TW201827655A - 連續式分離器及其組件 - Google Patents

連續式分離器及其組件 Download PDF

Info

Publication number: TW201827655A
Authority: TW; Taiwan
Prior art keywords: contactors; contactor; continuous separator; controller; contact
Prior art date: 2016-12-09

Application number

TW106143063A

Other languages

English (en)

Chinese (zh)

Inventor

麥可帕斯哥

馬庫思賽伯

諾貝爾特貝

約翰伯爾斯西克

達米安賽克

沃夫岡多姆佩弗德

馬庫思伊蘭

霍格庫恩蘭

湯瑪士赫特

安卓亞斯凱特爾

Original Assignee

德商雷納科技有限公司

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2016-12-09

Filing date

2017-12-08

Publication date

2018-08-01

2017-12-08 Application filed by 德商雷納科技有限公司 filed Critical 德商雷納科技有限公司

2018-08-01 Publication of TW201827655A publication Critical patent/TW201827655A/zh

Links

239000003792 electrolyte Substances 0.000 claims abstract description 32
239000000126 substance Substances 0.000 claims abstract description 17
238000009713 electroplating Methods 0.000 claims abstract description 7
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 20
238000007747 plating Methods 0.000 claims description 16
229910052751 metal Inorganic materials 0.000 claims description 10
239000002184 metal Substances 0.000 claims description 10
238000004891 communication Methods 0.000 claims description 7
229910001092 metal group alloy Inorganic materials 0.000 claims description 5
238000000034 method Methods 0.000 description 16
239000008151 electrolyte solution Substances 0.000 description 8
238000010586 diagram Methods 0.000 description 5
238000005259 measurement Methods 0.000 description 5
238000012545 processing Methods 0.000 description 5
239000000243 solution Substances 0.000 description 5
230000000694 effects Effects 0.000 description 4
238000004519 manufacturing process Methods 0.000 description 4
239000000463 material Substances 0.000 description 4
238000001465 metallisation Methods 0.000 description 4
230000036961 partial effect Effects 0.000 description 4
239000010935 stainless steel Substances 0.000 description 4
229910001220 stainless steel Inorganic materials 0.000 description 4
229910052782 aluminium Inorganic materials 0.000 description 3
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
230000007797 corrosion Effects 0.000 description 3
238000005260 corrosion Methods 0.000 description 3
230000002829 reductive effect Effects 0.000 description 3
239000000758 substrate Substances 0.000 description 3
239000002800 charge carrier Substances 0.000 description 2
238000009434 installation Methods 0.000 description 2
150000002500 ions Chemical class 0.000 description 2
230000002441 reversible effect Effects 0.000 description 2
101001073212 Arabidopsis thaliana Peroxidase 33 Proteins 0.000 description 1
OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
239000004593 Epoxy Substances 0.000 description 1
101001123325 Homo sapiens Peroxisome proliferator-activated receptor gamma coactivator 1-beta Proteins 0.000 description 1
102100028961 Peroxisome proliferator-activated receptor gamma coactivator 1-beta Human genes 0.000 description 1
230000009286 beneficial effect Effects 0.000 description 1
230000005540 biological transmission Effects 0.000 description 1
239000000969 carrier Substances 0.000 description 1
150000001768 cations Chemical class 0.000 description 1
238000006243 chemical reaction Methods 0.000 description 1
239000011248 coating agent Substances 0.000 description 1
238000000576 coating method Methods 0.000 description 1
238000005520 cutting process Methods 0.000 description 1
230000003247 decreasing effect Effects 0.000 description 1
230000007547 defect Effects 0.000 description 1
230000002950 deficient Effects 0.000 description 1
230000003111 delayed effect Effects 0.000 description 1
238000013461 design Methods 0.000 description 1
238000005516 engineering process Methods 0.000 description 1
239000010408 film Substances 0.000 description 1
PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
239000010931 gold Substances 0.000 description 1
229910052737 gold Inorganic materials 0.000 description 1
229910002804 graphite Inorganic materials 0.000 description 1
239000010439 graphite Substances 0.000 description 1
238000000752 ionisation method Methods 0.000 description 1
238000002955 isolation Methods 0.000 description 1
239000004922 lacquer Substances 0.000 description 1
238000003698 laser cutting Methods 0.000 description 1
239000011244 liquid electrolyte Substances 0.000 description 1
238000012423 maintenance Methods 0.000 description 1
238000000691 measurement method Methods 0.000 description 1
239000010970 precious metal Substances 0.000 description 1
238000004886 process control Methods 0.000 description 1
230000001681 protective effect Effects 0.000 description 1
238000006748 scratching Methods 0.000 description 1
230000002393 scratching effect Effects 0.000 description 1
238000005204 segregation Methods 0.000 description 1
-1 that is Substances 0.000 description 1
239000010409 thin film Substances 0.000 description 1

Classifications

- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/001—Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/005—Contacting devices
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/02—Tanks; Installations therefor
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/02—Electroplating of selected surface areas
- C25D5/028—Electroplating of selected surface areas one side electroplating, e.g. substrate conveyed in a bath with inhibited background plating
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/06—Wires; Strips; Foils
- C25D7/0614—Strips or foils
- C25D7/0621—In horizontal cells
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/18—Electroplating using modulated, pulsed or reversing current

Landscapes

Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Chemical Kinetics & Catalysis (AREA)
Electrochemistry (AREA)
Materials Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Automation & Control Theory (AREA)
Life Sciences & Earth Sciences (AREA)
Sustainable Development (AREA)
Electroplating Methods And Accessories (AREA)
Charge And Discharge Circuits For Batteries Or The Like (AREA)

TW106143063A 2016-12-09 2017-12-08 連續式分離器及其組件 TW201827655A (zh)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
DE102016124002		2016-12-09
??102016124002.8		2016-12-09

Publications (1)

Publication Number	Publication Date
TW201827655A true TW201827655A (zh)	2018-08-01

Family

ID=60788534

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
TW106143063A TW201827655A (zh)	2016-12-09	2017-12-08	連續式分離器及其組件

Country Status (7)

Country	Link
US (1)	US20190338439A1 (fr)
EP (1)	EP3551785A1 (fr)
JP (1)	JP2020505503A (fr)
KR (1)	KR20190091481A (fr)
CN (1)	CN110234799A (fr)
TW (1)	TW201827655A (fr)
WO (1)	WO2018103793A1 (fr)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE19612555C2 (de) *	1996-03-29	1998-03-19	Atotech Deutschland Gmbh	Verfahren zur selektiven elektrochemischen Behandlung von Leiterplatten und Vorrichtung zur Durchführung des Verfahrens
DE102005031948B3 (de) *	2005-07-08	2006-06-14	Höllmüller Maschinenbau GmbH	Vorrichtungen und Verfahren zur elektrolytischen Behandlung von Folien von Rolle zu Rolle
DE102007055338B4 (de) *	2007-11-19	2009-08-13	Rena Sondermaschinen Gmbh	Vorrichtung und Verfahren zum elektrischen Kontaktieren von Gut in elektrolytischen Durchlaufanlagen
DE102008026199B3 (de) *	2008-05-30	2009-10-08	Rena Gmbh	Vorrichtung und Verfahren zur elektrischen Kontaktierung von ebenem Gut in Durchlaufanlagen
DE102009057463A1 (de) *	2009-12-03	2011-06-09	Hübel, Egon	Verfahren und Vorrichtung zum elektrischen Kontaktieren von Gut in Durchlaufanlagen
CN102947941A (zh) *	2010-04-01	2013-02-27	索蒙特有限责任公司	太阳能电池及其制造方法
DE102013100805B4 (de) *	2013-01-28	2015-01-22	Hochschule Offenburg	Nasschemische Behandlungsanlage zum elektrochemischen Beschichten von flachen Substraten

2017
- 2017-12-08 EP EP17818422.2A patent/EP3551785A1/fr not_active Withdrawn
- 2017-12-08 US US16/467,728 patent/US20190338439A1/en not_active Abandoned
- 2017-12-08 KR KR1020197018534A patent/KR20190091481A/ko not_active Withdrawn
- 2017-12-08 CN CN201780076077.9A patent/CN110234799A/zh active Pending
- 2017-12-08 JP JP2019530183A patent/JP2020505503A/ja active Pending
- 2017-12-08 TW TW106143063A patent/TW201827655A/zh unknown
- 2017-12-08 WO PCT/DE2017/101049 patent/WO2018103793A1/fr not_active Ceased

Also Published As

Publication number	Publication date
WO2018103793A1 (fr)	2018-06-14
EP3551785A1 (fr)	2019-10-16
KR20190091481A (ko)	2019-08-06
JP2020505503A (ja)	2020-02-20
CN110234799A (zh)	2019-09-13
US20190338439A1 (en)	2019-11-07

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US6544391B1 (en)	2003-04-08	Reactor for electrochemically processing a microelectronic workpiece including improved electrode assembly
US6187166B1 (en)	2001-02-13	Integrated solution electroplating system and process
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KR100748792B1 (ko)	2007-08-13	수직 도금 장치 및 이를 이용한 수직 도금 방법
US20030201185A1 (en)	2003-10-30	In-situ pre-clean for electroplating process