TW201414687A - Method for producing chemically strengthened glass - Google Patents
Method for producing chemically strengthened glass Download PDFInfo
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- TW201414687A TW201414687A TW102131868A TW102131868A TW201414687A TW 201414687 A TW201414687 A TW 201414687A TW 102131868 A TW102131868 A TW 102131868A TW 102131868 A TW102131868 A TW 102131868A TW 201414687 A TW201414687 A TW 201414687A
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C21/00—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface
- C03C21/001—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions
- C03C21/002—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions to perform ion-exchange between alkali ions
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
- C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
- C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
- C03C3/087—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
- C03C3/093—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium containing zinc or zirconium
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- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Compositions (AREA)
- Surface Treatment Of Glass (AREA)
- Grinding Of Cylindrical And Plane Surfaces (AREA)
Abstract
Description
本發明係關於一種化學強化玻璃之製造方法。 The present invention relates to a method of producing a chemically strengthened glass.
對於智慧型手機等行動電話或PDA(Personal Digital Assistant,個人數位助理)等行動裝置,為保護顯示器,而使用覆蓋玻璃。近年來,要求行動裝置向薄型化、輕量化之技術,並推進覆蓋玻璃之輕量化及薄板化。一般而言,若玻璃板變薄,則強度下降,故而要求較先前強度更高之覆蓋玻璃。 For mobile devices such as smart phones and mobile devices such as PDAs (Personal Digital Assistants), cover glasses are used to protect the display. In recent years, the technology for reducing the size and weight of mobile devices has been demanded, and the weight reduction and thinning of the cover glass have been promoted. In general, if the glass sheet is thinned, the strength is lowered, so that a cover glass having a higher strength than before is required.
作為提高玻璃板之強度之方法,開發有藉由離子交換法等將玻璃板化學強化之技術(例如專利文獻1)。於專利文獻1中,揭示有藉由利用化學強化於玻璃板之表面上形成壓縮應力層,而抑制彎曲,或不易破損之玻璃板及其製造方法。 As a method of improving the strength of a glass plate, a technique of chemically strengthening a glass plate by an ion exchange method or the like has been developed (for example, Patent Document 1). Patent Document 1 discloses a glass sheet which is formed by compressing a compressive stress layer on the surface of a glass sheet by chemical strengthening to suppress bending or is less likely to be broken, and a method for producing the same.
專利文獻1:日本專利特開平7-223845號公報 Patent Document 1: Japanese Patent Laid-Open No. Hei 7-223845
由於覆蓋玻璃於其主表面上受到相較於外部更大之應力,故而要求更高強度、更為輕量,本發明者等人發現:藉由於化學強化後或化學強化前進行蝕刻,可提高覆蓋玻璃之下述球環強度或邊緣強度,提高覆蓋玻璃之對於破裂之耐受性。 Since the cover glass is subjected to a larger stress on the main surface than the outside, it is required to have higher strength and lighter weight, and the inventors have found that the etching can be improved by etching after chemical strengthening or before chemical strengthening. The following ball ring strength or edge strength of the cover glass improves the resistance of the cover glass to cracking.
因此,本發明之目的在於提供一種可提高覆蓋玻璃之強度之化學強化玻璃之製造方法。 Accordingly, it is an object of the present invention to provide a method for producing a chemically strengthened glass which can improve the strength of a cover glass.
本發明者等人發現:藉由於將玻璃板化學強化後,蝕刻該玻璃板之表面(以下有稱為主表面之情形)及邊緣(以下有稱為端面之情形),可提高邊緣強度,抑制玻璃之破裂,並可高效率地獲得強度提高之覆蓋玻璃,從而完成本發明。 The present inventors have found that by chemically strengthening a glass plate, the surface of the glass plate (hereinafter referred to as a main surface) and the edge (hereinafter referred to as an end surface) can be etched to improve edge strength and suppress The invention is completed by rupturing the glass and efficiently obtaining a cover glass having an increased strength.
又,本發明者等人發現:藉由使用滿足特定之必要條件的組成之玻璃作為本發明之較佳態樣之一,可提高蝕刻率從而提高製造效率。進而,本發明者等人發現:藉由將玻璃之蝕刻量設為特定之範圍作為本發明之較佳態樣之一,可進一步提高玻璃之邊緣強度。 Further, the inventors of the present invention have found that by using a glass having a composition satisfying a specific requirement as one of the preferred aspects of the present invention, the etching rate can be increased to improve the production efficiency. Further, the inventors of the present invention have found that the edge strength of the glass can be further improved by setting the etching amount of the glass to a specific range as one of the preferred aspects of the present invention.
即,本發明如以下所述。 That is, the present invention is as follows.
1.一種化學強化玻璃之製造方法,其包括將玻璃化學強化之化學強化步驟,及於該化學強化步驟後,將該玻璃之表面及邊緣蝕刻之強化後蝕刻步驟。 A method for producing a chemically strengthened glass, comprising a chemical strengthening step of chemically strengthening a glass, and a post-enhancement etching step of etching the surface and the edge of the glass after the chemical strengthening step.
2.一種化學強化玻璃之製造方法,其係包括將玻璃化學強化之化學強化步驟,及於該化學強化步驟後,將該玻璃之表面及邊緣蝕刻之強化後蝕刻步驟者,該玻璃以下述氧化物基準之莫耳百分率表示,含有SiO2 55~80%、Al2O3 0~20%、B2O3 0~10%、MgO 0~15%、CaO 0~10%、Li2O 0~20%、Na2O 0~25%、K2O 0~15%、ZrO2 0~10%,Li2O及Na2O之含量之合計為8~25%,使用SiO2之含量、Li2O、Na2O及K2O之含量之合計R2O及ZrO2之含量藉由下述式算出之e為73以下。 A method for producing a chemically strengthened glass, comprising: a chemical strengthening step of chemically strengthening a glass, and a step of strengthening the etching after etching the surface and the edge of the glass after the chemical strengthening step, the glass is oxidized by The molar percentage of the material reference is SiO 2 55-80%, Al 2 O 3 0-20%, B 2 O 3 0-10%, MgO 0-15%, CaO 0-10%, Li 2 O 0 ~20%, Na 2 O 0~25%, K 2 O 0~15%, ZrO 2 0~10%, the total content of Li 2 O and Na 2 O is 8~25%, using the content of SiO 2 , The total content of Li 2 O, Na 2 O, and K 2 O is calculated by the following formula, and the content of R 2 O and ZrO 2 is 73 or less.
e=SiO2+0.3×R2O+0.15×ZrO2 e = SiO 2 + 0.3 × R 2 O + 0.15 × ZrO 2
3.如前項2所記載之化學強化玻璃之製造方法,其中上述玻璃之 MgO及CaO之含量之合計為0~15%。 3. The method for producing a chemically strengthened glass according to the above item 2, wherein the glass is The total content of MgO and CaO is 0 to 15%.
4.如前項2或3所記載之化學強化玻璃之製造方法,其中上述玻璃之Li2O、Na2O及K2O之含量之合計為25%以下。 4. The method for producing a chemically strengthened glass according to the above item 2, wherein the total content of Li 2 O, Na 2 O and K 2 O in the glass is 25% or less.
5.如前項2至4中任一項所記載之化學強化玻璃之製造方法,其中上述玻璃之Na2O為0~20%、K2O為0~10%、ZrO2為0~5%。 5. The method for producing a chemically strengthened glass according to any one of the preceding items, wherein the glass has a Na 2 O of 0 to 20%, a K 2 O of 0 to 10%, and a ZrO 2 of 0 to 5%. .
6.如前項2至5中任一項所記載之化學強化玻璃之製造方法,其中上述玻璃之ZrO2為0~2.5%。 The method for producing a chemically strengthened glass according to any one of the preceding claims, wherein the glass has a ZrO 2 of 0 to 2.5%.
7.一種化學強化玻璃之製造方法,其包括將玻璃化學強化之化學強化步驟,及於該化學強化步驟後,將該玻璃之表面及邊緣蝕刻4μm以上之強化後蝕刻步驟。 A method for producing a chemically strengthened glass, comprising a chemical strengthening step of chemically strengthening a glass, and a post-enhancement etching step of etching the surface and the edge of the glass by 4 μm or more after the chemical strengthening step.
8.如前項7所記載之化學強化玻璃之製造方法,其中上述玻璃為玻璃板,於化學強化步驟與強化後蝕刻步驟之間包括利用具有1000號以上之較粗粒度的研磨材料將該玻璃板之主表面與端面之交叉部分進行精研磨之主表面端部研磨步驟。 8. The method for producing a chemically strengthened glass according to the above item 7, wherein the glass is a glass plate, and the glass plate is used between the chemical strengthening step and the post-intensification etching step by using an abrasive material having a coarser particle size of 1000 or more. The main surface end grinding step of the fine grinding is performed at the intersection of the main surface and the end surface.
9.如前項7或8所記載之化學強化玻璃之製造方法,其中上述玻璃為玻璃板,於化學強化步驟與強化後蝕刻步驟之間包括以該玻璃板之主表面與端面之交叉部分之表面粗糙度Ra成為0.1~30μm之方式進行精研磨之主表面端部研磨步驟。 9. The method for producing a chemically strengthened glass according to the above item 7 or 8, wherein the glass is a glass plate, and a surface of the intersection of the main surface and the end surface of the glass plate is included between the chemical strengthening step and the post-intensification etching step. The main surface end grinding step of performing the finish polishing in such a manner that the roughness Ra is 0.1 to 30 μm.
10.如前項8或9所記載之化學強化玻璃之製造方法,其中於上述強化後蝕刻步驟中,將上述玻璃板之表面及邊緣蝕刻30μm以下。 10. The method for producing a chemically strengthened glass according to the above item 8, wherein the surface and the edge of the glass plate are etched by 30 μm or less in the post-enhancement etching step.
11.如前項1至10中任一項所記載之化學強化玻璃之製造方法,其中上述化學強化玻璃為經化學強化之覆蓋玻璃。 The method for producing a chemically strengthened glass according to any one of the preceding claims, wherein the chemically strengthened glass is a chemically strengthened cover glass.
12.一種化學強化玻璃之製造方法,其包含將玻璃板之表面及邊緣濕式蝕刻7μm以上之強化前蝕刻步驟,及於該蝕刻步驟後,將玻璃板化學強化之化學強化步驟。 A method for producing a chemically strengthened glass, comprising: a pre-reinforcing etching step of wet etching a surface and an edge of a glass sheet of 7 μm or more, and a chemical strengthening step of chemically strengthening the glass sheet after the etching step.
13.如前項12所記載之化學強化玻璃之製造方法,其中於上述強化前蝕刻步驟中,將上述玻璃板之表面及邊緣蝕刻50μm以下。 The method for producing a chemically strengthened glass according to the above item 12, wherein the surface and the edge of the glass sheet are etched by 50 μm or less in the pre-reinforcing etching step.
14.如前項12或13所記載之化學強化玻璃之製造方法,其中於上述強化前蝕刻步驟中,將上述玻璃板之表面及邊緣蝕刻10~40μm。 The method for producing a chemically strengthened glass according to the above item 12 or 13, wherein in the pre-reinforcing etching step, the surface and the edge of the glass plate are etched by 10 to 40 μm.
15.如前項1至14中任一項所記載之化學強化玻璃之製造方法,其中上述化學強化玻璃表面之算術平均粗糙度Ra為1nm以下。 The method for producing a chemically strengthened glass according to any one of the preceding claims, wherein the surface of the chemically strengthened glass has an arithmetic mean roughness Ra of 1 nm or less.
16.如前項1至15中任一項所記載之化學強化玻璃之製造方法,其中上述玻璃之於25℃之5% HF水溶液中之蝕刻率為0.50μm/cm2/min以上。 The method for producing a chemically strengthened glass according to any one of the preceding claims, wherein the glass has an etching rate of 0.50 μm/cm 2 /min or more in a 5% aqueous HF solution at 25 ° C.
根據本發明之覆蓋玻璃之製造方法,藉由將玻璃化學強化後,將玻璃之表面及邊緣蝕刻,可抑制過剩之蝕刻所導致之表面粗糙並且使龜裂之頂端鈍化,因此可高效率地獲得球環強度或邊緣強度較高,且對於破裂之耐受性提高之覆蓋玻璃。 According to the method for producing a cover glass of the present invention, by chemically strengthening the glass, the surface and the edge of the glass are etched, whereby surface roughness caused by excessive etching can be suppressed and the top end of the crack can be passivated, so that the glass can be efficiently obtained. A cover glass having a high ring strength or edge strength and improved resistance to cracking.
又,作為本發明之第一實施態樣,以下述氧化物基準之莫耳百分率表示,將玻璃設為含有SiO2 55~80%、Al2O3 0~20%、B2O3 0~10%、MgO 0~15%、CaO 0~10%、Li2O 0~20%、Na2O 0~25%、K2O 0~15%、ZrO2 0~10%,Li2O及Na2O之含量之合計為8~25%,使用SiO2之含量、Li2O、Na2O及K2O之含量之合計R2O及ZrO2之含量藉由下述式算出之e為73以下之玻璃,藉此可提高蝕刻率而縮短蝕刻處理所需要之時間,從而提高製造效率。 Further, as a first embodiment of the present invention, the glass has a molar percentage of the following oxides, and the glass is made to contain SiO 2 55 to 80%, Al 2 O 3 0 to 20%, and B 2 O 3 0~. 10%, MgO 0~15%, CaO 0~10%, Li 2 O 0~20%, Na 2 O 0~25%, K 2 O 0~15%, ZrO 2 0~10%, Li 2 O and The total content of Na 2 O is 8 to 25%, and the content of SiO 2 , the total content of Li 2 O, Na 2 O, and K 2 O, and the contents of R 2 O and ZrO 2 are calculated by the following formula: The glass is 73 or less, whereby the etching rate can be increased and the time required for the etching process can be shortened, thereby improving the manufacturing efficiency.
e=SiO2+0.3×R2O+0.15×ZrO2 e = SiO 2 + 0.3 × R 2 O + 0.15 × ZrO 2
又,作為本發明之第二實施態樣,藉由將強化後蝕刻步驟中之玻璃之表面及邊緣之蝕刻量設為4μm以上,於玻璃為玻璃板之情形,即便不對其邊緣,尤其是玻璃板之表面與邊緣之交叉部分進行鏡面研磨,亦可進一步提高玻璃之邊緣強度。 Further, as a second embodiment of the present invention, the etching amount of the surface and the edge of the glass in the post-enhancement etching step is set to 4 μm or more, in the case where the glass is a glass plate, even if the edge is not used, especially glass. The mirror-grinding of the intersection of the surface and the edge of the panel further enhances the edge strength of the glass.
1、10‧‧‧玻璃板 1, 10‧‧‧ glass plate
2‧‧‧加壓治具 2‧‧‧ Pressing fixture
3‧‧‧承受治具 3‧‧‧Resistance
11‧‧‧倒角部 11‧‧‧Chamfering
12‧‧‧主表面 12‧‧‧Main surface
13‧‧‧端面 13‧‧‧ end face
14‧‧‧主表面端部 14‧‧‧Main surface end
D1‧‧‧表面層之厚度 D1‧‧‧ thickness of the surface layer
D2‧‧‧背面層之厚度 D2‧‧‧ Thickness of the back layer
D‧‧‧玻璃板之厚度 D‧‧‧ Thickness of glass plate
S1‧‧‧表面層之最大殘留壓縮應力 Maximum residual compressive stress of S1‧‧‧ surface layer
S2‧‧‧背面層之最大殘留壓縮應力 S2‧‧‧ Maximum residual compressive stress on the back layer
S‧‧‧化學強化後之玻璃板之殘留應力 S‧‧‧Residual stress of glass plates after chemical strengthening
T‧‧‧平均殘留拉伸應力 T‧‧‧ average residual tensile stress
圖1係對覆蓋玻璃所產生之4種破碎模式進行說明之圖。 Fig. 1 is a view for explaining four types of fracture modes produced by covering glass.
圖2係例示化學強化後之玻璃板之殘留應力的厚度方向分佈之模式圖。 Fig. 2 is a schematic view showing a thickness direction distribution of residual stress of a glass plate after chemical strengthening.
圖3係用以說明強度試驗之方法之概略圖。 Fig. 3 is a schematic view for explaining a method of strength test.
圖4係表示供至化學強化之玻璃之組成與蝕刻率之相關之圖表。 Figure 4 is a graph showing the correlation between the composition of the glass for chemical strengthening and the etching rate.
圖5係表示表現玻璃之組成之式e(SiO2+0.3×R2O+0.15×ZrO2)與蝕刻率之相關性之圖表。 Fig. 5 is a graph showing the correlation between the expression e (SiO 2 + 0.3 × R 2 O + 0.15 × ZrO 2 ) representing the composition of the glass and the etching rate.
圖6係用以說明本發明之第二實施態樣之較佳態樣的玻璃板之剖面圖。 Figure 6 is a cross-sectional view of a glass sheet for explaining a preferred embodiment of the second embodiment of the present invention.
圖7(a)及(b)係表示強化後蝕刻量與強度提高比率之相關關係之圖表。 7(a) and 7(b) are graphs showing the correlation between the amount of etching after strengthening and the ratio of improvement in strength.
以下,對本發明之化學強化玻璃之製造方法的較佳實施形態進行說明。 Hereinafter, preferred embodiments of the method for producing a chemically strengthened glass of the present invention will be described.
本發明係關於一種覆蓋玻璃之製造方法,其包括將玻璃化學強化之化學強化步驟,及於該化學強化步驟後,將該玻璃之表面及邊緣蝕刻之強化後蝕刻步驟。 The present invention relates to a method for producing a cover glass comprising a chemical strengthening step of chemically strengthening a glass, and a post-enhancement etching step of etching the surface and edges of the glass after the chemical strengthening step.
其次,關於本發明之玻璃之組成,若無特別說明,則使用莫耳百分率表示含量進行說明。 Next, the composition of the glass of the present invention will be described using a percentage of the molar percentage unless otherwise specified.
於本發明之第一實施態樣中,玻璃之組成以下述氧化物基準之莫耳百分率表示,含有SiO2 55~80%、Al2O3 0~20%、B2O3 0~10%、MgO 0~15%、CaO 0~10%、Li2O 0~20%、Na2O 0~25%、K2O 0~15%、ZrO2 0~10%,Li2O及Na2O之含量之合計為8~25%,上述e為73以下。 In the first embodiment of the present invention, the composition of the glass is expressed by the molar percentage of the following oxide standard, and contains SiO 2 55 to 80%, Al 2 O 3 0 to 20%, and B 2 O 3 0 to 10%. , MgO 0~15%, CaO 0~10%, Li 2 O 0~20%, Na 2 O 0~25%, K 2 O 0~15%, ZrO 2 0~10%, Li 2 O and Na 2 The total content of O is 8 to 25%, and the above e is 73 or less.
SiO2為構成玻璃之骨格之成分,係必需者,又,為減少於玻璃表面上留下損傷(壓痕)時之龜裂之產生或減小化學強化後留下壓痕時之破碎率之成分。SiO2未達55%時,作為玻璃之穩定性或耐候性或碎片耐受性下降。SiO2較佳為58%以上,更佳為60%以上。SiO2超過80%時,玻璃之黏性增大而熔融性降低。就提高蝕刻率之觀點而言較典型為75%以下。 SiO 2 is a component of the skeleton constituting the glass, and is required to reduce the occurrence of cracks when the damage (indentation) is left on the surface of the glass or to reduce the fracture rate when the indentation is left after chemical strengthening. ingredient. When the SiO 2 is less than 55%, the stability or weather resistance or chip resistance of the glass is lowered. The SiO 2 is preferably 58% or more, more preferably 60% or more. When SiO 2 exceeds 80%, the viscosity of the glass increases and the meltability decreases. It is typically 75% or less from the viewpoint of increasing the etching rate.
Al2O3雖非必需者,但為用於提高離子交換性能及碎片耐受性之有效之成分,為增大表面壓縮應力之成分,或為減小留下壓痕時之龜裂產生率之成分。含有Al2O3之情形,較佳為其含量為5%以上。Al2O3超過20%時,玻璃之黏性變高而均質之熔融變得困難。Al2O3較佳為17%以下,較典型為13%以下。 Although Al 2 O 3 is not essential, it is an effective component for improving ion exchange performance and chip resistance, in order to increase the surface compressive stress component, or to reduce the crack generation rate when leaving an indentation. The ingredients. In the case of containing Al 2 O 3 , the content thereof is preferably 5% or more. When Al 2 O 3 exceeds 20%, the viscosity of the glass becomes high and it becomes difficult to homogenize the melting. Al 2 O 3 is preferably 17% or less, and more typically 13% or less.
B2O3雖非必需者,但為了高溫下之熔融性或玻璃強度之提高等,亦可於10%以下之範圍內含有。B2O3超過10%時,有變得不易於獲得均質之玻璃,而玻璃之成型變得困難之虞,或有龜裂耐受性降低之虞。較典型為不含有B2O3。 Although B 2 O 3 is not essential, it may be contained in a range of 10% or less in order to improve the meltability at high temperature or the strength of the glass. When B 2 O 3 exceeds 10%, it becomes difficult to obtain a homogeneous glass, and molding of glass becomes difficult, or crack resistance is lowered. More typically it does not contain B 2 O 3 .
MgO雖非必需者,但為增大表面壓縮應力之成分,或為提高熔融性之成分。於欲降低高溫下之黏性,並獲得較高表面應力之情形時,較佳為含有MgO 1%以上,更佳為2%以上,進而較佳為4%以上。又,MgO超過15%時,有玻璃變得易於失透,或硝酸鉀熔融鹽中之NaNO3濃度所導致之表面壓縮應力之變化變大之虞,較佳為13%以下。 Although MgO is not essential, it is a component that increases the surface compressive stress or a component that improves the meltability. When it is desired to lower the viscosity at a high temperature and obtain a high surface stress, it is preferably contained in an amount of 1% or more, more preferably 2% or more, and still more preferably 4% or more. Further, when the MgO exceeds 15%, the glass tends to be devitrified, or the change in the surface compressive stress due to the NaNO 3 concentration in the molten salt of potassium nitrate becomes large, preferably 13% or less.
CaO雖非必需者,但為了提高高溫下之熔融性,或變得不易於引起失透,亦可於10%以下之範圍內含有。CaO超過10%時,離子交換速度或對於龜裂產生之耐受性降低。 Although CaO is not essential, it may be contained in a range of 10% or less in order to improve the meltability at a high temperature or to cause devitrification. When CaO exceeds 10%, the ion exchange rate or the resistance to cracking is lowered.
MgO及CaO之含量之合計較佳為15%以下。超過15%時,有離子交換速度變慢,用於獲得所期望之應力層深度之時間變得過長之虞。 The total content of MgO and CaO is preferably 15% or less. When it exceeds 15%, the ion exchange rate becomes slow, and the time for obtaining the desired stress layer depth becomes too long.
Li2O及Na2O為離子交換成分,必須含有至少任一成分。Li2O及Na2O之含量合計未達8%時,變得難以藉由離子交換而形成所期望之表面壓縮應力層。Li2O及Na2O之合計超過25%時,有耐候性變得不充分之虞。 Li 2 O and Na 2 O are ion exchange components and must contain at least one component. When the total content of Li 2 O and Na 2 O is less than 8%, it becomes difficult to form a desired surface compressive stress layer by ion exchange. When the total of Li 2 O and Na 2 O exceeds 25%, the weather resistance is insufficient.
Li2O為藉由離子交換形成表面壓縮應力層,或提高玻璃之熔融性之成分。含有Li2O之情形,其含量較佳為9%以上,更佳為10%以上。Li2O超過20%時,耐候性降低,或變得易於由壓痕產生龜裂。較佳為17%以下。 Li 2 O is a component that forms a surface compressive stress layer by ion exchange or increases the meltability of the glass. In the case of containing Li 2 O, the content thereof is preferably 9% or more, more preferably 10% or more. When Li 2 O exceeds 20%, the weather resistance is lowered or cracking is easily caused by the indentation. It is preferably 17% or less.
Na2O為藉由離子交換形成表面壓縮應力層,或提高玻璃之熔融性之成分。含有Na2O之情形,其含量較佳為8%以上,更佳為9%以上。Na2O超過25%時,耐候性降低,或變得易於由壓痕產生龜裂。較佳為20%以下。 Na 2 O is a component that forms a surface compressive stress layer by ion exchange or increases the meltability of the glass. In the case of containing Na 2 O, the content thereof is preferably 8% or more, more preferably 9% or more. When Na 2 O exceeds 25%, the weather resistance is lowered or cracking is easily caused by the indentation. It is preferably 20% or less.
K2O雖非必需者,但為了增大離子交換速度,亦可於15%以下之範圍內含有。超過15%時,有變得易於由壓痕產生龜裂,或硝酸鉀熔融鹽中之NaNO3濃度所導致之表面壓縮應力之變化變大之虞。K2O較佳為10%以下,更佳為6%以下,較典型為3%以下。於欲減小硝酸鉀熔融鹽中之NaNO3濃度所導致之表面壓縮應力之變化之情形時,較佳為不含有K2O。 Although K 2 O is not essential, it may be contained in a range of 15% or less in order to increase the ion exchange rate. When more than 15%, it becomes easy to have cracks by the indentation, or potassium nitrate molten salt of NaNO the resulting surface compressive stress change becomes large danger 3 concentration. K 2 O is preferably 10% or less, more preferably 6% or less, and is more typically 3% or less. In the case where it is desired to reduce the change in surface compressive stress caused by the concentration of NaNO 3 in the molten salt of potassium nitrate, it is preferred that K 2 O is not contained.
較佳為Li2O、Na2O及K2O之含量之合計R2O為25%以下。超過25%時,有耐候性變得不充分之虞。 Preferably Li 2 O, Na 2 O and K 2 O content of the sum of R 2 O is 25% or less. When it exceeds 25%, the weather resistance becomes insufficient.
ZrO2雖非必需者,但為了降低高溫下之黏性,或為了增大表面壓縮應力,亦可於最多為10%之範圍內含有。ZrO2超過10%時,有由壓痕產生龜裂之可能性變高之虞。較佳為5%以下,更佳為2.5%以下。 Although ZrO 2 is not essential, it may be contained in a range of up to 10% in order to lower the viscosity at a high temperature or to increase the surface compressive stress. When ZrO 2 exceeds 10%, there is a possibility that cracks may occur due to indentation. It is preferably 5% or less, more preferably 2.5% or less.
本發明之玻璃本質上包含以上所說明之成分,但亦可於無損本發明之目的之範圍內含有其他成分。於含有此種成分之情形時,較佳為該等成分之含量之合計未達2%,更佳為1%以下。以下,對上述其 他成分例示性地進行說明。 The glass of the present invention essentially comprises the components described above, but may contain other components within the scope not detracting from the object of the present invention. In the case of containing such a component, it is preferred that the total content of the components is less than 2%, more preferably 1% or less. Following, for the above His components are illustrated illustratively.
為了提高玻璃之高溫下之熔融性,亦有例如含有最多為2%之ZnO之情形,較佳為1%以下,於以浮式法製造之情形等時,較佳為設為0.5%以下。ZnO超過0.5%時,有浮式法成型時進行還原而成為製品缺點之虞。較典型為不含有ZnO。 In order to increase the meltability at a high temperature of the glass, for example, it is preferable to contain ZnO of at most 2%, preferably 1% or less, and when it is produced by a floating method, it is preferably 0.5% or less. When ZnO exceeds 0.5%, it is reduced by float-forming, which is a defect of the product. More typically, it does not contain ZnO.
藉由TiO2與存在於玻璃中之Fe離子共存,有降低可見光穿透率,使玻璃著色為褐色之虞,故而即便含有,亦較佳為1%以下,較典型為不含有。 By coexisting TiO 2 with Fe ions present in the glass, the visible light transmittance is lowered and the glass is colored brown. Therefore, even if it is contained, it is preferably 1% or less, and is typically not contained.
視需要可含有SrO,但由於其相較於MgO及CaO,降低離子交換速度之效果更大,故而即便於含有之情形,亦較佳為其含量未達1%。較典型為不含有SrO。 SrO may be contained as needed, but since it has a greater effect of lowering the ion exchange rate than MgO and CaO, it is preferably less than 1% even in the case of inclusion. More typically it does not contain SrO.
由於BaO於鹼土類金屬氧化物之中降低離子交換速度之效果最大,故而設為不含有BaO,或即便於含有之情形,亦較佳為其含量設為未達1%。 Since BaO has the largest effect of lowering the ion exchange rate among the alkaline earth metal oxides, it is considered that BaO is not contained, or even if it is contained, the content is preferably less than 1%.
含有SrO或BaO之情形,較佳為該等之含量之合計為1%以下,更佳為未達0.3%。 In the case of containing SrO or BaO, the total content of these is preferably 1% or less, more preferably less than 0.3%.
於含有CaO、SrO、BaO及ZrO2中任一個以上之情形,較佳為該等4成分之含量之合計未達1.5%。該合計為1.5%以上時,有離子交換速度降低之虞,較典型為1%以下。 In the case where any one of CaO, SrO, BaO and ZrO 2 is contained, it is preferred that the total content of the four components is less than 1.5%. When the total amount is 1.5% or more, the ion exchange rate is lowered, and it is typically 1% or less.
亦可適當含有SO3、氯化物或氟化物等作為玻璃熔融之時之澄清劑。然而,為了提高觸控面板等顯示器裝置之可見度,較佳為儘量減少可以於可見光範圍中能吸收之Fe2O3、NiO或Cr2O3等原料中之雜質之形式而混入之成分,各自以質量百分率表示較佳為0.15%以下,更佳為0.05%以下。 It is also possible to suitably contain SO 3 , a chloride or a fluoride as a clarifying agent at the time of melting the glass. However, in order to improve the visibility of a display device such as a touch panel, it is preferable to minimize the components mixed in the form of impurities in a raw material such as Fe 2 O 3 , NiO or Cr 2 O 3 which can be absorbed in the visible light range. The mass percentage is preferably 0.15% or less, more preferably 0.05% or less.
本發明者等人對根據表示玻璃之組成之下述式而算出的e與蝕刻率之相關性進行解析,結果可知有如圖5所示之相關關係。如圖5所 示,若e超過73,則有蝕刻率變得小於0.5μm/cm2/min,玻璃之蝕刻所需要之時間變長之虞。因此,於本發明之第一實施態樣中,對於玻璃之組成,使用SiO2、R2O及ZrO2之各含量藉由下述式而算出之e為73以下,較佳為72以下。 The present inventors analyzed the correlation between e and the etching rate calculated based on the following formula indicating the composition of the glass, and as a result, it was found that there is a correlation as shown in FIG. 5. As shown in FIG. 5, when e exceeds 73, the etching rate becomes less than 0.5 μm/cm 2 /min, and the time required for etching of the glass becomes long. Therefore, in the first embodiment of the present invention, the content of each of SiO 2 , R 2 O and ZrO 2 used for the composition of the glass is 73 or less, preferably 72 or less, calculated by the following formula.
e=SiO2+0.3×R2O+0.15×ZrO2 e = SiO 2 + 0.3 × R 2 O + 0.15 × ZrO 2
作為供於化學強化處理之玻璃,例如使用以下之組成之玻璃。 As the glass to be subjected to the chemical strengthening treatment, for example, a glass of the following composition is used.
(i)以莫耳%表示之組成計,包含50~80%之SiO2、0~25%之Al2O3、0~25%之Na2O、0~15%之RO之玻璃 (i) Glass containing 50 to 80% of SiO 2 , 0 to 25% of Al 2 O 3 , 0 to 25% of Na 2 O, and 0 to 15% of RO, based on the composition expressed by mole %
(ii)以莫耳%表示之組成計,包含SiO2 50~70%、Al2O3 0~25%、Na2O 0~25%、CaO 0~5%、Li2O 0~20%、K2O 0~15%、MgO 0~20%,及ZrO2 0~10%之玻璃 (ii) SiO 2 50~70%, Al 2 O 3 0~25%, Na 2 O 0~25%, CaO 0~5%, Li 2 O 0~20%, expressed in % by mole , K 2 O 0~15%, MgO 0~20%, and ZrO 2 0~10% glass
(iii)以莫耳%表示之組成,含有SiO2 55~70%、Al2O3 5~20%、Na2O 5~20%、CaO 0~1%、K2O 0~10%、MgO 0~15%及ZrO2 0~5%之玻璃 (iii) a composition expressed in mole %, containing 55 to 70% of SiO 2 , 5 to 20% of Al 2 O 3 , 5 to 20% of Na 2 O, 0 to 1% of CaO, and 0 to 10% of K 2 O, MgO 0~15% and ZrO 2 0~5% glass
(iv)以莫耳%表示之組成,含有SiO2 60~70%、Al2O3 5~20%、Na2O 5~20%、CaO 0~1%、K2O 0~5%、MgO 0~15%及ZrO2 0~3%之玻璃 (iv) a composition expressed in mole %, containing SiO 2 60-70%, Al 2 O 3 5-20%, Na 2 O 5-20%, CaO 0-1%, K 2 O 0-5%, MgO 0~15% and ZrO 2 0~3% glass
(v)以莫耳%表示之組成,含有SiO2 60~70%、Al2O3 5~20%、Na2O 5~20%、CaO 0~1%、K2O 0~5%、MgO 7~15%及ZrO2 0~3%之玻璃 (v) a composition expressed by mol%, containing SiO 2 60-70%, Al 2 O 3 5-20%, Na 2 O 5-20%, CaO 0-1%, K 2 O 0-5%, Glass with MgO 7~15% and ZrO 2 0~3%
(vi)以莫耳%表示之組成,含有SiO2 60~70%、Al2O3 5~20%、Na2O 5~20%、CaO 0~1%、K2O 0~5%、MgO 8~15%及ZrO2 0~3%之玻璃 (vi) a composition expressed in mole %, containing SiO 2 60-70%, Al 2 O 3 5-20%, Na 2 O 5-20%, CaO 0-1%, K 2 O 0-5%, Glass of MgO 8~15% and ZrO 2 0~3%
(vii)以莫耳%表示之組成計,含有SiO2 50~70%、Al2O3 0~25%、Na2O 0~25%、CaO 0~5%、Li2O 0~20%、K2O 0~15%、MgO 0~20%、及ZrO2 0~10%,不含有LiO2之玻璃 (vii) SiO 2 50~70%, Al 2 O 3 0~25%, Na 2 O 0~25%, CaO 0~5%, Li 2 O 0~20%, based on the composition of Moh% , K 2 O 0~15%, MgO 0~20%, and ZrO 2 0~10%, glass without LiO 2
(viii)以莫耳%表示之組成,含有SiO2 60~70%、Al2O3 5~20%、Na2O 5~20%、CaO 0~1%、K2O 0~5%、MgO 0~15%及ZrO2 0~3%,不含有LiO2之玻璃 (viii) a composition expressed by mol%, containing SiO 2 60-70%, Al 2 O 3 5-20%, Na 2 O 5-20%, CaO 0-1%, K 2 O 0-5%, MgO 0~15% and ZrO 2 0~3%, glass without LiO 2
以下,對玻璃為板狀之情形,即玻璃為玻璃板,尤其是覆蓋玻璃之情形進行說明,但本發明並非限定於此,例如亦可為玻璃容器。玻璃板藉由浮式法、熔融下拉法、狹縫下拉法或再曳引法等方法製作。 Hereinafter, the case where the glass is in the form of a plate, that is, the glass is a glass plate, in particular, the cover glass is described. However, the present invention is not limited thereto, and may be, for example, a glass container. The glass plate is produced by a floating method, a melt down method, a slit down method, or a re-drawing method.
又,玻璃板之厚度根據用途而有所不同,於行動電話等之覆蓋玻璃用途之情形,通常較佳為0.2mm~2.5mm。 Further, the thickness of the glass plate varies depending on the application, and is preferably 0.2 mm to 2.5 mm in the case of covering a glass for use in a mobile phone or the like.
於化學強化步驟中,對玻璃之表面進行離子交換,從而形成壓縮應力殘留之表面層。具體而言,以玻璃轉移點以下之溫度,藉由離子交換將玻璃板表面之離子半徑較小之鹼金屬離子(典型而言,Li離子、Na離子)取代為離子半徑更大之鹼離子(典型而言,相對於Li離子為Na離子或K離子,相對於Na離子為K離子)。藉此,於玻璃之表面殘留壓縮應力,且提高玻璃之強度。 In the chemical strengthening step, the surface of the glass is ion-exchanged to form a surface layer of residual compressive stress. Specifically, alkali metal ions (typically Li ions, Na ions) having a smaller ionic radius on the surface of the glass plate are replaced by ion exchanges with alkali ions having a larger ionic radius by ion exchange at a temperature below the glass transition point ( Typically, it is a Na ion or a K ion with respect to Li ions, and a K ion with respect to a Na ion. Thereby, the compressive stress remains on the surface of the glass, and the strength of the glass is increased.
圖2表示顯示化學強化後之玻璃板之殘留應力S的厚度方向分佈之模式圖。於圖2中,分別有S1表示玻璃板之一面層(稱為表面層)之最大殘留壓縮應力、S2表示另一面層(稱為背面層)之最大殘留壓縮應力(通常,S1=S2),D1表示表面層之厚度,D2表示背面層之厚度,D表示玻璃板之厚度,T表示存在於表面層與背面層之間之中間層之平均殘留拉伸應力。又,圖2中之水平軸表示以表面層為基準點(=0)之情形之板厚方向之距離。 Fig. 2 is a schematic view showing the thickness direction distribution of the residual stress S of the glass plate after chemical strengthening. In FIG. 2, S1 respectively represents the maximum residual compressive stress of one surface layer (referred to as a surface layer) of the glass sheet, and S2 represents the maximum residual compressive stress of the other surface layer (referred to as a back layer) (normally, S1=S2), D1 represents the thickness of the surface layer, D2 represents the thickness of the back layer, D represents the thickness of the glass sheet, and T represents the average residual tensile stress of the intermediate layer existing between the surface layer and the back layer. Further, the horizontal axis in Fig. 2 indicates the distance in the thickness direction in the case where the surface layer is the reference point (=0).
如圖2所示,殘留於表面層或背面層之壓縮應力有自表面及背面朝向內部緩緩地變小之傾向。另一方面,作為形成殘留壓縮應力之表面層及背面層等之反作用,於表面層與背面層之間,形成殘留拉伸應 力之中間層。此時,殘留於中間層之拉伸應力大致成為一定。 As shown in FIG. 2, the compressive stress remaining in the surface layer or the back layer tends to gradually decrease from the front surface and the back surface toward the inside. On the other hand, as a reaction between the surface layer and the back layer which form residual compressive stress, a residual stretch is formed between the surface layer and the back layer. The middle layer of force. At this time, the tensile stress remaining in the intermediate layer is substantially constant.
圖2中之S1、S2(通常S2=S1)、D1、D2(通常D2=D1)、T可利用強化處理條件進行調節,熟知本技藝者可利用化學強化用之處理液之濃度或溫度,或者將化學強化用之玻璃浸漬於處理液中之時間等進行調節。 In Fig. 2, S1, S2 (usually S2 = S1), D1, D2 (usually D2 = D1), and T can be adjusted by using enhanced treatment conditions, and those skilled in the art can utilize the concentration or temperature of the treatment liquid for chemical strengthening. Alternatively, the glass for chemical strengthening is immersed in the treatment liquid for adjustment.
化學強化之條件及方法並無特別限定,可使用眾所周知之方法。作為化學強化之方法,若為可將玻璃表層之Li2O或Na2O與熔融鹽中之Na2O或K2O進行離子交換者,則並無特別限定,例如,可列舉將玻璃浸漬於經加熱之硝酸鉀(KNO3)熔融鹽中之方法。 The conditions and methods for chemical strengthening are not particularly limited, and well-known methods can be used. The method of chemical strengthening is not particularly limited as long as it can ion-exchange Li 2 O or Na 2 O in the glass surface layer with Na 2 O or K 2 O in the molten salt. For example, the glass is impregnated. A method of heating potassium nitrate (KNO 3 ) molten salt.
用以於玻璃上形成具有所期望之表面壓縮應力之化學強化層(表面壓縮應力層)之離子交換處理之條件雖根據玻璃之厚度而有所不同,但溫度條件較佳為520℃以下,更佳為500℃以下,又,較佳為350℃以上,更佳為400℃以上。 The conditions of the ion exchange treatment for forming the chemical strengthening layer (surface compressive stress layer) having the desired surface compressive stress on the glass vary depending on the thickness of the glass, but the temperature condition is preferably 520 ° C or lower. Preferably, it is 500 ° C or less, and more preferably 350 ° C or more, more preferably 400 ° C or more.
又,進行離子交換處理之時間較佳為1~72小時,更佳為2~24小時。為了提高生產性,較佳為12小時以下。作為熔融鹽,例如可列舉KNO3等。 Further, the time for performing the ion exchange treatment is preferably from 1 to 72 hours, more preferably from 2 to 24 hours. In order to improve productivity, it is preferably 12 hours or less. Examples of the molten salt include KNO 3 and the like.
具體而言,例如較典型為使玻璃浸漬於400~500℃之KNO3熔融鹽中1~72小時。又,於化學強化後,由於去除附著於玻璃板上之熔融鹽等附著物等之目的,較佳為利用水進行清洗。 Specifically, for example, the glass is typically immersed in a KNO 3 molten salt at 400 to 500 ° C for 1 to 72 hours. Further, after chemical strengthening, it is preferred to wash with water for the purpose of removing adhering substances such as molten salt adhered to the glass plate.
為了使化學強化所引起之強度提高效果成為有效者,較佳為具有相較於形成於玻璃表面之微龜裂更深之表面壓縮應力層,較佳為藉由化學強化產生之表面壓縮應力層之深度為6μm以上。又,若於使用時留下超過表面壓縮應力層之深度之損傷,則關係到玻璃之破碎,故而較佳為表面壓縮應力層較深,更佳為10μm以上,進而較佳為20μm以上,較典型為30μm以上。 In order to make the strength-enhancing effect by chemical strengthening effective, it is preferable to have a surface compressive stress layer deeper than the microcrack formed on the glass surface, preferably a surface compressive stress layer produced by chemical strengthening. The depth is 6 μm or more. Further, if the damage exceeding the depth of the surface compressive stress layer is left during use, the glass is broken. Therefore, the surface compressive stress layer is preferably deep, more preferably 10 μm or more, and still more preferably 20 μm or more. Typically it is 30 μm or more.
另一方面,若表面壓縮應力層較深,則內部拉伸應力變大,而 破碎時之衝擊變大。即,可知若內部拉伸應力較大,則於玻璃破碎時有成為碎片而粉碎地飛散之傾向。對於厚度1mm以下之玻璃,若表面壓縮應力層之深度超過70μm,則破碎時之飛散變得顯著。因此,本發明之覆蓋玻璃較佳為表面壓縮應力層之深度為70μm以下。 On the other hand, if the surface compressive stress layer is deep, the internal tensile stress becomes large, and The impact when broken is large. In other words, it is understood that when the internal tensile stress is large, it tends to be scattered and pulverized when the glass is broken. When the depth of the surface compressive stress layer exceeds 70 μm for a glass having a thickness of 1 mm or less, the scattering at the time of crushing becomes remarkable. Therefore, the cover glass of the present invention preferably has a surface compressive stress layer having a depth of 70 μm or less.
本發明之覆蓋玻璃亦根據包裝之電子機器,於例如在表面上留下接觸損傷之概率較高之面板等之用途中,為了安全亦考慮事先將表面壓縮應力層之深度變薄,更佳為60μm以下,進而較佳為50μm以下,較典型為40μm以下。 The cover glass of the present invention is also suitable for use in a packaged electronic device, for example, in a panel having a high probability of contact damage on the surface, and it is preferable to reduce the depth of the surface compressive stress layer in advance for safety. 60 μm or less, further preferably 50 μm or less, and more typically 40 μm or less.
再者,本發明之覆蓋玻璃之表面壓縮應力CS(單位:MPa)及壓縮應力層之厚度DOL(單位:μm)可藉由測定雙折射而測定。又,表面壓縮應力層之深度可使用EPMA(electron probe micro analyzer,電子探針微量分析儀)等而測定。 Further, the surface compressive stress CS (unit: MPa) of the cover glass of the present invention and the thickness DOL (unit: μm) of the compressive stress layer can be measured by measuring birefringence. Further, the depth of the surface compressive stress layer can be measured using an EPMA (electron probe micro analyzer) or the like.
將覆蓋玻璃之破裂分類為已分類之4種破碎模式(1.端面‧表面破裂、2.端面‧背面破裂、3.面‧背面破裂、4.面‧表面破裂)。以下,對4種破碎模式,一面參照圖1一面進行說明。 The rupture of the cover glass was classified into four types of fracture modes (1. end face ‧ surface rupture, 2. end face ‧ back rupture, 3. face ‧ back rupture, 4. face ‧ surface rupture) Hereinafter, four types of fracture modes will be described with reference to Fig. 1 .
端面‧表面破裂亦稱為赫茲破碎(赫茲龜裂破裂),係於向覆蓋玻璃之端面施加衝擊時,以產生於衝擊面(端面)之稱為赫茲錐之圓錐狀之斷裂面作為起點而產生破碎者。關於該端面‧表面破裂,可根據下述赫茲破裂試驗測定其耐受性。 End face ‧ Surface rupture, also known as Hertzian rupture (Hertz crack rupture), is generated when a shock is applied to the end face of the cover glass, and a conical fracture surface called a Hertz cone which is generated on the impact face (end face) is used as a starting point. Broken. Regarding the end face ‧ surface rupture, the tolerance can be measured according to the Hertz crack test described below.
端面‧背面破裂係於向覆蓋玻璃之端面施加衝擊時,以藉由於與衝擊面為相反側之非衝擊面(端面)產生之拉伸應力產生之損傷作為起點而產生破碎者。關於該端面‧背面破裂,可藉由下述之背面破裂試驗而測定其耐受性。 When the end surface ‧ the back surface rupture is applied to the end surface of the cover glass, the damage caused by the tensile stress generated by the non-impingement surface (end surface) on the opposite side to the impact surface is generated as a starting point. Regarding the end face ‧ back rupture, the resistance can be measured by the back crack test described below.
面‧背面破裂係於向覆蓋玻璃之主面施加衝擊時,以藉由於與衝擊面為相反側之非衝擊面(主面)產生之拉伸應力產生之損傷作為起點而產生破碎者。關於該面‧背面破裂,可藉由下述之落球試驗而測定其耐受性。 When the surface rupture is applied to the main surface of the cover glass, the damage is caused by the damage caused by the tensile stress generated by the non-impact surface (main surface) on the opposite side to the impact surface. Regarding the surface ‧ rupture of the back surface, the tolerance can be measured by the following ball drop test.
面‧表面破裂係於向覆蓋玻璃之主面施加衝擊時,以穿透壓縮應力層之損傷作為起點,玻璃以較慢之速度破裂之緩慢龜裂所導致之破裂(以下,亦將此種玻璃之破裂方法稱為緩慢龜裂破裂)。該緩慢龜裂破裂一般而言破裂破片較少,最典型為一條龜裂自破碎起點延伸,而附有觸摸傳感器之化學強化玻璃破裂為2片之現象,為用於行動電話、個人數位助理(PDA)或平板PC(Personal Computer,個人電腦)等具有觸控面板功能之顯示裝置之覆蓋玻璃中可見之較典型之破裂。 Surface ‧ surface rupture is caused by the impact of the crack that penetrates the compressive stress layer as the starting point and the slow cracking of the glass at a slower speed when the impact is applied to the main surface of the cover glass (hereinafter, this glass is also used) The method of rupture is called slow crack rupture). The slow cracking rupture generally has fewer rupture fragments, most typically one crack extends from the fracture starting point, and the chemically strengthened glass with the touch sensor is broken into two pieces, which is used for mobile phones, personal digital assistants ( A typical rupture visible in the cover glass of a display device having a touch panel function such as a PDA) or a tablet PC (Personal Computer).
供於藉由離子交換之化學強化之玻璃較佳為去除玻璃之表面上之損傷(龜裂)、或存在玻璃之彎曲或凹坑之層。例如,於玻璃之表面上,一般存在稱為格里菲思微裂紋之龜裂。對玻璃之表面施加拉伸應力之情形,於該龜裂處產生應力集中,從而龜裂發展,導致玻璃之破碎。 The glass for chemical strengthening by ion exchange is preferably a layer (cork) which removes the surface of the glass, or a layer of curved or pitped glass. For example, on the surface of glass, there is generally a crack called Griffith microcrack. In the case where tensile stress is applied to the surface of the glass, stress concentration occurs at the crack, and cracking progresses, resulting in breakage of the glass.
因此,於本發明之第二實施態樣中,藉此蝕刻將化學強化後之玻璃之表面上之損傷(龜裂)、或存在玻璃之彎曲或凹坑之層去除4μm以上,藉此可提高邊緣強度。於化學強化後蝕刻玻璃之表面及邊緣之層之厚度為4μm以上,較佳為5μm以上,更佳為7μm以上。 Therefore, in the second embodiment of the present invention, the damage (cracking) on the surface of the chemically strengthened glass or the layer in which the glass is bent or pitped is removed by etching by 4 μm or more, thereby improving Edge strength. The thickness of the layer which etches the surface and the edge of the glass after chemical strengthening is 4 μm or more, preferably 5 μm or more, and more preferably 7 μm or more.
於本發明之第二實施態樣中,較佳為於化學強化步驟與強化後蝕刻步驟之間包括利用具有1000號(JIS R6001,1996年)以上之較粗粒度之研磨劑將作為玻璃板之主表面與端面之交叉部分之主表面端部精 研磨之主表面端部研磨步驟。 In a second embodiment of the present invention, it is preferred to use an abrasive having a coarser particle size of 1000 (JIS R6001, 1996) or more as a glass plate between the chemical strengthening step and the post-intensification etching step. The main surface end of the intersection of the main surface and the end surface is fine Grinding the main surface end grinding step.
使用圖6說明第二實施態樣之較佳態樣之具體例。圖6係表示玻璃板10之剖面圖之圖。所謂主表面端部14,係指玻璃板10之主表面12與端面13之交叉部分,屬於端面13。端面13為玻璃板10之側面部,圖中之符號11為倒角部。 A specific example of a preferred embodiment of the second embodiment will be described using FIG. Fig. 6 is a view showing a cross-sectional view of the glass plate 10. The main surface end portion 14 is an intersection portion between the main surface 12 and the end surface 13 of the glass sheet 10 and belongs to the end surface 13. The end surface 13 is a side portion of the glass sheet 10, and reference numeral 11 in the figure is a chamfered portion.
由於主表面端部係成為破碎起點之可能性較高之處,故而於化學強化步驟與強化後蝕刻步驟之間包括利用具有1000號(JIS R6001,1996年)以上之較粗粒度之研磨劑將主表面端部精研磨之主表面端部研磨步驟,藉此可不對玻璃板端面進行鏡面研磨而提高玻璃板之邊緣強度。若利用較1000號(JIS R6001,1996年)粒度更小之研磨材料進行研磨,則進入所謂之鏡面研磨之區域,產生精研磨前之研磨步驟數或時間增多,精研磨步驟本身之時間變長等問題。 Since the main surface end portion is highly likely to be the starting point of the fracture, the use of the abrasive having a coarser particle size of No. 1000 (JIS R6001, 1996) or more is included between the chemical strengthening step and the post-intensification etching step. The main surface end grinding step of the main surface end is finely ground, whereby the edge strength of the glass sheet can be improved without mirror polishing the end face of the glass sheet. If grinding is carried out using an abrasive material having a smaller particle size than No. 1000 (JIS R6001, 1996), it enters the so-called mirror-polished area, and the number of grinding steps or time before the fine grinding is increased, and the time of the fine grinding step itself becomes long. And other issues.
作為具有較1000號(JIS R6001,1996年)更粗之粒度之研磨材料,具體而言,例如,可列舉800號及325號等。 Specific examples of the abrasive material having a coarser particle size than No. 1000 (JIS R6001, 1996) include, for example, No. 800 and No. 325.
於玻璃板10中,通常如圖6所示進行倒角加工,但倒角部11之形狀未限定,可進行所謂之R倒角(於具有曲率之變圓之面倒角),亦可不進行倒角。精研磨一般利用研磨石進行,但並非限定於此,例如亦可使用研磨布紙或研磨漿料進行。主表面端部14之研磨通常於端面13之研磨時同時進行。 In the glass sheet 10, chamfering is generally performed as shown in Fig. 6, but the shape of the chamfered portion 11 is not limited, so that a so-called R chamfering (chamfering on a surface having a curvature of a circle) may be performed, or may not be reversed. angle. Fine polishing is generally carried out using a grinding stone, but is not limited thereto, and may be carried out, for example, using a polishing cloth or a polishing slurry. The grinding of the main surface end portion 14 is usually performed simultaneously at the time of grinding of the end surface 13.
又,於本發明之第二實施態樣中,較佳為於化學強化步驟與強化後蝕刻步驟之間包括以玻璃板之主表面與端面之交叉部分之表面粗糙度Ra成為0.1~30μm之方式進行精研磨之主表面端部研磨步驟。更佳為Ra為0.2μm以上,進而較佳為10μm以下。由於主表面端部係成為破碎起點之可能性較高之處,故而藉由進行此種研磨,可提高玻璃板之邊緣強度。 Moreover, in the second embodiment of the present invention, it is preferable that the surface roughness Ra of the intersection of the main surface and the end surface of the glass plate is 0.1 to 30 μm between the chemical strengthening step and the post-intensification etching step. The main surface end grinding step of the fine grinding is performed. More preferably, Ra is 0.2 μm or more, and further preferably 10 μm or less. Since the main surface end portion is highly likely to be the starting point of the fracture, the edge strength of the glass sheet can be improved by performing such polishing.
藉由將Ra設為0.1μm以上,進入所謂之鏡面研磨之區域,雖有產 生精研磨前之研磨步驟數或時間增多,精研磨步驟本身之時間變長等問題之虞,但可防止此種問題。藉由將Ra設為30μm以下,可減小主表面端部成為破碎起點之可能性。 By setting Ra to 0.1 μm or more, it enters the so-called mirror-polished area, although it is produced. The number of grinding steps or the time before the polishing of the fine grinding is increased, and the time of the fine grinding step itself becomes long, but the problem can be prevented. By setting Ra to 30 μm or less, it is possible to reduce the possibility that the end of the main surface becomes the starting point of the fracture.
於第二實施態樣中,於化學強化後將玻璃之表面及邊緣濕式蝕刻之層之厚度較佳為30μm以下,更佳為20μm以下。藉由將其設為30μm以下,可防止利用325號之研磨材料等將主表面端部精研磨時,降低邊緣彎曲強度[圖7(b)]。 In the second embodiment, the thickness of the layer which is wet-etched on the surface and the edge of the glass after chemical strengthening is preferably 30 μm or less, more preferably 20 μm or less. By setting it to 30 μm or less, it is possible to prevent the edge bending strength from being lowered when the main surface end portion is polished by the polishing material No. 325 or the like [Fig. 7(b)].
利用325號之研磨材料進行精研磨時較佳為20μm以下[圖7(b)]。利用800號之研磨材料進行精研磨時較佳為7μm以下[圖7(a)]。再者,該蝕刻量較佳為壓縮應力層之深度之50%以下,更佳為30%以下。藉由設為50%以下,可防止邊緣彎曲強度降低。 When the finish polishing is performed using the abrasive material No. 325, it is preferably 20 μm or less [Fig. 7(b)]. When fine polishing is performed using the abrasive material of No. 800, it is preferably 7 μm or less [Fig. 7 (a)]. Further, the etching amount is preferably 50% or less, more preferably 30% or less, of the depth of the compressive stress layer. By setting it to 50% or less, the edge bending strength can be prevented from decreasing.
於本發明之第2實施態樣中,將化學強化後之玻璃蝕刻4μm以上,可使龜裂之頂端鈍化,降低龜裂頂端之應力集中,從而提高邊緣強度,故而可抑制由4種破碎模式所含之<1.端面‧表面破裂>、<2.端面‧背面破裂>導致之破裂。 In the second embodiment of the present invention, the chemically strengthened glass is etched by 4 μm or more, and the tip end of the crack can be passivated, and the stress concentration at the crack tip can be reduced, thereby improving the edge strength, thereby suppressing the four kinds of fracture modes. The crack caused by <1. end face ‧ surface rupture>, <2. end face ‧ back rupture>
藉由本發明之製造方法而獲得之覆蓋玻璃之邊緣強度較佳為400MPa以上,更佳為500MPa以上,進而較佳為600MPa以上。邊緣強度可藉由按照「JIS R 1601(2008年)精細陶瓷抗彎強度試驗方法」之三點彎曲試驗或四點彎曲試驗而測定。 The edge strength of the cover glass obtained by the production method of the present invention is preferably 400 MPa or more, more preferably 500 MPa or more, still more preferably 600 MPa or more. The edge strength can be measured by a three-point bending test or a four-point bending test in accordance with "JIS R 1601 (2008) Fine Ceramic Bending Strength Test Method".
<1,端面‧表面破裂>可藉由赫茲破裂試驗求出破裂強度。赫茲破裂試驗係藉由對玻璃端面撞擊超硬材料之細徑之圓柱棒而於玻璃端面之表面產生赫茲應力,藉此產生赫茲龜裂破裂者,可藉由圓柱棒之衝擊能量(撞擊能量J=高度m×重量kg×9.8m/s2)測定由<1.端面‧表面破裂>導致之耐受性。 <1, end face ‧ surface rupture> The rupture strength can be obtained by a Hertz crack test. The Hertz rupture test produces Hertzian stress on the surface of the glass end face by striking the cylindrical end face with a small diameter cylindrical rod of the superhard material, thereby generating a Hertz crack rupture, and the impact energy of the cylindrical rod (impact energy J) = height m × weight kg × 9.8 m / s 2 ) The tolerance caused by <1. end face ‧ surface rupture> was measured.
<2.端面‧背面破裂>可藉由背面破裂試驗求出破裂強度。背面破裂試驗係藉由對玻璃端面撞擊粗徑之超硬材料之圓柱棒而於玻璃端 面之背面側產生衝擊拉伸應力,從而產生端面‧背面破裂者,可藉由圓柱棒之衝擊能量(撞擊能量J=高度m×重量kg×9.8m/s2)測定由<2.端面‧背面破裂>導致之耐受性。 <2. End face ‧ back rupture> The rupture strength can be obtained by a back rupture test. The back rupture test produces impact tensile stress on the back side of the glass end face by striking the glass end face against the cylindrical rod of the super-hard material of the large diameter, thereby generating the end face ‧ back cracker, which can be impacted by the impact energy of the cylindrical rod Energy J = height m × weight kg × 9.8 m / s 2 ) The tolerance caused by <2. end face ‧ back rupture> was measured.
於本發明中,亦可於化學強化前將玻璃之表面及邊緣蝕刻。於化學強化前將玻璃之表面及邊緣蝕刻之層之厚度較佳為7μm以上,更佳為10μm以上,進而較佳為15μm以上。又,較佳為50μm以下,更佳為40μm以下。藉由將於化學強化前將玻璃之表面及邊緣蝕刻之層之厚度設為10μm以上,可提高玻璃之邊緣強度,提高對破裂之耐受性。又,藉由將於化學強化前蝕刻之層之厚度設為50μm以下,可使龜裂之頂端鈍化,更提高邊緣強度。 In the present invention, the surface and edges of the glass may also be etched prior to chemical strengthening. The thickness of the layer etched on the surface and the edge of the glass before chemical strengthening is preferably 7 μm or more, more preferably 10 μm or more, and still more preferably 15 μm or more. Further, it is preferably 50 μm or less, and more preferably 40 μm or less. By setting the thickness of the layer etched on the surface and the edge of the glass to 10 μm or more before chemical strengthening, the edge strength of the glass can be increased, and the resistance to cracking can be improved. Further, by setting the thickness of the layer to be etched before the chemical strengthening to 50 μm or less, the tip end of the crack can be made passivated, and the edge strength can be further improved.
藉由蝕刻化學強化前之玻璃從而去除含有缺陷及微細之凹凸之異質層,可減少成為破碎之起點之缺陷從而提高球環強度,故而可抑制4種破碎模式所含之<3.面‧背面破裂>導致之破裂。 By etching the chemically strengthened glass to remove the heterogeneous layer containing defects and fine concavities and convexities, the defects which become the starting point of the fracture can be reduced, and the strength of the ball ring can be improved, so that the back surface of the four types of fracture modes can be suppressed. Rupture> causes cracking.
藉由本發明之製造方法而獲得之覆蓋玻璃之球環強度較佳為2.0kN,更佳為2.2kN,進而較佳為2.4kN。藉由球環強度為2.0kN以上,可抑制<3.面‧背面破裂>導致之破裂。再者,球環強度於實施例中利用下述方法測定。 The strength of the spherical ring of the cover glass obtained by the production method of the present invention is preferably 2.0 kN, more preferably 2.2 kN, still more preferably 2.4 kN. By having a ball ring strength of 2.0 kN or more, cracking caused by <3. face ‧ back rupture> can be suppressed. Further, the ball ring strength was measured by the following method in the examples.
<3.面‧背面破裂>可藉由落球試驗求出破裂強度。落球試驗係藉由落球衝擊於玻璃之背面產生拉伸應力,藉此產生面‧背面破裂者,可藉由落球能量(落球能力J=高度m×重量kg×9.8m/s2)測定由<3.面‧背面破裂>導致之耐受性。 <3. Face ‧ Back rupture> The rupture strength can be obtained by the ball drop test. The ball drop test produces a tensile stress by impacting the ball against the back side of the glass, thereby producing a surface ‧ back crack, which can be determined by the falling ball energy (falling ability J = height m × weight kg × 9.8 m / s 2 ) 3. Face ‧ back rupture > cause tolerance.
於本發明之製造方法中,亦可於化學強化前、化學強化後兩者時包括蝕刻步驟。作為蝕刻液,較佳為含有選自氫氟酸(HF)、六氟矽酸、及緩衝氫氟酸所組成之群中之至少一種之溶液,較典型為使用含有氫氟酸之蝕刻液。 In the production method of the present invention, an etching step may be included before both chemical strengthening and chemical strengthening. As the etching solution, a solution containing at least one selected from the group consisting of hydrofluoric acid (HF), hexafluoroantimonic acid, and buffered hydrofluoric acid is preferred, and an etching solution containing hydrofluoric acid is more typically used.
作為含有氫氟酸之蝕刻液,例如可列舉氫氟酸、以氫氟酸作為主成分之酸性溶液、於氫氟酸中含有硫酸、鹽酸、磷酸、硝酸、氟矽酸中至少1種酸之混合酸。 Examples of the etching liquid containing hydrofluoric acid include hydrofluoric acid, an acidic solution containing hydrofluoric acid as a main component, and hydrofluoric acid containing at least one acid selected from the group consisting of sulfuric acid, hydrochloric acid, phosphoric acid, nitric acid, and fluoroantimonic acid. Mixed acid.
蝕刻率較佳為0.50μm/cm2/min以上,更佳為0.60μm/cm2/min以上,進而較佳為0.70μm/cm2/min以上。藉由將蝕刻率設為0.50μm/cm2/min以上,可縮短蝕刻步驟所需要之時間,以更高效率製造覆蓋玻璃。蝕刻率可藉由適當調整供於化學強化之玻璃之組成、蝕刻液之溫度或濃度等而進行調整。 The etching rate is preferably 0.50μm / cm 2 / min or more, more preferably 0.60μm / cm 2 / min or more, and further preferably 0.70μm / cm 2 / min or more. By setting the etching rate to 0.50 μm/cm 2 /min or more, the time required for the etching step can be shortened, and the cover glass can be manufactured with higher efficiency. The etching rate can be adjusted by appropriately adjusting the composition of the glass for chemical strengthening, the temperature or concentration of the etching solution, and the like.
蝕刻溫度通常較佳為10℃~60℃,更佳為20℃~40℃。進而,蝕刻時間通常較佳為30秒~30分鐘,更佳為1分鐘~10分鐘。該等蝕刻之條件係業者可根據所使用之玻璃基板之材質,以不析出反應物之方式適當選擇者。 The etching temperature is usually preferably from 10 ° C to 60 ° C, more preferably from 20 ° C to 40 ° C. Further, the etching time is usually preferably from 30 seconds to 30 minutes, more preferably from 1 minute to 10 minutes. The conditions of the etching can be appropriately selected depending on the material of the glass substrate to be used so that the reactants are not precipitated.
由於蝕刻後之玻璃板之表面上有附著物附著之情形,故而較佳為清洗處理後之玻璃板。作為清洗方法,並無特別限定,可使用眾所周知之方法,例如可於施加超音波之狀態下,利用硫酸、鹽酸或硝酸等水溶液進行清洗。 Since the adhering matter adheres to the surface of the glass plate after etching, it is preferably a glass plate after the cleaning process. The washing method is not particularly limited, and a known method can be used. For example, it can be washed with an aqueous solution such as sulfuric acid, hydrochloric acid or nitric acid in a state where ultrasonic waves are applied.
本發明之覆蓋玻璃之製造方法亦可包括於化學強化之步驟之前,去除存在於玻璃板之表面之損傷(龜裂)或玻璃板之彎曲或凹坑之其他步驟。作為於化學強化處理之前去除玻璃板之表面之龜裂之方法,與上述去除表面異質層之步驟相同地,可列舉研磨玻璃板之表面之方法。 The method for producing a cover glass of the present invention may also include other steps of removing damage (cracks) or bending or pits of the glass sheet present on the surface of the glass sheet before the step of chemical strengthening. As a method of removing the crack of the surface of the glass plate before the chemical strengthening treatment, a method of polishing the surface of the glass plate may be mentioned in the same manner as the above step of removing the surface heterogeneous layer.
於研磨玻璃板之表面而去除龜裂之情形,只要可去除存在於玻璃表面之龜裂,並未限定研磨方法。例如,可列舉使用包含氧化鈰等稀土類氧化物、氧化鋯、氧化鋁、氧化鎂、氧化矽(包含膠體氧化矽)、碳化矽、氧化錳、氧化鐵、金剛石、氮化硼及鋯英石等研磨粒 之漿料進行研磨等。該等研磨粒可單獨使用1種,亦可併用2種以上。 In the case where the surface of the glass plate is ground to remove cracks, the grinding method is not limited as long as the crack existing on the surface of the glass can be removed. For example, a rare earth oxide such as cerium oxide, zirconia, alumina, magnesia, cerium oxide (including colloidal cerium oxide), cerium carbide, manganese oxide, iron oxide, diamond, boron nitride, and zircon may be used. Grinding grain The slurry is subjected to grinding or the like. These abrasive grains may be used alone or in combination of two or more.
於上述之研磨粒之群中,與上述去除表面異質層之步驟相同地,使用含有平均粒徑80nm以下之膠體氧化矽作為研磨粒之漿料進行研磨,可均勻地研磨玻璃板之表面,可達成充分之強度,故而較佳。 In the above-mentioned group of the abrasive grains, in the same manner as the above step of removing the surface heterogeneous layer, the slurry containing the colloidal cerium oxide having an average particle diameter of 80 nm or less is used as the abrasive grains, and the surface of the glass plate can be uniformly polished. It is better to achieve sufficient strength.
又,於使用包含氧化鈰等稀土類氧化物、氧化鋯、氧化鋁、氧化鎂、氧化矽、碳化矽、氧化錳、氧化鐵、金剛石、氮化硼及鋯英石等眾所周知之研磨粒之漿料進行研磨後,更佳為使用含有平均粒徑80nm以下之膠體氧化矽作為研磨粒之漿料進行研磨。 Further, a well-known abrasive slurry containing a rare earth oxide such as cerium oxide, zirconium oxide, aluminum oxide, magnesium oxide, cerium oxide, cerium carbide, manganese oxide, iron oxide, diamond, boron nitride or zircon is used. After the material is ground, it is more preferable to use a slurry containing colloidal cerium oxide having an average particle diameter of 80 nm or less as abrasive grains.
本發明之覆蓋玻璃之算術平均粗糙度Ra較佳為1nm以下,更佳為0.7nm以下,進而較佳為0.5nm以下,特佳為0.4以下。藉由算術平均粗糙度Ra為1nm以下,可充分提高球環強度。 The arithmetic mean roughness Ra of the cover glass of the present invention is preferably 1 nm or less, more preferably 0.7 nm or less, still more preferably 0.5 nm or less, and particularly preferably 0.4 or less. The ball ring strength can be sufficiently increased by the arithmetic mean roughness Ra of 1 nm or less.
算術平均粗糙度Ra[JIS B0601(1994年)]係自粗糙度曲線中於其平均線之方向上僅抽出基準長度,於該抽出部分之平均線之方向上取X軸,於縱向放大率之方向上取Y軸,以y=f(x)表示粗糙度曲線之時,將藉由下述式所求出之值以奈米(nm)表示者。 The arithmetic mean roughness Ra [JIS B0601 (1994)] extracts only the reference length in the direction of the average line from the roughness curve, and takes the X-axis in the direction of the average line of the extracted portion, in the longitudinal magnification When the Y-axis is taken in the direction and the roughness curve is represented by y=f(x), the value obtained by the following formula is expressed in nanometers (nm).
算術平均粗糙度Ra例如可使用非接觸表面形狀測定機(Zygo公司製造之NewView5032)進行測定。 The arithmetic mean roughness Ra can be measured, for example, using a non-contact surface shape measuring machine (NewView 5032 manufactured by Zygo Corporation).
覆蓋玻璃之製造方法根據用途亦有所不同,作為除上述化學強化步驟及蝕刻步驟以外之其他步驟,並無特別限定。如下表示一例,但本發明並非限定於此例。 The method for producing the cover glass varies depending on the application, and is not particularly limited as long as the steps other than the chemical strengthening step and the etching step described above. An example is shown as follows, but the present invention is not limited to this example.
首先,使所準備之玻璃素板經由切斷、開孔、切口、研磨或線倒角等步驟,成形為最終完工所期望之大小、形狀。此時,為了其後步驟之操作之提高及削減製程成本,亦可事先切斷為較最終完工所期望之大小更大之大小,於所有加工步驟完成後,成形為所期望之大小、形狀。 First, the prepared glass plate is formed into a desired size and shape for final completion by steps such as cutting, opening, slitting, grinding, or wire chamfering. At this time, in order to improve the operation of the subsequent steps and to reduce the process cost, the size may be cut to a larger size than expected by the final completion, and after all the processing steps are completed, the desired size and shape are formed.
成形之玻璃藉由本發明之玻璃強化方法而強化。於經強化之玻璃上,進行印刷、防反射塗層、功能性膜之貼合等,從而製造覆蓋玻璃。 The formed glass is reinforced by the glass strengthening method of the present invention. A cover glass is produced by printing on a tempered glass, an antireflection coating, a bonding of functional films, and the like.
本發明之覆蓋玻璃可用於行動電話、數位相機或觸控面板顯示器等之顯示器用覆蓋玻璃。 The cover glass of the present invention can be used for a cover glass for a display such as a mobile phone, a digital camera or a touch panel display.
本發明之製造方法於玻璃之質量為1.0kg以上之情形時,本發明尤其奏效,而較佳。又,於玻璃之大小為1m見方以上之情形時較佳。於玻璃之厚度為0.3mmt之情形時較佳。 In the production method of the present invention, the present invention is particularly effective when the mass of the glass is 1.0 kg or more, and is preferable. Further, it is preferable when the size of the glass is 1 m square or more. It is preferable when the thickness of the glass is 0.3 mmt.
於上述玻璃之質量、大小或厚度之情形時本發明尤其奏效而較佳係由於:若玻璃變大,則面之大小變大,並且邊緣之長度變長,從而導致存在較深損傷之可能性變高,或若玻璃變重,則因玻璃之自重而變得向其較深之損傷施加較大之力。 The present invention is particularly effective in the case of the above-mentioned quality, size or thickness of the glass because, if the glass becomes large, the size of the surface becomes large, and the length of the edge becomes long, resulting in the possibility of deep damage. It becomes higher, or if the glass becomes heavier, it exerts a greater force on the deeper damage due to the weight of the glass.
以下藉由實施例等具體說明本發明,但本發明並不受該等例限定。 Hereinafter, the present invention will be specifically described by way of Examples and the like, but the present invention is not limited by the Examples.
所謂實施例及比較例中之底面及頂面,意指於利用浮式法之成形之時,接觸於熔融錫之面(底面)、及其相反側之面(頂面)。 The bottom surface and the top surface in the examples and comparative examples mean a surface (bottom surface) which is in contact with the molten tin and a surface (top surface) on the opposite side when it is formed by the floating method.
於以下之實施例及比較例中,將其次之各步驟適當組合而進行。 In the following examples and comparative examples, the next steps were appropriately combined.
將平板玻璃浸漬於KNO3熔融鹽中,進行離子交換處理後,藉由 冷卻至室溫附近而進行化學強化。此時,將KNO3熔融鹽之溫度設為435℃,浸漬時間設為4小時。將所獲得之化學強化玻璃水洗,供於下一步驟。 The plate glass was immersed in a KNO 3 molten salt, subjected to ion exchange treatment, and then chemically strengthened by cooling to near room temperature. At this time, the temperature of the KNO 3 molten salt was set to 435 ° C, and the immersion time was set to 4 hours. The obtained chemically strengthened glass was washed with water for the next step.
將平均粒子直徑(d50)為1μm之氧化鈰分散於水中而製作漿料作為研磨漿料,使用所獲得之漿料,將平板玻璃研磨約3.0μm。 A cerium oxide having an average particle diameter (d50) of 1 μm was dispersed in water to prepare a slurry as a polishing slurry, and the obtained slab was ground to a thickness of about 3.0 μm using the obtained slurry.
將平均粒子直徑(d50)為80nm之膠體氧化矽(COMPOL80,Fujimi Incorporated公司製造)分散於水中而製作漿料作為研磨漿料,使用所獲得之漿料將平板玻璃研磨約0.2μm。 A colloidal cerium oxide (COMPOL80, manufactured by Fujimi Incorporated) having an average particle diameter (d50) of 80 nm was dispersed in water to prepare a slurry as a polishing slurry, and the plate glass was polished to about 0.2 μm using the obtained slurry.
使用氫氟酸及鹽酸之混合酸(氫氟酸0.55質量%、鹽酸5.8質量%)作為蝕刻液,將平板玻璃於20℃下蝕刻5分鐘。 Using a mixed acid of hydrofluoric acid and hydrochloric acid (0.55 mass% of hydrofluoric acid and 5.8 mass% of hydrochloric acid) as an etching liquid, the plate glass was etched at 20 ° C for 5 minutes.
於實施例1-1~1-4及比較例1-1~1-3中,使用藉由浮式法成形後切斷而獲得之縱向50mm×橫向50mm×厚度1.1mm之平板玻璃。所使用之平板玻璃之組成以氧化物基準之莫耳%表示,為SiO2:64%、Al2O3:8%、MgO:11%、Na2O:12.5%、ZrO2:0.5%。 In Examples 1-1 to 1-4 and Comparative Examples 1-1 to 1-3, a flat glass having a longitudinal direction of 50 mm × a lateral direction of 50 mm × a thickness of 1.1 mm obtained by cutting by a floating method was used. The composition of the flat glass used was expressed by mol% of the oxide standard, and was SiO 2 : 64%, Al 2 O 3 : 8%, MgO: 11%, Na 2 O: 12.5%, and ZrO 2 : 0.5%.
於藉由上述化學強化步驟將平板玻璃強化後,進行濕式蝕刻。上述濕式蝕刻係對頂面進行。 After the flat glass is reinforced by the above chemical strengthening step, wet etching is performed. The above wet etching is performed on the top surface.
對平板玻璃進行氧化鈰研磨,於藉由化學強化步驟將平板玻璃強化後,進行濕式蝕刻。上述氧化鈰研磨及濕式蝕刻係對頂面進行。 The flat glass is subjected to cerium oxide polishing, and after the flat glass is reinforced by a chemical strengthening step, wet etching is performed. The above cerium oxide polishing and wet etching are performed on the top surface.
於對平板玻璃進行氧化鈰研磨後,進行膠體氧化矽研磨,於藉 由化學強化步驟將平板玻璃強化後,進行濕式蝕刻。上述氧化鈰研磨、膠體氧化矽研磨及濕式蝕刻係對頂面進行。 After the cerium oxide is polished on the flat glass, the colloidal cerium oxide is ground and used. After the flat glass is reinforced by a chemical strengthening step, wet etching is performed. The above cerium oxide polishing, colloidal cerium oxide polishing, and wet etching are performed on the top surface.
將平板玻璃之頂面及底面濕式蝕刻後,藉由化學強化步驟將平板玻璃強化,再次對兩面實施濕式蝕刻。 After the top surface and the bottom surface of the flat glass were wet-etched, the flat glass was strengthened by a chemical strengthening step, and both surfaces were wet-etched again.
對平板玻璃進行氧化鈰研磨。不進行平板玻璃之化學強化及化學強化後之處理。上述氧化鈰研磨係對頂面進行。 The flat glass is subjected to cerium oxide polishing. The chemical strengthening and chemical strengthening of the flat glass are not performed. The above cerium oxide polishing is performed on the top surface.
對平板玻璃進行氧化鈰研磨,其後藉由化學強化步驟將平板玻璃強化。不進行化學強化後之處理。上述氧化鈰研磨係對頂面進行。 The flat glass is subjected to cerium oxide polishing, and then the flat glass is reinforced by a chemical strengthening step. No chemical strengthening treatment. The above cerium oxide polishing is performed on the top surface.
藉由上述化學強化步驟將平板玻璃強化,但化學強化之前及之後的處理均未進行。 The flat glass was reinforced by the above chemical strengthening step, but the treatment before and after the chemical strengthening was not performed.
將實施例1-1~1-4及比較例1-1~1-3中之各強化處理之條件示於表1。 The conditions of the respective strengthening treatments in Examples 1-1 to 1-4 and Comparative Examples 1-1 to 1-3 are shown in Table 1.
以下說明評價方法。關於各實施例及比較例,對於進行化學強化前後之處理之面,分別進行下述評價。對於比較例1-3(無化學強化前後處理),評價頂面。 The evaluation method will be described below. With respect to each of the examples and the comparative examples, the following evaluations were performed on the surfaces subjected to the treatment before and after the chemical strengthening. For Comparative Example 1-3 (without chemical strengthening before and after treatment), the top surface was evaluated.
於球環(Ball on Ring;BOR)試驗中,於將玻璃板1水平載置之狀態下,使用SUS304製造之加壓治具2將玻璃板1加壓,測定玻璃板1之強度。圖3表示用以說明本發明中所用之強度試驗之概略圖。 In the ball on ring (BOR) test, the glass plate 1 was pressed with a press jig 2 made of SUS304 in a state where the glass plate 1 was horizontally placed, and the strength of the glass plate 1 was measured. Fig. 3 is a schematic view for explaining the strength test used in the present invention.
於圖3中,SUS304製造之承受治具3之上,水平設置有成為樣品之玻璃板1。於玻璃板1之上方,設置有用以對玻璃板1加壓之加壓治 具2。 In Fig. 3, on the jig 3 manufactured by SUS304, a glass plate 1 serving as a sample is horizontally disposed. Above the glass plate 1, a pressure treatment for pressurizing the glass plate 1 is provided With 2.
於本實施之形態中,自實施例及比較例後所獲得之玻璃板1之上方,對玻璃板1之中央區域加壓。再者,試驗條件如下所述。樣品之厚度:1.1(mm);加壓治具2之下降速度:1.0(mm/min): 此時,將玻璃破碎時之破碎荷重(單位N)作為BOR強度,將20次測定之平均值作為BOR平均強度。 In the embodiment of the present embodiment, the central portion of the glass sheet 1 was pressurized from the upper side of the glass sheet 1 obtained after the examples and the comparative examples. Furthermore, the test conditions are as follows. The thickness of the sample: 1.1 (mm); the descending speed of the press fixture 2: 1.0 (mm/min): At this time, the crushing load (unit: N) at the time of glass breakage was taken as the BOR intensity, and the average value of the 20 measurements was taken as the BOR average intensity.
於落球試驗中,使鐵球落下至玻璃板,從而評價玻璃板之強度。作為具體之試驗方法,首先,將實施例及比較例中所獲得之玻璃板搭載於SUS304製造之治具(於中央具有40×40mm之貫通部之縱向100×橫向100×厚度10mm之金屬板)。 In the ball drop test, the iron balls were dropped to a glass plate to evaluate the strength of the glass plate. As a specific test method, first, the glass plate obtained in the examples and the comparative examples was mounted on a jig made of SUS304 (a metal plate having a longitudinal direction of a through hole of 40 × 40 mm at the center of 100 × a lateral direction of 100 × a thickness of 10 mm) .
使質量230kg之鐵球(SUS304)落下至玻璃板之中央部,由玻璃破碎時之高度(破碎高度)求出落球強度(J)。再者,進行20次測定,將落球強度之平均值作為平均落球強度。 The iron ball (SUS304) having a mass of 230 kg was dropped to the center portion of the glass plate, and the falling ball strength (J) was determined from the height (crushing height) at which the glass was broken. Further, 20 measurements were performed, and the average value of the falling ball strength was taken as the average falling ball strength.
落球強度(J)=鐵球之質量(kg)×重力加速度(9.81m/s2)×破碎高度(m) Falling ball strength (J) = mass of iron ball (kg) × gravity acceleration (9.81m/s 2 ) × breaking height (m)
玻璃基板之表面粗糙度係使用觸針式之表面粗糙度計(Veeco公司製造之Multimode V SPM-Nanoscope V controller)進行測定。再者,測定值係測定自玻璃板之任意2處之表面粗糙度,以其平均值表示。 The surface roughness of the glass substrate was measured using a stylus type surface roughness meter (Multimode V SPM-Nanoscope V controller manufactured by Veeco Co., Ltd.). In addition, the measured value is measured from the surface roughness of any two places of the glass plate, and is represented by the average value.
對於玻璃基板之邊緣強度,邊緣強度藉由按照「JIS R 1601(2008年)精細陶瓷抗彎強度試驗方法」之三點彎曲試驗或四點彎曲試驗而測定。 For the edge strength of the glass substrate, the edge strength was measured by a three-point bending test or a four-point bending test in accordance with "JIS R 1601 (2008) Fine Ceramic Bending Strength Test Method".
將藉由本發明之玻璃之強化方法而獲得之玻璃的以上述評價方法進行評價之結果示於表1。 The results of the evaluation of the glass obtained by the glass strengthening method of the present invention by the above evaluation method are shown in Table 1.
再者,藉由測定蝕刻前後之厚度而測定實施例1-1~1-4之蝕刻量時,均為1μm。 Further, when the etching amounts of Examples 1-1 to 1-4 were measured by measuring the thickness before and after the etching, they were all 1 μm.
如表1所示,可知於化學強化步驟後已將玻璃蝕刻之玻璃(實施例1-1~1-4)相較於未蝕刻之玻璃(比較例1-1~1-3),球環強度相對變高,表面之粗糙度亦變得均勻。 As shown in Table 1, it can be seen that after the chemical strengthening step, the glass-etched glass (Examples 1-1 to 1-4) was compared with the unetched glass (Comparative Examples 1-1 to 1-3), and the ball ring was obtained. The strength is relatively high and the roughness of the surface becomes uniform.
將包含分別為下述之組成之玻璃2A或2B之板狀之玻璃加工為5mm×40mm×1mmt之形狀,使用氧化鈰對5mm×40mm之面進行鏡面研磨加工,從而製作玻璃試驗片。使用# 600之金剛石將玻璃試驗片之邊緣倒角。 A plate-shaped glass containing the glass 2A or 2B having the following composition was processed into a shape of 5 mm × 40 mm × 1 mmt, and a surface of 5 mm × 40 mm was mirror-polished using yttrium oxide to prepare a glass test piece. The edge of the glass test piece was chamfered using #600 diamond.
玻璃2A:SiO2:64.5%、Al2O3:6%、MgO:11%、CaO:0.1%、SrO:0.1%、Na2O:12%、K2O:4%、ZrO2:2.5% Glass 2A: SiO 2 : 64.5%, Al 2 O 3 : 6%, MgO: 11%, CaO: 0.1%, SrO: 0.1%, Na 2 O: 12%, K 2 O: 4%, ZrO 2 : 2.5 %
玻璃2B:SiO2:71.3%、Al2O3:2%、MgO:10.4%、CaO:0.3%、Na2O:10.8%、K2O:4.6%、ZrO2:0.5% Glass 2B: SiO 2 : 71.3%, Al 2 O 3 : 2%, MgO: 10.4%, CaO: 0.3%, Na 2 O: 10.8%, K 2 O: 4.6%, ZrO 2 : 0.5%
使用5%之HF藉由超音波清洗機將所獲得之玻璃試驗片之20片進行濕式蝕刻3分鐘12秒。其後,將包含玻璃2A之玻璃試驗片浸漬於加熱至425℃之KNO3100%之熔融鹽中6小時,從而進行化學強化。 20 sheets of the obtained glass test piece were wet-etched for 3 minutes and 12 seconds by an ultrasonic cleaning machine using 5% HF. Thereafter, the glass test piece containing the glass 2A was immersed in a molten salt of 100% of KNO 3 heated to 425 ° C for 6 hours to carry out chemical strengthening.
包含化學強化後之玻璃2A之玻璃試驗片之表面壓縮應力為993MPa,表面壓縮應力層之深度為31μm。將包含玻璃2B之玻璃試驗片浸漬於加熱至400℃之KNO3 100%之熔融鹽中7小時,從而進行化學強化。包含化學強化後之玻璃2B之玻璃試驗片之表面壓縮應力為648MPa,表面壓縮應力層之深度為32μm。表面壓縮應力及表面壓縮應力層之深度使用折原製作所公司製造之表面應力計(FSM-6000LE)進行測定。 The glass test piece containing the chemically strengthened glass 2A had a surface compressive stress of 993 MPa and a surface compressive stress layer of 31 μm. The glass test piece containing the glass 2B was immersed in a molten salt of 100% of KNO 3 heated to 400 ° C for 7 hours to carry out chemical strengthening. The glass test piece containing the chemically strengthened glass 2B had a surface compressive stress of 648 MPa, and the surface compressive stress layer had a depth of 32 μm. The surface compressive stress and the depth of the surface compressive stress layer were measured using a surface stress meter (FSM-6000LE) manufactured by Ohara.
對於上述已實施濕式蝕刻之玻璃試驗片與未實施濕式蝕刻之玻璃試驗片,分別藉由按照「JIS R 1601(2008年)精細陶瓷抗彎強度試驗方法」之四點彎曲試驗對20片進行邊緣強度試驗。將結果示於表2。 The glass test piece which has been subjected to the wet etching described above and the glass test piece which was not subjected to the wet etching were respectively subjected to a four-point bending test according to the "JIS R 1601 (2008) Fine Ceramic Bending Strength Test Method" for 20 pieces. Perform an edge strength test. The results are shown in Table 2.
如表2所示,關於相較於鹼石灰玻璃蝕刻率較快之玻璃2A,蝕刻後之玻璃之邊緣強度相較於無蝕刻者有提高(實施例2-1及比較例2-1)。另一方面,相較於鹼石灰玻璃蝕刻速度較低之玻璃2B即便實施蝕刻處理,強度亦幾乎未提高(實施例2-2及比較例2-2)。由該結果,可知玻璃之邊緣強度藉由蝕刻而提高,蝕刻率越高,藉由蝕刻處理之強度之提高越顯著。 As shown in Table 2, regarding the glass 2A having a faster etching rate than the soda lime glass, the edge strength of the etched glass was improved as compared with the non-etcher (Example 2-1 and Comparative Example 2-1). On the other hand, the glass 2B having a lower etching speed of the soda lime glass hardly improved in strength even when the etching treatment was performed (Example 2-2 and Comparative Example 2-2). From this result, it is understood that the edge strength of the glass is improved by etching, and the higher the etching rate, the more remarkable the improvement in the strength by the etching treatment.
為了研究供於化學強化之玻璃之組成與蝕刻率之相關性,將表3所示之組成之玻璃A~K藉由化學強化步驟強化後,進行濕式蝕刻,從而研究蝕刻率。將其結果示於表4及表5以及圖4及圖5。 In order to investigate the correlation between the composition of the glass for chemical strengthening and the etching rate, the glass A to K having the composition shown in Table 3 was reinforced by a chemical strengthening step, and then subjected to wet etching to investigate the etching rate. The results are shown in Tables 4 and 5 and Figures 4 and 5.
如表4及表5以及圖4所示,可知藉由將供於化學強化之玻璃板設為以莫耳%表示,含有50~70%之SiO2、0~25%之Al2O3、0~25%之Na2O之組成,可將蝕刻率設為0.50μm/cm2/min以上,可提高覆蓋玻璃之生產性。 As shown in Tables 4 and 5 and FIG. 4, it is understood that the glass plate to be chemically strengthened is represented by mol%, and contains 50 to 70% of SiO 2 and 0 to 25% of Al 2 O 3 . The composition of 0 to 25% of Na 2 O can set the etching rate to 0.50 μm/cm 2 /min or more, thereby improving the productivity of the cover glass.
又,如圖5所示,可知藉由作為玻璃組成之參數之下述式算出之e與蝕刻率為反比例關係,若e超過73,則蝕刻率變得小於0.5μm/cm2/min。 Moreover, as shown in FIG. 5, it is understood that the e calculated from the following equation as a parameter of the glass composition has an inverse relationship with the etching rate, and when e exceeds 73, the etching rate becomes less than 0.5 μm/cm 2 /min.
e=SiO2+0.3×R2O+0.15×ZrO2 e = SiO 2 + 0.3 × R 2 O + 0.15 × ZrO 2
利用含有HF之蝕刻液將實施例3之表3所示之玻璃組成B之浮法玻璃板(0.8mm厚,大小400mm×500mm)之兩面蝕刻,從而去除100μm(每單面50μm)。其後,浸漬於400℃之KNO3熔融鹽中1小時,進行化學強化。表面壓縮應力為700MPa,表面壓縮應力層之深度為20μm。 The both sides of a float glass plate (0.8 mm thick, size 400 mm × 500 mm) of the glass composition B shown in Table 3 of Example 3 were etched by an etching solution containing HF to remove 100 μm (50 μm per one side). Thereafter, it was immersed in a KNO 3 molten salt at 400 ° C for 1 hour to carry out chemical strengthening. The surface compressive stress was 700 MPa, and the depth of the surface compressive stress layer was 20 μm.
其後,使用超硬合金製砂輪切割機切斷為50mm×50mm之大小。其後,使用800號或325號之研磨石將主表面端部進行0.2mm之R倒角。繼而藉由包含5質量%之HF之蝕刻液以5μm/min之蝕刻率進行蝕刻。對於以此方式獲得之玻璃板,使用彎曲試驗裝置進行四點彎曲試驗,從而評價強度。 Thereafter, it was cut into a size of 50 mm × 50 mm using a superhard alloy grinding wheel cutter. Thereafter, the end of the main surface was subjected to a R of 0.2 mm R using a grinding stone of No. 800 or No. 325. Then, etching was performed at an etching rate of 5 μm/min by an etching liquid containing 5% by mass of HF. For the glass plate obtained in this manner, a four-point bending test was performed using a bending test apparatus to evaluate the strength.
將其結果示於表6及圖7(a)及(b)。圖7(a)為使用800號研磨石之結果,圖7(b)為使用325號研磨石之結果。關於圖7(a)及(b),將各強化後蝕刻量之強度除以強化後蝕刻量為0μm時之強度之值,作為強度提高比率。 The results are shown in Table 6 and Figures 7(a) and (b). Fig. 7(a) shows the results of using No. 800 grinding stone, and Fig. 7(b) shows the result of using No. 325 grinding stone. In FIGS. 7(a) and 7(b), the intensity of each post-enhancement etching amount is divided by the value of the strength at the time of the post-enhancement etching amount of 0 μm as the strength improvement ratio.
如表6及圖7(a)及圖7(b)所示,可知藉由於化學強化步驟與強化後蝕刻步驟之間包括利用具有1000號以上之較粗粒度的研磨材料將玻璃板之主表面端部精研磨之步驟,提高玻璃板之邊緣強度。再者,可考慮使用325號之研磨材料進行強化後蝕刻40μm之情形時,利用化學強化處理之表面壓縮應力層藉由蝕刻而刮去,從而降低強度。 As shown in Table 6 and FIG. 7(a) and FIG. 7(b), it is understood that the main surface of the glass plate is used by using an abrasive material having a coarser particle size of 1000 or more between the chemical strengthening step and the post-intensification etching step. The step of fine grinding at the end improves the edge strength of the glass sheet. Further, in the case where the polishing material of No. 325 is used for the etching and the etching is performed for 40 μm, the surface compressive stress layer which is subjected to the chemical strengthening treatment is scraped off by etching to lower the strength.
已使用特定之態樣詳細地說明本發明,但業者明確認識到,不脫離本發明之意圖及範圍可進行各種變更及變形。再者本申請案係基於2012年9月20日時提出申請之日本專利申請案(日本專利特願2012-207318),藉由引用而援用其整體。 The present invention has been described in detail with reference to the preferred embodiments thereof. The present application is based on a Japanese patent application filed on Sep. 20, 2012 (Japanese Patent Application No. 2012-207318), the entire disclosure of which is incorporated by reference.
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| WO2014045809A1 (en) | 2014-03-27 |
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