TW201710544A - Solid electrolyte layers of LiPON or LiPSON and method for making such layers - Google Patents
Solid electrolyte layers of LiPON or LiPSON and method for making such layers Download PDFInfo
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- TW201710544A TW201710544A TW104130297A TW104130297A TW201710544A TW 201710544 A TW201710544 A TW 201710544A TW 104130297 A TW104130297 A TW 104130297A TW 104130297 A TW104130297 A TW 104130297A TW 201710544 A TW201710544 A TW 201710544A
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- lipon
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- 239000007784 solid electrolyte Substances 0.000 title claims abstract description 75
- 238000000034 method Methods 0.000 title claims abstract description 46
- 229910012305 LiPON Inorganic materials 0.000 title claims description 43
- 238000004544 sputter deposition Methods 0.000 claims abstract description 43
- 239000007789 gas Substances 0.000 claims abstract description 39
- 239000000758 substrate Substances 0.000 claims abstract description 29
- 150000001875 compounds Chemical class 0.000 claims abstract description 18
- 239000011261 inert gas Substances 0.000 claims abstract description 15
- 229910052717 sulfur Inorganic materials 0.000 claims abstract description 9
- 239000012298 atmosphere Substances 0.000 claims abstract description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 46
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 35
- 229910052757 nitrogen Inorganic materials 0.000 claims description 25
- 229910052799 carbon Inorganic materials 0.000 claims description 22
- 229910052760 oxygen Inorganic materials 0.000 claims description 22
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 20
- 239000001301 oxygen Substances 0.000 claims description 20
- 229920001940 conductive polymer Polymers 0.000 claims description 18
- 239000004020 conductor Substances 0.000 claims description 16
- 239000011521 glass Substances 0.000 claims description 13
- 229910052786 argon Inorganic materials 0.000 claims description 11
- 229910002804 graphite Inorganic materials 0.000 claims description 9
- 239000010439 graphite Substances 0.000 claims description 9
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 claims description 9
- 239000011888 foil Substances 0.000 claims description 8
- -1 polyphenylene Polymers 0.000 claims description 7
- 229910012258 LiPO Inorganic materials 0.000 claims description 5
- 229910052782 aluminium Inorganic materials 0.000 claims description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 4
- 150000004678 hydrides Chemical class 0.000 claims description 4
- 229920000767 polyaniline Polymers 0.000 claims description 4
- 229920000642 polymer Polymers 0.000 claims description 4
- 229910000831 Steel Inorganic materials 0.000 claims description 3
- 239000010406 cathode material Substances 0.000 claims description 3
- 239000010959 steel Substances 0.000 claims description 3
- 229910052715 tantalum Inorganic materials 0.000 claims description 3
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 3
- 229920000265 Polyparaphenylene Polymers 0.000 claims description 2
- 239000004734 Polyphenylene sulfide Substances 0.000 claims description 2
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 claims description 2
- 239000010405 anode material Substances 0.000 claims description 2
- 229920001197 polyacetylene Polymers 0.000 claims description 2
- 229920000414 polyfuran Polymers 0.000 claims description 2
- 229920000069 polyphenylene sulfide Polymers 0.000 claims description 2
- 229920000128 polypyrrole Polymers 0.000 claims description 2
- 229920000123 polythiophene Polymers 0.000 claims description 2
- 125000005678 ethenylene group Chemical group [H]C([*:1])=C([H])[*:2] 0.000 claims 1
- 229920000323 polyazulene Polymers 0.000 claims 1
- 229920006389 polyphenyl polymer Polymers 0.000 claims 1
- 239000013077 target material Substances 0.000 claims 1
- 239000000463 material Substances 0.000 abstract description 15
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 abstract description 13
- 229910052744 lithium Inorganic materials 0.000 abstract description 13
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 abstract description 8
- 229910052698 phosphorus Inorganic materials 0.000 abstract description 8
- 239000011574 phosphorus Substances 0.000 abstract description 8
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 abstract description 7
- 239000011593 sulfur Substances 0.000 abstract description 7
- 229910019142 PO4 Inorganic materials 0.000 abstract description 4
- 238000002360 preparation method Methods 0.000 abstract description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 abstract description 2
- 239000010452 phosphate Substances 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 139
- 239000000203 mixture Substances 0.000 description 23
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 17
- 230000008569 process Effects 0.000 description 15
- 150000002500 ions Chemical class 0.000 description 12
- 229910001386 lithium phosphate Inorganic materials 0.000 description 10
- TWQULNDIKKJZPH-UHFFFAOYSA-K trilithium;phosphate Chemical compound [Li+].[Li+].[Li+].[O-]P([O-])([O-])=O TWQULNDIKKJZPH-UHFFFAOYSA-K 0.000 description 10
- INHCSSUBVCNVSK-UHFFFAOYSA-L lithium sulfate Inorganic materials [Li+].[Li+].[O-]S([O-])(=O)=O INHCSSUBVCNVSK-UHFFFAOYSA-L 0.000 description 7
- RBTVSNLYYIMMKS-UHFFFAOYSA-N tert-butyl 3-aminoazetidine-1-carboxylate;hydrochloride Chemical compound Cl.CC(C)(C)OC(=O)N1CC(N)C1 RBTVSNLYYIMMKS-UHFFFAOYSA-N 0.000 description 7
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 6
- 150000001450 anions Chemical class 0.000 description 6
- 239000003792 electrolyte Substances 0.000 description 6
- 238000012545 processing Methods 0.000 description 6
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 5
- 230000008020 evaporation Effects 0.000 description 5
- 238000001704 evaporation Methods 0.000 description 5
- 150000003839 salts Chemical class 0.000 description 5
- 238000001004 secondary ion mass spectrometry Methods 0.000 description 5
- 238000000151 deposition Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 238000001552 radio frequency sputter deposition Methods 0.000 description 4
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 3
- 229910002092 carbon dioxide Inorganic materials 0.000 description 3
- 239000001569 carbon dioxide Substances 0.000 description 3
- 229910002091 carbon monoxide Inorganic materials 0.000 description 3
- 239000002041 carbon nanotube Substances 0.000 description 3
- 229910021393 carbon nanotube Inorganic materials 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 238000007599 discharging Methods 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- 239000002346 layers by function Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 235000021317 phosphate Nutrition 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229910018119 Li 3 PO 4 Inorganic materials 0.000 description 2
- 229910012851 LiCoO 2 Inorganic materials 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000007731 hot pressing Methods 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 238000001659 ion-beam spectroscopy Methods 0.000 description 2
- 229910001416 lithium ion Inorganic materials 0.000 description 2
- IIPYXGDZVMZOAP-UHFFFAOYSA-N lithium nitrate Chemical compound [Li+].[O-][N+]([O-])=O IIPYXGDZVMZOAP-UHFFFAOYSA-N 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- 150000002823 nitrates Chemical class 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 238000005546 reactive sputtering Methods 0.000 description 2
- 238000005245 sintering Methods 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 239000001117 sulphuric acid Substances 0.000 description 2
- 235000011149 sulphuric acid Nutrition 0.000 description 2
- 238000011282 treatment Methods 0.000 description 2
- 229910013063 LiBF 4 Inorganic materials 0.000 description 1
- 229910013684 LiClO 4 Inorganic materials 0.000 description 1
- 229910013870 LiPF 6 Inorganic materials 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 229910001257 Nb alloy Inorganic materials 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- PQAMPNNEMONCFE-UHFFFAOYSA-K [C+4].P(=O)([O-])([O-])[O-].[Li+] Chemical compound [C+4].P(=O)([O-])([O-])[O-].[Li+] PQAMPNNEMONCFE-UHFFFAOYSA-K 0.000 description 1
- IBXOPEGTOZQGQO-UHFFFAOYSA-N [Li].[Nb] Chemical compound [Li].[Nb] IBXOPEGTOZQGQO-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 239000002001 electrolyte material Substances 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000001566 impedance spectroscopy Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 239000010416 ion conductor Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000011244 liquid electrolyte Substances 0.000 description 1
- 229910000625 lithium cobalt oxide Inorganic materials 0.000 description 1
- 229910003002 lithium salt Inorganic materials 0.000 description 1
- 159000000002 lithium salts Chemical class 0.000 description 1
- BFZPBUKRYWOWDV-UHFFFAOYSA-N lithium;oxido(oxo)cobalt Chemical compound [Li+].[O-][Co]=O BFZPBUKRYWOWDV-UHFFFAOYSA-N 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002048 multi walled nanotube Substances 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 150000003017 phosphorus Chemical class 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000553 poly(phenylenevinylene) Polymers 0.000 description 1
- 229920002098 polyfluorene Polymers 0.000 description 1
- 239000005518 polymer electrolyte Substances 0.000 description 1
- 229920000307 polymer substrate Polymers 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000002109 single walled nanotube Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000005478 sputtering type Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000002226 superionic conductor Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000002207 thermal evaporation Methods 0.000 description 1
- QHGNHLZPVBIIPX-UHFFFAOYSA-N tin(ii) oxide Chemical class [Sn]=O QHGNHLZPVBIIPX-UHFFFAOYSA-N 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Classifications
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/10—Energy storage using batteries
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- Secondary Cells (AREA)
Abstract
Description
本發明關於一種製備固態電解質層之方法,及特別是,關於基於磷酸鹽或磷及硫的組合之氮氧化鋰固態電解質層的製備。 The present invention relates to a process for preparing a solid electrolyte layer, and in particular to the preparation of a lithium oxynitride solid electrolyte layer based on a phosphate or a combination of phosphorus and sulfur.
當今愈來愈常使用可充電鋰離子電池。先前技術之鋰離子單元電池(cell)包含薄金屬箔,其上施加呈多孔層形式之電解質材料,諸如石墨作為陽極,以及鋰鈷氧化物作為陰極。本文中,陽極及陰極係由分隔件層分開以避免短路。本文中該經液態電解質浸泡之分隔件層亦作為鋰離子之導體。 Rechargeable lithium-ion batteries are increasingly used today. The prior art lithium ion unit cell comprises a thin metal foil on which an electrolyte material in the form of a porous layer, such as graphite as an anode, and lithium cobalt oxide as a cathode, are applied. Herein, the anode and cathode are separated by a separator layer to avoid short circuits. The separator layer immersed in the liquid electrolyte herein also serves as a conductor of lithium ions.
固態電解質作為分隔件層受到注目的原因係藉由堆疊個別層之較佳處理特性。此等固態電解質尤其包含所謂超離子導體,或上述離子導體,彼等分別具有高導電率以及聚合基質(諸如例如聚(環氧乙烷))、及主要的鹽(例如LiPF6、LiBF4或LiClO4之聚合物電解質。 The reason why the solid electrolyte is used as a separator layer is due to the preferable handling characteristics of stacking individual layers. These particular solid electrolyte comprising a so-called super-ionic conductor, or said ion conductor, each having their high conductivity and a polymeric matrix (e.g., such as poly (ethylene oxide)), and major salts (e.g., LiPF 6, LiBF 4, or Polymer electrolyte of LiClO 4 .
現今使用之固態電解質層經常基於使用磷酸鋰作為起始材料。可使用其他元素或化學化合物。與鋰離子單元電池併用之固態電解質層必須具有均勻的化學組成且必須具有薄而固定的層厚度。為了獲得高能量密度之鋰離子單元電池,使用層厚度為10μm或更小的固態電解質層。層厚度之差異不應超過10%。特別是,該固態電解質層中應避免有孔洞以避免短路。 The solid electrolyte layers used today are often based on the use of lithium phosphate as a starting material. Other elements or chemical compounds can be used. The solid electrolyte layer used in combination with a lithium ion unit cell must have a uniform chemical composition and must have a thin and fixed layer thickness. In order to obtain a lithium ion unit cell of high energy density, a solid electrolyte layer having a layer thickness of 10 μm or less is used. The difference in layer thickness should not exceed 10%. In particular, holes should be avoided in the solid electrolyte layer to avoid short circuits.
主要使用濺鍍方法來產生滿足上述要求的層。分別在濺鍍或陰極噴霧期間,藉由以富含能量之離子撞擊而從靶材提取原子。藉由撞擊提取之原子最終沉積在基材上。 Sputtering methods are primarily used to produce layers that meet the above requirements. The atoms are extracted from the target by impact with energetic ions during sputtering or cathodic spraying, respectively. The atoms extracted by the impact are finally deposited on the substrate.
在濺鍍期間,鈍氣(例如氬)係在低壓下離子化。電壓加速離子朝向靶材。該等離子從靶材提取原子,該等原子再次沉積在基材上。 During sputtering, an blunt gas (such as argon) is ionized at low pressure. The voltage accelerates the ions towards the target. The plasma extracts atoms from the target, which are again deposited on the substrate.
先前技術中已知之濺鍍技術除了直流或DC濺鍍以外亦包括射頻或RF濺鍍、中頻或MF濺鍍以及離子束濺鍍。DC濺鍍、RF濺鍍、及MF濺鍍亦可用作磁控管濺鍍。除此之外,亦已知反應性濺鍍技術,其中反應性氣體(諸如氮)離子化且沉積在基材上。使用磷酸鋰作為靶材及氮作為反應性氣體之反應性濺鍍技術係描述於US 2009/0117289 A1。在基材上形成經改質的含磷之氮氧化鋰(LiPON)層。其中所使用之射頻濺鍍使用高頻交流電場以不只從氬陽離子及電子產生電漿,也解離同時被饋入的氮。以此方式,可將不同材料併入該沉積層。因而可使 用不同氫化物,其中氫係在該室容積內,而其他部分係併入該生長層。 Sputtering techniques known in the prior art include RF or RF sputtering, intermediate frequency or MF sputtering, and ion beam sputtering in addition to DC or DC sputtering. DC sputtering, RF sputtering, and MF sputtering can also be used as magnetron sputtering. In addition to this, reactive sputtering techniques are also known in which a reactive gas such as nitrogen is ionized and deposited on a substrate. A reactive sputtering technique using lithium phosphate as a target and nitrogen as a reactive gas is described in US 2009/0117289 A1. A modified phosphorus-containing lithium oxynitride (LiPON) layer is formed on the substrate. The RF sputtering used therein uses a high frequency alternating electric field to generate plasma not only from argon cations and electrons, but also to be simultaneously fed nitrogen. In this way, different materials can be incorporated into the deposited layer. Thus Different hydrides are used in which hydrogen is in the chamber volume and other portions are incorporated into the growth layer.
該方法的缺點是用於產生高頻電場必要的高能量需求、在1m2或更大之大尺寸基材中的層厚度分布之不規律性、以及相對低塗覆速率。 Disadvantages of this method are the high energy requirements necessary to generate a high frequency electric field, the irregularity of the layer thickness distribution in a large-sized substrate of 1 m 2 or more, and the relatively low coating rate.
有鑑於此,本發明目的係提供一種能在基材上沉積含磷之氮氧化鋰(LiPON)或含磷或硫之氮氧化鋰(LiPSON)固態電解質層作為具有均勻層厚度的薄層之方法。此外亦揭示適用於具有大表面之基材的塗覆方法。最後,若可能的話,亦應減少個別濺鍍方法期間之能源消耗。 In view of the above, an object of the present invention is to provide a method for depositing a phosphorus-containing lithium oxynitride (LiPON) or a phosphorus or sulfur-containing lithium oxynitride (LiPSON) solid electrolyte layer as a thin layer having a uniform layer thickness on a substrate. . Coating methods suitable for substrates having large surfaces are also disclosed. Finally, if possible, the energy consumption during individual sputtering methods should also be reduced.
該目的係藉由包括下列步驟之製備LiPON或LiPSON固態電解質層的方法獲致:提供至少一種基材、至少一種反應性氣體、至少一種惰性氣體及一個靶材;在包含該至少一種反應性氣體及該至少一種惰性氣體之氣氛下濺鍍;及在該至少一種基材上產生LiPON或LiPSON固態電解質層;其中該靶材包含導電性材料,且其中該導電性材料係在濺鍍期間轉變成惰性化合物。 The object is achieved by a method of preparing a LiPON or LiPSON solid electrolyte layer comprising the steps of: providing at least one substrate, at least one reactive gas, at least one inert gas, and a target; comprising the at least one reactive gas and Sputtering at least one inert gas atmosphere; and producing a LiPON or LiPSON solid electrolyte layer on the at least one substrate; wherein the target comprises a conductive material, and wherein the conductive material is converted to inert during sputtering Compound.
根據本發明另一態樣,提供LiPON或 LiPxS(1-x)ON固態電解質層,其可藉由根據本發明之方法獲得,其中x<1。 According to another aspect of the invention, a LiPON or LiP x S (1-x) ON solid electrolyte layer is provided, which is obtainable by the method according to the invention, wherein x < 1.
根據本發明另一態樣,揭示薄層電池、電致顯色玻璃或電致顯色箔。薄層電池、電致顯色玻璃、或電致顯色箔包含本發明之LiPON或LiPxS(1-x)ON固態電解質層,其中x<1。 According to another aspect of the invention, a thin layer battery, an electrochromic glass or an electrochromic foil is disclosed. The thin layer battery, the electrochromic glass, or the electrochromic foil comprises the LiPON or LiP x S (1-x) ON solid electrolyte layer of the present invention, wherein x < 1.
最後,本發明揭示用於濺鍍方法之靶材,其包括化合物鋰、磷及氧,以及彼等之化合物。此外,該靶材包含氮或硫、或分別包含氮或硫。又,包括具有導電性之材料。該導電性材料在濺鍍期間轉變成惰性化合物,因此該沉積功能層通常不含任何電子傳導組分,因而滿足電解質的功能。 Finally, the present invention discloses a target for a sputtering process comprising the compounds lithium, phosphorus and oxygen, and their compounds. Further, the target contains nitrogen or sulfur, or contains nitrogen or sulfur, respectively. Also, it includes a material having electrical conductivity. The electrically conductive material is converted to an inert compound during sputtering, so the deposition functional layer typically does not contain any electron conducting components and thus satisfies the function of the electrolyte.
已意外發現可揭示用於濺鍍方法之靶材,其中該靶材包含導電性(以及亦具有電子傳導性)。藉由提供具有導電性之靶材,使得可能使用直流濺鍍方法。在直流濺鍍期間所使用的DC電壓分別藉由撞擊離子化而使惰性氣體之原子離子化,或藉由撞擊離子化使反應性氣體之分子解離。在直流電場內之恆定離子運動導致更高且均勻的沉澱速率。以此方式使大基材表面亦能迅速塗覆固定層厚度之層。 It has been unexpectedly discovered that a target for a sputtering process can be disclosed wherein the target contains electrical conductivity (and also has electron conductivity). By providing a target having electrical conductivity, it is possible to use a direct current sputtering method. The DC voltage used during DC sputtering is ionized by ionization of the inert gas by impact ionization, or the molecules of the reactive gas are dissociated by impact ionization. Constant ion motion within the DC electric field results in a higher and uniform precipitation rate. In this way, the surface of the large substrate can also be quickly applied to the layer of the thickness of the fixed layer.
此外,本發明人已發現可以不同途徑獲得在同時使用惰性與反應性氣體時適於產生LiPON或LiPSON固態電解質層之導電性靶材。 Furthermore, the inventors have found that conductive targets suitable for producing LiPON or LiPSON solid electrolyte layers when using inert and reactive gases simultaneously can be obtained in different ways.
因此在該靶材內可使用會導致該靶材之導電 性的不同材料。該等材料在濺鍍期間轉變成「惰性化合物」。在該沉積之固態電解質層內的惰性化合物不再存在或僅少量或分別以不同形式併入其中,因而該固態電解質層之該層的行為或該層特性均不會受到不利地影響。因此,電子傳導性碳(諸如石墨、碳黑、奈米碳管等)可用於製造導電性靶材。在濺鍍方法期間,藉由例如氧作為反應性氣體,碳可幾乎完全轉變成一氧化碳或二氧化碳,分別以氣相存在,彼等可因而藉由泵送而移除,及因此不會併入該固態電解質層中。此外,可能使用傳導性聚合物,諸如具有共軛雙鍵之烯類,或可能使用亦分裂成一氧化碳、二氧化碳及含氫化合物及/或併入該固態電解質層作為非電子傳導性化合物的其他傳導性聚合物系統。該靶材亦可含有一或多種鹽,其中形成該鹽之離子的組分亦可進行固態電解質層之沉積或仍保持呈氣相。範例的陽離子包含鋰及銨離子。適用之陰離子尤其是磷酸鹽、硫酸及硝酸鹽。 Therefore, it can be used in the target to cause conduction of the target. Different materials for sex. These materials are converted to "inert compounds" during sputtering. The inert compound in the deposited solid electrolyte layer is no longer present or only incorporated in a small amount or separately in different forms, so that the behavior of the layer of the solid electrolyte layer or the layer properties are not adversely affected. Therefore, electron conductive carbon such as graphite, carbon black, carbon nanotubes, or the like can be used to manufacture the conductive target. During the sputtering process, carbon can be almost completely converted to carbon monoxide or carbon dioxide by, for example, oxygen as a reactive gas, respectively in the gas phase, which can thus be removed by pumping, and thus not incorporated In the solid electrolyte layer. Furthermore, it is possible to use conductive polymers, such as olefins having conjugated double bonds, or possibly other conducts that also split into carbon monoxide, carbon dioxide and hydrogen-containing compounds and/or incorporate the solid electrolyte layer as a non-electron conductive compound. Polymer system. The target may also contain one or more salts, wherein the components forming the ions of the salt may also be deposited as a solid electrolyte layer or remain in the vapor phase. Exemplary cations include lithium and ammonium ions. Suitable anions are especially phosphates, sulphuric acid and nitrates.
應暸解根據本發明之該方法不只局限於DC濺鍍,而是可應用任何種類之濺鍍方法。例如,亦可使用RF濺鍍、MF濺鍍、離子束濺鍍及不同變體及混合形式,例如磁控管濺鍍。又,可能使用傳導性靶材之熱汽化。又,靶材之導電性使得特別能藉由使用感應加熱器之感應耦合直接加熱蒸發的材料。因此,熱未經由蒸發壺轉移至蒸發的材料上,而是直接耦合至該蒸發的材料。又,可能使用傳導性靶材之電子束蒸鍍及電弧蒸鍍。此外,相較於 只有LiPON或LiPSON靶材時,二者方法均具有較佳加熱能力及熱傳導性。因而可提高蒸發速率。又,碳可能併入該固態電解質層導致機械特性之改善,例如沉積層之破裂韌性。亦可能的是,該靶材具有較佳機械特性,諸如提高之破裂韌性。又,可使用所有其他用於物理氣相沉積之方法(PVD法)。較佳地,在濺鍍期間,亦使用捲至捲(roll-to-roll)法,特別是用於產生數層。更佳係捲至捲DC濺鍍法。 It should be understood that the method according to the present invention is not limited to DC sputtering, but any type of sputtering method can be applied. For example, RF sputtering, MF sputtering, ion beam sputtering, and various variations and hybrid forms, such as magnetron sputtering, can also be used. Also, it is possible to use thermal vaporization of the conductive target. Moreover, the conductivity of the target makes it possible to directly heat the evaporated material, in particular by inductive coupling using an induction heater. Therefore, heat is not transferred to the evaporated material via the evaporation pot, but is directly coupled to the evaporated material. Further, electron beam evaporation and arc evaporation of a conductive target may be used. In addition, compared to Both LiPON and LiPSON targets have better heating and thermal conductivity. Thus, the evaporation rate can be increased. Also, carbon may be incorporated into the solid electrolyte layer resulting in an improvement in mechanical properties, such as fracture toughness of the deposited layer. It is also possible that the target has better mechanical properties, such as increased fracture toughness. Also, all other methods for physical vapor deposition (PVD method) can be used. Preferably, during the sputtering, a roll-to-roll method is also used, in particular for producing several layers. Better roll-to-roll DC sputtering.
含磷氮氧化鋰或含磷及含硫之氮氧化鋰固態電解質層經常顯示個別元素鋰、氧、氮、磷及可能的硫之不同化學計量。根據本發明之LiPON固態電解質層亦可以不同含量之磷為特徵。該LiPON固態電解質層因此可以LiPyON固態電解質層形式存在。通常,0<y<1.2。較佳地,y係在0.1至1.1之範圍;或0.2至1.0;或0.3至0.9;或0.4至0.8或分別為0.5至0.6,或分別為0.7。在LiPxS(1-x)ON固態電解質層中,通常x<1。較佳地,x係在0<x<0.7之範圍。更佳地,x係分別在0.1至0.6;或0.15至0.55;或0.2至0.5;或0.25至0.45;或0.3至0.4;或0.32至0.38;或0.34至0.36之範圍。應暸解,根據本發明之方法亦使得能獲得上述具有個別化學計量之LiPyON或LiPxS(1-x)ON固態電解質層。 Lithium oxynitride or a phosphorus-containing and sulfur-containing lithium oxynitride solid electrolyte layer often shows different stoichiometry of individual elements lithium, oxygen, nitrogen, phosphorus and possibly sulfur. The LiPON solid electrolyte layer according to the present invention may also be characterized by different levels of phosphorus. The LiPON solid electrolyte layer can thus be present in the form of a LiP y ON solid electrolyte layer. Usually, 0 < y < 1.2. Preferably, y is in the range of 0.1 to 1.1; or 0.2 to 1.0; or 0.3 to 0.9; or 0.4 to 0.8 or 0.5 to 0.6, respectively, or 0.7, respectively. In the LiP x S (1-x) ON solid electrolyte layer, x<1 is usually used. Preferably, x is in the range of 0 < x < 0.7. More preferably, the x series is in the range of 0.1 to 0.6; or 0.15 to 0.55; or 0.2 to 0.5; or 0.25 to 0.45; or 0.3 to 0.4; or 0.32 to 0.38, or 0.34 to 0.36, respectively. It will be appreciated that the method according to the invention also makes it possible to obtain the above described individual stoichiometric LiP y ON or LiP x S (1-x) ON solid electrolyte layers.
根據本發明之固態電解質層為具有通常介於50nm與250μm之間的層厚度之薄層。該層厚度較佳係介於100nm與200μm之間,或介於200nm與150μm之 間,或介於300nm與100μm之間,或介於400nm與90μm之間,或介於500nm與80μm之間,或介於600nm與70μm之間,或介於700nm與60μm之間,或介於800nm與50μm之間,或介於900nm與40μm之間,或介於950nm與30μm之間,或介於980nm與25μm之間,或介於1μm與20μm之間,或介於1μm與15μm之間,或介於1μm與10μm之間,或介於1μm與8μm之間,或介於1μm與6μm之間。最佳係介於1μm與4μm之間的層厚度。 The solid electrolyte layer according to the present invention is a thin layer having a layer thickness of usually between 50 nm and 250 μm. The thickness of the layer is preferably between 100 nm and 200 μm, or between 200 nm and 150 μm. Between 300 nm and 100 μm, or between 400 nm and 90 μm, or between 500 nm and 80 μm, or between 600 nm and 70 μm, or between 700 nm and 60 μm, or between Between 800 nm and 50 μm, or between 900 nm and 40 μm, or between 950 nm and 30 μm, or between 980 nm and 25 μm, or between 1 μm and 20 μm, or between 1 μm and 15 μm Or between 1 μm and 10 μm, or between 1 μm and 8 μm, or between 1 μm and 6 μm. The optimum is a layer thickness between 1 μm and 4 μm.
沉積固態電解質層內的層厚度變化小於該層厚度的20%,較佳係小於該層厚度的10%,或小於9%,或小於8%,或小於5%,或小於3%,或小於2%,或小於1%。 The thickness variation of the layer in the deposited solid electrolyte layer is less than 20% of the thickness of the layer, preferably less than 10%, or less than 9%, or less than 8%, or less than 5%, or less than 3%, or less than the thickness of the layer. 2%, or less than 1%.
用詞「基材」係指其上沉積根據本發明之固態電解質層的材料。可使用數個基材。基材表面可在數個cm2至高達1m2或更大之區域中。因此,基材可具有介於1cm2與3m2之間的表面。較佳之基材表面包括10cm2、或100cm2、或500cm2、或1000cm2、或5000cm2、或1m2、或1.1m2、或1.2m2、或1.3m2、或1.4m2、或1.5m2。較大的基材表面積亦可行。捲至捲DC濺鍍法可用於以低成本基礎製備具有上述面積之基材。 The term "substrate" refers to a material on which a solid electrolyte layer according to the present invention is deposited. Several substrates can be used. The surface of the substrate can be in the range of several cm 2 up to 1 m 2 or more. Thus, the substrate can have a surface between 1 cm 2 and 3 m 2 . Preferred substrate surfaces include 10 cm 2 , or 100 cm 2 , or 500 cm 2 , or 1000 cm 2 , or 5000 cm 2 , or 1 m 2 , or 1.1 m 2 , or 1.2 m 2 , or 1.3 m 2 , or 1.4 m 2 , or 1.5m 2 . Larger substrate surface areas are also possible. The roll-to-roll DC sputtering method can be used to prepare a substrate having the above-described area on a low cost basis.
用詞「反應性氣體」係指在濺鍍方法期間分裂且部分或全部分別併入LiPON或LIPSON固態電解質層的氣體。範例的反應性氣體包含氮、氧、氣態氫化物、氮 氧化物、H2S、PH3、及SO2。 The term "reactive gas" refers to a gas that splits during the sputtering process and is partially or fully incorporated into a LiPON or LIPSON solid electrolyte layer, respectively. Exemplary reactive gases include nitrogen, oxygen, gaseous hydrides, nitrogen oxides, H 2 S, PH 3 , and SO 2 .
用詞「惰性氣體」係指在濺鍍方法期間用以產生電漿之氣體。為此,經常使用鈍氣,尤其是氬,但亦使用氦及氖。 The term "inert gas" means the gas used to generate the plasma during the sputtering process. For this reason, blunt gas, especially argon, is often used, but bismuth and antimony are also used.
清楚看出,所使用之至少一種反應性氣體與該至少一種惰性氣體的氣體混合物可改變。因而,再次會影響該沉積之固態電解質層的組成。該至少一種反應性氣體可包含氧及氮。例如,在濺鍍期間,可使用包含氣氛1至60體積%之惰性氣體、1至60體積%之氧及20至90體積%之氮的氣氛。較佳係10至40體積%之惰性氣體、10至40體積%之氧、及40至80體積%之氮。更佳係15至30體積%之惰性氣體、15至40體積%之氧、及40至70體積%之氮。惰性氣體、氧及氮之總和始終為100體積%。 It is clear that the gas mixture of the at least one reactive gas used and the at least one inert gas can be varied. Thus, the composition of the deposited solid electrolyte layer is again affected. The at least one reactive gas may comprise oxygen and nitrogen. For example, during sputtering, an atmosphere containing 1 to 60% by volume of an inert gas, 1 to 60% by volume of oxygen, and 20 to 90% by volume of nitrogen may be used. It is preferably 10 to 40% by volume of an inert gas, 10 to 40% by volume of oxygen, and 40 to 80% by volume of nitrogen. More preferably, it is 15 to 30% by volume of an inert gas, 15 to 40% by volume of oxygen, and 40 to 70% by volume of nitrogen. The sum of the inert gas, oxygen and nitrogen is always 100% by volume.
用詞「靶材」係指作為起始材料之導電性蒸發材料。在濺鍍方法中,靶材經常為陰極。然而,亦可經由氣體流將個別成分添加至該電漿及亦可被沉積。導電性可例如藉由在蒸發材料中添加傳導性聚合物及/或碳(例如呈石墨形式)來維持。又可想像的是應用鋰鹽,其中陰離子係構成導電性陰離子。應暸解,導電性陰離子包含存在於待沉積之層中,或在濺鍍後以氣體形式存在之元素。例如,可使用包含氮及碳之導電性陰離子。此外,靶材可包含硝酸鋰、磷酸鋰及/或硫酸鋰。靶材可例如分別藉由熱壓或冷壓、或燒結來製備。 The term "target" means a conductive evaporation material as a starting material. In the sputtering method, the target is often a cathode. However, individual components can also be added to the plasma via a gas stream and can also be deposited. Conductivity can be maintained, for example, by the addition of a conductive polymer and/or carbon (e.g., in the form of graphite) to the evaporation material. It is also conceivable to use a lithium salt in which an anion constitutes a conductive anion. It will be appreciated that the electrically conductive anion comprises an element present in the layer to be deposited or in the form of a gas after sputtering. For example, a conductive anion containing nitrogen and carbon can be used. Further, the target may comprise lithium nitrate, lithium phosphate, and/or lithium sulfate. The target can be prepared, for example, by hot pressing or cold pressing, or sintering, respectively.
用詞「包含(comprises/comprising)」在本 發明範圍內分別指開放式清單,且除了分別明確提及的組分或處理之外,亦分別容許其他組分或步驟。 Use the word "comprises/comprising" in this Within the scope of the invention are respectively referred to as open lists, and other components or steps are respectively permitted in addition to the components or treatments explicitly mentioned respectively.
用詞「由...組成(consists of/consisting of)在本發明範圍內分別指封閉式清單,且除了分別明確提及的組分或處理之外,不分別包括其他組分或步驟。 The word "consists of/consisting of" refers to a closed list, respectively, within the scope of the invention, and does not include other components or steps, respectively, except for the components or treatments explicitly mentioned.
用詞「實質上由...組成(substantially consists of/substantially consisting of)在本發明範圍內分別指部分封閉式清單,且指示除了所提及的組分之外僅可包括不實質上改變該組成特性之組分或僅以不實質改變該組成物之特性的量存在之其他組分的組成物。 The term "substantially consists of/substantially consisting of" refers to a partially closed list, respectively, and indicates that, in addition to the components mentioned, may only include A component that constitutes a characteristic or a composition of other components that are present only in an amount that does not substantially alter the properties of the composition.
當在本發明架構中時,分別使用用詞「包含(comprises/comprising)」描述組成物,明確指示包括由所提及之組分組成,或通常由所提及之組分組成的組成物。 When used in the context of the present invention, the terms "comprises/comprising" are used to describe the composition, respectively, and the explicit indication includes compositions consisting of the components mentioned, or generally consisting of the components mentioned.
將理解上述本發明特徵及下文待解釋之特徵不只可以給定組合使用,亦可在不違背本發明範圍的情況下獨立地以不同組合使用。 It will be understood that the features of the invention described above and the features to be explained hereinafter may be used not only in combination but also in various combinations independently without departing from the scope of the invention.
本發明之其他特徵及優點可從隨後較佳實施態樣之描述並參考圖式獲得。圖式中顯示:圖1為使用LiPO-C作為靶材以及使用氬和氮作為處理氣體之DC濺鍍法的SIMS(二次離子質譜法)檢查; 圖2為使用LiPO-C靶材及呈不同組成之處理氣體氬、氧和氮的DC濺鍍之其他SIMS檢查;圖3為不同程序參數之標準化離子傳導性之方塊圖形表示;圖4為根據本發明之單元電池的放電曲線;圖5分別為根據圖4之單元電池的充電及放電曲線;及圖6分別為根據圖3及圖4之單元電池的其他充電及放電循環。 Other features and advantages of the present invention can be obtained from the description of the preferred embodiments and the drawings. The figure shows: Figure 1 is a SIMS (Secondary Ion Mass Spectrometry) inspection using LiPO-C as a target and DC sputtering using argon and nitrogen as processing gases; 2 is another SIMS inspection using a LiPO-C target and DC sputtering of argon, oxygen and nitrogen in different compositions; FIG. 3 is a block diagram representation of normalized ion conductivity for different program parameters; FIG. The discharge curve of the unit cell of the present invention; FIG. 5 is a charging and discharging curve of the unit cell according to FIG. 4; and FIG. 6 are other charging and discharging cycles of the unit cell according to FIGS. 3 and 4, respectively.
在一實施態樣中,根據本發明之方法包含選自氮、氧、氣態氫化物、氮氧化物、H2S、PH3、及SO2中之至少一者之至少一種所用的反應性氣體。在一實施態樣中,使用氮及/或氧作為該至少一種反應性氣體。 In one embodiment, the method according to the present invention comprises a reactive gas selected from at least one of nitrogen, oxygen, gaseous hydride, nitrogen oxides, H 2 S, PH 3 , and SO 2 . In one embodiment, nitrogen and/or oxygen is used as the at least one reactive gas.
在一實施態樣中,根據本發明之方法中該靶材包含具有導電性的材料。該具有導電性之材料包含選自導電性聚合物及碳中的至少一或多者。 In an embodiment, the target according to the method of the invention comprises a material having electrical conductivity. The electrically conductive material comprises at least one or more selected from the group consisting of a conductive polymer and carbon.
在一實施態樣中,碳係以石墨形式存在。 In one embodiment, the carbon system is present in the form of graphite.
呈石墨形式之碳因其高導電性之故,特別適於在該靶材內產生導電性。此外,石墨的特徵係高熱傳導性。因而,含石墨之靶材可更容易蒸發。或者,亦可能利用其他導電性碳改質。例如,可使用導電性單壁奈米碳管或多壁奈米碳管。後者本身具有導電性。當在靶材中使用 奈米碳管時,形成良好加工特性。然而,應小心以使導電性奈米碳管通常不存在於沉積之固態電解質層中。此可藉由使用適當程序參數來確保。因本發明之層內存在少量碳,其通常不會導致該層內的導電性,故可改善其機械特性,例如關於延性屈服方面。此對於包括奈米碳管之本發明層而言特別真切。 Carbon in the form of graphite is particularly suitable for producing electrical conductivity in the target due to its high electrical conductivity. In addition, graphite is characterized by high thermal conductivity. Thus, the graphite-containing target can be more easily evaporated. Alternatively, it is also possible to use other conductive carbon modifications. For example, a conductive single-walled carbon nanotube or a multi-walled carbon nanotube can be used. The latter itself is electrically conductive. When used in a target Good carbon nanotubes form good processing characteristics. However, care should be taken so that the conductive carbon nanotubes are not normally present in the deposited solid electrolyte layer. This can be ensured by using appropriate program parameters. Since a small amount of carbon is present in the layer of the present invention, it generally does not result in electrical conductivity within the layer, so that its mechanical properties can be improved, for example with respect to ductile yield. This is especially true for the layers of the invention comprising carbon nanotubes.
該導電性聚合物可為選自聚乙炔、聚薁、聚異噻、聚伸苯基、聚伸苯基乙烯、聚吡咯、聚苯硫醚、聚噻吩、聚(3-烷基噻吩)、聚呋喃、磺化聚苯胺及聚苯胺中之一或多者。藉由使用具有特定鏈長之導電性聚合物,可調整靶材的導電性。此點於使用上述濺鍍方法之混合形式時可特別有利。 The conductive polymer may be selected from the group consisting of polyacetylene, polyfluorene, polyisothiophene One or more of polyphenylene, polyphenylenevinylene, polypyrrole, polyphenylene sulfide, polythiophene, poly(3-alkylthiophene), polyfuran, sulfonated polyaniline and polyaniline. The conductivity of the target can be adjusted by using a conductive polymer having a specific chain length. This can be particularly advantageous when using a hybrid form of the above-described sputtering method.
該導電性聚合物可構成經摻雜的形式。在此可使用不同化合物。適用的摻雜劑之實例包含質子酸(protone acid)。 The conductive polymer can constitute a doped form. Different compounds can be used here. Examples of suitable dopants include protone acid.
靶材之導電性可為例如至少0.05S/cm。或者,靶材之導電性係介於10-3與0.1S/cm之間,或介於10-2與0.05S/cm之間。最佳係靶材的導電性通常為至少10-2S/cm。 The conductivity of the target can be, for example, at least 0.05 S/cm. Alternatively, the conductivity of the target is between 10 -3 and 0.1 S/cm, or between 10 -2 and 0.05 S/cm. The conductivity of the best system target is typically at least 10 -2 S/cm.
本發明之LiPON或LiPSON固態電解質層通常不具導電性,而是只有離子傳導性。該固態電解質層具有例如10-3S/cm之最大導電性。更佳係最大導電性為低於5.10-4S/cm,或低於10-4S/cm,或低於5.10-5S/cm,或低於10-5S/cm,或低於10-6S/cm,或低於10-7S/cm,或低 於10-8S/cm,或低於10-9S/cm,或低於10-10S/cm。 The LiPON or LiPSON solid electrolyte layer of the present invention is generally not electrically conductive, but only ion conductive. The solid electrolyte layer has a maximum conductivity of, for example, 10 -3 S/cm. More preferably, the maximum conductivity is less than 5.10 -4 S/cm, or less than 10 -4 S/cm, or less than 5.10 -5 S/cm, or less than 10 -5 S/cm, Or less than 10 -6 S/cm, or less than 10 -7 S/cm, or less than 10 -8 S/cm, or less than 10 -9 S/cm, or less than 10 -10 S/cm.
在一實施態樣中,靶材包含磷酸鋰及硫酸鋰。因而,特別是可實現LIPSON固態電解質層,通常且特別是LiPxS(1-x)ON固態電解質層,其中x<1。 In one embodiment, the target comprises lithium phosphate and lithium sulfate. Thus, in particular, a LIPSON solid electrolyte layer, typically and in particular a LiP x S (1-x) ON solid electrolyte layer, wherein x < 1 can be realized.
在一實施態樣中,靶材係由20至60重量%之LiPO4、20至60重量%之LiSO4及1至20重量%之導電性材料組成。其中所有百分比之總和為100重量%。較佳係由等份數之磷酸鋰及硫酸鋰及具有不同份數之傳導性聚合物及/或碳組成的靶材。例如,較佳係具有40重量%之磷酸鋰及40重量%之硫酸鋰的靶材、粒子45重量%之磷酸鋰及45重量%之硫酸鋰的靶材、具有48重量%之磷酸鋰及48重量%之硫酸鋰的靶材、具有49重量%之磷酸鋰及49重量%之硫酸鋰的靶材。本文中,其餘部分由選自傳導性聚合物及碳之一或多份組成。較佳係使用碳。 In one embodiment, the target is comprised of 20 to 60% by weight of LiPO 4 , 20 to 60% by weight of LiSO 4 and 1 to 20% by weight of a conductive material. The sum of all percentages therein is 100% by weight. Preferably, it is an aliquot of lithium phosphate and lithium sulfate and a target having a different number of conductive polymers and/or carbon. For example, a target having 40% by weight of lithium phosphate and 40% by weight of lithium sulfate, a target of 45% by weight of lithium phosphate and 45% by weight of lithium sulfate, having 48% by weight of lithium phosphate and 48 is preferable. A target of wt% lithium sulfate, a target having 49% by weight of lithium phosphate and 49% by weight of lithium sulfate. Herein, the remainder consists of one or more parts selected from the group consisting of conductive polymers and carbon. Carbon is preferably used.
在一實施態樣中,該至少一種基材係選自由鋁、矽、碳、鋼、聚合物、玻璃、正極材料、及負極材料所組成之群組。該基材可為例如金屬、分散液、半導體、玻璃、聚合物、箔材料、或由上述材料之混合物或積層物所形成的複合材料。較佳地,該基材係由鋁或鋼構成。該基材具有實質上小於1mm之層厚度。較佳層厚度為1μm至500μm、或5μm至250μm、或10μm至200μm、或15μm至150μm、或20μm至100μm、或30μm至90μm、或40μm至80μm。 In one embodiment, the at least one substrate is selected from the group consisting of aluminum, tantalum, carbon, steel, polymers, glass, cathode materials, and anode materials. The substrate can be, for example, a metal, a dispersion, a semiconductor, a glass, a polymer, a foil material, or a composite formed from a mixture or laminate of the above materials. Preferably, the substrate is composed of aluminum or steel. The substrate has a layer thickness of substantially less than 1 mm. Preferred layer thicknesses are from 1 μm to 500 μm, or from 5 μm to 250 μm, or from 10 μm to 200 μm, or from 15 μm to 150 μm, or from 20 μm to 100 μm, or from 30 μm to 90 μm, or from 40 μm to 80 μm.
在一實施態樣中,該至少一種惰性氣體係選 自由He、Ne、及Ar所組成之群組。 In one embodiment, the at least one inert gas system is selected A group of free He, Ne, and Ar.
根據較佳實施態樣,根據本發明之方法獲得LiPON或LiPxS(1-x)ON固態電解質層。此處,x<1。所形成之固態電解質層的化學計量視所使用之靶材或氣體的組成而定。此外,加工參數影響所形成之固態電解質層的化學計量。根據本發明之LiPON固態電解質層可以LiPyON固態電解質層形式存在,其中0<y<1.2。較佳地,y係在0.1至1.1之範圍;或0.2至1.0;或0.3至0.9;或0.4至0.8、或分別為0.5至0.6,或分別為0.7。就根據本發明之固態電解質層LiPxS(1-x)ON而定,通常x<1。較佳地,x係在0<x<0.7之範圍。更佳地,x係分別在0.1至0.6;或0.15至0.55;或0.2至0.5;或0.25至0.45;或0.3至0.4;或0.32至0.38;或0.34至0.36之範圍。 According to a preferred embodiment, a LiPON or LiP x S (1-x) ON solid electrolyte layer is obtained according to the method of the present invention. Here, x<1. The stoichiometry of the solid electrolyte layer formed depends on the composition of the target or gas used. In addition, processing parameters affect the stoichiometry of the solid electrolyte layer formed. The LiPON solid electrolyte layer according to the present invention may exist in the form of a LiP y ON solid electrolyte layer in which 0 < y < 1.2. Preferably, y is in the range of 0.1 to 1.1; or 0.2 to 1.0; or 0.3 to 0.9; or 0.4 to 0.8, or 0.5 to 0.6, respectively, or 0.7, respectively. With respect to the solid electrolyte layer LiP x S (1-x) ON according to the present invention, usually x < 1. Preferably, x is in the range of 0 < x < 0.7. More preferably, the x series is in the range of 0.1 to 0.6; or 0.15 to 0.55; or 0.2 to 0.5; or 0.25 to 0.45; or 0.3 to 0.4; or 0.32 to 0.38, or 0.34 to 0.36, respectively.
在一實施態樣中,在LiPON或LiPxS(1-x)ON固態電解質層內含有選自實質上非導電性之聚合物及C中的一或多者。明顯地,本文之LiPON或LiPxS(1-x)ON固態電解質層通常不具導電性,而是通常只具有離子傳導性。因此,例如C可以實質上不引起導電性之適當少量存在於該固態電解質層內。此可例如藉由適當選擇程序參數而確保。C之存在可例如使固態電解質層的特性被改良,諸如破裂韌性。該非導電性聚合物亦可藉由適當選擇上述之導電性聚合物的程序參數而獲得。非導電性聚合物及/或C係均勻地分布在該LiPON或LiPxS(1-x)ON固態電解質層(其中x<1)內。 In one embodiment, one or more selected from the group consisting of substantially non-conductive polymers and C are contained in the LiPON or LiP x S (1-x) ON solid electrolyte layer. Clearly, the LiPON or LiP x S (1-x) ON solid electrolyte layers herein are generally not electrically conductive, but generally have only ionic conductivity. Therefore, for example, C may be present in the solid electrolyte layer in a suitable amount that does not substantially cause conductivity. This can be ensured, for example, by appropriate selection of program parameters. The presence of C can, for example, improve the properties of the solid electrolyte layer, such as fracture toughness. The non-conductive polymer can also be obtained by appropriately selecting the program parameters of the above-mentioned conductive polymer. The non-conductive polymer and/or C-system is uniformly distributed in the LiPON or LiP x S (1-x) ON solid electrolyte layer (where x < 1).
在該LiPON或LiPxS(1-x)ON固態電解質層(其中x<1)內之實質上非導電性聚合物及C及/或C的量小於相對於該固態電解質層總重之2重量%。較佳地,該固態電解質層包含介於10-3重量%與2重量%之間,較佳係5.10-2重量%與1重量%之間,介於10-2重量%與1重量%之間,介於10-2重量%與0.5重量%之間的該實質上非導電性聚合物及/或C。 The amount of substantially non-conductive polymer and C and/or C in the LiPON or LiP x S (1-x) ON solid electrolyte layer (where x < 1) is less than 2% relative to the total weight of the solid electrolyte layer weight%. Preferably, the solid electrolyte layer is comprised between 10 -3 wt% and 2 wt%, preferably between 5.10 and 2 wt% and 1 wt%, between 10 and 2 wt% and 1 wt%. Between 10 and 2 % by weight and 0.5% by weight of the substantially non-conductive polymer and/or C.
在一實施態樣中,該LiPON或LiPxS(1-x)ON固態電解質層之層厚度大約介於1μm與4μm之間。 In one embodiment, the layer thickness of the LiPON or LiP x S (1-x) ON solid electrolyte layer is between about 1 μm and 4 μm.
在本發明較佳實施態樣中,提供包含該LiPON或LiPxS(1-x)ON固態電解質層(其中x<1)之薄層電池或電致顯色玻璃。或者,亦提供包含該LiPON或LiPxS(1-x)ON固態電解質層(其中x<1)之薄層電池的單一或多個單元電池。 In a preferred embodiment of the invention, a thin layer battery or electrochromic glass comprising the LiPON or LiP x S (1-x) ON solid electrolyte layer (where x < 1) is provided. Alternatively, a single or a plurality of unit cells including the thin layer battery of the LiPON or LiP x S (1-x) ON solid electrolyte layer (where x < 1) are also provided.
薄層電池較佳係由數個單元電池組成,其中每一個別單元電池包含二維負極、二維正極,根據本發明之固態電解質層係構成介於該負極與該正極之間的分隔件。薄層電池係例如與積體電子電路併用或與微電機系統(MEMS)、感測器及智慧卡(smartcard)一起使用。可使用例如呈元素及/或部分氧化形式之金屬作為負極。元素材料包含鋰、鋅、鎂、鐵及其混合物;亦適用者為鉑、銀、鈦、或鉭。又,可使用鋰矽合金作為陽極。使用化學計量Li(1+-x)CoxO2之組成物作為陰極材料。此等單元電池可堆疊配置以形成薄層電池。熟習本領域之人士已知薄層 電池的製備方法。較佳地,藉由LiCoO2層及Li層且其間具有中間LiPON或LiPxS(1-x)ON固態電解質層(其中x<1)形成單一單元電池。 The thin layer battery is preferably composed of a plurality of unit cells each of which comprises a two-dimensional negative electrode and a two-dimensional positive electrode, and the solid electrolyte layer according to the present invention constitutes a separator interposed between the negative electrode and the positive electrode. Thin-layer batteries are used, for example, in conjunction with integrated electronic circuits or with micro-electromechanical systems (MEMS), sensors, and smart cards. As the negative electrode, for example, a metal in an elemental and/or partially oxidized form can be used. The elemental material comprises lithium, zinc, magnesium, iron, and mixtures thereof; also suitable for platinum, silver, titanium, or tantalum. Further, a lithium niobium alloy can be used as the anode. A composition of stoichiometric Li (1+-x) Co x O 2 was used as a cathode material. These unit cells can be stacked to form a thin layer battery. Methods of preparing thin layer batteries are known to those skilled in the art. Preferably, a single unit cell is formed by a LiCoO 2 layer and a Li layer with an intermediate LiPON or LiP x S (1-x) ON solid electrolyte layer (where x < 1).
電致顯色玻璃或箔之製備在本技術中係分別已知。對玻璃或箔分別地配備功能層化合物。若該層化合物內的電荷偏移(經常係藉由施加適當電壓造成),該化合物的光學特性改變。電致變色薄層單元電池通常係由兩個玻璃基材組成,在該等玻璃基材間提供FTO(摻雜氟之氧化錫)或ITO(銦錫氧化物)層。在該等層之間配置電致變色層及離子貯存層。彼等再次連接至應具有非常小導電性之離子傳導層。為此,發現LiPON或LiPxS(1-x)ON固態電解質層(其中x<1)係適用的。 The preparation of electrochromic glass or foil is known in the art. The glass or foil is separately provided with a functional layer compound. If the charge within the layer of the compound shifts (often caused by the application of an appropriate voltage), the optical properties of the compound change. Electrochromic thin layer unit cells are typically composed of two glass substrates with FTO (fluorinated tin oxide) or ITO (indium tin oxide) layers provided between the glass substrates. An electrochromic layer and an ion storage layer are disposed between the layers. They are again connected to an ion conducting layer that should have very little conductivity. For this reason, a LiPON or LiP x S (1-x) ON solid electrolyte layer (where x < 1) was found to be suitable.
該LiPON或LiPxS(1-x)ON固態電解質層亦可用於製造薄層電池或電致顯色玻璃。 The LiPON or LiP x S (1-x) ON solid electrolyte layer can also be used to manufacture thin layer batteries or electrochromic glass.
在本發明較佳實施態樣中,提供靶材以供濺鍍方法。該靶材包含Li、P、O及導電性材料,其中該導電性材料在濺鍍期間轉變成惰性化合物。此外,該靶材包含N或S。該靶材可包含一或多種鹽,其中形成該鹽之離子的化合物亦分別沉積在該固態電解質層上或保留在該氣相內。範例的陽離子包含鋰及銨離子。適用之陰離子尤其是磷酸鹽、硫酸及硝酸鹽。 In a preferred embodiment of the invention, a target is provided for use in a sputtering process. The target comprises Li, P, O and a conductive material, wherein the conductive material is converted to an inert compound during sputtering. Furthermore, the target comprises N or S. The target may comprise one or more salts, wherein the compounds forming the ions of the salt are also deposited on the solid electrolyte layer or remain in the gas phase, respectively. Exemplary cations include lithium and ammonium ions. Suitable anions are especially phosphates, sulphuric acid and nitrates.
在一實施態樣中,該靶材包含Li3PO4及Li2SO4。 In one embodiment, the target comprises Li 3 PO 4 and Li 2 SO 4 .
在一實施態樣中,該靶材包含20至60重量% 之Li3PO4、20至60重量%之Li2SO4、及1至20重量%之該導電性材料。所有百分比之總和為100重量%。 In one embodiment, the target comprises 20 to 60% by weight of Li 3 PO 4 , 20 to 60% by weight of Li 2 SO 4 , and 1 to 20% by weight of the electrically conductive material. The sum of all percentages is 100% by weight.
應暸解上述特性及待於下文解釋之特性不只在個別給定之組合內,在不違肩本發明範圍的情況下,不同組合或獨立地亦適用。 It is to be understood that the above-described characteristics and the characteristics to be explained below are not limited to the individual combinations given, and may be applied in different combinations or independently without departing from the scope of the invention.
下文中,茲參考實施例解釋本發明且在隨後說明中更詳細解釋之。 Hereinafter, the invention will be explained with reference to the examples and explained in more detail in the following description.
為了測試目的,使用具有50mm直徑且層厚度為7mm之圓盤形靶材。該靶材係由具有1至10重量%之呈石墨形式的碳之磷酸鋰組成。靶材可分別經由熱壓或冷壓、及燒結來製備。選擇下列濺鍍程序參數:該靶材處之功率密度>8.5W/cm2;占空比>95%之脈衝直流(脈衝DC);及程序壓力3.10-2毫巴。 For testing purposes, a disc shaped target having a diameter of 50 mm and a layer thickness of 7 mm was used. The target consists of lithium phosphate having from 1 to 10% by weight of carbon in the form of graphite. The target can be prepared by hot pressing or cold pressing, and sintering, respectively. The following sputtering procedure parameters were chosen: power density at the target > 8.5 W/cm 2 ; pulsed DC (pulse DC) with duty cycle >95%; and program pressure 3.10 - 2 mbar.
處理氣體之組成變化容許調整下列層參數: 碳之分率 The compositional changes of the process gas allow adjustment of the following layer parameters: Carbon fraction
離子傳導性 Ion conductivity
層之形態。 The shape of the layer.
處理氣體的可能組成如下: The possible composition of the process gas is as follows:
組成1:1至30%之氬、0%之氧、70%之氮 Composition of 1:1 to 30% argon, 0% oxygen, 70% nitrogen
組成2:2至25%之氬、15%之氧、60%之氮 Composition 2: 2 to 25% argon, 15% oxygen, 60% nitrogen
組成3:17%之氬、40%之氧、43%之氮。 Composition 3: 17% argon, 40% oxygen, 43% nitrogen.
使用二次離子質譜法檢查,可顯示氧分率提高使該沉積之層內的碳濃度降低,因此碳分別以一氧化碳或二氧化碳形式存在該處理氣體內,且係藉由泵抽一起從該處理室移除(恆定處理氣體饋入)。所得之組成1及3的SIMS檢查結果分別顯示於圖1及2。該等圖式中,a至h描述不同離子,其中a=Ni-,b=CH-,c=CN2-,d=O2-,e=Li-,f=C-,g=P-,而h=CN-。在顯示於x軸上的區域中,區域10代表Ni,12代表LiPON,14係從LiPON過渡至Ni,而16代表Ni。此外,在圖2中,參考數字18代表所使用之聚合物基材。 Using secondary ion mass spectrometry, it can be shown that an increase in oxygen fraction reduces the concentration of carbon in the deposited layer, so that carbon is present in the process gas in the form of carbon monoxide or carbon dioxide, respectively, and is pumped together from the processing chamber. Remove (constant processing gas feed). The SIMS results of the obtained compositions 1 and 3 are shown in Figures 1 and 2, respectively. In the figures, a to h describe different ions, where a = Ni - , b = CH - , c = CN 2 -, d = O 2 -, e = Li - , f = C - , g = P - And h=CN - . In the region shown on the x-axis, region 10 represents Ni, 12 represents LiPON, 14 is transitioned from LiPON to Ni, and 16 represents Ni. Further, in Fig. 2, reference numeral 18 represents a polymer substrate to be used.
離子傳導性係使用阻抗譜(impedance spectrometry)測量來研究。本文中,該處理氣體混合比對於層之傳導性具有相當大的影響(見圖2)。藉由改變處理氣體混合物及該室壓,可調整介於層特性與沉積速率以及層形態之間的最佳化(見圖3)。因此,就組成1(Z 1)而言,可看到實質上0.3至實質上0.4之標準化傳導性;組成2(Z 2)顯示實質上0.41至實質上0.62之標準化傳導性;及組成3(Z 3)具有實質上0.35至實質上0.45之標準化傳導性。 Ion conductivity is studied using impedance spectrometry measurements. Herein, the process gas mixing ratio has a considerable influence on the conductivity of the layer (see Figure 2). By varying the process gas mixture and the chamber pressure, the optimization between layer properties and deposition rate and layer morphology can be adjusted (see Figure 3). Thus, for composition 1 (Z 1 ), a substantially normal conductivity of from 0.3 to substantially 0.4 can be seen; composition 2 (Z 2 ) exhibits a normalized conductivity of substantially 0.41 to substantially 0.62; and composition 3 ( Z 3) has a normalized conductivity of substantially 0.35 to substantially 0.45.
發現除了特定方法實例之外,氣體組成、處理氣體或室壓以及濺鍍功率可在廣泛範圍中變化,從而影響層形成及特性。 It has been discovered that in addition to specific process examples, gas composition, process gas or chamber pressure, and sputtering power can vary over a wide range, affecting layer formation and characteristics.
總而言之,可說藉由適當程序參數,當使用含碳磷酸鋰濺鍍靶材時,分別可沉積低碳的LiPON或 LiPxS(1-x)ON電解質層(其中x<1),其適於應用作為薄層電池中之電解質功能層。薄層電池的特殊之處係電解質層同時作為陽極與陰極之間的電分隔件。 In summary, it can be said that by using a suitable procedure parameter, when a target containing lithium carbon phosphate is used, a low carbon LiPON or LiP x S (1-x) ON electrolyte layer (where x < 1) can be deposited, respectively. Used as an electrolyte functional layer in thin-layer batteries. A special feature of a thin layer battery is that the electrolyte layer serves as an electrical separator between the anode and the cathode.
另外發現,該電解質邊界層之明顯表面至少一者為氈狀。本發明之LiPON或LiPxS(1-x)ON薄電解質層(其中x<1)除了不會玻璃狀外,在可見光範圍為透明,且具有抗UV照射之安定性。該等特性顯示除了使用本發明之固態電解質層外,薄層電池中亦可能應用於電致顯色玻璃輔助。 It has also been found that at least one of the distinct surfaces of the electrolyte boundary layer is felt-like. The LiPON or LiP x S (1-x) ON thin electrolyte layer of the present invention (where x < 1) is transparent in the visible light range and has stability against UV irradiation, except that it is not glassy. These characteristics show that in addition to the use of the solid electrolyte layer of the present invention, a thin layer battery may also be applied to the electrochromic glass.
使用在600℃回火4小時之4μm厚濺鍍LiCoO2層作為陰極。基材為50μm厚度之鋁箔。在陰極上,根據本發明3.2μm厚LiPON層係使用下列程序參數沉積:該靶材處之功率密度>8.5W/cm2;占空比>95%之脈衝直流(脈衝DC);及程序壓力為3.10-2毫巴。使用20%之氬、65%之氮、15%之氧的混合物作為處理氣體。 A 4 μm thick sputtered LiCoO 2 layer tempered at 600 ° C for 4 hours was used as a cathode. The substrate was an aluminum foil having a thickness of 50 μm. On the cathode, a 3.2 μm thick LiPON layer according to the invention is deposited using the following program parameters: power density at the target > 8.5 W/cm 2 ; pulsed DC with a duty cycle > 95% (pulse DC); and program pressure It is 3.10 -2 mbar. A mixture of 20% argon, 65% nitrogen, and 15% oxygen was used as the processing gas.
本文中,該LiPON層具有恆定層厚度,任何變化均小於3%。於該層堆疊的末端施加金屬鋰陽極。於此末端,利用熱蒸發施加3.2μm厚之Li層。 Herein, the LiPON layer has a constant layer thickness with any variation of less than 3%. A metal lithium anode is applied to the end of the stack of layers. At this end, a 3.2 μm thick Li layer was applied by thermal evaporation.
從圖4,可看出單元電池SSLB0121顯示LCO陰極之非常有特性的放電曲線。電壓平坦區係在3.9V, 且只在放電程序結束時惡化。 From Figure 4, it can be seen that the unit cell SSLB0121 shows a very characteristic discharge curve of the LCO cathode. The voltage flat zone is at 3.9V. And only deteriorates at the end of the discharge program.
在圖5中,顯示根據本發明之單元電池係以C/10之電池充電,直到達到4.2V之電壓為止。之後,以CV模式(即,於4.2V)充電,直到電池降至1/3。該單元電池係以C/10電池放電。以i描繪之過程表示安培數I(以安培計)。以j描繪之過程表示電壓U(以伏特計)。 In Fig. 5, it is shown that the unit cell according to the present invention is charged with a C/10 battery until a voltage of 4.2 V is reached. After that, it is charged in CV mode (ie, at 4.2V) until the battery drops to 1/3. The unit battery is discharged with a C/10 battery. The process depicted by i represents the amperage I (in amperes). The process depicted by j represents the voltage U (in volts).
以不同測量裝置測量第一循環,且未顯示於此處。該單元電池係部分充電,因此第一充電步驟只有約128mAh/g。進一步充電及放電循環之反應分別可從圖6看出。 The first cycle is measured with different measuring devices and is not shown here. The unit cell is partially charged, so the first charging step is only about 128 mAh/g. The reactions of further charging and discharging cycles can be seen from Figure 6, respectively.
總之,根據本發明的實例顯示當使用節能DC濺鍍法時,當使用具有碳之LiPON靶材、在含氧及氮之氬氣氛中在部分或全部去除碳的情況下,以高而均勻之沉積速率沉積LiPON固態電解質層。所濺鍍之LiPON固態電解質層因而可分別用於薄層單元電池或薄層電池中。LiPxS(1-x)ON固態電解質層(其中x<1)之製備及其在薄層電池中的使用對應於所揭示之LiPON固態電解質層及其在薄層電池中的使用。 In summary, the example according to the present invention shows that when an energy-saving DC sputtering method is used, when a carbon-containing LiPON target is used, in the case of partially or completely removing carbon in an oxygen-containing and nitrogen-containing argon atmosphere, it is high and uniform. A LiPON solid electrolyte layer is deposited at a deposition rate. The sputtered LiPON solid electrolyte layer can thus be used in thin layer unit cells or thin layer batteries, respectively. The preparation of the LiP x S (1-x) ON solid electrolyte layer (where x < 1) and its use in thin layer cells corresponds to the disclosed LiPON solid electrolyte layer and its use in thin layer batteries.
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