（甲基）丙烯酸酯，可舉例爲 (甲基）丙烯酸2-羥基乙酯、（甲基）丙烯酸2-羥基丙酯 、（甲基）丙烯酸2-羥基丁酯、（甲基）丙烯酸2-羥基-3-苯氧基丙酯、I,4-丁二醇單（甲基）丙烯酸酯、（甲基） 丙烯醯基磷酸2-羥基烷酯、（甲基）丙烯酸4-羥基環己酯 、1，6-己二醇單（甲基）丙烯酸酯、新戊二醇單（甲基） 丙烯酸酯、三羥甲基丙烷（甲基）丙烯酸酯、三羥甲基乙 烷二（甲基）丙烯酸酯、季戊四醇三（甲基）丙烯酸酯、 @ 二季戊四醇五（甲基）丙烯酸酯等。該等中，以（甲基） 丙烯酸2-羥基乙酯、（甲基）丙烯酸2-羥基丙酯等較佳。 該等多官能基（甲基）丙烯酸酯化合物可單獨使用一 種，或混合兩種以上使用。 該等多官能基（甲基）丙烯酸酯化合物中，最好爲二 季戊四醇六丙烯酸酯、季戊四醇四丙烯酸酯、季戊四醇三 丙烯酸酯、三羥甲基丙烷三丙烯酸酯等之一分子內含有之 丙烯醯基之數量多、可實現交聯密度之提高、賦予優異之 ® 膜硬度之多官能基（甲基）丙烯酸酯化合物。 至於前述透明樹脂（A)只要是對使用偏光性繞射元 件時之雷射波長爲透明者即可無特別限制地使用，但前述 雷射波長中不同波長之光線透過率爲8 5%以上者較佳，更 好爲87%以上者，最好爲89%以上者。 至於前述透明樹脂（A)較好包含三乙醯基纖維素（ TAC ) 、PMMA、PS、PC、PES、PSU、環狀烯烴系樹脂等 之熱可塑性樹脂、紫外線硬化型樹脂等較佳。其中透明樹 -24- 201027140 脂（A )較好爲包含環狀烯烴系樹脂者。透明樹脂（A ) 爲環狀烯烴系樹脂時，由於耐熱性或耐久性以及加工性優 異故而較佳。至於環狀烯烴系樹脂之成爲熱變形溫度指標 之玻璃轉移溫度（Tg)通常爲90〜200°C，較好爲 100~190°C，更好爲1 10~180°C。Tg超過1 10°C以上時，由於 偏光性繞射元件具有優異之耐熱性故而較佳。Tg未達90°C 時，由於熱變形溫度低，而有產生耐熱性問題之虞，又， φ 亦有所得薄膜因溫度而產生光學特性變化變大之問題。另 一方面’ Tg超過200 °c時，由於加工溫度過高，因此加工 成薄膜形狀時會有因氧化劣化引起著色而發生光學特性下 降問題之情況。 本文中所謂的玻璃轉移溫度（Tg)係使用示差掃描熱 量計（DSC ) ’在升溫速度20°C/分鐘，於氮氣氛圍中測定 時所得之微分示差掃描熱量曲線之於示差掃描熱量曲線上 對最大峰値溫度（A點）與比最大峰値溫度低20 °C之溫度 • ( B點）作圖，以B點作爲起點之基準線上之接線與以A點 作爲起點之接線之交叉點求得。 前述透明樹脂（E)較好爲與透明樹脂（A)相同之樹 又’本發明之偏光性繞射元件於任意之層中亦可含有 抗氧化劑、熱安定劑、光安定劑、紫外線吸收劑、抗靜電 劑、消泡劑、界面活性劑（脫模劑）等之習知添加劑。 本發明之偏光性繞射元件爲利用後述之偏光性繞射元 件之製造方法（第一樣態，第二樣態）獲得之元件。以下 -25- 201027140 針對偏光性繞射元件之製造方法加以說明。 [偏光性繞射元件之製造方法] 本發明之偏光性繞射元件之製造方法大致上分成三種 樣態》 本發明之偏光性繞射元件之製造方法之第一樣態爲具 有下列步驟之偏光性繞射元件之製造方法：（1)在由透 明樹脂（A)所構成之基材（a)之至少一面上形成具有分 @ 子配向能之層（B)，獲得基材（b)之步驟，（2)在由 透明樹脂（E)所構成之基材（e)之~面上，利用轉印而 形成連續形成有由含有化合物（D)之組成物所構成之凹 部與凸部之圖型，獲得基材（f)之步驟，及（3)透過含 有化合物（C)之組成物使前述基材（b)之具有分子配向 能之層（B)與基材（f)之具有圖型之面相對向地層合之 步驟，其特徵爲由包含前述化合物（D)之組成物所構成 之圖型部份具有光學同向性，且源自包含前述化合物（C G )之組成物之部分具有光學異向性。 本發明之偏光性繞射元件之製造方法之第二樣態爲具 有下列步驟之偏光性繞射元件之製造方法：（I )在由透 明樹脂（A)所構成之基材（a)之至少一面上形成具有分 子配向能之層（B)，獲得基材（b)之步驟，（II)在基 材（b)之層（B)上，利用轉印而形成連續形成有由含有 化合物（C )之組成物所構成之凹部與凸部之圖型，獲得 基材（c)之步驟，以及（III)在前述基材（c)之具有圖 -26- 201027140 型之面上塗佈包含化合物（D)之組成物，使前述凹部至 少由化合物（D)所塡充，獲得具有塡充部之基材之 步驟，其特徵爲源自前述凸部之部分具有光學異向性，源 自前述塡充部之部分具有光學同向性。 本發明之偏光性繞射元件之製造方法之第三樣態爲具 有下列步驟之偏光性繞射元件之製造方法·· （i)於由透 明樹脂（A)所構成之基材（a’）之至少~面上，利用轉 φ 印而形成連續形成有由包含化合物（C)之組成物所構成 之凹部與凸部之圖型，而獲得基材（b)之步驟，及（ϋ) 將包含化合物（D)之組成物塗佈於前述基材（b)之具有 圖型之面上，使前述凹部至少由化合物（D)所塡充，獲 得具有塡充部之基材（c)之步驟，其特徵爲前述基材（ a’）之形成有圖型之面具有分子配向能，源自前述凸部之 部分具有光學異向性，且源自前述塡充部之部分具有光學 同向性。 0 本發明之偏光性繞射元件之製造方法中，第一樣態及 第二樣態可製造前述[偏光性繞射元件]之項中所述之偏光 性繞射元件。又，本發明之偏光性繞射元件之製造方法中 ，以第三樣態可獲得與前述之[偏光性繞射元件]之項中所 述之偏光性繞射元件不同之構造之偏光性繞射元件。具體 而言，第一樣態中源自連續形成有由含有化合物（D)之 組成物所構成之凹部與凸部之圖型之層及源自包含化合物 (C )之組成物之層分別相當於前述[偏光性繞射元件]之 項中所述之偏光性繞射元件之層（LD)及層（LC)。又 -27- 201027140 ’第二樣態中源自連續形成有由含有化合物（C)之組成 物所構成之凹部與凸部之圖型之層及塡充部分別相當於前 述[偏光性繞射元件]之項中所述之偏光性繞射元件之層（ LC )及層（LD )。 又’ （1)於由透明樹脂（A)所構成之基材（a)之 至少一面上形成具有分子配向能之層（B)，獲得基材（b )之步驟亦稱爲（1 )步驟，（2 )在由透明樹脂（E )所 構成之基材（e)之一面上，利用轉印而形成連續形成有 參 由含有化合物（D)之組成物所構成之凹部與凸部之圖型 ，獲得基材（〇之步驟稱爲（2)步驟，（3)透過含有 化合物（C)之組成物使前述基材（b)之具有分子配向能 之層（B)與基材（f)之具有圖型之面相對向地層合之步 驟稱爲（3 )步驟。 又，（Ο在由透明樹脂（A)所構成之基材（〇之 至少一面上形成具有分子配向能之層（B)，獲得基材（b )之步驟亦稱爲（I)步驟，（II)在基材（b)之層（B) © 上，利用轉印而形成連續形成有由含有化合物（C )之組 成物所構成之凹部與凸部之圖型，獲得基材（c)之步驟 稱爲（Π)步驟，（III)在前述基材（c)之具有圖型之 面上塗佈包含化合物（D)之組成物，使前述凹部至少由 化合物（D)所塡充，獲得具有塡充部之基材（d)之步驟 稱爲（ΙΠ)步驟，（i)於由透明樹脂（A)所構成之基材 (a’）之至少一面上，利用轉印而形成連續形成有由包含 化合物（C)之組成物所構成之凹部與凸部之圖型，而獲 -28- 201027140 得基材（b)之步驟稱爲（i)步驟，（ϋ)將包含化合物 (D)之組成物塗佈於前述基材（b)之具有圖型之面上， 使前述凹部至少由化合物（D)所塡充，獲得具有塡充部 之基材（c)之步驟稱爲（ii)步驟。 [第一樣態] 本發明之偏光性繞射元件之製造方法之第一樣態具有 0 後述（1)~(3)步驟’由包含前述化合物（d)之組成物 所構成之圖型部份具有光學同向性，且源自包含前述化合 物（C)之組成物之部分具有光學異向性。 &lt; (1 )步驟&gt; 本發明之第一樣態之偏光性繞射元件之製造法所具有 之（Ο步驟爲（1)在由透明樹脂（A)所構成之基材（a )之至少一面上形成具有分子配向能之層（B)，獲得基 φ 材（b )之步驟。 亦即，本發明之（1)步驟中獲得之基材（b)爲基材 (a)與具有至少一層於該基材（a)上形成之層（B)之 層合體。 第一樣態之偏光性繞射元件之製造方法中之透明樹脂 (A)只要是對使用以本發明之製造方法獲得之偏光性繞 射元件時之雷射波長爲透明者即可無特別限制地使用。 至於前述透明樹脂（A)，較好使用前述[偏光性繞射 元件]之項中所述之透明性樹脂。 -29- 201027140 又，透明樹脂（A )通常使用熱可塑性樹脂，但亦可 使用適當調製構造而成之紫外線硬化樹脂。至於紫外線硬 化樹脂可使用例如化合物（D)所例示之紫外線硬化型（ 甲基）丙烯酸樹脂。 (基材（a))Ar1 represents a valence group having an aromatic ring, and the above-mentioned (meth) group containing at least one selected from the group consisting of a (meth)acrylic compound, a polyimine, a polyvinyl alcohol, and a polyurethane The acrylic compound is exemplified by a polymer obtained by reacting a (meth) acrylate compound exemplified in the compound (D) described later, and the polyfluorene@imide is exemplified by reacting a tetracarboxylic dianhydride with a diamine. Polyacrylic acid obtained by dehydration and cyclization, etc. 'Polyvinyl alcohol is exemplified as a modified polyvinyl alcohol such as a hydroxyl group of a polyvinyl alcohol which is substituted with an organic group. The polyurethane is exemplified as a polyether polyol and a polyisocyanate. The polymer obtained by the reaction. Among them, a polymer obtained by reacting a (meth) acrylate compound exemplified in the compound (D) described later is preferably an ultraviolet curable resin, and may be used for molecular aligning energy after obtaining a prepolymer. In the layer (B), a layer having a molecular alignment energy (b) may be formed on the substrate (a) as a monomer or a photopolymerization initiator (photo-radical generator; 16-201027140). The layer containing the structural unit derived from the compound (D) is generally used as an optically isotropic material, but may be used as a layer having molecular alignment energy by a rubbing treatment or an extension treatment. In this case, in particular, when the base material (a) is composed of a transparent resin (A) containing a cyclic olefin resin to be described later, the (meth) acrylate compound is adhered to the substrate (a). From the viewpoint of the nature, a monofunctional mono- or poly-functional monomer having an alicyclic structure is preferred. Further, as the other component contained in the composition containing at least one selected from the group consisting of a (meth)acrylic compound, a polyimine, a polyvinyl alcohol, and a polyurethane, the physical properties are not impaired. In the range, from the viewpoint of improving the adhesion to the surface of the substrate (a), a compound containing a functional decane, an epoxy compound, or the like may be contained. The polymer having the configuration represented by the above formula (I) contained in the composition comprising the polymer having the structure represented by the above formula (I) and φ is not particularly limited, but may be exemplified by, for example, a side chain The polymer of the above formula (I). The polymer is exemplified by, for example, a polyfluorene-based polymer or an acrylic polymer described in JP-A-2003-3〇7736, JP-A-6-28 7453. Moreover, the viewpoint of improving the adhesion to the surface of the substrate (a) in the range of not impairing the target physical property in the other component contained in the composition having the polymer represented by the formula (I) Further, a compound containing a functional decane, an epoxy compound, or the like may be contained. Further, in the polarizing diffractive element of the present invention, the layer (B) having a molecular alignment energy preferably has a thickness of from 1 to 5,000 nm, more preferably from 5 to 500 nm, most preferably from -17 to 2010, and from 27 to 200 nm. The layer (LC) is preferably formed of a composition comprising the compound (c). An optically anisotropic material is usually used as the compound (C). Further, the compound (C) preferably contains an ultraviolet curable liquid crystal. Further, the composition containing the compound (C) is a composition having optical anisotropy, and an optically anisotropic material is usually used as the compound (C). The optical anisotropic material is optically anisotropic as long as it is optically anisotropic. The material is @no special restrictions' but it is better to use liquid crystal materials. From the viewpoint of continuously and economically producing a polarizing diffractive element in a liquid crystal material, an ultraviolet curable liquid crystal is preferably used. The ultraviolet curable liquid crystal is not particularly limited, and may be used for introducing at least one or more acrylate groups and/or methacrylate groups into a nematic liquid crystal or a smectic liquid crystal. Examples of the ultraviolet curable liquid crystal are azoxy-based liquid crystal, cyanobiphenyl liquid crystal, Schiff liquid crystal, @cyanophenyl ester liquid crystal, and cyanophenylcyclohexane. Introducing one or more acrylate groups and/or A into a low molecular liquid crystal such as a liquid crystal, a phenyl benzoate liquid crystal, a cyclohexane carboxylate liquid crystal, a phenylpyrimidine liquid crystal, or a phenyl dioxane liquid crystal A acrylate-based ultraviolet curable liquid crystal. Further, these ultraviolet curable liquid crystals may be used singly or in combination of two or more. When the ultraviolet curable liquid crystal itself has fluidity, the composition containing the compound (C) may be only an ultraviolet curable liquid crystal, or may be a mixture containing an ultraviolet curable liquid crystal, in order to improve the ultraviolet curable type 18 - 201027140 liquid crystal. As the coating property, a solution in which a solvent is added may be used as a composition. At this time, the solvent to be used can be appropriately selected without impairing the molecular alignment ability of the layer (B) having the molecular alignment energy. When the solution containing the solvent is used as the composition containing the compound (C), after the composition is applied onto the layer (B) of the substrate (b), the solvent is preferably volatilized by heating. In this case, the amount of the solvent added is preferably from 1 to 500% by mass, more preferably from 10 to 400% by mass, most preferably from 20 to 30,000% by mass, based on 100% by mass of the compound (C). @ Further, a composition containing the compound (C) is preferably added with a photopolymerization initiator (photoradical generator). The photopolymerization initiator can be used when the (meth) acrylate compound is polymerized (hardened), and the same as the photopolymerization initiator (photoradical generator) can be used. The amount of the photopolymerization initiator (photo-radical generator) is preferably 100% by mass or less, more preferably 5% by mass or less, even more preferably 3% by mass based on 100% by mass of the mass of the ultraviolet curable liquid crystal of the present invention. Below mass%. When the amount of addition exceeds 1% by mass, it is not preferable because the unreacted photopolymerization initiator cannot be ignored for the influence of the physical properties of the polarizing diffractive element such as the liquid crystal transition temperature. Further, a commercially available composition containing the compound (C) is exemplified by, for example, LicrivueTM RMM727 manufactured by Merck Co., Ltd., and the like. The layer (LD) is formed of a composition containing the compound (D). An optically isotropic material is usually used as the compound (D). Further, the compound (D) preferably contains an ultraviolet curable resin. When the compound (D) is an ultraviolet curable resin, it is preferable because the polarizing diffractive member of the present invention can be continuously produced, and the above compound (D) is preferable in terms of transparency or optical homology. ) Contains UV curable (methyl • 19 ~ 201027140) acrylic resin. As the ultraviolet curable (meth)acrylic resin, a resin obtained by polymerizing a (meth) acrylate compound shown below is preferably used. The (meth) acrylate compound is not particularly limited as long as it has at least one (meth) acrylonitrile group in the molecule. For example, as the (meth) acrylate compound, a monofunctional (meth) acrylate compound or a polyfunctional (meth) acrylate compound is exemplified. Further, the (meth) acrylate compound in the present invention is represented by at least one compound selected from the group consisting of an acrylate compound and a methacrylate compound, and the so-called (meth) acrylonitrile group is represented by At least one group selected from the group consisting of an acryloyl group and a methacryl group is selected. Specific examples of the monofunctional (meth) acrylate compound are exemplified by methyl (meth) acrylate, ethyl (meth) acrylate, 2-phenoxyethyl acrylate, propyl (meth) acrylate, (a) Isopropyl acrylate, butyl (meth)acrylate, isobutyl (meth)acrylate, tert-butyl (meth)acrylate, amyl (meth)acrylate, @pentyl (meth)acrylate , isoamyl (meth)acrylate, hexyl (meth)acrylate, heptyl (meth)acrylate, octyl (meth)acrylate, isooctyl (meth)acrylate, 2-(meth)acrylate Ethylhexyl ester, decyl (meth)acrylate, decyl (meth)acrylate, isodecyl (meth)acrylate, undecyl (meth)acrylate, dodecyl (meth)acrylate, (meth)acrylic acid alkyl esters such as lauryl (meth)acrylate, stearyl (meth)acrylate, isostearyl (meth)acrylate; hydroxyethyl (meth)acrylate, (methyl) Hydroxypropyl acrylate-20- 201027140, hydroxyl group (meth) acrylate (meth)acrylic acid hydroxyalkyl esters such as esters; phenoxyethyl (meth)acrylate; 2-hydroxy-3-phenoxypropyl (meth)acrylate; Oxygen vinegar; methoxyethyl (meth)acrylate, ethoxyethyl (meth)acrylate, propoxyethyl (meth)acrylate, butoxyethyl (meth)acrylate, (A) alkoxyalkyl (meth)acrylates such as methoxybutyl (meth)acrylate; polyethylene glycol mono(meth)acrylate, ethoxydiethylene glycol (meth)acrylate Polyethylene glycol such as methoxypolyethylene glycol (meth) acrylate, phenoxy polyethylene glycol (meth) acrylate, nonyl phenoxy polyethylene glycol (meth) acrylate (Meth)acrylates; polypropylene glycol mono(meth)acrylate, methoxypolypropylene glycol (meth)acrylate, ethoxypolypropylene glycol (meth)acrylate, nonylphenoxypolypropylene glycol ( Polypropylene glycol (methyl) φ acrylate such as methyl acrylate; cyclohexyl (meth) acrylate, (A) ) 4-butylcyclohexyl acrylate, dicyclopentanyl (meth) acrylate, dicyclopentyloxy (meth) acrylate, dicyclopentenyl (meth) acrylate, (meth) acrylate Cyclopentenyloxyethyl ester, dicyclopentadienyl (meth)acrylate, borneol (meth)acrylate, isobornyl (meth)acrylate, tricyclodecyl (meth)acrylate, etc. Base) Cycloalkyl acrylates, benzyl (meth) acrylate, tetrahydrofurfuryl (meth) acrylate, and the like. These monofunctional (meth) acrylate compounds may be used alone, -21 - 201027140 or may be used in combination of two or more. Further, specific examples of the polyfunctional (meth) acrylate compound are exemplified by ethylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, and tetraethylene glycol di(meth)acrylic acid. Ester, polyethylene glycol di(meth)acrylate, 1,4-butanediol di(meth)acrylate, n,6-hexanediol di(meth)acrylate, neopentyl glycol di( Alkylene glycol di(meth)acrylates such as methyl)acrylate; trimethylolpropane tri(meth)acrylate, trimethylolpropane trihydroxyethyl tri(meth)acrylate, Di-trimethylolpropane tetra(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol hexa(meth)acrylate, hydroxypivalic acid neopentyl Poly(meth)acrylates of polyvalent alcohols such as alcohol di(meth)acrylate; isocyanurate tri(meth)acrylate, gin(2-hydroxyethyl)isourea cyanide (meth) acrylate, ginseng (2-hydroxyethyl) isocyanurate tris(meth)acrylic acid Poly(meth) acrylates of iso-ureidocyanate: poly(meth) acrylates of cycloalkanes such as tricyclodecyl dimethyl di(meth) acrylate; bisphenol A Di(meth)acrylate of ethylene oxide adduct, bis(meth)acrylate of propylene oxide adduct of bisphenol A, and alkylene oxide adduct of bisphenol A Di(meth) acrylate of ethylene oxide adduct of acrylate, hydrogenated bisphenol A, bis(meth) acrylate of hydrogenated bisphenol A propylene oxide adduct, hydrogenated bisphenol A Alkylene oxide plus -22- 201027140 bis(meth) acrylate, bisphenol A bis bis diglycidyl ether and (meth) acrylate (meth) acrylate derivatives; 3,3,4,4,5,5,6,6-octafluorooctane di(meth)acrylate, 3-(2-perfluorohexyl)ethoxy -1,2-di(methyl)propyl sulfhydryl propylate, N-n-propyl-N-2,3-di(methyl)propyl succinylpropyl perfluorooctyl sulfonamide, etc. Fluorine (meth) acrylate; having the following bisphenol structure a urethane (meth) acrylate obtained by reacting a polymer (a) with an organic polyisocyanate (b) and a hydroxyl group-containing (meth) acrylate (c); (a) having a bisphenol structure The polyhydric alcohol is exemplified by an alkylene oxide addition diol of bisphenol A, an alkylene oxide addition diol of bisphenol F, an alkylene oxide addition diol of hydrogenated bisphenol A, and hydrogenation. A diol in which an alkylene oxide of bisphenol F is added. Among these, a glycol which is added with an alkylene oxide of bisphenol A is preferred. As such commercial products, for example, DA-400, DB-400, etc. manufactured by Nippon Oil Co., Ltd. are mentioned. (I)) As for the organic polyisocyanate, a diisocyanate is preferred, for example, 2,4-toluene diisocyanate, 2,6-toluene diisocyanate, oxime, 3-xylene diisocyanate, oxime, 4-xylene diisocyanate , 1&gt;5_naphthalene diisocyanate, m-phenylene diisocyanate, p-phenylene diisocyanate, 3,3,-dimethyl-4,4'-phenylmethane diisocyanate, 4,4, diphenylmethane Diisocyanate, 3,3'-dimethylphenyl diisocyanate, 4,4, biphenyl diisocyanate, and the like. The best of these are 2,4-toluene diisocyanate, 2,6-toluene diisocyanate, 1,3-xylene diisocyanate, i,4-xylene diisocyanate. -23- 201027140 (C) As for the (meth) acrylate containing a hydroxyl group, 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, and 2-(meth)acrylic acid can be exemplified. Hydroxybutyl ester, 2-hydroxy-3-phenoxypropyl (meth)acrylate, I,4-butanediol mono(meth)acrylate, 2-hydroxyalkyl (meth) acryloylphosphonate, 4-hydroxycyclohexyl (meth)acrylate, 1,6-hexanediol mono(meth)acrylate, neopentyl glycol mono(meth)acrylate, trimethylolpropane (meth)acrylate , trimethylolethane di(meth)acrylate, pentaerythritol tri(meth)acrylate, @dipentaerythritol penta(meth)acrylate, and the like. Among these, 2-hydroxyethyl (meth)acrylate and 2-hydroxypropyl (meth)acrylate are preferable. These polyfunctional (meth) acrylate compounds may be used singly or in combination of two or more. Among these polyfunctional (meth) acrylate compounds, propylene fluorene contained in one molecule such as dipentaerythritol hexaacrylate, pentaerythritol tetraacrylate, pentaerythritol triacrylate, or trimethylolpropane triacrylate is preferable. A polyfunctional (meth) acrylate compound having a large number of bases and an increase in crosslink density and imparting excellent hardness to the film. The transparent resin (A) is not particularly limited as long as it is transparent to the wavelength at which the polarizing diffractive element is used, but the light transmittance of the different wavelengths of the laser wavelength is 85% or more. Preferably, it is preferably 87% or more, preferably 89% or more. The transparent resin (A) preferably contains a thermoplastic resin such as triacetyl cellulose (TAC), PMMA, PS, PC, PES, PSU or a cyclic olefin resin, or an ultraviolet curable resin. Among them, the transparent tree -24- 201027140 is preferably a resin containing a cyclic olefin resin. When the transparent resin (A) is a cyclic olefin resin, it is preferred because of its excellent heat resistance, durability, and processability. The glass transition temperature (Tg) of the cyclic olefin resin as a heat distortion temperature index is usually 90 to 200 ° C, preferably 100 to 190 ° C, more preferably 1 10 to 180 ° C. When the Tg exceeds 10 °C or more, the polarizing diffractive element is preferred because it has excellent heat resistance. When the Tg is less than 90 ° C, the heat distortion temperature is low, and there is a problem of heat resistance. Further, φ also has a problem that the optical characteristics of the obtained film become large due to temperature. On the other hand, when the Tg exceeds 200 °C, the processing temperature is too high, so that when it is processed into a film shape, coloring may occur due to oxidative degradation, and the optical property may be lowered. The glass transition temperature (Tg) referred to herein is a differential scanning calorimetry curve obtained by using a differential scanning calorimeter (DSC) at a heating rate of 20 ° C / min in a nitrogen atmosphere. Maximum peak temperature (point A) and temperature 20 °C lower than the maximum peak temperature • (point B), the intersection of the wiring on the reference line with point B as the starting point and the wiring with point A as the starting point Got it. The transparent resin (E) is preferably the same tree as the transparent resin (A). The polarizing diffractive element of the present invention may further contain an antioxidant, a thermal stabilizer, a light stabilizer, and an ultraviolet absorber in any layer. Conventional additives such as antistatic agents, antifoaming agents, surfactants (release agents), and the like. The polarizing diffractive element of the present invention is an element obtained by a method for producing a polarizing diffractive element (a second aspect) which will be described later. The following -25- 201027140 describes a method of manufacturing a polarizing diffractive element. [Manufacturing Method of Polarizing Diffractive Element] The manufacturing method of the polarizing diffractive element of the present invention is roughly divided into three types. The first aspect of the manufacturing method of the polarizing diffractive element of the present invention is a polarized light having the following steps. Method for producing a sexual diffraction element: (1) forming a layer (B) having a sub-alignment energy on at least one side of a substrate (a) composed of a transparent resin (A), and obtaining a substrate (b) In the step (2), on the surface of the substrate (e) composed of the transparent resin (E), a concave portion and a convex portion formed of a composition containing the compound (D) are continuously formed by transfer. a pattern, a step of obtaining a substrate (f), and (3) having a layer (B) having a molecular alignment energy of the substrate (b) and a substrate (f) through a composition containing the compound (C) a step of laminating a face of a pattern, characterized in that the pattern portion composed of the composition comprising the compound (D) has optical homology and is derived from a composition comprising the compound (CG) Some have optical anisotropy. The second aspect of the method for producing a polarizing diffractive element of the present invention is a method for producing a polarizing diffractive element having the following steps: (I) at least a substrate (a) composed of a transparent resin (A) a layer (B) having a molecular alignment energy is formed on one side to obtain a substrate (b), and (II) is formed on the layer (B) of the substrate (b) by transfer to form a compound containing a compound ( a pattern of the concave portion and the convex portion formed by the composition of C), a step of obtaining the substrate (c), and (III) coating the surface of the substrate (c) having the type of the pattern -26-201027140 a composition of the compound (D), wherein the concave portion is at least filled with the compound (D), and a step of obtaining a substrate having a filling portion, wherein the portion derived from the convex portion has optical anisotropy is derived from Portions of the aforementioned entangled portion have optical anisotropy. The third aspect of the method for producing a polarizing diffractive element of the present invention is a method for producing a polarizing diffractive element having the following steps: (i) a substrate (a') composed of a transparent resin (A) At least on the surface, a pattern in which the concave portion and the convex portion composed of the composition containing the compound (C) are continuously formed by using a φ-print, and the substrate (b) is obtained, and (ϋ) The composition containing the compound (D) is applied onto the surface of the substrate (b) having a pattern, and the concave portion is filled with at least the compound (D) to obtain a substrate (c) having a filling portion. a step characterized in that the surface on which the pattern of the substrate (a') is formed has a molecular alignment energy, and a portion derived from the convex portion has an optical anisotropy, and a portion derived from the aforementioned portion has an optical orientation Sex. In the manufacturing method of the polarizing diffractive element of the present invention, the polarizing diffractive element described in the above item [Polarizing diffractive element] can be manufactured in the first state and the second state. Further, in the method for producing a polarizing diffractive element of the present invention, in a third mode, a polarization winding of a structure different from that of the polarizing diffractive element described in the above [Polarizing Diffractive Element] can be obtained. Shooting components. Specifically, in the first state, the layer formed by continuously forming the pattern of the concave portion and the convex portion composed of the composition containing the compound (D) and the layer derived from the composition containing the compound (C) are respectively equivalent. The layer (LD) and layer (LC) of the polarizing diffractive element described in the above section [Polarizing diffractive element]. -27-201027140 'In the second state, the layer and the filling portion derived from the pattern of the concave portion and the convex portion which are formed by the composition containing the compound (C) are respectively equivalent to the aforementioned [polarizing diffraction] The layer (LC) and layer (LD) of the polarizing diffractive element described in the section [Element]. Further, (1) a layer (B) having a molecular alignment energy is formed on at least one side of the substrate (a) composed of the transparent resin (A), and the step of obtaining the substrate (b) is also referred to as a step (1). (2) a pattern in which a concave portion and a convex portion which are formed by continuously forming a composition containing the compound (D) by transfer on one surface of the substrate (e) composed of the transparent resin (E) Type, obtaining a substrate (the step of 〇 is called (2) step, (3) passing the composition containing the compound (C) to make the layer (B) having the molecular aligning energy of the substrate (b) and the substrate (f) The step of laminating the pattern with respect to the surface layer is referred to as step (3). Further, (the layer formed of the transparent resin (A) (the layer having the molecular alignment energy is formed on at least one side of the crucible ( B), the step of obtaining the substrate (b) is also referred to as the step (I), and (II) is formed on the layer (B) of the substrate (b) by continuous transfer to form the compound (C) The pattern of the concave portion and the convex portion formed by the composition, the step of obtaining the substrate (c) is referred to as a (Π) step, and (III) the pattern of the substrate (c) is The composition containing the compound (D) is coated on the surface, and the concave portion is at least filled with the compound (D), and the step of obtaining the substrate (d) having the filling portion is referred to as a (ΙΠ) step, and (i) On at least one surface of the base material (a') composed of the transparent resin (A), a pattern in which a concave portion and a convex portion composed of the composition containing the compound (C) are continuously formed by transfer is obtained. -28- 201027140 The step of obtaining the substrate (b) is referred to as the step (i), and the composition containing the compound (D) is applied onto the surface of the substrate (b) having the pattern, The recess is filled with at least the compound (D), and the step of obtaining the substrate (c) having the splicing portion is referred to as step (ii). [Comparative state] The method for producing the polarizing diffractive element of the present invention The same state has 0. The following steps (1) to (3) 'the pattern portion composed of the composition containing the compound (d) described above has optical homology and is derived from the composition containing the aforementioned compound (C) The portion has optical anisotropy. <1) Step> The manufacturing method of the polarizing diffractive element of the first aspect of the present invention The step (1) is a step of forming a layer (B) having a molecular alignment energy on at least one side of a substrate (a) composed of a transparent resin (A) to obtain a base φ material (b). The substrate (b) obtained in the step (1) of the present invention is a laminate of the substrate (a) and the layer (B) having at least one layer formed on the substrate (a). The transparent resin (A) in the method for producing a diffraction element can be used without any particular limitation as long as it is transparent to the wavelength of the polarizing diffractive element obtained by the production method of the present invention. As the resin (A), the transparent resin described in the above [Polarizing Diffractive Element] is preferably used. -29- 201027140 Further, a transparent resin (A) is usually made of a thermoplastic resin, but an ultraviolet curable resin having a suitable modulation structure can also be used. As the ultraviolet curable resin, for example, an ultraviolet curable (meth)acrylic resin exemplified as the compound (D) can be used. (substrate (a))

第一樣態之偏光性繞射元件之製造方法中之基材（a )係由前述透明樹脂（A )所構成。 H 前述基材（a)可爲薄片之型態，亦可於長度方向具 有長條之型態。爲於長度方向具有長條型態之所謂輥形狀 時，就連續生產性之觀點而言更好，但亦較好在作成輥形 狀後進行裁斷成爲薄片之型態。又，基材（a)由於爲由 前述透明樹脂（A)所構成之基材，因此相較於玻璃基板 或結晶基板較柔軟，可輕易的成爲輥形狀故而較佳，又由 於可容易地以沖壓等加工成爲期望之形狀故而較佳。 至於基材（a)，就連續生產性之觀點而言以輥形狀 Θ 之基材較佳，更好爲於長度方向至少3 m以上連續之輥形狀 之基材，最好爲於長度方向至少5 0m以上連續之輥形狀之 基材。長度之上限鑒於工業上之操作性，較好爲3 000m以 下，更好在2000m以下。比3000m長時，輥直徑或輥重量 增加使製造時所用之裝置大型化，故而在實際生產上變得 沒有效率而不佳。 基材（a)爲輥形狀時，基材（a)之寬度並無特別限 制，但若鑑於工業之操作性，較好爲3 00~2200mm，更好 -30- 201027140 爲500-1 500 mm。寬度比300mm窄時，就經濟生產性之觀 點而言較不佳，寬度寬過2200mm時由於製造時使用之裝 置需大型化，因此在實際生產上變得沒有效率而不佳。另 外，基材（a)之厚度只要可維持作爲光學零件之型態則 無特別限制，但成爲輥形狀之情況下較好爲10〜500μπι，更 好爲50〜300μιη，最好爲80〜200μιη。厚度小於30μιη時作爲 基材之剛性弱故而不佳，厚度超過300μπι時，除了難以成 0 爲輥之形狀以外，由於成爲輥形狀時之卷長度縮短，使連 續生產性降低故而不佳。又厚度超過3 ΟΟμπι時，就進行沖 壓等加工時會產生毛邊、容易產生龜裂之觀點而言亦不佳 使基材（a)成爲薄片時，鑒於工業之操作性，寬度 及長度較好設爲3〜100 cm，更好爲5〜80 cm。再者，寬及長 並無必要爲一致，只要設定成適宜加工之大小即可。例如 ，在擁有A4大小之薄片型態時成爲21 cmx30cm之大小。於 φ 薄片之情況下，寬度與長度未達3cm時，由於缺乏工業生 產性故而不佳，於寬度與長度超過100cm時，裝置大型化 而欠缺加工性，反而缺乏生產性故而不佳。 (層（B )之形成） (I)步驟中係在前述基材（a)之至少一面上形成具 有分子配向能之層（B)。 又’所謂具有分子配性能之層（B)通常爲由包含選 自（甲基）丙烯酸系化合物、聚醯亞胺、聚乙烯醇及聚胺 -31 - 201027140 基甲酸醋之至少一種之組成物’或由包含具有以下式（1 )表示之構造之聚合物之組成物所構成： 【化3】 -r1—CH=CH——Z1——Ar1 (ι) [式（I)中，R1 表示-c(0)0-、-CONH-、-CO-E-、未取代 或具有選自鹵基、氰基及硝基之基之I，4·伸苯基、或吡啶-2,5-二基、嘧啶-2,5-二基、2,5-噻吩二基、2,5-伸呋喃基、 1,4-伸萘基、或2,6-伸萘基， E表示未取代或具有選自鹵基、氰基及硝基之基之 1，4-伸苯基、或吡啶-2,5-二基、嘧啶-2,5-二基、2,5-噻吩 二基、2,5 -伸呋喃基、1,4-伸萘基、或2,6 -伸萘基， Z1表示單鍵、未取代或具有選自鹵基、氰基及硝基之 基之I，4·伸苯基、或吡啶-2,5 -二基、嘧啶-2,5 -二基、2,5-噻吩二基、2,5-伸呋喃基、反式-1，4-伸環己基、反式-1，3-二噁烷-2,5-二基或1，4-哌啶基，The substrate (a) in the method for producing a polarizing diffractive element of the first aspect is composed of the transparent resin (A). H The aforementioned substrate (a) may be in the form of a sheet or may have a long strip shape in the longitudinal direction. In the case of a so-called roll shape having a long strip shape in the longitudinal direction, it is more preferable from the viewpoint of continuous productivity, but it is also preferable to form a sheet shape after being formed into a roll shape. Further, since the base material (a) is a base material composed of the transparent resin (A), it is softer than the glass substrate or the crystal substrate, and can be easily formed into a roll shape, and is easily formed. It is preferred that the processing such as stamping becomes a desired shape. The substrate (a) is preferably a substrate having a roll shape in terms of continuous productivity, and more preferably a substrate having a continuous roll shape of at least 3 m in the longitudinal direction, preferably at least in the longitudinal direction. A continuous roll shape substrate of more than 50 m. The upper limit of the length is preferably 3,000 m or less, more preferably 2,000 m or less, in view of industrial operability. When it is longer than 3000 m, the increase in the roll diameter or the weight of the roll increases the size of the apparatus used in the production, and thus it becomes inefficient in actual production. When the base material (a) is in the form of a roll, the width of the base material (a) is not particularly limited, but in view of industrial workability, it is preferably from 300 to 2200 mm, more preferably from -30 to 201027140, from 500 to 1 500 mm. . When the width is narrower than 300 mm, it is less advantageous in terms of economic productivity. When the width is wider than 2,200 mm, the size of the device used in manufacturing is required to be large, so that it is inefficient in actual production. Further, the thickness of the substrate (a) is not particularly limited as long as it can maintain the shape of the optical member, but in the case of a roll shape, it is preferably 10 to 500 μm, more preferably 50 to 300 μm, and most preferably 80 to 200 μm. . When the thickness is less than 30 μm, the rigidity of the substrate is not so good, and when the thickness exceeds 300 μm, it is difficult to form a roll shape, and the roll length in the roll shape is shortened, which makes the continuous productivity lower. When the thickness is more than 3 ΟΟμπι, it is not preferable from the viewpoint of occurrence of cracks when punching or the like is formed, and when the substrate (a) is formed into a sheet, the width and length are preferably set in view of industrial operability. It is 3 to 100 cm, more preferably 5 to 80 cm. Furthermore, the width and length are not necessarily the same, as long as they are set to a suitable size. For example, it has a size of 21 cm x 30 cm when it has a sheet shape of A4 size. In the case of φ sheet, when the width and length are less than 3 cm, it is not preferable because of lack of industrial productivity. When the width and length exceed 100 cm, the apparatus is large in size and lacks workability, and it is not preferable because it lacks productivity. (Formation of Layer (B)) In the step (I), a layer (B) having a molecular alignment energy is formed on at least one side of the substrate (a). Further, the layer (B) having a molecular compounding property is usually composed of at least one selected from the group consisting of a (meth)acrylic compound, a polyimine, a polyvinyl alcohol, and a polyamine-31 - 201027140 carboxylic acid vinegar. 'Or consisting of a composition comprising a polymer having the structure represented by the following formula (1): [Chem. 3] -r1 - CH=CH - Z1 - Ar1 (ι) [In the formula (I), R1 represents -c(0)0-, -CONH-, -CO-E-, unsubstituted or having a group selected from a halogen group, a cyano group and a nitro group, a phenyl group, or a pyridine-2,5- Diyl, pyrimidine-2,5-diyl, 2,5-thiophenediyl, 2,5-extended furyl, 1,4-naphthyl, or 2,6-anthranyl, E means unsubstituted or 1,4-phenylene group having a group selected from a halogen group, a cyano group and a nitro group, or a pyridine-2,5-diyl group, a pyrimidine-2,5-diyl group, a 2,5-thiophenediyl group, 2 , 5-furanyl, 1,4-naphthyl, or 2,6-naphthyl, and Z1 represents a single bond, unsubstituted or having a group selected from a halogen group, a cyano group, and a nitro group. Phenyl, or pyridine-2,5-diyl, pyrimidine-2,5-diyl, 2,5-thiophenediyl, 2,5-extended furyl, trans-1,4-cyclohexylene, Trans-1,3- Dioxane-2,5-diyl or 1,4-piperidyl,

Ar1表示具有芳香族環之一價基]。 前述（甲基）丙烯酸系化合物、聚醯亞胺、聚乙烯醇 及聚胺基甲酸酯較好使用前述[偏光性繞射元件]之項中所 述者。 又’包含選自（甲基）丙烯酸系化合物、聚醯亞胺、 聚乙烯醇及聚胺基甲酸酯之至少一種之組成物中所含其他 成分’在不損及目的物性之範圍內，就提高對基材（a) -32- 201027140 表面之接著性之觀點而言，亦可含有含官能性矽烷之化合 物、環氧化合物等。 包含具有以前述式（I)表示之構造之聚合物之組成 物中所含之具有以前述式（I)表示之構造之聚合物，較 好使用前述[偏光性繞射元件]之項中所述者。 又，包含具有以式（I)表示之構造之聚合物之組成 物中所含之其他成分，在不損及目的物性之範圍內，就提 φ 高對基材（a)表面之接著性之觀點而言，亦可含有含官 能性矽烷之化合物、環氧化合物等。 具有分子配向能之層（B)之厚度較好爲1〜5000nm， 更好爲5~500nm，最好爲10〜200nme 具有分配向能之層（B)亦可藉由摩擦處理賦予分子 配向能。具體而言具有分子配向能之層（B)爲由包含選 自（甲基）丙烯酸系化合物、聚醢亞胺、聚乙烯醇及聚胺 基甲酸酯之至少一種之組成物所組成時，較好利用摩擦處 φ 理賦予分子配向能。 摩擦處理可以習知之方铸進行，舉例爲例如將包含選 自（甲基）丙烯酸系化合物、聚醯亞胺、聚乙烯醇及聚胺 基甲酸酯之至少一種之組成物塗佈於基材（a)上，於基 材（a)上形成塗佈膜，且將棉或縲縈等摩擦布捲在金屬 製輥之表面上，一邊使該輥旋轉，一邊與前述塗佈膜之表 面接觸，形成具有分子配向能之層（B)之處理。摩擦處 理之處理條件並無特別限制，但輥之轉數較好爲 100〜2000rpm，更好爲 200〜1 500 rpm，最好爲 300〜900rpm -33- 201027140 。形成塗佈膜之基材（a)之輸送速度較好爲1〜50m/分鐘 ，更好爲3〜30m /分鐘，輥之壓入量較好爲0.1〜〇.5mm，更 好爲 0.2~0.4mm。 以上述處理條件進行時，可適當地形成具有分子配性 能之層（B)，以於前述塗佈膜之全面進行均勻的摩擦處 理。摩擦處理之方向係由摩擦輥之旋轉軸方向與薄膜（形 成塗佈膜之基材（a))之長度方向所成之角度加以決定 ，但只要摩擦輥可涵蓋薄膜全部寬度之範圍則無特別限制 © 。摩擦方向亦可設定成期望之方向並實施摩擦處理，以決 定液晶分子之配向方向。 又，前述摩擦處理通常會伴隨著產生異物。該等係源 自摩擦布之纖維脫落者、供於摩擦之薄膜表面之材質經削 減脫落者、或由於產生之靜電使周圍之環境異物附著者。 因此，有必要去除該等異物，且較好將異物吹掉並吸取， 並經洗淨。其中，較好使用水洗淨。尤其，由藉由塗佈包 含聚醯亞胺之組成物形成之塗佈膜所形成之層（B)對於 © 源自聚醯亞胺之構造之水之耐性高，即使進行水洗亦不損 及摩擦效果而可使後述之光學異向性材料配向故而較佳。 另外，由藉由塗佈包含選自聚乙烯醇、聚胺基甲酸酯之至 少一種之組成物形成之塗佈膜所形成之層（B)，若進行 水洗時，由於聚乙烯醇及聚胺基甲酸酯對水之耐性低，而 無法使後述之光學異向性材料配向，故而若進行水洗則較 不佳。又，當使用具有交聯構造之改質聚乙烯醇作爲聚乙 烯醇時，或使用使具有交聯構造之聚醚多元醇與聚異氰酸 -34- 201027140 酯反應而成之聚合物等之改質具胺基甲酸酯作爲聚胺基甲 酸酯時’由於藉由交聯構造而展現對水之耐性，因此由藉 由塗佈包含聚乙烯醇及聚胺基甲酸酯之組成物形成之塗佈 膜所形成之層（B)即使進行水洗，亦不損及摩擦效果， 而可使後述之光學異向性材料配向。 前述具有分子配向能之層（B)爲由包含具有以上式 (I)表示之構造之聚合物之組成物所構成時，較好藉由 φ 放射線之照射而賦予分子配向能。 放射線之照射可由習知方法進行，例如將包含具有以 上式（I)表示之構造之聚合物之組成物塗佈於基材（a) 上，於基材（a)上形成塗佈膜，對該塗佈膜照射直線偏 光或部分偏光之放射線或無偏光之放射線，依據其況進而 在150~250°C之溫度進行加熱處理，賦予塗佈膜配向能， 藉此可形成具有分子配向能之層（B)。至於放射線，可 使用具有波長150nm〜800nm之紫外線及可見光，較好爲具 φ 有波長3 20nm〜450nm之紫外線。 又，第一樣態之偏光性繞射元件之製造方法中，亦可 於步驟（I)中形成層（B)時進行延伸處理。 具體而言，將包含選自前述（甲基）丙烯酸系化合物 、聚醯亞胺、聚乙烯醇及聚胺基甲酸酯之至少一種之組成 物，或包含具有以下式（I)表示之構造之聚合物之組成 物塗佈於前述基材（a)之至少一面上之後，藉由將前述 基材（a)及藉塗佈形成之塗佈膜經延伸處理，可在基材 (a)上形成具有分子配向能之層（B)，獲得基材（b) -35- 201027140 對前述基材（a)及藉塗佈形成之塗佈膜進行延伸處 理時，通常係以加熱延伸處理進行。加熱延伸相較於摩擦 處理，異物等之產生較少，且可以良好之良率生產故而較 佳。 使前述基材（a)與藉塗佈形成之塗佈膜延伸之方法 較好爲（1)在加熱下對前述基材（a)及藉塗佈形成之塗 佈膜於長度方向軸延伸之方法（以下亦稱爲（1’）之方法 @ )，（2)在加熱下，對前述基材（a)及藉塗佈形成之塗 佈膜於寬度方向單軸延伸之方法（以下亦稱爲（2’）之方 法）。 使前述基材（a)與藉塗佈形成之塗佈膜延伸時，延 伸時之加熱溫度較好在前述基材（a)與藉塗佈形成之塗 佈膜之延伸部位全體中進行精確控制。 以上述（1’）之方法使前述基材（a)與藉塗佈形成 之塗佈膜延伸時，藉由使前述基材（a)與藉塗佈形成之 ® 塗佈膜於長度方向單軸延伸，獲得基材（b)。例如，上 述（1’）之方法中之長度方向之單軸延伸，亦即縱向單軸 延伸較好在溫度分佈經控制在設定溫度±〇.6°C以內，較好 在設定溫度±〇.4°C以內，更好在設定溫度±〇.2°C以內之烤 箱中進行。 本文中，設定溫度可爲烤箱中之全部區域中相等之溫 度，亦可爲階段性的或梯度分佈之溫度。設定溫度爲設定 分佈之溫度時，烤箱中之實際溫度分佈與所設定之溫度分 -36- 201027140 佈以±0.6°C以內，較好±0.4°C以內，更好±〇.2°C以內較適宜 〇 長度方向單軸延伸之設定溫度只要依據前述基材（a )及藉塗佈形成之塗佈膜之原料種類、延伸倍率及延伸速 度、前述基材（a)及藉塗佈形成之塗佈膜之厚度、延伸 後之光學異向性材料之期望相位差等設定即可，而無特別 限制，但例如，以基材（a )之玻璃轉移溫度（Tg )爲基 φ 準，在（Tg + o ) °c至（Tg + 3 0 ) °C之範圍。在該等溫度範 圍，不會引起前述基材（a)與藉塗佈形成之塗佈膜之熱 劣化，且可不斷裂地加以延伸故而較佳。 上述（1’）之方法中，長度方向單軸延伸之延伸倍率 爲例如1.1~2.5倍，較好爲1.1〜2.0倍，最好爲1.2〜1.5倍之 範圍。延伸倍率未達1.1倍時，由於無法良好地均勻展現 前述化合物（C)之配向故而不佳，延伸倍率超過2.5倍時 ，由於加工時會出現基材產生破斷等之缺陷故而不佳。 φ 另外，上述（1’）之方法中之長度方向單軸延伸之延 伸速度爲例如2〜100m/分鐘，較好爲5〜50m/分鐘之範圍。 以上述（2’）之方法使前述基材（a)及藉塗佈形成 之塗佈膜延伸時，藉由使前述基材（a)及藉塗佈形成之 塗佈膜於寬度方向單軸延伸，獲得基材（b)。 藉由在比長度方向之單軸延伸更爲精密地溫度控制下 進行該寬度方向之單軸延伸，亦即橫向單軸延伸，可適當 地獲得全面均勻之偏光性繞射元件。例如，寬度方向之單 軸延伸以在溫度分佈控制在設定溫度±〇· 5 °C以內，較好在 -37- 201027140 設定溫度±0_3°C以內’更好在設定溫度±0.2°c以內之烤箱 中進行較適宜。 本文中’寬度方向單軸延伸之設定溫度係與長度方向 單軸延伸之情況相同’可爲烤箱中之全部區域中相等之溫 度，亦可爲階段性的或梯度分佈之溫度。設定溫度爲設定 分佈之溫度時，烤箱中之實際溫度分佈與設定之溫度分佈 宜在±0_5°C以內，較好在±〇.3°C以內，更好在=t〇.2°C以內。 該寬度方向單軸延伸之設定溫度可與長度方向單軸延伸之 n 步驟中之設定溫度相同，亦可不同。 寬度方向單軸延伸之設定溫度與長度方向單軸延伸之 情況相同，並無特別限制，例如以基材（a )之玻璃轉移 溫度（Tg )爲基準，爲（Tg + 0 ) °C至（Tg + 30 ) °C之範圍 ο 寬度方向單軸延伸之延伸倍率可依據製造之偏光性繞 射元件所期望之特性決定，但以上述（2 ’）之方法製造時 ，爲例如1.5〜5倍，較好爲1.7~4倍，最好爲2〜3.5倍之範圍 β 。延伸倍率成爲未達1·5倍時，由於無法良好地均勻展現 前述化合物（C)之配向故而不佳，延伸倍率超過5倍時， 由於加工時會出現基材產生破斷等之缺陷故而不佳。 上述寬度方向單軸延伸之延伸速度爲例如2〜100m/分 鐘’較好爲5~50m/分鐘之範圍。 &lt; (2)步驟&gt; 本發明之第一樣態之偏光性繞射元件之製造方法所具 -38- 201027140 有之（2)步驟爲（2)在由透明樹脂（E)所構 (e )之一面上，利用轉印而形成連續形成有由 物（D)之組成物所構成之凹部與凸部之圖型， (f)之步驟。又’利用第一樣態之製造方法獲 性繞射元件中，源自連續形成有由包含前述化名 之組成物所構成之凹部與凸部而成之圖型之層相 之[偏光性繞射元件]之項中所述之偏光性繞射元 ⑩ ld)。 以該步驟獲得之基材（f)爲在由透明樹脂 成之基材（e)上具有連續形成有由含有化合物 成物所構成之凹部與凸部之圖型之基材。基材 式圖示於圖5(a)。 至於（2)步驟中所用之透明樹脂（E)，可 之透明樹脂（A )中例示之樹脂，且較好透明榻 與透明樹脂（E)爲相同之樹脂。又，基材（e) φ 基材（a)中例示之基材。 (圖型之形成方法） (2 )步驟中，係在基材（e )之單面上利用 連續形成有由包含化合物（D)之組成物所構成 凸部之圖型，獲得基材（f)。 又（2)步驟中，通常連續形成有凹部與凸 係在前述基材（e)上，轉印由包含化合物（D) 形成之塗膜而形成。 ;成之基材 含有化合 獲得基材 得之偏光 含物（D ) 丨當於前述 件之層（ (E )所構 (D)之組 (f)之模 使用前述 Ϊ 脂（A ) 可使用與 轉印形成 之凹部與 部之圖型 之組成物 -39- 201027140 於前述基材（e)上利用轉印形成連續形成有由包含 化合物（D)之組成物所構成之凹部與凸部之圖型之方法 舉例爲例如在則述基材（e )上塗佈包含化合物（d )之組 成物，在由包含該化合物（D)之組成物形成之塗膜上轉 印連續形成有凹部與凸部之圖型之方法（以下稱爲轉印法 A，）。 轉印法A’係先在前述基材（e)上塗佈包含化合物（d )之組成物，且依據需要進行加熱等之處理並經乾燥，獲 得包含化合物（D)之塗膜。此時，塗佈之方法可無限制 的採用習知之塗佈方法。具體之塗佈方法舉例爲例如旋轉 塗佈法、模唇塗佈法、柯瑪（Comma)塗佈法、輥塗佈法 、模嘴塗佈法、摻塗法、浸漬塗佈法、棒塗佈法、流延成 膜法、凹版塗佈法、印刷法等。其中，就厚度精準度及量 產性之觀點而言，較好使用科瑪塗佈法或凹版塗佈法。 〇 包含化合物（D)之塗膜之厚度只要可賦予期望之圖 型則無特別限制，但爲了確保厚度精準度，較好爲1~30μιη ，更好爲1〜20μηι，最好爲1~15μιη。圖型之凹部深度依使 用之雷射波長或使用之材料種類而有不同之設計，但通常 爲1〜ΙΟμιη之範圍。據此，將塗佈材料之厚度控制在前述之 範圍內，一方面確保厚度之精準度，另一方面可在不使用 不必要之材料而經濟性優異的設計故而較佳。又，圖型之 凸部與凹部之寬度，於以L表示凸部之寬度/以S表示凹部 -40- 201027140 之寬度時，L/(L + S)之値較好爲0.4${L/(L + S) }S0.6 ，更好爲〇.45${L/(L+S) }$0.55。其中以L = S之情況， 亦即凸部之寬度與凹部之寬度一致之情況最佳。再者凸部 之寬度L以1μπι$Ι^10μηι較佳’更好爲1μιη$Ι^5μηι，最 好爲。凹部之寬度S亦以lpmSSSlOpm較佳 ，.更好爲，最好爲1μχη$8€3μιη。選擇該等 凸部之寬度L與凹部之寬度S時，由於可獲得期望之偏光繞 φ 射能故而較佳。 在由包含前述化合物（D)之組成物形成之塗膜上賦 予連續形成有凹部與凸部之圖型之方法，較好使用連續形 成有凹部與凸部之模具。至於連續形成有凹部與凸部之模 具之材質只要可製作期望之圖型則無特別限制，但較好使 用鎳等金屬製者或矽製造者，或者合成石英等透明者等。 另外，爲了賦與形狀且爲使與塗膜密著後之脫模良好，因 此亦較好在連續形成有凹部與凸部之模具表面上進行塗佈 〇 氟系或矽氧系之脫模劑等之脫模處理。連續形成有凹部與 凸部之模具形狀只要是平板狀或輥形狀等可製作期望圖型 則無特別限制，基材爲薄片之型態時，較好使用平板狀之 模具，基材爲輥之型態時較好使用平板狀或輥形狀之模具 〇 另外，使用模具等，於利用包含前述化合物（D)之 組成物形成之塗膜上，於賦予圖型之同時或於賦予後，較 好儘速使包含化合物（D)之組成物硬化。具體而言，使 用紫外線硬化型（甲基）丙烯酸酯樹脂作爲化合物（D ) -41 - 201027140 時’於賦予圖型之同時或在賦予後，較好儘速照射紫外線 使該樹脂硬化。發生紫外線之光源之例舉例爲金屬鹵素燈 或高壓水銀燈。另外，紫外線照射可在圖型之上面進行， 亦可透過基材（e)進行。連續形成圖型時，較好由前述 模具之相反側照射，亦即透過基材（e )對圖型照射紫外 線。 包含化合物（D)之組成物係使用具有光學異向性之 組成物。又，通常使用光學同向性材料作爲化合物（D) φ 〇 前述之光學同向性材料只要是具有光學同向性之樹脂 則無特別限制，但就連續且經濟性地生產偏光性繞射元件 之觀點而言，較好包含紫外線硬化型樹脂，就容易獲得透 明性或光學同向性之方面而言更好包含紫外線硬化型（甲 基）丙烯酸樹脂。至於紫外線硬化型（甲基）丙烯酸樹脂 較好使用前述之[偏光性繞射元件]之項中所述之紫外線硬 化型（甲基）丙烯酸樹脂。 @ 使用紫外線硬化型（甲基）丙烯酸樹脂作爲化合物（ D)時’包含化合物（D)之組成物較好含有光聚合起始 劑（光自由基產生劑）。該組成物中含有光聚合起始劑（ 光自由基產生劑）時，由於可適當地使紫外線硬化型（甲 基）丙烯酸樹脂聚合（硬化）故而較佳。 光聚合起始劑（光自由基產生劑）之具體例列舉爲1 -翔基環己基苯基酮、2，2，-二甲氧基_2_苯基苯乙酮、咕噸 酮、苐、苐酮、苯甲醛、蒽醌、三苯基胺、咔唑、3-甲基 -42- 201027140 苯乙酮、4-氯二苯甲酮、4,4，-二甲氧基二苯甲酮、4，4’-二 胺基二苯甲酮、米査（Michier)酮、苯甲醯基丙基醚、苯 甲醯基乙基醚、苄基二甲基縮酮、1-(4-異丙基苯基）-2-羥基-2-甲基丙-1-酮、2-羥基-2-甲基-1-苯基丙-1-酮、噻噸 酮、二乙基噻噸酮、2-異丙基噻噸酮、2-氯噻噸酮、2 -甲 基甲硫基）苯基]-2-嗎啉基丙-1-酮、2,4,6-三甲基 苯甲醯基二苯基氧化膦、2-苄基-2-二甲胺基-1- (4-嗎琳 φ 基苯基）丁 -1-酮、1-[4- (2-羥基乙氧基）-苯基]-2-羥基-2-甲基丙-1-酮等。該等光聚合起始劑（光自由基產生劑） 可單獨使用一種，或組合兩種以上使用。 該等光聚合起始劑（光自由基產生劑）中，以2-甲基-1-[4-(甲硫基）苯基]-2-嗎啉基丙-1-酮、2,4,6-三甲基苯 甲醯基二苯基氧化膦、1-羥基環己基苯基酮較佳。 另外，該等光聚合起始劑（光自由基產生劑）可使用 市售品。例如2-甲基-1-[4-(甲硫基）苯基]-2-嗎啉基丙-φ 1-酮可以Irgacure 907 (汽巴特用化學品（股）製造）購得 ，另外，1-羥基環己基苯基酮可以Irgacure 184 (汽巴特用 化學品（股）製造）購得。 光聚合起始劑（光自由基產生劑）之添加量只要是可 充分進行硬化反應之量則無特別限制，但相對於前述紫外 線硬化型（甲基）丙烯酸樹脂100重量份，通常以0.1〜20 重量份，較好以0.5〜10重量份較適宜。光聚合起始劑（光 自由基產生劑）之添加量未達上述下限時，前述紫外線硬 化型（甲基）丙烯酸樹脂之硬化反應無法充分進行，而有 -43- 201027140 無法獲得充分硬度之情況。又，光聚合起始劑（光自由基 產生劑）之添加量超過上述之上限時，有使紫外線硬化型 (甲基）丙烯酸樹脂之儲存安定性下降之情況。 藉由使用如上述包含化合物（D)之組成物，可獲得 基材（f)。又，藉由使用基材（f)，利用本發明之製造 方法獲得之偏光性繞射元件之由包含化合物（D )之組成 物所形成之圖型部份具有光學同向性。 ❿ &lt; (3 )步驟&gt; 本發明之第一樣態之偏光性繞射元件之製造方法所具 有之（3)步驟爲（3)透過含有化合物（C)之組成物使 前述基材（b)之具有分子配向能之層（B)與基材（f) 之具有圖型之面相對向地層合之步驟。 至於前述（3)步驟爲透過包含化合物（C)之組成物 使基材（b)與基材（f)層合在一起，但包含化合物（C )之組成物可塗佈於基材（b)之層（B)上，亦可塗佈於 ® 基材（f)之具有圖型之面上。 具體而言，可舉例爲前述（3)步驟係將包含化合物 (C)之組成物塗佈於前述基材（b)之層（B)上，使該 塗佈面與前述基材（f)之具有圖型之面相對向地層合在 一起之步驟之樣態，及前述（3)步驟係將包含化合物（C )之組成物塗佈於前述基材（f)之具有圖型之面上，使 該塗佈面與前述基材（b)之層（B)相對向地層合在一起 之步驟之樣態 -44- 201027140 又，利用第一樣態之製造方法獲得之偏光性繞射元件 中，源自包含化合物（C)之組成物之層相當於前述[偏光 性繞射元件]之項中所述之偏光性繞射元件之層（LC )。 藉由該步驟形成偏光性繞射元件。利用第一樣態之偏 光性繞射元种之製造法獲得之偏光性繞射元件之模式圖示 於圖6。又，基材（f)之構造示於圖5(a)，塗佈包含化 合物（C)之組成物之基材（b)之構造示於圖5(b)。 @ 至於化合物（C)及包含化合物（C)之組成物較好使 用前述之[偏光性繞射元件]之項中所述之化合物（C )及 包含化合物（C )之組成物。 前述（3)步驟爲將包含化合物（C)之組成物塗佈於 前述基材（b)之層（B)上，使該塗佈面與前述基材（f )之具有圖型之面相對向地層合之步驟時，如圖5所示， 塗佈有化合物（C)之面與基材（f)之具有圖型之面以相 對向之狀態層合。 φ 進行層合時可使用在兩根輥間夾合層合之方法，亦可 使用在支撐基盤上放置單方基材，邊重疊上另一方基材邊 以輥層合之方法。層合時之壓力通常在0.1〜2MPa之範圍內 適當選擇。壓力小於0.1 MPa時，由於咬入氣泡等而出現外 觀不良故而不佳，壓力超過2 MPa時會有使形成之凹凸遭破 壞之缺陷故而不佳。又，層合速度較好爲0.1〜3 Om/s，更 好爲0.3〜lOm/s。速度未達0.1時就生產性之觀點而言較不 佳，相反地速度大於3 Om/s時使結晶之配向紊亂而產生缺 陷故而不佳。而且，層合後較好使包含化合物（C)之組 -45- 201027140 成物儘速硬化（形成相當於前述層（LC)之層）。具體而 言，使用紫外線硬化型液晶作爲化合物（C)時，較好於 層合後儘速照射紫外線，使該樹脂硬化。發生紫外線之光 源之例舉例爲金屬鹵素燈或高壓水銀燈。另外，紫外線照 射可透過基材（e)進行，亦可透過基材（f)進行。 又，前述之透明樹脂（A)、包含選自（甲基）丙嫌 酸系化合物、聚醯亞胺、聚乙烯醇及聚胺基甲酸酯之至少 一種之組成物、包含具有以上式（I)表示之構造之聚合 參 物之組成物、包含化合物（C)之組成物、包含化合物（d )之組成物及透明樹脂（E)，可依據需要，在不損及發 明效果之範圍內添加抗氧化劑、熱安定劑、光安定劑、紫 外線吸收劑、抗靜電劑、消泡劑、界面活性劑（脫模劑） 等習知添加劑。 (第二樣態） 本發明之偏光性繞射元件之製造方法之第二樣態具有 © 後述（I)〜（III)之步驟，且其特徵爲源自凸部之部分具 有光學異向性’源自塡充部之部分具有光學同向性。 &lt; (I)步驟&gt; 本發明之第二樣態之偏光性繞射元件之製造法所具有 之（I)步驟爲（I)在由透明樹脂（A)所構成之基材（a )之至少一面上形成具有分子配向能之層（B)，獲得基 材（b)之步驟。前述步驟（I)可與前述之第一樣態之偏 -46- 201027140 光性繞射元件之製造方法之（1)步驟同樣進行。 另外’第二樣態之偏光性繞射元件之製造方法亦與前 述第一樣態同樣，可於步驟（I )中形成層（B )時進行延 伸處理。 &lt; (II)步驟&gt; 本發明之第二樣態之偏光性繞射元件之製造方法所具 〇 有之（II)步驟爲（II)在基材（b)之層（B)上，利用 轉印而形成連續形成有由含有化合物（C )之組成物所構 成之凹部與凸部之圖型，獲得基材（c)之步驟。 再者’利用第二樣態之製造方法獲得之偏光性繞射元 件中，源自連續形成有由包含前述化合物（C)之組成物 所構成之凹部與凸部之圖型之層相當於前述之[偏光性繞 射元件]之項中所述之偏光性繞射元件之層（LC )。 該步驟中獲得之基材（c)爲在層（B)上具有連續形 ® 成有由包含化合物（C)之組成物所構成之凹部與凸部之 圖型之基材。基材（c)之模式圖示於圖1。 (圖型之形成方法） (II )步驟中，利用轉印在基材（b )之層（B )上形 成連續形成有由包含化合物（C)之組成物所構成之凹部 與凸部之圖型’獲得基材（c) » 又（II)步驟中，通常連續形成有凹部與凸部之圖型 係在前述基材（b)上轉印於由包含化合物（C)之組成物 -47- 201027140 形成之塗膜上而形成。 利用轉印而於前述基材（b )之層（B )上形成連續形 成有由包含化合物（C)之組成物所構成之凹部與凸部之 圖型之方法舉例爲例如於前述基材（b)之層（B)上塗佈 包含化合物（C)之組成物，且於由包含該化合物（C)之 組成物形成之塗膜上轉印連續形成有凹部與凸部之圖型之 方法（以下稱爲轉印法A)。 ❿Ar1 represents a valence group having an aromatic ring]. The above (meth)acrylic compound, polyimine, polyvinyl alcohol and polyurethane are preferably used in the above-mentioned [polarizing diffraction element]. Further, 'the other component contained in the composition containing at least one selected from the group consisting of a (meth)acrylic compound, a polyimine, a polyvinyl alcohol, and a polyurethane) does not impair the target physical property, From the viewpoint of improving the adhesion to the surface of the substrate (a) -32 to 201027140, a compound containing a functional decane, an epoxy compound or the like may be contained. A polymer having a structure represented by the above formula (I) contained in a composition having a polymer represented by the above formula (I), preferably using the aforementioned [polarizing diffraction element] Narrator. Further, the other component contained in the composition having the polymer having the structure represented by the formula (I) improves the adhesion of the surface of the substrate (a) to the surface of the substrate (a) without impairing the physical properties of the object. From the viewpoint, a compound containing a functional decane, an epoxy compound, or the like may be contained. The layer (B) having a molecular alignment energy preferably has a thickness of from 1 to 5,000 nm, more preferably from 5 to 500 nm, most preferably from 10 to 200 nm, and has a layer which is assigned to energy (B) and can impart molecular aligning energy by rubbing treatment. . Specifically, the layer (B) having a molecular alignment energy is composed of a composition containing at least one selected from the group consisting of a (meth)acrylic compound, a polyimine, a polyvinyl alcohol, and a polyurethane. It is better to use the friction zone to impart molecular aligning energy. The rubbing treatment can be carried out by a conventional casting, for example, by coating a composition containing at least one selected from the group consisting of a (meth)acrylic compound, a polyimine, a polyvinyl alcohol, and a polyurethane to a substrate. (a) forming a coating film on the substrate (a), and winding a rubbing cloth such as cotton or crepe on the surface of the metal roll, and contacting the surface of the coating film while rotating the roll Forming a layer (B) having a molecular alignment energy. The treatment conditions for the rubbing treatment are not particularly limited, but the number of revolutions of the rolls is preferably from 100 to 2,000 rpm, more preferably from 200 to 1,500 rpm, most preferably from 300 to 900 rpm to 33 to 201027140. The conveying speed of the substrate (a) forming the coating film is preferably from 1 to 50 m/min, more preferably from 3 to 30 m/min, and the pressing amount of the roller is preferably from 0.1 to 〇5 mm, more preferably from 0.2 to 2. 0.4mm. When the treatment is carried out under the above-mentioned conditions, a layer (B) having a molecular compounding property can be suitably formed to uniformly perform a rubbing treatment on the entire coating film. The direction of the rubbing treatment is determined by the angle between the direction of the rotation axis of the rubbing roller and the length of the film (the substrate (a) forming the coating film), but there is no special as long as the rubbing roller covers the entire width of the film. Limit ©. The rubbing direction can also be set to a desired direction and a rubbing treatment can be performed to determine the alignment direction of the liquid crystal molecules. Moreover, the aforementioned rubbing treatment is usually accompanied by the generation of foreign matter. These materials originate from the fibers of the rubbing cloth, and the material of the surface of the film for rubbing is cut off, or the external environment is attached by the static electricity generated. Therefore, it is necessary to remove the foreign matter, and it is preferable to blow off the foreign matter and suck it, and wash it. Among them, it is preferred to use water to wash. In particular, the layer (B) formed by coating a coating film formed of a composition containing polyimine has high resistance to water derived from a polyimide-derived structure, and does not damage even if washed with water. The frictional effect is preferable because the optically anisotropic material described later can be aligned. Further, the layer (B) formed by coating a coating film comprising a composition selected from at least one selected from the group consisting of polyvinyl alcohol and polyurethane, if washed, is polyvinyl alcohol and poly The urethane has low resistance to water and cannot align the optically anisotropic material described later, so that it is less preferable if it is washed with water. Further, when a modified polyvinyl alcohol having a crosslinked structure is used as the polyvinyl alcohol, or a polymer obtained by reacting a polyether polyol having a crosslinked structure with a polyisocyanate-34-201027140 ester, or the like is used. When a modified urethane is used as a polyurethane, it exhibits water resistance by a crosslinked structure, and thus a composition comprising polyvinyl alcohol and a polyurethane is coated by coating The layer (B) formed by the formed coating film can be aligned with the optically anisotropic material described later without damaging the rubbing effect even if it is washed with water. When the layer (B) having the molecular alignment energy is composed of a composition containing a polymer having a structure represented by the above formula (I), it is preferred to impart molecular aligning energy by irradiation of φ radiation. Irradiation of the radiation can be carried out by a conventional method, for example, a composition comprising a polymer having the structure represented by the above formula (I) is applied onto the substrate (a), and a coating film is formed on the substrate (a). The coating film is irradiated with linearly polarized or partially polarized radiation or unpolarized radiation, and further heated at a temperature of 150 to 250 ° C according to the condition to impart a aligning energy to the coating film, thereby forming a molecular alignment energy. Layer (B). As the radiation, ultraviolet rays and visible light having a wavelength of 150 nm to 800 nm, preferably ultraviolet rays having a wavelength of 3 20 nm to 450 nm can be used. Further, in the method of manufacturing a polarizing diffractive element of the first aspect, the stretching treatment may be performed when the layer (B) is formed in the step (I). Specifically, a composition containing at least one selected from the group consisting of the above (meth)acrylic compound, polyimine, polyvinyl alcohol, and polyurethane, or a structure having the following formula (I) After the composition of the polymer is applied to at least one side of the substrate (a), the substrate (a) and the coating film formed by coating are subjected to elongation treatment to be used in the substrate (a). A layer (B) having a molecular alignment energy is formed thereon to obtain a substrate (b) -35 - 201027140. When the substrate (a) and the coating film formed by coating are subjected to elongation treatment, it is usually subjected to a heat extension treatment. . The heat extension phase is less generated by the friction treatment than the foreign matter, and can be produced at a good yield. The method of extending the substrate (a) and the coating film formed by coating is preferably (1) extending the axial direction of the substrate (a) and the coating film formed by coating under heating. Method (hereinafter also referred to as method (1')], (2) a method of uniaxially extending the substrate (a) and the coating film formed by coating in the width direction under heating (hereinafter also referred to as For the method of (2')). When the substrate (a) and the coating film formed by coating are extended, the heating temperature at the time of stretching is preferably precisely controlled in the entire extension of the substrate (a) and the coating film formed by coating. . When the substrate (a) and the coating film formed by coating are extended by the method of the above (1'), the coating film formed by the substrate (a) and the coating is formed in the longitudinal direction. The shaft is extended to obtain a substrate (b). For example, in the method of the above (1'), the uniaxial extension in the longitudinal direction, that is, the longitudinal uniaxial extension is preferably controlled within a set temperature of ± 〇 6 ° C, preferably at a set temperature ± 〇. Within 4 ° C, better in the oven within the set temperature ± 〇. 2 ° C. In this context, the set temperature can be equal to the temperature in all areas of the oven, or it can be a staged or gradient temperature. When the set temperature is set to the temperature of the distribution, the actual temperature distribution in the oven and the set temperature are -0.6-201027140 within ±0.6 °C, preferably within ±0.4 °C, preferably within ±2 °C. Preferably, the set temperature of the uniaxial extension in the longitudinal direction of the crucible is formed according to the substrate type (a) and the type of the raw material of the coating film formed by coating, the stretching ratio and the elongation speed, and the substrate (a) and the coating. The thickness of the coating film, the desired phase difference of the optically anisotropic material after stretching, and the like may be set without particular limitation, but for example, based on the glass transition temperature (Tg) of the substrate (a), (Tg + o ) °c to (Tg + 3 0 ) °C range. In these temperature ranges, it is preferred that the substrate (a) and the coating film formed by coating are not thermally deteriorated and can be extended without being broken. In the above method (1'), the stretching ratio in the longitudinal direction uniaxial stretching is, for example, 1.1 to 2.5 times, preferably 1.1 to 2.0 times, more preferably 1.2 to 1.5 times. When the stretching ratio is less than 1.1 times, the alignment of the compound (C) is not satisfactorily exhibited, and when the stretching ratio exceeds 2.5 times, it is not preferable because the substrate is broken during processing. Further, in the method of the above (1'), the elongation in the longitudinal direction of the uniaxial stretching is, for example, 2 to 100 m/min, preferably 5 to 50 m/min. When the substrate (a) and the coating film formed by coating are stretched by the method of the above (2'), the substrate (a) and the coating film formed by coating are uniaxial in the width direction. Extending to obtain the substrate (b). By performing uniaxial stretching in the width direction, i.e., lateral uniaxial stretching under more precise temperature control than the uniaxial extension in the longitudinal direction, a uniformly uniform polarizing diffractive element can be suitably obtained. For example, the uniaxial extension in the width direction is controlled within the set temperature ± 〇 · 5 ° C in the temperature distribution, preferably within the range of -37 - 201027140 ± 0_3 ° C 'better than the set temperature ± 0.2 ° c It is more suitable in the oven. Herein, the setting temperature of the uniaxial extension in the width direction is the same as the case of the uniaxial extension in the longitudinal direction, and may be an equal temperature in all regions in the oven, or may be a temperature of a stepwise or gradient distribution. When the set temperature is set to the temperature of the distribution, the actual temperature distribution in the oven and the set temperature distribution should be within ±0_5 °C, preferably within ±〇3 °C, preferably within =t〇.2 °C. . The set temperature of the uniaxial extension in the width direction may be the same as or different from the set temperature in the step n of the uniaxial extension in the longitudinal direction. The set temperature of the uniaxial extension in the width direction is the same as the case of the uniaxial extension in the longitudinal direction, and is not particularly limited. For example, based on the glass transition temperature (Tg) of the substrate (a), it is (Tg + 0 ) ° C to ( Tg + 30 ) °C range ο The stretching ratio of the uniaxial extension in the width direction can be determined according to the desired characteristics of the manufactured polarizing diffractive element, but is, for example, 1.5 to 5 times when manufactured by the above method (2 ') Preferably, it is 1.7 to 4 times, preferably 2 to 3.5 times the range β. When the stretching ratio is less than 1.5 times, the alignment of the compound (C) cannot be satisfactorily exhibited, and when the stretching ratio exceeds 5 times, defects such as breakage of the substrate may occur during processing. good. The stretching speed of the uniaxial stretching in the width direction is, for example, 2 to 100 m/min, preferably 5 to 50 m/min. &lt;(2) Step&gt; The method for producing a polarizing diffractive element of the first aspect of the present invention has -38- 201027140. The step (2) is (2) constructed of a transparent resin (E) ( e) a step of forming a pattern of concave portions and convex portions formed by the composition of the object (D) continuously by transfer, (f). Further, in the manufacturing method of the first state, the polarizing diffraction element is formed by a layered pattern in which a concave portion and a convex portion composed of a composition including the above-mentioned pseudonym are continuously formed. The polarizing diffracting element 10 ld) described in the item]. The substrate (f) obtained in this step is a substrate having a pattern in which a concave portion and a convex portion composed of a compound-containing product are continuously formed on a substrate (e) made of a transparent resin. The substrate pattern is shown in Figure 5(a). As for the transparent resin (E) used in the step (2), the resin exemplified as the transparent resin (A), and preferably the transparent resin and the transparent resin (E) are the same resin. Further, the substrate (e) φ is a substrate exemplified in the substrate (a). (Formation Method of Pattern) (2) In the step of obtaining a substrate (f) by continuously forming a pattern of a convex portion composed of a composition containing the compound (D) on one surface of the substrate (e) ). Further, in the step (2), a concave portion and a convex portion are usually continuously formed on the base material (e), and a transfer coating film comprising the compound (D) is formed. The base material containing the compound obtains the polarizing material (D) obtained by the substrate. The layer of the above-mentioned member ((E) is a mold of the group (f) (f), and the above-mentioned resin (A) can be used. The composition of the pattern formed by the transfer of the concave portion and the portion - 39 - 201027140 is formed on the substrate (e) by transfer to form a concave portion and a convex portion which are formed by the composition containing the compound (D). The method of the pattern is exemplified by, for example, coating a composition containing the compound (d) on the substrate (e), and continuously forming a concave portion on the coating film formed of the composition containing the compound (D). a method of patterning a convex portion (hereinafter referred to as a transfer method A). The transfer method A' first coats a composition containing the compound (d) on the substrate (e), and heats it as needed. The treatment is carried out and dried to obtain a coating film containing the compound (D). In this case, the coating method can be carried out without any limitation by a conventional coating method. Specific coating methods are exemplified by, for example, spin coating, lip coating. Cloth method, Comma coating method, roll coating method, die coating method, doping method, dip Coating method, bar coating method, casting film forming method, gravure coating method, printing method, etc. Among them, in terms of thickness precision and mass productivity, it is preferred to use Cooma coating method or gravure coating method. The thickness of the coating film containing the compound (D) is not particularly limited as long as it can impart a desired pattern, but in order to secure the thickness precision, it is preferably 1 to 30 μm, more preferably 1 to 20 μm, preferably 1~15μιη. The depth of the recess of the pattern varies depending on the wavelength of the laser used or the type of material used, but is usually in the range of 1 to ΙΟμιη. Accordingly, the thickness of the coating material is controlled within the above range. On the one hand, it is possible to ensure the accuracy of the thickness, and on the other hand, it is preferable to design without using unnecessary materials and having excellent economy. Moreover, the width of the convex portion and the concave portion of the pattern is the width of the convex portion by L. / When S is the width of the recess 40-201027140, the L/(L + S) is preferably 0.4${L/(L + S) }S0.6 , more preferably 〇.45${L/ (L+S) }$0.55, where L = S, that is, the width of the convex portion is the same as the width of the concave portion. The width L of the convex portion is preferably 1 μπι$Ι^10μηι, preferably 1 μιη$Ι^5μηι, preferably the width S of the concave portion is preferably lpmSSS10pm, more preferably 1μχη$8€3μιη. When the width L of the convex portions and the width S of the concave portions are selected, it is preferable to obtain a desired polarized light φ. Therefore, a concave portion is continuously formed on the coating film formed of the composition containing the compound (D). The method of forming the pattern of the convex portion is preferably a mold in which the concave portion and the convex portion are continuously formed. The material of the mold in which the concave portion and the convex portion are continuously formed is not particularly limited as long as the desired pattern can be produced, but is preferably used. A metal manufacturer such as nickel or a niobium manufacturer, or a transparent person such as synthetic quartz. Further, in order to impart a shape and to release the film after adhesion to the coating film, it is also preferred to apply a fluorinated or oxime-based release agent to the surface of the mold on which the concave portion and the convex portion are continuously formed. Wait for the release treatment. The shape of the mold in which the concave portion and the convex portion are continuously formed is not particularly limited as long as it is a flat shape or a roll shape, and when the substrate is in the form of a sheet, a flat mold is preferably used, and the substrate is a roll. In the case of the pattern, it is preferred to use a flat-plate or roll-shaped mold, and it is preferable to use a mold or the like on the coating film formed using the composition containing the compound (D) at the same time as or after the application of the pattern. The composition containing the compound (D) is hardened as quickly as possible. Specifically, when an ultraviolet curable (meth) acrylate resin is used as the compound (D ) -41 - 201027140, the resin is preferably cured by irradiating ultraviolet rays as quickly as possible while imparting a pattern or after application. Examples of the source of the ultraviolet light are metal halide lamps or high pressure mercury lamps. Further, the ultraviolet irradiation may be performed on the top of the pattern or through the substrate (e). When the pattern is continuously formed, it is preferred to irradiate the opposite side of the mold, that is, to irradiate the pattern with ultraviolet rays through the substrate (e). The composition containing the compound (D) is a composition having optical anisotropy. Further, an optically isotropic material is generally used as the compound (D) φ. The optically isotropic material is not particularly limited as long as it is optically isotropic, but the polarizing diffractive element is continuously and economically produced. In view of the above, the ultraviolet curable resin is preferably contained, and the ultraviolet curable (meth)acrylic resin is more preferably contained in terms of transparency or optical anisotropy. As the ultraviolet curable (meth)acrylic resin, the ultraviolet curable (meth)acrylic resin described in the above [Polarizing Diffractive Element] is preferably used. @ When an ultraviolet curable (meth)acrylic resin is used as the compound (D) The composition containing the compound (D) preferably contains a photopolymerization initiator (photoradical generator). When the photopolymerization initiator (photo-radical generator) is contained in the composition, the ultraviolet-curable (meth)acrylic resin can be appropriately polymerized (hardened). Specific examples of the photopolymerization initiator (photo-radical generator) are 1-cyclohexyl phenyl ketone, 2,2,-dimethoxy-2-phenyl acetophenone, xanthone, oxime , anthrone, benzaldehyde, hydrazine, triphenylamine, carbazole, 3-methyl-42- 201027140 acetophenone, 4-chlorobenzophenone, 4,4,-dimethoxybenzophenone Ketone, 4,4'-diaminobenzophenone, Michier ketone, benzhydryl propyl ether, benzhydryl ethyl ether, benzyl dimethyl ketal, 1-(4 -isopropylphenyl)-2-hydroxy-2-methylpropan-1-one, 2-hydroxy-2-methyl-1-phenylpropan-1-one, thioxanthone, diethyl thioxanthene Ketone, 2-isopropylthioxanthone, 2-chlorothioxanthone, 2-methylmethylthio)phenyl]-2-morpholinylpropan-1-one, 2,4,6-trimethyl Benzhydryldiphenylphosphine oxide, 2-benzyl-2-dimethylamino-1-(4-morphinylphenyl)butan-1-one, 1-[4-(2-hydroxyethyl) Oxy)-phenyl]-2-hydroxy-2-methylpropan-1-one and the like. These photopolymerization initiators (photoradical generators) may be used alone or in combination of two or more. Among the photopolymerization initiators (photoradical generators), 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinylpropan-1-one, 2, 4 6-Trimethylbenzimidyldiphenylphosphine oxide and 1-hydroxycyclohexyl phenyl ketone are preferred. Further, commercially available products can be used as the photopolymerization initiator (photoradical generator). For example, 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinylpropan-φ 1-one is commercially available as Irgacure 907 (manufactured by Steam Batt Chemicals). 1-Hydroxycyclohexyl phenyl ketone is commercially available as Irgacure 184 (manufactured by Steam Batt Chemicals). The amount of the photopolymerization initiator (photo-radical-producing agent) to be added is not particularly limited as long as it is sufficient for the curing reaction, but is usually 0.1 to 100 parts by weight of the ultraviolet-curable (meth)acrylic resin. 20 parts by weight, preferably 0.5 to 10 parts by weight, is preferred. When the amount of addition of the photopolymerization initiator (photo-radical generator) is less than the above lower limit, the curing reaction of the ultraviolet-curable (meth)acrylic resin may not be sufficiently performed, and the case where -43-201027140 cannot obtain sufficient hardness may be obtained. . When the amount of the photopolymerization initiator (photo-radical generator) is more than the above upper limit, the storage stability of the ultraviolet curable (meth)acrylic resin may be lowered. The substrate (f) can be obtained by using the composition containing the compound (D) as described above. Further, by using the substrate (f), the pattern portion formed of the composition containing the compound (D) of the polarizing diffractive element obtained by the production method of the present invention has optical anisotropy. ❿ &lt; (3) Step&gt; The method of manufacturing the polarizing diffractive element of the first aspect of the present invention has the step (3) of (3) passing the substrate containing the compound (C) to the substrate ( b) the step of layer (B) having the molecular alignment energy and the patterned surface of the substrate (f) being laminated opposite each other. The step (3) is a step of laminating the substrate (b) and the substrate (f) through the composition containing the compound (C), but the composition containing the compound (C) can be applied to the substrate (b). The layer (B) can also be applied to the patterned surface of the ® substrate (f). Specifically, in the step (3), the composition containing the compound (C) is applied onto the layer (B) of the substrate (b), and the coated surface and the substrate (f) are coated. a step of the step of forming the pattern opposite to the ground layer, and the step (3) of applying the composition comprising the compound (C) to the patterned surface of the substrate (f) a step of laminating the coated surface and the layer (B) of the substrate (b) oppositely to each other - 44 - 201027140 Further, the polarizing diffractive element obtained by the manufacturing method of the first state In the middle, the layer derived from the composition containing the compound (C) corresponds to the layer (LC ) of the polarizing diffractive element described in the above section [Polarizing diffractive element]. By this step, a polarizing diffractive element is formed. A mode diagram of a polarizing diffractive element obtained by the manufacturing method of the polarizing diffraction element of the first state is shown in Fig. 6. Further, the structure of the substrate (f) is shown in Fig. 5 (a), and the structure of the substrate (b) containing the composition of the compound (C) is shown in Fig. 5 (b). As the compound (C) and the composition containing the compound (C), the compound (C) described in the above [Polarizing Diffractive Element] and the composition containing the compound (C) are preferably used. The step (3) is a step of applying a composition containing the compound (C) to the layer (B) of the substrate (b) such that the coated surface is opposite to the patterned surface of the substrate (f). In the step of laminating to the ground layer, as shown in Fig. 5, the surface on which the compound (C) is applied and the surface having the pattern of the substrate (f) are laminated in a state opposite thereto. When φ is laminated, a method of laminating and laminating between two rolls may be used, or a method of laminating a single substrate on a support substrate while laminating the other substrate may be used. The pressure at the time of lamination is usually selected in the range of 0.1 to 2 MPa. When the pressure is less than 0.1 MPa, it is not preferable because of the appearance of a bubble or the like, and when the pressure exceeds 2 MPa, there is a defect that the formed unevenness is broken. Further, the laminating speed is preferably from 0.1 to 3 Om/s, more preferably from 0.3 to 10 m/s. When the speed is less than 0.1, it is less preferable from the viewpoint of productivity. On the contrary, when the speed is more than 3 Om/s, the alignment of crystals is disordered and defective, which is not preferable. Further, it is preferred that the group-45-201027140 containing the compound (C) is cured as soon as possible after lamination (forming a layer corresponding to the layer (LC) described above). Specifically, when an ultraviolet curable liquid crystal is used as the compound (C), it is preferred to irradiate the ultraviolet rays as soon as possible after lamination to cure the resin. An example of a source of ultraviolet light is a metal halide lamp or a high pressure mercury lamp. Further, the ultraviolet irradiation may be carried out through the substrate (e) or through the substrate (f). Further, the transparent resin (A) described above, and a composition comprising at least one selected from the group consisting of a (meth)acrylic acid compound, a polyimine, a polyvinyl alcohol, and a polyurethane, and having the above formula ( The composition of the polymerization parameter of the structure represented by I), the composition containing the compound (C), the composition containing the compound (d), and the transparent resin (E) can be used as needed without impairing the effects of the invention. Adding conventional additives such as an antioxidant, a heat stabilizer, a light stabilizer, an ultraviolet absorber, an antistatic agent, an antifoaming agent, and a surfactant (release agent). (Second aspect) The second aspect of the method for producing a polarizing diffractive element of the present invention has the steps of (I) to (III) described later, and is characterized in that the portion derived from the convex portion has optical anisotropy. 'The part derived from the supplement has optical anisotropy. &lt;(I) Step&gt; The method of manufacturing the polarizing diffractive element of the second aspect of the present invention has the step (I) of (I) a substrate composed of a transparent resin (A) (a) A step of forming a layer (B) having a molecular alignment energy on at least one side to obtain a substrate (b). The above step (I) can be carried out in the same manner as the above-mentioned step (1) of the manufacturing method of the optical diffraction element of the -46-201027140. Further, the manufacturing method of the polarizing diffractive element of the second aspect is also the same as the above-described first state, and the stretching treatment can be carried out when the layer (B) is formed in the step (I). &lt;(II) Step&gt; The method of manufacturing the polarizing diffractive element of the second aspect of the present invention has the step (II) of (II) on the layer (B) of the substrate (b), The step of obtaining the substrate (c) by forming a pattern in which the concave portion and the convex portion composed of the composition containing the compound (C) are continuously formed by transfer. Further, in the polarizing diffractive element obtained by the manufacturing method of the second aspect, the layer derived from the pattern in which the concave portion and the convex portion composed of the composition containing the compound (C) are continuously formed is equivalent to the aforementioned The layer (LC) of the polarizing diffractive element described in the item [Polarizing diffractive element]. The substrate (c) obtained in this step is a substrate having a continuous shape on the layer (B) and having a pattern of concave portions and convex portions composed of a composition containing the compound (C). A schematic diagram of the substrate (c) is shown in FIG. (Formation Method of Pattern) In the step (II), a pattern in which a concave portion and a convex portion composed of a composition containing the compound (C) are continuously formed on the layer (B) of the substrate (b) is formed. Type 'obtaining the substrate (c) » In the step (II), the pattern in which the concave portion and the convex portion are continuously formed is transferred onto the substrate (b) onto the substrate-containing composition (C)-47 - 201027140 Formed on the formed film. A method of forming a pattern in which a concave portion and a convex portion composed of a composition containing the compound (C) are continuously formed on the layer (B) of the substrate (b) by transfer is exemplified as, for example, the aforementioned substrate ( a layer (B) coated with a composition containing the compound (C), and a method of continuously forming a pattern of concave portions and convex portions on a coating film formed of the composition containing the compound (C) (hereinafter referred to as transfer method A). ❿

轉印法A 轉印法A係先在前述基材（b)之層（B)上塗佈包含 化合物（C)之組成物，並進行加熱等之處理並經乾燥， 獲得包含化合物（C)之塗膜。此時，塗佈之方法可未加 限制地採用習知之塗佈方法。具體之塗佈方法舉例爲例如 旋轉塗佈法、模唇塗佈法、柯瑪塗佈法、輥塗佈法、模嘴 塗佈法、摻塗法、浸漬塗佈法、塗佈棒塗佈法、流延成膜 法、凹版塗佈法、印刷法等。其中，就厚度精準度及量產 G 性之觀點而言，較好使用科瑪塗佈法或凹版塗佈法》 包含化合物（C)之塗膜之厚度只要可賦予期望之圖 型則無特別限制，但爲了確保厚度精準度，較好爲1〜3 Ομηι ，更好爲1~20μιη，最好爲1〜15μχη。圖型之凹部深度依使 用之雷射波長或使用之材料種類而有不同之設計，但通常 爲1〜10 μιη之範圍。據此，將塗佈材料之厚度控制在前述之 範圍內’一方面確保厚度之精準度，另一方面可不使用不 必要之材料而經濟性優異地設計故而較佳。又，圖型之凸 -48- 201027140 部與凹部之寬度，以L表示凸部之寬度，以S表示凹部之寬 度時，1^/(1^ + 3)之値較好爲0.4${1^/(1&gt; + 8)}$0.6，更 好爲0.45S {L/ ( L + S ) }S0.55。其中以L = S之情況，亦即 凸部之寬度與凹部之寬度一致之情況最佳。再者凸部之寬 度L以lpmSLSIOgm較佳，更好爲1μηι$Ι^5μηι，最好爲 1μιη$Ι^3μιη。凹部之寬度S亦以lpmSS彡ΙΟμιη較佳，更 好爲最好爲1μιη$8$3μπι。選擇該等凸部 0 之寬度L與凹部之寬度S時，由於可獲得期望之偏光繞射能 故而較佳。 在藉由包含前述化合物（C)之組成物形成之塗膜上 賦予連續形成有凹部與凸部之圖型之方法較好使用連續形 成有凹部與凸部之模具。連續形成有凹部與凸部之模具之 材質只要可製作期望之圖型則無特別限制，但較好使用鎳 等金屬製者或矽製造者，或者合成石英等透明者。又，爲 了賦與形狀且與塗膜密著後之脫模良好，因此亦較好在連 φ 續形成有凹部與凸部之模具表面上塗佈氟系或聚矽氧烷系 之脫模劑等進行脫模處理。連續形成有凹部與凸部之模具 形狀只要是平板狀或輥形狀等可製作期望圖型則無特別限 制，基材爲薄片之型態時，較好使用平板狀之模具，基材 爲輥型態時較好使用平板狀或輥形狀之模具。 又，爲了獲得連續形成有由包含化合物（C)之組成 物所構成之凹部與凸部之圖型，較好在以包含化合物（C )之組成物形成之塗膜上形成圖型之同時或形成後，儘速 照射紫外線，進行前述紫外線硬化型液晶之紫外線硬化， -49- 201027140 獲得前述紫外線硬化型液晶之硬化物（聚合物）（此處， 形成相當於前述層（LC)之層）。 另外，塗佈如前述之包含化合物（C)之組成物後， 可進行加熱以獲得塗膜。該加熱係爲了使液晶配向而進行 ’但作爲包含化合物（C )之組成物添加溶劑時，亦係爲 了使溶劑揮發而進行者。加熱之溫度係依所用液晶之種類 而定，但通常高至高於液晶轉移溫度之溫度較佳，且若亦 鑑於透明樹脂（A)或層（B)之耐熱性，則較好爲 © 40〜150°C，更好爲50〜14(TC。加熱溫度超過15CTC時，會有 基材（b)變形之顧慮而不佳，相反地當加熱溫度未達 40 °C時，由於無法獲得期望之配向而不佳，添加溶劑時， 由於溶劑未揮發而殘留故而不佳。又，加熱溫度只要在上 述溫度範圍內，則亦可分階段上升》 進行紫外線硬化時之光源之例舉例爲金屬鹵化物燈或 高壓水銀燈。又，紫外線照射可自具有圖型之面側進行， 亦可自沒有圖型之面側進行，但形成連續圖型時，在模具 ® 與包含化合物（C)之組成物接觸之狀態下，亦可自沒有 圖型之面側進行照射。 作爲包含化合物（C)之組成物係使用具有光學異向 性之組成物。又’通常使用光學異向性材料作爲化合物（ C)。 較好包含如後述之紫外線硬化型液晶做爲前述化合物 (C )。 化合物（C)及包含化合物（C)之組成物較好使用前 -50- 201027140 述[偏光性繞射元件]之項中所述之化合物（c )及包含化 合物（C)之組成物。如前述般藉由使用包含化合物（C) 之組成物，使利用本發明之製造方法獲得之源自偏光性繞 射元件之凸部之部分具有光學異向性。 &lt; (III)步驟 &gt; 本發明之第二樣態之偏光性繞射元件之製造方法所具 Φ 有之（ΠΙ)步驟爲（III)在前述基材（C)之具有圖型之 面上塗佈包含化合物（D)之組成物，使前述凹部至少由 化合物（D)所填充，獲得具有塡充部之基材（d)之步驟 〇 另外，利用第二樣態之製造方法獲得之偏光性繞射元 件中，由包含前述化合物（D)之組成物形成之前述塡充 部相當於前述之[偏光性繞射元件]之項中所述之偏光性繞 射元件之層（LD )。 〇 以（ΠΙ)步驟獲得之基材（d)之模式圖示於圖2。再 者，圖2中僅塡充前述之凹部，但實際上在塡充凹部之同 時，亦有在凸部之上部亦塗佈包含化合物（D)之組成物 ，而於凸部之上部亦存在化合物（D)之情況。 (III)步驟係藉由將前述凹部埋住之方式塗佈包含化 合物（D )之組成物，使前述凹部至少由化合物（D )所 塡充而達成。塗佈包含化合物（D)之組成物時之方法並 無特別限制，可未加限制的採用習知之塗佈方法。具體之 塗佈方法舉例爲例如旋轉塗佈法、模唇塗佈法、柯瑪塗佈 -51 - 201027140 法、輥塗佈法、模嘴塗佈法、摻塗法、浸漬塗佈法、棒塗 佈法、流延成膜法、凹版塗佈法、印刷法等。其中，自厚 度精準度及量產性之觀點而言，較好使用科瑪塗佈法或凹 版塗佈法等。又，亦可在減壓環境下塗佈，以使化合物（ D)更易於塡充前述凹部。 至於包含化合物（D)之組成物係使用具有光學同向 性之組成物。又，通常使用光學同向性材料作爲化合物（ D) ° ⑮ 前述化合物（D)較好包含紫外線硬化型樹脂，但就 連續且經濟的生產偏光性繞射元件之觀點而言，更好包含 紫外線硬化型（甲基）丙烯酸樹脂。前述化合物（D)包 含紫外線硬化型樹脂時，通常在獲得基材（d)之際，凹 部至少由化合物（D)所塡充，隨後進行紫外線照射，藉 由使該紫外線硬化樹脂硬化獲得基材（d )(此處形成相 當於前述層（LD)之層）^ 至於包含化合物（D)之組成物較好使用前述第一樣 © 態之偏光性繞射元件之製造方法之（[第一樣態])項中所 述之包含化合物（D)之組成物。 又’可使用於本發明中之紫外線硬化型（甲基）丙烯 酸樹脂係利用紫外線硬化’產生紫外線之光源之例舉例爲 金屬鹵化物燈或商壓水銀燈。又’紫外線照射可由基材（ a)之形成圖型之面側進行，亦可由基材（a)之未形成圖 型之面側進行。另外’連續形成圖型時，較好由前述模具 之相反側照射’亦即自基材（a )之未形成圖型之面側進 -52- 201027140 行紫外線照射。 藉由使用如前述之包含化合物（D)之組成物，源自 利用本發明之製造方法獲得之偏光性繞射元件之塡充部之 部分具有光學同向性。 另外，第二樣態之偏光性繞射元件之製造方法可在前 述偏光性繞射元件之具有塡充部之面上進而任意設有配設 由透明性樹脂（E)所構成之基材（e)之步驟。藉由設有 Q 該步騾使偏光性繞射元件之最外層成爲基材（a)及基材 (e)，就獲得偏光性繞射元件之耐久性及平滑性方面而 W爲較佳。 至於透明性樹脂（E )可使用前述透明樹脂（A )所例 示之樹脂，且較好透明樹脂（A )與透明樹脂（E )爲相同 之樹脂。又，基材（e)可使用基材（a)中所例示之基材 〇 又，前述之透明樹脂（A)、包含選自（甲基）丙烯 ❹ 酸系化合物、聚醯亞胺、聚乙烯醇及聚胺基甲酸酯之至少 一種之組成物、包含具有以上式（I)表示之構造之聚合 物之組成物、包含化合物（C)之組成物、包含化合物（D )之組成物及透明樹脂（E)中可依據需要，在不損及發 明效果之範圍內添加抗氧化劑、熱安定劑、光安定劑 '紫 外線吸收劑、抗靜電劑、消泡劑 '界面活性劑（脫模劑） 等習知添加劑。 (第三樣態） -53- 201027140 本發明之偏光性繞射元件之製造方法之第三樣態具有 後述（i)及（ii)之步驟，其特徵爲基材（a，）之形成圖 型之面具有分子配向能，且源自凸部之部分具有光學異向 性，源自塡充部之部分具有光學各同向性。 又，以第三樣態之偏光性繞射元件之製造方法獲得之 偏光性繞射元件爲與前述之[偏光性繞射元件]之項中所述 之偏光性繞射元件不同構造之元件。具體而言，以第三樣 態之偏光性繞射元件之製造方法獲得之偏光性繞射元件之 @ 構造爲將[偏光性繞射元件]之項中所述之偏光性繞射元件 中之基材（a)置換成基材（a’），且沒有層（B)之構造 &lt; (i )步驟&gt; 本發明之第三樣態之偏光性繞射元件之製造方法所具 有之（i)步驟爲（ί)於由透明樹脂（A)所構成之基材 (a’）之至少一面上，利用轉印而形成連續形成有由包含 Θ 化合物（C)之組成物所構成之凹部與凸部之圖型，而獲 得基材（b )之步驟。 亦即，以本發明之（i)步驟獲得之基材（b)爲具有 基材（a’）及於該基材（a，）上形成之連續形成有由包含 化合物（C)之組成物所構成之凹部與凸部之圖型之基材 。基材（b)之模式圖示於圖3。 (透明樹脂（A )) -54- 201027140 第三樣態之偏光性繞射元件之製造方法中之透明樹脂 (A)係與前述第二樣態之偏光性繞射元件之製造方法中 之透明樹脂（A)相同。 (基材（a’）） 第三樣態之偏光性繞射元件之製造方法中之基材（a’ )爲於前述第二樣態之偏光性繞射元件之製造方法中之基 φ 材（a)之至少一面上賦予分子配向能之基材。 於前述第二樣態之偏光性繞射元件之製造方法中之基 材（a)之至少一面上賦予分子配向能之方法並無特別限 制，舉例爲對基材（a)進行摩擦處理，對所獲得之基材 (a’）賦予分子配向能之方法，或對基材（a)進行延伸 處理，對所獲得之基材（a’）賦予分子配向能之方法。 又，對前述基材（a)進行摩擦處理獲得之基材（a’ )係施以摩擦處理之面爲具有分子配向能之面，該面爲由 〇 包含化合物（C)之組成物形成圖型之面。又，對基材（a )進行延伸處理，所得之基材（a’）爲經施加延伸處理， 且具有相位差之基材，所得基材（a，）之兩面均具有分子 配向能。 摩擦處理可藉習知方法進行，舉例爲例如將棉或縲縈 等摩擦布捲在金屬製輥之表面上，邊使該輥旋轉邊與前述 基材（a)之表面接觸，而賦予分子配向能之處理。摩擦 處理之處理條件並無特別限制，但輥之轉數較好爲 100~2000rpm，更好爲 200~1 500rpm，最好爲 300~900rpm -55- 201027140 。基材（a)之輸送速度較好爲l〜50m/分鐘，更好爲3〜 30m/分鐘，輥之壓入量較好爲0.1〜0.5mm，更好爲0.2〜 0·4mm 〇 以上述處理條件進行時，由於可對前述基材（a)之 全面進行均勻的摩擦處理，因此可適當地形成具有分子配 向能之基材（a’）。摩擦處理之方向係由摩擦輥之旋轉軸 方向與薄膜（基材（a))之長度方向所成之角度加以決 定。摩擦方向亦可設定成期望之方向並實施摩擦處理，以 © 決定液晶分子之配向方向。 又，前述摩擦處理通常會伴隨著產生異物。該等係源 自摩擦布之纖維脫落者、供給摩擦之薄膜表面之材質經削 減脫落者、或由於產生之靜電使周圍環境異物附著者。因 此，有必要去除該等異物，且較好將異物吹掉並吸取，並 經洗淨，尤其，以水洗處理較適用。 對基材（a)進行延伸處理時，通常藉由使基材（a) 加熱延伸進行。加熱延伸之方法由於可減少異物等之產生 ® ，且可良率良好地生產故而較佳。 至於前述基材（a)之延伸方法較好爲（1)在加熱下 對基材（a)之長度方向單軸延伸之方法（以下亦稱爲（1 )之方法），（2)在加熱下對基材（a)之寬度方向單軸 延伸之方法（以下亦稱爲（2)之方法）》 基材（a)延伸之際，延伸時之加熱溫度較好在基材 (a )之全部延伸部位中被精密地控制。例如，上述（1 ) 之方法中之長度方向之單軸延伸，亦即縱向單軸延伸’較 -56- 201027140 好在溫度分佈經控制在設定溫度±0.6°C以內，較好設定溫 度±〇.4t以內，更好設定溫度：t〇.2°C以內之烤箱中進行。 本文中之設定溫度可爲烤箱中之全部區域中相等之溫 度，亦可爲設定成階段性的或梯度分佈之溫度。設定溫度 爲設定分佈之溫度時，烤箱中之實際溫度分佈與設定之溫 度分佈以±0.6°C以內，較好±〇.4°C以內，更好±0.2°C以內較 適宜。 @ 長度方向單軸延伸之設定溫度只要依據構成基材（a )之透明樹脂（A)之種類、延伸倍率及延伸速度、基材 (a)之厚度、延伸後之光學異向性材料之所需相位差等 設定，則無特別限制，但例如，當透明樹脂（A )爲熱可 塑性樹脂時，可以作爲熱可塑性樹脂之熱變形溫度之指標 之玻璃轉移溫度（Tg)爲基準。設定溫度以該Tg作爲基準 ’通常爲（Tg-10°C )至（Tg + 7(TC )之範圍，較好爲（ Tg±〇°C )至（Tg + 50°C )之範圍。在該等溫度範圍內，不 〇 會引起基材（a)之熱劣化，且可不破斷地延伸故而較佳 〇 上述（1)之方法中，長度方向單軸延伸之延伸倍率 爲例如1.1〜2.5倍，較好爲1.1〜2.0倍，最好爲1.2-1.5倍之 範圍。延伸倍率未達1.1倍時，由於無法良好地均勻展現 前述化合物（C)之配向故而不佳，延伸倍率超過2.5倍時 ’由於加工時會出現基材產生破斷等之缺陷故而不佳。 又’上述（1)之方法中之長度方向單軸延伸之延伸 速度爲例如2〜100m/分鐘，較好爲5〜50m/分鐘之範圍。 -57- 201027140 以上述（1 )之方法，基材（a’）具有相位差’具體 而言，面內相位差R0通常爲1〇〇〜l〇〇〇nm，較好爲150~ 800nm之範圍。 基材（a，）之面內相位差R0之偏差通常在±3nm以內’ 較好在±2nm以內，更好在±lnm以內。又，基材（a’）面 內之最大折射率方向相對於基材（a，）之長度方向通常爲 〇±3度之範圍，較好爲0±2度之範圍，更好爲0±1度之範圍 ，最好爲〇±〇.5度之範圍。 ® 以上述（2)之方法獲得基材（a’）時，係使基材（a )朝寬度方向單軸延伸。藉由在比長度方向之單軸延伸更 爲精密地溫度控制下進行該寬度方向之單軸延伸，亦即橫 向單軸延伸，可適當獲得全面均勻之偏光性繞射元件。例 如，寬度方向之單軸延伸以在溫度分佈控制在設定溫度 ±〇.5°C以內，較好設定溫度±〇.3°C以內，更好設定溫度 ±〇. 2 °C以內之烤箱中進行較適宜。 本文中，寬度方向單軸延伸之設定溫度係與長度方向 ® 單軸延伸之情況相同，可爲烤箱中之全部區域中相等之溫 度，亦可爲設定爲階段性或梯度分佈之溫度。設定溫度爲 設定分佈之溫度時，烤箱中之實際溫度分佈與設定之溫度 分佈以±0.5°C以內，較好±0.3°C以內，更好±0.2°C以內較適 宜。該寬度方向單軸延伸之設定溫度可與長度方向單軸延 伸之步驟中之設定溫度相同，亦可不同。 寬度方向單軸延伸之設定溫度與長度方向單軸延伸之 情況相同，並無特別限制，例如透明樹脂（A )爲熱可塑 -58- 201027140 性樹脂時，以熱可塑性樹脂之玻璃轉移溫度（Tg )作爲基 準’通常爲（Tg-10°c )至（Tg + 70°C )之範圍，較好爲（ Tg±0°c )至（Tg + 50°c )之範圍。 寬度方向單軸延伸之延伸倍率可依據製造之偏光性繞 射元件所需之特性決定，但以上述（2 )之方法製造時， 爲例如1.5〜5倍，較好爲1.7〜4倍，最好爲2~3.5倍之範圍。 延伸倍率未達1.5倍時，由於無法良好地均勻展現前述化 φ 合物（C)之配向故而不佳，延伸倍率超過5倍時，由於加 工時會出現基材產生破斷等之缺陷故而不佳。 上述寬度方向單軸延伸之延伸速度爲例如2〜100m/分 鐘，較好爲5〜50m/分鐘之範圍。 以上述（2)之方法，基材（a’）具有相位差，具體 而言，面內相位差R0通常爲50~800nm，較好爲100〜500nm 之範圍。 基材（a’）之面內相位差R0之偏差通常在±3nm以內， φ 較好在±2nm以內，更好在±lnm以內。又，基材（a’）面 內之最大折射率方向相對於基材（a’）之寬度方向通常爲 〇±3度之範圍，較好爲0±2度之範圍，更好爲0±1度之範圍 ，最好爲〇±〇.5度之範圍。 該等基材（a’）之延伸步驟中，係考慮聚合物種類、 共聚合比例、分子量分佈、熱變形溫度（玻璃轉移溫度） 等特性而選擇構成基材（a’）之透明樹脂（A)之種類， 且長度方向之單軸延伸及寬度方向之單軸延伸之各步驟中 ，可藉由選擇烤箱中之設定溫度、選擇延伸倍率及延伸速 -59- 201027140 度，控制由化合物（C)所構成之光學異向性材料之配向 特性。 (圖型形成方法） (i )步驟中，係在基材（a’）之至少一面上利用轉印 形成連續形成有由包含化合物（C)之組成物所構成之凹 部與凸部之圖型，獲得基材（b)。 又（i)步驟中，通常連續形成有凹部與凸部之圖型 @ 係在前述基材（a’）上，轉印於由包含化合物（C)之組 成物形成之塗膜上而形成。 於前述基材（a’）之至少一面上利用轉印形成連續形 成有由包含化合物（C)之組成物所構成之凹部與凸部之 圖型之方法舉例爲例如在前述基材（a’）上塗佈包含化合 物（C)之組成物，於由包含該化合物（D)之組成物形成 之塗膜上轉印連續形成有凹部與凸部之圖型之方法（以下 稱爲轉印法A ) 。 〇Transfer Method A Transfer Method A First, a composition containing the compound (C) is applied onto the layer (B) of the substrate (b), and subjected to heating or the like and dried to obtain a compound (C). Coating film. At this time, the coating method can employ a conventional coating method without limitation. Specific coating methods are, for example, a spin coating method, a lip coating method, a komal coating method, a roll coating method, a die coating method, a doping method, a dip coating method, and a coating bar coating method. Method, casting film forming method, gravure coating method, printing method, and the like. Among them, in terms of thickness accuracy and mass production G, it is preferable to use the Comme coating method or the gravure coating method. The thickness of the coating film containing the compound (C) is not particularly limited as long as the desired pattern can be imparted. The limitation, but in order to ensure the thickness precision, it is preferably 1 to 3 Ομηι, more preferably 1 to 20 μιη, and most preferably 1 to 15 μχη. The depth of the recess of the pattern varies depending on the wavelength of the laser used or the type of material used, but is usually in the range of 1 to 10 μm. Accordingly, the thickness of the coating material is controlled within the above-described range. On the one hand, the accuracy of the thickness is ensured, and on the other hand, it is preferable to design without using an unnecessary material and to be economically excellent. Further, the width of the pattern -48 - 201027140 is the width of the concave portion, and the width of the convex portion is indicated by L. When S is the width of the concave portion, the radius of 1^/(1^ + 3) is preferably 0.4${1. ^/(1&gt; + 8)}$0.6, more preferably 0.45S {L/ ( L + S ) }S0.55. Among them, L = S, that is, the width of the convex portion is the same as the width of the concave portion. Further, the width L of the convex portion is preferably lpmSLSIOgm, more preferably 1μηι$Ι^5μηι, and most preferably 1μηη$Ι^3μιη. The width S of the concave portion is also preferably lpmSS 彡ΙΟ μηη, more preferably 1 μιη $8$3 μπι. When the width L of the convex portion 0 and the width S of the concave portion are selected, it is preferable to obtain a desired polarization diffraction energy. In the method of continuously forming the pattern of the concave portion and the convex portion on the coating film formed of the composition containing the compound (C), it is preferred to use a mold in which the concave portion and the convex portion are continuously formed. The material of the mold in which the concave portion and the convex portion are continuously formed is not particularly limited as long as the desired pattern can be produced. However, it is preferable to use a metal such as nickel or a niobium maker, or a transparent such as synthetic quartz. Further, in order to impart a shape and to be released from the coating film, it is preferable to apply a fluorine-based or polyoxyalkylene-based release agent to the surface of the mold in which the concave portion and the convex portion are continuously formed. Wait for the release treatment. The shape of the mold in which the concave portion and the convex portion are continuously formed is not particularly limited as long as it is a flat shape or a roll shape, and when the base material is in the form of a sheet, a flat mold is preferably used, and the base material is a roll type. It is preferable to use a flat or roll-shaped mold. Further, in order to obtain a pattern in which the concave portion and the convex portion composed of the composition containing the compound (C) are continuously formed, it is preferred to form a pattern on the coating film formed of the composition containing the compound (C) or After the formation, ultraviolet rays are irradiated as quickly as possible to perform ultraviolet curing of the ultraviolet curable liquid crystal, and -49 to 201027140, a cured product (polymer) of the ultraviolet curable liquid crystal is obtained (here, a layer corresponding to the layer (LC) is formed). . Further, after coating the composition containing the compound (C) as described above, heating may be carried out to obtain a coating film. This heating is carried out in order to align the liquid crystal. However, when a solvent is added as a component containing the compound (C), the solvent is volatilized. The heating temperature depends on the type of liquid crystal used, but it is usually preferably at a temperature higher than the liquid crystal transfer temperature, and if it is also heat resistance of the transparent resin (A) or the layer (B), it is preferably 40 °. 150 ° C, more preferably 50 to 14 (TC. When the heating temperature exceeds 15 CTC, there is a concern that the substrate (b) is deformed poorly. Conversely, when the heating temperature is less than 40 ° C, the desired condition cannot be obtained. When the solvent is added, it is not preferable because the solvent is not volatilized. Further, if the heating temperature is within the above temperature range, the temperature may be increased in stages. An example of a light source for ultraviolet curing is exemplified by a metal halide. A lamp or a high-pressure mercury lamp. Further, the ultraviolet irradiation may be performed from the side of the pattern, or may be performed from the side of the pattern without the pattern, but when the continuous pattern is formed, the mold® is in contact with the composition containing the compound (C). In this state, the surface may be irradiated from the side without the pattern. As the composition containing the compound (C), a composition having optical anisotropy is used. Further, an optical anisotropic material is usually used as the compound (C). Preferably, the ultraviolet curable liquid crystal as described later is used as the compound (C). The compound (C) and the composition containing the compound (C) are preferably used in the item [polarizing diffraction element] before -50-201027140. The compound (c) and the composition comprising the compound (C). The convexity derived from the polarizing diffractive element obtained by the production method of the present invention is obtained by using the composition containing the compound (C) as described above. The portion of the portion has an optical anisotropy. &lt;(III) Step&gt; The method for producing a polarizing diffractive element of the second aspect of the present invention has a step (III) in the aforementioned substrate (C) a step of coating a composition containing the compound (D) on the surface of the pattern, and filling the concave portion with at least the compound (D) to obtain a substrate (d) having a filling portion, and further utilizing In the polarizing diffractive element obtained by the manufacturing method of the second aspect, the entangled portion formed of the composition containing the compound (D) corresponds to the polarized light described in the item [Polarizing diffractive element] described above. The layer of the diffraction element (LD). The mode of the substrate (d) obtained in the step is shown in Fig. 2. In addition, in Fig. 2, only the above-mentioned concave portion is filled, but in fact, while filling the concave portion, the upper portion of the convex portion is also coated. The composition of the compound (D), and the compound (D) is also present in the upper portion of the convex portion. (III) The step of coating the composition containing the compound (D) by embedding the concave portion causes the aforementioned The concave portion is at least extended by the compound (D). The method of applying the composition containing the compound (D) is not particularly limited, and a conventional coating method can be employed without limitation. The specific coating method is exemplified by For example, spin coating method, lip coating method, komal coating-51 - 201027140 method, roll coating method, die coating method, doping method, dip coating method, bar coating method, casting into Membrane method, gravure coating method, printing method, and the like. Among them, from the viewpoints of thickness accuracy and mass productivity, it is preferred to use a Komal coating method or a gravure coating method. Further, it may be applied under a reduced pressure environment to make it easier for the compound (D) to fill the recess. As the composition containing the compound (D), a composition having optical tropism is used. Further, an optically isotropic material is usually used as the compound (D) ° 15 The above compound (D) preferably contains an ultraviolet curable resin, but in terms of continuous and economical production of a polarizing diffractive element, it preferably contains ultraviolet rays. Hardened (meth)acrylic resin. When the compound (D) contains an ultraviolet curable resin, usually, when the substrate (d) is obtained, the concave portion is filled with at least the compound (D), followed by ultraviolet irradiation, and the ultraviolet curable resin is cured to obtain a substrate. (d) (where a layer corresponding to the above layer (LD) is formed) ^ As for the composition containing the compound (D), it is preferred to use the method of manufacturing the polarizing diffraction element of the above-mentioned first state ([first The composition of the compound (D) is as described in the item]). Further, an example of a light source which can be used in the ultraviolet curable (meth)acrylic resin of the present invention to generate ultraviolet rays by ultraviolet curing is exemplified by a metal halide lamp or a commercial pressure mercury lamp. Further, the ultraviolet irradiation may be performed on the surface side on which the substrate (a) is formed, or may be formed on the surface side of the substrate (a) on which the pattern is not formed. Further, when the pattern is continuously formed, it is preferred to irradiate from the opposite side of the mold, i.e., from the side of the substrate (a) where the pattern is not formed, -52 to 201027140, ultraviolet irradiation. By using the composition containing the compound (D) as described above, the portion derived from the fulcrum of the polarizing diffractive element obtained by the production method of the present invention has optical anisotropy. Further, in the method of manufacturing a polarizing diffractive element of the second aspect, a substrate made of a transparent resin (E) may be optionally provided on a surface of the polarizing diffractive element having a splicing portion ( e) steps. By providing the step Q to make the outermost layer of the polarizing diffractive element into the substrate (a) and the substrate (e), it is preferable to obtain the durability and smoothness of the polarizing diffractive element. As the transparent resin (E), a resin exemplified as the above-mentioned transparent resin (A) can be used, and it is preferred that the transparent resin (A) and the transparent resin (E) are the same resin. Further, as the substrate (e), the substrate exemplified in the substrate (a) may be used. The transparent resin (A) described above may be selected from the group consisting of (meth)acrylic acid-based compounds, polyimine, and poly a composition of at least one of vinyl alcohol and a polyurethane, a composition comprising a polymer having the structure represented by the above formula (I), a composition comprising the compound (C), and a composition comprising the compound (D) And the transparent resin (E) may be added with an antioxidant, a thermal stabilizer, a photo-static agent 'ultraviolet absorber, an antistatic agent, an antifoaming agent' surfactant (without the effect of the invention) as needed. Conventional additives such as agents). (Third aspect) -53- 201027140 The third aspect of the method for producing a polarizing diffractive element of the present invention has the steps (i) and (ii) described later, and is characterized in that the substrate (a,) is formed. The surface of the type has molecular aligning energy, and the portion derived from the convex portion has optical anisotropy, and the portion derived from the filling portion has optical isotropy. Further, the polarizing diffractive element obtained by the method of manufacturing the polarizing diffractive element of the third aspect is an element having a structure different from that of the polarizing diffractive element described in the above-mentioned [polarizing diffractive element]. Specifically, the @ of the polarizing diffractive element obtained by the manufacturing method of the polarizing diffractive element of the third aspect is configured to be in the polarizing diffractive element described in the item [Polarizing diffractive element] Substrate (a) is replaced with a substrate (a'), and the structure of the layer (B) is not &lt; (i) Step&gt; The third aspect of the present invention has a method of manufacturing a polarizing diffractive element ( i) the step of forming a concave portion formed of a composition containing the ruthenium compound (C) by transfer on at least one side of the substrate (a') composed of the transparent resin (A) The step of obtaining the substrate (b) with the pattern of the convex portion. That is, the substrate (b) obtained by the step (i) of the present invention has the substrate (a') and the composition formed on the substrate (a,) continuously formed of the compound (C). The substrate of the pattern of the concave portion and the convex portion. A schematic diagram of the substrate (b) is shown in FIG. (Transparent Resin (A)) -54- 201027140 The transparent resin (A) in the manufacturing method of the polarizing diffractive element of the third aspect is transparent in the manufacturing method of the polarizing diffractive element of the second aspect described above The resin (A) is the same. (Substrate (a')) The substrate (a') in the manufacturing method of the polarizing diffractive element of the third aspect is the base material in the manufacturing method of the polarizing diffractive element of the second aspect described above. A substrate to which molecular aligning energy is imparted on at least one side of (a). The method for imparting molecular aligning energy on at least one side of the substrate (a) in the method for producing a polarizing diffractive element according to the second aspect is not particularly limited. For example, the substrate (a) is subjected to rubbing treatment. The obtained substrate (a') imparts molecular aligning energy or a method of extending the substrate (a) to impart molecular aligning energy to the obtained substrate (a'). Further, the substrate (a') obtained by subjecting the substrate (a) to a rubbing treatment is a surface having a rubbing treatment as a surface having a molecular alignment energy, and the surface is formed by a composition containing a compound (C). The face of the type. Further, the substrate (a) is subjected to elongation treatment, and the obtained substrate (a') is a substrate which is subjected to elongation treatment and has a phase difference, and the obtained substrate (a,) has molecular alignment energy on both sides. The rubbing treatment can be carried out by a conventional method. For example, a rubbing cloth such as cotton or crepe is wound on the surface of the metal roll, and the roll is rotated to contact the surface of the substrate (a) to impart molecular alignment. Can handle it. The treatment conditions of the rubbing treatment are not particularly limited, but the number of revolutions of the rolls is preferably from 100 to 2,000 rpm, more preferably from 200 to 1,500 rpm, most preferably from 300 to 900 rpm to 55 to 201027140. The conveying speed of the substrate (a) is preferably from 1 to 50 m/min, more preferably from 3 to 30 m/min, and the amount of the roll is preferably from 0.1 to 0.5 mm, more preferably from 0.2 to 0.4 mm. When the processing conditions are carried out, since the entire substrate (a) can be uniformly subjected to a rubbing treatment, the substrate (a') having a molecular alignment energy can be appropriately formed. The direction of the rubbing treatment is determined by the angle between the direction of the rotation axis of the rubbing roller and the length direction of the film (substrate (a)). The rubbing direction can also be set to the desired direction and rubbing treatment can be performed to determine the alignment direction of the liquid crystal molecules. Moreover, the aforementioned rubbing treatment is usually accompanied by the generation of foreign matter. These materials originate from the fibers of the rubbing cloth, and the material of the surface of the film to be rubbed is cut off, or the foreign matter attached to the surrounding environment due to static electricity generated. Therefore, it is necessary to remove the foreign matter, and it is preferable to blow off the foreign matter and suck it, and wash it, in particular, it is suitable for washing with water. When the substrate (a) is subjected to an elongation treatment, it is usually carried out by heating and stretching the substrate (a). The method of heating and stretching is preferable because it can reduce the generation of foreign matter, etc., and can be produced with good yield. The method for extending the substrate (a) is preferably (1) a method of uniaxially extending the length direction of the substrate (a) under heating (hereinafter also referred to as a method of (1)), and (2) heating. The method of uniaxially extending the width direction of the substrate (a) (hereinafter also referred to as the method of (2)) When the substrate (a) is extended, the heating temperature at the time of stretching is preferably in the substrate (a) All extensions are precisely controlled. For example, in the method of the above (1), the uniaxial extension in the longitudinal direction, that is, the longitudinal uniaxial extension is better than -56-201027140. The temperature distribution is controlled within the set temperature ±0.6 ° C, and the temperature is preferably set ± 〇 Within .4t, it is better to set the temperature: in the oven within t〇.2°C. The set temperature herein may be an equal temperature in all areas of the oven, or may be a temperature set in a stepwise or gradient manner. When the set temperature is set to the temperature of the distribution, the actual temperature distribution in the oven and the set temperature distribution are within ±0.6 °C, preferably within ±〇4 °C, preferably within ±0.2 °C. @ The setting temperature of the uniaxial extension in the longitudinal direction is determined by the type of the transparent resin (A) constituting the substrate (a), the stretching ratio and the stretching speed, the thickness of the substrate (a), and the extended optical anisotropic material. The setting of the phase difference or the like is not particularly limited. For example, when the transparent resin (A) is a thermoplastic resin, the glass transition temperature (Tg) which is an index of the heat distortion temperature of the thermoplastic resin can be used as a reference. The set temperature is usually in the range of (Tg - 10 ° C) to (Tg + 7 (TC ), preferably (Tg ± 〇 ° C ) to (Tg + 50 ° C) based on the Tg. In the above temperature range, it is preferable that the substrate (a) is thermally deteriorated and can be extended without breaking. In the method of the above (1), the stretching ratio of the uniaxial stretching in the longitudinal direction is, for example, 1.1 to 2.5. The stretching ratio is preferably 1.1 to 2.0 times, preferably 1.2 to 1.5 times. When the stretching ratio is less than 1.1 times, the stretching ratio is more than 2.5 times because the alignment of the compound (C) is not uniformly exhibited. In the case of the above-mentioned (1), the elongation speed of the uniaxial extension in the longitudinal direction is, for example, 2 to 100 m/min, preferably 5 to 5 The range of 50 m/min. -57- 201027140 The substrate (a') has a phase difference by the method of the above (1). Specifically, the in-plane phase difference R0 is usually 1 〇〇 to 1 〇〇〇 nm. It is preferably in the range of 150 to 800 nm. The deviation of the in-plane phase difference R0 of the substrate (a,) is usually within ±3 nm', preferably ±2n. Within m, more preferably within ±1 nm. Further, the direction of the maximum refractive index in the plane of the substrate (a') is usually in the range of 〇 ± 3 degrees with respect to the length direction of the substrate (a,), preferably 0 ± The range of 2 degrees, more preferably 0 ± 1 degree, is preferably in the range of 〇 ± 〇 5 degrees. ® When the substrate (a') is obtained by the method (2) above, the substrate is made (a) ) uniaxially extending in the width direction. By performing uniaxial stretching in the width direction, that is, lateral uniaxial stretching under more precise temperature control than the uniaxial extension in the longitudinal direction, a uniform and uniform polarization can be suitably obtained. For example, the uniaxial extension in the width direction is controlled within the set temperature ± 〇 .5 ° C in the temperature distribution, preferably within ± 〇. 3 ° C, and better within ± 2 ° C. In the oven, it is more suitable. In this paper, the set temperature of the uniaxial extension in the width direction is the same as the length direction of the uniaxial extension, which can be equal to the temperature in all areas of the oven, or can be set to stage or The temperature of the gradient distribution. When the set temperature is the temperature of the set distribution, it is baked. The actual temperature distribution and the set temperature distribution are within ±0.5 ° C, preferably within ±0.3 ° C, and more preferably within ± 0.2 ° C. The set temperature of the uniaxial extension in the width direction can be uniaxial with the length direction. The set temperature in the step of extending is the same or different. The set temperature of the uniaxial extension in the width direction is the same as the uniaxial extension in the longitudinal direction, and is not particularly limited. For example, the transparent resin (A) is thermoplastic -58- 201027140. In the case of a resin, the glass transition temperature (Tg) of the thermoplastic resin is used as a reference 'usually (Tg - 10 ° C) to (Tg + 70 ° C), preferably (Tg ± 0 ° c) to (Tg). + 50 ° c ) range. The stretching ratio of the uniaxial stretching in the width direction may be determined according to the characteristics required for the polarizing diffractive element to be manufactured, but when manufactured by the method of the above (2), it is, for example, 1.5 to 5 times, preferably 1.7 to 4 times, most Good range of 2 to 3.5 times. When the stretching ratio is less than 1.5 times, the alignment of the above-mentioned chemical compound (C) cannot be satisfactorily exhibited, and when the stretching ratio exceeds 5 times, defects such as breakage of the substrate may occur during processing. good. The stretching speed of the uniaxial stretching in the width direction is, for example, 2 to 100 m/min, preferably 5 to 50 m/min. In the method of the above (2), the substrate (a') has a phase difference, and specifically, the in-plane retardation R0 is usually in the range of 50 to 800 nm, preferably 100 to 500 nm. The deviation of the in-plane retardation R0 of the substrate (a') is usually within ±3 nm, and φ is preferably within ±2 nm, more preferably within ±1 nm. Further, the direction of the maximum refractive index in the plane of the substrate (a') is usually in the range of 〇 ± 3 degrees with respect to the width direction of the substrate (a'), preferably in the range of 0 ± 2 degrees, more preferably 0 ± The range of 1 degree is preferably in the range of 〇±〇.5 degrees. In the step of extending the substrate (a'), the transparent resin constituting the substrate (a') is selected in consideration of characteristics such as polymer type, copolymerization ratio, molecular weight distribution, and heat distortion temperature (glass transition temperature). In the steps of the uniaxial extension in the longitudinal direction and the uniaxial extension in the width direction, the compound (C) can be controlled by selecting the set temperature in the oven, selecting the stretching ratio, and extending the speed -59-201027140 degrees. The alignment characteristics of the optically anisotropic materials. (Form Pattern Forming Method) In the step (i), a pattern in which a concave portion and a convex portion composed of a composition containing the compound (C) are continuously formed by transfer on at least one surface of the substrate (a') , obtaining the substrate (b). Further, in the step (i), the pattern of the concave portion and the convex portion is continuously formed on the substrate (a'), and is transferred onto the coating film formed of the composition containing the compound (C). A method of forming a pattern in which a concave portion and a convex portion formed of a composition containing the compound (C) are continuously formed on at least one surface of the substrate (a') by, for example, a substrate (a' in the foregoing substrate (a') a method of applying a pattern containing the compound (C) and transferring a pattern in which a concave portion and a convex portion are continuously formed on a coating film formed of the composition containing the compound (D) (hereinafter referred to as a transfer method) A). 〇

轉印法A 轉印法A係先在前述基材（a’）上塗佈包含化合物（C )之組成物後，且利用加熱等之步驟獲得乾燥之塗膜。此 時，塗佈方法可未加限制地採用習知之塗佈方法。具體之 塗佈方法舉例爲例如旋轉塗佈法、模唇塗佈法、柯瑪塗佈 法、輥塗佈法、模嘴塗佈法、摻塗法、浸漬塗佈法、塗佈 棒塗佈法、流延成膜法、凹版塗佈法、印刷法等。其中， -60- 201027140 就厚度精準度及量產性之觀點而言，較好使用柯瑪塗佈法 或凹版塗佈法。 塗佈之包含化合物（C)之塗膜厚度只要可賦予所需 圖型則無特別限制，但爲了確保厚度精準度，較好爲 1~3 0μηι，更好爲1〜20μπι，最好爲1〜1 5μηι。圖型之凹部深 度依使用之雷射波長或使用之材料種類而有不同之設計， 但通常爲1〜ΙΟμηι之範圍。據此，將塗佈材料之厚度控制在 φ 前述之範圍內，一方面確保厚度之精準度，另一方面可不 使用不必要之材料經濟性優異地設計故而較佳。又，圖型 之凸部與凹部之寬度，以L表示凸部之寬度，以S表示凹部 之寬度時，L/S之値較好爲〇.4$ (L/S) ‘0.6，更好爲 0.45$ ( L/S ) S0.55。其中以L=S之情況，亦即凸部之寬 度與凹部之寬度一致之情況最佳。再者凸部之寬度L以 lpmSLSIOpm較佳，更好爲1 μιη S L S 5 μιη，最好爲 1μιη$Ι^3μιη。凹部之寬度S亦以lpmSSSlOpm較佳，更 φ 好爲最好爲選擇該等凸部 之寬度L與凹部之寬度S時，由於可獲得期望之偏光繞射能 故而較隹。 在藉由包含前述化合物（C)之組成物形成之塗膜上 賦予連續形成有凹部與凸部之圖型之方法較好使用連續形 成有凹部與凸部之模具。連續形成有凹部與凸部之模具之 材質只要可製作所需圖型則無特別限制，但較好使用鎳等 金屬製者或矽製造者’或者合成石英等透明者。又，爲了 賦與形狀且與塗膜密著後之脫模良好，因此亦較好在連續 -61 - 201027140 形成有凹部與凸部之模具表面上塗佈氟系或聚矽氧烷系之 脫模劑等進行脫模處理。連續形成有凹部與凸部之模具形 狀只要是平板狀或輥形狀等可製作所需圖型則無特別限制 ，基材爲薄片之型態時’較好使用平板狀之模具，基材爲 輥型態時較好使用平板狀或輥形狀之模具。 至於包含化合物（C)之組成物係使用具有光學異向 性之組成物。又，通常使用光學異向性材料作爲化合物（ c)。 _ 至於前述化合物（C )，就連續且經濟地生產偏光性 繞射元件之觀點而言，較好包含紫外線硬化型液晶。 (包含合物（C)之組成物） 第三樣態之偏光性繞射元件之製造法中包含化合物（ C)之組成物係與第二樣態之偏光性繞射元件之製造法中 之包含化合物（C)之組成物相同。關於溶劑之揮發或添 加量亦與第二樣態之偏光性繞射元件之製造方法中相同》 @ 又，爲了獲得連續形成有由包含化合物（C)之組成 物所構成之凹部與凸部之圖型，於由包含化合物（C)之 組成物形成之塗膜上，較好經紫外線照射，進行前述紫外 線硬化型液晶之紫外線硬化，獲得前述紫外線硬化型液晶 之硬化物（聚合物）。至於進行紫外線硬化時之加熱溫度 及光源係與第二樣態之偏光性繞射元件之製造方法中，對 於由包含化合物（C)之組成物形成之塗膜照射紫外線進 行紫外線硬化時之溫度及光源相同。 -62- 201027140 又，包含化合物（C)之組成物較好添加光聚合起始 劑（光自由基產生劑）。該光聚合起始劑（光自由基產生 劑）及其量係與第二樣態之偏光性繞射元件之製造方法中 ，添加於包含化合物（c)之組成物中之光聚合起始劑（ 光自由基產生劑）及其量相同。 藉由使用包含該等化合物（C)之組成物，源自利用 本發明之製造方法獲得之偏光性繞射元件之凸部之部分具 Φ 有光學異向性。 &lt; (ii)步驟&gt; 本發明之第三樣態之偏光性繞射元件之製造方法所具 有之（Π)步驟爲（ii)在前述基材（b)之具有圖型之面 上塗佈包含化合物（D )之組成物，使前述凹部至少由化 合物（D)所塡充，獲得具有塡充部之基材（c)之步驟。 以（ii)步驟獲得之基材（c)之模式圖示於圖4。再 Φ 者，圖4中僅塡充前述凹部，但實際上在塡充凹部之同時 ’有凸部之上部亦塗佈包含化合物（D)之組成物，於凸 部之上部亦存在化合物（D)之情況。 (Π)步驟係以將前述凹部埋入之方式塗佈包含化合 物（D)之組成物，且藉由前述凹部至少以化合物（d) 塡充而達成。塗佈包含化合物（D)之組成物時之方法並 無特別限制，可未加限制地採用習知之塗佈方法。具體之 塗佈方法舉例爲例如旋轉塗佈法、模唇塗佈法、柯瑪塗佈 法、輥塗佈法、模嘴塗佈法、摻塗法、浸漬塗佈法、塗佈 -63- 201027140 棒塗佈法、流延成膜法、凹版塗佈法、印刷法等。其中， 就厚度精準度及量產性之觀點而言，較好使用柯瑪塗佈法 或凹版塗佈法等。又，亦可在減壓環境下塗佈，以使化合 物（D)更易於塡充前述凹部。 至於包含化合物（D)之組成物係使用具有光學同向 性之組成物。又，通常使用光學同向性材料作爲化合物（ D )。 前述化合物（D)較好包含紫外線硬化型樹脂，但就 @ 自經濟面連續生產偏光性繞射元件之觀點而言更好包含紫 外線硬化型（甲基）丙烯酸樹脂。前述化合物（D)包含 紫外線硬化型樹脂時，通常在獲得基材（c)之際，凹部 至少由化合物（D)所塡充，隨後進行紫外線照射，藉由 使該紫外線硬化樹脂硬化獲得基材（c )。 又，第三樣態之偏光性繞射元件之製造方法中包含化 合物（D)之組成物爲與第二樣態之偏光性繞射元件之製 造方法中之包含化合物（D)之組成物相同。 β 藉由使用該等包含該化合物（D)之組成物，源自利 用本發明之製造方法獲得之偏光性繞射元件之塡充部之部 分具有光學同向性。 又，第三樣態之偏光性繞射元件之製造方法可在前述 偏光性繞射元件之具有塡充部之面上進而任意設有配設由 透明性樹脂（Ε)所構成之基材（e)之步驟。藉由設有該 步驟使偏光性繞射元件之最外層成爲基材（a’）及基材（ e )，就獲得偏光性繞射元件之耐久性及平滑性之方面而 -64- 201027140 言較佳。 至於透明性樹脂（E)可使用於前述透明樹脂（A)所 例示之樹脂，且較好透明樹脂（A )與透明樹脂（E )爲相 同之樹脂。又，基材（e)可使用基材（a)中所例示之基 材。 又，前述之透明樹脂（A)、包含化合物（C)之組成 物、包含化合物（D)之組成物及透明樹脂（E)中可依據 φ 需要，在不損及發明效果之範圍內，添加抗氧化劑、熱安 定劑、光安定劑、紫外線吸收劑、抗靜電劑、消泡劑、界 面活性劑（脫模劑）等習知添加劑。 利用本發明之製造方法獲得之偏光性繞射元件可適當 使用作爲組裝於光讀取裝置等中之光學零件。於使該等雷 射光通過之光學零件中，爲了不使雷射光通過時使雷射光 偏斜，因此要求零件之平滑性。至於該等平滑性之指標係 使用透過波前像差（全面RMS，Xrms )，但利用本發明之 〇 製造方法獲得之偏光性繞射元件由於係使用平滑之基材（ a)或基材（a’），且於其上塗佈材料獲得表面平滑性， 因而可確保充分之平滑性。利用本發明之製造方法獲得之 偏光性繞射元件之透過波前差以例如於DVD波長中光徑 2mm φ之情況之全面RMS値較好爲25ιηλ以下，更好爲20ιηλ 以下，最好爲15ιηλ以下。全面RMS値超過25ιηλ時，由於射 出之雷射光偏斜，使光讀取裝置之讀取性能下降故而不佳 -65- 201027140 &lt;抗反射處理&gt; 利用本發明之第一至第三樣態之製造方法獲得之偏光 性繞射元件爲以（3 )步驟獲得之偏光性繞射元件 '以（ ΙΠ )步驟獲得之基材（d )(第二樣態）、以（U )步驟 獲得之基材（c)(第三樣態）即可，但通常另具有抗反 射層。 利用本發明之製造方法獲得之偏光性繞射元件較好具 有抗反射層。抗反射層可以凹版塗佈、模塗佈、狹縫塗佈 _ 等習知塗佈方法塗佈熱硬化性樹脂組成物或光硬化性樹脂 組成物，且依需要乾燥後，經硬化形成。又，亦可利用濺 鍍或蒸鍍等形成。該等層可設置於以（3)步驟獲得之偏 光性繞射元件（第一樣態）、基材（d )(第二樣態）或 基材（c)(第三樣態）之單面上，亦可設置於兩面上。 又，可預先設於基材（a)(第一、第二樣態）或基材（ a’）（第三樣態）之未形成圖型之面上，亦可設置於基材 (b)之不具有層（B)之面（第二樣態）、基材（c) ( © 第二樣態）或基材（b)(第三樣態）之不具有圖型之面 上。又，亦可設於基材（e)之未形成圖型之面上。 抗反射層通常係由低折射率層形成，另爲了進一步提 高抗反射性能，亦可具有低折射率層與高折射率層之層合 構造，又爲了進一步確保耐擦傷性，亦可具有硬質塗層。 層合順序係由偏光元件之最外層側起，較好依硬質塗層/ 高折射率層/低折射率層之順序層合。另依據需要，在低 折射率層與高折射率層之間或者硬質塗層與高折射率層之 -66- 201027140 間亦可具有中折射率層。 至於用以形成低折射率層及高折射率層之組成物舉例 爲習知之硬化性組成物。例如，含有一種以上之環氧系樹 脂、酚系樹脂、三聚氰胺系樹脂、醇酸系樹脂、氰酸酯系 樹脂、丙烯酸系樹脂、聚酯系樹脂、胺基甲酸酯系樹脂、 矽氧樹脂等作爲結合劑樹脂，再者，形成低折射率層用組 成物含有含氟化合物，形成高折射率層用組成物含有高折 φ 射率之無機粒子，例如氧化矽、氧化鋁、氧化鈦、氧化锆 、氧化铈、氧化銃、氟化鎂等金屬氧化物粒子。 低折射率層及高折射率層之折射率及厚度可在習知範 圍內使用，但爲了提高對所使用波長之抗反射效果，低折 射率層之折射率（25°C，於波長589nm之平均折射率）較 好爲1·45以下，低折射率層之厚度較好爲50〜300nm。又， 高折射率層之折射率（25°C，於波長589nm之平均折射率 )較好比低折射率層之折射率大0.05以上之折射率，厚度 較好爲 50~10,000nm。 &lt;本發明（樣態B ) &gt; 本發明之偏光性繞射元件之製造方法爲具有下列步驟 之偏光性繞射元件之製造方法：（I )於基板（a )之至少 —面上，利用轉印而形成連續形成有凹部與凸部之圖型， 獲得構件（b )之步驟，（II )使前述凹部至少由化合物（ C)所塡充，獲得具有塡充部之構件（c)之步驟，及（III )使構件（c)延伸，獲得構件（d)之步驟，其特徵爲偏 -67- 201027140 光性繞射元件中，源自前述凸部之部份及源自前述塡充部 之部分之一方具有光學同向性，另一方具有學異向性。 又，（I)於基板（a)之至少一面上，利用轉印而形 成連續形成有凹部與凸部之圖型，獲得構件（b)之步驟 稱爲（I)步驟，（II)使前述凹部至少由化合物（C)所 塡充，獲得具有塡充部之構件（c)之步驟稱爲（II)步驟 ’ （III )使構件（c )延伸，獲得構件（d )之步驟稱爲（ III)步驟。 ❹ (I )步驟中，利用轉印於基板（a )之至少一面上形 成連續形成有前述凹部與凸部之圖型之方法大致上分成兩 種樣態。亦即，藉由直接轉印，在前述基板（a )之至少 一面上形成連續形成有前述凹部與凸部之圖型之樣態，及 於前述基板（a)上塗佈包含化合物（B)之組成物，獲得 由該組成物形成之塗膜後，於該塗膜上轉印形成連續形成 有前述凹部與凸部之圖型之樣態。 又，利用如前述之本發明之製造方法獲得之偏光性繞 © 射元件中，源自前述凸部之部分與源自前述塡充部之部分 之一方具有光學同向性，另一方具有光學異向性。亦即， 以本發明之製造方法獲得之偏光性繞射元件於源自前述凸 部之部分具有光學同向性，源自前述塡充部之部分具有光 學異向性，或源自前述凸部之部分具有光學異向性，源自 前述塡充部之部分具有光學同向性。 &lt; (I)步驟&gt; -68- 201027140 本發明之偏光性繞射元件之製造方法所具有之（I) 步驟係（I )於基板（a)之至少一面上，利用轉印而形成 連續形成有凹部與凸部之圖型，而獲得構件（b)之步驟 〇 以該步驟獲得之構件（b)爲於至少一面上具有連續 形成有凹部與凸部之圖型之構件。構件（b)之模式圖示 於圖7。 φ 又，本發明所用之基板（a )通常係由下樹脂透明樹 脂（A)構成，且較好由熱可塑性樹脂構成，更好由環狀 烯烴系樹脂構成。 (透明樹脂（A )) 作爲前述透明樹脂（A )只要是使用利用本發明之製 造方法獲得之偏光性繞射元件時之雷射波長爲透明者則無 特別限制。 © 至於透明樹脂（A)可使用例如三乙醯基纖維素（ TAC) 、PMMA、PS、PC、PES、PSU、環狀烯烴系樹脂等 熱可塑性樹脂、紫外線硬化型樹脂等。至於透明樹脂（A )通常使用光學同向性材料。又，本發明中之光學同向性 材料在經歷後述之加熱延伸步驟之情況下嚴格而言僅展現 少許光學異向性。然而，該光學同向性材料之雙折射値爲 後述之光學異向性材料之雙折射値之十分之一以下，在與 後述之光學異向性材料相對比較之下，可認爲是同向性材 料0 -69- 201027140 本發明之偏光性繞射元件之製造方法，在（III)步驟 中，爲進行延伸，透明樹脂（A)要求有在延伸之際可對 應於設定之延伸倍率而伸長。又，延伸通常係在加熱下進 行。又，在加熱下進行之延伸亦稱爲加熱延伸。 爲進行加熱延伸，作爲透明樹脂（A )通常使用具有 熱變形溫度之熱可塑性樹脂，但亦可使用適當調製構造而 成之紫外線硬化樹脂。至於紫外線硬化樹脂可使用例如後 述之紫外線硬化型（甲基）丙烯酸樹脂。 參 其中作爲透明樹脂（A )，就耐熱性及耐久性以及加 工性之觀點而言，以環狀烯烴系樹脂較佳。至於環狀烯烴 系樹脂，於成爲熱變形溫度指標之玻璃轉移溫度（Tg )通 常爲90〜200°C，較好爲100〜190°C，更好爲110〜180〇C。Tg 超過110 °C以上時，由於所得之偏光性繞射元件具有優要 之耐熱性故而較佳。Tg未達90 °C時，由於熱變形溫度變低 ，因此有耐熱性產生問題之虞，又，有所得薄膜因溫度而 產生光學特性變化大之問題。另一方面，Tg超過200。&lt;：時 ® ’加工成薄膜形狀時會有因氧化劣化引起著色之光學特性 下降之問題，延伸加工等之際加工溫度太高時，有進行（ III)步驟時使用之構件（c)劣化之情況。 本文中所謂玻璃轉移溫度（Tg)係使用示差掃描熱量 計（DSC) ’在升溫速度20°C/分鐘，於氮氣氛圍中測定時 獲得之微分示差掃描熱量曲線之對示差掃描熱量曲線上之 最大峰値溫度（A點）及比最大峰値溫度-20°C之溫度（B 點）作圖’以B點作爲起點之基準線上之接線與以A點作爲 -70- 201027140 起點之接線之交叉點求得。 (基板（a)) 本發明中所用之基板（a)通常係由前述透明樹脂（A )所構成。 本發明所用之基板（a)可爲薄片型態，亦可在長度 方向具有長條之型態。在長度方向具有長條型態之所謂輥 ❹ 形狀之情況，就連續生產性之觀點而言更好，但亦較好在 成爲輥形狀後進行裁斷成爲薄片之型態。又，基板（a) 由於爲由前述透明樹脂（A)所構成之基板，因此相較於 玻璃基板或結晶基板較柔軟，可輕易成爲輥形狀而較佳， 又由於可以沖壓等加工成爲所需形狀故而較佳。成爲輥形 狀時基板（a)之寬度並無特別限制，但鑑於工業操作性 ，較好爲300〜2200 mm，更好爲500〜1 500mm。若寬度窄於 30 0mm時，就經的生產性之觀點而言並不佳，當寬度寬於 〇 22〇Omm時，由於製造所用之裝置需大型化，因此在實際 生產上變得沒有效率故而不佳。又，基板（a)之厚度只 要可維持作爲光學零件之型態則無特別限制，但輥形狀之 情況下較好爲10〜500μιη，更好爲50〜300μπι，最好爲 80~200μιη。厚度未達30μιη時作爲基板之剛性變弱故而不 佳，厚度超過300 μιη時，除難以成爲輥之形狀以外，由於 成爲輥形狀時會使卷長度縮短，造成連續生產性下降故而 不佳。另外，由於進行沖壓等加工時會產生毛邊，容易產 生龜裂故而不佳。又，基板（a)爲輥形狀時，較好爲於 -71 - 201027140 長度方向至少3m以上連續之輥形狀之基板’最好爲於長度 方向至少50m以上連續之輥形狀之基板。長度之上限鑒於 工業上之操作性，較好在3〇〇〇m以下’更好在2000m以下 。比3000m長時，輕直徑或棍重量增加使製造所用之裝置 大型化，因此在實際生產上變得沒有效率而不佳。 另外，基板（a)成爲薄片之型態時’鑒於工業操作 性，寬度及長度設爲3〜100cm較佳’更好爲5~80cm。再者 ，寬及長並不須一致’只要設定成適宜加工之大小即可。 ® 例如，在具有A4大小之薄片型態時成爲21 cm X 30 cm之大 小。薄片之情況下’寬度與長度未達3cm時’由於缺乏工 業生產性而不適當，寬度與長度超過100(：111時，裝置大型 化而欠缺加工性，且缺乏生產性故而不佳。 (形成圖型之方法） (I)步驟中，係於前述基板（a)之至少一面上，利 用轉印而形成連續形成有凹部與凸部之圖型’而獲得構件 ® (b )。形成該圖形之方法舉例爲例如可直接轉印在前述 基板（a)之至少一面上，或者於前述基板（a)上塗佈包 含化合物（B )之組成物，獲得由該組成物形成之塗膜後 ，於該塗膜上轉印圖型之方法等。亦即’藉由直接轉印’ 在前述基板（a)之至少一面上形成連續形成有前述凹部 與凸部之圖型之樣態，及於前述基板（a)上塗佈包含化 合物（B )之組成物，獲得由該組成物形成之塗膜後’於 該塗膜上轉印形成連續形成有前述凹部與凸部之圖型之樣 -72- 201027140 態。 在由前述透明樹脂（A)所構成之基板（a)上直接轉 印連續形成有凹部與凸部之圖型而成之構件（b)之模式 圖示於圖7(a)，於由前述透明樹脂（A)所構成之基板 (a)上塗佈包含化合物（B)之組成物，獲得由該組成物 形成之塗膜後，於該塗膜上轉印該圖型而成之構件（b) 之模式圖示於圖7(b)。 @ 藉由轉印，在前述基板（a)之至少一面上形成連續 形成有凹部與凸部之圖型之方法舉例爲於前述基板（a) 本身上轉印連續形成有凹部與凸部之圖型之方法（以下稱 爲轉印法B)，或於前述基板（a)上塗佈包含化合物（B )之組成物，且於由該組成物形成之塗膜上轉印連續形成 有凹部與凸部之圖型之方法（以下稱爲轉印法A)。 再者，以（I)步驟獲得之構件（b)所具有之圖型之 凸部與凹部之寬度，以L表示凸部之寬度，以S表示凹部之 φ 寬度時，L/(L + S)之値較好爲 0.4S{L/(L+S) }$0.6, 更好爲0.45 S {L/ ( L + S ) }$0.55。其中以L = S之情況，亦 即凸部之寬度與凹部之寬度一致之情況最佳。再者凸部之 寬度L以lpmSLSIOgm較佳，更好爲lpm$LS5pm，最好 爲1μηι$Ι^$3μιη。凹部之寬度S亦以lpmSS客ΙΟμιη較佳， 更好爲1μιη$3$5μιη，最好爲選擇該等凸 部之寬度L與凹部之寬度S時，由於可獲得所需之偏光繞射 能故而較佳。又，圖型之凹部深部依據使用之雷射波長或 使用之材料種類而有不同之設計，但通常爲1〜ΙΟμπι之範圍 -73- 201027140Transfer Method A The transfer method A is a method in which a composition containing the compound (C) is applied onto the substrate (a'), and a dried coating film is obtained by a step of heating or the like. At this time, the coating method can employ a conventional coating method without limitation. Specific coating methods are, for example, a spin coating method, a lip coating method, a komal coating method, a roll coating method, a die coating method, a doping method, a dip coating method, and a coating bar coating method. Method, casting film forming method, gravure coating method, printing method, and the like. Among them, -60- 201027140, in terms of thickness accuracy and mass productivity, it is preferred to use a gamma coating method or a gravure coating method. The thickness of the coating film containing the compound (C) to be coated is not particularly limited as long as it can impart a desired pattern, but in order to secure the thickness accuracy, it is preferably 1 to 30 μm, more preferably 1 to 20 μm, and most preferably 1 ~1 5μηι. The depth of the recess of the pattern varies depending on the wavelength of the laser used or the type of material used, but is usually in the range of 1 to ΙΟμηι. Accordingly, the thickness of the coating material is controlled within the range of φ described above, and on the other hand, the accuracy of the thickness is ensured, and on the other hand, it is preferable to design without using an unnecessary material economy. Further, the width of the convex portion and the concave portion of the pattern indicates the width of the convex portion by L, and when S indicates the width of the concave portion, the L/S is preferably 〇.4$ (L/S) '0.6, more preferably It is 0.45$ ( L/S ) S0.55. Among them, L = S, that is, the width of the convex portion is the same as the width of the concave portion. Further, the width L of the convex portion is preferably lpmSLSIOpm, more preferably 1 μηη S L S 5 μιη, and most preferably 1 μιη$Ι^3μιη. The width S of the concave portion is also preferably lpmSSS10pm, and it is preferable that the width L of the convex portion and the width S of the concave portion are selected in order to obtain a desired polarization diffracting energy. In the method of continuously forming the pattern of the concave portion and the convex portion on the coating film formed of the composition containing the compound (C), it is preferred to use a mold in which the concave portion and the convex portion are continuously formed. The material of the mold in which the concave portion and the convex portion are continuously formed is not particularly limited as long as the desired pattern can be produced. However, it is preferable to use a metal such as nickel or a niobium manufacturer or a transparent person such as synthetic quartz. Further, in order to impart a shape and a good mold release after adhesion to the coating film, it is also preferred to apply a fluorine-based or polyoxyalkylene-based coating to the surface of the mold in which the concave portion and the convex portion are formed continuously from -61 to 201027140. The mold agent or the like is subjected to mold release treatment. The shape of the mold in which the concave portion and the convex portion are continuously formed is not particularly limited as long as it is a flat shape or a roll shape. When the substrate is in the form of a sheet, it is preferable to use a flat mold, and the substrate is a roll. A flat or roll-shaped mold is preferably used in the form. As the composition containing the compound (C), a composition having optical anisotropy is used. Further, an optically anisotropic material is usually used as the compound (c). The above compound (C) preferably contains an ultraviolet curable liquid crystal from the viewpoint of continuously and economically producing a polarizing diffractive element. (Including the composition of the compound (C)) The third aspect of the method for producing a polarizing diffractive element includes a composition of the compound (C) and a method of manufacturing the polarizing diffractive element of the second aspect. The composition containing the compound (C) is the same. The volatilization or addition amount of the solvent is also the same as in the manufacturing method of the polarizing diffractive element of the second aspect. @ Further, in order to obtain a concave portion and a convex portion which are formed by continuously forming a composition containing the compound (C) In the coating film formed of the composition containing the compound (C), it is preferred to perform ultraviolet curing of the ultraviolet curable liquid crystal by ultraviolet irradiation to obtain a cured product (polymer) of the ultraviolet curable liquid crystal. In the method for producing a polarizing diffraction element in which the heating temperature and the light source are the same as in the second embodiment, the temperature of the ultraviolet ray hardening is applied to the coating film formed of the composition containing the compound (C). The light source is the same. Further, a composition containing the compound (C) is preferably added with a photopolymerization initiator (photoradical generator). The photopolymerization initiator (photoradical generator) and the amount thereof and the method for producing a polarizing diffraction element of the second aspect, which are added to the photopolymerization initiator containing the composition of the compound (c) (Photoradical generator) and the same amount. By using the composition containing the compound (C), the portion derived from the convex portion of the polarizing diffractive element obtained by the production method of the present invention has optical anisotropy. &lt;(ii) Step&gt; The method of manufacturing the polarizing diffractive element of the third aspect of the present invention has (ii) a step of coating the surface of the substrate (b) The cloth comprises a composition of the compound (D), and the concave portion is filled with at least the compound (D) to obtain a substrate (c) having a filling portion. A schematic diagram of the substrate (c) obtained in the step (ii) is shown in FIG. In the case of Φ, only the concave portion is filled in FIG. 4, but actually, the composition containing the compound (D) is applied to the upper portion of the convex portion while the concave portion is filled, and the compound is also present on the upper portion of the convex portion (D). ) The situation. The step (涂布) is carried out by applying the composition containing the compound (D) so as to embed the concave portion, and at least the compound (d) is filled by the concave portion. The method of coating the composition containing the compound (D) is not particularly limited, and a conventional coating method can be employed without limitation. Specific coating methods are exemplified by, for example, spin coating method, lip coating method, gamma coating method, roll coating method, die coating method, doping method, dip coating method, coating-63- 201027140 Bar coating method, casting film forming method, gravure coating method, printing method, and the like. Among them, the gamma coating method or the gravure coating method is preferably used from the viewpoint of thickness precision and mass productivity. Further, it may be applied under a reduced pressure atmosphere to make it easier for the compound (D) to fill the concave portion. As the composition containing the compound (D), a composition having optical tropism is used. Further, an optically isotropic material is usually used as the compound (D). The compound (D) preferably contains an ultraviolet curable resin, but more preferably contains an ultraviolet curable (meth)acrylic resin from the viewpoint of continuously producing a polarizing diffractive element from an economical surface. When the compound (D) contains an ultraviolet curable resin, usually, when the substrate (c) is obtained, the concave portion is filled with at least the compound (D), followed by ultraviolet irradiation, and the ultraviolet curable resin is cured to obtain a substrate. (c). Further, in the method for producing a polarizing diffractive element of the third aspect, the composition of the compound (D) is the same as the composition containing the compound (D) in the method for producing the polarizing diffractive element of the second aspect. . β By using the composition containing the compound (D), the portion derived from the filling portion of the polarizing diffractive element obtained by the production method of the present invention has optical anisotropy. Further, in the third aspect of the method for producing a polarizing diffractive element, a substrate made of a transparent resin may be disposed on the surface of the polarizing diffractive element having the squeezing portion. e) steps. By providing this step, the outermost layer of the polarizing diffractive element becomes the substrate (a') and the substrate (e), and the durability and smoothness of the polarizing diffractive element are obtained. -64 - 201027140 Preferably. The transparent resin (E) can be used for the resin exemplified for the above transparent resin (A), and it is preferred that the transparent resin (A) and the transparent resin (E) are the same resin. Further, as the substrate (e), the substrate exemplified in the substrate (a) can be used. Further, the transparent resin (A), the composition containing the compound (C), the composition containing the compound (D), and the transparent resin (E) may be added in accordance with φ, without impairing the effects of the invention. Conventional additives such as antioxidants, thermal stabilizers, photosensitizers, ultraviolet absorbers, antistatic agents, antifoaming agents, surfactants (release agents). The polarizing diffractive element obtained by the production method of the present invention can be suitably used as an optical component incorporated in an optical reading device or the like. In the optical component through which the laser light passes, the smoothness of the component is required in order to deflect the laser light without passing the laser light. As for the indicators of the smoothness, the wavefront aberration (full RMS, Xrms) is used, but the polarizing diffractive element obtained by the crucible manufacturing method of the present invention uses a smooth substrate (a) or a substrate ( a'), and the material is coated thereon to obtain surface smoothness, thereby ensuring sufficient smoothness. The total RMS 透过 of the transmission wavefront difference of the polarizing diffractive element obtained by the manufacturing method of the present invention is, for example, 2 mm φ in the DVD wavelength, preferably 25 ηηλ or less, more preferably 20 ηηλ or less, and most preferably 15 ηηλ. the following. When the full RMS 値 exceeds 25 η λ, the readout performance of the optical reading device is degraded due to the deflection of the emitted laser light. -65-201027140 &lt;Anti-reflection treatment&gt; Using the first to third aspects of the present invention The polarizing diffractive element obtained by the manufacturing method is the substrate (d) (second state) obtained by the (d) step of the polarizing diffractive element obtained in the step (3), obtained by the (U) step. The substrate (c) (third state) may be, but usually has an antireflection layer. The polarizing diffractive element obtained by the production method of the present invention preferably has an antireflection layer. The antireflection layer can be coated with a thermosetting resin composition or a photocurable resin composition by a conventional coating method such as gravure coating, die coating, or slit coating, and dried as needed to be formed by curing. Further, it may be formed by sputtering or vapor deposition. The layers may be disposed in a single order of the polarizing diffractive element (the first state), the substrate (d) (the second state) or the substrate (c) (the third state) obtained in the step (3) On the surface, it can also be placed on both sides. Moreover, it may be provided in advance on the unformed surface of the substrate (a) (first and second states) or the substrate (a') (third state), or may be provided on the substrate (b) The surface without the layer (B) (second state), the substrate (c) (© second state) or the substrate (b) (third state) has no pattern. Further, it may be provided on the surface of the substrate (e) on which the pattern is not formed. The antireflection layer is usually formed of a low refractive index layer, and may have a laminated structure of a low refractive index layer and a high refractive index layer in order to further improve antireflection performance, and may also have a hard coating in order to further ensure scratch resistance. Floor. The lamination sequence is carried out from the outermost layer side of the polarizing element, preferably in the order of the hard coat layer/high refractive index layer/low refractive index layer. Further, depending on the need, a medium refractive index layer may be provided between the low refractive index layer and the high refractive index layer or between -66 and 201027140 of the hard coat layer and the high refractive index layer. As the composition for forming the low refractive index layer and the high refractive index layer, a conventional hardening composition is exemplified. For example, it contains one or more types of epoxy resin, phenol resin, melamine resin, alkyd resin, cyanate resin, acrylic resin, polyester resin, urethane resin, and oxime resin. Further, as a binder resin, the composition for forming a low refractive index layer contains a fluorine-containing compound, and the composition for a high refractive index layer contains inorganic particles having a high refractive index, such as cerium oxide, aluminum oxide, or titanium oxide. Metal oxide particles such as zirconium oxide, cerium oxide, cerium oxide, and magnesium fluoride. The refractive index and thickness of the low refractive index layer and the high refractive index layer can be used within the conventional range, but in order to improve the antireflection effect on the wavelength used, the refractive index of the low refractive index layer (25 ° C, at a wavelength of 589 nm) The average refractive index is preferably 1.45 or less, and the thickness of the low refractive index layer is preferably from 50 to 300 nm. Further, the refractive index of the high refractive index layer (25 ° C, average refractive index at a wavelength of 589 nm) is preferably a refractive index larger than the refractive index of the low refractive index layer by 0.05 or more, and the thickness is preferably from 50 to 10,000 nm. &lt;The present invention (Pattern B) &gt; The method for producing a polarizing diffractive element of the present invention is a method for producing a polarizing diffractive element having the following steps: (I) at least on the surface of the substrate (a), Forming a pattern in which a concave portion and a convex portion are continuously formed by transfer, obtaining a member (b), and (II) filling the concave portion with at least a compound (C) to obtain a member having a filling portion (c) a step of (III) extending the member (c) to obtain the member (d), characterized by a partial-67-201027140 optical diffraction element, a portion derived from the convex portion and derived from the foregoing One part of the filling part has optical anisotropy and the other side has an anisotropy. Further, (I) a pattern in which a concave portion and a convex portion are continuously formed by transfer on at least one surface of the substrate (a), a step of obtaining the member (b) is referred to as a step (I), and (II) is performed as described above. The recess is filled with at least the compound (C), and the step of obtaining the member (c) having the filling portion is referred to as (II) step '(III) for extending the member (c), and the step of obtaining the member (d) is called ( III) Steps. In the step (I), the method of forming the pattern in which the concave portion and the convex portion are continuously formed on at least one surface of the substrate (a) is roughly divided into two types. That is, by direct transfer, a pattern in which the concave portion and the convex portion are continuously formed is formed on at least one surface of the substrate (a), and the compound (B) is coated on the substrate (a). After the coating film formed of the composition is obtained, the composition is transferred onto the coating film to form a pattern in which the concave portion and the convex portion are continuously formed. Further, in the polarizing-wound imaging element obtained by the above-described manufacturing method of the present invention, the portion derived from the convex portion has optical anisotropy with one of the portions derived from the aforementioned filling portion, and the other has optical difference Directional. That is, the polarizing diffractive element obtained by the manufacturing method of the present invention has optical anisotropy in a portion derived from the convex portion, and an optical anisotropy derived from a portion derived from the above-mentioned expanding portion, or derived from the convex portion The portion has optical anisotropy, and the portion derived from the aforementioned portion has optical anisotropy. &lt;(I) Step&gt; -68- 201027140 The method for producing a polarizing diffractive element of the present invention has (I) a step (I) formed on at least one side of the substrate (a) by transfer to form a continuous The pattern in which the concave portion and the convex portion are formed, and the step of obtaining the member (b), the member (b) obtained in this step is a member having a pattern in which the concave portion and the convex portion are continuously formed on at least one side. The mode diagram of component (b) is shown in Figure 7. φ Further, the substrate (a) used in the present invention is usually composed of a lower resin transparent resin (A), preferably a thermoplastic resin, and more preferably a cyclic olefin resin. (Transparent Resin (A)) The transparent resin (A) is not particularly limited as long as it is transparent when the polarizing diffraction element obtained by the production method of the present invention is used. © As the transparent resin (A), for example, a thermoplastic resin such as triethylenesulfonyl cellulose (TAC), PMMA, PS, PC, PES, PSU or a cyclic olefin resin, or an ultraviolet curable resin can be used. As the transparent resin (A), an optically isotropic material is usually used. Further, the optically isotropic material of the present invention exhibits only a slight degree of optical anisotropy in the case of undergoing the heat extension step described later. However, the birefringence 値 of the optically isotropic material is one tenth or less of the birefringence 値 of the optically anisotropic material to be described later, and can be regarded as the same as compared with the optically anisotropic material described later. The directional material 0-69-201027140 The method for producing a polarizing diffractive element according to the present invention, in the step (III), in order to carry out the stretching, the transparent resin (A) is required to have a stretching ratio corresponding to the setting while extending. elongation. Again, the extension is usually carried out under heating. Also, the extension performed under heating is also referred to as heating extension. For the purpose of heat extension, a thermoplastic resin having a heat distortion temperature is usually used as the transparent resin (A), but an ultraviolet curable resin may be used in a suitably prepared structure. As the ultraviolet curable resin, for example, an ultraviolet curable (meth)acrylic resin to be described later can be used. In the case of the transparent resin (A), a cyclic olefin resin is preferred from the viewpoint of heat resistance, durability, and workability. The cyclic olefin resin has a glass transition temperature (Tg) which is an index of heat distortion temperature of usually 90 to 200 ° C, preferably 100 to 190 ° C, more preferably 110 to 180 ° C. When the Tg exceeds 110 °C or more, the obtained polarizing diffractive element is preferable because it has excellent heat resistance. When the Tg is less than 90 °C, the heat distortion temperature is lowered, so that there is a problem in heat resistance, and the film has a large change in optical characteristics due to temperature. On the other hand, the Tg exceeds 200. &lt;:时时® When there is a film shape, there is a problem that the optical characteristics of coloring are deteriorated due to oxidative degradation, and when the processing temperature is too high during the stretching process or the like, the member (c) used in the step (III) is deteriorated. The situation. The glass transition temperature (Tg) used herein is the maximum differential scanning calorimetry curve obtained by using a differential scanning calorimeter (DSC) 'measured at a heating rate of 20 ° C / min and measured in a nitrogen atmosphere. The peak temperature (point A) and the temperature above the maximum peak temperature of -20 °C (point B) are plotted as the intersection of the wiring on the reference line with point B as the starting point and the wiring with the point A as the starting point of -70-201027140. Click for it. (Substrate (a)) The substrate (a) used in the present invention is usually composed of the above transparent resin (A). The substrate (a) used in the present invention may be in the form of a sheet or may have a long strip shape in the longitudinal direction. In the case of a so-called roll shape having a long strip shape in the longitudinal direction, it is more preferable from the viewpoint of continuous productivity, but it is also preferable to cut into a sheet shape after being formed into a roll shape. Further, since the substrate (a) is a substrate made of the transparent resin (A), it is softer than the glass substrate or the crystal substrate, and can be easily formed into a roll shape, and can be processed by press processing or the like. The shape is preferred. The width of the substrate (a) when it is in the form of a roll is not particularly limited, but is preferably 300 to 2,200 mm, more preferably 500 to 1,500 mm, in view of industrial workability. If the width is narrower than 30 mm, it is not good from the viewpoint of productivity. When the width is wider than 〇22〇Omm, since the device used for manufacturing needs to be enlarged, it becomes inefficient in actual production. Not good. Further, the thickness of the substrate (a) is not particularly limited as long as it can be maintained as an optical member, but in the case of a roll shape, it is preferably 10 to 500 μm, more preferably 50 to 300 μm, and most preferably 80 to 200 μm. When the thickness is less than 30 μm, the rigidity of the substrate is not so good, and when the thickness exceeds 300 μm, it is difficult to form a roll shape, and the roll length is shortened when the roll shape is formed, which causes a decrease in continuous productivity and is not preferable. In addition, since burrs are generated during processing such as pressing, cracking is likely to occur, which is not preferable. Further, when the substrate (a) has a roll shape, it is preferably a substrate having a roll shape of at least 3 m or more in the longitudinal direction of -71 - 201027140. The substrate ‘ is preferably a roll having a continuous roll shape of at least 50 m in the longitudinal direction. The upper limit of the length is preferably below 3 〇〇〇m, and more preferably below 2000 m, in view of industrial operability. When it is longer than 3000 m, the increase in the weight of the light diameter or the weight of the stick makes the apparatus used for manufacturing large, and thus it becomes inefficient in actual production. Further, when the substrate (a) is in the form of a sheet, the width and length are preferably 3 to 100 cm, more preferably 5 to 80 cm, in view of industrial workability. Furthermore, the width and length do not have to be the same ‘just set to a size suitable for processing. ® For example, it has a size of 21 cm X 30 cm when it has a sheet shape of A4 size. In the case of a sheet, when the width and length are less than 3 cm, it is not suitable due to lack of industrial productivity, and when the width and length exceed 100 (: 111, the apparatus is large in size and lacks workability, and lacks productivity, which is not preferable. In the step (I), on the one side of the substrate (a), a pattern of a concave portion and a convex portion is continuously formed by transfer to obtain a member® (b). The pattern is formed. For example, the method may be directly transferred onto at least one surface of the substrate (a), or a composition containing the compound (B) may be applied onto the substrate (a) to obtain a coating film formed of the composition. a method of transferring a pattern on the coating film, that is, a pattern in which the concave portion and the convex portion are continuously formed on at least one surface of the substrate (a) by "direct transfer", and The substrate (a) is coated with a composition containing the compound (B), and after obtaining a coating film formed of the composition, 'transfers on the coating film to form a pattern in which the concave portion and the convex portion are continuously formed - 72- 201027140 state. In the above transparent resin A schematic diagram of a member (b) in which a pattern in which a concave portion and a convex portion are continuously formed is directly transferred onto a substrate (a) (A) is shown in Fig. 7(a), and the transparent resin (A) is used. A pattern of the member (b) obtained by applying the composition of the compound (B) to the substrate (a), and obtaining a coating film formed of the composition, and transferring the pattern onto the coating film 7(b) is shown in Fig. 7. By the transfer, a method of forming a pattern in which a concave portion and a convex portion are continuously formed on at least one surface of the substrate (a) is exemplified as continuous transfer on the substrate (a) itself. a method of forming a pattern of a concave portion and a convex portion (hereinafter referred to as a transfer method B), or coating a composition containing the compound (B) on the substrate (a), and forming a coating film from the composition a method of continuously forming a pattern in which a concave portion and a convex portion are formed (hereinafter referred to as a transfer method A). Further, the convex portion and the concave portion of the pattern having the member (b) obtained in the step (I) The width, L indicates the width of the convex portion, and S indicates the width φ of the concave portion, and the value of L/(L + S) is preferably 0.4S{L/(L+S) }$0.6, more preferably 0.45 S { L/ ( L + S) }$0.55, wherein L = S, that is, the width of the convex portion is the same as the width of the concave portion. Further, the width L of the convex portion is preferably lpmSLSIOgm, more preferably lpm$LS5pm, preferably 1μηι$Ι^$3μιη. The width S of the concave portion is also preferably lpmSS ΙΟμιη, more preferably 1μιη$3$5μιη, preferably when the width L of the convex portion and the width S of the concave portion are selected, It is better to use polarized diffraction, and the depth of the concave portion of the pattern is different depending on the wavelength of the laser used or the type of material used, but usually ranges from 1 to ΙΟμπι -73- 201027140

轉印法B 轉印法B爲在基板（a)自身上轉印連續形成有凹部與 凸部之圖型。至於轉印之方法，較佳爲一邊將基板（a) 加熱至熱變形溫度以上一邊壓著預先準備之連續形成有凹 部與凸部之模具之方法（壓製成形法）。至於壓著之手段 較好使用利用平板狀模具處理薄片之基板（a)之手段， @ 或使用輥形狀之模具連續處理輥形狀之基板（a)之手段 ’或使用平板狀之模具一邊間歇性輸送輥形狀之基板（a )一邊連續批式處理之手段等。至於模具，較好使用連續 形成有凹部及凸部者。至於連續形成有凹部與凸部之模具 之材質只要可製作所需圖型則無特別限制，但較好使用鎳 等金屬製者或矽製造者，或者合成石英等透明者。又，爲 了賦與形狀且爲了與塗膜密著後之脫模良好，亦較好在連 續形成有凹部與凸部之模具表面上進行塗佈氟系或聚矽氧 〇 烷系之脫模劑等之脫模處理。連續形成有凹部與凸部之模 具形狀只要是平板狀或輥形狀等之可製作所需圖型則無特 別限制，基材爲薄片之型態時，較好使用平板狀之模具，Transfer Method B The transfer method B is a pattern in which a concave portion and a convex portion are continuously formed on the substrate (a) itself. In the method of transferring, it is preferable to press a mold (press molding method) in which a concave portion and a convex portion are formed in advance while heating the substrate (a) to a temperature higher than the heat distortion temperature. As for the pressing means, it is preferable to use a means for treating the substrate (a) of the sheet by a flat mold, @ or a method of continuously treating the substrate (a) of the roll shape using a roll-shaped mold or intermittently using a flat mold. A means for continuously carrying out batch processing of the substrate (a) of the transport roll shape. As for the mold, it is preferred to use a concave portion and a convex portion continuously. The material of the mold in which the concave portion and the convex portion are continuously formed is not particularly limited as long as the desired pattern can be produced. However, it is preferable to use a metal such as nickel or a niobium manufacturer, or a transparent such as synthetic quartz. Further, in order to impart a shape and to release the film after adhesion to the coating film, it is also preferred to apply a fluorine- or polyoxynonane-based release agent to the surface of the mold on which the concave portion and the convex portion are continuously formed. Wait for the release treatment. The shape of the mold in which the concave portion and the convex portion are continuously formed is not particularly limited as long as it is a flat shape or a roll shape, and when the substrate is in the form of a sheet, a flat mold is preferably used.

基材爲輥型態時較好使用平板狀或輥形狀之模具。 轉印法A 轉印法A係先在前述基板（a)上塗佈包含化合物（B )之組成物。此時，塗佈方法可未限制地採用習知之塗佈 -74- 201027140 方法。具體之塗佈方法舉例爲例如旋轉塗佈法、模唇塗佈 法、珂瑪塗佈法、輥塗佈法、模嘴塗佈法、摻塗法、浸漬 塗佈法、塗佈棒塗佈法、流延成膜法、凹版塗佈法、印刷 法等。其中，就厚度精準度及量產性之觀點而言，較好使 用柯瑪塗佈法或凹版塗佈法。 塗佈材料之厚度只要可賦予所需圖型則無特別限制， 但爲了確保厚度精準度，較好爲1~30μιη，更好爲1~20μπι φ ’最好爲1〜15μιη。圖型之凹部深度依使用之雷射波長或使 用之材料種類而有不同之設計，但通常爲1〜ΙΟμίη之範圍》 據此’藉由將塗佈材料之厚度控制在前述範圍內，一方面 確保厚度之精準度，另一方面可不使用不必要之材料經濟 性優異的設計故而較佳。 塗佈材料在適度經歷藉由加熱之處理等之後，成爲供 於圖型形成之塗膜。 對由前述材料形成之塗膜賦予連續形成有凹部與凸部 〇 之圖型之方法較好使用連續形成有凹部與凸部之模具。連 續形成有凹部與凸部之模具之材質只要可製作所需圖型則 無特別限制’但較好使用鎳等金屬製者或矽製造者，或者 合成石英等透明者。又，爲了賦與形狀且爲了與塗膜密著 後之脫模良好’亦較好在連續形成有凹部與凸部之模具表 面上塗佈氟系或聚矽氧烷系之脫模劑等進行脫模處理。連 續形成有凹部與凸部之模具形狀只要是平板狀或輥形狀等 之可製作所需圖型則無特別限制，基板爲薄片之型態時， 較好使用平板狀模具’基板爲輥型態時較好使用平板狀或 -75- 201027140 輥形狀之模具。 (包含化合物（B )之組成物） (I)步驟中，在前述基板（a)上塗佈包含化合物（ B)之組成物，獲得由該組成物形成之塗膜後，將前述連 續形成有凹部與凸部之圖型轉印於該塗膜上而形成時，包 含化合物（B )之組成物並無特別限制，於源自前述凸部 之部分具有光學同向性、源自前述塡充部之部分具有光學 n 異向性之情況，以及於源自前述凸部之部分具有光學異向 性、源自前述塡充部之部分具有光學同向性之情況下，可 使用之組成物不同。 至於由包含化合物（B)之組成物形成之塗膜較好爲 由透明樹脂（B )形成者。亦即，本發明中之透明樹脂（B )係由包含化合物（B)之組成物形成。至於前述透明樹 脂（B)只要對於利用本發明之製造方法獲得之偏光性繞 射元件時之雷射波長爲透明，且具有所需光學同向性或光 ® 學異向性即可，可無特別限制地使用》 使用包含化合物（B)之組成物製造偏光性繞射元件 時，偏光性繞射元件之源自前述凸部之部分係源自包含化 合物（B)之組成物。以下分別記述爲源自前述凸部之部 分具有光學同向性之情況，及源自前述凸部之部分具有光 學異向性之情況。 於源自前述凸部之部分具有光學同向性之情況，作爲 前述透明樹脂（B)可使用例如三乙醯基纖維素（TAC ) -76- 201027140 、PMMA、PS、PC、PES、PSU、環狀烯烴系樹脂等之熱 可塑性樹脂、紫外線硬化型樹脂或熱硬化型樹脂等。作爲 紫外線硬化型或熱硬化型樹脂可使用矽氧系、環氧系、（ 甲基）丙烯酸系、氧雜環丁烷系、三聚氰胺系樹脂。只要 爲具有光學同向性之樹脂則無特別限制，但就連續且經濟 地生產偏光性繞射元件之觀點而言，較好包含紫外線硬化 型樹脂，且就容易獲得透明.性或光學同向性之方面而言， φ 作爲紫外線硬化型樹脂更好爲由紫外線硬化型（甲基）丙 稀酸單體所構成之樹脂（亦稱爲紫外線硬化型（甲基）丙 烯酸樹脂）。 至於化合物（B )可爲前述透明性樹脂（b )本身，亦 可爲用以形成前述透明性樹脂（B)之單體等。至於前述 單體舉例爲紫外線硬化型（甲基）丙烯酸單體等。化合物 (B)爲紫外線硬化型（甲基）丙烯酸單體時，係將包含 化合物（B)之組成物塗佈於前述基板（a)上，且依據需 ® 要進行乾燥’進行紫外線照射，藉由使紫外線硬化型（甲 基）丙烯酸單體經紫外線硬化，形成由透明樹脂（B)之 紫外線硬化型（甲基）丙烯酸單體構成之樹脂所形成之塗 膜。 本發明使用之包含化合物（B)之組成物，於化合物 (B)本身具有流動性時，可僅爲化合物（b)，亦可爲含 兩種以上化合物（B)之混合物，但爲進一步提高塗佈性 ’亦可添加溶劑之溶液作爲組成物使用。使用添加溶劑之 溶液作爲包含化合物（B )之組成物時，較好於塗佈該組 -77- 201027140 成物後利用加熱使溶劑揮發。再者，溶劑之揮發較好在進 行紫外線硬化前進行。 進行溶劑揮發時之加熱溫度取決於化合物（B)之種 類’但通常鑒於透明樹脂（A)之耐熱性較好爲40~150〇C ’更好爲5 0~l4〇°c。加熱溫度超過150。(：時，會有塗佈包含 化合物（B)之組成物之基板（a)變形之虞而不佳，相反 地當加熱溫度未達40 °C時，由於溶劑未揮發而殘留故而不 佳。又，若在上述溫度範圍內，則加熱溫度亦可分階段進 @ 行。 又’爲了獲得由前述紫外線硬化型（甲基）丙烯酸單 體所成之樹脂（紫外線硬化型（甲基）丙烯酸樹脂），較 好進行前述紫外線硬化型（甲基）丙烯酸單體之紫外線硬 化。使用紫外線硬化型（甲基）丙烯酸單體作爲化合物（ B) ’爲了進行前述紫外線硬化，包含化合物（B)之組成 物較好添加後述之光聚合起始劑（光自由基產生劑）。 至於紫外線硬化型（甲基）丙烯酸單體只要是分子內 〇 具有至少一個（甲基）丙烯醯基之（甲基）丙烯酸酯化合 物則無特別限制。至於（甲基）丙烯酸酯化合物舉例爲例 如單官能性基（甲基）丙烯酸酯化合物、多官能基（甲基 )丙烯酸酯化合物。 再者’本發明中所謂的（甲基）丙烯酸酯化合物係表 示選自由丙烯酸酯化合物及甲基丙烯酸酯化合物所組成群 組之至少一種化合物，所謂的（甲基）丙烯醯基係表示選 自由丙烯醯基及甲基丙烯醯基所組成群組之至少一種基。 -78- 201027140 單官能基（甲基）丙烯酸酯化合物之具體例列舉爲（ 甲基）丙烯酸甲酯、（甲基）丙烯酸乙酯、（甲基）丙烯 酸丙酯、（甲基）丙烯酸異丙酯、（甲基）丙烯酸丁酯、 (甲基）丙烯酸異丁酯、（甲基）丙烯酸第三丁酯、（甲 基）丙烯酸戊酯、（甲基）丙烯酸戊酯、（甲基）丙烯酸 異戊酯、（甲基）丙烯酸己酯、（甲基）丙烯酸庚酯、（ 甲基）丙烯酸辛酯、（甲基）丙烯酸異辛酯、（甲基）丙 ^ 烯酸2-乙基己酯、（甲基）丙烯酸壬酯、（甲基）丙烯酸 癸酯、（甲基）丙烯酸異癸酯、（甲基）丙烯酸十一烷酯 、（甲基）丙烯酸十二烷酯、（甲基）丙烯酸月桂酯、（ 甲基）丙烯酸硬脂酯、（甲基）丙烯酸異硬脂酯等之（甲 基）丙烯酸烷酯類； (甲基）丙烯酸羥基乙酯、（甲基）丙烯酸羥基丙酯 、（甲基）丙烯酸羥基丁酯等之（甲基）丙烯酸羥基烷酯 類； 〇 (甲基）丙烯酸苯氧基乙酯、（甲基）丙烯酸2-羥基- 3-苯氧基丙酯等之（甲基）丙烯酸苯氧基烷酯類； (甲基）丙烯酸甲氧基乙酯、（甲基）丙烯酸乙氧基 乙酯、（甲基）丙烯酸丙氧基乙酯、（甲基）丙烯酸丁氧 基乙酯、（甲基）丙烯酸甲氧基丁酯等之（甲基）丙烯酸 院氧基院醋類； 聚乙二醇單（甲基）丙烯酸酯、乙氧基二乙二醇（甲 基）丙烯酸酯 '甲氧基聚乙二醇（甲基）丙烯酸酯、苯氧 基聚乙二醇（甲基）丙烯酸酯、壬基苯氧基聚乙二醇（甲 -79 - 201027140 基）丙烯酸酯等之聚乙二醇（甲基）丙烯酸酯類； 聚丙二醇單（甲基）丙烯酸酯、甲氧基聚丙二醇（甲 基）丙烯酸酯、乙氧基聚丙二醇（甲基）丙烯酸酯、壬基 苯氧基聚丙二醇（甲基）丙烯酸酯等之聚丙二醇（甲基） 丙烯酸酯類； (甲基）丙烯酸環己酯、（甲基）丙烯酸4-丁基環己 酯、（甲基）丙烯酸二環戊酯、（甲基）丙烯酸二環戊烯 酯、（甲基）丙烯酸二環戊二烯酯、（甲基）丙烯酸冰片 @ 酯、（甲基）丙烯酸異冰片酯、（甲基）丙烯酸三環癸酯 等之（甲基）丙烯酸環烷酯類； (甲基）丙烯酸苄酯；（甲基）丙烯酸四氫糠酯等。 該等單官能基（甲基）丙烯酸酯化合物可單獨使用一種， 或混合兩種以上使用。 又，多官能基（甲基）丙烯酸酯化合物之具體例舉例 爲乙二醇二（甲基）丙烯酸酯、二乙二醇二（甲基）丙烯 酸酯、四乙二醇二（甲基）丙烯酸酯、聚乙二醇二（甲基 〇 )丙烯酸酯、1，4-丁二醇二（甲基）丙烯酸酯、1,6-己二 醇二（甲基）丙烯酸酯、新戊二醇二（甲基）丙烯酸酯等 之烷二醇二（甲基）丙烯酸酯類： 三羥甲基丙烷三（甲基）丙烯酸酯、三羥甲基丙烷三 羥基乙基三（甲基）丙烯酸酯、二-三羥甲基丙烷四（甲 基）丙烯酸酯、季戊四醇三（甲基）丙烯酸酯、季戊四醇 四（甲基）丙烯酸酯、二季戊四醇六（甲基）丙烯酸酯、 羥基特戊酸新戊二醇二（甲基）丙烯酸酯等之多價醇之聚 -80- 201027140 (甲基）丙烯酸酯類； 異脲氰酸酯三（甲基）丙烯酸酯、參（2-羥基乙基） 異脲氰酸酯二（甲基）丙烯酸酯、參（2-羥基乙基）異脲 氰酸酯三（甲基）丙烯酸酯等之異脲氰酸酯之聚（甲基） 丙烯酸酯類； 三環癸二基二甲基二（甲基）丙烯酸酯等之環烷之聚 (甲基）丙烯酸酯類； 雙酚A之環氧乙烷加成物之二（甲基）丙烯酸酯、雙 酚A之環氧丙烷加成物之二（甲基）丙烯酸酯 '雙酚A之 環氧烷加成物之二（甲基）丙烯酸酯、氫化雙酚A之環氧 乙烷加成物之二（甲基）丙烯酸酯、氫化雙酚A之環氧丙 烷加成物之二（甲基）丙烯酸酯、氫化雙酚A之環氧烷加 成物之二（甲基）丙烯酸酯、由雙酚A二縮水甘油醚與（ 甲基）丙烯酸獲得之（甲基）丙烯酸酯等之雙酚A之（甲 基）丙烯酸酯衍生物類； 3,3,4,4,5,5,6,6-八氟辛烷二（甲基）丙烯酸酯、3-( 2-全氟己基）乙氧基-1，2-二（甲基）丙烯醯基丙烷、N-正 丙基-N-2,3-二（甲基）丙烯醯基丙基全氟辛基磺醯胺等含 氟（甲基）丙烯酸酯類； 使以下之具有雙酚構造之聚合物（a)與有機聚異氰 酸酯（b)及含有羥基之（甲基）丙烯酸酯（c)反應獲得 之胺基甲酸酯（甲基）丙烯酸酯類； (a)具有雙酚構造之多元醇列舉爲雙酚A之環氧烷加 成之二元醇、雙酚F之環氧烷加成之二元醇、氫化雙酚A之 -81 · 201027140 環氧烷加成之二元醇、氫化雙酚F之環氧烷加成之二元醇 等。該等中’以雙酚A之環氧烷加成之二元醇較佳。至於 該等市售品’舉例爲例如日油（股）製造之DA-400、DB-400等 〇 (b) 有機聚異氰酸酯較好爲二異氰酸酯，舉例爲例 如2，4 -甲苯二異氰酸酯、2,6 -甲苯二異氰酸酯、i，3 -二甲苯 二異氰酸酯、1，4-二甲苯二異氰酸酯、1,5_萘二異氰酸酯 、間-苯二異氰酸酯、對-苯二異氰酸酯、3，3，_二甲基- @ 4,4’-二苯基甲烷二異氰酸酯、4,4’-二苯基甲烷二異氰酸酯 、3，3’-二甲基苯二異氰酸酯、4,4’-聯苯二異氰酸酯等。該 等中最佳者爲2,4-甲苯二異氰酸酯、2,6_甲苯二異氰酸酯 、1,3-二甲苯二異氰酸酯、1,4-二甲苯二異氰酸酯。 (c) 含有羥基之（甲基）丙烯酸酯可舉例爲（甲基 )丙烯酸2-羥基乙酯、（甲基）丙烯酸2-羥基丙酯、（甲 基）丙烯酸2-羥基丁酯、（甲基）丙烯酸2_羥基-3_苯氧基 丙酯、1,4-丁二醇單（甲基）丙烯酸酯 '(甲基）丙烯醯 © 基磷酸2-羥基烷酯、（甲基）丙烯酸4_羥基環己酯、1，6_ 己二醇單（甲基）丙烯酸酯、新戊二醇單（甲基）丙烯酸 酯、三羥甲基丙烷二（甲基）丙烯酸酯、三羥甲基乙烷二 (甲基）丙烯酸酯、季戊四醇三（甲基）丙烯酸酯、二季 戊四醇五（甲基）丙烯酸酯等。該等中，以（甲基）丙烯 酸2 -羥基乙酯、（甲基）丙烯酸2_經基丙酯等較佳。 該等多官能基（甲基）丙烯酸酯化合物可單獨使用一 種，或混合兩種以上使用。 -82- 201027140 該等多官能基（甲基）丙烯酸酯化合物中，最好爲二 季戊四醇六丙烯酸酯、季戊四醇四丙烯酸酯、季戊四醇三 丙烯酸酯、三羥甲基丙烷三丙烯酸酯等之—分子內含有之 丙烯醯基之數量多、實現交聯密度之提升、賦予優異之膜 硬度之多官能基（甲基）丙烯酸酯化合物。 使用前述紫外線硬化型（甲基）丙烯酸單體作爲化合 物（B)時’形成塗膜時，使紫外線硬化型（甲基）丙烯 φ 酸單體聚合（硬化）’成爲由紫外線硬化型（甲基）丙烯 酸單體構成之樹脂，但進行該聚合時較好使用光聚合起始 劑（光自由基產生劑）。亦即，包含化合物（B )之組成 物中較好包含光聚合起始劑（光自由基產生劑）。 光聚合起始劑（光自由基產生劑）之具體例列舉爲1-羥基環己基苯基酮、2，2’-二甲氧基-2 -苯基苯乙酮、咕噸 酮、荛、弗酮、苯甲醛、蒽醌、三苯基胺、咔唑、3 -甲基 苯乙酮、4-氯二苯甲酮、4,4，-二甲氧基二苯甲酮、4，4’-二 φ 胺基二苯甲酮、米查（Mi chi er)酮、苯甲醯基丙基醚、苯 甲醯基乙基醚、苄基二甲基縮酮、1_(4_異丙基苯基）-2-羥基-2-甲基丙-1-酮、2-羥基-2-甲基-1-苯基丙-1-酮、噻噸 酮、二乙基噻噸酮、2-異丙基噻噸酮、2-氯噻噸酮、2 -甲 基-1-[4-(甲硫基）苯基]_2-嗎咐基丙-1-酮、2,4,6-三甲基 苯甲醯基二苯基氧化膦、2 -苄基-2 -二甲胺基-1-(4 -嗎啉 基苯基）丁 -1-酮、1-[4-(2-羥基乙氧基）-苯基]-2-羥基-2-甲基丙-1-酮等。該等光聚合起始劑（光自由基產生劑） 可單獨使用一種，或組合兩種以上使用。 -83 - 201027140 該等光聚合起始劑（光自由基產生劑）中，以2-甲基-1-[4-(甲硫基）苯基]-2-嗎啉基丙-1-酮、2,4,6-三甲基苯 甲醯基二苯基氧化膦、1-羥基環己基苯基酮較佳。When the substrate is in a roll form, a flat or roll-shaped mold is preferably used. Transfer Method A Transfer Method A First, a composition containing the compound (B) is applied onto the substrate (a). At this time, the coating method can be carried out without limitation using the conventional coating-74-201027140 method. Specific coating methods are, for example, a spin coating method, a lip coating method, a gamma coating method, a roll coating method, a die coating method, a doping method, a dip coating method, and a coating bar coating method. Method, casting film forming method, gravure coating method, printing method, and the like. Among them, in terms of thickness precision and mass productivity, it is preferred to use a gamma coating method or a gravure coating method. The thickness of the coating material is not particularly limited as long as it can impart a desired pattern, but in order to secure the thickness precision, it is preferably from 1 to 30 μm, more preferably from 1 to 20 μm φ ', preferably from 1 to 15 μm. The depth of the recess of the pattern varies depending on the wavelength of the laser used or the type of material used, but is usually in the range of 1 to ΙΟμίη. According to this, by controlling the thickness of the coating material within the aforementioned range, The accuracy of the thickness is ensured, and on the other hand, it is preferable to use an unnecessary material economical design. The coating material is subjected to a treatment by heating or the like to form a coating film for pattern formation. A method of imparting a pattern in which a concave portion and a convex portion are continuously formed to a coating film formed of the above-mentioned material is preferably a mold in which a concave portion and a convex portion are continuously formed. The material of the mold in which the concave portion and the convex portion are continuously formed is not particularly limited as long as the desired pattern can be produced. However, it is preferable to use a metal such as nickel or a niobium manufacturer, or a transparent such as quartz. Moreover, it is preferable to apply a fluorine-based or polyoxyalkylene-based release agent to the surface of the mold in which the concave portion and the convex portion are continuously formed in order to impart a shape and to be released from the coating film. Demoulding treatment. The shape of the mold in which the concave portion and the convex portion are continuously formed is not particularly limited as long as it is a flat shape or a roll shape, and when the substrate is in the form of a sheet, it is preferable to use a flat mold "the substrate is a roll type". It is preferable to use a flat-shaped or -75-201027140 roll-shaped mold. (Constituent comprising Compound (B)) In the step (I), a composition containing the compound (B) is applied onto the substrate (a), and a coating film formed of the composition is obtained, and then the continuous formation is performed. When the pattern of the concave portion and the convex portion is formed by being transferred onto the coating film, the composition containing the compound (B) is not particularly limited, and the optical isotropic property is derived from the portion derived from the convex portion, and is derived from the aforementioned charging. Where the portion of the portion has optical n anisotropy, and the portion derived from the convex portion has optical anisotropy, and the portion derived from the aforementioned portion has optical anisotropy, the composition that can be used is different . The coating film formed of the composition containing the compound (B) is preferably formed of a transparent resin (B). That is, the transparent resin (B) in the present invention is formed of a composition containing the compound (B). The transparent resin (B) may be transparent as long as the laser wavelength of the polarizing diffractive element obtained by the manufacturing method of the present invention is transparent, and may have a desired optical anisotropy or optical asymmetry. When the polarizing diffractive element is produced using the composition containing the compound (B), the portion derived from the convex portion of the polarizing diffractive element is derived from the composition containing the compound (B). Hereinafter, the case where the portion derived from the convex portion has optical anisotropy and the portion derived from the convex portion have optical anisotropy will be described below. In the case where the portion derived from the convex portion has optical anisotropy, as the transparent resin (B), for example, triacetyl cellulose (TAC)-76-201027140, PMMA, PS, PC, PES, PSU, A thermoplastic resin such as a cyclic olefin resin, an ultraviolet curable resin, or a thermosetting resin. As the ultraviolet curable or thermosetting resin, an antimony-based, epoxy-based, (meth)acrylic, oxetane-based or melamine-based resin can be used. The resin having optical anisotropy is not particularly limited, but from the viewpoint of continuously and economically producing a polarizing diffractive element, it is preferred to contain an ultraviolet curable resin, and it is easy to obtain transparency or optical co-directionality. In terms of properties, φ is preferably a resin composed of an ultraviolet curable (meth)acrylic acid monomer (also referred to as an ultraviolet curable (meth)acrylic resin) as an ultraviolet curable resin. The compound (B) may be the transparent resin (b) itself or a monomer or the like for forming the transparent resin (B). The above monomer is exemplified by an ultraviolet curing type (meth)acrylic monomer or the like. When the compound (B) is an ultraviolet curable (meth)acrylic monomer, the composition containing the compound (B) is applied onto the substrate (a), and drying is performed according to the need of the product. A coating film formed by curing an ultraviolet curable (meth)acrylic monomer by ultraviolet rays to form a resin composed of an ultraviolet curable (meth)acrylic monomer of a transparent resin (B). The composition containing the compound (B) used in the present invention may be only the compound (b) or a mixture containing two or more compounds (B) when the compound (B) itself has fluidity, but is further improved. A coating solution in which a solvent is added may also be used as a composition. When a solution containing a solvent is used as the composition containing the compound (B), it is preferred to apply the group of -77 to 201027140 and then volatilize the solvent by heating. Further, the volatilization of the solvent is preferably carried out before the ultraviolet curing. The heating temperature at which the solvent is volatilized depends on the kind of the compound (B). However, in general, the heat resistance of the transparent resin (A) is preferably from 40 to 150 〇C ', more preferably from 50 to 14 ° C. The heating temperature is over 150. (: When the substrate (a) coated with the composition containing the compound (B) is deformed, it is not preferable. On the contrary, when the heating temperature is less than 40 °C, it is not preferable because the solvent does not volatilize and remains. Further, when the temperature is within the above temperature range, the heating temperature may be further advanced in stages. In order to obtain a resin (UV-curable (meth)acrylic resin) obtained by the ultraviolet-curable (meth)acrylic monomer described above. It is preferred to perform ultraviolet curing of the ultraviolet curable (meth)acrylic monomer. The ultraviolet curable (meth)acrylic monomer is used as the compound (B) 'In order to perform the ultraviolet curing, the composition of the compound (B) is included. The photopolymerization initiator (photo-radical generator) to be described later is preferably added. The ultraviolet-curable (meth)acrylic monomer has at least one (meth) acrylonitrile group as long as it is intramolecular oxime. The acrylate compound is not particularly limited. The (meth) acrylate compound is exemplified by, for example, a monofunctional (meth) acrylate compound, a polyfunctional group ( Further, the (meth) acrylate compound in the present invention means at least one compound selected from the group consisting of an acrylate compound and a methacrylate compound, so-called (meth) propylene. The fluorenyl group means at least one group selected from the group consisting of an acryloyl group and a methacryl fluorenyl group. -78- 201027140 A specific example of the monofunctional (meth) acrylate compound is exemplified as methyl (meth) acrylate , ethyl (meth)acrylate, propyl (meth)acrylate, isopropyl (meth)acrylate, butyl (meth)acrylate, isobutyl (meth)acrylate, third (meth)acrylate Butyl ester, amyl (meth)acrylate, amyl (meth)acrylate, isoamyl (meth)acrylate, hexyl (meth)acrylate, heptyl (meth)acrylate, octyl (meth)acrylate Ester, isooctyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, decyl (meth)acrylate, decyl (meth)acrylate, isodecyl (meth)acrylate ,(methyl) Undecyl acrylate, dodecyl (meth) acrylate, lauryl (meth) acrylate, stearyl (meth) acrylate, isostearyl (meth) acrylate, etc. Esters; hydroxyethyl (meth)acrylates such as hydroxyethyl (meth)acrylate, hydroxypropyl (meth)acrylate, hydroxybutyl (meth)acrylate; phenoxy (meth)acrylate Ethyl phenoxyalkyl (meth)acrylate such as ethyl ester or 2-hydroxy-3-phenoxypropyl (meth)acrylate; methoxyethyl (meth)acrylate, (meth)acrylic acid (meth)acrylic acid hospital vinegar such as oxyethyl ester, propoxyethyl (meth)acrylate, butoxyethyl (meth)acrylate or methoxybutyl (meth)acrylate ; polyethylene glycol mono (meth) acrylate, ethoxy diethylene glycol (meth) acrylate 'methoxy polyethylene glycol (meth) acrylate, phenoxy polyethylene glycol (A Poly(ethylene), decylphenoxy polyethylene glycol (A-79 - 201027140) acrylate, etc. Glycol (meth) acrylates; polypropylene glycol mono (meth) acrylate, methoxy polypropylene glycol (meth) acrylate, ethoxy propylene glycol (meth) acrylate, decyl phenoxy poly Polypropylene glycol (meth) acrylate such as propylene glycol (meth) acrylate; cyclohexyl (meth) acrylate, 4-butylcyclohexyl (meth) acrylate, dicyclopentanyl (meth) acrylate , dicyclopentenyl (meth)acrylate, dicyclopentadienyl (meth)acrylate, borneol (meth)acrylate, isobornyl (meth)acrylate, tricycloanthracene (meth)acrylate a cycloalkyl (meth)acrylate such as an ester; benzyl (meth)acrylate; tetrahydrofurfuryl (meth)acrylate; These monofunctional (meth) acrylate compounds may be used alone or in combination of two or more. Further, specific examples of the polyfunctional (meth) acrylate compound are exemplified by ethylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, and tetraethylene glycol di(meth)acrylic acid. Ester, polyethylene glycol bis(methyl hydrazide) acrylate, 1,4-butanediol di(meth) acrylate, 1,6-hexanediol di(meth) acrylate, neopentyl glycol Alkylene glycol di(meth)acrylates such as (meth) acrylate: trimethylolpropane tri(meth)acrylate, trimethylolpropane trihydroxyethyl tri(meth)acrylate, Di-trimethylolpropane tetra(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol hexa(meth)acrylate, hydroxypivalic acid neopentyl Poly-80-201027140 (meth) acrylates of isoalcoordinates such as alcohol di(meth)acrylate; isosodium citrate tris(meth) acrylate, ginseng (2-hydroxyethyl) isourea Cyanate di(meth) acrylate, ginseng (2-hydroxyethyl) isocyanurate tris (A) a poly(meth) acrylate of isourea cyanide such as acrylate; a poly(meth) acrylate of a cycloalkane such as tricyclodecyl dimethyl di(meth) acrylate; Di(meth)acrylate of ethylene oxide adduct of phenol A, bis(meth)acrylate of bisphenol A propylene oxide adduct, and alkylene oxide adduct of bisphenol A (meth) acrylate, di(meth) acrylate of ethylene oxide adduct of hydrogenated bisphenol A, bis(meth) acrylate of hydrogenated bisphenol A propylene oxide adduct, hydrogenation double a (meth) acrylate of an alkylene oxide adduct of phenol A, a (meth) acrylate such as (meth) acrylate obtained from bisphenol A diglycidyl ether and (meth)acrylic acid Acrylate derivatives; 3,3,4,4,5,5,6,6-octafluorooctane di(meth)acrylate, 3-(2-perfluorohexyl)ethoxy-1,2 Fluorinated (meth) acrylates such as bis(meth) propylene decyl propane and N-n-propyl-N-2,3-di(methyl) propylene decyl propyl perfluorooctyl sulfonamide ; to make the following bisphenol structure a urethane (meth) acrylate obtained by reacting the organic polyisocyanate (b) with a hydroxyl group-containing (meth) acrylate (c); (a) a polyol having a bisphenol structure Listed as an alkylene oxide addition diol of bisphenol A, an alkylene oxide addition diol of bisphenol F, a hydrogenated bisphenol A-81 · 201027140 alkylene oxide addition diol, hydrogenation A diol in which an alkylene oxide of bisphenol F is added. Among these, a glycol which is added with an alkylene oxide of bisphenol A is preferred. As for the above-mentioned commercial products, for example, DA-400, DB-400, etc. manufactured by Nippon Oil Co., Ltd., etc. (b) The organic polyisocyanate is preferably a diisocyanate, for example, 2,4-toluene diisocyanate, 2 , 6-toluene diisocyanate, i,3-xylene diisocyanate, 1,4-dimethylbenzene diisocyanate, 1,5-naphthalene diisocyanate, m-phenylene diisocyanate, p-phenylene diisocyanate, 3,3,_ Dimethyl-@4,4'-diphenylmethane diisocyanate, 4,4'-diphenylmethane diisocyanate, 3,3'-dimethylphenyl diisocyanate, 4,4'-biphenyl diisocyanate Wait. The most preferred of these are 2,4-toluene diisocyanate, 2,6-toluene diisocyanate, 1,3-xylene diisocyanate, and 1,4-dimethylbenzene diisocyanate. (c) The hydroxyl group-containing (meth) acrylate can be exemplified by 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 2-hydroxybutyl (meth)acrylate, (A) 2) hydroxy-3_phenoxypropyl acrylate, 1,4-butanediol mono(meth) acrylate '(meth) propylene phthalate 2-hydroxyalkyl phosphinate, (meth) acrylate 4-hydroxycyclohexyl ester, 1,6-hexanediol mono(meth)acrylate, neopentyl glycol mono(meth)acrylate, trimethylolpropane di(meth)acrylate, trimethylol Ethane di(meth)acrylate, pentaerythritol tri(meth)acrylate, dipentaerythritol penta(meth)acrylate, and the like. Among these, 2-hydroxyethyl (meth)acrylate and 2-propylpropyl (meth)acrylate are preferred. These polyfunctional (meth) acrylate compounds may be used singly or in combination of two or more. -82- 201027140 Among these polyfunctional (meth) acrylate compounds, preferably dipentaerythritol hexaacrylate, pentaerythritol tetraacrylate, pentaerythritol triacrylate, trimethylolpropane triacrylate, etc. - intramolecular A polyfunctional (meth) acrylate compound having a large amount of acrylonitrile groups and an increase in crosslinking density and imparting excellent film hardness. When the ultraviolet curable (meth)acrylic monomer is used as the compound (B), when the coating film is formed, the ultraviolet curable (meth)acrylic acid monomer is polymerized (cured) to be ultraviolet curable (methyl) A resin composed of an acrylic monomer, but a photopolymerization initiator (photo-radical generator) is preferably used in the polymerization. That is, the composition containing the compound (B) preferably contains a photopolymerization initiator (photo-radical generator). Specific examples of the photopolymerization initiator (photo-radical generator) are 1-hydroxycyclohexyl phenyl ketone, 2,2'-dimethoxy-2-phenylacetophenone, xanthone, anthracene, Furose, benzaldehyde, hydrazine, triphenylamine, carbazole, 3-methylacetophenone, 4-chlorobenzophenone, 4,4,-dimethoxybenzophenone, 4,4 '-Di-φ-aminobenzophenone, Mi chi er ketone, benzhydryl propyl ether, benzhydryl ethyl ether, benzyl dimethyl ketal, 1_(4_isopropyl Phenyl)-2-hydroxy-2-methylpropan-1-one, 2-hydroxy-2-methyl-1-phenylpropan-1-one, thioxanthone, diethylthioxanthone, 2 -isopropyl thioxanthone, 2-chlorothioxanthone, 2-methyl-1-[4-(methylthio)phenyl]_2-mercaptopropan-1-one, 2,4,6- Trimethylbenzimidyldiphenylphosphine oxide, 2-benzyl-2-dimethylamino-1-(4-morpholinylphenyl)butan-1-one, 1-[4-(2- Hydroxyethoxy)-phenyl]-2-hydroxy-2-methylpropan-1-one and the like. These photopolymerization initiators (photoradical generators) may be used alone or in combination of two or more. -83 - 201027140 In the photopolymerization initiator (photoradical generator), 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinylpropan-1-one 2,4,6-trimethylbenzimidyldiphenylphosphine oxide and 1-hydroxycyclohexyl phenyl ketone are preferred.

另外，該等光聚合起始劑（光自由基產生劑）可使用 市售品。例如2-甲基- l-[4-(甲硫基）苯基]-2-嗎啉基丙-1-酮可以Irgacure 907 (汽巴特用化學品（股）製造）購得 ，另外，1-羥基環己基苯基酮可以Irgacure 184 (汽巴特用 化學品（股）製造）購得。 G 光聚合起始劑（光自由基產生劑）之添加量相對於前 述紫外線硬化型（甲基）丙烯酸樹脂之質量100質量％，較 好爲10質量％以下，更好爲5質量％以下，最好爲3質量％以 下。添加量超過10質量％時，無法忽視未反應之光聚合起 始劑殘留對偏光性繞射元件之物性之影響故而不佳。 進行紫外線硬化時之光源之例舉例爲金屬鹵化物燈或 高壓水銀燈。又，紫外線照射可自塗膜側（形成有圖型之 面、具有圖型之面）進行，亦可自未形成圖型之面側進行 ® 。又，連續形成圖型時，較好自前述模具之相反側，亦即 基板（a )之未形成圖型之面側進行紫外線照射。 源自前述凸部之部分具有光學異向性時，前述透明樹 脂（B )較好使用液晶材料。液晶材料中，就連續且經濟 地生產偏光性繞射元件之觀點而言，較好使用紫外線硬化 型液晶。紫外線硬化型液晶通常爲使包含後述紫外線硬化 型液晶單體之組成物在適度施予乾燥之後藉由紫外線照射 獲得。 -84 - 201027140 至於化合物（B)可爲前述透明性樹脂（B)本身，亦 可爲用以形成前述透明性樹脂（B)之單體等。前述單體 舉例爲前述紫外線硬化型液晶單體等。化合物（B)爲紫 外線硬化型液晶單體時，係將包含化合物（B)之組成物 塗佈於前述基板（a)上，且依據需要進行乾燥，進行紫 外線照射，藉由使紫外線硬化型液晶單體經紫外線硬化， 形成由透明樹脂（B)之紫外線硬化型液晶單體構成之樹 0 脂所形成之塗膜。 於本發明使用之包含化合物（B)之組成物當化合物 (B)本身具有流動性時，可僅爲化合物（B)，亦可爲含 兩種以上化合物（B)之混合物，但爲進一步提高塗佈性 ’亦可使用添加溶劑之溶液作爲組成物。使用添加溶劑之 溶液作爲包含化合物（B)之組成物時，較好於塗佈該組 成物後利用加熱使溶劑揮發。再者，溶劑之揮發較好在進 行紫外線硬化前進行。 φ 進行溶劑揮發時之加熱溫度取決於化合物（B)之種 類’但通常鑒於透明樹脂（A )之耐熱性較好爲40~150°C ’更好爲50〜14〇°C。加熱溫度超過150°C時，會有塗佈包含 化合物（B )之組成物之基板（a )變形之虞而不佳，相反 地當加熱溫度未達40°C時，由於溶劑未揮發造成殘留故而 T佳。又，若在上述溫度範圍內，加熱溫度亦可分階段進 行。 又，爲了獲得前述紫外線硬化型液晶，較好進行前述 #外線硬化型液晶單體之紫外線硬化。使用紫外線硬化型 -85- 201027140 液晶單體作爲化合物（B)，爲了進行前述紫外線硬化， 包含化合物（B )之組成物較好添加後述之光聚合起始劑 (光自由基產生劑）。 至於紫外線硬化型液晶並無特別限制，可使用於向列 型液晶、層列型液晶中導入一個以上丙烯酸酯基及/或甲 基丙烯酸酯基者作爲單體。 該紫外線硬化型液晶單體之例列舉爲在氧化偶氮系液 晶、氰基聯苯系液晶、席夫氏系液晶、氰基苯酯系液晶、 φ 氰基苯基環己烷系液晶、苯甲酸苯酯系液晶、環己烷羧酸 苯酯系液晶、苯基嘧啶系液晶、苯基二噁烷系液晶等之低 分子液晶中導入一個以上之丙烯酸酯基及/或甲基丙烯酸 酯基之紫外線硬化型液晶單體。又，該等紫外線硬化型液 晶單體可單獨使用，亦可混合兩種以上使用。 又，爲了獲得前述紫外線硬化型液晶單體之硬化物（ 紫外線硬化型液晶）’較好進行紫外線硬化。爲了進行紫 外線硬化，包含化合物（B)之組成物較好添加光聚合起 Θ 始劑（光自由基產生劑）。光聚合起始劑在源自塗佈之部 分具有光學向同性時，包含化合物（B)之組成物中，可 使用與可於聚合（硬化）紫外線硬化型（甲基）丙烯酸單 體之際使用之光聚合起始劑（光自由基產生劑）相同者。 添加量相對於本發明之紫外線硬化型液晶單體之質量 1 00質量％，較好爲1 0質量％以下，更好爲5質量％以下，最 好爲3質量％以下。添加量超過10質量％時，由於無法忽視 未反應之光聚合起始劑對於液晶轉移溫度等之偏光性繞射 -86 - 201027140 元件之物性產生之影響故而不佳。 進行紫外線硬化時之光源之例舉例爲金屬鹵化物燈或 高壓水銀燈。又，紫外線照射可自塗膜側（形成有圖型之 面、具有圖型之面）進行，亦可自未形成圖型之面側進行 。另外’連續形成圖型時，較好自前述模具之相反側，亦 即基板（a )之未形成圖型之面側進行紫外線照射。 又，前述透明樹脂（A)、透明樹脂（B)及後述之透 φ 明樹脂（C)中，可依據需要，在不損及發明效果之範圍 內添加抗氧化劑、熱安定劑、光安定劑、紫外線吸收劑、 抗靜電劑、消泡劑、界面活性劑等習知之添加知I。 &lt; (π)步驟&gt; 本發明之偏光性繞射元件之製造方法所具有之（II ) 步驟爲使前述凹部至少由化合物（C)所塡充，獲得具有 塡充部之構件（C)之步驟。 φ 以（II)步驟中獲得之構件（C)之模式圖示於圖8。 又，圖8係顯示由在前述基板（a)上直接轉印連續形成有 凹部與凸部之圖型而成之構件（b)所獲得之構件（c)之 模式圖作爲構件（C )之一例。再者，圖8中係一起描述後 述（III)步驟中之延伸方向。 又，前述凹部至少由化合物（C)塡充之方法並無特 別限制，但通常係在前述構件（b )之具有圖型之面上藉 由塗佈包含化合物（C)之組成物進行。又，圖8中雖僅塡 充前述凹部，但實際上在塡充凹部之同時，會有凸部之上 -87- 201027140 部亦塗佈包含化合物（C)之組成物，且凸部之上部亦存 在化合物（C)之情況。 亦即，於（II)步驟通常以使前述凹部埋入之方式塗 佈包含化合物（C)之組成物，使前述凹部至少由化合物 (C)所塡充。塗佈包含化合物（C)之組成物時之方法並 無特別限制，可未加限制地採用習知之塗佈方法。具體之 塗佈方法舉例爲例如旋轉塗佈法、模唇塗佈法、柯瑪塗佈 法、輥塗佈法、模嘴塗佈法、摻塗法、浸漬塗佈法、塗佈 © 棒塗佈法、流延成膜法、凹版塗佈法、印刷法等。其中， 就厚度精準度及量產性之觀點而言，較好使用柯瑪塗佈法 或凹版塗佈法。又，亦可在減壓環境下塗佈，以使包含化 合物（C)之組成物更易於塡充前述凹部。. (包含化合物（C )之組成物） 於（Π)步驟中使用之包含化合物（C)之組成物並 無特別限制，於源自前述凸部之部分具有光學同向性、源 ® 自前述塡充部之部分具有光學異向性之情況，以及於源自 前述凸部之部分具有光學異向性、源自前述塡充部之部分 具有光學同向性之情況下，可使用之組成物不同。 構件（C )具有之塡充部較好由透明樹脂（C )形成。 亦即，本發明中之透明樹脂（C)係由包含化合物（C)之 組成物形成。至於前述透明樹脂（C)只要對於利用本發 明之製造方法獲得之偏光性繞射元件時之雷射波長爲透明 ’且具有所需光學同向性或光學異向性則可無特別限制地 -88- 201027140 使用。 使用包含化合物（C)之組成物製造偏光性繞射元件 時，偏光性繞射元件之源自前述塡充部之部分係源自包含 化合物（C)之組成物。以下分別敘述爲源自前述塡充部 之部分具有光學同向性之情況，及源自前述凸部之部分具 有光學異向性之情況。 源自前述塡充部之部分具有光學異向性時爲源自前述 〇 凸部之部分具有光學同向性之情況，至於包含化合物（c )之組成物係使用與源自前述凸部之部分具有光學異向性 時之包含化合物（B)之組成物相同者。 又，源自前述塡充部之部分具有光學同向性時爲源自 前述凸部之部分具有光學異向性之情況，至於包含化合物 (C)之組成物係使用與源自前述凸部之部分具有光學同 向性時之包含化合物（B )之組成物相同者。 φ &lt; ( III)步驟 &gt; 本發明之偏光性繞射元件之製造方法所具有之（III ) 步驟爲使構件（C)延伸，獲得構件（d)之步驟， 藉由（III)步驟，由於使前述構件（C)延伸、使光 學異向性材料配向，故由（III )步驟獲得之構件（d )具 有偏光折射能，可對利用本發明之偏光性繞射元件之製造 方法所得之偏光性繞射元件賦予所需之偏光繞射能。 對前述構件（c)進行延伸之方法，通常使用使前述 構件（C )加熱延伸之方法。加熱延伸之方法由於可減少 -89- 201027140 異物等之發生，且可良率良好地生產故而較佳。又’延伸 通常使用單軸延伸。又’ （II〗）步驟中之延伸方向示於圖 8 » 使前述構件（C)延伸之方法較好爲（1)在加熱下對 構件（C)之長度方向單軸延伸之方法（以下亦稱爲（1) 之方法），（2)在加熱下對構件（c)之寬度方向單軸延 伸之方法（以下亦稱爲（2 )之方法）。 使構件（c )延伸之際，延伸時之加熱溫度較好在構 ® 件（c )之全部延伸部位中準確地控制。例如，上述（1 ) 之方法中之長度方向之單軸延伸’亦即縱向單軸延伸以溫 度分佈控制在設定溫度±〇.6°C以內，較好設定溫度±〇.4°C 以內，更好設定溫度±0.2°C以內之烤箱中進行較適宜。 本文中之設定溫度可爲烤箱中之全部區域中相等之溫 度，亦可爲設定成階段性或梯度分佈之溫度。設定溫度爲 設定分佈之溫度時，烤箱中之實際溫度分佈與設定之溫度 分佈以± 0.6 °C以內，較好± 0.4 °C以內，更好± 0.2 °C以內較適 @ 宜。 長度方向單軸延伸之設定溫度只要依據構成構件（c )之各成分（透明樹脂（A)、包含化合物（C)之組成物 、依據需要使用之包含化合物（B)之組成物）之種類、 延伸倍率及延伸速度、構件（c )之厚度、延伸後之光學 異向性材料之所需相位差等加以設定即可，而無特別限制 ’但例如，於構成構件（c )之透明樹脂（A )爲熱可塑性 樹脂時，可以作爲熱可塑性樹脂之熱變形溫度的指標之玻 -90- 201027140 璃轉移溫度（Tg)爲基準。設定溫度以該Tg作爲基準，通 常爲（Tg-iot )至（Tg + 70°c )之範圍，較好爲（Tg±0°c )至（Tg + 5〇°C )之範圍。在該等溫度範圍內，不會引起 構件（C)之熱劣化，且可不引起破裂而延伸故而較佳。 上述（1)之方法中，長度方向單軸延伸之延伸倍率 爲例如1.03-1.5倍，較好爲1.05〜1.3倍，最好爲1.1〜1.2倍 之範圍。延伸倍率未達1.03倍時，由於光學異向性材料無 φ 法如所需配向故而不佳，延伸倍率超過1.5倍時，由於（I )步驟中連續形成有凹部與凸部之圖型上會出現裂痕等之 缺陷故而不佳。 又，上述（1)之方法中之長度方向單軸延伸之延伸 速度爲例如2~100m/分鐘，較好爲5〜50m/分鐘之範圍。 以（III)步驟獲得之構件（d)中，於長度方向單軸 延伸之光學異向性材料之構件（d)面內之最大折射率方 向相對於構件（d)之長度方向通常爲0±3度之範圍，較好 φ 爲〇±2度之範圍，更好爲0±1度之範圍，最好爲0±0.5度之 範圍。 以上述（2 )之方法進行（III )步驟時，係使構件（c )於寬度方向單軸延伸。該寬度方向之單軸延伸，亦即橫 向單軸延伸係藉由在比長度方向之單軸延伸更爲精密地溫 度控制下進行，可適當地獲得全面均勻之偏光性繞射元件 。例如，寬度方向之單軸延伸以在溫度分佈控制在設定溫 度±0.5°C以內，較好設定溫度±〇.3°C以內，更好設定溫度 ± 0.2 °C以內之烤箱中進行較適宜。 -91 - 201027140 本文中，寬度方向單軸延伸之設定溫度係與長度方向 單軸延伸之情況相同，可爲烤箱中之全部區域中相等之溫 度，亦可爲設定階段性或梯度分佈之溫度。設定溫度爲設 定分佈之溫度時，烤箱中之實際溫度分佈與設定之溫度分 佈以±〇.5°C以內，較好±0.3°C以內，更好±〇.2°C以內較適宜 。該寬度方向單軸延伸之設定溫度可與長度方向單軸延伸 之步驟中之設定溫度相同，亦可不同。 寬度方向單軸延伸之設定溫度與長度方向單軸延伸之 @ 情況相同，並無特別限制，例如構成構件（c )之透明樹 脂（A )爲熱可塑性樹脂時，以熱可塑性樹脂之玻璃轉移 溫度（Tg )作爲基準，通常爲（Tg-10°C )至（Tg + 70°C ) 之範圍，較好爲（Tg±0°C )至（Tg + 50°C )之範圍。 寬度方向單軸延伸之延伸倍率可依據製造之偏光性繞 射元件所需特性決定，但以上述（2)之方法製造時，爲 例如1.02〜1.4倍，較好爲1.04〜1.25倍，最好爲1.05〜1.2倍 之範圍。延伸倍率若未達1.02倍，則由於無法良好地均勻 © 展現光學異向性材料故而不佳，延伸倍率超過1.4倍時， 由於在（I)步驟中形成之連續形成有凹部與凸部之圖型 上會產生發生裂痕等之缺陷故而不佳。 上述寬度方向單軸延伸之延伸速度爲例如2〜100m/分 鐘，較好爲5~50m/分鐘之範圍。 上述（2)之方法獲得之構件（d)之面內最大折射率 方向相對於構件（d)之寬度方向通常爲〇±3度之範圍，較 好爲0±2度之範圍，更好爲〇±1度之範圍，最好爲0±0.5度 -92- 201027140 之範圍。 該等偏光性繞射元件之加熱延伸步驟中，係考慮聚合 物種類'共聚合比例、分子量分佈、熱變形溫度（玻璃轉 移溫度）等特性而選擇構成構件（c)之各成分（透明樹 月旨（A)、包含化合物（C)之組成物、依據需要使用之包 含化合物（B)之組成物）之種類，且長度方向之單軸延 伸及寬度方向之單軸延伸之各步驟中，可藉由選擇烤箱中 φ 之設定溫度、選擇延伸倍率及延伸速度，控制所得偏光性 繞射元件之特性。又，經過延伸步驟，圖型之凹部或凸部 之寬度、圖型之凹部深度減少，但經過延伸步驟後之形狀 可藉由調整成如前述之範圍而控制偏光性繞射元件之特性 〇 利用本發明之製造方法獲得之偏光性光學元件可適用 作爲組裝於光讀取裝置等中之光學零件。使該等雷射光通 過之光學零件中，爲了不使雷射光通過時雷射光歪斜，而 φ 要求零件之平滑性。該等平滑性之指標爲使用透過波前像 差（全面RMS，Xrms )，但利用本發明之製造方法獲得之 偏光性光學元件由於係使用平滑之基板（a)，且經過精 密之材料塗佈（塡充）步驟（（Π)步驟）或精密延伸步 驟（（III)步驟），因而可確保充分之平滑性。利用本發 明之製造方法獲得之偏光性光學元件之透過波前像差以例 如於DVD波長中光徑2mm Φ之情況之全面RMS値較好爲 25ιηλ以下，更好爲20ιηλ以下，最好爲15ιηλ以下。全面 RMS値超過25ιηλ時，由於射出之雷射光歪斜，使光讀取裝 -93- 201027140 置之讀取性能下降故而不佳。 &lt;抗反射處理&gt; 利用本發明之製造方法獲得之偏光性繞射元件爲以（ III)步驟獲得之構件（d)本身，但通常另具有抗反射層 〇 利用本發明之製造方法獲得之偏光性繞射元件較好具 有抗反射層。抗反射層可藉凹版塗佈、模嘴塗佈、狹縫塗 ® 佈等習知塗佈方法塗佈熱硬化性樹脂組成物或光硬化性樹 脂組成物，且依需要乾燥後，經硬化形成。又，亦可利用 濺鍍或蒸鍍等形成。該等層可設於構件（d)之一面上， 亦可設於兩面上。又，可預先設於基板（a)之未形成圖 型之面上，亦可設於構件（b)之不具有圖型之面上或亦 可設於構件（c )上。Further, commercially available products can be used as the photopolymerization initiator (photoradical generator). For example, 2-methyl-l-[4-(methylthio)phenyl]-2-morpholinylpropan-1-one is commercially available as Irgacure 907 (manufactured by Gasbat Chemicals Co., Ltd.), in addition, 1 -Hydroxycyclohexyl phenyl ketone is commercially available as Irgacure 184 (manufactured by Steam Batt Chemicals). The amount of addition of the photopolymerization initiator (photo-radical generator) is preferably 100% by mass or less, more preferably 5% by mass or less, based on 100% by mass of the mass of the ultraviolet curable (meth)acrylic resin. It is preferably 3% by mass or less. When the amount is more than 10% by mass, the influence of the unreacted photopolymerization initiator residue on the physical properties of the polarizing diffractive element cannot be ignored. Examples of the light source when ultraviolet curing is exemplified by a metal halide lamp or a high pressure mercury lamp. Further, the ultraviolet ray irradiation may be performed from the side of the coating film (the surface on which the pattern is formed or the surface having the pattern), or may be performed from the side where the pattern is not formed. Further, when the pattern is continuously formed, it is preferred to irradiate ultraviolet rays from the side opposite to the mold, that is, the side of the substrate (a) on which the pattern is not formed. When the portion derived from the convex portion has optical anisotropy, the transparent resin (B) is preferably a liquid crystal material. Among the liquid crystal materials, ultraviolet curable liquid crystals are preferably used from the viewpoint of continuously and economically producing a polarizing diffractive element. The ultraviolet curable liquid crystal is usually obtained by ultraviolet irradiation after the composition containing the ultraviolet curable liquid crystal monomer described later is appropriately dried. -84 - 201027140 The compound (B) may be the transparent resin (B) itself or a monomer or the like for forming the transparent resin (B). The aforementioned monomer is exemplified by the aforementioned ultraviolet curable liquid crystal monomer or the like. When the compound (B) is an ultraviolet curable liquid crystal monomer, the composition containing the compound (B) is applied onto the substrate (a), and if necessary, dried to irradiate ultraviolet rays, and the ultraviolet curable liquid crystal is used. The monomer is cured by ultraviolet rays to form a coating film formed of a resin composed of a UV-curable liquid crystal monomer of a transparent resin (B). The composition containing the compound (B) used in the present invention may be a compound (B) only when the compound (B) itself has fluidity, or may be a mixture containing two or more compounds (B), but is further improved. The coating property can also use a solution in which a solvent is added as a composition. When a solution containing a solvent is used as the composition containing the compound (B), it is preferred to coat the composition and then volatilize the solvent by heating. Further, the volatilization of the solvent is preferably carried out before the ultraviolet curing. The heating temperature at which φ is volatilized by the solvent depends on the kind of the compound (B). However, in general, the heat resistance of the transparent resin (A) is preferably from 40 to 150 ° C', more preferably from 50 to 14 ° C. When the heating temperature exceeds 150 ° C, the substrate (a ) coated with the composition containing the compound (B) may be poorly deformed. Conversely, when the heating temperature is less than 40 ° C, the solvent is not volatilized to cause residue. Therefore, T is good. Further, the heating temperature may be carried out in stages in the above temperature range. Moreover, in order to obtain the ultraviolet curable liquid crystal, it is preferred to perform ultraviolet curing of the #external curable liquid crystal monomer. In the ultraviolet ray curing type -85 - 201027140, the liquid crystal monomer is used as the compound (B), and the photopolymerization initiator (photoradical generator) to be described later is preferably added to the composition containing the compound (B). The ultraviolet curable liquid crystal is not particularly limited, and one or more acrylate groups and/or methacrylate groups may be introduced into the nematic liquid crystal or the smectic liquid crystal as a monomer. Examples of the ultraviolet curable liquid crystal monomer are oxidized azo liquid crystal, cyanobiphenyl liquid crystal, Schiff's liquid crystal, cyanophenyl ester liquid crystal, φ cyanophenylcyclohexane liquid crystal, and benzene. One or more acrylate groups and/or methacrylate groups are introduced into a low molecular liquid crystal such as a phenyl ester type liquid crystal, a cyclohexane carboxylic acid phenyl ester liquid crystal, a phenyl pyrimidine liquid crystal, or a phenyl dioxane liquid crystal. UV curable liquid crystal monomer. Further, these ultraviolet curable liquid crystal monomers may be used singly or in combination of two or more. Further, in order to obtain a cured product (ultraviolet-curable liquid crystal) of the ultraviolet curable liquid crystal monomer, ultraviolet curing is preferably performed. In order to carry out the ultraviolet hardening, the composition containing the compound (B) is preferably added with a photopolymerization initiator (photoradical generator). When the photopolymerization initiator is optically isotropic in the portion derived from the coating, the composition containing the compound (B) can be used as long as it can be used in the polymerization (hardening) ultraviolet curing type (meth)acrylic monomer. The photopolymerization initiator (photoradical generator) is the same. The amount of the ultraviolet light-curable liquid crystal monomer of the present invention is preferably 100% by mass, preferably 10% by mass or less, more preferably 5% by mass or less, and most preferably 3% by mass or less. When the amount is more than 10% by mass, it is not preferable because the unreacted photopolymerization initiator does not affect the physical properties of the polarizing diffraction of the liquid crystal transfer temperature, etc. -86 - 201027140. Examples of the light source when ultraviolet curing is exemplified by a metal halide lamp or a high pressure mercury lamp. Further, the ultraviolet irradiation may be performed from the side of the coating film (the surface on which the pattern is formed or the surface having the pattern), or may be performed from the side on which the pattern is not formed. Further, when the pattern is continuously formed, it is preferred to carry out ultraviolet irradiation from the side opposite to the mold, that is, the side of the substrate (a) on which the pattern is not formed. Further, in the transparent resin (A), the transparent resin (B), and the transparent resin (C) to be described later, an antioxidant, a thermal stabilizer, and a light stabilizer may be added as needed within a range that does not impair the effects of the invention. Addition of known additives such as ultraviolet absorbers, antistatic agents, antifoaming agents, and surfactants. &lt; (π) Step&gt; The (II) step of the method for producing a polarizing diffractive element of the present invention is such that the concave portion is filled with at least the compound (C) to obtain a member having a filling portion (C) The steps. φ The pattern of the member (C) obtained in the step (II) is shown in Fig. 8. Moreover, FIG. 8 is a schematic view showing a member (c) obtained by directly transferring a member (b) in which a concave portion and a convex portion are continuously formed on the substrate (a) as a member (C). An example. Further, in Fig. 8, the direction of extension in the step (III) will be described together. Further, the method of filling the concave portion with at least the compound (C) is not particularly limited, but is usually carried out by applying a composition containing the compound (C) on the surface of the member (b) having the pattern. Further, in Fig. 8, although the concave portion is merely filled, the composition of the compound (C) is coated on the -87-201027140 portion of the convex portion at the same time as the convex portion is filled, and the upper portion of the convex portion is applied. There is also a case of the compound (C). That is, in the step (II), the composition containing the compound (C) is usually applied so as to embed the concave portion, and the concave portion is filled with at least the compound (C). The method of coating the composition containing the compound (C) is not particularly limited, and a conventional coating method can be employed without limitation. Specific coating methods are, for example, a spin coating method, a lip coating method, a komal coating method, a roll coating method, a die coating method, a doping method, a dip coating method, a coating © bar coating Cloth method, cast film forming method, gravure coating method, printing method, and the like. Among them, the gamma coating method or the gravure coating method is preferably used from the viewpoint of thickness precision and mass productivity. Further, it may be applied under a reduced pressure atmosphere to make it easier for the composition containing the compound (C) to fill the concave portion. (Composition of Compound (C)) The composition containing the compound (C) used in the (Π) step is not particularly limited, and has optical anisotropy in a portion derived from the above-mentioned convex portion, source from the foregoing A component which is optically anisotropic in a portion of the filling portion, and an optical anisotropy in a portion derived from the convex portion, and an optical isotropic property in a portion derived from the above-mentioned expanding portion, a composition which can be used different. The filling portion of the member (C) is preferably formed of a transparent resin (C). That is, the transparent resin (C) in the present invention is formed of a composition containing the compound (C). As the foregoing transparent resin (C), there is no particular limitation as long as the laser wavelength at the time of using the polarizing diffractive element obtained by the manufacturing method of the present invention is transparent ' and has desired optical anisotropy or optical anisotropy - 88- 201027140 Use. When a polarizing diffractive element is produced using the composition containing the compound (C), the portion of the polarizing diffractive element derived from the above-mentioned entangled portion is derived from the composition containing the compound (C). Hereinafter, the case where the portion derived from the above-mentioned expansion portion has optical anisotropy and the portion derived from the convex portion have optical anisotropy will be described. When the portion derived from the aforementioned filling portion has optical anisotropy, the portion derived from the above-mentioned convex portion has optical isotropy, and the composition containing the compound (c) is used as the portion derived from the convex portion. The composition containing the compound (B) when the optical anisotropy is the same is the same. Further, when the portion derived from the entangled portion has optical anisotropy, the portion derived from the convex portion has optical anisotropy, and the composition containing the compound (C) is used and derived from the convex portion. The composition containing the compound (B) which is the same when partially having optical anisotropy is the same. φ &lt; (III) Step&gt; The method of manufacturing the polarizing diffractive element of the present invention has the step (III) of extending the member (C) to obtain the member (d), and by the step (III), Since the member (C) is extended to align the optically anisotropic material, the member (d) obtained in the step (III) has polarization refracting energy, which can be obtained by the method for producing the polarizing diffractive element of the present invention. The polarizing diffractive element imparts the desired polarization diffracting energy. For the method of extending the member (c), a method of heating and extending the member (C) is usually used. The method of heating and stretching is preferable because it can reduce the occurrence of foreign matter such as -89 to 201027140 and can be produced with good yield. Further extensions usually use a uniaxial extension. Further, the extending direction in the step (II) is shown in Fig. 8 » The method of extending the member (C) is preferably (1) a method of uniaxially extending the length direction of the member (C) under heating (hereinafter also A method called (1), (2) a method of uniaxially extending the width direction of the member (c) under heating (hereinafter also referred to as a method of (2)). When the member (c) is extended, the heating temperature at the time of extension is preferably accurately controlled in all the extension portions of the member (c). For example, in the method of the above (1), the uniaxial extension in the longitudinal direction, that is, the longitudinal uniaxial extension is controlled within a set temperature of ± 〇 6 ° C with a temperature distribution, preferably within a temperature of ± 4 ° C. It is more suitable to set the temperature within ±0.2 °C. The set temperature herein may be an equal temperature in all areas of the oven, or may be a temperature set in a stepwise or gradient manner. When the set temperature is set to the temperature of the distribution, the actual temperature distribution in the oven and the set temperature distribution are within ± 0.6 °C, preferably within ± 0.4 °C, and more preferably within ± 0.2 °C. The setting temperature of the uniaxial stretching in the longitudinal direction is determined according to the type of each component (the transparent resin (A), the composition containing the compound (C), and the composition containing the compound (B) used as needed, depending on the constituent member (c), The stretching ratio and the stretching speed, the thickness of the member (c), the desired phase difference of the optical anisotropic material after stretching, and the like may be set without any particular limitation, but for example, the transparent resin constituting the member (c) A) When it is a thermoplastic resin, it can be used as a reference for the glass transition temperature (Tg) of the glass-90-201027140, which is an index of the heat distortion temperature of the thermoplastic resin. The set temperature is usually in the range of (Tg-iot) to (Tg + 70 °c), preferably (Tg ± 0 °c) to (Tg + 5 ° ° C). In these temperature ranges, it is preferable that the member (C) is not thermally deteriorated and can be extended without causing cracking. In the method of the above (1), the stretching ratio of the uniaxial stretching in the longitudinal direction is, for example, 1.03 to 1.5 times, preferably 1.05 to 1.3 times, more preferably 1.1 to 1.2 times. When the stretching ratio is less than 1.03 times, since the optical anisotropic material has no φ method such as the desired alignment, and the stretching ratio exceeds 1.5 times, since the pattern of the concave portion and the convex portion is continuously formed in the step (I), Defects such as cracks are not good. Further, in the method of the above (1), the stretching speed in the longitudinal direction of the uniaxial stretching is, for example, 2 to 100 m/min, preferably 5 to 50 m/min. In the member (d) obtained in the step (III), the direction of the maximum refractive index in the surface of the member (d) of the optically anisotropic material which is uniaxially extended in the longitudinal direction is usually 0± with respect to the length direction of the member (d). The range of 3 degrees, preferably φ is in the range of 〇 ± 2 degrees, more preferably in the range of 0 ± 1 degree, and most preferably in the range of 0 ± 0.5 degrees. When the step (III) is carried out by the method of the above (2), the member (c) is uniaxially stretched in the width direction. The uniaxial extension in the width direction, i.e., the transverse uniaxial extension, is carried out under more precise temperature control than the uniaxial extension in the longitudinal direction, so that a uniform and uniform polarization diffractive element can be suitably obtained. For example, the uniaxial extension in the width direction is preferably carried out in an oven in which the temperature distribution is controlled within a set temperature of ± 0.5 ° C, preferably within a temperature of ± 0.3 ° C, and preferably within a temperature of ± 0.2 ° C. -91 - 201027140 In this paper, the set temperature of the uniaxial extension in the width direction is the same as the case of the uniaxial extension in the longitudinal direction. It can be equal to the temperature in all areas of the oven, or it can be set to the temperature of the staged or gradient distribution. When the set temperature is set to the temperature of the distribution, the actual temperature distribution in the oven and the set temperature distribution are within ± 〇 5 ° C, preferably within ± 0.3 ° C, preferably within ± 2 ° C. The set temperature of the uniaxial extension in the width direction may be the same as or different from the set temperature in the step of extending the uniaxial direction in the longitudinal direction. The set temperature of the uniaxial extension in the width direction is the same as the case of the uniaxial extension in the longitudinal direction, and is not particularly limited. For example, when the transparent resin (A) constituting the member (c) is a thermoplastic resin, the glass transition temperature of the thermoplastic resin is used. (Tg) is usually in the range of (Tg - 10 ° C) to (Tg + 70 ° C), preferably in the range of (Tg ± 0 ° C) to (Tg + 50 ° C). The stretching ratio of the uniaxial stretching in the width direction may be determined according to the required characteristics of the polarizing diffractive element to be manufactured, but when it is manufactured by the method of the above (2), it is, for example, 1.02 to 1.4 times, preferably 1.04 to 1.25 times, preferably. It is in the range of 1.05 to 1.2 times. If the stretching ratio is less than 1.02 times, it is not preferable because the optical anisotropic material is not uniformly formed. When the stretching ratio exceeds 1.4 times, the concave portion and the convex portion are continuously formed due to the formation in the step (I). It is not good for the type to have defects such as cracks. The stretching speed of the uniaxial stretching in the width direction is, for example, 2 to 100 m/min, preferably 5 to 50 m/min. The in-plane maximum refractive index direction of the member (d) obtained by the above method (2) is usually in the range of 〇 ± 3 degrees with respect to the width direction of the member (d), preferably in the range of 0 ± 2 degrees, more preferably The range of 〇 ± 1 degree is preferably in the range of 0 ± 0.5 degrees - 92 - 201027140. In the heating extension step of the polarizing diffractive elements, the components of the constituent member (c) are selected in consideration of characteristics such as the polymer type 'copolymerization ratio, molecular weight distribution, heat distortion temperature (glass transition temperature) (transparent tree month) In the steps of (A), a composition comprising the compound (C), and a composition comprising the compound (B), if necessary, and uniaxially extending in the longitudinal direction and uniaxially extending in the width direction, The characteristics of the resulting polarizing diffractive element are controlled by selecting the set temperature of φ in the oven, selecting the stretching ratio and the stretching speed. Moreover, after the extending step, the width of the concave portion or the convex portion of the pattern and the depth of the concave portion of the pattern are reduced, but the shape after the extending step can be controlled by controlling the characteristics of the polarizing diffractive element by adjusting the range as described above. The polarizing optical element obtained by the manufacturing method of the present invention can be applied as an optical component incorporated in an optical reading device or the like. In the optical component through which the laser light passes, the smoothness of the component is required in order to prevent the laser light from being skewed without passing the laser light. The index of the smoothness is the use of the wavefront aberration (full RMS, Xrms), but the polarizing optical element obtained by the manufacturing method of the present invention uses a smooth substrate (a) and is coated with a precise material. (Full) step ((Π) step) or precision extension step ((III) step), thus ensuring sufficient smoothness. The total RMS 透过 of the transmission wavefront aberration of the polarizing optical element obtained by the manufacturing method of the present invention is, for example, 2 mm Φ in the DVD wavelength, preferably 25 ηηλ or less, more preferably 20 ηηλ or less, and most preferably 15 ηηλ. the following. When the full RMS 値 exceeds 25 ηηλ, the optical output of the optical reading device is degraded due to the skew of the emitted laser light, which is not good. &lt;Anti-reflection treatment&gt; The polarizing diffractive element obtained by the production method of the present invention is the member (d) itself obtained in the step (III), but usually has an anti-reflection layer, which is obtained by the production method of the present invention. The polarizing diffractive element preferably has an antireflection layer. The antireflection layer can be coated with a thermosetting resin composition or a photocurable resin composition by a conventional coating method such as gravure coating, die coating, or slit coating® cloth, and dried after being dried as needed. . Further, it may be formed by sputtering or vapor deposition. The layers may be provided on one side of the member (d) or on both sides. Further, it may be provided on the surface of the substrate (a) on which the pattern is not formed, or may be provided on the surface of the member (b) which does not have a pattern or may be provided on the member (c).

抗反射層通常係由低折射率層形成，另爲了提高抗反 射性能，亦可具有低折射率層與高折射率層之層合構造， G 又爲了進一步確保耐擦傷性，亦可具有硬質塗層。層合順 序係自偏光元件之最外層側起，較好依硬質塗層/高折射 率層/低折射率層之順序層合。另依據需要，在低折射率 層與高折射率層之間或者硬質塗層與高折射率層之間亦可 具有中折射率層。 至於用以形成低折射率層及高折射率層之組成物舉例 爲習知之硬化性組成物。例如，含有一種以上之環氧系樹 脂、酚系樹脂、三聚氰胺系樹脂、醇酸系樹脂、氰酸酯系 -94- 201027140 樹脂、丙烯酸系樹脂、聚酯系樹脂 '胺基甲酸酯系樹脂、 矽氧樹脂等作爲結合劑樹脂’進而’形成低折射率層用組 成物含有含氟化合物’形成高折射率層用組成物含有高折 射率之無機粒子’例如氧化砍、氧化銘、氧化鈦'氧化锆 、氧化鈽、氧化銃、氟化鎂等金屬氧化物粒子。 低折射率層及高折射率層之折射率及厚度係在習知範 圍內使用，爲了提高對所使用波長之抗反射效果’低折射 φ 率層之折射率（2 5 °C，於波長5 8 9nm之平均折射率）較好 爲1.45以下，低折射率層之厚度較好爲50〜300nm。又，高 折射率層之折射率（25°C，於波長5 89nm之平均折射率） 較好比低折射率層之折射率大〇.〇5以上之折射率’厚度較 好爲 50〜1 0,000nm。 本發明之偏光性繞射元件爲以前述偏光性繞射元件之 製造方法獲得之元件。該製造法爲經濟性優異之製造方法 ，且以該製造方法獲得之偏光性繞射元件由於全面中偏光 φ 性能高度受到控制，故適用於組裝在光讀取裝置等中作爲 光學零件。 [實施例] 以下依據實施例更具體說明本發明，但本發明並不受 該等實施例之限制。又，各性狀係如下列般測定、評價。 (1)正常光透過率及異常光透過率 使用大塚電子公司製造之RETS-1200VA，在光徑5mm -95- 201027140 φ之條件下，藉由使光線相對於偏光性繞射元件垂直入射 ，分別測定正常光透過率及異常光透過率。其中，入射之 光設爲直線偏光，以直線偏光之偏波面與爲異向性材料之 紫外線硬化型液晶材料之正常光折射率爲平行之方向設爲 正常光，又與異常光折射率成平行之方向設爲異常光，測 定透過率。亦即，以下實施例中，相對於薄膜之長度方向 連續形成有凹部與凸部之圖型中，以相對於薄膜長度方向 垂直入射直線偏光之偏波面之情況設爲正常光，以相對於 薄膜長度方向平行的入射直線偏光之偏波面之情況設爲異 常光而測定透過率。 (2) 波前像差 使用Fujinon公司製造之雷射干涉計R-10，使用波長 656nm、光徑2ηιιηφ之雷射光，測定全面RMS( Arms)作 爲偏光性繞射元件之波前像差。 (3 )反射率 以黑色噴霧塗裝測定反射率之面之相反側表面，利用 分光反射率測定裝置（組裝大型試料室積分球附屬裝置 150-09090之分光光度計U-3410，日立製作所（股）製造 )，測定偏光性繞射元件於波長660nm及78 5nm之反射率 。具體而言，以鋁之蒸鏟膜之反射率作爲基準（1 00% )， 測定於660nm及785nm之反射率。 201027140 (4)玻璃轉移溫度（Tg) 使用Seiko Instruments公司製造之DSC6200，以升溫 速度每分鐘20°C，於氮氣流中進行測定。樹脂之Tg爲在示 差掃描熱量曲線上對微分示差掃描熱量之最大峰値溫度（ A點）及比最大峰値溫度-20°C之溫度（B點）作圖，以B點 作爲起點之基準線上之接線與以A點作爲起點之接線之交 叉點而求得。紫外線硬化型丙烯酸樹脂之Tg係使用強制共 φ 振振動型之動黏彈性測定裝置，測定作爲硬化薄膜時之玻 璃轉移溫度。具體而言，一邊對硬化薄膜施以頻率數10Hz 之振動，一邊以3 °C /分鐘之升溫速度測定損失正切。以顯 示最大値之損失正切値之溫度作爲玻璃轉移溫度（Tg )。 (5 )氫化率 核磁共振分光計（NMR )係使用Bruker公司製造之 AVANCE 500，測定溶劑爲d-氯仿測定1H-NMR。由 ^ 5.1〜5.8ppm之伸乙稀基、3.7ppm之甲氧基、0.6~2.8ppm之 脂肪族質子之積分値計算出單體之組成後，計算出樹脂之 氫化率。 (6)重量平均分子量（Mw)及分子量分佈（Mw/Mn) 使用凝膠滲透層析儀（TOSOH (股）製造之HLC-8220 GPC，管柱：依序連接TOSOH (股）製造之Guard管 柱 Hxl-H、TSK凝膠 G7000Hxl、TSK凝膠 GMHXL兩根、TSK 凝膠G2000HXL，溶劑：四氫呋喃，流速：lmL/min，樣品 -97- 201027140 濃度：0.7〜0.8質量％ ’注入量：70 L，測定溫度：設爲 4〇°C，檢測器：RI ( 40°C )，標準物質：TOSOH (股）製 造之TSK標準聚苯乙烯），測定樹脂之重量平均分子量（ Mw )及分子量分佈（Mw/Mn )。另，前述Μη爲數平均分 子量。 (7 )殘留溶劑量 將樣品（薄膜）溶解於二氯甲烷中，使用氣相層析儀 @ (島津製作所製造之GC-7A)分析所得之溶液。 (8)對數黏度 使用Ubblohde型黏度計，針對環狀烯烴樹脂在氯仿中 (試料濃度：〇.5g/dL)，於30°C測定。對可溶性聚醯亞胺 ，在N -甲基-2 -吡咯啶酮中（試料濃度：〇.5g/dL)，於30 °C測定。 (9 )飽和吸水率 依據ASTM D57〇 ’將樣品（樹脂）浸漬於23°C之水中 一週，測定浸漬前後之質量變化而求得。 (1〇)全光線透過率，濁度 使用Suga試驗機公司製造之濁度計（JJGM-2DP型）， 測定薄膜之全光透過率。 以下之合成例、調製例、製造例及實施例中，合成例 -98- 201027140 A、調製例A、製造例A及實施例A分別顯示本發明之樣態A ，合成例B、調製例B、製造例B及實施例B分別顯示本發 明之樣態B。 [合成例A1](樹脂（A-1) (環狀烯烴系樹脂）之合成 ) 使用225質量份之8-甲基-8-甲氧基羰基四環 φ [4.4.0·l2.5·l_7.1°]-3-癸烯（DNM)，及 25 質量份之雙環 [2.2.1]庚-2-烯（原冰片烯）作爲單體，與27質量份之1-己 烯（分子量調節劑）及750質量份之甲苯（開環聚合反應 用溶劑）一起饋入經氮氣置換之反應容器中，將該溶液加 熱至60 °C。接著，於反應容器內之溶液中添加0.62質量份 之作爲聚合觸媒之三乙基鋁之甲苯溶液（1.5111〇1/1〇及3.7 質量份之以第三丁醇及甲醇改質之六氯化鎢（第三丁醇： 甲醇：鶴_=〇.35mol: 0.3mol: lmol)之甲苯溶液（濃度 φ 0.05mol/L)，使該溶液在80°C下加熱攪拌3小時藉此進行 開環聚合反應，獲得開環聚合物溶液。該聚合反應中之聚 合轉化率爲9 7 %。 將1,000質量份之如此獲得之開環聚合物溶液饋入高 壓釜中，將〇」2質量份之RuHC1(CO)[P(C6H5)3]3添加於該 開環聚合物溶液中，在l〇〇kg/cm2之氫氣壓、反應溫度165 °C之條件下加熱攪拌3小時，進行氫化反應。 使所得反應溶液（氫化聚合物溶液）冷卻後，使氫氣 放壓。將該反應溶液注入大量甲醇中且分離回收凝固物， 99 - 201027140 並使之乾燥，獲得氫化聚合物（以下稱爲「樹脂（A- 1 ) J ) 0 如此獲得之樹脂（A-1)藉由1H-NMR測定之氫化率爲 99.9% ’以DSC法測定之Tg爲130°C，以GPC法測定之聚苯 乙烯換算之 Μη 爲 20,800，Mw 爲 62,000，及 Mw/Mn 爲 3.00, 於23 °C之飽和吸水率爲0.21 %，及於30 °C之於氯仿中之對 數黏度爲〇.51dl/g。 [合成例A2](樹脂（A_2 ) (環狀烯烴系樹脂）之合成 ) 使用71質量份之DN Μ、15質量份之二環戊二烯（三環 [4.3.0.12 5]癸-3,7-二烯）（DCP)及1質量份之原冰片嫌（ ΝΒ )作爲單體，與18質量份之分子調節劑之1-己烯及200 質量份之甲苯一起饋入經氮氣置換之反應容器中，且加熱 至 loot：。 於其中添加0.005質量份之三乙基鋁、0.005質量份之 甲醇改質之WC16 (無水甲醇：PhPOCl2 : WC16=1 03 : 630 :427質量比）’且反應1分鐘，接著，於5分鐘內追加添 加10質量份之DCP及3質量份之NB，再反應45分鐘，藉此 獲得源自DNM之構成單位/源自DCP之構成單位/源自NB之 構成單位=69.77/26.0 1/4.23 ( wt% )之共聚物。 接著，將所得共聚物溶液饋入高壓釜中，再添加200 份之甲苯。隨後，添加1質量份之十八烷基- 3-( 3，5-二-第 三丁基-4-羥基苯基）丙酸酯作爲反應調整劑，及〇.006質 -100- 201027140 量份之爲氫化觸媒之RuHC1(CO)[P(C6H5)]3，且直至155°C 過熱後，於反應器中注入氫氣，使壓力成爲lOMPa。隨後 ，使壓力維持在lOMPa，在165°C進行反應3小時。反應結 束後，添加1〇〇質量份之甲苯、3質量份之蒸餾水、0.72質 量份之乳酸、0.002 14質量份之過氧化氫，且在60 °C加熱 30分鐘。隨後，添加200質量份之甲醇且在60 °C加熱30分 鐘，使之冷卻至25 °C，分離成兩層。去除5 00質量份之上 φ 澄液’再添加3 50質量份之甲苯、3質量份之水且在60°C加 熱30分鐘，隨後添加240質量份之甲醇且在60 °C加熱30分 鐘，並冷卻至25 °C，分離成兩層。去除500質量份之上澄 液，再添加350質量份之甲苯、3質量份之水且在60 °C加熱 30分鐘，隨後添加240質量份之甲醇且在6CTC下加熱30分 鐘’並冷卻至25 °C，分離成兩層。最後去除500質量份之 上澄液後，使用2.0/zm、i.oytn、0.2;zm之各過濾器過濾 殘留之聚合物溶液。隨後，將聚合物固成分量濃縮至55% 〇 爲止’且在2 5 0 °C、4 torr、滞留時間1小時下進行脫溶劑 處理’通過10 # m之聚合物過濾器，獲得共聚物（以下稱 爲「樹脂（A-2)」。 如此獲得之樹脂（A-2)藉由1H-NMR測定之氫化率爲 9 9 · 9 %，以D S C法測定之τ g爲1 3 1 °C，以GP C法測定之聚苯 乙嫌換算之Mπ爲16,000，Mw爲61,000，及Mw/Mn爲3.81, 於23 °C之飽和吸水率爲0.18%，以及在30t之於氯仿中之 對數黏度爲〇.52dl/g。 -101 - 201027140 [合成例A3](樹脂（A-5 )(環狀烯烴系樹脂）之合成） 除使用53質量份之四環[4·4.0.125.171()]-3-十二碳烯 、46質量份之8-亞乙基四環[4.4.0.12·5.171()]-3-十二碳烯、 及66質量份之三環[4.3.0.12·5]-癸-3,7-二烯，且1-己烯（分 子量調節劑）之添加量設爲22質量份，並使用環己烷替代 甲苯作爲開環聚合反應用溶劑以外，餘如合成例Α1同樣， 獲得氫化聚合物（以下稱爲「樹脂Α-5」）。 所得樹脂（Α-5 )之氫化率爲99.9%，玻璃轉移溫度（ Tg)爲 125°C，Μη 爲 30,000，Mw 爲 122,000，分子量分佈 (Mw/Mn)爲 4_07，對數黏度爲 0.63dl/g。 [合成例A4](聚醯亞胺之合成） 將22.4克（0.1莫耳）作爲四羧酸二酐之2,3,5-三羧基 環戊基乙酸二酐、19.8克（0.1莫耳）作爲二胺化合物之 4,4’-二胺基二苯基甲烷溶解於800克之N-甲基-2-吡咯啶酮 中，在60 °C下反應4小時。接著，將反應溶液注入大爲過 量之甲醇中使反應產物沉澱。隨後，以甲醇洗淨，且在減 壓下於40°C乾燥15小時，獲得390克對數黏度0.32dl/g之聚 醯胺酸。將25克所得之聚醯胺酸溶解於47 5克之N-甲基-2-吡咯啶酮中，添加39·5克之吡啶及30.6克之乙酸酐，且在 1 l〇°C脫水閉環4小時，如上述般進行沉澱、洗淨、減壓， 獲得19.5克對數黏度0.64(11^、醯亞胺化率92%之聚醯亞胺 -102- 201027140 [合成例A5](聚醯胺酸酯之合成） 將0.1莫耳（22.4克）2,3,5-三羧基環戊基乙酸二酐及 0.1莫耳（10.8克）對-苯二胺溶解於300克之N-甲基-2-吡 略陡酮中，且在60 °C反應6小時。接著’將反應混合物注 入大爲過量之甲醇中，使反應產物沉澱。隨後，以甲醇洗 淨，於減壓下在4〇°C乾燥15小時，獲得27.4克之聚醯胺酸 。於16·6克所得聚醯胺酸中添加350克N-甲基-2-吡咯啶酮 ❿ 、38_7克1-溴-6-(4-查爾酮氧基（（：1131(；〇11丫1(^)〇 )己院 及13.8克之碳酸鉀，在120 °C反應4小時。接著，將反應混 合液注入水中，使反應產物沉澱。以水洗淨所得沉澱物， 且在減壓下乾燥15小時，獲得35.4克聚醯胺酸酯。 [合成例A6](胺基甲酸酯丙烯酸酯之合成） 於具備攪拌機之反應容器中添加49.96質量份之丙烯 酸2-苯氧基乙酯、0.01質量份之2,6_二第三丁基-對-甲酚、 # 〇· 04質量份之二月桂酸二正丁基錫、17.74質量份之甲苯二 異氰酸醋’冷卻至5〜15 t：。使溫度成爲10。(：以下後，邊攪 拌邊滴加11.84質量份之丙烯酸2 -羥基乙酯，一邊將液體溫 度控制在20〜35 °C —邊攪拌1小時。隨後，饋入2〇4〇質量 份之雙酣A之環氧烷加成之二元醇（曰油（股）製造之 DA_4〇〇) ’在55〜65°C連續反應3小時，以殘留異氰酸酯成 爲〇· 1質量％以下時作爲反應終點，獲得胺基甲酸酯丙烯酸 酯。 -103- 201027140 [合成例B1](樹脂（A-1)(環狀烯烴系樹脂）之製造 ) 使用225質量份之8_甲基-8-甲氧基羰基四環 [4.4.0.125.17_1Q]_3_十二碳烯（〇ΝΜ ) 、25 質量份之雙環 [2.2.1]庚-2-烯（原冰片烯）作爲單體，與27質量份之^己 烯（分子量調節劑）及75 0質量份之甲苯（開環聚合反應 用溶劑）一起饋入經氮氣置換之反應容器中，將該溶液加 熱至60 °C。接著，於反應容器內之溶液中添加作爲聚合觸 媒之0.62質量份之三乙基鋁之甲苯溶液（1.5莫耳/升）及 3.7質量份之以第三丁醇及甲醇改質之六氯化鎢（第三丁 醇：甲醇：鎢=0.3 5莫耳：0·3莫耳：1莫耳）之甲苯溶液（ 濃度〇.〇5莫耳/升），且使該溶液在80°C加熱攪拌3小時藉 此進行開環聚合反應，獲得開環聚合物溶液。該聚合反應 中之聚合轉化率爲9 7 %。 將1，000質量份之如此獲得之開環聚合物溶液饋入高 壓釜中’且將0.12質量份之111111&lt;：1((：0)[?(&lt;：6115)3]3添加於 該開環聚合物溶液中，在100kg/cm2之氫氣壓、反應溫度 1 65 °C之條件下加熱攪拌3小時，進行氫化反應。 使所得反應溶液（氫化聚合物溶液）冷卻後，使氫氣 放壓。將該反應溶液注入大量甲醇中且分離回收凝固物， 並使之乾燥，獲得氫化聚合物（以下稱爲「樹脂（A-1) j ) ° 如此獲得之樹脂（A-1 )以1H-NMR測定之氫化率爲 99.9%，以DSC法測定之Tg爲130°C，以GPC法測定之聚苯 -104- 201027140 乙烯換算之 Μη 爲 20,800，Mw 爲 62,000，且 Mw/Mn 爲 3.00, 於23 °C之飽和吸水率爲0.21 %及在30°C之於氯仿中之對數 黏度爲〇.51dl/g。 [合成例B2](樹脂（A-2 ) (環狀烯烴系樹脂）之製造 ) 除使用53份之四環[4.4.0.12 5.l71Q]-3-十二碳烯、46 φ 份之8-亞乙基四環[4.4.0.12·5.171()]-3-十二碳烯及66份之三 環[4.3.0.12·5]-癸-3,7_二烯，且使1-己烯（分子量調節劑） 之添加量成爲22質量份，並使用環己烷替代甲苯作爲開環 聚合反應用溶劑以外，餘如合成例Β1同樣地獲得氫化聚合 物（以下稱爲「樹脂Α-2」）。 所得樹脂（Α-2 )之氫化率爲99.9%，玻璃轉移溫度（ Tg)爲 125°C，Μη 爲 3 0,000，Mw 爲 1 22,000，分子量分佈 (Mw/Mn)爲 4.07，對數黏度爲 0.63dl/g。 Φ [合成例B3](樹脂（A-3) (環狀烯烴系樹脂）之合成 ) 使用71質量份之DNM、15質量份之二環戊二烯（三環 [4·3.0·12·5]癸-3,7_二烯）（DCP )及1質量份之原冰片嫌（ ΝΒ )作爲單體，與18質量份之分子調節劑的1-己烯及200 質量份之甲苯一起饋入經氮氣置換之反應容器中，且加熱 至 100°C。 於其中添加0.005質量份之三乙基鋁、0.005質量份之 -105- 201027140 甲醇改質之WC16 (無水甲醇：PhP〇Cl2 : WC16= 1 03 : 630 :42 7質量比）’並反應1分鐘’接著，於5分鐘內追加添 加10質量份之DCP及3質量份之NB，再反應45分鐘，獲得 源自DNM之構成單位/源自DCP之構成單位/源自NB之構成 單位= 69.77/26.01/4.23 ( wt%)之共聚物。 接著’將所得共聚物溶液饋入高壓釜中，再添加200 份之甲苯。隨後’添加1質量份之作爲反應調整劑之十八 烷基- 3-(3,5-二-第三丁基-4-羥基苯基）丙酸酯，及0.006 · 質量份之氫化觸媒RuHC1(CO)[P(C6H5)]3，且直至1 55 °C過 熱後，於反應器中注入氫氣，使壓力成爲lOMPa。隨後， 使壓力維持在lOMPa，在165°C進行反應3小時。反應結束 後，添加1〇〇質量份之甲苯、3質量份之蒸餾水、0.72質量 份之乳酸、〇.〇〇214質量份之過氧化氫，且在60°C加熱30 分鐘。隨後，添加200質量份之甲醇且在60 °C加熱30分鐘 ，使之冷卻至25 t，分離成兩層。去除500質量份之上澄 液，再添加350質量份之甲苯、3質量份之水且在6CTC加熱 ❹ 30分鐘，隨後添加240質量份之甲醇且在60°C加熱30分鐘 ，並冷卻至25 °C，分離成兩層。去除500質量份之上澄液 ，再添加350質量份之甲苯、3質量份之水且在60°C加熱30 分鐘，隨後添加240質量份之甲醇且在60 °C加熱30分鐘， 並冷卻至25°C，分離成兩層。最後去除500質量份之上澄 液後，使用2.0#m、1.0/zm、0.2#xn之各過濾器過濾殘留 之聚合物溶液。隨後，聚合物固成分量濃縮至55 %爲止’ 在250 °C、4 torr、滯留時間1小時進行脫溶劑處理，通過 -106- 201027140 10〆m之聚合物過濾器，獲得共聚物（以下稱爲「樹脂（ A-3)」° 如此獲得之樹脂（A-3 )以1H-NMR測定之氫化率爲 99.9%，以DSC法測定之Tg爲131°C，以GPC法測定之聚苯 乙烯換算之 Μη爲 16,000’ Mw爲 61，000，及 Mw/Mn爲 3.8 1， 於23°C之飽和吸水率爲〇_18%，及在30°C之於氯仿中之對 數黏度爲〇.52dl/g 。 ❹ [合成例B4](胺基甲酸酯丙烯酸酯之合成） 於具備攪拌機之反應容器中添加49,96質量份之丙烯 酸2-苯氧基乙酯、0.01質量份之2,6-二第三丁基·對-甲酚、 0.04質量份之二月桂酸二正丁基錫、17.74質量份之甲苯二 異氰酸酯，冷卻至5〜15 °C。使溫度成爲10 °C以下後，邊攪 拌邊滴加11·84質量份之丙烯酸2-羥基乙酯，將液體溫度控 制在20〜35°C同時攪拌1小時。隨後，饋入20.40質量份之 © 雙酚A之環氧烷加成之二元醇（日油（股）製造之DA-400 )’在55〜65 °C繼續反應3小時，以殘留異氟酸酯成爲0.1 質量％以下時作爲反應終點，獲得胺基甲酸酯丙烯酸酯。 [調製例A1](紫外線硬化型丙烯酸樹脂（D-1 )之調製） 於具備攪拌機之反應容器中饋入以下所示調配比（質 量份）之各成分，且在50 t攪拌混合1小時，獲得液狀組 成物。具體調配比爲合成例A6中所得之胺基甲酸酯丙烯酸 醋9.8質量份、三羥甲基丙烷三丙烯酸酯13.7質量份、參（ -107- 201027140 2-經基乙基）異脲氰酸丙烯酸酯29.4質量份、聚氧伸烷基 雙酚A二丙烯酸酯32.3質量份、二季戊四醇六丙烯酸酯/二 季戊四醇五丙烯酸酯之混合物4.9質量份' N-乙烯基-2-吡 略陡酮7.8質量份' 1-羥基環己基苯基酮1.5質量份、硫二 伸乙基雙（3_(3,5_二第三丁基_4_羥基苯基）丙酸酯）〇_3 質量份、二乙胺0.1質量份、聚氧伸烷基烷基醚磷酸酯0.3 質量份，以上合計爲〖〇〇.丨質量份。所得之作爲液狀組成 物之紫外線硬化型丙烯酸材料之黏度依據JIS K7 117，使 用旋轉式黏度計，於25。(：之値爲540mPa · s，紫外線硬化 後之丙烯酸樹脂（D_l)之Tg爲120°C。 [調製例A2](配向膜組成物（B-1 )之調製） 相對於100重量份之蒸餾水，混合5重量份之具有聚乙 烯醇之羥基以〇.2莫耳％經取代基-OCOPhO(CH2)4〇COCH = CH2取代，以&quot;^莫耳^經取代基-0C0Ch3取代之構造， 皂化度88莫耳％，聚合度3〇〇之改質聚乙烯醇粉體，且添加 3 5重量份之甲醇使之溶解。使用孔徑lym之過濾器過濾該 溶液，調製配向膜組成物（B-1 )。 [調製例A3](配向膜組成物（B-2)之調製） 將合成例A4獲得之聚醯亞胺溶解於r-丁內酯中，且 相對於100重量份之聚合物溶解0.75重量份之N-乙氧基羰 基-3-胺基丙基三乙氧基矽烷，成爲固形份濃度4重量。/〇之 溶液。使用孔徑1/zm之過濾器過濾該溶液，調製配向膜組 -108- 201027140 成物（B-2 )。 [調製例A4](配向膜組成物（B-3)之調製） 將合成例A5獲得之聚醯胺酸酯溶解於r-丁內酯中， 且相對於1〇〇重量份之聚合物溶解0.75重量份之N-乙氧基 羰基-3-胺基丙基三乙氧基矽烷，成爲固形份濃度4重量％ 之溶液。使用孔徑之過濾器過濾該溶液，調製配向膜 . 組成物（B-3 )。 [調製例A5](配向膜用紫外線硬化型丙烯酸樹脂（B-4) 之調製） 於具備攪拌機之反應容器中以如下所示調配比（質量 份）饋入各成分，室溫攪拌混合1小時，獲得液狀組成物 。具體之調配比爲二環戊烯基氧基乙基丙烯酸酯90.1質量 份、異脲氰酸酯三丙烯酸酯7.2質量份、2-甲基-1-[4-(甲 φ 硫基）苯基]-2-嗎啉基丙-1-酮2.7質量份，以上合計爲 100.0質量份。所得之作爲液狀組成物之紫外線硬化型丙 烯酸材料之黏度依據JIS K7 117，使用旋轉式黏度計，於 2 5°C之値爲24mPa · s，獲得經紫外線硬化之丙烯酸樹脂（ B-4 )。 [調製例A6](紫外線硬化型丙烯酸樹脂（D-2)之調製） 於具備攪拌機之反應容器中以如下所示調配比（質量 份）饋入各成分，在室溫攪拌混合1小時，獲得液狀組成 -109- 201027140 物。具體之調配比爲1,6 -己二醇二丙烯酸酯61.2質量份、 丙烯酸2 -苯氧基乙酯26.2質量份、異脲氰酸酯三丙烯酸酯 9.7質量份、1-羥基環己基苯基酮2.9質量份，以上合計爲 100.0質量份。所得之作爲液狀組成物之紫外線硬化型丙 烯酸材料之黏度依據JIS K7117，使用旋轉式黏度計，於 25°C之値爲17mPa · s，獲得經紫外線硬化之丙烯酸樹脂（ D-2 )。 [調製例B1](紫外線硬化型丙烯酸樹脂之調製） 於具備攪拌機之反應容器中以如下所示調配比（質量 份）饋入各成分，在50 °C攪拌混合1小時，獲得液狀組成 物。具體之調配比爲合成例B4中所得之胺基甲酸酯丙烯酸 酯9.8質量份、三羥甲基丙烷三丙烯酸酯13.7質量份、參（ 2-羥基乙基）異脲氰酸丙烯酸酯29.4質量份、聚氧伸烷基 雙酚A二丙烯酸酯32.3質量份、二季戊四醇六丙烯酸酯/二 季戊四醇五丙烯酸酯之混合物4.9質量份、N-乙烯基-2-吡 咯啶酮7.8質量份、1-羥基環己基苯基酮1.5質量份、硫二 伸乙基雙（3-(3,5-二第三丁基-4-羥基苯基）丙酸酯）0.3 質量份、二乙胺0.1質量份、聚氧伸烷基烷基醚磷酸酯0.3 質量份，以上合計爲1 〇〇. 1質量份。所得之作爲液狀組成 物之紫外線硬化型丙烯酸材料之黏度依據JIS K7 117，使 用旋轉式黏度計，於25t之値爲540mPa · s，紫外線硬化 後之樹脂之Tg爲120°C。 -110- 201027140 [製造例A1](基材（a-1)之製造） 使用雙軸擠出機（東芝機械股份有限公司製造； TEM-48 )擠出合成例A1獲得之樹月旨（A-1 )與作爲抗氧化 劑之季戊四醇基肆[3-(3,5-二第三丁基-4-羥基苯基）丙酸 酯]，於冷卻水槽中冷卻自線股模嘴流出之樹脂線股後， 送入線股切斷機，裁斷成米粒狀，獲得造粒樹脂（透明樹 脂（A-1 ))。抗氧化劑添加量相對於1 〇〇質量份之樹脂爲 麕 0.1質量份。 使該造粒樹脂在氮氣氛圍中，於100°C乾燥4小時後， 送入單軸擠出機（90mm(D )中，在260°c下熔融，同時以 齒輪泵浦實施定量擠出，使用公稱網目爲1〇μπι之日本精線 製之金屬纖維燒結過濾器進行熔融過濾，使用掛衣架型模 嘴（寬度17〇〇mm)，使掛衣架模嘴出口之間隙作爲0.5mm ，在260°C擠出成膜狀。此時使用之模嘴之口模面（die land )長度（模嘴出口之平行部份之長度）爲20mm。使自 φ 模嘴出口至輥壓著點之距離設爲65mm，使押出之薄膜挾 持在表面粗糙度爲0.1S之25 0mm(D之鏡面輥與0.3xnm厚之 金屬輸送帶之間，使薄膜之表面轉印至光澤面。金屬輸送 帶（寬度1 650mm )爲藉由橡膠被覆之輥（支撐之輥直徑 爲150mm〇))與冷卻輕（輥直徑150mm)保持者，使用市 售之滑動式轉印輥（千葉機械工業製造）並轉印。轉印時 之輥間隔爲〇.35«1«1，轉印壓力爲〇.351^&amp;。 此時，使鏡面輥外周之周速設爲iOm/min。此時_之鏡 面輥之溫度係使用油調溫機設定成125°C ’橡膠被覆輥之 -111 - 201027140 溫度係設定成115°C。 於鏡面輥下游側配置250mm(D之冷卻輥，且自鏡面輥 剝離之薄膜到壓著至設定爲1 1 5 °C之冷卻輥上之時間設爲 2.1秒並冷卻。隨後以剝離張力0.4MPa · cm剝離薄膜，於 一面上貼合遮蔽薄膜，以捲取機捲取，獲得厚度130μηι之 樹脂薄膜（以下稱爲「基材（a-Ι)」）。所得薄膜之殘 留溶劑量爲0.1%，全光線透過率爲93%，玻璃轉移溫度（ Tg)爲 130〇C。 [製造例A2](基材（a-2)之製造） 除使用合成例A2中獲得之樹脂（A-2)替代製造例A 1 中之樹脂（A-1)以外，餘與製造例A1同樣，獲得厚度 130μιη之樹脂薄膜（以下稱爲「基材（a-2)」）。所得薄 膜之殘留溶劑量爲0.1 %，全光線透過率爲93 %，玻璃轉移 溫度（Tg)爲 13 1°C。 [製造例A3](基材（a-5)之製造） 除使用合成例A3中獲得之樹脂（A-5 )替代製造例A1 中之樹脂（A-1)以外，餘與製造例A1同樣，獲得厚度 ΙΟΟμπι之樹脂薄膜（以下稱爲「基材（a_5 )」）。所得薄 膜之殘留溶劑量爲0.1%，全光線透過率爲93%，玻璃轉移 溫度（Tg)爲 124°C。 [製造例B1](基材（n)之製造） -112 _ 201027140 使用雙軸擠出機（東芝機械股份有限公司製造； TEM-48)擠出合成例B1獲得之樹脂（A-1)與作爲抗氧化 劑用之季戊四醇基肆[3-(3,5-二第三丁基-4-羥基苯基）丙 酸酯]，於冷卻水槽中冷卻使自線股模嘴流出之樹脂線股 後，送入線股切割機，裁斷成米粒狀’獲得造粒樹脂（透 明樹脂（A-1 ))。抗氧化劑添加量相對於1 〇〇質量份樹脂 爲0.1質量份。 Φ 使該造粒樹脂在氮氣氛圍下，於100°C乾燥4小時後， 送入單軸擠出機（90mm(D )中，在260°c下熔融，以齒輪 泵浦實施定量擠出，使用公稱網目爲1〇 Rm之日本精線製之 金屬纖維燒結過濾器進行熔融過濾，使用掛衣架型模嘴（ 寬度1 700mm )，使掛衣架模嘴出口之間隙設爲0.5mm，在 260 °C擠出成膜狀。此時使用之模嘴之口模面長度（模嘴 出口之平行部份之長度）爲20mm。使自模嘴出口至輥壓 著點之距離設爲65mm，使押出之薄膜挾持在表面粗糙度 爲0.1S之25 0mm Φ之鏡面輥與0.3 mm厚之金屬輸送帶之間 ，使薄膜之表面轉印至光澤面。金屬輸送帶（寬度 1650mm)爲藉由橡膠被覆之輥（支撐之輥直徑爲150mm&lt;D )與冷卻輥（輥直徑150mm )保持者，使用市售之滑動式 轉印輥（千葉機械工業製造）並轉印。轉印時之輥間隔爲 0.35mm，轉印壓力爲〇.35MPa。 此時’使鏡面輥外周之周速設爲l〇m/min。此時之鏡 面輥之溫度係使用油調溫機設定成125 °C，橡膠被覆輥之 溫度係設定成1 1 5 °C。 -113- 201027140 於鏡面輥之下游側配置2 5 0mm Φ之冷卻輥，且自鏡面 輥剝離之薄膜至壓著於設定在115 °C之冷卻輥之時間設爲 2.1秒並冷卻。隨後以剝離張力0.4MPa· cm剝離薄膜，且 於一面上貼合遮蔽薄膜，以捲取機捲取，獲得厚度130μιη 之樹脂薄膜（以下稱爲「基材（a-1)」）。所得薄膜之 殘留溶劑量爲0.1%，全光線透過率爲93%，玻璃轉移溫度 (Tg)爲 130。。。 [製造例B2](基材（a-2)之製造） 除使用合成例B2中獲得之樹脂（A-2 )替代製造例B1 中之樹脂（A-1)以外，餘與製造例B1同樣，獲得厚度 ΙΟΟμπι之樹脂薄膜（以下稱爲「基材（a-2 )」）。所得薄 膜之殘留溶劑量爲0.1%，全光線透過率爲93%，玻璃轉移 溫度（Tg)爲 124°C。 [製造例B3](基材（a-3)之製造） 除使用合成例B3中獲得之樹脂（A-3 )替代製造例B1 中之樹脂（A-1)以外，餘與製造例B1同樣，獲得厚度 130μηι之樹脂薄膜（以下稱爲「基材（a-3)」）。所得薄 膜之殘留溶劑量爲0.1 %，全光線透過率爲9 3 %，玻璃轉移 溫度（Tg)爲 13 1°C。 [實施例A1] 於製造例A1獲得之基材（a-l)之一面上，以飯沼 -114- 201027140The antireflection layer is usually formed of a low refractive index layer, and has a laminated structure of a low refractive index layer and a high refractive index layer in order to improve antireflection performance, and G may have a hard coating in order to further ensure scratch resistance. Floor. The lamination sequence is preferably laminated from the outermost layer side of the polarizing element in the order of the hard coat layer/high refractive index layer/low refractive index layer. Further, depending on the necessity, a medium refractive index layer may be provided between the low refractive index layer and the high refractive index layer or between the hard coat layer and the high refractive index layer. As the composition for forming the low refractive index layer and the high refractive index layer, a conventional hardening composition is exemplified. For example, it contains one or more types of epoxy resin, phenol resin, melamine resin, alkyd resin, cyanate ester-94-201027140 resin, acrylic resin, polyester resin' urethane resin. A resin for forming a low refractive index layer containing a fluorine-containing compound, and a composition for forming a high refractive index layer containing a high refractive index inorganic particle, such as oxidized chopped, oxidized, and titanium oxide. Metal oxide particles such as zirconium oxide, cerium oxide, cerium oxide, and magnesium fluoride. The refractive index and thickness of the low refractive index layer and the high refractive index layer are used within the conventional range, in order to improve the antireflection effect on the wavelength used. The refractive index of the low refractive φ layer (25 ° C, at wavelength 5 The average refractive index of 8 9 nm is preferably 1.45 or less, and the thickness of the low refractive index layer is preferably 50 to 300 nm. Further, the refractive index of the high refractive index layer (25 ° C, the average refractive index at a wavelength of 5 89 nm) is preferably larger than the refractive index of the low refractive index layer. The refractive index of the above 5 or more is preferably 50 to 1 0,000. Nm. The polarizing diffractive element of the present invention is an element obtained by the above-described manufacturing method of the polarizing diffractive element. This manufacturing method is a highly economical manufacturing method, and the polarizing diffractive element obtained by this manufacturing method is highly controlled by the overall mid-polarization φ performance, and is therefore suitable for use as an optical component in an optical reading device or the like. [Examples] The present invention will be more specifically described below based on examples, but the present invention is not limited by the examples. Further, each trait was measured and evaluated as follows. (1) Normal light transmittance and abnormal light transmittance are determined by using RETS-1200VA manufactured by Otsuka Electronics Co., Ltd. under the conditions of an optical path of 5 mm -95 to 201027140 φ, respectively, by causing the light to be incident perpendicularly to the polarizing diffractive element. Normal light transmittance and abnormal light transmittance were measured. Wherein, the incident light is linearly polarized, and the polarized surface of the linearly polarized light is parallel to the normal light refractive index of the ultraviolet curable liquid crystal material which is an anisotropic material, and is parallel to the refractive index of the extraordinary light. The direction is set to abnormal light, and the transmittance is measured. That is, in the following embodiments, in the pattern in which the concave portion and the convex portion are continuously formed in the longitudinal direction of the film, the case where the polarized surface of the linearly polarized light is perpendicularly incident with respect to the longitudinal direction of the film is set as normal light to be opposed to the film. The case where the polarization plane of the incident linear polarization parallel to the longitudinal direction is set as abnormal light, and the transmittance is measured. (2) Wavefront aberration Using a laser interferometer R-10 manufactured by Fujinon Corporation, laser light having a wavelength of 656 nm and a light path of 2 ηιηηφ was used, and the total RMS (Arms) was measured as a wavefront aberration of the polarizing diffractive element. (3) Reflectance The opposite side of the surface on which the reflectance is measured by black spray coating, using a spectroscopic reflectance measuring device (assembling a large-scale sample room integrating sphere attachment 150-09090 spectrophotometer U-3410, Hitachi, Ltd. ))) The reflectance of the polarizing diffractive element at wavelengths of 660 nm and 78 5 nm was measured. Specifically, the reflectance at 660 nm and 785 nm was measured using the reflectance of the aluminum shovel film as a reference (100%). 201027140 (4) Glass transition temperature (Tg) was measured using a DSC 6200 manufactured by Seiko Instruments Co., Ltd. at a temperature rising rate of 20 ° C per minute in a nitrogen stream. The Tg of the resin is plotted on the differential scanning calorimetry curve for the maximum peak temperature of the differential scanning heat (point A) and the temperature of the maximum peak temperature of -20 °C (point B), using the point B as the starting point. The wiring on the line is obtained from the intersection of the wiring starting from point A. The Tg of the ultraviolet curable acrylic resin was measured for the glass transition temperature as a cured film by using a forced viscoelastic vibrating type viscoelasticity measuring device. Specifically, the loss tangent was measured at a temperature increase rate of 3 ° C /min while applying a vibration of a frequency of 10 Hz to the cured film. The glass transition temperature (Tg) is shown as the temperature at which the maximum tantalum loss tangent is displayed. (5) Hydrogenation rate The nuclear magnetic resonance spectrometer (NMR) was measured by using AVANCE 500 manufactured by Bruker, and the measurement solvent was d-chloroform to measure 1H-NMR. The hydrogenation ratio of the resin was calculated by calculating the composition of the monomer from the integral of 5.15.1 to 5.8 ppm of the ethylene group, 3.7 ppm of the methoxy group, and 0.6 to 2.8 ppm of the aliphatic proton. (6) Weight average molecular weight (Mw) and molecular weight distribution (Mw/Mn) HL tube manufactured by TOSOH (manufactured by TOSOH) Column Hxl-H, TSK gel G7000Hxl, TSK gel GMHXL two, TSK gel G2000HXL, solvent: tetrahydrofuran, flow rate: lmL/min, sample-97-201027140 concentration: 0.7~0.8 mass% 'injection amount: 70 L , Measurement temperature: set to 4 ° C, detector: RI (40 ° C), standard material: TSK standard polystyrene manufactured by TOSOH (stock), measure the weight average molecular weight (Mw) and molecular weight distribution of the resin ( Mw/Mn). Further, the aforementioned Μη is a number average molecular weight. (7) Amount of residual solvent The sample (film) was dissolved in dichloromethane, and the resulting solution was analyzed using a gas chromatograph @GC-7A manufactured by Shimadzu Corporation. (8) Logarithmic viscosity Using a Ubblohde type viscometer, the cyclic olefin resin was measured in chloroform (sample concentration: 〇.5 g/dL) at 30 °C. The soluble polyimine was measured in N-methyl-2-pyrrolidone (sample concentration: 〇. 5 g/dL) at 30 °C. (9) Saturated water absorption The sample (resin) was immersed in water at 23 ° C for one week in accordance with ASTM D57 〇 ', and the mass change before and after immersion was measured. (1〇) Total light transmittance, turbidity The total light transmittance of the film was measured using a turbidimeter (JJGM-2DP type) manufactured by Suga Test Machine Co., Ltd. In the following synthesis examples, preparation examples, production examples, and examples, Synthesis Example-98-201027140 A, Preparation Example A, Production Example A, and Example A show the aspect A of the present invention, Synthesis Example B, and Preparation Example B, respectively. Production Example B and Example B show the mode B of the present invention, respectively. [Synthesis Example A1] (Synthesis of Resin (A-1) (Cyclic Olefin Resin)) 225 parts by mass of 8-methyl-8-methoxycarbonyltetracyclo φ [4.4.0·l2.5· L_7.1°]-3-decene (DNM), and 25 parts by mass of bicyclo [2.2.1] hept-2-ene (formylbornene) as a monomer, and 27 parts by mass of 1-hexene (molecular weight) The regulator () and 750 parts by mass of toluene (solvent for ring-opening polymerization) were fed together into a nitrogen-substituted reaction vessel, and the solution was heated to 60 °C. Next, 0.62 parts by mass of a toluene solution of triethylaluminum as a polymerization catalyst (1.5111〇1/1〇 and 3.7 parts by mass of a hexachloro group modified with a third butanol and methanol) was added to the solution in the reaction vessel. Toluene solution (concentration φ 0.05 mol/L) of tungsten (third butanol: methanol: crane _= 〇. 35 mol: 0.3 mol: 1 mol), and the solution was heated and stirred at 80 ° C for 3 hours to open Ring polymerization to obtain a ring-opening polymer solution. The polymerization conversion ratio in the polymerization reaction is 97%. 1,000 parts by mass of the thus obtained ring-opening polymer solution is fed into the autoclave to give 2 parts by mass. RuHC1(CO)[P(C6H5)3]3 was added to the ring-opening polymer solution, and the mixture was heated and stirred for 3 hours under a hydrogen pressure of 1 〇〇kg/cm 2 and a reaction temperature of 165 ° C to carry out a hydrogenation reaction. After cooling the obtained reaction solution (hydrogenated polymer solution), the hydrogen gas is depressurized. The reaction solution is poured into a large amount of methanol, and the coagulum is separated and recovered, 99 - 201027140 and dried to obtain a hydrogenated polymer (hereinafter referred to as "resin (A-1) J) 0 The resin (A-1) thus obtained was determined by 1 H-NMR The hydrogenation rate was 99.9%. The Tg measured by the DSC method was 130 ° C, and the polystyrene conversion Μη measured by the GPC method was 20,800, Mw was 62,000, and Mw/Mn was 3.00, and the saturated water absorption at 23 °C. The logarithmic viscosity of 0.21% and 30 ° C in chloroform was 51.51 dl / g. [Synthesis Example A2] (Synthesis of Resin (A_2) (Cyclic Olefin Resin)) 71 parts by mass of DN Μ was used. 15 parts by mass of dicyclopentadiene (tricyclo[4.3.0.125]癸-3,7-diene) (DCP) and 1 part by mass of raw borneol (() as a monomer, and 18 parts by mass The molecular modifier 1-hexene and 200 parts by mass of toluene are fed together into a nitrogen-substituted reaction vessel and heated to a loot: 0.005 parts by mass of triethylaluminum and 0.005 parts by mass of methanol are added thereto. WC16 (anhydrous methanol: PhPOCl2: WC16=1 03: 630: 427 mass ratio)' and reacted for 1 minute, then 10 parts by mass of DCP and 3 parts by mass of NB were added in 5 minutes, and then reacted for 45 minutes. Thereby, a copolymer derived from DNM/constituting unit derived from DCP/constituting unit derived from NB=69.77/26.0 1/4.23 (wt%) was obtained. The obtained copolymer solution was fed into an autoclave, and 200 parts of toluene was further added. Subsequently, 1 part by mass of octadecyl-3-(3,5-di-t-butyl-4-hydroxybenzene was added. Propionate as a reaction modifier, and 〇.006-100- 201027140 parts of the hydrogenation catalyst RuHC1(CO)[P(C6H5)]3, and after overheating at 155 ° C, in the reactor Hydrogen was injected to make the pressure lOMPa. Subsequently, the pressure was maintained at 10 MPa, and the reaction was carried out at 165 ° C for 3 hours. After the reaction was completed, 1 part by mass of toluene, 3 parts by mass of distilled water, 0.72 parts by mass of lactic acid, 0.002 part by mass of hydrogen peroxide, and heated at 60 ° C for 30 minutes were added. Subsequently, 200 parts by mass of methanol was added and heated at 60 ° C for 30 minutes, cooled to 25 ° C, and separated into two layers. Remove 500 parts by mass of φ 液液' and add 3 50 parts by mass of toluene, 3 parts by mass of water and heat at 60 ° C for 30 minutes, then add 240 parts by mass of methanol and heat at 60 ° C for 30 minutes. It was cooled to 25 ° C and separated into two layers. 500 parts by mass of the supernatant was removed, 350 parts by mass of toluene, 3 parts by mass of water, and heated at 60 ° C for 30 minutes, followed by adding 240 parts by mass of methanol and heating at 6 CTC for 30 minutes' and cooling to 25 °C, separated into two layers. After finally removing 500 parts by mass of the supernatant liquid, the residual polymer solution was filtered using each of 2.0/zm, i.oytn, 0.2; zm filters. Subsequently, the amount of the solid component of the polymer was concentrated to 55% 〇 and the solvent was removed at 250 ° C, 4 torr, and a residence time of 1 hour. The copolymer was obtained by a 10 # m polymer filter ( Hereinafter, it is referred to as "resin (A-2)". The thus obtained resin (A-2) has a hydrogenation ratio of 9 9 · 9 % as determined by 1 H-NMR, and a τ g of 1 3 1 ° C as determined by DSC method. The Mπ of the polystyrene styrene measured by the GP C method is 16,000, the Mw is 61,000, the Mw/Mn is 3.81, the saturated water absorption at 23 °C is 0.18%, and the logarithmic viscosity at 30t in chloroform. 〇.52 dl / g. -101 - 201027140 [Synthesis Example A3] (Synthesis of Resin (A-5) (Cyclic Olefin Resin)) Except that 53 parts by mass of tetracyclo[4.4.0.125.171()] was used. -3-dodecene, 46 parts by mass of 8-ethylenetetracyclo[4.4.0.12·5.171()]-3-dodecene, and 66 parts by mass of tricyclo[4.3.0.12·5] - 癸-3,7-diene, and the amount of addition of 1-hexene (molecular weight modifier) was 22 parts by mass, and cyclohexane was used instead of toluene as a solvent for ring-opening polymerization reaction, and the synthesis example was as follows. Similarly, a hydrogenated polymer is obtained (hereinafter referred to as Resin Α-5"). The obtained resin (Α-5) has a hydrogenation rate of 99.9%, a glass transition temperature (Tg) of 125 ° C, a Μη of 30,000, a Mw of 122,000, and a molecular weight distribution (Mw/Mn) of 4_07. The logarithmic viscosity was 0.63 dl/g [Synthesis Example A4] (Synthesis of Polyimine) 22.4 g (0.1 mol) of 2,3,5-tricarboxycyclopentyl acetic acid dianhydride as tetracarboxylic dianhydride 19.8 g (0.1 mol) of 4,4'-diaminodiphenylmethane as a diamine compound was dissolved in 800 g of N-methyl-2-pyrrolidone, and reacted at 60 ° C for 4 hours. Next, the reaction solution was poured into a large excess of methanol to precipitate a reaction product, followed by washing with methanol, and drying at 40 ° C for 15 hours under reduced pressure to obtain 390 g of a polytheneamine having a logarithmic viscosity of 0.32 dl/g. Acid. Dissolve 25 g of the obtained polyamic acid in 47 5 g of N-methyl-2-pyrrolidone, add 39. 5 g of pyridine and 30.6 g of acetic anhydride, and dehydrate the closed ring at 1 l ° ° C. After the above, precipitation, washing and decompression were carried out as described above, and 19.5 g of a logarithmic viscosity of 0.64 (11?, a sulfhydryl imidization rate of 92% of polyimine-102-201027140) [Synthetic Example A5] (Polyamine) was obtained. Synthesis of the ester) 0.1 mol (22.4 g) of 2,3,5-tricarboxycyclopentyl acetic acid dianhydride and 0.1 mol (10.8 g) of p-phenylenediamine were dissolved in 300 g of N-methyl-2- In pyridoxone, and reacted at 60 ° C for 6 hours. Next, the reaction mixture was poured into a large excess of methanol to precipitate a reaction product. Subsequently, it was washed with methanol, and dried at 4 ° C for 15 hours under reduced pressure to obtain 27.4 g of polylysine. Adding 160 g of N-methyl-2-pyrrolidone oxime and 38_7 g of 1-bromo-6-(4-chalconeoxy group ((:1131(;〇11)) to 16.6 g of the obtained polylysine丫1(^)〇) ancestor and 13.8 g of potassium carbonate were reacted at 120 ° C for 4 hours. Then, the reaction mixture was poured into water to precipitate a reaction product, and the resulting precipitate was washed with water and under reduced pressure. After drying for 15 hours, 35.4 g of polyphthalate was obtained. [Synthesis Example A6] (Synthesis of urethane acrylate) 49.96 parts by mass of 2-phenoxyethyl acrylate was added to a reaction vessel equipped with a stirrer, 0.01 parts by mass of 2,6-di-tert-butyl-p-cresol, # 〇·04 parts by mass of di-n-butyltin dilaurate, 17.74 parts by mass of toluene diisocyanate vinered 'cooled to 5 to 15 t The temperature was changed to 10. (: After the following, 11.84 parts by mass of 2-hydroxyethyl acrylate was added dropwise while stirring, while stirring the liquid temperature for 20 hours at 20 to 35 ° C. Then, feeding 2 〇4〇 parts by mass of dioxime A alkylene oxide addition diol (DA_4〇〇 manufactured by oyster sauce (stock)) 'Continuous reaction at 55~65°C for 3 hours, with residual When the acid ester is 〇·1 mass% or less, the urethane acrylate is obtained as a reaction end point. -103- 201027140 [Synthesis Example B1] (Production of Resin (A-1) (Cyclic Olefin Resin)) 225 parts by mass of 8-methyl-8-methoxycarbonyltetracyclo[4.4.0.125.17_1Q]_3_dodecene (〇ΝΜ), 25 parts by mass of bicyclo [2.2.1] hept-2-ene (original borneol) is fed as a monomer to 27 parts by mass of hexene (molecular weight modifier) and 75 parts by mass of toluene (solvent for ring-opening polymerization reaction) in a reaction vessel substituted with nitrogen. The solution was heated to 60 ° C. Then, 0.62 parts by mass of a toluene solution of triethylaluminum (1.5 mol/liter) as a polymerization catalyst and 3.7 parts by mass of a third butanol were added to the solution in the reaction vessel. And methanol modified toluene solution (t-butanol: methanol: tungsten = 0.3 5 mol: 0·3 mol: 1 mol) in toluene solution (concentration 〇. 〇 5 mol / liter), and The solution was heated and stirred at 80 ° C for 3 hours to carry out ring-opening polymerization to obtain a ring-opening polymer solution. The polymerization conversion ratio in the polymerization reaction was 9 7 . Adding 1,000 parts by mass of the thus obtained ring-opening polymer solution into the autoclave' and adding 0.12 parts by mass of 111111&lt;:1((:0)[?(&lt;:6115)3]3 The hydrogenation reaction is carried out by heating and stirring for 3 hours under a hydrogen pressure of 100 kg/cm 2 and a reaction temperature of 1 65 ° C in the ring-opening polymer solution. After the obtained reaction solution (hydrogenated polymer solution) is cooled, hydrogen is supplied. Release pressure. The reaction solution was poured into a large amount of methanol, and the coagulum was separated and recovered, and dried to obtain a hydrogenated polymer (hereinafter referred to as "resin (A-1) j ) ° The resin (A-1) thus obtained was 1H-NMR The hydrogenation rate of the measurement was 99.9%, the Tg measured by the DSC method was 130 ° C, and the polystyrene-104-201027140 measured by the GPC method had a Μη of 20,800, a Mw of 62,000, and a Mw/Mn of 3.00, at 23 The saturated water absorption at ° C was 0.21% and the logarithmic viscosity at 30 ° C in chloroform was 51.51 dl / g. [Synthesis Example B2] (Manufacture of Resin (A-2) (Cyclic Olefin Resin)) In addition to 53 parts of tetracyclo [4.4.0.12 5.l71Q]-3-dodecene, 46 φ parts of 8-ethylenetetracyclo[4.4.0.12·5.171()]-3-dodecene And 66 parts of tricyclo [4.3.0.12·5]-indole-3,7-diene, and the amount of 1-hexene (molecular weight modifier) added is 22 parts by mass, and cyclohexane is used instead of toluene. A hydrogenated polymer (hereinafter referred to as "resin oxime-2") was obtained in the same manner as in Synthesis Example 1 except for the solvent for the ring-opening polymerization reaction. The obtained resin (Α-2) had a hydrogenation rate of 99.9%, a glass transition temperature (Tg) of 125 ° C, a Μη of 3,0,000, a Mw of 122,000, a molecular weight distribution (Mw/Mn) of 4.07, and a logarithmic viscosity of 0.63 dl. /g. Φ [Synthesis Example B3] (Synthesis of Resin (A-3) (Cyclic Olefin Resin)) 71 parts by mass of DNM and 15 parts by mass of dicyclopentadiene (tricyclic [4·3.0·12·5) were used. ]癸-3,7_diene)(DCP) and 1 part by mass of raw borneol (() as a monomer, fed together with 18 parts by mass of a molecular regulator of 1-hexene and 200 parts by mass of toluene The reaction vessel was replaced with nitrogen and heated to 100 °C. 0.005 parts by mass of triethyl aluminum and 0.005 parts by mass of -105-201027140 methanol-modified WC16 (anhydrous methanol: PhP〇Cl2: WC16=1 03: 630: 42 7 mass ratio) were added thereto and reacted for 1 minute. 'Next, 10 parts by mass of DCP and 3 parts by mass of NB were added in 5 minutes, and further reacted for 45 minutes to obtain a constituent unit derived from DNM / a constituent unit derived from DCP / a constituent unit derived from NB = 69.77 / 26.01/4.23 (wt%) copolymer. Next, the obtained copolymer solution was fed into an autoclave, and 200 parts of toluene was further added. Subsequently, '1 part by mass of octadecyl-3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate as a reaction modifier, and 0.006 part by mass of a hydrogenation catalyst were added RuHC1(CO)[P(C6H5)]3, and after superheating at 1 55 °C, hydrogen gas was injected into the reactor to bring the pressure to 10 MPa. Subsequently, the pressure was maintained at 10 MPa, and the reaction was carried out at 165 ° C for 3 hours. After completion of the reaction, 1 part by mass of toluene, 3 parts by mass of distilled water, 0.72 part by mass of lactic acid, 214 parts by mass of hydrogen peroxide, and heated at 60 ° C for 30 minutes were added. Subsequently, 200 parts by mass of methanol was added and heated at 60 ° C for 30 minutes, and allowed to cool to 25 t, and separated into two layers. 500 parts by mass of the supernatant was removed, 350 parts by mass of toluene, 3 parts by mass of water, and heated at 6 CTC for 30 minutes, followed by addition of 240 parts by mass of methanol and heating at 60 ° C for 30 minutes, and cooling to 25 °C, separated into two layers. 500 parts by mass of the supernatant was removed, 350 parts by mass of toluene, 3 parts by mass of water were added and heated at 60 ° C for 30 minutes, then 240 parts by mass of methanol was added and heated at 60 ° C for 30 minutes, and cooled to At 25 ° C, it was separated into two layers. After finally removing 500 parts by mass of the supernatant, the residual polymer solution was filtered using each of 2.0#m, 1.0/zm, and 0.2#xn filters. Subsequently, the amount of the solid component of the polymer was concentrated to 55%. The solvent was removed at 250 ° C, 4 torr, and residence time for 1 hour, and the copolymer was obtained by a polymer filter of -106-201027140 10 〆m (hereinafter referred to as The resin (A-3) thus obtained has a hydrogenation rate of 99.9% as determined by 1H-NMR, a Tg of 131 ° C as determined by a DSC method, and a polystyrene measured by a GPC method. The converted Μη is 16,000' Mw is 61,000, and Mw/Mn is 3.8 1, the saturated water absorption at 23 ° C is 〇_18%, and the logarithmic viscosity at 30 ° C in chloroform is 〇.52dl /g 合成 [Synthesis Example B4] (Synthesis of urethane acrylate) 49,96 parts by mass of 2-phenoxyethyl acrylate and 0.01 parts by mass of 2,6 were added to a reaction vessel equipped with a stirrer. - di-tert-butyl p-cresol, 0.04 parts by mass of di-n-butyltin dilaurate, 17.74 parts by mass of toluene diisocyanate, and cooled to 5 to 15 ° C. After the temperature is 10 ° C or less, stirring is carried out. 11.84 parts by mass of 2-hydroxyethyl acrylate was added dropwise, and the temperature of the liquid was controlled at 20 to 35 ° C while stirring for 1 hour. Subsequently, the feed was 20. 40 parts by mass of bisphenol A alkylene oxide addition diol (DA-400 manufactured by Nippon Oil Co., Ltd.) 'The reaction was continued at 55 to 65 ° C for 3 hours to make the residual isoflurane 0.1 When the mass % or less is the reaction end point, the urethane acrylate is obtained. [Preparation Example A1] (Preparation of ultraviolet curable acrylic resin (D-1)) The mixing ratio shown below is fed into a reaction vessel equipped with a stirrer. Each component (parts by mass) was stirred and mixed at 50 t for 1 hour to obtain a liquid composition. The specific compounding ratio was 9.8 parts by mass of urethane acrylate vinegar obtained in Synthesis Example A6, and trimethylolpropane III. 13.7 parts by mass of acrylate, 29.4 parts by mass of ginseng (-107-201027140 2-ethylidene)isocyanuric acid acrylate, 32.3 parts by mass of polyoxyalkylene bisphenol A diacrylate, dipentaerythritol hexaacrylate/ a mixture of dipentaerythritol pentaacrylate 4.9 parts by mass of 'N-vinyl-2-pyrrolidone 7.8 parts by mass' 1.5 parts by mass of 1-hydroxycyclohexyl phenyl ketone, thiodiethylidene bis (3_(3,5) _Di-tert-butyl-4-ylhydroxyphenyl)propionate)〇_3 parts by mass, diethylamine 0.1 0.3 parts by mass of polyoxyalkylene alkyl ether phosphate, and the total amount is 〇〇.丨 parts by mass. The viscosity of the obtained ultraviolet curable acrylic material as a liquid composition is based on JIS K7 117, using a rotary type Viscosity meter, at 25 ((:: 540 mPa · s, UV-cured acrylic resin (D_l) has a Tg of 120 °C. [Preparation Example A2] (Preparation of alignment film composition (B-1)) 5 parts by weight of a hydroxyl group having polyvinyl alcohol was mixed with 0.22 mol% of a substituent-OCOPhO with respect to 100 parts by weight of distilled water ( CH2) 4〇COCH = CH2 substitution, a structure substituted with a substituent of -CO2^3, a saponification degree of 88 mol%, a polymerization degree of 3 〇〇 of modified polyvinyl alcohol powder, and addition of 3 5 The parts by weight of methanol are dissolved. This solution was filtered using a filter of a pore size lym to prepare an alignment film composition (B-1). [Preparation Example A3] (Preparation of Alignment Membrane Composition (B-2)) The polyimine obtained in Synthesis Example A4 was dissolved in r-butyrolactone, and dissolved in 0.75 parts by weight with respect to 100 parts by weight of the polymer. N-ethoxycarbonyl-3-aminopropyltriethoxydecane has a solid concentration of 4% by weight. / 〇 solution. The solution was filtered using a filter having a pore size of 1/zm to prepare an alignment film group -108 - 201027140 (B-2). [Preparation Example A4] (Preparation of alignment film composition (B-3)) The polyphthalate obtained in Synthesis Example A5 was dissolved in r-butyrolactone, and dissolved in 1 part by weight of the polymer. 0.75 parts by weight of N-ethoxycarbonyl-3-aminopropyltriethoxydecane was added to a solution having a solid concentration of 4% by weight. The solution was filtered using a pore size filter to prepare an alignment film (B-3). [Preparation Example A5] (Preparation of ultraviolet curable acrylic resin (B-4) for an alignment film) In a reaction container equipped with a stirrer, each component was fed at a mixing ratio (parts by mass) as shown below, and stirred at room temperature for 1 hour. , a liquid composition was obtained. The specific compounding ratio is 90.1 parts by mass of dicyclopentenyloxyethyl acrylate, 7.2 parts by mass of isocyanurate triacrylate, and 2-methyl-1-[4-(methyl φ thio)phenyl group. 2.7 parts by mass of 2-morpholinopropan-1-one, and the total amount thereof was 100.0 parts by mass. The viscosity of the obtained ultraviolet curable acrylic material as a liquid composition is obtained according to JIS K7 117, using a rotary viscometer at 24 ° C for 24 mPa · s to obtain an ultraviolet-curable acrylic resin (B-4). . [Preparation Example A6] (Preparation of ultraviolet curable acrylic resin (D-2)) In a reaction vessel equipped with a stirrer, each component was fed at a mixing ratio (parts by mass) as shown below, and stirred and mixed at room temperature for 1 hour to obtain Liquid composition -109- 201027140. The specific compounding ratio is 61.2 parts by mass of 1,6-hexanediol diacrylate, 26.2 parts by mass of 2-phenoxyethyl acrylate, 9.7 parts by mass of isocyanurate triacrylate, and 1-hydroxycyclohexylphenyl group. The ketone was 2.9 parts by mass, and the total amount was 100.0 parts by mass. The viscosity of the ultraviolet curable acrylic material obtained as a liquid composition was obtained in accordance with JIS K7117 using a rotary viscometer at 25 ° C for 17 mPa · s to obtain an ultraviolet curable acrylic resin (D-2). [Preparation Example B1] (Preparation of ultraviolet curable acrylic resin) In a reaction vessel equipped with a stirrer, each component was fed at a mixing ratio (parts by mass) as shown below, and the mixture was stirred and mixed at 50 ° C for 1 hour to obtain a liquid composition. . The specific compounding ratio is 9.8 parts by mass of the urethane acrylate obtained in Synthesis Example B4, 13.7 parts by mass of trimethylolpropane triacrylate, and 29.4 by mass of bis(2-hydroxyethyl)isocyanuric acid acrylate. Parts, polyoxyalkylene bisphenol A diacrylate 32.3 parts by mass, dipentaerythritol hexaacrylate / dipentaerythritol pentaacrylate mixture 4.9 parts by mass, N-vinyl-2-pyrrolidone 7.8 parts by mass, 1- 1.5 parts by mass of hydroxycyclohexyl phenyl ketone, 0.3 parts by mass of thiodiethyl bis(3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate), and 0.1 parts by mass of diethylamine The amount of the polyoxyalkylene alkyl ether phosphate is 0.3 parts by mass, and the total amount is 1 〇〇. 1 part by mass. The viscosity of the obtained ultraviolet curable acrylic material as a liquid composition was 540 mPa·s at 25 t after using a rotary viscometer according to JIS K7 117, and the Tg of the resin after ultraviolet curing was 120 °C. -110-201027140 [Production Example A1] (Production of Substrate (a-1)) A biaxial extruder (manufactured by Toshiba Machine Co., Ltd.; TEM-48) was used to extrude the synthesis example A1. -1 ) with a pentaerythritol ruthenium [3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate as an antioxidant, cooling the resin line flowing from the strand nozzle in a cooling water tank After the strands, they were fed into a strand cutting machine and cut into rice grains to obtain a granulated resin (transparent resin (A-1)). The amount of the antioxidant added was 0.1 part by mass based on 1 part by mass of the resin. The granulated resin was dried at 100 ° C for 4 hours in a nitrogen atmosphere, and then sent to a single-axis extruder (90 mm (D), melted at 260 ° C, and quantitatively extruded by gear pumping. Melt-filtering was carried out using a metal fiber sintered filter made of Japanese fine wire of 1 〇μπι, using a hanger type die mouth (width 17 〇〇mm), so that the gap of the nozzle exit of the hanger was 0.5 mm, at 260 The film is extruded into a film. The length of the die land (the length of the parallel portion of the die exit) of the nozzle used at this time is 20 mm. The distance from the exit of the die to the point of the roll is made. Set to 65mm, the extruded film is held between the mirror roll with a surface roughness of 0.1S and a metal belt of 0.3xnm thickness, and the surface of the film is transferred to the shiny side. Metal conveyor belt (width) 1 650 mm) was a rubber-coated roll (supported roll diameter of 150 mm 〇) and a light-cooled (roller diameter of 150 mm) holder, and a commercially available sliding transfer roll (manufactured by Chiba Machinery Co., Ltd.) was used and transferred. The roller spacing during transfer is 〇.35«1«1, and the transfer pressure is 〇.351^&amp;. The peripheral speed of the outer circumference of the mirror roll was set to iOm/min. At this time, the temperature of the mirror roll was set to 125 ° C using an oil thermostat. The temperature of the rubber coated roll was set to 115 ° C. A 250 mm (D cooling roll was placed on the downstream side of the mirror roll, and the time from the film peeled off by the mirror roll to the chill roll set to 1 15 ° C was set to 2.1 seconds and cooled. Then the peeling force was 0.4 MPa. · The cm-peeled film is attached to one side with a masking film, and taken up by a winder to obtain a resin film having a thickness of 130 μm (hereinafter referred to as "substrate (a-Ι)"). The residual solvent amount of the obtained film is 0.1%. The total light transmittance was 93%, and the glass transition temperature (Tg) was 130 ° C. [Production Example A2] (Production of Substrate (a-2)) The resin (A-2) obtained in Synthesis Example A2 was used. In the same manner as in Production Example A1, a resin film having a thickness of 130 μm (hereinafter referred to as "base material (a-2)") was obtained, except for the resin (A-1) in Production Example A1. The residual solvent amount of the obtained film was 0.1%, total light transmittance was 93%, and glass transition temperature (Tg) was 13 1 ° C. [Manufacturing Example A3] (Substrate (a-5) In the same manner as in Production Example A1, a resin film (hereinafter referred to as "base" having a thickness of ΙΟΟμπι was obtained, except that the resin (A-5) obtained in Synthesis Example A3 was used instead of the resin (A-1) in Production Example A1. (a_5)"). The obtained film had a residual solvent amount of 0.1%, a total light transmittance of 93%, and a glass transition temperature (Tg) of 124 ° C. [Production Example B1] (Manufacture of Substrate (n)) -112 _ 201027140 Extrusion of the resin (A-1) obtained in Synthesis Example B1 and pentaerythritol ruthenium as an antioxidant using a twin-screw extruder (manufactured by Toshiba Machine Co., Ltd.; TEM-48) [3-(3, 5-Di-tert-butyl-4-hydroxyphenyl)propionate], which is cooled in a cooling water tank to be discharged from the strands of the resin strands, and then sent to a strand cutter to be cut into rice grains. Granulated resin (transparent resin (A-1)). The amount of the antioxidant added was 0.1 part by mass based on 1 part by mass of the resin. Φ The granulated resin was dried at 100 ° C for 4 hours under a nitrogen atmosphere, and then sent to a single-axis extruder (90 mm (D), melted at 260 ° C, and quantitatively extruded by gear pumping, Melt-filtering using a metal fiber sintered filter made of Japanese fine wire of 1〇Rm, using a hanger type die mouth (width 1 700mm), so that the clearance of the nozzle exit of the hanger is set to 0.5mm at 260 ° C is extruded into a film shape. The length of the die face of the nozzle used at this time (the length of the parallel portion of the die nozzle exit) is 20 mm. The distance from the die mouth to the roll pressing point is set to 65 mm, so that the extrusion is performed. The film is held between a mirror roll with a surface roughness of 0.1S and a metal roll of 0.3 mm thick, and the surface of the film is transferred to a glossy surface. The metal conveyor belt (width 1650 mm) is covered with rubber. The roll (supported roll diameter 150 mm &lt; D) and the chill roll (roll diameter 150 mm) were held by a commercially available sliding transfer roll (manufactured by Chiba Machinery Co., Ltd.) and transferred. The roll interval at the time of transfer was 0.35. Mm, the transfer pressure is 〇.35MPa. At this time, 'the peripheral speed of the outer circumference of the mirror roll Set to l〇m/min. At this time, the temperature of the mirror roll is set to 125 °C using an oil thermostat, and the temperature of the rubber coated roll is set to 1 15 ° C. -113- 201027140 downstream of the mirror roll A cooling roll of 260 mm Φ was disposed on the side, and the film peeled from the mirror roll was set to 2.1 seconds after being pressed against a cooling roll set at 115 ° C and cooled. Then, the film was peeled off at a peeling force of 0.4 MPa·cm, and The masking film was attached to one side and wound up by a winder to obtain a resin film having a thickness of 130 μm (hereinafter referred to as "substrate (a-1)"). The residual solvent amount of the obtained film was 0.1%, and the total light transmittance was The glass transition temperature (Tg) was 93%. [Manufacturing Example B2] (Manufacturing of Substrate (a-2)) The resin (A-2) obtained in Synthesis Example B2 was used instead of Production Example B1. In the same manner as in Production Example B1, a resin film having a thickness of ΙΟΟμπι (hereinafter referred to as "substrate (a-2)") was obtained, and the residual solvent amount of the obtained film was 0.1%, and the total light was transmitted. The rate was 93%, and the glass transition temperature (Tg) was 124 ° C. [Production Example B3] (Manufacture of Substrate (a-3)) The resin (A-3) obtained in the example B3 was replaced with the resin (A-1) in the production example B1, and a resin film having a thickness of 130 μm was obtained in the same manner as in Production Example B1 (hereinafter referred to as "substrate (a-3). The resulting film had a residual solvent amount of 0.1%, a total light transmittance of 93%, and a glass transition temperature (Tg) of 13 1 ° C. [Example A1] The substrate obtained in Production Example A1 (al ) on one side, to rice cooker -114- 201027140

Gauge製作所股份有限公司製造之摩擦機，在輥轉速 600rpm，薄膜輸送速度3m/分鐘，棍壓入量〇.3mm之下’ 以摩擦方向係與薄膜長度方向平行之方式進行摩擦處理’ 獲得基材（a，-1)。接著，使用於井上金屬工業製之 INVEX實驗塗佈機（Labcoater)上之200網目之小直徑凹 版印刷輥，且在50°C條件下將相對於1〇〇質量份之Merck股 份有限公司製造之紫外線硬化型液晶材料RMM727添加30 φ 質量份之丙酮溶劑而成者塗佈於基材（a’-1)上並經乾燥 、配向，成爲厚度4μηι。接著，使用以使連續形成有凹部 與凸部之圖型轉印而製備之轉印輥，於塗佈面上轉印連續 形成有凹部與凸部之圖型。另外，轉印輥表面之凹部與凸 部係沿著輥之圓周方向形成凹凸之溝槽而製備。 轉印之同時，利用高壓水銀燈，自基材（a’-l )之不 具有圖型之面側，以500mJ/cm2之能量照射紫外線，形成 連續形成有凹部與凸部之圖型，獲得基材（b-Ι)。凸部 〇 之寬度爲2_5#m，凹部之寬度爲2.5//m，凹部之深度爲 2.6ym。接著’使用於井上金屬工業製之IN VEX實驗塗佈 機中300網目之小直徑凹版印刷輥，塗佈於調製例A1獲得 之紫外線硬化型丙烯酸材料，利用高壓水銀燈，且不具有 圖型之側以500mJ/cm2之能量照射紫外線並硬化，形成由 紫外線硬化型丙烯酸樹脂（D-1)所構成之塡充部，獲得 基材（c-1)。紫外線硬化型丙烯酸樹脂之厚度自凹部之 底部至最表層爲4μιη。 對基材（¢-1)之兩面進行抗反射處理，獲得偏光性 -115- 201027140 繞射元件（1 )。所得偏光性繞射元件（1 )之正常光透過 率於波長660nm爲99.2%，於波長785nm爲99.0%，異常光 透過率於波長660nm爲1.3%，於波長78 5nm爲3.2%。反射 率在具有圖型及塡充部之側（圖型側）之面，於660nm爲 0.1%，於波長785nm爲0.1%，於基材（a’-l )側（基材側 )之面，於660nm爲0.2%，於波長78 5nm爲0.2%。又，測 定波前像差之結果，Xrms=10mX，可知爲平坦面》 [實施例A2] 在延伸機爐內溫度155 °C之槽內，以延伸速度 5.0m/min，延伸倍率3.5倍，使製造例A2獲得之基材（a_2 )拉幅，進行橫向延伸，獲得厚度37/zm之輥狀延伸薄膜 (基材（a’-2 ))。接著，如實施例A1同樣地使用紫外線 硬化型液晶材料，在延伸薄膜（基材（a，-2))之一面上 形成凹部與凸部，獲得基材（b-Ι)。凸部之寬度爲2.5 #m，凹部之寬度爲2.5//m，凹部之深度爲2.6ym。接著 ，與實施例A1同樣，使用紫外線硬化型丙烯酸材料（d-1 )形成塡充部，獲得基材（c-2)。塡充部之厚度自凹部 之底部至最表層爲4/z m。 對基材（C-2 )之兩面進行抗反射處理，獲得偏光性 繞射元件（2 )。所得偏光性繞射元件（2 )之正常光透過 率於波長66〇11111爲98_9%，於波長78511111爲98.9%，異常光 透過率於波長66〇11111爲1.5%，於波長78511111爲3.1%。反射 率在具有圖型及塡充部之側（圖型側）之面，於66〇nm爲 -116- 201027140 0.2%，於波長7 85nm爲0.1%，於基材（a’-2 )側（基材側 )之面，於660nm爲0.2%，於波長785nm爲0.2%。又’測 定波前像差之結果，Xrms = 9mX，可知爲平坦面。 [實施例A3] 使用於井上金屬工業製之IN VEX實驗塗佈機中之200 網目之小直徑凹版印刷輥，將調製例A2獲得之配向膜組成 φ 物（B-1)塗佈於厚度80#m之三乙醯基纖維素製之薄膜（ 基材（a-3))上。塗佈時，以0.2#m之PTFE製之薄膜進 行過濾，塗佈後通過乾燥機使溶劑揮發乾燥，形成配向膜 層。乾燥係在l〇〇°C進行30秒後，在120°C進行30秒之階段 條件下進行。接著，使形成之配向膜層表面以飯沼Gauge 製作所股份有限公司製造之摩擦機，在輥轉速設爲80〇rpm 、薄膜輸送速度設爲3 m/分鐘、輥壓入量設爲0.3 mm，以摩 擦方向與薄膜長度方向平行之方式進行摩擦處理，獲得基 ❿ 材（b-3)。接著，與實施例A1同樣，使用紫外線硬化型 液晶材料獲得形成有凹凸溝之基材（c-3 )(層（LC )之 形成）。凸部之寬度爲2.5/zm，凹部之寬度爲2.5//m，凹 部之深度爲2.6#m。接著，與實施例A1同樣，使用紫外線 硬化型丙烯酸材料（D-1)形成塡充部（層（LD)之形成 )，獲得基材（d-3)。塡充部之厚度自凹部之底部至最 表層爲4 # m。 對基材（d-3 )之兩面進行抗反射處理，獲得偏光性 繞射元件（3 )。所得偏光性繞射元件（3 )之正常光透過 -117- 201027140 率於波長66〇11111爲98.7%，於波長78511111爲98.7%’異常光 透過率於波長660nm爲1 .8%，於波長78 5nm爲3.8%。反射 率在具有圖型及塡充部之側（圖型側）之面，於660nra爲 0.2%，於波長785nm爲0.3%，於基材（a-3 )側（基材側） 之面，於660nm爲0.3%，於波長7 85nm爲0.2%。又，測定 波前像差之結果，Xrms = 9mk，可知爲平坦面。 [實施例A4] 使用於井上金屬工業製之INVEX實驗塗佈機中之200 網目之小直徑凹版印刷輥，將調製例A3獲得之配向膜組成 物（B-2)塗佈於厚度90/zm之聚碳酸酯製之薄膜（基材（ a-4))上。塗佈時，以〇.2/zm之PTFE製之薄膜進行過濾 ’塗佈後通過乾燥機使溶劑揮發乾燥，形成配向膜層。乾 燥係在l〇〇°C進行30秒後，在120 °C進行30秒之階段條件下 進行。接著’使形成之配向膜層表面以飯沼Gauge製作所 股份有限公司製造之摩擦機，在輥轉速設爲8 〇〇rpm，薄膜 輸送速度設爲3m/分鐘’輥壓入量設爲0.3nim，以摩擦方向 與薄膜之長度方向平行之方式進行摩擦處理，獲得基材（ b-4)。接著’與實施例^同樣，使用紫外線硬化型液晶 材料獲得形成有凹凸之溝之基材（c-4 )(層（LC )之形 成）°凸部之寬度爲2.5 ym’凹部之寬度爲2.5 ，凹部 之深度爲2.6/zm。接著’與實施例幻同樣地，使用紫外線 硬化型丙稀酸材料（D—丨）形成塡充部（層（LD)之形成 )’獲得基材（d-4)。塡充部之厚度自凹部之底部至最 -118- 201027140 表層爲4 // m。 對基材（d-4)之兩面進行抗反射處理’獲得偏光性 繞射元件（4)。所得偏光性繞射元件（4)之正常光透過 率於波長660 nm爲98.5%，於波長785 nm爲98.6 %’異常光 透過率於波長660nm爲1.9%，於波長78 5nm爲4.2%。反射 率在具有圖型及塡充部之側（圖型側）之面，於660nm爲 0.3%，於波長7 8 5nm爲0.3% ’於基材（a-4 )側（基材側） φ 之面，於660nm爲0.4%，於波長78 5nm爲0.3%。又，測定 波前像差之結果，Xrms = 9mX，可知爲平坦面。 [實施例A5] 使用於井上金屬工業製之INVEX實驗塗佈機之200網 目之小直徑凹版印刷輥，將調製例A4獲得之配向膜組成物 (B-3)塗佈於製造例A3獲得之基材（a-5)上。塗佈時， 以0.2 之PTFE製之薄膜進行過濾，塗佈後通過乾燥機使 Φ 溶劑揮發乾燥，形成配向膜層。乾燥係在l〇〇°C進行30秒 後，在12(TC進行30秒之階段條件下進行。接著，使用Hg-Xe燈，使形成之配向膜層之表面通過PYREX (註冊商標） 玻璃製偏光板SPF-50C-32 ( Sigma光機製），照射〇.5J/Cm2 之以3 65nm之波長爲主之直線偏光之紫外線，獲得基材（ b-5)。直線偏光之偏波面方向係與薄膜長度方向成平行 之方式行進。接著，與實施例A1同樣，使用紫外線硬化型 液晶材料獲得形成有凹凸之溝之基材（c-5 )(層（LC ) 之形成）。凸部之寬度爲2.5#m，凹部之寬度爲2.5#m， -119- 201027140 凹部之深度爲2.6em。接著，與實施例A1同樣，使用紫外 線硬化型丙烯酸材料（D-1)形成塡充部（層（Ld)之形 成），獲得基材（d-5)。塡充部之厚度自凹部之底部至 最表層爲4 m。 對基材（d-5)之兩面進行抗反射處理，獲得偏光性 繞射元件（5 )。所得偏光性繞射元件（5 )之正常光透過 率於波長660nm爲98.2%，於波長785nm爲98.3%，異常光 透過率於波長66〇11111爲1.7%，於波長78 511111爲3.6%。反射 率在具有圖型及塡充部之側（圖型側）之面，於660nm爲 〇 _ 2 %，於波長7 8 5 nm爲0 · 2 %，於基材（a - 5 )側（基材側） 之面，於660nm爲0.3%，於波長78 5nm爲0.2%。又，測定 波前像差之結果，Xrms=10mX，可知爲平坦面。 [實施例A6] 使用於井上金屬工業製之INVEX實驗塗佈機中之200 網目之小直徑凹版印刷輥，將聚醚聚胺基甲酸酯材料 H YDR AN WLS-201 (大曰本油墨化學工業（股）製造）以 甲醇稀釋成3%者塗佈於製造例A1獲得之基材（a-i)之一 面上，在80 °C加熱乾燥5分鐘，獲得具有聚胺基甲酸酯之 基材。以飯沼Gauge製作所股份有限公司製造之摩擦機， 在輥轉速設爲600rpm，薄膜輸送速度設爲3m/分鐘，輥壓 入量設爲〇_3 mm之下，以摩擦方向與薄膜之長度方向平行 之方式進行摩擦處理，獲得基材（b-6)。接著，與實施 例A 1同樣，使用紫外線硬化型液晶材料獲得連續形成有凹 -120- 201027140 部與凸部之基材（C-6)(層（LC)之形成）。凸部之寬 度爲2.5#m，凹部之寬度爲2.5&quot;m’凹部之深度爲2_6//m 。接著，與實施例A1同樣，使用紫外線硬化型丙烯酸材料 (D-1)形成塡充部（層（LD)之形成），獲得基材（d-6 )。塡充部之厚度自凹部之底部至最表層爲 對基材（d-6)之兩面進行抗反射處理，獲得偏光性 繞射元件（6 )。所得偏光性繞射元件（1 )之正常光透過 φ 率於波長66 Onm爲99.1%，於波長785 nm爲99.1 %，異常光 透過率於波長660nm爲1.1%，於波長785nm爲3.0%。反射 率在具有圖型及塡充部之側（圖型側）之面，於660nm爲 〇· 1%，於波長785nm爲〇_1%，於基材（a-l )側（基材側） 之面’於660nm爲0.2%，於波長785nm爲0.2%。又，測定 波前像差之結果，；lrms=12mA，可知爲平坦面。 [實施例A7] ® 使用於井上金屬工業製之INVEX實驗塗佈機中之200 網目之小直徑凹版印刷輥’將調製例A5獲得之配向膜用紫 外線硬化樹脂（B-4)塗佈於製造例A1獲得之基材（aq) 之一面上，使用高壓水銀燈，以7〇〇mj/cm2之能量照射紫 外線’獲得基材。接著’以飯沼Gauge製作所股份有限公 司製造之摩擦機，在輥轉速設爲6〇〇1_1)111，薄膜輸送速度設 爲3m/分鐘，輥壓入量設爲〇.3mm之下，以摩擦方向與薄膜 長度方向平行之方式進行摩擦處理，獲得基材（b_7)。 接者，與實施例A 1同樣，使用紫外線硬化型液晶材料於基 -121 - 201027140 材（b-7 )上形成凹凸之溝（層（LC )之形成），獲得基 材（c-7)。凸部之寬度爲2.5ym，凹部之寬度爲2.5/zm ，凹部之深度爲2.6 yin。 除使用調製例A6獲得之紫外線硬化型丙烯酸材料（D_ 2)以外，餘如實施例A1同樣形成塡充部（層（LD)之形 成），獲得基材（d-7)。塡充部之厚度自凹部之底部至 最表層爲4 // m。 對基材（d-7)之兩面進行抗反射處理，獲得偏光性 繞射元件（7 )。所得偏光性繞射元件（7 )之正常光透過 率於波長660nm爲98.5%，於波長785nm爲99.0%，異常光 透過率於波長660nm爲1.7%，於波長785nm爲3.2%。反射 率在具有圖型及塡充部之側（圖型側）之面，於660nm爲 0.3%，於波長7 8 5nm爲0.2%，於基材（a-Ι )側（基材側） 之面，於660nm爲0.2%，於波長7 85nm爲0.2%。又，測定 波前像差之結果，又rms = 9m；l，可知爲平坦面。 [實施例A8] 使用於井上金屬工業製之INVEX實驗塗佈機中之200 網目之小直徑凹版印刷輥，將調製例A5獲得之配向膜用紫 外線硬化樹脂（B-4)塗佈於製造例A2獲得之基材（a-2) 之一面上，使用高壓水銀燈，以700m J/cm2之能量照射紫 外線，獲得基材。接著，在延伸機爐內溫度155 °C之槽內 ，邊以延伸機爐內之速度5. Om/min輸送邊以延伸倍率1 .5倍 進行縱向延伸，獲得厚度107 之輥狀延伸薄膜（基材（ -122- 201027140 b-8 ))。接著，與實施例A1同樣，使用紫外線硬化型液 晶材料於基材（b-8)上形成凹凸之溝（層（LC)之形成 )，獲得基材（c-8)。凸部之寬度爲2·5 // m，凹部之寬 度爲2.5// m，凹部之深度爲2.6# m。除使用調製例A6獲得 之紫外線硬化型丙烯酸材料（D-2 )以外，餘如實施例A1 同樣形成塡充部，獲得基材（d-8) (層（LD)之形成） 。塡充部之厚度自凹部之底部至最表層爲4#m。 0 對基材（d-8)之兩面進行抗反射處理，獲得偏光性 繞射元件（8 )。所得偏光性繞射元件（8 )之正常光透過 率於波長660nm爲98.3%，於波長785nm爲99.3%，異常光 透過率於波長660nm爲1.6%，於波長78 5nm爲3.4%。反射 率在具有圖型及塡充部之側（圖型側）之面，於660tun爲 0.2%，於波長78 5nm爲0.3%，於基材（a-2 )側（基材側） 之面，於660nm爲0.3%，於波長78 5nm爲0.3%。又，測定 波前像差之結果，Arms=12mA ，可知爲平坦面。 ⑩ [實施例A9] 使用於井上金屬工業製之INVEX實驗塗佈機中之30〇 網目之小直徑凹版印刷輥，將調製例A 1獲得之紫外線硬化 型丙烯酸材料（D-1)塗佈於實施例A1獲得之基材（b-1) 上形成之凹部，接著於其上層合製造例A1獲得之基材（a_ 1)作爲基材（e-1)。接著使用高壓水銀燈，自不具有圖 型之側（基材（b-Ι)之側）以500mJ/Cm2之能量照射紫外 線並經硬化，形成塡充部，獲得基材（g-1 )。塡充部之 -123- 201027140 厚度自凹部之底部至與層合基材（e-l)相接之層爲止爲4 β m。 對基材（g-1)之兩面進行抗反射處理，獲得偏光性 繞射元件（9)。所得偏光性繞射元件（9)之正常光透過 率於波長660nm爲98.7%，於波長785nm爲98·8%，異常光 透過率於波長660nm爲1.6%，於波長785nm爲4.0%。反射 率在基材（e-l )側（層合側）之面，於660nm爲0.3%，於 波長785nm爲0.2%，於基材（a’-l )側（基材側）之面， 於660nm爲0.2%，於波長78 5nm爲0.2%。又，測定波前像 差之結果，；lrms=10mA，可知爲平坦面。 [實施例A10] 除以實施例A2獲得之基材（b-2)替代基材（b-Ι)、 以基材（a-2 )(基材（e-2 ))替代基材（a-l )(基材（ e-l ))以外，餘如實施例A9般進行，獲得基材（g·2 )。 塡充部之厚度自凹部之底部至與層合基材（e-2)相接之 層爲止爲4 v m。 對基材（g-2)之兩面進行抗反射處理，獲得偏光性 繞射元件（1 〇 )。所得偏光性繞射元件（1 0 )之正常光透 過率於波長660nm爲98.7%，於波長785nm爲98.7%，異常 光透過率於波長66〇11111爲1.6%，於波長78511111爲3.8%。反 射率在基材（e-2 )側（層合側）之面，於660nm爲0.2%， 於波長785nm爲0.2%，於基材（a’-2 )側（基材側）之面 ，於660nm爲0.3%，於波長785nm爲0.2%。又，測定波前 -124- 201027140 像差之結果，λ rms = 9m又’可知爲平坦面。 [實施例Al 1] 除以實施例A3獲得之基材（c-3)替代基材（b-Ι)、 以厚度80 y in之三乙醯基纖維素製之薄膜（基材（e-3 )) 替代基材（a-1 )(基材（e-1 ))以外，餘如實施例A9般 進行，獲得基材（g-3)。塡充部之厚度自凹部之底部至 φ 與層合基材（e-3)相接之層爲止爲4/zm。 對基材（g-3 )之兩面進行抗反射處理，獲得偏光性 繞射元件（1 1 )。所得偏光性繞射元件（1 1 )之正常光透 過率於波長660nm爲98.2%，於波長78 5nm爲99.1%，異常 光透過率於波長660nm爲1.2%，於波長785nm爲3.7%。反 射率在基材（e-3 )側（層合側）之面，於660nm爲0.2%， 於波長785nm爲0.3%，於基材（a-3 )側（基材側）之面， 於660nm爲0.2%，於波長78 5nm爲0.3%。又，測定波前像 〇 差之結果，λ rms=10m又，可知爲平坦面。 [實施例A12] 除以實施例A4獲得之基材（c-4)替代基材（b-Ι)、 以厚度90 // m之聚碳酸酯製薄膜（基材（e-4 ))替代基材 (a-Ι )(基材（e-1 ))以外，餘如實施例A9般進行，獲 得基材（g_4)。塡充部之厚度自凹部之底部至與層合基 材（e-4 )相接之層爲止爲4//m。 對基材（g-4 )之兩面進行抗反射處理’獲得偏光性 -125- 201027140 繞射元件（12)。所得偏光性繞射元件（12)之正常光透 過率於波長660 nm爲98.6%，於波長785nm爲98.7%’異常 光透過率於波長66〇11111爲1.4%’於波長78511111爲4.2%。反 射率在基材（e-4 )側（層合側）之面，於660nm爲0.3%， 於波長785nm爲0.2%，於基材（a-4 )側（基材側）之面’ 於660nm爲0.3%，於波長785nm爲0_2%。又，測定波前像 差之結果，又rms = 9mA，可知爲平坦面。 [實施例A13] 除以實施例AS獲得之基材（c-5)替代基材（b-Ι)、 以製造例A3獲得之基材（a-5 )(基材（e-5 ))替代基材 (a-Ι )(基材（e-1 ))以外，餘如實施例A9般進行，獲 得基材（g-5)。塡充部之厚度自凹部之底部至與層合基 材（e-5)相接之層爲止爲4;/m。 對基材（g-5 )之兩面進行抗反射處理，獲得偏光性 繞射元件（1 3 )。所得偏光性繞射元件（1 3 )之正常光透 過率於波長660nm爲98.2%，於波長78 5nm爲98.7%，異常 光透過率於波長660nm爲1.3%，於波長785nm爲4.1%。反 射率在基材（e-5 )側（層合側）之面，於660nm爲0.2%， 於波長78 5nm爲0.3%，於基材（c-5 )中之基材（a-5 )側 (基材側）.之面，於660nm爲0.3%，於波長785nm爲0.3% 。又，測定波前像差之結果，又rms = 9m又，可知爲平坦面 -126- 201027140 [實施例A14] 除以實施例A6獲得之基材（c-6)替代基材（b-1)以 外，餘如實施例A9般進行，獲得基材（g-6 )。塡充部之 厚度自凹部之底部至與層合基材（e-Ι)相接之層爲止爲4 β m。 對基材（g-6)之兩面進行抗反射處理，獲得偏光性 繞射元件（1 4 )。所得偏光性繞射元件（1 4 )之正常光透 φ 過率於波長660nm爲98.7%，於波長78 5nm爲98.9%，異常 光透過率於波長66〇11111爲1.5%，於波長78511111爲3.1%。反 射率在基材（e- 1 )側（層合側）之面，於660nm爲0.3 %， 於波長785nm爲0.2%，於基材（c-6)中之基材（a-i)側 (基材側）之面’於660nm爲0.2%，於波長785nm爲0.2% 。又’測定波前像差之結果，λ rms = 8m Λ，可知爲平坦面 φ [實施例A 1 5 ] 除以實施例A7獲得之基材（c_7)替代基材（b-1)、 以調製例A6獲得之紫外線硬化型丙烯酸材料（d_2 )替代 紫外線硬化型丙烯酸材料（D-1 )以外，餘如實施例人9般 進行’獲得基材（g-7)。塡充部之厚度自凹部之底部至 與層合基材（e-Ι)相接之層爲止爲4/zm。 對基材（g-7)之兩面進行抗反射處理，獲得偏光性 繞射兀件（1 5 )。所得偏光性繞射元件（〗5 )之正常光透 過率於波長660nm爲98.6%，於波長78 511„1爲98.9%，異常 -127- 201027140 光透過率於波長660nm爲1.7%，於波長785nm爲4.2%。反 射率在基材（e-Ι )側（層合側）之面，於660nm爲0.2%， 於波長78 5nm爲0.3%，於基材（c-7 )中之基材（a-Ι )側 (基材側）之面，於660nm爲0.3%，於波長785nm爲0.2% 。又，測定波前像差之結果，Arms = 9mA，可知爲平坦面 [實施例A16] 除以實施例A8獲得之基材（c-8)替代基材（b-Ι)、 以調製例A6獲得之紫外線硬化型丙烯酸材料（D-2 )替代 紫外線硬化型丙烯酸材料（D-1 )，以製造例A2獲得之基 材（a-2 )(基材（e-2 ))替代基材（a-1 )(基材（e-1 ))以外，餘如實施例A9般進行，獲得基材（g-8 )。塡 充部之厚度自凹部之底部至與層合基材（e-2)相接之層 爲止爲4 // m。 對基材（g-8)之兩面進行抗反射處理，獲得偏光性 繞射元件（1 6 )。所得偏光性繞射元件（1 6 )之正常光透 過率於波長660nm爲98.6%，於波長78 5nm爲98.8%，異常 光透過率於波長660nm爲1.6%，於波長785 nm爲3.5%。反 射率在基材（e-2 )側（層合側）之面，於660nm爲0.2%， 於波長785nm爲0.2%，於基材（c-8 )中之基材（a-2 )側 (基材側）之面，於660nm爲0.3%，於波長785nm爲0.3% 。又，測定波前像差之結果，又rms=10m；l ，可知爲平坦 面。 -128- 201027140 [實施例A17] 使用於井上金屬工業製之INVEX實驗塗佈機中之300 網目之小直徑凹版印刷輥，將調製例A6獲得之紫外線硬化 型丙烯酸材料（D-2)塗佈於製造例A1獲得之基材（a-〇 之一面上成爲厚度4//m，且使用爲了轉印連續形成有凹部 與凸部之圖型而製備之轉印輥，將連續形成有凹部與凸部 φ 之圖型轉印於塗佈面上。另外，轉印輥表面之凹部與凸部 係製備爲沿著輥之圓周方向形成凹凸之溝槽。轉印之同時 ，自基材之不具有圖型之面側，利用高壓水銀燈，以 500mJ/cm2之能量照射紫外線，形成連續形成有由紫外線 硬化型丙烯酸樹脂（D-2)所構成之凹部與凸部之圖型（ 層（LD)之形成），獲得基材（f-Ι)。凸部之寬度爲2.5 凹部之寬度爲2.5#m，凹部之深度爲2.6#m。 另一方面’使用於井上金屬工業製之INVEX實驗塗佈 ® 機中之2 00網目之小直徑凹版印刷輥，在5 0 °C條件下將相 對於100質量份之Merck股份有限公司製造之紫外線硬化型 液晶材料RMM 727添加30質量份之丙酮溶劑而成者塗佈於 實施例A7獲得之基材（b-7 )上，並經乾燥、配向，成爲 厚度4/zm。接著，以使基材（η)之凹凸面與基材（b-7 )之紫外線硬化型液晶材料塗佈面相對之方式，使二基材 層合’層合後立即使用高壓水銀燈，自基材（b - 7 )側以 500mJ/Cm2之能量照射紫外線，使紫外線硬化型液晶硬化 ’獲得基材（h-Ι)(層（LC)之形成）^ -129- 201027140 對基材（h-l)之兩面進行抗反射處理，獲得偏光性 繞射元件（1 7 )。所得偏光性繞射元件（1 7 )之正常光透 過率於波長660nm爲98.1%，於波長785nm爲98.6%，異常 光透過率於波長660nm爲1.4%，於波長78 5nm爲3.6%。反 射率在基材（f-Ι )側（圖型側）之面，於660nm爲0.2%， 於波長78 5nm爲0.3%，於基材（b-7 )中之基材（a-Ι )側 (基材側）之面，於660nm爲0.2%，於波長785nm爲0.2% 。又，測定波前像差之結果，λ rms = 8m λ，可知爲平坦面 [實施例Α18] 除以製造例Α2獲得之基材（a-2 )替代基材（a-Ι )以 外，餘如實施例A1 7般進行，獲得連續形成有凹部與凸部 之基材（f-2)。凸部之寬度爲2.5/zm，凹部之寬度爲2.5 ym，凹部之深度爲2.6ym。 除以實施例A8獲得之基材（b-8)替代基材（b-7)， 以基材（f-2)替代基材（f-1)以外，餘如實施例A17般進 行，獲得基材（f-2 )之凹凸面與基材（b-8 )之紫外線硬 化型液晶材料之塗佈面相對向層合而成之基材（h-2 )。 對基材（h-2 )之兩面進行抗反射處理，獲得偏光性 繞射元件（1 8 )。所得偏光性繞射元件（1 8 )之正常光透 過率於波長660nm爲98.5 %，於波長785 nm爲99.0%，異常 光透過率於波長660nm爲1.6%，於波長785 nm爲3.3%。反 射率在基材（f-2 )側（圖型側）之面，於660nm爲0.2%， -130- 201027140 於波長785nm爲0.2%，於基材（b-8 )中之基材（a-2 )側 (基材側）之面，於660nm爲0.2%，於波長785nm爲0.2% 。又，測定波前像差之結果，；I rms = 8m λ，可知爲平坦面 [實施例Α19] 使用於井上金屬工業製之INVEX實驗塗佈機中之200 φ 網目之小直徑凹版印刷輥，在50°C條件下將相對於100質 量份之Merck股份有限公司製造之紫外線硬化型液晶材料 RMM727中添加30質量份之丙酮溶劑而成者塗佈於實施例 A1 7獲得之基材（f-Ι)之凹凸圖型面上，並經乾燥，獲得 基材（j-Ι )。接著，使實施例A7獲得之基材（b-7 )之紫 外線硬化型樹脂面與基材（j -1 )之紫外線硬化型液晶材料 塗佈面相對之方式層合二基材，且在50。(：之條件下加熱處 理使液晶材料配向，加熱後立即使用高壓水銀燈，自基材 ® ( j_l )側以500mJ/Cm2之能量照射紫外線，使紫外線硬化 型液晶硬化，獲得基材（k-Ι )(層（LC )之形成）。紫 外線硬化型液晶層之厚度自凹部之底部自與基材（b-7 ) 相接之面爲止爲4;/ m。 對基材（k-1)之兩面進行抗反射處理，獲得偏光性 繞射元件（1 9 )。所得偏光性繞射元件（丨9 )之正常光透 過率於波長660nm爲98.3%，於波長785nm爲98.7%，異常 光透過率於波長660nm爲1.6%，於波長785nm爲3.7%。反 射率在基材（j -1 )側（圖型側）之面，於6 6 Onm爲0.2 %， -131 - 201027140 於波長78511111爲0.3%，於基材（13-7)中之基材（^1)側 (基材側）之面’於660nm爲0.2%，於波長78 5nm爲0.3% 。又’測定波前像差之結果，又rms = 9m又，可知爲平坦面 [實施例A20] 使用於井上金屬工業製之INVEX摩擦塗佈機中之200 網目之小直徑凹版印刷輥，在5 0 °C條件下將相對於1 0 〇質 量份之Merck股份有限公司製造之紫外線硬化型液晶材料 RMM727中添加30質量份之丙酮溶劑而成者塗佈於實施例 A 18獲得之基材（f-2 )之凹凸圖型面上，並經乾燥，獲得 基材（j-2 )。 接著，以使實施例A8獲得之基材（b-8)之紫外線硬 化型樹脂面與基材（j-2)之紫外線硬化型液晶材料塗佈面 相對之方式層合二基材，且在50 °C之條件下加熱處理使液 晶材料配向，加熱後立即使用高壓水銀燈，自基材（j -2 ) 側以500mJ/cm2之能量照射紫外線，使紫外線硬化型液晶 硬化，獲得基材（k-2 )(層（LC )之形成）。紫外線硬 化型液晶層之厚度自凹部之底部自與基材（b-8)相接之 面爲止爲4 /z m。 對基材（k-2)之兩面進行抗反射處理，獲得偏光性 繞射元件（20 )。所得偏光性繞射元件（20 )之正常光透 過率於波長660 nm爲98.4 %，於波長785 nm爲98.8%，異常 光透過率於波長66〇11111爲1.4%，於波長78511111爲3.4%。反 -132- 201027140 射率在基材（f-2 )側（圖型側）之面，於660run爲0.3%， 於波長785nm爲0.2%，於基材（b-8 )中之基材（a-2 )側 (基材側）之面，於660nm爲0.3%，於波長785nm爲0.2% 。又，測定波前像差之結果，Arms = 8mA，確定爲平坦面 [表1]A friction machine manufactured by Gauge Co., Ltd., at a roll speed of 600 rpm, a film conveyance speed of 3 m/min, and a stick press amount of 3.3 mm 'friction treatment in a rubbing direction parallel to the film length direction' (a, -1). Next, it was used for a 200-mesh small-diameter gravure roll on an INVEX experimental coater (Labcoater) manufactured by Inoue Metals Co., Ltd., and manufactured at 50 ° C with respect to 1 part by mass of Merck Co., Ltd. The ultraviolet curable liquid crystal material RMM727 was applied to a substrate (a'-1) by adding 30 φ parts by mass of an acetone solvent, and dried and aligned to have a thickness of 4 μm. Next, a transfer roller prepared by transferring a pattern in which the concave portion and the convex portion are continuously formed is used, and a pattern in which a concave portion and a convex portion are continuously formed is transferred onto the coated surface. Further, the concave portion and the convex portion on the surface of the transfer roller are prepared by forming grooves having irregularities along the circumferential direction of the roller. At the same time of transfer, a high-pressure mercury lamp is used to irradiate ultraviolet rays with an energy of 500 mJ/cm 2 from the surface side of the substrate (a'-l) which does not have a pattern, and a pattern in which concave portions and convex portions are continuously formed is obtained. Material (b-Ι). The width of the convex portion 2 is 2_5 #m, the width of the concave portion is 2.5 / / m, and the depth of the concave portion is 2.6 ym. Then, the small-diameter gravure roll of 300 mesh used in the IN VEX experimental coater manufactured by Inoue Metal Industry was applied to the ultraviolet curable acrylic material obtained in Preparation Example A1, using a high-pressure mercury lamp, and having no pattern side. The ultraviolet ray was irradiated with an energy of 500 mJ/cm 2 and hardened to form an entangled portion composed of an ultraviolet curable acrylic resin (D-1), whereby a substrate (c-1) was obtained. The thickness of the ultraviolet curable acrylic resin is from the bottom of the concave portion to the outermost layer of 4 μm. Antireflection treatment was performed on both sides of the substrate (¢-1) to obtain a polarizing property -115 - 201027140 diffraction element (1). The normal light transmittance of the obtained polarizing diffractive element (1) was 99.2% at a wavelength of 660 nm, 99.0% at a wavelength of 785 nm, an abnormal light transmittance of 1.3% at a wavelength of 660 nm, and 3.2% at a wavelength of 78 5 nm. The reflectance is 0.1% at 660 nm on the side of the pattern and the side of the filling portion (pattern side), 0.1% at a wavelength of 785 nm, and is on the side of the substrate (a'-l) side (substrate side). It is 0.2% at 660 nm and 0.2% at a wavelength of 78 5 nm. Further, as a result of measuring the wavefront aberration, Xrms = 10 mX, which is a flat surface. [Example A2] In the groove of the extension furnace temperature of 155 ° C, the elongation speed was 5.0 m/min, and the stretching ratio was 3.5 times. The substrate (a_2) obtained in Production Example A2 was stretched and stretched in the transverse direction to obtain a roll-shaped stretched film (substrate (a'-2)) having a thickness of 37/zm. Next, in the same manner as in Example A1, a UV-curable liquid crystal material was used in the same manner, and a concave portion and a convex portion were formed on one surface of the stretched film (substrate (a, -2)) to obtain a substrate (b-Ι). The width of the convex portion is 2.5 #m, the width of the concave portion is 2.5/m, and the depth of the concave portion is 2.6 μm. Next, in the same manner as in Example A1, a fused portion was formed using an ultraviolet curable acrylic material (d-1) to obtain a substrate (c-2). The thickness of the filling portion is 4/z m from the bottom of the recess to the outermost layer. Antireflection treatment was performed on both surfaces of the substrate (C-2) to obtain a polarizing diffractive element (2). The normal light transmittance of the obtained polarizing diffractive element (2) was 98_9% at a wavelength of 66 〇 11111, 98.9% at a wavelength of 78511111, and the extraordinary light transmittance was 1.5% at a wavelength of 66 〇 11111 and 3.1% at a wavelength of 78511111. The reflectance is on the side of the pattern and the side of the filling (pattern side), which is -116-201027140 0.2% at 66〇nm and 0.1% at a wavelength of 7 85nm, on the side of the substrate (a'-2). The surface (base material side) was 0.2% at 660 nm and 0.2% at 785 nm. In addition, the result of measuring the wavefront aberration, Xrms = 9mX, is known as a flat surface. [Example A3] The alignment film composition φ (B-1) obtained in Preparation Example A2 was applied to a thickness of 80 using a small-diameter gravure roll of 200 mesh in an IN VEX experimental coater manufactured by Inoue Metal Industry Co., Ltd. #m的三乙醯 based cellulose film (substrate (a-3)). At the time of coating, a film made of PTFE of 0.2 #m was filtered, and after application, the solvent was evaporated and dried by a dryer to form an alignment film layer. The drying was carried out at 30 ° C for 30 seconds, and then at 120 ° C for 30 seconds. Next, the surface of the formed alignment film layer was set to a friction machine manufactured by Iijima Gauge Co., Ltd., and the roll rotation speed was set to 80 rpm, the film conveyance speed was set to 3 m/min, and the roll press amount was set to 0.3 mm. The rubbing direction is rubbed in parallel with the longitudinal direction of the film to obtain a base material (b-3). Then, in the same manner as in Example A1, a base material (c-3) (formation of a layer (LC)) in which irregular grooves were formed was obtained using an ultraviolet curable liquid crystal material. The width of the convex portion was 2.5 / zm, the width of the concave portion was 2.5 / / m, and the depth of the concave portion was 2.6 # m. Then, in the same manner as in Example A1, a fused portion (formation of a layer (LD)) was formed using an ultraviolet curable acrylic material (D-1) to obtain a substrate (d-3). The thickness of the filling portion is 4 # m from the bottom of the recess to the outermost layer. Antireflection treatment was performed on both surfaces of the substrate (d-3) to obtain a polarizing diffractive element (3). The normal light transmission of the obtained polarizing diffractive element (3) is -117-201027140, which is 98.7% at a wavelength of 66〇11111, and 98.7% at a wavelength of 78511111. The extraordinary light transmittance is 1.8% at a wavelength of 660 nm, at a wavelength of 78. 5 nm was 3.8%. The reflectance is 0.2% at 660 nra and 0.3% at 785 nm on the side of the pattern and the side of the filling portion (the side of the substrate), on the side of the substrate (a-3) side (substrate side). It is 0.3% at 660 nm and 0.2% at a wavelength of 7 85 nm. Further, as a result of measuring the wavefront aberration, Xrms = 9 mk, which is a flat surface. [Example A4] The alignment film composition (B-2) obtained in Preparation Example A3 was applied to a thickness of 90/zm using a 200-mesh small-diameter gravure roll in an INVEX experimental coater manufactured by Inoue Metal Industry Co., Ltd. On a polycarbonate film (substrate (a-4)). At the time of coating, it was filtered with a film of PTFE made of 〇2/zm. After coating, the solvent was volatilized and dried by a dryer to form an alignment film layer. The drying was carried out at 30 ° C for 30 seconds and then at 120 ° C for 30 seconds. Then, the surface of the formed alignment film layer was made into a friction machine manufactured by Iijima Gauge Co., Ltd., and the roll rotation speed was set to 8 rpm, and the film conveyance speed was set to 3 m/min. The rubbing treatment was carried out in such a manner that the rubbing direction was parallel to the longitudinal direction of the film to obtain a substrate (b-4). Then, in the same manner as in the example, the substrate (c-4) in which the groove having the unevenness was formed was obtained using the ultraviolet curable liquid crystal material (the formation of the layer (LC)), the width of the convex portion was 2.5 μm, and the width of the concave portion was 2.5. The depth of the recess is 2.6/zm. Then, in the same manner as in the embodiment, an underfill portion (formation of a layer (LD)) was formed using an ultraviolet curable acrylic material (D-丨) to obtain a substrate (d-4). The thickness of the filling portion is from the bottom of the recess to the most -118-201027140. The surface layer is 4 // m. Antireflection treatment was performed on both sides of the substrate (d-4) to obtain a polarizing diffractive element (4). The normal light transmittance of the obtained polarizing diffractive element (4) was 98.5% at a wavelength of 660 nm and 98.6 % at a wavelength of 785 nm. The extraordinary light transmittance was 1.9% at a wavelength of 660 nm and 4.2% at a wavelength of 78 5 nm. The reflectance is 0.3% at 660 nm on the side of the pattern and the side (pattern side), and 0.3% at the wavelength of 785 nm. 'On the side of the substrate (a-4) (substrate side) φ The surface was 0.4% at 660 nm and 0.3% at a wavelength of 78 5 nm. Further, as a result of measuring the wavefront aberration, Xrms = 9 mX, which is a flat surface. [Example A5] The alignment film composition (B-3) obtained in Preparation Example A4 was applied to Production Example A3 using a 200-mesh small-diameter gravure roll of an INVEX experimental coater manufactured by Inoue Metal Industry Co., Ltd. On the substrate (a-5). At the time of coating, it was filtered with a 0.2 PTFE film, and after coating, the Φ solvent was evaporated and dried by a dryer to form an alignment film layer. The drying was carried out at 30 ° C for 30 seconds, and then carried out under conditions of 12 (TC for 30 seconds). Then, using the Hg-Xe lamp, the surface of the formed alignment film layer was made of PYREX (registered trademark) glass. Polarized plate SPF-50C-32 (Sigma optical mechanism), irradiated 直线.5J/Cm2 with a linear polarized ultraviolet light with a wavelength of 3 65 nm, and obtained a substrate (b-5). The direction of the polarized surface of the linear polarized light is The film length direction was parallel to each other. Then, in the same manner as in Example A1, a base material (c-5) (formation of a layer (LC)) in which grooves having irregularities were formed was obtained using an ultraviolet curable liquid crystal material. The width of the recess is 2.5 #m, and the depth of the recess is -2.6 mm. The depth of the recess is 2.6 cm. Then, in the same manner as in the case of the embodiment A1, the yoke portion (layer (formed) is formed using the ultraviolet curable acrylic material (D-1). Ld)), the substrate (d-5) is obtained. The thickness of the filling portion is 4 m from the bottom of the concave portion to the outermost layer. Antireflection treatment is performed on both sides of the substrate (d-5) to obtain a polarizing winding. Shooting element (5). The normal light transmittance of the obtained polarizing diffractive element (5) is at a wavelength of 660 nm. 98.2%, 98.3% at a wavelength of 785 nm, an abnormal light transmittance of 1.7% at a wavelength of 66 〇 11111, and 3.6% at a wavelength of 78 511 111. The reflectance is on the side of the pattern and the side of the ridge (the side of the pattern) 〇 2 2 % at 660 nm, 0 · 2 % at a wavelength of 7 8 5 nm, 0.3% at 660 nm on the side of the substrate (a - 5 ) (substrate side), and 0.2 at a wavelength of 78 5 nm Further, the result of measuring the wavefront aberration, Xrms = 10 mX, is known as a flat surface. [Example A6] A small-diameter gravure roll of 200 mesh used in an INVEX experimental coater manufactured by Inoue Metal Industry, The polyether polyurethane material H YDR AN WLS-201 (manufactured by Otsuka Ink Chemical Industry Co., Ltd.) was diluted with methanol to 3% and coated on one side of the substrate (ai) obtained in Production Example A1. The substrate was heated and dried at 80 ° C for 5 minutes to obtain a substrate having a polyurethane. The friction machine manufactured by Iguchi Gauge Co., Ltd. was set at a roll speed of 600 rpm and a film transport speed of 3 m/min. The roller pressing amount is set to be below 〇3 mm, and the rubbing direction is performed in parallel with the longitudinal direction of the film to obtain a rubbing treatment. Substrate (b-6) Next, in the same manner as in Example A1, a substrate (C-6) (layer (LC)) in which concave-120-201027140 and convex portions were continuously formed was obtained using an ultraviolet curable liquid crystal material. The width of the convex portion is 2.5#m, and the width of the concave portion is 2.5&quot;m', and the depth of the concave portion is 2_6//m. Then, in the same manner as in Example A1, a fused portion (formation of a layer (LD)) was formed using an ultraviolet curable acrylic material (D-1) to obtain a substrate (d-6). The thickness of the filling portion is antireflection treatment on both sides of the substrate (d-6) from the bottom of the concave portion to the outermost layer to obtain a polarizing diffractive element (6). The normal light transmission φ ratio of the obtained polarizing diffractive element (1) was 99.1% at a wavelength of 66 Onm, 99.1% at a wavelength of 785 nm, and an abnormal light transmittance of 1.1% at a wavelength of 660 nm and 3.0% at a wavelength of 785 nm. The reflectance is 〇·1% at 660 nm and 〇_1% at 785 nm on the side of the pattern and the side of the filling (pattern side), on the substrate (al) side (substrate side). The surface '0.2% at 660 nm and 0.2% at 785 nm. Further, the result of measuring the wavefront aberration; lrms = 12 mA, which is known to be a flat surface. [Example A7] ® 200 mm mesh small-diameter gravure roll used in the INVEX experimental coater manufactured by Inoue Metal Industry'. The alignment film obtained in Preparation Example A5 was coated with UV curable resin (B-4). On one side of the substrate (aq) obtained in Example A1, a substrate was obtained by irradiating ultraviolet rays with an energy of 7 〇〇mj/cm 2 using a high pressure mercury lamp. Then, 'the friction machine manufactured by Iguchi Gauge Co., Ltd. was set to 6〇〇1_1) 111, the film conveying speed was set to 3 m/min, and the roll pressing amount was set to 〇.3 mm, in the rubbing direction. The rubbing treatment was carried out in parallel with the longitudinal direction of the film to obtain a substrate (b_7). In the same manner as in Example A1, a groove of irregularities (formation of a layer (LC)) was formed on the base-121 - 201027140 material (b-7) using an ultraviolet curable liquid crystal material to obtain a substrate (c-7). . The width of the convex portion is 2.5 μm, the width of the concave portion is 2.5/zm, and the depth of the concave portion is 2.6 yin. A ruthenium portion (formation of a layer (LD)) was formed in the same manner as in Example A1 except that the ultraviolet curable acrylic material (D-2) obtained in Preparation Example A6 was used, and a substrate (d-7) was obtained. The thickness of the filling portion is 4 // m from the bottom of the recess to the outermost layer. Antireflection treatment was performed on both surfaces of the substrate (d-7) to obtain a polarizing diffractive element (7). The normal light transmittance of the obtained polarizing diffractive element (7) was 98.5% at a wavelength of 660 nm, 99.0% at a wavelength of 785 nm, an extraordinary light transmittance of 1.7% at a wavelength of 660 nm, and 3.2% at a wavelength of 785 nm. The reflectance is 0.3% at 660 nm on the side of the pattern and the side of the filling portion (pattern side), and 0.2% at a wavelength of 785 nm, on the substrate (a-Ι) side (substrate side). The surface was 0.2% at 660 nm and 0.2% at a wavelength of 7 85 nm. Further, the result of measuring the wavefront aberration was rms = 9 m; l, which was known to be a flat surface. [Example A8] The alignment film obtained in Preparation Example A5 was coated with an ultraviolet curable resin (B-4) in a production example using a 200-mesh small-diameter gravure roll in an INVEX experimental coater manufactured by Inoue Metals Co., Ltd. On one side of the substrate (a-2) obtained in A2, a high-pressure mercury lamp was used, and ultraviolet rays were irradiated at an energy of 700 m J/cm 2 to obtain a substrate. Then, in the groove of the extruder furnace at a temperature of 155 ° C, the longitudinal direction was extended by a magnification of 1.5 times at a speed of 5. Om/min in the extension furnace to obtain a roll-shaped stretch film having a thickness of 107 ( Substrate (-122-201027140 b-8)). Then, in the same manner as in Example A1, a groove (layer (LC)) was formed on the substrate (b-8) by using an ultraviolet curable liquid crystal material to obtain a substrate (c-8). The width of the convex portion is 2·5 // m, the width of the concave portion is 2.5//m, and the depth of the concave portion is 2.6# m. Except that the ultraviolet curable acrylic material (D-2) obtained in Preparation Example A6 was used, the filling portion was formed in the same manner as in Example A1 to obtain a substrate (d-8) (formation of a layer (LD)). The thickness of the filling portion is 4#m from the bottom of the concave portion to the outermost layer. 0 Antireflection treatment is applied to both sides of the substrate (d-8) to obtain a polarizing diffractive element (8). The normal light transmittance of the obtained polarizing diffractive element (8) was 98.3% at a wavelength of 660 nm, 99.3% at a wavelength of 785 nm, an extraordinary light transmittance of 1.6% at a wavelength of 660 nm, and 3.4% at a wavelength of 78 5 nm. The reflectance is 0.2% at 660 tun and 0.3% at a wavelength of 78 5 nm on the side of the pattern and the side of the filling (pattern side), on the side of the substrate (a-2) (substrate side). It is 0.3% at 660 nm and 0.3% at a wavelength of 78 5 nm. Further, as a result of measuring the wavefront aberration, Arms = 12 mA, which is a flat surface. 10 [Example A9] The ultraviolet curable acrylic material (D-1) obtained in Preparation Example A 1 was applied to a small-diameter gravure roll of 30 mesh in an INVEX experimental coater manufactured by Inoue Metal Industry Co., Ltd. The concave portion formed on the substrate (b-1) obtained in Example A1, and then the substrate (a-1) obtained in Production Example A1 was laminated thereon as the substrate (e-1). Subsequently, a high-pressure mercury lamp was used, and the ultraviolet rays were irradiated with energy of 500 mJ/cm 2 from the side having no pattern (the side of the substrate (b-Ι)) and hardened to form a filling portion, thereby obtaining a substrate (g-1). The filling portion -123- 201027140 has a thickness of 4 β m from the bottom of the concave portion to the layer in contact with the laminated substrate (e-1). Antireflection treatment was performed on both surfaces of the substrate (g-1) to obtain a polarizing diffractive element (9). The normal light transmittance of the obtained polarizing diffractive element (9) was 98.7% at a wavelength of 660 nm, 98.8% at a wavelength of 785 nm, and the extraordinary light transmittance was 1.6% at a wavelength of 660 nm and 4.0% at a wavelength of 785 nm. The reflectance is 0.3% at 660 nm on the side of the substrate (el) side (on the side of the laminate), 0.2% at a wavelength of 785 nm, and is on the side of the substrate (a'-l) side (substrate side) at 660 nm. It was 0.2% and was 0.2% at a wavelength of 78 5 nm. Further, the result of the wavefront aberration was measured, and lrms = 10 mA, which was found to be a flat surface. [Example A10] Substituting the substrate (b-2) obtained in Example A2 in place of the substrate (b-Ι), and replacing the substrate (a-2) (substrate (e-2)) with the substrate (al) Except for the substrate (el), the remainder was carried out as in Example A9 to obtain a substrate (g·2). The thickness of the filling portion is 4 v m from the bottom of the concave portion to the layer in contact with the laminated substrate (e-2). Antireflection treatment was performed on both surfaces of the substrate (g-2) to obtain a polarizing diffractive element (1 〇 ). The normal light transmittance of the obtained polarizing diffractive element (10) was 98.7% at a wavelength of 660 nm, 98.7% at a wavelength of 785 nm, and an abnormal light transmittance of 1.6% at a wavelength of 66〇11111 and 3.8% at a wavelength of 78511111. The reflectance is 0.2% at 660 nm on the side of the substrate (e-2) side (layered side), 0.2% at a wavelength of 785 nm, and is on the side of the substrate (a'-2) side (substrate side). It is 0.3% at 660 nm and 0.2% at 785 nm. Further, the result of the aberration of the wavefront -124 - 201027140 was measured, and λ rms = 9 m was found to be a flat surface. [Example Al 1] A substrate (e-) obtained by dividing the substrate (c-3) obtained in Example A3 in place of the substrate (b-Ι), and having a thickness of 80 y in triethyl fluorene-based cellulose (e- 3)) The substrate (g-3) was obtained in the same manner as in Example A9 except that the substrate (a-1) (substrate (e-1)) was used instead. The thickness of the filling portion is 4/zm from the bottom of the concave portion to the layer where φ is in contact with the laminated base material (e-3). Antireflection treatment was performed on both surfaces of the substrate (g-3) to obtain a polarizing diffractive element (1 1 ). The normal light transmittance of the obtained polarizing diffractive element (1 1 ) was 98.2% at a wavelength of 660 nm, 99.1% at a wavelength of 78 5 nm, an abnormal light transmittance of 1.2% at a wavelength of 660 nm, and 3.7% at a wavelength of 785 nm. The reflectance is 0.2% at 660 nm on the side of the substrate (e-3) side (lamination side), 0.3% at a wavelength of 785 nm, and is on the side of the substrate (a-3) side (substrate side). It was 0.2% at 660 nm and 0.3% at a wavelength of 78 5 nm. Further, as a result of measuring the wavefront image coma, λ rms = 10 m, and it was found to be a flat surface. [Example A12] A substrate (c-4) obtained in the same manner as in Example A4 was used instead of the substrate (b-Ι), and a polycarbonate film (substrate (e-4)) having a thickness of 90 // m was replaced. The substrate (g_4) was obtained as in Example A9 except for the substrate (a-Ι) (substrate (e-1)). The thickness of the filling portion is 4/m from the bottom of the concave portion to the layer in contact with the laminated substrate (e-4). Antireflection treatment was performed on both sides of the substrate (g-4) to obtain a polarizing property -125 - 201027140 diffraction element (12). The normal light transmittance of the obtained polarizing diffractive element (12) was 98.6% at a wavelength of 660 nm, 98.7% at a wavelength of 785 nm, and an abnormal light transmittance of 1.4% at a wavelength of 66〇11111 and 4.2% at a wavelength of 78511111. The reflectance is 0.3% at 660 nm on the side of the substrate (e-4) (layered side), 0.2% at a wavelength of 785 nm, and is on the side of the substrate (a-4) (substrate side). It is 0.3% at 660 nm and 0_2% at 785 nm. Further, as a result of measuring the wavefront aberration, rms = 9 mA, which is a flat surface. [Example A13] Substrate (c-5) obtained in Example AS was used instead of the substrate (b-Ι), and the substrate (a-5) obtained in Production Example A3 (substrate (e-5)) The substrate (g-5) was obtained in the same manner as in Example A9 except that the substrate (a-Ι) (substrate (e-1)) was used instead. The thickness of the filling portion was 4; / m from the bottom of the concave portion to the layer in contact with the laminated substrate (e-5). Antireflection treatment was performed on both surfaces of the substrate (g-5) to obtain a polarizing diffractive element (13). The normal light transmittance of the obtained polarizing diffractive element (13) was 98.2% at a wavelength of 660 nm, 98.7% at a wavelength of 78 5 nm, an abnormal light transmittance of 1.3% at a wavelength of 660 nm, and 4.1% at a wavelength of 785 nm. The reflectance is 0.2% at 660 nm on the side of the substrate (e-5) (lamination side), 0.3% at a wavelength of 78 5 nm, and a substrate (a-5) in the substrate (c-5). The side (substrate side) surface was 0.3% at 660 nm and 0.3% at 785 nm. Further, as a result of measuring the wavefront aberration, rms = 9 m, and it was found to be a flat surface - 126 - 201027140 [Example A14] The substrate (c-6) obtained by the example A6 was substituted for the substrate (b-1) Except as in Example A9, the substrate (g-6) was obtained. The thickness of the filling portion is 4 β m from the bottom of the concave portion to the layer in contact with the laminated substrate (e-Ι). Antireflection treatment was performed on both surfaces of the substrate (g-6) to obtain a polarizing diffractive element (14). The normal light transmission φ of the obtained polarizing diffractive element (14) was 98.7% at a wavelength of 660 nm, 98.9% at a wavelength of 78 5 nm, an abnormal light transmittance of 1.5% at a wavelength of 66 〇 11111, and 3.1 at a wavelength of 78,511,111. %. The reflectance is 0.3% at 660 nm on the side of the substrate (e-1) side (on the side of the laminate), 0.2% at a wavelength of 785 nm, and is on the substrate (ai) side in the substrate (c-6). The side of the material side was 0.2% at 660 nm and 0.2% at 785 nm. Further, as a result of measuring the wavefront aberration, λ rms = 8 m Λ, it is known that the flat surface φ [Example A 1 5 ] The substrate (c_7) obtained in Example A7 was replaced by the substrate (b-1), The ultraviolet curable acrylic material (d_2) obtained in Preparation Example A6 was replaced with the ultraviolet curable acrylic material (D-1), and the substrate (g-7) was obtained as in Example 9. The thickness of the filling portion is 4/zm from the bottom of the concave portion to the layer in contact with the laminated substrate (e-Ι). Antireflection treatment was performed on both sides of the substrate (g-7) to obtain a polarizing diffractive element (15). The normal light transmittance of the obtained polarizing diffractive element (〖5) is 98.6% at a wavelength of 660 nm, 98.9% at a wavelength of 78 511 „1, and the light transmittance at an anomaly-127-201027140 is 1.7% at a wavelength of 660 nm at a wavelength of 785 nm. It is 4.2%. The reflectance is 0.2% at 660 nm on the side of the substrate (e-Ι) side (lamination side), 0.3% at a wavelength of 78 5 nm, and a substrate in the substrate (c-7) ( The surface of the a-Ι side (substrate side) was 0.3% at 660 nm and 0.2% at a wavelength of 785 nm. Further, as a result of measuring wavefront aberration, Arms = 9 mA, which is known to be a flat surface [Example A16] The substrate (c-8) obtained in Example A8 was used instead of the substrate (b-Ι), and the ultraviolet curable acrylic material (D-2) obtained in Preparation Example A6 was used instead of the ultraviolet curable acrylic material (D-1). The substrate (a-2) (substrate (e-2)) obtained in Production Example A2 was used in the same manner as in Example A9 except that the substrate (a-1) (substrate (e-1)) was used. The base material (g-8). The thickness of the filling portion is 4 // m from the bottom of the concave portion to the layer in contact with the laminated base material (e-2). On both sides of the substrate (g-8) Anti-reflection treatment to obtain a polarizing diffractive element (16). The normal light transmittance of the polarizing diffractive element (16) is 98.6% at a wavelength of 660 nm, 98.8% at a wavelength of 78 5 nm, and the extraordinary light transmittance is 1.6% at a wavelength of 660 nm and 3.5% at a wavelength of 785 nm. On the side of the substrate (e-2) side (lamination side), 0.2% at 660 nm and 0.2% at 785 nm, on the side of the substrate (a-2) in the substrate (c-8) The surface of the material side is 0.3% at 660 nm and 0.3% at a wavelength of 785 nm. Further, as a result of measuring wavefront aberration, rms = 10 m; l is known to be a flat surface. -128 - 201027140 [Example A17] The ultraviolet curable acrylic material (D-2) obtained in Preparation Example A6 was applied to the substrate obtained in Production Example A1 using a 300-mesh small-diameter gravure roll in an INVEX experimental coater manufactured by Inoue Metal Industry Co., Ltd. ( a surface of a-〇 is a thickness of 4//m, and a transfer roller prepared by transferring a pattern in which a concave portion and a convex portion are continuously formed is used, and a pattern in which a concave portion and a convex portion φ are continuously formed is transferred to In addition, the concave portion and the convex portion on the surface of the transfer roller are prepared as grooves which form irregularities along the circumferential direction of the roller. The surface of the substrate which does not have the pattern is irradiated with ultraviolet rays at a dose of 500 mJ/cm 2 by a high-pressure mercury lamp to form a pattern in which concave portions and convex portions composed of the ultraviolet curable acrylic resin (D-2) are continuously formed ( The formation of a layer (LD)), obtaining a substrate (f-Ι). The width of the convex portion is 2.5. The width of the concave portion is 2.5#m, and the depth of the concave portion is 2.6#m. On the other hand, the small-diameter gravure roll used in the INVEX Experimental Coating® machine manufactured by Inoue Metal Industry Co., Ltd. will be UV-oxidized at 100 °C relative to 100 parts by mass of Merck Co., Ltd. at 50 °C. The hardened liquid crystal material RMM 727 was applied to the substrate (b-7) obtained in Example A7 by adding 30 parts by mass of an acetone solvent, and dried and aligned to have a thickness of 4/zm. Next, a high-pressure mercury lamp is used immediately after laminating the two base materials so that the uneven surface of the base material (η) faces the coated surface of the ultraviolet curable liquid crystal material of the base material (b-7). The material (b - 7 ) side is irradiated with ultraviolet rays at an energy of 500 mJ/cm 2 to harden the ultraviolet curable liquid crystal 'to obtain a substrate (h-Ι) (formation of a layer (LC)) ^ -129- 201027140 to a substrate (hl) Antireflection treatment is performed on both sides to obtain a polarizing diffractive element (17). The normal light transmittance of the obtained polarizing diffractive element (17) was 98.1% at a wavelength of 660 nm, 98.6% at a wavelength of 785 nm, an abnormal light transmittance of 1.4% at a wavelength of 660 nm, and 3.6% at a wavelength of 78 5 nm. The reflectance is 0.2% at 660 nm on the substrate (f-Ι) side (pattern side), 0.3% at a wavelength of 78 5 nm, and a substrate (a-Ι) in the substrate (b-7). The side of the side (substrate side) was 0.2% at 660 nm and 0.2% at 785 nm. Further, as a result of measuring the wavefront aberration, λ rms = 8 m λ, which is a flat surface [Example Α 18], except that the substrate (a-2) obtained in Production Example 替代2 was used instead of the substrate (a-Ι) The substrate (f-2) in which the concave portion and the convex portion were continuously formed was obtained as in the case of Example A1. The width of the convex portion is 2.5/zm, the width of the concave portion is 2.5 ym, and the depth of the concave portion is 2.6 ym. Except that the substrate (b-8) obtained in Example A8 was used instead of the substrate (b-7), and the substrate (f-2) was used in place of the substrate (f-1), the same procedure as in Example A17 was carried out. The base material (h-2) in which the uneven surface of the base material (f-2) and the coated surface of the ultraviolet curable liquid crystal material of the base material (b-8) are laminated. Antireflection treatment was performed on both surfaces of the substrate (h-2) to obtain a polarizing diffractive element (18). The normal light transmittance of the obtained polarizing diffractive element (18) was 98.5% at a wavelength of 660 nm, 99.0% at a wavelength of 785 nm, an extraordinary light transmittance of 1.6% at a wavelength of 660 nm, and 3.3% at a wavelength of 785 nm. The reflectance is 0.2% at 660 nm on the side of the substrate (f-2) (pattern side), -130-201027140 is 0.2% at 785 nm, and the substrate in the substrate (b-8) (a The surface of the side (substrate side) was 0.2% at 660 nm and 0.2% at a wavelength of 785 nm. Further, as a result of measuring the wavefront aberration, I rms = 8 m λ, which is a flat surface [Example Α 19] A small diameter gravure roll of 200 φ mesh used in an INVEX experimental coater manufactured by Inoue Metal Industry Co., Ltd. The substrate obtained in Example A1 7 was coated with 30 parts by mass of acetone solvent added to 100 parts by mass of the ultraviolet curable liquid crystal material RMM727 manufactured by Merck Co., Ltd. at 50 ° C (f- The embossed surface of Ι) was dried to obtain a substrate (j-Ι). Next, the ultraviolet curable resin surface of the substrate (b-7) obtained in Example A7 was laminated to the ultraviolet curable liquid crystal material coated surface of the substrate (j-1), and the two substrates were laminated at 50 . (In the condition of heat treatment, the liquid crystal material is aligned, and immediately after heating, a high-pressure mercury lamp is used, and ultraviolet rays are irradiated from the substrate® (j_l) side at an energy of 500 mJ/cm 2 to harden the ultraviolet curable liquid crystal to obtain a substrate (k-Ι). (formation of layer (LC).) The thickness of the ultraviolet curable liquid crystal layer is 4 Å from the bottom of the concave portion from the surface in contact with the substrate (b-7). For the substrate (k-1) Antireflection treatment was performed on both sides to obtain a polarizing diffractive element (19). The normal light transmittance of the obtained polarizing diffractive element (丨9) was 98.3% at a wavelength of 660 nm, and 98.7% at a wavelength of 785 nm, and an abnormal light transmittance. It is 1.6% at a wavelength of 660 nm and 3.7% at a wavelength of 785 nm. The reflectance is 0.2% on the surface of the substrate (j -1 ) (pattern side) at 0.26 Onm, -131 - 201027140 is 0.3 at a wavelength of 78511111. %, the surface of the substrate (^1) side (substrate side) in the substrate (13-7) was 0.2% at 660 nm, and 0.3% at a wavelength of 78 5 nm. Further, the result of measuring wavefront aberration was measured. And rms = 9m, it is known as a flat surface [Example A20] used in the INVEX friction coating machine manufactured by Inoue Metal Industry, 200 mesh small straight The gravure printing roller was applied to Example A 18 by adding 30 parts by mass of acetone solvent to 10 parts by mass of the ultraviolet curable liquid crystal material RMM727 manufactured by Merck Co., Ltd. at 50 °C. The surface of the obtained surface (f-2) of the obtained surface (f-2) was dried to obtain a substrate (j-2). Next, the ultraviolet curable resin of the substrate (b-8) obtained in Example A8 was obtained. The two substrates are laminated in a manner opposite to the coated surface of the ultraviolet curable liquid crystal material of the substrate (j-2), and the liquid crystal material is aligned by heating at 50 ° C, and a high pressure mercury lamp is used immediately after heating. The substrate (j -2 ) side is irradiated with ultraviolet rays at an energy of 500 mJ/cm 2 to cure the ultraviolet curable liquid crystal, thereby obtaining a substrate (k-2 ) (formation of a layer (LC)). The thickness of the ultraviolet curable liquid crystal layer is from the concave portion. The bottom portion is 4 /zm from the surface in contact with the substrate (b-8). Antireflection treatment is performed on both surfaces of the substrate (k-2) to obtain a polarizing diffractive element (20). The normal light transmittance of the element (20) is 98.4% at a wavelength of 660 nm at a wavelength of 785 nm. 98.8%, the abnormal light transmittance is 1.4% at a wavelength of 66〇11111, and 3.4% at a wavelength of 78511111. The anti-132-201027140 is on the side of the substrate (f-2) side (pattern side) at 660 run 0.3% is 0.2% at a wavelength of 785 nm, and is 0.3% at 660 nm on the substrate (a-2) side (substrate side) in the substrate (b-8), and 0.2% at a wavelength of 785 nm. Also, the result of measuring the wavefront aberration, Arms = 8 mA, was determined to be a flat surface [Table 1]

正常光透過率 /% 異常光透過率 /% 反射 圖型側 率/% 層合側 反射率/% 基材側 波前像差 /m λ 660nm 785nm 660nm 785nm 660nm 785nm 660nm 785nm Arms 實施例A1 99.2 99.0 1.3 3.2 0.1 0.1 0.2 0.2 10 實施例A2 98.9 98.9 1.5 3.1 0.2 0.1 0.2 0.2 9 實施例A3 98.7 98.7 1.8 3.8 0.2 0.3 0.3 0.2 9 實施例A4 98.5 98.6 1.9 4.2 0.3 0.3 0.4 0.3 9 實施例A5 98.2 98.3 1.7 3.6 0.2 0.2 0.3 0.2 10 實施例A6 99.1 99.1 1.1 3.0 0.1 0.1 0.2 0.2 12 實施例A7 98.5 99.0 1.7 3.2 0.3 0.2 0.2 0.2 9 實施例A8 98.3 99.3 1.6 3.4 0.2 0.3 0.3 0.3 9 實施例A9 98.7 98.8 1.6 4.0 0.3 0.2 0.2 0.2 10 實施例A10 98.7 98.7 1.6 3.8 0.2 0.2 0.3 0.2 9 實施例All 98.2 99.1 1.2 3.7 0.2 0.3 0.2 0.3 10 實施例A12 98.6 98.7 1.4 4.2 0.3 0.2 0.3 0.2 9 實施例A13 98.2 98.7 1.3 4.1 0.2 0.3 0.3 0.3 9 實施例A14 98.7 98.9 1.5 3.1 0.3 0.2 0.2 0.2 8 實施例A15 98.6 98.9 1.7 4.2 0.2 0.3 0.3 0.2 9 實施例A16 98.6 98.8 1.6 3.5 0.2 0.2 0.3 0.3 10 實施例A17 98.1 98.6 1.4 3.6 0.2 0.3 0.2 0.2 8 實施例A18 98.5 99.0 1.6 3.3 0.2 0.2 0.2 0.2 8 實施例A19 98.3 98.7 1.6 3.7 0.2 0.3 0.2 0.3 9 實施例A20 98.4 98.8 1.4 3.4 0.3 0.2 0.3 0.2 8 -133- 201027140 [實施例Bl] 使用於井上金屬工業製之invex實驗塗佈機中之200 網目之小直徑凹版印刷輥’將調製例B i獲得之紫外線硬化 型丙烯酸材料塗佈於製造例B1獲得之基板（a-1)上。接 著’使用用以轉印連續形成有凹部與凸部之圖型而製備之 轉印輥，將連續形成有凹部與凸部之圖型轉印於塗佈面上 。轉印之同時，利用高壓水銀燈自不具有圖型之側，以 500mJ/cm2之能量照射紫外線，形成連續形成有凹部與凸 部之圖型’獲得構件（b-Ι)。凸部之寬度爲2.5ym，凹 部之寬度爲2.5/zm，凹部之深度爲2.6#m。接著，使用於 井上金屬工業製之INVEX實驗塗佈機中之200網目之小直 徑凹版印刷輥，將Merck股份有限公司製造之紫外線硬化 型液晶材料RMS03-013C塗佈於所形成之凹部中，並通過 乾燥路徑乾燥。再者，RMS03-013C爲由Merck股份有限公 司銷售之包含紫外線硬化型液晶單體及光聚合起始劑、溶 劑等之混合物。 乾燥後，利用高壓水銀燈自不具有圖型之側，以5 00 mJ/cm2之能量照射紫外線硬化，形成塡充部，獲得構件（ c-1 ) 〇 接著，在延伸機爐內溫度130 °C之槽內，以延伸速度 5m/niin，延伸倍率倍，在未固定薄膜（構件（c-i )) 寬度方向下對薄膜（構件（c-1))長度方向進行單軸延 伸’獲得構件（d-1 )。對所得構件（d-1 )之兩面進行抗 -134- 201027140 反射處理’獲得偏光性繞射元件（1)。所得偏光性繞射 元件（1)之正常光透過率於波長6 6 Onm爲98.5%，於波長 785nm爲98.4%，異常光透過率於波長660nm爲1.5%，於波 長785nm爲3.2%。反射率在具有圖型及塡充部之側（圖型 側）之面，於660nm爲0.1%，於波長78 5nm爲0.2%，於基 材（a-Ι )側（基板側）之面，於660nm爲0.2%，於波長 78 5nm爲0.2%。又，測定波前像差之結果，；I rms = l2m λ ❿ ’可知爲平坦面。 [實施例Β2] 一面間歇地輸送製造例Β2獲得之基板（a-2 )，一面 使用具有每邊20cm之轉印面積之鎳製模具，在溫度23(TC 條件下進行壓製，將連續形成有凹部與凸部之圖型轉印於 基板（a-2 )上，獲得構件（b-2 )。凸部之寬度爲2.5 y m ，凹部之寬度爲2.5ym，凹部之深度爲2.6ym。接著，使 Ο 用於井上金屬工業製之INVEX實驗塗佈機之200網目之小 直徑凹版印刷輥，將Merck股份有限公司製造之紫外線硬 化型液晶材料RMS03-013C塗佈於所形成之凹部中，通過 乾燥路徑乾燥。 乾燥後，利用高壓水銀燈自不具有圖型之側，以500 mJ/cm2之能量照射紫外線硬化，形成塡充部，獲得構件（ c-2 )。 接著，在延伸機爐內溫度130°C之槽內，以延伸速度 5m/min，延伸倍率1.1倍，在未固定薄膜（構件（c-2)) -135- 201027140 寬度方向下對薄膜（構件（c-2))長度方向進行單軸延 伸，獲得構件（d-2 )。對所得構件（d-2 )之兩面進行抗 反射處理，獲得偏光性繞射元件（2)。所得偏光性繞射 元件（2)之正常光透過率於波長660nm爲98.2%，於波長 785nm爲98.3%，異常光透過率於波長660nm爲1.7%，於波 長78 5nm爲3.6%。反射率在具有圖型及塡充部之側（圖型 側）之面，於6 6 Onm爲0.2 %，於波長7 8 5 nm爲0.1 %，於基 材（a-2 )側（基板側）之面，於660nm爲0.2%，於波長 7 8 511111爲0.3%。又，測定波前像差之結果，又1：1113 = 10«1入 ，可知爲平坦面。 [實施例B3] 使用於井上金屬工業製之INVEX實驗塗佈機中之200 網目之小直徑凹版印刷輥，將Merck股份有限公司製造之 紫外線硬化型液晶材料RMS03-013C以調製例B1所得之紫 外線硬化型丙烯酸材料塗佈於製造例B3獲得之基板（a-3 )上，且通過乾燥路徑乾燥。接著，使用用以轉印連續形 成有凹部與凸部之圖型而製備之轉印輥，將連續形成有凹 部與凸部之圖型轉印於塗佈面上。轉印之同時，利用高壓 水銀燈自不具有圖型之側，以500mJ/cm2之能量照射紫外 線，形成連續形成有凹部與凸部之圖型，獲得構件（b-3 )。凸部之寬度爲2.5/zm，凹部之寬度爲2.5ym，凹部之 深度爲2.6#m。接著，使用於井上金屬工業製之IN VEX實 驗塗佈機中之200網目之小直徑凹版印刷輥，將調製例B1 -136- 201027140 中獲得之紫外線硬化型丙烯酸材料塗佈於所形成之凹部中 ，塗佈後，利用高壓水銀燈自不具有圖型之側，以 500mJ/cm2之能量照射紫外線硬化，形成塡充部，獲得構 件（c-3)。 接著，在延伸機爐內溫度130 °C之槽內，以延伸速度 5m/min，延伸倍率1.1倍，在未固定薄膜（構件（c-3)) 寬度方向下對薄膜（構件（c-3))長度方向進行單軸延 伸，獲得構件（d-3 )。對所得構件（d-3 )之兩面進行抗 反射處理，獲得偏光性繞射元件（3 )。所得偏光性繞射 元件（3)之正常光透過率於波長6 6 Onm爲99.0%，於波長 785 nm爲98.8%，異常光透過率於波長6 6 Onm爲1.1%，於波 長78 5nm爲3.4%。反射率在具有圖型及塡充部之側（圖型 側）之面，於660nm爲0.3%，於波長785nm爲0.2%，於基 材（a-3 )側（基板側）之面，於660nm爲0.3%，於波長 785nm爲0.4〇/〇。又，測定波前像差之結果，又rms = 9m；l， G 可知爲平坦面。 [表2] 表2 正常光透過率 /% 異常光透過率 /% 反射率/% 圖型側 反射率/% 基材側 波前 像差 660nm 785nm 660nm 785nm 660nm 785nm 660nm 785nm λ rms 實施例B1 98.5 98.4 1.5 3.2 0.1 0.2 0.2 0.2 12m λ 實施例B2 98.2 98.3 1.7 3.6 0.2 0.1 0.2 0.3 10m λ 實施例B3 99.0 98.8 1.1 3.4 0.3 0.2 0.3 0.4 9m λ -137- 201027140 【圖式簡單說明】 圖1爲本發明（樣態A )之第二樣態之偏光性繞射元件 之製造方法中之基材（c)之模式圖。 圖2爲本發明（樣態A)之第二樣態之偏光性繞射兀件 之製造方法中之基材（d)之模式圖。 圖3爲本發明（樣態A )之第三樣態之偏光性繞射元件 之製造方法中之基材（b)之模式圖。 圖4爲本發明（樣態A )之第三樣態之偏光性繞射元件 之製造方法中之基材（c)之模式圖。 圖5爲顯示本發明（樣態A)之第一樣態之偏光性繞射 元件之製造方法之（3)步驟中之一樣態中所用之塗佈包 含化合物（C)之組成物之基材（b)之構造及基材（f) 之剖面之模式圖。 圖6爲以本發明（樣態A )之第一樣態之偏光性繞射元 件的製造方法獲得之偏光性繞射元件之模式圖。 圖7爲顯示本發明（樣態B)中，於前述基板（a)上 直接轉印連續形成有凹部與凸部之圖型而成之構件（b) 之模式圖（a)，及於以透明樹脂（B)形成之塗膜上轉印 連續形成有凹部與凸部之圖型而成之構件（b)之模式圖 (b )。 圖8爲顯示本發明（樣態B)中之構件（c)之模式圖 【主要元件符號說明】 -138- 201027140 圖1至6中 1 :基材（a ) 3 :層（B ) 5:連續形成由含化合物（C)之組成物所構成之凹部 與凸部之圖型 7 :凸部 9 :凹部 _ 1 1 :塡充部 13 :基材（a’） 1 5 :連續形成由含化合物（D )之組成物所構成之凹 部與凸部之圖型 17 :基材（e) 19:由含化合物（C)之組成物所形成之塗佈面 2 1 :源自含化合物（C )之組成物之部分 圖7及8 φ 1 :凹部 3 :凸部 5 :透明樹脂（A ) 7 :由透明樹脂（B )所形成之塗膜 9 :塡充部 1 1 :於（ΙΠ )步驟中之延伸方向 -139-Normal light transmittance /% Abnormal light transmittance /% Reflectance pattern side rate /% Laminated side reflectance /% Substrate side wavefront aberration / m λ 660nm 785nm 660nm 785nm 660nm 785nm 660nm 785nm Arms Example A1 99.2 99.0 1.3 3.2 0.1 0.1 0.2 0.2 10 Example A2 98.9 98.9 1.5 3.1 0.2 0.1 0.2 0.2 9 Example A3 98.7 98.7 1.8 3.8 0.2 0.3 0.3 0.2 9 Example A4 98.5 98.6 1.9 4.2 0.3 0.3 0.4 0.3 9 Example A5 98.2 98.3 1.7 3.6 0.2 0.2 0.3 0.2 10 Example A6 99.1 99.1 1.1 3.0 0.1 0.1 0.2 0.2 12 Example A7 98.5 99.0 1.7 3.2 0.3 0.2 0.2 0.2 9 Example A8 98.3 99.3 1.6 3.4 0.2 0.3 0.3 0.3 9 Example A9 98.7 98.8 1.6 4.0 0.3 0.2 0.2 0.2 10 Example A10 98.7 98.7 1.6 3.8 0.2 0.2 0.3 0.2 9 Example All 98.2 99.1 1.2 3.7 0.2 0.3 0.2 0.3 10 Example A12 98.6 98.7 1.4 4.2 0.3 0.2 0.3 0.2 9 Example A13 98.2 98.7 1.3 4.1 0.2 0.3 0.3 0.3 9 Example A14 98.7 98.9 1.5 3.1 0.3 0.2 0.2 0.2 8 Example A15 98.6 98.9 1.7 4.2 0.2 0.3 0.3 0.2 9 Example A16 98.6 98.8 1.6 3.5 0.2 0.2 0.3 0.3 10 Example A17 98.1 98.6 1.4 3.6 0.2 0.3 0.2 0.2 8 Example A18 98.5 99.0 1.6 3.3 0.2 0.2 0.2 0.2 8 Example A19 98.3 98.7 1.6 3.7 0.2 0.3 0.2 0.3 9 Example A20 98.4 98.8 1.4 3.4 0.3 0.2 0.3 0.2 8 -133- 201027140 [Example Bl] The ultraviolet curable acrylic material obtained in Preparation Example B i was applied to the substrate (a-1) obtained in Production Example B1 using a small-diameter gravure roll of 200 mesh in an invex experimental coater manufactured by Inoue Metal Industry Co., Ltd. . Then, a transfer roller prepared by transferring a pattern in which the concave portion and the convex portion are continuously formed is used, and a pattern in which the concave portion and the convex portion are continuously formed is transferred onto the coated surface. At the same time as the transfer, the high-pressure mercury lamp was used to irradiate the ultraviolet ray at an energy of 500 mJ/cm 2 from the side having no pattern, and a pattern-obtaining member (b-Ι) in which the concave portion and the convex portion were continuously formed was formed. The width of the convex portion was 2.5 μm, the width of the concave portion was 2.5 / zm, and the depth of the concave portion was 2.6 #m. Next, a UV-curable liquid crystal material RMS03-013C manufactured by Merck Co., Ltd. was applied to the formed recess using a 200-mesh small-diameter gravure roll in an INVEX experimental coater manufactured by Inoue Metals Co., Ltd., and Dry through the drying path. Further, RMS03-013C is a mixture of an ultraviolet curable liquid crystal monomer, a photopolymerization initiator, a solvent, and the like, which are sold by Merck Co., Ltd. After drying, a high-pressure mercury lamp is used to irradiate the ultraviolet light with an energy of 500 mJ/cm 2 from the side without a pattern to form a filling portion, and a member (c-1) is obtained, followed by a temperature of 130 ° C in the furnace of the stretching machine. In the groove, the film (member (c-1)) is uniaxially stretched in the direction of the width of the unfixed film (member (ci)) at an extension speed of 5 m/niin and a magnification ratio of the member (d- 1 ). The both sides of the obtained member (d-1) were subjected to anti-134-201027140 reflection treatment to obtain a polarizing diffractive element (1). The normal light transmittance of the obtained polarizing diffractive element (1) was 98.5% at a wavelength of 6 6 Onm, 98.4% at a wavelength of 785 nm, an abnormal light transmittance of 1.5% at a wavelength of 660 nm, and 3.2% at a wavelength of 785 nm. The reflectance is 0.1% at 660 nm on the side of the pattern and the side (pattern side), and is 0.2% at a wavelength of 78 5 nm on the side of the substrate (a-Ι) side (substrate side). It was 0.2% at 660 nm and 0.2% at a wavelength of 78 5 nm. Further, as a result of measuring the wavefront aberration, I rms = l2m λ ❿ ' is a flat surface. [Example Β 2] While the substrate (a-2) obtained in Production Example 2 was intermittently conveyed, a nickel mold having a transfer area of 20 cm per side was used, and pressing was performed at a temperature of 23 (TC conditions, and continuous formation was carried out. The pattern of the concave portion and the convex portion is transferred onto the substrate (a-2) to obtain the member (b-2). The width of the convex portion is 2.5 μm, the width of the concave portion is 2.5 μm, and the depth of the concave portion is 2.6 μm. ΟUsed for the 200-mesh small-diameter gravure roll of the INVEX experimental coater manufactured by Inoue Metal Industry, the UV-curable liquid crystal material RMS03-013C manufactured by Merck Co., Ltd. was applied to the formed recess and dried. The path is dry. After drying, the high-pressure mercury lamp is used to irradiate the ultraviolet light with an energy of 500 mJ/cm 2 from the side without the pattern to form a filling portion, and the member (c-2) is obtained. Next, the temperature in the furnace of the stretching machine is 130. In the groove of °C, the extension speed is 5m/min, the stretching ratio is 1.1 times, and the length direction of the film (member (c-2)) is performed in the width direction of the unfixed film (member (c-2)) -135- 201027140. Uniaxial extension, obtaining component (d-2). The both sides of the member (d-2) were subjected to antireflection treatment to obtain a polarizing diffractive element (2). The normal light transmittance of the obtained polarizing diffractive element (2) was 98.2% at a wavelength of 660 nm and 98.3 at a wavelength of 785 nm. %, the extraordinary light transmittance is 1.7% at a wavelength of 660 nm, and 3.6% at a wavelength of 78 5 nm. The reflectance is 0.2% on the side of the pattern and the side of the filling portion (the pattern side), and is 0.2% at 6 6 Onm. The wavelength of 7 8 5 nm is 0.1%, and the surface of the substrate (a-2) side (substrate side) is 0.2% at 660 nm and 0.3% at a wavelength of 7 8 511111. Further, the results of wavefront aberration are measured. Further, 1:1113 = 10«1, it is known as a flat surface. [Example B3] A small-diameter gravure roll of 200 mesh used in an INVEX experimental coater manufactured by Inoue Metal Industries, manufactured by Merck Co., Ltd. The ultraviolet curable liquid crystal material RMS03-013C was applied onto the substrate (a-3) obtained in Production Example B3 by the ultraviolet curable acrylic material obtained in Preparation Example B1, and dried by a drying path. A transfer roller prepared with a pattern of concave portions and convex portions will be continuously formed with concave portions and convex portions The pattern is transferred onto the coated surface. At the same time as the transfer, the high-pressure mercury lamp is used to irradiate the ultraviolet light with an energy of 500 mJ/cm 2 from the side without the pattern, and a pattern in which the concave portion and the convex portion are continuously formed is formed, and the member is obtained. (b-3) The width of the convex portion is 2.5/zm, the width of the concave portion is 2.5 μm, and the depth of the concave portion is 2.6 #m. Then, it is used in 200 mesh in the IN VEX experimental coater manufactured by Inoue Metal Industry Co., Ltd. The small-diameter gravure printing roller is coated with the ultraviolet curable acrylic material obtained in Preparation Example B1 - 136 - 201027140 in the formed concave portion, and after coating, using a high pressure mercury lamp from the side having no pattern, at 500 mJ/cm 2 The energy is irradiated with ultraviolet rays to form a filling portion, and the member (c-3) is obtained. Next, in the groove of the extension furnace at a temperature of 130 ° C, at an extension speed of 5 m/min, the extension ratio was 1.1 times, and the film (member (c-3) was oriented in the width direction of the unfixed film (member (c-3)). )) uniaxially extending in the longitudinal direction to obtain the member (d-3). Antireflection treatment was performed on both faces of the obtained member (d-3) to obtain a polarizing diffractive element (3). The normal light transmittance of the obtained polarizing diffractive element (3) is 99.0% at a wavelength of 6 6 Onm, 98.8% at a wavelength of 785 nm, an abnormal light transmittance of 1.1% at a wavelength of 6 6 Onm, and 3.4 at a wavelength of 78 5 nm. %. The reflectance is 0.3% at 660 nm and 0.2% at 785 nm on the side of the pattern and the side of the filling (pattern side), on the side of the substrate (a-3) side (substrate side). It is 0.3% at 660 nm and 0.4 〇/〇 at a wavelength of 785 nm. Further, as a result of measuring the wavefront aberration, rms = 9 m; l, G is known as a flat surface. [Table 2] Table 2 Normal light transmittance /% Abnormal light transmittance /% Reflectance /% Pattern side reflectance /% Substrate side wavefront aberration 660 nm 785 nm 660 nm 785 nm 660 nm 785 nm 660 nm 785 nm λ rms Example B1 98.5 98.4 1.5 3.2 0.1 0.2 0.2 0.2 12m λ Example B2 98.2 98.3 1.7 3.6 0.2 0.1 0.2 0.3 10m λ Example B3 99.0 98.8 1.1 3.4 0.3 0.2 0.3 0.4 9m λ -137- 201027140 [Simplified illustration] Fig. 1 A schematic diagram of the substrate (c) in the method of manufacturing the polarizing diffractive element of the second aspect of the aspect (A). Fig. 2 is a schematic view showing a substrate (d) in a method of producing a polarizing diffractive member of the second aspect of the invention (in the aspect A). Fig. 3 is a schematic view showing a substrate (b) in the method for producing a polarizing diffractive element of the third aspect of the invention (the aspect A). Fig. 4 is a schematic view showing a substrate (c) in the method for producing a polarizing diffractive element of the third aspect of the invention (the aspect A). Figure 5 is a view showing the substrate coated with the composition of the compound (C) used in the same manner as in the step (3) of the method for producing a polarizing diffractive element of the first aspect of the invention (the aspect A). (b) Schematic diagram of the structure and the cross section of the substrate (f). Fig. 6 is a schematic view showing a polarizing diffractive element obtained by the method for producing a polarizing diffractive element of the first aspect of the invention (in the form A). Fig. 7 is a schematic view (a) showing a member (b) in which a concave portion and a convex portion are continuously formed on the substrate (a) in the present invention (in the aspect B), and A pattern (b) of a member (b) in which a pattern in which a concave portion and a convex portion are continuously formed is transferred onto a coating film formed of a transparent resin (B). Figure 8 is a schematic view showing a member (c) in the present invention (Section B) [Description of main components] -138- 201027140 1 in Figs. 1 to 6: substrate (a) 3: layer (B) 5: Pattern 7 in which the concave portion and the convex portion composed of the composition containing the compound (C) are continuously formed: the convex portion 9: the concave portion _ 1 1 : the filling portion 13: the base material (a') 1 5 : continuous formation Pattern of concave portion and convex portion composed of the composition of the compound (D) 17 : Substrate (e) 19: Coating surface 2 1 composed of a composition containing the compound (C): derived from a compound (C) Parts of the composition FIGS. 7 and 8 φ 1 : concave portion 3 : convex portion 5 : transparent resin (A ) 7 : coating film 9 formed of transparent resin (B ) : filling portion 1 1 : at (ΙΠ) Extension direction in the step -139-

Claims (1)

201027140 七、申請專利範圍： 1. —種偏光性繞射元件，其特徵爲在由透明樹脂（A )所構成之基材（a)之至少一面上，以下列順序層合有 下列各層而成： 具有分子配向能之層（B)， 連續形成有凹部與凸部之具有源自化合物（C)之構 造單位之層（LC)， 及具有與前述層（LC)之凹部及凸部嵌合之連續凸部 與凹部之由含有化合物（D)之組成物所形成之層（LD) 前述層（LC)具有光學異向性，且前述層（LD)具 有光學同向性。 2. —種偏光性繞射元件，其特徵爲在由透明樹脂（A )所構成之基材（a)之至少一面上以下列順序層合有下 列各層而成： 具有分子配向能之層（B )， 連續形成有凹部與凸部之具有源自化合物（C)之構 造單位之層（LC)， 具有與前述層（LC)之凹部及凸部嵌合之連續凸部與 凹部之由含有化合物（D)之組成物所形成之層（LD) ’ 及由透明樹脂（E)所構成之基材（e)， 前述層（LC)具有光學異向性，且前述層（LD)具 有光學同向性。 3. 如申請專利範圍第1或2項之偏光性繞射元件，其中 -140- 201027140 對前述基材（a)及具有分子配向能之層（B)施以延伸處 理。 4. 如申請專利範圍第1或2項之偏光性繞射元件，其中 對前述具有分子配向能之層（B)施以摩擦處理。 5. 如申請專利範圍第1至4項中任一項之偏光性繞射元 件，其中前述具有分子配向能之層（B)係由包含選自（ 甲基）丙烯酸系化合物、聚醯亞胺、聚乙烯醇及聚胺基甲 φ 酸酯之至少一種之組成物所構成。 6. 如申請專利範圍第1或2項之偏光性繞射元件，其中 前述具有分子配向能之層（B)係由包含具有以下式（I) 表示之構造之聚合物之組成物所構成，且層（B)係藉由 放射線照射而賦予分子配向能者： 【化1】 -R1—CH=CH-21—Ar1 (I ) [式（I)中，R1 表示-C(〇)〇·、-CONH-、-CO-E-、未取代 或具有選自鹵基、氰基及硝基之基之1,4-伸苯基、或妣啶-2,5 -二基、嘧聢-2,5 -二基、2,5-噻吩二基、2，5 -伸呋喃基、 1，4-伸萘基、或2,6-伸萘基， E表示未取代或具有選自鹵基、氰基及硝基之基之 1,4-伸苯基、或吡啶-2,5-二基、嘧啶_2,5-二基、2,5-噻吩 二基、2,5-伸咲喃基、1，4-伸萘基、或2,6-伸萘基， Z1表示單鍵 '未取代或具有選自鹵基、氰基及硝基之 -141 - 201027140 基之1，4 -伸本基、或啦陡-2,5 -—基、嚷:陡-2,5 -二基、 噻吩二基、2,5 -伸呋喃基、反式-1，4-伸環己基、反式 二噁烷-2,5 -二基或1，4 -哌啶基， Ar1表示具有芳香族環之一價基]。 7. 如申請專利範圍第1至6項中任一項之偏光性繞 件’其中前述化合物（C)包含紫外線硬化型液晶。 8. 如申請專利範圍第1至7項中任一項之偏光性繞 件’其中前述化合物（D)包含紫外線硬化型樹脂。 9. 如申請專利範圍第1至7項中任一項之偏光性繞 件’其中前述化合物（D)包含紫外線硬化型（甲基 烯酸樹脂。 10. 如申請專利範圍第1至9項中任一項之偏光性 元件’其中前述透明樹脂（A)包含環狀烯烴系樹脂。 11. 如申請專利範圍第2至10項中任一項之偏光性 元件，其中前述透明樹脂（E )爲與透明樹脂（a )相 樹脂。 12. —種偏光性繞射元件之製造方法，其特徵爲 具有下列步驟之偏光性繞射元件之製造方法： (1) 在由透明樹脂（A)所構成之基材（a)之 一面上形成具有分子配向能之層（B)，獲得基材（b 步驟， (2) 在由透明樹脂（E)所構成之基材（e)之 上，利用轉印而形成連續形成有由含有化合物（D ) 成物所構成之凹部與凸部之圖型，獲得基材（f)之 2,5- -1,3- 射元 射元 射元 )丙 繞射 繞射 同之 其係 至少 )之 一面 之組 步驟 -142- 201027140 (3)透過含有化合物（C)之組成物使前述基材（b )之具有分子配向能之層（B)與基材（f)之具有圖型之 面相對向地層合之步驟，其中 由包含前述化合物（D)之組成物所構成之圖型部份 具有光學同向性，且源自包含前述化合物（C)之組成物 之部分具有光學異向性。 φ 13.如申請專利範圍第12項之偏光性繞射元件之製造 方法，其中前述（3)之步驟係將包含化合物（C)之組成 物塗佈於前述基材（b)之層（B)上，且使該塗佈面與前 述基材（f)之具有圖型之面相對向地層合之步驟。 14.如申請專利範圍第12項之偏光性繞射元件之製造 方法，其中前述（3)之步驟係將包含化合物（C)之組成 物塗佈於前述基材（f)之具有圖型之面上，使該塗佈面 與前述基材（b)之層（B)面相對向地層合之步驟。 〇 1 5 .如申請專利範圍第1 2項之偏光性繞射元件之製造 方法，其中在步驟（1)中，於形成層（B)之際進行延伸 處理。 16.—種偏光性繞射元件之製造方法，其特徵爲其係 具有下列步驟之偏光性繞射元件之製造方法： (I )在由透明樹脂（A )所構成之基材（a )之至少 一面上形成具有分子配向能之層（B)，獲得基材（b)之 步驟， (II )在基材（b )之層（B )上，利用轉印而形成連 -143- 201027140 續形成有由含有化合物（C)之組成物所構成之凹部與凸 部之圖型，獲得基材（C)之步驟，以及 (III)在前述基材（C)之具有圖型之面上塗佈包含 化合物（D)之組成物，使前述凹部至少由化合物（D) 所塡充，獲得具有塡充部之基材（d)，其中 源自前述凸部之部分具有光學異向性，源自前述塡充 部之部分具有光學同向性。 17. 如申請專利範圍第16項之偏光性繞射元件之製造 方法，其中在步驟（I)中，於形成層（B)之際進行延伸 處理。 18. 如申請專利範圍第12項之偏光性繞射元件之製造 方法，其中前述透明樹脂（A)與透明樹脂（E)爲相同樹 脂。 1 9.如申請專利範圍第1 6項之偏光性繞射元件之製造 方法，其具有於前述偏光性繞射元件之具有塡充部之面上 進一步設置由透明性樹脂（E)所構成之基材（e)之步驟 〇 20. 如申請專利範圍第12至19項中任一項之偏光性繞 射元件之製造方法，其中前述基材（a)係由透明樹脂（A )所構成之於長度方向至少3 m以上連續之輥形狀之基材。 21. —種偏光性繞射元件之製造方法，其特徵爲其爲 具有以下步驟之偏光性繞射元件之製造方法： (i )於由透明樹脂（A )所構成之基材（a’）之至少 —面上，利用轉印而形成連續形成有由包含化合物（C) -144 - 201027140 之組成物所構成之凹部與凸部之圖型，而獲得基材（b) 之步驟，及 (H) 將包含化合物（D)之組成物塗佈於前述基材 (b)之具有圖型之面上，使前述凹部至少由化合物（D) 所塡充，獲得具有塡充部之基材（c)之步驟，其中 前述基材（a’）之形成有圖型之面具有分子配向能， 源自前述凸部之部分具有光學異向性，且源自前述塡充部 φ 之部分具有光學同向性。 22. 如申請專利範圍第21項之偏光性繞射元件之製造 方法，其具有在前述偏光性繞射元件之具有塡充部之面上 進一步設置由透明性樹脂（E)所構成之基材（e)之步驟 Q 23. 如申請專利範圍第21或22項之偏光性繞射元件之 製造方法，其中前述基材（a，）係由透明樹脂（a)所構 成之在長度方向至少3 m以上連續之輥形狀之基材。 ® 24.—種偏光性繞射元件之製造方法，其特徵爲其係 包含下列步驟之偏光性繞射元件之製造方法： (I) 利用轉印在基板（a)之至少一面上形成連續形 成有凹部與凸部之圖型，獲得構件（b)之步驟， (II)使前述凹部至少由化合物（C)所塡充，獲得 具有塡充部之構件（C)之步驟，及 (III )使構件（c )延伸，獲得構件（d )之步驟，其 中 偏光性繞射兀件中，源自目丨i述凸部之部分及源自前述 -145- 201027140 塡充部之·部分之一方具有光學同向性，另一方具有光學異 向性。 2 5.如申請專利範圍第24項之偏光性繞射元件之製造 方法，其中連續形成有前述凹部與凸部之圖型係藉由直接 轉印於前述基板（a)之至少一面上而形成。 2 6.如申請專利範圍第24項之偏光性繞射元件之製造 方法，其中連續形成有前述凹部與凸部之圖型係將包含化 合物（B)之組成物塗佈於前述基板（a)上，獲得由該組 成物形成之塗膜後，轉印於該塗膜上所形成。 27·如申請專利範圍第25或26項之偏光性繞射元件之 _@力法，其中前述偏光性繞射元件中，源自前述凸部之 胃有光學同向性，源自前述塡充部之部分具有光學異 向性。 28.如申請專利範圍第26項之偏光性繞射元件之製造 ’其中前述偏光性繞射元件中，源自前述凸部之部分 具異向性，源自前述塡充部之部分具有光學同向性 〇 29·如申請專利範圍第27項之偏光性繞射元件之製造 3¾ ’其中前述化合物（C)爲具有光學異向性之紫外線 硬化型液晶單體。 3 0.如申請專利範圍第27項之偏光性繞射元件之製造 # &amp; ’其中前述化合物（B)爲紫外線硬化型（甲基）丙 烯酸單體。 31·如申請專利範圍第28項之偏光性繞射元件之製造 -146- 201027140 方法’其中即述化合物（B)爲具有光學異向性之紫外線 硬化型液晶單體。 32.如申請專利範圍第28項之偏光性繞射元件之製造 方法’其中述化合物（c )爲紫外線硬化型（甲基）丙 烯酸單體。 33·如申請專利範圍第24至3 2項中任一項之偏光性繞 射元件之製造方法，其中前述基板（a)係由熱可塑性樹 _ 脂所構成。 3 4.如申請專利範圍第24至33項中任一項之偏光性繞 射元件之製造方法，其中前述基板（a)係由環狀烯烴系 樹脂所構成。 3 5 · —種偏光性繞射元件，其特徵爲以申請專利範圍 第2 4~34項中任一項之偏光性繞射元件之製造方法所製造 〇 -147-201027140 VII. Patent application scope: 1. A polarizing diffractive element characterized in that on at least one side of a substrate (a) composed of a transparent resin (A), the following layers are laminated in the following order: : a layer (B) having a molecular alignment energy, a layer (LC) having a structural unit derived from the compound (C) in which a concave portion and a convex portion are continuously formed, and having a concave portion and a convex portion with the layer (LC) The layer (LD) of the continuous convex portion and the concave portion formed of the composition containing the compound (D) has the optical anisotropy, and the layer (LD) has optical anisotropy. 2. A polarizing diffractive element characterized in that the following layers are laminated on at least one side of a substrate (a) composed of a transparent resin (A) in the following order: a layer having molecular alignment energy ( B), a layer (LC) having a structural unit derived from the compound (C) in which a concave portion and a convex portion are continuously formed, and a continuous convex portion and a concave portion which are fitted to the concave portion and the convex portion of the layer (LC) are contained a layer (LD) formed by the composition of the compound (D) and a substrate (e) composed of a transparent resin (E), the layer (LC) having optical anisotropy, and the layer (LD) having optical properties Isotropic. 3. The polarizing diffractive element according to claim 1 or 2, wherein -140-201027140 applies an extension treatment to the aforementioned substrate (a) and the layer (B) having molecular alignment energy. 4. The polarizing diffractive element according to claim 1 or 2, wherein the layer (B) having the molecular alignment energy is subjected to a rubbing treatment. 5. The polarizing diffractive element according to any one of claims 1 to 4, wherein the layer (B) having the molecular aligning energy is selected from the group consisting of (meth)acrylic compounds, polyimine And a composition of at least one of polyvinyl alcohol and polyaminomethacrylate. 6. The polarizing diffractive element according to claim 1 or 2, wherein the layer (B) having the molecular alignment energy is composed of a composition comprising a polymer having a structure represented by the following formula (I), And layer (B) is given to the molecular aligning energy by radiation irradiation: [Chemical Formula 1] -R1 - CH=CH-21 - Ar1 (I ) [In the formula (I), R1 represents -C(〇)〇· , -CONH-, -CO-E-, unsubstituted or having a 1,4-phenylene group selected from the group consisting of a halogen group, a cyano group and a nitro group, or an acridine-2,5-diyl group, pyrimidine- 2,5-diyl, 2,5-thiophenediyl, 2,5-extended furanyl, 1,4-naphthyl, or 2,6-anthranyl, E represents unsubstituted or has a halogen group 1,4-phenylene group of cyano group and nitro group, or pyridine-2,5-diyl, pyrimidine-2,5-diyl, 2,5-thiophenediyl, 2,5-extension Oryl, 1,4-naphthyl, or 2,6-anthranyl, Z1 represents a single bond 'unsubstituted or has a group selected from the group consisting of halo, cyano and nitro - 141 - 201027140 1,4-, Stretching the base, or the steep-2,5--yl, fluorene: steep-2,5-diyl, thiophenediyl, 2,5-extended furyl, trans-1,4-cyclohexyl, anti Dioxane-2, 5-diyl or 1,4-piperidinyl, Ar1 represents a valence group having an aromatic ring]. 7. The polarizing wrapper of any one of claims 1 to 6, wherein the aforementioned compound (C) comprises an ultraviolet curable liquid crystal. 8. The polarizing wound member according to any one of claims 1 to 7, wherein the aforementioned compound (D) comprises an ultraviolet curable resin. 9. The polarizing winding of any one of claims 1 to 7 wherein the aforementioned compound (D) comprises an ultraviolet curing type (methacrylic acid resin). 10. In the scope of claims 1 to 9 The polarizing element of any one of the above-mentioned transparent resin (A) is a polarizing element according to any one of claims 2 to 10, wherein the transparent resin (E) is A resin which is phase-transparent with a transparent resin (a) 12. A method for producing a polarizing diffractive element, which is characterized by the method for producing a polarizing diffractive element having the following steps: (1) consisting of a transparent resin (A) A layer (B) having molecular aligning energy is formed on one surface of the substrate (a) to obtain a substrate (step b, (2) on the substrate (e) composed of the transparent resin (E), using a transfer Printing forms a pattern in which a concave portion and a convex portion composed of the compound (D) are continuously formed, and a 2,5-1,3-element element of the substrate (f) is obtained. Steps of shooting a diffraction plane with at least one of its faces - 142 - 201027140 (3) a composition of (C), wherein the layer (B) having the molecular alignment energy of the substrate (b) is laminated to the patterned surface of the substrate (f), wherein the compound (D) is contained The pattern portion composed of the composition has optical anisotropy, and the portion derived from the composition containing the aforementioned compound (C) has optical anisotropy. Φ 13. The method for producing a polarizing diffractive element according to claim 12, wherein the step (3) is a step of applying a composition comprising the compound (C) to the layer of the substrate (b) (B) And the step of laminating the coated surface with the patterned surface of the substrate (f). 14. The method for producing a polarizing diffractive element according to claim 12, wherein the step (3) is a method of applying a composition comprising the compound (C) to the substrate (f). The surface is a step of laminating the coated surface with the layer (B) of the substrate (b). The manufacturing method of the polarizing diffractive element of claim 12, wherein in the step (1), the stretching treatment is performed while forming the layer (B). 16. A method of producing a polarizing diffractive element, characterized by the method for producing a polarizing diffractive element having the following steps: (I) a substrate (a) composed of a transparent resin (A) a layer (B) having a molecular alignment energy formed on at least one side to obtain a substrate (b), and (II) a layer (B) on a substrate (b) by transfer to form a continuous -143-201027140 continued Forming a pattern of concave portions and convex portions composed of a composition containing the compound (C), obtaining a substrate (C), and (III) coating the surface of the substrate (C) having a pattern The cloth comprises a composition of the compound (D) such that the concave portion is at least filled with the compound (D) to obtain a substrate (d) having a filling portion, wherein a portion derived from the convex portion has an optical anisotropy, the source The portion from the aforementioned portion has optical anisotropy. 17. The method of producing a polarizing diffractive element according to claim 16, wherein in the step (I), the stretching treatment is performed while forming the layer (B). 18. The method of producing a polarizing diffractive element according to claim 12, wherein the transparent resin (A) and the transparent resin (E) are the same resin. 1. The method for producing a polarizing diffractive element according to claim 16 which further comprises a transparent resin (E) on a surface of the polarizing diffractive element having a filling portion. The method for producing a polarizing diffractive element according to any one of claims 12 to 19, wherein the substrate (a) is composed of a transparent resin (A). A substrate having a continuous roll shape of at least 3 m in the longitudinal direction. A method of producing a polarizing diffractive element, characterized by the method for producing a polarizing diffractive element having the following steps: (i) a substrate (a') composed of a transparent resin (A) a step of obtaining a pattern of a concave portion and a convex portion formed of a composition containing the compound (C) -144 - 201027140 by at least a surface to obtain a substrate (b), and H) The composition containing the compound (D) is applied onto the surface of the substrate (b) having a pattern, and the concave portion is filled with at least the compound (D) to obtain a substrate having a filling portion ( a step of c), wherein a surface on which the pattern of the substrate (a') is formed has a molecular alignment energy, a portion derived from the convex portion has an optical anisotropy, and a portion derived from the aforementioned portion Φ has an optical Isotropic. 22. The method for producing a polarizing diffractive element according to claim 21, further comprising: a substrate made of a transparent resin (E) on a surface of the polarizing diffractive element having a filling portion The method of manufacturing the polarizing diffractive element of claim 21 or 22, wherein the substrate (a,) is composed of a transparent resin (a) and is at least 3 in the longitudinal direction. A substrate having a continuous roll shape of m or more. ® 24. A method of producing a polarizing diffractive element, characterized in that it comprises a method of manufacturing a polarizing diffractive element comprising the following steps: (I) forming a continuous formation on at least one side of the substrate (a) by transfer a pattern having a concave portion and a convex portion, a step of obtaining the member (b), (II) a step of filling the concave portion with at least the compound (C), obtaining a member (C) having a filling portion, and (III) a step of extending the member (c) to obtain the member (d), wherein the polarizing diffractive element is derived from a portion of the convex portion and one of the portions derived from the aforementioned -145-201027140 It has optical anisotropy and the other has optical anisotropy. 2. The method of manufacturing a polarizing diffractive element according to claim 24, wherein the pattern in which the concave portion and the convex portion are continuously formed is formed by directly transferring onto at least one side of the substrate (a). . [2] The method for producing a polarizing diffractive element according to claim 24, wherein the pattern in which the concave portion and the convex portion are continuously formed is a method in which a composition containing the compound (B) is applied to the substrate (a) Then, a coating film formed of the composition is obtained, and then formed on the coating film. 27. The method of claim 5, wherein the polarizing diffractive element of the polarizing diffractive element has optical anisotropy from the stomach of the convex portion, derived from the aforementioned charging Part of the part has optical anisotropy. 28. The manufacture of a polarizing diffractive element according to claim 26, wherein in the polarizing diffractive element, the portion derived from the convex portion is anisotropic, and the portion derived from the aforementioned filling portion has an optical The invention is the production of a polarizing diffractive element of claim 27, wherein the aforementioned compound (C) is an ultraviolet curable liquid crystal monomer having optical anisotropy. 30. Manufacture of a polarizing diffractive element as in claim 27 of the patent application # &amp; ' wherein the aforementioned compound (B) is an ultraviolet curable (meth)acrylic acid monomer. 31. Manufacture of a polarizing diffractive element as claimed in claim 28 - 146 - 201027140 Method wherein the compound (B) is an ultraviolet curable liquid crystal monomer having optical anisotropy. A method of producing a polarizing diffractive element according to claim 28, wherein the compound (c) is an ultraviolet curable (meth)acrylic acid monomer. The method of producing a polarizing diffraction element according to any one of claims 24 to 3, wherein the substrate (a) is composed of a thermoplastic resin. The method for producing a polarizing diffraction element according to any one of claims 24 to 33, wherein the substrate (a) is composed of a cyclic olefin resin. A polarizing diffractive element, which is manufactured by the method for producing a polarizing diffractive element according to any one of claims 24 to 34, 〇 -147-
TW098141517A 2008-12-05 2009-12-04 Polarization diffraction element and method for manufacturing the same TW201027140A (en)

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TWI595276B (en) * 2015-04-29 2017-08-11 三星Ｓｄｉ股份有限公司 Optical film for improving contrast ratio, polarizing plate comprising the same, and liquid crystal display apparatus comprising the same

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CN103926643A (en) * 2014-04-28 2014-07-16 东莞市鑫聚光电科技有限公司 a polarizer

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JP3849138B2 (en) * 2002-02-18 2006-11-22 Ｊｓｒ株式会社 Liquid crystal aligning agent, method for forming liquid crystal aligning film, and liquid crystal display element
JP4561080B2 (en) * 2003-11-07 2010-10-13 旭硝子株式会社 Diffraction element and optical head device
CN100492505C (en) * 2004-02-03 2009-05-27 旭硝子株式会社 Liquid crystal lens element and optical head device

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI595276B (en) * 2015-04-29 2017-08-11 三星Ｓｄｉ股份有限公司 Optical film for improving contrast ratio, polarizing plate comprising the same, and liquid crystal display apparatus comprising the same

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