TW201930200A - Method and apparatus for removing hydrogen peroxide - Google Patents
Method and apparatus for removing hydrogen peroxide Download PDFInfo
- Publication number
- TW201930200A TW201930200A TW107133285A TW107133285A TW201930200A TW 201930200 A TW201930200 A TW 201930200A TW 107133285 A TW107133285 A TW 107133285A TW 107133285 A TW107133285 A TW 107133285A TW 201930200 A TW201930200 A TW 201930200A
- Authority
- TW
- Taiwan
- Prior art keywords
- hydrogen peroxide
- water
- platinum
- container
- catalyst
- Prior art date
Links
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 title claims abstract description 218
- 238000000034 method Methods 0.000 title claims abstract description 23
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims abstract description 150
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 131
- 239000003054 catalyst Substances 0.000 claims abstract description 78
- 229910052697 platinum Inorganic materials 0.000 claims abstract description 64
- 229910021642 ultra pure water Inorganic materials 0.000 claims abstract description 64
- 239000012498 ultrapure water Substances 0.000 claims abstract description 64
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 5
- 238000004519 manufacturing process Methods 0.000 claims description 29
- 230000003647 oxidation Effects 0.000 claims description 22
- 238000007254 oxidation reaction Methods 0.000 claims description 22
- 239000007789 gas Substances 0.000 claims description 16
- 238000011084 recovery Methods 0.000 claims description 15
- 230000001590 oxidative effect Effects 0.000 claims description 11
- 239000001257 hydrogen Substances 0.000 claims description 7
- 229910052739 hydrogen Inorganic materials 0.000 claims description 7
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 6
- 229910052757 nitrogen Inorganic materials 0.000 claims description 2
- 230000001568 sexual effect Effects 0.000 claims 1
- 229910001873 dinitrogen Inorganic materials 0.000 abstract 1
- 229910052751 metal Inorganic materials 0.000 description 27
- 239000002184 metal Substances 0.000 description 27
- 238000000354 decomposition reaction Methods 0.000 description 23
- 239000011347 resin Substances 0.000 description 22
- 229920005989 resin Polymers 0.000 description 22
- 238000012360 testing method Methods 0.000 description 18
- 239000012528 membrane Substances 0.000 description 17
- 239000002245 particle Substances 0.000 description 16
- 238000005342 ion exchange Methods 0.000 description 14
- 238000000108 ultra-filtration Methods 0.000 description 11
- 239000003957 anion exchange resin Substances 0.000 description 10
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 9
- 239000003456 ion exchange resin Substances 0.000 description 9
- 229920003303 ion-exchange polymer Polymers 0.000 description 9
- 238000007872 degassing Methods 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- 230000015556 catabolic process Effects 0.000 description 6
- 238000006731 degradation reaction Methods 0.000 description 6
- 230000007774 longterm Effects 0.000 description 5
- 230000001172 regenerating effect Effects 0.000 description 5
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- 238000002203 pretreatment Methods 0.000 description 4
- 238000001223 reverse osmosis Methods 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- 238000000926 separation method Methods 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 150000007524 organic acids Chemical class 0.000 description 3
- 239000005416 organic matter Substances 0.000 description 3
- 238000006722 reduction reaction Methods 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 2
- 230000003197 catalytic effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000005374 membrane filtration Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 235000005985 organic acids Nutrition 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- KJFMBFZCATUALV-UHFFFAOYSA-N phenolphthalein Chemical compound C1=CC(O)=CC=C1C1(C=2C=CC(O)=CC=2)C2=CC=CC=C2C(=O)O1 KJFMBFZCATUALV-UHFFFAOYSA-N 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 238000010301 surface-oxidation reaction Methods 0.000 description 2
- 239000005909 Kieselgur Substances 0.000 description 1
- 229910001252 Pd alloy Inorganic materials 0.000 description 1
- 229910001260 Pt alloy Inorganic materials 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 229910021536 Zeolite Inorganic materials 0.000 description 1
- 238000002835 absorbance Methods 0.000 description 1
- 238000005273 aeration Methods 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000009841 combustion method Methods 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- 239000008235 industrial water Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 230000002427 irreversible effect Effects 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000002082 metal nanoparticle Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- 238000006864 oxidative decomposition reaction Methods 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- -1 platinum group metals Chemical class 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000007781 pre-processing Methods 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000012264 purified product Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000013022 venting Methods 0.000 description 1
- 235000020681 well water Nutrition 0.000 description 1
- 239000002349 well water Substances 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J31/00—Catalysts comprising hydrides, coordination complexes or organic compounds
- B01J31/26—Catalysts comprising hydrides, coordination complexes or organic compounds containing in addition, inorganic metal compounds not provided for in groups B01J31/02 - B01J31/24
- B01J31/28—Catalysts comprising hydrides, coordination complexes or organic compounds containing in addition, inorganic metal compounds not provided for in groups B01J31/02 - B01J31/24 of the platinum group metals, iron group metals or copper
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J31/00—Catalysts comprising hydrides, coordination complexes or organic compounds
- B01J31/40—Regeneration or reactivation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J38/00—Regeneration or reactivation of catalysts, in general
- B01J38/48—Liquid treating or treating in liquid phase, e.g. dissolved or suspended
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/20—Treatment of water, waste water, or sewage by degassing, i.e. liberation of dissolved gases
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/58—Treatment of water, waste water, or sewage by removing specified dissolved compounds
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/72—Treatment of water, waste water, or sewage by oxidation
- C02F1/725—Treatment of water, waste water, or sewage by oxidation by catalytic oxidation
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/02—Non-contaminated water, e.g. for industrial water supply
- C02F2103/04—Non-contaminated water, e.g. for industrial water supply for obtaining ultra-pure water
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Environmental & Geological Engineering (AREA)
- Water Supply & Treatment (AREA)
- Life Sciences & Earth Sciences (AREA)
- Hydrology & Water Resources (AREA)
- Inorganic Chemistry (AREA)
- Removal Of Specific Substances (AREA)
- Catalysts (AREA)
- Physical Water Treatments (AREA)
- Solid-Sorbent Or Filter-Aiding Compositions (AREA)
Abstract
Description
本發明有關於純水製造步驟中用以去除水中之過氧化氫的方法及裝置。本發明中,純水包含超純水。The invention relates to a method and a device for removing hydrogen peroxide in water in the manufacturing step of pure water. In the present invention, pure water includes ultrapure water.
半導體・電子材料洗淨用之超純水係藉由以自前處理裝置、一次純水製造裝置、二次純水製造裝置(副系統)構成之超純水製造設備處理原水(工業用水,自來水、井水等)而製造。Ultrapure water for cleaning semiconductors and electronic materials is a process for treating raw water (industrial water, tap water, etc.) by ultrapure water manufacturing equipment consisting of a pre-treatment device, a primary pure water manufacturing device, and a secondary pure water manufacturing device (subsystem). Well water, etc.).
由凝集、加壓上浮(沉澱)、過濾(膜過濾)裝置等所成之前處理裝置係進行原水中之懸浮物質或膠體物質之去除。且,該過程中亦可能去除高分子系有機物、疏水性有機物等。The pre-treatment device formed by agglomeration, pressurized floatation (precipitation), filtration (membrane filtration) device, etc. is used to remove suspended substances or colloidal substances in raw water. Moreover, in this process, it is possible to remove polymer-based organic substances, hydrophobic organic substances, and the like.
具備逆滲透膜分離裝置、脫氣裝置及離子交換裝置(混床式或4床5塔式等)之一次純水製造裝置,係進行原水中之離子或有機成分之去除。於逆滲透膜分離裝置去除鹽類同時去除離子性、膠體性之TOC。於離子交換裝置去除鹽類並且藉由離子交換樹脂進行經吸附或離子交換之TOC成分之去除。於脫氣裝置進行無機系碳(IC)、溶存氧之去除。It is equipped with a reverse osmosis membrane separation device, degassing device and ion exchange device (mixed bed type or 4 bed 5 tower type, etc.) primary pure water production device, which is used to remove ions or organic components in raw water. In the reverse osmosis membrane separation device to remove salts and ionic and colloidal TOC. In the ion exchange device, the salts are removed, and the TOC component by adsorption or ion exchange is removed by the ion exchange resin. In the degassing device, the inorganic carbon (IC) and dissolved oxygen are removed.
來自一次純水製造裝置之一次純水於副系統中,經紫外線(UV)照射裝置、離子交換裝置及超過濾(UF)膜分離裝置予以處理,製造超純水。UV氧化裝置係藉由自UV燈照射之185nm之UV將TOC分解為有機酸,進而分解為CO2 。藉由分解生成之有機物及CO2 係於後段之離子交換裝置(通常為混床式離子交換裝置)去除。於UF膜分離裝置去除微粒子,亦去除自離子交換樹脂流出之離子交換樹脂之破片等。將如此獲得之超純水供給至使用點。The primary pure water from the primary pure water manufacturing device is processed in the auxiliary system by ultraviolet (UV) irradiation device, ion exchange device and ultrafiltration (UF) membrane separation device to produce ultrapure water. The UV oxidation device decomposes TOC into organic acids and then into CO 2 by 185 nm UV irradiated from a UV lamp. The organic matter and CO 2 generated by the decomposition are removed in an ion exchange device (usually a mixed bed type ion exchange device) in the latter stage. In the UF membrane separation device, remove the fine particles, and also remove the fragments of the ion exchange resin flowing out from the ion exchange resin. The ultrapure water thus obtained is supplied to the point of use.
藉由利用紫外線氧化裝置之紫外線照射之氧化處理,分解水中之有機物(TOC成分)並產生有機酸及碳酸。該紫外線氧化裝置中之TOC成分的氧化分解機制係將水氧化分解生成OH自由基,藉由該OH自由基使TOC成分氧化分解者,紫外線照射量係設為可使水中TOC充分氧化分解的過量照射。The oxidation treatment by ultraviolet irradiation using an ultraviolet oxidation device decomposes organic matter (TOC component) in water and produces organic acids and carbonic acid. The oxidative decomposition mechanism of the TOC component in the ultraviolet oxidizing device is to oxidize and decompose water to generate OH radicals, and the OH radical oxidizes and decomposes the TOC component. Irradiation.
如此紫外線照射量較多時,由於因水的分解生成之OH自由基成為過量,故因剩餘OH自由基締合而生成過氧化氫。生成之過氧化氫雖若與後述之混床式離子交換裝置的陰離子交換樹脂接觸則分解,但此時使離子交換樹脂劣化。隨著此分解,溶存氧亦增加。且,因離子交換樹脂之分解,生成新的源自離子交換樹脂之TOC成分,使所得超純水的水質降低。又,於混床式離子交換裝置通水後仍殘留之過氧化氫使混床式離子交換裝置之後段脫氣裝置或UF膜劣化。When there is a large amount of ultraviolet irradiation in this way, the OH radicals generated by the decomposition of water become excessive, so that the remaining OH radicals associate to generate hydrogen peroxide. The generated hydrogen peroxide decomposes when it comes into contact with an anion exchange resin of a mixed bed ion exchange device described later, but at this time, the ion exchange resin is deteriorated. With this decomposition, dissolved oxygen also increases. Moreover, due to the decomposition of the ion exchange resin, a new TOC component derived from the ion exchange resin is generated, which reduces the water quality of the obtained ultrapure water. In addition, the hydrogen peroxide remaining after the mixed bed type ion exchange device passes water deteriorates the degassing device or the UF membrane in the subsequent stage of the mixed bed type ion exchange device.
專利文獻1中,作為超純水中之過氧化氫去除方法,記載有將自超純水製造裝置之紫外線氧化處理裝置排出之含過氧化氫的被處理水與將鉑族金屬奈米膠體粒子擔持於陰離子交換樹脂載體所得之過氧化氫分解觸媒接觸,將被處理水中之過氧化氫分解至1ppb以下之方法。Patent Document 1 describes, as a method for removing hydrogen peroxide in ultrapure water, the hydrogen peroxide-containing treated water discharged from the ultraviolet oxidation treatment device of the ultrapure water production device and the platinum group metal nanocolloid particles Hydrogen peroxide decomposition catalyst supported on anion exchange resin carrier is contacted to decompose hydrogen peroxide in the treated water to below 1 ppb.
專利文獻2中記載有為了抑制鉑觸媒之劣化,於被處理水以紫外線氧化裝置進行紫外線氧化處理後,使用鉑系觸媒進行過氧化氫去除處理之純水的製造方法中,對該紫外線氧化裝置供水的TOC設為5ppb以下。Patent Document 2 describes that in order to suppress the deterioration of the platinum catalyst, after the water to be treated is subjected to ultraviolet oxidation treatment with an ultraviolet oxidation device, the method for producing pure water using a platinum-based catalyst to perform hydrogen peroxide removal treatment, the ultraviolet The TOC of the water supply of the oxidation device is set to 5 ppb or less.
[專利文獻1] 日本特開2007-185587號公報 [專利文獻2] 日本特開2015-93226號公報[Patent Literature 1] Japanese Patent Application Publication No. 2007-185587 [Patent Literature 2] Japanese Patent Application Publication No. 2015-93226
如上述,一直以來以Pt為代表之鉑族觸媒係被活用於氧化性物質之分解等。超純水製造系統中,以分解水中微量含有之有機物為目的之紫外線氧化步驟中作為副生成物而產生之過氧化氫的去除近幾年來已成為課題,而進行利用擔持有Pt奈米膠體之離子交換樹脂或Pt擔持樹脂等之過氧化氫分解處理。As mentioned above, the platinum group catalyst system represented by Pt has been used for decomposition of oxidizing substances. In the ultrapure water production system, the removal of hydrogen peroxide as a by-product in the ultraviolet oxidation step for the purpose of decomposing organic substances contained in water has become a problem in recent years. Hydrogen peroxide decomposition treatment of ion exchange resin or Pt support resin.
藉由該過氧化氫分解處理,可使被處理水中之過氧化氫濃度減低至低於目標濃度(例如1ppb),但隨著長期間使用而使觸媒性能降低。Through the hydrogen peroxide decomposition treatment, the concentration of hydrogen peroxide in the treated water can be reduced to below the target concentration (for example, 1 ppb), but the catalyst performance decreases with long-term use.
本發明目的在於提供可抑制鉑系觸媒之性能降低或者恢復其性能,可長期保持充分具有觸媒活性之狀態的過氧化氫去除方法及裝置。The purpose of the present invention is to provide a method and a device for removing hydrogen peroxide that can suppress the reduction of the performance of the platinum-based catalyst or restore its performance, and can maintain the state of having sufficient catalyst activity for a long time.
一般,藉由使流入鉑系觸媒裝置之被處理水中之有機物濃度降低,而抑制了鉑系觸媒的性能降低。本發明人為進一步抑制性能降低而重複積極研究。其結果,發現觸媒表面之氧化亦為鉑系觸媒之性能降低之一原因,藉由抑制該觸媒表面之氧化,可抑制鉑系觸媒之性能降低。Generally, by reducing the concentration of organic matter in the water to be treated flowing into the platinum-based catalyst device, the performance degradation of the platinum-based catalyst is suppressed. The present inventors repeated active research in order to further suppress performance degradation. As a result, it was found that the oxidation of the catalyst surface is also one of the reasons for the performance degradation of the platinum catalyst. By suppressing the oxidation of the catalyst surface, the performance degradation of the platinum catalyst can be suppressed.
本發明係基於該見解而完成者。The present invention was completed based on this knowledge.
本發明之過氧化氫去除方法係對具有經並列配置之鉑系觸媒填充容器之過氧化氫去除裝置通入含過氧化氫的水並去除過氧化氫之過氧化氫去除方法,其特徵係進行停止含過氧化氫的水對一部分之該鉑系觸媒填充容器之通水,將填充於該容器之鉑系觸媒於超純水中保存特定時間之過氧化氫去除性能恢復操作。The hydrogen peroxide removal method of the present invention is a hydrogen peroxide removal method in which a hydrogen peroxide removal device having a platinum-based catalyst filled container arranged in parallel is passed through water containing hydrogen peroxide and hydrogen peroxide is removed. Hydrogen peroxide removal performance recovery operation is performed by stopping the passage of water containing hydrogen peroxide to a part of the platinum catalyst-filled container, and storing the platinum catalyst filled in the container in ultrapure water for a specific time.
本發明一態樣中,前述過氧化氫去除性能恢復操作係將已停止前述通水之容器內的水置換為超純水,將前述鉑系觸媒於該容器內之超純水中保存特定期間之操作。In one aspect of the present invention, the hydrogen peroxide removal performance recovery operation is to replace the water in the container where the water passage has been stopped with ultrapure water, and store the platinum-based catalyst in the ultrapure water in the container to store specific During the operation.
本發明一態樣中,前述過氧化氫去除性能恢復操作係由已停止前述通水之容器取出該容器內之鉑系觸媒,將取出之鉑系觸媒於超純水中保存特定期間後,再填充於該容器之操作。In one aspect of the present invention, the hydrogen peroxide removal performance recovery operation is to take out the platinum catalyst in the container from which the water flow has been stopped, and store the taken platinum catalyst in ultrapure water for a specific period , Then refill the container.
本發明一態樣中,對前述超純水供給氮氣等之非氧化性氣體。In one aspect of the present invention, non-oxidizing gas such as nitrogen is supplied to the ultrapure water.
本發明一態樣中,前述超純水係經溶解氫之超純水。In one aspect of the invention, the aforementioned ultrapure water is ultrapure water in which hydrogen has been dissolved.
本發明一態樣中,前述過氧化氫去除裝置係設置於超純水製造裝置,於前述特定時間內,增加對前述一部分以外之鉑系觸媒填充容器之通水量。In one aspect of the present invention, the hydrogen peroxide removal device is provided in an ultrapure water production device, and the water flow rate to the platinum-based catalyst-filled container other than the aforementioned part is increased within the specified time.
本發明之過氧化氫去除裝置係具備:並列設置之鉑系觸媒填充容器,對各容器通入含過氧化氫的水之含過氧化氫水之通水手段,對各容器供給非氧化性氣體或溶解氫的水之供給手段,及切換對各容器之含過氧化氫水之通水與非氧化性氣體或溶解氫的水之供給之切換手段。 [發明效果]The hydrogen peroxide removal device of the present invention is provided with platinum-based catalyst-filled containers arranged in parallel, a hydrogen peroxide-containing water passage means for passing hydrogen peroxide-containing water into each container, and supplying non-oxidizing properties to each container The means for supplying gas or hydrogen-dissolved water, and the means for switching the supply of hydrogen peroxide-containing water to non-oxidizing gas or hydrogen-dissolved water in each container. [Effect of the invention]
觸媒具有其本身不變化而可降低某些化學反應之障壁並促進進行之功能。因長期暴露於氧化條件下,而使觸媒表面氧化,因此引起觸媒性能降低。The catalyst has the function of not changing itself, which can lower the barrier of certain chemical reactions and promote the progress. The catalyst surface is oxidized due to long-term exposure to oxidizing conditions, thus causing a decrease in catalyst performance.
鉑系觸媒若進行強的氧化則成為不可逆之氧化物,但於可逆的表面氧化階段,藉由自持續氧化狀態釋放而可復原並恢復性能。本發明人等發現藉由停止通水並將鉑系觸媒浸漬於超純水中予以保存,可使鉑系觸媒自持續狀態釋放而能恢復觸媒性能。於該通水停止期間中藉由於超純水中通入N2 氣體,或通入溶解氫之超純水,可於更短時間內恢復過氧化氫分解性能。Platinum-based catalysts become irreversible oxides if they undergo strong oxidation, but during the reversible surface oxidation stage, they can be recovered and restored by releasing from the continuous oxidation state. The inventors found that by stopping the water flow and immersing the platinum-based catalyst in ultrapure water for storage, the platinum-based catalyst can be released from the continuous state and the catalyst performance can be restored. During the stop of the water passing, the hydrogen peroxide decomposition performance can be restored in a shorter time by introducing N 2 gas in ultra-pure water or ultra-pure water in which hydrogen is dissolved.
觸媒劣化之原因,除了鉑族觸媒本身之表面氧化所致之變質以外,亦有受被處理水中所含之有機物等雜質所致之污染。且,亦有基材即載體(例如離子交換樹脂)本身劣化之情況。因此,被處理水中之雜質較少,且過氧化氫濃度比較高時,由於氧化成為性能降低之主要原因,故本發明變得有效。The reason for the deterioration of the catalyst is not only the deterioration caused by the surface oxidation of the platinum group catalyst itself, but also the pollution caused by impurities such as organic substances contained in the treated water. Moreover, the substrate, that is, the carrier (for example, ion exchange resin) itself may deteriorate. Therefore, when there are few impurities in the water to be treated, and the hydrogen peroxide concentration is relatively high, the oxidation becomes the main cause of performance degradation, so the present invention becomes effective.
依據本發明,不將鉑系觸媒更換為新品而可延長鉑系觸媒之有效期間。According to the present invention, the effective period of the platinum-based catalyst can be extended without replacing the platinum-based catalyst with a new product.
並列配置複數個鉑系觸媒填充容器,對一部分容器實施性能恢復處理之期間,藉由依序重複將對其他容器之通水流量設定為較高之通水切換操作,可邊維持期望之處理水質與水量,邊於長期間內進行過氧化氫分解處理。Multiple platinum-based catalyst-filled containers are arranged in parallel, and during the performance recovery process of some containers, by sequentially repeating the water flow switching operation of setting the water flow rate to other containers to a higher level, the desired treatment water quality can be maintained With the amount of water, hydrogen peroxide decomposition treatment is carried out for a long period of time.
以下,針對本發明進一步詳細說明。Hereinafter, the present invention will be described in further detail.
本發明之過氧化氫去除方法及裝置可較好於超純水製造步驟中使用。於超純水製造步驟中,如前述,來自一次純水製造裝置之一次純水藉由副系統進行處理而製造超純水。於副系統,一次純水以紫外線氧化裝置處理後,以具有鉑系觸媒之過氧化氫去除裝置進行過氧化氫去除處理,其次通入非再生離子交換裝置、膜式脫氣裝置、UF膜裝置。The method and device for removing hydrogen peroxide of the present invention can be preferably used in the ultrapure water manufacturing step. In the ultrapure water production step, as described above, the primary pure water from the primary pure water production device is processed by the auxiliary system to produce ultrapure water. In the sub-system, once the pure water is treated with an ultraviolet oxidation device, the hydrogen peroxide removal treatment is carried out with a hydrogen peroxide removal device with a platinum catalyst, followed by a non-regenerative ion exchange device, membrane degassing device, UF membrane Device.
藉由於紫外線氧化裝置的紫外線氧化處理使TOC成分氧化分解,生成有機酸及碳酸,並且產生過氧化氫。本發明中,來自紫外線氧化裝置之流出水通入過氧化氫去除裝置而去除過氧化氫。作為該過氧化氫去除裝置,係採用於容器中填充鉑系觸媒者。作為鉑系觸媒較好為鉑系金屬之膠體粒子,特佳為於載體擔持奈米膠體粒子者。The TOC component is oxidized and decomposed by the ultraviolet oxidation treatment of the ultraviolet oxidation device to generate organic acid and carbonic acid, and hydrogen peroxide is generated. In the present invention, the outflow water from the ultraviolet oxidation device passes through the hydrogen peroxide removal device to remove hydrogen peroxide. As the hydrogen peroxide removal device, a container filled with a platinum catalyst is used. The platinum-based catalyst is preferably a colloidal particle of a platinum-based metal, and particularly preferably supports nanocolloid particles on a carrier.
作為鉑系金屬可舉例為釕、銠、鈀、鋨、銥及鉑。該等鉑族金屬可單獨使用1種,亦可組合2種以上使用,亦可作為2種以上的合金使用,或者亦可將天然產出之混合物之純化物不分離為單體而使用。該等中,鉑、鈀、鉑/鈀合金之單獨或該等之2種以上之混合物由於觸媒活性較強,故可特佳地使用。Examples of platinum-based metals include ruthenium, rhodium, palladium, osmium, iridium, and platinum. These platinum group metals may be used alone or in combination of two or more, or as two or more alloys, or the purified product of a naturally produced mixture may be used without separating into monomers. Among these, platinum, palladium, platinum / palladium alloy alone or a mixture of two or more of these can be used particularly well because of their strong catalytic activity.
製造鉑系金屬之奈米膠體粒子之方法並未特別限制,可舉例為例如金屬鹽還原反應法、燃燒法等。該等中,金屬鹽還原反應法由於容易製造,可獲得安定品質之金屬奈米膠體粒子故而可較好地使用。The method of producing the nanocolloid particles of platinum-based metal is not particularly limited, and examples thereof include a metal salt reduction reaction method and a combustion method. Among these, the metal salt reduction reaction method is easy to manufacture and can be used well because it can obtain metal nanocolloid particles of stable quality.
鉑系金屬之奈米膠體粒子的平均粒徑較好為1~50nm,更好為1.2~20nm,又更好為1.4~5nm。該粒徑係自電子顯微鏡攝像所得之值。The average particle diameter of the platinum-based metal nanocolloid particles is preferably 1 to 50 nm, more preferably 1.2 to 20 nm, and still more preferably 1.4 to 5 nm. The particle size is a value obtained from imaging with an electron microscope.
作為擔持鉑系金屬奈米膠體粒子的載體可舉例為例如氧化鎂、氧化鈦、氧化鋁、氧化矽-氧化鋁、氧化鋯、活性碳、沸石、矽藻土、離子交換樹脂等。該等中,可特佳地使用陰離子交換樹脂。鉑系金屬奈米膠體粒子具有電雙層,由於帶負電,故安定地擔持於陰離子交換樹脂成為不易剝離者。擔持於陰離子交換樹脂之鉑系金屬奈米膠體粒子對於過氧化氫之分解去除顯示強的觸媒活性。陰離子交換樹脂之交換基較好為OH形。OH形陰離子交換樹脂於樹脂表面成為鹼性,促進過氧化氫之分解。Examples of the carrier that supports the platinum-based metal nanocolloid particles include magnesium oxide, titanium oxide, aluminum oxide, silica-alumina, zirconium oxide, activated carbon, zeolite, diatomaceous earth, and ion exchange resin. Among these, anion exchange resins can be particularly preferably used. The platinum-based metal nanocolloid particles have an electric double layer, and since they are negatively charged, they are stably supported by the anion exchange resin and become difficult to peel. The platinum-based metal nanocolloid particles supported on the anion exchange resin show strong catalytic activity for the decomposition and removal of hydrogen peroxide. The exchange group of the anion exchange resin is preferably OH form. The OH-type anion exchange resin becomes alkaline on the surface of the resin, which promotes the decomposition of hydrogen peroxide.
鉑系金屬奈米膠體粒子對陰離子交換樹脂之擔持量較好為0.01~0.2重量%,更好為0.04~0.1重量%。The supporting amount of the platinum-based metal nanocolloid particles to the anion exchange resin is preferably 0.01 to 0.2% by weight, more preferably 0.04 to 0.1% by weight.
藉由使含過氧化氫之水與於載體擔持有鉑系金屬奈米膠體粒子之過氧化氫分解觸媒接觸,水中之過氧化氫藉由2H2 O2 à2H2 O+O2 之反應而分解。By bringing the water containing hydrogen peroxide into contact with the hydrogen peroxide decomposition catalyst holding platinum-based metal nanocolloid particles on the carrier, the hydrogen peroxide in the water reacts by 2H 2 O 2 à2H 2 O + O 2 And decomposition.
含過氧化氫之水對鉑系觸媒填充容器之通水速度較好為空間速度SV100~2,000h-1 ,更好為300~1,500h-1 。鉑系觸媒由於過氧化氫之分解速度非常快速,故即使SV為100h-1 以上,過氧化氫亦可充分分解。但,SV超過2,000h-1 時,有通水之壓力損失過大並且過氧化氫之分解去除變不充分之虞。The flow rate of water containing hydrogen peroxide to the platinum-based catalyst filled container is preferably space velocity SV100 ~ 2,000h -1 , more preferably 300 ~ 1,500h -1 . The platinum catalyst has a very rapid decomposition rate of hydrogen peroxide, so even if the SV is 100h -1 or more, hydrogen peroxide can be fully decomposed. However, when the SV exceeds 2,000h -1 , there is a possibility that the pressure loss of passing water is too large and the decomposition and removal of hydrogen peroxide may become insufficient.
參考圖1及圖2針對本發明之過氧化物去除方法及裝置之具體例加以說明。A specific example of the method and device for removing peroxide according to the present invention will be described with reference to FIGS. 1 and 2.
圖1中,並列配置複數根(圖示為5根)填充有鉑系觸媒之管柱21~25。上述紫外線照射裝置流出水等之含過氧化氫的水自配管1經由閥11~15通入管柱21~25。自管柱21~25之流出水經由閥31~35及集合配管2取出。In FIG. 1, a plurality of columns (five shown in the figure) filled with platinum-based catalysts 21 to 25 are arranged in parallel. Hydrogen peroxide-containing water, such as water flowing out of the ultraviolet irradiation device, passes from the pipe 1 to the columns 21 to 25 via the valves 11 to 15. The effluent water from the columns 21 to 25 is taken out through the valves 31 to 35 and the collection piping 2.
以5根管柱21~25並列通水之要領進行處理。於見到處理水劣化之徵兆的時點,如圖1(b)藉由關閉閥11、31停止對1根管柱(圖1(b)為管柱21)之通水,暫時將其餘4根管柱22~25之通水量分別增加25%而成為確保處理水量之並列運轉。Treat with 5 pipes 21 ~ 25 juxtaposed to pass water. When seeing the signs of water degradation, as shown in Figure 1 (b), by closing the valves 11, 31, stop the flow of water to one pipe string (Figure 1 (b) is the pipe string 21). The flow rates of the columns 22 to 25 are increased by 25% respectively to ensure the parallel operation of the treated water.
針對已停止通水之管柱21,如下進行過氧化氫去除性能恢復操作。 (1)將管柱21內之水置換為超純水,將管柱21內之鉑系觸媒於管柱21內於超純水中浸漬保存特定期間。 (2)暫時抽出管柱21內之鉑系觸媒,於另一容器內浸漬於超純水中保存特定期間後,再次填充於管柱21中。 (3)於上述(1)或(2)之操作中,對鉑系觸媒之浸漬處理所用之超純水供給N2 氣體等之非氧化性氣體。 (4)於上述(1)或(2)之操作中,作為鉑系觸媒之浸漬處理所用之超純水係使用溶解氫的超純水。 上述(1)~(4)之操作亦可組合2個以上進行。For the column 21 whose water flow has been stopped, the hydrogen peroxide removal performance recovery operation is performed as follows. (1) The water in the column 21 is replaced with ultrapure water, and the platinum-based catalyst in the column 21 is immersed in the ultrapure water in the column 21 for a specific period of time. (2) The platinum catalyst in the column 21 is temporarily withdrawn, immersed in ultrapure water in another container and stored for a specific period, and then filled in the column 21 again. (3) In the operation of (1) or (2) above, non-oxidizing gas such as N 2 gas is supplied to the ultrapure water used for the immersion treatment of the platinum catalyst. (4) In the operation of (1) or (2) above, the ultrapure water used for the impregnation treatment of the platinum-based catalyst uses ultrapure water in which hydrogen is dissolved. The above operations (1) to (4) can also be performed in combination of two or more.
鉑系觸媒之浸漬處理所用之超純水不含過氧化氫,較好過氧化氫濃度為未滿2μg/L,特佳為未滿1μg/L者。The ultrapure water used for the immersion treatment of the platinum catalyst does not contain hydrogen peroxide, preferably the hydrogen peroxide concentration is less than 2 μg / L, particularly preferably less than 1 μg / L.
本發明中,於超純水中保存鉑系觸媒之特定期間較好為1天以上,特佳為2天~2週左右。In the present invention, the specific period for storing the platinum-based catalyst in ultrapure water is preferably 1 day or more, and particularly preferably 2 days to 2 weeks or so.
又,本發明中,除了上述(1)~(4)之操作以外,亦可進行以N2 氣體等之非氧化性氣體置換管柱21內之氛圍的操作或者進行通入溶解氫的水之操作。In addition, in the present invention, in addition to the above operations (1) to (4), it is also possible to perform an operation of replacing the atmosphere in the column 21 with a non-oxidizing gas such as N 2 gas or to pass water in which hydrogen is dissolved operating.
進行上述過氧化氫去除性能恢復操作後,較好對該管柱21試驗性通水,確認處理水質良好後,打開閥11、31再次開始對管柱21之通水。隨後,針對其他管柱22~25亦依序進行同樣的性能恢復操作,使性能恢復至良好狀態。After performing the above-mentioned hydrogen peroxide removal performance recovery operation, it is preferable to test-pass water to the pipe string 21, and after confirming that the treated water quality is good, open the valves 11, 31 to start water flow to the pipe string 21 again. Subsequently, the same performance recovery operation was also performed for other columns 22 to 25 in order to restore the performance to a good state.
針對5根管柱21~25全部完成恢復處理後,回到利用原本標準流量之5根並列通水。After all the 5 pipes 21 to 25 have been completely restored, they will return to use the 5 parallel flow of the original standard flow.
圖2係顯示代替閥11~15而設置三向閥41~45,代替閥31~35而設置三向閥51~55,藉由三向閥31~35、51~55之切換操作,可對各管柱21~25供給超純水、N2 氣體或溶解氫的水之過氧化氫去除裝置。Fig. 2 shows that instead of valves 11 to 15, three-way valves 41 to 45 are provided, and instead of valves 31 to 35, three-way valves 51 to 55 are provided. By switching the three-way valves 31 to 35 and 51 to 55, Each column 21 to 25 is supplied with a hydrogen peroxide removal device for ultrapure water, N 2 gas, or hydrogen dissolved water.
於三向閥41~45之第3埠連接自配管60分支之配管61~65。三向閥51~55之第3埠係經由分支配管71~75連接於排出用配管70。自配管60對管柱21~25之任一者供給超純水、N2 氣體或溶解氫的水,其流出氣體或流出水自配管70排出。The piping 61 to 65 branched from the piping 60 are connected to the third port of the three-way valves 41 to 45. The third ports of the three-way valves 51 to 55 are connected to the discharge pipe 70 via branch pipes 71 to 75. The self-piping 60 supplies ultrapure water, N 2 gas, or hydrogen-dissolved water to any one of the columns 21 to 25, and the outflow gas or outflow water is discharged from the piping 70.
又,如圖1、2所示具備並列之5根管柱21~25之過氧化氫去除裝置之各管柱21~25均等地以標準SV為400/h通水時,若1根進行恢復處理成為4根並列通水(例如圖1(b))時,各管柱之SV增大為500/h。此就處理水質維持方面而言並不期望。然而,相對於鉑系樹脂之過氧化氫分解壽命(未施以恢復處理之情況)為數年,恢復處理每1根時間長為1週左右,故對各管柱施以增加25%的負擔時間長為4週左右。該期間,由於對依次再開始對恢復性能之管柱的通水,故作為過氧化氫去除裝置全體維持處理水量(SV500/h)並不難。In addition, as shown in FIGS. 1 and 2, when each of the columns 21 to 25 of the hydrogen peroxide removal device with five columns 21 to 25 in parallel is fed with water at a standard SV of 400 / h, if one is restored When the treatment becomes four parallel water passes (for example, FIG. 1 (b)), the SV of each column increases to 500 / h. This is undesirable in terms of treatment water quality maintenance. However, the hydrogen peroxide decomposition life of platinum-based resins (when no recovery treatment is applied) is several years, and the recovery treatment time is about 1 week per piece. Therefore, a 25% increase in the burden time is applied to each column It is about 4 weeks long. During this period, it is not difficult to maintain the treated water volume (SV500 / h) as the entire hydrogen peroxide removal device because the water flow to the recovery performance string is resumed in sequence.
圖1、2係並列設置5根管柱,但亦可並列設置6根管柱,依序停止其中1根(性能恢復操作),平常對5根管柱通水進行運轉。In Figures 1, 2 series, 5 pipes are arranged in parallel, but 6 pipes can be arranged in parallel, and one of them is stopped in sequence (performance recovery operation). Usually, 5 pipes are run with water.
該情況,縱使過了特定時間(特定之過氧化氫負荷),仍可藉由使1根停止,並對未同時使用之1根開始通水之要領,依序重複進行對各容器均通水全體之5/6的時間,停止1/6之時間的間歇運轉之所謂旋轉木馬式之運用,而可具有餘裕地運轉。In this case, even after a certain period of time (a specific hydrogen peroxide load), you can still stop one of them and start watering the one that is not used at the same time. For 5/6 of the whole time, the so-called carousel-type operation of intermittent operation for 1/6 of the time is stopped, and it can be operated with a margin.
若依據本發明人之實驗結果,確認如下。 (1)被處理水對鉑系觸媒填充容器之通水停止特定時間後再開始通水後,見到過氧化氫分解性能之恢復。停止時間越長,其恢復程度越高。 (2)被處理水對鉑系觸媒填充容器之通水停止中加上藉由N2 氣體通氣而自該容器內排除O2 之操作,結果見到以比(1)進而更短的時間恢復過氧化氫分解性能。 (3)被處理水對鉑系觸媒填充容器之通水停止中,進行將該容器內的水置換為超純水,使容器內之鉑系觸媒於超純水中浸漬保存之操作,結果見到以比(1)、(2)進而更短的時間恢復過氧化氫分解性能。 (4)被處理水對鉑系觸媒填充容器之通水停止中,自容器暫時拔出鉑系觸媒,於特定時間於另一容器內浸漬保存於超純水中之後進行再填充並再開始通水,結果見到以比上述(1)~(3)進而更短的時間恢復過氧化氫分解性能。 (5)被處理水對鉑系觸媒填充容器之通水停止中,通入溶解氫的超純水,結果見到以比上述(1)~(4)進而更短的時間恢復過氧化氫分解性能。Based on the experimental results of the present inventors, it is confirmed as follows. (1) After the water flow through the treated container filled with the platinum-based catalyst is stopped for a certain period of time and the water flow starts again, the hydrogen peroxide decomposition performance is restored. The longer the stop time, the higher the degree of recovery. (2) Adding the operation of removing O 2 from the container by venting the treated water to the platinum-based catalyst-filled container by aeration with N 2 gas, the result was seen to be shorter than (1) Restore hydrogen peroxide decomposition performance. (3) While the flow of treated water to the platinum catalyst filled container is stopped, the water in the container is replaced with ultrapure water, and the platinum catalyst in the container is immersed and stored in the ultrapure water, As a result, the hydrogen peroxide decomposition performance was restored in a shorter time than (1) and (2). (4) While the flow of treated water to the platinum-based catalyst-filled container is stopped, the platinum-based catalyst is temporarily pulled out of the container, immersed in another container and stored in ultrapure water at a specific time, then refilled and refilled Starting to pass water, as a result, the hydrogen peroxide decomposition performance was restored in a shorter time than the above (1) to (3). (5) While the flow of treated water to the platinum-based catalyst-filled container was stopped, ultra-pure water with dissolved hydrogen was introduced, and as a result, hydrogen peroxide was recovered in a shorter time than the above (1) to (4). Decomposition performance.
上述實施形態為本發明之一例,本發明亦可為上述以外之實施形態。例如管柱不限定於5根。 [實施例]The above-mentioned embodiment is an example of the present invention, and the present invention may be an embodiment other than the above. For example, the pipe string is not limited to five. [Example]
[參考例1] 作為超純水製造裝置係準備圖3所示者。該超純水製造裝置81係以前處理裝置82、一次純水製造裝置83及二次純水製造裝置(副系統)84之3段裝置構成。於該超純水製造裝置81的前處理裝置82中,實施原水W的過濾、凝集沉澱、利用精密過濾膜之前處理。[Reference Example 1] prepared as shown in Fig. 3 as an ultrapure water production device. The ultrapure water production device 81 is a three-stage device composed of a pretreatment device 82, a primary pure water production device 83, and a secondary pure water production device (subsystem) 84. In the pretreatment device 82 of the ultrapure water production device 81, the raw water W is filtered, coagulated and precipitated, and pre-processed using a precision filtration membrane.
一次純水製造裝置83具有前處理水W1之槽85、逆滲透(RO)膜裝置86、紫外線(UV)氧化裝置87、再生型離子交換裝置(混床式或4床5塔式等)88、膜式脫氣裝置89。The primary pure water production device 83 has a tank 85 for pre-treatment water W1, a reverse osmosis (RO) membrane device 86, an ultraviolet (UV) oxidation device 87, and a regenerative ion exchange device (mixed bed type or 4 bed 5 tower type, etc.) 88 、 Membrane degassing device 89.
副系統84係由下述構成:儲存一次純水製造裝置83中製造之一次純水W2之副槽91、處理自該副槽91經由未圖示之泵送給之一次純水W2的紫外線氧化裝置92、鉑族金屬觸媒樹脂塔93、膜式脫氣裝置94、非再生型混床式離子交換裝置95及作為膜過濾裝置之超過濾(UF)膜96。超過濾(UF)膜96中去除微粒子成為超純水W3,將其供給至使用點97,未使用之超純水於副槽91中回流。The sub-system 84 is composed of the following: a sub-tank 91 that stores the primary pure water W2 manufactured in the primary pure-water manufacturing device 83, and treatment of ultraviolet oxidation of the primary pure water W2 sent from the sub-tank 91 via a pump not shown An apparatus 92, a platinum group metal catalyst resin tower 93, a membrane degasser 94, a non-regenerating mixed bed ion exchange apparatus 95, and an ultrafiltration (UF) membrane 96 as a membrane filtration apparatus. The ultrafiltration (UF) membrane 96 removes fine particles to become ultrapure water W3, which is supplied to the use point 97, and unused ultrapure water is refluxed in the sub tank 91.
將平均粒徑3.5nm之鉑奈米膠體粒子以0.07重量%之擔持量擔持於強鹼性凝膠型陰離子交換樹脂,調製作為鉑族金屬觸媒樹脂之擔持有鉑族金屬奈米粒子之陰離子交換樹脂。The platinum nanocolloid particles with an average particle diameter of 3.5 nm are supported on a strong alkaline gel-type anion exchange resin at a support amount of 0.07% by weight, and a platinum group metal nanoparticle is prepared as a platinum group metal catalyst resin. Particle anion exchange resin.
圖3所示之裝置構成的超純水製造裝置81中,使用上述鉑族金屬觸媒樹脂構成鉑族金屬觸媒樹脂塔93製造超純水W3,測定副系統84之鉑族金屬觸媒樹脂塔93之入口水及出口水的過氧化氫濃度(初期)。結果示於表1。又,測定長期間持續該超純水製造裝置81之運轉後之鉑族金屬觸媒樹脂塔93之出口水的過氧化氫濃度(末期)。結果彙總示於表1。In the ultrapure water production apparatus 81 of the device configuration shown in FIG. 3, the platinum group metal catalyst resin tower 93 is used to manufacture ultrapure water W3 using the platinum group metal catalyst resin, and the platinum group metal catalyst resin of the sub-system 84 is measured The hydrogen peroxide concentration of the inlet water and outlet water of the tower 93 (initial). The results are shown in Table 1. Moreover, the hydrogen peroxide concentration of the outlet water of the platinum group metal catalyst resin tower 93 after the operation of the ultrapure water production device 81 was continued for a long period of time (final period) was measured. The results are summarized in Table 1.
又,為了測定過氧化氫濃度,於酚酞4.8mg、硫酸銅(無水)8mg及氫氧化鈉48mg中添加硫酸鈉(無水)成為10g,調製微量過氧化氫濃度測定用試藥。於該試驗水10mL中添加、溶解該試料0.5g,於室溫靜置10分鐘後,測定552nm下之吸光度,基於該測定值計算過氧化氫濃度。In order to measure the hydrogen peroxide concentration, sodium sulfate (anhydrous) was added to 4.8 mg of phenolphthalein, 8 mg of copper sulfate (anhydrous), and 48 mg of sodium hydroxide to make 10 g, and a trace amount of hydrogen peroxide concentration measurement reagent was prepared. 0.5 g of this sample was added to and dissolved in 10 mL of the test water, and after standing at room temperature for 10 minutes, the absorbance at 552 nm was measured, and the hydrogen peroxide concentration was calculated based on the measured value.
[表1]
如由表1所了解,長期間運轉後之超純水W3之過氧化氫濃度上升顯著。As understood from Table 1, the hydrogen peroxide concentration of ultrapure water W3 after a long period of operation increases significantly.
[參考例2] 參考例1中,取出長期間運轉後之鉑族金屬觸媒樹脂塔93之使用過樹脂,填充於試驗用管柱,作成試驗用之鉑族金屬觸媒樹脂塔。且,為了比較同樣將新品的樹脂填充於試驗用管柱,作成鉑族金屬觸媒樹脂塔。[Reference Example 2] In Reference Example 1, the used resin of the platinum group metal catalyst resin tower 93 after long-term operation was taken out and filled in the test column to make a platinum group metal catalyst resin tower for the test. In addition, for comparison, a new-type resin was similarly packed in a test column to make a platinum group metal catalyst resin tower.
對超純水(過氧化氫未滿1μg/L)中分別添加300μg/L或1000μg/L之過氧化氫,調製試驗用入口水,測定將該試驗用入口水以通水速度(SV)300 hr-1 對上述各試驗用管柱向下通入後之出口水的過氧化氫濃度。結果示於表2。Add 300μg / L or 1000μg / L of hydrogen peroxide to ultrapure water (less than 1μg / L of hydrogen peroxide), prepare the test inlet water, and measure the test inlet water at the water flow rate (SV) 300 hr -1 is the concentration of hydrogen peroxide in the outlet water after the above test column is passed down. The results are shown in Table 2.
[表2]
如由表2所了解,長期間運轉後之鉑族金屬觸媒樹脂塔93之使用過樹脂之出口水過氧化氫濃度高於新品。藉此可知過氧化氫分解能降低。As understood from Table 2, the concentration of hydrogen peroxide in the outlet water of the used resin of the platinum group metal catalyst resin tower 93 after long-term operation is higher than that of the new product. From this, it can be seen that the decomposition energy of hydrogen peroxide decreases.
[參考例3] 參考例1中,將長期間運轉後之鉑族金屬觸媒樹脂塔93之使用過樹脂填充於試驗用管柱,作成試驗用之鉑族金屬觸媒樹脂塔。且,為了比較同樣將新品的樹脂填充於試驗用管柱,作成鉑族金屬觸媒樹脂塔。[Reference Example 3] In Reference Example 1, the used column of the platinum group metal catalyst resin tower 93 after long-term operation was filled in the test column to prepare a platinum group metal catalyst resin tower for the test. In addition, for comparison, a new-type resin was similarly packed in a test column to make a platinum group metal catalyst resin tower.
於超純水(過氧化氫未滿1μg/L)中添加30μg/L過氧化氫,調製入口水,測定將該入口水以通水速度(SV) 400hr-1 對上述各試驗用管柱向下通入後之出口水的過氧化氫濃度(No.1)。結果示於表3。Add 30μg / L of hydrogen peroxide to ultrapure water (less than 1μg / L of hydrogen peroxide) to prepare the inlet water, and measure the inlet water at the water flow rate (SV) 400hr -1 for each test column The hydrogen peroxide concentration (No. 1) in the outlet water after the lower pass. The results are shown in Table 3.
又,作為負荷試驗,係於超純水(過氧化氫未滿1μg/L)中添加400μg/L過氧化氫,調製試驗用入口水,將該試驗用入口水以通水速度(SV)6400hr-1 對上述各試驗用管柱向下通入22小時後停止運轉。其次,將於超純水(過氧化氫未滿1μg/L)中添加30μg/L過氧化氫之入口水通入各試驗用管柱,測定5分鐘後(No.2)、60分鐘後(No.3)之出口水之過氧化氫濃度。結果示於表3。In addition, as a load test, 400 μg / L of hydrogen peroxide was added to ultrapure water (less than 1 μg / L of hydrogen peroxide) to prepare test inlet water, and the test inlet water was passed at a water flow rate (SV) of 6400 hours -1 Stop the operation after passing the above test string downward for 22 hours. Next, 30μg / L of hydrogen peroxide inlet water was added to the ultrapure water (less than 1μg / L of hydrogen peroxide) and passed into each test column. After 5 minutes (No. 2) and 60 minutes ( No.3) The hydrogen peroxide concentration in the outlet water. The results are shown in Table 3.
[表3]
[實施例1] 參考例3之試驗後,取出各試驗用管柱之樹脂,以超純水(過氧化氫未滿1μg/L)保存2週後,再度填充,測定將於超純水(過氧化氫未滿1μg/L)中添加30μg/L過氧化氫之入口水進行通水時之出口水的過氧化氫濃度。結果示於表4。[Example 1] After the test of Reference Example 3, the resin of each test column was taken out, stored in ultrapure water (less than 1μg / L of hydrogen peroxide) for 2 weeks, and filled again, and the measurement will be carried out in ultrapure water ( The hydrogen peroxide concentration of the outlet water when the inlet water of 30 µg / L hydrogen peroxide is added to the inlet water of hydrogen peroxide less than 1 µg / L). The results are shown in Table 4.
[表4]
由表4可知,藉由將使用過之鉑系觸媒於超純水中保存特定期間,可恢復其過氧化氫去除性能。It can be seen from Table 4 that by storing the used platinum catalyst in ultrapure water for a specific period, its hydrogen peroxide removal performance can be restored.
本發明雖使用特定態樣詳細說明,但本技藝者應了解在不偏離本發明意圖及範圍下可進行各種變更。 本申請案係基於2017年12月15日提出申請之日本專利申請號2017-240802,其全文藉由引用加以援用。Although the present invention is described in detail using specific aspects, those skilled in the art should understand that various changes can be made without departing from the intention and scope of the present invention. This application is based on Japanese Patent Application No. 2017-240802 filed on December 15, 2017, the entire contents of which are incorporated by reference.
11~15、31~35‧‧‧閥11 ~ 15, 31 ~ 35‧‧‧Valve
21~25‧‧‧管柱21 ~ 25‧‧‧Column
41~45、51~55‧‧‧三向閥41 ~ 45, 51 ~ 55‧‧‧Three-way valve
60~65‧‧‧配管60 ~ 65‧‧‧Piping
70‧‧‧排出用配管70‧‧‧Exhaust piping
71~75‧‧‧分支配管71 ~ 75‧‧‧ branch piping
81‧‧‧超純水製造裝置81‧‧‧Ultra-pure water manufacturing device
82‧‧‧前處理裝置82‧‧‧Pre-processing device
83‧‧‧一次純水製造裝置83‧‧‧Pure water manufacturing device
84‧‧‧二次純水製造裝置84‧‧‧Second pure water manufacturing device
85‧‧‧槽85‧‧‧slot
86‧‧‧逆滲透(RO)膜裝置86‧‧‧Reverse Osmosis (RO) membrane device
87‧‧‧紫外線(UV)氧化裝置87‧‧‧Ultraviolet (UV) oxidation device
88‧‧‧再生型離子交換裝置88‧‧‧ Regenerative ion exchange device
89‧‧‧膜式脫氣裝置89‧‧‧membrane degassing device
91‧‧‧副槽91‧‧‧slot
92‧‧‧紫外線氧化裝置92‧‧‧UV oxidation device
93‧‧‧鉑族金屬觸媒樹脂塔93‧‧‧Platinum metal catalyst resin tower
94‧‧‧膜式脫氣裝置94‧‧‧membrane degassing device
95‧‧‧非再生型混床式離子交換裝置95‧‧‧non-regenerative mixed bed ion exchange device
96‧‧‧超過濾(UF)膜96‧‧‧Ultrafiltration (UF) membrane
97‧‧‧使用點97‧‧‧point of use
W1‧‧‧前處理水W1‧‧‧Pre-treatment water
W2‧‧‧一次純水W2‧‧‧One time pure water
W3‧‧‧超純水W3‧‧‧Ultra-pure water
W‧‧‧原水W‧‧‧raw water
圖1係本發明方法之說明圖。 圖2係本發明裝置之一例的說明圖。 圖3係超純水製造裝置之系統圖。FIG. 1 is an explanatory diagram of the method of the present invention. FIG. 2 is an explanatory diagram of an example of the device of the present invention. Figure 3 is a system diagram of an ultrapure water manufacturing device.
Claims (8)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016255445 | 2016-12-28 | ||
| JP2017240802A JP6451824B2 (en) | 2016-12-28 | 2017-12-15 | Hydrogen peroxide removal method and apparatus |
| JP2017-240802 | 2017-12-15 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201930200A true TW201930200A (en) | 2019-08-01 |
| TWI820042B TWI820042B (en) | 2023-11-01 |
Family
ID=62707073
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW106132896A TW201823166A (en) | 2016-12-28 | 2017-09-26 | Hydrogen peroxide removal method and apparatus |
| TW107133285A TWI820042B (en) | 2016-12-28 | 2018-09-21 | Hydrogen peroxide removal method and device |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW106132896A TW201823166A (en) | 2016-12-28 | 2017-09-26 | Hydrogen peroxide removal method and apparatus |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP6451824B2 (en) |
| KR (1) | KR102340160B1 (en) |
| CN (1) | CN111183118B (en) |
| TW (2) | TW201823166A (en) |
| WO (2) | WO2018123156A1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI773374B (en) * | 2020-06-23 | 2022-08-01 | 日商奧璐佳瑙股份有限公司 | Water treatment device, water treatment method, and regeneration-type ion exchange tower |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2022122556A1 (en) | 2020-12-10 | 2022-06-16 | Basf Se | Process for the controlled decomposition of peroxo compounds |
| CN113019362B (en) * | 2021-05-31 | 2021-09-07 | 江苏欣诺科催化剂有限公司 | Metal ruthenium supported catalyst |
| CN119930016A (en) * | 2023-11-02 | 2025-05-06 | 万华化学集团电子材料有限公司 | Hydrogen peroxide catalytic reactor for ultrapure water production system, ultrapure water production system and method for continuously producing ultrapure water |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2560167Y2 (en) * | 1991-05-02 | 1998-01-21 | 須賀工業株式会社 | Hydrogen peroxide water decomposition equipment |
| CN1063354C (en) * | 1993-12-22 | 2001-03-21 | 三菱化学株式会社 | The regeneration method of ruthenium series catalyst |
| JP2780652B2 (en) * | 1993-12-22 | 1998-07-30 | 三菱化学株式会社 | Ruthenium-based regenerated catalyst |
| JP2003305465A (en) * | 2002-04-15 | 2003-10-28 | Mitsubishi Electric Corp | Pure water production system and water quality monitoring method |
| JP4578048B2 (en) * | 2002-06-21 | 2010-11-10 | 中国電力株式会社 | Denitration catalyst regeneration method |
| JP2007160268A (en) * | 2005-12-16 | 2007-06-28 | Tokyo Electric Power Co Inc:The | Denitration catalyst regeneration treatment method |
| JP5124946B2 (en) * | 2006-01-12 | 2013-01-23 | 栗田工業株式会社 | Removal method of hydrogen peroxide in ultrapure water in ultrapure water production equipment |
| JP5098215B2 (en) * | 2006-05-01 | 2012-12-12 | 三菱瓦斯化学株式会社 | Method for activating hydrogenation catalyst and method for producing hydrogen peroxide containing the same |
| JP2010017633A (en) * | 2008-07-09 | 2010-01-28 | Japan Organo Co Ltd | Apparatus for producing hydrogen-dissolved water and method for producing hydrogen-dissolved water using the apparatus, and washing device for electronic component or for instrument for manufacturing electronic component |
| JP5838485B2 (en) * | 2012-02-14 | 2016-01-06 | 国立大学法人大阪大学 | Glycerol hydrocracking catalyst and method for producing 1,3-propanediol using the catalyst |
| JP2013215679A (en) * | 2012-04-09 | 2013-10-24 | Nomura Micro Sci Co Ltd | Ultrapure water production apparatus |
| JP6351589B2 (en) * | 2013-06-18 | 2018-07-04 | 株式会社ダイセル | Method for regenerating catalyst for hydrogenation reaction and method for producing hydride of polyhydric alcohol |
| JP6423211B2 (en) * | 2013-09-25 | 2018-11-14 | オルガノ株式会社 | Substrate processing method and substrate processing apparatus |
| JP2015093226A (en) * | 2013-11-11 | 2015-05-18 | 栗田工業株式会社 | Method and apparatus for manufacturing pure water |
| JP6290654B2 (en) * | 2014-03-04 | 2018-03-07 | オルガノ株式会社 | Ultrapure water production equipment |
| JP6490952B2 (en) * | 2014-11-26 | 2019-03-27 | オルガノ株式会社 | Reactor and water treatment device |
| CN104785254B (en) * | 2015-03-20 | 2017-04-12 | 西安凯立新材料股份有限公司 | Catalyst for degrading hydrogen peroxide as well as preparation method and application of catalyst |
| JP6670047B2 (en) * | 2015-05-22 | 2020-03-18 | オルガノ株式会社 | Ultrapure water production equipment |
-
2017
- 2017-09-13 WO PCT/JP2017/033060 patent/WO2018123156A1/en not_active Ceased
- 2017-09-26 TW TW106132896A patent/TW201823166A/en unknown
- 2017-12-15 JP JP2017240802A patent/JP6451824B2/en active Active
-
2018
- 2018-09-12 KR KR1020207010326A patent/KR102340160B1/en active Active
- 2018-09-12 WO PCT/JP2018/033813 patent/WO2019116653A1/en not_active Ceased
- 2018-09-12 CN CN201880065236.XA patent/CN111183118B/en active Active
- 2018-09-21 TW TW107133285A patent/TWI820042B/en active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI773374B (en) * | 2020-06-23 | 2022-08-01 | 日商奧璐佳瑙股份有限公司 | Water treatment device, water treatment method, and regeneration-type ion exchange tower |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201823166A (en) | 2018-07-01 |
| CN111183118A (en) | 2020-05-19 |
| JP6451824B2 (en) | 2019-01-16 |
| JP2018108577A (en) | 2018-07-12 |
| KR20200096485A (en) | 2020-08-12 |
| WO2018123156A1 (en) | 2018-07-05 |
| TWI820042B (en) | 2023-11-01 |
| CN111183118B (en) | 2021-10-22 |
| KR102340160B1 (en) | 2021-12-15 |
| WO2019116653A1 (en) | 2019-06-20 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP5454468B2 (en) | Pure water production method and pure water production apparatus | |
| JP5124946B2 (en) | Removal method of hydrogen peroxide in ultrapure water in ultrapure water production equipment | |
| TWI640482B (en) | Ultrapure water manufacturing method and ultrapure water manufacturing equipment | |
| JP6439777B2 (en) | Ultrapure water production apparatus and operation method of ultrapure water production apparatus | |
| TWI820042B (en) | Hydrogen peroxide removal method and device | |
| TWI408107B (en) | Extra-pure water production equipment and operating method thereof | |
| TWI868365B (en) | Pure water production device, ultra pure water production device, pure water production method, and ultra pure water production method | |
| JP6848415B2 (en) | Operation method of ultrapure water production equipment and ultrapure water production equipment | |
| JP5854163B2 (en) | Ultrapure water production method and ultrapure water production facility | |
| JP4534766B2 (en) | Ultrapure water production apparatus and ultrapure water production method | |
| JP7765679B2 (en) | Ultrapure water production device and ultrapure water production method | |
| JP6543925B2 (en) | Method of operating ultrapure water production system | |
| JP6728913B2 (en) | Ultrapure water production method |