TW201102757A - Position adjustment apparatus and exposure machine containing same - Google Patents

Position adjustment apparatus and exposure machine containing same Download PDF

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Publication number
TW201102757A
TW201102757A TW98122224A TW98122224A TW201102757A TW 201102757 A TW201102757 A TW 201102757A TW 98122224 A TW98122224 A TW 98122224A TW 98122224 A TW98122224 A TW 98122224A TW 201102757 A TW201102757 A TW 201102757A
Authority
TW
Taiwan
Prior art keywords
plate
adjusting
adjustment
screw
disposed
Prior art date
Application number
TW98122224A
Other languages
English (en)
Chinese (zh)
Other versions
TWI401540B (fr
Inventor
zhi-ming Deng
Rong-Ting Wei
Original Assignee
Els System Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Els System Technology Co Ltd filed Critical Els System Technology Co Ltd
Priority to TW98122224A priority Critical patent/TW201102757A/zh
Publication of TW201102757A publication Critical patent/TW201102757A/zh
Application granted granted Critical
Publication of TWI401540B publication Critical patent/TWI401540B/zh

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW98122224A 2009-07-01 2009-07-01 Position adjustment apparatus and exposure machine containing same TW201102757A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW98122224A TW201102757A (en) 2009-07-01 2009-07-01 Position adjustment apparatus and exposure machine containing same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW98122224A TW201102757A (en) 2009-07-01 2009-07-01 Position adjustment apparatus and exposure machine containing same

Publications (2)

Publication Number Publication Date
TW201102757A true TW201102757A (en) 2011-01-16
TWI401540B TWI401540B (fr) 2013-07-11

Family

ID=44837577

Family Applications (1)

Application Number Title Priority Date Filing Date
TW98122224A TW201102757A (en) 2009-07-01 2009-07-01 Position adjustment apparatus and exposure machine containing same

Country Status (1)

Country Link
TW (1) TW201102757A (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109108940A (zh) * 2018-08-15 2019-01-01 苏州富强科技有限公司 自动对心调整旋转机构

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5464715A (en) * 1993-04-02 1995-11-07 Nikon Corporation Method of driving mask stage and method of mask alignment
JP3672715B2 (ja) * 1997-11-26 2005-07-20 Ｈｏｙａ株式会社 マスクホルダー付き転写マスク及び転写マスク用ホルダー
US6281655B1 (en) * 1999-12-23 2001-08-28 Nikon Corporation High performance stage assembly
JP4620365B2 (ja) * 2003-02-20 2011-01-26 アプライド マテリアルズ インコーポレイテッド 支持ステージに対して基板を位置決めするアライメント装置および基板較正システム
JP4362862B2 (ja) * 2003-04-01 2009-11-11 株式会社ニコン ステージ装置及び露光装置
EP1531363A1 (fr) * 2003-10-27 2005-05-18 ASML Netherlands B.V. Dispositif de maintien d'un réticule

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109108940A (zh) * 2018-08-15 2019-01-01 苏州富强科技有限公司 自动对心调整旋转机构

Also Published As

Publication number Publication date
TWI401540B (fr) 2013-07-11

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