TW201713804A - Crystal growth apparatus - Google Patents

Crystal growth apparatus Download PDF

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TW201713804A
TW201713804A TW104132981A TW104132981A TW201713804A TW 201713804 A TW201713804 A TW 201713804A TW 104132981 A TW104132981 A TW 104132981A TW 104132981 A TW104132981 A TW 104132981A TW 201713804 A TW201713804 A TW 201713804A
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wall
crystal growth
disposed
crucible
growth apparatus
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TW104132981A
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TWI567253B (en
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李岱柏
陳俊宏
藍文杰
施英汝
徐文慶
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環球晶圓股份有限公司
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Abstract

A crystal growth apparatus including a chamber, a pulling rod, a crucible, a heater, a heat insulating cover and a cooler is provided. The pulling rod is disposed in the chamber for pulling a seed crystal. The crucible is disposed in the chamber for containing a raw material melt. The heater is disposed in the chamber and located outside the crucible for heating the raw material melt. The heat insulating cover is disposed in the chamber and located above the crucible. The heat insulating cover has an inner wall and an outer wall. An inner space is between the inner wall and the outer wall. The cooler is disposed in the inner space between the inner wall and the outer wall.

Description

長晶裝置Crystal growth device

本發明是有關於一種長晶裝置,且特別是有關於一種具有冷卻元件的長晶裝置。This invention relates to a crystal growth apparatus and, more particularly, to a crystal growth apparatus having a cooling element.

近年來,半導體產業蓬勃發展,其中矽晶圓為半導體產業最基本的必需品。矽晶圓成長的方式包括浮熔帶長晶法(Floating Zone Method)、雷射加熱提拉長晶法(Laser Heated Pedestal Growth)以及柴氏長晶法(Czochralski Method,簡稱CZ method)等。其中柴氏長晶法因具有較佳的經濟效益,故成為目前大尺寸晶圓的主要生長方式。In recent years, the semiconductor industry has flourished, and silicon wafers are the most basic necessities of the semiconductor industry. The way in which the wafer is grown includes the Floating Zone Method, the Laser Heated Pedestal Growth, and the Czochralski Method (CZ method). Among them, the Chai's long crystal method has become a major growth mode for large-size wafers because of its better economic benefits.

在CZ法的單晶生長(growth of single crystal)中,在維持成減壓下的惰性氣體環境的腔室內,將晶種(seed crystal)浸漬於坩堝(crucible)內所積存的矽的原料熔湯中,並將所浸漬的晶種緩慢提拉,藉此於晶種的下方生長出單晶矽。此外,在CZ法中,需在溶液上成長的單晶矽周圍配置圓柱或是倒圓錐形式的熱帷幕來隔絕輻射熱,以控制長成的單晶矽的溫階(temperature gradient)。然而,被逐漸拉起的晶棒在降溫的過程中經過900°C~1200°C時,有可能會出現疊差(stacking fault)。這些由氧化所引起的疊差簡稱為OISF (Oxidation Induced Stacking Faults)。因此,如何讓晶棒降溫的速度加快,也就是提高溫度梯度,以降低氧化疊差的生成,就成為值得研究的課題。In the growth of single crystal of the CZ method, in a chamber maintained in an inert gas atmosphere under reduced pressure, a seed crystal is immersed in a crucible material accumulated in a crucible. In the soup, the impregnated seed crystals are slowly pulled to grow a single crystal crucible under the seed crystal. In addition, in the CZ method, a cylindrical or inverted hot-cut curtain is placed around the single crystal crucible grown on the solution to insulate the radiant heat to control the temperature gradient of the grown single crystal crucible. However, when the ingot being gradually pulled out passes through 900 ° C to 1200 ° C during the cooling process, a stacking fault may occur. These overlaps caused by oxidation are simply referred to as OISF (Oxidation Induced Stacking Faults). Therefore, how to speed up the cooling of the ingot, that is, to increase the temperature gradient to reduce the generation of the oxidation stack, has become a subject worthy of study.

本發明提供一種長晶裝置,可解決習知技術中溫度梯度較小而容易產生氧化疊差的問題。The invention provides a crystal growth device which can solve the problem that the temperature gradient is small and the oxidation stack is easily generated in the prior art.

本發明的長晶裝置包括一腔體、一吊線、一坩堝、一加熱元件、一熱帷幕以及一冷卻元件。吊線設置於腔體中,用以上拉一晶種。坩堝配置於腔體中,用以容置一熔湯。加熱元件配置於腔體中且位於坩堝的外圍,用以加熱熔湯。熱帷幕配置於腔體中且位於坩堝上方。熱帷幕具有一內壁與一外壁。內壁與外壁之間具有一內部空間。冷卻元件配置於內壁與外壁之間的內部空間。The crystal growth apparatus of the present invention comprises a cavity, a suspension wire, a weir, a heating element, a thermal curtain and a cooling element. The hanging wire is placed in the cavity, and a seed crystal is pulled by the above. The crucible is disposed in the cavity for accommodating a molten soup. The heating element is disposed in the cavity and located at the periphery of the crucible for heating the melt. The thermal curtain is placed in the cavity and above the crucible. The hot curtain has an inner wall and an outer wall. There is an internal space between the inner wall and the outer wall. The cooling element is disposed in an inner space between the inner wall and the outer wall.

在本發明的一實施例中,以熱帷幕靠近熔湯的一側為底部,冷卻元件從熱帷幕的底部分布至頂部。In an embodiment of the invention, the side of the hot curtain adjacent to the melt is the bottom and the cooling elements are distributed from the bottom of the hot curtain to the top.

在本發明的一實施例中,冷卻元件為裝有冷卻液的金屬管。In an embodiment of the invention, the cooling element is a metal tube containing a coolant.

在本發明的一實施例中,熱帷幕的材質為石墨。In an embodiment of the invention, the material of the thermal curtain is graphite.

在本發明的一實施例中,內壁與外壁是可拆解地組裝在一起。In an embodiment of the invention, the inner and outer walls are removably assembled.

在本發明的一實施例中,長晶裝置更包括一保溫元件,配置於腔體中。加熱元件位於保溫元件與坩堝之間。In an embodiment of the invention, the crystal growth device further includes a heat insulating element disposed in the cavity. The heating element is located between the thermal insulation element and the crucible.

在本發明的一實施例中,長晶裝置更包括一保溫材,配置於內壁與外壁之間的內部空間。In an embodiment of the invention, the crystal growth device further includes a heat insulating material disposed in an inner space between the inner wall and the outer wall.

在本發明的一實施例中,其中保溫材為碳纖維。In an embodiment of the invention, wherein the insulating material is carbon fiber.

基於上述,在本發明的長晶裝置中,熱帷幕內設有冷卻元件,可加大長晶時晶棒的溫度梯度而提升晶棒品質,並可提升產出效率。Based on the above, in the crystal growth apparatus of the present invention, a cooling element is provided in the thermal curtain, which can increase the temperature gradient of the ingot during the growth of the crystal, thereby improving the quality of the ingot and improving the output efficiency.

為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。The above described features and advantages of the invention will be apparent from the following description.

圖1是依照本發明一實施例的長晶裝置的剖面示意圖。請參照圖1,本實施例的長晶裝置100包括一腔體110、一吊線120、一坩堝130、一加熱元件140、一熱帷幕150以及一冷卻元件160。腔體110通常為圓桶狀,且適合通入鈍氣至腔體110,腔體110內的壓力例如是60 torr。鈍氣例如是氬氣,不容易與長晶材料產生反應,可確保晶棒的品質。坩堝130配置於腔體110中,用以容置一熔湯50。在本實施例中,可將例如是多晶矽的半導體材料及例如是硼、磷的摻雜物以1420°C以上的高溫熔融於坩堝130中以形成熔湯50。吊線120設置於腔體110中,用以上拉一晶種60。加熱元件140配置於腔體110中且位於坩堝130的外圍,用以加熱熔湯50。熱帷幕150配置於腔體110中且位於坩堝130上方。熱帷幕150可在拉晶的過程中隔絕輻射熱,進而控制並且提高矽晶棒70的溫階。1 is a schematic cross-sectional view of a crystal growth apparatus in accordance with an embodiment of the present invention. Referring to FIG. 1 , the crystal growth apparatus 100 of the present embodiment includes a cavity 110 , a suspension line 120 , a crucible 130 , a heating element 140 , a thermal curtain 150 , and a cooling element 160 . The cavity 110 is generally in the shape of a barrel and is adapted to pass a blunt gas to the cavity 110. The pressure within the cavity 110 is, for example, 60 torr. The blunt gas is, for example, argon gas, and does not easily react with the crystal growth material to ensure the quality of the crystal rod. The crucible 130 is disposed in the cavity 110 for accommodating a molten soup 50. In the present embodiment, a semiconductor material such as polysilicon and a dopant such as boron or phosphorus may be melted in the crucible 130 at a high temperature of 1420 ° C or higher to form the melt 50. The suspension wire 120 is disposed in the cavity 110, and a seed crystal 60 is pulled by the above. The heating element 140 is disposed in the cavity 110 and located at the periphery of the crucible 130 for heating the melt 50. The thermal curtain 150 is disposed in the cavity 110 and above the crucible 130. The thermal curtain 150 can isolate radiant heat during the pulling process, thereby controlling and increasing the temperature profile of the twine 70.

當多晶矽材料與摻雜物熔化完成而形成熔湯50時,將吊線120緩慢地下放至熔湯50中。接著,吊線120一邊旋轉一邊緩步拉升晶種60,以使得類似於圓柱體狀的矽晶棒70在晶種60下方形成。另外,長晶裝置100可更包括旋轉軸190,旋轉軸190可支撐坩堝130並且帶動坩堝130旋轉。例如當吊線120以逆時針方向旋轉並緩步拉升晶種60時,坩堝130藉由旋轉軸190的帶動而以順時針方向旋轉。另外,隨著矽晶棒70越來越長,熔湯50的液面會越來越低。此時,可調整坩堝130與熱帷幕150之間的距離而使兩者逐漸靠近,藉以保持熱帷幕150的底部與熔湯50的液面的距離,並使矽晶棒70維持較佳的溫度梯度。When the polysilicon material and the dopant are melted to form the melt 50, the suspension wire 120 is slowly placed underground into the melt 50. Next, the suspension wire 120 slowly pulls up the seed crystal 60 while rotating, so that a cylinder-like twin rod 70 is formed under the seed crystal 60. In addition, the crystal growth apparatus 100 may further include a rotating shaft 190 that can support the crucible 130 and drive the crucible 130 to rotate. For example, when the suspension wire 120 is rotated in the counterclockwise direction and the seed crystal 60 is slowly pulled up, the crucible 130 is rotated in the clockwise direction by the rotation of the rotary shaft 190. In addition, as the twin rod 70 becomes longer and longer, the liquid level of the melt 50 will become lower and lower. At this time, the distance between the crucible 130 and the thermal curtain 150 can be adjusted to bring the two closer together, thereby maintaining the distance between the bottom of the thermal curtain 150 and the liquid surface of the melt 50, and maintaining the twin rod 70 at a preferred temperature. gradient.

本實施例的熱帷幕150具有一內壁152與一外壁154。內壁152與外壁154之間具有一內部空間156。內壁152是指構成熱帷幕150面向吊線120的內表面的壁,而外壁154是指構成熱帷幕150背向吊線120的外表面的壁。冷卻元件160配置於內壁152與外壁154之間的內部空間156。因此,冷卻元件160大致是被密封於內壁152與外壁154之間,並與外界隔絕。藉此,可避免冷卻元件160對於熔湯50產生污染。由於冷卻元件160的降溫作用,矽晶棒70離開熔湯50後的溫度會快速下降,也就是矽晶棒70上的溫度梯度會增加。因此,矽晶棒70經過900°C~1200°C這個溫度段的時間也會縮短,進而降低OISF產生的機會,以提高矽晶棒70的品質。而且,溫度梯度增加後,矽晶棒70形成的速度也可以加快,有助於縮短製程時間而降低製程成本。The thermal curtain 150 of the present embodiment has an inner wall 152 and an outer wall 154. An inner space 156 is defined between the inner wall 152 and the outer wall 154. The inner wall 152 refers to a wall constituting the inner surface of the heat curtain 150 facing the suspension wire 120, and the outer wall 154 refers to a wall constituting the outer surface of the heat curtain 150 facing away from the suspension wire 120. The cooling element 160 is disposed in an interior space 156 between the inner wall 152 and the outer wall 154. Therefore, the cooling element 160 is substantially sealed between the inner wall 152 and the outer wall 154 and is isolated from the outside. Thereby, contamination of the melt 50 by the cooling element 160 can be avoided. Due to the cooling effect of the cooling element 160, the temperature of the crystallized rod 70 after leaving the melt 50 drops rapidly, that is, the temperature gradient on the twin rod 70 increases. Therefore, the time during which the twin rod 70 passes through the temperature range of 900 ° C to 1200 ° C is also shortened, thereby reducing the chance of OISF generation, thereby improving the quality of the twin rod 70. Moreover, after the temperature gradient is increased, the speed at which the twin rod 70 is formed can also be increased, which helps to shorten the process time and reduce the process cost.

在本發明的一實施例中,以熱帷幕150靠近熔湯50的一側為底部150A,冷卻元件160從熱帷幕150的底部150A分布至頂部150B。換言之,冷卻元件160從上到下佈滿在熱帷幕150的內部空間156中。如此,冷卻元件160可以提供較佳的冷卻效果,以增加溫度梯度並加快長晶速度。冷卻元件160的冷卻能力越好,溫度梯度就能越明顯地增加。本實施例的冷卻元件160可以是裝有冷卻液的金屬管,例如是裝有冷卻水、氬氣或氦氣的銅管,但本發明不侷限於此。由於內壁152與外壁154隔絕了冷卻元件160與熔湯50,因此冷卻元件160的材質的選擇不需考慮是否會污染熔湯50。In one embodiment of the invention, the side of the thermal curtain 150 adjacent the melt 50 is the bottom 150A, and the cooling element 160 is distributed from the bottom 150A of the thermal curtain 150 to the top 150B. In other words, the cooling element 160 is filled in the interior space 156 of the thermal curtain 150 from top to bottom. As such, the cooling element 160 can provide a better cooling effect to increase the temperature gradient and speed up the growth rate. The better the cooling capacity of the cooling element 160, the more pronounced the temperature gradient can be increased. The cooling member 160 of the present embodiment may be a metal tube equipped with a cooling liquid, for example, a copper tube equipped with cooling water, argon gas or helium gas, but the present invention is not limited thereto. Since the inner wall 152 isolates the cooling element 160 from the melt 50 from the outer wall 154, the choice of material for the cooling element 160 does not require consideration of whether the melt 50 will be contaminated.

為了進一步提升冷卻效果,本實施例的長晶裝置100可更包括一保溫材170,配置於內壁152與外壁154之間的內部空間156。保溫材例如為碳纖維,但本發明不侷限於此。In order to further enhance the cooling effect, the crystal growth apparatus 100 of the present embodiment may further include a heat insulating material 170 disposed in the inner space 156 between the inner wall 152 and the outer wall 154. The heat insulating material is, for example, carbon fiber, but the present invention is not limited thereto.

本實施例的熱帷幕150的材質為石墨或其他適當材質。內壁152與外壁154的材質可以相同或不同。內壁152與外壁154例如是可拆解地組裝在一起。因此,在置放冷卻元件160時,可先將內壁152與外壁154拆開,然後再組裝在一起。內部空間156例如是與腔體110內的其他空間隔絕而彼此不連通的,已確保冷卻效果及避免污染熔湯50。The material of the thermal curtain 150 of this embodiment is graphite or other suitable material. The material of the inner wall 152 and the outer wall 154 may be the same or different. The inner wall 152 and the outer wall 154 are, for example, detachably assembled. Therefore, when the cooling element 160 is placed, the inner wall 152 and the outer wall 154 can be first detached and then assembled. The interior space 156, for example, is isolated from the other spaces within the cavity 110 and is not in communication with each other, ensuring a cooling effect and avoiding contamination of the melt 50.

本實施例的長晶裝置100可更包括一保溫元件180,配置於腔體110中。加熱元件140位於保溫元件180與坩堝130之間,以保持熔湯50的溫度以及加熱元件140所造成的加熱效果。The crystal growth apparatus 100 of the present embodiment may further include a heat retention element 180 disposed in the cavity 110. The heating element 140 is positioned between the thermal insulation element 180 and the crucible 130 to maintain the temperature of the melt 50 and the heating effect caused by the heating element 140.

申請人對於上述實施例的具有冷卻元件160的長晶裝置100以及習知技術中沒有設置冷卻元件的長晶裝置進行了模擬分析。模擬的長晶裝置100的製程條件為:熔湯投料量60 kg、矽晶棒轉速16 rpm、矽晶棒拉速60 mm/hr、坩堝轉速-14 rpm、腔體內氣壓60 torr、冷卻元件內所通的氬氣流量40 slpm (Standard liters per minute),而模擬的習知的長晶裝置的製程條件除了沒有冷卻元件之外,其他都與長晶裝置100相同。在以上述條件進行模擬後得到,長晶裝置100的矽晶棒從熔湯的表面起算的平均溫度梯度為5.137 ºK/mm,而習知長晶裝置的矽晶棒從熔湯的表面起算的平均溫度梯度為4.137 ºK/mm。由此可知,相較於習知長晶裝置所達成的溫度梯度,上述實施例的具有冷卻元件160的長晶裝置100所達成的溫度梯度提高了24%,足以證明本發明的長晶裝置確實有助於加大晶棒的溫度梯度。Applicant performed a simulation analysis of the crystal growth apparatus 100 having the cooling element 160 of the above embodiment and the crystal growth apparatus having no cooling element provided in the prior art. The process conditions of the simulated crystal growth apparatus 100 are: melt feed amount 60 kg, twin rod rotation speed 16 rpm, twin rod pull speed 60 mm/hr, helium rotation speed - 14 rpm, chamber internal pressure 60 torr, cooling element The flow rate of the argon gas passed was 40 slpm (Standard liters per minute), and the process conditions of the simulated conventional crystal growth apparatus were the same as those of the crystal growth apparatus 100 except that there was no cooling element. After the simulation under the above conditions, the average temperature gradient of the twin rod of the crystal growth apparatus 100 from the surface of the melt was 5.137 oK/mm, and the crystal growth rod of the conventional crystal growth apparatus was calculated from the surface of the molten soup. The average temperature gradient is 4.137 oK/mm. It can be seen that the temperature gradient achieved by the crystal growth device 100 having the cooling element 160 of the above embodiment is improved by 24% compared to the temperature gradient achieved by the conventional crystal growth apparatus, which is sufficient to prove that the crystal growth apparatus of the present invention is indeed Helps increase the temperature gradient of the ingot.

綜上所述,在本發明的長晶裝置中,冷卻元件對晶棒產生冷卻效果,以加大晶棒的溫度梯度而降低氧化疊差產生的機率,不僅可以提升晶棒的品質,還可提升產出效率。另外,因為冷卻元件是配置於熱帷幕的內部空間,所以可以避免冷卻元件污染熔湯。In summary, in the crystal growth apparatus of the present invention, the cooling element produces a cooling effect on the ingot to increase the temperature gradient of the ingot and reduce the probability of occurrence of the oxidation stack, which not only improves the quality of the ingot, but also improves the quality of the ingot. Improve output efficiency. In addition, since the cooling element is disposed in the inner space of the heat curtain, it is possible to prevent the cooling element from contaminating the molten material.

雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明的精神和範圍內,當可作些許的更動與潤飾,故本發明的保護範圍當視後附的申請專利範圍所界定者為準。Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present invention, and any one of ordinary skill in the art can make some changes and refinements without departing from the spirit and scope of the present invention. The scope of the invention is defined by the scope of the appended claims.

50‧‧‧熔湯
60‧‧‧晶種
70‧‧‧矽晶棒
100‧‧‧長晶裝置
110‧‧‧腔體
120‧‧‧吊線
130‧‧‧坩堝
140‧‧‧加熱元件
150‧‧‧熱帷幕
150A‧‧‧底部
150B‧‧‧頂部
152‧‧‧內壁
154‧‧‧外壁
156‧‧‧內部空間
160‧‧‧冷卻元件
170‧‧‧保溫材
180‧‧‧保溫元件
190‧‧‧旋轉軸
50‧‧‧ molten soup
60‧‧‧ seed crystal
70‧‧‧矽晶棒
100‧‧‧ crystal growth device
110‧‧‧ cavity
120‧‧‧ hanging wire
130‧‧‧坩埚
140‧‧‧heating elements
150‧‧‧hot curtain
150A‧‧‧ bottom
150B‧‧‧ top
152‧‧‧ inner wall
154‧‧‧ outer wall
156‧‧‧Internal space
160‧‧‧Cooling element
170‧‧‧Insulation
180‧‧‧Insulation components
190‧‧‧Rotary axis

圖1是依照本發明一實施例的長晶裝置的剖面示意圖。1 is a schematic cross-sectional view of a crystal growth apparatus in accordance with an embodiment of the present invention.

50‧‧‧熔湯 50‧‧‧ molten soup

60‧‧‧晶種 60‧‧‧ seed crystal

70‧‧‧矽晶棒 70‧‧‧矽晶棒

100‧‧‧長晶裝置 100‧‧‧ crystal growth device

110‧‧‧腔體 110‧‧‧ cavity

120‧‧‧吊線 120‧‧‧ hanging wire

130‧‧‧坩堝 130‧‧‧坩埚

140‧‧‧加熱元件 140‧‧‧heating elements

150‧‧‧熱帷幕 150‧‧‧hot curtain

150A‧‧‧底部 150A‧‧‧ bottom

150B‧‧‧頂部 150B‧‧‧ top

152‧‧‧內壁 152‧‧‧ inner wall

154‧‧‧外壁 154‧‧‧ outer wall

156‧‧‧內部空間 156‧‧‧Internal space

160‧‧‧冷卻元件 160‧‧‧Cooling element

170‧‧‧保溫材 170‧‧‧Insulation

180‧‧‧保溫元件 180‧‧‧Insulation components

190‧‧‧旋轉軸 190‧‧‧Rotary axis

Claims (8)

一種長晶裝置,包括: 一腔體; 一吊線,設置於該腔體中,用以上拉一晶種; 一坩堝,配置於該腔體中,用以容置一熔湯; 一加熱元件,配置於該腔體中且位於該坩堝的外圍,用以加熱該熔湯; 一熱帷幕,配置於該腔體中且位於該坩堝上方,其中該熱帷幕具有一內壁與一外壁,該內壁與該外壁之間具有一內部空間;以及 一冷卻元件,配置於該內壁與該外壁之間的該內部空間。A crystal growth apparatus comprising: a cavity; a suspension wire disposed in the cavity, the seed crystal is pulled by the above; a crucible disposed in the cavity for accommodating a molten soup; a heating element, Disposed in the cavity and located at the periphery of the crucible for heating the molten material; a thermal curtain disposed in the cavity and above the crucible, wherein the thermal curtain has an inner wall and an outer wall, the inner An inner space is formed between the wall and the outer wall; and a cooling element disposed in the inner space between the inner wall and the outer wall. 如申請專利範圍第1項所述的長晶裝置,其中以該熱帷幕靠近該熔湯的一側為底部,該冷卻元件從該熱帷幕的底部分布至頂部。The crystal growth apparatus of claim 1, wherein the side of the hot curtain adjacent to the melt is a bottom portion, and the cooling element is distributed from the bottom of the heat curtain to the top. 如申請專利範圍第1項所述的長晶裝置,其中該冷卻元件為裝有冷卻液的金屬管。The crystal growth apparatus of claim 1, wherein the cooling element is a metal tube filled with a coolant. 如申請專利範圍第1項所述的長晶裝置,其中該熱帷幕的材質為石墨。The crystal growth apparatus of claim 1, wherein the thermal curtain is made of graphite. 如申請專利範圍第1項所述的長晶裝置,其中該內壁與該外壁是可拆解地組裝在一起。The crystal growth apparatus of claim 1, wherein the inner wall and the outer wall are detachably assembled. 如申請專利範圍第1項所述的長晶裝置,更包括一保溫元件,配置於該腔體中,其中該加熱元件位於該保溫元件與該坩堝之間。The crystal growth device of claim 1, further comprising a heat insulating member disposed in the cavity, wherein the heating element is located between the heat insulating member and the crucible. 如申請專利範圍第1項所述的長晶裝置,更包括一保溫材,配置於該內壁與該外壁之間的該內部空間。The crystal growth device of claim 1, further comprising a heat insulating material disposed in the inner space between the inner wall and the outer wall. 如申請專利範圍第7項所述的長晶裝置,其中該保溫材為碳纖維。The crystal growth apparatus of claim 7, wherein the thermal insulation material is carbon fiber.
TW104132981A 2015-10-07 2015-10-07 Crystal growth apparatus TWI567253B (en)

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