TW201902607A - A cutting method and cutting machine of a brittle substrate with a resin layer - Google Patents
A cutting method and cutting machine of a brittle substrate with a resin layer Download PDFInfo
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- TW201902607A TW201902607A TW107108804A TW107108804A TW201902607A TW 201902607 A TW201902607 A TW 201902607A TW 107108804 A TW107108804 A TW 107108804A TW 107108804 A TW107108804 A TW 107108804A TW 201902607 A TW201902607 A TW 201902607A
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P54/00—Cutting or separating of wafers, substrates or parts of devices
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/38—Removing material by boring or cutting
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/40—Removing material taking account of the properties of the material involved
- B23K26/402—Removing material taking account of the properties of the material involved involving non-metallic material, e.g. isolators
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0428—Apparatus for mechanical treatment or grinding or cutting
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W10/00—Isolation regions in semiconductor bodies between components of integrated devices
- H10W10/01—Manufacture or treatment
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- Mechanical Engineering (AREA)
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- Processing Of Stones Or Stones Resemblance Materials (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
Abstract
本發明係提供一種能以簡單之步驟俐落地分斷附樹脂層之脆性材料基板之分斷方法及分斷裝置。 使包含脈衝雷射光束之叢發(burst)之雷射光束L1透過產生像差之像差生成透鏡4c而生成為像差雷射光束L2;將上述像差雷射光束L2之最聚光部自成為附樹脂層之脆性材料基板W之母體之脆性材料基板W1之表面沿分斷預定線掃描,於上述脆性材料基板W1形成強度經降低之改質層K並同時於上述樹脂層W2形成分斷槽V;接著,沿上述改質層K經由裂斷器件將附樹脂層之脆性材料基板W沿分斷預定線分斷。The invention provides a cutting method and a cutting device capable of neatly cutting a brittle material substrate with a resin layer in a simple step. A burst laser beam L1 including a pulsed laser beam is transmitted through the aberration generating lens 4c to generate an aberration laser beam L2; the most condensing portion of the aberration laser beam L2 is generated The surface of the brittle material substrate W1, which becomes the mother body of the brittle material substrate W with the resin layer, is scanned along a predetermined breaking line, and a modified layer K having a reduced strength is formed on the brittle material substrate W1, and at the same time, a component is formed on the resin layer W2 The groove V is broken; then, the brittle material substrate W with a resin layer is cut along a predetermined breaking line along the reforming layer K via a cracking device.
Description
本發明係關於於脆性材料基板之一面積層樹脂層之附樹脂層之脆性材料基板之分斷方法及分斷裝置。尤其本發明係關於如半導體基板般之於玻璃等脆性材料基板之一面,以保護電路圖案等為目的積層了丙烯酸或環氧樹脂等較薄之合成樹脂層之附樹脂層之脆性材料基板之分斷方法及分斷裝置。The invention relates to a cutting method and a cutting device for a brittle material substrate with a resin layer on a resin layer with an area layer of a brittle material substrate. In particular, the present invention relates to a brittle material substrate with a resin layer and a thin resin layer, such as acrylic or epoxy, laminated on one side of a brittle material substrate such as a semiconductor substrate and glass, for the purpose of protecting circuit patterns and the like. Breaking method and breaking device.
一般而言,於分斷如上述之附樹脂層之脆性材料基板之情形時,已知一種分斷方法,係如圖8(a)所示,藉由刀輪15(亦稱為劃線輪)等,對成為附樹脂層之脆性材料基板W之母體之脆性材料基板W1之表面進行劃線而形成切槽狀之劃線S,自與形成該劃線S之面成相反側之樹脂層W2之面,如圖8(b)所示,藉由按壓裂斷棒14使附樹脂層之脆性材料基板W撓曲而沿劃線S分斷(例如,參照專利文獻1、專利文獻2之圖10)。 於上述之劃線加工中,替代藉由刀輪等機械之方法,一般亦有使用將雷射光束照射於脆性材料基板之表面藉由熱沿著分斷預定線產生裂紋,或形成改質層,藉此形成劃線之方法。 [先前技術文獻] [專利文獻] [專利文獻1]日本專利特開2016-000533號公報 [專利文獻2]日本專利特開2015-039872號公報 [專利文獻3]日本專利特開2012-066479號公報Generally speaking, in the case of breaking a brittle material substrate with a resin layer as described above, a breaking method is known, as shown in FIG. 8 (a), by a cutter wheel 15 (also called a scribing wheel) ), Etc., the surface of the brittle material substrate W1 which becomes the mother of the brittle material substrate W with a resin layer is scribed to form a grooved scribe line S, and the resin layer on the opposite side from the surface on which the scribe line S is formed As shown in FIG. 8 (b), the surface of W2 is broken along the scribe line S by bending the brittle material substrate W with a resin layer by pressing the breaking rod 14 (for example, see Patent Documents 1 and 2). Figure 10). In the above-mentioned scribing process, instead of using a mechanical method such as a cutter wheel, a laser beam is generally irradiated on the surface of a brittle material substrate, and cracks are generated along a predetermined line by heat, or a modified layer is formed To form a scribing method. [Prior Art Literature] [Patent Literature] [Patent Literature 1] Japanese Patent Laid-Open No. 2016-000533 [Patent Literature 2] Japanese Patent Laid-Open No. 2015-039872 [Patent Literature 3] Japanese Patent Laid-Open No. 2012-066479 Bulletin
[發明所欲解決之問題] 然而,於欲藉由上述方法對附樹脂層之脆性材料基板進行分斷之情形時,由於成為母體之脆性材料基板與樹脂層之物理特性不同,故會產生樹脂層之一部分未完全分斷而仍然相連,或即便已經分斷但產生了擦痕、不規則地割出之毛刺、及碎屑等而無法俐落地分斷等問題。 又,為了確實地切離樹脂層,亦已知一種於分斷步驟之前於樹脂層之表面以刀輪或雷射光束沿著分斷預定線形成劃線之方法(例如參照專利文獻3)。然而,於該方法中,對附樹脂層之脆性材料基板之任一面加工出劃線之後,需要使基板反轉於相反側之面進行劃線加工,從而作業步驟增加、耗費手續,且必須有用於使基板反轉之機構等而有裝置變複雜,成本變高之問題點。 因此,本發明之目的在於可提供能解決上述問題,且可以簡單之步驟精度良好地且俐落地分斷之附樹脂層之脆性材料基板之分斷方法及分斷裝置。 [解決問題之技術手段] 為了達成上述目的之本發明之分斷方法係使樹脂層積層於脆性材料基板之單側之一面之附樹脂層之脆性材料基板之分斷方法,其係使包含脈衝雷射光束之叢發之雷射光束透過產生像差之像差生成透鏡而生成為像差雷射光束,將上述像差雷射光束之最聚光部自成為上述附樹脂層之脆性材料基板之母體之脆性材料基板之表面沿分斷預定線掃描,於上述脆性材料基板形成強度經降低之改質層並同時於上述樹脂層形成分斷槽,接著,沿上述改質層經由裂斷器件將上述附樹脂層之脆性材料基板沿上述分斷預定線分斷。 於本發明之分斷方法中,較佳為將上述像差雷射光束之最聚光之最聚光部對準上述脆性材料基板之厚度之中間位置進行掃描。 此處,像差雷射光束之最聚光部係指沿著像差雷射光束之照射方向,於測定光束分佈(強度分佈)時,光束分佈之峰值功率最高之位置(沿著像差雷射光束之照射方向之位置)。 作為分斷上述脆性材料基板之改質層之裂斷器件,可使用照射波長10.6 μm之CO2 雷射光束或波長1.064 μm之Nd;YAG雷射光束等之具有紅外線區域之波長(通常,波長為0.7 μm以上)之雷射光束(具體而言,波長0.7 μm~20 μm之雷射光束)而藉由熱分斷之光學器件或藉由自基板上表面按壓裂斷棒使基板撓曲而分斷之機械器件。 又,基於另一觀點之本發明之分斷裝置係使樹脂層積層於脆性材料基板之單側之一面之附樹脂層之脆性材料基板之分斷裝置,且包含以下而構成:載台,其載置上述附樹脂層之脆性材料基板;像差雷射光束發光構件,其將自光源出射之包含脈衝雷射光束之叢發之雷射光束經由產生像差之像差生成透鏡而生成為像差雷射光束;移動機構,其使上述像差雷射光束發光構件沿上述附樹脂層之脆性材料基板之分斷預定線相對地移動,而於成為母體之脆性材料基板形成強度經降低之改質層並同時於樹脂層形成分斷槽;及裂斷器件,其沿上述改質層將上述附樹脂層之脆性材料基板分斷。 [發明之效果] 由於本發明如上述般構成,故可藉由像差雷射光束之掃描,於成為母體之玻璃基板等脆性材料基板加工強度經降低之改質層之同時於樹脂層可沿分斷預定線形成分斷槽。因此,於接下來之裂斷步驟中,對附樹脂層之脆性材料基板施加外力而沿改質層分斷脆性材料基板時,由於樹脂層預先於分斷槽之部分切離或其厚度之大部分被去除,故可不於樹脂層產生擦痕或毛刺,碎屑等而以俐落之端面確實地分斷。又,由於藉由像差雷射光束於脆性材料基板加工改質層之同時於樹脂層形成分斷槽,故可省略如先前般之反轉基板而於樹脂層加工劃線等繁雜之步驟,且可謀求加工時間之縮短或成本之減少化。 於本發明中,上述像差生成透鏡較佳由平凸透鏡形成。於該情形時,藉由使雷射光束自平凸透鏡之平面側入射,可自凸面側出射像差雷射光束。於該情形時,藉由於平凸透鏡之平面側配置繞射光學元件(DOE),可增加自平凸透鏡之凸面側出射之雷射光束之焦點數,而且,可縮小聚光徑。 進而,於本發明中,上述像差雷射光束之光源為波長0.7~2.5 μm(例如,Nd:YAG雷射之基本波)之近紅外雷射,且,較佳為使用脈衝寬度為100皮秒以下之雷射光束之叢發。[Problems to be Solved by the Invention] However, when the brittle material substrate with a resin layer is to be divided by the above method, since the physical characteristics of the brittle material substrate and the resin layer serving as a parent body are different, resin is generated. One part of the layer is not completely cut and still connected, or even if it has been cut, it has problems such as scratches, irregularly cut burrs, and debris that cannot be cut cleanly. In addition, in order to surely cut off the resin layer, a method of forming a scribing line along a predetermined breaking line with a cutter wheel or a laser beam on the surface of the resin layer before the cutting step is also known (for example, refer to Patent Document 3). However, in this method, after scribe lines are processed on one side of a brittle material substrate with a resin layer, the substrate needs to be reversed to the opposite side for scribe processing, which increases the number of work steps, consumes procedures, and must be useful. There are problems in that the device is complicated and the cost is high for a mechanism or the like for reversing the substrate. Therefore, an object of the present invention is to provide a cutting method and a cutting device for a brittle material substrate with a resin layer that can solve the above-mentioned problems and can be accurately and neatly separated in a simple procedure. [Technical means for solving the problem] The breaking method of the present invention for achieving the above-mentioned object is a breaking method of a brittle material substrate with a resin layer laminated with a resin layer on one side of a brittle material substrate. The cluster of laser beams generated by the laser beam passes through the aberration generating lens to generate an aberration laser beam, and the most condensing part of the aberration laser beam becomes the brittle material substrate with the resin layer The surface of the substrate of the brittle material of the mother body is scanned along the predetermined breaking line to form a modified layer having a reduced strength on the brittle material substrate and a breaking groove is formed on the resin layer at the same time, and then, a fracture device is passed along the modified layer. The brittle material substrate with a resin layer is divided along the predetermined division line. In the breaking method of the present invention, it is preferable to scan the most condensed part of the aberration laser beam at the middle position of the thickness of the brittle material substrate. Here, the most condensing portion of the aberration laser beam refers to the position along the irradiation direction of the aberration laser beam. When measuring the beam distribution (intensity distribution), the peak power of the beam distribution is highest (along the aberration laser). Position of the irradiation direction of the light beam). As a breaking device for breaking the modified layer of the brittle material substrate, a CO 2 laser beam irradiating a wavelength of 10.6 μm or Nd having a wavelength of 1.064 μm; a wavelength having an infrared region such as a YAG laser beam (typically, a wavelength Laser beam (specifically, a laser beam with a wavelength of 0.7 μm to 20 μm) and the substrate is flexed by thermally breaking optical devices or by pressing a breaking rod from the upper surface of the substrate Breaking mechanical device. In addition, the breaking device of the present invention based on another viewpoint is a breaking device of a brittle material substrate with a resin layer laminated with a resin layer on one side of the brittle material substrate, and includes the following: a stage, which The aforesaid brittle material substrate with a resin layer mounted thereon; an aberration laser beam light emitting member that generates a cluster of laser beams including a pulsed laser beam emitted from a light source through an aberration generating lens to generate an image A differential laser beam; a moving mechanism that moves the aberration laser beam light-emitting member relatively along a predetermined breaking line of the brittle material substrate with a resin layer, and reduces the formation strength of the brittle material substrate that becomes the mother And forming a breaking groove in the resin layer at the same time; and a breaking device that breaks the brittle material substrate with the resin layer along the reforming layer. [Effects of the Invention] Since the present invention is structured as described above, it is possible to scan the aberration laser beam to form a modified layer of a substrate of a brittle material, such as a glass substrate, which is a mother, while reducing the processing strength of the substrate. The predetermined breaking line forms a breaking groove. Therefore, in the subsequent cracking step, when an external force is applied to the brittle material substrate with the resin layer to cut the brittle material substrate along the modified layer, the resin layer is cut off in advance at the part of the cutting groove or its thickness is large. The part is removed, so that the resin layer can be surely cut off without generating scratches, burrs, and debris on the resin layer. In addition, because the aberration laser beam is used to form a breaking groove in the resin layer while the modified layer is processed on the brittle material substrate, the complicated steps such as reversing the substrate and processing the scribing on the resin layer can be omitted. In addition, it is possible to reduce processing time or cost. In the present invention, the aberration generating lens is preferably formed of a plano-convex lens. In this case, by making the laser beam incident from the plane side of the plano-convex lens, an aberration laser beam can be emitted from the convex side. In this case, by arranging the diffractive optical element (DOE) on the plane side of the plano-convex lens, the number of focal points of the laser beam emitted from the convex side of the plano-convex lens can be increased, and the condensing path can be reduced. Furthermore, in the present invention, the light source of the aberration laser beam is a near-infrared laser having a wavelength of 0.7 to 2.5 μm (for example, a fundamental wave of Nd: YAG laser), and it is preferable to use a pulse width of 100 pico Bursts of laser beams below seconds.
於以下,基於於圖所示之實施例說明本發明之細節。 圖1係顯示本發明之劃線裝置(分斷裝置)A之圖。 於劃線裝置A中,於左右之支柱1、1設置有具備沿X方向之引導件2之水平之樑(橫樑)3。於該樑3之引導件2,以可藉由馬達M1向X方向移動之方式安裝有具備像差雷射光束發光構件4之劃線頭5、及具備分斷用雷射光束發光構件6之劃線頭7。載置並吸附保持加工對象基板W之載台8經由以縱軸為支點之旋動機構9被保持於台盤10上,台盤10形成為可藉由利用馬達M2驅動之螺紋螺釘11向Y方向(圖1之前後方向)移動。另,於本實施例中,像差雷射光束發光構件4與分斷用雷射光束發光構件6係分別安裝於各劃線頭5、7,但亦可安裝於共通之劃線頭。 安裝於劃線頭5之像差雷射光束發光構件4如圖2所示,其脈衝寬度(脈衝持續時間)為100皮秒以下,較佳為50皮秒以下(通常為1皮秒以上),此處具備出射10皮秒之脈衝雷射光束之光源4a、使自該光源4a振盪之脈衝雷射光束作為經分割之叢發列之集合而出射之光調變器4b,及使自該光調變器4b出射之雷射光束L1產生像差之像差生成透鏡4c。 另,光源4a可使用波長0.7~2.5 μm之近紅外雷射,於本實施例中使用波長1.064 μm之近紅外線雷射。 又,關於使脈衝雷射光束之叢發列出射之光調變器4b,例如於日本專利特表2012-515450號公報中揭示,此處設為使用周知之光調變器而出射脈衝雷射光束之叢發列者,對其細節省略說明。 用於使自光調變器4b出射之雷射光束L1產生像差之像差生成透鏡4c並未特別限定,但此處係使用使焦點向光軸方向分散,且使通過之雷射光束L1以結成朝軸方向模糊之焦點之方式聚光而產生像差之平凸透鏡。通過該平凸透鏡之雷射光束L1成為焦點分散之像差雷射光束L2。藉由使雷射光束L1自平凸透鏡之平面側入射,可自凸面側出射像差雷射光束L2。 自脈衝雷射光束之叢發列生成之像差雷射光束L2如圖3(a)所示,可藉由以像差生成透鏡4c聚光而形成使能量蓄積於各焦點部f之較窄且長之高能量分佈區域(雷射光絲)F。於圖3(b)顯示將該高能量分佈區域F模式性放大之圖。藉由此種高能量分佈區域F之形成,於對加工對象基板、例如對鈉玻璃基板之表面照射時,可自鈉玻璃基板之被照射面深入至內部地加工強度經降低之改質層K(參照圖5)。 自安裝於另一劃線頭7之分斷用雷射光束發光構件6出射之分斷用雷射光束L3(參照圖6)係使用可將藉由上述像差雷射光束L2使強度降低之改質層K完全分斷之雷射光束。於本實施例中,作為該分斷用雷射光束L3,使用波長10.6 μm之CO2 雷射光束。另,亦可替代CO2 雷射光束,而使用波長1.064 μm之Nd、YAG雷射光束等之波長0.7~20 μm之雷射光束。 其次,以下針對使用上述劃線頭裝置A之本發明之附樹脂層之脆性材料基板W之分斷方法進行說明。於本實施例中,成為母體之脆性材料基板W1以厚度1 mm之鈉玻璃形成,將於其一面積層有厚度10~50 μm之丙烯酸樹脂層W2之附樹脂層之脆性材料基板W作為加工對象基板。 首先,如圖5(a)所示,於載台8上載置附樹脂層之脆性材料基板W,一面將自像差雷射光束發光構件4出射之像差雷射光束L2向基板W照射,一面藉由包含劃線頭5與引導件2之移動機構沿基板W之分斷預定線移動。此時,像差雷射光束L2之聚光部之高能量分佈區域F自脆性材料基板W1之厚度之中間遍及至樹脂層W2。藉此,如圖5(b)所示,可自脆性材料基板W1之被照射面至下表面加工出強度變弱之改質層K,並同時藉由燒蝕等去除層厚較薄之樹脂層W2之較高能量分佈區域F而形成分斷槽V。於該分斷槽V之部分,樹脂層2被完全地切離,或厚度大部分被去除。 另,於接收基板W之載台8,較佳預先設置空間8a以使照射像差雷射光束L2時能使透過基板W之雷射光束向下方發散。 此處,於下述顯示包含叢發之像差雷射光束L2(脈衝雷射光束之叢發列)之較佳之實施條件之一例。 雷射輸出:10.6 W 重複頻率:32.5 kHz 脈衝寬度:10皮秒 脈衝間隔(雷射脈衝於基板上之照射點之照射間隔):4 μm 叢發(burst):2脈衝 脈衝能量:163 μJ/1叢發 掃描速度:130 mm/s 另,加工深度及加工狀態可藉由上述之雷射輸出、重複頻率、脈衝寬度、叢發數及脈衝間隔、像差等之調整而容易地控制。 圖4係顯示脈衝雷射光束之叢發列之模式圖。形成將一個個脈衝雷射光束分割而成之2個微細脈衝P,且依每重複頻率間歇性地照射。 如上述般,藉由像差雷射光束L2之掃描,於基板W之脆性材料基板W1加工改質層K並同時於樹脂層W2加工分斷槽V後,如圖6所示,一面自分斷用雷射光束發光構件6朝向經加工改質層K之分斷預定線照射CO2 雷射光束L3,一面藉由包含劃線頭7以及引導件2之移動機構沿分斷預定線移動。此時之CO2 雷射光束L3之雷射照射條件根據成為加工對象之附樹脂層之脆性材料基板W之素材或厚度而不同,但於本實施例中,將輸出設為22 W,掃描速度設為20 mm/s,重複頻率設為10 kHz。 如此,藉由沿經加工改質層K之分斷預定線一面照射CO2 雷射光束L3一面移動,從而可藉由雷射光束之熱而完全分斷脆性材料基板W1之強度變弱之改質層K。又,於此之前,由於藉由像差雷射光束L2之照射將樹脂層W2於分斷槽V切離,或將其厚度之大部分去除,故藉由以CO2 雷射光束L3施加外力,可沿分斷預定線以俐落之端面確實地分斷,而不會於附樹脂層之脆性材料基板W產生劃痕或毛刺、碎屑等。 於上述實施例中,藉由像差雷射光束L2於脆性材料基板W1加工改質層K之後,使用分斷用雷射光束L3作為自改質層K分斷附樹脂層之脆性材料基板W之裂斷器件,但亦可取代其而使用裂斷棒機械地施加外力而分斷。 圖7係顯示使用裂斷棒之裂斷器件者,如圖7(a)所示,於載台12上鋪設包含橡膠等之彈性片材13,於該彈性片材13上將加工出改質層K之附樹脂層之脆性材料基板W以樹脂層W2側朝上之方式載置。且,如圖7(b)所示,藉由自上方朝向改質層K按壓裂斷棒14,可使脆性材料基板W1撓曲而自改質層K分斷基板W。 以上,雖已就本發明之代表性之實施形態進行說明,但本發明未必僅特定為上述之實施形態。例如,於上述實施形態中,使用光學系統作為裂斷器件時,藉由像差雷射光束L2之照射於所有分斷預先線形成改質層K,之後,沿改質層K照射分斷用雷射光束L3進行分斷,但亦可追隨像差雷射光束L2之照射而照射分斷用雷射光束L3。於其他本發明中,可在達成本發明之目的且不脫離申請專利範圍之範圍內進行適當修正及變更。 [產業上之可利用性] 本發明可於將於玻璃基板等之脆性材料基板之一面積層有樹脂層之附樹脂層之脆性材料基板予以分斷時加以利用。In the following, details of the present invention will be described based on the embodiment shown in the drawings. FIG. 1 is a diagram showing a scribing device (breaking device) A of the present invention. In the scribing device A, horizontal beams (transverse beams) 3 including guides 2 in the X direction are provided on the left and right pillars 1 and 1. A scribing head 5 having an aberration laser beam light emitting member 4 and a breaking laser beam light emitting member 6 are mounted on the guide 2 of the beam 3 so as to be movable in the X direction by the motor M1. Scribe head 7. The stage 8 on which the processing target substrate W is placed and held is held on a platen 10 via a rotation mechanism 9 with a vertical axis as a fulcrum, and the platen 10 is formed to be Y by a threaded screw 11 driven by a motor M2. Direction (front-back direction in FIG. 1). In addition, in this embodiment, the aberration laser beam light emitting member 4 and the breaking laser beam light emitting member 6 are respectively mounted on the scribing heads 5 and 7, but may be mounted on a common scribing head. The aberration laser beam light-emitting member 4 mounted on the scribing head 5 is shown in FIG. 2, and its pulse width (pulse duration) is 100 picoseconds or less, preferably 50 picoseconds or less (usually 1 picosecond or more). Here, there is a light source 4a that emits a pulse laser beam of 10 picoseconds, a light modulator 4b that emits a pulsed laser beam that oscillates from the light source 4a as a set of divided clusters, and The laser beam L1 emitted from the optical modulator 4b generates an aberration aberration generating lens 4c. In addition, the light source 4a may use a near-infrared laser with a wavelength of 0.7 to 2.5 μm. In this embodiment, a near-infrared laser with a wavelength of 1.064 μm is used. The light modulator 4b that emits a burst of pulsed laser beams is disclosed in, for example, Japanese Patent Publication No. 2012-515450. Here, it is assumed that a pulsed laser is emitted using a well-known light modulator. For those who emit beams of light, the details are omitted. The aberration generating lens 4c for generating aberrations in the laser beam L1 emitted from the optical modulator 4b is not particularly limited, but here the laser beam L1 is used to disperse the focus in the direction of the optical axis and to pass the laser beam L1. A plano-convex lens that condenses light to form a focal point that blurs in the axial direction and produces aberrations. The laser beam L1 passing through the plano-convex lens becomes a focal aberration laser beam L2. By making the laser beam L1 incident from the plane side of the plano-convex lens, the aberration laser beam L2 can be emitted from the convex side. The aberration laser beam L2 generated from the burst of the pulsed laser beam is shown in FIG. 3 (a), and can be formed by condensing the light with the aberration generating lens 4c to form a narrow energy accumulation at each focal point f. And a long high energy distribution area (laser filament) F. FIG. 3 (b) shows a schematic enlarged view of the high-energy distribution area F. FIG. By forming such a high-energy distribution area F, when the surface of the processing target substrate, for example, the surface of the soda glass substrate is irradiated, the modified layer K having a reduced processing strength can be penetrated from the irradiated surface of the soda glass substrate to the inside. (See Figure 5). The breaking laser beam L3 (see FIG. 6) emitted from the breaking laser beam light-emitting member 6 mounted on another scribing head 7 is used to reduce the intensity by the aberration laser beam L2. Laser beam completely broken by reforming layer K. In this embodiment, as the breaking laser beam L3, a CO 2 laser beam having a wavelength of 10.6 μm is used. In addition, instead of a CO 2 laser beam, a laser beam having a wavelength of 0.7 to 20 μm, such as a Nd, YAG laser beam having a wavelength of 1.064 μm, may be used. Next, a method for cutting the brittle material substrate W with a resin layer of the present invention using the scribing head device A will be described below. In this embodiment, the brittle material substrate W1 that becomes the mother body is formed of soda glass with a thickness of 1 mm. The brittle material substrate W with a resin layer having an acrylic resin layer W2 with a thickness of 10 to 50 μm in one area is used as a processing object. Substrate. First, as shown in FIG. 5 (a), a substrate W with a brittle material with a resin layer is placed on the stage 8, and the substrate W is irradiated with the aberration laser beam L2 emitted from the aberration laser beam light emitting member 4, One side is moved along a predetermined breaking line of the substrate W by a moving mechanism including the scribing head 5 and the guide 2. At this time, the high-energy distribution area F of the light-concentrating portion of the aberration laser beam L2 extends from the middle of the thickness of the brittle material substrate W1 to the resin layer W2. Thereby, as shown in FIG. 5 (b), the modified layer K having a weakened strength can be processed from the irradiated surface of the brittle material substrate W1 to the lower surface, and at the same time, the resin with a thinner layer can be removed by ablation or the like. The higher energy distribution region F of the layer W2 forms the breaking groove V. In the part of the breaking groove V, the resin layer 2 is completely cut off, or most of the thickness is removed. In addition, it is preferable that a space 8a is provided in advance on the stage 8 for receiving the substrate W so that the laser beam transmitted through the substrate W can be diffused downward when the aberration laser beam L2 is irradiated. Here, an example of a preferable implementation condition of a clustered aberration laser beam L2 (bulk train of pulsed laser beams) is shown below. Laser output: 10.6 W Repetition frequency: 32.5 kHz Pulse width: 10 picosecond pulse interval (irradiation interval of the laser pulse at the irradiation point on the substrate): 4 μm Burst: 2 pulses Pulse energy: 163 μJ / 1 Burst scanning speed: 130 mm / s In addition, the processing depth and processing status can be easily controlled by the laser output, repetition frequency, pulse width, burst number, pulse interval, aberration and other adjustments as described above. FIG. 4 is a pattern diagram showing a burst of pulsed laser beams. Two fine pulses P formed by dividing one pulse laser beam are formed, and are irradiated intermittently at each repetition frequency. As described above, after the aberration laser beam L2 is scanned, the modified layer K is processed on the brittle material substrate W1 of the substrate W and the breaking groove V is processed on the resin layer W2, as shown in FIG. The CO 2 laser beam L3 is irradiated with the laser beam light-emitting member 6 toward the planned breaking line of the processed modified layer K, and is moved along the planned breaking line by a moving mechanism including the scribing head 7 and the guide 2. The laser irradiation conditions of the CO 2 laser beam L3 at this time differ depending on the material or thickness of the brittle material substrate W with the resin layer to be processed, but in this embodiment, the output is set to 22 W and the scanning speed Set to 20 mm / s and the repetition frequency to 10 kHz. In this way, by irradiating the CO 2 laser beam L3 along the predetermined breaking line of the processed reforming layer K, the heat of the laser beam can be used to completely break the weakened strength of the brittle material substrate W1. Stratum K. In addition, before this, because the resin layer W2 was cut off by the aberration laser beam L2 at the breaking groove V, or most of its thickness was removed, an external force was applied by the CO 2 laser beam L3 It can be reliably cut off along the predetermined cutting line with a sharp end surface, without causing scratches, burrs, and debris on the brittle material substrate W with a resin layer. In the above embodiment, after the modified layer K is processed on the brittle material substrate W1 by the aberration laser beam L2, the laser beam L3 for breaking is used as the self-modified layer K to separate the brittle material substrate W with the resin layer. The breaking device can be replaced with a breaking rod to mechanically apply external force to break. FIG. 7 shows a cracking device using a cracking rod. As shown in FIG. 7 (a), an elastic sheet 13 containing rubber or the like is laid on the stage 12, and the elastic sheet 13 is processed and modified. The brittle material substrate W with the resin layer of the layer K is placed with the resin layer W2 side facing upward. Further, as shown in FIG. 7 (b), by pressing the breaking rod 14 toward the reforming layer K from above, the brittle material substrate W1 can be flexed to break the substrate W from the reforming layer K. As mentioned above, although the typical embodiment of this invention was described, this invention is not necessarily limited only to the said embodiment. For example, in the above embodiment, when the optical system is used as the breaking device, the reforming layer K is formed by irradiating all the cutting lines in advance with the aberration laser beam L2, and then the cutting is irradiated along the reforming layer K. The laser beam L3 is divided, but the laser beam L3 for division may be irradiated following the irradiation of the aberration laser beam L2. In other inventions, appropriate amendments and changes can be made within the scope of achieving the purpose of the invention without departing from the scope of the patent application. [Industrial Applicability] The present invention can be used when breaking a brittle material substrate with a resin layer and a resin layer on an area of a brittle material substrate such as a glass substrate.
1‧‧‧支柱1‧‧‧ pillar
2‧‧‧引導件2‧‧‧Guide
3‧‧‧樑(橫樑)3‧‧‧ beam (transverse beam)
4‧‧‧像差雷射光束發光構件4‧‧‧ aberration laser beam light emitting member
4a‧‧‧光源4a‧‧‧light source
4b‧‧‧光調變器4b‧‧‧light modulator
4c‧‧‧像差生成透鏡4c‧‧‧Aberration generating lens
5‧‧‧劃線頭5‧‧‧ crossed head
6‧‧‧分斷用雷射光束發光構件6‧‧‧ Breaking laser light emitting member
7‧‧‧劃線頭7‧‧‧ crossed head
8‧‧‧載台8‧‧‧ carrier
8a‧‧‧空間8a‧‧‧space
9‧‧‧旋轉機構9‧‧‧ rotating mechanism
10‧‧‧基板10‧‧‧ substrate
11‧‧‧螺紋螺釘11‧‧‧Threaded Screw
12‧‧‧載台12‧‧‧ carrier
13‧‧‧彈性片材13‧‧‧Elastic sheet
14‧‧‧裂斷棒14‧‧‧ split broken rod
15‧‧‧刀輪15‧‧‧knife wheel
A‧‧‧劃線裝置(分斷裝置)A‧‧‧ scribing device (breaking device)
f‧‧‧ 焦點部f‧‧‧ focus
F‧‧‧高能量分佈區域F‧‧‧High Energy Distribution Area
K‧‧‧改質層K‧‧‧Modified layer
L1‧‧‧雷射光束L1‧‧‧laser beam
L2‧‧‧像差雷射光束L2‧‧‧ aberration laser beam
L3‧‧‧分斷用雷射光束(CO2雷射光束)L3‧‧‧ breaking laser beam (CO 2 laser beam)
M1‧‧‧馬達M1‧‧‧Motor
M2‧‧‧馬達M2‧‧‧Motor
P‧‧‧微細脈衝P‧‧‧fine pulse
S‧‧‧劃線S‧‧‧ crossed
V‧‧‧分斷槽V‧‧‧ Breaking slot
W‧‧‧附樹脂層之脆性材料基板W‧‧‧ Brittle material substrate with resin layer
W1‧‧‧脆性材料基板W1‧‧‧Fragile material substrate
W2‧‧‧樹脂層W2‧‧‧Resin layer
X‧‧‧方向X‧‧‧ direction
Y‧‧‧方向Y‧‧‧ direction
圖1係本發明之分斷裝置之概略說明圖。 圖2係顯示本發明之像差雷射光束發光構件之光學系統之方塊圖。 圖3(a)、(b)係顯示像束雷射光束之聚光狀態之放大說明圖。 圖4係顯示脈衝雷射光束之叢發之分佈之概念圖。 圖5(a)、(b)係顯示本發明之分斷加工步驟之第一階段之說明圖。 圖6係顯示本發明之分斷加工步驟之第二階段之說明圖。 圖7(a)、(b)係顯示本發明之裂斷器件之另一例之說明圖。 圖8(a)、(b)係顯示先前之附樹脂層之脆性材料基板之分斷方法之一例之說明圖。FIG. 1 is a schematic explanatory diagram of a breaking device of the present invention. FIG. 2 is a block diagram showing an optical system of the aberration laser beam light emitting member of the present invention. 3 (a) and 3 (b) are enlarged explanatory diagrams showing a condensing state of an image laser beam. Figure 4 is a conceptual diagram showing the burst distribution of a pulsed laser beam. 5 (a) and 5 (b) are explanatory diagrams showing the first stage of the cutting processing step of the present invention. FIG. 6 is an explanatory diagram showing the second stage of the cutting processing step of the present invention. 7 (a) and 7 (b) are explanatory diagrams showing another example of the fracture device of the present invention. 8 (a) and 8 (b) are explanatory diagrams showing an example of a method for cutting a conventional brittle material substrate with a resin layer.
Claims (6)
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| Application Number | Priority Date | Filing Date | Title |
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| JP2017-068794 | 2017-03-30 | ||
| JP2017068794A JP6888808B2 (en) | 2017-03-30 | 2017-03-30 | Brittle material substrate with resin layer Dividing method and dividing device |
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|---|---|
| TW201902607A true TW201902607A (en) | 2019-01-16 |
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|---|---|---|---|
| TW107108804A TW201902607A (en) | 2017-03-30 | 2018-03-15 | A cutting method and cutting machine of a brittle substrate with a resin layer |
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| JP (2) | JP6888808B2 (en) |
| KR (1) | KR20180111496A (en) |
| CN (1) | CN108705208A (en) |
| TW (1) | TW201902607A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI874561B (en) * | 2020-02-06 | 2025-03-01 | 日商日本電氣硝子股份有限公司 | Method for manufacturing glass plate |
| TWI899225B (en) * | 2020-09-04 | 2025-10-01 | 日商日東電工股份有限公司 | Composite material cutting method and composite material |
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| EP3685954B1 (en) | 2019-01-22 | 2024-01-24 | Synova S.A. | Method for cutting a workpiece with a complex fluid-jet-guided laser beam |
| JP7326053B2 (en) * | 2019-07-11 | 2023-08-15 | 株式会社ディスコ | Workpiece processing method |
| KR102799965B1 (en) | 2019-07-16 | 2025-04-25 | 닛토덴코 가부시키가이샤 | Method of dividing composite materials |
| EP4001230A1 (en) * | 2019-07-16 | 2022-05-25 | Nitto Denko Corporation | Method for dividing composite material |
| CN111007686A (en) * | 2019-11-14 | 2020-04-14 | Tcl华星光电技术有限公司 | Array substrate, display panel and preparation method |
| WO2023176068A1 (en) * | 2022-03-16 | 2023-09-21 | ナルックス株式会社 | Methods for manufacturing microlens and microlens array |
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| JPS63188487A (en) * | 1987-01-29 | 1988-08-04 | Mitsubishi Electric Corp | Laser beam machining head |
| JP2002110588A (en) * | 2000-09-27 | 2002-04-12 | Nec Kansai Ltd | Chip manufacturing apparatus |
| JP5232375B2 (en) * | 2006-10-13 | 2013-07-10 | アイシン精機株式会社 | Method for separating semiconductor light emitting device |
| JP2009166169A (en) * | 2008-01-15 | 2009-07-30 | Mitsuboshi Diamond Industrial Co Ltd | Cutter device |
| WO2009128316A1 (en) * | 2008-04-15 | 2009-10-22 | 三星ダイヤモンド工業株式会社 | Method for processing fragile material substrate |
| JP2010201479A (en) * | 2009-03-05 | 2010-09-16 | Mitsuboshi Diamond Industrial Co Ltd | Apparatus and method of laser beam machining |
| JP5170195B2 (en) * | 2010-09-24 | 2013-03-27 | 三星ダイヤモンド工業株式会社 | Method for dividing brittle material substrate with resin |
| CN104722925B (en) * | 2011-05-13 | 2017-09-05 | 日本电气硝子株式会社 | The shearing device and cutting-off method of layered product, the processing method of the cutting-off method of layered product and layered product and fragility plate object |
| JP5633849B2 (en) * | 2011-08-02 | 2014-12-03 | 住友電工ハードメタル株式会社 | Laser optical components |
| JP2013136077A (en) * | 2011-12-28 | 2013-07-11 | Mitsuboshi Diamond Industrial Co Ltd | Splitting device |
| KR20150045957A (en) * | 2012-08-21 | 2015-04-29 | 아사히 가라스 가부시키가이샤 | Method for cutting composite sheet, method for cutting glass sheet, and cut piece of composite sheet |
| US11053156B2 (en) * | 2013-11-19 | 2021-07-06 | Rofin-Sinar Technologies Llc | Method of closed form release for brittle materials using burst ultrafast laser pulses |
| US10144088B2 (en) * | 2013-12-03 | 2018-12-04 | Rofin-Sinar Technologies Llc | Method and apparatus for laser processing of silicon by filamentation of burst ultrafast laser pulses |
| US20150166393A1 (en) * | 2013-12-17 | 2015-06-18 | Corning Incorporated | Laser cutting of ion-exchangeable glass substrates |
| JP6428112B2 (en) * | 2014-09-30 | 2018-11-28 | 三星ダイヤモンド工業株式会社 | Patterning substrate breaker |
| JP6734202B2 (en) * | 2015-01-13 | 2020-08-05 | ロフィン−シナール テクノロジーズ エルエルシー | Method and system for scribing and chemically etching brittle materials |
| US11773004B2 (en) * | 2015-03-24 | 2023-10-03 | Corning Incorporated | Laser cutting and processing of display glass compositions |
| JP6548944B2 (en) * | 2015-04-09 | 2019-07-24 | 株式会社ディスコ | Laser processing equipment |
| JP6549014B2 (en) * | 2015-10-13 | 2019-07-24 | 株式会社ディスコ | Optical device wafer processing method |
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2017
- 2017-03-30 JP JP2017068794A patent/JP6888808B2/en active Active
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2018
- 2018-01-31 KR KR1020180012336A patent/KR20180111496A/en not_active Withdrawn
- 2018-03-14 CN CN201810210842.8A patent/CN108705208A/en not_active Withdrawn
- 2018-03-15 TW TW107108804A patent/TW201902607A/en unknown
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2021
- 2021-05-13 JP JP2021081335A patent/JP2021114633A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI874561B (en) * | 2020-02-06 | 2025-03-01 | 日商日本電氣硝子股份有限公司 | Method for manufacturing glass plate |
| TWI899225B (en) * | 2020-09-04 | 2025-10-01 | 日商日東電工股份有限公司 | Composite material cutting method and composite material |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2018170474A (en) | 2018-11-01 |
| JP6888808B2 (en) | 2021-06-16 |
| CN108705208A (en) | 2018-10-26 |
| JP2021114633A (en) | 2021-08-05 |
| KR20180111496A (en) | 2018-10-11 |
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