TW201819753A - 排氣閥系統 - Google Patents

排氣閥系統 Download PDF

Info

Publication number: TW201819753A
Authority: TW; Taiwan
Prior art keywords: exhaust valve; chamber; vacuum system; gas; controller
Prior art date: 2016-10-17

Application number

TW106135436A

Other languages

English (en)

Chinese (zh)

Inventor

李方甫

王友金

Original Assignee

漢民微測科技股份有限公司

荷蘭商Ａｓｍｌ荷蘭公司

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2016-10-17

Filing date

2017-10-17

Publication date

2018-06-01

2017-10-17 Application filed by 漢民微測科技股份有限公司, 荷蘭商Ａｓｍｌ荷蘭公司 filed Critical 漢民微測科技股份有限公司

2018-06-01 Publication of TW201819753A publication Critical patent/TW201819753A/zh

Links

238000000034 method Methods 0.000 claims abstract description 24
238000013022 venting Methods 0.000 claims abstract description 9
238000010894 electron beam technology Methods 0.000 claims description 44
239000012080 ambient air Substances 0.000 claims description 11
238000007689 inspection Methods 0.000 claims description 6
238000012544 monitoring process Methods 0.000 claims 1
239000007789 gas Substances 0.000 description 139
239000002245 particle Substances 0.000 description 9
238000010586 diagram Methods 0.000 description 8
238000007599 discharging Methods 0.000 description 6
238000012546 transfer Methods 0.000 description 6
238000004519 manufacturing process Methods 0.000 description 5
230000008569 process Effects 0.000 description 5
230000008859 change Effects 0.000 description 4
238000001514 detection method Methods 0.000 description 4
239000004065 semiconductor Substances 0.000 description 4
230000005684 electric field Effects 0.000 description 3
239000011261 inert gas Substances 0.000 description 3
230000004044 response Effects 0.000 description 3
239000000823 artificial membrane Substances 0.000 description 2
238000011109 contamination Methods 0.000 description 2
238000013461 design Methods 0.000 description 2
238000009792 diffusion process Methods 0.000 description 2
230000006870 function Effects 0.000 description 2
238000007654 immersion Methods 0.000 description 2
238000001459 lithography Methods 0.000 description 2
239000000463 material Substances 0.000 description 2
238000012545 processing Methods 0.000 description 2
238000004626 scanning electron microscopy Methods 0.000 description 2
239000003570 air Substances 0.000 description 1
238000003491 array Methods 0.000 description 1
230000005540 biological transmission Effects 0.000 description 1
239000000919 ceramic Substances 0.000 description 1
238000004891 communication Methods 0.000 description 1
230000008878 coupling Effects 0.000 description 1
238000010168 coupling process Methods 0.000 description 1
238000005859 coupling reaction Methods 0.000 description 1
239000013078 crystal Substances 0.000 description 1
230000007547 defect Effects 0.000 description 1
230000005284 excitation Effects 0.000 description 1
239000011521 glass Substances 0.000 description 1
238000003384 imaging method Methods 0.000 description 1
239000007788 liquid Substances 0.000 description 1
238000013507 mapping Methods 0.000 description 1
239000012528 membrane Substances 0.000 description 1
239000002184 metal Substances 0.000 description 1
239000000203 mixture Substances 0.000 description 1
238000012986 modification Methods 0.000 description 1
230000004048 modification Effects 0.000 description 1
QKCGXXHCELUCKW-UHFFFAOYSA-N n-[4-[4-(dinaphthalen-2-ylamino)phenyl]phenyl]-n-naphthalen-2-ylnaphthalen-2-amine Chemical compound C1=CC=CC2=CC(N(C=3C=CC(=CC=3)C=3C=CC(=CC=3)N(C=3C=C4C=CC=CC4=CC=3)C=3C=C4C=CC=CC4=CC=3)C3=CC4=CC=CC=C4C=C3)=CC=C21 QKCGXXHCELUCKW-UHFFFAOYSA-N 0.000 description 1
230000003287 optical effect Effects 0.000 description 1
238000000399 optical microscopy Methods 0.000 description 1
229920000642 polymer Polymers 0.000 description 1
238000006116 polymerization reaction Methods 0.000 description 1
230000001105 regulatory effect Effects 0.000 description 1
239000007787 solid Substances 0.000 description 1
238000003860 storage Methods 0.000 description 1

Classifications

- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/18—Vacuum control means
- H01J2237/186—Valves

Landscapes

Chemical & Material Sciences (AREA)
Analytical Chemistry (AREA)
Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Sampling And Sample Adjustment (AREA)

TW106135436A 2016-10-17 2017-10-17 排氣閥系統 TW201819753A (zh)

Applications Claiming Priority (4)

Application Number	Priority Date	Filing Date
US201662408880P	2016-10-17	2016-10-17
US62/408,880		2016-10-17
US201762570625P	2017-10-10	2017-10-10
US62/570,625		2017-10-10

Publications (1)

Publication Number	Publication Date
TW201819753A true TW201819753A (zh)	2018-06-01

Family

ID=60143697

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
TW106135436A TW201819753A (zh)	2016-10-17	2017-10-17	排氣閥系統

Country Status (2)

Country	Link
TW (1)	TW201819753A (fr)
WO (1)	WO2018073192A1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US20250012855A1 (en) *	2021-11-24	2025-01-09	Asml Netherlands B.V.	Systems and structures for venting and flow conditioning operations in inspection systems

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4739787A (en) *	1986-11-10	1988-04-26	Stoltenberg Kevin J	Method and apparatus for improving the yield of integrated circuit devices
US6120606A (en) *	1998-06-26	2000-09-19	Acer Semiconductor Manufacturing Inc.	Gas vent system for a vacuum chamber
US8302420B2 (en) *	2009-04-27	2012-11-06	Hermes Microvision, Inc.	Method for venting gas into closed space and gas supply assembly thereof
WO2014181685A1 (fr) *	2013-05-10	2014-11-13	株式会社日立ハイテクノロジーズ	Dispositif à faisceau de particules chargées

2017
- 2017-10-16 WO PCT/EP2017/076384 patent/WO2018073192A1/fr not_active Ceased
- 2017-10-17 TW TW106135436A patent/TW201819753A/zh unknown

Also Published As

Publication number	Publication date
WO2018073192A1 (fr)	2018-04-26

Publication	Publication Date	Title
US9728374B2 (en)	2017-08-08	Inspection apparatus
US7157703B2 (en)	2007-01-02	Electron beam system
US8946629B2 (en)	2015-02-03	Inspection apparatus
WO2007020866A1 (fr)	2007-02-22	Dispositif de détection et dispositif d’inspection
JP6584946B2 (ja)	2019-10-02	検査装置
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JP6737598B2 (ja)	2020-08-12	検査装置及び検査方法
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