201230644 六、發明說明： 【發明所屬之技術領域】 本發明，係有關於對與電漿負載作接觸之電極而投入 電力的直流電源裝置，特別是有關於被使用在濺鍍裝置中 者。 【先前技術】 作爲在玻璃或者是矽晶圓等之基板表面上形成薄膜的 方法，從先前技術起，使用濺鍍裝置來進行一事，係爲週 知。在此濺鍍裝置中，例如，係在真空氛圍下之處理室內 ，而導入特定之濺鍍氣體（氬氣），並且，對於因應於欲 在基板表面所形成之薄膜的組成而製作了的身爲與電漿負 載作接觸之電極的靶材，來藉由直流電源裝置而投入電力 ，以形成電漿氛圍。而後，使電漿氛圍中之離子朝向靶材 而加速並作碰撞，來使濺鍍粒子（靶材原子）飛散，並附 著'堆積在基板表面上，而形成特定之薄膜。 在由上述濺鎪裝置所致之薄膜形成中，會由於某些之 原因而導致產生電弧放電（異常放電），此事，係爲週知 。若是產生電弧放電，則由於電漿負載之阻抗係會急遽地 變小，因此，會發生急遽的電壓降低，伴隨於此，電流係 會增加。於此種情況，特別是在靶材爲鋁等之金屬製的情 況時，高電弧電流値之電弧放電，若是例如在靶材處而局 部性地發生，則靶材係會被熔解，所放出的物質會附著在 處理基板表面上，而發生所謂的粒子或者是噴濺（數 -5- 201230644 〜數百；am之塊）。並造成無法進行良好之成膜的問題。 於此，在專利文獻1中，係揭示有一種裝置，其係在 從直流電源部所對於靶材之正負的輸出中之其中一方處， 而將電感作串聯連接，並且，在此電感之後，而於直流電 源部側在正負之輸出（纜線）之間並聯地連接切換元件， 以設爲能夠將從直流電源部而來之電力投入遮斷並進行電 弧放電之消弧處理。 在上述專利文獻1所記載之裝置中，由於係在正負之 輸出間並聯地設置有切換元件，因此，係有著下述之問題 :亦即是，在電弧放電之發生時，就算是將上述切換元件 短路（ON)並形成閉電路，直到殘留於電漿負載或纜線 之電感成分或者是電容成分中之能量被消耗爲止，電弧電 流亦仍會通過上述切換元件而持續流動至與電漿負載相接 觸之靶材處。 因此，在上述專利文獻1中，係提案有：使用自耦變 壓器，而在將上述切換元件作了短路時，使正電壓產生並 將此殘留能量急速的消除。然而，就算是如此這般地使正 電壓產生，由於若是在電弧放電之發生時而阻抗爲非常低 ，則逆電流係會過大地發生，並且係施加製程上之負電壓 的10%以上之較高的正電壓，因此，真空裝置內之陽極和 陰極係會相互交換，依存於情況，會成爲逆濺鑛狀態，而 產生使電弧放電持續、或者是在從電弧處理而再度開始對 於靶材之電力投入的回復動作時而容易再度發生電弧放電 的問題。 -6- 201230644 又，雖然亦提案有在當電弧放電之發生時而 壓之電路處而串聯地設置電阻的構成’但是’如 用以將電弧放電作消弧之能力係會降低’而無s 以上之正電壓。因此，在施加充分之正電壓時’ 必要將脈衝寬幅增加，但是，在使用有自耦變壓 時，隨著時間的變長，流動至直流電源部側之線 流會增加，其結果，流動至電漿負載側之線圈處 係增加，而成爲滿足相反之條件一般的電弧處理 [先前技術文獻] [專利文獻] [專利文獻1]日本特開2004-6230號公報 【發明內容】 [發明所欲解決之課題] 本發明，係有鑑於上述之點，而以提供一種 加正電壓而將電弧放電消弧，並且在將電弧放電 當回復至通常動作時，能夠對於電弧放電之再度 地作抑制之直流電源裝置，作爲課題。 [用以解決課題之手段] 爲了解決上述課題，本發明之直流電源裝置 爲’具備有：對於與電漿負載作接觸的電極投入 流電源部；和將由於從此直流電源部而來之正負 施加正電 此一來， 施加1 0 % 係成爲有 器的情況 圏處的電 的逆電流 :能夠施 消弧後， 發生確實 ，其特徵 電力之直 的輸出所 201230644 在電極處產生之電弧放電檢測出來之電弧檢測部，並且， 係更進而具備有：在從前述直流電源部而來之正負的輸出 中之其中一方處而被與電漿負載串聯地作設置之第1切換 元件；和在正負之兩輸出間，被與電漿負載並聯地作設置 之第2切換元件以及施加逆電壓之逆電壓施加部；和對於 兩切換元件之ON、OFF的切換作控制之控制手段，前述控 制手段，係在對於電極投入電力之通常動作時，於藉由第 2切換元件來將從逆電壓施加部所對於電極之逆電壓的施 加停止了的狀態下，藉由第1切換元件來對於前述電極作 通電，若是藉由電弧檢測部而檢測出電弧放電，則係進行 電弧處理，其係藉由第2切換元件來從逆電壓施加部而對 於電極作通電，並施加特定期間之逆電壓，經由此，來進 行電弧放電之消弧，並於經過此期間後，藉由第1切換元 件來將對於電極之通電作特定期間之遮斷，而後，再度開 始對於電極之通電。 若依據本發明，則若是以對於和電漿負載接觸之電極 施加負的電壓之情況爲例來作說明，則在身爲通常動作之 電漿放電時，係將第2切換元件設爲ON，並將第1切換元 件設爲OFF，而將直流電源部和電極作通電，以投入電力 。而，若是藉由電弧檢測部而檢測出電弧放電，則首先係 將第2切換元件設爲ON。藉由此，在其與電極之間係作出 閉電路，並從逆電壓施加部而對於電極施加正電壓。藉由 此，電弧能量係被縮小（將施加此逆電壓之時間，稱作逆 電壓施加期間）。 -8- 201230644 若是如此這般而使電弧能量變小，則藉由將第1切換 元件設爲OFF，係能夠並不產生非常大之過電壓地而將電 漿負載作特定期間之切離（將此期間稱作輸出遮斷期間） 。亦即是，係藉由第1以及第2之兩切換元件來構成串並聯 之開關電路，並爲了將電弧放電消弧而施加正電壓，之後 ，將電漿負載和直流電源部以及逆電壓施加部暫時作切離 ，而將對於電弧放電之能量供給完全遮斷。之後，·將第1 切換元件設爲ON，並將直流電源部和電極再度作通電， 而再度開始電漿放電。 如此這般，若依據本發明，則與上述先前技術例相異 ，在逆電壓施加期間經過後，藉由設置輸出遮斷期間，係 能夠將逆電壓施加期間和輸出遮斷期間分別作最適當的設 定。其結果，係能夠將電弧放電時之電弧能量最小化，而 將電弧放電消弧，並且，在從消弧處理而作回復時，由於 係設置輸出遮斷期間而將能量供給暫時作遮斷，因此，係 能夠確實地抑制電弧放電之持續或者是再度發生。 而，若是將本發明之直流電源裝置適用在濺鑛裝置中 ，則在將電弧放電消弧時，係將正電壓施加期間盡可能地 縮短，並將電弧電流急速地降爲〇A，而，在將電弧放電消 弧後，係僅在直到身爲與電漿接觸之電極的靶材之表面狀 態和靶材所被作配置之處理室內的氛圍回到不會再度發生 電弧放電之程度爲止的期間中，而將對於電弧放電之能量 供給遮斷，其結果，係能夠實現最適當之電弧放電的消弧 處理。 -9 - 201230644 在本發明中，若是採用下述之構成，則爲理想，亦即 是：前述逆電壓施加部，係由變壓器所構成，此變壓器之 —次側卷線，係在從直流電源部而來之正負的輸出中之至 少其中一方處，而被與前述第1切換元件作串聯連接，變 壓器之二次側卷線，係被與並聯地設置在正負之兩輸出間 的第2切換元件作串聯連接，藉由第2切換元件之控制，而 對電極作通電並施加逆電壓。 若依據此，則在通常動作時，係藉由將第2切換元件 設爲OFF，並將第1切換元件設爲ON，而將變壓器之二次 側和一次側作串聯連接，來對於電極投入電力。而，若是 藉由電弧檢測部而檢測出電弧放電之發生，則首先，係將 第2切換元件設爲ON。此時，從直流電源部而來之輸出電 壓係成爲0V，之後，爲了在變壓器之二次側處產生正的電 壓，係通過第2切換元件來對於電極施加正電壓，而成爲 逆電壓施加期間。 在逆電壓施加期間經過後，藉由將第1切換元件設爲 OFF，係成爲輸出遮斷期間，輸出電流以及輸出電壓係成 爲〇。於此，在通常動作中，於輸出電壓係爲大，在電極 處流動有輸出電流的狀態下，若是將第1切換元件作ON、 OFF，則會產生非常大之過電壓，但是，若是採用上述構 成，則由於係藉由第2切換元件而預先將電壓或電流設爲 較小的準位，因此，第1切換元件之過電壓保護用的電路 ，係只需要簡單的構成即可。 若依據上述構成，則由於不需使用其他電源，便能夠 -10- 201230644 藉由變壓器來產生正電壓，因此，在信賴性或成本之觀點 上，係爲有利。另外，在上述先前技術例之裝置中，若是 不以相較來說較短之時間來產生正電壓並使電弧處理結束 ，則逆電流之增加係會變大。相對於此，在本發明中，藉 由使用第1以及第2之各切換元件，由於係能夠對於正電壓 之產生時間作限制，因此，就算是施加在通常之電漿放電 時所投入的電壓之10%以下的正電壓，例如施加3〜5%程 度之正電壓，只要取得有充分的與電極作切離之輸出遮斷 期間，則便能夠實現用以將電弧放電作消弧之電弧處理。 另一方面，在本發明中，亦可採用下述之構成：亦即 是，前述逆電壓施加部，係由逆電壓產生用之其他直流電 源部所構成，從此其他直流電源而來之正的輸出，係被與 第2切換元件作串聯連接，其之負的輸出，係被與電極作 連接。 若依據此，則在通常動作時，係將第2切換元件設爲 OFF，並將第1切換元件設爲ON。而，若是藉由電弧檢測 部而檢測出電弧放電之發生，則係將第2切換元件設爲ON 。同時，將第1切換元件設爲OFF，以從直流電源部來對於 電極施加正電壓，而成爲逆電壓施加期間。而，藉由將第 2切換元件設爲OFF，係成爲輸出遮斷期間，在經過此輸出 遮斷期間後，係將第1切換元件設爲ON，而成爲通常之電 漿放電狀態。若依據上述構成，則由於係能夠無關於通常 之電漿放電狀態，而簡單地對於施加在電極處之正電壓的 準位（電壓）作控制，因此，係能夠對各種之電弧處理作 -11 - 201230644 對應。 又’在本發明中，前述控制手段，係亦可採用將前述 電弧處理連續地反覆進行之構成。若依據此，則當如同上 述一般地接續於逆電壓施加期間而設置有輸出遮斷期間的 情況時’爲了對於逆濺鍍或者是伴隨於此所產生之逆電弧 放電狀態作防止，逆電壓施加期間係以盡可能地設爲較短 爲理想，但是，在像是對於基板或靶材之起因於處理室內 之電子的帶電（充電）而導致電弧放電之頻度變多一般的 情況時’作爲充電之防止效果，逆脈衝之產生係爲有效。 因此，在如同上述一般之由於用以防止充電之逆電壓施加 而容易成爲逆濺鍍的情況時，係藉由將脈衝寬幅和輸出遮 斷時間縮短，並將上述電弧處理作複數次之反覆進行，而 能夠確實地進行電弧放電之消弧。 當將前述電弧處理反覆進行複數次的情況時，較理想 ，控制手段，係在最後而停止了逆電壓之施加後，立即藉 由第1切換元件而再度開始對於電極之通電。 進而，在本發明中，係亦可採用下述之構成：亦即是 ，前述控制手段，係以特定間隔來進行對於電極之帶電防 止處理，該帶電防止處理，係在通常動作時，藉由第1切 換元件而將對於前述電極之通電停止，並藉由第2切換元 件而從逆電壓施加部來對於電極作通電而施加逆電壓，並 在經過特定期間後，藉由第1切換元件來再度開始對於電 極之通電。 若依據此’則在通常動作中，係能夠將對於基板或電 -12- 201230644 極之充電降低，而能夠對起因於此充電而誘發 情況作抑制。 另外，在本發明中，較理想，於前述電弧 加逆電壓的期間、和在前述帶電防止處理中而 的期間，係設爲互爲相異之期間。亦即是，在 ，由於係只要能夠將電弧放電消弧即可，因此 加期間，係被設定爲直到能夠將電弧放電消弧 ，而盡可能地設爲短，並相反地將輸出遮斷期 由此，特別是能夠將身爲電極之陰極表面的狀 而亦快速地回復到正常狀態。另一方面，在帶 中，由於陰極表面或電漿狀態係爲正常，因此 電防止效果變大的方式，而將逆電壓施加期間 輸出遮斷期間則只要爲能夠對於逆濺鍍作防止 ，而可設爲非常短的時間。另外，當逆濺鍍不 的情況時，係亦可將上述時間設爲〇。 又，亦可設爲下述之構成：亦即是，係將 處理中而施加逆電壓後起直到藉由第1切換元 始對於電極之通電爲止之期間、和在前述帶電 而施加逆電壓後起直到藉由第1切換元件來再 電極之通電爲止之期間，設爲互爲相異之期間 【實施方式】 以下，參考圖面，針對爲了在濺鍍裝置中 投入直流電力而作利用的情況爲例，來對於本 電弧放電的 處理中而施 施加逆電壓 電弧處理中 ，逆電壓施 爲止之時間 間增長，藉 態在熱性上 電防止處理 ，係以使充 設爲長，而 的時間即可 會成爲問題 在前述電弧 件來再度開 防止處理中 度開始對於 而對於靶材 發明之實施 -13- 201230644 形態的直流電源裝置E 1、E2作說明。 如圖1中所示一般，直流電源裝置E 1，例如係與被配 置在濺鍍裝置之處理室1內的基板S相對向地而被作配置， 並對於身爲與電漿負載P相接觸之電極的靶材T，而投入直 流電力者。直流電源裝置E1，係具備有可進行直流電力之 供給的直流電源部2、和電弧檢測部3、和對於直流電源裝 置E1之動作進行統籌控制的身爲控制手段之CPU電路4。 直流電源部2，雖並未特別作圖示，但是，係被輸入有商 用之交流電力（例如，單相AC200V、3相AC200等），並 在將此所輸入了的交流電力作整流而變換爲直流電力之後 ，進行反相器變換而再度變換爲交流，再對於該輸出作整 流而再度變換爲直流電力，而輸出至靶材T處。從直流電 源部2而來之正的輸出（纜線）5a之端部，係被作接地（ 在本賓施形態中，係被作接地，並與在處理室1內而將基 板S作保持之支持器（未圖示）作連接），而負的輸出（ 纜線）5b之端部，係被與靶材T作連接。另外，在圖1中， C係爲電容器。 電弧檢測部3，係具備有將輸出電流、輸出電壓檢測 出來之檢測電路3 1，藉由檢測電路3 1所檢測出來的輸出電 流、輸出電壓，係成爲透過AD變換電路32而被輸入至CPU 電路4中。又，檢測電路3 1係被與電弧檢測電路3 3作連接 。當發生有電弧放電時，電漿負載P之阻抗係會急遽地變 小’並發生急遽的電壓降低，伴隨於此，電流係會增加， 電弧檢測電路3 3 ’係根據此，而從藉由檢測電路3 1所檢測 -14- 201230644 出的輸出電流以及/或者是輸出電壓之變化量，來檢測出 電弧放電之發生。電弧檢測電路3 3，係可自由通訊地被與 電弧處理電路34作連接，電弧處理電路34，係可自由通訊 地被與CPU電路4作連接。 在從直流電源部2而來之負的輸出5b處，係與電漿負 載P串聯地而被設置有第1切換元件SW1。又，在正負之兩 輸出5a、5b間，係在較第1切換元件SW1的位置而更靠直 流電源部2側處，與電漿負載P並聯地而被設置有第2切換 元件SW2以及施加逆電壓之逆電壓施加部6。第1切換元件 SW1，係作爲雙方向開關而被構成，例如係具備有IGBT和 二極體d。而，藉由被與CPU電路4可自由通訊地作連接之 驅動電路D，其之ON、OFF的切換係被作控制。又，第2切 換元件SW2，係作爲單方向開關而被構成，例如係具備有 IGBT。而，與上述相同的，藉由被與CPU電路4可自由通 訊地作連接之驅動電路D，其之ON、OFF的切換係被作控 制。另外，第1、第2之兩切換元件SW1、SW2，係並非爲 被限定於上述者，例如，作爲第1切換元件，係可將2個的 IGBT作組合來構成之，又，亦可使用FET等之電晶體。 逆電壓施加部6，係由變壓器所構成，此變壓器之一 次側卷線61，係在負的輸出5b處，而在較從第2切換元件 起直到此負的輸出5 b處之配線的接點更靠直流電源部2側 處，被與第1切換元件SW1作串聯連接。另一方面，變壓 器之二次側卷線6 2，係與被和正負之兩輸出5 a、5 b並聯地 作設置之第2切換元件SW2作串聯連接。 -15- 201230644 接下來，參考圖2，對於本實施形態之直流電源裝置 E1的動作作說明。在對於靶材T投入電力之通常動作時， 若是在藉由CPU電路4以及驅動電路D之控制而將第2切換 元件SW2設爲OFF，而將從逆電壓施加部6所對於靶材τ之 逆電壓施加停止了的狀態下，而將第1切換元件SW1之 IGBT設爲ON，貝IJ電路上，由於二極體d係成爲ON，因此 係從直流電源部2而對於靶材T投入電力。亦即是，藉由使 變壓器之一次側卷線61和二次側卷線62作串聯連接，係從 直流電源部2而對於靶材T投入電力。 在靶材T之濺鍍中，若是藉由電弧檢測部3而檢測出電 弧放電，則藉由CPU電路4以及驅動電路D之控制，第2切 換元件SW2係首先被設爲ON。藉由此，在與靶材T之間， 係作出有閉電路，並開始將電弧放電消弧之電弧處理。亦 即是，若是第2切換元件SW2被設爲ON，則由於係藉由變 壓器之二次側卷線62而產生正的電壓，因此，通過第2切 換元件SW2，在靶材T處係被施加有正電壓。藉由此，經 由從逆電壓施加部6來對於靶材T施加正電壓，朝向電漿負 載P之電弧能量係變小。另外，在本實施形態中，雖係施 加有脈衝狀正電壓，但是，波形係並不被限定於此。又， 所產生之正的電壓，係藉由對於在通常動作時所投入至靶 材T之電力等作考慮並對變壓器之一次側以及二次側的兩 卷線61、62之捲數比作適當調整，而設定之。 而，在經過特定期間（逆電壓施加期間）後，亦即是 在電弧能量變小後，若是將第1切換元件SW1之IGBT設爲 -16- 201230644 OFF，則二極體d亦係成爲OFF，並不會產生非常大的過電 壓，便能夠將電漿負載P從直流電源部2以及逆電壓施加部 6作特定期間之切離，而成爲輸出遮斷期間。此時，第2切 換元件SW2，係可維持在ON狀態，亦可切換至OFF狀態。 而，在輸出遮斷期間中，輸出電流以及輸出電壓係成爲〇 ，對於電弧放電之能量供給係暫時被作遮斷。最後，藉由 CPU電路4以及驅動電路D之控制，第2切換元件SW2係被 設爲OFF，並且，第1切換元件SW1之二極體d係被設爲ON ，電弧處理係結束，並回復至通常動作。 於此，通常，在從直流電源部2而來之輸出電壓係爲 大，在靶材T處流動有輸出電流的狀態下，若是將第1切換 元件SW1作ON、OFF，則會產生非常大之過電壓，但是， 若是採用上述構成，則由於係藉由第2切換元件SW2而預 先將電壓或電流設爲較小的準位，因此，第1切換元件 SW1之過電壓保護用的電路，係只需要簡單的構成即可。 又，在電弧處理時，由於不需爲了施加正電壓而使用其他 電源，便能夠藉由變壓器6來產生正電壓，因此，在信賴 性或成本之觀點上，係爲有利。進而，在上述先前技術例 之裝置中，若是不以較短的時間來產生正電壓並結束電弧 處理，則逆電流之增加係會變大，相對於此，在本實施形 態中，藉由使用第1以及第2之各切換元件SW1、SW2，由 於係能夠對於正電壓之發生時間作限制，因此，就算是施 加在通常之電漿放電時所投入的電壓之10%以下的正電壓 ，例如施加3〜5 %程度之正電壓，只要取得有充分的與電 -17- 201230644 漿負載p作切離之時間，則便能夠實現用以將電弧放電充 分作消弧之操作。 如同以上所說明一般，在本實施形態中，與上述先前 技術例相異，在逆電壓施加期間經過後’藉由設置輸出遮 斷期間，係能夠將逆電壓施加期間和輸出遮斷期間分別作 最適當的設定。其結果，係能夠將電弧放電發生時之電弧 能量最小化，而將電弧放電消弧，並且，在從消弧處理而 作回復時，由於係設置輸出遮斷期間而將能量供給暫時作 遮斷，因此，係能夠確實地抑制電弧放電之持續或者是再 度發生。亦即是，在將電弧放電消弧時，係將正電壓施加 期間盡可能地縮短，並將電弧電流急速地降爲0A，而，在 將電弧放電消弧後，係能夠僅在直到靶材T之表面狀態（ 在此被切離的期間中而靶材T被冷卻等）和處理室1內的氛 圍回到不會再度發生電弧放電之程度爲止的期間中，而將 從直流電源部所對於靶材T之能量的供給遮斷，其結果， 係能夠進行在回復至通常動作後而不會使電弧放電再度發 生之最適當的電弧處理。 在上述實施形態中，係將作爲逆電壓施加部6而使用 有變壓器者爲例來作了說明’但是，係並不被限定於此。 若是參考圖3以及圖4來作說明’則在其他實施形態之直流 電源裝置E2中’逆電壓施加部6，係能夠由可對於靶材τ施 加脈衝狀之正電壓的正電壓產生電路60來構成。於此情況 ’正電壓產生電路60，例如，係可設爲與直流電源部2相 同之構成，其之正的輸出，係被與第2切換元件SW2作串 -18- 201230644 聯連接，其之負的輸出’係被與靶材T作連接。而，若是 藉由電弧檢測部3而檢測出電弧放電之發生，則若是將第2 切換元件SW2設爲ON’同時，將第1切換元件Swi設爲OFF ，則係成爲逆電壓施加期間。 在逆電壓施加期間經過後，藉由將第2切換元件SW2 設爲OFF ’係成爲輸出遮斷期間，在經過此輸出遮斷期間 後，係將第1切換元件SW1設爲ON，而成爲通常之電漿放 電狀態。若採用此種構成，則由於係能夠無關於通常之電 漿放電狀態，而簡單地對於爲了進行電弧放電之消弧所應 施加的正電壓之準位（電壓）作控制，因此，係能夠實現 對於各種之電弧處理的對應。 又，在上述實施形態中，係以將逆電壓施加期間和輸 出遮斷期間連續地而設置了 1次者爲例來作了說明，但是 ，係並不被限定於此。亦即是，亦可如圖5中所示一般， 設爲藉由CPU電路4以及驅動電路D之控制，來連續地反覆 進行上述之電弧處理。若依據此，則當接續於逆電壓施加 期間而設置有輸出遮斷期間的情況時，爲了對於逆濺鍍或 者是伴隨於此所產生之逆電弧放電的發生作防止，逆電壓 施加期間係以盡可能地設爲較短爲理想，但是，在像是由 於對於基板S或靶材T之充電而導致電弧放電之頻度變多一 般的情況時，作爲充電之防止效果，逆脈衝之產生係爲有 效。因此，如同上述一般，在會由於施加用以防止充電之 逆電壓而容易成爲逆濺鏟的情況時，係藉由將脈衝寬幅和 輸出遮斷時間縮短，並作複數次之反覆進行（第2次以後 -19- 201230644 之逆電壓施加期間，係成爲防止帶電），係能夠確實地進 行電弧放電之消弧。於此情況，只要在最後而停止了逆電 壓之施加後，立即藉由第1切換元件SW1而再度開始對於 靶材T之通電即可。 又，在上述實施形態中，係以進行最適當之電弧處理 —事爲例，來對於本發明之直流電源裝置E1、E2作了說明 ，但是，係並不被限定於此，具備有第1以及第2切換元件 SW1、SW2和逆電壓施加部6之直流電源裝置El、E2，亦 可作爲在對於靶材T之濺鍍中而用以將起因於對靶材T或基 板S之充電所導致的電弧放電之發生降低者’來起作用。 亦即是，若是以直流電源裝置E 1爲例，則如圖6 ( a ) 中所示一般，在通常動作中，係以特定之間隔，來藉由 CPU電路4以及驅動電路D之控制，而首先將第2切換元件 SW2設爲ON，並在其與靶材T之間作成閉電路，而開始帶 電防止處理。亦即是，若是第2切換元件SW2被設爲ON， 則由於係藉由變壓器6之二次側卷線62而產生正的電壓， 因此，通過第2切換元件SW2，在靶材T處係被施加有正電 壓。而，在特定期間（帶電防止期間）經過後，若是將第 1切換元件SW1設爲OFF，則電漿負載P係被作特定期間之 切離，並成爲防止逆電弧之發生的輸出遮斷期間。之後， 若是藉由CPU電路4以及驅動電路D之控制，而將第2切換 元件SW2設爲OFF，並且將第1切換元件SW1設爲ON，則帶 電防止處理係結束，並回復至通常動作。另外，進行帶電 防止處理之次數或間隔，係因應於對靶材T之投入電力、 -20- 201230644 其之使用頻度或者是靶材T之種類，而適宜作設定。 又，上述間隔，係可爲等間隔，亦可爲相異之間隔。 另外，施加逆電壓之波形，係以將電弧處理時和帶電防止 處理時設爲互爲相異爲較有效。通常，在電弧處理中，逆 電壓之產生，係只要能夠將電弧放電作消弧即可，因此， 藉由將其盡可能的設爲較短，並相反的將輸出遮斷期間設 爲較長，特別是能夠將靶材Τ之表面的狀態在熱性上亦快 速地回復至正常狀態。另一方面，在帶電防止處理中，由 於係並非爲從電弧放電狀態，而是從通常之電漿放電來移 行至逆電壓，因此，靶材Τ表面或電漿狀態係爲正常，故 而，係以使充電防止效果變大的方式，而將逆電壓期間設 爲長，而，由於輸出遮斷期間係只要爲能夠對於逆濺鏟作 防止的時間即可，因此亦可設爲非常短的時間。當逆濺鏟 不會成爲問題的情況時，係亦可將輸出遮斷時間設爲〇。 進而，亦可如圖6(b)中所示一般，設爲在進行了電 弧處理之後，藉由實施圖6(a)中所示之帶電防止處理， 而降低對於基板S或靶材Τ之充電，以將電弧放電發生之頻 度降低。又，此時，與上述相同的，電弧處理時之正電壓 施加的波形、和帶電防止處理時之正電壓施加的波形，係 以設爲互爲相異爲較有效。又，亦可如圖6(c)中所示一 般，在電弧處理後，作爲帶電防止處理’而將逆電壓作複 數次（2次）的發生。 【圖式簡單說明】 -21 - 201230644 [圖1]對於本發明之實施形態的直流電源裝置之構成作 槪略性展示的圖。 [圖2]對於圖1之直流電源裝置的控制處理程序作說明 之圖。 [圖3]對於本發明之其他實施形態的直流電源裝置之構 成作槪略性展示的圖。 [圖4]對於圖3之直流電源裝置的控制處理程序作說明 之圖。 [圖5 ]對於圖1之直流電源裝置的控制處理程序之變形 例作說明之圖。 [圖6] ( a )〜（c )，係爲對於在圖1所示之直流電源 裝置中’而於通常動作時進行帶電防止處理的情況之控制 處理程序作說明之圖》 【主要元件符號說明】201230644 VI. Description of the Invention: [Technical Field] The present invention relates to a DC power supply device that inputs electric power to an electrode in contact with a plasma load, and particularly relates to a sputtering device. [Prior Art] As a method of forming a film on the surface of a substrate such as glass or tantalum wafer, it has been known from the prior art to use a sputtering apparatus. In the sputtering apparatus, for example, a specific sputtering gas (argon gas) is introduced into a processing chamber under a vacuum atmosphere, and a body is prepared for the composition of the film to be formed on the surface of the substrate. A target for an electrode that is in contact with a plasma load is supplied with electric power by a DC power supply device to form a plasma atmosphere. Then, the ions in the plasma atmosphere are accelerated toward the target and collided to cause the sputtered particles (target atoms) to scatter and attach 'on the surface of the substrate to form a specific film. In the film formation by the above-described sputtering apparatus, arc discharge (abnormal discharge) may occur due to some reasons, and this is well known. If an arc discharge is generated, the impedance of the plasma load is rapidly reduced, so that a sudden voltage drop occurs, and accordingly, the current system increases. In this case, particularly in the case where the target is made of a metal such as aluminum, the arc discharge of the high arc current ,, if it occurs locally, for example, at the target, the target is melted and released. The substance will adhere to the surface of the processing substrate, and so-called particles or splashes will occur (number -5 - 201230644 ~ hundreds; am block). And caused the problem of not being able to perform good film formation. Here, in Patent Document 1, there is disclosed an apparatus in which an inductance is connected in series from one of positive and negative outputs of a DC power supply unit to a target, and after the inductance, On the other hand, the switching element is connected in parallel between the positive and negative outputs (cables) on the DC power supply unit side, so that the arc extinguishing process can be performed by interrupting the electric power from the DC power supply unit and performing arc discharge. In the device described in Patent Document 1, since the switching element is provided in parallel between the positive and negative outputs, there is a problem in that, even when the arc discharge occurs, the switching is performed. The component is short-circuited (ON) and forms a closed circuit until the energy remaining in the plasma load or the inductance component of the cable or the capacitance component is consumed, and the arc current continues to flow to the plasma load through the switching element. At the target of contact. Therefore, in Patent Document 1, it is proposed to use an autotransformer to generate a positive voltage and to quickly eliminate the residual energy when the switching element is short-circuited. However, even if the positive voltage is generated in this way, if the impedance is very low when the arc discharge occurs, the reverse current system will excessively occur, and more than 10% of the negative voltage on the process is applied. High positive voltage, therefore, the anode and cathode systems in the vacuum device will exchange with each other, depending on the situation, it will become a reverse splash state, and the arc discharge will continue, or it will start again from the arc treatment for the target. When the power input is restored, the arc discharge is likely to occur again. -6- 201230644 In addition, although it is also proposed to provide a resistor in series at the circuit where the arc discharge occurs, 'but the ability to arc-discharge the arc will be reduced' without s The above positive voltage. Therefore, when a sufficient positive voltage is applied, it is necessary to increase the pulse width. However, when autotransformation is used, the flow to the DC power supply side increases as time goes by, and as a result, The coils that flow to the plasma load side are increased, and the arc processing is performed to satisfy the opposite conditions. [Prior Art Document] [Patent Document 1] [Patent Document 1] Japanese Patent Laid-Open Publication No. 2004-6230 [Abstract] [Invention SUMMARY OF THE INVENTION The present invention has been made in view of the above, and provides a positive voltage to extinguish an arc discharge, and when the arc discharge is returned to a normal operation, it can be re-established for the arc discharge. A DC power supply device that is suppressed is a problem. [Means for Solving the Problems] In order to solve the above-described problems, the DC power supply device of the present invention is provided with an "electrode input power supply unit for making contact with a plasma load" and positive and negative application due to the DC power supply unit. In the case of positive electricity, the application of 10% is the case of the device. The reverse current of the electricity is generated. After the arc is extinguished, the output of the characteristic electric power is generated. 201230644 The arc discharge detection at the electrode is generated. The arc detecting unit that is provided further includes: a first switching element that is provided in series with the plasma load in one of positive and negative outputs from the DC power supply unit; and positive and negative a second switching element provided in parallel with the plasma load and a reverse voltage applying unit for applying a reverse voltage between the two outputs; and a control means for controlling switching between ON and OFF of the two switching elements, the control means, When the normal operation of the electric power is applied to the electrode, the application of the reverse voltage from the counter voltage applying unit is stopped by the second switching element. In the state where the first switching element is energized by the first switching element, and the arc detecting unit detects the arc discharge, the arc processing is performed, and the second switching element is used from the reverse voltage applying unit. The electrode is energized, and a reverse voltage for a specific period is applied, thereby performing arc extinguishing of the arc discharge, and after the lapse of the period, the energization of the electrode is interrupted for a specific period by the first switching element. Then, the energization of the electrodes is started again. According to the present invention, a case where a negative voltage is applied to an electrode that is in contact with a plasma load is used as an example, and when the plasma discharge is performed as a normal operation, the second switching element is turned ON. The first switching element is turned OFF, and the DC power supply unit and the electrode are energized to supply electric power. On the other hand, if the arc discharge is detected by the arc detecting unit, the second switching element is first turned ON. Thereby, a closed circuit is formed between the electrode and the electrode, and a positive voltage is applied to the electrode from the reverse voltage applying portion. Thereby, the arc energy is reduced (the time during which this reverse voltage is applied is referred to as the reverse voltage application period). -8- 201230644 If the arc energy is reduced as described above, by turning off the first switching element, it is possible to cut off the plasma load for a specific period without generating a very large overvoltage ( This period is called the output occlusion period). That is, the switching circuit of the series and parallel is formed by the first and second switching elements, and a positive voltage is applied to extinguish the arc discharge, and then the plasma load and the DC power supply unit and the reverse voltage are applied. The part is temporarily cut off, and the energy supply to the arc discharge is completely interrupted. After that, the first switching element is turned ON, and the DC power supply unit and the electrode are energized again, and the plasma discharge is started again. As described above, according to the present invention, unlike the above-described prior art example, it is possible to appropriately set the reverse voltage application period and the output interruption period by setting the output interruption period after the reverse voltage application period elapses. Settings. As a result, it is possible to minimize the arc energy at the time of arc discharge, and to extinguish the arc discharge, and to temporarily interrupt the energy supply by setting the output interruption period when returning from the arc suppression process. Therefore, it is possible to surely suppress the continuation or recurrence of the arc discharge. However, if the DC power supply device of the present invention is applied to a sputtering device, when the arc discharge is extinguished, the positive voltage application period is shortened as much as possible, and the arc current is rapidly reduced to 〇A. After the arc discharge is extinguished, the surface of the target until the electrode that is in contact with the plasma and the atmosphere in the processing chamber where the target is disposed return to the extent that the arc discharge does not occur again. During the period, the energy supply to the arc discharge is interrupted, and as a result, the arc extinguishing treatment of the most appropriate arc discharge can be realized. -9 - 201230644 In the present invention, it is preferable that the reverse voltage applying unit is constituted by a transformer, and the secondary winding of the transformer is connected to a DC power source. At least one of the positive and negative outputs is connected in series with the first switching element, and the secondary winding of the transformer is connected to the second switching between the positive and negative outputs in parallel. The elements are connected in series, and the electrodes are energized and a reverse voltage is applied by the control of the second switching elements. According to this, in the normal operation, by turning off the second switching element and turning the first switching element ON, the secondary side and the primary side of the transformer are connected in series to input the electrodes. electric power. On the other hand, if the occurrence of arc discharge is detected by the arc detecting unit, first, the second switching element is turned ON. At this time, the output voltage from the DC power supply unit is 0 V. Thereafter, in order to generate a positive voltage at the secondary side of the transformer, a positive voltage is applied to the electrode by the second switching element, and the reverse voltage application period is obtained. . After the reverse voltage application period elapses, the first switching element is turned OFF, and the output blocking period is set, and the output current and the output voltage are 〇. Here, in the normal operation, when the output voltage is large and the output current flows in the electrode, if the first switching element is turned on and off, a very large overvoltage is generated, but if In the above configuration, since the voltage or the current is set to a small level in advance by the second switching element, the circuit for overvoltage protection of the first switching element needs only a simple configuration. According to the above configuration, since it is possible to generate a positive voltage by a transformer without using another power source, it is advantageous from the viewpoint of reliability or cost. Further, in the apparatus of the above prior art example, if the positive voltage is not generated in a relatively short period of time and the arc processing is ended, the increase in the reverse current is increased. On the other hand, in the present invention, by using the first and second switching elements, since the generation time of the positive voltage can be limited, even the voltage applied to the normal plasma discharge is applied. A positive voltage of 10% or less, for example, a positive voltage of about 3 to 5% is applied, and an arc treatment for arc extinguishing can be realized as long as an output interruption period sufficient to be separated from the electrode is obtained. . On the other hand, in the present invention, the reverse voltage applying unit may be configured by another DC power supply unit for generating a reverse voltage, and the other DC power supply may be positive. The output is connected in series with the second switching element, and its negative output is connected to the electrode. According to this, in the normal operation, the second switching element is turned OFF, and the first switching element is turned ON. On the other hand, if the occurrence of arc discharge is detected by the arc detecting portion, the second switching element is turned ON. At the same time, the first switching element is turned OFF, and a positive voltage is applied to the electrode from the DC power supply unit to be a reverse voltage application period. On the other hand, when the second switching element is turned off, the output is turned off, and after the output interruption period is passed, the first switching element is turned ON to be in a normal plasma discharge state. According to the above configuration, since it is possible to control the level (voltage) of the positive voltage applied to the electrode in a simple manner irrespective of the normal plasma discharge state, it is possible to perform -11 on various arc treatments. - 201230644 corresponds. Further, in the present invention, the control means may be configured such that the arc treatment is continuously repeated. According to this, when the output interruption period is provided as described above in connection with the reverse voltage application period as described above, 'in order to prevent the reverse sputtering or the reverse arc discharge state generated therewith, the reverse voltage application is performed. It is preferable to set the period as short as possible, but when the frequency of the arc discharge is increased as a result of charging (charging) of the electrons in the processing chamber due to the substrate or the target, the charging is performed as a charging. The prevention effect, the generation of the inverse pulse is effective. Therefore, in the case where the reverse sputtering is easily caused by the reverse voltage application for preventing charging as described above, the pulse width and the output interruption time are shortened, and the above arc treatment is repeated plural times. This is performed, and the arc extinguishing of the arc discharge can be surely performed. When the arc treatment is repeated a plurality of times, it is preferable that the control means restarts the energization of the electrodes by the first switching element immediately after the application of the reverse voltage is stopped. Further, in the present invention, it is also possible to adopt a configuration in which the control means performs the charging prevention processing for the electrodes at a predetermined interval, and the charging prevention processing is performed by the normal operation. The first switching element stops energization of the electrode, and a reverse voltage is applied from the reverse voltage applying unit to the electrode by the second switching element, and after a predetermined period of time, the first switching element is used. The energization of the electrodes is started again. According to this, in the normal operation, the charging of the substrate or the electric pole can be reduced, and the situation induced by the charging can be suppressed. Further, in the present invention, it is preferable that the period during which the arc is applied with the reverse voltage and the period during the charging prevention process are mutually different periods. That is, since the arc extinguishing can be performed as long as the arc discharge can be performed, the period of the addition is set until the arc discharge can be extinguished, and is set as short as possible, and conversely, the output is blocked. Thereby, in particular, the shape of the cathode surface of the electrode can be quickly returned to the normal state. On the other hand, in the belt, since the cathode surface or the plasma state is normal, the electric prevention effect is increased, and the output of the reverse voltage application period is interrupted, and the reverse sputtering can be prevented. Can be set to a very short time. In addition, when the reverse sputtering is not performed, the above time may be set to 〇. Further, a configuration may be adopted in which a reverse voltage is applied during processing, a period from when the first switching element is energized to the electrode, and a reverse voltage is applied after the charging is applied. The period until the energization of the re-electrode by the first switching element is set to be different from each other. [Embodiment] Hereinafter, the case where the DC power is used for the sputtering device is used as a reference to the drawing. For example, in the process of applying the reverse voltage arc to the processing of the arc discharge, the time until the reverse voltage is applied increases, and the thermal power-on prevention process is performed, so that the charge can be set to a long time. It is a problem that the DC power supply devices E1 and E2 of the embodiment of the target invention are described in the specification of the invention of the present invention. As shown in Fig. 1, in general, the DC power supply unit E1 is disposed, for example, opposite to the substrate S disposed in the processing chamber 1 of the sputtering apparatus, and is in contact with the plasma load P. The target T of the electrode is the one that inputs DC power. The DC power supply unit E1 includes a DC power supply unit 2 that can supply DC power, an arc detecting unit 3, and a CPU circuit 4 as a control means for collectively controlling the operation of the DC power supply unit E1. Although the DC power supply unit 2 is not particularly illustrated, commercially available AC power (for example, single-phase AC 200 V, three-phase AC 200, etc.) is input, and the input AC power is rectified and converted. After the DC power is applied, the inverter is converted into an alternating current, and the output is rectified and converted into direct current power, and output to the target T. The end of the positive output (cable) 5a from the DC power supply unit 2 is grounded (in the present embodiment, it is grounded and held in the processing chamber 1 to hold the substrate S). A support (not shown) is connected, and an end of the negative output (cable) 5b is connected to the target T. In addition, in Fig. 1, C is a capacitor. The arc detecting unit 3 includes an output current and an output voltage detected by the detecting circuit 3 1 that detects the output current and the output voltage, and is input to the CPU through the AD conversion circuit 32. In circuit 4. Further, the detection circuit 31 is connected to the arc detecting circuit 33. When an arc discharge occurs, the impedance of the plasma load P is rapidly reduced, and a sudden voltage drop occurs. As a result, the current system increases, and the arc detecting circuit 3 3 ' The output current detected by the detection circuit 31 is detected by -14 - 201230644 and/or the amount of change in the output voltage to detect the occurrence of the arc discharge. The arc detecting circuit 33 is communicably connected to the arc processing circuit 34, and the arc processing circuit 34 is communicably connected to the CPU circuit 4. At the negative output 5b from the DC power supply unit 2, the first switching element SW1 is provided in series with the plasma load P. Further, between the positive and negative outputs 5a and 5b, the second switching element SW2 and the application are provided in parallel with the plasma load P at the position closer to the DC power supply unit 2 than the position of the first switching element SW1. The reverse voltage application unit 6 of the reverse voltage. The first switching element SW1 is configured as a bidirectional switch, and includes, for example, an IGBT and a diode d. Further, by the drive circuit D connected to the CPU circuit 4 in a freely communicable manner, the ON/OFF switching is controlled. Further, the second switching element SW2 is configured as a one-way switch, and is provided with, for example, an IGBT. On the other hand, in the same manner as described above, the ON/OFF switching of the drive circuit D, which is freely communicable with the CPU circuit 4, is controlled. In addition, the first and second switching elements SW1 and SW2 are not limited to the above. For example, the first switching element may be configured by combining two IGBTs, or may be used. A transistor such as an FET. The reverse voltage applying unit 6 is constituted by a transformer, and the primary side winding 61 of the transformer is connected to the negative output 5b, and the wiring is connected from the second switching element to the negative output 5b. The point is further connected to the first switching element SW1 in the vicinity of the DC power supply unit 2 side. On the other hand, the secondary side winding wire 6 2 of the transformer is connected in series to the second switching element SW2 which is provided in parallel with the positive and negative outputs 5 a and 5 b. -15- 201230644 Next, the operation of the DC power supply device E1 of the present embodiment will be described with reference to Fig. 2 . When the power is applied to the target T, the second switching element SW2 is turned OFF by the control of the CPU circuit 4 and the drive circuit D, and the target τ is applied from the reverse voltage applying unit 6. When the reverse voltage application is stopped, the IGBT of the first switching element SW1 is turned ON, and since the diode d is turned on, the DC power supply unit 2 supplies power to the target T. . In other words, by connecting the primary winding wire 61 of the transformer and the secondary winding wire 62 in series, electric power is supplied to the target T from the DC power supply unit 2. In the sputtering of the target T, if the arc discharge is detected by the arc detecting unit 3, the second switching element SW2 is first turned ON by the control of the CPU circuit 4 and the drive circuit D. Thereby, a closed circuit is formed between the target T and the arc treatment for arc extinguishing is started. In other words, when the second switching element SW2 is turned on, a positive voltage is generated by the secondary winding wire 62 of the transformer. Therefore, the second switching element SW2 is used at the target T. A positive voltage is applied. As a result, a positive voltage is applied to the target T from the reverse voltage applying unit 6, and the arc energy toward the plasma load P becomes small. Further, in the present embodiment, a pulsed positive voltage is applied, but the waveform is not limited thereto. Further, the positive voltage generated is compared with the number of turns of the two winding wires 61 and 62 on the primary side and the secondary side of the transformer in consideration of the electric power input to the target T during the normal operation. Adjust it appropriately and set it. However, after a certain period of time (reverse voltage application period), that is, after the arc energy is reduced, if the IGBT of the first switching element SW1 is set to -16 - 201230644 OFF, the diode d is also turned OFF. Without causing a very large overvoltage, the plasma load P can be separated from the DC power supply unit 2 and the reverse voltage application unit 6 for a specific period of time, and becomes an output interruption period. At this time, the second switching element SW2 can be maintained in the ON state or can be switched to the OFF state. However, in the output interruption period, the output current and the output voltage are 〇, and the energy supply system for the arc discharge is temporarily blocked. Finally, the second switching element SW2 is turned OFF by the control of the CPU circuit 4 and the drive circuit D, and the diode d of the first switching element SW1 is turned ON, the arc processing system ends, and the response is resumed. To the usual action. In this case, in general, the output voltage from the DC power supply unit 2 is large, and in the state where the output current flows through the target T, if the first switching element SW1 is turned on and off, a large amount is generated. In the above-described configuration, the voltage or current is set to a small level in advance by the second switching element SW2. Therefore, the circuit for overvoltage protection of the first switching element SW1 is The system only needs a simple configuration. Further, in the arc processing, since it is not necessary to use a different power source for applying a positive voltage, a positive voltage can be generated by the transformer 6, which is advantageous from the viewpoint of reliability and cost. Further, in the apparatus of the above-described prior art, if the positive voltage is not generated in a short period of time and the arc processing is terminated, the increase in the reverse current is increased. In contrast, in the present embodiment, by using Since the first and second switching elements SW1 and SW2 can limit the occurrence time of the positive voltage, even if a positive voltage of 10% or less of the voltage applied during normal plasma discharge is applied, for example, A positive voltage of about 3 to 5% is applied, and as long as sufficient time is obtained for cutting off the plasma load p from the electricity -17-201230644, an operation for sufficiently extinguishing the arc discharge can be realized. As described above, in the present embodiment, unlike the above-described prior art example, after the reverse voltage application period elapses, by setting the output interruption period, the reverse voltage application period and the output interruption period can be respectively made. The most appropriate setting. As a result, it is possible to minimize the arc energy at the time of occurrence of the arc discharge, and to extinguish the arc discharge, and to temporarily interrupt the energy supply by setting the output interruption period when recovering from the arc suppression treatment. Therefore, it is possible to surely suppress the continuation or recurrence of the arc discharge. That is, when the arc discharge is extinguished, the period during which the positive voltage is applied is shortened as much as possible, and the arc current is rapidly reduced to 0 A, and after the arc discharge is extinguished, it is only possible to reach the target. In the surface state of T (the target T is cooled during the period in which the target is cut off) and the atmosphere in the processing chamber 1 is returned to the extent that the arc discharge does not occur again, the DC power supply unit is used. The supply of energy to the target T is interrupted, and as a result, the most appropriate arc treatment can be performed without returning the arc discharge after returning to the normal operation. In the above-described embodiment, the transformer is used as the reverse voltage applying unit 6 as an example. However, the present invention is not limited thereto. Referring to FIG. 3 and FIG. 4, the reverse voltage applying unit 6 in the DC power supply device E2 of the other embodiment can be provided with a positive voltage generating circuit 60 that can apply a pulsed positive voltage to the target τ. Composition. In this case, the positive voltage generating circuit 60 can be configured similarly to the DC power supply unit 2, and the positive output thereof can be connected to the second switching element SW2 in series -18-201230644. The negative output ' is connected to the target T. On the other hand, when the arc detecting unit 3 detects the occurrence of the arc discharge, the second switching element SW2 is turned ON and the first switching element Swi is turned OFF, which is a reverse voltage application period. After the reverse voltage application period has elapsed, the second switching element SW2 is turned OFF, and the output switching period is set. After the output blocking period has elapsed, the first switching element SW1 is turned ON, which is normal. The plasma discharge state. According to this configuration, since it is possible to control the level (voltage) of the positive voltage to be applied for arc extinguishing for arc discharge without being related to the normal plasma discharge state, it is possible to realize Correspondence for various arc treatments. In the above-described embodiment, the reverse voltage application period and the output interruption period are successively provided as an example. However, the present invention is not limited thereto. That is, as shown in Fig. 5, it is also possible to continuously perform the arc processing described above by the control of the CPU circuit 4 and the drive circuit D. According to this, when the output interruption period is provided following the reverse voltage application period, in order to prevent the occurrence of reverse sputtering or the reverse arc discharge generated therewith, the reverse voltage application period is It is preferable to set it as short as possible. However, when the frequency of arc discharge is increased due to charging of the substrate S or the target T, the effect of preventing the reverse pulse is effective. Therefore, as in the above, in the case where it is easy to become a reverse shovel due to application of a reverse voltage for preventing charging, the pulse width and the output interruption time are shortened, and the repetition is performed plural times (first) The arc suppression can be performed reliably during the reverse voltage application period of -19-201230644. In this case, immediately after the application of the reverse voltage is stopped at the end, the energization of the target T can be resumed by the first switching element SW1. Further, in the above-described embodiment, the DC power supply devices E1 and E2 of the present invention have been described by taking the most appropriate arc processing as an example. However, the present invention is not limited thereto, and the first one is provided. And the DC power supply devices E1 and E2 of the second switching elements SW1 and SW2 and the reverse voltage applying unit 6 can also be used for charging the target T or the substrate S in the sputtering of the target T. The resulting reduction in the occurrence of arcing 'has come to work. That is, if the DC power supply device E 1 is taken as an example, as shown in FIG. 6( a ), in the normal operation, the CPU circuit 4 and the drive circuit D are controlled at specific intervals. First, the second switching element SW2 is turned ON, and a closed circuit is formed between the second switching element SW2 and the target T, and the charging prevention process is started. In other words, when the second switching element SW2 is turned on, a positive voltage is generated by the secondary side winding 62 of the transformer 6, so that the second switching element SW2 is used at the target T. A positive voltage is applied. On the other hand, when the first switching element SW1 is turned off after the lapse of the specific period (the charging prevention period), the plasma load P is cut off for a predetermined period of time and becomes an output interruption period for preventing the occurrence of the reverse arc. . Then, when the second switching element SW2 is turned off and the first switching element SW1 is turned on by the control of the CPU circuit 4 and the drive circuit D, the charging prevention processing system is terminated, and the normal operation is resumed. Further, the number or interval of the charging prevention processing is appropriately set in accordance with the power input to the target T, the frequency of use of the -20-201230644, or the type of the target T. Further, the intervals may be equal intervals or may be different intervals. Further, it is effective to apply a waveform of the reverse voltage to make the arc processing and the charging prevention processing mutually different. In general, in the arc treatment, the generation of the reverse voltage is as long as the arc discharge can be arc-extinguish. Therefore, by setting it as short as possible, and conversely, the output interruption period is made longer. In particular, the state of the surface of the target crucible can be quickly returned to a normal state in terms of heat. On the other hand, in the charging prevention process, since it is not from the arc discharge state but from the normal plasma discharge to the reverse voltage, the target crucible surface or the plasma state is normal, and therefore, The reverse voltage period is made long so that the charge prevention effect is increased, and the output interruption period is only required to be able to prevent the back splash, so it can be set to a very short time. . When the backsplash shovel does not become a problem, the output cutoff time can also be set to 〇. Further, as shown in FIG. 6(b), it is also possible to reduce the substrate S or the target material by performing the charging prevention process shown in FIG. 6(a) after the arc treatment is performed. Charge to reduce the frequency of arcing. Further, at this time, in the same manner as described above, the waveform applied by the positive voltage during the arc processing and the waveform applied by the positive voltage during the charging prevention processing are effective to be mutually different. Further, as shown in Fig. 6(c), the reverse voltage may be generated plural times (two times) as the charging prevention process after the arc treatment. [Brief Description of the Drawings] - 21 - 201230644 [Fig. 1] A schematic diagram showing the configuration of a DC power supply device according to an embodiment of the present invention. Fig. 2 is a view for explaining a control processing procedure of the DC power supply device of Fig. 1. Fig. 3 is a view schematically showing the configuration of a DC power supply device according to another embodiment of the present invention. Fig. 4 is a view for explaining a control processing procedure of the DC power supply device of Fig. 3. Fig. 5 is a view for explaining a modification of the control processing program of the DC power supply device of Fig. 1. [Fig. 6] (a) to (c) are diagrams for explaining a control processing procedure for performing a charging prevention process during normal operation in the DC power supply device shown in Fig. 1. [Main component symbols Description]
El、E2 :直流電源裝置 1 :處理室 2 :直流電源部 3 :電弧檢測部 4 : CPU電路（控制手段） 5a、5b :輸出 6 :變壓器（逆電壓施加部） 6〇:正電壓產生電路（逆電壓施加部） SW1、SW2 :切換元件 T :標靶（電極） P :電漿負載 -22-El, E2: DC power supply device 1: Processing chamber 2: DC power supply unit 3: Arc detection unit 4: CPU circuit (control means) 5a, 5b: Output 6: Transformer (reverse voltage application unit) 6〇: Positive voltage generation circuit (Reverse voltage application unit) SW1, SW2: Switching element T: Target (electrode) P: Plasma load-22-