TW201410092A - Rigid-flexible circuit substrate, rigid-flexible circuit board and method for manufacturing same - Google Patents
Rigid-flexible circuit substrate, rigid-flexible circuit board and method for manufacturing same Download PDFInfo
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- 239000000758 substrate Substances 0.000 title claims abstract description 244
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 45
- 238000000034 method Methods 0.000 title claims abstract description 22
- 239000010408 film Substances 0.000 claims description 296
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 107
- 239000011889 copper foil Substances 0.000 claims description 95
- 239000013039 cover film Substances 0.000 claims description 23
- 238000003825 pressing Methods 0.000 claims description 13
- 230000000149 penetrating effect Effects 0.000 claims description 10
- 238000007639 printing Methods 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 5
- 238000009413 insulation Methods 0.000 claims description 4
- 230000005611 electricity Effects 0.000 claims 1
- 239000012939 laminating adhesive Substances 0.000 abstract 6
- 239000010410 layer Substances 0.000 description 274
- 230000001681 protective effect Effects 0.000 description 13
- 239000012790 adhesive layer Substances 0.000 description 12
- 229910052802 copper Inorganic materials 0.000 description 12
- 239000010949 copper Substances 0.000 description 12
- 238000000465 moulding Methods 0.000 description 12
- 229910000679 solder Inorganic materials 0.000 description 10
- 239000004020 conductor Substances 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000011241 protective layer Substances 0.000 description 5
- 238000003475 lamination Methods 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 239000012792 core layer Substances 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000009713 electroplating Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000000608 laser ablation Methods 0.000 description 2
- -1 polyethylene terephthalate Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 238000009966 trimming Methods 0.000 description 1
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- Production Of Multi-Layered Print Wiring Board (AREA)
- Structure Of Printed Boards (AREA)
- Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
Abstract
Description
本發明涉及電路板製作領域,尤其涉及一種軟硬結合電路基板及其製作方法、軟硬結合電路板及其製作方法。The invention relates to the field of circuit board manufacturing, in particular to a soft and hard combined circuit substrate, a manufacturing method thereof, a soft and hard combined circuit board and a manufacturing method thereof.
印刷電路板因具有裝配密度高等優點而得到了廣泛的應用。關於電路板的應用請參見文獻Takahashi, A. Ooki, N. Nagai, A. Akahoshi, H. Mukoh, A. Wajima, M. Res. Lab, High density multilayer printed circuit board for HITAC M-880,IEEE Trans. on Components, Packaging, and Manufacturing Technology, 1992, 15(4): 1418-1425。Printed circuit boards have been widely used due to their high assembly density. For application of the board, please refer to the literature Takahashi, A. Ooki, N. Nagai, A. Akahoshi, H. Mukoh, A. Wajima, M. Res. Lab, High density multilayer printed circuit board for HITAC M-880, IEEE Trans On Components, Packaging, and Manufacturing Technology, 1992, 15(4): 1418-1425.
軟硬結合電路板是同時包括有相互連接的軟板與硬板的電路板結構,其既能夠具有軟性電路板的撓折性,也可以包括硬性電路板的硬度。在軟硬結合電路板的製作過程中,通過在軟性線路板上逐層壓合絕緣層和導電層,然後將導電層製作形成導電線路層的方式形成。這樣,在軟硬結合電路板的製作過程中,需要進行多次壓合及導電線路製作步驟,使得軟性結合電路板的製作工藝較長,軟硬結合電路板製作的效率低下。The hard and soft bonding circuit board is a circuit board structure including both a flexible board and a hard board which are connected to each other, and can have both the flexibility of the flexible circuit board and the hardness of the rigid circuit board. In the manufacturing process of the soft-hard bonded circuit board, the insulating layer and the conductive layer are laminated on the flexible circuit board, and then the conductive layer is formed to form a conductive circuit layer. Thus, in the manufacturing process of the soft and hard combined circuit board, multiple press-fitting and conductive circuit manufacturing steps are required, so that the manufacturing process of the flexible combined circuit board is long, and the efficiency of the hard and soft combined circuit board production is low.
有鑑於此,提供一種軟硬結合電路基板及其製作方法、軟硬結合電路板及其製作方法,以能提供一種軟硬結合電路板製作效率實屬必要。In view of the above, a soft and hard combined circuit substrate, a manufacturing method thereof, a soft and hard combined circuit board, and a manufacturing method thereof are provided, so that it is necessary to provide a soft and hard combined circuit board manufacturing efficiency.
一種軟硬結合電路基板,包括軟性電路板、芯層基板、第一壓合膠片、第二壓合膠片、第五導電線路層及第六導電線路層,所述軟性電路板包括暴露區及連接於所述暴露區的壓合區,所述芯層基板具有與軟性電路板相對應的第一開口,所述軟性電路板收容於第一開口,所述第一壓合膠片和第二壓合膠片分別壓合於芯層基板的相對兩側,且也位於壓合區的相對兩側,第四導電線路層形成於第一壓合膠片遠離芯層基板的表面,第五導電線路層形成於第二壓合膠片遠離芯層基板的表面,所述第一壓合膠片包括第一壓合膠片本體、多個第一電連接體及多個第二電連接體,第一壓合膠片本體具有與暴露區對應的第二開口,所述多個第一電連接體、多個第二電連接體均設置於第一壓合膠片本體中且均與所述第六導電線路層相接觸,所述多個第一電連接體還與壓合區相接觸並電性相連,所述多個第二電連接體還與芯層基板電連接,所述第二壓合膠片包括第二壓合膠片本體、多個第三電連接體及多個第四電連接體,第二壓合膠片本體具有與暴露區對應的第三開口,所述多個第三電連接體、多個第四電連接體均設置於第二壓合膠片本體中且均與第五導電線路層相接觸,所述多個第三電連接體還與壓合區相接觸並電性相連,所述多個第四電連接體還與芯層基板電連接。A soft and hard combined circuit substrate comprises a flexible circuit board, a core substrate, a first press film, a second press film, a fifth conductive circuit layer and a sixth conductive circuit layer, wherein the flexible circuit board comprises an exposed area and a connection In the nip area of the exposed area, the core substrate has a first opening corresponding to the flexible circuit board, the flexible circuit board is received in the first opening, the first press film and the second press The film is respectively pressed on opposite sides of the core substrate, and is also located on opposite sides of the nip, the fourth conductive layer is formed on the surface of the first press film away from the core substrate, and the fifth conductive layer is formed on the film The second press-fit film is away from the surface of the core substrate, the first press-fit film comprises a first press-fit film body, a plurality of first electrical connectors and a plurality of second electrical connectors, and the first press-fit film body has a second opening corresponding to the exposed area, the plurality of first electrical connectors and the plurality of second electrical connectors are disposed in the first press film body and are in contact with the sixth conductive circuit layer, The plurality of first electrical connectors are also pressed The plurality of second electrical connectors are further electrically connected to the core substrate, and the second press film comprises a second press film body, a plurality of third electrical connectors, and a plurality of a fourth electrical connector, the second embossed film body has a third opening corresponding to the exposed area, and the plurality of third electrical connectors and the plurality of fourth electrical connectors are disposed in the second embossed film body Each of the plurality of third electrical connectors is in contact with and electrically connected to the nip. The plurality of fourth electrical connectors are also electrically connected to the core substrate.
一種軟硬結合電路基板的製作方法,包括步驟:提供軟性電路板,所述軟性電路板包括暴露區及連接於所述暴露區的壓合區;提供芯層基板、第一壓合膠片、第二壓合膠片、第一銅箔及第二銅箔,所述芯層基板內具有與軟性電路板相對應的第一開口,所述第一壓合膠片包括第一膠片本體、多個第一電連接體及多個第二電連接體,第一膠片本體具有與暴露區對應的第二開口,所述多個第一電連接體、多個第二電連接體均設置於第一壓合膠片本體,所述多個第一電連接體與所述壓合區相對應,所述第二壓合膠片包括第二壓合膠片本體、多個第三電連接體及多個第四電連接體,第二壓合膠片本體具有與暴露區對應的第三開口,所述多個第三電連接體、多個第四電連接體均設置於第二膠片本體中,所述多個第三電連接體與所述壓合區相對應;壓合所述軟性電路板、芯層基板、第一壓合膠片、第二壓合膠片、第一銅箔及第二銅箔,使得所述軟性電路板配合於芯層基板的第一開口內,所述第一壓合膠片和第二壓合膠片分別壓合於芯層基板的相對兩側,且也位於壓合區的相對兩側,第一銅箔形成於第一壓合膠片遠離芯層基板的表面,第二銅箔形成於第二壓合膠片遠離芯層基板的表面,所述第一銅箔通過第二電連接體與芯層基板電導通,所述第二銅箔通過第四電連接體與芯層基板電導通,所述第一電連接體電連接軟性電路板的壓合區與第一銅箔,所述第三電連接體電連接軟性電路板的壓合區與第二銅箔;以及選擇性去除部分第一銅箔形成第五導電線路層,選擇性去除部分第二銅箔形成第六導電線路層,所述第五導電線路層通過第二電連接體與芯層基板電導通,所述第六導電線路層通過第四電連接體與芯層基板電導通,所述第一電連接體電連接軟性電路板的壓合區與五導電線路層,所述第三電連接體電連接軟性電路板的壓合區與第六導電線路層。A manufacturing method of a soft and hard combined circuit substrate, comprising the steps of: providing a flexible circuit board, the flexible circuit board comprising an exposed area and a nip area connected to the exposed area; providing a core substrate, a first press film, a second laminated film, a first copper foil and a second copper foil, wherein the core substrate has a first opening corresponding to the flexible circuit board, the first pressed film comprises a first film body, a plurality of first And a plurality of second electrical connectors, the first film body has a second opening corresponding to the exposed area, and the plurality of first electrical connectors and the plurality of second electrical connectors are respectively disposed on the first pressing a film body, the plurality of first electrical connectors corresponding to the nip area, the second press film comprising a second press film body, a plurality of third electrical connectors, and a plurality of fourth electrical connections The second press-fit film body has a third opening corresponding to the exposed area, and the plurality of third electrical connectors and the plurality of fourth electrical connectors are disposed in the second film body, the plurality of third An electrical connector corresponding to the nip; pressing the soft a circuit board, a core substrate, a first press film, a second press film, a first copper foil and a second copper foil, so that the flexible circuit board is fitted into the first opening of the core substrate, the first The press-fit film and the second press-fit film are respectively pressed on opposite sides of the core substrate, and are also located on opposite sides of the nip, and the first copper foil is formed on the surface of the first press film away from the core substrate. a second copper foil is formed on the surface of the second press film away from the core substrate, the first copper foil is electrically connected to the core substrate through the second electrical connector, and the second copper foil is passed through the fourth electrical connector The core substrate is electrically connected, the first electrical connector electrically connects the nip of the flexible circuit board with the first copper foil, and the third electrical connector electrically connects the nip of the flexible circuit board with the second copper foil; And selectively removing a portion of the first copper foil to form a fifth conductive wiring layer, selectively removing a portion of the second copper foil to form a sixth conductive wiring layer, and the fifth conductive wiring layer is electrically connected to the core substrate through the second electrical connector The sixth conductive circuit layer passes through the fourth electrical connector and the core layer Electrically conductive plate, electrically connected to the first electrical connection region of the flexible circuit board laminated with five conductive circuit layer, the third electrical connector is electrically connected to nip the flexible circuit board and the sixth conductive trace layer.
一種軟硬結合電路板,包括壓合在一起所述的軟硬結合電路基板、第一連接膠片及第一外層基板,所述第一連接膠片壓合於所述第一外層基板及所述軟硬電路基板的第五導電線路層之間,所述第一外層基板包括依次設置的第七導電線路層、第五絕緣層及第八導電線路層,所述第五絕緣層中形成有多個電導通第七導電線路層及第八導電線路層的第二導電孔,所述第一連接膠片包括第一連接膠片本體及設置於第一膠片本體內的多個第五電連接體,所述第五導電線路層與第七導電線路層通過所述多個第五電連接體相互電導通,所述第一外層基板及第一連接膠片本體內形成有與所述軟性電路板暴露區對應的開口,以使得所述軟性電路板暴露出。A soft and hard combined circuit board comprising a soft and hard bonded circuit substrate, a first connecting film and a first outer substrate, which are press-fitted together, the first connecting film being pressed against the first outer substrate and the soft Between the fifth conductive circuit layers of the hard circuit substrate, the first outer substrate includes a seventh conductive circuit layer, a fifth insulating layer, and an eighth conductive circuit layer, which are sequentially disposed, and a plurality of the fifth insulating layer are formed Conducting a second conductive via of the seventh conductive circuit layer and the eighth conductive circuit layer, the first connecting film comprising a first connecting film body and a plurality of fifth electrical connectors disposed in the first film body, The fifth conductive circuit layer and the seventh conductive circuit layer are electrically connected to each other through the plurality of fifth electrical connectors, and the first outer substrate and the first connecting film body are formed with corresponding to the exposed area of the flexible circuit board. Opening to expose the flexible circuit board.
一種軟硬結合電路板的製作方法,包括步驟:採用所述的軟硬結合電路基板的製作方法製作形成軟硬結合電路基板;提供第一外層基板及第一連接膠片,所述第一外層基板包括依次設置的第七導電線路層、第五絕緣層及第八導電線路層,第五絕緣層內形成有多個電導通第七導電線路層及第八導電線路層的第二導電孔,所述第一連接膠片內形成有多個貫穿第一連接膠片的第五電連接體;壓合所述第一外層基板、第一連接膠片及軟硬結合電路基板,所述多個第五電連接體將第五導電線路層及第一外層基板的第七導電線路層相互電導通;沿著暴露區與壓合區的交界線,形成貫穿第一外層基板和第一連接膠片的第一切口,去除第一切口環繞的該部分第一外層基板和第一連接膠片,從而得到軟硬結合電路板。A method for manufacturing a soft and hard combined circuit board, comprising the steps of: forming a soft and hard combined circuit substrate by using the method of manufacturing the soft and hard combined circuit substrate; providing a first outer substrate and a first connecting film, the first outer substrate The seventh conductive circuit layer, the fifth insulating layer and the eighth conductive circuit layer are sequentially disposed, and a plurality of second conductive holes electrically conducting the seventh conductive circuit layer and the eighth conductive circuit layer are formed in the fifth insulating layer. Forming a plurality of fifth electrical connectors penetrating through the first connecting film in the first connecting film; pressing the first outer substrate, the first connecting film, and the soft and hard bonding circuit substrate, the plurality of fifth electrical connections The fifth conductive circuit layer and the seventh conductive circuit layer of the first outer substrate are electrically connected to each other; and a first slit penetrating the first outer substrate and the first connecting film is formed along a boundary line between the exposed region and the nip And removing the portion of the first outer substrate and the first connecting film surrounded by the first slit, thereby obtaining a soft and hard bonding circuit board.
本技術方案提供的軟硬結合電路板及其製作方法,在進行製作過程中,採用印刷金屬導電膏的方式形成導電孔,相比於現有技術中電用電鍍形成導電孔的方式,可以提高軟硬結合電路板的信賴性,並降低軟硬結合電路板的製作成本。另外,由於本技術方案中先通過在連接膠片或者基板中通過印刷的方式形成塞孔物,相比於現有技術逐層層壓並逐層導通的方式,能夠減少軟硬結合電路板製作過程中壓合的次數,提高軟硬結合電路板製作的效率。The soft and hard combined circuit board provided by the technical solution and the manufacturing method thereof are formed by using a printed metal conductive paste in the manufacturing process, and the conductive hole can be improved by the method of forming the conductive hole by electroplating in the prior art. Hardly combine the reliability of the board and reduce the manufacturing cost of the hard and soft board. In addition, since the plug hole is formed by printing in the connecting film or the substrate in the prior art, the layer-by-layer lamination and layer-by-layer conduction can reduce the hard and soft bonding circuit board manufacturing process. The number of presses is combined to improve the efficiency of the hard and soft board production.
本技術方案第一實施例提供的軟硬結合電路板製作方法包括如下步驟:The method for fabricating a soft-hard combination circuit board provided by the first embodiment of the present technical solution includes the following steps:
第一步,請參閱圖1,提供一個軟性電路板110。In the first step, referring to FIG. 1, a flexible circuit board 110 is provided.
軟性電路板110為製作有導電線路的電路板。軟性電路板110可以為單面電路板也可以為雙面電路板。本實施例中,以軟性電路板110為雙面電路板為例進行說明。軟性電路板110包括依次堆疊的第一覆蓋膜118、第一電磁遮罩層116、第二絕緣層114、第一導電線路層112、第一絕緣層111、第二導電線路層113、第三絕緣層115、第二電磁遮罩層117及第二覆蓋膜119。第一絕緣層111包括相對的第一表面1111和第二表面1112,第一導電線路層112形成於第一絕緣層111的第一表面1111,第二導電線路層113形成於第一絕緣層111的第二表面1112。The flexible circuit board 110 is a circuit board on which conductive lines are formed. The flexible circuit board 110 can be a single-sided circuit board or a double-sided circuit board. In the present embodiment, the flexible circuit board 110 is taken as an example of a double-sided circuit board. The flexible circuit board 110 includes a first cover film 118, a first electromagnetic mask layer 116, a second insulating layer 114, a first conductive wiring layer 112, a first insulating layer 111, a second conductive wiring layer 113, and a third layer which are sequentially stacked. The insulating layer 115, the second electromagnetic mask layer 117, and the second cover film 119. The first insulating layer 111 includes an opposite first surface 1111 and a second surface 1112. The first conductive wiring layer 112 is formed on the first surface 1111 of the first insulating layer 111, and the second conductive wiring layer 113 is formed on the first insulating layer 111. The second surface 1112.
軟性電路板110大致為長方形,其包括暴露區1101及連接於暴露區1101相對兩側的第一壓合區1102和第二壓合區1103。暴露區1101也為長方形,其用於形成軟硬結合電路板板的軟性區域。第一壓合區1102和第二壓合區1103用於與硬性電路板相互固定連接。本實施例中,在軟性電路板110所在的平面內,將自第一壓合區1102向第二壓合區1103的延伸方向定義為長度方向,與上述延伸方向垂直的方向定義為寬度方向。第一導電線路層112和第二導電線路層113均沿所述長度方向延伸,且均自第一壓合區1102經過暴露區1101延伸至第二壓合區1103。The flexible circuit board 110 is substantially rectangular and includes an exposed area 1101 and a first nip 1102 and a second nip 1103 connected to opposite sides of the exposed area 1101. The exposed area 1101 is also rectangular, which is used to form a soft region of the hard and soft bonded circuit board. The first nip 1102 and the second nip 1103 are for fixed connection to the rigid circuit board. In the embodiment, in the plane in which the flexible circuit board 110 is located, the extending direction from the first nip 1102 to the second nip 1103 is defined as a length direction, and the direction perpendicular to the extending direction is defined as a width direction. The first conductive wiring layer 112 and the second conductive wiring layer 113 both extend along the length direction, and both extend from the first nip 1102 through the exposed region 1101 to the second nip region 1103.
在第一壓合區1102和第二壓合區1103內的第二絕緣層114中,形成有多個第一孔1141,使得部分第一導電線路層112從第一孔1141處露出。在第一壓合區1102和第二壓合區1103內的第三絕緣層115中,形成有多個第二孔1151,使得部分第二導電線路層113從第二孔1151處露出。In the second insulating layer 114 in the first nip 1102 and the second nip 1103, a plurality of first holes 1141 are formed such that a portion of the first conductive wiring layer 112 is exposed from the first holes 1141. In the third insulating layer 115 in the first nip 1102 and the second nip 1103, a plurality of second holes 1151 are formed such that a portion of the second conductive wiring layer 113 is exposed from the second holes 1151.
第一電磁遮罩層116、第二電磁遮罩層117、第一覆蓋膜118和第二覆蓋膜119位於全部暴露區1101、還位於與暴露區1101相鄰的部分第一壓合區1102和與暴露區1101相鄰的部分第二壓合區1103中。第一電磁遮罩層116和第二電磁遮罩層117均可以通過印刷導電銀漿的方式形成。第一覆蓋膜118形成於第一電磁遮罩層116暴露在外的表面,即形成在第一電磁遮罩層116遠離第二絕緣層114的表面以及第一電磁遮罩層116的側面,用於覆蓋並保護第一電磁遮罩層116,第二覆蓋膜119形成於第二電磁遮罩層117的遠離第三絕緣層115的表面及第二電磁遮罩層117的側面,用於覆蓋並保護第二電磁遮罩層117。The first electromagnetic mask layer 116, the second electromagnetic mask layer 117, the first cover film 118, and the second cover film 119 are located in the entire exposed area 1101, and are also located in a portion of the first nip 1102 adjacent to the exposed area 1101 and A portion of the second nip 1103 adjacent to the exposed region 1101. Both the first electromagnetic mask layer 116 and the second electromagnetic mask layer 117 can be formed by printing a conductive silver paste. The first cover film 118 is formed on the exposed surface of the first electromagnetic mask layer 116, that is, on the surface of the first electromagnetic mask layer 116 away from the second insulating layer 114 and the side of the first electromagnetic mask layer 116, for Covering and protecting the first electromagnetic shielding layer 116, the second covering film 119 is formed on the surface of the second electromagnetic shielding layer 117 away from the third insulating layer 115 and the side of the second electromagnetic shielding layer 117 for covering and protecting A second electromagnetic mask layer 117.
第二步,請一併參閱圖2至圖8,提供芯層基板120、第一壓合膠片130、第二壓合膠片140、第一銅箔150及第二銅箔160。In the second step, please refer to FIG. 2 to FIG. 8 to provide a core substrate 120, a first press film 130, a second press film 140, a first copper foil 150 and a second copper foil 160.
請參閱圖2,芯層基板120的厚度大致與軟性電路板110的厚度相等。芯層基板120內形成有與軟性電路板110相對應的第一開口121。所述相對應是指第一開口121的橫截面積、形狀均與軟性電路板110相一致。芯層基板120沿著長度方向,包括連接於第一開口121兩端的第一成型區域127和第二成型區域128。芯層基板120包括第四絕緣層124、第三導電線路層122及第四導電線路層123。第三導電線路層122形成於第四絕緣層124一個表面,第四導電線路層123形成於第四絕緣層124的另一相對的表面。在芯層基板120內,形成有多個第一導電孔125,第三導電線路層122通過多個第一導電孔125與第四導電線路層123相互電導通。Referring to FIG. 2, the thickness of the core substrate 120 is substantially equal to the thickness of the flexible circuit board 110. A first opening 121 corresponding to the flexible circuit board 110 is formed in the core substrate 120. Correspondingly, the cross-sectional area and shape of the first opening 121 are consistent with the flexible circuit board 110. The core substrate 120 includes, along the length direction, a first molding region 127 and a second molding region 128 that are connected to both ends of the first opening 121. The core substrate 120 includes a fourth insulating layer 124, a third conductive wiring layer 122, and a fourth conductive wiring layer 123. The third conductive wiring layer 122 is formed on one surface of the fourth insulating layer 124, and the fourth conductive wiring layer 123 is formed on the other opposite surface of the fourth insulating layer 124. In the core substrate 120, a plurality of first conductive vias 125 are formed, and the third conductive trace layer 122 is electrically connected to the fourth conductive via layer 123 via the plurality of first conductive vias 125.
請參閱圖3,第一壓合膠片130可以為低流動性的半固化膠片。第一壓合膠片130內形成有與軟性電路板110的暴露區1101相對應的第二開口131。第一壓合膠片130包括第一壓合膠片本體130a、多個第一電連接體1331及多個第二電連接體1332。在第一壓合膠片本體130a內形成有多個第一通孔1321及多個第二通孔1322。其中,第一通孔1321開設的位置較第二通孔1322更靠近第二開口131,第一通孔1321位於第二開口131和多個第二通孔1322之間。每個第一通孔1321內形成有第一電連接體1331,每個第一通孔1321內的第一電連接體1331與該第一通孔1321同軸設置,並貫穿第一通孔1321。第一電連接體1331的兩端分別延伸出第一通孔1321。第一電連接體1331與第二絕緣層114的第一孔1141相對應。每個第二通孔1322內形成有第二電連接體1332。每個第二通孔1322內的第二電連接體1332與該第二通孔1322同軸設置,並貫穿第二通孔1322。第二電連接體1332的兩端分別延伸出第二通孔1322。第一電連接體1331與第一孔1141一一對應。本實施例中,第一電連接體1331及第二電連接體1332均為金屬導電膏製成。優選為銅導電膏。Referring to FIG. 3, the first press film 130 may be a low flow semi-cured film. A second opening 131 corresponding to the exposed region 1101 of the flexible circuit board 110 is formed in the first press film 130. The first press film 130 includes a first press film body 130a, a plurality of first electrical connectors 1331, and a plurality of second electrical connectors 1332. A plurality of first through holes 1321 and a plurality of second through holes 1322 are formed in the first press film body 130a. The first through hole 1321 is located closer to the second opening 131 than the second through hole 1322 , and the first through hole 1321 is located between the second opening 131 and the plurality of second through holes 1322 . A first electrical connection body 1331 is formed in each of the first through holes 1321. The first electrical connection body 1331 in each of the first through holes 1321 is disposed coaxially with the first through hole 1321 and penetrates the first through hole 1321. Both ends of the first electrical connector 1331 extend through the first through holes 1321. The first electrical connector 1331 corresponds to the first hole 1141 of the second insulating layer 114. A second electrical connection body 1332 is formed in each of the second through holes 1322. The second electrical connection body 1332 in each of the second through holes 1322 is coaxially disposed with the second through holes 1322 and penetrates the second through holes 1322. Two ends of the second electrical connector 1332 extend through the second through holes 1322, respectively. The first electrical connector 1331 has a one-to-one correspondence with the first hole 1141. In this embodiment, the first electrical connector 1331 and the second electrical connector 1332 are both made of a metal conductive paste. A copper conductive paste is preferred.
請參閱圖4,第二壓合膠片140的結構與第一壓合膠片130的結構基本相同,第二壓合膠片140也可以為低流動性的半固化膠片。具體的,第二壓合膠片140內形成有與軟性電路板110的暴露區1101相對應的第三開口141。第二壓合膠片140包括第二壓合膠片本體140a、多個第三電連接體1431及多個第四電連接體1432。在第二壓合膠片本體140a第二壓合膠片140內形成有多個第三通孔1421及多個第四通孔1422。第三通孔1421開設的位置較第四通孔1422更靠近所述第三開口141,第三通孔1421位於第三開口141和多個第四通孔1422之間。每個第三通孔1421內形成有第三電連接體1431。每個第三通孔1421內的第三電連接體1431與該第三通孔1421同軸設置,並貫穿第三通孔1421。第三電連接體1431的兩端分別延伸出第三通孔1421。第三電連接體1431與第三絕緣層115的第二孔1151一一對應。每個第四通孔1422內形成有第四電連接體1432,每個第四通孔1422內的第四電連接體1432與該第四通孔1422同軸設置,並貫穿第四通孔1422。第四電連接體1432的兩端分別延伸出第四通孔1422。本實施例中,第三電連接體1431及第四電連接體1432為金屬導電膏製成。優選為銅導電膏。Referring to FIG. 4, the structure of the second press film 140 is substantially the same as that of the first press film 130, and the second press film 140 may also be a low-flow semi-cured film. Specifically, a third opening 141 corresponding to the exposed area 1101 of the flexible circuit board 110 is formed in the second press film 140. The second press film 140 includes a second press film body 140a, a plurality of third electrical connectors 1431, and a plurality of fourth electrical connectors 1432. A plurality of third through holes 1421 and a plurality of fourth through holes 1422 are formed in the second pressed film 140 of the second pressed film body 140a. The third through hole 1421 is located closer to the third opening 141 than the fourth through hole 1422 , and the third through hole 1421 is located between the third opening 141 and the plurality of fourth through holes 1422 . A third electrical connection body 1431 is formed in each of the third through holes 1421. The third electrical connection body 1431 in each of the third through holes 1421 is disposed coaxially with the third through hole 1421 and penetrates the third through hole 1421. The two ends of the third electrical connector 1431 extend through the third through holes 1421. The third electrical connector 1431 is in one-to-one correspondence with the second hole 1151 of the third insulating layer 115. A fourth electrical connector 1432 is formed in each of the fourth through holes 1422. The fourth electrical connector 1432 in each of the fourth through holes 1422 is coaxially disposed with the fourth through hole 1422 and extends through the fourth through hole 1422. Both ends of the fourth electrical connector 1432 extend through the fourth through hole 1422, respectively. In this embodiment, the third electrical connector 1431 and the fourth electrical connector 1432 are made of a metal conductive paste. A copper conductive paste is preferred.
第一銅箔150及第二銅箔160優選為連續的壓延銅箔,但也可以為連續的電解銅箔如圖13所示。The first copper foil 150 and the second copper foil 160 are preferably continuous rolled copper foils, but may be continuous electrolytic copper foils as shown in FIG.
芯層基板120、第一壓合膠片130、第二壓合膠片140、第一銅箔150及第二銅箔160的長度均大於軟性電路板110的長度。在本實施例中,芯層基板120、第一壓合膠片130、第二壓合膠片140、第一銅箔150及第二銅箔160長度相同。The lengths of the core substrate 120, the first press film 130, the second press film 140, the first copper foil 150, and the second copper foil 160 are all greater than the length of the flexible circuit board 110. In this embodiment, the core substrate 120, the first press film 130, the second press film 140, the first copper foil 150, and the second copper foil 160 have the same length.
請參閱圖5至圖8,芯層基板120可以採用如下方法製成:Referring to FIG. 5 to FIG. 8, the core substrate 120 can be made by the following method:
首先,提供覆銅基板120a。覆銅基板120a為雙面覆銅基板,其包括第一銅箔層122a、第四絕緣層124及第二銅箔層123a。第四絕緣層124位於第一銅箔層122a與第二銅箔層123a之間。在覆銅基板120a內形成有第一開口121,第一開口121的形狀、大小與軟性電路板110的形狀、大小相對應。First, a copper clad substrate 120a is provided. The copper clad substrate 120a is a double-sided copper clad substrate including a first copper foil layer 122a, a fourth insulating layer 124, and a second copper foil layer 123a. The fourth insulating layer 124 is located between the first copper foil layer 122a and the second copper foil layer 123a. A first opening 121 is formed in the copper clad substrate 120a, and the shape and size of the first opening 121 correspond to the shape and size of the flexible circuit board 110.
其次,在第一銅箔層122a的遠離第四絕緣層124的表面形成第一可剝保護膠層129。所述第一可剝保護膠層129可以為可剝型的聚對苯二甲酸乙二酯膜。本步驟中,還可以在第二銅箔層123a遠離第四絕緣層124的表面也形成第一可剝保護膠層129,以保護第二銅箔層123a。Next, a first peelable protective adhesive layer 129 is formed on the surface of the first copper foil layer 122a remote from the fourth insulating layer 124. The first peelable protective adhesive layer 129 may be a peelable polyethylene terephthalate film. In this step, the first peelable protective adhesive layer 129 may also be formed on the surface of the second copper foil layer 123a away from the fourth insulating layer 124 to protect the second copper foil layer 123a.
再次,採用鐳射燒蝕的方式在覆銅基板120a中形成僅貫穿第一可剝保護膠層129、第一銅箔層122a及第四絕緣層124的第一盲孔125a,並在第一盲孔125a內形成第一導電材料125b,從而得到第一導電孔125。本實施例中,可以採用二氧化碳鐳射及紫外鐳射相結合的方式,自第一可剝保護膠層129向第四絕緣層124形成第一盲孔125a。第一導電材料125b可以通過印刷導電膏並固化的方式形成。優選地,第一導電材料125b由導電銅膏製成。第一可剝保護膠層129可以防止在印刷形成第一導電材料125b時,導電膏形成在第一銅箔層122a和第二銅箔層123a的表面。Thirdly, a first blind hole 125a penetrating only the first peelable protective adhesive layer 129, the first copper foil layer 122a and the fourth insulating layer 124 is formed in the copper clad substrate 120a by laser ablation, and is in the first blind A first conductive material 125b is formed in the hole 125a, thereby obtaining a first conductive hole 125. In this embodiment, a first blind hole 125a may be formed from the first peelable protective adhesive layer 129 to the fourth insulating layer 124 by using a combination of carbon dioxide laser and ultraviolet laser. The first conductive material 125b may be formed by printing a conductive paste and curing. Preferably, the first conductive material 125b is made of a conductive copper paste. The first peelable protective adhesive layer 129 can prevent the conductive paste from being formed on the surfaces of the first copper foil layer 122a and the second copper foil layer 123a when the first conductive material 125b is formed by printing.
再次,去除第一可剝保護膠層129。可以採用直接剝離的方式將第一可剝保護膠層129去除。Again, the first peelable protective layer 129 is removed. The first peelable protective layer 129 can be removed by direct peeling.
最後,選擇性去除部分第一銅箔層122a形成第三導電線路層122,選擇性去除部分第二銅箔層123a形成第四導電線路層123。Finally, a portion of the first copper foil layer 122a is selectively removed to form a third conductive wiring layer 122, and a portion of the second copper foil layer 123a is selectively removed to form a fourth conductive wiring layer 123.
本實施例中,可以採用影像轉移工藝及蝕刻工藝選擇性去除部分第一銅箔層122a形成第三導電線路層122,選擇性去除部分第二銅箔層123a形成第四導電線路層123。In this embodiment, a portion of the first copper foil layer 122a may be selectively removed by an image transfer process and an etching process to form a third conductive wiring layer 122, and a portion of the second copper foil layer 123a may be selectively removed to form a fourth conductive wiring layer 123.
請一併參閱圖9至12,第一壓合膠片130可以採用如下方法制得:Referring to FIGS. 9 to 12 together, the first press film 130 can be obtained by the following method:
首先,提供如圖5所示的第一壓合膠片本體130a,第一壓合膠片本體130a內形成有所述第二開口131,所述第二開口131與軟性電路板110的暴露區1101相對應。First, a first press-fit film body 130a is provided as shown in FIG. 5, and the second opening 131 is formed in the first press-fit film body 130a, and the second opening 131 is opposite to the exposed area 1101 of the flexible circuit board 110. correspond.
其次,如圖6所示,在第一壓合膠片本體130a的相對兩個表面分別形成第二可剝保護膠層135,第二可剝保護膠層135覆蓋第二開口131。所述第二可剝保護膠層135可以為可剝型的聚對苯二甲酸乙二酯膜。Next, as shown in FIG. 6, a second peelable protective adhesive layer 135 is formed on opposite surfaces of the first press-fit film body 130a, and a second peelable protective adhesive layer 135 covers the second opening 131. The second peelable protective adhesive layer 135 may be a peelable polyethylene terephthalate film.
再次,採用鐳射燒蝕的方式在第一壓合膠片本體130a中形成貫穿第二可剝保護膠層135、第一壓合膠片本體130a的多個第一通孔1321及多個第二通孔1322,第一通孔1321開設的位置較第二通孔1322更靠近第二開口131,第一通孔1321位於第二開口131和多個第二通孔1322之間。並在第一通孔1321及第二通孔1322內印刷導電膏,導電膏固化後形成所述第一電連接體1331及第二電連接體1332。由於第二可剝保護膠層135具有厚度,第一電連接體1331及第二電連接體1332均凸出於第一壓合膠片本體130a的兩個相對表面。Thirdly, a plurality of first through holes 1321 and a plurality of second through holes penetrating the second peelable protective adhesive layer 135, the first pressed film body 130a, and the second peeling protective adhesive layer 135 are formed in the first pressed film body 130a by laser ablation. The first through hole 1321 is located closer to the second opening 131 than the second through hole 1322 , and the first through hole 1321 is located between the second opening 131 and the plurality of second through holes 1322 . The conductive paste is printed in the first through hole 1321 and the second through hole 1322, and the conductive paste is cured to form the first electrical connector 1331 and the second electrical connector 1332. Since the second peelable protective adhesive layer 135 has a thickness, the first electrical connector 1331 and the second electrical connector 1332 protrude from the opposite surfaces of the first press-fit film body 130a.
最後,去除第一壓合膠片本體130a的相對兩個表面的第二可剝保護膠層135,得到第一壓合膠片130。Finally, the second peelable protective layer 135 of the opposite two surfaces of the first press-fit film body 130a is removed to obtain the first press-fit film 130.
第二壓合膠片140的形成方法與第一壓合膠片130的製作方法基本相同。The second press film 140 is formed in substantially the same manner as the first press film 130.
第三步,請參閱圖14,將軟性電路板110、芯層基板120、第一壓合膠片130、第二壓合膠片140、第一銅箔150及第二銅箔160進行對位並壓合成為一個整體。In the third step, referring to FIG. 14, the flexible circuit board 110, the core substrate 120, the first press film 130, the second press film 140, the first copper foil 150, and the second copper foil 160 are aligned and pressed. Synthesize into a whole.
進行對位時,第一銅箔150、第一壓合膠片130、芯層基板120、第二壓合膠片140、第二銅箔160依次堆疊,軟性電路板110放置於第一壓合膠片130和第二壓合膠片140之間,並位於芯層基板120的第一開口121內。第一壓合膠片130的第二開口131和第二壓合膠片140的第三開口141均與軟性電路板110的暴露區1101相對應,第一壓合膠片130位於軟性電路板110的第一壓合區1102和第二壓合區1103及芯層基板120的一側表面,第二壓合膠片140位於軟性電路板110的第一壓合區1102和第二壓合區1103及芯層基板120的另一側表面。When the alignment is performed, the first copper foil 150, the first pressed film 130, the core substrate 120, the second pressed film 140, and the second copper foil 160 are sequentially stacked, and the flexible circuit board 110 is placed on the first pressed film 130. Between the second press film 140 and the first opening 121 of the core substrate 120. The second opening 131 of the first press film 130 and the third opening 141 of the second press film 140 respectively correspond to the exposed area 1101 of the flexible circuit board 110, and the first press film 130 is located at the first of the flexible circuit board 110. The nip area 1102 and the second nip area 1103 and one side surface of the core substrate 120, the second emboss film 140 is located at the first nip 1102 and the second nip 1103 of the flexible circuit board 110 and the core substrate The other side surface of 120.
本實施例中,第一至第四電連接體均採用導電膏製成,在進行加熱壓合過程中,可以產生變形。壓合時,第一壓合膠片130的第一電連接體1331穿過軟性電路板110的第一孔1141,與第一導電線路層112相接觸並電導通,所述第一電連接體1331形成電導通第一導電線路層112及第一銅箔150的第一導電盲孔。第一壓合膠片130的第二電連接體1332與芯層基板120的第一導電孔125相接觸並電導通。第二壓合膠片140的第三電連接體1431穿過軟性電路板110的第二孔1151,與第二導電線路層113相接觸並電導通,所述第三電連接體1431形成電導通第二導電線路層113及第二銅箔160的第二導電盲孔。第二壓合膠片140的第四電連接體1432與芯層基板120的第一導電孔125相接觸並電導通。從而,每個第一導電孔125的一端與第二電連接體1332相互連接,另一端與第四電連接體1432相互連接。每個第一導電孔125與與其對應連接的第二電連接體1332及第四電連接體1432形成一個電導通第一銅箔150和第二銅箔160的第三導電盲孔。In this embodiment, the first to fourth electrical connectors are all made of a conductive paste, and deformation can be generated during the heating and pressing process. The first electrical connector 1331 of the first laminated film 130 passes through the first hole 1141 of the flexible circuit board 110, is in contact with the first conductive circuit layer 112, and is electrically connected. The first electrical connector 1331 is pressed. A first conductive via hole electrically conducting the first conductive wiring layer 112 and the first copper foil 150 is formed. The second electrical connector 1332 of the first press film 130 is in contact with and electrically conductive with the first conductive via 125 of the core substrate 120. The third electrical connector 1431 of the second laminated film 140 passes through the second hole 1151 of the flexible circuit board 110, is in contact with the second conductive circuit layer 113, and is electrically connected. The third electrical connector 1431 forms an electrical continuity. The second conductive circuit layer 113 and the second conductive blind hole of the second copper foil 160. The fourth electrical connector 1432 of the second press film 140 is in contact with the first conductive via 125 of the core substrate 120 and is electrically conducted. Therefore, one end of each of the first conductive holes 125 is connected to the second electrical connector 1332, and the other end is connected to the fourth electrical connector 1432. Each of the first conductive vias 125 and the second electrical connector 1332 and the fourth electrical connector 1432 connected thereto are formed with a third conductive via hole electrically conducting the first copper foil 150 and the second copper foil 160.
可以理解的是,第二電連接體1332不與第一導電孔125直接連接,第二電連接體1332可以與第三導電線路層122相互電連接。第四電連接體1432可以不與第一導電孔125直接連接,第四電連接體1432可以與第四導電線路層123相互電連接。It can be understood that the second electrical connector 1332 is not directly connected to the first conductive via 125, and the second electrical connector 1332 can be electrically connected to the third conductive trace layer 122. The fourth electrical connector 1432 may not be directly connected to the first conductive via 125, and the fourth electrical connector 1432 may be electrically connected to the fourth conductive trace layer 123.
經過壓合之後,芯層基板120、第一壓合膠片130及第二壓合膠片140固化形成硬性部分,而軟性電路板110的暴露區1101形成軟性部分。After pressing, the core substrate 120, the first press film 130, and the second press film 140 are cured to form a hard portion, and the exposed region 1101 of the flexible circuit board 110 forms a soft portion.
第四步,請一併參閱圖15,選擇性去除部分第一銅箔150以將至少部分第一銅箔150形成位於第一壓合膠片130表面的第五導電線路層151,選擇性去除部分第二銅箔160以將至少部分第二銅箔160形成位於第二壓合膠片140表面的第六導電線路層161,從而得到軟硬結合電路基板100a。第五導電線路層151及第六導電線路層161可以採用影像轉移工藝及蝕刻工藝形成。In the fourth step, referring to FIG. 15, a portion of the first copper foil 150 is selectively removed to form at least a portion of the first copper foil 150 to form a fifth conductive circuit layer 151 on the surface of the first press film 130, and selectively remove portions. The second copper foil 160 is formed to form at least a portion of the second copper foil 160 on the sixth conductive wiring layer 161 on the surface of the second press film 140, thereby obtaining a soft-hard bonded circuit substrate 100a. The fifth conductive circuit layer 151 and the sixth conductive circuit layer 161 may be formed by an image transfer process and an etching process.
本實施例中,僅將與芯層基板120的第一成型區域127、第二成型區域128、軟性電路板110的第一壓合區1102和第二壓合區1103相對應的部分第一銅箔150進行選擇性蝕刻得到第五導電線路層151,即將壓合在第一壓合膠片130表面的第一銅箔150進行選擇性蝕刻得到第五導電線路層151。僅將與芯層基板120的第一成型區域127、第二成型區域128、第一壓合區1102和第二壓合區1103相對應的第二銅箔160進行選擇性蝕刻得到第六導電線路層161。即將壓合在第二壓合膠片140表面的第二銅箔160進行選擇性蝕刻得到第六導電線路層161。覆蓋於暴露區1101的部分第一銅箔150和部分第二銅箔160並未被蝕刻。可以理解的是,在本步驟中,也可以將暴露區1101對應的殘留的第一銅箔150和第二銅箔160全部蝕刻去除。In this embodiment, only the first copper portion corresponding to the first molding region 127, the second molding region 128 of the core substrate 120, the first nip region 1102 and the second nip region 1103 of the flexible circuit board 110 is used. The foil 150 is selectively etched to obtain a fifth conductive wiring layer 151, that is, the first copper foil 150 pressed onto the surface of the first laminated film 130 is selectively etched to obtain a fifth conductive wiring layer 151. Only the second copper foil 160 corresponding to the first molding region 127, the second molding region 128, the first nip region 1102, and the second nip region 1103 of the core substrate 120 is selectively etched to obtain a sixth conductive line. Layer 161. The second copper foil 160 to be pressed against the surface of the second press film 140 is selectively etched to obtain a sixth conductive wiring layer 161. A portion of the first copper foil 150 and a portion of the second copper foil 160 covering the exposed region 1101 are not etched. It can be understood that, in this step, the residual first copper foil 150 and the second copper foil 160 corresponding to the exposed region 1101 can also be completely removed.
本實施例中,覆蓋於暴露區1101的部分第一銅箔150和部分第二銅箔160並未被蝕刻,可以在後續製作軟硬結合電路板時保護被其遮蔽的軟性電路板110。In this embodiment, a portion of the first copper foil 150 and a portion of the second copper foil 160 covering the exposed region 1101 are not etched, and the flexible circuit board 110 shielded by the flexible circuit board can be protected when the soft and hard circuit board is subsequently fabricated.
在軟硬結合電路基板100a中,軟性電路板110的暴露區1101及其表面的第一銅箔150、第二銅箔160構成軟硬結合電路基板100a的軟板區,其餘部分則構成軟硬結合電路基板100a的硬板區,軟板區的厚度比硬板區的厚度小,且材質柔軟,可以相對於硬板區彎折變形,從而構成了軟硬結合電路基板100a。In the soft and hard-bonding circuit substrate 100a, the exposed region 1101 of the flexible circuit board 110 and the first copper foil 150 and the second copper foil 160 on the surface thereof constitute a soft board region of the soft and hard bonded circuit substrate 100a, and the remaining portions constitute a soft and hard region. In combination with the hard plate region of the circuit substrate 100a, the thickness of the soft plate region is smaller than the thickness of the hard plate region, and the material is soft, and can be bent and deformed with respect to the hard plate region, thereby forming the soft and hard bonded circuit substrate 100a.
請參閱圖15,本技術方案第二實施例提供一種由以上製作方法制得的軟硬結合電路基板100a,其包括如前所述的、壓合於一起的軟性電路板110、芯層基板120、第一壓合膠片130、第二壓合膠片140、第五導電線路層151及第六導電線路層161。Referring to FIG. 15 , a second embodiment of the present invention provides a soft and hard bonded circuit substrate 100 a obtained by the above manufacturing method, which comprises the flexible circuit board 110 and the core substrate 120 which are pressed together as described above. The first press film 130, the second press film 140, the fifth conductive circuit layer 151, and the sixth conductive circuit layer 161.
軟性電路板110包括依次堆疊的第一覆蓋膜118、第一電磁遮罩層116、第二絕緣層114、第一導電線路層112、第一絕緣層111、第二導電線路層113、第三絕緣層115、第二電磁遮罩層117及第二覆蓋膜119。第一絕緣層111包括相對的第一表面1111和第二表面1112,第一導電線路層112形成於第一絕緣層111的第一表面1111,第二導電線路層113形成於第一絕緣層111的第二表面1112。The flexible circuit board 110 includes a first cover film 118, a first electromagnetic mask layer 116, a second insulating layer 114, a first conductive wiring layer 112, a first insulating layer 111, a second conductive wiring layer 113, and a third layer which are sequentially stacked. The insulating layer 115, the second electromagnetic mask layer 117, and the second cover film 119. The first insulating layer 111 includes an opposite first surface 1111 and a second surface 1112. The first conductive wiring layer 112 is formed on the first surface 1111 of the first insulating layer 111, and the second conductive wiring layer 113 is formed on the first insulating layer 111. The second surface 1112.
軟性電路板110大致為長方形,其包括暴露區1101及連接於暴露區1101相對兩側的第一壓合區1102和第二壓合區1103。暴露區1101也為長方形,其用於形成軟硬結合電路板板的軟性區域相對應。第一壓合區1102和第二壓合區1103用於與硬性電路板相互固定連接。本實施例中,在軟性電路板110所在的平面內,將自第一壓合區1102向第二壓合區1103的延伸方向定義為長度方向,與上述延伸方向垂直的方向定義為寬度方向。第一導電線路層112和第二導電線路層113內的導電線路均延所述長度方向延伸,且均自第一壓合區1102經過暴露區1101延伸至第二壓合區1103。The flexible circuit board 110 is substantially rectangular and includes an exposed area 1101 and a first nip 1102 and a second nip 1103 connected to opposite sides of the exposed area 1101. The exposed area 1101 is also rectangular, which is used to form a soft region of the hard and soft bonded circuit board. The first nip 1102 and the second nip 1103 are for fixed connection to the rigid circuit board. In the embodiment, in the plane in which the flexible circuit board 110 is located, the extending direction from the first nip 1102 to the second nip 1103 is defined as a length direction, and the direction perpendicular to the extending direction is defined as a width direction. The conductive lines in the first conductive wiring layer 112 and the second conductive wiring layer 113 extend in the length direction and extend from the first bonding region 1102 through the exposed region 1101 to the second pressing region 1103.
在第一壓合區1102和第二壓合區1103內的第二絕緣層114中,形成有多個第一孔1141,使得部分第一導電線路層112從第一孔1141處露出。在第一壓合區1102和第二壓合區1103內的第三絕緣層115中,形成有多個第二孔1151,使得部分第二導電線路層113從第二孔1151處露出。In the second insulating layer 114 in the first nip 1102 and the second nip 1103, a plurality of first holes 1141 are formed such that a portion of the first conductive wiring layer 112 is exposed from the first holes 1141. In the third insulating layer 115 in the first nip 1102 and the second nip 1103, a plurality of second holes 1151 are formed such that a portion of the second conductive wiring layer 113 is exposed from the second holes 1151.
第一電磁遮罩層116、第二電磁遮罩層117、第一覆蓋膜118和第二覆蓋膜119貼合於位於全部暴露區1101、與暴露區1101相鄰的部分第一壓合區1102和與暴露區1101相鄰的部分第二壓合區1103。第一電磁遮罩層116和第二電磁遮罩層117均可以通過印刷導電銀漿的方式形成。第一覆蓋膜118用於覆蓋並保護第一電磁遮罩層116,第二覆蓋膜119用於覆蓋並保護第二電磁遮罩層117。The first electromagnetic mask layer 116, the second electromagnetic mask layer 117, the first cover film 118 and the second cover film 119 are attached to a portion of the first nip 1102 located in the entire exposed area 1101 and adjacent to the exposed area 1101. And a portion of the second nip 1103 adjacent to the exposed region 1101. Both the first electromagnetic mask layer 116 and the second electromagnetic mask layer 117 can be formed by printing a conductive silver paste. The first cover film 118 is used to cover and protect the first electromagnetic mask layer 116, and the second cover film 119 is used to cover and protect the second electromagnetic mask layer 117.
芯層基板120沿著長度方向,包括連接於第一開口121兩端的第一成型區域127和第二成型區域128。芯層基板120包括第四絕緣層124、第三導電線路層122及第四導電線路層123。第三導電線路層122形成於第四絕緣層124一個表面,第四導電線路層123形成於第四絕緣層124的另一相對的表面。在芯層基板120內,形成有多個第一導電孔125,第三導電線路層122通過多個第一導電孔125與第四導電線路層123相互電導通。The core substrate 120 includes, along the length direction, a first molding region 127 and a second molding region 128 that are connected to both ends of the first opening 121. The core substrate 120 includes a fourth insulating layer 124, a third conductive wiring layer 122, and a fourth conductive wiring layer 123. The third conductive wiring layer 122 is formed on one surface of the fourth insulating layer 124, and the fourth conductive wiring layer 123 is formed on the other opposite surface of the fourth insulating layer 124. In the core substrate 120, a plurality of first conductive vias 125 are formed, and the third conductive trace layer 122 is electrically connected to the fourth conductive via layer 123 via the plurality of first conductive vias 125.
第一壓合膠片130可以為低流動性的半固化膠片。第一壓合膠片130內形成有與軟性電路板110的暴露區1101相對應的第二開口131。第一壓合膠片130包括第一壓合膠片本體130a、多個第一電連接體1331及多個第二電連接體1332。在第一壓合膠片本體130a內形成有多個第一通孔1321及多個第二通孔1322。其中,第一通孔1321開設的位置較第二通孔1322更靠近第二開口131,第一通孔1321位於第二開口131和多個第二通孔1322之間。每個第一通孔1321內形成有第一電連接體1331,每個第一通孔1321內的第一電連接體1331與該第一通孔1321同軸設置,並貫穿第一通孔1321。第一電連接體1331的兩端分別延伸出第一通孔1321。第一電連接體1331與第二絕緣層114的第一孔1141相對應。每個第二通孔1322內形成有第二電連接體1332。每個第二通孔1322內的第二電連接體1332與該第二通孔1322同軸設置,並貫穿第二通孔1322。第二電連接體1332的兩端分別延伸出第二通孔1322。第一電連接體1331與第一孔1141一一對應。第二電連接體1332與芯層基板120的第一導電孔125一一相對應。本實施例中,第一電連接體1331及第二電連接體1332均為金屬導電膏製成。優選為銅導電膏。The first press film 130 can be a low flow semi-cured film. A second opening 131 corresponding to the exposed region 1101 of the flexible circuit board 110 is formed in the first press film 130. The first press film 130 includes a first press film body 130a, a plurality of first electrical connectors 1331, and a plurality of second electrical connectors 1332. A plurality of first through holes 1321 and a plurality of second through holes 1322 are formed in the first press film body 130a. The first through hole 1321 is located closer to the second opening 131 than the second through hole 1322 , and the first through hole 1321 is located between the second opening 131 and the plurality of second through holes 1322 . A first electrical connection body 1331 is formed in each of the first through holes 1321. The first electrical connection body 1331 in each of the first through holes 1321 is disposed coaxially with the first through hole 1321 and penetrates the first through hole 1321. Both ends of the first electrical connector 1331 extend through the first through holes 1321. The first electrical connector 1331 corresponds to the first hole 1141 of the second insulating layer 114. A second electrical connection body 1332 is formed in each of the second through holes 1322. The second electrical connection body 1332 in each of the second through holes 1322 is coaxially disposed with the second through holes 1322 and penetrates the second through holes 1322. Two ends of the second electrical connector 1332 extend through the second through holes 1322, respectively. The first electrical connector 1331 has a one-to-one correspondence with the first hole 1141. The second electrical connector 1332 corresponds to the first conductive via 125 of the core substrate 120. In this embodiment, the first electrical connector 1331 and the second electrical connector 1332 are both made of a metal conductive paste. A copper conductive paste is preferred.
請參閱圖3,第二壓合膠片140的結構與第一壓合膠片130的結構基本相同,第二壓合膠片140也可以為低流動性的半固化膠片。具體的,第二壓合膠片140內形成有與軟性電路板110的暴露區1101相對應的第三開口141。第二壓合膠片140包括第二壓合膠片本體140a、多個第三電連接體1431及多個第四電連接體1432。在第二壓合膠片本體140a第二壓合膠片140內形成有多個第三通孔1421第三通孔1421及多個第四通孔1422。第三通孔1421第三通孔1421開設的位置較第四通孔1422更靠近所述第三開口141,第三通孔1421第三通孔1421位於第三開口141和多個第四通孔1422之間。每個第三通孔1421第三通孔1421內形成有第三電連接體1431。每個第三通孔1421第三通孔1421內的第三電連接體1431與該第三通孔1421第三通孔1421同軸設置,並貫穿第三通孔1421第三通孔1421。第三電連接體1431的兩端分別延伸出第三通孔1421第三通孔1421。第三電連接體1431與第三絕緣層115的第二孔1151一一對應。每個第四通孔1422內形成有第四電連接體1432,每個第四通孔1422內的第四電連接體1432與該第四通孔1422同軸設置,並貫穿第四通孔1422。第四電連接體1432的兩端分別延伸出第四通孔1422。每個第四電連接體1432與芯層基板120的一個第一導電孔125對應。本實施例中,第三電連接體1431及第四電連接體1432為金屬導電膏製成。優選為銅導電膏。Referring to FIG. 3, the structure of the second press film 140 is substantially the same as that of the first press film 130, and the second press film 140 may also be a low-flow semi-cured film. Specifically, a third opening 141 corresponding to the exposed area 1101 of the flexible circuit board 110 is formed in the second press film 140. The second press film 140 includes a second press film body 140a, a plurality of third electrical connectors 1431, and a plurality of fourth electrical connectors 1432. A plurality of third through holes 1421, a third through hole 1421 and a plurality of fourth through holes 1422 are formed in the second pressed film 140 of the second pressed film body 140a. The third through hole 1421 is located closer to the third opening 141 than the fourth through hole 1422, and the third through hole 1421 is located in the third opening 141 and the plurality of fourth through holes. Between 1422. A third electrical connection body 1431 is formed in each of the third through holes 1421 of each of the third through holes 1421. The third electrical connection body 1431 in the third through hole 1421 of each of the third through holes 1421 is disposed coaxially with the third through hole 1421 of the third through hole 1421 and penetrates the third through hole 1421 of the third through hole 1421. The two ends of the third electrical connector 1431 extend through the third through hole 1421 of the third through hole 1421. The third electrical connector 1431 is in one-to-one correspondence with the second hole 1151 of the third insulating layer 115. A fourth electrical connector 1432 is formed in each of the fourth through holes 1422. The fourth electrical connector 1432 in each of the fourth through holes 1422 is coaxially disposed with the fourth through hole 1422 and extends through the fourth through hole 1422. Both ends of the fourth electrical connector 1432 extend through the fourth through hole 1422, respectively. Each of the fourth electrical connectors 1432 corresponds to one of the first conductive vias 125 of the core substrate 120. In this embodiment, the third electrical connector 1431 and the fourth electrical connector 1432 are made of a metal conductive paste. A copper conductive paste is preferred.
第三導電線路151形成於第一壓合膠片130遠離芯層基板120的表面。第六導電線路層161形成於第二壓合膠片140遠離芯層基板120的表面。暴露區1101的兩側分別被第一銅箔150和第二銅箔160覆蓋。The third conductive line 151 is formed on a surface of the first press film 130 away from the core substrate 120. The sixth conductive wiring layer 161 is formed on a surface of the second press film 140 away from the core substrate 120. Both sides of the exposed region 1101 are covered by the first copper foil 150 and the second copper foil 160, respectively.
第一壓合膠片130的第一電連接體1331穿過軟性電路板110的第一孔1141,與第一導電線路層112相互電導通,第一電連接體1331形成電導通第一導電線路層112及第五導電線路層151的第一導電盲孔1104。第二壓合膠片140的第三電連接體1431穿過軟性電路板110的第二孔1151,與第二導電線路層113相互電導通,所述第三電連接體1431形成電導通第二導電線路層113及第六導電線路層161的第二導電盲孔1105。每個第一導電孔125的一端與第二電連接體1332相互連接,另一端與第四電連接體1432相互連接。每個第一導電孔125與與其對應連接的第二電連接體1332及第四電連接體1432形成一個電導通第五導電線路層151和第六導電線路層161的第三導電盲孔1106。從而實現芯層基板120的第三導電線路層122與第五導電線路層151相互電導通。第四導電線路層123與第六導電線路層161相互電導通。The first electrical connector 1331 of the first laminated film 130 passes through the first hole 1141 of the flexible circuit board 110, and is electrically connected to the first conductive circuit layer 112. The first electrical connector 1331 forms a conductive first conductive layer. 112 and a first conductive via hole 1104 of the fifth conductive circuit layer 151. The third electrical connector 1431 of the second laminated film 140 passes through the second hole 1151 of the flexible circuit board 110 and is electrically connected to the second conductive circuit layer 113. The third electrical connector 1431 forms a conductive second conductive. The second conductive via 1105 of the circuit layer 113 and the sixth conductive circuit layer 161. One end of each of the first conductive holes 125 is connected to the second electrical connector 1332, and the other end is connected to the fourth electrical connector 1432. Each of the first conductive vias 125 and the second electrical connector 1332 and the fourth electrical connector 1432 connected thereto are formed with a third conductive via 1106 electrically conducting the fifth conductive layer 151 and the sixth conductive layer 161. Thereby, the third conductive circuit layer 122 and the fifth conductive circuit layer 151 of the core substrate 120 are electrically connected to each other. The fourth conductive wiring layer 123 and the sixth conductive wiring layer 161 are electrically connected to each other.
本技術方案第三實施例提供一種軟硬結合電路板的製作方法,該製作方法包括步驟:The third embodiment of the present technical solution provides a method for manufacturing a soft and hard combined circuit board, and the manufacturing method includes the following steps:
第一步,請參閱圖15,提供所述的軟硬結合電路基板100a。所述軟硬結合電路基板100a可以採用本技術方案第一實施例提供的製作方法製作而成。In the first step, referring to FIG. 15, the soft and hard bonded circuit substrate 100a is provided. The hard and soft combined circuit substrate 100a can be fabricated by using the manufacturing method provided by the first embodiment of the present technical solution.
第二步,請參閱圖16至圖19,提供第一連接膠片171、第二連接膠片172、第一外層基板181及第二外層基板182。In the second step, referring to FIG. 16 to FIG. 19, a first connecting film 171, a second connecting film 172, a first outer substrate 181 and a second outer substrate 182 are provided.
第一連接膠片171和第二連接膠片172的製作方法與第一實施例中第一壓合膠片130的製作方法相近,不同之處在於第一連接膠片171和第二連接膠片172中部不具有開口。The first connecting film 171 and the second connecting film 172 are manufactured in a similar manner to the first pressing film 130 in the first embodiment, except that the first connecting film 171 and the second connecting film 172 have no opening in the middle. .
第一連接膠片171包括第一連接膠片本體1711及多個第五電連接體174。第一連接膠片本體1711內形成有多個第六通孔173,每個第六通孔173內形成有第五電連接體174。第六通孔173開設的位置與第五導電線路層151中的導電線路相對應,第五電連接體174用於與第五導電線路層151相互電導通。The first connecting film 171 includes a first connecting film body 1711 and a plurality of fifth electrical connectors 174. A plurality of sixth through holes 173 are formed in the first connecting film body 1711, and a fifth electrical connecting body 174 is formed in each of the sixth through holes 173. The sixth through hole 173 is opened at a position corresponding to the conductive line in the fifth conductive circuit layer 151, and the fifth electrical connector 174 is used to electrically conduct with the fifth conductive circuit layer 151.
第二連接膠片172包括第二連接膠片本體1721及多個第六電連接體176。第一連接膠片本體1711形成有多個第七通孔175。每個第七通孔175內形成有第六電連接體176。第七通孔175開設的位置與第六導電線路層161中的導電線路相對應,第六電連接體176用於與第六導電線路層161相互電導通。The second connecting film 172 includes a second connecting film body 1721 and a plurality of sixth electrical connectors 176. The first connecting film body 1711 is formed with a plurality of seventh through holes 175. A sixth electrical connector 176 is formed in each of the seventh through holes 175. The seventh through hole 175 is opened at a position corresponding to the conductive line in the sixth conductive circuit layer 161, and the sixth electrical connection body 176 is used to electrically conduct with the sixth conductive circuit layer 161.
第一外層基板181包括第五絕緣層183、第七導電線路層184及第八導電線路層185。第七導電線路層184形成於第五絕緣層183一個表面,第八導電線路層185形成於第五絕緣層183的另一相對的表面。第五絕緣層183位於第七導電線路層184、第八導電線路層185之間。在第一外層基板181內,形成有多個第二導電孔1811,第七導電線路層184通過多個第二導電孔1811與第八導電線路層185相互電導通。部分第七導電線路層184中的導電線路應與第一連接膠片171內的第六通孔173開設的位置相對應。The first outer substrate 181 includes a fifth insulating layer 183, a seventh conductive wiring layer 184, and an eighth conductive wiring layer 185. The seventh conductive wiring layer 184 is formed on one surface of the fifth insulating layer 183, and the eighth conductive wiring layer 185 is formed on the other opposite surface of the fifth insulating layer 183. The fifth insulating layer 183 is located between the seventh conductive circuit layer 184 and the eighth conductive circuit layer 185. In the first outer substrate 181, a plurality of second conductive vias 1811 are formed, and the seventh conductive trace layer 184 is electrically connected to the eighth conductive via layer 185 through the plurality of second conductive vias 1811. The conductive line in the portion of the seventh conductive wiring layer 184 should correspond to the position where the sixth through hole 173 in the first connecting film 171 is opened.
第二外層基板182包括第六絕緣層186、第九導電線路層187及第十導電線路層188。第九導電線路層187形成於第六絕緣層186一個表面,第十導電線路層188形成於第六絕緣層186的另一相對的表面。第六絕緣層186位於第九導電線路層187、第十導電線路層188之間。在第二外層基板182內,形成有多個第三導電孔1812,第九導電線路層187通過多個第三導電孔1812與第十導電線路層188相互電導通。部分第九導電線路層187中的導電線路應與第二連接膠片172內的第七通孔175開設的位置相對應。The second outer substrate 182 includes a sixth insulating layer 186, a ninth conductive wiring layer 187, and a tenth conductive wiring layer 188. The ninth conductive wiring layer 187 is formed on one surface of the sixth insulating layer 186, and the tenth conductive wiring layer 188 is formed on the other opposite surface of the sixth insulating layer 186. The sixth insulating layer 186 is located between the ninth conductive circuit layer 187 and the tenth conductive circuit layer 188. In the second outer substrate 182, a plurality of third conductive vias 1812 are formed, and the ninth conductive trace layer 187 is electrically connected to the tenth conductive trace layer 188 through the plurality of third conductive vias 1812. The conductive lines in the portion of the ninth conductive wiring layer 187 should correspond to the positions at which the seventh via holes 175 in the second connecting film 172 are opened.
所述第一外層基板181及第二外層基板182的製作方法與芯層基板120的製作方法相同。The first outer layer substrate 181 and the second outer layer substrate 182 are formed in the same manner as the core layer substrate 120.
另外,第二導電孔1811和第三導電孔1812也可以為導電通孔,其可以通過在覆銅基板形成通孔,然後在通孔內填充導電材料的方法製成。In addition, the second conductive via 1811 and the third conductive via 1812 may also be conductive vias, which may be formed by forming a via hole in the copper clad substrate and then filling the via hole with a conductive material.
第三步,請參閱圖20,依次堆疊並一次性壓合第一外層基板181、第一連接膠片171、軟硬結合電路基板100a、第二連接膠片172及第二外層基板182,得到多層電路基板100b。The third step, referring to FIG. 20, sequentially stacks and presses the first outer substrate 181, the first connecting film 171, the soft and hard bonded circuit substrate 100a, the second connecting film 172, and the second outer substrate 182 to obtain a multilayer circuit. Substrate 100b.
由於第一連接膠片171、第二連接膠片172、第一連接膠片171內的第五電連接體174及第二連接膠片172內的第六電連接體176均可以在加熱加壓時產生變形。這樣,經過壓合之後,第五導電線路層151通過第一連接膠片171中的第五電連接體174與第七導電線路層184相互電導通。第一連接膠片171中的膠片材料成為第五導電線路層151與第七導電線路層184之間的絕緣層。第六導電線路層161通過第二連接膠片172中的第六電連接體176與第九導電線路層187相互電導通。第二連接膠片172中的膠片材料成為第六導電線路層161與第九導電線路層187之間的絕緣層。Since the first connecting film 171, the second connecting film 172, the fifth electrical connecting body 174 in the first connecting film 171, and the sixth electrical connecting body 176 in the second connecting film 172 are all deformable when heated and pressurized. Thus, after pressing, the fifth conductive wiring layer 151 is electrically conducted to the seventh conductive wiring layer 184 through the fifth electrical connection body 174 of the first connection film 171. The film material in the first connecting film 171 becomes an insulating layer between the fifth conductive wiring layer 151 and the seventh conductive wiring layer 184. The sixth conductive wiring layer 161 is electrically connected to the ninth conductive wiring layer 187 through the sixth electrical connection body 176 of the second connection film 172. The film material in the second connecting film 172 becomes an insulating layer between the sixth conductive wiring layer 161 and the ninth conductive wiring layer 187.
第四步,請參閱圖21至圖22,沿著所述軟性電路板110的暴露區1101與第一壓合區1102、第二壓合區1103的交界線,形成貫穿第一外層基板181、第一連接膠片171及暴露區1101對應的第一銅箔150的第一切口191及貫穿第二外層基板182、第二連接膠片172及暴露區1101對應的第二銅箔160的第二切口192,將位於所述第一切口191內的部分第一外層基板181和第一連接膠片171、暴露區1101對應的第一銅箔150去除,並將位於第二切口192內的部分第二外層基板182及第二連接膠片172、暴露區1101對應的第二銅箔160去除,從而暴露出軟性電路板110的暴露區1101,得到軟硬結合電路板100。In the fourth step, referring to FIG. 21 to FIG. 22, along the boundary between the exposed region 1101 of the flexible circuit board 110 and the first nip region 1102 and the second nip region 1103, a first outer substrate 181 is formed. a first slit 191 of the first copper foil 150 corresponding to the first connecting film 171 and the exposed area 1101, and a second slit of the second copper foil 160 corresponding to the second outer substrate 182, the second connecting film 172 and the exposed area 1101 192. The first copper foil 150 corresponding to the portion of the first outer substrate 181 and the first connecting film 171 and the exposed region 1101 in the first slit 191 is removed, and the portion located in the second slit 192 is second. The second copper foil 160 corresponding to the outer substrate 182 and the second connecting film 172 and the exposed region 1101 is removed, thereby exposing the exposed region 1101 of the flexible circuit board 110, and the soft and hard circuit board 100 is obtained.
第一切口191和第二切口192可以採用紫外鐳射定深切割的方式形成,形成的第一切口191和第二切口192並不貫穿至軟性電路板110。The first slit 191 and the second slit 192 may be formed by ultraviolet laser deep cut, and the formed first slit 191 and second slit 192 are not penetrated to the flexible circuit board 110.
在本實施例中,第七導電線路層184、第八導電線路層185具有對應於暴露區1101的開口,第一連接膠片171中對應於暴露區1101的部分未設置第五電連接體174,因此,可以很方便地切割形成第一切口191。第九導電線路層187、第十導電線路層188具有對應於暴露區1101的開口,第二連接膠片172中對應於暴露區1101的部分未設置第六電連接體176,因此,可以很方便地切割形成第二切口192。In this embodiment, the seventh conductive circuit layer 184 and the eighth conductive circuit layer 185 have openings corresponding to the exposed regions 1101, and the portion of the first connecting film 171 corresponding to the exposed regions 1101 is not provided with the fifth electrical connectors 174. Therefore, the first slit 191 can be formed by cutting. The ninth conductive circuit layer 187 and the tenth conductive circuit layer 188 have openings corresponding to the exposed regions 1101, and the portion of the second connecting film 172 corresponding to the exposed regions 1101 is not provided with the sixth electrical connecting body 176, so that it can be conveniently The cutting forms a second slit 192.
本實施例中,第一切口191和第二切口192均包括兩條如圖19所示的切邊。In this embodiment, the first slit 191 and the second slit 192 each include two trimming edges as shown in FIG.
所述第一成型區域127、第一壓合區1102及該二部分對應的第一連接膠片171、第二連接膠片172、第一外層基板181、第二外層基板182形成了軟硬結合電路板100的一個硬性區域107,所述第二成型區域128與軟性電路板110的第二壓合區1103對應的硬性部分形成了軟硬結合電路板100的另一個硬性區域107。連接在兩個硬性區域107之間的軟性電路板110的暴露區1101形成了軟硬結合電路板100的軟性區域108。The first molding region 127, the first nip region 1102, and the first connecting film 171, the second connecting film 172, the first outer substrate 181, and the second outer substrate 182 corresponding to the two portions form a soft and hard circuit board. A hard region 107 of 100, the hard portion corresponding to the second nip region 1103 of the flexible circuit board 110 forms another hard region 107 of the hard and soft circuit board 100. The exposed region 1101 of the flexible circuit board 110 connected between the two hard regions 107 forms a soft region 108 of the hard and soft bonded circuit board 100.
可以理解的是,當暴露區1101兩側不具有第五導電線路層151和第六導電線路層161時,在此步驟中可以不必去除第五導電線路層151和第六導電線路層161,只需將暴露區1101對應的第一連接膠片171、第二連接膠片172、第一外層基板181及第二外層基板182去除即可。It can be understood that when the fifth conductive circuit layer 151 and the sixth conductive circuit layer 161 are not provided on both sides of the exposed region 1101, the fifth conductive circuit layer 151 and the sixth conductive circuit layer 161 need not be removed in this step. The first connecting film 171, the second connecting film 172, the first outer substrate 181, and the second outer substrate 182 corresponding to the exposed area 1101 may be removed.
第五步,請參閱圖23,在軟硬結合電路板100的兩個硬性區域的外層導電線路層及外層絕緣層表面形成防焊層。In the fifth step, referring to FIG. 23, a solder resist layer is formed on the outer conductive layer and the outer insulating layer surface of the two hard regions of the hard-and-soft bonded circuit board 100.
本實施例中,在第八導電線路層185的表面及從第八導電線路層185的露出的第五絕緣層183的表面形成第一防焊層1010,第一防焊層1010具有開口,使得部分第八導電線路層185從所述開口露出。在第十導電線路層188的表面及從第十導電線路層188露出的第六絕緣層186的表面形成第二防焊層1011,第二防焊層1011內也具有開口,部分第十導電線路層188從所述開口露出。In this embodiment, a first solder resist layer 1010 is formed on a surface of the eighth conductive wiring layer 185 and a surface of the exposed fifth insulating layer 183 from the eighth conductive wiring layer 185, and the first solder resist layer 1010 has an opening. A portion of the eighth conductive wiring layer 185 is exposed from the opening. A second solder resist layer 1011 is formed on a surface of the tenth conductive circuit layer 188 and a surface of the sixth insulating layer 186 exposed from the tenth conductive circuit layer 188, and the second solder resist layer 1011 also has an opening, and a tenth conductive line Layer 188 is exposed from the opening.
可以理解的是,第一防焊層1010和第二防焊層1011也可以在第三步之後形成。It can be understood that the first solder resist layer 1010 and the second solder resist layer 1011 can also be formed after the third step.
可以理解的是,本技術方案提供的軟硬結合電路板的製作方法,可以在第三步中,在軟硬結合電路基板100a的相對兩側壓合更多層的外層電路基板及連接膠片,使得相鄰的兩個外層電路基板之間設置有一個連接膠片,可以製作更多層的軟硬結合電路板。It can be understood that, in the third step, in the third step, more layers of the outer circuit substrate and the connecting film are pressed on opposite sides of the hard and soft combined circuit substrate 100a. A connecting film is disposed between two adjacent outer circuit boards, and more layers of soft and hard circuit boards can be fabricated.
可以理解的是,為了防止壓合過程中,第一壓合膠片130和第二壓合膠片140的材料產生流動至位於暴露區1101的第一覆蓋膜118和第二覆蓋膜119,在後續過程中不易去除,可以在位於暴露區1101的第一覆蓋膜118和第二覆蓋膜119表面形成可剝保護膜。並在第四步中,將位於所述第一切口191內的部分第一外層基板181和第一連接膠片171去除,並將位於第二切口192內的部分第二外層基板182及第二連接膠片172去除時,一併去除。It can be understood that, in order to prevent the material of the first press film 130 and the second press film 140 from flowing to the first cover film 118 and the second cover film 119 located in the exposed area 1101, in the subsequent process, in the subsequent process It is not easy to remove, and a peelable protective film can be formed on the surfaces of the first cover film 118 and the second cover film 119 located in the exposed region 1101. And in a fourth step, a portion of the first outer substrate 181 and the first connecting film 171 located in the first slit 191 are removed, and a portion of the second outer substrate 182 and the second portion located in the second slit 192 are removed. When the connecting film 172 is removed, it is removed together.
可以理解的是,本技術方案提供的軟硬結合電路板,其可以僅包括軟性電路板及層壓在軟性電路板的一側的硬性電路結構。在進行軟硬結合電路板製作過程中,也可以僅在軟性電路板的一側進行層壓操作。It can be understood that the soft and hard circuit board provided by the technical solution may include only a flexible circuit board and a rigid circuit structure laminated on one side of the flexible circuit board. In the process of making a hard and soft board, it is also possible to perform the lamination operation only on one side of the flexible board.
請參閱圖21,本技術方案第四實施例還提供一種由上述製作方法制得的軟硬結合電路板100,其包括軟性區域108及連接於軟性區域108兩端的兩個硬性區域107。本實施例中,軟硬結合電路板100包括壓合於一起的、如前所述的所述軟硬結合電路基板100a、第一連接膠片171、第二連接膠片172、第一外層基板181及第二外層基板182。Referring to FIG. 21, a fourth embodiment of the present invention further provides a soft and hard bonded circuit board 100 obtained by the above manufacturing method, which comprises a soft region 108 and two hard regions 107 connected to both ends of the soft region 108. In this embodiment, the hard and soft bonding circuit board 100 includes the soft and hard bonding circuit substrate 100a, the first connecting film 171, the second connecting film 172, and the first outer substrate 181 which are pressed together as described above. The second outer substrate 182.
第五導電線路層151通過第一連接膠片171中的第五電連接體174與第一外層基板181的第七導電線路層184相互電導通。第五電連接體174成為一個導電盲孔。第六導電線路層161通過第二連接膠片172中的第六電連接體176與第九導電線路層187相互電導通。第六電連接體176成為一個導電盲孔。The fifth conductive wiring layer 151 is electrically connected to the seventh conductive wiring layer 184 of the first outer substrate 181 through the fifth electrical connection body 174 of the first connection film 171. The fifth electrical connector 174 becomes a conductive blind hole. The sixth conductive wiring layer 161 is electrically connected to the ninth conductive wiring layer 187 through the sixth electrical connection body 176 of the second connection film 172. The sixth electrical connector 176 becomes a conductive blind hole.
可以理解的是,第五導電線路層151上可以具有多層第一連接膠片171及多層第一外層基板181,所述第一連接膠片171和多層第一外層基板181交替排列,每相鄰兩層第一連接膠片171之間僅有一個多層第一外層基板181。相鄰的兩個第一外層基板181之間僅有一個第一連接膠片171,一個所述第一連接膠片171與第五導電線路層151相鄰,所述第五電連接體174電導通與其相鄰的導電線路層。It can be understood that the fifth conductive circuit layer 151 may have a plurality of first connecting films 171 and a plurality of first outer substrates 181, and the first connecting film 171 and the plurality of first outer substrates 181 are alternately arranged, each adjacent two layers. There is only one multilayer first outer substrate 181 between the first connecting films 171. There is only one first connecting film 171 between the adjacent two first outer substrates 181, one of the first connecting films 171 is adjacent to the fifth conductive circuit layer 151, and the fifth electrical connecting body 174 is electrically connected thereto Adjacent conductive circuit layers.
第六導電線路層161上可以具有多層第二連接膠片172及多層第二外層基板182,所述第二連接膠片172和多層第二外層基板182交替排列,每相鄰兩層第二連接膠片172之間僅有一個多層第二外層基板182。相鄰的兩個第二外層基板182之間僅有一個第二連接膠片172,一個所述第二連接膠片172與第六導電線路層161相鄰,所述第六電連接體176電導通與其相鄰的導電線路層。The sixth conductive circuit layer 161 may have a plurality of second connecting films 172 and a plurality of second outer substrates 182. The second connecting film 172 and the plurality of second outer substrates 182 are alternately arranged, and each adjacent two layers of the second connecting film 172 There is only one multilayer second outer substrate 182 between them. There is only one second connecting film 172 between the adjacent two second outer substrates 182, one of the second connecting films 172 is adjacent to the sixth conductive circuit layer 161, and the sixth electrical connecting body 176 is electrically connected thereto Adjacent conductive circuit layers.
本技術方案提供的軟硬結合電路板及其製作方法,在進行製作過程中,採用印刷金屬導電膏的方式形成導電孔,相比於現有技術中電用電鍍形成導電孔的方式,可以提高軟硬結合電路板的信賴性,並降低軟硬結合電路板的製作成本。另外,由於本技術方案中先通過在連接膠片或者基板中通過印刷的方式形成塞孔物,相比於現有技術逐層層壓並逐層導通的方式,能夠減少軟硬結合電路板製作過程中壓合的次數,提高軟硬結合電路板製作的效率。The soft and hard combined circuit board provided by the technical solution and the manufacturing method thereof are formed by using a printed metal conductive paste in the manufacturing process, and the conductive hole can be improved by the method of forming the conductive hole by electroplating in the prior art. Hardly combine the reliability of the board and reduce the manufacturing cost of the hard and soft board. In addition, since the plug hole is formed by printing in the connecting film or the substrate in the prior art, the layer-by-layer lamination and layer-by-layer conduction can reduce the hard and soft bonding circuit board manufacturing process. The number of presses is combined to improve the efficiency of the hard and soft board production.
惟,以上所述者僅為本發明之較佳實施方式,自不能以此限制本案之申請專利範圍。舉凡熟悉本案技藝之人士援依本發明之精神所作之等效修飾或變化,皆應涵蓋於以下申請專利範圍內。However, the above description is only a preferred embodiment of the present invention, and it is not possible to limit the scope of the patent application of the present invention. Equivalent modifications or variations made by persons skilled in the art in light of the spirit of the invention are intended to be included within the scope of the following claims.
100...軟硬結合電路板100. . . Soft and hard combined circuit board
100a...軟硬結合電路基板100a. . . Soft and hard combined circuit board
100b...多層電路基板100b. . . Multilayer circuit substrate
107...硬性區域107. . . Hard area
108...軟性區域108. . . Soft area
110...軟性電路板110. . . Flexible circuit board
1101...暴露區1101. . . Exposed area
1102...第一壓合區1102. . . First nip
1103...第二壓合區1103. . . Second nip
111...第一絕緣層111. . . First insulating layer
1111...第一表面1111. . . First surface
1112...第二表面1112. . . Second surface
112...第一導電線路層112. . . First conductive circuit layer
113...第二導電線路層113. . . Second conductive circuit layer
114...第二絕緣層114. . . Second insulating layer
1141...第一孔1141. . . First hole
115...第三絕緣層115. . . Third insulating layer
1151...第二孔1151. . . Second hole
116...第一電磁遮罩層116. . . First electromagnetic mask layer
117...第二電磁遮罩層117. . . Second electromagnetic mask layer
118...第一覆蓋膜118. . . First cover film
119...第二覆蓋膜119. . . Second cover film
120...芯層基板120. . . Core substrate
124...第四絕緣層124. . . Fourth insulating layer
122...第三導電線路層122. . . Third conductive circuit layer
122a...第一銅箔層122a. . . First copper foil layer
123...第四導電線路層123. . . Fourth conductive circuit layer
123a...第二銅箔層123a. . . Second copper foil layer
125...第一導電孔125. . . First conductive hole
125a...第一盲孔125a. . . First blind hole
125b...第一導電材料125b. . . First conductive material
121...第一開口121. . . First opening
127...第一成型區域127. . . First molding area
128...第二成型區域128. . . Second molding area
129...第一可剝保護膠層129. . . First peelable protective layer
130...第一壓合膠片130. . . First press film
130a...第一壓合膠片本體130a. . . First press film body
131...第二開口131. . . Second opening
1321...第一通孔1321. . . First through hole
1322...第二通孔1322. . . Second through hole
1331...第一電連接體1331. . . First electrical connector
1332...第二電連接體1332. . . Second electrical connector
135...第二可剝保護膠層135. . . Second peelable protective layer
140...第二壓合膠片140. . . Second press film
140a...第二壓合膠片本體140a. . . Second press film body
141...第三開口141. . . Third opening
1421...第三通孔1421. . . Third through hole
1422...第四通孔1422. . . Fourth through hole
1431...第三電連接體1431. . . Third electrical connector
1432...第四電連接體1432. . . Fourth electrical connector
150...第一銅箔150. . . First copper foil
160...第二銅箔160. . . Second copper foil
151...第五導電線路層151. . . Fifth conductive circuit layer
161...第六導電線路層161. . . Sixth conductive layer
171...第一連接膠片171. . . First connecting film
1711...第一連接膠片本體1711. . . First connecting film body
173...第六通孔173. . . Sixth through hole
174...第五電連接體174. . . Fifth electrical connector
172...第二連接膠片172. . . Second connecting film
1721...第二連接膠片本體1721. . . Second connecting film body
175...第七通孔175. . . Seventh through hole
176...第六電連接體176. . . Sixth electrical connector
181...第一外層基板181. . . First outer substrate
183...第五絕緣層183. . . Fifth insulation layer
184...第七導電線路層184. . . Seventh conductive layer
185...第八導電線路層185. . . Eightth conductive layer
1811...第二導電孔1811. . . Second conductive hole
182...第二外層基板182. . . Second outer substrate
186...第六絕緣層186. . . Sixth insulation layer
187...第九導電線路層187. . . Ninth conductive layer
188...第十導電線路層188. . . Tenth conductive circuit layer
1812...第三導電孔1812. . . Third conductive hole
191...第一切口191. . . First incision
192...第二切口192. . . Second incision
1010...第一防焊層1010. . . First solder mask
1011...第二防焊層1011. . . Second solder mask
圖1係本技術方案實施例提供的軟性電路板的剖面示意圖。1 is a schematic cross-sectional view of a flexible circuit board provided by an embodiment of the present technical solution.
圖2係本技術方案實施例提供的芯層基板的剖面示意圖。2 is a schematic cross-sectional view of a core substrate provided by an embodiment of the present technical solution.
圖3係本技術方案實施例提供的第一連接膠片的剖面示意圖。FIG. 3 is a schematic cross-sectional view of a first connecting film provided by an embodiment of the present technical solution.
圖4係本技術方案實施例提供的第二連接膠片的剖面示意圖。4 is a cross-sectional view of a second connecting film provided by an embodiment of the present technical solution.
圖5至圖8係本技術方案實施例提供的芯層基板製作過程各步驟的示意圖。FIG. 5 to FIG. 8 are schematic diagrams showing steps of a core substrate manufacturing process provided by an embodiment of the present technical solution.
圖9至圖12係本技術方案提供的第一連接膠片製作過程各步驟的示意圖。9 to FIG. 12 are schematic diagrams showing the steps of the first connecting film manufacturing process provided by the technical solution.
圖13係本技術方案提供的第一銅箔及第二銅箔的剖面示意圖。13 is a schematic cross-sectional view of a first copper foil and a second copper foil provided by the present technical solution.
圖14係壓合軟性電路板、芯層基板、第一連接膠片、第二連接膠片、第一銅箔及第二銅箔後的剖面示意圖。14 is a schematic cross-sectional view of a flexible circuit board, a core substrate, a first connecting film, a second connecting film, a first copper foil, and a second copper foil.
圖15係本技術方案製作形成的軟硬結合電路基板的剖面示意圖。15 is a schematic cross-sectional view showing a soft and hard bonded circuit substrate formed by the present technical solution.
圖16係本技術方案提供的第一外層基板的剖面示意圖。16 is a schematic cross-sectional view of a first outer substrate provided by the present technical solution.
圖17係本技術方案提供的第二外層基板的剖面示意圖。17 is a schematic cross-sectional view of a second outer substrate provided by the present technical solution.
圖18係本技術方案提供的第三連接膠片的剖面示意圖。18 is a schematic cross-sectional view of a third connecting film provided by the present technical solution.
圖19係本技術方案提供的第四連接膠片的剖面示意圖。Figure 19 is a cross-sectional view showing a fourth connecting film provided by the present technical solution.
圖20係壓合第一外層基板、第三連接膠片、內層基板、第四連接膠片及第二外層基板得到的多層電路基板的剖面示意圖。20 is a schematic cross-sectional view showing a multilayer circuit substrate obtained by pressing a first outer substrate, a third connecting film, an inner substrate, a fourth connecting film, and a second outer substrate.
圖21係在圖20的多層電路基板形成第一切口和第二切口後的剖面示意圖。21 is a schematic cross-sectional view showing the first slit and the second slit formed in the multilayer circuit substrate of FIG. 20.
圖22係對圖21中的預製電路板進行成型後得到軟硬結合電路板的剖面示意圖。Figure 22 is a cross-sectional view showing the soft-hardened circuit board obtained by molding the prefabricated circuit board of Figure 21.
圖23係在圖22的軟硬結合電路板形成外層防焊層的剖面示意圖。Figure 23 is a cross-sectional view showing the outer solder resist layer formed in the soft-hard bonded circuit board of Figure 22.
100a...軟硬結合電路基板100a. . . Soft and hard combined circuit board
110...軟性電路板110. . . Flexible circuit board
122...第三導電線路層122. . . Third conductive circuit layer
123...第四導電線路層123. . . Fourth conductive circuit layer
125...第一導電孔125. . . First conductive hole
1331...第一電連接體1331. . . First electrical connector
1332...第二電連接體1332. . . Second electrical connector
1431...第三電連接體1431. . . Third electrical connector
1432...第四電連接體1432. . . Fourth electrical connector
151...第五導電線路層151. . . Fifth conductive circuit layer
161...第六導電線路層161. . . Sixth conductive layer
Claims (26)
提供軟性電路板,所述軟性電路板包括暴露區及連接於所述暴露區的壓合區;
提供芯層基板、第一壓合膠片、第二壓合膠片、第一銅箔及第二銅箔,所述芯層基板內具有與軟性電路板相對應的第一開口,所述第一壓合膠片包括第一膠片本體、多個第一電連接體及多個第二電連接體,第一膠片本體具有與暴露區對應的第二開口,所述多個第一電連接體、多個第二電連接體均設置於第一壓合膠片本體,所述多個第一電連接體與所述壓合區相對應,所述第二壓合膠片包括第二壓合膠片本體、多個第三電連接體及多個第四電連接體,第二壓合膠片本體具有與暴露區對應的第三開口,所述多個第三電連接體、多個第四電連接體均設置於第二膠片本體中,所述多個第三電連接體與所述壓合區相對應;
壓合所述軟性電路板、芯層基板、第一壓合膠片、第二壓合膠片、第一銅箔及第二銅箔,使得所述軟性電路板配合於芯層基板的第一開口內,所述第一壓合膠片和第二壓合膠片分別壓合於芯層基板的相對兩側,且也位於壓合區的相對兩側,第一銅箔形成於第一壓合膠片遠離芯層基板的表面,第二銅箔形成於第二壓合膠片遠離芯層基板的表面,所述第一銅箔通過第二電連接體與芯層基板電導通,所述第二銅箔通過第四電連接體與芯層基板電導通,所述第一電連接體電連接軟性電路板的壓合區與第一銅箔,所述第三電連接體電連接軟性電路板的壓合區與第二銅箔;以及
選擇性去除部分第一銅箔形成第五導電線路層,選擇性去除部分第二銅箔形成第六導電線路層,所述第五導電線路層通過第二電連接體與芯層基板電導通,所述第六導電線路層通過第四電連接體與芯層基板電導通,所述第一電連接體電連接軟性電路板的壓合區與五導電線路層,所述第三電連接體電連接軟性電路板的壓合區與第六導電線路層。A method for manufacturing a soft and hard combined circuit substrate, comprising the steps of:
Providing a flexible circuit board, the flexible circuit board including an exposed area and a nip area connected to the exposed area;
Providing a core substrate, a first press film, a second press film, a first copper foil and a second copper foil, wherein the core substrate has a first opening corresponding to the flexible circuit board, the first pressure The film comprises a first film body, a plurality of first electrical connectors and a plurality of second electrical connectors, the first film body having a second opening corresponding to the exposed area, the plurality of first electrical connectors, the plurality of The second electrical connectors are respectively disposed on the first press-fit film body, the plurality of first electrical connectors are corresponding to the nip area, and the second press-fit film comprises a second press-fit film body and a plurality of a third electrical connector and a plurality of fourth electrical connectors, the second laminated film body having a third opening corresponding to the exposed area, wherein the plurality of third electrical connectors and the plurality of fourth electrical connectors are disposed on In the second film body, the plurality of third electrical connectors correspond to the nip area;
Pressing the flexible circuit board, the core substrate, the first press film, the second press film, the first copper foil and the second copper foil to fit the flexible circuit board into the first opening of the core substrate The first press film and the second press film are respectively pressed on opposite sides of the core substrate, and are also located on opposite sides of the nip, and the first copper foil is formed on the first press film away from the core a surface of the layer substrate, the second copper foil is formed on the surface of the second press film away from the core substrate, the first copper foil is electrically connected to the core substrate through the second electrical connector, and the second copper foil passes through The fourth electrical connector is electrically connected to the core substrate, the first electrical connector electrically connects the nip of the flexible circuit board with the first copper foil, and the third electrical connector electrically connects the nip of the flexible circuit board with a second copper foil; and selectively removing a portion of the first copper foil to form a fifth conductive wiring layer, selectively removing a portion of the second copper foil to form a sixth conductive wiring layer, and the fifth conductive wiring layer passes through the second electrical connection body The core substrate is electrically conducted, and the sixth conductive circuit layer passes through the fourth electricity The body is electrically connected to the core substrate, the first electrical connector electrically connects the nip area of the flexible circuit board with the five conductive circuit layer, and the third electrical connector electrically connects the nip area of the flexible circuit board with the sixth Conductive circuit layer.
採用如請求項9所述的軟硬結合電路基板的製作方法製作形成軟硬結合電路基板;
提供第一外層基板及第一連接膠片,所述第一外層基板包括依次設置的第七導電線路層、第五絕緣層及第八導電線路層,第五絕緣層內形成有多個電導通第七導電線路層及第八導電線路層的第二導電孔,所述第一連接膠片內形成有多個貫穿第一連接膠片的第五電連接體;
壓合所述第一外層基板、第一連接膠片及軟硬結合電路基板,所述多個第五電連接體將第五導電線路層及第一外層基板的第七導電線路層相互電導通;
沿著暴露區與壓合區的交界線,形成貫穿第一外層基板和第一連接膠片的第一切口,去除第一切口環繞的該部分第一外層基板和第一連接膠片,從而得到軟硬結合電路板。A method for manufacturing a soft and hard combined circuit board, comprising the steps of:
Forming a soft and hard bonded circuit substrate by using the method of manufacturing the soft and hard bonded circuit substrate according to claim 9;
Providing a first outer substrate and a first connecting film, the first outer substrate includes a seventh conductive circuit layer, a fifth insulating layer and an eighth conductive circuit layer, which are sequentially disposed, and a plurality of electrical conduction layers are formed in the fifth insulating layer a second conductive hole of the seventh conductive circuit layer and the eighth conductive circuit layer, wherein the first connecting film is formed with a plurality of fifth electrical connecting bodies penetrating the first connecting film;
Pressing the first outer substrate, the first connecting film and the soft and hard circuit substrate, the plurality of fifth electrical connectors electrically electrically connecting the fifth conductive circuit layer and the seventh conductive circuit layer of the first outer substrate;
Forming a first slit penetrating the first outer layer substrate and the first connecting film along a boundary line between the exposed area and the nip area, removing the portion of the first outer layer substrate and the first connecting film surrounded by the first slit, thereby obtaining Soft and hard combined circuit board.
提供如請求項1所述的軟硬結合電路基板;
提供第一外層基板、第一連接膠片、第二外層基板及第二連接膠片,所述第一外層基板包括第五絕緣層、第七導電線路層及第八導電線路層,第五絕緣層內形成有多個電導通第七導電線路層及第八導電線路層的第二導電孔,所述第一連接膠片內形成有多個貫穿第一連接膠片的第五電連接體,所述第二外層基板包括第六絕緣層、第九導電線路層及第十導電線路層,第六絕緣層內形成有多個電導通第九導電線路層及第十導電線路層的第三導電孔,所述第二連接膠片內形成有多個貫穿第二連接膠片的第六電連接體;
壓合第一外層基板、第一連接膠片、軟硬電路板基板、第二連接膠片及第二外層基板,所述第五電連接體將第五導電線路層及第一外層基板相互電導通,所述第六電連接體將第六導電線路層及第二外層基板相互電導通;
沿著暴露區的邊界線,形成貫穿第一外層基板的第一連接膠片的第一切口,將被第一切口環繞的第一外層基板及第一連接膠片去除,得到軟硬結合電路板。A method for manufacturing a soft and hard combined circuit board, comprising the steps of:
Providing the soft and hard combined circuit substrate as claimed in claim 1;
Providing a first outer substrate, a first connecting film, a second outer substrate and a second connecting film, wherein the first outer substrate comprises a fifth insulating layer, a seventh conductive circuit layer and an eighth conductive circuit layer, and the fifth insulating layer Forming a plurality of second conductive holes electrically conducting the seventh conductive circuit layer and the eighth conductive circuit layer, wherein the first connecting film is formed with a plurality of fifth electrical connectors penetrating the first connecting film, the second The outer substrate includes a sixth insulating layer, a ninth conductive circuit layer and a tenth conductive circuit layer, and a plurality of third conductive holes electrically conducting the ninth conductive circuit layer and the tenth conductive circuit layer are formed in the sixth insulating layer, a plurality of sixth electrical connectors penetrating through the second connecting film are formed in the second connecting film;
Pressing the first outer substrate, the first connecting film, the soft and hard circuit board substrate, the second connecting film and the second outer substrate, the fifth electrical connecting body electrically connecting the fifth conductive circuit layer and the first outer substrate to each other, The sixth electrical connector electrically conducts the sixth conductive circuit layer and the second outer substrate;
Forming a first slit through the first connecting film of the first outer substrate along the boundary line of the exposed region, removing the first outer substrate and the first connecting film surrounded by the first slit, thereby obtaining a soft and hard combined circuit board .
提供如請求項1所述的軟硬結合電路基板;
提供多個第一外層基板、多個第一連接膠片、多個第二外層基板及多個第二連接膠片,每個所述第一外層基板包括第五絕緣層、第七導電線路層及第八導電線路層,第五絕緣層內形成有多個電導通第七導電線路層及第八導電線路層的第二導電孔,每個所述第一連接膠片內形成有多個貫穿第一連接膠片的第五電連接體,每個所述第二外層基板包括第六絕緣層、第九導電線路層及第十導電線路層,第六絕緣層內形成有多個電導通第九導電線路層及第十導電線路層的第三導電孔,每個所述第二連接膠片內形成有多個貫穿第二連接膠片的第六電連接體;
壓合多個第一外層基板、多個第一連接膠片、軟硬電路板基板、多個第二連接膠片及多個第二外層基板,多個第一外層基板及多個第一連接膠片壓合於第五導電線路層一側,多個第一外層基板及多個第一連接膠片相互交替設置,相鄰的兩個第一外層基板之間只有一個第一連接膠片,所述第一連接膠片與第五導電線路層相鄰,所述第五電連接體電導通與其相鄰的導電線路層,所述第二外層基板及第二連接膠片壓合於所述軟硬電路板基板的第六導電線路層一側,所述第二外層基板包括第六絕緣層、第九導電線路層及第十導電線路層,第六絕緣層內形成有多個電導通第九導電線路層及第十導電線路層的第三導電孔,所述第二連接膠片內形成有多個貫穿第二連接膠片的第六電連接體,多個第二連接膠片及多個第二外層基板相互交替設置,相鄰的兩個第二外層基板之間只有一個第二連接膠片,一個所述第二連接膠片與第六導電線路層相鄰,所述第六電連接體電導通與其相鄰的導電線路層;以及
沿著暴露區的邊界線,形成貫穿第一外層基板的第一連接膠片的第一切口,將被第一切口環繞的第一外層基板、第一連接膠片去除,得到軟硬結合電路板。
A method for manufacturing a soft and hard combined circuit board, comprising the steps of:
Providing the soft and hard combined circuit substrate as claimed in claim 1;
Providing a plurality of first outer substrate, a plurality of first connecting films, a plurality of second outer substrates, and a plurality of second connecting films, each of the first outer substrates including a fifth insulating layer, a seventh conductive circuit layer, and The first conductive film is formed with a plurality of second conductive holes electrically conducting the seventh conductive circuit layer and the eighth conductive circuit layer, and each of the first connecting films is formed with a plurality of first connections. a fifth electrical connector of the film, each of the second outer substrate comprises a sixth insulating layer, a ninth conductive circuit layer and a tenth conductive circuit layer, and a plurality of electrically conductive ninth conductive circuit layers are formed in the sixth insulating layer And a third conductive hole of the tenth conductive circuit layer, each of the second connecting films is formed with a plurality of sixth electrical connectors penetrating the second connecting film;
Pressing a plurality of first outer substrate, a plurality of first connecting films, a hard and soft circuit board substrate, a plurality of second connecting films and a plurality of second outer substrates, a plurality of first outer substrates and a plurality of first connecting film presses On the side of the fifth conductive circuit layer, the plurality of first outer substrate and the plurality of first connecting films are alternately arranged, and there is only one first connecting film between the adjacent two first outer substrates, the first connection The film is adjacent to the fifth conductive circuit layer, the fifth electrical connector electrically conducts the adjacent conductive circuit layer, and the second outer substrate and the second connecting film are pressed against the soft and hard circuit board substrate a side of the sixth conductive circuit layer, the second outer substrate comprises a sixth insulating layer, a ninth conductive circuit layer and a tenth conductive circuit layer, wherein the sixth insulating layer is formed with a plurality of electrically conductive ninth conductive circuit layers and a tenth a third conductive hole of the conductive circuit layer, a plurality of sixth electrical connectors penetrating through the second connecting film are formed in the second connecting film, and the plurality of second connecting films and the plurality of second outer substrates are alternately arranged Two adjacent second There is only one second connecting film between the substrates, one of the second connecting films is adjacent to the sixth conductive circuit layer, the sixth electrical connecting body electrically conducts the conductive layer adjacent thereto; and the boundary along the exposed area And forming a first slit through the first connecting film of the first outer substrate, and removing the first outer substrate and the first connecting film surrounded by the first slit to obtain a soft and hard circuit board.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210303974.8A CN103635007B (en) | 2012-08-24 | 2012-08-24 | Rigid-flexible circuit substrate, rigid-flexible circuit board and manufacture method |
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| Publication Number | Publication Date |
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| TW201410092A true TW201410092A (en) | 2014-03-01 |
| TWI472276B TWI472276B (en) | 2015-02-01 |
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| TW101131603A TWI472276B (en) | 2012-08-24 | 2012-08-30 | Rigid-flexible circuit substrate, rigid-flexible circuit board and method for manufacturing same |
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| Country | Link |
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| JP (1) | JP2014045164A (en) |
| CN (1) | CN103635007B (en) |
| TW (1) | TWI472276B (en) |
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| CN106061107B (en) * | 2016-08-08 | 2019-10-25 | 广州杰赛科技股份有限公司 | Has the rigid-flex circuit board and preparation method thereof of electromagnetic shielding film |
| KR20180032375A (en) * | 2016-09-22 | 2018-03-30 | 삼성전기주식회사 | Printed circuit board |
| CN108901139A (en) * | 2018-08-16 | 2018-11-27 | 鹤山市得润电子科技有限公司 | A kind of single-sided circuit board and its manufacturing method |
| CN113973420B (en) * | 2020-07-22 | 2024-05-31 | 庆鼎精密电子(淮安)有限公司 | Soft and hard combined plate and manufacturing method thereof |
| TWI741891B (en) * | 2020-08-28 | 2021-10-01 | 欣興電子股份有限公司 | Circuit board structure and manufacturing method thereof |
| CN115720403B (en) * | 2021-08-24 | 2025-10-14 | 宏启胜精密电子(秦皇岛)有限公司 | Display module, circuit board and manufacturing method thereof |
| CN115087205A (en) * | 2022-07-25 | 2022-09-20 | 高德(江苏)电子科技股份有限公司 | Rigid-flex board with one-time mixed pressure of different flow glue prepreg and its manufacturing method |
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| US8759687B2 (en) * | 2010-02-12 | 2014-06-24 | Ibiden Co., Ltd. | Flex-rigid wiring board and method for manufacturing the same |
| TW201130405A (en) * | 2010-02-23 | 2011-09-01 | Ibiden Co Ltd | Flex-rigid wiring board and method for manufacturing the same |
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2012
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| Publication number | Publication date |
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| CN103635007B (en) | 2016-12-21 |
| CN103635007A (en) | 2014-03-12 |
| JP2014045164A (en) | 2014-03-13 |
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