TW201230376A - Light-confining integrating method of thin film solar cell and structure thereof - Google Patents

Light-confining integrating method of thin film solar cell and structure thereof Download PDF

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TW201230376A
TW201230376A TW100101248A TW100101248A TW201230376A TW 201230376 A TW201230376 A TW 201230376A TW 100101248 A TW100101248 A TW 100101248A TW 100101248 A TW100101248 A TW 100101248A TW 201230376 A TW201230376 A TW 201230376A
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layer
solar cell
light
thin film
transparent conductive
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TWI594450B (en
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Jia-Min Xie
Chang-Hong Shen
wen-xian Huang
Shi-Quan Wu
Bao-Tong Dai
zhong-yao Huang
hao-zhong Guo
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Nat Applied Res Laboratories
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
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Abstract

A light-confining integrating method of a thin film solar cell and a structure thereof , which utilizes plasma treatment to form a composite light-confining nano material having a light absorption layer for being integrated into a light incident layer, an intermediate layer or a shaded layer of a thin-film solar cell. In this way, nano-particles can be embedded into a transparent conductive film by utilizing a sandwich structure. A gradually varied refraction structure is simultaneously provided, and light holding time in the light absorption layer is increased by high refraction efficiency and strong near field optical effect of the surface plasma nano-structure, so as to increase light current of the elements and improve efficiency of optoelectronic elements, and simultaneously reduce consumption of thin film material, such that the present invention has advantages of reducing defect of semiconductor light absorption layer and damage in the thin film properties, and is capable of increasing anti-reflection efficiency of incident light, and improving integration of the optoelectronic elements as well as increasing long-term irradiation stability of the optoelectronic elements.

Description

201230376 六、發明說明: 【發明所屬之技術領域】 &本發明係有關於_種細太陽能電池光侷限整合方法及 其結構’尤指涉及—種以電漿處理形成具有光吸收層之複合性 光侷限奈米材料’可將其整合至薄膜太陽能電池之入光面、中 間層及背光面處之製備方法及其結構。 【先前技術】 隨著具低成本之薄膜太陽能電池(Thin Film Solar Cells ) 之開發’薄膜太陽能電池已成為未來太陽能電池發展之趨勢; 然而,因薄膜太陽能電池吸收層厚度遠小於晶石夕((^_此 Si)太陽能電池,故其展現之太陽光頻譜吸收響應較弱,導致 降低其光電轉換效能,而其薄吸收層亦造成傳統之表面粗糖化 (Surface Texturing)技術無法應用於薄膜太陽能電池之光侷 限(LightTrapping)上,因此近年來新穎之光捕捉技術已吸引 了相當大之注意。 奈米粒子具備之光散射效應、近場電場增強效應與载子 注入等光學響應特性,可有效地提昇光路徑及光利用率,以增 加太陽能電池之轉換效率。惟在製程整合部分,奈米粒子會產 生額外之介面缺陷,並可能在製程過程中破壞吸收層特性因 此含有奈米粒子技術之太陽能電池其轉換效率通常不易有效 改善。 金屬奈米粒子及介電奈米粒子材料在發光二極體、化學 及生物感測領域上已廣泛被應用’且奈米粒子材料在製備與感 測上相當成功,所展現之材料特性亦具有相當之多樣性。其表 201230376 面電漿子係光或電磁波與金屬内之自由電子交互作用產生電 子電荷密絲回缝形摘極距,當舰發糾,此複合式電 水子材料將會產生極向之消光係數(Extjncti〇n)及高密度之 強近場光學特性0其特殊之光學性質,根據Mie,s散射理論, 大尺寸之金屬粒子其消光係數主要來自於粒子之散射吸收所 造成之熱損耗遠低於散射之貢獻;而小尺寸之金屬粒子其消光 係數主要來自妹子之魏,賴賴之近場絲效應。這種 散射特性與金屬粒子之材料、大小及微有關,將使光行進方 向因不同波長產生不财向之散射行為;而強近場光學特性, 則與金屬粒子大小及週圍環境有關,因此有效控制金屬顆粒與 週圍環境之組態,將有助於薄膜矽太陽電池光侷限技術之應 用0 近年來已有相當多之奈米材料結合奈米結構技術方面, 或材料/結構整合式薄膜太陽能電池之專利發表,但其轉換效 率及增加之比例並不高,主要原因來自於奈米粒子直接與原製 程整合會造成奈米粒子/半導體吸收層間產生缺陷或造成原有 之薄膜特性破壞,如以下所述: 2007年Atwater等人於美國專利第2007/0289623號發表 種表面電聚效應之光伏特元件(Plasm0njc ph〇t〇 )」 發明專利,如第7圖所示。其係於光吸收層4 〇上方利用鋁 (A1)及銅(Cu)奈米粒子電漿共振散射層4丄與入射光產 生表面電鞔偶合波導(Light Coupling Waveguide)效應,增加 入射光之散射,進而增加吸收層4 〇内光吸收,以提昇光電流 響應°然而’此技術中係將A丨及Cu奈米粒子4 1 1置於吸 收層4 0與空氣之界面間,由於八丨及(:11在空氣中極易於金 201230376 屬表面氡化成氧化鋁(A1203)及氧化銅(CuO),因此將降低 入射光與金屬粒子偶合之效應。 2009年工研院於中華民國專利第097120261號發表一種 「具有電漿子結構的疊層薄膜光能元件及其用途(Laminated thin film photovoltaic device with plasmon structure and use of thesame)」發明專利,如第8圖所示。其係將i〇〇nm〜2〇〇nm 之奈米金屬顆粒5 〇 1鑲敌於低禁帶(low band gap)光電轉 換層5 1及高禁帶(high band gap)光電轉換層5 2之間,運 φ 用此具有電漿子結構層5 0之疊層薄膜光能元件5可以減少201230376 VI. Description of the invention: [Technical field to which the invention pertains] & The present invention relates to a method for integrating light confinement of a thin solar cell and its structure, particularly to a composite of a light absorbing layer formed by plasma treatment The light-limited nano-material can be integrated into the light-emitting surface, the intermediate layer and the backlight surface of the thin film solar cell, and the structure thereof. [Prior Art] With the development of low-cost thin film solar cells, thin film solar cells have become the trend of solar cell development in the future; however, because the thickness of the absorption layer of thin film solar cells is much smaller than that of spar (( ^_This Si) solar cell, so it shows that the solar spectrum absorption response is weak, resulting in lowering its photoelectric conversion efficiency, and its thin absorption layer also causes the traditional surface texturing technology to be applied to thin film solar cells. LightTrapping has been adopted, so the novel light-trapping technology has attracted considerable attention in recent years. Nano-particles have optical scattering characteristics, near-field electric field enhancement effects and carrier injection and other optical response characteristics, which can effectively Improve light path and light utilization to increase the conversion efficiency of solar cells. However, in the process integration part, nano particles will generate additional interface defects, and may destroy the characteristics of the absorption layer during the process, so the solar energy containing nano particle technology The conversion efficiency of the battery is usually not easy to effectively improve. And dielectric nanoparticle materials have been widely used in the field of light-emitting diodes, chemical and biological sensing' and the nanoparticle materials have been quite successful in preparation and sensing, and the material properties exhibited are quite diverse. Its surface 201230376 surface plasmon light or electromagnetic wave interacts with the free electrons in the metal to produce an electronic charge dense wire back-slit-shaped pick-up pole distance. When the ship is correct, this composite electric water sub-material will produce extreme Extinction coefficient (Extjncti〇n) and high-density strong near-field optical properties. Its special optical properties. According to Mie, s scattering theory, the extinction coefficient of large-sized metal particles mainly comes from the heat loss caused by the scattering absorption of particles. It is much lower than the contribution of scattering; while the extinction coefficient of small-sized metal particles mainly comes from the near-field silk effect of the sister Wei, which is related to the material, size and micro of the metal particles, which will make the light travel direction. Due to the different wavelengths, the scattering behavior of the non-precision is generated; while the strong near-field optical characteristics are related to the size of the metal particles and the surrounding environment, thus effectively controlling the metal particles and The configuration of the surrounding environment will contribute to the application of thin-film solar cell light confinement technology. In recent years, a considerable number of nano-materials have been combined with nano-structure technology, or patents for material/structure-integrated thin-film solar cells. However, the conversion efficiency and the proportion of increase are not high, mainly due to the fact that the direct integration of the nanoparticles with the original process may cause defects between the nanoparticle/semiconductor absorption layer or cause damage to the original film properties, as described below: In the United States Patent No. 2007/0289623, the invention discloses a photovoltaic element (Plasm0njc ph〇t〇) having a surface electropolymerization effect, as shown in Fig. 7. It is used above the light absorbing layer 4 The aluminum (A1) and copper (Cu) nanoparticle plasma resonance scattering layer 4丄 and the incident light generate a surface light coupling waveguide (Light Coupling Waveguide) effect, which increases the scattering of the incident light, thereby increasing the absorption of the absorption layer 4 To enhance the photocurrent response. However, in this technique, A丨 and Cu nanoparticle 4 1 1 are placed between the interface of the absorption layer 40 and the air, due to the gossip and (: 11 in the air 201230376 easy to metal in the metal surface radon into alumina (A1203) and copper oxide (CuO), thus reducing the effect of coupling the incident light to the metal particles. In 2009, ITRI published a patent for the invention of "Laminated thin film photovoltaic device with plasmon structure and use of thesame" in the Republic of China Patent No. 097120261. Figure 8 shows. The nano metal particles 5 〇1 of i〇〇nm~2〇〇nm are enemies with a low band gap photoelectric conversion layer 5 1 and a high band gap photoelectric conversion layer 5 2 . Between the use of the laminated thin film light energy element 5 having the plasmonic structure layer 50 can be reduced

元件整體厚度並提高光電流之產生率。其中該疊層薄膜光能元 件5 0係由較高禁帶寬度之非晶矽薄膜(即高禁帶光電轉換層 5 2)及較低禁帶寬度之微晶矽或矽鍺合金薄膜(即低禁帶光 電轉換層51)交疊而成。然而,此種三明治元件結構極易產 生兩類問題,其一為無論組裝於低禁帶光電轉換層上之奈米金 屬顆粒之製備方式為何,如薄膜退火成核(X]jennalAnneal)、 奈米模板(Aluminum Anode Oxide,AAO)、旋轉塗佈(Spin φ Coating )、奈米轉印(Nano-imprint)及深紫外光微影(Deep UV lithography )及聚焦離子束方式(Focus Ion Bean,FIB )等,當 光電轉換層抽離真空並與上述技術接觸時,將會產生相當多之 表面缺陷;其二則為當電漿技術沉積矽薄膜於奈米金屬顆粒表 面上時’極易因電漿離子轟擊導致奈米金屬顆粒表面破壞。因 此’上述兩類因素皆會嚴重影響元件之光電轉換效能。 2009年Edward T. Yu及Daniel Derkacs等人於美國專利第 2009/0250110號發表一種「正向散射奈米粒子增強方法及光偵 測器裝置(Forward scattering nanoparticle enhancement method 201230376 and photodetector· device)」發明專利,如第9圖所示。係將奈 米金粒子(lOOnm) 6 〇或二氧化石夕粒子(15〇nm)以靜電^ 附方式置於氧化銦錫(indium Tin 〇xide,IT〇)之透明氧化層 6 1上’其透明氧化層6 1下則為n_i_p堆疊層非晶列a Si:H) 6 2 ;並且,由圖中右側實線為加入奈米金(觸nm)粒子之 分析曲線可知,其與第8圖㈣,㈣用光散射α咖 Scattering)效應,將光電流由6 6mA/cm2提昇至7 2福咖2 , 光電轉換效率則由2.77%提高至3%。然而,此專利雖可改善 • 非晶石夕層6 2與透明氧化層6 1界面間之缺陷問題,惟其仍^ %決銘金屬電極與奈未粒子接觸之問題。 2010年C. L〇renzetti及M. Vitaie等人於美國專利第 2〇1〇/〇_398號發表「光伏特電池⑽。tovolta丨⑽丨丨)」,如第 1 0圖所示。其係-種多層奈錄子級化層(phQt_sitive • 而此混合層之半導體材料,若非光吸收材料The overall thickness of the component increases the rate of photocurrent generation. The laminated thin film light energy element 50 is a thin film of amorphous germanium film having a higher band gap (ie, a high band gap photoelectric conversion layer 52) and a microcrystalline germanium or germanium alloy film having a lower band gap (ie, The low band gap photoelectric conversion layer 51) is formed by overlapping. However, such a sandwich component structure is prone to two types of problems, one of which is the preparation of nano metal particles assembled on a low bandgap photoelectric conversion layer, such as thin film annealing nucleation (X]jennalAnneal), nano Template (Aluminum Anode Oxide, AAO), Spin φ Coating, Nano-imprint and Deep UV lithography, and Focus Ion Bean (FIB) Etc., when the photoelectric conversion layer is evacuated from the vacuum and is in contact with the above technology, considerable surface defects will be generated; the second is that when the plasma technology deposits the tantalum film on the surface of the nano metal particles, it is extremely susceptible to plasma. Ion bombardment causes surface damage of the nano metal particles. Therefore, both of the above factors will seriously affect the photoelectric conversion efficiency of the components. Invented by Edward T. Yu and Daniel Derkacs, in the United States Patent No. 2009/0250110, a "Forward scattering nanoparticle enhancement method 201230376 and photodetector device" The patent is shown in Figure 9. The nano gold particles (100 nm) 6 〇 or the SiO 2 particles (15 〇 nm) are electrostatically deposited on the transparent oxide layer 61 of indium tin 〇xide (IT〇). The transparent oxide layer 6 1 is an n_i_p stacked layer amorphous column a Si:H) 6 2 ; and, by the solid line on the right side in the figure, the analysis curve of adding nano-gold (touching nm) particles is known, and it is shown in FIG. (4) (4) Using the Scattering effect of light scattering, the photocurrent is increased from 6 6 mA/cm 2 to 7 2 Focal 2, and the photoelectric conversion efficiency is increased from 2.77% to 3%. However, this patent can improve the defect between the interface of the amorphous layer and the transparent oxide layer 61, but it still solves the problem of contact between the metal electrode and the nanoparticle. In 2010, C. L. Renzetti and M. Vitaie et al. published "Photovoltaic Special Battery (10). Tovolta 丨 (10) 丨丨)" in US Patent No. 2〇1〇/〇_398, as shown in Figure 10. a multi-layered nano-leveling layer (phQt_sitive • and a mixed layer of semiconductor material, if not a light absorbing material)

Layer),鑲鼓於雜雜與硼摻雜之石夕薄膜中,慨結構仍具有 上述中華民國專利之缺點。繼之,再將多層奈米粒子材料混雜 於半導體材料中’形成另—綠化層結構(如财⑷所示), :材科,對於光電流匹配 不僅不利於光電流之產 (matching)則會產生相當大之問題, 生,甚而降低光電轉換效率。Layer), the drum is embedded in the doped and boron-doped Shixi film, and the structure still has the shortcomings of the above-mentioned Republic of China patent. In addition, the multi-layered nanoparticle material is mixed in the semiconductor material to form a new-green layer structure (as shown in Cai (4)). The material is not only conducive to photocurrent matching. It creates considerable problems, and even reduces the efficiency of photoelectric conversion.

201230376 性與長時光照之可靠度之發明實有必要。 【發明内容】 本發明之主要目的係在於,克服習知技藝所遭遇之上述 問題並提供-種以雜處理軸具有光吸㈣之複合性光侷 限奈米材料,可將其整合至_太電池之人光面、中間層 及背光面處之製備方法及其結構。201230376 The invention of the reliability of sexual and long-term illumination is necessary. SUMMARY OF THE INVENTION The main object of the present invention is to overcome the above-mentioned problems encountered in the prior art and to provide a composite optical confinement nano material having a light-absorbing (four) miscellaneous processing axis, which can be integrated into a _ Tai battery The preparation method and structure of the smooth, intermediate layer and back surface of the person.

為達以上之目的,本發明係-種薄社陽能電池光侷限 整合方法及其結構,係為—整合至薄膜太陽能電池之入光面、 中間層及背光喊之複合性光舰奈料料之製備方法及結 構〃提供基板’並在該基板上依序形成一第一透明導電氧 化層、-經由賴處理所構成之第—光吸收層、—第二透明導 電氧化層及-金屬光柵,且在製備上述各層結構製程中更包括 形成一電漿子奈米結構層,其中: 、田欲整。至;I臈;^陽能電池之人光面處時,係將該電浆 子奈米結構層軸於該第二透明導電氧化層上,且於該電聚子 S ㈣電氧化層’並在該基板及 電氧化層之間形成—背金屬反射層,俾以完成一 口 =薄膜太陽能電池之人光面處之複合性光航奈米材料; 子奈間麟時,係將該電裝 卵卜j 吸收層上,且贿子奈米結 構另卜形成—第四透明導電氧化層及-第二光吸收層,並 在該基板及該L科電氧化狀間 a 層,俾以完成—整人至$ 又《金屬反射 侷限奈米材料;Γ及 城電池之中财處之複合性光 7 201230376 子太^L賴太陽能電池之背絲鱗,係將該電聚 電池之=喊之複纽光鎌絲觀;“ 於其中’上述電漿子奈米結構層包括數個奈米粒子。 f實施方式】 敕本發明係—種_太陽能電池光紐整合方法係為一In order to achieve the above purpose, the present invention relates to a thin-film solar cell light confinement integration method and a structure thereof, which are prepared for integration into a light-emitting surface of a thin film solar cell, an intermediate layer, and a composite light-lighting material of a backlight. The method and structure provide a substrate 'and sequentially form a first transparent conductive oxide layer on the substrate, a first light absorbing layer formed by the ray treatment, a second transparent conductive oxide layer, and a metal grating, and In the process of preparing the above-mentioned various layers, the process further comprises forming a plasmonic nano-structure layer, wherein: When the surface of the solar cell is light, the plasmonic nanostructure layer is axially on the second transparent conductive oxide layer, and the electropolymer S (four) is electrically oxidized. Forming a back metal reflective layer between the substrate and the electro-oxidation layer to complete a composite photonic nanomaterial at a person's glossy surface of the thin film solar cell;卜j on the absorbing layer, and the bribe nanostructure is formed into a fourth transparent conductive oxide layer and a second light absorbing layer, and a layer between the substrate and the L-electro-oxidation layer is completed. People to $ and "metal reflection limited nano material; Γ and city battery in the financial complex of the complex light 7 201230376 child too ^ L La solar battery back wire scale, the electric cell battery = shouting complex ray镰丝观; "In which 'the above-mentioned plasmonic nano-structure layer includes several nano-particles. f Embodiments 敕 发明 发明 发明 _ 太阳能 太阳能 太阳能 太阳能 太阳能 太阳能 太阳能 太阳能 太阳能 太阳能 太阳能 太阳能

能電池之入光面、中間層及背光面處之複合性 Ϊ开雜方法,其提供—魏,並錢基板上依 τ ^ 伽導電氧化層(Transparent C—ve Oxide 杯M、_ 柵,且在⑽上述各層結讎程中更包 /告A電聚子奈米結構層(plasmonicNanostructure),其令: 不太整合至馳太陽能電池之人光面祕,储該電聚 ::::層形成於該第二透明導電氧化層上,且於該電漿子 上糾形成—第三透明導電氧化層,並在該基板及 I人f明導電氧化層之_成—背金屬反射層,俾以完成-σ膜太陽#電池之人絲處之複合性光侷限奈米材料; =欲整合關膜太陽能電池之中間層處時,係將該電聚 播Γ:結構層形成於該第—光吸收層上,且於該電漿子奈米結 曰另外形成—第四翻導電氧化層及―第二光吸收層,並 ίι/科—㈣導魏化層之間戦—背金屬反射 a χ疋成整合至薄膜太陽能電池之中間層處之複合 侷限奈米材料;以及 當欲整合至薄社陽能電池之背絲树,係將該電裝 201230376 子奈米結構層形成於該基板上,俾以完成一整合至薄膜太陽能 電池之背光面處之複合性光侷限奈米材料; «•月參閱『弟1圖』所示,係為本發明之複合性光侷限奈 米材料之薄膜太陽能電池整合流程示意圖。如圖所示:本發明 以上述整合至薄社陽能電池之人光面處之複合性光偈限奈 米材料之製備流程為例,其至少包含下列步驟: (A) 提供一基板丄〇,並分別形成一背金屬反射層工 1 及第一透明導電氧化層(Transparent Conductive Oxide • TC〇) 12於該基板1〇上; ’ (B) 利用電漿處理以縣—第―光吸收層i 3於該第 一透明導電氧化層12上; (C) 利用一光罩形成一第二透明導電氧化層丄4於該 第一光吸收層13上;A composite Ϊ-opening method capable of entering the light surface, the middle layer and the backlight surface of the battery, which provides - Wei, and the τ ^ 380 conductive oxide layer on the substrate (Transparent C-ve Oxide cup M, _ grid, and In (10) the above-mentioned layers, the plasmonic nanostructure is further encapsulated, which makes: a person who is less integrated into the solar cell, and stores the electropolymer:::: layer formation Forming a third transparent conductive oxide layer on the second transparent conductive oxide layer, and forming a third transparent conductive oxide layer on the substrate, and forming a back-metal reflective layer on the substrate and the surface of the conductive oxide layer. Completion of the composite light-limited nano-material of the sigma film solar cell at the human wire; = when the intermediate layer of the solar cell of the solar cell is to be integrated, the electricity is concentrated: the structural layer is formed in the first light absorption On the layer, and forming a fourth turn conductive oxide layer and a "second light absorbing layer", and ίι/科-(4) between the conductive layers and the back metal reflection a χ疋a composite nanomaterial integrated into the middle layer of the thin film solar cell; The back silk tree of the thinner solar cell is formed on the substrate by the 201230376 sub-nano structure layer to complete a composite optical confinement nano material integrated into the backlight surface of the thin film solar cell; Referring to the "Diner 1", it is a schematic diagram of the integration process of the thin-film solar cell of the composite optical nano-material of the present invention. As shown in the figure: the present invention is integrated into the smooth surface of the thin solar cell battery. For example, the preparation process of the composite aperture-limited nanomaterial includes at least the following steps: (A) providing a substrate and forming a back metal reflective layer 1 and a first transparent conductive oxide layer (Transparent Conductive Oxide). • TC 〇) 12 on the substrate 1 ;; ' (B) using plasma treatment to the county - the first light absorbing layer i 3 on the first transparent conductive oxide layer 12; (C) using a mask to form a a second transparent conductive oxide layer 4 on the first light absorbing layer 13;

(D )形成一電漿子奈米結構層(朽沾⑽也 Nanostructure) i 5於該第二透明導電氧化層工4上,其中該 電槳子奈米結構層1 5包括數個奈綠子i 5 i ; 人 (E)利用該光罩形成—第三透明導電氧化層i 6於該 電漿子奈米結構層15上; 人 (F)利用該第三透明導電氧化層16作為-遮罩,钱 刻該第一光吸收層13;以及 導電氧=用上另「光罩形成一金屬先柵17於該第三透明 例如有機聚合物或鋼板材料 4及16係可選自於氧 上述基板10係為非透明基板, 亦可為透明基板,如玻璃。 上述各透明導電氧化層12 201230376 化銅錫(IT0)、氧化鋅(ZnO)、氧化鈕辞(AZO或ΖηΟ:Α1) 或摻雜氟之二氧化錫(Sn〇2:F)之材料。 上述背金屬反射層1 1係可選自於鋁(Al)或銀(Ag) 之高反射率金屬膜。 上述第一光吸收層1 3係為一 n-i-p或p-i-η之非晶矽 (a-Si:H)堆疊層。 上述奈米粒子1 5 1係為金屬奈米粒子(Metalparticles) 材料’可選自於金(Au)或銀;亦可為介電奈米粒子(Dielectric parties)材料,可選自於二氧化石夕(Si〇2)、氮化石夕(私风) 或一氣化欽(Ti〇2)。 、利用本發明所提出之方法,其製備奈米粒子組裝結構方 法,無論係採用薄膜退火成核(Xhermal 、奈米模板 ^Alumumm Anode Oxide, AAO )、旋轉塗佈(Spin c〇ating )、 奈米轉印(Nan0-imprint )、深紫外光微影(以印^ U^ography)或聚焦離子束方式(F〇cusi〇nBean FiB),皆可 :谷一般半導體積體電路製程所使用之金屬麟(Sputter), 二乍不同”電係數之透明導電層,此薄膜太陽能電池光揭限整 '方法除應用於石夕薄膜太陽能電池外可同時套用至異質結 構夕B日太陽i電池'有機魏太陽能電池及細細薄膜太陽 ^電池中,提高鱗電流及改善填細子,進啸高太陽光譜 利用率及光電轉換效率。 一立請參閱『第2圖』所示,係為本發明之第—整合性結構 t圖所不係以第1圖之複合性光触奈米材料之薄 ^场能電池整合流程所軸之整合性結構,係包括一基幻 0、一配置於該基板10上之背金屬反射層!i、-配置於該 201230376 背金屬反射層1 1上之第-透料電氧化層i 2、—經 處理所構成而配置於該第-透明導電氡化層i 2上二 吸收層! 3、-配置於該第-光吸收層i 3上之第二透明3 氧化層1 4、-配置於該第二翻導電氧化層i彳上 奈米結構層1 5 ’且該電駐奈雜構層i 5係包括數齡米 粒子1 5 1、-配置於該電料絲結構層i 5上之第三^明 導電氧化層1 6、以及-配置於該第三透明導電氧化層丄^上 之金屬光柵17。其中:(D) forming a plasmonic nanostructure layer (fat (10) also Nanostructure) i 5 on the second transparent conductive oxide layer 4, wherein the electric pad nanostructure layer 15 includes a plurality of nano greens i 5 i ; person (E) uses the mask to form a third transparent conductive oxide layer i 6 on the plasmonic nanostructure layer 15; the person (F) uses the third transparent conductive oxide layer 16 as a mask a cover, money engraving the first light absorbing layer 13; and conducting oxygen = using another "mask to form a metal first grid 17 to the third transparent, for example, an organic polymer or steel sheet material 4 and 16 series may be selected from oxygen The substrate 10 is a non-transparent substrate, and may also be a transparent substrate such as glass. Each of the transparent conductive oxide layers 12 201230376 is made of copper tin (IT0), zinc oxide (ZnO), oxidized button (AZO or ΖηΟ: Α1) or A material of a fluorine-doped tin dioxide (Sn〇2: F). The above-mentioned back metal reflective layer 11 is a high-reflectance metal film which may be selected from aluminum (Al) or silver (Ag). 1 3 is a stack of amorphous yttrium (a-Si:H) of a nip or pi-η. The above-mentioned nanoparticle 1 5 1 is a metal nanoparticle (Metalparticles) material. The material 'may be selected from gold (Au) or silver; or may be a dielectric material of Dielectric parties, which may be selected from the group consisting of sulphur dioxide (Si〇2), nitrite (private wind) or one gas. Huayu (Ti〇2). Using the method proposed by the present invention, the method for preparing nanoparticle assembly structure, whether using film annealing nucleation (Xhermal, nano template ^Alumumm Anode Oxide, AAO), spin coating (Spin c〇ating), nanotransfer (Nan0-imprint), deep ultraviolet lithography (by printing ^ U ^ography) or focused ion beam method (F〇cusi〇nBean FiB), can be: general semiconductor The metal stalk (Sputter) used in the integrated circuit process, and the two different "electrical coefficient transparent conductive layer, the thin film solar cell light-reduction method" can be applied to the heterogeneous structure in addition to the Shixi thin film solar cell. B-day solar i battery 'organic Wei solar cell and thin film solar ^ battery, improve scaly current and improve filling, high solar spectrum utilization and photoelectric conversion efficiency. Please refer to the "Figure 2" for the first time, which is the first part of the invention - the integrated structure t diagram is not tied to the thin photo field battery integration process of the composite photo-touch nano-material of Figure 1. The integrated structure includes a base magic 0, a back metal reflective layer disposed on the substrate 10! i, - the first-transfer electro-oxidation layer i 2 disposed on the back metal reflective layer 11 of the 201230376 is formed by processing and disposed on the first transparent conductive layer i 2 on the second absorption layer! 3, a second transparent 3 oxide layer 14 disposed on the first light absorbing layer i 3, a nanostructure layer 15 5 disposed on the second conductive oxide layer i 3 and the electricity The layer i 5 includes a plurality of age-old particles 516, a third conductive oxide layer 16 disposed on the electrode structure layer i 5, and a third transparent conductive oxide layer 丄Metal grating 17 on it. among them:

當組裝大尺寸之金屬奈錄子及介電奈餘子於非透明 基板上(如有機聚合物或鋼板材料),再依序製作背金屬 層(如紹或銀等高反射率金屬膜)'透明導電氧化層及光吸收 層(n-i-p太陽能電池材料),此複合性光舰奈米材料可 太陽能電池之纽層;小尺寸之金屬絲粒子於透明基 t (如玻璃),再依序製作透明導電層及光吸收層(p_i_n^ 陽能電池材料)’此複合性光侷限奈米材料可作為太陽能電池 之表面電漿光侷限層。 'When assembling large-sized metal na[iota]ns and dielectric na[iota]ns on non-transparent substrates (such as organic polymers or steel plate materials), the back metal layers (such as high reflectivity metal films such as Shao or silver) are sequentially fabricated. Transparent conductive oxide layer and light absorbing layer (nip solar cell material), the composite light ship nano material can be a layer of solar cells; small-sized wire particles are transparent on the base t (such as glass), and then transparently Conductive layer and light absorbing layer (p_i_n^ cation battery material) 'This composite light-limited nano-material can be used as a surface plasma layer of solar cells. '

—立凊參閱『第3圖』所示’係為本發明之第二整合性結構 :意圖。如®所示:係本發明複合性絲限奈紐料之第:整 ^性結構,其包括—基板1 gi置於該基板i Qa上之= 聚子奈米結構層i 5a’且該電聚子奈綠構層i 5a係包括數 2錄子1 5 la、—配置於該電奸奈米結構層1 5a上之 、透明導電氧化層1 2a、一經由電漿處理而配置於該第一 ,明導電氧化層1 h上之第—光吸收層i〜、—配置於該第 、光吸收層1 3a上之第二透明導電氧化層i 4a、以及一配置 於5亥第二透明導電氧化層1 4a上之金屬光栅1 ?a。 11 201230376 本實施例係將複合性光偈限奈米材料整合至_堆疊層 a-Si:H之底層,無論細金屬奈錄子或介電奈恤子皆可 增加光之背反雜率’躺增加先_徑、增加光停留於光吸 收層時間(縱向方向);而此週離奈米結構亦同時產生另一 種表面電漿子之橫向方向之漸逝波(Evana_ee—Looking at “Figure 3” is the second integrated structure of the invention: Intent. As shown in the ®: is the first of the composite silk-restricted materials of the present invention: a structure comprising: a substrate 1 gi placed on the substrate i Qa = a poly-nano-structure layer i 5a' and the electricity The poly-nano-green layer i 5a includes a number 2 of records 15 a, a transparent conductive oxide layer 12 2 disposed on the electrical adult nanostructure layer 15 5 , and is disposed in the first via a plasma treatment First, the first transparent conductive oxide layer i 4a disposed on the first light-transmissive layer 13a, and the second transparent conductive layer disposed on the first light-transmissive layer 13a The metal grating 1 ?a on the oxide layer 14a. 11 201230376 This embodiment integrates the composite diaphragm-nano-material into the bottom layer of the _stack layer a-Si:H, regardless of the fine metal nephew or the dielectric nap, which can increase the back of the light. Increasing the first-path, increasing the light staying in the light-absorbing layer time (longitudinal direction); and this week, the nanostructure also produces an evanescent wave in the lateral direction of another surface plasmon (Evana_ee)

Wave)現 象,可增加橫向光波停留於光吸收層時間。 請參閱『第4圖』所示,係為本發明之第三整合性結構 示意圖。如斷示:係本發明複合性光侷限絲材料之第三整 φ 5 K構’其包括一基板1 〇b、—配置於該基板1 Ob上之 背金屬反射層1 lb、-配置於該背金屬反射層i lb上之第 -透明導電氧化層1 2b、-經由電聚處理所構成而配置於該 第-透明導電氧化層!2b上之第一光吸收層丄3b、一配置 於該第-紋收層1 3b上之概子奈綠構層i 5b,且該 %漿子奈米結構層15b係包括數個奈米粒子15ib、一配 置於該電聚子奈米結構層1 5b上之第二透明導電氧化層丄4 b、一配置於該第二透明導電氧化層i4b上之第二光吸收層 • 1 8b、一配置於該第二光吸收層i 8b上之第三透明導電氧 化層1 6b、以及一配置於該第三透明導電氧化層【6b上之 金屬光栅17b。 本實施例係將小尺寸之金屬奈米粒子鑲嵌於兩組光吸收 層13b、18b中間,利用量子點之量子井侷限效應,以撞 擊游離(ImpactIonization)機制可產生更多之载子,以及量子 點形成之微能帶(Mini-bands)提高載子之傳輪,形成類似於 堆疊型太陽能電池多重接面之多重能階結構,增進全光譜太陽 光吸收及載子傳輸收集。 12 201230376 叫參閱『第5圖及第6圖』所示,係分別為本發明第二 整合性結構之電子顯微掃描示意圖、及本發明第二整合性結構 之性能測試示意ΐμ如圖所示:係本發·H合性結構為 例,該實施例之複合性光侷限奈米材料,其結構中電漿子奈米 結構層1 5a之奈練Η 5 U雖可直接形成在基板^心 上而無需以上下夾層之透明導電氧化層堆疊,惟本發明亦可進 -步以第二透明導電氧化層丨6a上下夾包該奈錄子丄5 1 a ’如弟5圖所示。 第6圖所示為本發明以Sn〇2:F/Au/Zn〇:A1複合性光侷限 奈米材料應用於p_i_n疊堆層非晶矽太陽能電池上之實驗數Wave) can increase the time that lateral light waves stay in the light absorbing layer. Please refer to Fig. 4, which is a schematic diagram of the third integrated structure of the present invention. The third φ 5 K structure of the composite optical confinement material of the present invention comprises a substrate 1 〇b, a back metal reflective layer 1 lb disposed on the substrate 1 Ob, and disposed thereon. The first transparent conductive oxide layer 12b on the back metal reflective layer i lb is formed by electropolymerization and disposed on the first transparent conductive oxide layer! a first light absorbing layer 丄3b on 2b, a substantially sub-green layer i 5b disposed on the first-grain layer 13b, and the % slurry nanostructure layer 15b includes a plurality of nano particles 15ib, a second transparent conductive oxide layer 4b disposed on the electro-poly nanostructure layer 15b, and a second light absorbing layer disposed on the second transparent conductive oxide layer i4b. a third transparent conductive oxide layer 16b disposed on the second light absorbing layer i 8b and a metal grating 17b disposed on the third transparent conductive oxide layer [6b]. In this embodiment, small-sized metal nanoparticles are embedded in the middle of the two light-absorbing layers 13b and 18b, and the quantum well confinement effect of the quantum dots can generate more carriers and quantum by the impact free mechanism. The micro-bands formed by the dots enhance the carrier of the carrier, forming a multi-level structure similar to the multiple junctions of the stacked solar cells, and enhancing the full-spectrum solar absorption and carrier transport collection. 12 201230376 Referring to "Fig. 5 and Fig. 6", the schematic diagram of the electron microscopy of the second integrated structure of the present invention and the performance test of the second integrated structure of the present invention are shown in the figure. For example, the composite light-restricted nano-material of the embodiment has a composite optical nano-material in which the plasmonic nano-structure layer 15 5 can be directly formed on the substrate. The transparent conductive oxide layer stack of the upper interlayer is not required, but the present invention can also further sandwich the nephew 丄5 1 a ' as shown in FIG. 5 with the second transparent conductive oxide layer 丨 6a. Figure 6 shows the number of experiments in the present invention using Sn〇2:F/Au/Zn〇:A1 composite optical confinement nanomaterials applied to p_i_n stacked amorphous germanium solar cells.

據。本發明係將5nm之金奈米粒子自組裝於具粗链化之Sn〇2:F 及ΖηΟ:Α1介面間,由圖中在14〇〇c及9〇〇c下分別呈現加入 金奈米粒子效率曲線2、3與未加人金奈練子效率曲線2 a、3 a之比較顯示,在14〇〇c下加入金奈米粒子效率達8 5%, 未加入金奈米粒子效率則為8 〇%;而在90〇(:下加入金奈米粒 子效率達7.6% ’未加入金奈米粒子效率則為6 9%。由此可知, 本發明利則、尺寸金奈錄子之強近場絲效應,在最佳之奈 米粒子表面覆盍率下,可達成光侷限效應,進而增加太陽能電 池之光電流密度。 本發明提出之方法及其結構’射有效克服無介面保護 所產生之表面缺陷及電漿離子轟擊導致奈米粒子表面破壞問 題’不僅可細於傾駄陽能電池之各人射光面向結構,同 時更具備有:-漸變式折射率(腳折射率為2 3 ; a Si:H折 射率為4.23)結構,可提高人射光之抗反射效率;—週期性表 面粗糙化結構,具備橫向方向之表面賴子漸逝麟性,增加 13 201230376 可 於光吸收層之時間;具備多元 改善光電元狀整合性:从辦触之可靠ΐ · ί 辑電氧化層_介電性質,可調變i 面缺fe’補可提昇元件電性 染及破壞,更可同時多方位整人至子-輯產生之污 中間層及背絲處,触有^升2太=㈣池之入光面、 之元件整合峨㈣输^㈣嶋米材料 本;®Γ述核⑽—種相域能電池絲限整合方 …構,可有效改善f用之種種缺點,為三明治結構,將 料輯财,朗雜供—㈣式折射率結according to. The invention self-assembles 5 nm gold nanoparticles into the thick-chained Sn〇2:F and ΖηΟ:Α1 interfaces, and presents the addition of gold nanoparticles in the figure at 14〇〇c and 9〇〇c respectively. The comparison of particle efficiency curves 2 and 3 with the unaffected Chennai efficiency curve 2 a, 3 a shows that the efficiency of adding gold nanoparticles at 14 〇〇c is 85%, and the efficiency of not adding gold nanoparticles is It is 8 〇%; and at 90 〇 (: the efficiency of adding Jinnai particles is 7.6%), the efficiency of the non-added Jinnai particles is 6 9%. It can be seen that the advantages of the invention and the size of the Chennai are strong. Near-field filament effect, under the optimal coverage of nano-particles, the optical confinement effect can be achieved, thereby increasing the photocurrent density of the solar cell. The method and structure of the invention are effective to overcome the non-interface protection. The surface defects and the plasma ion bombardment cause the surface damage problem of the nanoparticles to be 'not only finer than the light-emitting surface of each of the slanting solar cells, but also have:-gradient refractive index (the refractive index of the foot is 2 3 ; a Si:H refractive index of 4.23) structure, can improve the anti-reflection efficiency of human light; The surface roughening structure has the surface gradual gradation of the lateral direction, increasing the time of 2012 2012376 in the light absorbing layer; having multiple improvements in photo-electrical integration: from the touch of reliability ΐ · ί _Dielectric properties, adjustable i-face lack of fe' complement can improve the electrical dyeing and destruction of the components, but also can be multi-faceted from the whole person to the sub-set of the dirty intermediate layer and the back wire, touched ^ 2 = (4) The entrance surface of the pool, the integration of the components (4) The transmission of the (4) glutinous rice material; the Γ 核 nuclear (10) - the phase domain energy battery wire limit integration ... structure, can effectively improve the various disadvantages of f, for the sandwich structure , will be rich in materials, Lang miscellaneous - (four) type refractive index

Jt/面A漿子絲結構之高散射效率及銳場光學效應 t增加光停留在光魏層之_,叫加猶之找流,達成 乂升先電讀之鱗’同時可減少_磐之使用,並具有減 少半導體吸收層_及_特性破壞之優點,可於提高入射光 之抗反射效辆時’改善找元件之整合性並增加光電元件之 長時光照穩定性,進而使本發明之産生缺進步、更實用、更 符合制者之賴,確已符合發明專财請之要件爰依法提 出專利申請。 惟以上所述者,僅為本發明之較佳實關而已當不能 以此限疋本發财^之範ϋ ;故,凡依本發明中請專利範圍及 毛月。03内谷所作之簡單的等效變化與修飾,皆應仍屬本發 明專利涵蓋之範圍内。 14 201230376 【圖式簡單說明】 第1圖,係為本發明之複合性光侷限奈米材料之薄膜太陽 能電池整合流程示意圖。 第2圖’係為本發明之第一整合性結構示意圖。 第3圖,係為本發明之第二整合性結構示意圖。 第4圖,係為本發明之第三整合性結構示意圖。 第5圖’係本發明第二整合性結構之電子顯微掃描示意圖。 第6圖,係本發明第二整合性結構之性能測試示意圖。 第7圖,係習用表面賴效應之光伏特元件示意圖。 第8圖’係習用具有電聚子結構的疊層薄膜光能元件示意 圖。 第9圖,係習用光偵測器裝置示意圖。 第10圖’係習用光伏特電池示意圖。 【主要元件符號說明】 (本發明部分)The high scattering efficiency of the Jt/face A pulp filament structure and the optical effect of the sharp field t increase the light staying in the ray layer of the light, which is called the search of the water, and the scale of the electric reading is achieved. It has the advantages of reducing the damage of the semiconductor absorption layer and the characteristic damage, and can improve the integration of the component and increase the long-term illumination stability of the photovoltaic element when the anti-reflection effect of the incident light is improved, thereby making the invention The lack of progress, more practical, and more in line with the system, has indeed met the requirements of the invention of special funds, and filed a patent application according to law. However, the above is only a better practice of the present invention, and it cannot be limited to the scope of the present invention; therefore, the patent scope and the gross month are required in accordance with the present invention. The simple equivalent changes and modifications made by Neigu in 03 shall remain within the scope of the patents of this invention. 14 201230376 [Simple description of the diagram] Fig. 1 is a schematic diagram showing the integration process of the thin-film solar cell of the composite optical confinement nano material of the present invention. Figure 2 is a schematic view of the first integrated structure of the present invention. Figure 3 is a schematic view of the second integrated structure of the present invention. Figure 4 is a schematic view of the third integrated structure of the present invention. Figure 5 is a schematic view of an electron microscopy of a second integrated structure of the present invention. Figure 6 is a schematic diagram showing the performance test of the second integrated structure of the present invention. Figure 7 is a schematic diagram of a photovoltaic component that uses the surface effect. Fig. 8 is a schematic view showing a laminated thin film light energy element having an electropolymer structure. Figure 9, is a schematic diagram of a conventional photodetector device. Figure 10 is a schematic diagram of a conventional photovoltaic cell. [Description of main component symbols] (part of the present invention)

基板 10、l〇a、 背金屬反射層1 1、1 ] 2、1 2a、1 2b 3a、1 3b 4、1 4a、1 4b 、1 5a、1 5b la、1 5 lb 6、1 6a、1 6b 第一透明導電氧化層1 第一光吸收層13、1 第二透明導電氧化層i 電漿子奈米結構層15 奈米粒子151、i 5 弟二透明導電氧化層1 15 201230376 金屬光柵1 7、1 7a、1 7b 第二光吸收層1 8b 加入金奈米粒子效率曲線2、3 未加入金奈米粒子效率曲線2a、3a (習用部分) 光吸收層4 0 鋁及銅奈米粒子電漿共振散射層41 鋁及銅奈米粒子411 疊層薄膜光能元件5 電漿子結構層5 0 奈米金屬顆粒5 01 低禁帶光電轉換層51 高禁帶光電轉換層52 奈米金粒子6 0 透明氧化層61 n-i-p堆疊層非晶矽6 2 16Substrate 10, 10a, back metal reflective layer 1 1 , 1 2, 1 2a, 1 2b 3a, 1 3b 4, 1 4a, 1 4b, 1 5a, 1 5b la, 1 5 lb 6 , 16a, 1 6b first transparent conductive oxide layer 1 first light absorbing layer 13, 1 second transparent conductive oxide layer i plasmonic nanostructure layer 15 nanoparticle 151, i 5 dian two transparent conductive oxide layer 1 15 201230376 metal grating 1 7、1 7a, 1 7b Second light absorbing layer 1 8b Adding gold nanoparticle particle efficiency curve 2, 3 No gold nanoparticle particle efficiency curve 2a, 3a (conventional part) Light absorbing layer 40 0 aluminum and copper nano Particle plasma resonance scattering layer 41 Aluminum and copper nanoparticles 411 Laminated film light energy element 5 Plasma substructure layer 5 0 Nano metal particles 5 01 Low band gap photoelectric conversion layer 51 High band gap photoelectric conversion layer 52 nm Gold particles 60 transparent oxide layer 61 nip stacked layer amorphous 矽 6 2 16

Claims (1)

201230376 七、申請專利範圍: 1·一種薄膜太陽能電池光侷限整合方法,係為一整合至薄膜 太陽能電池之入光面處之複合性光侷限奈米材料之製備方 法,其至少包含下列步驟: (A 1)&amp;供一基板’並分別形成一背金屬反射層及一 第一透明導電氧化層(Transparent Conductive Oxide, TCO ) 於該基板上; (B 1 )利用電漿處理以形成一第一光吸收層於該第一 透明導電氧化層上; (C 1 )利用一光罩形成一第二透明導電氧化層於該第 一光吸收層上; D1 ) ^/成一電槳子奈米結構層(piasmonic Nanostructure)於該第二透明導電氧化層上,其中該電漿子 奈米結構層包括數個奈米粒子; (E 1)利用該光罩形成-第三透明導電氧化層於該電 漿子奈米結構詹上; (F 1 )利用該第三透明導電氧化層作為一遮罩,蝕刻 該第一光吸收層;以及 (G 1 )利用另一光罩形成一金屬光柵於該第三透明 電氧化層上。 據申請糊範圍第1項所述之_太陽能電池光侷限整 :方法,其t,該基㈣為非透明基板,並可為有機聚合物 或鋼板材料。 2請糊翻第1項所述之_域能電池光侷限整 σ 其中’該基板係為透明基板,並可為坡璃。 17 201230376 4.依據申請專利範圍第1頊 — 人H1 、斤遨之溥膜太陽能電池光侷限整 口ί^、:該些透明導電氧化層係可選自於氧化姻錫 畤,夕一!^匕辞(Ζη〇)、氧化銘鋅(細或Ζη〇:Α1)或摻 雜亂之一氣化锡(SnO/F)之材料。 5 mi概财1销敎賴域能電池光侷限整 ^ 1财,該f金屬反射層係可選自於链(A1)或銀㈤ 之尚反射率金屬膜。 6 ·依據申請專利範圍第丄項所述之薄膜太陽能電池光偈限整 口方法,、中’ 5亥些光吸收層係為—n-i-p或p-i-n之非晶石夕 (a-Si:H)堆疊層。 7 ·依據申請專利範圍第χ項所述之薄膜太陽能觀光偈限整 〇方法其中’該奈米粒子係為金屬奈米粒子 particles)材料,可選自於金(Au)或銀。 8 ·依據中請專利麵第!項所述之薄駄陽能電池光偈限整 合方法,其中,該奈米粒子係為介電奈来粒子⑺心咖 partides)材料,可選自於二氧化石夕(Si〇2)、氣化石夕(秘4) 或二氧化鈦(Ti02)。 9 ·依據申請專利範圍$ 1項所述之薄膜太陽能電池光偈限整 合方法’其中’該電漿子奈米結構層係藉由薄膜退火成核 (Thermal Anneal)、奈米模板(Aluminurn An〇de 〇xide, AAO)、旋轉塗佈(Spin Coating )、奈米轉印(N__imprint)、 深紫外光微影(Deep UV Lithography)或聚焦離子束方式 (Focus Ion Bean, Fffi)之方式形成。 l〇.依據申請專利範圍第l項所述之薄膜太陽能電池光侷限 整合方法,係適用於太陽能電池之表面電聚光侷限層或背反 18 201230376 層使用。 1 1效^據申請專利範圍第1項所述之薄膜太陽能電池光侷限 整合方法,其中,該薄膜太陽能電池係可為矽薄膜太陽能電 池、異質結構石夕晶太陽能電池、有機薄膜太陽能電池及銅麵 鎵硒薄膜太陽能電池。 12 種薄膜太陽能電池光侷限整合方法,係為一整合至薄 駄陽能電池之中間層處之複合性光侷限奈米材料之製備 方法,其至少包含下列步驟: (A 2)提供一基板,並分別形成一背金屬反射層及一 第一透明導電氧化層於該基板上; (B 2 )彻魏處理以形成―第_光吸收層於該第 透明導電氧化層上; 2)形成一電漿子奈米結構層於該第一光吸收層 八中該電漿子奈米結構層包括數個奈米粒子; 黎光罩形成一第二透明導電氧化層於該電 透明電聚處理以形成一第二光吸收層於該第二 二光光罩形成-第三透明導電她 電氧利用另—光罩形成—金屬光栅於該第三透明導 限整mu細第12項所述之_太陽能電池光侷 锡、氧化鉢亥些透明導電氧化層係可選自於氧化銅 辛、乳化紹辞或摻雜氟之二氧化錫之材料。 19 201230376 1 專纖㈣1 2項所述之薄膜太陽能電池光侷 限整合方法,其中,該些光吸收層係為-叫或―之非 晶石夕堆疊層。 1 5㈣^申請專利範㈣1 2項所述之賴太陽能電池光侷 δ方法’其中’該奈練子係為金屬奈米粒子材料,可 运自於金或銀。 1 6 .依據申請糊細第i 2項所述之薄社陽能電池光偈 ,合方f ’其中’該奈米粒子係為介電奈米粒子材料,可 選自於二氧化矽、氮化矽或二氧化鈦。 1 7 . -種_太陽能電池光侷限整合方法,料—整人至薄 Π㉙池之背光面處之複合性光侷限奈米材料:製備 方法,其至少包含下列步驟: jA 3)提供-基板,並分別形成—電漿子奈米結構層 t第一透料電氧化層於職板上,射該賴子奈米結 構層包括數個奈米粒子; (B 3 )湘f漿處理以形成—第—光吸收層於該第一 透明導電氧化層上; (C 3 ) _-光罩形成—第二透明導電氧化層於該第 一光吸收層上;以及 (D 3)利用另-光罩形成—金屬光栅於該第二透明導 電氧化層上。 1申請專利範圍第17項所述之_太陽能電池光侷 限正5方法,其中,該些透明導電氧化層係 錫、氧化鋅、氧化簡或摻雜氣之二氧化錫之材料。乳銦 1 9 .依據申請專概圍第i 7項所叙_太陽能電池絲 20 201230376 該些光吸收層係為— 限整合方法,其中 晶碎堆疊層。 n_i-p 或 p-i-n 之非 2 圍I1,7項所述之薄膜太陽能電池光褐 式银 ,、中U粒子係為金屬奈米粒子材料之金 二S、為介f奈綠子材料之:氧切、氮财或二氧化 欽0201230376 VII. Patent application scope: 1. A thin film solar cell optical confinement integration method is a preparation method of a composite optical confinement nano material integrated into a light entrance surface of a thin film solar cell, which comprises at least the following steps: A 1) &amp; for a substrate 'and separately forming a back metal reflective layer and a first transparent conductive oxide layer (TCO) on the substrate; (B 1 ) using plasma treatment to form a first a light absorbing layer on the first transparent conductive oxide layer; (C1) forming a second transparent conductive oxide layer on the first light absorbing layer by using a mask; D1) ^/ into an electric paddle nanostructure layer (piasmonic Nanostructure) on the second transparent conductive oxide layer, wherein the plasmonic nanostructure layer comprises a plurality of nano particles; (E1) forming a third transparent conductive oxide layer on the plasma by using the reticle a sub-nano structure; (F 1 ) etching the first light absorbing layer using the third transparent conductive oxide layer as a mask; and (G 1 ) forming a metal grating in the third by using another mask Transparent electricity Layer on. According to the application of the paste range, the solar cell is limited by the method: t, the base (4) is a non-transparent substrate, and may be an organic polymer or a steel plate material. 2 Please paste the _ domain energy battery described in item 1 to limit the σ where 'the substrate is a transparent substrate and can be a glass. 17 201230376 4. According to the scope of patent application No. 1 - Human H1, 遨 遨 溥 太阳能 太阳能 太阳能 太阳能 太阳能 太阳能 太阳能 太阳能 ί ί ί ί ί ί ί ί ί ί ί ί 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该 该匕 Ζ (Ζη〇), oxidized zinc (fine or Ζη〇: Α 1) or doped with a gasified tin (SnO / F) material. 5 mi 财 1 1 敎 敎 能 能 能 能 能 电池 电池 ^ ^ ^ ^ ^ ^ 1 1 1 1 1 1 1 1 1 1 金属 金属 金属 金属 金属 金属 金属 金属 金属 金属 金属 金属 金属 金属 金属 金属6 · According to the method of the patent application scope, the thin-film solar cell photo-reduction method is as described in the above paragraph, and the light absorption layer in the '5 ha is a-spin or pin-shaped a-Si:H stack Floor. 7. The thin film solar energy sightseeing method according to the invention of claim </ RTI> wherein the 'nano particles are metal nanoparticle particles> material may be selected from gold (Au) or silver. 8 · According to the patent, please! The thin solar energy cell photo-integration method according to the invention, wherein the nano particle system is a dielectric nano-particle (7) heart-shaped partides) material, which may be selected from the group consisting of: cerium dioxide (Si〇2), gasification stone eve (Secret 4) or Titanium Dioxide (Ti02). 9 · The thin film solar cell photo-integration method according to the patent application scope of claim 1 'where the plasmonic nanostructure layer is formed by thin film annealing nucleation (Thermal Anneal), nano template (Aluminurn An〇 De 〇xide, AAO), spin coating, N__imprint, Deep UV Lithography or Focus Ion Bean (Fffi). L〇. The thin film solar cell light confinement integration method according to the scope of claim patent is applicable to the surface electric concentrating layer of the solar cell or the back layer 18 201230376 layer. The invention relates to a method for integrating light confinement of a thin film solar cell according to claim 1, wherein the thin film solar cell can be a germanium thin film solar cell, a heterostructure stone solar cell, an organic thin film solar cell and copper. Surface gallium selenide thin film solar cell. 12 thin film solar cell optical confinement integration method is a method for preparing a composite optical confinement nano material integrated into an intermediate layer of a thin solar cell, which comprises at least the following steps: (A 2) providing a substrate and separately Forming a back metal reflective layer and a first transparent conductive oxide layer on the substrate; (B 2 ) processing to form a “first light absorbing layer on the first transparent conductive oxide layer; 2) forming a plasmonic The nanostructure layer is in the first light absorbing layer VIII, the plasmonic nanostructure layer comprises a plurality of nano particles; the ray mask forms a second transparent conductive oxide layer in the electro-transparent electropolymerization process to form a first The second light absorbing layer is formed in the second two-light ray mask - the third transparent conductive material is formed by the oxidant, and the metal grating is used in the third transparent conductive limit The transparent conductive oxide layer of the tin and the yttrium oxide may be selected from the group consisting of copper oxychloride, emulsified or fluorine-doped tin dioxide. 19 201230376 1 Special fiber (4) The thin film solar cell light localization integration method described in the above, wherein the light absorbing layers are - or a non-crystallized stack. 1 5 (4) ^ Application for a patent (4) The solar cell luminescence of the solar cell δ method 'where' is the metal nanoparticle material, which can be transported from gold or silver. 1 6. According to the application of the paste of the thinner solar cell light, as described in item i 2, the square f 'where the nanoparticle is a dielectric nanoparticle material, which may be selected from the group consisting of cerium oxide and tantalum nitride. Or titanium dioxide. 1 7 . - _ solar cell light confinement integration method, material - composite light confinement nano-material at the backlight surface of the whole person to the thin pool 29: preparation method, which at least comprises the following steps: jA 3) provide - substrate, and Forming a plasmonic nanostructure layer t first through the electrical oxide layer on the job board, shooting the Lai nano structure layer including a plurality of nano particles; (B 3) processing the slurry to form - the first a light absorbing layer on the first transparent conductive oxide layer; (C3) _-mask forming - a second transparent conductive oxide layer on the first light absorbing layer; and (D3) forming using a different mask - A metal grating is on the second transparent conductive oxide layer. (1) The method of claim 5, wherein the transparent conductive oxide layer is a material of tin, zinc oxide, oxidized or doped tin dioxide. Indium Indium 1 9 . According to the application of the general section i 7 item 7 solar cell wire 20 201230376 These light absorbing layers are - limited integration method, in which the crystal layer is stacked. N_i-p or pin non-circle I1, thin film solar cell light brown type silver, and medium U particle system is metal nano particle material of gold two S, which is a kind of n-green material: oxygen Cut, nitrogen or dioxide 21twenty one
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TWI482304B (en) * 2012-07-19 2015-04-21 Nat Univ Chung Hsing A method for manufacturing a stacked solar cell and a product thereof
US9450117B2 (en) 2013-11-11 2016-09-20 Kingwave Corporation Optoelectronic device having surface periodic grating structure
US11843064B2 (en) 2018-08-20 2023-12-12 Pixelexx Systems, Inc. High information content imaging using Mie photo sensors

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TWI482304B (en) * 2012-07-19 2015-04-21 Nat Univ Chung Hsing A method for manufacturing a stacked solar cell and a product thereof
US9450117B2 (en) 2013-11-11 2016-09-20 Kingwave Corporation Optoelectronic device having surface periodic grating structure
US11843064B2 (en) 2018-08-20 2023-12-12 Pixelexx Systems, Inc. High information content imaging using Mie photo sensors
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