TW201247338A - Casting mold, cu-ga allow slab, sputtering target, and cu-ga alloy slab manufacturing method - Google Patents

Casting mold, cu-ga allow slab, sputtering target, and cu-ga alloy slab manufacturing method Download PDF

Info

Publication number: TW201247338A
Authority: TW; Taiwan
Prior art keywords: main body; mold; casting; mold main; alloy
Prior art date: 2011-02-16

Application number

TW101104930A

Other languages

English (en)

Chinese (zh)

Inventor

Kazuki Yamashita

Naoya Satoh

Toshiaki Kumagai

Original Assignee

Sumitomo Chemical Co

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2011-02-16

Filing date

2012-02-15

Publication date

2012-12-01

2012-02-15 Application filed by Sumitomo Chemical Co filed Critical Sumitomo Chemical Co

2012-12-01 Publication of TW201247338A publication Critical patent/TW201247338A/zh

Links

238000005266 casting Methods 0.000 title claims abstract description 232
229910000807 Ga alloy Inorganic materials 0.000 title claims abstract description 211
238000004519 manufacturing process Methods 0.000 title claims abstract description 22
238000005477 sputtering target Methods 0.000 title claims description 21
238000000034 method Methods 0.000 claims abstract description 53
238000013459 approach Methods 0.000 claims abstract description 19
239000000155 melt Substances 0.000 claims description 56
238000001816 cooling Methods 0.000 claims description 44
230000002093 peripheral effect Effects 0.000 claims description 38
239000007788 liquid Substances 0.000 claims description 28
239000010949 copper Substances 0.000 claims description 17
238000010438 heat treatment Methods 0.000 claims description 17
239000000203 mixture Substances 0.000 claims description 11
229910052733 gallium Inorganic materials 0.000 claims description 8
230000001629 suppression Effects 0.000 claims description 8
GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims description 7
RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 6
229910052802 copper Inorganic materials 0.000 claims description 6
238000003723 Smelting Methods 0.000 claims description 3
230000032683 aging Effects 0.000 claims 1
238000002844 melting Methods 0.000 abstract description 3
230000008018 melting Effects 0.000 abstract description 3
229910052751 metal Inorganic materials 0.000 description 35
239000002184 metal Substances 0.000 description 35
229910045601 alloy Inorganic materials 0.000 description 21
239000000956 alloy Substances 0.000 description 21
230000007547 defect Effects 0.000 description 19
230000000052 comparative effect Effects 0.000 description 17
238000007711 solidification Methods 0.000 description 13
230000008023 solidification Effects 0.000 description 13
238000012545 processing Methods 0.000 description 12
239000000463 material Substances 0.000 description 11
238000005336 cracking Methods 0.000 description 10
238000003754 machining Methods 0.000 description 9
OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 8
238000005520 cutting process Methods 0.000 description 6
PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 6
239000010931 gold Substances 0.000 description 6
229910052737 gold Inorganic materials 0.000 description 6
238000005204 segregation Methods 0.000 description 6
230000000694 effects Effects 0.000 description 5
238000011156 evaluation Methods 0.000 description 5
239000010439 graphite Substances 0.000 description 5
229910002804 graphite Inorganic materials 0.000 description 5
238000002347 injection Methods 0.000 description 5
239000007924 injection Substances 0.000 description 5
239000007789 gas Substances 0.000 description 4
239000010409 thin film Substances 0.000 description 4
238000009835 boiling Methods 0.000 description 3
229910052799 carbon Inorganic materials 0.000 description 3
239000011810 insulating material Substances 0.000 description 3
229910000881 Cu alloy Inorganic materials 0.000 description 2
241000270666 Testudines Species 0.000 description 2
230000015572 biosynthetic process Effects 0.000 description 2
239000000919 ceramic Substances 0.000 description 2
239000003795 chemical substances by application Substances 0.000 description 2
238000011109 contamination Methods 0.000 description 2
238000004043 dyeing Methods 0.000 description 2
239000012768 molten material Substances 0.000 description 2
239000002994 raw material Substances 0.000 description 2
239000004576 sand Substances 0.000 description 2
239000006104 solid solution Substances 0.000 description 2
238000004544 sputter deposition Methods 0.000 description 2
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
JFLSOKIMYBSASW-UHFFFAOYSA-N 1-chloro-2-[chloro(diphenyl)methyl]benzene Chemical compound ClC1=CC=CC=C1C(Cl)(C=1C=CC=CC=1)C1=CC=CC=C1 JFLSOKIMYBSASW-UHFFFAOYSA-N 0.000 description 1
208000003351 Melanosis Diseases 0.000 description 1
230000002159 abnormal effect Effects 0.000 description 1
229920006231 aramid fiber Polymers 0.000 description 1
QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
230000037237 body shape Effects 0.000 description 1
239000012141 concentrate Substances 0.000 description 1
230000006837 decompression Effects 0.000 description 1
229910003460 diamond Inorganic materials 0.000 description 1
239000010432 diamond Substances 0.000 description 1
238000004821 distillation Methods 0.000 description 1
238000005516 engineering process Methods 0.000 description 1
239000010408 film Substances 0.000 description 1
238000007429 general method Methods 0.000 description 1
239000011491 glass wool Substances 0.000 description 1
239000012535 impurity Substances 0.000 description 1
238000001746 injection moulding Methods 0.000 description 1
238000003780 insertion Methods 0.000 description 1
230000037431 insertion Effects 0.000 description 1
229910000765 intermetallic Inorganic materials 0.000 description 1
238000012986 modification Methods 0.000 description 1
230000004048 modification Effects 0.000 description 1
238000004421 molding of ceramic Methods 0.000 description 1
238000000465 moulding Methods 0.000 description 1
230000003647 oxidation Effects 0.000 description 1
238000007254 oxidation reaction Methods 0.000 description 1
229910052760 oxygen Inorganic materials 0.000 description 1
239000001301 oxygen Substances 0.000 description 1
231100000572 poisoning Toxicity 0.000 description 1
230000000607 poisoning effect Effects 0.000 description 1
239000000843 powder Substances 0.000 description 1
238000003825 pressing Methods 0.000 description 1
238000003672 processing method Methods 0.000 description 1
239000011819 refractory material Substances 0.000 description 1
230000000452 restraining effect Effects 0.000 description 1
230000001235 sensitizing effect Effects 0.000 description 1
238000005245 sintering Methods 0.000 description 1
238000009987 spinning Methods 0.000 description 1
238000012546 transfer Methods 0.000 description 1
WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
229910052721 tungsten Inorganic materials 0.000 description 1
239000010937 tungsten Substances 0.000 description 1
238000009763 wire-cut EDM Methods 0.000 description 1

Classifications

- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C9/00—Alloys based on copper
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22C—FOUNDRY MOULDING
- B22C9/00—Moulds or cores; Moulding processes
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22D—CASTING OF METALS; CASTING OF OTHER SUBSTANCES BY THE SAME PROCESSES OR DEVICES
- B22D21/00—Casting non-ferrous metals or metallic compounds so far as their metallurgical properties are of importance for the casting procedure; Selection of compositions therefor
- B22D21/02—Casting exceedingly oxidisable non-ferrous metals, e.g. in inert atmosphere
- B22D21/025—Casting heavy metals with high melting point, i.e. 1000 - 1600 degrees C, e.g. Co 1490 degrees C, Ni 1450 degrees C, Mn 1240 degrees C, Cu 1083 degrees C
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22D—CASTING OF METALS; CASTING OF OTHER SUBSTANCES BY THE SAME PROCESSES OR DEVICES
- B22D7/00—Casting ingots, e.g. from ferrous metals
- B22D7/005—Casting ingots, e.g. from ferrous metals from non-ferrous metals
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22D—CASTING OF METALS; CASTING OF OTHER SUBSTANCES BY THE SAME PROCESSES OR DEVICES
- B22D7/00—Casting ingots, e.g. from ferrous metals
- B22D7/06—Ingot moulds or their manufacture

Landscapes

Engineering & Computer Science (AREA)
Mechanical Engineering (AREA)
Chemical & Material Sciences (AREA)
Materials Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Continuous Casting (AREA)

TW101104930A 2011-02-16 2012-02-15 Casting mold, cu-ga allow slab, sputtering target, and cu-ga alloy slab manufacturing method TW201247338A (en)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
JP2011031424		2011-02-16
JP2011031423		2011-02-16

Publications (1)

Publication Number	Publication Date
TW201247338A true TW201247338A (en)	2012-12-01

Family

ID=46672379

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
TW101104930A TW201247338A (en)	2011-02-16	2012-02-15	Casting mold, cu-ga allow slab, sputtering target, and cu-ga alloy slab manufacturing method

Country Status (2)

Country	Link
TW (1)	TW201247338A (fr)
WO (1)	WO2012111448A1 (fr)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS5456029A (en) *	1977-10-12	1979-05-04	Nippon Steel Corp	Upper pouring type steel casting method
JPH0627247Y2 (ja) *	1988-06-27	1994-07-27	トヨタ自動車株式会社	落し込み方案用鋳造設備
JP2000073163A (ja) *	1998-08-28	2000-03-07	Vacuum Metallurgical Co Ltd	Ｃｕ−Ｇａ合金スパッタリングターゲット及びその製造方法
JP4113967B2 (ja) *	2002-04-26	2008-07-09	Ｄｏｗａメタルマイン株式会社	金属インゴット鋳造装置及び鋳造方法
WO2009119660A1 (fr) *	2008-03-27	2009-10-01	住友化学株式会社	Procédé de découpe d'alliage cu-ga
JP2010280944A (ja) *	2009-06-04	2010-12-16	Hitachi Cable Ltd	Ｃｕ−Ｇａ合金、スパッタリングターゲット、Ｃｕ−Ｇａ合金の製造方法、スパッタリングターゲットの製造方法

2012
- 2012-02-02 WO PCT/JP2012/052418 patent/WO2012111448A1/fr not_active Ceased
- 2012-02-15 TW TW101104930A patent/TW201247338A/zh unknown

Also Published As

Publication number	Publication date
WO2012111448A1 (fr)	2012-08-23

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