201130573 五、 本案若有化學式時，請揭示最能顯示發 徵的化學式： 賞乃狩 六、 發明說明： 【發明所屬之技術領域】 本發明是關於供給塗佈液至塗佈塗佈液至基板 (substrate)上的塗佈裝置（coating machjne)之塗佈液供 給裝置、塗佈液供給方法及緩衝槽（buffer tank)，特別是 關於可不浪費地使用塗佈液的殘液，並且可抑制於在塗佈 液中混入氣泡的狀態下供給之塗佈液供給裝置、塗佈液供 給方法及緩衝槽。 【先前技術】 在液晶顯示器（liquid crystal display)或電漿顯示 器（plasma display)等的平面面板顯示器（flat卩⑽“ display)使用有在玻璃基板（giass substrate)上塗佈有 光阻（resist)液者（稱為塗佈基板）。該塗佈基板是藉由均 勻地塗佈光阻液或藥液等的塗佈液之基板處理裝置形成。 該基板處理裝置如圖11所示包含：塗佈液的供給源之塗佈 液供給裝置100;塗佈塗佈液至基板上之塗佈裝置1〇5，由 塗佈液供給裝置100送液的塗佈液被供給至塗佈裝置1〇5 的泵（pump) 10 5a ’藉由透過使該泵105a動作，使塗佈液由 塗佈裝置105的喷嘴（n〇zzle)105b吐出到基板，在基板上 201130573 形成有均勻的塗佈膜。 .一般，塗佈液供給裝置1〇〇具有：儲存塗佈液之塗佈液 槽101，與一時地儲存塗佈液之緩衝槽1〇2，藉由使來自塗 佈液槽1 0 1的塗佈液一時地停滞於緩衝槽1 〇 2，可防止在 塗佈液中混入氣泡W。具體上，塗佈液槽1 〇丨配設有在容 器内具有伸縮性的袋狀的管子（tube)l〇la，在管子i〇ia 内儲存有塗佈液。然後，藉由將容器内加壓，使管子1 〇 1 & 收縮並使管子l〇la内的塗佈液送液至緩衝槽1〇2，並且藉 由由緩衝槽102送液至塗佈裝置丨05的泵’使塗佈液由塗 佈液供給裝置1 0 〇供給至塗佈裝置丨〇 5。此處，假定在塗 佈液内混入氣泡w的情形，藉由在一時地被儲存於緩衝槽 1 02的時候透過浮力使氣泡w上升並除去氣泡w，使氣泡评 被除去的塗佈液供給至配設於緩衝槽1〇2的底面的液排出 部（例如參照下述專利文獻丨）。 如此，管子101a内的塗佈液被供給至塗佈裝置1〇5， 惟如圖12所示’若在管子i〇ia内的塗佈液的殘量變少的 狀態下使管子1 〇 1 a收縮’則管子1 〇丨a内的空氣會混入塗 佈液’大量的氣泡w包含在塗佈液而被供給。在該狀態下 僅一時地停滯於緩衝槽1 02仍無法充分地進行氣泡w的除 去’因由緩衝槽1 02供給混入氣泡w的塗佈液，故成為塗 佈膜的品質不良的原因。因此，若配設檢測氣泡w的感測 - 器（sens〇r)103’在由管子l〇la送液的塗佈液内氣泡⑻即 • 使只有一點點也被檢測出的話’則判斷為管子1 〇丨a内的塗 佈液空了’藉由與新的塗佈液槽1〇1更換，避免氣泡w的 201130573 •犯入/¾時塗佈液繼續被供給至塗佈裝置1 〇 5。 • [專利文獻1]日本國特開平5-304087號公報 【發明内容】 但是’在上述的塗佈液供給裝1 1〇〇中有光阻液等的 塗佈液被浪費廢棄之問題。亦即，為了防止氣泡w的混入， 透過在所送液的塗佈液内-檢測出氣泡"尤被判斷為塗佈 液槽1G1為空並更換塗佈液槽⑻，使得於在管子101a内 殘留某種程度的塗佈液的狀態下更換塗佈液槽ι〇ι。該殘 ㈣塗佈液儘管昂貴’但仍在槽更換時被廢棄，故有成為 化費運轉成本（running cost)的因素之問題。 本發明疋鑒於上述的問題點所進行的創作，其目的為 提供-種塗佈液供給裝置、塗佈液供給方法及緩衝槽，可 避免塗佈液被浪費廢棄’同時進而可抑制氣泡w混入供給 的塗佈液。 為了解決上述課題，本發明的塗佈液供給裝置，包含 儲存塗佈液之塗佈液槽，與一時地儲存塗佈液之緩衝槽，· 藉由將前述塗佈液槽加壓，將塗佈液送液至緩衝槽，^且 由緩衝槽將塗佈液送液’供給塗佈液槽的塗佈液，其特徵 為：包含檢測前述塗佈液槽内的塗佈液的殘量之殘量檢測 手奴，在一藉由該殘量檢測手段檢測出前述塗佈液槽内的 .塗佈液的殘量只有一點點，就進行停止由前述緩衝槽將塗 .佈液送液的送液停止動作後，在使來自緩衝槽的送液停止 的狀態下’進行使前述塗佈液槽内的殘留塗佈液送液至緩 5 201130573 衝槽的殘液送液動作，然後進行塗佈液槽的更換之槽更換 動作被進行。 依照上述塗佈液供給裝置，一檢測出塗佈液槽的殘量 只有一點點，就藉由送液停止動作停止來自緩衝槽的送 液。然後，因在使該送液停止的狀態下，藉由殘液送液動 作將殘留於塗佈液槽的塗佈液送液至緩衝槽，故即使是在 殘留的塗佈液内混入大量的氣泡的情形，也能防止氣泡由 緩衝槽流到下游側。然後，藉由在殘液送液動作之後進行 槽更換動作，在槽更換動作所需的時間内，透過被送液至 緩衝槽的殘留塗佈液内的氣泡受到浮力而上升，使塗佈液 與氣泡分離。亦即，可將塗佈液槽内的塗佈液使用到最後， 並且也能充分地除去塗佈液内的氣泡。因此，可避免塗佈 液被浪費廢棄，同時可抑制氣泡混入供給的塗佈液。 而且可當作如下的構成：配設有複數個具有塗佈液槽 :緩衝槽的塗佈液供給單元，該等塗佈液供給單元的緩衝 =擇-地連通連結於共通的供料徑，在被連通連結於 刖述供給路徑的第—塗佈湳 佈液供給早7^的緩衝槽中的送液停 止動作破進行後，就與前述 贤，峪仫的連接，進行由第一 塗佈液供給單元切換成第 备从 孟怖成供給早元’由前述第二 塗佈液供給單元將塗佈液送液。 依照該構成，藉由在第 ,μ ^ ^ ^ Π狀W給早7C中的送液停 動作被進行後，！t與前述 塗佈液供給單元切換成第二塗佈=，，進行由第- 由第二塗佈液供給單元逆液田…。單70，使塗佈液被 单…。因此’藉由第一塗佈液供給 6 201130573 單元在 泡的殘 塗佈液 供給單 而 進行後 佈液減 殘液送 依 槽的塗 容量。 而 供給的 將供給 液的塗 具有由 管部的 在緩衝槽内分離氣泡與 給停止而由第二塗佈液 I前述送液停止動作被 進行使前述緩衝槽的塗 少量被設定為藉由前述 送液的量。 送液動作使供給至緩衝 緩衝槽設有收容殘液的 到必要以上。 :前述緩衝槽包含：收容 容器部的底面部，並且 出部；將由塗佈液槽送 供給部，前述液供給部 部的内部之管部，在該 达液停止動作之後進行殘液 留塗佈液送液至緩衝槽内並 的時候’可不使塗佈液的供 元供給塗佈液。 且，也可以作成如下的構成： ，殘液送液動作被進行前， 、的塗佈液減量動作，其減 液動作將塗佈液槽内的殘液 照該構成，因預先藉由殘液 佈液量減量，故無須另外在 因此，可抑制緩衝槽大型化 且，也可以作成如下的構成 塗佈液之谷器部；配設於該 的塗佈液排出並送液之液排 佈液供給至前述容器部之液 容器部的底面部延伸至容器 頂端具有吐出塗佈液之吐出 依照該構成，因將由塗佈液槽送液的塗佈液供給至容 器部之液供給部配設於由容器部的底面部延伸的管部頂= 部分，另一方面，排出容器部内的塗佈液的液排出部配气 於底面部，故液供給部與液排出部存在於互相分離的位 置。因此’即使是殘留塗佈液被由液供給部供給的情形， 也能抑制殘留塗佈液内的氣泡立即被由液排出部排 並流 到緩衝槽的下游側。 201130573 方法而:含.V存解塗:上述課題，，本發明的塗佈液供給 Γ:衝槽1:佈液之塗佈液槽，與-時地儲存塗佈液 <歧衝槽，經由緩衝樺眩 ^ s -塗佈液槽的塗佈液供给至胳冷故 液塗佈於基板上的塗佈穿w甘4… 供、。至將塗佈 达 、置，/、特徵為：包含檢測前述塗佈 Θ 殘里檢測手段，包含：一藉由兮路 =測手段檢測出前述塗佈液槽内的塗佈液的殘量只二 Γ在述緩衝槽將塗佈液送液停止之送液停止程 广吏來自緩衝槽的送液停止的狀態下，使塗佈 的殘留塗佈液送液至緩衝槽之殘液送液料；進行 槽的更換之槽更換程序。 依照上述塗佈液供給方法’因一檢測出塗佈液槽的殘 量只剩-點點’就藉由送液停止程序使來自緩衝槽的送液 停止。然後，在使該送液停止的狀態下，藉由殘液送液程 序使殘留於塗佈液槽的塗佈液送液至緩衝槽，故即使是 殘留的塗佈液内混入大量的氣泡的情形，也能藉由停=2 自緩衝槽的送液，防止氣泡由緩衝槽流到下游侧。然後， 藉由在殘液送液程序之後進行槽更換程序，在槽更換料 所需的時間内’透過被送液至緩衝槽的殘留塗佈液内的氣 泡受到浮力而上升，使塗佈液與氣泡分離。亦即，可將塗 佈液槽内的塗佈液使用到最後，並且也能充分地除去塗佈 液内的氣泡。因此，町避免塗佈液被浪費廢棄，同時可抑 制氣泡混入供給的塗佈液。 而且，為了解決上述課題’依照本發明的緩衝槽，包 含：收容供給的塗佈液之容器部；配設於該容器部的底面 8 201130573 > 部，並且將供給的塗佈液排出並送液之液排出部；將由塗 佈液槽送液的塗佈液供給至前述容器部之液供給部，其特 徵為：前述液供給部具有由容器部的底面部延伸至容器部 的内部之管部，在該管部的頂端具有吐出塗佈液之吐出π。 依照該構成，因將由塗佈液槽送液的塗佈液供給至容 器部之液供給部配設於由容器部的底面部延伸的管部了頁端 部分’另一方面，排出容器部内的塗佈液的液排出部配設 於底面部，故液供給部與液排出部存在於互相分離的位 置°因此’即使是殘留塗佈液被由液供給部供給的情形， 也能抑制殘留塗佈液内的氣泡立即被由液排出部排出並# 到緩衝槽的下游側。據此，即使是氣泡大量混入的塗佈液 槽的殘留塗佈液被供給至緩衝槽的情形’也能抑制氣泡流 到下游側，故可避免塗佈液被浪費廢棄。 【發明的功效】 依照本發明的塗佈液供給裝置、塗佈液供給方法及緩 衝槽，可避免塗佈液被浪費廢棄，同時進而可抑制氡泡混 入供給的塗佈液。 【實施方式】 使用圖面說明與本發明的塗佈液供給裝置、塗佈液供 ‘ 給方法及緩衝槽有關的實施的形態。 、 - 圖1是顯示本發明的一實施形態中的塗佈液供給裝置 之概略圖’圖2是顯示緩衝槽之圖。 201130573 如圖1、圖2所+，泠#、 單元务 、、佈液供給裝置包含：塗佈液供給 早兀10(第一塗佈液供仏 _ 供、，，。早7L);塗佈液供給單元 塗佈液供給單元），由兮冷从 第— 算的Μ Μ 供給單元10、20將光阻液 專的塗佈液供給至槽或塗你 s W佈裝置的泵。在本實施形態中的 圖1中，顯不由塗你饬徂认„ _ , 地、 佈液仏、，‘σ早凡1 0、20經由預備槽2將塗 佈液供給至塗佈裝晉0 的泵3a的例子。本實施形態中的塗 佈液供給裝置是顯千 疋，.、、員不具備兩個塗佈液供給單元i 〇、2〇的例 子如塗佈液供給單& 1〇(或塗佈液供給單元2〇) 的塗佈液供給一結束’就由他方的塗佈液供給單元20(或 塗佈液供給單元1 供仏泠优，& , 一 平几ιυ)供給塗佈液般，由任一方的塗佈液供 給單元ι〇(或塗佈液供給單元20)供給塗佈液。 '、 此外在本實施形態中雖然塗佈液被由塗佈液供心單 元1。、2〇送液至預備槽2、塗佈裝置3,惟直接送液2 佈裝置3也可以，任一個構成都特別稱被送液的側為下游 侧。 塗佈液供給單元1〇包含：儲存塗佈液的塗佈液槽 一時地儲存塗佈液的緩衝槽12，在塗佈液槽1 1的塗佈液 於緩衝槽12 —時地被儲存後，被供給至預備槽2。具體上， 塗佈液槽11與緩衝槽12藉由配管Dla連通連接，透過該 配管Dl a使塗佈液槽丨丨的塗佈液供給至緩衝槽i 2。亦即， 藉由使配設於配管Dla的閥（valve)vla成開狀態，由塗佈 液槽11將塗佈液送液，使塗佈液供給至緩衝槽12。 塗佈液槽11是儲存大量的塗佈液，儲存有藉由塗佈裝 置塗佈的基板複數片份的塗佈液。該塗佈液槽具有塗 201130573 '佈液槽本體Ua;用以將氣體導入塗佈液槽本體lla内的 氣體導入部11 b ;排出塗佈液之塗佈液排出部1 1 c。 塗佈液槽本體lla是儲存塗佈液的容器。該塗佈液槽 本體11a是可更換而構成’在沒有塗佈液的情形下可更換 填充有塗佈液的塗佈液槽本體lla本身。在該塗佈液槽本 體11 a的上方部分配設有氣體導入部丨丨b，該氣體導入部 lib與未圖示的空氣壓縮機（air compressor)是藉由配管 D2a連結。而且’在該配管D2a配設有閥V2a，藉由使該閥 V 2 a進行開閉動作可將空氣供給至塗佈液槽本體丨丨心該閥 V2a使用氣動式閥（air operated valve)，可藉由後述的 控制裝置控制開閉動作。而且，藉由控制該閥V 2 a的開閉 動作將空氣供給至塗佈液槽本體11a並加壓，可將塗佈液 槽本體11a的塗佈液送液至緩衝槽12。亦即，藉由一使閥 V2a成開狀態並將空氣供給至塗佈液槽本體iia，塗佈液槽 本體11a的壓力就上升’使塗佈液槽本體lla的塗佈液受 到壓力’塗佈液透過塗佈液排出部11 c排出到配管d 1 a， 被送液至緩衝槽12。 而且’塗佈液排出部11 c為管狀的管狀構件由塗佈液 槽本體11 a的上方延伸至下方而被配設，該管狀構件與配 管D1 a被連結。然後’該管狀構件被延伸配設至塗佈液槽 本體11a的底面部分’據此’即使是塗佈液槽本體iia的 ’ 塗佈液的殘里少的情形（在底面部附近有液面的情形），也 . 能透過配管Dla將塗佈液送液至緩衝槽12。 此外，在配管D1 a安裝有檢測氣泡的氣泡檢測感測器 201130573 F1 a。該氣泡檢測感測岑p ' ㈣的綠旦,=% Fla是檢測塗佈液槽本體1U的塗 佈液的殘量少的裝置。告 你泷认淼县,1 田塗佈液槽本體11a内的塗 ur τ ^ ^ ^ 佈液槽本體Ha内的空氣也與塗 佈液同時一起被取入， ^ .... 混入軋泡的狀態下塗佈液被送 液。因此’透過即使是塗 ,,,..., 堂佈液僅混入-點點的氣泡w的狀 L也被;^測出，可防止旦# 里的氣泡w被供給至緩衝槽1 2。 此外，在圖1所+ & ,, #嫿杜龜- 斤不的例子中雖然塗佈液槽本體11a以 由提.籌件内具有管狀的袋構件之構成，藉 的壓力，使袋構件内的塗佈液供給至緩衝 槽1 2者也可以。 而且，緩衝揭 10 «12疋一時地儲存由塗佈液槽n送液的 塗佈液，除去塗佑、^ 液内的氣泡。緩衝槽12如圖2所示具有： 儲存塗佈液之容器 + 4 41;將由塗佈液槽u送液的塗佈液 供給至容器部41 之液供給部42 ;將塗佈液排出到下游測 之液排出部4 3 ; μ山+ 排出谷器部41内的氣體之排氣部44。 容器部41兔π ^ i 句ΊΓ儲存塗佈液的圓筒形狀的箱構件。該容 器部41可分宝_丨#匕， 战上側容器部41 a與下側容器部41 b，在上 側容器部 41a μ n 的凸緣部（flange part)與下側容器部41b 的凸緣部中介脔4+ μ , 在封構件的狀態下被連結固定。據此，可密 封容器部41内的办& ^的塗佈液。而且，容器部41在上側容器部 41 a與下Ί則交哭 ' @ 4 4 1 b被連結固定的狀態下，成為容器部 41的頂面部^ 41 c與底面部41 d對面的狀態，在底面部41 d 12 1 位於錯直方向下彳日丨 側的狀態下被使用。因此，一由塗佈液槽 1 J >ti£ jj_ 、 师液’塗佈液就由容器部4 1的底面部4 1 d依次 實施 41的 Dla i 管部 45a， 佈液 可維 液的 供給 而供 在供 地被 檢測 Cla 比管 液面 防止 且， 比管 如下 量的 此處 201130573 被填滿。 而且，液供給部42將塗佈液供給至容器部 形態中具有由容器部41的底面部41d延伸 内部之管部45。具體上，在底面部41d形成 I結的供給孔，在該供給孔安裝有管部45。 45的頂端部分形成有開口於容器部41 ^ 若由塗佈液槽11透過配管Dla將塗佈液送 被由吐出口 45a供給至容器部41。具體上，^ 持直立於鉛直方向的姿勢而被固定，透過配 塗佈液由吐出口 45a湧出並順著管部45的側 至容器部41。亦即，藉由順著管部45的側 給，與由吐出口 45a強勁地噴出而供給的情 給時產生氣泡被抑制，由容器部41的底面部 填滿。 在容器部4 1配設有液面感測器c丄& 供給至谷器部41的塗佈液的容量。亦即，液 是檢測塗佈液的液量的上限，在本實施形態 部45的吐出口 45a還上方。然後，塗佈液的 感測器Cla的高度一致，液面感測器na就 容器部41内的塗佈液被供給至該液面的高g 液面感測器C2a是控制塗佈液的液量的下限 部45的吐出口 45a還下方。在本實施形態中 •與液面感測器C1 a所反應的上限值比較，只 量液面感測器C2a就反應的位置。具體上， 4 1，在本 至容器部 有與配管 而且，在 的吐出口 液，則塗： $管部4 5 管Dla送 面部45b 面部45b 形比較， 4 1 d穩靜 C2a，可 面感測器 中配設於 液面一與 反應’可 [以上。而 ，配設於 ，配設於 要少規定 被設定為 201130573 與塗佈液槽1 F 1 a就反應時I 而且，排 施形態中配設 41a的頂面部 接有配管D4a 開口於大氣中 裝置控制開閉 可一邊排出容 壓力。據此，| 控制該閥V4a 制容器部 4 1 供給至容器部 液排出部 佈裝置3側， 液至下游側的 部41 d的排出 配管D3a連結 透過配管排出 60藉由閥V3a 且，閥V3a使月 ，因此，若在閥 為開狀態下空 本體11 a的塗^ 1的塗佈液量僅剩一點點，氣泡檢測感測器 的塗佈液槽11的塗佈液量大致相等的量。 氣部44是排出容器部41内的氣體，在本實 於上側容器部41 a。具體上，在上側容器部 4 1 c開口形成有排氣孔’在該排氣孔連通連 。該配管D4a配設有閥V4a，配管D4a的端部 而且，閥V4a使用氣動式閥，可藉由控制 動作°因此，藉由控制閥V4a的開閉動作， 器》P 41内的氣體，一邊調節容器部内的 备由塗佈液由液供給部42供給至容器部41， 的開閉動作並排出容器部4 1内的氣體，可抑 内的壓力的上升並使規定量的塗佈液穩定地 41 〇 43是將儲存於容器部4ι的塗佈液排出到塗 在本實施形態中，藉由塗佈液被排出而被送 預備槽2。該液排出部43為開口形成於底面 孔然後’藉由液排出部4 3與預備槽2透過 ’儲存於容器部41的塗佈液由液排出部43 到預備槽2 ^具體上，配管D3a與共通配管 連結’共通配管60連通連接於預備槽2。而 弓氣動式閥’可藉由控制裝置控制開閉動作。 V4a為閉狀態’且在閥Vla、V2a及閥V3a 氣被供給至塗佈液槽本體11a，則塗佈液槽 怖液被送液至緩衝槽12，藉由透過該被送液 201130573 的塗佈液使緩衝槽12内的壓力上升，使緩衝槽12内的塗 佈液受到壓力，透過配管D3a及共通配管60被送液至下游 側的預備槽2。而且，藉由液排出部4 3配設於底面部4 1 d， 即使假定為塗佈液中混入氣泡w的情形，也能除去塗佈液 中的氣泡w。亦即如圖3所示，雖然若塗佈液與氣泡w — 起被由液供給部4 2的吐出口 4 5 a供給，則氣泡w與塗佈液 的流動一起朝向底面部 4 1 d，但是藉由立即透過浮力而上 升，抑制氣泡w與塗佈液一起被由液排出部4 3排出。因此， 藉由液供給部4 2的吐出口 4 5 a配置於離開配設有液排出部 4 3的底面部4 1 d的位置，即使是在由液供給部4 2的吐出 口 45a供給的塗佈液中混入氣泡w的情形，也能抑制氣泡 w與塗佈液一起被由液排出部43排出，可除去塗佈液内的 氣泡w。 而且，在容器部41的頂面部41c配設有氣體導入部 48。該氣體導入部48具有與塗佈液槽11的氣體導入部lib 同樣的功能，藉由由該氣體導入部4 8供給空氣，即使塗佈 液不被由塗佈液槽11送液，也能將容器部41内的塗佈液 排出到下游側。具體上，氣體導入部48與未圖示的空氣壓 縮機藉由配管D5a連結。然後，在該配管D5a配設有閥 V5a，藉由使該閥 V5a開閉動作，可將空氣供給至容器部 41。該閥V5a使用氣動式閥，可藉由控制裝置控制開閉動 • 作。而且，藉由控制該閥V 5 a的開閉動作將空氣供給至容 . 器部41，可將容器部41的塗佈液送液至預備槽2。亦即， 若使閥V3a、閥V5~a成開狀態，使閥Via、閥V4a成閉狀態 15 201130573 •並將工氣供給至容器部4 i ’則藉由容器部4上的壓 使谷器P 41的塗佈液受到壓力，塗佈液透過液排 排出到配管D3a，經由共通流道6〇(共通的供給路 至預備槽2。 而且在本實施形態中，除了塗佈液供給單元1〔 外配λ有塗佈液供給單元2 〇 ^該塗佈液供給單元 與塗佈液供給單元同樣的構成，在圖1中處在對 置關係的構成構件具有相同的功能。因此，針對塗 給單元20擬省略說明。 該等塗佈液供給單元10、20被連通連接於共 60，藉由切換連接至該共通流道60，可由任—方的 i' '”。單元1〇、20將塗佈液供給至塗佈裝置3。亦即 定閥V3a為開狀態，閥V3b為閉狀態的情形下’因 道60與塗佈液供給單元1〇連通連接， 液供給單元10供給。而且，在使間V3b為開::破 為閉狀態的情形下’因共通流道60與塗佈液供給 連通連接，故塗佈液被由塗佈液供給單S 20供給， 而且，該塗佈液供給裝置配設有未圖示的控制 藉由該控制裝置使塗佈液供給裝置被統括地控制 上’接受來自氣泡檢測感測器Fla、Flb、液面感測姜 C2a、Clb、C2b等的各感測器類的信號，使各閥 的開閉動作被控制。II由控制該各閥Vla、仏·.的 作，使塗佈液槽η、21或緩衝槽12、22的送液、 被控制。 力上升， 出部43 徑）送液 1之外另 20具有 稱的位 佈液供 通流道 塗佈液 ，在設 共通流 由塗佈 閥V3a 單元20 I 裝置。 。具體 f Cla、 、V2a… 開閉動 停止等 201130573 . 其次’針對該塗佈液供給裝置的動作’根據圖4所示 的流程圖及顯示圖5〜圖1 〇的各程序中的閥的開閉狀態的 圖來說明。此外’在圖5〜圖1 0中反白的閥是表示開狀態， 塗黑的閥是表示閉狀態。而且，在該說明中針對最初由塗 佈液供給單元10供給塗佈液，接著由塗佈液供給單元2 〇 供給塗佈液的例子來說明。 首先’藉由步驟S1進行緩衝槽填充（緩衝槽填充程 序）。亦即’藉由塗佈液供給單元10之由塗佈液槽11將塗 佈液送液’使規定量的塗佈液被填充到緩衝槽1 2。具體上 如圖5所示，閥Via、V2a、V4a被設定為開狀態，若由配 管D 2 a透過氣體導入部iib供給空氣，則塗佈液槽本體Ua 的塗佈液受到壓力，塗佈液透過塗佈液排出部11 c排出到 配管D1 a ’被送液至緩衝槽1 2。然後，透過配管D1 a被送 液的塗佈液由液供給部4 2的吐出口 4 5 a湧出並順著管部 45的側面部45b供給至容器部41。然後，藉由塗佈液被填 充到緩衝槽1 2的容器部41，液面感測器C2a的開關接通， 進而供給塗佈液，藉由液面感測器c丨a的開關接通，判斷 為規定量的塗佈液被供給至緩衝槽12，完成緩衝槽填充。 其次，藉由步驟S 2進行塗佈液供給至塗佈裝置3 (塗 佈液供給程序）。亦即’緩衝槽12的塗佈液經由預備槽2 供給至塗佈裝置3。具體上，藉由若液面感測器cla的開 ' 關接通’則如圖6所示閥V 4 a被關閉，閥v 3 a被打開，緩 • 衝槽1 2的塗佈液被供給至塗佈裝置3側。亦即，藉由成為 圖6所示的閥的開閉狀態，若由配管D2a透過氣體導入部 201130573 11 b供給空氣，則塗佈液槽本體11 a的塗佈液被送液 衝槽12’藉由該被送液的塗佈液使緩衝槽12内的壓 升’由液排出部43排出的塗佈液透過配管D3a及共通 60並經由預備槽2被送液至塗佈裝置3。據此，藉由 給的塗佈液透過泵3a的驅動而被吐出，使塗佈液塗佈 佈對象的基板等。 其次’藉由步驟S3進行送液停止（送液停止程序 即’若塗佈液槽1 1的塗佈液的殘量只有一點點，則為 止在由液排出部43排出的塗佈液中混入大量的氣泡） 行送液停止。具體上，若藉由氣泡檢測感測器F 1 &檢 在配管D1 a内的塗佈液包含有氣泡，則如圖7所示， 到目前為止為開狀態的閥V1 a、V3a被關閉，使送液传 亦即，藉由閥Via、V3a被關閉，防止新的氣泡w被供 緩衝槽1 2，並且防止供給至緩衝槽丨2的氣泡*由液 部43排出。據此，即使藉由氣泡檢測感測@…檢測 氣泡被供給至緩衝槽12，在閥Vla、V3a為閉狀態下 被停止，而且因液供給部42與液排出部43分離，故 ί、、’’σ 42的吐出口 45a吐出的氣泡w透過浮力上升 此，可防止氣泡w被由液排出告p 43排出。此外，因在 該送液停止的狀態下，配管DU 一被檢測出氣泡化就 進行，故在塗佈液槽u還殘存廢棄就太可惜的量 液。 的 其次，藉由步驟S4進行緩衝槽液量調整（緩衝 調整程序）。亦即’通常緩衝槽12也有空間的問題： 至緩 力上 配管 所供 至塗 >。亦 了防 ，，進 測出 藉由 止。 給至 排出 出的 送液 由液 。據 進行 立即 塗佈 液量 被設 201130573 計為很難由液面感測器C1 a反應的狀態更進一步追加塗佈 液的大小。因此’為了將殘留於塗佈液槽11的塗佈液送液 至緩衝槽12’需調整緩衝槽12的液量，為了將殘留於塗 佈液槽11的塗佈液供給至緩衝槽1 2，使緩衝槽1 2的塗佈 液僅減少塗佈液槽丨丨的殘留塗佈液量的部分。具體上如圖 8所示，打開閥v3a、V5a並由配管D5a透過氣體導入部48 將空氣供給至容器部41内。據此，塗佈液透過液排出部 43排出到配管D3a，經由共通流道6〇被送液至預備槽2。 然後’藉由持續送液至液面感測器C2a成為〇FF，使緩衝 槽12的液量減少。然後，若緩衝槽丨2的液量減少，液面 感測器C2a成為0FF，則使閥Vla、V3a成閉狀態，完成緩 衝槽液量調整。 另一方面，若因該緩衝槽液量調整完了而使閥yia、 V3a成閉狀態，則進行切換成塗佈液供給單元2〇的準備。 亦即’藉由打開閥Vlb、V2b、V4bil將塗佈液供給至緩衝 槽22，針對塗佈液供給單元2〇進行緩衝槽填充程序。 其次，藉由步驟S5進行殘液送液動作（殘液送液程 序）。亦即’不會浪費廢棄殘留於塗佈液槽"的塗佈液而 送液至緩衝槽12。具體上如圖9所示，若在打開閥Vla、 V2a、V4a的狀態了’由配管D2a透過氣體導入冑"匕供給 空氣’則塗佈液透過塗佈液排出部Uc排出到配管Μ = 被送液至緩衝槽12°亦即’殘留於塗佈液槽11的塗佈液 的送液動作被進行到液面感測器Cla成為〇Ν為止。此處， 因塗佈液# 1 1的塗佈液殘量為少的狀態，大量的空氣與塗 201130573 佈液一起進入塗佈液排出部 1 1 c，始认+ 又於在塗佈液混入大量 的氣泡W的狀態下殘量塗佈液被供給 ^ 後衝槽1 2。亦即， 藉由混入大量的氣泡w的塗佈液被由汸 饭由夜供給部42的吐出口 45a供給，就會使大量的氣泡*散布在交取 双邱任奋器部41内，惟因 吐出口 45a與液排出部43配置於分離的位置而且閥 被維持於閉狀態，故由液排出部43流動到配"3a不會產 生，混入塗佈液的氣泡w會殘存於容器部4 i。 其次，進行塗佈液槽的更換（槽更換程序）。具體上， 塗佈液之供給至塗佈裝置3是由塗佈液供給單元2〇進行， 塗佈液供給單元10的塗佈液槽丨丨被更換成填充有塗佈液 的塗佈液槽1 1 ^亦即，如圖丨〇所示，針對與塗佈液供給 單元10的緩衝槽液量調整程序完了同時開始的塗佈液供 給單元20’若緩衝槽填充動作完了，則在打開閥v2b、vib、 V3b的狀態下，若由配管D2b透過氣體導入部2ib供給空 氣則塗佈液槽本體21a的塗佈液被送液至緩衝槽22，藉 由該被送液的塗佈液使緩衝槽22内的壓力上升，由液排出 部53排出的塗佈液透過配管D3b及共通流道6〇經由預備 槽2被送液至塗佈裝置3。據此，塗佈液不中斷而能持續 供給至塗佈裝置3。 而且，藉由進行該塗佈液槽u的更換，可利用該槽更 換程序的時間除去塗佈液供給單元i Q的容器部4 i的氣泡 W亦即，因當塗佈液供給單元20的塗佈液—邊被供給， 塗佈液供給單元10的塗佈液槽η -邊被更換時，到由下 —次的塗佈液供給單元1 〇的緩衝槽丨2開始塗佈液的送液 20 201130573 為止，可 至緩衝槽 佈液内的 佈液内的 的殘存塗 故可不浪 然後 圖，進行 塗佈液供 繼續將塗 以上 測出塗佈 止來自緩 下’藉由 緩衝槽， 也能防止 液動作之 内’透過 而上升， 的塗佈液 泡。因此 入供給的 .而且 給單元的 確保足夠的時間’故可透過浮力使存在於被供給 12的塗佈液的所有的氣泡w上升。亦即，可使塗 大量的氣泡w由液排出部43脫離，可除去殘留塗 大量的氣泡w。據此，即使供給大量包含有氣泡w 怖液’也能抑制氣泡w被供給至塗佈裝置3側， 費地使用塗佈液槽11的塗佈液。 ，針對塗佈液供給單元20也是依照圖4的流程 t述的塗佈液供給單元10的動作。然後，藉由由 給單元20再度被切換成塗佈液供給單元丨〇，可 佈液供給至塗佈裝置3。 ，依照上述實施形態中的塗佈液供給裝置，若檢 液槽的殘量僅m則藉由送液停止動作停 衝槽的送液。然後，透過在使該送液停止的狀態 殘液送液動作使殘留於塗佈液槽的塗佈液送液至 即使是大量的氣泡混入殘留的塗佈液内的情形， 氣泡由緩衝槽流到下游側。然後，藉由在殘液送 後進行槽更換動作，在槽更換動作所需的時間 被送液至緩衝槽的殘留塗佈液内的氣泡受到浮力 可使塗佈液與氣泡分離。亦即，可將塗佈液槽内 使用到最後，並且也能充分地除去塗佈液内的氣 ’可避免塗佈液被浪費廢棄’同時可抑制氣泡混 塗佈液。 ，在上述實施形態中雖然針對配設兩個塗佈液供 情形而說明，惟配設3個以上的構成也可以。此 201130573 情形，因在一個塗佈液供給單元供給塗佈液結束後，到剩 下的兩個塗佈液供給單元的塗佈液供給完了之間，可充分 確保使塗佈液與氣、泡w分離的時間，故與配設兩個塗佈： 供給單元的情形比較，彳更確實地進行氣泡W的除去。而 2，不是配設複數個塗佈液供給單元的構成，而是僅配嗖 -個的構成也可以。即使是此情形也能在槽更換程序中叹 利用更換完全排出塗佈液的塗佈液槽的時間除去氣泡卜 【圖式簡單說明】 實施形態中的塗佈 一實施形態中的緩 液供給裝置 衝槽之概略 圖1是顯示本發明的一 之概略圖。 圖2是顯示本發明的 圖。 圖3是顯示塗佈液被供給至緩衝 圖4是顯示塗佈液供給裝置的動 圖5是顯示緩衝槽填充程序 圖6是顯示塗佈液供給程序 圖7是顯示送液停止程序中 圖8是顯示緩衝槽液量調整 槽的狀態之圖 作之流程圖。 中的間的開閉狀態之圖。 中的閥的開閉狀態之圖。 的閥的開閉狀態之圖。 程序中的閥的開閉狀態之 圖9是顯示殘液送液程库φ沾 _ 杠序中的閥的開閉狀態之圖。 圖1 0是顯示槽更換程序中的關 汁τ的閱的開閉狀態之圖。 圖11是顯示習知的塗佈液供給骏置之圖。 圖12是顯示在習知的塗佈液供給裝置中，塗佈液變少 22 201130573 的狀態之圖。 【主要元件符號說明】 2 :預備槽 3 :塗佈裝置 I 0 :塗佈液供給單元（第一塗佈液供給單元） 11、2 1 :塗佈液槽 II a :塗佈液槽本體 I 1 b :氣體導入部 II c :塗佈液排出部 1 2、2 2 :緩衝槽 2 0 :塗佈液供給單元（第二塗佈液供給單元） 2 1 a :塗佈液槽本體 2 1 b :氣體導入部 4 1 :容器部 4 1 a :上側容器部 4 1 b :下側容器部 4 1 c :頂面部 4 1 d :底面部 42 :液供給部 4 3、5 3 :液排出部 44:排氣部 45 :管部 4 5 a :吐出部 23 201130573 48 :氣體導入部 6 0 :共通流道 1 0 0 :塗佈液供給裝置 1 0 1 :塗佈液槽 101a:管子 1 0 2 :緩衝槽 1 0 3 :感測器 105:塗佈裝置 1 0 5 a :泵 105b:喷嘴201130573 V. If there is a chemical formula in this case, please disclose the chemical formula that best shows the levy: 赏乃舍六, invention description: [Technical field of the invention] The present invention relates to the supply of a coating liquid to a coating liquid to a substrate The coating liquid supply device, the coating liquid supply method, and the buffer tank of the coating device on the substrate, in particular, the residual liquid which can be used without waste, and can be suppressed The coating liquid supply device, the coating liquid supply method, and the buffer tank supplied in a state where bubbles are mixed in the coating liquid. [Prior Art] A flat panel display (flat 卩 (10) "display" such as a liquid crystal display or a plasma display is coated with a resist on a giass substrate. The liquid crystal substrate (referred to as a coated substrate) is formed by a substrate processing apparatus that uniformly applies a coating liquid such as a photoresist liquid or a chemical liquid. The substrate processing apparatus includes as shown in FIG. The coating liquid supply device 100 that supplies the supply of the cloth liquid; the coating device 1〇5 that applies the coating liquid to the substrate, and the coating liquid that is supplied from the coating liquid supply device 100 is supplied to the coating device 1〇 The pump 10a is discharged to the substrate by the nozzle 105b of the coating device 105 by operating the pump 105a, and a uniform coating film is formed on the substrate 201130573. In general, the coating liquid supply device 1b has a coating liquid tank 101 for storing a coating liquid, and a buffer tank 1〇2 for temporarily storing a coating liquid, by using a coating liquid tank 1 0 1 The coating liquid temporarily stagnates in the buffer tank 1 〇 2 to prevent coating Specifically, the coating liquid tank 1 is provided with a bag-shaped tube l〇la having a stretchable shape in the container, and a coating liquid is stored in the tube i〇ia. Then, By pressurizing the inside of the container, the tube 1 〇 1 & shrinks and the coating liquid in the tube 10 〇 la is supplied to the buffer tank 1 〇 2, and is supplied to the coating device by the buffer tank 102. The pump of 05' supplies the coating liquid from the coating liquid supply device 10 to the coating device 丨〇5. Here, it is assumed that the bubble w is mixed in the coating liquid, and is stored in the buffer at a time. In the case of the groove 102, the bubble w is raised by the buoyancy, and the bubble w is removed, and the coating liquid which has been removed from the bubble is supplied to the liquid discharge portion which is disposed on the bottom surface of the buffer tank 1〇2 (see, for example, the following patent document) In this way, the coating liquid in the tube 101a is supplied to the coating device 1〇5, but as shown in Fig. 12, the tube 1 is 若1 in a state where the residual amount of the coating liquid in the tube i〇ia is small. a shrinks, the air in the tube 1 〇丨a is mixed into the coating liquid. A large number of bubbles w are contained in the coating liquid and are supplied. In the state in which the bubble w is not sufficiently removed in the buffer tank 012, the coating liquid in which the bubble w is mixed is supplied from the buffer tank 102, which causes a poor quality of the coating film. It is assumed that the sensor (sens〇r) 103' in which the bubble w is detected in the coating liquid supplied from the tube l〇la (ie, if only a little bit is detected) is judged as the tube 1 The coating liquid in a is empty. By replacing with the new coating liquid tank 1〇1, 201130573 to avoid air bubbles w. • The coating liquid is continuously supplied to the coating device 1 〇5. [Patent Document 1] Japanese Laid-Open Patent Publication No. Hei 5-304087. However, there is a problem that a coating liquid such as a photoresist liquid is discarded in the above-described coating liquid supply device 1 1 . In other words, in order to prevent the incorporation of the air bubbles w, the bubble is detected in the coating liquid of the liquid to be fed. In particular, it is determined that the coating liquid tank 1G1 is empty and the coating liquid tank (8) is replaced, so that the tube 101a is replaced. The coating liquid tank ι〇ι is replaced in a state where a certain amount of the coating liquid remains in the inside. This residual (four) coating liquid is a problem of being a running cost because it is expensive but is discarded at the time of tank replacement. The present invention has been made in view of the above problems, and an object of the invention is to provide a coating liquid supply device, a coating liquid supply method, and a buffer tank, which can prevent the coating liquid from being wasted and discarded, and at the same time, can suppress the incorporation of air bubbles w. The coating liquid supplied. In order to solve the above problems, the coating liquid supply device of the present invention includes a coating liquid tank for storing a coating liquid, and a buffer tank for storing the coating liquid at a time, and pressurizing the coating liquid tank to coat the coating liquid tank. The coating liquid is supplied to the buffer tank, and the coating liquid is supplied from the buffer tank to the coating liquid of the coating liquid tank, and is characterized in that it includes detecting the residual amount of the coating liquid in the coating liquid tank. The residual amount detecting hand slave detects that the residual amount of the coating liquid in the coating liquid tank is only a little bit by the residual amount detecting means, and stops the liquid feeding of the coating liquid by the buffer tank. After the liquid supply stop operation, in the state where the liquid supply from the buffer tank is stopped, the liquid supply operation of the residual liquid in the coating liquid tank is sent to the buffering solution of the buffer 5 201130573, and then the coating is performed. The replacement of the groove of the cloth tank is performed. According to the coating liquid supply device described above, once the residual amount of the coating liquid tank is detected, the liquid supply from the buffer tank is stopped by the liquid supply stop operation. Then, in the state in which the liquid supply is stopped, the coating liquid remaining in the coating liquid tank is supplied to the buffer tank by the liquid-feeding operation of the residual liquid, so that a large amount of the coating liquid is mixed in the remaining coating liquid. In the case of bubbles, it is also possible to prevent bubbles from flowing from the buffer tank to the downstream side. Then, by performing the groove replacement operation after the liquid supply operation of the residual liquid, the bubbles in the residual coating liquid that has been supplied to the buffer tank are lifted by buoyancy in the time required for the tank replacement operation, and the coating liquid is applied. Separated from the bubbles. That is, the coating liquid in the coating liquid tank can be used up to the end, and the bubbles in the coating liquid can also be sufficiently removed. Therefore, it is possible to prevent the coating liquid from being wasted and discarded, and at the same time, it is possible to suppress the air bubbles from being mixed into the supplied coating liquid. Further, a configuration may be adopted in which a plurality of coating liquid supply units having a coating liquid tank: a buffer tank are disposed, and the buffering of the coating liquid supply unit is selectively connected to a common supply path. After the liquid-feeding stop operation in the buffer tank that is connected to the first coating liquid supply that is connected to the supply path is described as being broken, the first coating is performed by the connection with the above-mentioned sputum. The liquid supply unit is switched to supply the liquid to the coating liquid from the second coating liquid supply unit. According to this configuration, after the liquid supply stop operation in the first 7C is performed in the first, μ ^ ^ ^ shape W, it is performed! t is switched to the coating liquid supply unit to the second coating =, and the second coating liquid supply unit is reversed to the liquid phase. Single 70, so that the coating liquid is single... Therefore, the coating capacity of the post-discharge reducing liquid supply tank is performed by the first coating liquid supply unit 6 201130573 unit in the bubble residual coating liquid supply sheet. On the other hand, the supply of the supply liquid is performed by separating the bubbles in the buffer tank from the tube portion and stopping the supply of the liquid to be stopped by the second coating liquid I. The coating amount of the buffer tank is set to be set by the aforementioned The amount of liquid delivered. The liquid supply operation is performed so that the supply of the residual liquid to the buffer buffer tank is more than necessary. The buffer tank includes: a bottom surface portion of the storage container portion, and an outlet portion; and a supply portion that is supplied from the coating liquid tank to the inside of the liquid supply portion, and the residual liquid is left after the liquid is stopped. When the liquid is supplied to the buffer tank, the supply of the coating liquid can be prevented from being supplied to the coating liquid. Further, a configuration may be adopted in which the coating liquid is decremented before the liquid feeding operation of the residual liquid is performed, and the liquid-repellent operation is performed by the liquid residue in the coating liquid tank, and the residual liquid is previously used. Since the amount of the liquid is reduced, it is not necessary to increase the size of the buffer tank, and the following may be used to form a liquid portion for arranging the coating liquid; and the liquid arranging liquid to be disposed and discharged from the coating liquid. The liquid crystal supply unit that supplies the coating liquid that is supplied from the coating liquid tank to the container portion is disposed in the liquid supply unit that supplies the coating liquid that is supplied from the coating liquid tank to the container portion. The tube portion top portion extending from the bottom surface portion of the container portion is on the other hand, and the liquid discharge portion of the coating liquid in the discharge container portion is disposed on the bottom surface portion. Therefore, the liquid supply portion and the liquid discharge portion are present at positions separated from each other. Therefore, even when the residual coating liquid is supplied from the liquid supply unit, it is possible to prevent the bubbles in the residual coating liquid from being immediately discharged from the liquid discharge unit to the downstream side of the buffer tank. 201130573 Method: Containing .V storage coating: The above problem, the coating liquid supply of the present invention: 冲: the coating liquid tank of the rinsing tank 1: the cloth liquid, and the coating liquid are stored at the same time <Differential groove is supplied to the coated coating liquid coated on the substrate via the buffering solution of the buffering glaze-s coating liquid tank. The method for detecting the coating, setting, and/or detecting includes: detecting the residual amount of the coating liquid in the coating liquid tank by using the method of measuring the road; In the state in which the liquid supply from the buffer tank is stopped, the liquid supply from the buffer tank is stopped in the buffer tank, and the residual coating liquid is applied to the residual liquid of the buffer tank. ; The tank replacement procedure for the replacement of the tank. According to the above-described coating liquid supply method, the liquid supply from the buffer tank is stopped by the liquid supply stop program by detecting only the residual amount of the coating liquid tank. Then, in the state where the liquid supply is stopped, the coating liquid remaining in the coating liquid tank is supplied to the buffer tank by the residual liquid feeding procedure, so that even a large amount of air bubbles are mixed in the remaining coating liquid. In this case, it is also possible to prevent air bubbles from flowing from the buffer tank to the downstream side by stopping the liquid supply from the buffer tank. Then, by performing the tank replacement procedure after the residual liquid feeding procedure, the bubbles in the residual coating liquid that has passed through the liquid to the buffer tank are lifted by buoyancy in the time required for the tank to change the material, so that the coating liquid is applied. Separated from the bubbles. That is, the coating liquid in the coating liquid tank can be used to the end, and the air bubbles in the coating liquid can also be sufficiently removed. Therefore, the town can prevent the coating liquid from being wasted and discarded, and at the same time, it is possible to suppress the air bubbles from being mixed into the supplied coating liquid. Further, in order to solve the above problem, the buffer tank according to the present invention includes a container portion that accommodates the supplied coating liquid, and is disposed on the bottom surface 8 201130573 > of the container portion, and discharges the supplied coating liquid. a liquid liquid discharge unit that supplies a coating liquid that is supplied from the coating liquid tank to the liquid supply unit of the container unit, wherein the liquid supply unit has a tube that extends from the bottom surface portion of the container portion to the inside of the container portion The portion has a discharge π of the discharge coating liquid at the tip end of the tube portion. According to this configuration, the liquid supply unit that supplies the coating liquid supplied from the coating liquid tank to the container portion is disposed in the end portion of the tube portion that extends from the bottom surface portion of the container portion, and is discharged from the container portion. Since the liquid discharge portion of the coating liquid is disposed on the bottom surface portion, the liquid supply portion and the liquid discharge portion are separated from each other. Therefore, even if the residual coating liquid is supplied from the liquid supply portion, the residual coating can be suppressed. The air bubbles in the cloth liquid are immediately discharged from the liquid discharge portion and # to the downstream side of the buffer tank. According to this, even when the residual coating liquid of the coating liquid tank in which a large amount of bubbles are mixed is supplied to the buffer tank, the bubble flow can be suppressed from flowing to the downstream side, so that the coating liquid can be prevented from being wasted. [Effects of the Invention] According to the coating liquid supply device, the coating liquid supply method, and the buffer tank of the present invention, it is possible to prevent the coating liquid from being wasted and discarded, and at the same time, it is possible to suppress the coating liquid which is mixed with the foam. [Embodiment] The embodiment of the coating liquid supply device and the coating liquid of the present invention for the "method" and the buffer tank will be described with reference to the drawings. Fig. 1 is a schematic view showing a coating liquid supply device according to an embodiment of the present invention. Fig. 2 is a view showing a buffer tank. 201130573 As shown in Fig. 1 and Fig. 2, the 泠#, unit service, and cloth supply device include: the coating liquid is supplied to the early stage 10 (the first coating liquid supply 供, supply,,, 7L); coating The liquid supply unit coating liquid supply unit) supplies the photoresist liquid-specific coating liquid from the first 供给 supply unit 10, 20 to the tank or the pump of the sW cloth device. In Fig. 1 in the present embodiment, it is obvious that the coating liquid is supplied to the coating package through the preliminary tank 2 by the coating of _ _ , 地 , cloth liquid 仏 , , σ 早 凡 10 , 20 An example of the pump 3a. The coating liquid supply device according to the present embodiment is an example of a coating liquid supply unit i 〇, 2 不, and a coating liquid supply unit i 〇, 2 如(or the coating liquid supply unit 2A) is supplied to the coating liquid supply unit 20 (or the coating liquid supply unit 1 for supplying the liquid, and the coating liquid supply unit 1 is supplied to the end). In the same manner as the cloth liquid, the coating liquid supply unit ι (or the coating liquid supply unit 20) supplies the coating liquid. In addition, in the present embodiment, the coating liquid is supplied from the coating liquid supply unit 1 2. The liquid is supplied to the preparation tank 2 and the coating device 3, but the liquid supply device 2 may be directly supplied, and the side of the liquid supply 2 may be the downstream side. The coating liquid supply unit 1 includes The coating liquid tank storing the coating liquid temporarily stores the buffer tank 12 of the coating liquid, and the coating liquid in the coating liquid tank 1 1 is stored in the buffer tank 12 After that, it is supplied to the preliminary tank 2. Specifically, the coating liquid tank 11 and the buffer tank 12 are connected to each other via the pipe D1a, and the coating liquid of the coating liquid tank is supplied to the buffer tank through the pipe D1a. 2. When the valve vla disposed in the pipe D1a is opened, the coating liquid is supplied from the coating liquid tank 11 to supply the coating liquid to the buffer tank 12. 11 is a coating liquid storing a large amount of coating liquid and storing a plurality of substrates coated by a coating device. The coating liquid tank has a coating 201130573 'cloth liquid tank body Ua; for introducing a gas into the coating The gas introduction portion 11b in the liquid tank main body 11a; the coating liquid discharge portion 1 1 c that discharges the coating liquid. The coating liquid tank main body 11a is a container for storing the coating liquid. The coating liquid tank main body 11a is replaceable. In the case where there is no coating liquid, the coating liquid tank body 11a itself filled with the coating liquid can be replaced. The gas introduction portion 丨丨b is disposed in the upper portion of the coating liquid tank body 11a. The gas introduction unit lib and an air compressor (not shown) are connected by a pipe D2a. Further, 'the pipe D2 a valve V2a is disposed, and air can be supplied to the coating liquid tank body by opening and closing the valve V 2 a. The valve V2a uses an air operated valve, which can be controlled by a later-described method. The device controls the opening and closing operation. Further, by controlling the opening and closing operation of the valve V 2 a to supply air to the coating liquid tank main body 11a and pressurizing, the coating liquid of the coating liquid tank main body 11a can be supplied to the buffer tank 12 . That is, by bringing the valve V2a into an open state and supplying air to the coating liquid tank main body iia, the pressure of the coating liquid tank main body 11a rises, and the coating liquid of the coating liquid tank main body 11a is subjected to pressure. The coating liquid is discharged to the pipe d 1 a through the coating liquid discharge unit 11 c, and is supplied to the buffer tank 12 . Further, the tubular member having the tubular liquid discharge portion 11c extending from the upper side to the lower side of the coating liquid tank main body 11a is disposed, and the tubular member is connected to the pipe D1a. Then, the tubular member is extended to the bottom surface portion of the coating liquid tank main body 11a. Thus, even if the coating liquid of the coating liquid tank main body iia has a small amount of residual liquid (the liquid surface is present near the bottom surface portion). In other cases, the coating liquid can be supplied to the buffer tank 12 through the pipe Dla. Further, a bubble detecting sensor 201130573 F1 a for detecting bubbles is attached to the pipe D1 a. This bubble detection senses the green denier of 岑p '(4), and =% Fla is a means for detecting the residual amount of the coating liquid of the coating liquid tank main body 1U.告 泷 泷 泷 泷 , , , , , 涂布 涂布 涂布 涂布 涂布 涂 涂 涂 涂 涂 涂 涂 涂 涂 涂 涂 涂 涂 涂 涂 涂 涂 涂 涂 涂 涂 涂 涂 涂 涂 涂 涂 涂 涂 涂 涂 涂 涂 涂 涂 涂The coating liquid is sent to the liquid state. Therefore, even if it is a coating, the ..., the bubble of the bubble w which is mixed with only the dot is also detected, and it is detected that the bubble w in the den # is prevented from being supplied to the buffer tank 12. Further, in the example of + &, #婳杜龟- 斤, in Fig. 1, although the coating liquid tank main body 11a is constituted by a tubular bag member having a tubular shape in the lifting member, the pressure is applied to the bag member. The coating liquid inside may be supplied to the buffer tank 1 2 . Further, the buffering liquid 10*12 stores the coating liquid supplied from the coating liquid tank n at a time, and removes air bubbles in the coating liquid. As shown in Fig. 2, the buffer tank 12 has: a container for storing a coating liquid + 4 41; a coating liquid supplied from the coating liquid tank u to the liquid supply portion 42 of the container portion 41; and a coating liquid discharged downstream The measured liquid discharge portion 4 3 ; μ mountain + the exhaust portion 44 of the gas discharged from the trough portion 41. The container portion 41 is a cylindrical box member that stores the coating liquid in a rabbit π ^ i sentence. The container portion 41 is divided into a flange portion, a upper container portion 41a and a lower container portion 41b, and a flange portion of the upper container portion 41a n n and a flange of the lower container portion 41b. The intermediate agent 脔4+ μ is connected and fixed in the state of the sealing member. Thereby, the coating liquid of the container & ^ can be sealed in the container portion 41. Further, the container portion 41 is in a state in which the top surface portion 41 c of the container portion 41 is opposed to the bottom portion 41 d in a state in which the upper container portion 41 a and the lower jaw are connected to each other. The bottom surface portion 41 d 12 1 is used in a state in which the bottom surface portion 41 d 12 1 is located in the wrong direction. Therefore, the coating liquid tank 1 J >ti£ jj_ and the men's liquid coating liquid are sequentially subjected to the Dla i tube portion 45a of the bottom surface portion 4 1 d of the container portion 4 1 in order to form a fluid solution. It is filled with the 201130573 where the amount of the tube is detected. Further, the liquid supply unit 42 supplies the coating liquid to the container portion, and has a tube portion 45 extending inside the bottom surface portion 41d of the container portion 41. Specifically, a supply hole of the I junction is formed in the bottom surface portion 41d, and the tube portion 45 is attached to the supply hole. The top end portion of the 45 is formed with an opening in the container portion 41. The coating liquid is supplied from the coating liquid tank 11 through the pipe D1a to the container portion 41 through the discharge port 45a. Specifically, it is fixed in a posture standing upright in the vertical direction, and is discharged from the discharge port 45a through the dispensing liquid to the container portion 41 along the side of the tube portion 45. In other words, by the side of the tube portion 45, the bubble generated during the supply of the strong discharge from the discharge port 45a is suppressed, and the bottom portion of the container portion 41 is filled. The liquid level sensor c丄 & the capacity of the coating liquid supplied to the grain portion 41 is disposed in the container portion 4 1 . That is, the liquid is the upper limit of the amount of the liquid for detecting the coating liquid, and is also above the discharge port 45a of the embodiment 45. Then, the heights of the sensors C1a of the coating liquid are uniform, and the liquid level sensor na is supplied to the liquid surface of the high-g liquid level sensor C2a in which the coating liquid in the container portion 41 is controlled by the coating liquid. The discharge port 45a of the lower limit portion 45 of the liquid amount is also below. In the present embodiment, the position of the liquid level sensor C2a is reflected as compared with the upper limit value of the liquid level sensor C1a. Specifically, 4 1, in the container part and the piping, and in the discharge port, the coating: $ tube 4 5 tube Dla send face 45b face 45b shape comparison, 4 1 d stable C2a, can be face The detector is equipped with a liquid surface and a reaction 'may [above. In addition, it is disposed in a case where the reaction is set to 201130573 and the coating liquid tank 1 F 1 a is reacted, and the top surface of the arrangement 41a is disposed with the pipe D4a opened to the atmosphere. The opening and closing can be controlled to discharge the pressure. According to this, the valve portion 4 1 for controlling the valve V4a is supplied to the container portion liquid discharge portion device 3 side, and the discharge pipe D3a for the liquid to the downstream portion 41 d is connected to the transmission pipe discharge 60 by the valve V3a and the valve V3a. Since the amount of the coating liquid of the coating body 1 of the empty body 11 a is only a little left when the valve is open, the amount of the coating liquid of the coating liquid tank 11 of the bubble detecting sensor is substantially equal. . The gas portion 44 is a gas discharged from the container portion 41, and is actually the upper container portion 41a. Specifically, a vent hole is formed in the opening of the upper container portion 4 1 c, and the vent hole is connected to each other. The pipe D4a is provided with a valve V4a, the end of the pipe D4a, and the valve V4a is a pneumatic valve, and can be controlled by the control action. Therefore, the gas in the device "P 41" is adjusted by the opening and closing operation of the control valve V4a. In the container portion, the liquid is supplied from the liquid supply unit 42 to the container portion 41, and the gas in the container portion 41 is discharged, and the pressure inside the container portion 41 is increased to stabilize the predetermined amount of the coating liquid. In the crucible 43, the coating liquid stored in the container portion 4i is discharged to the present embodiment, and the coating liquid is discharged and sent to the preliminary tank 2. The liquid discharge portion 43 is formed in the bottom surface and then passes through the liquid discharge portion 43 and the preliminary tank 2 to pass the coating liquid stored in the container portion 41 from the liquid discharge portion 43 to the preliminary tank 2, specifically, the pipe D3a. The common pipe connecting the common pipe 60 is connected to the preliminary tank 2. The bow pneumatic valve ' can be controlled to open and close by a control device. When V4a is in the closed state and the valves Vla, V2a and V3a are supplied to the coating liquid tank main body 11a, the coating liquid tank liquid is sent to the buffer tank 12, and the coating liquid is passed through the coating liquid 201130573. The cloth liquid raises the pressure in the buffer tank 12, and the coating liquid in the buffer tank 12 is pressurized, and the liquid is sent to the preliminary tank 2 on the downstream side through the pipe D3a and the common pipe 60. Further, the liquid discharge portion 43 is disposed on the bottom surface portion 4 1 d, and even if the bubble w is mixed in the coating liquid, the bubble w in the coating liquid can be removed. In other words, as shown in Fig. 3, when the coating liquid is supplied from the discharge port 4 5 a of the liquid supply unit 4 2 together with the bubble w, the bubble w and the flow of the coating liquid are directed toward the bottom surface portion 4 1 d. However, the bubble w is suppressed from being discharged from the liquid discharge portion 43 together with the coating liquid by immediately rising by buoyancy. Therefore, the discharge port 45 5 a of the liquid supply unit 4 2 is disposed at a position away from the bottom surface portion 4 1 d where the liquid discharge unit 43 is disposed, and is supplied from the discharge port 45 a of the liquid supply unit 42 . When the bubble w is mixed in the coating liquid, the bubble w can be prevented from being discharged from the liquid discharge portion 43 together with the coating liquid, and the bubble w in the coating liquid can be removed. Further, a gas introduction portion 48 is disposed on the top surface portion 41c of the container portion 41. The gas introduction unit 48 has the same function as the gas introduction unit lib of the coating liquid tank 11, and by supplying air from the gas introduction unit 48, even if the coating liquid is not supplied by the coating liquid tank 11, The coating liquid in the container portion 41 is discharged to the downstream side. Specifically, the gas introduction portion 48 is connected to an air compressor (not shown) via a pipe D5a. Then, the valve D5a is provided with a valve V5a, and by opening and closing the valve V5a, air can be supplied to the container portion 41. The valve V5a uses a pneumatic valve that can be controlled to open and close by a control device. Further, by controlling the opening and closing operation of the valve V 5 a to supply air to the container portion 41, the coating liquid of the container portion 41 can be supplied to the preliminary tank 2. In other words, when the valve V3a and the valve V5-a are opened, the valve Via and the valve V4a are closed to each other. 15 201130573 • The process gas is supplied to the container portion 4 i ', and the valley is pressed by the container portion 4 The coating liquid of the apparatus P 41 is pressurized, and the coating liquid is discharged to the pipe D3a through the liquid discharge line, and passes through the common flow path 6 (the common supply path to the preliminary tank 2. Further, in the present embodiment, the coating liquid supply unit is provided. 1 [The external λ-containing coating liquid supply unit 2 has the same configuration as the coating liquid supply unit, and the constituent members in the opposing relationship have the same functions in Fig. 1. Therefore, The coating unit 20 is omitted from the description. The coating liquid supply units 10, 20 are connected to the common 60, and are connected to the common flow path 60 by switching, and may be any one of the squares. The coating liquid is supplied to the coating device 3. When the valve V3a is in the open state and the valve V3b is in the closed state, the liquid supply unit 10 is supplied by the liquid supply unit 10 in the channel 60. Moreover, in the case where the gap V3b is opened: the broken state is closed, 'by the common flow path 60 and coating Since the supply liquid is supplied, the coating liquid is supplied from the coating liquid supply unit S20, and the coating liquid supply device is provided with control (not shown), and the coating liquid supply device is collectively controlled by the control device. The upper side receives the signals from the sensors of the bubble detecting sensors Fla, Flb, and the liquid level sensing ginger C2a, Clb, C2b, etc., and controls the opening and closing operations of the valves. II controls the valves Vla,仏·., the liquid supply of the coating liquid tanks η, 21 or the buffer tanks 12, 22 is controlled. The force rises, the outlet portion 43) the liquid supply 1 is supplied, and the other 20 has the position liquid supply. The flow path coating liquid is provided in the common flow by the coating valve V3a unit 20 I. The specific f Cla, V2a... opening and closing, etc. 201130573. Next, the operation of the coating liquid supply device is as follows according to Fig. 4 The flowchart and the diagram showing the open/close state of the valves in each of the procedures of FIGS. 5 to 1 are described. In addition, the valve which is reversed in FIG. 5 to FIG. 10 indicates the open state, and the blackened valve is Indicates a closed state. Further, in this description, the coating is initially supplied from the coating liquid supply unit 10. The cloth liquid is then described by an example in which the coating liquid supply unit 2 supplies the coating liquid. First, the buffer tank filling (buffer filling procedure) is performed in step S1. That is, by the coating liquid supply unit 10 The coating liquid is supplied to the coating liquid tank 11 to fill a predetermined amount of the coating liquid into the buffer tank 12. Specifically, as shown in Fig. 5, the valves Via, V2a, and V4a are set to the open state. When the pipe D 2 a is supplied with air through the gas introduction portion iib, the coating liquid of the coating liquid tank main body Ua is pressurized, and the coating liquid is discharged to the pipe D1 a 'through the coating liquid discharge portion 11 c to be sent to the buffer tank 1 2. Then, the coating liquid that has been supplied through the pipe D1 a is poured out from the discharge port 45 5 a of the liquid supply unit 4 2 and supplied to the container portion 41 along the side surface portion 45b of the tube portion 45. Then, the coating liquid is filled in the container portion 41 of the buffer tank 12, the switch of the liquid level sensor C2a is turned on, and the coating liquid is supplied, and the switch of the liquid level sensor c丨a is turned on. It is determined that a predetermined amount of the coating liquid is supplied to the buffer tank 12, and the buffer tank is filled. Next, the coating liquid is supplied to the coating device 3 (coating liquid supply program) by the step S2. That is, the coating liquid of the buffer tank 12 is supplied to the coating device 3 via the preliminary tank 2. Specifically, if the liquid level sensor cla is turned "on", the valve V 4 a is closed as shown in FIG. 6, and the valve v 3 a is opened, and the coating liquid of the buffer 1 2 is It is supplied to the side of the coating device 3. In other words, when the air is supplied from the pipe D2a through the gas introduction portion 201130573 11b by the opening and closing state of the valve shown in Fig. 6, the coating liquid of the coating liquid tank main body 11a is borrowed by the liquid supply groove 12'. The coating liquid which is discharged from the liquid discharge unit 43 by the pressure of the liquid to be applied is transmitted through the pipe D3a and the common 60, and is supplied to the coating device 3 via the preliminary tank 2. As a result, the applied coating liquid is discharged by the driving of the pump 3a, and the coating liquid is applied to the substrate or the like to be coated. Then, the liquid supply is stopped in the step S3 (the liquid supply stop program is the case where the residual amount of the coating liquid in the coating liquid tank 1 is only a little, and the liquid is discharged from the liquid discharged from the liquid discharge unit 43. A large number of bubbles) The feed is stopped. Specifically, if the coating liquid detected in the pipe D1 a by the bubble detecting sensor F 1 & contains bubbles, as shown in Fig. 7, the valves V1 a, V3a which are now open are closed. That is, the liquid supply is transmitted, that is, the valves Via and V3a are closed, the new air bubbles w are prevented from being supplied to the buffer tank 12, and the air bubbles* supplied to the buffer tank 2 are prevented from being discharged by the liquid portion 43. According to this, even if the detection bubble is supplied to the buffer tank 12 by the bubble detection sensing, the valve Vla, V3a is stopped in the closed state, and since the liquid supply unit 42 is separated from the liquid discharge unit 43, The bubble w discharged from the discharge port 45a of the ''σ 42 rises by the buoyancy, and the bubble w can be prevented from being discharged by the liquid discharge. In addition, since the piping DU is detected as being bubbled out in the state where the liquid supply is stopped, it is a peculiar amount of liquid remaining in the coating liquid tank u. Next, the buffer tank amount adjustment (buffer adjustment program) is performed by step S4. That is, 'there is usually a problem with the buffer tank 12: to the support pipe to the coating >. Also prevented, and the test is stopped. The liquid to be discharged to the discharge. According to the state in which the amount of the coating liquid is immediately applied, the amount of the coating liquid is further increased in the state in which it is difficult to be reacted by the liquid level sensor C1 a. Therefore, the liquid amount of the buffer tank 12 needs to be adjusted in order to supply the coating liquid remaining in the coating liquid tank 11 to the buffer tank 12', and the coating liquid remaining in the coating liquid tank 11 is supplied to the buffer tank 1 2 The coating liquid of the buffer tank 12 is reduced only by the amount of the residual coating liquid in the coating liquid tank. Specifically, as shown in Fig. 8, the valves v3a and V5a are opened, and the air is supplied into the container portion 41 through the gas introduction portion 48 by the pipe D5a. As a result, the coating liquid permeated liquid discharge unit 43 is discharged to the pipe D3a, and is supplied to the preliminary tank 2 via the common flow path 6〇. Then, by continuously feeding the liquid to the liquid level sensor C2a, the amount of liquid in the buffer tank 12 is reduced. Then, when the liquid amount of the buffer tank 2 is decreased and the liquid level sensor C2a is set to 0FF, the valves Vla and V3a are closed, and the buffer volume adjustment is completed. On the other hand, when the valve yia and V3a are closed due to the adjustment of the buffer tank amount, the preparation for switching to the coating liquid supply unit 2 is performed. That is, the coating liquid is supplied to the buffer tank 22 by opening the valves Vlb, V2b, and V4bil, and the buffer liquid filling process is performed for the coating liquid supply unit 2''. Next, the residual liquid feeding operation (residual liquid feeding step) is performed by the step S5. That is, the coating liquid remaining in the coating liquid tank is not wasted and liquid is supplied to the buffer tank 12. Specifically, as shown in Fig. 9, when the valves Vla, V2a, and V4a are opened, "the gas is introduced into the gas through the pipe D2a", the coating liquid is discharged to the pipe through the coating liquid discharge portion Uc. The liquid feeding operation of the coating liquid which is sent to the buffer tank 12°, that is, the 'remaining in the coating liquid tank 11, is performed until the liquid level sensor C1a becomes 〇Ν. Here, since the residual amount of the coating liquid of the coating liquid #1 1 is small, a large amount of air enters the coating liquid discharge unit 1 1 c together with the coating liquid of 201130573, and it is mixed with the coating liquid. In the state in which a large amount of bubbles W are present, the residual coating liquid is supplied to the rear punching groove 12. In other words, when the coating liquid in which a large amount of air bubbles w is mixed is supplied from the squid outlet 45a of the night supply unit 42 by the risotto, a large amount of air bubbles* are scattered in the delivery of the Shuangqiu sufficiency unit 41. Since the discharge port 45a and the liquid discharge portion 43 are disposed at the separated position and the valve is maintained in the closed state, the liquid discharge portion 43 flows to the distribution "3a", and the bubble w mixed with the coating liquid remains in the container portion. 4 i. Next, the coating tank is replaced (slot replacement program). Specifically, the application of the coating liquid to the coating device 3 is performed by the coating liquid supply unit 2, and the coating liquid tank of the coating liquid supply unit 10 is replaced with a coating liquid tank filled with the coating liquid. In the case of the coating liquid supply unit 20' which is started at the same time as the buffer tank amount adjustment program of the coating liquid supply unit 10, the filling liquid supply unit 20' is opened, and the valve is opened. In the state of v2b, vib, and V3b, when the air is supplied from the gas introduction unit 2ib through the pipe D2b, the coating liquid of the coating liquid tank main body 21a is sent to the buffer tank 22, and the coating liquid of the liquid to be supplied is used. The pressure in the buffer tank 22 rises, and the coating liquid discharged from the liquid discharge unit 53 passes through the pipe D3b and the common flow path 6〇, and is supplied to the coating device 3 via the preliminary tank 2. According to this, the coating liquid can be continuously supplied to the coating device 3 without interruption. Further, by replacing the coating liquid tank u, the air bubbles W of the container portion 4 i of the coating liquid supply unit i Q can be removed by the time of the groove replacement process, that is, the coating liquid supply unit 20 When the coating liquid is supplied, and the coating liquid tank η of the coating liquid supply unit 10 is replaced, the coating liquid is sent to the buffer tank 2 of the next coating liquid supply unit 1 Liquid 20 201130573, the residual coating in the cloth liquid in the buffer tank liquid can be removed, and then the coating liquid is supplied, and the coating is continued to be coated, and the coating is stopped by the buffer tank. It is possible to prevent the coating liquid bubble from rising through the liquid movement. Therefore, the supply is supplied, and the unit is ensured for a sufficient period of time. Therefore, all the bubbles w existing in the coating liquid supplied to the liquid 12 can be raised by buoyancy. That is, a large amount of air bubbles w can be removed from the liquid discharge portion 43, and a large amount of residual air bubbles w can be removed. According to this, even if a large amount of bubbles w are contained, the bubble w can be suppressed from being supplied to the coating apparatus 3 side, and the coating liquid of the coating liquid tank 11 can be used arbitrarily. The coating liquid supply unit 20 is also an operation of the coating liquid supply unit 10 described in the flow t of Fig. 4 . Then, by the switching of the feeding unit 20 to the coating liquid supply unit 再, the supply liquid is supplied to the coating device 3. According to the coating liquid supply device of the above embodiment, when the residual amount of the liquid detecting tank is only m, the liquid feeding in the stopping tank is stopped by the liquid feeding stop operation. Then, the liquid remaining in the coating liquid tank is supplied to the coating liquid remaining in the coating liquid tank while the liquid supply is stopped, so that even if a large amount of air bubbles are mixed into the remaining coating liquid, the bubbles flow through the buffer tank. To the downstream side. Then, by performing the groove replacement operation after the residual liquid is sent, the bubbles in the residual coating liquid sent to the buffer tank during the time required for the tank replacement operation are subjected to buoyancy to separate the coating liquid from the bubbles. That is, the inside of the coating liquid tank can be used up to the end, and the gas in the coating liquid can be sufficiently removed to prevent the coating liquid from being wasted and discarded, and the bubble mixed coating liquid can be suppressed. In the above embodiment, the case where two coating liquids are disposed is described, but three or more configurations may be provided. In the case of 201130573, after the application of the coating liquid by one coating liquid supply unit is completed, the supply of the coating liquid to the remaining two coating liquid supply units is completed, and the coating liquid and the gas and bubbles can be sufficiently ensured. Since w is separated, the removal of the bubbles W is performed more reliably than in the case of providing two coating: supply units. On the other hand, the configuration of the plurality of coating liquid supply units is not limited, and only one configuration may be provided. Even in this case, it is possible to remove the bubble by replacing the coating liquid tank in which the coating liquid is completely discharged in the tank replacement program. [Brief Description] The slow liquid supply device in the embodiment of the coating method in the embodiment BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic view showing one of the present invention. Fig. 2 is a view showing the present invention. 3 is a view showing that the coating liquid is supplied to the buffer. FIG. 4 is a view showing the application of the coating liquid supply device. FIG. 6 is a display buffer filling procedure. FIG. 6 is a flow chart showing the application of the coating liquid. FIG. It is a flow chart showing the state of the buffer tank amount adjusting tank. A diagram of the opening and closing state between the two. Diagram of the opening and closing state of the valve in the middle. Diagram of the open and closed state of the valve. The open/close state of the valve in the program Fig. 9 is a view showing the open/close state of the valve in the residual liquid supply path library φ _ _ bar sequence. Fig. 10 is a view showing an open/close state of the reading of the juice τ in the tank replacement program. Fig. 11 is a view showing a conventional coating liquid supply. Fig. 12 is a view showing a state in which the coating liquid is reduced 22 201130573 in the conventional coating liquid supply device. [Description of main component symbols] 2 : Preparation tank 3 : Coating apparatus I 0 : Coating liquid supply unit (first coating liquid supply unit) 11 , 2 1 : Coating liquid tank II a : Coating liquid tank main body I 1 b : gas introduction portion II c : coating liquid discharge portion 1 2, 2 2 : buffer tank 2 0 : coating liquid supply unit (second coating liquid supply unit) 2 1 a : coating liquid tank main body 2 1 b: gas introduction portion 4 1 : container portion 4 1 a : upper container portion 4 1 b : lower container portion 4 1 c : top surface portion 4 1 d : bottom portion 42 : liquid supply portion 4 3, 5 3 : liquid discharge Portion 44: Exhaust portion 45: Tube portion 4 5 a : Discharge portion 23 201130573 48 : Gas introduction portion 6 0 : Common flow path 1 0 0 : Coating liquid supply device 1 0 1 : Coating liquid tank 101a: Tube 1 0 2 : buffer tank 1 0 3 : sensor 105: coating device 1 0 5 a : pump 105b: nozzle
Cla、 C2a、 Clb、 C2b:液面感測器Cla, C2a, Clb, C2b: liquid level sensor
Dla、 D2a、 D3a、 D4a、 D5a、 D2b、 D3b:酉己管 F 1 a、F 1 b :氣泡檢測感測器Dla, D2a, D3a, D4a, D5a, D2b, D3b: 酉 pipe F 1 a, F 1 b : bubble detection sensor
Via、 V2a、 V3a、 V4a、 V5a、 Vlb、 V2b、 V3b:閥 w :氣泡Via, V2a, V3a, V4a, V5a, Vlb, V2b, V3b: Valve w: Bubble