201210789 六、發明說明: c發明戶斤屬之技術領域;1 發明領域 本發明係有關於用於光學元件、精密零件等之樹脂成 形之隔熱模具及其製造方法。 I:先前技術3 發明背景 各種樹脂成形品係藉將熔融樹脂射出至形成於為成形 模具之固定模具與可動模具間之成形空間而成形的樹脂射 出成形法等製造。當為樹脂成形之代表性成形方法之射出 成形時,一將熔融樹脂射出至模具之成形空間内,熔融樹 m 脂之熱便立即急速地移動至模具,同時,接觸模具之熔融 " 樹脂之表面急速地被冷卻而固化,此動作進行至内部為 止,成形便完畢。 近年來,對樹脂成形品要求更複雜或細微之形狀。因 此,進行樹脂成形之際,需要加工成複雜或細微之形狀之 模具成形面之立體的細微加工圖形,而且,需要將其細微 加工圖形忠實地轉印於樹脂成形品。然而,在細微之溝加 工之模具等,於射出成形之際,熔融樹脂到達溝之内部(深 部)前,溶融樹脂表面之固化便開始,而有未將模具面正確 地轉印完,成形便結束之情形。為實現正確之轉印,考量 於樹脂成形之際,提高熔融樹脂之射出壓力之方法、提高 射出速度之方法等改善成形條件的方法,但要使轉印性提 高則有界限。 201210789 因此,便強烈要求以下所示之二點。即,其中一點係 在模具内’於可充分將模具成形面轉印於所投入之樹脂為 止之期間’為保持適合成形之樹脂之黏度,使所投入之樹 脂之溫度不致下降。另一點係一旦可轉印預定形狀時,便 立即將模具内之熔融樹脂保持之熱通過模具排洩,將該樹 脂之溫度降低,以產生固化。對於該等之技術手段也考慮 於射出成形前,先使模具全體加熱而使轉印性提高後,立 即將模具全體驟冷’使所轉印之樹脂固化後脫模之方法, 但需於樹脂成形裝置附加龐大之模具全體之加熱冷卻設 備,而從成本面及能源面而言,並不適當。 是故’用以在樹脂成形時’將模具之溫度降低控制成 緩陵之辦法k出了於模具之成形面附近設由熱傳導性低於 其模具材料之各種物質構成之隔熱層(例如參照專利文獻 1)。 針對此’在作為特別需要高精確度之光學元件之樹脂 成形品方面’於其成形之際’在模具作聽熱層逐漸需要 機械強度高之材料及高精確度之隔熱層厚度。因此,提出 使用機械強度高之喊材料,不是將其形成板狀來貼合於 模具,而是直接以膜形成於模具母材之方法。最適合此膜 形成之方法採用了騎法1射法係__種塗膜技術該塗 膜技術係藉彻電料之加熱,使塗膜材舰融或軟化, 使其呈微粒子狀,加速成高速而噴出,撞擊被覆對象物表 面’使壓壞成扁平之粒子凝@、_,藉此,形成被膜者。 提出了使用·此技術,崎低熱傳導性且機械強度高之 201210789 陶瓷系材料、特別是氧化錯而形成之膜作為習知模具之隔 熱膜(例如參照專利文獻2)。於第24圖顯示記載於專利文獻2 之習知之隔熱模具。在第24圖中,隔熱模具101由模具母材 102、隔熱膜(隔熱層)1〇5、及具有精密加工表面l〇7a之金屬 被膜層108構成。特別是其特徵為隔熱膜1 〇5係由氧化結等 陶竞材料之熔射膜構成之隔熱膜。 先行技術文獻 專利文獻 專利文獻1日本專利第3382281號 專利文獻2日本專利第4135304號 【發^明内容_】 發明概要 發明欲解決之課題 d而,如習知技術之由溶射膜構成之隔熱膜不易形成 句孓厚度,而需要進一步之改良。一般在隔熱模具,由 ^可進行精雄之轉印’故模具之成形面之隔熱性需儘可能 均質,。因此,隔熱層之厚度需均一。對此,使用樹脂,以 射法形成用以施^比習知精密之形狀之模具的隔熱膜 ^平:易姐射膜均…舉例言之,為小型之模具母材時, ^平—之模具母材表面形成隔熱模之際,其模具母材表面 ^喷射喊微粒子而成長之炫射膜在其中央部份與外周部 ^ ^射膜之厚度W同。因此,⑽制表面將鑛金屬 以加1^平常厚’將此較厚之鍍膜精密地機械加工,藉此, 膜之形成而變化之表面,以作為隔熱模 201210789 具來使用。然而,此時’由於成形面之中央部份與外巧部 份之隔熱膜之厚度不同’故嚴格說來,仍因成形面之表面 之場所不同,導致隔熱性產生偏差。 另一方面,為使模具之隔熱性更均一,提出了下述之 方法。舉例言之,為具有平面度高之形狀之成形面的模具 時,在熔射膜形成之步驟採用下述步驟,前述步驟係形成 較目標厚度厚之熔射膜,接著,將此進行磨削、切削等機 械加工,而將形成於模具母材表面之熔射膜之厚度加工成 均者,藉此,可謀求成形時之模具成形面之隔熱性的均 一化,而可進行精確度更高之樹脂成形。 而由於所增加之機械加工之步驟係將硬度高之熔射膜 精抢地加工之步驟,故困難性及勞力伴隨而生。又,有熔 射膜在熔射膜㊉成階段或之後之加工階段,於熔射膜產生 p應力應{之情形。產生此種内部應力應變時,於炼射 '產生裂縫等’進而’導致溶射膜之剝離之嚴重的缺陷, 而對成形步驟造缝大之障礙。 泣者成形模為存在深凹部之模具時,需於位於隔熱 部卩之模具母材之成形面側預先形成類似成形面之凹 由、、; 成句之厚度之隔熱膜。然而,如上述, 系將熔融微粒子之高直進飛翔性之高速流體喷 射於破形成面而米&# 〜成膜之方法,故於具有如上述之凹部之 加工物表面以均— 如匕^ 之厚度塗膜便越發困難。 田隔熱膜之形成依靠熔射法之習知技術用於對 战形被要求高择〜 "月进性之模具時’以熔射形成之膜無法直接 201210789 使用,需要以精密 成均-之厚度C將該硬度高之炫射膜後加工 特別是為具有複雜之深凹部之成形 成膜之_…正之微粒子堆積而形 _-. 也撝出β亥凹4之形,將膜形成為均 二:。即使膜可描出該凹部’而形成膜,該熔射膜在模 王仍不易开V成均—之厚度,故需要上述之機械後加工 '·另t面’在该等步驟不可欠缺之後加工有施予 炫射膜内部應力應變之風險,當施予該種應變時,有引起 炫射膜之裂縫、剝離等之虞。 因而’本發明之主要目的在於提供不需要後加工,且 具有厚度之均-性較習知技術高,且與模具之密著性優異 之隔熱層的模具。 用以欲解決課題之手段 本發明人鑑於習知技術之問題點,致力不斷研究之結 果,發現藉採用以水熱合成反應形成之金屬氧化物作為隔 熱層,可達成上述目的,而臻至完成本發明。 即,本發明係有關於下述隔熱模具及其製造方法。 L 一種隔熱模具,係於金屬製模具母材與構成成形面之金 屬被膜間具有隔熱層者,其特徵在於:前述隔熱層係由 肥粒體之結晶粒子連接成三維網眼狀而形成之多孔質 體構成。 2.如第1之隔熱模具’其中肥粒體係、具有以下述一般式 表示之尖晶石型結晶構造之化合物.201210789 VI. Description of the Invention: C Technical Field of Invention: 1 Field of the Invention The present invention relates to a heat insulating mold for resin molding of optical components, precision parts, and the like, and a method of manufacturing the same. I. Prior Art 3 Background of the Invention Various resin molded articles are produced by a resin injection molding method in which molten resin is injected into a molding space formed between a fixed mold and a movable mold of a molding die. In the case of injection molding of a representative molding method for resin molding, once the molten resin is injected into the molding space of the mold, the heat of the molten resin is rapidly moved to the mold immediately, and at the same time, the melting of the contact mold is "resin" The surface is rapidly cooled and solidified, and the operation proceeds to the inside, and the molding is completed. In recent years, more complicated or subtle shapes have been demanded for resin molded articles. Therefore, in the case of resin molding, it is necessary to process a three-dimensional finely processed pattern of a mold forming surface having a complicated or fine shape, and it is necessary to faithfully transfer the finely processed pattern to the resin molded article. However, in the mold of the fine groove processing, when the molten resin reaches the inside (deep) of the groove at the time of injection molding, the solidification of the surface of the molten resin starts, and the mold surface is not properly transferred, and the molding is performed. The end of the situation. In order to achieve a proper transfer, a method of improving the molding conditions, a method of increasing the injection pressure of the molten resin, and a method of increasing the injection speed, etc., are considered, but there is a limit in improving the transferability. 201210789 Therefore, the two points shown below are strongly requested. That is, one of the points is in the mold "the period during which the mold forming surface can be sufficiently transferred to the resin to be injected" is to maintain the viscosity of the resin suitable for molding, so that the temperature of the input resin does not decrease. Another point is that once the predetermined shape can be transferred, the heat retained by the molten resin in the mold is immediately discharged through the mold, and the temperature of the resin is lowered to cause solidification. For the above-mentioned technical means, it is also considered that before the injection molding, the entire mold is heated to improve the transferability, and then the entire mold is quenched immediately, and the transferred resin is solidified and then released, but the resin is required. The forming device is attached to the heating and cooling device of the entire mold, which is not suitable from the cost side and the energy side. Therefore, the method for controlling the temperature of the mold to reduce the temperature during the molding of the resin is to provide a heat insulating layer composed of various materials having a thermal conductivity lower than that of the mold material in the vicinity of the forming surface of the mold (for example, Patent Document 1). In view of the fact that the resin molded article of the optical element which is particularly required to have high precision is formed at the time of molding, a material having a high mechanical strength and a high-precision heat insulating layer thickness are required in the heat-sensitive layer of the mold. Therefore, it has been proposed to use a material having a high mechanical strength, instead of forming it into a plate shape to be attached to a mold, and directly forming a film on a mold base material. The most suitable method for film formation is the riding method. The coating technology is based on the heating of the electric material, so that the coating material is melted or softened to make it into a microparticle shape and accelerate. The film is ejected at a high speed, and the surface of the object to be coated is struck to cause the particles to be crushed into flat particles to condense @, _, thereby forming a film. In this technique, a ceramic-based material having a low thermal conductivity and high mechanical strength, in particular, a film formed by oxidation is formed as a heat-insulating film of a conventional mold (see, for example, Patent Document 2). A conventional heat insulating mold described in Patent Document 2 is shown in Fig. 24. In Fig. 24, the heat insulating mold 101 is composed of a mold base material 102, a heat insulating film (heat insulating layer) 1〇5, and a metal coating layer 108 having a precision machined surface 10a. In particular, the heat-insulating film 1 〇 5 is a heat-insulating film composed of a spray film of a ceramic composition such as an oxide bond. PRIOR ART DOCUMENT PATENT DOCUMENT Patent Document 1 Japanese Patent No. 3382281 Patent Document 2 Japanese Patent No. 4135304 [Abstract] Summary of Invention The object of the invention is to provide heat insulation by a spray film as in the prior art. The film is not easy to form a sentence thickness, and further improvement is required. Generally, in the heat-insulating mold, the transfer of the fine mold can be carried out, so the heat-insulating properties of the forming surface of the mold should be as uniform as possible. Therefore, the thickness of the insulation layer needs to be uniform. In this case, a resin is used to form a heat-insulating film for applying a mold having a shape that is more precise than that of a conventional method: the film is easy to be used as an example, and when it is a small mold base material, it is flat- When the surface of the mold base material forms a heat insulating mold, the surface of the mold base material is sprayed with the particles and the growth of the smear film is the same as the thickness W of the outer peripheral portion. Therefore, the surface of the (10) surface is precisely machined by adding a normal thickness of the ore metal, and the surface which is changed by the formation of the film is used as a heat insulating mold 201210789. However, at this time, since the thickness of the heat insulating film of the central portion of the forming surface is different from that of the outer portion, it is strictly speaking that the heat insulating property is deviated due to the difference in the surface of the surface of the forming surface. On the other hand, in order to make the heat insulation of the mold more uniform, the following method has been proposed. For example, in the case of a mold having a flat surface having a high degree of flatness, the step of forming a sprayed film employs a step of forming a spray film having a thickness larger than a target thickness, and then grinding the same. By machining such as cutting, the thickness of the spray film formed on the surface of the mold base material is processed into a uniform shape, whereby the heat insulating property of the mold forming surface during molding can be uniformized, and accuracy can be further improved. High resin molding. Since the increased mechanical processing step is a step of processing the high-hardness spray film, the difficulty and labor accompany it. Further, there is a case where the melt film is subjected to a p-stress in the spray film at the processing stage of the tenth or later stage of the spray film. When such an internal stress strain occurs, a serious defect such as a crack or the like is generated in the refining, which causes a peeling of the spray film, and a large gap is formed in the forming step. When the weaner molding die is a mold having a deep recessed portion, it is necessary to form a heat-insulating film similar to the thickness of the molding surface in the molding surface side of the mold base material located on the heat insulating portion. However, as described above, the high-intensity flying high-speed fluid of the molten fine particles is sprayed on the surface of the broken surface and the film is formed by the filming method, so that the surface of the processed object having the concave portion as described above is uniform. The thickness of the film becomes more and more difficult. The formation of the field heat-insulating film relies on the conventional technique of the spray method to be used for the warfare type. When the mold is formed by the spray, the film formed by the spray cannot be directly used in 201210789, and it needs to be precision-- The thickness C is a high-density glare film post-processing, especially for the formation of a film having a complicated deep recessed portion. The positive microparticles are stacked and shaped _-. Both are: Even if the film can form the film to form the concave portion, the molten film is not easy to open the V-thickness of the mold, so the above-mentioned mechanical post-processing is required '·the other t-face' is processed after the steps are indispensable The risk of stress and strain applied to the glare film is such that when the strain is applied, cracks, peeling, and the like of the glare film are caused. Therefore, the main object of the present invention is to provide a mold which does not require post-processing and has a heat-insulating layer which is higher in uniformity in thickness than conventional techniques and which is excellent in adhesion to a mold. Means for Solving the Problems The present inventors have made efforts to continuously study the results of the prior art, and found that the above object can be achieved by using a metal oxide formed by a hydrothermal synthesis reaction as a heat insulating layer. The present invention has been completed. That is, the present invention relates to the following heat insulating mold and a method of manufacturing the same. L is a heat insulating mold which is provided with a heat insulating layer between a metal mold base material and a metal film constituting a molding surface, wherein the heat insulating layer is formed by connecting crystal particles of the fat granules into a three-dimensional mesh shape. The formed porous body is composed. 2. The insulating mold of the first aspect, wherein the fertilizer system has a spinel crystal structure represented by the following general formula.
AxFe3_x04(其中’ A表示可於構成尖晶石型氧化鐵之 7 201210789 結晶之Fe位置換之金屬元素的至少1種,χ滿足OSx< 1 〇 ) ° 3. 如第2項之隔熱模具,其中前述Α係Ca、Ζη、Μη、Α卜 Cr、Li及Mg之至少1種。 4. 如第1項之隔熱模具,其中隔熱層之孔隙率係5〜75%。 5. 如第1項之隔熱模具,其中隔熱層之厚度係15/zm以上。 6. 如第1項之隔熱模具,其中隔熱層之維氏硬度係 Hvl30〜Hv560。 7. 如第1項之隔熱模具,其中隔熱層係藉使1)金屬製模具 母材之表面或2)預先形成於該模具母材表面上之金屬 質層之表面,與含有金屬成份之水溶液或水分散體反應 而生成者。 8. 如第1項之隔熱模具,其中作為該金屬被膜者係至少包 含:1)形成於該隔熱層上且含有鍍覆觸媒之種晶層;及 2)形成於該種晶層上之鍍金屬膜。 9. 如第1項之隔熱模具,其係用於含有樹脂成份之組成物 之成形。 10. —種隔熱模具之製造方法,係製造於金屬製模具母材與 構成成形面之金屬被膜間具有隔熱層之模具者,該隔熱 層之形成步驟包含下述步驟: 使1)金屬製模具母材之表面或2)預先形成於該模具 母材表面上之金屬質層之表面與含有金屬成份之水溶 液或水分散體反應,藉此,生成金屬氧化物者。 11. 如第10項之隔熱模具之製造方法,其中該金屬被膜之形 201210789 成步驟包含下述步驟: 1) 於該隔熱層上形成含有觸媒之種晶層之步驟;及 2) 於§亥種晶層上形成鑛金屬膜之步驟。 12. 如第11項之隔熱模具之製造方法,其係以濺鍍法或鍍覆 法進行該種晶層之形成。 13. 如第1〇項之隔熱模具之製造方法,其中前述反應包含下 述步驟:在1)金屬製模具母材表面或2)預先形成於該模 具母材上之金屬質層表面已與混合金屬鹽 、驗及水而成 之處理液接觸之狀態下,以85°c以上之溫度進行熱處理 者0 14.如第13項之隔熱模具之製造方法,其係在1〇〇〜2〇〇。〇之 飽和水蒸氣壓以上之環境下進行熱處理。 如第10項之隔熱模具之製造方法,其係在還原劑之存在 下進行該反應。 發明效果 根據本發明,可提供不需要後加工,且具有厚度之均 -性較習知技術高,且與模具之密著性優異之隔熱層的模 具。藉此,特別是進行樹脂成形時,可以良好精確度轉印 複雜之成形面,而可自由地製造精密之成形體。 特別是’在本發明之模具,可以作為隔熱層之基底之 =料作為起始原料’以濕式反應(特別是錢合成反應),形 成隔熱層。此時,可沿著為基底之金屬製模具等之表面形 狀,形成較均一之厚度之隔埶層。 据繪(再現)模且健主於可更忠實地 版、母材之表面形狀,故可較自由地製造具有緻 9 201210789 在之構造之成形體。即,使㈣融樹脂作為成形材料時, 由於成㈣’可有效地保㈣融狀態,祕雜脂可無死 角地遍及成形面之細小之溝部,結果,可忠實地再現成形 面之表面形狀(凹凸形狀)。 一體P且因以水熱合成反應,將隔熱層與金屬製模具等 少成,而可大幅地減低諸如習知之熔射膜之裂縫、 曰"力等弓丨起之脫落、剝離等之風險,結果,可更進一 步提高樹脂成频之製造效率。 再者’於上述樹脂成形之際,在隔熱似,藉使各細 二隔熱層之厚度特意地變化,可精細地控制供溶融 。動之模具成形面之細微區域的保熱性及冷卻性。結 °期待具有更複雜之凹凸形狀之成形物之樹脂成形。 此時要求形成隔熱層之材料可易加卫,而由於本發明之 隔熱膜機械加卫性優異,故於樹脂成形時,需進行模具表 面之散熱性之騎控㈣,對在本發明之隔減具表面整 面形成均-之厚度之隔熱膜僅切削加卫必要部份,而使膜 厚變化,藉此,成_,可更精密地進行以之樹脂之熱 流動或冷卻之控制。 此種本發明模具特別適合樹脂成形體之製造。因而, 亦對光學材料(透鏡、稜鏡片、導光板、CD、则碟等光 碟、其他記錄媒體)等之製造有用。 圖式簡單說明 第1圖係本發明第2實施例之隔熱模具之概略截面圖。 第2圖⑴〜(5)係顯示本發明幻實施例之隔熱模具之製 10 201210789 • 作步驟的圖。 第3圖係本發明第2實施例之隔熱膜之X射線繞射圖形 圖。 第4圖係具有本發明第2實施例之隔熱膜之隔熱評價用 試樣的概略截面圖。 第5圖係具有習知隔熱膜之隔熱評價用試樣之概略截 面圖。 第6圖係不具有隔熱膜之隔熱評價之比較試樣的概略 截面圖。 第7圖係用以評價本發明之隔熱膜之隔熱性之測定裝 置的概略結構圖。 第8圖係顯示具有本發明第2實施例之隔熱膜之隔熱評 ' 價用試樣之升溫時之隔熱性評價結果的圖。 第9圖係顯示具有本發明第2實施例之隔熱膜之隔熱評 價用試樣之降溫時之隔熱性評價結果的圖。 第10圖係顯示具有習知之隔熱膜之隔熱評價用試樣之 升溫時之隔熱性評價結果的圖。 第11圖係顯示具有習知隔熱膜之隔熱評價用試樣之降 溫時之隔熱性評價結果的圖。 第12圖係本發明第3實施例之隔熱模具之概略截面圖。 第13圖(1)〜(4)係顯示本發明第3實施例之隔熱模具之 製作步驟的圖。 第14圖係與本發明第3實施例之隔熱模具相同之結構 之隔熱評價用試樣的概略截面圖。 201210789 第15圖係不具有隔熱膜之隔熱評價用比較試樣之概略 截面圖。 第16圖係顯示具有本發明第3實施例之隔熱膜之隔熱 評價用試樣之升溫時之隔熱性評價結果的圖。 第17圖係顯示具有本發明第3實施例之隔熱膜之隔熱 評價用試樣之降溫時之隔熱性評價結果的圖。 第18圖係顯示具有本發明第3實施例之隔熱膜之隔熱 評價用試樣之升溫時之隔熱性評價結果的圖。 第19圖係顯示具有本發明第3實施例之隔熱膜之隔熱 評價用試樣之降溫時之隔熱性評價結果的圖。 第2 0圖係本發明第6實施例之隔熱模具之概略立體圖。 第21圖係本發明第6實施例之模具母材之加工圖形的 截面尺寸圖。 第22圖係顯示於本發明第5實施例之組成含有鋅之隔 熱膜之X射線繞射圖形圖。 第23圖係本發明第7實施例之隔熱模具之概略截面圖。 第24圖係習知之隔熱模具之概略截面圖。 第25圖係顯示使用本發明模具,將熔融樹脂成形時之 步驟例之圖。 第26圖係本發明第1實施例之隔熱模具之概略截面圖。 第27圖(1)〜(5)係顯示本發明第1實施例之隔熱模具之 製作步驟的圖。 第28圖係本發明第1實施例之隔熱膜A之X射線繞射圖 形圖。 12 201210789 第29圖係顯示本發明第1實施例之隔熱膜A之研磨表面 之掃瞒式電子顯微鏡像的圖。 第30圖係顯示本發明第1實施例之隔熱膜A之研磨截面 的圖。 第31圖係顯示本發明第1實施例之隔熱膜B之研磨表面 之掃瞄式電子顯微鏡像的圖。 第32圖係與本發明第1實施例之隔熱模具相同之結構 之隔熱評價用試樣的概略截面圖。 第3 3圖係不具有隔熱膜之隔熱評價用比較試樣之概略 截面圖。 第3 4圖係用以評價本發明之隔熱膜之隔熱性之測定裝 置的概略結構圖。 第35圖係顯示具有本發明第1實施例之隔熱膜之隔熱 評價用試樣之升溫時之隔熱性評價結果的圖。 第36圖係顯示具有本發明第1實施例之隔熱膜之隔熱 評價用試樣之降溫時之隔熱性評價結果的圖。 第37圖係顯示本發明第4實施例之隔熱膜C、D、E之研 磨表面之掃瞄式電子顯微鏡像的圖。 第38圖係於本發明第5實施例之組成含有鈣之隔熱膜 之X射線繞射圖形圖。 第39圖係顯示於本發明第5實施例之組成含有鈣之隔 熱膜之研磨表面之掃瞄式電子顯微鏡像的圖。 第40圖係顯示本發明之隔熱層之孔隙率之測定方法的 圖。 13 201210789 第41圖係顯示本發明第1實施例之隔熱膜A表面之掃瞄 式電子顯微鏡像的圖。 第4 2圖係顯示於本發明第5實施例之組成含有鈣之隔 熱膜表面之掃瞄式電子顯微鏡像的圖。 第43圖係本發明第8實施例之隔熱模具之概略截面圖。 第44圖(1)〜(5)係顯示本發明第8實施例之隔熱模具之 製作步驟的圖。 第45圖係在本發明第8實施例使用之反應容器之概略 圖。 第46圖係本發明第8實施例之隔熱膜之X射線繞射圖形 圖。 第47圖係顯示本發明第8實施例之隔熱膜表面之掃瞄 式電子顯微鏡像的圖。 第4 8圖係顯示本發明第8實施例之隔熱膜之研磨表面 之掃猫式電子顯微鏡像的圖。 第4 9圖係本發明第9實施例之隔熱膜G之X射線繞射圖 形圖。 第50圖係顯示本發明第9實施例之隔熱膜G表面之掃瞄 式電子顯微鏡像的圖。 第51圖係顯示本發明第9實施例之隔熱膜G之研磨表面 之掃瞄式電子顯微鏡像的圖。 第5 2圖係本發明第9實施例之隔熱膜Η之X射線繞射圖 形圖。 第53圖係顯示本發明第9實施例之隔熱膜Η表面之掃瞄 14 201210789 • 式電子顯微鏡像的圖。 第54圖係本發明第9實施例之隔熱膜I之X射線繞射圖 形圖。 第55圖係顯示本發明第9實施例之隔熱膜I表面之掃瞄 式電子顯微鏡像的圖。 第56圖係配置有隔熱膜G之隔熱評價用試樣之概略截 面圖。 第57圖係顯示具有本發明第9實施例之隔熱膜G之隔熱 評價用試樣之升溫時之隔熱性評價結果的圖。 第58圖係顯示具有本發明第9實施例之隔熱膜G之隔熱 評價用試樣之降溫時之隔熱性評價結果的圖。 第59圖係顯示具有本發明第9實施例之隔熱膜I之隔熱 ' 評價用試樣之升溫時之隔熱性評價結果的圖。 第60圖係顯示具有本發明第9實施例之隔熱膜I之隔熱 評價用試樣之降溫時之隔熱性評價結果的圖。 第61圖係本發明第10實施例之組成不同之隔熱膜的X 射線繞射圖形圖。 I:實施方式3 用以實施發明之形態 1.隔熱模具 本發明之隔熱模具(本發明模具)係於金屬製模具母材 與構成成形面之金屬被膜間具有隔熱層之模具,其特徵在 於前述隔熱層由肥粒體之結晶粒子連接成三維網眼狀而形 成之多孔質體構成。 15 201210789 在本發明模具中,如上述,為具有a)金屬製模具母材/ 隔熱層/金屬被膜或b)金屬製模具母材/金屬質層/隔熱層/金 屬被膜之基本構造者,亦可依需要,包含其他層。以下, 就各層之結構作說明。 此外,在本說明書中,只要未特別限制,「金屬」不僅 係指金屬單體,也包含合金、金屬間化合物之涵意。 金屬製模具母材 金屬製模具母材只要由金屬構成即可,亦可使用與在 眾所皆知或市面販售之模具之材質相同者。舉例言之,可 舉鐵、鋁、銅等金屬(金屬單體)、碳鋼、不鏽鋼、銅合金、 鈦合金等合金等為例。又,金屬製模具母材亦可為熔製材 或燒結體任一者。特別是在本發明,在可於鐵系金屬表面 上直接形成為隔熱層之肥粒體層之優點中,以使用鐵系金 屬作為金屬製模具母材為佳。即,以使用金屬鐵及鐵合金 之至少1種鐵系金屬為佳。鐵合金未特別限定,適合使用碳 鋼、不鏽鋼(SUS)、鉻鉬鋼等。 又,金屬製模具母材之成形面側亦可形成平面或曲面 任一形狀,又,亦可為要施予最終成形體之細微形狀之反 轉型,亦可按目的之成形體之形狀,適宜構成。舉例言之, 特別是模具需深凹部(溝部)時,亦可於金屬製模具母材之成 形面側預先形成要轉印於成形面之形狀的反轉型或與其類 似之形狀(凹部)。 金屬被膜 金屬被膜只要由金屬構成即可,亦可與於眾所皆知或 16 201210789 市面販售之模具之成形面採用的材質相同者。舉例言之, 可舉鐵、鎳、銅、鉻等金屬、镍磁a全 濁螺磷0金、鎳硼、鎳鎢磷合 金、鎳銅磷合金等合金等為例。 又,金屬被膜之結構可為單層,亦可為多層。舉例言 之,為更提高隔熱層與金屬被膜之密著性(接合性),有令金 屬被膜為第1金屬被膜及第2金屬被膜之2層結構’並使第【 金屬被膜界於隔熱層與第2金屬被膜間作為接著層(基底層) 的情形。更具體言之,可採用丨)由形成於該隔熱層上,並 含有鍍覆觸媒之種晶層、及2)形成於該種晶層上之鍍金屬 膜構成之結構。即,種晶層係採用由可形成鍍作為上層之 鍍金屬膜時之触媒的金屬構成之層,藉將其利用作為觸 媒,並形成鍍金屬膜,可適於在隔熱層上形成金屬被膜。 此時,可不管構成隔熱層之材質,而有效地形成穩固之金 屬被膜。又,在前述,亦可進—步於第2金屬被膜上形成經 於表面施行細微加工作為構成成形面之層的細微加工金屬 膜作為第3金屬被膜。 金屬被膜之形成方法也未特別限定,可按採用之金屬 種、作為基底之層之組成等,從眾所皆知之方法適宜選擇。 舉例έ之,可組合電鍍、無電電鍍等鍍覆法(液相沉積法); 熱CVD、MOCVD、RF電漿CVD等化學氣相沉積法;濺鍍 法、離子鍍法、ΜΒΕ法、真空蒸鍍法等物理氣相沉積法等 眾所皆知之薄膜形成方法1種或2種以上而適宜採用。 金屬被膜採多層構造時,各層之形成方法亦可不同, 可從則述所示之薄膜形成方法中適宜組合來採用。舉例言 17 201210789 之’如前述,為由作為接著層(基底層)之第1金屬被膜及形 成於其上之第2金屬被膜構成時,可以如下之方法形成各 層°舉例言之,1)於該隔熱層上形成以濺鍍法形成,並包 3鍛覆啤媒(金屬觸媒)之種晶層(第1金屬被膜),以利用該 觸媒之錢覆法’於該種晶層上適於形成鍍金屬膜(第2金屬 被膜)。推 _ 礙''步,更具有細微加工金屬膜作為第3金屬被膜AxFe3_x04 (where 'A' indicates at least one of the metal elements which can be formed in the Fe position of the crystallized iron oxide 7 201210789, and χ meets OSx<1 〇) ° 3. As in the thermal mold of item 2, The lanthanide is at least one of Ca, Ζη, Μη, CrCr, Li, and Mg. 4. The insulation mold of item 1, wherein the thermal insulation layer has a porosity of 5 to 75%. 5. The insulation mold of item 1, wherein the thickness of the insulation layer is 15/zm or more. 6. The insulation mold of item 1, wherein the insulation layer has a Vickers hardness of Hvl30~Hv560. 7. The heat insulating mold according to item 1, wherein the heat insulating layer is made of 1) a surface of a metal mold base material or 2) a surface of a metal layer previously formed on a surface of the mold base material, and a metal component The aqueous solution or the aqueous dispersion reacts to form a generator. 8. The heat insulating mold according to Item 1, wherein the metal film comprises at least: 1) a seed layer formed on the heat insulating layer and containing a plating catalyst; and 2) formed in the seed layer Metallized film on it. 9. The heat insulating mold according to item 1, which is used for forming a composition containing a resin component. 10. A method for producing a heat insulating mold, which is a mold having a heat insulating layer between a metal mold base material and a metal film constituting a forming surface, the step of forming the heat insulating layer comprising the steps of: 1) The surface of the metal mold base material or 2) the surface of the metal layer previously formed on the surface of the mold base material reacts with the aqueous solution or the aqueous dispersion containing the metal component, thereby forming a metal oxide. 11. The method of manufacturing the heat insulating mold according to Item 10, wherein the step of forming the metal film 201210789 comprises the steps of: 1) forming a seed layer containing a catalyst on the heat insulating layer; and 2) The step of forming a mineral metal film on the § hai seed layer. 12. The method of producing an insulating mold according to item 11, wherein the seed layer is formed by a sputtering method or a plating method. 13. The method of manufacturing the heat insulating mold according to Item 1, wherein the foregoing reaction comprises the steps of: 1) the surface of the metal mold base material or 2) the surface of the metal layer previously formed on the mold base material has been In the state in which the mixed metal salt and the treatment liquid obtained by the test are in contact with each other, the heat treatment is performed at a temperature of 85 ° C or more. 12. The manufacturing method of the heat insulating mold according to item 13 is in the range of 1 〇〇 2 Hey. Heat treatment in a saturated water vapor pressure or higher. A method of producing a heat insulating mold according to item 10, which is carried out in the presence of a reducing agent. Advantageous Effects of Invention According to the present invention, it is possible to provide a mold which does not require post-processing and has a heat-insulating layer which is higher in uniformity in thickness than conventional techniques and which is excellent in adhesion to a mold. Thereby, in particular, when the resin is molded, a complicated molding surface can be transferred with good precision, and a precise molded body can be produced freely. In particular, in the mold of the present invention, it can be used as a base material of the heat insulating layer as a starting material to form a heat insulating layer by a wet reaction (particularly, a money synthesis reaction). At this time, a relatively uniform thickness of the barrier layer can be formed along the surface shape of the metal mold or the like which is the base. According to the drawing (reproduction) mode and the shape of the surface of the base material which can be more faithfully printed, the molded body having the structure of the Japanese Patent No. 201210789 can be manufactured freely. In other words, when the (four) melt resin is used as the molding material, the (four)' can effectively maintain the (four) melt state, and the secret grease can pass through the fine groove portion of the molding surface without dead angle, and as a result, the surface shape of the molding surface can be faithfully reproduced ( Concave shape). In addition, due to the hydrothermal synthesis reaction, the heat-insulating layer and the metal mold are reduced, and the cracks such as the conventional spray film, the peeling of the bow, the peeling, and the like can be greatly reduced. Risk, as a result, can further improve the manufacturing efficiency of resin formation. Further, when the resin is formed, it is heat-insulated, and if the thickness of each of the fine heat-insulating layers is intentionally changed, the melting can be finely controlled. The heat retention and cooling properties of the fine areas of the mold forming surface. The resin molding of a molded article having a more complicated uneven shape is expected. At this time, it is required that the material forming the heat insulating layer can be easily reinforced, and since the heat insulating film of the present invention is excellent in mechanical reinforcement, it is necessary to perform heat control of the surface of the mold during the molding of the resin (4). The heat-insulating film which forms a uniform thickness on the entire surface of the reducer only cuts the necessary portion and changes the film thickness, thereby making it possible to perform the heat flow or cooling of the resin more precisely. control. Such a mold of the present invention is particularly suitable for the production of a resin molded body. Therefore, it is also useful for the manufacture of optical materials (lenses, cymbals, light guides, CDs, discs, etc., other recording media). BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic cross-sectional view showing a heat insulating mold according to a second embodiment of the present invention. Fig. 2 (1) to (5) show the manufacture of the heat insulating mold of the magic embodiment of the present invention 10 201210789 • A diagram of the steps. Fig. 3 is a view showing an X-ray diffraction pattern of the heat insulating film of the second embodiment of the present invention. Fig. 4 is a schematic cross-sectional view showing a sample for heat insulation evaluation of the heat insulating film of the second embodiment of the present invention. Fig. 5 is a schematic cross-sectional view showing a sample for heat insulation evaluation of a conventional heat insulating film. Fig. 6 is a schematic cross-sectional view of a comparative sample which does not have thermal insulation evaluation of a heat insulating film. Fig. 7 is a schematic configuration diagram of a measuring device for evaluating the heat insulating property of the heat insulating film of the present invention. Fig. 8 is a view showing the results of evaluation of the heat insulating properties at the time of temperature rise of the heat-insulating sample of the heat-insulating film of the second embodiment of the present invention. Fig. 9 is a view showing the results of heat insulation evaluation at the time of temperature drop of the sample for heat insulation evaluation of the heat insulating film of the second embodiment of the present invention. Fig. 10 is a view showing the results of heat insulation evaluation at the time of temperature rise of a sample for heat insulation evaluation of a conventional heat insulating film. Fig. 11 is a view showing the results of heat insulation evaluation at the time of cooling of the sample for heat insulation evaluation of the conventional heat insulating film. Fig. 12 is a schematic cross-sectional view showing a heat insulating mold of a third embodiment of the present invention. Fig. 13 (1) to (4) are views showing the steps of producing the heat insulating mold of the third embodiment of the present invention. Fig. 14 is a schematic cross-sectional view showing a sample for heat insulation evaluation of the same structure as the heat insulating mold of the third embodiment of the present invention. 201210789 Fig. 15 is a schematic cross-sectional view of a comparative sample for thermal insulation evaluation without a heat insulating film. Fig. 16 is a view showing the results of heat insulation evaluation at the time of temperature rise of the sample for heat insulation evaluation of the heat insulating film of the third embodiment of the present invention. Fig. 17 is a view showing the results of evaluation of the heat insulating properties at the time of temperature lowering of the sample for heat insulation evaluation of the heat insulating film of the third embodiment of the present invention. Fig. 18 is a view showing the results of heat insulation evaluation at the time of temperature rise of the sample for heat insulation evaluation of the heat insulating film of the third embodiment of the present invention. Fig. 19 is a view showing the results of heat insulation evaluation at the time of temperature drop of the sample for heat insulation evaluation of the heat insulating film of the third embodiment of the present invention. Fig. 20 is a schematic perspective view showing a heat insulating mold of a sixth embodiment of the present invention. Figure 21 is a cross-sectional view showing the processing pattern of the mold base material of the sixth embodiment of the present invention. Fig. 22 is a view showing an X-ray diffraction pattern of a heat insulating film containing zinc in the fifth embodiment of the present invention. Figure 23 is a schematic cross-sectional view showing a heat insulating mold of a seventh embodiment of the present invention. Figure 24 is a schematic cross-sectional view of a conventional heat insulating mold. Fig. 25 is a view showing an example of a procedure for molding a molten resin using the mold of the present invention. Figure 26 is a schematic cross-sectional view showing a heat insulating mold according to a first embodiment of the present invention. Fig. 27 (1) to (5) are views showing the steps of producing the heat insulating mold according to the first embodiment of the present invention. Fig. 28 is a view showing an X-ray diffraction pattern of the heat insulating film A of the first embodiment of the present invention. 12 201210789 Fig. 29 is a view showing a broom type electron microscope image of the polishing surface of the heat insulating film A of the first embodiment of the present invention. Fig. 30 is a view showing a polishing section of the heat insulating film A of the first embodiment of the present invention. Fig. 31 is a view showing a scanning electron microscope image of the polishing surface of the heat insulating film B of the first embodiment of the present invention. Fig. 32 is a schematic cross-sectional view showing a sample for heat insulation evaluation of the same structure as the heat insulating mold of the first embodiment of the present invention. Fig. 3 is a schematic cross-sectional view of a comparative sample for thermal insulation evaluation without a heat insulating film. Fig. 34 is a schematic structural view of a measuring device for evaluating the heat insulating property of the heat insulating film of the present invention. Fig. 35 is a view showing the results of heat insulation evaluation at the time of temperature rise of the sample for heat insulation evaluation of the heat insulating film of the first embodiment of the present invention. Fig. 36 is a view showing the results of heat insulation evaluation at the time of temperature drop of the sample for heat insulation evaluation of the heat insulating film of the first embodiment of the present invention. Fig. 37 is a view showing a scanning electron microscope image of the polishing surface of the heat insulating films C, D, and E of the fourth embodiment of the present invention. Fig. 38 is a view showing an X-ray diffraction pattern of a heat-insulating film containing calcium in the fifth embodiment of the present invention. Fig. 39 is a view showing a scanning electron microscope image of a polishing surface of a heat-insulating film containing calcium in the fifth embodiment of the present invention. Fig. 40 is a view showing a method of measuring the porosity of the heat insulating layer of the present invention. 13 201210789 Fig. 41 is a view showing a scanning electron microscope image of the surface of the heat insulating film A of the first embodiment of the present invention. Fig. 4 is a view showing a scanning electron microscope image of the surface of the heat-insulating film containing calcium in the fifth embodiment of the present invention. Figure 43 is a schematic cross-sectional view showing a heat insulating mold of an eighth embodiment of the present invention. Fig. 44 (1) to (5) are views showing the steps of producing the heat insulating mold of the eighth embodiment of the present invention. Fig. 45 is a schematic view showing a reaction vessel used in the eighth embodiment of the present invention. Fig. 46 is a view showing an X-ray diffraction pattern of the heat insulating film of the eighth embodiment of the present invention. Fig. 47 is a view showing a scanning electron microscope image of the surface of the heat insulating film of the eighth embodiment of the present invention. Fig. 4 is a view showing a scanning cat electron microscope image of the polishing surface of the heat insulating film of the eighth embodiment of the present invention. Fig. 49 is an X-ray diffraction pattern diagram of the heat insulating film G of the ninth embodiment of the present invention. Fig. 50 is a view showing a scanning electron microscope image of the surface of the heat insulating film G of the ninth embodiment of the present invention. Fig. 51 is a view showing a scanning electron microscope image of the polishing surface of the heat insulating film G of the ninth embodiment of the present invention. Fig. 5 is a view showing an X-ray diffraction pattern of the heat-insulating film of the ninth embodiment of the present invention. Fig. 53 is a view showing the scanning of the surface of the insulating film of the ninth embodiment of the present invention. Fig. 54 is a view showing an X-ray diffraction pattern of the heat insulating film I of the ninth embodiment of the present invention. Fig. 55 is a view showing a scanning electron microscope image of the surface of the heat insulating film I of the ninth embodiment of the present invention. Fig. 56 is a schematic cross-sectional view showing a sample for heat insulation evaluation in which the heat insulating film G is disposed. Fig. 57 is a view showing the results of heat insulation evaluation at the time of temperature rise of the sample for heat insulation evaluation of the heat insulating film G of the ninth embodiment of the present invention. Fig. 58 is a view showing the results of heat insulation evaluation at the time of temperature drop of the sample for heat insulation evaluation of the heat insulating film G of the ninth embodiment of the present invention. Fig. 59 is a view showing the results of heat insulation evaluation at the time of temperature rise of the sample for evaluation of the heat insulating film 1 of the heat insulating film 1 of the ninth embodiment of the present invention. Fig. 60 is a view showing the results of heat insulation evaluation at the time of temperature drop of the sample for heat insulation evaluation of the heat insulating film 1 of the ninth embodiment of the present invention. Fig. 61 is a view showing an X-ray diffraction pattern of a heat-insulating film having a different composition according to a tenth embodiment of the present invention. I: Embodiment 3: Embodiment for carrying out the invention 1. Insulation mold The mold for insulation of the present invention (the mold of the present invention) is a mold having a heat insulation layer between a metal mold base material and a metal film constituting a molding surface. The heat insulating layer is composed of a porous body formed by connecting crystal particles of a fat body to a three-dimensional network. 15 201210789 In the mold of the present invention, as described above, it is a basic constructor having a) a metal mold base material/heat insulation layer/metal film or b) a metal mold base material/metal layer/heat insulation layer/metal film. It can also include other layers as needed. Hereinafter, the structure of each layer will be described. Further, in the present specification, the term "metal" means not only a metal monomer but also an alloy or an intermetallic compound, unless otherwise specified. Metal mold base material The metal mold base material may be made of metal, and may be the same material as that of a mold which is well known or commercially available. For example, metals such as iron, aluminum, and copper (metal monomers), carbon steel, stainless steel, copper alloys, and alloys such as titanium alloys can be exemplified. Further, the metal mold base material may be either a melted material or a sintered body. In particular, in the present invention, it is preferable to use an iron-based metal as a metal mold base material in the advantage that the fertilizer-granular layer which can be directly formed as a heat-insulating layer on the surface of the iron-based metal. That is, it is preferable to use at least one type of iron-based metal of metallic iron and iron alloy. The iron alloy is not particularly limited, and carbon steel, stainless steel (SUS), chrome molybdenum steel or the like is suitably used. Further, the forming surface side of the metal mold base material may be formed into any shape of a flat surface or a curved surface, or may be an inverted shape in which the fine shape of the final molded body is to be applied, or may be a shape of the molded body according to the purpose. Suitable for constitution. For example, in particular, when the mold requires a deep recessed portion (groove portion), an inverted type or a similar shape (recessed portion) to be transferred to the shape of the forming surface may be formed in advance on the molding surface side of the metal mold base material. Metal film The metal film may be made of a metal, and may be the same material as that of a molding surface of a mold which is well known or sold in the market. For example, metals such as iron, nickel, copper, and chromium, alloys such as nickel magnetic a total turbid phosphorus, gold nickel boron, nickel tungsten phosphorus alloy, and nickel copper phosphorus alloy may be exemplified. Further, the structure of the metal film may be a single layer or a plurality of layers. For example, in order to further improve the adhesion (bonding property) between the heat insulating layer and the metal film, the metal film is a two-layer structure of the first metal film and the second metal film, and the metal film is separated. The case where the thermal layer and the second metal film are used as the adhesion layer (base layer). More specifically, a structure comprising a seed layer formed on the heat insulating layer and containing a plating catalyst, and 2) a metal plating film formed on the seed layer may be employed. That is, the seed layer is a layer made of a metal which can form a catalyst for plating a metal plating film as an upper layer, and is used as a catalyst to form a metal plating film, which is suitable for forming a metal on the heat insulating layer. Membrane. At this time, a stable metal film can be effectively formed regardless of the material constituting the heat insulating layer. Further, in the above-described second metal film, a finely processed metal film which is subjected to fine processing as a layer constituting the molding surface on the surface of the second metal film may be formed as the third metal film. The method for forming the metal film is not particularly limited, and can be appropriately selected from the known methods, such as the metal species to be used, the composition of the layer as the substrate, and the like. For example, electroplating, electroless plating, etc. (liquid phase deposition); thermal CVD, MOCVD, RF plasma CVD, etc.; chemical vapor deposition; sputtering, ion plating, hydrazine, vacuum evaporation One or two or more types of thin film forming methods, such as a physical vapor deposition method such as a plating method, are suitably employed. When the metal film is formed in a multilayer structure, the method of forming each layer may be different, and it may be suitably combined from the film forming method described. For example, when the first metal film as the adhesive layer (base layer) and the second metal film formed thereon are formed as described above, the layers can be formed by the following method, for example, 1) The insulating layer is formed by a sputtering method, and a seed layer (first metal film) of a beer medium (metal catalyst) is forged and coated with the catalyst to form a crystal layer. It is suitable for forming a metal plating film (second metal film). Pushing _ ' '' step, more finely processed metal film as the third metal film
可以錢覆法於為前述第2金屬被膜之鍍金屬膜上形成細 微加工夺M 龙屬膜。藉採此種結構,可更提高隔熱層與金屬被 骐之接合強度。 本發明模具中之金屬被膜之厚度(為多層構造時,為各 之總合厚度)未特別限定,通常為20〜300/zm左右,以 5〇〜15〇, 為特佳。多層構造時之各層之厚度按層數、各 層之材質等,適宜設定即可。 隔熱層 本發明模具之隔熱層(也稱為「隔熱膜」。)形成於金屬 、具母材與構成成形面之金屬被膜間。藉此,可有效地 抑制乃至防止正在熔融之成形材料具有之熱急速地為金屬 製模具母材奪取的現象。 在本發明中,隔熱層由肥粒體之結晶粒子連接成三維 網眼狀而形成之多孔質體構成。隔熱材之材質在金屬氧化 物中也特別採用肥粒體,藉此,可獲得更高之隔熱性,並 且’可發揮其與為其基底之金屬製模具或金屬質層之高密 著性。 多孔質體之構造係肥粒體之結晶粒子連接成三維網眼 201210789 狀而形成。舉例言之,如第42圖所示,由不呈圓形,具有1 個或2個以上之角部之多面體形狀的複數個結晶粒子連接 而由三維網眼構造構成多孔質體。又,如第42圖所示,宜 於多孔質體中形成有連通孔。肥粒體之結晶粒子可為雙 晶,亦可為複數個結晶連結者。又,構成多孔質構造之肥 粒體之結晶粒子以尖晶石型結晶構造者為佳。 在本發明,肥粒體宜為具有以下述一般式AxFe3_x04(其 中,A表示可置換成構成尖晶石型氧化鐵之結晶之Fe位的金 屬之至少1種,X滿足〇Sx<l。)表示之尖晶石型結晶構造 之化合物。 由於前述X係0$χ<1,故不僅可包含x = 0,即,為鐵 系肥粒體(即,尖晶石型氧化鐵Fe304)外,亦可為將Fe位之 一部份以其他金屬元素置換之組成。 前述A誠如前述,只要為可置換成構成尖晶石型氧化鐵 之結晶之Fe位的金屬元素之至少1種,並未限定,特別以 Ca、Ζη、Μη、Al、Cr、Li及Mg之至少1種為佳。因而,在 本發明中,亦可為A成份係Ca、Ζη、Μη、A卜Cr、Li及Mg 之至少1種之組成。此種組成本身為眾所皆知者即可,舉例 言之,可舉Ca〇.5Fe2.5〇4、ZnFe2〇4、MnFe2〇4、AlFe2〇4、 CrFe2〇4、Lio.5Fe2.5O4、MgFe2〇4等之至少 1種為例。 隔熱層之熱膨脹率未特別限定,因金屬製模具在溫度 上升、下降之變化太大且嚴苛之條件下使用,故隔熱層之 熱膨脹率為越接近金屬製模具之熱膨脹率之值,在耐久性 方面越佳。因而,隔熱層之熱膨脹率特別於在200°C以上之 19 201210789 南成形溫度使用之金;®製金>1模具時,宜在滅具之熱膨 脹率之90〜110%之範圍内。 隔熱層之孔隙率未限定,從可達成更高之隔熱性能之 見解而言,通常以5〜75%左右為佳,以4〇〜象範圍内為 特佳。孔隙率可特別以合成溫度、原料濃度等合成條件控 制。本發明中之孔隙率之蚊方法係根據後述實施例所示 之方法。 又’隔熱層之硬度可按成形之材料之種類等,適宜設 定,一般以維氏硬度(平均值)為Hvl30〜Hv560為佳、特別以 Hv200〜Hv400為佳。 又,在本發明中,金屬氧化物宜具有導電性。形成具 有導電性之隔熱層時,以電鍍法將用以形成施行成形面之 細微加工之金屬被膜層的基底鍍層形成於隔熱層上。藉 此,可較簡便地形成基底鍍層。此時,構成隔熱層之氧化 物之導電率未特別限定,通常在25°C之導電率為40S/m以上 即可。 隔熱層中之金屬氧化物之含有量從其隔熱性及密著性 之觀點而言,越高值越佳,通常以在隔熱層中為90重量% 以上為佳,以98重量%以上為特佳。 又,隔熱層之厚度按使用之成形材料之種類、所期之 隔熱性等,適宜設定即可,一般可在15# m以上之範圍内設 定。特別是以15〜l〇〇〇//m為佳’進一步,以30〜150ym為 較佳。藉將隔熱層之厚度設定在上述範圍内,可以均一之 膜厚更有效地描繪作為基底之模具形狀(基材表面)。 20 201210789 本發明之隔熱層可適於使用藉使1)金屬製模具母材之 表面或2)預先形成於該模具母材表面上之金屬質層之表面 與含有金屬成份之水溶液或水分散體(以下也稱為「處理 液」。)反應(濕式反應’特別是水熱合成反應)而生成者。藉 此,可維持與習知物品之隔熱層同等之標準的隔熱性,並 且,可發揮優異之膜厚均一性 '密著性等,結果,可獲得 正確地再現(描繪)作為基底之模具形狀(凹凸形狀)的效果。 與處理液之反應亦可根據眾所皆知之濕式反應(水熱 合成反應)等之條件來施行。較佳為根據後述2記載之方法 施行即可。 金屬質層 本發明模具之隔熱層亦可直接形成於金屬製模具母材 之表面上,亦可使金屬質層(隔熱膜基底層)界在其中間作為 隔熱層之基底層。此時,金屬質層宜在金屬製模具母材之 表面與隔熱層間接觸兩者而形成。 又,金屬質層之組成只要由金屬構成,未特別限定, 可使用在前述金屬被膜所例示之金屬等。在本發明中,特 別宜含有構成隔熱層之組成之金屬元素。g卩,由於本發明 之隔熱層可適於以水熱合成反應形成,故可—面使作為基 底之金屬質層之表面溶解,—面於該金屬質層表面上形成 隔熱層之成長核,並以此作為核,形成均質且密著性穩固 之隔熱層。因而’形成隔熱膜為鐵氧化物之肥粒體層時, 宜具有含有金屬鐵之金屬質層(特別是由金屬鐵構 屬質層)。 21 201210789 在本發明中,金屬質層可由單層構成,亦可由多層構 成。舉例言之,金屬質層可採用1)由種晶層及鍍金屬膜構 成之金屬質層、2)由1層或2層以上之鍍金屬膜構成之金屬 質層等。 因而’金屬質之形成也可按金屬質層之結構等,適宜 採用在則述金屬被臈之形成所例示之薄膜形成方法。舉例 ° 可適於採用丨)包含將金屬製模具母材之表面以藏鑛 恪成種aa層之步驟及於前述種晶層上以鍍覆法形成鍍金屬 膜之步驟的方法、2)包含於金屬製模具母材之表面以鍍覆 法形成鍍金屬膜之步驟的方法等。 金屬質層之厚度按構成金屬質層之金屬元素之種類、 隔熱層之厚度等,適錢定即可,通常為1〜5"m左右之範 圍内即可。 成形材料 本發明之隔熱模具用於其之材料(成形材料)未限制,特 別適於含有職成份之組祕(特假含有樹脂成份作為 主成份之樹餘絲)之絲。舉财之,亦適於用於樹脂 成形。樹脂成份(特別;I:合成樹脂)可舉聚乙烯、聚丙稀、聚 笨乙稀、聚氣乙稀、聚曱基㊉基酸甲8旨、聚醯胺、聚碳酸 醋、ABS樹脂 '聚對酞酸乙二酸、聚四i乙稀等熱塑性樹 脂,還有聚環稀等為較佳例。其他成份亦可依需要包含在 上述組成物中。 隔熱模具之使用 本發明之隔熱模具可與眾所皆知或市面販售之模具同 22 201210789 樣地使用。又’使用模具成形時之成形條件等亦可根據眾 所皆知之方法施行。 使用本發明模具成形時’可使用本發明模具作為構成 模具之成形空間之一部份或全部。舉例言之,藉於以固定 模具與可動模具2個模具形成之成形空間射出成型而成形 時’固定模具及可動模具之至少一者可採用本發明模具。 又,僅將市面販售之模具(成形装置)之一部份或全部更換成 本發明模具’亦可施行本發明模具所作之成形。 於第25圖顯示在由固定模具與可動模具構成之模具 中’使用本發明模具作為可動模具來成形之步驟例之示意 圖。在第25圖中,成形裝置可使用由固定模具3〇1及可動模 具401構成之模具。將樹脂r以熔融狀態射出而導入至固定 模具與可動模具間之空間(成形空間)後,在如圖所示,保持 保壓之狀態下,將樹脂尺冷卻。之後,使可動模具4〇1下降, 開啟模具’脫模後’回收所期之成形樹脂即可。此時,可 動模具401採用本發明模具,並施予本發明模具之成形面預 疋升J狀。然後,藉本發明模具之隔熱層,即使在射出炼融 樹脂,將之導入至模具之成形空間之階段,熔融樹脂之熱 也不致急遽地為模具奪取,溶融樹脂可無死角地遍及施予 成形面之凹凸或溝部,結果,可將該形狀忠實地轉印於樹 脂側。藉此,可獲得正確地再現細微之形狀之成形品。 2.隔熱模具之製造方法 本發明模具可特別適於以下述方法製造。即,可適於 採用製造於金屬製模具母材與構成成形面之金屬被膜間具 23 201210789 有隔熱層之模具的方法,該隔熱層之形成步驟具有下述步 驟’前述步驟係藉使丨)金屬製模具母材之表面或2)預先形成 於該模具母材表面上之金屬質層之表面與含有金屬成份之 水溶液或水分散體(處理液)反應而生成金屬氧化物者。 上述處理液可適於使用含有金屬成份之水溶液或水分 散體。金屬成份採用可構成肥粒體結構之成份即可,特別 以Fe、Ca、Zn、Mn、A卜Cr、以及叫之至少】種為佳。前 述水溶液或水分散體之調製可使用作為金屬成份之供給源 之化合物。舉例言之,可使用金屬鹽、金屬氧化物、金屬 氩氧化物等。該等皆可使用水可溶性(水溶性)或水難溶性之 金屬化合物,而在本發明中,特別較適於使用水溶性之金 屬化合物。 又,處理液中之金屬成份之濃度可按使用之金屬成份 之種類、反應條件等適宜設定,通常以〇·〇3〜〇.35g/mL為佳。 前述反應亦可根據眾所皆知之濕式反應方法來施行, 舉例言之,可採用浸潰於處理液之方法、以噴霧等塗佈處 理液之方法等任一者。特別是在本發明中,以使用處理液, 以水熱合成反應來施行為佳。水熱合成反應之條件自身根 據眾所皆知之方法即可,特別以下述方法施行為佳。即, 該水熱合成反應宜採用下述方法,前述方法係包含使丨)金 屬製模具母材表面或2)預先形成於其模具母材上之金屬質 層表面’與混合金屬鹽、鹼及水而形成之處理液接觸,並 於此已接觸狀態下,在100〜200。(:之飽和水蒸氣以上之環境 下,進行熱處理之步驟。 24 201210789 在上述水熱合成反應,處理液以使用混合金屬鹽、鹼 及水而成者為佳。混合方法未特別限定,其摻合順序亦未 限制。 金屬鹽可使用無機酸鹽及有機酸鹽之至少丨種。無機酸 鹽可使用硫酸鹽、碳酸鹽、氯化物等。又,有機酸鹽可使 用醋酸鹽、草酸鹽等。 又’鹼未特別限定,可使用氫氧化鈉、氫氧化鉀、氨 等之至少1種。 處理液亦可為金屬鹽或鹼溶解於水,或者溶解一部份 者。又亦可為金屬鹽或鹼不溶解而分散者(懸浮液(水分散 體))。此時之金料之處理液巾之含有量亦可㈣使用之金 屬鹽之_等,—般膚3〜G.35g/mL為佳ϋ亦根據 使用之鹼之種類等,一般以〇〇5〜〇 18g/mL為佳。 又,在本發明中,亦可在還原劑之存在下施行與處理 液之反應。藉還原劑之使用,在反應系統中抑制乃至防止3 價鐵離子之生成,藉此,可更確實地形成優異之隔熱膜。 因而,還原劑只要為可抑制乃至防止3價鐵離子之生成者, 未限定,可從眾所皆知之還原劑適宜選定。舉例言之可 適於使用如抗壞血酸、氫醌類等為人所知作為抗氧化劑之 化合物。在本發明中,宜使處理液含有還原劑(特別是使還 原劑溶解於處理液中)。 在本發明中,使處理液接觸收屬製模具母材表面或 2)預先形成於該模具母材上之金屬質層表面。#,給予要 形成隔Μ之區域處理液。給予之方法未特別㈣,可根 25 201210789 # = μ、塗料眾所皆知之方法來施行。處理液之使 用『/、要給'^足以形成預定隔熱層之量即可。因而,在本 發明中’可適於採㈣要形成隔熱層之部位浸潰於處理液 之方法。 ” 液反應時之條件只要為可生成肥粒體之條件, tni 。特财進行水熱合敍應作為與處理液之反 應=其溫度及壓力條件以在⑽〜·。c(特別是ιι〇〜·。c) =°水錢㈣上之環境下進行熱處 溫度、壓力下進行熱處理,可杯/此種 度、壓力條杜一 、於形成預疋隔熱層。此溫 奘、3又疋可使用高壓釜裝置(密閉系統)等眾所皆 知之裝置來進行。 吓白 又’與處理液反應之時間(水熱合成反應之反應時 可按鳩熱層之厚料,射觀。即,使反應持續至 瓜成月’j述㈣之厚度之隔熱膜為止即可,而為以所期之厚 度獲得均-厚度之隔熱膜,為水熱合成反應時,可以反^ 進行通常2〜12小時之範圍内之反應複數次之方法形成。 在本發明之製造方法中,由於以形成前述L所述之肥 粒體料隔熱層為佳,故宜㈣⑽、金屬作為前述金屬製 母材或金屬㈣。藉使齡金屬表面與處職反應(特別是 水熱合成反應)’可適於形成作為隔熱層之肥粒體層。舉例 言之,生成鐵系肥粒體(前述χ=〇時),根據本發明之水熱人 成反應’可經由下述階段1)〜2),從鐵生成肥粒體。 Q l)Fe2+ + 0H、Fe(0H)2、2)Fe(〇H)2—Fe304 本發明之製造方法之實施態樣按其層結構,有各種變 26 201210789 異,該等皆包含在本發明内。 舉例言之,為水熱合成反應(或平常之濕式反應)時,有 下述方法等,該等皆包含在本發明之製造方法内,下述方 法係1)具有以水熱合成反應(濕式反應)於金屬製模具母材 之上層形成隔熱膜之步驟、於隔熱膜之表面上以濺鍍法形 成種晶層之步驟及接觸種晶層上而以鍍覆法形成金屬被膜 層之步驟;2)具有以鍍覆法或濺鍍法於金屬製模具母材之 上層形成隔熱膜基底層之步驟、以水熱合成反應(濕式反應) 於隔熱膜基底層之表面上形成隔熱膜之步驟、以濺鍍法於 隔熱膜之表面上形成種晶層之步驟、及接觸種晶層上而以 鍍覆法形成金屬被膜層之步驟;3)具有以鍍覆法或濺鍍法 於金屬製模具母材之上層形成隔熱膜基底層之步驟、以水 ' 熱合成反應(濕式反應)於隔熱膜基底層上形成隔熱膜之步 驟、接觸隔熱膜之上面而以電鍍法或濺鍍法形成金屬被膜 層之基底密著膜的步驟、及接觸金屬被膜層之基底膜之上 面而以鍍覆法形成金屬被膜層的步驟。 實施例 於以下顯示實施例,更具體地說明本發明之特徵。惟, 本發明之範圍不限於實施例。 第1實施例 於第26圖顯示本實施例之隔熱模具之層結構的截面 圖。隔熱模具1001係用於具有精密之細微加工形狀之樹脂 製零件之成型加工的模具。此使用具有高熱傳導性之純銅 作為模具母材之材料,並具有以下所示之層結構。即,於 27 201210789 下述模具母材1002之表面上使用硫酸鐵鍍浴,配置以膜厚 3μηι之鐵膜形成之隔熱膜基底層1〇〇3,前述模具母材係具 有咼度2.5mm之帽詹狀部份(直徑25.0mm),且自底面起之高 度為15.0mm ’直徑2〇.〇mm者,進一步,於該隔熱膜基底層 上形成由厚度50/im之鐵系肥粒體(即,尖晶石型氧化鐵) 構成之隔熱膜1004,然後於其上配置由鈀之觸媒微粒子膜 構成之種晶層1005,再於其上形成有金屬被膜層1〇〇8。此 金屬被膜層1008係由由鎳構成之基底鍍膜ι〇〇6(厚度 1 #m)、進一步形成於其上之非晶質鎳磷合金膜構成之細微 加工金屬膜1007(平均厚度6/zm)構成。此細微加工金屬膜 1007之成形面側形成為以機械加工形成有最大深度3"m之 成型零件之加壓成型用細微圖形的精密加工表面1〇〇7a。 根據上述結構’藉使用為熱導率低之金屬氧化物(尖晶 矽型氧化鐵)’且具有氣孔之氧化物材料作為隔熱層,可進 行具有細微圖形之良好之樹脂成型。換言之,如在習知技 術所見’在金屬製模具之成形面上成形之高溫之熔融樹脂 之熱通過模具基材而n結果,可有效地避免因該樹脂 於成形中溫度降低至必要以上而引起之繼成形的不良。 於第27圖顯7F本發明隔熱模具1〇〇1之製造步驟例。於 模具母材1G G 2之成形面側之表面使用硫酸鐵鍵浴 ,形成由 厚度3/zm之鐵膜構成之隔熱膜基底層1〇〇3(第27圖〇))。接 著,於此表面上形成厚度之由尖晶石魏化鐵構成之 隔熱膜1_(第27圖(2))。隔熱膜麵如以下進行而形成。 即’將在氮氣中蒸館而製作之水6Qml溶解有41 7g之硫酸亞 28 201210789 ;g之氩氧化鈉(NaOH)水溶 將上述懸浮液放入内容積 鐵(?68〇4.7112〇)之水溶液與21.6 液60ml混合,而製作了懸浮液。; 2編之㈣鋼製高壓統應容Μ,將形柄隔熱基底層 1003之模具母材浸潰於其中,並使心具予㈣持。將模It is possible to form a finely processed M-long film on the metal-plated film of the second metal film. By adopting such a structure, the joint strength between the heat insulating layer and the metal bead can be further improved. The thickness of the metal coating film in the mold of the present invention (in the case of a multilayer structure, the total thickness of each layer) is not particularly limited, but is usually about 20 to 300 / zm, and particularly preferably 5 to 15 inches. The thickness of each layer in the multilayer structure may be appropriately set in accordance with the number of layers, the material of each layer, and the like. Insulating layer The heat insulating layer (also referred to as "heat insulating film") of the mold of the present invention is formed between a metal, a base material, and a metal film constituting a forming surface. Thereby, it is possible to effectively suppress or prevent the phenomenon that the molten molding material has a rapid and rapid take-up of the metal mold base material. In the present invention, the heat insulating layer is composed of a porous body formed by connecting crystal particles of the fat granules into a three-dimensional network. The material of the heat insulating material is also particularly made of a metal granule, whereby a higher heat insulating property can be obtained, and the high adhesion of the metal mold or the metal layer to the base thereof can be exerted. . The structure of the porous body is formed by connecting the crystal particles of the granules into a three-dimensional mesh 201210789. For example, as shown in Fig. 42, a plurality of crystal particles having a polyhedral shape having one or two or more corner portions which are not circular are connected to each other to form a porous body from a three-dimensional network structure. Further, as shown in Fig. 42, it is preferable that a continuous hole is formed in the porous body. The crystal particles of the fat granules may be double crystals or may be a plurality of crystal linkers. Further, it is preferable that the crystal particles constituting the porous structure of the porous structure have a spinel crystal structure. In the present invention, it is preferable that the fertilizer granule has at least one of the following general formulas AxFe3_x04 (wherein A represents a metal which can be substituted with the Fe site constituting the crystal of the spinel type iron oxide, and X satisfies 〇Sx <l.). A compound represented by a spinel crystal structure. Since the aforementioned X system is 0$χ<1, it may include not only x = 0, that is, an iron-based fertilizer body (i.e., spinel-type iron oxide Fe304), but also a part of the Fe site. The composition of other metal element substitutions. As described above, the above-mentioned A is not limited to at least one metal element which can be substituted with the Fe site constituting the crystal of the spinel-type iron oxide, and particularly, Ca, Ζη, Μη, Al, Cr, Li, and Mg are used. At least one of them is preferred. Therefore, in the present invention, at least one of the components A, Ca, Ζη, Μη, A, Cr, Li, and Mg may be used. Such a composition itself is well known, for example, Ca〇.5Fe2.5〇4, ZnFe2〇4, MnFe2〇4, AlFe2〇4, CrFe2〇4, Lio.5Fe2.5O4, At least one of MgFe2〇4 or the like is taken as an example. The thermal expansion coefficient of the heat insulating layer is not particularly limited, and since the metal mold is used under conditions in which the temperature rise and fall are too large and severe, the thermal expansion coefficient of the heat insulating layer is closer to the value of the thermal expansion rate of the metal mold. The better the durability. Therefore, the thermal expansion coefficient of the heat insulating layer is particularly high for gold used at a temperature of 200 ° C or higher; 201210789 South forming temperature; and when the metal is > 1 mold, it is preferably within a range of 90 to 110% of the thermal expansion rate of the extinguishing device. The porosity of the heat insulating layer is not limited, and from the viewpoint of achieving higher heat insulating performance, it is usually about 5 to 75%, and particularly preferably 4 to 15 inches. The porosity can be controlled particularly by synthesis conditions such as synthesis temperature and raw material concentration. The method of mosquitoes of the porosity in the present invention is a method according to the examples described later. Further, the hardness of the heat insulating layer may be appropriately set depending on the type of the material to be formed, and the Vickers hardness (average value) is preferably Hvl30 to Hv560, particularly preferably Hv200 to Hv400. Further, in the present invention, the metal oxide preferably has electrical conductivity. When a thermally conductive layer having conductivity is formed, a base plating layer for forming a finely processed metal coating layer on which a forming surface is formed is formed on the heat insulating layer by electroplating. Thereby, the base plating layer can be formed relatively easily. In this case, the conductivity of the oxide constituting the heat insulating layer is not particularly limited, and the conductivity at 25 ° C is usually 40 S/m or more. The content of the metal oxide in the heat insulating layer is preferably from a viewpoint of heat insulating properties and adhesion, and is preferably 90% by weight or more in the heat insulating layer, and 98% by weight. The above is especially good. Further, the thickness of the heat insulating layer may be appropriately set depending on the type of the molding material to be used, the heat insulating property expected, and the like, and it is generally set within a range of 15 # m or more. In particular, it is preferably 15 to 1 〇〇〇//m. Further, it is preferably 30 to 150 μm. By setting the thickness of the heat insulating layer within the above range, the mold shape (substrate surface) as the base can be more effectively drawn with a uniform film thickness. 20 201210789 The heat insulating layer of the present invention may be suitably used by using the surface of the 1) metal mold base material or 2) the surface of the metal layer previously formed on the surface of the mold base material and the aqueous solution or water dispersion containing the metal component. The body (hereinafter also referred to as "treatment liquid".) The reaction (wet reaction, especially hydrothermal synthesis reaction) is produced. In this way, it is possible to maintain the standard heat insulating properties equivalent to the heat insulating layer of the conventional article, and to exhibit excellent film thickness uniformity, such as adhesion, and as a result, it is possible to accurately reproduce (depice) the substrate as a base. The effect of the mold shape (concave shape). The reaction with the treatment liquid can also be carried out under the conditions of a well-known wet reaction (hydrothermal synthesis reaction). Preferably, it may be carried out according to the method described in the following 2. Metallic layer The heat insulating layer of the mold of the present invention may be directly formed on the surface of the metal mold base material, or the metal layer (heat insulating film base layer) may be used as a base layer of the heat insulating layer. In this case, the metal layer is preferably formed by contacting both the surface of the metal mold base material and the heat insulating layer. Further, the composition of the metal layer is not particularly limited as long as it is composed of a metal, and a metal exemplified in the metal film can be used. In the present invention, it is particularly preferable to contain a metal element constituting a composition of the heat insulating layer. g卩, since the heat insulating layer of the present invention can be suitably formed by a hydrothermal synthesis reaction, the surface of the metal layer as a substrate can be dissolved, and the surface layer is formed on the surface of the metal layer to form a heat insulating layer. The core, and using this as a core, forms a homogeneous and tightly sealed insulation layer. Therefore, when the heat insulating film is formed into a ferrite layer of iron oxide, it is preferable to have a metal layer containing metal iron (particularly, a metal iron structure layer). 21 201210789 In the present invention, the metal layer may be composed of a single layer or a plurality of layers. For example, the metal layer may be 1) a metal layer composed of a seed layer and a metal plating film, 2) a metal layer composed of one or more metal plating films, or the like. Therefore, the formation of the metal material may be carried out in accordance with the structure of the metal layer, etc., and the film formation method exemplified in the formation of the metal beryllium is suitably employed. For example, a method comprising the steps of: forming a surface of a metal mold base material into a layer of aa of a metal mold base material and forming a metal plating film by a plating method on the seed layer; 2) A method of forming a metal plating film by a plating method on the surface of a metal mold base material. The thickness of the metal layer may be appropriately determined according to the type of the metal element constituting the metal layer, the thickness of the heat insulating layer, and the like, and is usually in the range of about 1 to 5 " m. Molding material The material (molding material) for which the heat insulating mold of the present invention is applied is not limited, and is particularly suitable for a wire containing a component of a component (a resin containing a resin component as a main component). It is also suitable for resin molding. Resin component (special; I: synthetic resin) can be polyethylene, polypropylene, polystyrene, polyethylene, polydecyl decyl acid, polyamine, polycarbonate, ABS resin A thermoplastic resin such as ruthenic acid oxalic acid or polytetraethylene is also preferable as a polycyclic ring. Other ingredients may also be included in the above composition as needed. Use of Insulating Mold The insulating mold of the present invention can be used in the same manner as the well-known or commercially available molds 22 201210789. Further, the molding conditions and the like at the time of molding using a mold can be carried out according to a well-known method. When molding using the mold of the present invention, the mold of the present invention can be used as part or all of the molding space constituting the mold. For example, at least one of the fixed mold and the movable mold can be formed by injection molding by forming a molding space formed by fixing the mold and the movable mold into two molds. Further, only part or all of the commercially available mold (forming apparatus) may be replaced with the mold of the present invention. The molding of the mold of the present invention may also be carried out. Fig. 25 is a view showing an example of a step of forming a mold using the mold of the present invention as a movable mold in a mold composed of a fixed mold and a movable mold. In Fig. 25, the molding apparatus can use a mold composed of a fixed mold 3〇1 and a movable mold 401. After the resin r is injected in a molten state and introduced into a space (forming space) between the fixed mold and the movable mold, the resin ruler is cooled while maintaining the pressure as shown in the drawing. Thereafter, the movable mold 4〇1 is lowered, and the mold is released after the mold is released. At this time, the movable mold 401 employs the mold of the present invention, and the forming surface of the mold of the present invention is preliminarily J-shaped. Then, with the heat insulating layer of the mold of the present invention, even when the molten resin is injected and introduced into the forming space of the mold, the heat of the molten resin is not rushed to the mold, and the molten resin can be applied without any dead angle. The unevenness or the groove portion of the molding surface is obtained, and as a result, the shape can be faithfully transferred to the resin side. Thereby, a molded article in which a fine shape is accurately reproduced can be obtained. 2. Method of Manufacturing Insulating Mold The mold of the present invention can be particularly suitably produced by the following method. That is, it is suitable to employ a method of manufacturing a mold having a heat insulating layer between a metal mold base material and a metal film constituting a molding surface, and the step of forming the heat insulation layer has the following steps.丨) The surface of the metal mold base material or 2) The surface of the metal layer previously formed on the surface of the mold base material reacts with an aqueous solution or a water dispersion (treatment liquid) containing a metal component to form a metal oxide. The above treatment liquid may be suitably used in the form of an aqueous solution containing a metal component or a moisture dispersion. The metal component may be a component which can constitute a fat granule structure, and particularly preferably Fe, Ca, Zn, Mn, A, Cr, and at least one of them. The preparation of the aqueous solution or the aqueous dispersion described above can be carried out using a compound as a supply source of the metal component. For example, a metal salt, a metal oxide, a metal argon oxide or the like can be used. All of these may be water-soluble (water-soluble) or water-insoluble metal compounds, and in the present invention, it is particularly preferable to use a water-soluble metal compound. Further, the concentration of the metal component in the treatment liquid can be appropriately set depending on the type of the metal component to be used, the reaction conditions, etc., and is usually preferably 〇·〇3 to 3535 g/mL. The above reaction can also be carried out according to a well-known wet reaction method. For example, any one of a method of immersing in a treatment liquid, a method of coating a treatment liquid by spraying, or the like can be employed. In particular, in the present invention, it is preferable to use a treatment liquid to perform a hydrothermal synthesis reaction. The conditions of the hydrothermal synthesis reaction are themselves well known in the art, and in particular, the following methods are preferred. That is, the hydrothermal synthesis reaction preferably employs a method comprising: coating the surface of the metal base material of the metal mold or 2) the surface of the metal layer previously formed on the mold base material thereof with a mixed metal salt, an alkali and The treatment liquid formed by the contact of water is in contact with the state at 100 to 200. (: The step of heat treatment in an environment of saturated steam or more. 24 201210789 In the hydrothermal synthesis reaction described above, it is preferred to use a mixed metal salt, a base, and water in the hydrothermal synthesis reaction. The mixing method is not particularly limited, and the mixing method is not particularly limited. The order of the metal salt may be at least one of a mineral acid salt and an organic acid salt. The inorganic acid salt may be a sulfate, a carbonate, a chloride, etc. Further, the organic acid salt may be an acetate or an oxalate. Further, the 'base is not particularly limited, and at least one of sodium hydroxide, potassium hydroxide, ammonia, etc. may be used. The treatment liquid may be a metal salt or an alkali dissolved in water, or a part of it may be dissolved. Metal salt or alkali is insoluble and dispersible (suspension (water dispersion)). At this time, the content of the treatment liquid towel of the gold material can also be (4) the metal salt used, etc., - the average skin 3~G.35g The /mL is preferably also 〇〇5 to 〇18 g/mL depending on the type of the base to be used, etc. Further, in the present invention, the reaction with the treatment liquid may be carried out in the presence of a reducing agent. Use of reducing agent to inhibit or even prevent 3 in the reaction system The formation of iron ions can form an excellent heat-insulating film more reliably. Therefore, the reducing agent is not limited as long as it can suppress or prevent the formation of trivalent iron ions, and the reducing agent can be appropriately selected. For example, it may be suitably used as a compound known as an ascorbic acid, hydroquinone or the like as an antioxidant. In the present invention, it is preferred that the treatment liquid contains a reducing agent (particularly, a reducing agent is dissolved in the treatment liquid). In the present invention, the treatment liquid is brought into contact with the surface of the base material of the mold base or 2) the surface of the metal layer previously formed on the mold base material. #, Give the treatment liquid to form the barrier. The method of giving is not particularly (four), can be carried out according to the method known in the paint. The use of the treatment liquid "/, to give '^ is sufficient to form a predetermined amount of insulation layer. Therefore, in the present invention, it is suitable for the method of immersing the portion where the heat insulating layer is to be formed in the treatment liquid. The conditions for the liquid reaction are as long as the conditions for the formation of the fertilizer granules, tni. The hydrothermal combination of the special funds should be used as the reaction with the treatment liquid = the temperature and pressure conditions are at (10) ~ · · c (especially ιι〇 ~·.c) = ° water money (four) in the environment under the heat of the temperature, pressure heat treatment, cup / such degree, pressure strip Du Yi, in the formation of pre-heat insulation layer. This warm, 3 again疋 It can be carried out using a well-known device such as an autoclave device (closed system). The whitening and the time of reaction with the treatment liquid (the reaction of the hydrothermal synthesis reaction can be carried out according to the thick material of the hot layer. That is, the reaction may be continued until the heat-insulating film of the thickness of the moon is described, and the heat-sensitive film of the uniform thickness is obtained for the desired thickness, and the hydrothermal synthesis reaction may be carried out. Usually, the method of forming a plurality of times in the range of 2 to 12 hours is formed. In the manufacturing method of the present invention, since it is preferable to form the heat insulating layer of the fat body material described in the above L, it is preferable to use (4) (10) and metal as the metal. Base metal or metal (4). By reacting the surface of the aged metal with the job (especially The thermal synthesis reaction can be adapted to form a fertilizer granule layer as a heat insulating layer. For example, when iron-based fertilizer granules are formed (the foregoing χ=〇), the hydrothermal artificial reaction according to the present invention can be Stages 1) to 2), producing fertilizer granules from iron. Q l) Fe2+ + 0H, Fe(0H)2, 2) Fe(〇H)2-Fe304 The embodiment of the manufacturing method of the present invention according to its layer structure There are various variations 26 201210789, and these are all included in the present invention. For example, in the case of a hydrothermal synthesis reaction (or a usual wet reaction), there are the following methods, etc., which are all included in the present invention. In the manufacturing method, the following method 1) has a step of forming a heat insulating film on the upper layer of a metal mold base material by a hydrothermal synthesis reaction (wet reaction), and forming a seed crystal by sputtering on the surface of the heat insulating film. a step of forming a metal film layer by a plating method on the step of contacting the seed layer; 2) a step of forming a base layer of the heat insulating film on the upper layer of the metal mold base material by a plating method or a sputtering method, Hydrothermal synthesis reaction (wet reaction) step of forming a heat insulation film on the surface of the base layer of the heat insulation film, a step of forming a seed layer on the surface of the heat insulating film, and a step of contacting the seed layer to form a metal film layer by plating; 3) having a metal mold by plating or sputtering a step of forming a base layer of the heat insulating film on the upper layer of the material, a step of forming a heat insulating film on the base layer of the heat insulating film by a water 'thermal synthesis reaction (wet reaction), contacting the upper surface of the heat insulating film by electroplating or sputtering The step of forming a base adhesion film of the metal coating layer and the step of contacting the upper surface of the base film of the metal coating layer to form a metal coating layer by a plating method. EXAMPLES Hereinafter, the present invention will be described, and the present invention will be more specifically described. However, the scope of the present invention is not limited to the embodiment. The first embodiment shows a sectional view of the layer structure of the heat insulating mold of the present embodiment in Fig. 26. The heat insulating mold 1001 is used for a fine micromachined shape. A mold for forming a resin part. This uses pure copper having high thermal conductivity as a material for the mold base material and has the layer structure shown below. That is, on the surface of the mold base material 1002 described below, an iron sulfate plating bath is used, and a heat insulating film base layer 1〇〇3 formed of an iron film having a thickness of 3 μm is disposed on the surface of the mold base material 1002, and the mold base material has a twist of 2.5 mm. The hat-like part (diameter 25.0mm), and the height from the bottom surface is 15.0mm 'diameter 2〇.〇mm, further, the iron-based fertilizer with a thickness of 50/im is formed on the base layer of the thermal insulation film. A heat insulating film 1004 composed of granules (i.e., spinel type iron oxide) is then provided with a seed layer 1005 composed of a catalyst film of palladium, and a metal film layer 1 is formed thereon. 8. The metal film layer 1008 is a finely processed metal film 1007 composed of a base plating film made of nickel (thickness 1 #m) and an amorphous nickel-phosphorus alloy film further formed thereon (average thickness 6/zm) ) constitutes. The forming surface side of the finely machined metal film 1007 is formed as a precision machined surface 1?7a which is formed by machining a fine pattern for press forming of a molded part having a maximum depth of 3" m. According to the above structure, by using a metal oxide (spinel-type iron oxide) having a low thermal conductivity and an oxide material having pores as a heat insulating layer, good resin molding having a fine pattern can be performed. In other words, as seen in the prior art, the heat of the molten resin of the high temperature formed on the forming surface of the metal mold passes through the mold base material, and as a result, it is possible to effectively prevent the temperature of the resin from being lowered to more than necessary during the molding. The formation is not good. Fig. 27 shows an example of a manufacturing procedure of the heat insulating mold 1〇〇1 of the present invention. On the surface of the molding surface side of the mold base material 1G G 2 , an iron sulfate bond bath was used to form a heat insulating film base layer 1〇〇3 (Fig. 27) composed of an iron film having a thickness of 3/zm. Then, a heat-insulating film 1_ (Fig. 27 (2)) composed of spinel-treated iron is formed on the surface. The heat insulating film surface was formed as follows. That is, '6Qml of water prepared by steaming in a nitrogen atmosphere is dissolved in 41 7g of sulfuric acid 28 201210789; g of sodium argon oxide (NaOH) is dissolved in water to put the above suspension into an aqueous solution of internal iron (?68〇4.7112〇) It was mixed with 60 ml of 21.6 liquid to prepare a suspension. 2 (4) Steel high-pressure system should be allowed to contain, the mold base material of the insulating base layer 1003 is immersed in it, and the heart is given to (4). Mode
行。藉從外部將此高壓爸反應容器加熱,以丨耽反應10小 時。反應後,將模具母材連同夾具一起取出,且為將其與 同時生成之反應殘渣之粉體化合物分離,而充分水洗。高 壓爸反應容器也同樣地為去取所生成之反應殘渣,而將内 邛水洗再度摻合與上述同量之懸浮液,再將模具母材連 同夾具一起安裝,同樣地,以150°c反應10小時,而形成了 膜厚50#m之隔熱膜1〇〇4。 如此進行,將形成有隔熱膜1〇〇4之模具水洗,使其充 分乾燥後’使用安裝有鈀靶材之直流濺鍍裝置,於隔熱膜 1004之表面形成鈀微粒子膜,藉此,形成了種晶層1005(第 27圖(3)) °接著’以無電電鑛鎳法,被覆由厚度1/zm之鎳 膜構成之基底鍍膜1〇〇6。進一步,以無電電鍍鎳法形成由 厚度6 # m之精密加工用鍍鎳磷合金膜構成之細微加工金屬 膜1007 ’藉此’製作金屬被膜層1008,以200°C進行熱處理 3小時(第27圖(4))。之後使用精密切削加工機,形成精密 加工表面l〇〇7a,而獲得了細微加工模具用隔熱模具 1001(第 27 圖(5))。 此外’由形成於模具母材1002之表面上之鐵膜構成之 29 201210789 隔熱膜基底層1003之形成方法在本實施例中,記述了以鍵 覆法所作之方法之例,隔熱膜之基底只要為在隔熱膜之正 下方由形成該隔熱膜之金屬元素構成之金屬膜即可。又, 該金屬膜之形成方法非限於記載於本實施例之鍍覆法者。 舉例言之,亦可為將此鐵膜直接以濺鍍法形成於模具母材 之表面之方法。 根據上述步驟’本發明之隔熱膜與將習知氧化锆熔射 膜用於隔熱膜之模具不同’不需精密磨削加工等後加工, 而可於金屬模具之成形面側直接形成所期之厚度。 關於隔熱膜1004,為確認是否形成了所期材質之膜, 另外準備與模具母材1002相同之材質(純銅)之長方形基板 (大小.長50mm、寬20mm、厚度2.0mm),使用此基板,形 成了隔熱膜。將所得之試樣作為隔熱膜A,詳細地評價材 料。以下記述隔熱膜A之製作方法。首先,與製作上述隔熱 模具1001之步驟(第27圖)同樣地進行,而於此基板之表面上 形成了同樣之隔熱膜基底層。之後,與隔熱模具1〇〇1之隔 熱膜1004同樣地,使用以相同之混合比調製了相同原料之 相同組成的懸浮液,使用相同之高壓釜反應容器,以為相 同之水熱合成條件之150°C再反覆進行5次1 〇小時之反應 (總共6次之反覆),而製作了膜厚15〇以爪之隔熱膜A。在此, 形成膜厚厚至用在模具以上之膜之理由係為了除了界定隔 熱膜之材料所需之組成及結晶構造外,還要以相同之試樣 同時評價後述孔隙率及維氏硬度。 如此進行而形成於基板上之膜係黑色膜。關於該膜, 30 201210789 使用螢光x射線裝置,調查了組成。結果,可知為金屬離子 僅由鐵構成之組成之化合物。進一步,以乂射線繞射分析, 調查了結晶構造。結果,可知晶格常數%=8 4〇入之尖晶石 型氧化鐵(=鐵肥粒體),為FqOc即,可確認隔熱膜1〇〇4 為尖晶石型氧化鐵。於第28圖顯示其乂射線繞射圖形。又, 於第41圖顯示隔熱膜a之膜形成後之表面之掃瞄式電子顯 微鏡像。可知形成下述膜構造,前述膜構造係角尖銳,大 小不同之結晶粒子連接,呈現三維之網眼構造之形態者。 再者,更仔細觀察,可知形成為可看到雙晶結日日日之結晶粒 連續成長成三維之膜及形成為於該膜内部存在無數氣孔之 構造之多孔質膜。 屬於以鐵為主成份之氧化物之一種的肥粒體陶瓷材料 為易切削加工等機械加工成複雜之形狀之材料,係進行細 微加工而作為磁頭之磁心材料來使用之材料。 本發明之隔熱膜係具有與上述肥粒體陶瓷材料相同之 尖晶石型結晶構造之鐵系肥粒體材料,係較易機械加工之 材料。是故,關於在本實施例所形成之隔熱膜A,從表面逐 漸研磨較深時,以掃瞄式電子顯微鏡觀察該獏試樣時,可 知,在隔熱膜,皆於膜表面不僅存在開放之氣孔,還存在 許多封閉之氣孔。是故,於形成隔熱膜錢,以表面研磨形 成平滑之表面,並以測定氣孔之凹部份對包含以研磨形成 之氣孔的平滑表面全體之存在比例的簡易方法測定孔隙 率。 首先,具有進行孔隙率測定所需之平滑之研磨表面的 31 201210789Row. The high pressure dad reaction vessel was heated from the outside to react for 10 hours. After the reaction, the mold base material was taken out together with the jig, and it was sufficiently washed with water to separate it from the powder compound of the reaction residue formed at the same time. The high-pressure dad reaction vessel is also used to remove the generated reaction residue, and the inner water is washed again and mixed with the same amount of the above suspension, and then the mold base material is installed together with the jig, and similarly, the reaction is carried out at 150 ° C. After 10 hours, a heat-insulating film 1〇〇4 having a film thickness of 50#m was formed. In this manner, the mold in which the heat insulating film 1〇〇4 is formed is washed with water and sufficiently dried, and a palladium particle film is formed on the surface of the heat insulating film 1004 by using a DC sputtering device to which a palladium target is attached. The seed layer 1005 is formed (Fig. 27 (3)). Then, the base plating film 1〇〇6 composed of a nickel film having a thickness of 1/zm is coated by an electroless nickel plating method. Further, a fine-worked metal film 1007 composed of a nickel-phosphorus alloy film for precision machining having a thickness of 6 #m is formed by electroless nickel plating, thereby forming a metal film layer 1008, and heat-treating at 200 ° C for 3 hours ( 27 (4)). Then, using a precision cutting machine to form a precision machined surface l〇〇7a, a heat insulating mold 1001 for a micromachining mold was obtained (Fig. 27 (5)). Further, 'the method of forming the insulating film base layer 1003 from the iron film formed on the surface of the mold base material 1002. In the present embodiment, an example of the method by the keying method is described. The substrate may be a metal film composed of a metal element forming the heat-insulating film directly under the heat-insulating film. Moreover, the method of forming the metal film is not limited to those described in the plating method of the present embodiment. For example, the iron film may be directly formed on the surface of the mold base material by sputtering. According to the above steps, the heat-insulating film of the present invention is different from the mold in which the conventional zirconia spray film is used for the heat-insulating film. It is not required to be subjected to post-processing such as precision grinding, and can be directly formed on the forming surface side of the metal mold. The thickness of the period. In the heat-insulating film 1004, in order to confirm whether or not a film of the desired material is formed, a rectangular substrate (size: length 50 mm, width 20 mm, thickness 2.0 mm) of the same material (pure copper) as the mold base material 1002 is prepared, and the substrate is used. , a thermal insulation film is formed. The obtained sample was used as the heat insulating film A, and the material was evaluated in detail. The method of producing the heat insulating film A will be described below. First, in the same manner as the step of producing the above-described heat insulating mold 1001 (Fig. 27), the same heat insulating film underlayer is formed on the surface of the substrate. Thereafter, similarly to the heat insulating film 1004 of the heat insulating mold 1〇〇1, the same autoclave reaction vessel was used in the same composition in which the same composition was prepared, and the same hydrothermal synthesis conditions were used. The reaction was repeated at 150 ° C for 5 times for 1 hour (repeated 6 times in total), and a heat-insulating film A having a film thickness of 15 inches was prepared. Here, the reason why the film thickness is formed to be larger than the film is to evaluate the porosity and Vickers hardness which are described later in the same sample in addition to the composition and crystal structure required for the material defining the film. . The film-based black film formed on the substrate was thus carried out. About the film, 30 201210789 The composition was investigated using a fluorescent x-ray device. As a result, it is known that the metal ion is composed of only a compound composed of iron. Further, the crystal structure was investigated by ray diffraction analysis. As a result, it was found that the crystal lattice constant % = 8 4 of the spinel-type iron oxide (= iron fertilizer granule), and FqOc, that is, the heat-insulating film 1 〇〇 4 was confirmed to be spinel-type iron oxide. The ray diffraction pattern is shown in Fig. 28. Further, in Fig. 41, a scanning electron microscopic image of the surface after the formation of the film of the heat insulating film a is shown. It is understood that the film structure is formed such that the film structure is sharp and the crystal particles having different sizes are connected, and the three-dimensional mesh structure is formed. Further, as a result of further observation, it was found that a crystal film in which the crystal grains of the twin crystal day and day were continuously grown into a three-dimensional film and a porous film having a structure in which numerous pores exist inside the film were formed. A granular granule ceramic material which is a type of oxide containing iron as a material which is machined into a complicated shape such as a free-cutting process, and is a material which is used as a core material of a magnetic head by fine processing. The heat insulating film of the present invention is an iron-based fertilizer granular material having the same spinel crystal structure as the above-mentioned fat-granular ceramic material, and is a material which is easy to be machined. Therefore, when the heat-insulating film A formed in the present embodiment is gradually polished from the surface and observed by a scanning electron microscope, it is understood that the heat-insulating film is present on the film surface. Open pores, there are also many closed pores. Therefore, in forming the heat insulating film, a smooth surface is formed by surface grinding, and the porosity is measured by a simple method of measuring the ratio of the concave portion of the pore to the entire smooth surface including the pores formed by the polishing. First, with a smooth polished surface required for porosity measurement 31 201210789
試樣如下進行而製作。使用第1000號之研磨片,將隔熱膜A 之表面從膜表面進行粗研磨加工至30〜5〇 β m左右之深 度。接著,使用由氧化鋁微粉體之研磨材構成之第4〇〇〇號 拋光薄骐片,以手研磨此粗研磨面,製作了具有測定孔隙 率用研磨表面之試樣。 接著,關於此隔熱膜A,為抽出孔隙率之測定區域,以 掃瞄式電子顯微鏡(SEM)觀察其平滑研磨表面,從試樣表面 全體之大範圍中抽出4處表面粗糙度之程度在其試樣全體 看來平岣之一邊15〇"〇1之正方形區域。 對以SEM觀察所抽出之4處之各正方形區域如第4〇(勾 圖所示,利用使用雷射顯微鏡之非接觸表面粗糙度量測之 方法’分別進行長150"m、寬150/zm之正方形區域之深度 方向的凹凸雜之測定。糾之雷射賴鏡之倍率為2_ 倍。接著,裁減正方形區域之上側橫邊(長度之 直線部份之截面的圖像,在所得之截面之凹凸狀之深度剖 面(第40(b)圖)中,求出自表面起至深度之凹部份之水 平方向的距離之總和對以雷射顯微鏡測定凹凸之全距 的比例(第40⑷圖),令其百分率為存在於其測定線 上之氣孔之比例,即,孔隙率pa丨。 同樣地,將長150_每隔25_,與上述正方形區域 之上側橫邊平行地’拉出連結兩端之6條直線,從該等直線 部份之截面之凹凸雜的剖面,求出對應於各直線部份之 孔隙率,將從該等7個直線部份求出之各孔隙率μ〜ρ&7之 值相加平均’作為上述正方形區域之孔隙率h。 32 201210789 關於隔熱膜A,分別求出上述4處之一邊150μηι之正方 形區域之孔隙率Pa、Pb、Pc、Pd,從該等之相加平均值算 出隔熱膜A之孔隙率P。此外,關於此孔隙率,考慮測定區 域之抽樣中之測定誤差,將其以每5%之值顯示,來作為此 隔熱膜A之孔隙率之值P。 結果,可知隔熱膜A之孔隙率為55%。於第29圖顯示如 此進行而測定了孔隙率之隔熱膜A之研磨表面的掃瞄式電 子顯微鏡像。 進一步,使用維氏硬度計,測定隔熱膜A之維氏硬度。 所使用之維氏硬度計具有正四角錐鑽石壓頭,以試驗負載 5〇g之條件測定硬度。關於用於測定之隔熱膜之試樣,為不 易受為隔熱膜基底之基材之硬度的影響,乃測定用於孔隙 率之測定之各隔熱膜試樣之膜截面。以與各孔隙率測定時 相同之方法’研磨隔熱膜之截面,將該平滑之截面作為維 氏測定用表面。於第30圖顯示此隔熱膜a之研磨截面。存在 許多可壓入測定用鑽石壓頭來評價之大小之研磨平滑面區 域,而可進行維氏硬度之測定。藉將維氏壓頭壓入至分散 存在於第30圖所示之研磨截面之表面内,由平滑之面構成 之區域之任意12處,予以評價,進行了測定。結果,以與 隔熱膜職完全相同之反應條件合成之隔熱膜A其維氏硬 度最大值為Hv407、最小值為Hvl9〇、平均值為Hv257。 _接著,藉選擇與上述孔隙率55%之隔熱膜試樣a之水熱 。成條件不同之合成條件’嘗試了具有與隔熱賴樣A不同 之孔隙率之隔熱膜試樣B的製作。 33 201210789 隔熱膜B之形成如下進行。即,將在氮氣中蒸餾而製作 之水60ml溶解有l〇.4g之硫酸亞鐵(FeS04 · 7H20)之水溶液 及與用於隔熱膜A之合成之驗性水溶液相同之水溶液21.6g 之氫氧化納(NaOH)水溶液60ml混合,而製作了懸浮液。以 此懸浮液作為起始原料’使用與隔熱膜A之合成相同之反應 容器’將形成有隔熱基底層(與隔熱模具1〇〇1之隔熱基底層 1003相同之鐵膜)之試樣基材浸潰於其中,並使用夾具予以 保持。此外’上述作業在氮氣環境中進行。藉從外部將此 高壓蚤反應容器加熱,而以140°C反應12小時。反應後,將 試樣基材連同夾具一起取出,同時,為與反應殘渣之粉體 化合物等分離,而充分水洗。高壓釜反應容器也同樣地為 去除反應殘渣而水洗内部,然後再度摻合與上述同量之懸 浮液’再次將模具母材連同夾具一起安裝,同樣地以140°c 反應12小時。藉反覆進行此操作總共8次,形成了膜厚 15〇vm之隔熱膜B。 如此進行而得之隔熱膜B也為黑色膜。就該膜,與隔熱 膜A同樣地’調查了組成與結晶構造及孔隙率。結果,隔熱 膜B也為與隔熱膜a相同之晶格常數a〇 = 8.40A之尖晶石型 氧化鐵Fe3〇4。又’此隔熱膜Β之膜形成後之表面從以掃瞄 式電子顯微鏡(SEM)所作之觀察,與隔熱膜A同樣地,形成 為角尖銳,可看見雙晶結晶之結晶粒連連續成長成三維之 膜’且形成為於該膜内部存在無數氣孔之多孔質膜。 與隔熱膜A同樣地,測定隔熱膜B之孔隙率與維氏硬 度’結果,孔隙率為40%,維氏硬度最大值為Hv435、最小 34 201210789 值為Hv239、平均值為Hv298。於第31圖顯示測定了孔隙率 之隔熱膜B之研磨表面之掃瞄式電子顯微鏡像。 隔熱性之評價 就與本發明之隔熱模具相同之層結構,評價了前述2種 隔熱膜A及隔熱膜b之隔熱性能。製作了包含隔熱犋a或B, 由相同之材料及相同之結構構成之隔熱性評價用測定試樣 1011A、1011B。於第32圖顯示配置有隔熱膜a之蜊定試樣 1011A之概略截面圖。測定試樣1〇11B僅隔熱膜之材料為隔 熱膜B之點不同,其他為與第32圖所示之結構完全相同之妹 構。測定試樣1011A如以下進行而製作。首先,準備直徑 10.0mm、長度44.0mm,且與用於本實施例隔熱模具i〇〇! 之模具母材1002相同之材質的圓棒,於其一端面之中心形 成直徑3.5mm,深度22_0mm之熱電偶安裝孔1012a,而製作 了金屬圓棒之基材1012。使用此基材1012,以與第27圖所 示之方法相同之製作方法,自位於與有熱電偶安裝孔1012a 之端面反向之位置的端面底部至30.0mm之位置形成由厚 度3//m之鐵膜構成之隔熱膜基底層1013,然後於其上形成 由厚度50 μ m之本發明之隔熱膜A構成的隔熱膜1014。接 著,於其上從有熱電安裝孔1012a之端面施行樹脂遮蔽,以 濺鍍法自端面底部起至23.0mm之位置形成由極薄之鈀之 觸媒微粒子膜構成的種晶層1015,然後於其上以無電電鍍 錄法形成由鎳構成之基底鑛膜1〇16(厚度l"m),進一步, 於其上以無電電鍍鎳法形成由厚度6" m之非晶質鎳磷合金 膜構成之鑛金屬膜1〇17’而形成由基底鑛膜1016及鑛金屬 35 201210789 膜1017構成之金屬被膜層1018。 測定試樣1011B係在第32圖所示之測定試樣1〇1 J A 中,取代由隔熱膜A構成之隔熱膜1014,而形成由隔熱 構成之隔熱膜而製作之測定試樣。 為比較隔熱性之評價,也製作了完全不具有隔熱膜< 比較試樣1211。於第33圖顯示此比較試樣之結構。準備以 與上述基材1012完全相同之材質加工成相同形狀之基材 1212,保留自端面底部至23.0mm之位置,於有熱電偶安裝 孔1212a之端面側施行樹脂遮蔽。之後,以木材觸擊電趣浴 (wood strike plating bath),形成由鍍鎳膜構成之厚度1以m 基底鍍膜1216,再於其上以無電電鍍法形成由厚度 非晶質鎳磷合金膜構成之鍍金屬膜1217,而形成了金屬被 膜層1218。如此進行,製作了測定試樣1211。 就如此進行而製作之3種測定試樣10UA、1011B、 1211,如以下進行,同時進行了隔熱性之評價。 於第34圖顯示在本實施例使用之隔熱性評價裝置21之 概略截面圖。此裝置係保持有皆由透明玻璃製燒杯構成之 之相同大小的高溫水用恆溫水槽22、冷水用恆溫水槽23及3 個測定試樣1011A、1011B、1211之硬質泡沫苯乙烯樹脂製, 由覆蓋各恆溫槽之上面,可形成為蓋之大小(正方形、大小 20cm) ’厚度5mm之隔熱板1〇24構成。於高溫水用恆溫水槽 22之下部配置有電熱加熱器25,形成為可加熱之構造。在 其旁邊’冷水用值溫水槽23以相同高度搭載配置於台26 上。於隔熱板1024以等間隔開設直徑10.〇mm之3個貫穿 36 201210789 孔,將測定試樣1011A、l〇UB、1211配置成在各自形成有 金屬被祺層之部份,自測定試樣之端面至2〇mm&隔熱板 1024露出至下部。在各測定試樣,於設在另一端面之I電 偶女裝孔安裝有熱電偶18、118、218,該等連接於各溫度 顯示計19、119、219,而形成為可顯示構成各測定試樣之 金屬圓棒之基材之溫度的結構。此外,為於溫度測定結果 減少外部氣溫之影響,在各測定試樣1〇11八、1〇nB、12丨1 , 在與熱電偶連接之上部部份,為完全遮蔽從隔熱板以之上 側露出至外部之部份,而以完全相同形狀之泡沫苯乙烯樹 脂製隔熱蓋27、28 ' 29覆蓋。於2個恆溫水槽22、23放入高 溫水及冷水來使用,以可浸泡安裝在隔熱板24之3種測定試 樣1011A、1011B、1211之自下部端面起至15mm之部份。測 定中,高溫水用恆溫水槽22使用電熱加熱器25,調整成水 溫一定,冷水用恆溫水槽23藉更換冷水,保持在一定水溫 來使用。 本發明之隔熱膜之隔熱性評價係將放置於室溫而保持 一定之3個測定試樣1011A、1011B、1211直接以安裝於隔熱 板1024之狀態同時浸泡於隔熱性評價裝置21之恆溫水槽22 之保持在95°C的高溫水,並測定其溫度上升之速度,藉此, 5周查了升溫時之隔熱效果。接著,將溫度已上升之測定試 樣1011A、1011B、1211直接以仍舊安裝於隔熱板24之狀態 同時浸泡於恆溫水槽23之保持在32°C之水,並測定其溫度 下降之速度’藉此,調查了降溫時之隔熱效果。 於第35圖顯示溫度上升之時間變化與2個測定試樣之 37 201210789 各自之溫度差之時間變化,作為關於從室溫,同時浸泡於 保持在95°C之恆溫水槽22時之溫度上升的時間變化,與不 具隔熱膜之測定試樣1211比較,設有本發明之隔熱膜之測 定試樣1011A(孔隙率55%)、ioiib(孔隙率40%)之測定結 果。於第36圖顯示將溫度已上升之測定試樣1〇11A、 1011B、1211同時浸泡於保持在32。(:之恆溫水槽時之溫度下 降之時間變化的測定結果。 從第35圖及第36圖之結果也可明瞭,可知本發明之隔 熱膜具有對外部之溫度變化,不易將熱傳遞至基材之效 果。再者,亦可知具有孔隙率越大之隔熱膜之測定試樣, 其隔熱效果越南。 第2實施例 於第1圖顯示本實施例之隔熱模具之積層結構的截面 圖。隔熱模具1係用於具有精密之細微加㈣狀之樹脂製零 件之成形加工的不鏽鋼製模具,由以下之層結構構成。即, 於下述模具母材2之表面上形成以膜厚之鐵膜形成之 隔熱膜基底層3 ’前述模具母材係具有高度2·5_之帽詹形 狀部份(直徑25.0晒),且自底面起之高度為15〇咖,直徑 讥〇醜者,然後於該隔熱膜基底層上形成厚扣―之由 鐵系肥粒體(即,尖晶石型氧化鐵)構成之隔故膜4,再於其 上配置由蚊觸媒微粒子膜構成之種晶層5,接著於立上來 =金屬被膜層8。此金屬被膜層8由㈣構叙基底賴 ^厚度2㈣、進-步形成於其上之由非晶質鎳磷合金膜構 成之細微加工金屬膜7(平均厚度一 m)構成。此細微加工 38 201210789 金屬膜7之成形面側形成為以機械加工形成有成形零件之 加壓成形用細微圖形的精密加工表面7a。 本實施例之隔熱模具之製造係與第1實施例同樣地進 行。於第2圖顯示其製造步驟例。於模具母材2之成形面側 之表面使用硫酸鐵鍍浴,形成了由厚度3//m之鐵膜構成之 隔熱膜基底層3。接著’於此表面上形成厚度之由尖 晶石型氧化鐵構成之隔熱膜4。隔熱膜4如以下進行而形 成。首先,將在氮氣中蒸餾而製作之水60ml溶解有41.7g之 硫酸亞鐵(FeS〇4.7H2〇)之水溶液與21.6g之氫氧化鈉(Na〇H) 水溶液60ml混合’而調製了懸浮液作為處理液。將上述懸 浮液放入内容積200ml之不鏽鋼製高壓釜反應容器中,將形 成有隔熱基底層3之模具母材浸潰於其中,並使用夾具予以 保持。將此模具母材以四氟乙烯製密封帶預先遮蔽形成有 隔熱基底層3之成形面以外者。此外,上述作業在氮氣環境 中進行。藉從外部將此高壓爸反應容器加熱,以150。〇反應 10小時。反應後,將模具母材連同夾具一起取出,為與同 時生成之粉體化合物分離’而充分水洗。高壓爸反應容器 也同樣地為去取(斤生成之粉體,而將内部水洗,再度換合 與上述同量之懸浮液,再將模具母材連同失具一起安裝, 同樣地’以150°C反應10小時。藉將此操作反覆進行共6次, 而形成了膜厚15〇#m之由尖晶石型氧化鐵構成之隔熱膜4。 如此進行,將形成有積層膜之模具水洗,使其充分乾 燥後’使用安裝有鈀靶材之直流濺鍍裝置,於隔熱膜4之表 面形成鈀微粒子膜,藉此,形成了種晶層5。接著,以無電 39 201210789 電鍍鎳法,被覆由厚度2//m之鎳膜構成之基底鍍膜進— 步,以無電電鑛鎳法形成由厚度15〇em之精密加工用錄碟 合金膜構成之細微加工金屬膜7,藉此,製作金屬被膜層8 後,以200°C進行熱處理3小時。接著,藉使用精密切削加 工機’形成精密加工表面7a,而獲得了細微加工模具用隔 熱模具1。 此外’關於隔熱膜4 ’為確s忍是否形成了所期材質之 膜’另外準備與模具母材2相同之材質之正方形板(大小. 18.0mm正方形、厚度2.0mm),在製作上述隔熱模具丨之步 驟中’形成了同樣之隔熱膜基底層。之後,在形成隔熱模 具1之隔熱膜4之步驟中,也將此正方形板之試樣與此隔熱 模具1 一同放入相同之高壓釜反應容器,在此正方形板試樣 也與隔熱膜4同時地形成了隔熱膜。就形成於前述正方形板 上之膜’進行了與第1實施例同樣之材料評價。從營光X射 線裝置之組成分析之結果與.以X射線繞射而得之X射線轉 射圖形(第3圖)之解析的結果,可確認隔熱膜4為與在前述第 1實施例所示之隔熱膜1004相同之晶格常數知=8.4〇人之尖 晶石型氧化鐵Fe3〇4。又’此隔熱膜4之孔隙率為55%,維 氏硬度Hv最大值為410,最小值為180,平均值為265。 隔熱性之評價 為評價上述本發明之結構之隔熱模具的隔熱性能,製 作了包含本發明之隔熱膜,由相同之材料及相同之結構構 成之隔熱性評價用測定試樣11。於第4圖顯示其概略截面結 構圖。此測定試樣11如以下進行而製作。首先,準備直徑 40 201210789 9.5mm、長度45_0mm,且與用於本實施例結構之隔熱模具1 之模具母材2相同之材質的圓棒,於其一端面之中心形成直 徑3.5mm ’深度22.0mm之熱電偶安裝孔12a。進一步,為使 形成於上方之隔熱膜之密著性佳,而於此圓棒之側面整面 形成間距125 β m,深度15 /z m之凹凸溝,而製作了金屬圓 棒之基材12。使用此基材12,以與本實施例之隔熱模具同 樣之製作方法,從位於與有熱電偶安裝孔12a之端面反向之 位置之端面底部至30.0mm之位置形成由厚度鐵膜構成之 隔熱膜基底層13,然後於其上形成厚度150//m之由本發明 之尖晶石型氧化鐵構成之隔熱膜14。接著,於其上從有熱 電安裝孔12a之端面施行樹脂遮蔽,從端面底部至23 〇爪爪 之位置以濺鍍法形成由極薄之鈀之觸媒微粒子膜構成的種 晶層15,再於其上以無電電鍍鎳法形成由鎳構成之基底鍍 膜16(厚度2/zm) ’進一步,於其上以無電電鍍鎳法形成由 厚度18# m之非晶質鎳磷合金膜構成之鍍金屬膜17,而形成 了由基底鑛膜16及艘金屬膜π構成之金屬被膜層a。 為比較隔熱性之評價,也製作了如第5圖及第6圖所示 之2種不同之結構的比較試樣。 其中一比較試樣係具有以氧化鍅熔射膜作為隔熱臈之 習知隔熱膜的測定試樣111,於第5圖顯示其結構。測定試 樣m如下進行而製作。準備以與上述測定試樣u之基材^ 完全相同之材質加工成相同之形狀的基材112,從位於與有 熱電偶安裝孔112a之端面反向之位置之端面底部至3〇 〇_ 之位置’以熔射法將高溫之氧化频粒子均質地熔射成平 41 201210789 均厚度大約2 5 0以如,而^士、γ ,. /成了溶射膜。藉將此炼射膜精密 地研磨加工,形成薄至厚度15G//m,由氧化雜射膜= 之^熱膜U4。之後,保留自端面底•至^之 糾上方财㈣偶安裝孔112a之端面側施行樹脂遮蔽。 精脫月y U之前處理步驟及在驗難之氯化亞锡溶液 之浸潰處理及之後錢化域之浸潰處理,形成了把觸媒 之種晶層115°於其上形成由賴膜構成之基底鍍膜116(厚 度2ym) ’再於其上以無電電鑛鍵法形成由厚度心⑺之非 晶質錄齡金膜構成之鑛金屬膜117,而形成了金屬被膜層 118。如此進行,製作了測定試樣ln。 另一比較试樣為完全不具有隔熱膜之測定試樣211。於 第6圖顯示其結構。準備以與上述基材12或112完全相同之 材質加工成相同之形狀之基材212,保留自端面底部起至 23.0mm之位置,於有熱電偶安裝孔212a之端面側施行樹脂 遮蔽。之後,以木材觸擊電鍍浴,形成由鍍鎳膜構成之厚 度2/zm之基底鍍膜216,然後於此上方與上述同樣地以無電 電鍍鎳法形成由厚度18 v m之非晶質鎳磷合金膜構成之錢 金屬膜217,而形成了金屬被膜層218。如此進行,製作了 測定試樣211。 如上述進行而製作之3種測定試樣11、111、211係如以 下進行,同時進行了隔熱性之評價。 隔熱性之評價係使用與在第1實施例所使用之第34圖 所示之隔熱性評價裝置相同的裝置’以同樣之方法評價。 在此,取代第1實施例之測定試樣1011A、1011B及1211,分 42 201210789 別將本實施例之測定試樣11 ' 111及211設置於隔熱性評價 裝置而測定。此外,保持3個測定試樣之隔熱板使用設有直 徑9.5mm之3個貫穿孔之隔熱板24取代在第34圖所使用之 隔熱板1024。於第7圖顯示此測定評價時之狀態。 隔熱性之評價係將放置於室溫而保持一定之3個測定 試樣11、111、211直接以安裝於隔熱板24之狀態同時浸泡 於第7圖所示之隔熱性評價裝置21之恆溫水槽22之保持在 90 C的咼溫水,測定其溫度上升之速度,藉此,調查了升 溫時之隔熱效果。接著,將溫度已上升之測定試樣u、m、 211直接以依舊安裝於隔熱板2 4之狀態同時浸潰於恆溫水 槽23之保持在20°C之冷水,測定其溫度下降之速度,藉此, 調查了降溫時之隔熱效果。 於第8圖顯示溫度上升之時間變化與2個測定試樣之溫 度差之時間變化,作為關於從室溫,同時浸泡於保持在9〇 °C之恆溫水槽22時之溫度上升之時間變化,與不具隔熱膜 之測定試樣211比較,設有本發明之隔熱膜之測定試樣釘之 測定結果。於第9圖顯示將溫度已上升之測定試樣u、2ιι 同時浸泡於保持在2(TC之怪溫水槽時之溫度下降之時間變 化的測定結果。 同樣地,關於設有習知隔熱祺之測定試樣lu,於第1〇 圖及第11圖顯示與上述本發明之隔熱膜之測定試樣相同地 進行而施行之測定結果。 從第8圖〜第11圖之結果也可明瞭,可知本發明之隔熱 膜斜外部之溫度變遞至基材之效果明確’。'、 43 201210789 又,可知其隔熱效果與由習知氧聽構成之隔熱膜 幾乎同等。 第3實施例 於第12圖顯不顯不本實施例之隔熱模具之積層結構的 截面圖》隔熱模具31係用於具有精密之細微加工表面之光 學元件之樹脂成形的模具’由以下之層結構構成。即,於 下述模具母材32之表面上配置有由尖晶石型氧化鐵構成之 膜厚105/zm之隔熱層34,前述模具母材係加工成光學元件 之大致之成形形狀的大小為直徑1〇 〇mm的圓筒狀且下部 具有直徑14.0mmx高度2.〇mm之帽簷形狀部份,由高度 15.0mm之鋼鐵材構成者。於該隔熱層表面上配置有由膜厚 3/zm之鐵膜構成之密著層35,進—步於其上面配置有金屬 被膜層38。此金屬被膜層38以由臈厚2ym構成之鎳之基底 鍍膜36、進一步於其上由膜厚1〇〇以m之非晶質鎳磷合金膜 構成之細微加工金屬膜3?構成。此外,此細微加工金屬膜 37之表面為樹脂成形時之成形轉印面,形成為經細微加工 成被成形物之形狀之精密加工表面37a。 於第13圖顯示本實施例之隔熱模具之製造方法的步 驟。首先,使用與第2實施例相同之原料及相同之高壓釜反 應容器,反覆進行同樣之水熱反應4次,而於將由鐵為主成 伤之鋼材構成之棒材經機械加工之模具母材32成形面形成 由厚度105# m之尖晶石型氧化鐵構成之隔熱膜34(第13圖 (1))。此外,將此模具母材以四氟乙烯製密封帶預先遮蔽模 具母材32之成形面以外者。 44 201210789 如此進行,將形成有隔熱膜34之模具水洗後,以使用 #樣酸之有機酸鐵鍍浴之電鍍法,形成由鍍鐵膜構成之密 著層35(第13圖(2))。接著,以無電電鍍鎳法,被覆由厚度 2//01之鎳膜構成之基底鍍膜36。進一步,以無電電鍍鎳法, 升/成由厚度15〇em之精密加工用錄鱗合金鍍膜構成之細微 加工金屬膜37,製作金屬被膜層38,並以20(TC進行熱處理 3小時(第Π圖(3))。之後,此細微加工金屬膜37之表面藉使 用精岔切削加工機,進行機械加工,而形成被成形物之形 狀之精密加工表面,而製作了用於光學元件之樹脂成形之 隔熱模具31(第13圖(4))。 如此,可知由於構成本實施例之隔熱膜之尖晶石型氧 化鐵為具有導電性之金屬氧化物,故可以在習知製造步驟 被視為輯讀精密陶㈣減之祕法,直接形成金屬 膜。 隔熱性之評價 為評價上述隔熱模具的隔熱性能,製作了包含本發明 之隔熱膜’由相同之材料及相同之結構構成之隔熱性評價 用測疋4樣41。於第14圖顯示其概略截面圖。此測定試樣 41如以下進行而製作。首先’準備直徑、長度 5:入:且::實施例之模具母材32相同之# f的圓棒, ==度測定之熱電偶,於轉-〜 成為』==,°義之熱電偶安裝貫穿孔仏形 〜、轴方向構成直角,而製作了基材42。 材42之一端’以四氣乙歸製密封帶預先遮蔽,與第IS圖: 45 201210789 隔熱膜34之形成方法同樣地,於距離另一端之端面底部 22.0〇1111之處形成厚度1〇5//111之隔熱膜44。接著,保留端面 底部至20.0mm之位置,以樹脂密封材料將剩餘之部份遮 蔽’再與隔熱模具31之密著層35之形成方法同樣地,形成 由鑛鐵膜構成之密著層45,進一步,以無電電鍵錦法,被 覆由厚度2 之鎳膜構成之基底鍍膜46及同樣地以無電電 鍍鎳法被覆由厚度28/zm之精密加工用鎳磷合金臈構成之 金屬膜47 ’藉此,製作了測定試樣41。 將不具有隔熱膜之測定試樣241如以下進行製作來作 為具有本發明隔熱膜之測定試樣41之隔熱性評價的比較試 樣。於第15圖顯示其概略截面圖。準備以與上述基材42完 全相同之材質加工成相同之形狀之基材242,保留從端面底 部至20.0mm之位置,於有熱電偶安裝孔242a之端面側施行 樹脂遮蔽。之後’以無電電鍍鎳法,形成由鍍鎳膜構成之 厚度2 之基底鍍膜246,然後於此上方與上述同樣地以無 電電電鍍法形成由厚度28"ιη之非晶質鎳磷合金膜構成之 鍍金屬膜247。如此進行,製作了測定試樣241。 如此進行而製作之測定試樣41、241除了將隔熱板24變 更成設直徑6.0mm之貫穿孔,而得以保持測定試樣41、241 以外,使用與在第1實施例所使用之隔熱性評價裝置2丨同樣 之結構之裝置,與第1實施例同樣地同時進行隔熱性之評 價。此外,以安裝在隔熱膜24之測定試樣41及241自下部端 面起至15mm之部份浸泡於貯存在恆溫槽之高溫水中及冷 水中之狀態,進行了隔熱性之評價。 46 201210789 於第16圖顯示關於從室溫,同時浸泡於保持在95°c之 恆溫水槽時之溫度上升之時間變化,與不具隔熱膜之測定 試樣241比較,設有本發明之隔熱膜之測定試樣41的測定結 果。於第17圖顯示將溫度已上升之測定試樣41、241直接以 不同之溫度之狀態,接著同時浸泡於保持在18。〇之亙溫水 槽時之溫度下降之時間變化的測定結果。 從第16圖及第17圖之結果也可明瞭,可知與第丨實施例 之結果相同,本發明之隔熱膜對外部之溫度變化,不易將 熱傳遞至基材之效果明確。 進一步,與上述測定試樣同樣地,製作隔熱膜厚度為 15 /z m之測定试樣341及隔熱膜之厚度為3以m之測定試樣 441,與上述之隔熱性測定同樣地,評價不具有隔熱膜之測 定試樣241之3個試樣。惟,以3個測定試様241、341 ' 441 之自下部端面起至19mm之部份浸泡於貯存在恆溫槽之高 溫水中及冷水中之狀態,進行了隔熱性之評價。 於第18圖,顯示關於從室溫,同時浸泡於保持在95它 之·!·亙溫水槽時之溫度上升之時間變化,與不具隔熱膜之測 定試樣2 41比較,設有本發明之隔熱膜之測定試樣3 4卜4 4 i 的測定結果。於第19圖顯示將溫度已上升之測定試樣24ι、 341及441直接以不同之溫度之狀態,接著同時浸泡於保持 在2 7 °C之溫水槽時之溫度下降之時間變化_定結果。 從第1S圖及第19圖之結果也可明瞭,可知與第丨實施例 之結果同樣地,本發明之隔熱膜即使膜厚為15 " m,對外部 之溫度變化,不易將熱傳遞至基材之效果仍明確。 47 201210789 第4實施例 如第1實施例所示,藉選擇水熱合成之反應條件,可形 成為對隔熱性能造成很大影響之孔隙率各不同之隔熱膜。 在本實施例,藉將水熱合成條件作各種改變,製作了孔隙 率不同之3種隔熱紅、D、E。此外,在水熱合成中,所有 原料溶液之調製使用了在氮氣中蒸飽之水。 用於隔熱膜形成之基底基材係假設鐵製模具,準備3個 由鐵構成之長方形基板(大小:長5〇mm、寬度2〇mm、厚度 2.0mm) ’於該等基板表面形成各隔熱膜。 隔熱膜C如以下進行而形成。將於水6〇ml溶解有38.3g 之硫酸亞鐵(FeS〇4 · 7H2〇)之水溶液與29.7g之氫氧化鈉 (NaOH)水溶液6〇mi混合,而製作了懸浮液。將上述懸浮液 放入與在第1實施例使用者相同之形狀之高壓爸反應容器 中’並使用失具,保持基底基材,將其浸潰,將反應容器 密閉’以loot:加熱並予以保持。45小時後,反應容器内部 之壓力上升至0.2〇MPa。之後,停止加熱,開啟壓力閥,釋 放内部之壓力,並開啟反應容器,將試樣基材連同夾具— 起取出’同時為與反應殘渣分離,而充分予以水洗。之後, 反應容器也同樣地為去除反應殘渣,而水洗内部,再度捧 合與上述同量之懸浮液,再將水洗後之上述基材連同夹具 一起女裝’同樣地,以1〇〇。(:反應45小時。藉反覆進行此操 作'、6人’形成了膜厚146/z m之隔熱膜C。 就如此進行而形成之隔熱膜C,與第1實施例之隔熱臈 A之材料評價同樣地 ,使用螢光X射線裝置及X射線繞射裝 48 201210789 置、雷射顯微鏡、維氏硬度計等,分別調查了化學組成與 結晶構造、孔隙率及維氏硬度。結果,可確認隔熱膜c為晶 格吊數a〇=8.4〇A之尖晶石型氧化鐵Fe3〇4 〇又,可知其孔隙 率為5% ’維氏硬度最大值為Hv314,最小值為办23〇,平 均值為HV278。 隔熱膜D之形成方法如下述。首先,將於在氮氣中蒸傲 而製作之水60ml溶解有41.7g之硫酸亞鐵(FeS〇4 . 7h2〇)之 水溶液與26.0g之氫氧化鈉(NaOH)水溶液6〇ml混合,而製作 了懸浮液。將此懸浮液放入與用於隔熱臈C之形成相同形狀 之反應容器中,與隔熱膜C時同樣地,以U(rc反應40小時。 反應後,取出形成有膜之基材,充分予以水洗,在反應容 器中’使上述基材浸潰於新之原料懸浮液,並密封容器, 以同樣之11〇。(:進行40小時之反應。藉反覆進行此操作共4 次’形成了膜厚150 之隔熱膜D。 將所彳于之隔熱膜D評價材料’結果,由晶格常數 a〇-8.40A之尖晶石型氧化鐵fqO4構成,其孔隙率為, 維氏硬度最大值為Hv560,最小值為Hv303,平均值為 Hv448 。 隔熱膜E之形成方法如下述。首先,將於在氮氣中蒸德 而製作之水60ml溶解有41.7g之硫酸亞鐵(Fes〇4 . 7氏〇)之 水溶液與21.6g之氫氧化鈉(NaOH)水溶液6〇ml混合,而製作 了懸浮液。將此懸浮液放入與用於隔熱膜c之形成相同形狀 之反應容器中,與隔熱膜c時同樣地,以145。〇反應9〇分鐘。 反應後,取出形成有膜之基材,充分予以水洗,再在反應 49 201210789 容器中,使上述基材浸潰於新之原料懸浮液,並密封容器, 以同樣之145°C反應90分鐘。藉反覆進行此操作共14次,形 成了膜厚150# m之隔熱膜E。 關於如此進行而得,呈現黑色之隔熱膜E,評價材料之 結果,隔熱膜E由晶格常數aQ=8.4〇A之尖晶石型氧化鐵 Fe304構成,其孔隙率為75%。然而,具有孔隙率大至75% 之孔隙率之隔熱膜E因無法獲得可壓入維氏壓頭,以形成壓 痕之凹陷之大小的平滑研磨面,故無法測定維氏硬度。於 第37圖顯示該等孔隙率不同之隔熱膜C、D、E之研磨表面 之掃瞄式顯微鏡像。此外,上述隔熱膜C、D、E形成後之 表面皆與隔熱膜A同樣地,形成為可看到角尖銳之雙晶結晶 之結晶粒連續成長成三維之膜,且形成為於其膜内部存在 無數氣孔之多孔質膜。 已知為習知隔熱性氧化物材料之氧化錯燒結體或熔射 膜維氏硬度Hv高至1200,為難加工性材料。相對於此,可 知本發明之隔熱膜材料為不論孔隙率之大小,硬度皆低, 可較易進行與習知之精密陶瓷同樣之精密切削、精密磨削 等細微加工之材料。 第5實施例 檢討了藉將形成尖晶石型氧化鐵Fe304之鐵離子之一 部份以各種金屬離子置換,是否可將各種組成之置換肥粒 體以水熱合成反應於基材上製作成膜狀。該等肥粒體因其 置換離子之種類,熱導率大致無太大之差異,但因可改變 熱膨脹率等其他之材料性質,故作為模具之隔熱膜之置換 50 201210789 肥粒體之膜形成為重要。 各種組成之置換肥粒體膜之形成在原料溶液之調製 中,使用在氮氣中蒸顧之水。 首先’嘗試了含有鈣離子作為置換離子之為肥粒體之 弼系肥粒體的成膜。上述置換肥粒體膜之合成如以下進 行。為確認所期之肥粒體膜是否可以與第1實施例所示之方 法同樣之水熱反應形成,用於臈形成之基底基材係與用於 第1實施例之隔熱膜之材料評價者相同之材質(純銅)的長方 开> 基板(大小:長50mx寬20mmx厚度2.0mm),且形成有同 樣之隔熱膜基底層(厚度3em之錢鐵膜)者。 將於水溶解有19.9g之氣化亞鐵(FeCl2 · 4H20)及7.4g之 氣化鈣(CaCl2 . 2氏0)之水溶液60ml與21.6g之氫氧化鈉 (NaOH)水溶液6〇ml混合,調製了懸浮液作為處理液。將上 述懸浮液放入與在第1實施例所使用者同樣之内容積2〇〇1^ 之不鏽鋼製高壓釜反應容器中,將上述評價用基底基材浸 潰於其中’並使用夾具予以保持。以l5(rc反應2小時後, 將基材連同夾具一起取出’為與同時生成之粉體化合物分 離’而充分水洗。高壓爸反應容器也同樣地為去取所生、 之粉體,而將内部水洗’再度摻合與上述同量之辯^ 再將模具母材連同炎具一起安裝,反覆進行同樣之反應 次 如此進行而形成於基材上之膜為黑色膜,其厚户為 l〇4/zm。就此膜,使用螢光X射線裝置,進行了組成八= 斤一 結果,可知為鐵與鈣之化合物’其化學組成(莫耳 51 I ) 201210789 鐵:飼=85 : 15。又,使用χ射線繞射裝置,調查了結晶構 造。於第38圖顯示其\射線繞射圖形。結果,確認了由顯示 晶格常數a0=8.4〇A之《晶石結晶構造的化合物構成。 即,可確認所得之膜為約系肥粒體%45^々4。又,於第 4 2圖顯不此膜之膜形成後之表面的掃瞄式電子顯微鏡像。 可知,與第1實施例所示之隔熱膜八同樣地形成為可看到 角尖銳之雙晶結晶之結晶粒連續成長成三維之膜,且形成 為其膜内部存在無數氣孔之構造之多孔質膜。 再者,與第1圖所示之方法同樣地,分別研磨膜表面及 膜截面,製作測定面,分別測定了孔隙率及維氏硬度。於 第39圖顯示研磨後之膜表面之掃瞄式顯微鏡像。結果,孔 隙率為20%。又,維氏硬度最大值為Hv339,最小值為 Ην130,該等之平均值為Ην220。 接著,就含有鋅離子作為置換離子之為肥粒體之辞系 肥粒體的成膜之可能性,作了檢討。惟,在此,評價用式 材使用了與在第3實施例所使用之模具母材32(鋼鐵材)相同 之材質之正方形板(大小18.0mm正方形,厚度2.0mm)。其人 成如以下進行。將於水60ml溶解有34.7g之硫酸亞鐵 (FeS04.7H20)及7.2g之硫酸鋅(ZnS04 · 7H20)之水溶液與 21_6g之氫氧化鈉(NaOH)水溶液60ml混合,調製了懸浮液作 為處理液。將上述懸浮液放入與在上述鈣系肥粒體之合成 所使用之内容積200ml之不鏽鋼製高壓釜反應容器中,將上 述評價用基底基材浸潰於其中,並使用夾具予以保持。以 180 C反應4小時後,將基材連同爽具一起取出,為與同時 52 201210789 生成之粉體化合物分離,而充分水洗。高壓*反應容器也 同樣地為s取所生紅粉體,㈣㈣水洗,再度換合與 上述同量之懸浮液’再將模具母材連同夾具—㈣裝,反 覆進行同樣之反應4次。 就形成於刚述正方形板上之膜,使用螢光χ射線裝置, 進行了組成为析。結果,確認了為鐵與辞之化合物。惟, 因基底之基材為鋼鐵材,於分析MX射線組成之際,亦加 上基材之成份(鐵)作為組成分析值,故肥粒體膜之正確組成 之疋塁困難。僅進行置換金屬離子是否包含在肥粒體組成 中之組成之定性分析。又,以X射線繞射分析,調查了結晶 構造。於第22圖顯示其X射線繞射圖形。結果,確認了僅由 晶格常數a〇=8.49A之尖晶石型結構構造之化合物構成。 即,可確認所得之膜為鋅系肥粒體。 與上述鋅系肥粒體之製作、檢討同樣地,就置換為猛 (Μη)離子時之肥粒體之成膜作了檢討。僅下述點不同,前 述點係將於水60ml溶解有34.7g之硫酸亞鐵(FeS04.7Η2〇) 及6.0g之硫酸錳(MnS〇4 · 5Η20)之水溶液與21.6g之氫氧化 鈉(NaOH)水溶液6〇ml混合,調製了懸浮液來使用作為處理 液’其他步驟與前述辞系肥粒體之成膜性檢討時完全同樣 地施行。就形成於放入高壓釜反應容器中之正方形板上之 膜,使用螢光X射線裝置,進行了組成分析。結果,確認了 為鐵與錳之化合物。又,以x射線繞射分析,調查了結晶構 造。結果,可明瞭所得之膜僅由晶格常數ac)=8.43A之尖晶 石型結晶構造之化合物構成。即,可確認所得之膜為錳系 53 201210789 肥粒體。 接著,就置換離子為鎂(Mg)離子時之肥粒體之成膜作 了檢討。僅下述點不同,前述點係將於水6〇ml溶解有34 7g 之硫酸亞鐵(FeS04.7H20)及6.2g之硫酸鎂(MgS〇4 . 7η2〇) 之水溶液與21.6g之氫氧化鈉(NaOH)水溶液6〇ml混合,調製 了懸浮液來使用作為處理液’其他步驟與前述鋅系肥粒體 之成膜性檢討時完全同樣地施行《就形成於放入高壓爸反 應谷器中之正方形板上之膜,使用螢光X射線裝置,進行了 組成分析。結果,確認了為鐵與鎂之化合物。又,以X射線 繞射分析’調查了結晶構造。結果,可明瞭所得之膜僅由 晶格常數a0=8.4〇A之尖晶石型結晶構造之化合物構成。 即’可確認所得之膜為鎂系肥粒體。為調查在反應溫度不 同之條件下之膜形成,將與上述同樣地調製之懸浮液放入 高壓爸容器,以1HTC嘗試了 4小時之成膜實驗。結果,與 上述同樣地,確認了可合成晶格常數a〇=8.4〇A之尖晶石型 結晶構造之鎂系肥粒體。 再者’就置換離子為鋁(A1)離子時之肥粒體之成膜作了 檢討。僅使用下述懸浮液作為處理液之點不同,前述懸浮 液係將於水60ml溶解有34.7g之硫酸亞鐵(FeS04 · 7H2〇)及 7.9g之硫酸鋁(AiS〇4 . 16H2〇)之水溶液與21 6g之氫氧化鈉 (NaOH)水溶液6〇mi混合而製作者,其他步驟與前述鋅系肥 粒體之成膜性檢討時完全同樣地施行。就形成於放入高壓 爸反應容器中之正方形板上之膜,使用螢光χ射線裝置,進 行了組成分析。結果,確認了為鐵與鋁之化合物。又,以χ 54 201210789 射線繞射分析’調查了結晶構造。結果,可明瞭所得之膜 僅由晶格常數aQ=8_35A之尖晶石型結晶構造之化合物構 成。即,可確認所得之膜為鋁系肥粒體。 也就置換離子為鉻(Cr)離子時之肥粒體之成膜作了檢 討。僅使用下述懸浮液作為處理液之點不同,前述懸浮液 係將於水60ml溶解有34.7g之硫酸亞鐵(FeSCV 7H20)及5.6g 之硫酸鉻(CrS〇4.3H2〇)之水溶液與21.6g之氮氧化鈉(NaOH) 水溶液60ml混合而製作者,其他步驟與前述鋅系肥粒體之 成膜性檢討時完全同樣地施行。就形成於放入高壓釜反應 容器中之正方形板上之膜,使用螢光X射線裝置,進行了組 成分析。結果,可確認為鐵與鉻之化合物。又,以X射線繞 射分析’調查了結晶構造。結果,可明瞭所得之膜僅由晶 格常數a〇=8.38A之尖晶石型結晶構造之化合物構成。即, 可確認所得之膜為鉻系肥粒體。 也就置換離子為鋰(Li)離子時之肥粒體之成膜作了檢 討。僅使用下述懸浮液作為處理液之點不同,前述懸浮液 係將於水60ml溶解有34.7g之硫酸亞鐵(FeS04.7H20)及3.2g 之硫酸鉻(LiS04. H20)之水溶液與21.6g之氫氧化鈉(NaOH) 水溶液60ml混合而調製者,其他步驟與前述鋅系肥粒體成 膜性檢討時完全同樣地施行。關於形成於放入高壓爸反應 容器中之正方形板上之膜,以X射線繞射分析,調查了結晶 構造。結果,確認了所得之膜僅由晶格常數a〇=8.39A之尖 晶石型結晶構造之化合物構成。再者,使所得之膜溶解於 鹽酸中’以ICP發光分析法,進行了組成分析,結果,可知 55 201210789 為鐵與鋰之化合物》即’可確認所得之膜為鋰系肥粒體。 此外’就所得之包含上述鋅至鋰之各種肥粒體膜,使用掃 式電子顯微鏡(SEM),觀察膜表面之結果,各膜全部皆形 成為與上述同樣可看到角尖銳之雙晶結晶之結晶粒連續成 長成三維之膜’且形成為於其膜内部存在無數氣孔之多孔 質暝。 從以上之結果,可知以各種金屬離子置換之各種肥粒 體媒可以與尖晶石型氧化鐵之隔熱膜之形成同樣之水熱合 成法有效地形成於基材上。 第6實施例 於第20圖顯示本實施例之隔熱模具之層結構的概略立 體圖。隔熱模具51係用於具有精密之細微加工表面之樹脂 成形的模具,為具有矩軸6.00mm、長軸9.00mm之長方形成 形面之高度20.00mm的柱狀,係具有以下之積層結構者。 首先,模具母材52由與第3實施例相同之組成之鋼鐵材構 成。在此模具母材52之長方形成形面側之表面,細微加工 成第21圖所示之尺寸之截面形狀之凹溝圖形在成形面側表 面之短轴之中心的位置’形成為與長轴並行。配置有由氣 化鐵構成之膜厚50// m之隔熱層54,以覆蓋此細微加工面之 表面。於其表面配置有膜厚3/^m之鐵膜構成之密著層55。 進一步,於其表面形成有金屬被膜層58,該金屬被骐層係 由由鎳構成之膜厚2"ιη之基底鍍膜56及形成於其上,由膜 厚65//m之非晶質鎳磷合金膜構成之細微加工金屬膜57構 成。此外,此細微加工金屬膜57之表面係樹脂成形之際之 56 201210789 成形轉印面,形成為細微加卫成與第21圖相同之尺寸之精 密加工表面57a。 本實_之隔熱模具之製造方法除了隔熱膜54之形成 條件不同之點外,經由與第3實施例相同之步驟來施行。 即’以與第1實_相同之操作’使用相同之原料及相同之 高壓爸反應容器,以阶反覆進行7小時之水熱反應,而 於形成有細微加工圖形之模具母材52形成厚度之由 尖晶石型氧化鐵構成之隔熱肋。又,於被覆在與^實施 例同樣地形成之密著層之鍍覆基底膜56上形成厚度刚^ 之鎳磷合金鍍合金之細微加工金屬膜57。 進一步’此細微加工金屬膜57之表面藉使用精密切削 加工機’機械加工成與在第21圖所示者相同之尺寸,而形 成精密加工表面57a,進—步,將4個側面精密地磨削加工, 製作了隔熱模具51。 隔熱膜之被覆性之評價 如此進行而得之隔熱模具51於其經磨削加工之側面^ 觀察到包含隔熱膜之積層膜之截面。使用掃叫顯微鏡, 觀察本發明之隔熱狀厚度。觀察職具輯52與隔熱膜 53及隔熱膜53與其±部之金屬積層膜(㈣著層Μ、基底魏 膜56及讀加工金屬膜57構成)之被覆性與密著性皆值,無 裂縫或相之_。接著,對於如圖所示之模呈母讨之 加工圖形戴面圖以 A、a,、b、b,、c、c,、e、e:、、f、f, 所示之1G處的部份,進行了隔熱膜之厚度測定。在此,A、 B、C D、E5處係隔熱模具5ι之長方形成形面之其中〆短 57 201210789 軸側側面之模具母材52的5點,A,、B,、ρ, 、L、D’、E’Jij 另一 短軸側側面之模具母材52之5點。該等你努a 罝係第21圖所+少 尺寸之處《存在於以上述記號所示之處之正 '、之 β m 之厚度分別為八:5〇/^、八,:50心、仏5〇正上方的隔熱膜 C : 51 //m、C,: 51 "m、E : 50# m、E,. •川以 m、F : 5〇 F’: 50y m。從以上之結果可知,所形 、 . 之隔熱膜可以形成 在模具母材52之凹溝圖形上之幾乎均/取 著性來被覆。 mx良好密 根據本發明之隔熱膜之製造方法, 因以水熱合成反庳 之化學反應’形絲顏,故可對料水熱合成反: 料之處理液的模具表面,使膜均等且緩 "'、 叉丨又地成長。因此, 即使在業經進行深溝加工等之複雜形狀之模具母材成) 上,亦可充分地繞入來形成隔熱膜。再者,根據本發明面 也有即使為薄膜厚,也不需後機械加 向可有效率地形 成隔熱膜之特徵。 第7實施例 進行了由非鐵金屬製模具母材構成之隔熱模具之製 作。於第23ϋ顯示本實關之隔純具之層結構^隔熱模 具2 01係用於具有由深溝構成之精密細微加工形狀之樹脂 製零件之成形加工,且由非鐵金屬製模具母材及隔熱臈構 成之模具,由以下之層結構構成。即,於下述模具母材2〇2 之表面上形成以厚度2#m之鍍鎳膜構成之基底層2〇3a,前 述模具母材係熱導性低’且在高溫也不致損失強度之鈦合 金製’具有直徑20.Ommx高度2.5mm之帽詹形狀之部份(直 58 201210789 徑25.0mm),自底面起之高度為l〇.〇mm者,再形成以厚度 3"m之鐵膜形成之隔熱膜基底層203,於其上形成由厚度 200# m,為肥粒體材料之一種之鋅系肥粒體構成的隔熱膜 204,再於其上配置由鈀之觸媒微粒子膜構成之種晶層 205 ’於其上形成有金屬被膜層208。此金屬被膜層208由由 鎳構成之基底鍍膜206(厚度2//m)及由進一步形成於其上 之非晶質鎳磷合金膜構成之細微加工金屬膜207(平均厚度 7 8 // m)構成。此細微加工金屬膜2 〇 7之成形面側形成為以機 械加工而形成有成形零件之加壓成形用細微圖形之精密加 工表面207a。 根據上述結構,藉採用熱導率低之辞系肥粒體膜與熱 導性低之鈦合金製模具母材一同作為隔熱膜,在具有施行 了深且細微之溝之細微加工的成形面之模具之樹脂成形, 亦可形成深之細微圖形。在習知技術,在模具之成形表面 上成形之高溫之樹脂之熱通過模具基材而排洩,該樹脂於 成形中產生過度之溫度下降,結果,產生妨礙樹脂成形之 事態。相對於此,在本發明中,可有效地避免此種事態, 結果,可更確實地形成細微之圖形。 上述隔熱模具201如以下進行而製作。於將為非鐵金屬 之鈦合金機械加工而製作之模具母材2〇2之成形面側的表 面,以木材觸擊電鍍浴形成由鍍鎳膜構成之厚度之基 底膜203a,進一步,於其表面使用硫酸鐵鍍浴,形成由厚 度3 μ m之鐵膜構成之隔熱膜基地層2〇3。接著,於此表面上 將由厚度200// m之鋅系肥粒體膜構成之隔熱膜2〇4如以下 59 201210789 進行而形成。即,將於對氮氣中蒸餾而製作之水60ml溶解 有34.7g之硫酸亞鐵(FeS04· 7H20)及7.2g之硫酸鋅(ZnS04 · 7H2〇)的水溶液與21.6g之氫氧化鈉(NaOH)水溶液60ml混 合,而調製了懸浮液作為處理液。將上述懸浮液放入内容 積200ml之不鏽鋼製高壓釜反應容器中,將形成有隔熱基底 層203之模具母材浸潰於其中’並使用夾具予以保持。將此 模具母材以四氟乙烯製密封帶預先遮蔽形成有隔熱基底層 203之成形面以外者。此外,上述作業在氮氣環境中進行。 藉從外部將此高壓爸反應容器加熱,以18〇°C反應6小時。 反應後,將模具母材連同夾具一同取出,為與同時生成之 粉體化合物分離,而充分水洗。高壓釜反應容器也同樣地 為去取所生成之粉體,而將内部水洗,再度摻合與上述同 量之懸浮液’再將模具母材連同夾具一起安裝,同樣地, 以180°C反應6小時。藉反覆進行此操作共8次,而形成了由 膜厚200 a ni之鋅系肥粒體膜構成之隔熱膜204。 將如此進行而形成有隔熱膜之模具水洗,使其充分乾 燥後’使用安裝有鈀靶材之直流濺鍍裝置,於隔熱膜204之 表面形成把微粒子膜,藉此,形成了種晶層205。接著,以 無電電锻鎳法’被覆由厚度之鎳膜構成之基底鍍膜 206進步’以無電電鑛錄法形成由厚度1〇〇 v m之精密加 工用鎳磷合鍍膜構成之細微加工金屬膜207,藉此,製作了 金屬被膜層208。接著,以2〇〇°C將金屬被膜層208進行熱處 理3小時。之後,使用精密切削加工機,形成精密加工表面 207a’而獲得了細微加工模具用隔熱模具2〇1。 201210789 此外’關於隔熱膜204,為確認是否形成了所期材質之 膜,另外準備由與模具母材搬姻之鈦合金構成之正抑 板(大小:20.0晒正方形、厚度2.0mm),在製作上述隔熱模 具2〇1之步驟,形成了由同樣之鍍錄膜構成之厚度2"m的基 底膜,進-步,於其表面形成由厚度3_之錄鐵膜構成二 隔熱膜基底層。之後’在形成隔熱模具2G1之隔熱膜綱之 步驟,也將此正方形板之試樣與此隔熱模具2〇1 一同放入相 同之高壓釜反應容器,與隔熱膜2〇4同時地,也在此正方形 板試樣形成隔熱膜。就形成於前述正方形板上之膜,使用 螢光X射線裝置,調查了組成,結果,可確認為由鐵與鋅之 組成構成之化合物。再者,使用X射線繞射,調查了結晶構 造。結果,可知為晶格常數a〇=8.49A之尖晶石型結晶構造 之化合物。即’可確認隔熱膜204為鋅系肥粒體。 在此’即使形成由鋅系肥粒體膜構成之隔熱膜之水熱 合成反應的溫度為200°C,亦可形成與上述同樣之組成之鋅 系肥粒體膜。惟,成長1次之膜厚不同時,可依需要,適宜 變更水熱合成之條件、處理次數等,藉此,可形成與上述 相同厚度之隔熱膜。 又’形成於模具母材202之表面上,作為隔熱模之基底 之金屬層在本實施例中記載了為鍍鎳膜之基底層203a及為 鍍鐵膜之隔熱膜基底層203之積層膜的例,隔熱膜之基底只 要為形成於隔熱膜之正下方,由金屬元素構成之金屬膜即 可,該金屬膜之形成方法非限於本實施例之上述積層膜 者。舉例言之,亦可為直接以濺鍍法形成於模具母材表面 201210789 之鐵膜。 在本實施例中,記載了以濺鍍法於隔熱膜之表面上米 成種晶層之步驟,除了此方法,另外以相同之_法,使 用金屬_材,直接形成賴之方法,亦可製造同樣之^ 熱模具。再者,亦可依需要,省略此鐵膜,使錢用錦: 材’以_法直接形成之錄膜作為由精密加卫用錦碟合金 鍍膜構成之細微加X金屬狀基底_,來取代錄錄膜。 第8貫施例 ' 於第43圖顯示第8實施例之隔熱模具之截面圖。隔熱模 具2001係用於具㈣密之鏡面形狀之樹脂製零件的成形加 工之模具,在此,模具母材之材料係使用具有高熱導性之 純銅,以以下所示之積層構造之形態構成。於下述模具母 材2002之表面上配置使用硫酸鐵鍍浴,以厚度3//m之鐵膜 構成之隔熱膜基底層2003,前述模具母材係具有高度 2.5mm之帽層形狀之部份(直徑25.0mm),且自底面起之高度 為15.0mm,直徑2〇.〇0101者,進一步於該隔熱膜基底層上形 成由厚度5〇em之鐵系肥粒體(即,尖晶石型氧化鐵)構成的 隔熱膜2004 ’再於其上配置由鈀之觸媒微粒子膜構成之種 晶層2005 ’於其上形成有金屬被膜層2008。此金屬被膜層 2008由由鎳構成之基底鍍膜2006(厚度1/zm)及由進一步形 成於其上之非晶質鎳磷合金膜構成之細微加工金屬膜 2007(厚度6/zm)構成。此細微加工金屬膜2007之成形面側 形成為以機械加工而形成有鏡面之精密加工表面2007a。 即,為與第1實施例之第26圖所示之積層結構類似之結構, 62 201210789 不同點係精密加工面形成為鏡面。此模具之製造方法係預 先將細微加工金屬膜以平均厚度1〇//ιη形成後,機械加工成 鏡面至厚度6ym,而製作上述精密加工面。又,關於構成 本第8實施例之由尖晶石型氧化鐵構成之隔熱膜2004,其製 造方法也與第1實施例之隔熱膜10〇4之水熱合成之形成方 法不同’特徵在於在loot:以下之大氣壓下合成而製作之 點。如此’藉使用由熱導率低之金屬氧化物(尖晶石型氧化 鐵)構成,且具有氣孔之氧化物材料作為隔熱層,可進行鏡 面性佳之樹脂成型。即,在金屬製模具之上述鏡面成形之 高溫熔融樹脂之熱通過模具基材而排洩,而可避免因該樹 脂於成形中溫度下降至必要以上而引發之樹脂成形不良。 於第44圖顯示本發明之隔熱模具2001之製造製程。於 模具母材2002之成形面側之表面使用硫酸鐵鍍浴,形成由 厚度3/i m之鐵膜構成之隔熱膜基底層2003(第44圖(1))。接 著,於此表面上形成由厚度50μ m之尖晶石型氧化鐵構成之 隔熱膜2004(第44圖(2))。此隔熱膜2004之形成係在大氣中 如以下進行而形成。即,首先,準備在水60ml溶解有41.7g 之硫酸亞鐵(FeS04 · 7H20)之水溶液,進一步,於此水溶液 混合於與此水不同之水溶解21.6g之氫氧化鈉(NaOH)而製 作之強鹼水溶液60ml,而製作了懸浮液2021。此外,在此 所使用之水皆使用在氮氣中蒸餾之水。接著,使用此懸浮 液2021,形成隔熱膜2004。於此時之膜形成使用第45圖所 示之隔熱膜形成裝置2022。以於上部安裝玻璃製球管冷凝 器2023,進一步可使氮氣流至内部之内容積3〇〇ml之不鏽鋼 63 201210789 合金製反應容器2024構成。將上述懸浮液2021放入此反應 容器2024中,將形成有隔熱基底層2003之模具母材2002浸 潰於其中,並使用夾具2025予以保持。將此模具母材以四 氟乙烯製密封帶預先遮蔽形成有隔熱基底層2003之成形面 以外者。藉將此反應容器2024放入加熱保持在98°C之油浴 2026來加熱,反應120小時。此外,在反應時間中,使氮氣 持續流至反應容器2024之内部。反應後,將模具母材連同 夾具一起取出,充分水洗。 如此進行’將形成有膜厚50/z m之隔熱膜1004之模具水 洗,使其充分乾燥後,使用安裝有鈀靴材之直流濺鍍裝置, 於隔熱膜2004之表面形成鈀微粒子膜,藉此,形成了種晶 層2005(第44圖(3))。接著,以無電電1鍍鎳法,被覆由厚度 l"m之鎳膜構成之基底鑛膜2006。進一步,以無電電鑛鎳 法形成由厚度10μ m之精密加工用鎳磷合金鍍膜構成之細 微加工金屬膜2007,藉此,製作金屬被膜層2008,以200°C 進行熱處理3小時(第44圖(4))。之後,使用精密切削加工 機,將上述細微加工金屬膜2007研磨加工至厚度6//m,形 成精密之鏡面l〇〇7a,而獲得了細微加工模具用隔熱模具 (第 44 圖(5))。 此外’由形成於模具母材2002之表面上之鐵膜構成之 隔熱膜基底層2003之形成方法在本實施例中記載了以電鑛 法所行之方法,但與第1實施例同樣地,隔熱膜基底層2003 之形成方法非限於記載於本實施例之電鍍法。舉例言之, 亦可為直接以濺鍍法將此鐵膜形成於模具母材之表面之方 64 201210789 法。 關於隔熱膜2004,為確認是否形成了所期材質之膜, 另外準備與模具母材2002相同之材質(純銅)之長方形基板 (大小:長50mm、寬20mm、厚度2.0mm),使用此基板,形 成隔熱膜,將此試樣作為隔熱膜F,詳細地評價材料。以下 記述隔熱膜F之製作。首先,與製作上述隔熱模具2001之步 驟(第44圖(1))同樣地進行,於此基板之表面形成了同樣之 隔熱膜基底層。之後,與隔熱模具2001之隔熱膜2004同樣 地,使用與前述懸浮液2021相同之組成之懸浮液,使用第 45圖所示之反應容器,以相同之合成條件之98°C,反覆進 行120小時之反應共3次(共360小時),而製作了膜厚約 150//m之隔熱膜F。在此,製作膜厚至用於模具以上之膜 之理由係與第1實施例同樣地,為了界定隔熱膜之材料所需 之組成及結晶構造外,還要以相同之試樣同時評價孔隙率 及維氏硬度。 如此進行而形成於基板上之隔熱膜F係黑色,從就該膜 之使用螢光X射線裝置之組成分析,可知為金屬離子僅由鐵 構成之組成之化合物,進一步,從X射線繞射,可鑑定為晶 格常數aQ=8.39A。即,確認了隔熱膜F為尖晶石型氧化鐵, 即為Fe304。於第46圖顯示其X射線繞射圖形。於第47圖顯 示隔熱膜F之膜形成後之表面之掃瞄式電子顯微鏡像。可知 與第1實施例之隔熱膜A同樣地,形成為角尖銳,大小不同 之結晶粒子連接,呈現三維之網眼構造之形態的膜構造。 進一步,更仔細觀察,可確認形成為可看到雙晶結晶之結 65 201210789 晶粒連續成長成三維之膜及形成為於其膜内部存在由上述 網眼構造形成之間隙部份構成的無數氣孔之構造之多孔質 膜。 又,與第1實施例同樣地,測定了隔熱mF之孔隙率與 維氏硬度。結果,可知隔熱膜F之孔隙率為65%。又,維氏 硬度最大值為Hv370 ’最小值為Hvl80 ’平均值為Hv24〇。 於第48圖顯示測定了上述孔隙率之隔熱膜F之研磨表面的 掃猫式電子顯微鏡像。從本貫施例可確§忍在大氣壓下之1 〇〇 。(:以下所製作之膜也與第1〜7實施例之藉水熱合成所形成 之膜同樣地為多孔質之肥粒體膜。 第9實施例 鐵系肥粒體(FqO4)膜之生成係藉本發明之濕式合成反 應時’經由下述2個反應,從鐵離子,生成肥粒體,前述2 個反應係 l)Fe2+ + OH_—Fe(OH)2、及2)Fe(OH)2—Fe304, 即,1)從2價鐵離子,在鹼性環境中,生成氫氧化亞鐵 (Fe(OH)2),2)進行水解反應,從此亞鐵變化成鐵系肥粒體 (Fe3〇4)膜。 在第1〜8貫施例中’所有本發明之隔熱膜之製作皆使用 在氮氣環境中蒸餾之水作為溶解原料之水。此理由係為了 使上述1)之反應順利地進行,以獲得為合成肥粒體膜時之 中間產物,且咼純度及均質之氫氧化亞鐵(Fe(〇H)2)之故。 亦即,為防止下述情形之故,前述情形係當大氣中之氧溶 解於將為原料之亞鐵鹽(例如硫酸亞鐵)用於溶解之水中 時,原料可溶解於此水之2價鐵離子(Fe2 +離子)之一部份因 66 201210789 存在於其中之溶解氧,而變化成3價鐵離& =質摻雜存在於鐵原料之水溶液中。即,當3價鐵離子存 料原本僅由2價娜子構紅原概_,且其存在量也常 時’有成為於本發明之肥粒體膜之生成的再現性產生 偏,之原因的可能性。然而,量產隔熱膜之際用於合成 化以使用易處理之離子交換水取代需注意保存等之 氣環境中蒸餾之水為理想。 >疋故,關於用於隔熱膜之合成之水是否可採用於離子 六、欠添加了還原劑之水取代上述在氮氣環境中蒸餾之 水’使用與第8實施例之隔熱膜F同樣之基板,嘗試了試樣 膜之製作。 在本第9實施例中,僅用於第8實施例之隔熱膜F之合成 的原料懸浮液*同,其他步驟完全與隔熱麟目同地進行, 而製作了試樣膜。gP,在原料懸浮液之製作中,水使用於 離子乂換水溶解有為還原劑之一種之抗壞血酸之水取代用 於隔熱膜F合成之際之在氮氣環境中蒸餾之水。首先,準備 於離子交換水60ml溶解有4l.7g之硫酸亞鐵(FeS04.7H20) 之水溶液’進—步,將為還原劑之抗壞血酸24mg加入此水 溶液而溶解。進—步,於上述水溶液混合將21.6g之氩氧化 納(NaOH)溶解於離子交換水而製作之強鹼水溶液6〇ηι卜而 製作了原料懸浮液。使用此原料懸浮液,且使用用於第8實 施例之隔熱膜F之形成的隔熱膜形成裝置2022(第45圖),以 為相同之合成條件之98°C,反覆進行115小時之反應共3 次,而製作了膜厚約150之隔熱膜G。 67 201210789 關於隔熱膜G,為確認是否形成了所期材質之膜,以與 隔熱膜F完全相同之方法,評價了材料。與第1實施例同樣 地’除了評價界定隔熱膜之材料所需之組成及結晶構造 外,還一併評價了孔隙率及維氏硬度。 如此進行而形成於基板上之隔熱膜G從使用螢光X射 線裝置之組成分析及X射線繞射,可確認為晶格常數a〇 = 8.39A之尖晶石型氧化鐵Fe3〇4。於第49圖顯不其X射線繞射 圖形。於第50圖顯示隔熱膜G形成後之表面之膜掃瞄式電子 顯微鏡像。可知與第1實施例之隔熱膜A同樣地,形成為大 小不同之結晶粒子連接,成長成三維之網眼構造之形態的 膜構造及於内部存在由上述網眼構造形成之間隙部份構成 的無數氣孔。 又,與第1實施例同樣地,測定了隔熱膜G之孔隙率與 維氏硬度。結果,隔熱膜G之孔隙率為65%。又,維氏硬度 最大值為Hv380,最小值為Hvl80,平均值為Hv240。於第 51圖顯示測定了上述孔隙率之隔熱膜G之研磨表面之掃瞄 式電子顯微鏡像。從本實施例可知,即使於隔熱膜之合成 使用溶解有還原劑之離子交換水,亦可與第丨〜8實施例之藉 水熱合成所形成之膜同樣地,製作多孔質之肥粒體膜。 接著’在用於上述隔熱膜G之合成之原料懸浮液之製作 中,僅添加為其他種類還原劑之氫醌(24mg)取代使用作為 還原劑之抗壞血酸(24mg)不同,其他以與隔熱膜〇之形成相 同之合成條件,a98°C反應88小時,嘗試了隔熱細之合 成。結果,於基板上形成厚度13 之膜。就此膜,與隔熱 201210789 '同樣&使用螢光x射線裝置之組成分析及x射線繞射 二解析、可知為晶格常數a〇= 8.38A之尖晶石型氧化鐵 3 4於第52圖顯示其乂射線繞射圖形。於第53圖顯示該 膜形成後之縣面之掃叫電子顯微鏡像。可知,粒子之 大小雖與隔熱膜+G不同,但為同樣形態之多孔質膜。 再者’藉選擇較上述隔熱膜G之合成溫度條件低溫之合 成皿度條件’嘗試了隔熱膜I之製作。隔熱膜I之合成如下進 行除了合成溫度條件為88〇CU外,使用與隔熱膜g之合成 完全相同之合成條件與合成I置,將反應時間設定在212小 時’形成了膜。如此進行而得之隔熱期其厚度為25以 進-步’與隔熱膜G同樣地,調查了組成與結晶構造。結果, 可知隔熱膜1為晶格常數a〇U7A之尖晶石型氧化鐵,即為 Fe3〇4於第54圖顯示其X射線繞射圖形。又,於第55圖顯 示該膜形«之絲φ之掃喊t子顯微鏡像。從第洲 可知形成了多孔質膜。 在此,在本實施例中,就可在loot以下之大氣壓下合 成而得之隔熱膜作了敘述,可知在以第卜7實施例之水熱合 成而得之隔熱膜之原料懸浮㈣製作中,即使使用於離子 交換水添加㈣糊之水取代在上述氮氣環境巾蒸顧之水 來作為用於隔熱膜之合成之水,,亦可與本實施例同樣地, 可合成由多孔質之肥粒體構成之隔熱膜。 此外’在隔熱膜之合成方法中,記載了使用抗壞赢酸 或氫酿作為起始原料之還·之方法的例,縣劑非限於 記载於本實施例之該等者,只要為具有防止τ述情形之效 69 201210789 果之還原性試藥,可為任意, 則述情形係前述亞鐵鹽(例如 硫S欠亞鐵)之水溶液中之2價鏹雜 Y m 織離子(以2+離子)在加進強鹼 水>合夜則或加進強鹼水溶液 生成之氫氧化鐵懸浮液中便 立即氧化’而形成3價鐵離子卬3 + 離子)者。舉例言之,亦 可使用氫醌之各種衍生物之 K/谷性氣醌類化合物作為還原 隔熱性之評價 就興本發明之隔熱模具相同之層結構,評價了上站 種隔熱齡及隔熱膜!之隔•[製作了包含本發明之 熱膜G或隔熱船,由相同切料及相同之結構構成之隔 性評價用測定試樣2〇11G、2()11I。於第测顯示配置有 熱膜化収試樣應錢料面圖。取試樣2则系 隔熱膜之㈣為麟25心之隔熱紹之點不同,其他與 56圖所示之結構完全相同之結構。 測定試樣20UG如以下進行而製作。首先,準備直 l〇_〇mm、長度44.0mm,且與用於本第8實施例之隔熱模具 2〇〇1之模具母材2002相同之材質的圓棒,於其一端面之中 心形成直徑3.5mm,深度22.〇_之熱電偶安裝孔2〇12a,而 製作了金屬圓棒之基材2〇丨2。使用此基材2〇12,以與第42 圖所示之方法相同之製作方法,從位於與有熱電偶安裝孔 2012a之端面反向之位置之端面底部至23 〇mm之位置,形成 由厚度之鐵膜構成之隔熱膜基底層2〇13,然後於其上 以與刚述隔熱膜G之形成相同之方法,形成由厚度5〇μ m之 本發明之隔熱膜G構成之隔熱膜2014。接著,於其上從有熱 70 201210789 電安裝孔2012a之端面施行樹脂遮蔽’再以激锻法從端面底 部至23.0mm之位置形成由極薄之把之觸媒微粒子膜構成 的種晶層2015,接著於其上以無電電鍵錄法形成由鎳構成 之基底鍍膜2016(厚度l//m),進一步’於其上以無電電鍍 鎳法形成由厚度6"m之非晶質鎳磷合金膜構成之鍍金屬膜 2017,而形成由基底鍍膜2016及鍍金屬膜2017構成之金屬 被膜層2018。 測定試樣20111係在第56圖所示之測定試樣2011中,取 代由膜厚5〇/zm之隔熱膜G構成之隔熱膜2014,而形成由膜 厚25ym之隔熱膜I構成之隔熱膜而製作的測定試樣。 為比較隔熱性之評價,使用了在第1實施例使用之比較 試樣1211(第33圖)作為完全不具有隔熱膜之結構之比較試 樣。隔熱性之評價係使用在第1實施例使用之隔熱性評價裝 置21(第34圖),如以下進行。首先,使用測定試樣2011G及 比較試樣1211 ’進行了隔熱膜G之隔熱性測定。 本發明之隔熱膜G之隔熱性評價係將放置於室溫而保 持一定之2個測定試樣2〇11G及1211直接以安裝於隔熱板 1024之狀態同時浸泡於第7圖所示之恆溫水槽22之高溫 水,並測定其溫度上升之速度,藉此,調查了升溫時之隔 熱效果。接著’將溫度已上升之測定試樣2〇111:及1211直接 以安裝於隔熱板24之狀態同時浸泡於恆溫水槽23之低溫 水,益測疋其溫度下降之速度,藉此,調查了降溫時之隔 熱效果。 於第57圖顯示溫度上升之時間變化與2個測定試樣之 71 201210789 各自之溫度差之時間變化作為關於將兩測定試樣2011G及 1211從室溫,同時浸泡於保持在9〇c之恆溫水槽22時之溫 度上升之時間變化,與不具隔熱膜之測定試樣1211比較, 設有本發明之隔熱膜之測定試樣2〇11G的測定結果。於第58 圖顯示將溫度已上升之兩測定試樣2011G及1211同時浸泡 於保持在28°C之恆溫水槽時之溫度下降之時間變化的測定 結果。 同樣地,使用測定試樣20111及比較試樣1211,亦進行 了本發明之隔熱膜I之隔熱性評價。於第59圖顯示溫度上升 之時間變化與2個測定試樣之各自之溫度差之時間變化作 為關於將兩測定試樣20111及1211從室溫同時浸泡於保持 在92 C之丨亙溫水槽22時之溫度上升之時間變化,與不且隔 熱膜之測定試樣1211比較,設有本發明之隔熱膜之測定試 樣20111之測定結果。於第60圖顯示將溫度已上升之兩測定 試樣201II及1211同時浸泡於保持在22°C之恆溫水槽時之 溫度下降之時間變化的測定結果。從第57圖至第60圖之結 果可明暸,本發明之二種類之隔熱皆明確具有對外部之溫 度變化,不易將熱傳遞至基材之效果。 第10實施例 如第5實施例所示,為以水熱合成法形成之隔熱膜時, 藉將形成尖晶石型氧化鐵Fe3〇4之鐵離子之一部份以各種 金屬離子置換’可於基材上將各種組成之置換肥粒體製作 成膜狀。與第5實施例同樣地,檢討了在記載於第8、9實施 例之為隔熱膜合成條件之100°C以下的大氣壓下之人成 72 201210789 中’是否可於基材上將各種組成之置換肥粒體製作成骐狀。 首先’嘗試了含有鋁離子作為置換離子之為肥粒體之 鋁系肥粒體的成膜。合成檢討如以下進行。為確認所期之 肥粒體膜可否以與第8實施例所示之方法相同之大氣壓下 的反應形成,用於膜形成之基底基材係與用於第8實施例之 隔熱膜之材料評價者相同之材質(純銅)及相同之形狀的基 板(大小:長50mm、寬20mm、厚度2.0mm),且形成有同樣 之隔熱膜基底層(厚度3#m之鍍鐵膜)者。 將在水60ml中將34.7g之硫酸亞鐵(FeS04.7H20)、7.9g 之硫酸紹(AISO4 . 16H2〇)及抗壞血酸48mg溶解於離子交換 水的水溶液6〇ml與將21.6g之氫氧化鈉(NaOH)溶解於離子 交換水而製作之強鹼水溶液60ml混合,調製了懸浮液作為 處理液。在基材之膜形成係使用第45圖所示之隔熱膜形成 裝置2022,將上述懸浮液放入内容積300ml之不鏽鋼合金製 反應容器2024中,將形成有隔熱基底層之基板浸潰於其 中,並使用夾具2025予以保持。以98°C反應40小時。反應 後’將基板連同夾具一起取出,充分水洗。反應結束後, 於基板上形成了厚度47# m之膜。就此膜,使用螢光X射線 裝置’進行了組成分析。結果,確認了為鐵與鋁之化合物。 又,使用X射線繞射,調查了結晶構造。於第61(a)圖顯示 其X射線繞射圖形。解析之結果,玎明瞭所得之膜僅由晶格 常數a〇=8.35A之尖晶石型結晶構造之化合物構成。即,$ 確認所得之膜為鋁系肥粒體。此外,從此膜之未加工表面 以掃瞄式電子顯微鏡所作之觀察,可知此膜為多孔質膜。 73 201210789 接著’就置換離子為鉻(〇)離子時之肥粒體之成膜,作 了檢討。僅使用下述懸浮液作為處理液之點不同,其他步 驟與前述鋁之成膜檢討時完全同樣地進行,以98。〇反應4〇 小時而成膜,前述懸浮液係將於水60溶解有34 7g之硫酸亞 鐵(FeS04.7H20)、5.6g之硫酸鉻(CrS04.3H20)及抗壞血 酉文48mg之水溶液與將21 6g之氫氧化鈉(NaOH)溶解於離子 交換水而製作之強驗水溶液60ml混合而製作者。於基板上 开>成了厚度6以m之膜》就此膜,與上述銘時同樣地,使用 螢光X射線裝置之組成分析及X射線繞射解析,可知化學組 成為鐵與鉻,為晶格常數a〇=8.39A之尖晶石型結晶構造之 氧化物、亦即為鉻系肥粒體。於第61(b)圖顯示其χ射線繞 射圖形。此外,儘管此膜為薄膜,仍從未加工表面之以掃 瞄式電子顯微鏡所作之觀察,得知此膜為多孔質膜。 就置換離子為鎂(Mg)離子時之肥粒體之成膜,作了檢 討。僅使用下述懸浮液作為處理液之點不同,其他步驟與 上述成膜檢討時完全同樣地進行’以98。〇反應4〇小時而成 膜,前述懸浮液係將於水60ml溶解有34.7g之硫酸亞鐵 (FeS04.7H20)、6.2g之硫酸鎂(MgS04 · 7H2〇)及抗壞血酸 48mg之水溶液與將2l_6g之氫氧化鈉(Na〇H)溶解於離子交 換水而製作之強鹼水溶液60ml混合而製作者。於基板上妒 成了厚度11 之膜。就此膜,與上述同樣地,使用螢光χ 射線裝置之組成分析及X射線繞射來解析,可知化學組成為 鐵與鎮,為晶格常數a〇=8.36A之尖晶石型結晶構造之氧化 物、亦即為鎂系肥粒體。於第61(c)圖顯示其乂射線繞射圖 74 201210789 形。又,此膜也同樣為多孔質膜。 就置換離子為猛(Μη)離子時之肥粒體之成膜,作了檢 討。僅使用下述懸浮液作為處理液之點不同,其他步驟與 前述成膜檢討時完全同樣地進行,以98〇c反應4〇小時而成 膜,前述懸浮液係將於水60ml溶解有34.7g之硫酸亞鐵 (FeS04.7H20)、6.0g之硫酸錳(MnS〇4 . 5h2〇)及抗壞血酸 48mg之水溶液60ml與將21.6g之氫氧化鈉(Na〇H)溶解於離 子交換水而製作之強鹼水溶液60ml混合而製作者。於基板 上形成了厚度18 μ m之膜。就此膜,與上述同樣地解析材料 之結果,可明瞭化學組成為鐵與錳’僅由晶格常數a〇=8 43A 之尖晶石型結晶構造之化合物構成。即,確認了所得之膜 為I孟系肥粒體。於第61(d)圖顯示其X射線繞射圖形。又, 此膜同樣為多孔質膜。 就置換離子為鋅(Zn)離子時之肥粒體之成膜,作了檢 討。僅使用下述懸浮液作為處理液之點不同,其他步驟與 上述成膜檢討時完全同樣地進行,以98。(:反應40小時而成 膜’前述懸浮液係將於水60ml溶解有34.7g之硫酸亞鐵 (FeS04.7H20)、7.2g之硫酸鋅(ZnS〇4 . 7h2〇)及抗壞血酸 48mg之水溶液60ml與將21 · 6g之氫氧化鈉(NaOH)溶解於離 子交換水而製作之強鹼水溶液60ml混合而製作者^於基板 上形成了尽度20 " m之膜。就此膜,與上述同樣地解析材料 之結果,可知化學組成為鐵與辞,為晶格常數aQ=8.45A之 尖晶石型結晶構造之氧化物、亦即為鋅系肥粒體。於第61 (e) 圖顯示其X射線繞射圖形。又,此膜也同樣為多孔質膜。 75 201210789 就置換離子為鈣離子時之肥粒體之成膜,作了檢討。 僅使用下述懸浮液作為處理液之點不同,其他步驟與上述 成膜檢討時完全同樣地進行,以98°C反應40小時而成膜, 前述懸浮液係將於離子交換水溶解有19.9g之氣化亞鐵 (FeCl2.4H20)'7.4g 之氯化鈣(CaCl2,2H20)及抗壞血酸 48mg 之水溶液60ml與將21_6g之氫氧化鈉(NaOH)溶解於離子交 換水而製作之強鹼水溶液60ml混合而製作者。於基板上形 成了厚度21 μ m之膜。關於此膜,與上述同樣地解析材料之 結果’可知化學組成為鐵與鈣,為晶格常數%=8·36Α之尖 晶石型結晶構造之氧化物、亦即為鈣系肥粒體。於第61(〇 圖顯示其X射線繞射圖形。又,此膜也同樣為多孔質犋。 從以上可知,以各種金屬離子置換之各種膜與第5實施 例同樣地,在1〇〇t以下之大氣壓下之合成,可於基 作成膜狀。 產業上之可利用性 具有預定隔熱層之本發明模具不僅具有優異之隔熱 性,還具有優異之模具基材成形面之形成被覆性,可在無 後加工下,一面調整膜厚’一面直接形成,故作為光學元 件、細微圖形形狀之成形體等複雜形狀之樹脂成形的隔熱 膜具為有用。又,亦可應用於奈米壓模用成形模具等用途: 【圖式簡單説明】 第1圖係本發明第2實施例之隔熱模具之概略截面圖。 第2圖(1)〜(5)係顯示本發明第2實施例之隔熱模具之製 作步驟的圖。 76 201210789 第3圖係本發明第2實施例之隔熱膜之X射線繞射圖形 圖。 第4圖係具有本發明第2實施例之隔熱膜之隔熱評價用 試樣的概略截面圖。 第5圖係具有習知隔熱膜之隔熱評價用試樣之概略截 面圖。 第6圖係不具有隔熱膜之隔熱評價之比較試樣的概略 截面圖。 第7圖係用以評價本發明之隔熱膜之隔熱性之測定裝 置的概略結構圖。 第8圖係顯示具有本發明第2實施例之隔熱膜之隔熱評 價用試樣之升溫時之隔熱性評價結果的圖。 第9圖係顯示具有本發明第2實施例之隔熱膜之隔熱評 價用試樣之降溫時之隔熱性評價結果的圖。 第10圖係顯示具有習知之隔熱膜之隔熱評價用試樣之 升溫時之隔熱性評價結果的圖。 第11圖係顯示具有習知隔熱膜之隔熱評價用試樣之降 溫時之隔熱性評價結果的圖。 第12圖係本發明第3實施例之隔熱模具之概略截面圖。 第13圖(1)〜(4)係顯示本發明第3實施例之隔熱模具之 製作步驟的圖。 第14圖係與本發明第3實施例之隔熱模具相同之結構 之隔熱評價用試樣的概略截面圖。 第15圖係不具有隔熱膜之隔熱評價用比較試樣之概略 77 201210789 截面圖。 第16圖係顯示具有本發明第3實施例之隔熱膜之隔熱 評價用試樣之升溫時之隔熱性評價結果的圖。 第17圖係顯示具有本發明第3實施例之隔熱膜之隔熱 評價用試樣之降溫時之隔熱性評價結果的圖。 第18圖係顯示具有本發明第3實施例之隔熱膜之隔熱 評價用試樣之升溫時之隔熱性評價結果的圖。 第19圖係顯示具有本發明第3實施例之隔熱膜之隔熱 評價用試樣之降溫時之隔熱性評價結果的圖。 第20圖係本發明第6實施例之隔熱模具之概略立體圖。 第21圖係本發明第6實施例之模具母材之加工圖形的 截面尺寸圖。 第22圖係顯示於本發明第5實施例之組成含有鋅之隔 熱膜之X射線繞射圖形圖。 第2 3圖係本發明第7實施例之隔熱模具之概略截面圖。 第24圖係習知之隔熱模具之概略截面圖。 第25圖係顯示使用本發明模具,將熔融樹脂成形時之 步驟例之圖。 第26圖係本發明第1實施例之隔熱模具之概略截面圖。 第27圖(1)〜(5)係顯示本發明第1實施例之隔熱模具之 製作步驟的圖。 第28圖係本發明第1實施例之隔熱膜A之X射線繞射圖 形圖。 第29圖係顯示本發明第1實施例之隔熱膜A之研磨表面 78 201210789 之掃瞄式電子顯微鏡像的圖。 第30圖係顯示本發明第1實施例之隔熱膜A之研磨截面 的圖。 第31圖係顯示本發明第1實施例之隔熱膜B之研磨表面 之掃瞄式電子顯微鏡像的圖。 第32圖係與本發明第1實施例之隔熱模具相同之結構 之隔熱評價用試樣的概略截面圖。 第33圖係不具有隔熱膜之隔熱評價用比較試樣之概略 截面圖。 第34圖係用以評價本發明之隔熱膜之隔熱性之測定裝 置的概略結構圖。 第35圖係顯示具有本發明第1實施例之隔熱膜之隔熱 評價用試樣之升溫時之隔熱性評價結果的圖。 第36圖係顯示具有本發明第1實施例之隔熱膜之隔熱 評價用試樣之降溫時之隔熱性評價結果的圖。 第37圖係顯示本發明第4實施例之隔熱膜C、D、E之研 磨表面之掃瞄式電子顯微鏡像的圖。 第38圖係於本發明第5實施例之組成含有鈣之隔熱膜 之X射線繞射圖形圖。 第39圖係顯示於本發明第5實施例之組成含有鈣之隔 熱膜之研磨表面之掃瞄式電子顯微鏡像的圖。 第40圖係顯示本發明之隔熱層之孔隙率之測定方法的 圖。 第41圖係顯示本發明第1實施例之隔熱膜A表面之掃瞄 79 201210789 式電子顯微鏡像的圖。 第42圖係顯示於本發明第5實施例之組成含有鈣之隔 熱膜表面之掃瞄式電子顯微鏡像的圖。 第4 3圖係本發明第8實施例之隔熱模具之概略截面圖。 第44圖(1)〜(5)係顯示本發明第8實施例之隔熱模具之 製作步驟的圖。 第45圖係在本發明第8實施例使用之反應容器之概略 圖。 第4 6圖係本發明第8實施例之隔熱膜之X射線繞射圖形 圖。 第47圖係顯示本發明第8實施例之隔熱膜表面之掃瞄 式電子顯微鏡像的圖。 第48圖係顯示本發明第8實施例之隔熱膜之研磨表面 之掃瞄式電子顯微鏡像的圖。 第4 9圖係本發明第9實施例之隔熱膜G之X射線繞射圖 形圖。 第50圖係顯示本發明第9實施例之隔熱膜G表面之掃瞄 式電子顯微鏡像的圖。 第51圖係顯示本發明第9實施例之隔熱膜G之研磨表面 之掃瞄式電子顯微鏡像的圖。 第5 2圖係本發明第9實施例之隔熱膜Η之X射線繞射圖 形圖。 第5 3圖係顯示本發明第9實施例之隔熱膜Η表面之掃瞄 式電子顯微鏡像的圖。 80 201210789 第54圖係本發明第9實施例之隔熱膜I之X射線繞射圖 形圖。 第55圖係顯示本發明第9實施例之隔熱膜I表面之掃瞄 式電子顯微鏡像的圖。 第56圖係配置有隔熱膜G之隔熱評價用試樣之概略截 面圖。 第57圖係顯示具有本發明第9實施例之隔熱膜G之隔熱 評價用試樣之升溫時之隔熱性評價結果的圖。 第58圖係顯示具有本發明第9實施例之隔熱膜G之隔熱 評價用試樣之降溫時之隔熱性評價結果的圖。 第5 9圖係顯示具有本發明第9實施例之隔熱膜I之隔熱 評價用試樣之升溫時之隔熱性評價結果的圖。 第60圖係顯示具有本發明第9實施例之隔熱膜I之隔熱 評價用試樣之降溫時之隔熱性評價結果的圖。 第61圖係本發明第10實施例之組成不同之隔熱膜的X 射線繞射圖形圖。 【主要元件符號說明】 1,31,51,101,201,10(H,2001...隔熱模具 2,32,52,102,202,1002,1012,2002,2012...模具母材 3,13,203,1003,1013,2003,2013....隔熱膜基底層 4,14,34,44,54,104,114,204,1004,2004,2014... 隔熱膜(隔熱層) 5,15,55,115,205,1005,2005,2015·.·種晶層 6 , 16 , 36 , 46 , 56 , 116 , 206 , 216 , 246 , 1006 , 1016 , 2006 , 81 201210789 2016...基底鍍膜 7,37,47,57,207,247,1007,2007…細微加工金屬膜 7a,37a,57a,107a,207a,1007a,2007a...精密加工表面 8,18 ’ 38 ’ 58,108,118,208,218,1008,1018,2008,2018... 金屬被膜層 1 卜 41,111,21 卜 24卜 34卜 44卜 1011A、1011B,1211 ’2011G, 20111…測定試樣 12,42,112 ’ 212 ’ 242,1012 ’ 1212,2012...基材 12a,42a,112a,212a,1012a,1212a,2012a...熱電偶安裝孔 17,117,217,1017…鍍金屬膜 18,118,218...熱電偶 21.. .隔熱性評價裝置 22.. .高溫水用恆溫水槽 23.. .冷水用恆溫水槽 24.. .隔熱板 25.. .電熱加熱器 26."台 27,28,29...隔熱蓋 35.. .密著層 203a...基底層 301.. .固定模具 401··.可動模具 2021.. .懸浮液 2022.. .隔熱膜形成裝置 82 201210789 2023.. .球管冷凝器 2024.. .反應容器 2025.. .夾具 2026.. .油槽 A-E...隔熱模具51之長方形成形面之一短軸側側面之模具母材52 之5點 A’-E’...另一短軸側側面之模具母材52之5點 R…樹脂 83The sample was produced as follows. Using the polishing sheet No. 1000, the surface of the heat insulating film A was roughly ground from the surface of the film to a depth of about 30 to 5 〇 β m . Next, using a 4th honed polished sheet composed of a polishing material of alumina fine powder, the coarsely polished surface was hand-polished to prepare a sample having a polishing surface for measuring porosity. Next, regarding the heat insulating film A, the measurement area of the porosity is extracted, and the smooth polished surface is observed by a scanning electron microscope (SEM), and the degree of surface roughness is extracted from the entire surface of the sample. The whole sample appears to be flat on one side of the square 〇15. For each of the square areas extracted by SEM observation, as shown in the fourth section (shown in the figure, using the method of measuring the non-contact surface roughness using a laser microscope), the length is 150 "m, width 150/zm. The measurement of the unevenness in the depth direction of the square region is performed. The magnification of the corrected laser beam is 2 times. Then, the upper lateral side of the square region is cut (the image of the cross section of the straight portion of the length is obtained in the obtained cross section) In the depth profile of the uneven shape (Fig. 40(b)), the sum of the distances in the horizontal direction from the surface to the depth of the concave portion is determined, and the ratio of the total distance of the unevenness measured by the laser microscope is obtained (Fig. 40 (4)) Let the percentage of the pores present on the measurement line, that is, the porosity pa丨. Similarly, the length 150_ every 25_, in parallel with the upper side of the above square area, 'pull out the two ends of the joint 6 straight lines, the porosity corresponding to each straight portion is obtained from the cross-section of the cross-section of the straight portions, and the respective porosity μ~ρ&7 obtained from the seven straight portions The value of the sum average 'as the above square Porosity h of the shape region. 32 201210789 For the heat-insulating film A, the porosity Pa, Pb, Pc, and Pd of the square region of one of the above four sides of 150 μm are obtained, and the heat-insulating film is calculated from the sum of the average values. The porosity P of A. Further, regarding the porosity, the measurement error in the sampling of the measurement region is considered, and it is displayed as a value of P per 5% as the value of the porosity P of the thermal insulation film A. The porosity of the heat-insulating film A was 55%. The scanning electron microscope image of the polishing surface of the heat-insulating film A in which the porosity was measured was measured in Fig. 29. Further, the heat insulation was measured using a Vickers hardness tester. Vickers hardness of film A. The Vickers hardness tester used has a regular quadrangular diamond indenter and the hardness is measured under the condition of a test load of 5 〇g. The sample for the thermal insulation film used for the measurement is not susceptible to heat insulation. The influence of the hardness of the substrate of the film substrate is determined by measuring the film cross section of each of the heat insulating film samples for the measurement of the porosity. The method of grinding the heat insulating film is the same as the method of measuring the respective porosity, and the smoothing is performed. The cross section is used as a surface for Vickers measurement. Fig. 30 is a view showing the polishing cross section of the heat insulating film a. There are many abrasive smooth surface areas which can be pressed into the size of the diamond indenter for evaluation, and the Vickers hardness can be measured by pressing the Vickers indenter. The measurement was carried out by measuring any 12 of the regions formed by the smooth surface in the surface of the polishing cross section shown in Fig. 30. As a result, it was synthesized under the same reaction conditions as the thermal barrier film. The heat-insulating film A has a Vickers hardness maximum value of Hv407, a minimum value of Hvl9〇, and an average value of Hv257. _ Next, the heat of the heat-insulating film sample a with the above-mentioned porosity of 55% is selected. The synthesis conditions 'the production of the heat insulating film sample B having a porosity different from that of the heat insulating sample A was attempted. 33 201210789 The formation of the thermal barrier film B is carried out as follows. That is, 60 ml of water prepared by distillation in nitrogen gas was dissolved in an aqueous solution of 10 g of ferrous sulfate (FeS04 · 7H20) and 21.6 g of hydrogen in the same aqueous solution as the aqueous solution for the synthesis of the heat insulating film A. A 60 ml portion of a sodium oxide (NaOH) aqueous solution was mixed to prepare a suspension. The suspension as the starting material 'using the same reaction vessel as the synthesis of the heat insulating film A' will form an insulating base layer (the same iron film as the heat insulating base layer 1003 of the heat insulating mold 1). The sample substrate was dipped therein and held using a jig. Further, the above work was carried out in a nitrogen atmosphere. This high pressure helium reaction vessel was heated from the outside and reacted at 140 ° C for 12 hours. After the reaction, the sample substrate is taken out together with the jig, and at the same time, it is separated from the powder compound of the reaction residue, and sufficiently washed with water. The autoclave reaction vessel was similarly washed with water to remove the reaction residue, and then re-blended with the same amount of suspension as above. The mold base material was again mounted together with the jig, and reacted at 140 ° C for 12 hours in the same manner. By repeating this operation a total of 8 times, a heat insulating film B having a film thickness of 15 〇vm was formed. The heat insulating film B thus obtained is also a black film. With respect to this film, the composition, crystal structure, and porosity were investigated in the same manner as the heat insulating film A. As a result, the heat insulating film B was also the same spinel type iron oxide Fe3〇4 having the same lattice constant a 〇 = 8.40 A as that of the heat insulating film a. Further, the surface after the formation of the film of the heat-insulating film was observed from a scanning electron microscope (SEM), and as in the case of the heat-insulating film A, a sharp angle was formed, and the crystal grains of the twin crystal were continuously observed. It grows into a three-dimensional film' and forms a porous film in which numerous pores are present inside the film. In the same manner as the heat insulating film A, the porosity and the Vickers hardness of the heat insulating film B were measured, and the porosity was 40%, the Vickers hardness maximum was Hv435, the minimum 34 201210789 was Hv239, and the average value was Hv298. Fig. 31 shows a scanning electron microscope image of the polished surface of the thermal barrier film B in which the porosity was measured. Evaluation of the heat insulating properties The heat insulating properties of the two types of the heat insulating film A and the heat insulating film b were evaluated in the same layer structure as the heat insulating mold of the present invention. The measurement samples 1011A and 1011B for heat insulation evaluation including the heat insulating material a or B and having the same material and the same structure were produced. Fig. 32 is a schematic cross-sectional view showing a sample 1011A in which the heat insulating film a is disposed. The measurement sample 1〇11B differs only in the case where the material of the heat insulating film is the heat insulating film B, and the other is the same structure as the structure shown in Fig. 32. The measurement sample 1011A was produced as follows. First, a round bar having a diameter of 10.0 mm and a length of 44.0 mm and having the same material as that of the mold base material 1002 used for the heat insulating mold of the present embodiment was prepared, and a diameter of 3.5 mm and a depth of 22_0 mm were formed at the center of one end surface thereof. The thermocouple is mounted with a hole 1012a to form a substrate 1012 of a metal round bar. Using this substrate 1012, in the same manufacturing method as that shown in Fig. 27, a thickness of 3//m is formed from the bottom of the end face at a position opposite to the end face having the thermocouple mounting hole 1012a to a position of 30.0 mm. The heat insulating film base layer 1013 composed of an iron film is then formed thereon with a heat insulating film 1014 composed of the heat insulating film A of the present invention having a thickness of 50 μm. Next, a resin mask is applied from the end surface of the thermoelectric mounting hole 1012a, and a seed layer 1015 composed of a very thin palladium catalyst particle film is formed by sputtering from the bottom of the end surface to a position of 23.0 mm. The base mineral film 1 〇 16 (thickness l " m) composed of nickel is formed by electroless plating, and further, an amorphous nickel-phosphorus alloy film having a thickness of 6 " m is formed thereon by electroless nickel plating. The ore metal film 1〇17' is formed to form a metal film layer 1018 composed of a base mineral film 1016 and a mineral metal 35 201210789 film 1017. The measurement sample 1011B is a measurement sample prepared by forming a heat-insulating film made of heat-insulating film instead of the heat-insulating film 1014 formed of the heat-insulating film A in the measurement sample 1〇1 JA shown in FIG. . In order to compare the evaluation of the heat insulation, it was also produced without a thermal insulation film. < Comparative sample 1211. The structure of this comparative sample is shown in Fig. 33. It is prepared to be processed into the same shape of the substrate 1212 in the same material as the above substrate 1012, and is retained from the bottom of the end face to 23. At a position of 0 mm, resin shielding was performed on the end face side of the thermocouple mounting hole 1212a. Thereafter, a wood strike plating bath is formed by wood to form a base 1 film 1216 made of a nickel-plated film, and then formed by a thickness-free amorphous nickel-phosphorus alloy film by electroless plating. The metal film 1217 is plated to form a metal film layer 1218. In this manner, a measurement sample 1211 was produced. The three kinds of measurement samples 10UA, 1011B, and 1211 produced in this manner were evaluated as follows, and the heat insulating properties were evaluated. Fig. 34 is a schematic cross-sectional view showing the heat insulating property evaluation device 21 used in the present embodiment. This apparatus is made of a rigid foamed styrene resin of the same size, which is composed of a transparent glass beaker, and is made of a rigid foamed water tank 23, a cold water constant temperature water tank 23, and three measurement samples 1011A, 1011B, and 1211. The upper surface of each of the thermostatic chambers can be formed into a size of a cover (square, size 20 cm) and a heat-insulating plate 1〇24 having a thickness of 5 mm. The electrothermal heater 25 is disposed below the constant temperature water tank 22 for high temperature water, and is formed into a heatable structure. Next to this, the cold water temperature control water tank 23 is mounted on the table 26 at the same height. The diameter of the heat insulating plate 1024 is 10. Three of 〇mm are inserted through 36 201210789 holes, and the measurement samples 1011A, l〇UB, and 1211 are disposed so that the metal bead layer is formed, and the end face of the sample is measured to 2 mm & Exposed to the lower part. In each of the measurement samples, thermocouples 18, 118, and 218 are attached to the I-couple female hole provided at the other end surface, and these are connected to the respective temperature display meters 19, 119, and 219, and are formed to be displayable. The structure of the temperature of the substrate of the metal round bar of the sample was measured. In addition, in order to reduce the influence of the outside air temperature on the temperature measurement result, each measurement sample is 1〇11, 1〇nB, 12丨1, and the upper part connected to the thermocouple is completely shielded from the heat shield. The upper side is exposed to the outside, and is covered with a foamed styrene resin insulating cover 27, 28' 29 of exactly the same shape. The two constant-temperature water tanks 22 and 23 are placed in high-temperature water and cold water to be immersed in the portion from the lower end surface of the three kinds of measurement samples 1011A, 1011B, and 1211 mounted on the heat insulating plate 24 to 15 mm. During the measurement, the high-temperature water constant temperature water tank 22 uses the electric heater 25 to adjust the water temperature to a constant temperature, and the cold water is replaced with cold water by the constant temperature water tank 23, and is kept at a constant water temperature. In the heat insulation evaluation of the heat-insulating film of the present invention, the three measurement samples 1011A, 1011B, and 1211 which are kept at a constant temperature are placed in the heat insulating plate 1024 and simultaneously immersed in the heat insulating property evaluation device 21 The constant temperature water tank 22 was kept at a high temperature of 95 ° C, and the temperature rise rate was measured. Thus, the heat insulating effect at the time of temperature rise was examined for 5 weeks. Next, the measurement samples 1011A, 1011B, and 1211 whose temperature has risen are directly immersed in the water of 32 ° C while being immersed in the constant temperature water tank 23 while being mounted on the heat insulation board 24, and the speed at which the temperature is lowered is measured. Therefore, the insulation effect at the time of cooling was investigated. Fig. 35 is a graph showing the time variation of the temperature change and the temperature difference between the two measurement samples of 37 201210789, as the temperature rise from the room temperature while being immersed in the constant temperature water tank 22 maintained at 95 °C. The measurement time of the measurement sample 1011A (porosity: 55%) and ioiib (porosity: 40%) of the heat insulating film of the present invention was compared with the measurement sample 1211 which does not have a heat insulation film. In Fig. 36, the measurement samples 1〇11A, 1011B, and 1211 whose temperature has risen are simultaneously immersed and kept at 32. (The measurement result of the time change of the temperature drop in the constant temperature water tank. It is also clear from the results of Fig. 35 and Fig. 36 that the heat insulating film of the present invention has a temperature change to the outside, and it is difficult to transfer heat to the base. Further, it is also known that the measurement sample of the heat insulating film having a larger porosity has a heat insulating effect. The second embodiment shows the cross section of the laminated structure of the heat insulating mold of the present embodiment in the first embodiment. The heat insulating mold 1 is a stainless steel mold for forming a resin material having a fine fine (four) shape, and is composed of the following layer structure. That is, a film is formed on the surface of the mold base material 2 described below. The base layer of the heat-insulating film formed by the thick iron film 3' The aforementioned mold base material has a cap shape of a height of 2.5 mm (diameter 25. 0 drying), and the height from the bottom is 15 〇, the diameter is ugly, and then form a thick buckle on the base layer of the thermal insulation film - the iron-based fertilizer granules (ie, spinel-type iron oxide The spacer film 4 is formed, and the seed layer 5 composed of the mosquito catalyst fine particle film is placed thereon, and then the metal film layer 8 is placed upright. This metal film layer 8 is composed of (4) a finely processed metal film 7 (average thickness of one m) composed of an amorphous nickel-phosphorus alloy film formed by a thickness of 2 (four) and a step formed thereon. This fine processing 38 201210789 The forming surface side of the metal film 7 is formed as a precision machined surface 7a in which a fine pattern for press forming of a molded part is machined. The manufacture of the heat insulating mold of this embodiment was carried out in the same manner as in the first embodiment. An example of the manufacturing steps is shown in Fig. 2. On the surface of the molding surface side of the mold base material 2, an iron sulfate plating bath was used to form a heat insulating film base layer 3 composed of an iron film having a thickness of 3/m. Then, a heat insulating film 4 made of spinel type iron oxide having a thickness is formed on the surface. The heat insulating film 4 is formed as follows. First, 60 ml of water produced by distillation in nitrogen was dissolved in 41. 7g of ferrous sulfate (FeS〇4. 7H2〇) aqueous solution and 21. 6 g of a sodium hydroxide (Na〇H) aqueous solution was mixed in 60 ml to prepare a suspension as a treatment liquid. The suspension was placed in a 200 ml stainless steel autoclave reaction vessel, and the mold base material on which the heat insulating base layer 3 was formed was impregnated therein and held by a jig. The mold base material was previously shielded with a sealing tape made of tetrafluoroethylene to form a molding surface of the heat insulating base layer 3. Further, the above work was carried out in a nitrogen atmosphere. The high pressure dad reaction vessel was heated from the outside to 150. 〇Reaction for 10 hours. After the reaction, the mold base material was taken out together with the jig, and separated from the powder compound formed at the same time, and sufficiently washed with water. The high-pressure dad reaction vessel is also similarly taken to remove the powder (the powder is formed, and the internal water is washed, and the same amount of the suspension is replaced again, and then the mold base material is installed together with the missing piece, the same as '150° C was reacted for 10 hours, and this operation was repeated for a total of 6 times to form a heat-insulating film 4 made of spinel-type iron oxide having a film thickness of 15 Å #m. Thus, the mold having the laminated film was washed with water. After it is sufficiently dried, a palladium particle film is formed on the surface of the heat insulating film 4 by using a DC sputtering device equipped with a palladium target material, whereby the seed layer 5 is formed. Next, the electroless nickel is applied at the time of no electricity 39 201210789 And coating a base coating film composed of a nickel film having a thickness of 2/m, and forming a finely processed metal film 7 composed of a recording film alloy film of a precision processing thickness of 15 〇em by electroless nickel plating method, whereby After the metal coating layer 8 was produced, heat treatment was performed at 200 ° C for 3 hours. Then, the precision machined surface 7a was formed by a precision cutting machine to obtain a heat insulating mold 1 for a fine processing die. 'Do you want to end up? The film of the desired material is additionally prepared as a square plate of the same material as the base material 2 of the mold (size. 18. 0mm square, thickness 2. 0 mm), in the step of producing the above-mentioned heat insulating mold, the same heat insulating film base layer was formed. Thereafter, in the step of forming the heat insulating film 4 of the heat insulating mold 1, the sample of the square plate is also placed in the same autoclave reaction container together with the heat insulating mold 1, and the square plate sample is also separated. The hot film 4 simultaneously forms a heat insulating film. The same material evaluation as in the first example was carried out on the film formed on the square plate. The results of the analysis of the composition of the Yingguang X-ray device are combined with. As a result of analysis of the X-ray diffraction pattern (Fig. 3) obtained by X-ray diffraction, it was confirmed that the heat insulating film 4 has the same lattice constant as that of the heat insulating film 1004 shown in the first embodiment. =8. 4 The tip of the monk is a spar-type iron oxide Fe3〇4. Further, the heat insulating film 4 has a porosity of 55%, a Vickers hardness Hv maximum of 410, a minimum value of 180, and an average value of 265. The evaluation of the heat insulating property is to evaluate the heat insulating performance of the heat insulating mold of the structure of the present invention, and the heat insulating film of the present invention is prepared, and the heat insulating property evaluation sample 11 composed of the same material and the same structure is produced. . A schematic cross-sectional structural view is shown in Fig. 4. This measurement sample 11 was produced as follows. First, prepare the diameter 40 201210789 9. 5mm, length 45_0mm, and the same material as the mold base material 2 used for the insulating mold 1 of the structure of the present embodiment, the diameter of the round bar is formed at the center of one end face thereof. 5mm ‘depth 22. A 0 mm thermocouple mounting hole 12a. Further, in order to make the heat insulating film formed on the upper surface excellent in adhesion, a concave and convex groove having a pitch of 125 β m and a depth of 15 μm was formed on the entire surface of the round bar, and the substrate 12 of the metal round bar was produced. . The substrate 12 is used in the same manner as the heat insulating mold of the present embodiment, from the bottom end of the end surface opposite to the end surface having the thermocouple mounting hole 12a to 30. At a position of 0 mm, a heat insulating film base layer 13 composed of a thick iron film was formed, and then a heat insulating film 14 made of the spinel type iron oxide of the present invention having a thickness of 150 / / m was formed thereon. Then, resin shielding is performed on the end surface of the thermoelectric mounting hole 12a, and the seed layer 15 composed of the extremely thin palladium catalyst fine particle film is formed by sputtering from the bottom of the end surface to the position of the 23 claws. A base plating film 16 (thickness 2/zm) composed of nickel is formed thereon by electroless nickel plating. Further, an amorphous nickel-phosphorus alloy film having a thickness of 18 #m is formed by electroless nickel plating. The metal film 17 is plated to form a metal film layer a composed of the base mineral film 16 and the metal film π. For the evaluation of the heat insulating properties, comparative samples of two different structures as shown in Figs. 5 and 6 were also produced. One of the comparative samples has a measurement sample 111 of a conventional heat-insulating film using a ruthenium oxide spray film as a heat-insulating film, and its structure is shown in Fig. 5. The measurement sample m was produced as follows. It is prepared to process the substrate 112 having the same shape in the same material as the substrate of the measurement sample u described above, from the bottom end of the end surface opposite to the end surface having the thermocouple mounting hole 112a to 3 〇〇 Position 'spraying the high-temperature oxidized frequency particles homogeneously into a flat 41 201210789 The average thickness is about 2 5 0, for example, and ^, γ,. / became a spray film. This refining film is precisely ground to form a thin film to a thickness of 15 G/m, and an oxidized film = a thermal film U4. Thereafter, resin shielding is performed from the end face of the end face to the end face side of the (4) even mounting hole 112a. The treatment step before the release of the month y U and the impregnation treatment of the stannous chloride solution in the test and the subsequent impregnation treatment of the methylene chloride domain form a seed layer of 115 ° on which the seed layer is formed. The underlying plating film 116 (thickness: 2 μm) is formed thereon, and a metal film layer 117 composed of an amorphous age gold film of a thickness core (7) is formed thereon by an electroless magnetic bonding method to form a metal film layer 118. In this manner, a measurement sample ln was produced. Another comparative sample was a measurement sample 211 having no heat insulating film at all. The structure is shown in Fig. 6. It is prepared to process the substrate 212 of the same shape in the same material as the above substrate 12 or 112, from the bottom of the end face to 23. At a position of 0 mm, resin shielding was performed on the end face side of the thermocouple mounting hole 212a. Thereafter, the plating bath was struck with wood to form a base plating film 216 having a thickness of 2/zm composed of a nickel-plated film, and then an amorphous nickel phosphorus having a thickness of 18 vm was formed thereon by electroless nickel plating in the same manner as described above. The alloy film constitutes the money metal film 217, and the metal film layer 218 is formed. In this manner, a measurement sample 211 was produced. The three types of measurement samples 11, 111, and 211 produced as described above were evaluated as follows, and the heat insulating properties were evaluated. The evaluation of the heat insulating property was evaluated in the same manner using the same apparatus as the heat insulating property evaluation device shown in Fig. 34 used in the first embodiment. Here, instead of the measurement samples 1011A, 1011B, and 1211 of the first embodiment, the measurement samples 11'111 and 211 of the present embodiment are placed in a heat insulating property evaluation device and measured. In addition, the heat insulation plate holding the three measurement samples is provided with a diameter of 9. The heat insulating plate 24 of the three through holes of 5 mm replaces the heat insulating plate 1024 used in Fig. 34. The state at the time of evaluation of this measurement is shown in Fig. 7. In the evaluation of the heat insulating property, the three measurement samples 11, 111, and 211 which are placed at room temperature and held at a constant temperature are simultaneously immersed in the heat insulating property evaluation device 21 shown in FIG. The thermostatic water tank 22 was kept at 90 C of warm water, and the temperature rise rate was measured, thereby investigating the heat insulating effect at the time of temperature rise. Then, the measurement samples u, m, and 211 whose temperature has risen are directly immersed in the cold water maintained at 20 ° C in the constant temperature water tank 23 while being attached to the heat insulating plate 24, and the temperature is lowered. In this way, the insulation effect during cooling is investigated. Fig. 8 is a graph showing the time variation of the temperature change between the temperature rise and the temperature difference between the two measurement samples as a time change with respect to the temperature rise when immersed in the constant temperature water tank 22 maintained at 9 °C from room temperature. The measurement result of the measurement sample nail of the heat insulation film of the present invention is provided in comparison with the measurement sample 211 which does not have a heat insulation film. Fig. 9 shows the measurement results of the time when the temperature of the measurement samples u and 2, which have been raised in temperature, are simultaneously immersed in the temperature drop of 2 (TC strange temperature water tank). Similarly, the conventional heat insulation is provided. The measurement sample lu is shown in the first and fourth figures in the same manner as the measurement sample of the thermal insulation film of the present invention described above. The results from Fig. 8 to Fig. 11 are also clear. It is understood that the effect of the temperature of the outer surface of the heat insulating film of the present invention on the substrate is clearly '.', 43 201210789 It is also known that the heat insulating effect is almost the same as that of the conventional heat-insulating film. For example, a cross-sectional view of the laminated structure of the heat insulating mold of the present embodiment is shown in Fig. 12. The heat insulating mold 31 is used for a resin molded mold of an optical element having a fine micromachined surface. In other words, a heat insulating layer 34 made of spinel-type iron oxide having a film thickness of 105/zm is disposed on the surface of the mold base material 32 described below, and the mold base material is processed into a substantially formed shape of an optical element. The size of the cylinder is 1〇〇mm in diameter And a lower portion having a diameter of 14. 0mmx height 2. 〇mm's hat shape part, by height 15. 0mm steel material constructor. An adhesion layer 35 made of an iron film having a thickness of 3/zm is disposed on the surface of the heat insulating layer, and a metal film layer 38 is placed thereon. The metal film layer 38 is composed of a nickel base plating film 36 made of a thickness of 2 μm and a finely processed metal film 3 made of an amorphous nickel-phosphorus alloy film having a thickness of 1 m. Further, the surface of the finely processed metal film 37 is a formed transfer surface at the time of resin molding, and is formed into a precision machined surface 37a which is finely processed into a shape of a molded object. Fig. 13 shows the steps of the method of manufacturing the heat insulating mold of the present embodiment. First, the same raw material and the same autoclave reaction vessel as in the second embodiment were used, and the same hydrothermal reaction was repeated four times, and the bar stock made of the steel mainly composed of iron was mechanically processed. The molding surface of 32 is formed of a heat-insulating film 34 made of spinel-type iron oxide having a thickness of 105 # m (Fig. 13 (1)). Further, the mold base material is preliminarily shielded from the molding surface of the mold base material 32 by a sealing tape made of tetrafluoroethylene. 44 201210789 In this way, after the mold in which the heat insulating film 34 is formed is washed with water, an adhesion layer 35 made of an iron-plated film is formed by an electroplating method using an organic acid iron plating bath of #-like acid (Fig. 13 (2) ). Next, a base plating film 36 made of a nickel film having a thickness of 2//01 was coated by an electroless nickel plating method. Further, the metal film layer 38 is formed by the electroless nickel plating method, and the metal film layer 38 is formed by a precision processing alloy plating film having a thickness of 15 〇em, and is heat treated at 20 (TC for 3 hours). (3)). Thereafter, the surface of the finely processed metal film 37 is machined to form a precision machined surface of the shape of the formed object by using a fine cutting machine, thereby producing a resin for the optical element. The formed heat insulating mold 31 (Fig. 13 (4)). Thus, it is understood that since the spinel type iron oxide constituting the heat insulating film of the present embodiment is a conductive metal oxide, it can be a known manufacturing step. It is regarded as the secret method of reading the precision ceramics (4) and directly forms a metal film. The evaluation of the heat insulation property is to evaluate the heat insulation performance of the above-mentioned heat insulation mold, and the heat insulation film containing the present invention is produced from the same material and the same The thermal conductivity evaluation 4 of the structural configuration is shown in Fig. 14. A schematic cross-sectional view is shown in Fig. 14. This measurement sample 41 is produced as follows. First, 'preparation diameter, length 5: in: and: implementation Example mold base material 32 phase The round bar of #f, the thermocouple measured by ==, in the turn-~ becomes 』==, the thermocouple of the right-handed thermocouple is mounted with a through-hole shape, and the axial direction forms a right angle, and the substrate 42 is fabricated. One end is pre-shielded with a four-air-binder sealing tape, similar to the method of forming the IS film: 45 201210789 thermal insulation film 34, at the bottom end of the end face from the other end 22. A heat-insulating film 44 having a thickness of 1〇5//111 is formed at 0〇1111. Next, keep the bottom of the end face to 20. At the position of 0 mm, the remaining portion is shielded by the resin sealing material. In the same manner as the method of forming the adhesion layer 35 of the heat insulating mold 31, the adhesion layer 45 composed of a mineral iron film is formed, and further, no electric key is used. The ruthenium method was coated with a base film 46 made of a nickel film having a thickness of 2, and a metal film 47' made of a nickel-phosphorus alloy ruthenium for precision machining having a thickness of 28/zm by an electroless nickel plating method. Sample 41. The measurement sample 241 having no heat-insulating film was produced as follows, and was used as a comparative sample for evaluation of the heat insulating property of the measurement sample 41 having the heat-insulating film of the present invention. A schematic cross-sectional view is shown in Fig. 15. The substrate 242 having the same shape as that of the above-mentioned substrate 42 is prepared, and is retained from the bottom of the end face to 20. At a position of 0 mm, resin shielding was performed on the end face side of the thermocouple mounting hole 242a. Then, a base plating film 246 having a thickness of 2 made of a nickel-plated film is formed by electroless nickel plating, and then an amorphous nickel-phosphorus alloy film having a thickness of 28 "ιη is formed by electroless plating in the same manner as above. A metallized film 247 is formed. In this manner, the measurement sample 241 was produced. The measurement samples 41 and 241 produced in this manner were changed to have a diameter of 6. In addition to the measurement samples 41 and 241, the device having the same configuration as that of the heat insulation evaluation device 2 used in the first embodiment is used for the simultaneous heat insulation in the same manner as in the first embodiment. Evaluation of sex. In addition, the heat insulating properties were evaluated by immersing the measurement samples 41 and 241 attached to the heat insulating film 24 from the lower end surface to a portion of 15 mm in the high-temperature water and cold water stored in the constant temperature bath. 46 201210789 Figure 16 shows the time change of temperature rise from room temperature while immersed in a constant temperature water bath maintained at 95 ° C. Compared with the measurement sample 241 without a heat shield film, the heat insulation of the present invention is provided. The measurement result of the measurement sample 41 of the film. In Fig. 17, it is shown that the measurement samples 41, 241 whose temperature has risen are directly at different temperatures, and then immersed at 18 at the same time. The measurement result of the time change of the temperature drop in the warm water tank. As is clear from the results of Figs. 16 and 17, it is understood that the effect of the heat-insulating film of the present invention on the external temperature change is not easy to transfer heat to the substrate as in the results of the third embodiment. Further, in the same manner as the above-described measurement sample, the measurement sample 341 having a thickness of 15 / zm and a measurement sample 441 having a thickness of 3 m in thermal insulation film were prepared, similarly to the above-described heat insulation measurement. Three samples of the measurement sample 241 not having the heat insulating film were evaluated. However, the heat insulation properties were evaluated by immersing the portions of the three test specimens 241, 341 '441 from the lower end surface to 19 mm in the high temperature water and cold water stored in the constant temperature bath. In Fig. 18, the time change of the temperature rise from the room temperature while being immersed in the water bath maintained at 95° is shown, and the present invention is provided in comparison with the measurement sample 2 41 without the heat insulating film. The measurement result of the measurement sample 3 4 4 4 4 i of the heat insulating film. Fig. 19 shows the time change of the temperature drop when the measurement samples 24, 341 and 441 whose temperature has risen are directly at different temperatures, and then simultaneously immersed in a warm water bath maintained at 27 °C. As is clear from the results of the first and third figures, it is understood that the heat-insulating film of the present invention has a film thickness of 15 " m as compared with the results of the third embodiment, and it is difficult to transfer heat to external temperature changes. The effect on the substrate is still clear. 47 201210789 Fourth Embodiment As shown in the first embodiment, by selecting the reaction conditions for hydrothermal synthesis, it is possible to form a heat-insulating film having different porosity which greatly affects the heat insulating performance. In the present embodiment, three types of heat insulating red, D, and E having different porosity were produced by various changes in hydrothermal synthesis conditions. Further, in the hydrothermal synthesis, all of the raw material solutions were prepared by using water saturated with nitrogen. The base substrate used for the formation of the heat-insulating film is assumed to be an iron mold, and three rectangular substrates made of iron are prepared (size: length 5 mm, width 2 mm, thickness 2. 0 mm) ' Each of the heat insulating films is formed on the surface of the substrates. The heat insulating film C is formed as follows. Will dissolve in water 6〇ml 38. 3g of ferrous sulfate (FeS〇4 · 7H2〇) aqueous solution and 29. 7 g of a sodium hydroxide (NaOH) aqueous solution was mixed at 6 〇mi to prepare a suspension. The suspension was placed in a high-pressure dad reaction vessel of the same shape as that of the user of the first embodiment, and a dislocation was used, the base substrate was held, and the reaction vessel was sealed, and the reaction vessel was sealed. maintain. After 45 hours, the pressure inside the reaction vessel rose to 0. 2〇MPa. Thereafter, the heating is stopped, the pressure valve is opened, the internal pressure is released, and the reaction vessel is opened, and the sample substrate is taken out together with the jig while being separated from the reaction residue, and sufficiently washed with water. Thereafter, the reaction vessel was similarly removed to remove the reaction residue, and the inside was washed with water, and the same amount of the above suspension was again taken, and the substrate after washing with water was used in the same manner as in the holder. (: Reaction for 45 hours. By repeating this operation, '6 persons' formed a heat-insulating film C having a film thickness of 146/zm. The heat-insulating film C formed in this manner, and the heat-insulating film A of the first embodiment In the same manner, the chemical composition, the crystal structure, the porosity, and the Vickers hardness were investigated using a fluorescent X-ray apparatus, an X-ray diffraction apparatus 48, 201210789, a laser microscope, a Vickers hardness tester, and the like. It can be confirmed that the thermal insulation film c is a lattice crane number a〇=8. 4〇A of spinel-type iron oxide Fe3〇4 〇, it is known that its porosity is 5% ′′, the maximum Vickers hardness is Hv314, the minimum value is 23〇, and the average value is HV278. The method of forming the heat insulating film D is as follows. First, it will be steamed in nitrogen and 60ml of water is dissolved. 7g of ferrous sulfate (FeS〇4. 7h2〇) aqueous solution and 26. A suspension of 0 g of a sodium hydroxide (NaOH) aqueous solution of 6 〇 ml was prepared to prepare a suspension. This suspension was placed in a reaction container having the same shape as that used for the heat insulating crucible C, and reacted with U (rc for 40 hours) in the same manner as in the case of the thermal barrier film C. After the reaction, the substrate on which the film was formed was taken out. The water is thoroughly washed, and the substrate is immersed in a new raw material suspension in a reaction vessel, and the container is sealed to the same size. (: 40 hours of reaction is carried out. This operation is repeated 4 times in total) The film thickness 150 of the thermal insulation film D. The thermal insulation film D is evaluated by the material's result, from the lattice constant a 〇-8. 40A of spinel-type iron oxide fqO4, the porosity, the maximum Vickers hardness is Hv560, the minimum value is Hv303, and the average value is Hv448. The method of forming the heat insulating film E is as follows. First, 60 ml of water prepared by steaming in nitrogen is dissolved in 41. 7g of ferrous sulfate (Fes〇4. 7 〇) aqueous solution and 21. 6 g of a sodium hydroxide (NaOH) aqueous solution was mixed at 6 〇 ml to prepare a suspension. This suspension was placed in a reaction container having the same shape as that for forming the heat insulating film c, and was similar to 145 in the case of the heat insulating film c. 〇 Reaction for 9 minutes. After the reaction, the substrate on which the film was formed was taken out, sufficiently washed with water, and the substrate was immersed in a new raw material suspension in a container of Reaction No. 20121010789, and the container was sealed and reacted at 145 ° C for 90 minutes. This operation was repeated 14 times in total to form a heat-insulating film E having a film thickness of 150 #m. In this way, a black heat-insulating film E was obtained, and as a result of evaluating the material, the heat-insulating film E was made by a lattice constant aQ=8. 4〇A of spinel-type iron oxide Fe304, the porosity of which is 75%. However, the heat-insulating film E having a porosity of up to 75% in porosity cannot be obtained by pressing a Vickers indenter to form a smooth polished surface having a size of a depression of the indentation, so that the Vickers hardness cannot be measured. Fig. 37 shows a scanning microscope image of the polished surfaces of the heat insulating films C, D, and E having different porosity. Further, the surface of the heat-insulating film C, D, and E is formed in the same manner as the heat-insulating film A, and is formed into a film in which a crystal grain of a sharp-angled twin crystal is continuously grown into a three-dimensional film, and is formed in the film. There are numerous porous membranes with numerous pores inside the membrane. It is known that the oxidized error-sintered body or the sprayed film of the conventional heat insulating oxide material has a Vickers hardness Hv of as high as 1200 and is a difficult-to-process material. On the other hand, it is understood that the material of the heat insulating film of the present invention is a material which is low in hardness regardless of the porosity and which can be easily subjected to fine cutting such as precision cutting and precision grinding as in the conventional precision ceramics. The fifth embodiment has examined whether a part of the iron ions forming the spinel-type iron oxide Fe304 is replaced with various metal ions, and whether the replacement fertilizer bodies of various compositions can be hydrothermally synthesized on the substrate. Membrane. These fertilizers and granules have almost no difference in thermal conductivity due to the type of ion exchange, but they can be used as a replacement for the heat-insulating film of the mold due to the change of other material properties such as thermal expansion rate. Forming is important. The formation of the replacement fertilizer granule film of various compositions is carried out in the preparation of the raw material solution, and water which is distilled in nitrogen gas is used. First, the film formation of the lanthanum granules containing calcium ions as replacement ions as the fertilizer granules was attempted. The synthesis of the above-mentioned replacement fertilizer granule film was carried out as follows. In order to confirm whether the desired fat granule film can be formed by the same hydrothermal reaction as the method shown in the first embodiment, the base substrate for bismuth formation and the material evaluation for the thermal insulation film of the first embodiment are used. The same material (pure copper) rectangular opening > substrate (size: length 50mx width 20mmx thickness 2. 0 mm), and the same heat-insulating film base layer (thickness iron film of 3 cm thickness) was formed. It will dissolve in water. 9g of gasified ferrous iron (FeCl2 · 4H20) and 7. 4g of vaporized calcium (CaCl2. 2) 0) aqueous solution 60ml and 21. 6 g of a sodium hydroxide (NaOH) aqueous solution was mixed at 6 ml, and a suspension was prepared as a treatment liquid. The suspension was placed in a stainless steel autoclave reaction vessel having the same internal volume as that of the user of the first embodiment, and the base substrate for evaluation was impregnated therein and held by a jig. . After l5 (rc reaction for 2 hours, the substrate is taken out together with the jig 'is separated from the powder compound formed at the same time' and fully washed with water. The high pressure dad reaction container is also used to remove the raw powder, and will Internal water washing 're-mixing and the same amount of the same as above. Then the mold base material is installed together with the ware, and the same reaction is repeated. The film formed on the substrate is a black film, and the thickness of the film is l〇 4/zm. For this film, using a fluorescent X-ray device, the composition of the composition of eight = jin, which is known as the compound of iron and calcium 'chemical composition (Mo I 51 I) 201210789 iron: feed = 85: 15. The crystal structure was investigated using a xenon ray diffraction device. The \ray diffraction pattern was shown in Fig. 38. As a result, it was confirmed that the display lattice constant a0=8. 4〇A “The composition of the crystal structure of the spar crystal structure. That is, it was confirmed that the obtained film was about granules %45^々4. Further, a scanning electron microscope image of the surface after the film formation of the film was not shown in Fig. 42. In the same manner as the heat-insulating film 8 shown in the first embodiment, it is known that a crystal grain having a sharp-angled twin crystal is continuously grown into a three-dimensional film, and a porous structure having a structure in which numerous pores are present in the film is formed. membrane. Further, in the same manner as in the method shown in Fig. 1, the surface of the film and the cross section of the film were each polished to prepare a measurement surface, and the porosity and Vickers hardness were measured. Fig. 39 shows a scanning microscope image of the surface of the film after grinding. As a result, the porosity was 20%. Further, the maximum Vickers hardness is Hv339, and the minimum value is Ην130, and the average value of these is Ην220. Next, the possibility of film formation of the granules containing the zinc ions as the replacement ions as the fat granules was reviewed. However, here, the evaluation material used a square plate of the same material as the mold base material 32 (steel material) used in the third embodiment (size 18. 0mm square, thickness 2. 0mm). The people are as follows. It will dissolve in water 60ml. 7g of ferrous sulfate (FeS04. 7H20) and 7. An aqueous solution of 2 g of zinc sulfate (ZnS04 · 7H20) was mixed with 60 ml of a 21 - 6 g aqueous solution of sodium hydroxide (NaOH) to prepare a suspension as a treatment liquid. The suspension was placed in a stainless steel autoclave reaction vessel containing 200 ml of the content of the above-mentioned calcium-based fertilizer granules, and the above-mentioned evaluation base substrate was impregnated therein and held by a jig. After reacting at 180 C for 4 hours, the substrate was taken out together with the refreshing device, and separated from the powder compound formed at the same time as 2012 201278, and sufficiently washed with water. The high pressure* reaction vessel is also subjected to the raw red powder for s, (4) (iv) water washing, and the same amount of the above suspension is re-fitted, and then the mold base material is attached to the jig-(four), and the same reaction is repeated four times. The film formed on the square plate was subjected to analysis using a fluorescent xenon ray device. As a result, a compound which is iron and a word was confirmed. However, since the base material of the base material is a steel material, when the composition of the MX ray is analyzed, the composition of the base material (iron) is also added as a composition analysis value, so that the correct composition of the fat granule film is difficult. Only a qualitative analysis of whether or not the replacement metal ion is contained in the composition of the fat body is performed. Further, the crystal structure was examined by X-ray diffraction analysis. The X-ray diffraction pattern is shown in Fig. 22. As a result, it was confirmed that only the lattice constant a 〇 = 8. 49A is composed of a compound of a spinel structure. That is, it was confirmed that the obtained film was a zinc-based fertilizer granule. In the same manner as the production and review of the zinc-based fertilizer and granules described above, the film formation of the fertilizer granules in the case of replacement with the sputum (Μη) ions was examined. Only the following points are different, and the above-mentioned point system will dissolve in water 60ml. 7g of ferrous sulfate (FeS04. 7Η2〇) and 6. 0g of manganese sulfate (MnS〇4 · 5Η20) aqueous solution and 21. 6 g of a sodium hydroxide (NaOH) aqueous solution was mixed at 6 ml, and a suspension was prepared and used as a treatment liquid. The other steps were carried out in exactly the same manner as in the film formation of the above-mentioned rhyolite. The composition of the film formed on the square plate placed in the autoclave reaction vessel was analyzed using a fluorescent X-ray apparatus. As a result, a compound of iron and manganese was confirmed. Further, the crystal structure was investigated by x-ray diffraction analysis. As a result, it can be understood that the obtained film is only composed of a lattice constant ac)=8. A compound of 43A in a spinel crystal structure. That is, it was confirmed that the obtained film was a manganese-based 53 201210789 fat granule. Next, the film formation of the fertilizer granules when the replacement ions were magnesium (Mg) ions was examined. Only the following points are different, the above point will dissolve 34 7g of ferrous sulfate (FeS04. 7H20) and 6. 2g of magnesium sulfate (MgS〇4. 7η2〇) aqueous solution and 21. 6 g of a sodium hydroxide (NaOH) aqueous solution was mixed at 6 〇 ml, and a suspension was prepared and used as a treatment liquid. The other steps were carried out in the same manner as in the film-forming property review of the zinc-based fertilizer granules. Dad responded to the film on the square plate in the barn and analyzed the composition using a fluorescent X-ray device. As a result, a compound which is iron and magnesium was confirmed. Further, the crystal structure was investigated by X-ray diffraction analysis. As a result, it was confirmed that the obtained film was only composed of a lattice constant a0=8. A compound of a spinel crystal structure of 4〇A. That is, it was confirmed that the obtained film was a magnesium-based fertilizer granule. In order to investigate the film formation under the conditions of different reaction temperatures, the suspension prepared in the same manner as above was placed in a high pressure dad container, and a film formation test was conducted at 1 HTC for 4 hours. As a result, as in the above, it was confirmed that the synthesizable lattice constant a 〇 = 8. 4 〇 A spinel type Crystal structure of magnesium granules. Furthermore, the film formation of the granules when the replacement ions are aluminum (A1) ions was reviewed. The above suspension is only used as a treatment liquid, and the suspension is dissolved in 60 ml of water. 7g of ferrous sulfate (FeS04 · 7H2〇) and 7. 9g of aluminum sulfate (AiS〇4. The aqueous solution of 16H2〇) was mixed with 6 6 g of a sodium hydroxide (NaOH) aqueous solution of 6 〇mi, and the other steps were carried out in the same manner as in the film-forming property evaluation of the zinc-based fertilizer. The composition analysis was carried out using a fluorescent xenon ray device on a film formed on a square plate placed in a high pressure dad reaction container. As a result, a compound which is iron and aluminum was confirmed. In addition, the crystal structure was investigated by 射线 54 201210789 ray diffraction analysis. As a result, it was confirmed that the obtained film was composed only of the compound having a spinel type crystal structure having a lattice constant aQ = 8 - 35A. That is, it was confirmed that the obtained film was an aluminum-based fertilizer granule. In other words, the film formation of the granules when the replacement ions are chromium (Cr) ions is examined. The suspension is only dissolved in 60 ml of water, using only the following suspension as the treatment liquid. 7g of ferrous sulfate (FeSCV 7H20) and 5. 6g of chromium sulfate (CrS〇4. 3H2〇) aqueous solution and 21. 6 g of a sodium oxynitride (NaOH) aqueous solution was mixed and prepared, and the other steps were carried out in the same manner as in the film formation test of the zinc-based fertilizer granules. The composition of the film formed on the square plate placed in the autoclave reaction vessel was analyzed using a fluorescent X-ray apparatus. As a result, it was confirmed that it was a compound of iron and chromium. Further, the crystal structure was investigated by X-ray diffraction analysis. As a result, it was confirmed that the obtained film was only confirmed by the lattice constant a 〇 = 8. A compound of a spinel crystal structure of 38A. That is, it was confirmed that the obtained film was a chromium-based fertilizer granule. In other words, the film formation of the granules when the replacement ions are lithium (Li) ions is examined. The suspension is only dissolved in 60 ml of water, using only the following suspension as the treatment liquid. 7g of ferrous sulfate (FeS04. 7H20) and 3. 2g of chromium sulfate (LiS04. H20) aqueous solution and 21. 6 g of a sodium hydroxide (NaOH) aqueous solution was mixed and prepared, and the other steps were carried out in the same manner as in the case of the zinc-based fertilizer granule film-forming property evaluation. The film formed on a square plate placed in a high-pressure dad reaction vessel was analyzed by X-ray diffraction to investigate the crystal structure. As a result, it was confirmed that the obtained film was only composed of a lattice constant a 〇 = 8. 39A is a compound of a spinel crystal structure. Further, the obtained film was dissolved in hydrochloric acid. The composition analysis was carried out by ICP emission spectrometry. As a result, it was found that 55 201210789 is a compound of iron and lithium, that is, the film obtained was confirmed to be a lithium-based fertilizer. In addition, as a result of observing the surface of the film by using a scanning electron microscope (SEM), various films of the above-mentioned zinc-to-lithium were obtained, and all the films were formed to have sharp-angled twin crystals as described above. The crystal grains continuously grow into a three-dimensional film 'and are formed into porous crucibles having numerous pores inside the film. From the above results, it has been found that various fertilizer granules substituted with various metal ions can be efficiently formed on the substrate by the hydrothermal synthesis method similar to the formation of the spinel-type iron oxide heat-insulating film. (Sixth embodiment) Fig. 20 is a schematic perspective view showing the layer structure of the heat insulating mold of the present embodiment. The heat insulating mold 51 is used for a resin-molded mold having a fine micro-machined surface, and has a rectangular shaft. 00mm, long axis 9. The height of the 00mm rectangular forming surface is 20. The columnar shape of 00 mm has the following laminated structure. First, the mold base material 52 is composed of a steel material having the same composition as that of the third embodiment. On the surface of the rectangular molding surface side of the mold base material 52, the groove pattern which is finely machined into the cross-sectional shape of the size shown in Fig. 21 is formed in parallel with the long axis at the position of the center of the short axis of the side surface of the forming surface. . A heat insulating layer 54 made of vaporized iron having a film thickness of 50/m is disposed to cover the surface of the finely processed surface. An adhesion layer 55 made of an iron film having a thickness of 3/m is disposed on the surface thereof. Further, a metal film layer 58 is formed on the surface thereof, and the metal layer is made of a base film 56 made of nickel and having a film thickness of 6 Å, and an amorphous nickel formed thereon having a film thickness of 65/m. A finely processed metal film 57 composed of a phosphorus alloy film is formed. Further, the surface of the finely-machined metal film 57 is formed on the surface of the resin, and the formed transfer surface is formed into a finely-machined surface 57a having the same size as that of Fig. 21. The manufacturing method of the heat insulating mold of the present embodiment is carried out in the same manner as in the third embodiment except that the conditions for forming the heat insulating film 54 are different. That is, 'the same raw material and the same high-pressure dad reaction vessel are used to carry out the hydrothermal reaction for 7 hours in a stepwise manner, and the thickness of the mold base material 52 formed with the finely processed pattern is formed. A heat insulating rib composed of spinel type iron oxide. Further, a finely-worked metal film 57 of a nickel-phosphorus alloy plating alloy having a thickness of just 0.5 is formed on the plating base film 56 coated with the adhesion layer formed in the same manner as in the embodiment. Further, the surface of the finely processed metal film 57 is machined into the same size as that shown in Fig. 21 by using a precision cutting machine to form a precision machined surface 57a, and the four sides are precisely ground. After the cutting, the heat insulating mold 51 was produced. Evaluation of the coating property of the heat-insulating film The heat-insulating mold 51 thus obtained was observed on the side of the grounded surface of the heat-insulating mold 51 to observe the cross-section of the laminated film including the heat-insulating film. The thickness of the heat insulation of the present invention was observed using a scanning microscope. The coverage and adhesion of the observation tool set 52 and the heat insulating film 53 and the heat insulating film 53 and the metal laminated film of the ± portion (the fourth layer, the base film 56, and the read metal film 57) are all worthy. No cracks or phase _. Next, for the pattern shown in the figure, the processing figure is at 1G as shown by A, a, b, b, c, c, e, e:, f, f. In part, the thickness of the thermal barrier film was measured. Here, A, B, CD, and E5 are the rectangular forming faces of the heat insulating mold 5, which are short 57, 201210789, 5 points of the mold base material 52 on the side of the shaft side, A, B, ρ, L, D ', E'Jij 5 points of the mold base material 52 on the other short-axis side. The thickness of the β m that exists in the small size of the figure shown in Figure 21 is eight: 5〇/^, eight, 50 hearts,隔热5〇 directly above the insulation film C: 51 //m, C,: 51 "m, E: 50# m, E,. • Sichuan with m, F: 5〇 F’: 50y m. From the above results, we can see that the shape, The heat-insulating film can be formed to be almost uniform/receptively formed on the groove pattern of the mold base material 52. Mx is well-densified according to the manufacturing method of the heat-insulating film of the present invention, because the chemical reaction of the ruthenium is synthesized by hydrothermal synthesis, so that the surface of the mold of the treatment liquid can be hydrothermally synthesized to make the film uniform and Slow "', the fork grows again. Therefore, even in a mold base material which is subjected to a deep groove processing or the like, the heat insulating film can be sufficiently wound. Further, according to the present invention, even if the film thickness is small, it is not necessary to mechanically add a film to efficiently form a heat insulating film. Seventh Embodiment A heat insulating mold composed of a non-ferrous metal mold base material was produced. In the 23rd ϋ, the layer structure of the separator is displayed. The heat-insulating mold 2 01 is used for forming a resin-made part having a precise fine-machining shape composed of a deep groove, and is made of a non-ferrous metal mold base material and The mold composed of the heat-insulating crucible is composed of the following layer structure. That is, a base layer 2〇3a composed of a nickel plating film having a thickness of 2#m is formed on the surface of the mold base material 2〇2 described below, and the mold base material is low in thermal conductivity and does not lose strength at high temperatures. Made of titanium alloy 'has a diameter of 20. Ommx height 2. The 5mm cap is part of the shape of Zhan (straight 58 201210789 diameter 25. 0mm), the height from the bottom is l〇. In the case of 〇mm, a heat-insulating film base layer 203 formed of an iron film having a thickness of 3"m is formed, and a heat-insulating film composed of a zinc-based fertilizer body having a thickness of 200# m and a kind of a fertilizer-granular material is formed thereon. The film 204 is further provided with a seed layer 205' composed of a palladium catalyst particle film on which a metal film layer 208 is formed. The metal coating layer 208 is composed of a base plating film 206 made of nickel (thickness 2/m) and a finely processed metal film 207 composed of an amorphous nickel-phosphorus alloy film further formed thereon (average thickness 7 8 // m ) constitutes. The molding surface side of the finely-machined metal film 2 〇 7 is formed as a precision processing surface 207a which is mechanically formed to form a fine pattern for press forming of a molded component. According to the above configuration, a ferrite film having a low thermal conductivity and a titanium alloy mold base material having a low thermal conductivity are used as a heat insulating film, and a molding surface having a fine processing in which a deep and fine groove is applied is used. The resin of the mold is formed to form a deep fine pattern. In the prior art, the heat of the high-temperature resin formed on the molding surface of the mold is discharged through the mold substrate, and the resin causes an excessive temperature drop during the molding, and as a result, a state in which the resin is formed is hindered. On the other hand, in the present invention, such a situation can be effectively avoided, and as a result, a fine pattern can be formed more surely. The heat insulating mold 201 is produced as follows. The base film 203a having a thickness of a nickel-plated film is formed on the surface of the molding surface side of the mold base material 2〇2 which is produced by machining a titanium alloy of a non-ferrous metal, and further, The surface was made of an iron sulfate plating bath to form a heat-insulating film base layer 2〇3 composed of an iron film having a thickness of 3 μm. Next, a heat-insulating film 2?4 composed of a zinc-based fertilizer-granular film having a thickness of 200//m was formed on the surface as follows: 59 201210789. That is, 60 ml of water prepared by distillation in nitrogen gas is dissolved. 7g of ferrous sulfate (FeS04·7H20) and 7. 2g of zinc sulfate (ZnS04 · 7H2 〇) aqueous solution and 21. 6 g of a 60 ml aqueous solution of sodium hydroxide (NaOH) was mixed, and a suspension was prepared as a treatment liquid. The suspension was placed in a stainless steel autoclave reaction vessel having a volume of 200 ml, and the mold base material on which the heat insulating base layer 203 was formed was immersed therein, and held by a jig. The mold base material is preliminarily shielded from a molding surface of the heat insulating base layer 203 by a sealing tape made of tetrafluoroethylene. Further, the above work was carried out in a nitrogen atmosphere. The high pressure dad reaction vessel was heated from the outside and reacted at 18 ° C for 6 hours. After the reaction, the mold base material was taken out together with the jig, and separated from the powder compound formed at the same time, and sufficiently washed with water. The autoclave reaction vessel is also similarly used to remove the formed powder, and the internal water is washed, and the same amount of the suspension as above is blended again. Then the mold base material is installed together with the jig, and similarly, the reaction is carried out at 180 ° C. 6 hours. By repeating this operation a total of eight times, a heat-insulating film 204 composed of a zinc-based fertilizer granular film having a film thickness of 200 μm was formed. After the mold having the heat-insulating film formed in this manner is washed with water and sufficiently dried, a micro-particle film is formed on the surface of the heat-insulating film 204 by using a DC sputtering device to which a palladium target is attached, thereby forming a seed crystal. Layer 205. Next, the base plating film 206 made of a nickel film of a thickness is coated with an electroless nickel forging method. A finely processed metal film 207 composed of a nickel-phosphorus plating film for precision processing having a thickness of 1 μm is formed by electroless magnetic recording. Thereby, the metal film layer 208 was produced. Next, the metal coating layer 208 was heat-treated at 2 °C for 3 hours. Thereafter, a precision machined surface 207a' was formed using a precision cutting machine to obtain a heat-insulating mold 2〇1 for a micro-machining die. 201210789 In addition, regarding the heat-insulating film 204, in order to confirm whether or not a film of the desired material is formed, a positive plate made of a titanium alloy that is smothered with the mold base material is prepared (size: 20. 0 drying square, thickness 2. 0mm), in the step of fabricating the above-mentioned heat insulating mold 2〇1, a base film having a thickness of 2"m composed of the same plating film is formed, and a step is formed on the surface thereof to form a cast iron film having a thickness of 3_ Two insulation film base layer. Then, in the step of forming the heat insulating film of the heat insulating mold 2G1, the sample of the square plate is placed in the same autoclave reaction container together with the heat insulating mold 2〇1, simultaneously with the heat insulating film 2〇4. Also, a heat insulating film is formed on the square plate sample. The film formed on the square plate was examined by a fluorescent X-ray apparatus, and as a result, it was confirmed that the film was composed of a composition of iron and zinc. Further, the X-ray diffraction was used to investigate the crystal structure. As a result, it is known that the lattice constant a 〇 = 8. A compound of the spinel crystal structure of 49A. That is, it can be confirmed that the heat insulating film 204 is a zinc-based fertilizer body. Here, even if the temperature of the hydrothermal synthesis reaction of the heat-insulating film composed of the zinc-based fertilizer film is 200 ° C, a zinc-based fertilizer granular film having the same composition as described above can be formed. When the thickness of the film is different, the temperature of the hydrothermal synthesis, the number of times of treatment, and the like can be appropriately changed as needed, whereby a heat insulating film having the same thickness as described above can be formed. Further, the metal layer which is formed on the surface of the mold base material 202 as the base of the heat insulating mold is described in the present embodiment as a laminate of the base layer 203a which is a nickel plating film and the base layer 203 of the heat insulation film which is an iron plating film. In the case of the film, the substrate of the heat insulating film may be a metal film formed of a metal element directly under the heat insulating film, and the method of forming the metal film is not limited to the laminated film of the present embodiment. For example, it may be an iron film formed directly on the surface of the mold base material 201210789 by sputtering. In the present embodiment, the step of forming a seed layer on the surface of the heat-insulating film by sputtering is described. In addition to this method, the method of directly forming the film is also carried out by using the same method. The same hot mold can be manufactured. In addition, the iron film may be omitted as needed, so that the material used for the material: the material directly formed by the _ method is replaced by a finely-added X-metal substrate _ which is composed of a precision-adhesive alloy plating film. Recording film. Eighth Embodiment Example A sectional view of the heat insulating mold of the eighth embodiment is shown in Fig. 43. The heat-insulating mold 2001 is used for a mold for forming a resin component having a (four) dense mirror shape. Here, the material of the mold base material is made of pure copper having high thermal conductivity, and is formed in the form of a laminated structure shown below. . On the surface of the mold base material 2002 described below, a heat-insulating film base layer 2003 composed of an iron-iron plating bath having a thickness of 3/m was disposed on the surface of the mold base material 2002, and the mold base material had a height of 2. Part of the shape of the 5mm cap layer (diameter 25. 0mm), and the height from the bottom is 15. 0mm, diameter 2〇. Further, in the case of 〇0101, a heat-insulating film 2004' composed of an iron-based fertilizer body (i.e., spinel-type iron oxide) having a thickness of 5 〇em is further formed on the base layer of the heat-insulating film, and palladium is further disposed thereon. The seed layer 2005 formed of the catalyst microparticle film has a metal film layer 2008 formed thereon. This metal film layer 2008 is composed of a base plating film 2006 made of nickel (thickness 1/zm) and a finely processed metal film 2007 (thickness 6/zm) composed of an amorphous nickel-phosphorus alloy film further formed thereon. The forming surface side of the finely machined metal film 2007 is formed as a precision machined surface 2007a which is machined to have a mirror surface. That is, in a structure similar to the laminated structure shown in Fig. 26 of the first embodiment, 62 201210789 is a mirror-finished surface of a precision machined surface. This mold is produced by previously forming a finely machined metal film at an average thickness of 1 Å//m, and then machining it into a mirror surface to a thickness of 6 μm to produce the above-mentioned precision machined surface. Further, the method for producing the heat-insulating film 2004 comprising the spinel-type iron oxide of the eighth embodiment is different from the method for forming the water-heat synthesis of the heat-insulating film 10〇4 of the first embodiment. It is made by synthesizing at the atmospheric pressure of loot: below. Thus, by using an oxide material having a low thermal conductivity (metal oxide (spinel type iron oxide)) and having a pore as an insulating layer, it is possible to form a resin having excellent mirror properties. In other words, the heat of the high-temperature molten resin formed by the mirror surface of the metal mold is discharged through the mold base material, and the resin molding failure caused by the temperature drop of the resin during the molding is required to be more than necessary. Fig. 44 shows a manufacturing process of the heat insulating mold 2001 of the present invention. On the surface of the forming surface side of the mold base material 2002, an iron sulfate plating bath was used to form a heat insulating film base layer 2003 composed of an iron film having a thickness of 3/i m (Fig. 44 (1)). Then, a heat-insulating film 2004 made of spinel-type iron oxide having a thickness of 50 μm was formed on the surface (Fig. 44 (2)). The formation of this heat insulating film 2004 is formed in the atmosphere as follows. That is, first, it is prepared to dissolve in water 60ml. 7 g of an aqueous solution of ferrous sulfate (FeS04 · 7H20), further, the aqueous solution is mixed and dissolved in water different from the water. 60 ml of a strong alkali aqueous solution prepared by using 6 g of sodium hydroxide (NaOH) was used to prepare a suspension 2021. Further, the water used here uses water distilled in nitrogen. Next, using this suspension 2021, a heat insulating film 2004 is formed. At this time, the film formation using the heat insulating film forming apparatus 2022 shown in Fig. 45 was carried out. The glass bulb condenser 2023 is attached to the upper portion, and the nitrogen gas is further flowed to the inner portion of the inner stainless steel 63 201210789 alloy reaction vessel 2024. The above suspension 2021 was placed in the reaction vessel 2024, and the mold base material 2002 on which the heat insulating base layer 2003 was formed was impregnated therein and held by a jig 2025. The mold base material was previously shielded with a sealing tape made of a vinyl fluoride to form a molding surface of the heat insulating base layer 2003. The reaction vessel 2024 was heated by heating in an oil bath 2026 maintained at 98 ° C for 120 hours. Further, nitrogen gas was continuously supplied to the inside of the reaction vessel 2024 during the reaction time. After the reaction, the mold base material was taken out together with the jig and thoroughly washed with water. In this manner, 'the mold having the heat-insulating film 1004 having a film thickness of 50/zm is washed with water and sufficiently dried, and then a palladium particle film is formed on the surface of the heat-insulating film 2004 by using a DC sputtering device to which a palladium shoe material is attached. Thereby, the seed layer 2005 is formed (Fig. 44 (3)). Next, a base mineral film 2006 composed of a nickel film having a thickness of 1 "m was coated by electroless nickel plating. Further, a finely processed metal film 2007 composed of a nickel-phosphorus alloy plating film for precision machining having a thickness of 10 μm was formed by electroless nickel plating, whereby a metal coating layer 2008 was produced and heat-treated at 200 ° C for 3 hours (Fig. 44) (4)). Thereafter, the finely-machined metal film 2007 is ground to a thickness of 6/m using a precision cutting machine to form a precise mirror surface l〇〇7a, and a heat-insulating mold for a micro-machining mold is obtained (Fig. 44 (5) ). Further, in the present embodiment, the method of forming the heat insulating film base layer 2003 composed of the iron film formed on the surface of the mold base material 2002 is described in the present embodiment, but the method is the same as in the first embodiment. The method of forming the heat insulating film underlayer 2003 is not limited to the plating method described in the present embodiment. For example, it is also possible to form the iron film directly on the surface of the mold base material by sputtering. In the heat-insulating film 2004, in order to confirm whether or not a film of the desired material is formed, a rectangular substrate of the same material (pure copper) as the mold base material 2002 is prepared (size: length 50 mm, width 20 mm, thickness 2. 0 mm) Using this substrate, a heat insulating film was formed, and this sample was used as the heat insulating film F, and the material was evaluated in detail. The production of the heat insulating film F will be described below. First, in the same manner as in the step of producing the above-described heat insulating mold 2001 (Fig. 44 (1)), the same heat insulating film underlayer is formed on the surface of the substrate. Thereafter, in the same manner as the heat insulating film 2004 of the heat insulating mold 2001, a suspension having the same composition as that of the above suspension 2021 was used, and the reaction container shown in Fig. 45 was used, and the reaction was repeated at 98 ° C under the same synthesis conditions. A 120-hour reaction was carried out 3 times (360 hours in total), and a heat-insulating film F having a film thickness of about 150 / / m was produced. Here, in the same manner as in the first embodiment, in order to define the composition and crystal structure required for the material of the heat insulating film, the pores of the same sample are simultaneously evaluated for pores. Rate and Vickers hardness. The heat-insulating film F formed on the substrate in this manner is black, and from the analysis of the composition of the fluorescent X-ray device using the film, it is known that the metal ion is composed of only a compound composed of iron, and further, X-ray diffraction is performed. Can be identified as a lattice constant aQ=8. 39A. That is, it was confirmed that the heat insulation film F is a spinel type iron oxide, that is, Fe304. The X-ray diffraction pattern is shown in Fig. 46. Fig. 47 shows a scanning electron microscope image of the surface after the formation of the film of the heat insulating film F. In the same manner as the heat insulating film A of the first embodiment, it is known that the crystal particles having sharp corners and different sizes are connected to each other and exhibit a three-dimensional network structure. Further, more closely, it was confirmed that the junction formed into a twin crystal can be seen. 201210789 The crystal grains are continuously grown into a three-dimensional film and formed into a plurality of pores formed by the gap portion formed by the above-mentioned mesh structure inside the film. A porous membrane of the structure. Further, in the same manner as in the first embodiment, the porosity and Vickers hardness of the heat insulating mF were measured. As a result, it was found that the porosity of the heat insulating film F was 65%. Further, the maximum Vickers hardness is Hv370', and the minimum value is Hvl80', and the average value is Hv24〇. Fig. 48 shows a scanning cat electron microscope image of the polished surface of the thermal barrier film F in which the porosity described above was measured. From the present example, it can be confirmed that it is 1 under atmospheric pressure. (The film produced below was also a porous fat granule film similarly to the film formed by the hydrothermal synthesis of the first to seventh examples. The ninth example produced the iron-based fertilizer granule (FqO4) film By the wet synthesis reaction of the present invention, 'the following two reactions are used to generate fertilizer granules from iron ions, the two reaction systems are 1) Fe2+ + OH_-Fe(OH)2, and 2) Fe(OH 2—Fe304, ie, 1) from ferrous iron ions, in the alkaline environment, ferrous hydroxide (Fe(OH)2), 2) hydrolysis reaction, from which ferrous iron changes to iron-based fertilizer (Fe3〇4) film. In the first to eighth embodiments, all of the heat insulating films of the present invention were produced by using water distilled in a nitrogen atmosphere as water for dissolving the raw materials. The reason for this is that the reaction of the above 1) is carried out smoothly to obtain an intermediate product in the case of synthesizing a granular film of a fertilizer, and the purity and homogenization of ferrous hydroxide (Fe(〇H) 2 ). That is, in order to prevent the following, when the oxygen in the atmosphere is dissolved in water which will be a ferrous salt of a raw material (for example, ferrous sulfate), the raw material can be dissolved in the water at a price of 2 One part of the iron ion (Fe2 + ion) is due to the dissolved oxygen present in 66 201210789, and the change to the trivalent iron ion & = mass doping is present in the aqueous solution of the iron raw material. In other words, when the trivalent iron ion stock is originally composed of only the valence of the divalent argon, and the amount of the ternary iron ion is always present, the reproducibility of the formation of the granule film of the present invention is biased. possibility. However, it is desirable to synthesize a mass-produced heat-insulating film for use in the use of easily-treated ion-exchanged water instead of water for distillation in an atmosphere where attention is required. > Regardless of whether or not the water used for the synthesis of the heat-insulating film can be used in the case of the hexahydrate, the water to which the reducing agent is added is substituted for the water distilled in the nitrogen atmosphere, and the heat-insulating film F of the eighth embodiment is used. For the same substrate, the production of the sample film was attempted. In the ninth embodiment, only the raw material suspension * used for the synthesis of the heat insulating film F of the eighth embodiment was used, and the other steps were carried out in the same manner as the heat insulating film, and a sample film was produced. gP, in the preparation of the raw material suspension, the water is used in the ion-exchanged water to dissolve the ascorbic acid water which is one of the reducing agents, and the water distilled in the nitrogen atmosphere for the synthesis of the heat-insulating film F. First, prepare 60ml of ion-exchanged water to dissolve 4l. 7g of ferrous sulfate (FeS04. The aqueous solution of 7H20) was further advanced, and 24 mg of ascorbic acid as a reducing agent was added to the aqueous solution to dissolve. Step-by-step, mixing in the above aqueous solution will be 21. A raw material suspension was prepared by dissolving 6 g of argon oxide sodium (NaOH) in a strong alkali aqueous solution prepared by dissolving in ion-exchanged water. This raw material suspension was used, and the heat insulating film forming apparatus 2022 (Fig. 45) used for the formation of the heat insulating film F of the eighth embodiment was used, and the reaction was repeated for 115 hours under the same synthesis conditions of 98 °C. A total of three times, a film G having a film thickness of about 150 was produced. 67 201210789 For the heat-insulating film G, in order to confirm whether or not a film of the desired material was formed, the material was evaluated in the same manner as the heat-insulating film F. In the same manner as in the first embodiment, in addition to the composition and crystal structure required for the material defining the heat insulating film, the porosity and Vickers hardness were also evaluated. The heat-insulating film G formed on the substrate in this manner was analyzed by composition analysis using a fluorescent X-ray device and X-ray diffraction, and it was confirmed that the lattice constant a 〇 = 8. 39A of spinel type iron oxide Fe3〇4. Figure X shows the X-ray diffraction pattern. Fig. 50 shows a film scanning electron microscope image of the surface after the formation of the heat insulating film G. In the same manner as the heat insulating film A of the first embodiment, it is understood that a film structure in which crystal particles having different sizes are connected and a three-dimensional mesh structure is formed, and a gap portion formed by the mesh structure is formed inside. Countless stomata. Further, in the same manner as in the first embodiment, the porosity and Vickers hardness of the heat insulating film G were measured. As a result, the porosity of the heat insulating film G was 65%. Further, the maximum Vickers hardness is Hv380, the minimum value is Hvl80, and the average value is Hv240. Fig. 51 shows a scanning electron microscope image of the polished surface of the thermal barrier film G in which the above porosity was measured. According to the present embodiment, even if the ion-exchanged water in which the reducing agent is dissolved is used for the synthesis of the heat-insulating film, the porous fertilizer can be produced in the same manner as the film formed by the hydrothermal synthesis of the first to eighth embodiments. Body membrane. Next, in the production of the raw material suspension for the synthesis of the above-mentioned heat insulating film G, only hydroquinone (24 mg) which is added as another type of reducing agent is used instead of ascorbic acid (24 mg) as a reducing agent, and other heat insulation is used. The formation of the membrane was the same as the synthesis conditions, and the reaction was carried out at a98 ° C for 88 hours, and the synthesis of the heat-insulating fine was attempted. As a result, a film having a thickness of 13 is formed on the substrate. This film is the same as the heat insulation 201210789 'amplitude analysis using the fluorescent x-ray device and x-ray diffraction. It can be seen that the lattice constant a 〇 = 8. The spinel-type iron oxide of 38A shows the 乂-ray diffraction pattern in Fig. 52. Fig. 53 shows a scanning electron microscope image of the county surface after the formation of the film. It is understood that the size of the particles is different from that of the heat insulating film +G, but is a porous film of the same form. Further, the production of the heat-insulating film I was attempted by selecting a combination of the temperature conditions of the above-mentioned heat-insulating film G at a low temperature. The synthesis of the heat-insulating film I was carried out in the following manner except that the synthesis temperature was 88 CU, and the synthesis conditions and the synthesis were the same as those of the synthesis of the heat-insulating film g, and the reaction time was set to 212 hours to form a film. In the heat insulating period thus obtained, the thickness was 25, and the composition and the crystal structure were examined in the same manner as the heat insulating film G. As a result, it was found that the heat-insulating film 1 was a spinel-type iron oxide having a lattice constant a 〇 U7A, that is, Fe3 〇 4 showed an X-ray diffraction pattern in Fig. 54. Further, in Fig. 55, the film shape «the silk φ is called the t submicroscope image. It is known from the state that a porous membrane is formed. Here, in the present embodiment, the heat insulating film which can be synthesized under the atmospheric pressure of the loot is described, and it is understood that the raw material suspension of the heat insulating film obtained by the hydrothermal synthesis of the seventh embodiment (4) In the production, even if water is added to the ion-exchange water (4) paste instead of the water vaporized in the nitrogen gas-zone towel as the water for the synthesis of the heat-insulating film, it can be synthesized by the same method as in the present embodiment. A heat-insulating film composed of a fat granule. In addition, in the method of synthesizing a heat-insulating film, an example of a method of using anti-bad acid or hydrogen brewing as a starting material is described, and the prefecture agent is not limited to those described in the present embodiment, and It has the effect of preventing the description of τ. The reductive reagent of 201210789 can be any, and the case is the divalent doping Y m woven ion in the aqueous solution of the ferrous salt (for example, sulfur S ferrous) 2+ ion) is added to the strong alkali water > in the night or by adding a strong aqueous alkali solution to form an iron hydroxide suspension to immediately oxidize 'to form a trivalent iron ion 卬 3 + ion). For example, it is also possible to use the K/grain gas-based compound of various derivatives of hydroquinone as the evaluation of the reduction heat insulation property to evaluate the same layer structure of the heat insulating mold of the present invention, and evaluate the insulation age of the upper station. And the heat-insulating film! The measurement sample 2〇11G and 2()11I for the evaluation of the barrier properties including the hot film G or the heat-insulating ship of the present invention, which are composed of the same material and the same structure. In the first measurement, the surface of the hot filmed sample should be arranged. Take sample 2, the heat-insulating film (4) is different from the point of heat insulation of Lin 25 heart, and the other structure is exactly the same as that shown in Figure 56. The measurement sample 20UG was produced as follows. First, prepare straight l〇_〇mm, length 44. The round bar of the same material as that of the mold base material 2002 used for the heat insulating mold 2〇〇1 of the eighth embodiment has a diameter of 3. 5mm, depth 22. The thermocouple of the crucible was mounted with a hole 2〇12a, and a substrate 2〇丨2 of a metal round bar was fabricated. Using the substrate 2〇12, in the same manner as the method shown in Fig. 42, the thickness is formed from the bottom of the end surface at a position opposite to the end face having the thermocouple mounting hole 2012a to 23 〇 mm. The base layer 2 〇 13 of the heat-insulating film formed of the iron film is formed thereon to form a partition of the heat-insulating film G of the present invention having a thickness of 5 μm in the same manner as the formation of the heat-insulating film G. Hot film 2014. Then, the resin is shielded from the end surface of the electric mounting hole 2012a with heat 70 201210789, and then the forging method is used from the bottom of the end surface to 23. At a position of 0 mm, a seed layer 2015 composed of a very thin catalyst particle film is formed, and then a base coating layer 2016 made of nickel (thickness l//m) is formed thereon by electroless key recording, further On the other hand, a metal plating film 2017 made of an amorphous nickel-phosphorus alloy film having a thickness of 6 mm is formed by an electroless nickel plating method to form a metal coating layer 2018 composed of a base plating film 2016 and a metal plating film 2017. In the measurement sample 2011 shown in Fig. 56, the measurement sample 20111 is formed of a heat-insulating film 2014 composed of a heat-insulating film G having a film thickness of 5 Å/zm, and is formed of a heat-insulating film I having a film thickness of 25 μm. A measurement sample prepared by a heat insulating film. For the evaluation of the heat insulating property, the comparative sample 1211 (Fig. 33) used in the first embodiment was used as a comparative sample having a structure having no heat insulating film at all. The evaluation of the heat insulating property was carried out by using the heat insulating property evaluation device 21 (Fig. 34) used in the first embodiment. First, the heat insulating properties of the heat insulating film G were measured using the measurement sample 2011G and the comparative sample 1211'. In the heat insulating property evaluation of the heat insulating film G of the present invention, two measurement samples 2〇11G and 1211 which are kept at room temperature and held at a constant temperature are directly attached to the heat insulating plate 1024 while being immersed in the state shown in FIG. The high-temperature water of the constant temperature water tank 22 was measured, and the temperature rise rate was measured, and the heat insulation effect at the time of temperature rise was investigated. Then, the measurement samples 2〇111: and 1211 whose temperature has risen are directly immersed in the low-temperature water of the constant temperature water tank 23 while being mounted on the heat insulating plate 24, and the temperature is lowered, thereby investigating Insulation effect when cooling down. In Fig. 57, the time change of the temperature rise and the time difference of the temperature difference of each of the two measurement samples 71 201210789 are shown as the temperature of the two measurement samples 2011G and 1211 simultaneously immersed in the constant temperature of 9 〇c. When the temperature of the water tank 22 rises, the measurement result of the measurement sample 2〇11G of the heat insulating film of the present invention is compared with the measurement sample 1211 which does not have a heat insulation film. Fig. 58 shows the measurement results of the time change of the temperature drop when the two measurement samples 2011G and 1211 whose temperature has risen are simultaneously immersed in a constant temperature water bath maintained at 28 °C. Similarly, the thermal insulation properties of the thermal barrier film I of the present invention were also evaluated using the measurement sample 20111 and the comparative sample 1211. In Fig. 59, the time change of the temperature rise and the time difference of the temperature difference between the two measurement samples are shown as the simultaneous immersion of the two measurement samples 20111 and 1211 from the room temperature in the warm water tank 22 maintained at 92 C. The time change of the temperature rise time is compared with the measurement sample 1211 of the heat insulation film, and the measurement result of the measurement sample 20111 of the heat insulation film of this invention is provided. Fig. 60 shows the measurement results of the time change of the temperature drop when the two samples 201II and 1211 were simultaneously immersed in a constant temperature water bath maintained at 22 °C. As is apparent from the results of Figs. 57 to 60, the heat insulation of the second type of the present invention clearly has a temperature change to the outside and is not easy to transfer heat to the substrate. In the tenth embodiment, as shown in the fifth embodiment, when the heat insulating film is formed by hydrothermal synthesis, a part of the iron ions forming the spinel type iron oxide Fe3〇4 is replaced with various metal ions. The replacement fertilizer granules of various compositions were formed into a film on the substrate. In the same manner as in the fifth embodiment, it was examined in the case of the human body 72 201210789 which is described in the eighth and ninth embodiments as the thermal insulation film synthesis conditions under the atmospheric pressure of 100 ° C or lower, whether or not the various components can be formed on the substrate. The replacement fertilizer body is made into a braid shape. First, a film formation of an aluminum-based fertilizer granule containing aluminum ions as a replacement ion as a fertilizer granule was attempted. The synthesis review was carried out as follows. In order to confirm whether the desired fat or granular film can be formed by the reaction at atmospheric pressure similar to the method shown in the eighth embodiment, the base substrate for film formation and the material for the thermal insulation film of the eighth embodiment are used. The same material (pure copper) and the same shape of the substrate (size: length 50 mm, width 20 mm, thickness 2. 0 mm), and the same heat insulating film base layer (iron plating film having a thickness of 3 #m) was formed. Will be in the water 60ml will be 34. 7g of ferrous sulfate (FeS04. 7H20), 7. 9g of sulfuric acid (AISO4. 16H2〇) and ascorbic acid 48mg dissolved in ion exchange water in an aqueous solution of 6〇ml and will 21. 6 g of a strong alkali aqueous solution prepared by dissolving 6 g of sodium hydroxide (NaOH) in ion-exchanged water was mixed, and a suspension was prepared as a treatment liquid. In the film formation system of the substrate, the heat insulating film forming apparatus 2022 shown in Fig. 45 is used, and the suspension is placed in a stainless steel alloy reaction container 2024 having an internal volume of 300 ml, and the substrate on which the heat insulating base layer is formed is immersed. It is held therein and clamped using a clamp 2025. The reaction was carried out at 98 ° C for 40 hours. After the reaction, the substrate was taken out together with the jig and washed thoroughly with water. After the completion of the reaction, a film having a thickness of 47 #m was formed on the substrate. For this film, composition analysis was carried out using a fluorescent X-ray device. As a result, a compound which is iron and aluminum was confirmed. Further, the crystal structure was examined using X-ray diffraction. The X-ray diffraction pattern is shown in Fig. 61(a). As a result of the analysis, it was confirmed that the obtained film was only composed of a lattice constant a 〇 = 8. A compound of a 35A spinel crystal structure. That is, it was confirmed that the obtained film was an aluminum-based fertilizer granule. Further, from the observation of the unprocessed surface of the film by a scanning electron microscope, the film was found to be a porous film. 73 201210789 Then, the film formation of the granules in the case of replacing the ions with chromium (〇) ions was reviewed. The point of using only the following suspension as the treatment liquid was different, and the other steps were carried out in exactly the same manner as in the film formation review of the aluminum described above. The hydrazine reacted for 4 hours to form a film, and the suspension was dissolved in water 60 with 34 7 g of ferrous sulfate (FeS04. 7H20), 5. 6g of chromium sulfate (CrS04. 3H20) and ascorbic acid A 48 mg aqueous solution was mixed with 60 ml of a strong aqueous solution prepared by dissolving 21 6 g of sodium hydroxide (NaOH) in ion-exchanged water. The film was opened on the substrate to form a film having a thickness of 6 m. In the same manner as in the above-mentioned time, the composition analysis and X-ray diffraction analysis of the fluorescent X-ray device were used, and the chemical composition was iron and chromium. The lattice constant a〇=8. The oxide of the spinel crystal structure of 39A, that is, the chromium-based fertilizer granule. The xenon ray diffraction pattern is shown in Fig. 61(b). Further, although the film was a film, it was found that the film was a porous film from the observation of a scanning electron microscope from the unprocessed surface. The film formation of the granules when the replacement ions were magnesium (Mg) ions was examined. The point of using only the following suspension as the treatment liquid was different, and the other steps were carried out in the same manner as in the film formation review described above. The hydrazine reacted for 4 hours to form a membrane, and the suspension was dissolved in 60 ml of water. 7g of ferrous sulfate (FeS04. 7H20), 6. 2 g of magnesium sulfate (MgS04 · 7H2 〇) and 48 mg of ascorbic acid were mixed with 60 ml of a strong alkali aqueous solution prepared by dissolving 2 to 6 g of sodium hydroxide (Na〇H) in ion exchange water. A film having a thickness of 11 is formed on the substrate. This film was analyzed in the same manner as described above by composition analysis and X-ray diffraction of a fluorescent X-ray device, and it was found that the chemical composition was iron and town, and the lattice constant a 〇 = 8. The oxide of the spinel-type crystal structure of 36A, that is, the magnesium-based fertilizer granule. Figure 61(c) shows the 乂 ray diffraction pattern 74 201210789 shape. Moreover, this film is also a porous film. The film formation of the granules when the replacement ions were violent (Μη) ions was examined. The procedure of using only the following suspension as the treatment liquid was different, and the other steps were carried out in exactly the same manner as in the film formation review described above, and the film was formed by reacting at 98 ° C for 4 hours, and the suspension was dissolved in 60 ml of water. 7g of ferrous sulfate (FeS04. 7H20), 6. 0g of manganese sulfate (MnS〇4. 5h2〇) and ascorbic acid 48mg of aqueous solution 60ml and will 21. 6 g of sodium hydroxide (Na〇H) was dissolved in ion exchange water to prepare 60 ml of a strong aqueous alkali solution, and the mixture was produced. A film having a thickness of 18 μm was formed on the substrate. As a result of analyzing the material in the same manner as described above, it was confirmed that the chemical composition of iron and manganese was composed only of a compound having a spinel crystal structure having a lattice constant a 〇 = 8 43 A. Namely, it was confirmed that the obtained film was an I Meng granule. The X-ray diffraction pattern is shown in Fig. 61(d). Further, this film is also a porous film. The film formation of the granules when the replacement ions were zinc (Zn) ions was examined. The point of using only the following suspension as the treatment liquid was different, and the other steps were carried out in exactly the same manner as in the above film formation review, to 98. (: The reaction is formed into a film for 40 hours. The suspension is dissolved in 60 ml of water. 7g of ferrous sulfate (FeS04. 7H20), 7. 2g of zinc sulfate (ZnS〇4. 60 ml of an aqueous solution of 7 h 2 〇) and ascorbic acid 48 mg and 60 ml of a strong alkali aqueous solution prepared by dissolving 21·6 g of sodium hydroxide (NaOH) in ion-exchanged water, and the makers formed a fullness of 20 " m on the substrate. membrane. As a result of analyzing the material in the same manner as described above, it was found that the chemical composition was iron and the lattice constant aQ=8. The oxide of the spinel-type crystal structure of 45A, that is, the zinc-based fertilizer granule. The X-ray diffraction pattern is shown in Figure 61 (e). Moreover, this film is also a porous film. 75 201210789 A review was made on the formation of fat and granules when the replacement ions were calcium ions. The procedure of using only the following suspension as the treatment liquid was different, and the other steps were carried out in the same manner as in the film formation review described above, and the film was formed by reacting at 98 ° C for 40 hours, and the suspension was dissolved in ion-exchanged water. 9g of gasified ferrous iron (FeCl2. 4H20) '7. 60 g of an aqueous solution of 4 g of calcium chloride (CaCl 2 , 2H20) and ascorbic acid (48 mg) was mixed with 60 ml of a strong alkali aqueous solution prepared by dissolving 21 to 6 g of sodium hydroxide (NaOH) in ion exchange water. A film having a thickness of 21 μm was formed on the substrate. With respect to the film, the result of analyzing the material in the same manner as described above is that the chemical composition is iron and calcium, and the oxide of the spinel crystal structure having a lattice constant % = 8.36 Å, that is, the calcium-based fertilizer granule. In the 61st (the figure shows the X-ray diffraction pattern. The film is also porous.) From the above, various films substituted with various metal ions are the same as in the fifth embodiment, at 1 〇〇t. In the following synthesis at atmospheric pressure, the film can be formed into a film. INDUSTRIAL APPLICABILITY The mold of the present invention having a predetermined heat insulating layer not only has excellent heat insulating properties, but also has excellent formation properties of a molding surface of a mold base material. It can be formed directly by adjusting the film thickness without post-processing. Therefore, it is useful as a heat-insulating film formed of a resin having a complicated shape such as an optical element or a molded body having a fine pattern shape. Use of a molding die for a stamper, etc.: BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic cross-sectional view showing a heat insulating mold according to a second embodiment of the present invention. Fig. 2 (1) to (5) show a second embodiment of the present invention. Fig. 3 is a diagram showing an X-ray diffraction pattern of a heat insulating film according to a second embodiment of the present invention. Fig. 4 is a heat insulating film having a second embodiment of the present invention. Summary of the sample for thermal insulation evaluation Fig. 5 is a schematic cross-sectional view of a sample for thermal insulation evaluation of a conventional heat insulating film. Fig. 6 is a schematic cross-sectional view of a comparative sample without thermal insulation evaluation of a heat insulating film. A schematic configuration diagram of a measuring device for evaluating the heat insulating property of the heat insulating film of the present invention. Fig. 8 is a view showing heat insulating at the time of temperature rise of the sample for heat insulating evaluation of the heat insulating film of the second embodiment of the present invention. Fig. 9 is a view showing the results of heat insulation evaluation when the sample for heat insulation evaluation of the heat insulating film of the second embodiment of the present invention is cooled. Fig. 10 shows a conventional partition. FIG. 11 is a view showing the results of heat insulation evaluation at the time of temperature drop of the sample for heat insulation evaluation of the conventional heat insulating film. Fig. 12 is a schematic cross-sectional view showing a heat insulating mold according to a third embodiment of the present invention. Fig. 13 (1) to (4) are views showing a manufacturing step of the heat insulating mold according to the third embodiment of the present invention. The figure is a schematic view of a sample for heat insulation evaluation of the same structure as the heat insulating mold of the third embodiment of the present invention. Fig. 15 is a schematic view of a comparative sample for thermal insulation evaluation without a heat insulating film 77 201210789. Fig. 16 is a view showing a sample for thermal insulation evaluation of a heat insulating film according to a third embodiment of the present invention. Fig. 17 is a view showing the results of heat insulation evaluation at the time of temperature drop of the sample for heat insulation evaluation of the heat insulating film of the third embodiment of the present invention. Fig. 19 is a view showing the results of heat insulation evaluation at the time of temperature rise of the sample for heat insulation evaluation of the heat insulating film of the third embodiment of the present invention. Fig. 19 is a view showing heat insulation of the heat insulating film of the third embodiment of the present invention. Fig. 20 is a schematic perspective view of a heat insulating mold according to a sixth embodiment of the present invention. Fig. 21 is a view showing the processing of a mold base material according to a sixth embodiment of the present invention. The cross-sectional dimension of the graph. Fig. 22 is a view showing an X-ray diffraction pattern of a heat insulating film containing zinc in the fifth embodiment of the present invention. Fig. 2 is a schematic cross-sectional view showing a heat insulating mold of a seventh embodiment of the present invention. Figure 24 is a schematic cross-sectional view of a conventional heat insulating mold. Fig. 25 is a view showing an example of a procedure for molding a molten resin using the mold of the present invention. Figure 26 is a schematic cross-sectional view showing a heat insulating mold according to a first embodiment of the present invention. Fig. 27 (1) to (5) are views showing the steps of producing the heat insulating mold according to the first embodiment of the present invention. Fig. 28 is a view showing an X-ray diffraction pattern of the heat insulating film A of the first embodiment of the present invention. Fig. 29 is a view showing a scanning electron microscope image of the polishing surface 78 201210789 of the heat insulating film A of the first embodiment of the present invention. Fig. 30 is a view showing a polishing section of the heat insulating film A of the first embodiment of the present invention. Fig. 31 is a view showing a scanning electron microscope image of the polishing surface of the heat insulating film B of the first embodiment of the present invention. Fig. 32 is a schematic cross-sectional view showing a sample for heat insulation evaluation of the same structure as the heat insulating mold of the first embodiment of the present invention. Fig. 33 is a schematic cross-sectional view showing a comparative sample for heat insulation evaluation without a heat insulating film. Fig. 34 is a schematic configuration diagram of a measuring device for evaluating the heat insulating property of the heat insulating film of the present invention. Fig. 35 is a view showing the results of heat insulation evaluation at the time of temperature rise of the sample for heat insulation evaluation of the heat insulating film of the first embodiment of the present invention. Fig. 36 is a view showing the results of heat insulation evaluation at the time of temperature drop of the sample for heat insulation evaluation of the heat insulating film of the first embodiment of the present invention. Fig. 37 is a view showing a scanning electron microscope image of the polishing surface of the heat insulating films C, D, and E of the fourth embodiment of the present invention. Fig. 38 is a view showing an X-ray diffraction pattern of a heat-insulating film containing calcium in the fifth embodiment of the present invention. Fig. 39 is a view showing a scanning electron microscope image of a polishing surface of a heat-insulating film containing calcium in the fifth embodiment of the present invention. Fig. 40 is a view showing a method of measuring the porosity of the heat insulating layer of the present invention. Fig. 41 is a view showing the scanning of the surface of the heat insulating film A of the first embodiment of the present invention. Fig. 42 is a view showing a scanning electron microscope image of the surface of a heat-insulating film containing calcium in the fifth embodiment of the present invention. Fig. 4 is a schematic cross-sectional view showing the heat insulating mold of the eighth embodiment of the present invention. Fig. 44 (1) to (5) are views showing the steps of producing the heat insulating mold of the eighth embodiment of the present invention. Fig. 45 is a schematic view showing a reaction vessel used in the eighth embodiment of the present invention. Fig. 4 is a view showing an X-ray diffraction pattern of the heat insulating film of the eighth embodiment of the present invention. Fig. 47 is a view showing a scanning electron microscope image of the surface of the heat insulating film of the eighth embodiment of the present invention. Fig. 48 is a view showing a scanning electron microscope image of the polishing surface of the heat insulating film of the eighth embodiment of the present invention. Fig. 49 is an X-ray diffraction pattern diagram of the heat insulating film G of the ninth embodiment of the present invention. Fig. 50 is a view showing a scanning electron microscope image of the surface of the heat insulating film G of the ninth embodiment of the present invention. Fig. 51 is a view showing a scanning electron microscope image of the polishing surface of the heat insulating film G of the ninth embodiment of the present invention. Fig. 5 is a view showing an X-ray diffraction pattern of the heat-insulating film of the ninth embodiment of the present invention. Fig. 5 is a view showing a scanning electron microscope image of the surface of the heat-insulating film of the ninth embodiment of the present invention. 80 201210789 Fig. 54 is a view showing an X-ray diffraction pattern of the heat insulating film I of the ninth embodiment of the present invention. Fig. 55 is a view showing a scanning electron microscope image of the surface of the heat insulating film I of the ninth embodiment of the present invention. Fig. 56 is a schematic cross-sectional view showing a sample for heat insulation evaluation in which the heat insulating film G is disposed. Fig. 57 is a view showing the results of heat insulation evaluation at the time of temperature rise of the sample for heat insulation evaluation of the heat insulating film G of the ninth embodiment of the present invention. Fig. 58 is a view showing the results of heat insulation evaluation at the time of temperature drop of the sample for heat insulation evaluation of the heat insulating film G of the ninth embodiment of the present invention. Fig. 5 is a view showing the results of heat insulation evaluation at the time of temperature rise of the sample for heat insulation evaluation of the heat insulating film 1 of the ninth embodiment of the present invention. Fig. 60 is a view showing the results of heat insulation evaluation at the time of temperature drop of the sample for heat insulation evaluation of the heat insulating film 1 of the ninth embodiment of the present invention. Fig. 61 is a view showing an X-ray diffraction pattern of a heat-insulating film having a different composition according to a tenth embodiment of the present invention. [Main component symbol description] 1,31,51,101,201,10 (H, 2001. . . Insulation mold 2,32,52,102,202,1002,1012,2002,2012. . . Mold base material 3,13,203,1003,1013,2003,2013. . . . Thermal insulation film base layer 4,14,34,44,54,104,114,204,1004,2004,2014. . . Thermal insulation film (insulation layer) 5,15,55,115,205,1005,2005,2015·. · Seed layer 6 , 16 , 36 , 46 , 56 , 116 , 206 , 216 , 246 , 1006 , 1016 , 2006 , 81 201210789 2016. . . Substrate coating 7,37,47,57,207,247,1007,2007...finely machined metal film 7a, 37a, 57a, 107a, 207a, 1007a, 2007a. . . Precision machined surface 8,18 ’ 38 ’, 58,108,118,208,218,1008,1018,2008,2018. . . Metal film layer 1 Bu 41, 111, 21 Bu 24 Bu 34 Bu 44 Bu 1011A, 1011B, 1211 ‘2011G, 20111... Measurement sample 12, 42, 112 ' 212 ' 242, 1012 ’ 1212, 2012. . . Substrate 12a, 42a, 112a, 212a, 1012a, 1212a, 2012a. . . Thermocouple mounting holes 17,117,217,1017...metallized film 18,118,218. . . Thermocouple 21. . . Insulation evaluation device 22. . . Constant temperature water tank for high temperature water 23. . . Constant temperature water tank for cold water 24. . . Insulation board 25. . . Electric heater 26. "台27,28,29. . . Insulation cover 35. . . Adhesive layer 203a. . . Base layer 301. . . Fixed mold 401··. Movable mold 2021. . . Suspension 2022. . . Thermal film forming device 82 201210789 2023. . . Tube condenser 2024. . . Reaction vessel 2025. . . Fixture 2026. . . Oil tank A-E. . . 5 points of the mold base material 52 on one side of the short-axis side of the rectangular forming surface of the heat insulating mold 51 A'-E'. . . 5 points of the mold base material 52 of the other short-axis side surface R...resin 83