TW201811452A - Internal purge diffuser with offset manifold - Google Patents

Internal purge diffuser with offset manifold Download PDF

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TW201811452A
TW201811452A TW105128692A TW105128692A TW201811452A TW 201811452 A TW201811452 A TW 201811452A TW 105128692 A TW105128692 A TW 105128692A TW 105128692 A TW105128692 A TW 105128692A TW 201811452 A TW201811452 A TW 201811452A
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nozzle
sprinkler
substrate container
aperture
inlet nozzle
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TW105128692A
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Chinese (zh)
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TWI709441B (en
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凱爾 葛萊紋
傑佛瑞 J 金
馬修 富勒
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恩特葛瑞斯股份有限公司
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Publication of TWI709441B publication Critical patent/TWI709441B/en

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Abstract

A purge tower assembly for a substrate container. The assembly may include a purge interface body, including a base portion and a top portion, for mounting to a bottom plate of a substrate container. The base portion may include a substantially tubular base sidewall and the top portion may have a top sidewall positioned on the top edge of the base portion. The top portion may include an inlet nozzle for mounting through a rearward inlet in the bottom plate. The inlet nozzle may have a substantially tubular sidewall extending upwardly from the top sidewall and defining an interior of the inlet nozzle. The base portion and the top sidewall may define an offset conduit portion disposed connected to the base portion and the inlet nozzle, the base portion and the inlet nozzle in fluid communication via the offset conduit portion.

Description

具偏移歧管之內部清潔噴灑器Internal cleaning sprayer with offset manifold

本發明大體上係關於用於微型環境之清潔系統,且更具體而言本發明係關於用於基板容器之噴灑器塔。The present invention relates generally to cleaning systems for use in microenvironments, and more particularly to sprinkler towers for substrate containers.

在將基板自一基板容器插入或移除期間,灰塵痕跡、氣體雜質或增加溼度可引入該基板容器中,負面影響駐留晶圓之產物良率。相應地,在基板處置期間存在對於控制此等容器內之環境之一增加需求以達成或維持清潔度之一高位準。 在一些例項中,使用透過一入口端口注入一基板容器之內部以引起該容器內之空氣透過一出口端口離開之一惰性氣體來清潔該容器內之一微型環境。將清潔氣體遞送至該容器中之系統及方法已經設計以提供該容器內之一改良環境。 由於開發了前開式晶圓傳送盒(FOUP),因此由載體製造商引入底部清潔端口以使用清潔乾燥空氣(CDA)或惰性清潔來實現內部環境之清潔。在FOUP殼之內部底面下方引入此等清潔模組。 當引入清潔噴灑器時,吾人將明白:若噴灑器軸向組裝至清潔介面,則噴灑器將不僅干擾晶圓處置排除體積亦干擾儲存在FOUP內部的晶圓。相反,在未對既有殼設計實行任何修改之情況下,噴灑器管設計為軸向朝內部偏移。 讓渡給Burns等人(「Burns」)之美國專利第9,054,144號揭示一種具一清潔塔之基板容器,該清潔塔包含由一偏移導管連接之一基座部分及一噴灑器塔部分。該偏移導管使得該塔部分能夠朝向該容器之背部偏移,藉此使得內部空間能夠更佳地用於基板儲存及處置且提供一更緊湊設計。除了含納於其中之明確限定及專利請求項之外,Burns之揭示內容特此以引用的方式併入本文中。During the insertion or removal of the substrate from a substrate container, dust marks, gaseous impurities or increased humidity can be introduced into the substrate container, adversely affecting the yield of the resident wafer. Accordingly, there is an increased demand during the handling of the substrate to control one of the environments within such containers to achieve or maintain a high level of cleanliness. In some embodiments, a microenvironment within the container is cleaned by injecting an interior of a substrate container through an inlet port to cause air within the container to exit an inert gas through an outlet port. Systems and methods for delivering a cleaning gas into the container have been designed to provide an improved environment within the container. Since the front opening wafer transfer cassette (FOUP) was developed, the bottom cleaning port was introduced by the carrier manufacturer to clean the internal environment using clean dry air (CDA) or inert cleaning. These cleaning modules are introduced below the inner bottom surface of the FOUP housing. When introducing a cleaning sprinkler, we will understand that if the sprinkler is axially assembled to the cleaning interface, the sprinkler will not only interfere with the wafer disposal exclusion volume but also interfere with the wafers stored inside the FOUP. In contrast, the sprinkler tube is designed to be axially offset toward the interior without any modifications to the existing shell design. U.S. Patent No. 9,054,144, the disclosure of which is incorporated herein by reference to the entire entire entire entire entire entire entire entire entire entire entire entire entire entire entire portion The offset conduit enables the tower portion to be offset toward the back of the container, thereby enabling the interior space to be better used for substrate storage and disposal and to provide a more compact design. The disclosure of Burns is hereby incorporated by reference in its entirety, in its entirety, in its entirety, in its entirety in its entirety.

利用一偏移導管之習知清潔塔經構形使得該偏移導管位於基板容器內部且自基板容器之地板向上突出使得偏移導管部分不與地板齊平。儘管導管可經設定大小使得最底下晶圓在導管上通過,但吾人已發現在最底下晶圓之插入或移除期間突出導管仍可干擾機器人端效應器之操作。干擾可引起端效應器與導管之間的碰撞,藉此產生顆粒且亦可導致晶圓不當處理。 與習知偏移清潔塔有關的另一問題係習知偏移清潔塔必須安裝至基板容器之內部。對於其中偏移清潔塔之總長度大於基板容器之地板至天花板間隙之構形,當在組裝期間嘗試使清潔塔直立時可出現問題。噴灑器部分之上端可與基板容器之天花板碰撞,其可損壞噴灑器部分及基板容器之一者或兩者。在一些例項中,可需要折衷噴灑器部分之所要長度。 本發明之各種實施例係關於一種釋放用於晶圓儲存及操縱同時允許清潔氣體之氣流的晶圓容器內之額外空間之清潔噴灑器總成。相應地,本發明之各種實施例呈現歸因於端效應器與清潔塔總成之間的碰撞而污染基板容器之內表面之一較低機率。此外,在本發明之各種實施例中,清潔塔總成之噴灑器部分之有效長度增加使得清潔氣體出口位於比使用習知清潔塔總成更靠近基板容器之地板。藉由定位清潔出口更靠近地板,基板容器之最底下晶圓下方之清潔氣體之氣流可增加以改良清潔效能。 本發明之各種實施例提供一種位於基板容器外部而非位於容器內部之偏移導管,該導管在基板容器之地板下面安排路線。藉由將偏移導管定位於基板容器外部而提供之額外空間使得機器人端效應器能夠在不會與偏移導管碰撞之情況下在儲存於其中之一最底下晶圓下方操控。 另外,一些實施例經構形使得清潔塔之噴灑器部分可在基板容器之地板平面處起作用。即,噴灑器部分之有效長度開始於與基板容器之地板對應之噴灑器部分上之一高度處。這使得清潔氣體能夠進入地板平面處之基板容器,使得最底下基板下方之清潔氣流相對於習知清潔塔而增加。在一實施例中,噴灑器部分之有效部分相對於習知噴灑器降低多至4.5 mm。 本發明之一些實施例呈現組裝於外部且可自基板容器之外部安裝及卸除之一外部偏移清潔塔總成。本發明之一些實施例包含可拆離及可重新附接至該外部偏移清潔塔總成之一清潔介面本體之一噴灑器部分,使得該噴灑器部分在該清潔介面本體安裝至基板容器之後貼附至該清潔介面本體。透過此等實施例之兩者,消除清潔塔總成之過量長度之問題。 亦考量藉由在一內部導管透過其安排路線之容器之地板中提供一凹口而減小導管之輪廓之實施例。偏移導管及凹口可經設定大小使得偏移導管之最上端位於基板容器之地板之內部平面處或下方。在此一實施例中,偏移導管之減小輪廓(儘管位於內部)相對於端效應器間隙而提供相同於一外部偏移導管之效應且增強最底下基板之清潔。 本發明之各種實施例係關於一種用於一基板容器之包含用於連接至一基板容器之一底板之一清潔介面本體的清潔塔總成。該清潔介面本體可包含一基座部分及一頂部部分。該基座部分可具有一自一底部邊緣向上延伸至一頂部邊緣之實質上管狀基座側壁。該底部邊緣可界定用於接達至該基座部分之一內部之一第一孔隙,該第一孔隙係圍繞一第一軸線同心。 在一或多個實施例中,該頂部部分連接至該基座部分之該頂部邊緣。該頂部部分可具有定位於該基座部分之該頂部邊緣上以向上遮蓋該底部孔隙之一頂部側壁。該頂部部分可包含用於透過該基板容器之該底板中之一入口安裝之一入口管嘴。該入口管嘴可具有自該頂部側壁向上延伸至一管嘴邊緣之一實質上管狀管嘴側壁。該管嘴邊緣可界定用於接達至該入口管嘴之一內部之一第二孔隙,該第二孔隙係圍繞一第二軸線同心。在特定實施例中,該第二軸線實質上平行於該第一軸線且定位於該第一軸線後側。在一或多個實施例中,該清潔介面本體包含安置於該基座部分與該入口管嘴之間的一偏移導管部分。該基座部分及該入口管嘴可經由該偏移導管部分呈流體連通。 該清潔塔總成包含一噴灑器部分。在一或多個實施例中,該噴灑器部分係一包含一多孔噴灑器側壁且界定一沿一噴灑器軸線延伸至該噴灑器部分之噴灑器通道之噴灑器部分。該噴灑器側壁可界定可操作性耦合至該入口管嘴用於該基座部分、該入口管嘴與該噴灑器部分之間的流體連通之該噴灑器部分之一底部部分處之一開口。另外或替代地,該噴灑器部分可包括一具有複數個形成於其中之通過孔隙的外殼。 上述[發明內容]不意欲描述本發明的各所繪示實施例或每個實施方案。Conventional cleaning towers utilizing an offset conduit are configured such that the offset conduit is located inside the substrate container and projects upwardly from the floor of the substrate container such that the offset conduit portion is not flush with the floor. Although the catheter can be sized to pass the bottommost wafer over the catheter, it has been found that the protruding conduit can interfere with the operation of the robotic end effector during insertion or removal of the bottommost wafer. Interference can cause collisions between the end effector and the conduit, thereby creating particles and can also cause improper handling of the wafer. Another problem associated with conventional offset cleaning towers is that conventional offset cleaning towers must be mounted to the interior of the substrate container. For configurations in which the offset cleaning tower has a total length greater than the floor-to-ceiling gap of the substrate container, problems can arise when attempting to erect the cleaning tower during assembly. The upper end of the sprinkler portion can collide with the ceiling of the substrate container, which can damage one or both of the sprinkler portion and the substrate container. In some instances, it may be desirable to compromise the desired length of the sprinkler portion. Various embodiments of the present invention are directed to a cleaning sprinkler assembly that releases additional space within a wafer container for wafer storage and manipulation while allowing gas flow of cleaning gas. Accordingly, various embodiments of the present invention present a lower probability of contaminating one of the inner surfaces of the substrate container due to a collision between the end effector and the cleaning tower assembly. Moreover, in various embodiments of the invention, the effective length of the sprinkler portion of the cleaning tower assembly is increased such that the cleaning gas outlet is located closer to the floor of the substrate container than with conventional cleaning tower assemblies. By positioning the cleaning outlet closer to the floor, the flow of cleaning gas below the bottommost wafer of the substrate container can be increased to improve cleaning performance. Various embodiments of the present invention provide an offset conduit located outside of the substrate container rather than inside the container, the conduit being routed under the floor of the substrate container. The additional space provided by positioning the offset conduit outside of the substrate container enables the robotic end effector to be manipulated under one of the bottommost wafers without colliding with the offset conduit. Additionally, some embodiments are configured such that the sprinkler portion of the cleaning tower can function at the floor level of the substrate container. That is, the effective length of the sprinkler portion begins at a height on the portion of the sprinkler that corresponds to the floor of the substrate container. This allows the cleaning gas to enter the substrate container at the floor level such that the clean gas stream below the bottommost substrate increases relative to conventional cleaning towers. In one embodiment, the effective portion of the sprinkler portion is reduced by up to 4.5 mm relative to conventional sprinklers. Some embodiments of the present invention present an externally offset cleaning tower assembly that is assembled externally and that can be mounted and removed from the exterior of the substrate container. Some embodiments of the invention include a sprinkler portion detachable and reattachable to one of the cleaning interface bodies of the external offset cleaning tower assembly such that the sprinkler portion is mounted to the substrate container after the cleaning interface body Attached to the cleaning interface body. The problem of excessive length of the cleaning tower assembly is eliminated by both of these embodiments. Embodiments for reducing the profile of the conduit by providing a recess in the floor of the container through which the internal conduit is routed are also contemplated. The offset conduit and recess can be sized such that the uppermost end of the offset conduit is at or below the inner plane of the floor of the substrate container. In this embodiment, the reduced profile of the offset conduit (although located internally) provides the same effect as an externally offset conduit relative to the end effector gap and enhances cleaning of the bottommost substrate. Various embodiments of the present invention are directed to a cleaning tower assembly for a substrate container that includes a cleaning interface body for attachment to a bottom plate of a substrate container. The cleaning interface body can include a base portion and a top portion. The base portion can have a substantially tubular base sidewall extending upwardly from a bottom edge to a top edge. The bottom edge can define a first aperture for accessing to one of the interior portions of the base portion, the first aperture being concentric about a first axis. In one or more embodiments, the top portion is coupled to the top edge of the base portion. The top portion can have a top edge positioned on the top edge of the base portion to cover upwardly one of the bottom apertures. The top portion can include an inlet nozzle for mounting one of the inlets through the substrate container. The inlet nozzle can have a substantially tubular nozzle sidewall extending upwardly from the top sidewall to a nozzle edge. The nozzle edge can define a second aperture for accessing one of the interior of the inlet nozzle, the second aperture being concentric about a second axis. In a particular embodiment, the second axis is substantially parallel to the first axis and is positioned on a rear side of the first axis. In one or more embodiments, the cleaning interface body includes an offset conduit portion disposed between the base portion and the inlet nozzle. The base portion and the inlet nozzle are fluidly connectable via the offset conduit portion. The cleaning tower assembly includes a sprinkler portion. In one or more embodiments, the sprinkler portion includes a sprinkler portion that includes a perforated sprinker sidewall and defines a sprinkler passage that extends along a sprinkler axis to the sprinkler portion. The sprinkler sidewall may define an opening at one of the bottom portions of the sprinkler portion operatively coupled to the inlet nozzle for fluid communication between the base portion and the spout portion. Additionally or alternatively, the sprinkler portion can include a housing having a plurality of through apertures formed therein. The above [invention] is not intended to describe the illustrated embodiments or each embodiment of the present invention.

相關申請案 本申請案主張2015年9月4日申請之較早申請日期之美國專利申請案第62/214,464號及2015年12月4日申請之美國專利申請案第62/263,194號之權利,該等專利申請案之全部內容以引用的方式併入本文中。 參考圖1,描繪根據本發明之一實施例之用於儲存複數個基板之一基板容器30。如本文所使用,該複數個基板包含在半導體、印刷電路板、平板顯示器及/或其類似者之製造中使用之基板。為了繪示,呈現一單一基板32a。在特定實施例中,基板容器30包含兩個相對側部分34、一頂部部分36、一底板38及一背部42。底板38界定基板容器30之一內表面或地板40。基板容器30之一前部44包含界定用於基板32之插入及移除的一門開口48之一門框46。一門52經調適以密封及遮蓋門開口48。基板容器30之門開口48位於一實質上平行於一垂直方向54之平面中。在各種實施例中,基板容器30之特性在於含有一微型環境64。 在一或多個實施例中,一對開槽側壁66安置於基板容器30內,各鄰近側壁部分34之一各自側壁部分。開槽側壁66經對準使得狹槽面向彼此以界定複數個狹槽位置68且隔開使得(若干)基板32被支撐於其等之間。為了本發明之目的,該複數個狹槽位置68之一最底下狹槽位置68a (即,最靠近底板38之狹槽)識別為「第一」狹槽,其中狹槽數目在向上方向上增加。為了繪示,諸如在下文所描述之圖6至圖8及圖15至圖16中,呈現一基板32b且其被描繪為佔據最底下狹槽68a。 在各種實施例中,基板容器30進一步包含安置於基板容器30內的至少一清潔塔總成70。在各種實施例中,清潔塔總成70可操作性耦合至位於基板容器30外部之一氣體源(未描繪)用於將一氣態工作流體引入至基板容器30中。在特定實施例中,清潔塔總成70之一或多者經定向以朝向門開口48引導該氣態工作流體以清潔基板容器30。 在特定實施例中,基板容器30進一步包含定位於底板38下之一輸送板71。在各種實施例中,輸送板71安裝至基板容器30之底部以在各種基板處理步驟期間用於基板容器30之以機器為基礎之定位及對準。 參考圖2至圖5,描繪根據本發明之一實施例之一清潔塔總成70。在所描繪之實施例中,清潔塔總成70包含一清潔介面本體90,其包含一基座部分94及一頂部部分98。在一或多個實施例中,清潔介面本體90經適當設定大小及塑形用於外部安裝於一基板容器30上。例如,清潔介面本體可安裝至一基板容器30之一輸送板71。在一些實施例中,清潔介面本體可安裝至底板38。在一些實施例中,清潔介面本體90可安裝於底板38與一輸送板71之間。 在(例如)圖3中之各種實施例中,基座部分94具有由自一底部邊緣102延伸至一頂部邊緣106之一側壁100界定之管狀形狀。側壁100之管狀形狀界定一內部部分110及於底部邊緣102處界定用於接達至內部部分110之一底部孔隙114。在各種實施例中,基座部分94包含用於耦合至一外部流體源之組件。例如,在一些實施例中,基座部分包含安裝在底部孔隙114及內部部分110中之一索環118、過濾器122及一閥126 (圖4)。在特定實施例中,底部孔隙114與一軸線130同心。 在(例如)圖5中之一或多個實施例中,側壁100界定基座部分94中的複數個孔隙119。在特定實施例中,孔隙119之各者圍繞側壁100及軸線130圓周地間隔。在各種實施例中,孔隙119係自索環118之側突出之凸出部用於將索環118裝配及放置於基座部分94之內部110內的插孔。例如,在一些實施例中,索環118係一撓性組件且凸出部可在插入至基座部分之內部110期間彈性地壓縮且接著向外擴展至孔隙119以將索環鎖定在適當位置。 在一些實施例中,基座部分94包含支撐部分120。支撐部分120可係與側壁100整合之向外延伸材料部分。在特定實施例中,支撐部分120作為用於清潔介面本體90之操縱之握柄或手柄。在一些實施例中,支撐部分120係卡扣配合至輸送板中之底切特徵用於將本體90安裝至一基板容器之撓性樑,本文中進一步描述。 在一或多個實施例中,頂部部分98包含實質上係平面且沿頂部邊緣106連接至基座部分94之一頂部側壁134。在一些實施例中,頂部側壁134連接至基座部分94之頂部。基座部分94及頂部部分98可由技術者可用之技術(例如,超音波焊接或熱焊接、卡扣配合、黏著劑結合)或由其他適合技術連接。 另外,(例如)在圖3中,頂部側壁134可包含自基座部分94延伸至一側之一偏移部分138。偏移部分138可包含自基座部分94偏移之一入口管嘴142。在一或多個實施例中,入口管嘴142具有由自頂部側壁134向上延伸至一管嘴邊緣150之一管嘴側壁146界定之一管狀形狀。在一或多個實施例中,管嘴側壁146界定一內部部分154及位於管嘴邊緣150處之一管嘴孔隙158。在各種實施例中,管嘴孔隙158提供接達至入口管嘴142之內部部分154。在特定實施例中,管嘴孔隙158係圍繞一第二軸線162同心。在各種實施例中,第二軸線162實質上平行於第一軸線130。 在一或多個實施例中,一偏移導管部分166安置於基座部分94與入口管嘴142之間(圖2及圖5)。在一或多個實施例中,偏移導管部分166與頂部側壁134之偏移部分138協作以在基座部分94與入口管嘴142之間提供一通路用於清潔介面本體90之組件之間的流體連通。 在操作中,流體透過止回閥126及底部孔隙114、通過內部部分110、154且透過管嘴孔隙158進入清潔塔總成70。在功能上,偏移導管166將氣流自第一軸線130轉向至第二軸線162。 在一些實施例中,如圖5中所展示,入口管嘴142係包含管嘴側壁146之一具倒鉤部分170及一錐形部分174之一具倒鉤之管嘴。在特定實施例中,具倒鉤部分170界定入口管嘴142之一外徑及錐形部分174界定毗鄰具倒鉤部分170之一減小外徑。在特定實施例中,管嘴側壁146界定具倒鉤部分170與錐形部分174之間的一側孔隙178。進一步描述:側孔隙178係管嘴側壁146中用於將氣體低噴灑至基板容器30之一孔或孔隙。 在一或多個實施例中,清潔塔總成70包含一耦合至清潔介面本體90之入口管嘴142之噴灑器部分182。在一些實施例中,噴灑器部分182包含一多孔或穿孔(孔隙)側壁186。在一些實施例中,側壁186界定一實質上管狀形狀,其中一噴灑器通道自噴灑器部分182之一頂面190延伸至一底部邊緣194。在一或多個實施例中,噴灑器部分182之底部邊緣194界定位於噴灑器部分182之一底部部分202處之一孔隙198。在各種實施例中,孔隙198可經設定大小用於入口管嘴142之插入以操作地耦合於兩者之間用於基座部分94、入口管嘴142與噴灑器部分182之間的流體連通。 在特定實施例中,管嘴側壁146包含形成於管嘴側壁146之一外表面上之外部螺紋(未描繪)。噴灑器部分182可包含形成於噴灑器部分之一內表面上之內部螺紋(未描繪)。當實施時,噴灑器部分182之螺紋與管嘴側壁146之螺紋相容以耦合於其等之間。 在各種實施例中,噴灑器部分182包含位於噴灑器部分182之底部部分處之一加寬部分206。在特定實施例中,加寬部分206向外加寬,具有相對於噴灑器部分之主體之一增加內徑以插入入口管嘴146及與入口管嘴142耦合。 參考圖6至圖8,根據本發明之一實施例描繪組裝於基板容器30中之清潔塔總成70。在所描繪之實施例中,基板容器30與清潔塔總成70相同或實質上類似,如本文所描述。相應地,相同元件係以相同編號參考數字予以識別。 在(例如)圖8中之組裝中,可藉由以下步驟將清潔介面本體90組裝至基板容器30:在方向210上向上插入清潔介面本體90、透過底板38中之一後部入口214放置入口管嘴142及將清潔介面本體90附接至一後部安裝區域218中之底板38之一外表面。在各種實施例中,後部安裝區域218介於輸送板71與底板38之間。清潔介面本體90可經設計以組裝至基板容器30達相對於一負載端口之一清潔固定裝置之各種垂直高度222。在各種實施例中,垂直高度222實質上匹配(若干)既有基板容器之垂直高度。在一或多個實施例中,入口管嘴142經設定大小使得當安裝至基板容器30之輸送板71時,入口管嘴142之管嘴邊緣150向上延伸至大約基板容器30之第一狹槽68a。 一旦清潔介面本體90透過入口214插入,噴灑器部分182可藉由經由門開口48使入口管嘴142接達基板容器30後部處而對其組裝。接著,噴灑器部分182貼附至入口管嘴142。 參考圖9至圖14,根據本發明之一實施例描繪基板容器30內之清潔塔總成70之組裝之各種階段。基板容器30與清潔塔總成70可係相同或實質上類似,如本文所描述。相應地,相同元件係以相同編號之參考數字予以識別。參考圖9,其中描繪一基板容器30及底板38之一底部透視圖。在一或多個實施例中,底板38包含用於一清潔塔總成70之一入口管嘴142之插入的一後部入口214 (圖8)。另外,在一些實施例中,底板38包含一安裝入口250。在各種實施例中,安裝入口250係底板38中之用於接納用於將輸送板71安裝至基板容器30之底板38之安裝構件之一孔隙。 例如,在圖10中,一輸送板71抵靠基板容器30之底板38放置。輸送板71可包含與安裝入口250對準之安裝入口251。如圖11中所描繪,一安裝機構254被接納於安裝入口250中且將輸送板71固定至底板38。在一或多個實施例中,安裝機構254係定位於底板38中以將輸送板71固定至基板容器30之底部的材料之一部分。圖11及圖12中描繪:安裝機構254係一具有一向下延伸側壁258且包含複數個圓周地配置在側壁258中之大體上L形狹槽262之部分環。在一或多個實施例中,L形狹槽262經傾斜具有一垂直部分263及一水平或止動部分264。 在各種實施例中,輸送板71在安裝入口251中可包含複數個向外延伸部件或凸輪265。凸輪265之各者可與L形狹槽262對應使得輸送板71可藉由以下步驟固定至底板38:將安裝機構254向下插入至安裝入口250及251、將凸輪265接納至垂直部分263中及扭轉安裝機構254以向上引導凸輪265及引導至止動部分264中,從而將輸送板71固定至底板38。 在各種實施例中,側壁254包含一對應於偏移導管部分166之後部開口266。如此一來,當固定於底板38時,偏移導管部分166自安裝機構254向後延伸以到達入口管嘴142。 在特定實施例中,各種類型之安裝機構254可用以將輸送板71固定至底板38。例如,安裝機構可使用超音波焊接或熱焊接、卡扣配合、黏著劑結合或其他適合技術。在一些實施例中,安裝機構254與底板38整合,使得底板38及安裝機構係一連續零件。 在圖12至圖13中描繪之一或多個實施例中,輸送板71包含用於清潔介面本體90之鎖定特徵,包含安裝入口251中的一或多個曝露接達至一支撐架268之側開口267。在各種實施例中,支撐架268由輸送板71中之底切部分269界定。在各種實施例中,藉由將清潔介面本體90向上插入至安裝入口251及將入口管嘴142 (圖2至圖4)插入至後部入口214而將清潔介面本體90固定至基板容器30。當向上插入清潔介面本體90時,支撐部分120可與傾斜或具倒鉤底切部分269接合及撓曲直至清潔介面本體90已完全插入安裝入口251中。一旦插入,支撐部分120可「卡扣」至支撐架268上以將清潔介面本體鎖定在適當位置。 在圖14中,描繪基板容器30之內部。在內部中,後部入口214及安裝機構254描繪於基板容器30之地板40中。清潔介面本體90安裝至基板容器30且入口管嘴142經描繪插入穿過後部入口214且延伸至容器30之內部中。在圖15中,描繪一噴灑器塔182,其裝配至入口管嘴142中。 參考圖16及圖17,描繪根據本發明之實施例之一基板容器30及清潔塔總成70之一部分之截面圖。在圖15中,清潔介面本體90外部安裝於底板38上,如上文所描述。安裝機構254定位於地板40中且將清潔介面本體90固定至容器30。入口管嘴142透過後部入口214進入容器30之內部。用於透過清潔介面本體90進入基板容器30之清潔氣體之噴灑的一噴灑器部分182裝配至入口管嘴142上使得入口管嘴142之一部分延伸至噴灑器部分182之內部中。定位於最底下狹槽68a中之基板32b在容器30中朝向清潔塔總成70向後延伸。因為清潔介面本體90安裝在外部,所以一間隙290維持在最底下基板32b與容器之地板40及安裝機構254之間。 諸如圖16中所描繪,在一些實施例中,基板容器30界定地板40中之一後部凹口300。在此等實施例中,清潔介面本體90內部安裝於容器30內。例如,清潔介面本體90可定位於凹口300中,其中基座部分94延伸穿過用於連接至一外部流體源之一孔隙304。凹口300可經設定大小使得清潔介面本體90之最上端位於基板容器30之地板40之平面處或下方。 在功能上,圖16實施例之凹口300減小偏移導管166之輪廓。由於該減小之輪廓,因此偏移導管166 (儘管位於容器30內部)提供相同於圖15之外部偏移導管配置之間隙290及相對於端效應器操縱及氣體清潔之相同操作優點。 亦在圖15及圖16中描繪,在一或多個實施例中,入口管嘴142包含一側孔隙178,如上文所描述。在各種實施例中,入口管嘴142及側孔隙178經構形使得清潔塔總成70之噴灑器部分182可在基板容器之地板40處或附近起作用。例如,在一些實施例中,側孔隙178依一高度定位於與基板容器30之地板40對應之入口管嘴142上。 在操作中,對於圖15之實施例及圖16之實施例兩者,間隙290提供機器人端效應器(未描繪)之基板32b下方的具有來自清潔介面本體90之組件之少量或無干擾之操控空間。另外,使地板平面處之噴灑器部分182之基座與由外部或減小輪廓偏移導管166提供之間隙290組合使得清潔氣體能夠進入地板平面處之基板容器30使得清潔氣流308被引導至最底下基板32b下方。 本文所揭示之額外特徵及方法之各者可單獨使用或與其他特徵及方法搭配使用以提供改良裝置及用於製造及使用改良裝置之方法。因此,本文所揭示之特徵及方法之組合可未必就其最廣義而言來實踐本發明且代以僅揭示以尤其描述代表實施例及較佳實施例。 熟習技術者在閱讀本發明之後可明白對實施例的各種修改。例如,熟習一般相關技術者將認識到針對不同實施例所描述之各種特徵可與其他特徵(單獨或在不同組合中)適合地組合、分離及重新組合。同樣地,上文所描述之各種特徵應全部被視為實例性實施例而不是對本發明之範疇或精神之限制。 熟習一般相關技術者將認識到各種實施例可包括比上文所描述之任何個別實施例中所繪示之特徵少的特徵。本文所描述之實施例不意謂為其中可組合各種特徵之方式之一窮舉性表示。相應地,實施例並非特徵之互斥組合;確切而言,申請專利範圍可包括選自不同個別實施例之不同個別特徵之一組合,如由熟習一般相關技術者所理解。 限制以引用上述文件的形式之任何併入使得無與本文之明確揭示內容相反之標的併入。進一步限制以引用上述文件的形式之任何併入使得無包含於文件中之請求項以引用的方式併入本文中。又進一步限制以引用上述文件的形式之任何併入使得提供於文件中的任何定義未以引用的方式併入本文中,除非明確包含於本文中。 參考含於本文中的「(若干)實施例」、「揭示內容」、「本發明」、「本發明之(若干)實施例」、「所揭示之(若干)實施例」及其類似者指稱未許可先前技術之本專利申請案之說明書(文字,包含申請專利範圍及圖式)。 為解釋申請專利範圍,本文之明確意圖為:未引用35 U.S.C. 112(f)之條款,除非在各自請求項中列舉特定術語「...之方法」或「...之步驟」。 RELATED APPLICATIONS This application claims the benefit of the benefit of the benefit of the benefit of the benefit of the benefit of the benefit of the benefit of the benefit of the benefit of the benefit of the benefit of the benefit of the benefit of the benefit of the benefit of The entire contents of these patent applications are incorporated herein by reference. Referring to Figure 1, a substrate container 30 for storing a plurality of substrates in accordance with an embodiment of the present invention is depicted. As used herein, the plurality of substrates comprise substrates for use in the manufacture of semiconductors, printed circuit boards, flat panel displays, and/or the like. To illustrate, a single substrate 32a is presented. In a particular embodiment, substrate container 30 includes two opposing side portions 34, a top portion 36, a bottom plate 38, and a back portion 42. The bottom plate 38 defines an inner surface of the substrate container 30 or the floor 40. One of the front portions 44 of the substrate container 30 includes a door frame 46 that defines a door opening 48 for insertion and removal of the substrate 32. A door 52 is adapted to seal and cover the door opening 48. The door opening 48 of the substrate container 30 lies in a plane substantially parallel to a vertical direction 54. In various embodiments, substrate container 30 is characterized by a microenvironment 64. In one or more embodiments, a pair of slotted sidewalls 66 are disposed within the substrate container 30, each adjacent a respective sidewall portion of the sidewall portion 34. The slotted sidewalls 66 are aligned such that the slots face each other to define a plurality of slot locations 68 and are spaced such that the substrate(s) 32 are supported between them. For the purposes of the present invention, one of the plurality of slot positions 68, the bottommost slot position 68a (i.e., the slot closest to the bottom plate 38) is identified as a "first" slot, wherein the number of slots increases in the upward direction. . To illustrate, such as in Figures 6-8 and 15-16, described below, a substrate 32b is presented and depicted as occupying the bottommost slot 68a. In various embodiments, the substrate container 30 further includes at least one cleaning tower assembly 70 disposed within the substrate container 30. In various embodiments, the cleaning tower assembly 70 is operatively coupled to a source of gas (not depicted) located outside of the substrate container 30 for introducing a gaseous working fluid into the substrate container 30. In a particular embodiment, one or more of the cleaning tower assemblies 70 are oriented to direct the gaseous working fluid toward the door opening 48 to clean the substrate container 30. In a particular embodiment, the substrate container 30 further includes a transport plate 71 positioned below the bottom plate 38. In various embodiments, the transport plate 71 is mounted to the bottom of the substrate container 30 for machine-based positioning and alignment of the substrate container 30 during various substrate processing steps. Referring to Figures 2 through 5, a cleaning tower assembly 70 is depicted in accordance with one embodiment of the present invention. In the depicted embodiment, the cleaning tower assembly 70 includes a cleaning interface body 90 that includes a base portion 94 and a top portion 98. In one or more embodiments, the cleaning interface body 90 is appropriately sized and shaped for external mounting on a substrate container 30. For example, the cleaning interface body can be mounted to one of the transport plates 71 of a substrate container 30. In some embodiments, the cleaning interface body can be mounted to the bottom plate 38. In some embodiments, the cleaning interface body 90 can be mounted between the bottom plate 38 and a transport plate 71. In various embodiments, such as in FIG. 3, base portion 94 has a tubular shape defined by a sidewall 100 extending from a bottom edge 102 to a top edge 106. The tubular shape of the side wall 100 defines an inner portion 110 and defines a bottom aperture 114 at the bottom edge 102 for access to one of the inner portions 110. In various embodiments, base portion 94 includes an assembly for coupling to an external fluid source. For example, in some embodiments, the base portion includes one of the bottom aperture 114 and the inner portion 110, a grommet 118, a filter 122, and a valve 126 (Fig. 4). In a particular embodiment, the bottom aperture 114 is concentric with an axis 130. In one or more embodiments, such as in FIG. 5, sidewall 100 defines a plurality of apertures 119 in base portion 94. In a particular embodiment, each of the apertures 119 is circumferentially spaced about the sidewall 100 and the axis 130. In various embodiments, the apertures 119 are projections projecting from the side of the grommet 118 for fitting and placing the grommet 118 within the interior 110 of the base portion 94. For example, in some embodiments, the grommet 118 is a flexible component and the projections can be elastically compressed during insertion into the interior 110 of the base portion and then flared outwardly to the apertures 119 to lock the grommet in place. . In some embodiments, the base portion 94 includes a support portion 120. The support portion 120 can be an outwardly extending material portion that is integrated with the sidewall 100. In a particular embodiment, the support portion 120 acts as a handle or handle for cleaning the manipulation of the interface body 90. In some embodiments, the support portion 120 is snap-fitted to an undercut feature in the transport plate for mounting the body 90 to a flexible beam of a substrate container, as further described herein. In one or more embodiments, the top portion 98 includes a substantially planar plane and is coupled along the top edge 106 to one of the top sidewalls 134 of the base portion 94. In some embodiments, the top sidewall 134 is coupled to the top of the base portion 94. Base portion 94 and top portion 98 may be joined by techniques available to the skilled artisan (e.g., ultrasonic or thermal welding, snap fit, adhesive bonding) or by other suitable techniques. Additionally, for example, in FIG. 3, the top sidewall 134 can include an offset portion 138 that extends from the base portion 94 to one side. The offset portion 138 can include one of the inlet nozzles 142 offset from the base portion 94. In one or more embodiments, the inlet nozzle 142 has a tubular shape defined by one of the nozzle sidewalls 146 extending upwardly from the top sidewall 134 to a nozzle edge 150. In one or more embodiments, the nozzle sidewall 146 defines an inner portion 154 and a nozzle aperture 158 at the nozzle edge 150. In various embodiments, the nozzle aperture 158 provides access to the inner portion 154 of the inlet nozzle 142. In a particular embodiment, the nozzle aperture 158 is concentric about a second axis 162. In various embodiments, the second axis 162 is substantially parallel to the first axis 130. In one or more embodiments, an offset conduit portion 166 is disposed between the base portion 94 and the inlet nozzle 142 (Figs. 2 and 5). In one or more embodiments, the offset conduit portion 166 cooperates with the offset portion 138 of the top sidewall 134 to provide a passage between the base portion 94 and the inlet nozzle 142 for cleaning the components of the interface body 90. Fluid communication. In operation, fluid passes through check valve 126 and bottom aperture 114, through inner portions 110, 154, and through nozzle aperture 158 into cleaning tower assembly 70. Functionally, the offset conduit 166 diverts airflow from the first axis 130 to the second axis 162. In some embodiments, as shown in FIG. 5, the inlet nozzle 142 includes one of the nozzle sidewalls 146 having a barbed portion 170 and a tapered portion 174 having a barbed nozzle. In a particular embodiment, the barbed portion 170 defines an outer diameter of the inlet nozzle 142 and the tapered portion 174 defines a reduced outer diameter adjacent one of the barbed portions 170. In a particular embodiment, the nozzle sidewall 146 defines a side aperture 178 between the barbed portion 170 and the tapered portion 174. Further, side apertures 178 are used in nozzle side walls 146 for low gas spray to one of the holes or apertures of substrate container 30. In one or more embodiments, the cleaning tower assembly 70 includes a sprinkler portion 182 that is coupled to the inlet nozzle 142 of the cleaning interface body 90. In some embodiments, the sprinkler portion 182 includes a porous or perforated (void) sidewall 186. In some embodiments, the sidewall 186 defines a substantially tubular shape with a sprinkler channel extending from a top surface 190 of the sprinkler portion 182 to a bottom edge 194. In one or more embodiments, the bottom edge 194 of the sprinkler portion 182 defines an aperture 198 at one of the bottom portions 202 of the sprinkler portion 182. In various embodiments, the apertures 198 can be sized for insertion of the inlet nozzle 142 to be operatively coupled therebetween for fluid communication between the base portion 94, the inlet nozzle 142, and the sprinkler portion 182. . In a particular embodiment, the nozzle sidewall 146 includes external threads (not depicted) formed on one of the outer surfaces of the nozzle sidewall 146. The sprinkler portion 182 can include internal threads (not depicted) formed on an inner surface of one of the sprinkler portions. When implemented, the threads of the sprinkler portion 182 are compatible with the threads of the nozzle sidewall 146 to couple between them. In various embodiments, the sprinkler portion 182 includes a widened portion 206 at a bottom portion of the sprinkler portion 182. In a particular embodiment, the widened portion 206 is widened outwardly, having an inner diameter that is increased relative to one of the bodies of the sprinkler portion to be inserted into and coupled to the inlet nozzle 142. Referring to Figures 6-8, a cleaning tower assembly 70 assembled in a substrate container 30 is depicted in accordance with an embodiment of the present invention. In the depicted embodiment, substrate container 30 is identical or substantially similar to cleaning tower assembly 70, as described herein. Accordingly, the same elements are identified by the same reference numerals. In the assembly of, for example, FIG. 8, the cleaning interface body 90 can be assembled to the substrate container 30 by inserting the cleaning interface body 90 upwardly in the direction 210 and placing the inlet tube through one of the rear inlets 214 of the bottom plate 38. The mouth 142 and the cleaning interface body 90 are attached to an outer surface of one of the bottom plates 38 in a rear mounting region 218. In various embodiments, the rear mounting region 218 is interposed between the transport plate 71 and the bottom plate 38. The cleaning interface body 90 can be designed to be assembled to the substrate container 30 for various vertical heights 222 of the cleaning fixture relative to one of the load ports. In various embodiments, the vertical height 222 substantially matches the vertical height of the (several) substrate container. In one or more embodiments, the inlet nozzle 142 is sized such that when mounted to the transfer plate 71 of the substrate container 30, the nozzle edge 150 of the inlet nozzle 142 extends upwardly to approximately the first slot of the substrate container 30. 68a. Once the cleaning interface body 90 is inserted through the inlet 214, the sprinkler portion 182 can be assembled by accessing the inlet nozzle 142 to the rear of the substrate container 30 via the door opening 48. Next, the sprinkler portion 182 is attached to the inlet nozzle 142. Referring to Figures 9-14, various stages of assembly of the cleaning tower assembly 70 within the substrate container 30 are depicted in accordance with one embodiment of the present invention. Substrate container 30 and cleaning tower assembly 70 can be the same or substantially similar, as described herein. Accordingly, the same elements are identified by the same reference numerals. Referring to Figure 9, a bottom perspective view of one of the substrate container 30 and the bottom plate 38 is depicted. In one or more embodiments, the bottom plate 38 includes a rear inlet 214 (Fig. 8) for insertion of an inlet nozzle 142 of a cleaning tower assembly 70. Additionally, in some embodiments, the bottom plate 38 includes a mounting inlet 250. In various embodiments, the mounting inlet 250 is an aperture in the bottom plate 38 for receiving one of the mounting members for mounting the transport plate 71 to the bottom plate 38 of the substrate container 30. For example, in FIG. 10, a transport plate 71 is placed against the bottom plate 38 of the substrate container 30. The transport plate 71 can include a mounting inlet 251 that is aligned with the mounting inlet 250. As depicted in FIG. 11, a mounting mechanism 254 is received in the mounting inlet 250 and secures the transport plate 71 to the bottom plate 38. In one or more embodiments, the mounting mechanism 254 is positioned in the bottom plate 38 to secure the transport plate 71 to a portion of the material of the bottom of the substrate container 30. 11 and 12, the mounting mechanism 254 is a partial ring having a downwardly extending sidewall 258 and including a plurality of generally L-shaped slots 262 circumferentially disposed in the sidewall 258. In one or more embodiments, the L-shaped slot 262 is angled with a vertical portion 263 and a horizontal or stop portion 264. In various embodiments, the transport plate 71 can include a plurality of outwardly extending members or cams 265 in the mounting inlet 251. Each of the cams 265 can correspond to the L-shaped slot 262 such that the transport plate 71 can be secured to the bottom plate 38 by inserting the mounting mechanism 254 downwardly into the mounting inlets 250 and 251, and receiving the cam 265 into the vertical portion 263 And twisting the mounting mechanism 254 to guide the cam 265 upward and into the stop portion 264 to secure the transport plate 71 to the bottom plate 38. In various embodiments, the sidewall 254 includes a rear opening 266 that corresponds to the offset conduit portion 166. As such, the offset conduit portion 166 extends rearwardly from the mounting mechanism 254 to the inlet nozzle 142 when secured to the bottom plate 38. In certain embodiments, various types of mounting mechanisms 254 can be used to secure the transport plate 71 to the bottom plate 38. For example, the mounting mechanism can use ultrasonic or thermal welding, snap fit, adhesive bonding, or other suitable technique. In some embodiments, the mounting mechanism 254 is integrated with the bottom plate 38 such that the bottom plate 38 and the mounting mechanism are a continuous piece. In one or more embodiments depicted in FIGS. 12-13, the transport plate 71 includes locking features for cleaning the interface body 90, including one or more exposures in the mounting inlet 251 to a support frame 268. Side opening 267. In various embodiments, the support frame 268 is defined by an undercut portion 269 in the transport plate 71. In various embodiments, the cleaning interface body 90 is secured to the substrate container 30 by inserting the cleaning interface body 90 up to the mounting inlet 251 and inserting the inlet nozzle 142 (FIGS. 2 through 4) into the rear inlet 214. When the cleaning interface body 90 is inserted upward, the support portion 120 can engage and flex with the angled or barbed undercut portion 269 until the cleaning interface body 90 has been fully inserted into the mounting inlet 251. Once inserted, the support portion 120 can be "snapped" onto the support frame 268 to lock the cleaning interface body in place. In Fig. 14, the inside of the substrate container 30 is depicted. In the interior, the rear inlet 214 and mounting mechanism 254 are depicted in the floor 40 of the substrate container 30. The cleaning interface body 90 is mounted to the substrate container 30 and the inlet nozzle 142 is depicted inserted through the rear inlet 214 and into the interior of the container 30. In Figure 15, a sprinkler tower 182 is depicted that fits into the inlet nozzle 142. Referring to Figures 16 and 17, a cross-sectional view of a portion of a substrate container 30 and cleaning tower assembly 70 in accordance with an embodiment of the present invention is depicted. In Figure 15, the cleaning interface body 90 is externally mounted to the base plate 38 as described above. Mounting mechanism 254 is positioned in floor 40 and secures cleaning interface body 90 to container 30. The inlet nozzle 142 enters the interior of the container 30 through the rear inlet 214. A sprinkler portion 182 for spraying the cleaning gas entering the substrate container 30 through the cleaning interface body 90 is fitted to the inlet nozzle 142 such that a portion of the inlet nozzle 142 extends into the interior of the sprinkler portion 182. The substrate 32b positioned in the lowermost slot 68a extends rearwardly in the container 30 toward the cleaning tower assembly 70. Because the cleaning interface body 90 is mounted externally, a gap 290 is maintained between the bottommost substrate 32b and the floor 40 of the container and the mounting mechanism 254. As depicted in FIG. 16, in some embodiments, the substrate container 30 defines one of the rear recesses 300 in the floor 40. In these embodiments, the cleaning interface body 90 is internally mounted within the container 30. For example, the cleaning interface body 90 can be positioned in the recess 300 with the base portion 94 extending through an aperture 304 for connection to one of the external fluid sources. The recess 300 can be sized such that the uppermost end of the cleaning interface body 90 is located at or below the plane of the floor 40 of the substrate container 30. Functionally, the notch 300 of the embodiment of Figure 16 reduces the profile of the offset conduit 166. Due to this reduced profile, the offset conduit 166 (although located inside the container 30) provides the same operational advantages as the gap 290 of the externally offset conduit configuration of Figure 15 and relative to end effector handling and gas cleaning. Also depicted in Figures 15 and 16, in one or more embodiments, the inlet nozzle 142 includes a side aperture 178, as described above. In various embodiments, the inlet nozzle 142 and the side apertures 178 are configured such that the sprinkler portion 182 of the cleaning tower assembly 70 can function at or near the floor 40 of the substrate container. For example, in some embodiments, the side apertures 178 are positioned at a height on the inlet nozzle 142 that corresponds to the floor 40 of the substrate container 30. In operation, for both the embodiment of Figure 15 and the embodiment of Figure 16, the gap 290 provides for a small or non-interfering manipulation of the components from the cleaning interface body 90 beneath the substrate 32b of the robotic end effector (not depicted). space. Additionally, combining the base of the sprinkler portion 182 at the floor level with the gap 290 provided by the outer or reduced profile offset conduit 166 enables the cleaning gas to enter the substrate container 30 at the floor level such that the clean airflow 308 is directed to the most Below the bottom substrate 32b. Each of the additional features and methods disclosed herein can be used alone or in combination with other features and methods to provide improved devices and methods for making and using the improved devices. Therefore, the combination of the features and methods disclosed herein is not necessarily to be construed in a Various modifications to the embodiments will be apparent to those skilled in the art after reading this invention. For example, those of ordinary skill in the art will appreciate that the various features described for the various embodiments can be combined, separated and recombined with other features, either individually or in various combinations. Likewise, the various features described above are to be considered as illustrative and not restrictive. Those of ordinary skill in the art will recognize that various embodiments may include fewer features than those illustrated in any of the individual embodiments described above. The embodiments described herein are not meant to be an exhaustive representation of one of the ways in which various features can be combined. Accordingly, the embodiments are not mutually exclusive combinations of features; rather, the scope of the claims may include a combination of different individual features selected from different individual embodiments, as understood by those of ordinary skill in the art. Any incorporation by way of a singular reference to the above documents is not to be construed as being inferred. Further incorporation into any of the incorporations in the form of the above-mentioned documents is incorporated herein by reference. It is further limited that any incorporation in the form of a reference to the above documents makes any definitions provided in the documents not incorporated herein by reference, unless expressly incorporated herein. Reference is made to the "(several) embodiments", "disclosed content", "the invention", "the embodiment of the invention", "the disclosed (several) embodiments" and the like The specification (text, including patent application scope and drawings) of the prior art patent application is not permitted. To clarify the scope of the patent application, the explicit intent of this document is that the terms of 35 USC 112(f) are not quoted unless the specific term "method of" or "step of" is recited in the respective claims.

7-7‧‧‧線7-7‧‧‧ line

30‧‧‧基板容器30‧‧‧Substrate container

32a‧‧‧基板32a‧‧‧Substrate

32b‧‧‧基板32b‧‧‧Substrate

34‧‧‧相對側部分/側壁部分34‧‧‧ opposite side part / side wall part

36‧‧‧頂部部分36‧‧‧Top part

38‧‧‧底板38‧‧‧floor

40‧‧‧地板40‧‧‧floor

42‧‧‧背部42‧‧‧ Back

44‧‧‧前部44‧‧‧ front

46‧‧‧門框46‧‧‧ door frame

48‧‧‧門開口48‧‧‧ door opening

52‧‧‧門52‧‧‧

54‧‧‧垂直方向54‧‧‧Vertical direction

64‧‧‧微型環境64‧‧‧Micro environment

66‧‧‧開槽側壁66‧‧‧Slotted side wall

68‧‧‧狹槽位置68‧‧‧ slot position

68a‧‧‧最底下狹槽68a‧‧‧ bottom slot

70‧‧‧清潔塔總成70‧‧‧Clean tower assembly

71‧‧‧輸送板71‧‧‧Transportation board

90‧‧‧清潔介面本體90‧‧‧Clean interface body

94‧‧‧基座部分94‧‧‧Base section

98‧‧‧頂部部分98‧‧‧Top part

100‧‧‧側壁100‧‧‧ side wall

102‧‧‧底部邊緣102‧‧‧ bottom edge

106‧‧‧頂部邊緣106‧‧‧ top edge

110‧‧‧內部部分110‧‧‧ internal part

114‧‧‧底部孔隙114‧‧‧ bottom aperture

118‧‧‧索環118‧‧‧The ring

119‧‧‧孔隙119‧‧‧ pores

120‧‧‧支撐部分120‧‧‧Support section

122‧‧‧過濾器122‧‧‧Filter

126‧‧‧閥126‧‧‧ valve

130‧‧‧第一軸線130‧‧‧first axis

134‧‧‧頂部側壁134‧‧‧ top side wall

138‧‧‧偏移部分138‧‧‧ offset part

142‧‧‧入口管嘴142‧‧‧ inlet nozzle

146‧‧‧管嘴側壁146‧‧‧ nozzle side wall

150‧‧‧管嘴邊緣150‧‧‧ nozzle edge

154‧‧‧內部部分154‧‧‧ internal part

158‧‧‧管嘴孔隙158‧‧‧ nozzle aperture

162‧‧‧第二軸線162‧‧‧second axis

166‧‧‧偏移導管部分166‧‧‧Offset conduit section

170‧‧‧具倒鉤部分170‧‧‧ with barbed parts

174‧‧‧錐形部分174‧‧‧Conical section

178‧‧‧側孔隙178‧‧‧ side porosity

182‧‧‧噴灑器部分182‧‧‧Spray part

186‧‧‧側壁186‧‧‧ side wall

190‧‧‧頂面190‧‧‧ top surface

194‧‧‧底部邊緣194‧‧‧ bottom edge

198‧‧‧孔隙198‧‧‧ pores

202‧‧‧底部部分202‧‧‧ bottom part

206‧‧‧加寬部分206‧‧‧ widened part

210‧‧‧方向210‧‧‧ Direction

214‧‧‧後部入口214‧‧‧ rear entrance

218‧‧‧後部安裝區域218‧‧‧ Rear installation area

222‧‧‧垂直高度222‧‧‧ vertical height

250‧‧‧安裝入口250‧‧‧Installation entrance

251‧‧‧安裝入口251‧‧‧Installation entrance

254‧‧‧安裝機構254‧‧‧Installation agency

258‧‧‧向下延伸側壁258‧‧‧ extends down the side wall

263‧‧‧垂直部分263‧‧‧ vertical part

264‧‧‧止動部分264‧‧‧Stop part

265‧‧‧凸輪265‧‧‧ cam

266‧‧‧後部開口266‧‧‧ rear opening

267‧‧‧側開口267‧‧‧ side opening

268‧‧‧支撐架268‧‧‧Support frame

269‧‧‧底切部分269‧‧‧ undercut

290‧‧‧間隙290‧‧‧ gap

300‧‧‧後部凹口300‧‧‧ rear notch

304‧‧‧孔隙304‧‧‧ pores

308‧‧‧清潔氣流308‧‧‧Clean airflow

包含於本申請案中之圖式併入本說明書中且形成本說明書之部分。圖式繪示本發明之實施例且與[實施方式]一起用以闡釋本發明之原理。圖式僅繪示特定實施例且不限制本發明。 圖1係根據本發明之一實施例之一基板容器之一透視圖。 圖2係根據本發明之一實施例之一清潔塔總成之一正視圖。 圖3係根據本發明之一實施例之圖2之清潔塔總成之一截面圖。 圖4係根據本發明之一實施例之圖2之清潔塔總成之一分解圖。 圖5係根據本發明之一實施例之一清潔塔總成之一放大部分透視圖。 圖6係根據本發明之一實施例之安裝在一基板容器中之清潔塔總成之一正視圖。 圖7係依圖6之線7-7取得之清潔塔總成及基板容器之一截面圖。 圖8係根據本發明之一實施例之一基板容器之一截面圖及一清潔塔總成之一分解圖。 圖9係根據本發明之一實施例之包含一清潔塔總成之開口的一基板容器之一部分底部透視圖。 圖10係根據本發明之一實施例之包含一輸送板之一基板容器之一部分底部透視圖。 圖11係根據本發明之一實施例之包含安裝至一底板之一輸送板的一基板容器之一部分底部透視圖。 圖12係根據本發明之一實施例之包含安裝至一底板之一輸送板的一基板容器之一部分截面圖。 圖13係根據本發明之一實施例之包含一安裝於外部之清潔塔總成之一基板容器之一部分底部透視圖。 圖14係根據本發明之一實施例之包含一安裝於外部之清潔塔總成之一基板容器之一內部之一部分透視圖。 圖15係根據本發明之一實施例之包含一安裝於外部之清潔塔總成之一基板容器之一內部之一部分透視圖。 圖16係根據本發明之一實施例之包含具有一安裝於內部之清潔塔總成之一凹口的一基板容器之一截面圖。 圖17係依圖6之線7-7取得之清潔塔總成及基板容器之一特寫截面圖。 雖然本發明之實施例適合各種修改及替代形式,但其具體細節已以實例的方式在圖式中展示且將被詳細描述。然而,應瞭解,本發明不使揭示內容受限於所描述之特定實施例。相反地,本發明涵蓋落入本發明之精神及範疇內的所有修改、等效物及替代方案。The drawings included in the present application are incorporated in the specification and form part of the specification. The drawings illustrate embodiments of the invention and together with the embodiments, illustrate the principles of the invention. The drawings are only illustrative of specific embodiments and are not limiting of the invention. 1 is a perspective view of a substrate container in accordance with an embodiment of the present invention. 2 is a front elevational view of one of the cleaning tower assemblies in accordance with an embodiment of the present invention. 3 is a cross-sectional view of the cleaning tower assembly of FIG. 2 in accordance with an embodiment of the present invention. 4 is an exploded view of the cleaning tower assembly of FIG. 2 in accordance with an embodiment of the present invention. Figure 5 is an enlarged partial perspective view of one of the cleaning tower assemblies in accordance with one embodiment of the present invention. Figure 6 is a front elevational view of a cleaning tower assembly mounted in a substrate container in accordance with one embodiment of the present invention. Figure 7 is a cross-sectional view of the cleaning tower assembly and substrate container taken in accordance with line 7-7 of Figure 6. Figure 8 is a cross-sectional view of a substrate container and an exploded view of a cleaning tower assembly in accordance with an embodiment of the present invention. 9 is a bottom perspective view of a portion of a substrate container including an opening of a cleaning tower assembly in accordance with an embodiment of the present invention. Figure 10 is a bottom perspective view of a portion of a substrate container including a conveyor plate in accordance with an embodiment of the present invention. Figure 11 is a bottom perspective view of a portion of a substrate container including a transport plate mounted to a backplane in accordance with an embodiment of the present invention. Figure 12 is a partial cross-sectional view of a substrate container including a transport plate mounted to a base plate in accordance with an embodiment of the present invention. Figure 13 is a bottom perspective view of a portion of a substrate container including a cleaning tower assembly mounted externally, in accordance with an embodiment of the present invention. Figure 14 is a partial perspective view of the interior of one of the substrate containers including an exterior cleaning tower assembly in accordance with one embodiment of the present invention. Figure 15 is a partial perspective view of one of the interiors of one of the substrate containers including an exterior cleaning tower assembly in accordance with one embodiment of the present invention. Figure 16 is a cross-sectional view of a substrate container including a recess having an interior cleaning tower assembly in accordance with an embodiment of the present invention. Figure 17 is a close-up cross-sectional view of the cleaning tower assembly and substrate container taken in accordance with line 7-7 of Figure 6. While the embodiments of the present invention are susceptible to various modifications and alternatives, the specific details are shown in the drawings and will be described in detail. However, it is understood that the invention is not to be limited to the particular embodiments described. Rather, the invention is to cover all modifications, equivalents, and alternatives.

Claims (22)

一種用於一基板容器之清潔塔總成,該清潔塔總成包括: 一清潔介面本體,其用於安裝至一基板容器之一底板,該清潔介面本體包含: 一基座部分,其具有一自一底部邊緣向上延伸至一頂部邊緣之實質上管狀基座側壁,該底部邊緣界定用於接達至該基座部分之一內部之一第一孔隙,該第一孔隙係圍繞一第一軸線同心;及 一頂部部分,其連接至該基座部分,該頂部部分包含定位於該基座部分之該頂部邊緣上之一頂部側壁,該頂部部分包含經構形用於透過該基板容器之該底板中之一入口安裝之一入口管嘴,該入口管嘴具有自該頂部側壁向上延伸至一管嘴邊緣之一實質上管狀管嘴側壁,該管嘴邊緣界定用於接達至該入口管嘴之一內部之一第二孔隙,該第二孔隙係圍繞實質上平行於該第一軸線且定位於該第一軸線後側之一第二軸線同心,其中該頂部側壁與該基座部分協作以界定安置於該第一孔隙與該入口管嘴之間的一偏移導管部分,該基座部分及該入口管嘴經由該偏移導管部分呈流體連通。A cleaning tower assembly for a substrate container, the cleaning tower assembly comprising: a cleaning interface body for mounting to a bottom plate of a substrate container, the cleaning interface body comprising: a base portion having a a substantially tubular base sidewall extending upwardly from a bottom edge to a top edge, the bottom edge defining a first aperture for accessing one of the interior portions of the base portion, the first aperture system surrounding a first axis Concentric; and a top portion coupled to the base portion, the top portion including a top sidewall positioned on the top edge of the base portion, the top portion including the configured to pass through the substrate container One of the inlets of the bottom plate is mounted with an inlet nozzle having a substantially tubular nozzle side wall extending upwardly from the top side wall to a nozzle edge, the nozzle edge defining for access to the inlet tube a second aperture in one of the mouths, the second aperture being concentric about a second axis substantially parallel to the first axis and positioned on a rear side of the first axis, wherein the top sidewall The base portion cooperate to define an offset portion disposed in the conduit between the first aperture and the inlet nozzle, the base portion and the inlet nozzle in fluid communication with the conduit via the offset portion. 如請求項1之清潔塔總成,其進一步包括: 一噴灑器部分,其界定一沿一噴灑器軸線延伸至該噴灑器部分之噴灑器通道,該噴灑器通道界定操作性耦合至該入口管嘴用於該基座部分、該入口管嘴與該噴灑器部分之間的流體連通之該噴灑器部分之一底部部分處之一開口。The cleaning tower assembly of claim 1 further comprising: a sprinkler portion defining a sprinkler passage extending along a sprinkler axis to the sprinkler portion, the sprinkler passage defining operative coupling to the inlet tube A mouth is open for opening one of the base portion, one of the bottom portions of the sprinkler portion in fluid communication with the sprinkler portion. 如請求項2之清潔塔總成,其中該管嘴側壁包含形成於該管嘴側壁之一外表面上之外部螺紋。A cleaning tower assembly according to claim 2, wherein the nozzle side wall includes external threads formed on an outer surface of one of the nozzle side walls. 如請求項3之清潔塔總成,其中該噴灑器部分包含形成於該噴灑器部分之一內表面上之內部螺紋,該等內部螺紋與該入口管嘴之該等外部螺紋相容以操作地耦合於該噴灑器部分與該入口管嘴之間。The cleaning tower assembly of claim 3, wherein the sprinkler portion includes internal threads formed on an inner surface of the sprinkler portion, the internal threads being operatively compatible with the external threads of the inlet nozzle Coupled between the sprinkler portion and the inlet nozzle. 如請求項2之清潔塔總成,其中該噴灑器部分包含位於該底部部分處之一加寬部分。A cleaning tower assembly according to claim 2, wherein the sprinkler portion comprises a widened portion at the bottom portion. 如請求項2之清潔塔總成,其中該噴灑器部分包含一多孔噴灑器側壁。The cleaning tower assembly of claim 2, wherein the sprinkler portion comprises a porous sprayer sidewall. 如請求項1之清潔塔總成,其中該基座部分包含安裝在該第一孔隙中以與一外部流體源呈流體連通之一索環及一閥。A cleaning tower assembly according to claim 1 wherein the base portion includes a grommet and a valve mounted in the first aperture for fluid communication with an external fluid source. 如請求項1之清潔塔總成,其中該入口管嘴係包含一具倒鉤部分及一錐形部分之一具倒鉤之管嘴,該具倒鉤部分界定該具倒鉤之管嘴之一外徑,該錐形部分界定毗鄰該具倒鉤部分之一減小外徑。The cleaning tower assembly of claim 1, wherein the inlet nozzle comprises a barbed portion and a barbed nozzle of the tapered portion, the barbed portion defining the barbed nozzle An outer diameter, the tapered portion defining a reduced outer diameter adjacent one of the barbed portions. 如請求項8之清潔塔總成,其中該管嘴側壁界定該具倒鉤部分與該錐形部分之間的一側孔隙。A cleaning tower assembly according to claim 8 wherein the nozzle side wall defines a side aperture between the barbed portion and the tapered portion. 如請求項1之清潔塔總成,其中該入口管嘴經設定大小使得當安裝至該基板容器之該底板時,該入口管嘴向上延伸至大約含納於該基板容器內之一第一晶圓之一位置。The cleaning tower assembly of claim 1, wherein the inlet nozzle is sized such that when mounted to the bottom plate of the substrate container, the inlet nozzle extends upwardly to approximately one of the first crystals contained within the substrate container One of the round positions. 如請求項1之清潔塔總成,其中該頂部側壁實質上係平面。A cleaning tower assembly according to claim 1, wherein the top side wall is substantially planar. 一種用於含納基板之基板容器,該基板容器包括: 一容器部分,其包含兩個相對側壁、一背部側壁、一頂部側壁及一底板,該容器部分界定用於基板之插入及移除的該基板容器之一前部中之一開口,該容器部分安裝在一輸送板上; 一門,其經構形用於遮蓋及密封由該容器部分界定之該開口;及 一清潔介面本體,其連接至該底板,該清潔介面本體包含: 一基座部分,其具有一自一底部邊緣向上延伸至一頂部邊緣之實質上管狀基座側壁,該底部邊緣界定用於接達至該基座部分之一內部之一第一孔隙,該第一孔隙係圍繞一第一軸線同心; 一頂部部分,其連接至該基座部分,該頂部部分具有定位於該基座部分之該頂部邊緣上之一實質上平面頂部側壁以向上遮蓋該底部孔隙,該頂部部分包含用於透過該基板容器之該底板中之一入口安裝之一入口管嘴,該入口管嘴具有自該頂部側壁向上延伸至一管嘴邊緣之一實質上管狀管嘴側壁,該管嘴邊緣界定用於接達至該入口管嘴之一內部之一第二孔隙,該第二孔隙係圍繞實質上平行於該第一軸線且定位於該第一軸線後側之一第二軸線同心;及 一偏移導管部分,其安置於該基座部分與該入口管嘴之間,該基座部分及該入口管嘴經由該偏移導管部分呈流體連通。A substrate container for a substrate containing a substrate, the substrate container comprising: a container portion comprising two opposing side walls, a back side wall, a top side wall and a bottom plate, the container portion defining insertion and removal for the substrate One of the front portions of the substrate container is open, the container portion is mounted on a transport plate; a door configured to cover and seal the opening defined by the container portion; and a cleaning interface body connected To the bottom plate, the cleaning interface body includes: a base portion having a substantially tubular base sidewall extending upwardly from a bottom edge to a top edge, the bottom edge defining a portion for accessing the base portion An inner first aperture, the first aperture being concentric about a first axis; a top portion coupled to the base portion, the top portion having a substantial portion positioned on the top edge of the base portion An upper planar top side wall covers the bottom aperture upwardly, the top portion including an inlet nozzle for mounting one of the bottom plates through the substrate container, The nozzle has a substantially tubular nozzle sidewall extending upwardly from the top sidewall to a nozzle edge, the nozzle edge defining a second aperture for accessing one of the interior of the inlet nozzle, the second a pore system concentric about a second axis substantially parallel to the first axis and positioned at a rear side of the first axis; and an offset conduit portion disposed between the base portion and the inlet nozzle, the aperture being disposed between the base portion and the inlet nozzle The base portion and the inlet nozzle are in fluid communication via the offset conduit portion. 如請求項12之基板容器,其進一步包括一噴灑器部分,該噴灑器部分具有一沿一噴灑器軸線延伸至該噴灑器部分之噴灑器通道,該噴灑器通道界定操作性耦合至該入口管嘴用於該基座部分、該入口管嘴與該噴灑器部分之間的流體連通之該噴灑器部分之一底部部分處之一開口。The substrate container of claim 12, further comprising a sprinkler portion having a sprinkler channel extending along a sprinkler axis to the sprinkler portion, the sprinkler channel defining operative coupling to the inlet tube A mouth is open for opening one of the base portion, one of the bottom portions of the sprinkler portion in fluid communication with the sprinkler portion. 如請求項13之基板容器,其中該管嘴側壁包含形成於該管嘴側壁之一外表面上之外部螺紋。The substrate container of claim 13, wherein the nozzle sidewall comprises external threads formed on an outer surface of one of the nozzle sidewalls. 如請求項14之基板容器,其中該噴灑器部分包含形成於該噴灑器部分之一內表面上之內部螺紋,該等內部螺紋與該入口管嘴之該等外部螺紋相容以操作地耦合於該入口管嘴與該噴灑器部分之間。The substrate container of claim 14 wherein the sprinkler portion includes internal threads formed on an inner surface of the sprinkler portion, the internal threads being operatively coupled to the external threads of the inlet nozzle for operative coupling The inlet nozzle is between the sprinkler portion. 如請求項13之基板容器,其中該噴灑器部分包含位於該噴灑器部分之該底部部分處之一加寬部分。The substrate container of claim 13, wherein the sprinkler portion comprises a widened portion at the bottom portion of the sprinkler portion. 如請求項12之基板容器,其中該基座部分包含安裝在該第一孔隙中以與一外部流體源呈流體連通之一索環及一閥。The substrate container of claim 12, wherein the base portion includes a grommet and a valve mounted in the first aperture to be in fluid communication with an external fluid source. 如請求項12之基板容器,其中該入口管嘴係包含該管狀管嘴側壁之一具倒鉤部分及一錐形部分之一具倒鉤之管嘴,該具倒鉤部分界定該具倒鉤之管嘴之一外徑,該錐形部分界定毗鄰該具倒鉤部分之一減小外徑。The substrate container of claim 12, wherein the inlet nozzle comprises a barbed portion of one of the tubular nozzle sidewalls and a barbed nozzle of the tapered portion, the barbed portion defining the barbed portion One of the outer diameters of the nozzle, the tapered portion defining a reduced outer diameter adjacent one of the barbed portions. 如請求項18之基板容器,其中該管嘴側壁界定該具倒鉤部分與該錐形部分之間的一側孔隙。The substrate container of claim 18, wherein the nozzle sidewall defines a side aperture between the barbed portion and the tapered portion. 如請求項12之基板容器,其中該入口管嘴經設定大小使得當連接至該基板容器之該底板及該輸送板時,該入口管嘴向上延伸至大約含納於該基板容器內之一第一晶圓之一位置。The substrate container of claim 12, wherein the inlet nozzle is sized such that when connected to the substrate and the transport plate of the substrate container, the inlet nozzle extends upwardly to approximately one of the substrate containers One of the locations of a wafer. 一種將一清潔塔總成組裝至一基板容器之方法,該方法包括: 將一清潔介面本體之一入口管嘴向上插入至一基板容器之一底板中之一後部入口,該清潔介面本體包含一基座部分,其具有一自一底部邊緣向上延伸至一頂部邊緣之實質上管狀基座側壁,該底部邊緣界定圍繞一第一軸線同心之一第一孔隙,該清潔介面本體包含定位於該基座部分之該頂部邊緣上之一頂部及包含具有自該頂部側壁向上延伸至一管嘴邊緣之一實質上管狀管嘴側壁之該入口管嘴,該管嘴邊緣界定圍繞實質上平行於該第一軸線且定位於該第一軸線後側之一第二軸線同心之一第二孔隙,該頂部側壁及該基座部分界定位於該第一孔隙與該入口管嘴之間用於流體連通之一偏移導管部分;及 當該入口管嘴插入至該後部入口中時將該清潔介面本體固定於該基板容器之該底板。A method of assembling a cleaning tower assembly to a substrate container, the method comprising: inserting an inlet nozzle of a cleaning interface body upwardly into a rear inlet of a bottom plate of a substrate container, the cleaning interface body comprising a base portion having a substantially tubular base sidewall extending upwardly from a bottom edge to a top edge, the bottom edge defining a first aperture concentric about a first axis, the cleaning interface body including being positioned on the base a top portion of the top edge of the seat portion and the inlet nozzle having a substantially tubular nozzle sidewall extending upwardly from the top sidewall to a nozzle edge, the nozzle edge defining a substantially parallel to the first a second aperture that is axially located and concentric with one of the second axes of the first axis, the top sidewall and the base portion defining one of fluid communication between the first aperture and the inlet nozzle Offering the conduit portion; and securing the cleaning interface body to the bottom plate of the substrate container when the inlet nozzle is inserted into the rear inlet. 一種基板容器,該基板容器包括: 一容器部分,其包含兩個相對側壁、一背部側壁、一頂部側壁及一底板,該容器部分界定用於基板之插入及移除的一內部,該內部具有:一地板,其包含該地板中之一後部凹口;及一門,其經構形用於遮蓋及密封由該容器部分界定之該開口;及 一清潔介面本體,其安裝在該凹口中,該清潔介面本體包含: 一基座部分,其具有一自一底部邊緣向上延伸至一頂部邊緣之實質上管狀基座側壁,該底部邊緣界定用於接達至該基座部分之一內部之一第一孔隙,該第一孔隙係圍繞一第一軸線同心; 一頂部部分,其連接至該基座部分,該頂部部分具有定位於該基座部分之該頂部邊緣上之一實質上平面頂部側壁以向上遮蓋該底部孔隙,該頂部部分包含用於透過該基板容器之該底板中之一入口安裝之一入口管嘴,該入口管嘴具有自該頂部側壁向上延伸至一管嘴邊緣之一實質上管狀管嘴側壁,該管嘴邊緣界定用於接達至該入口管嘴之一內部之一第二孔隙,該第二孔隙係圍繞實質上平行於該第一軸線且定位於該第一軸線後側之一第二軸線同心;及 一偏移導管部分,其安置於該基座部分與該入口管嘴之間,該基座部分及該入口管嘴經由該偏移導管部分呈流體連通; 其中該頂部側壁實質上與該地板齊平。A substrate container comprising: a container portion comprising two opposing side walls, a back side wall, a top side wall and a bottom plate, the container portion defining an interior for insertion and removal of the substrate, the interior having a floor comprising a rear recess in the floor; and a door configured to cover and seal the opening defined by the container portion; and a cleaning interface body mounted in the recess, the The cleaning interface body includes: a base portion having a substantially tubular base sidewall extending upwardly from a bottom edge to a top edge, the bottom edge defining one of the interiors for accessing one of the base portions An aperture, the first aperture is concentric about a first axis; a top portion coupled to the base portion, the top portion having a substantially planar top sidewall positioned on the top edge of the base portion Covering the bottom aperture upwardly, the top portion including an inlet nozzle for mounting one of the bottom plates through the substrate container, the inlet nozzle having a self The top side wall extends upwardly to one of the nozzle edges substantially a tubular nozzle side wall defining a second aperture for accessing one of the interior of the inlet nozzle, the second aperture surrounding a second axis parallel to the first axis and positioned on a rear side of the first axis; and an offset conduit portion disposed between the base portion and the inlet nozzle, the base portion and the The inlet nozzle is in fluid communication via the offset conduit portion; wherein the top sidewall is substantially flush with the floor.
TW105128692A 2016-09-05 2016-09-05 Substrate container and purge tower assembly for the substrate container TWI709441B (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114249029A (en) * 2020-09-22 2022-03-29 家登精密工业股份有限公司 Substrate container with enhanced internal flow field

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EP4235759A3 (en) * 2013-10-14 2023-10-04 Entegris, Inc. Towers for substrate carriers

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114249029A (en) * 2020-09-22 2022-03-29 家登精密工业股份有限公司 Substrate container with enhanced internal flow field

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