TW202003183A - Workpiece processing method - Google Patents

Workpiece processing method Download PDF

Info

Publication number
TW202003183A
TW202003183A TW108116990A TW108116990A TW202003183A TW 202003183 A TW202003183 A TW 202003183A TW 108116990 A TW108116990 A TW 108116990A TW 108116990 A TW108116990 A TW 108116990A TW 202003183 A TW202003183 A TW 202003183A
Authority
TW
Taiwan
Prior art keywords
cutting
workpiece
height
unit
target
Prior art date
Application number
TW108116990A
Other languages
Chinese (zh)
Other versions
TWI779194B (en
Inventor
台井曉治
古川良
水口雅則
小野隆之
Original Assignee
日商迪思科股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商迪思科股份有限公司 filed Critical 日商迪思科股份有限公司
Publication of TW202003183A publication Critical patent/TW202003183A/en
Application granted granted Critical
Publication of TWI779194B publication Critical patent/TWI779194B/en

Links

Images

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B28—WORKING CEMENT, CLAY, OR STONE
    • B28D—WORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B28—WORKING CEMENT, CLAY, OR STONE
    • B28D—WORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
    • B28D5/0064—Devices for the automatic drive or the program control of the machines
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B28—WORKING CEMENT, CLAY, OR STONE
    • B28D—WORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
    • B28D5/0076—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for removing dust, e.g. by spraying liquids; for lubricating, cooling or cleaning tool or work
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B28—WORKING CEMENT, CLAY, OR STONE
    • B28D—WORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
    • B28D5/0082—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B28—WORKING CEMENT, CLAY, OR STONE
    • B28D—WORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/02—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills
    • B28D5/022—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels
    • B28D5/023—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels with a cutting blade mounted on a carriage
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B28—WORKING CEMENT, CLAY, OR STONE
    • B28D—WORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/02—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills
    • B28D5/022—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels
    • B28D5/024—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels with the stock carried by a movable support for feeding stock into engagement with the cutting blade, e.g. stock carried by a pivoted arm or a carriage
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Dicing (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Milling Processes (AREA)

Abstract

[課題]提供一種可以不使產量大幅降低,而能適當地調整切割刀片高度的工件加工方法。[解決手段]一種工件加工方法,其包含:基準設定步驟,設定切割單元的作為基準的高度;目標設定步驟,以使切割刀片切入到切割膠膜的預定深度的方式,來設定切割單元的作為目標的高度;第一切割步驟,在將切割單元定位在作為目標的高度的狀態下,藉由使切割單元與卡盤台做相對移動來切割加工工件;修正值取得步驟,基於切割刀片在切割膠膜上形成之接觸痕跡的長度,取得修正值;以及第二切割步驟,切割單元定位在依據修正值修正後之作為目標的高度的狀態下,藉由使切割單元與卡盤台做相對移動來切割加工工件。[Problem] To provide a workpiece processing method that can appropriately adjust the height of the cutting blade without greatly reducing the output. [Solution] A workpiece processing method, including: a reference setting step to set the height of the cutting unit as a reference; a target setting step to set the cutting unit as a way of cutting the cutting blade to a predetermined depth of the cutting film The height of the target; the first cutting step, in the state where the cutting unit is positioned at the height of the target, the workpiece is cut by relatively moving the cutting unit and the chuck table; the correction value obtaining step is based on the cutting blade The length of the contact trace formed on the adhesive film to obtain the correction value; and the second cutting step, the cutting unit is positioned at the height of the target after correction according to the correction value, by relatively moving the cutting unit and the chuck table To cut the workpiece.

Description

工件加工方法Workpiece processing method

本發明係關於一種工件的加工方法,切割加工黏貼有切割膠膜的板狀工件。The invention relates to a processing method of a workpiece, which cuts and processes a plate-shaped workpiece adhered with a cutting glue film.

當加工代表半導體晶圓或封裝基板的板狀工件時,例如,使用在主軸上安裝有環狀切割刀片的切割裝置。一面使主軸旋轉並使切割刀片切入工件,一面使主軸以及切割刀片與工件做相對移動,藉此可以沿著此相對移動的方向切割加工工件。When processing a plate-shaped workpiece representing a semiconductor wafer or a package substrate, for example, a cutting device with a ring-shaped cutting blade mounted on a main shaft is used. While rotating the main shaft and cutting the cutting blade into the workpiece, the main shaft and the cutting blade and the workpiece are relatively moved, whereby the workpiece can be cut and processed along the direction of this relative movement.

可是,以如上述的切割裝置切割加工工件,切割刀片就會發生磨損,其直徑將會逐漸變小。若繼續使用直徑因磨損而變小的切割刀片,則切割刀片對於工件的切入就會變淺,無法適當地切割加工工件。However, when cutting the workpiece with the cutting device as described above, the cutting blade will wear out and its diameter will gradually become smaller. If the cutting blade whose diameter becomes smaller due to wear continues to be used, the cutting blade will cut into the workpiece shallower, and the workpiece cannot be properly cut and processed.

於是,下述方法被實用化:在任意時間點檢測切割刀片前端(下端)的位置,以此前端的位置為基準,來控制切割刀片對於工件的切入的方法(例如,參照專利文獻1)。此方法係為,使切割刀片侵入設置於切割裝置上的光學式感測器,藉由切割刀片遮斷感測器內的光路,檢測切割刀片前端的位置。 [習知技術文獻] [專利文獻]Therefore, the following method has been put into practical use: A method of detecting the position of the front end (lower end) of the cutting blade at an arbitrary point in time and using the position of the front end as a reference to control the cutting of the cutting blade into the workpiece (for example, see Patent Document 1). This method is to make the cutting blade invade the optical sensor provided on the cutting device, and block the optical path in the sensor by the cutting blade to detect the position of the front end of the cutting blade. [Conventional Technical Literature] [Patent Literature]

[專利文獻1]日本特開2001-298001號公報[Patent Document 1] Japanese Patent Laid-Open No. 2001-298001

[發明所欲解決的課題] 近幾年,伴隨著從工件切出之晶片的小型化等,設定於此工件上的加工預定線(切割道)的數量也增加。因此,容易發生下述狀況:在切割加工一片工件的途中,切割刀片大幅磨損,必須確認切割刀片前端的位置來調整切割刀片的高度。[Problems to be solved by the invention] In recent years, along with the miniaturization of wafers cut from workpieces, etc., the number of processing lines (dicing lanes) set on the workpieces has also increased. Therefore, the following situation is likely to occur: the cutting blade is greatly worn out during the cutting of a workpiece, and the height of the cutting blade must be adjusted by confirming the position of the front end of the cutting blade.

一旦發生這種狀況,就要停止工件的切割加工,以上述的感測器檢測切割刀片前端的位置後,調整切割刀片的高度,並重新開始切割加工。然而,這種情況下,必須使切割刀片在工件與感測器之間做相對移動,所以產量容易降低。Once this happens, the cutting process of the workpiece must be stopped. After detecting the position of the front end of the cutting blade with the sensor described above, the height of the cutting blade is adjusted, and the cutting process is restarted. However, in this case, the cutting blade must be relatively moved between the workpiece and the sensor, so the yield is easily reduced.

本發明是鑑於這種問題點而完成的發明,作為其目的,係提供一種可以不使產量大幅降低就能適當地調整切割刀片高度的工件加工方法。The present invention is made in view of such a problem, and as its object, it is to provide a workpiece processing method that can appropriately adjust the height of the cutting blade without greatly reducing the output.

[解決課題的技術手段] 根據本發明的一態樣,係為一種工件加工方法,其使用切割裝置對黏貼切割膠膜的工件進行切割加工,該切割膠膜貼在環狀框架開口上,該切割裝置包含:保持工件之卡盤台;切割單元,安裝有切割刀片,該切割刀片對保持在該卡盤台上的該工件進行切割加工;以及設定單元,基於該切割刀片外周前端的高度,設定該切割單元的作為基準的高度;該工件加工方法包含以下步驟:基準設定步驟,基於該切割刀片外周前端的高度,設定該切割單元的作為該基準的高度;目標設定步驟,以使該切割刀片切入到該切割膠膜的預定深度的方式,來設定該切割單元的作為目標的高度;第一切割步驟,在將該切割單元定位在作為該目標的高度的狀態下,藉由使該切割單元與該卡盤台做相對移動來切割加工該工件;修正值取得步驟,與該第一切割步驟同時,或在該第一切割步驟之後,基於該切割刀片在該切割膠膜上形成之接觸痕跡的長度,取得用於修正該切割單元的作為該目標的高度的修正值;以及第二切割步驟,在將該切割單元定位於依據該修正值修正作為該目標的高度後而得到的高度之狀態下,藉由使該切割單元與該卡盤台做相對移動來切割加工該工件。[Technical means to solve the problem] According to one aspect of the present invention, it is a workpiece processing method that uses a cutting device to perform cutting processing on a workpiece to which a cutting adhesive film is attached. The cutting adhesive film is attached to an opening of a ring frame. The cutting device includes: holding the workpiece A chuck table; a cutting unit installed with a cutting blade that cuts the workpiece held on the chuck table; and a setting unit that sets the cutting unit as a reference based on the height of the front end of the outer periphery of the cutting blade The height of the workpiece; the workpiece processing method includes the following steps: a reference setting step, based on the height of the outer peripheral front end of the cutting blade, setting the height of the cutting unit as the reference; a target setting step so that the cutting blade cuts into the cutting film The predetermined height of the cutting unit is used to set the target height of the cutting unit; the first cutting step, in the state of positioning the cutting unit at the target height, by making the cutting unit and the chuck table do Relatively move to cut and process the workpiece; the correction value acquisition step, at the same time as the first cutting step, or after the first cutting step, based on the length of the contact marks formed on the cutting film by the cutting blade, is used for A correction value of the height of the cutting unit as the target; and a second cutting step, by positioning the cutting unit at a height obtained by correcting the height of the target according to the correction value, by making the The cutting unit moves relative to the chuck table to cut and process the workpiece.

在本發明的一態樣中,也可以該第一切割步驟中,使該切割單元在該工件與該框架之間的該切割膠膜露出的第一區域下降,下降到作為該目標的高度後,以使該切割刀片相對於該工件移動,移動至與該第一區域相反側之該切割膠膜露出的第二區域為止的方式,藉由使該切割單元與該卡盤台做相對移動,於切割加工該工件的同時,在該切割膠膜上形成該接觸痕跡。In one aspect of the present invention, in the first cutting step, the cutting unit may be lowered in the first area exposed by the cutting glue film between the workpiece and the frame, and then lowered to the height as the target , By moving the cutting blade relative to the workpiece to the second area on the opposite side of the first area from which the cutting glue film is exposed, by relatively moving the cutting unit and the chuck table, While cutting the workpiece, the contact marks are formed on the cutting adhesive film.

此外,在本發明的一態樣中,更可以包含接觸痕跡形成步驟,其在第一切割步驟之後,該修正值取得步驟之前,使該切割單元在該工件與該框架之間的該切割膠膜之露出區域下降,藉由下降到作為該目標的高度,在該切割膠膜上形成該接觸痕跡。In addition, in one aspect of the present invention, a contact mark forming step may be further included, which is to make the cutting unit cut the glue between the workpiece and the frame after the first cutting step and before the correction value obtaining step The exposed area of the film descends, and by descending to the height as the target, the contact mark is formed on the dicing adhesive film.

此外,在本發明的一態樣中,可以在該修正值取得步驟中,基於由從該接觸痕跡的長度與該切割刀片的外徑算出之接觸痕跡的深度,取得該修正值。Furthermore, in one aspect of the present invention, in the correction value obtaining step, the correction value may be obtained based on the depth of the contact mark calculated from the length of the contact mark and the outer diameter of the cutting blade.

[發明功效] 在關於本發明一態樣的工件加工方法中,基於切割刀片在切割膠膜上形成之接觸痕跡的長度,取得用於修正切割單元的作為目標的高度的修正值,其後,將切割單元定位於依據此修正值修正後的高度來切割加工工件。[Effect of invention] In the workpiece processing method according to an aspect of the present invention, based on the length of the contact mark formed by the cutting blade on the cutting adhesive film, a correction value for correcting the target height of the cutting unit is obtained, and thereafter, the cutting unit is positioned Based on the height corrected by this correction value, the workpiece is cut and processed.

因此,每當切割刀片磨損時,即使不用設定單元檢測切割刀片外周前端的高度,也可以適當地調整切割單元的高度。即,當調整切割刀片的高度時,切割刀片相對移動的距離不需要如以往那麼大即可完成,所以可以不使產量大幅降低而適當地調整切割刀片的高度。Therefore, whenever the cutting blade is worn, the height of the cutting unit can be adjusted appropriately even without using the setting unit to detect the height of the front end of the outer periphery of the cutting blade. That is, when the height of the cutting blade is adjusted, the relative moving distance of the cutting blade does not need to be as large as in the past, so the height of the cutting blade can be adjusted appropriately without greatly reducing the output.

茲參照附圖,就關於本發明一態樣的實施方式進行說明。圖1為表示利用本實施方式的工件加工方法來進行切割加工之工件11等的構成例的立體圖。如圖1所示,工件11為,例如,使用矽(Si)等半導體材料所形成之圓盤狀的晶圓。The embodiment of the present invention will be described with reference to the drawings. FIG. 1 is a perspective view showing a configuration example of a workpiece 11 and the like that are cut by the workpiece processing method of the present embodiment. As shown in FIG. 1, the workpiece 11 is, for example, a disc-shaped wafer formed using a semiconductor material such as silicon (Si).

此工件11的正面11a側為,由互相交叉的多條加工預定線(切割道)13劃分成多個小區域,各小區域上形成有IC(Integrated Circuit;積體電路)等的元件15。於工件11的背面11b側,黏貼有直徑大於工件11之切割膠膜21的第一面21a側。The front surface 11a side of the workpiece 11 is divided into a plurality of small areas by a plurality of lines to be processed (cutting lanes) 13 crossing each other, and elements 15 such as an IC (Integrated Circuit) are formed on the small areas. On the back surface 11b side of the workpiece 11, a first surface 21a side of a dicing film 21 having a diameter larger than the workpiece 11 is pasted.

此外,切割膠膜21的第一面21a側的外周部分黏貼於具有大致圓形開口23a的環狀框架23上。即,在工件11的背面11b側,黏貼有貼於環狀框架23之開口23a上的切割膠膜21,工件11透過此切割膠膜21而為框架23所支撐。In addition, the outer peripheral portion of the dicing film 21 on the first surface 21a side is adhered to the ring-shaped frame 23 having a substantially circular opening 23a. That is, on the back surface 11 b side of the work 11, a dicing film 21 attached to the opening 23 a of the ring frame 23 is pasted, and the work 11 is supported by the frame 23 through the dicing film 21.

再者,在本實施方式中,雖然將以矽等半導體材料形成之圓盤狀的晶圓作為工件11,但對工件11的材質、形狀、構造、大小等並無限制。例如,也可以將以其他的半導體、陶瓷、樹脂、金屬等材料形成之基板等用作工件11。同樣地,對元件15的種類、數量、形狀、構造、大小、配置等亦無限制。工件11上也可以未形成元件15。In addition, in this embodiment, although a disc-shaped wafer formed of a semiconductor material such as silicon is used as the workpiece 11, the material, shape, structure, size, and the like of the workpiece 11 are not limited. For example, a substrate formed of other semiconductor, ceramic, resin, metal, or other materials may be used as the workpiece 11. Similarly, the type, number, shape, structure, size, arrangement, etc. of the elements 15 are not limited. The element 15 may not be formed on the work 11.

再者,在本實施方式中,雖然就將切割膠膜21黏貼於工件11的背面11b側,再從正面11a側切割加工工件11的例子進行說明,但也可以將切割膠膜21黏貼於工件11的正面11a側。這種情況,工件11就變成要從背面11b側來切割加工。In addition, in this embodiment, although the example where the dicing film 21 is adhered to the back surface 11b side of the workpiece 11 and the workpiece 11 is cut and processed from the front surface 11a side, the dicing film 21 may be adhered to the workpiece 11 is the front side 11a side. In this case, the work 11 becomes cut from the back surface 11b side.

在關於本實施方式的工件加工方法中,首先,進行用於以切割裝置切割加工上述工件11的準備。圖2為表示在關於本實施方式的工件加工方法中所使用的切割裝置2之構成例的立體圖。再者,圖2中以功能方塊表示一部分的構成要素。如圖2所示,切割裝置2具備支撐各構成要素的基台4。In the workpiece processing method according to the present embodiment, first, preparation for cutting and processing the workpiece 11 with a cutting device is performed. FIG. 2 is a perspective view showing a configuration example of the cutting device 2 used in the workpiece processing method according to this embodiment. In addition, in FIG. 2, some of the constituent elements are represented by functional blocks. As shown in FIG. 2, the cutting device 2 includes a base 4 that supports each component.

在基台4前方的角落形成有開口4a,此開口4a內設有利用升降機構(未圖示)進行升降的卡匣升降機6。卡匣升降機6的上表面放置有卡匣8,該卡匣8係用於容納透過切割膠膜21而為框架23所支撐之狀態的工件11。再者,圖2中為了說明方便起見,只顯示卡匣8的輪廓。An opening 4a is formed in a corner in front of the base 4, and a cassette elevator 6 that is raised and lowered by a lifting mechanism (not shown) is provided in the opening 4a. A cassette 8 is placed on the upper surface of the cassette elevator 6. The cassette 8 is used to accommodate the workpiece 11 in a state supported by the frame 23 through the cutting film 21. Furthermore, in FIG. 2, for convenience of explanation, only the outline of the cassette 8 is shown.

在卡匣升降機6的側面方向,於X軸方向上(前後方向、加工進給方向)形成有長的開口4b。開口4b內配置有滾珠螺桿式的X軸移動機構(加工進給機構)10,以及覆蓋X軸移動機構10上部的蛇腹狀罩蓋12。X軸移動機構10具備X軸移動台(未圖示),使此X軸移動台在X軸方向上移動。再者,此X軸移動台的上部為工作台罩蓋10a所覆蓋。In the lateral direction of the cassette elevator 6, a long opening 4 b is formed in the X-axis direction (front-rear direction, processing feed direction). A ball screw type X-axis moving mechanism (processing feed mechanism) 10 and a bellows-shaped cover 12 covering the upper part of the X-axis moving mechanism 10 are arranged in the opening 4b. The X-axis moving mechanism 10 includes an X-axis moving table (not shown), and moves the X-axis moving table in the X-axis direction. Furthermore, the upper part of the X-axis moving table is covered by the table cover 10a.

X軸移動台上配置有用於透過切割膠膜21來保持工件11的卡盤台(保持台)14,該卡盤台14係為從工作台罩蓋10a露出的態樣。卡盤台14連結有馬達等旋轉驅動源(未圖示),圍繞與Z軸方向(垂直方向)大致平行的旋轉軸來旋轉。此外,卡盤台14藉由上述之X軸移動機構10,與X軸移動台共同在X軸方向上移動(加工進給 )。A chuck table (holding table) 14 for holding the workpiece 11 through the dicing film 21 is arranged on the X-axis moving table, and the chuck table 14 is exposed from the table cover 10a. The chuck table 14 is connected to a rotation drive source (not shown) such as a motor, and rotates about a rotation axis substantially parallel to the Z-axis direction (vertical direction). In addition, the chuck table 14 is moved together with the X-axis moving table in the X-axis direction by the above-mentioned X-axis moving mechanism 10 (machining feed).

卡盤台14上表面的一部分為用於保持工件11的保持面14a。保持面14a係在相對X軸方向以及Y軸方向上(左右方向、分度進給方向)大致平行地形成,透過於卡盤台14內部形成之吸引通路14b(參照圖4(A))等而被吸引源(未圖示)所連接。此外,卡盤台14的周圍設置有4個夾具16,該夾具16係用於從四個方向固定支撐工件11的環狀框架23。A part of the upper surface of the chuck table 14 is a holding surface 14a for holding the work 11. The holding surface 14a is formed substantially parallel to the X-axis direction and the Y-axis direction (left-right direction, indexing feed direction), and passes through the suction passage 14b formed inside the chuck table 14 (see FIG. 4(A)), etc. It is connected to the source of attraction (not shown). In addition, four clamps 16 are provided around the chuck table 14, and the clamps 16 are used to fix and support the ring frame 23 of the workpiece 11 from four directions.

在開口4b的上方配置有搬送單元(未圖示),該搬送單元係用於將上述工件11(框架23)往卡盤台14等搬送。以搬送單元搬送的工件11,例如以正面11a側往上方露出的方式,放置於卡盤台14的保持面14a上。即,在本實施方式中,黏貼於工件11之背面11b側的切割膠膜21會接觸卡盤台14的保持面14a。Above the opening 4b, a conveying unit (not shown) is arranged for conveying the workpiece 11 (frame 23) to the chuck table 14 or the like. The workpiece 11 transported by the transport unit is placed on the holding surface 14a of the chuck table 14 such that the front surface 11a side is exposed upward. That is, in this embodiment, the dicing film 21 adhered to the back surface 11 b side of the workpiece 11 contacts the holding surface 14 a of the chuck table 14.

在開口4b的側面方向配置有懸臂樑狀的支撐構造20,該支撐構造20係用於支撐切割工件11的切割單元18。在支撐構造20的前面上部,設置有使切割單元18在Y軸方向以及Z軸方向上移動的切割單元移動機構(分度進給機構、切入進給機構)22。A cantilever-shaped support structure 20 is arranged in the lateral direction of the opening 4b. The support structure 20 is used to support the cutting unit 18 that cuts the workpiece 11. A cutting unit moving mechanism (indexing feeding mechanism, cutting feeding mechanism) 22 that moves the cutting unit 18 in the Y-axis direction and the Z-axis direction is provided on the upper front portion of the support structure 20.

切割單元移動機構22具備有配置於支撐構造20的前面且與Y軸方向大致平行的一對Y軸導軌24。在Y軸導軌24上安裝有可滑動之Y軸移動板26,該Y軸移動板26構成了切割單元移動機構22。The cutting unit moving mechanism 22 includes a pair of Y-axis guide rails 24 arranged in front of the support structure 20 and substantially parallel to the Y-axis direction. A slideable Y-axis moving plate 26 is mounted on the Y-axis guide 24, and the Y-axis moving plate 26 constitutes a cutting unit moving mechanism 22.

在Y軸移動板26的背面側(後面側)設置有螺母部(未圖示),與Y軸導軌24大致平行的Y軸滾珠螺桿28被旋入此螺母部。Y軸滾珠螺桿28的一端部連結有Y軸脈衝馬達(未圖示)。若以Y軸脈衝馬達使Y軸滾珠螺桿28旋轉,則Y軸移動板26會沿著Y軸導軌24在Y軸方向上移動。A nut portion (not shown) is provided on the back side (rear side) of the Y-axis moving plate 26, and the Y-axis ball screw 28 substantially parallel to the Y-axis guide rail 24 is screwed into this nut portion. A Y-axis pulse motor (not shown) is connected to one end of the Y-axis ball screw 28. When the Y-axis ball screw 28 is rotated by the Y-axis pulse motor, the Y-axis moving plate 26 moves in the Y-axis direction along the Y-axis guide rail 24.

在Y軸移動板26的表面(前面)設置有與Z軸方向大致平行的一對Z軸導軌30。在Z軸導軌30上安裝有可滑動之Z軸移動板32。A pair of Z-axis guide rails 30 substantially parallel to the Z-axis direction are provided on the surface (front surface) of the Y-axis moving plate 26. A slideable Z-axis moving plate 32 is installed on the Z-axis guide 30.

在Z軸移動板32的背面側(後面側)設置有螺母部(未圖示),與Z軸導軌30平行的Z軸滾珠螺桿34被旋入此螺母部。 Z軸滾珠螺桿34的一端部連結有Z軸脈衝馬達36。若以Z軸脈衝馬達36使Z軸滾珠螺桿34旋轉,則Z軸移動板32會沿著Z軸導軌30在Z軸方向上移動。A nut portion (not shown) is provided on the back side (rear side) of the Z-axis moving plate 32, and the Z-axis ball screw 34 parallel to the Z-axis guide 30 is screwed into this nut portion. A Z-axis pulse motor 36 is connected to one end of the Z-axis ball screw 34. When the Z-axis ball screw 34 is rotated by the Z-axis pulse motor 36, the Z-axis moving plate 32 moves in the Z-axis direction along the Z-axis guide rail 30.

在Z軸移動板32的下部固定有構成切割單元18的筒狀主軸外殼38。在主軸外殼38內,容納有作為旋轉軸的主軸40(參照圖3)。主軸40的一端部從主軸外殼38的一端側露出於外部,此主軸40的一端部安裝有用於切割加工工件11的切割刀片42。主軸40的另一端側連結有馬達等的旋轉驅動源(未圖示)。A cylindrical spindle housing 38 constituting the cutting unit 18 is fixed to the lower part of the Z-axis moving plate 32. In the main shaft housing 38, a main shaft 40 (refer to FIG. 3) as a rotating shaft is accommodated. One end portion of the spindle 40 is exposed to the outside from one end side of the spindle housing 38, and a cutting blade 42 for cutting the workpiece 11 is attached to one end portion of the spindle 40. A rotary drive source (not shown) such as a motor is connected to the other end side of the spindle 40.

在鄰接於切割單元18的位置,設置有攝影機(攝影單元)44,該攝影機(攝影單元)44係用於拍攝保持於卡盤台14上的工件11等。若以切割單元移動機構22使Y軸移動板26在Y軸方向上移動,則切割單元18以及攝影機44會在Y軸方向上移動(分度進給)。此外,若以切割單元移動機構22使Z軸移動板32在Z軸方向上移動,則切割單元18以及攝影機44會在Z軸方向上移動(切入進給)。At a position adjacent to the cutting unit 18, a camera (photographic unit) 44 is provided for photographing the work 11 and the like held on the chuck table 14. When the cutting unit moving mechanism 22 moves the Y-axis moving plate 26 in the Y-axis direction, the cutting unit 18 and the camera 44 move in the Y-axis direction (index feed). In addition, if the Z-axis moving plate 32 is moved in the Z-axis direction by the cutting unit moving mechanism 22, the cutting unit 18 and the camera 44 will move in the Z-axis direction (cutting feed).

在開口4b的上方且低於切割單元18的位置配置有刀片位置檢測單元(設定單元)46,該刀片位置檢測單元(設定單元)46係用於檢測切割刀片42的刀鋒(外周的前端)之Z軸方向的位置(高度)。此外,在相對於開口4b和開口4a為相反側的位置形成有開口4c。在開口4c內配置有清洗單元48,該清洗單元48係用於清洗切割加工後的工件11等。Above the opening 4b and below the cutting unit 18, a blade position detection unit (setting unit) 46 is arranged. This blade position detection unit (setting unit) 46 is used to detect the blade edge (front end of the outer periphery) of the cutting blade 42. The position (height) in the Z axis direction. In addition, an opening 4c is formed at a position opposite to the opening 4b and the opening 4a. In the opening 4c, a cleaning unit 48 is arranged for cleaning the workpiece 11 after cutting and the like.

控制單元(設定單元)50連接有X軸移動機構10、切割單元18、切割單元移動機構22、攝影機44、刀片位置檢測單元46等各構成要素。控制單元50為,例如,對照工件11的加工條件等來控制切割裝置2的各構成要素。The control unit (setting unit) 50 is connected to the X-axis moving mechanism 10, the cutting unit 18, the cutting unit moving mechanism 22, the camera 44, and the blade position detection unit 46. The control unit 50 is, for example, controlling each constituent element of the cutting device 2 based on the processing conditions of the workpiece 11 and the like.

圖3為切割單元18以及刀片位置檢測單元46的放大立體圖。再者,圖3中省略了切割單元18的一部分構成要素。如圖3所示,刀片位置檢測單元46具備位於切割單元18下方的檢測器54。檢測器54為,例如,包含以大致長方體狀構成的支撐部54a,以及設置於支撐部54a後端側(X軸方向的任一方側)上方的檢測部54b。FIG. 3 is an enlarged perspective view of the cutting unit 18 and the blade position detection unit 46. In addition, in FIG. 3, some constituent elements of the cutting unit 18 are omitted. As shown in FIG. 3, the blade position detection unit 46 includes a detector 54 located below the cutting unit 18. The detector 54 includes, for example, a support portion 54a configured in a substantially rectangular parallelepiped shape, and a detection portion 54b provided above the rear end side (any side in the X-axis direction) of the support portion 54a.

檢測部54b的上端部形成有已切出槽口的刀片侵入部54c,該刀片侵入部54c以切割刀片42可侵入之態樣所形成。刀片侵入部54c具備在Y軸方向上互相面對的一對內側面,在此一對內側面中,分別配置有構成光學式感測器的發光部56與受光部58。即,發光部56與受光部58隔著刀片侵入部54c而面對著。The upper end portion of the detection portion 54b is formed with a notched blade intrusion portion 54c formed so that the cutting blade 42 can invade. The blade intruding portion 54c includes a pair of inner side surfaces facing each other in the Y-axis direction, and the pair of inner side surfaces are respectively provided with a light emitting portion 56 and a light receiving portion 58 that constitute an optical sensor. That is, the light-emitting portion 56 and the light-receiving portion 58 face each other via the blade intrusion portion 54c.

位於檢測部54b前方側(X軸方向的另一方側)之支撐部54a的上表面,設置有兩支空氣供給噴嘴60,該空氣供給噴嘴60係用於供應空氣給發光部56與受光部58。此外,在空氣供給噴嘴60的前方,設置有兩支液體供給噴嘴62,該兩支液體供給噴嘴62係用於供應水等液體給發光部56與受光部58。例如,藉由從液體供給噴嘴62供應的液體清洗發光部56與受光部58後,利用從空氣供給噴嘴60供應的空氣乾燥發光部56與受光部58。Two air supply nozzles 60 are provided on the upper surface of the support portion 54a located in front of the detection portion 54b (the other side in the X-axis direction). The air supply nozzles 60 are used to supply air to the light emitting portion 56 and the light receiving portion 58 . In addition, two liquid supply nozzles 62 are provided in front of the air supply nozzle 60. The two liquid supply nozzles 62 are used to supply liquid such as water to the light-emitting portion 56 and the light-receiving portion 58. For example, after cleaning the light-emitting portion 56 and the light-receiving portion 58 with the liquid supplied from the liquid supply nozzle 62, the light-emitting portion 56 and the light-receiving portion 58 are dried using air supplied from the air supply nozzle 60.

在檢測器54的後端面,透過以鉸鏈等形成的連結器64來安裝長方體狀的罩蓋66。此罩蓋66的內部為空洞。因此,例如,以連結器64為中心而使罩蓋66旋轉,藉此可將檢測部54b、空氣供給噴嘴60、液體供給噴嘴62等容納於罩蓋66的內部。A rectangular parallelepiped cover 66 is attached to the rear end surface of the detector 54 through a connector 64 formed by a hinge or the like. The inside of the cover 66 is hollow. Therefore, for example, by rotating the cover 66 around the connector 64, the detection unit 54 b, the air supply nozzle 60, the liquid supply nozzle 62, and the like can be accommodated inside the cover 66.

另一方面,當要以刀片位置檢測單元46檢測切割刀片42外周前端的位置時,使罩蓋66旋轉到圖3所示的位置,而使得檢測部54b、空氣供給噴嘴60、液體供給噴嘴62等露出。藉此,就變得可以使切割刀片42侵入刀片侵入部54c的方式,檢測其外周前端的位置。On the other hand, when the position of the outer peripheral front end of the cutting blade 42 is to be detected by the blade position detection unit 46, the cover 66 is rotated to the position shown in FIG. 3, so that the detection portion 54b, the air supply nozzle 60, and the liquid supply nozzle 62 Wait to reveal. This makes it possible to detect the position of the tip of the outer periphery such that the cutting blade 42 invades the blade intrusion portion 54c.

在關於本實施方式的工件加工方法中,首先,基於上述切割刀片42外周前端的高度,將切割單元18的作為基準的高度(基準高度H0 )設定於切割裝置2(基準設定步驟)。具體而言,首先,將已使其旋轉之切割刀片42定位於刀片位置檢測單元46的檢測器54上方。然後,如圖3所示,在使光從發光部56放射的狀態下,使切割單元18下降,使已使其旋轉的切割刀片42侵入刀片侵入部54c(發光部56與受光部58之間)。In the workpiece processing method of the present embodiment, first, based on the height of the front end of the outer periphery of the cutting blade 42, the height (reference height H 0 ) of the cutting unit 18 as a reference is set to the cutting device 2 (reference setting step). Specifically, first, the cutting blade 42 that has been rotated is positioned above the detector 54 of the blade position detection unit 46. Then, as shown in FIG. 3, in a state where light is emitted from the light emitting portion 56, the cutting unit 18 is lowered, and the rotating cutting blade 42 is made to invade the blade intruding portion 54 c (between the light emitting portion 56 and the light receiving portion 58 ).

藉此,從發光部56往受光部58放射之光線,因切割刀片42而被部分地遮擋,受光部58的受光量會逐漸降低。控制單元50監視受光部58的受光量(相當於受光量的電壓值等),以及切割單元18的高度,例如,將受光部58的受光量降低到預定閾值時之切割單元18的高度作為基準高度H0 ,使其記憶於控制單元50內的記憶部。As a result, the light radiated from the light-emitting portion 56 to the light-receiving portion 58 is partially blocked by the cutting blade 42, and the amount of light received by the light-receiving portion 58 gradually decreases. The control unit 50 monitors the light receiving amount of the light receiving unit 58 (voltage value equivalent to the light receiving amount, etc.) and the height of the cutting unit 18, for example, the height of the cutting unit 18 when the light receiving amount of the light receiving unit 58 is reduced to a predetermined threshold is used as a reference The height H 0 makes it memorize in the memory section of the control unit 50.

在本實施方式中,係將切割刀片42外周的前端與卡盤台14的保持面14a接觸時之切割單元18的高度設定為基準高度H0 。即,以設定此基準高度H0 的方式,調整受光部58的受光量閾值等。但是,基準高度H0 也可以不一定要以切割刀片42的外周前端與卡盤台14的保持面14a接觸的方式來設定。In the present embodiment, the height of the cutting unit 18 when the front end of the outer periphery of the cutting blade 42 is in contact with the holding surface 14a of the chuck table 14 is set as the reference height H 0 . That is, the threshold value of the amount of light received by the light receiving unit 58 and the like are adjusted so that the reference height H 0 is set. However, the reference height H 0 may not necessarily be set so that the outer peripheral tip of the cutting blade 42 contacts the holding surface 14 a of the chuck table 14.

再者,在本實施方式中,雖然就使用上述刀片位置檢測單元46以非接觸設定基準高度H0 的例子進行了說明,但對基準高度H0 的設定方法並無限制。例如,也可以利用下述方法設定基準高度H0 :在卡盤台14與切割刀片42之間形成電位差,使此等構件接觸並確認導通。Furthermore, in the present embodiment, although the example in which the above-mentioned blade position detection unit 46 is used to set the reference height H 0 in a non-contact manner has been described, the method of setting the reference height H 0 is not limited. For example, the reference height H 0 may be set by a method in which a potential difference is formed between the chuck table 14 and the cutting blade 42 to contact these members and confirm conduction.

設定基準高度H0 後,以能適當地切斷為卡盤台14所保持之工件11的方式,將切割單元18的作為目標的高度(目標高度H1 )設定於切割裝置2 (目標設定步驟)。更具體而言,以能夠使切割刀片42切入至與工件11共同保持於卡盤台14之切割膠膜21的預定深度的方式,設定目標高度H1 。After setting the reference height H 0 , the target height (target height H 1 ) of the cutting unit 18 is set to the cutting device 2 in such a way that the workpiece 11 held by the chuck table 14 can be cut appropriately (target setting step ). More specifically, the target height H 1 is set in such a manner that the cutting blade 42 can be cut to a predetermined depth of the cutting adhesive film 21 held by the chuck table 14 together with the workpiece 11.

例如,切割膠膜21的厚度為T0 ,希望使切割刀片42切入至離此切割膠膜21的第一面21a之深度為D0 的位置時(即,第一面21a與切割刀片42之最下點的距離為D0 時),目標高度H1 係成為H0 +T0 -D0 。For example, if the thickness of the cutting film 21 is T 0 , it is desirable to cut the cutting blade 42 to a position where the depth from the first surface 21 a of the cutting film 21 is D 0 (that is, between the first surface 21 a and the cutting blade 42 When the distance of the lowest point is D 0 ), the target height H 1 becomes H 0 + T 0- D 0 .

控制單元50使所得到的目標高度H1 記憶於控制單元50內的記憶部。再者,用於算出目標高度H1 的深度D0 ,其較佳為5μm~35μm,具代表性的則為10μm程度。但是,深度D0 的值在可適當地切斷工件11的範圍內,可以任意調整。The control unit 50 memorizes the obtained target height H 1 in the memory unit in the control unit 50. Furthermore, the depth D 0 used for calculating the target height H 1 is preferably 5 μm to 35 μm, and typically is about 10 μm. However, the value of the depth D 0 is within a range in which the work 11 can be appropriately cut, and can be arbitrarily adjusted.

設定基準高度H0 與目標高度H1 後,切割加工工件11(第一切割步驟)。圖4(A)以及圖4(B)為表示切割加工工件11之情況的局部剖面側視圖。具體而言,首先,使黏貼於工件11的背面11b側的切割膠膜21接觸卡盤台14的保持面14a,使吸引源的負壓起作用。同時,以夾具16固定框架23。藉此,工件11以正面11a側往上方露出的狀態被保持。After setting the reference height H 0 and the target height H 1 , the workpiece 11 is cut and processed (first cutting step). 4(A) and 4(B) are partial cross-sectional side views showing a state where the workpiece 11 is cut and processed. Specifically, first, the dicing film 21 adhered to the back surface 11b side of the work 11 is brought into contact with the holding surface 14a of the chuck table 14 to make the suction source negative pressure act. At the same time, the frame 23 is fixed with the clamp 16. Thereby, the workpiece 11 is held in a state where the front surface 11a side is exposed upward.

其次,例如,使卡盤台14旋轉,並使對象的加工預定線13與切割裝置2之X軸方向一致。此外,使卡盤台14以及切割單元18做相對移動,使切割刀片42的位置與對象的加工預定線13的延長線上方一致。Next, for example, the chuck table 14 is rotated, and the target processing line 13 is aligned with the X-axis direction of the cutting device 2. In addition, the chuck table 14 and the cutting unit 18 are relatively moved so that the position of the cutting blade 42 coincides with the extension of the target processing line 13.

然後,如圖4(A)所示,一面使切割刀片42旋轉,一面使切割單元18下降至目標高度H1 。其結果,切割刀片42在工件11與框架23之間的切割膠膜21露出的第一區域,切入切割膠膜21。Then, as shown in FIG. 4(A), while the cutting blade 42 is rotated, the cutting unit 18 is lowered to the target height H 1 . As a result, the cutting blade 42 cuts into the cutting film 21 in the first area where the cutting film 21 between the workpiece 11 and the frame 23 is exposed.

其後,使卡盤台14在X軸方向上移動。具體而言,如圖4(A)以及圖4(B)所示,以使切割刀片42相對移動到對於工件11和第一區域相反側之第二區域的方式,使卡盤台14在X軸方向上移動。Thereafter, the chuck table 14 is moved in the X-axis direction. Specifically, as shown in FIGS. 4(A) and 4(B), the chuck table 14 is positioned at X in such a manner that the cutting blade 42 is relatively moved to the second area opposite to the workpiece 11 and the first area. Move in the axis direction.

藉此,沿著對象的加工預定線13切割加工工件11。再者,此第二區域也和第一區域同樣,露出切割膠膜21。在本實施方式中,設卡盤台14在X軸方向上移動的距離(使切割刀片42做相對移動的距離)為x0 。Thereby, the workpiece 11 is cut and processed along the planned processing line 13 of the object. In addition, the second area is exposed in the same way as the first area. In this embodiment, the distance that the chuck table 14 moves in the X-axis direction (the distance that the cutting blade 42 moves relatively) is x 0 .

圖5(A)為表示被切割加工後之工件11等的俯視圖。上述切割加工的結果,工件11上會形成沿著對象的加工預定線13切斷工件11之態樣的切口((kerf)11c。在本實施方式中,一面使切割刀片42對切割膠膜21做切入,一面使其從第一區域相對移動至第二區域。因此,如圖5(A)所示,在切割膠膜21上也會形成藉由與切割刀片42的接觸所造成的接觸痕跡21b。FIG. 5(A) is a plan view showing the workpiece 11 etc. after being cut. As a result of the cutting process described above, a cut (kerf) 11c is formed on the workpiece 11 along the line to be processed 13 of the object to cut the workpiece 11. In this embodiment, the cutting blade 42 is opposed to the cutting film 21 Do the cutting, and move it from the first area to the second area relatively. Therefore, as shown in FIG. 5(A), the contact marks caused by the contact with the cutting blade 42 will also be formed on the cutting film 21 21b.

例如,在沿著對象的加工預定線13切割加工工件11的同時,在切割膠膜21上形成接觸痕跡21b後,取得用於修正上述目標高度H1 的修正值(修正值取得步驟)。在本實施方式中,以基於由接觸痕跡21b的長度與切割刀片42的外徑(直徑)算出之接觸痕跡21b的深度,取得修正值。For example, while cutting the workpiece 11 along the line to be processed 13 of the object, and after forming the contact mark 21 b on the dicing film 21, a correction value for correcting the target height H 1 is obtained (correction value obtaining step). In the present embodiment, the correction value is obtained based on the depth of the contact mark 21b calculated from the length of the contact mark 21b and the outer diameter (diameter) of the cutting blade 42.

再者,此處為了說明方便起見,雖然就沿著一條加工預定線13切割加工工件11後,取得修正值的例子進行說明,但也可以在沿著多條加工預定線13切割加工工件11後,取得修正值。在取得修正值之前,被切割加工之加工預定線13的數量(即,在第一切割步驟要被切割加工之加工預定線的數量)等,可按照切割刀片42磨損的狀況等進行調整。In addition, for the sake of convenience of explanation, although an example in which the correction value is obtained after cutting the processed workpiece 11 along one planned machining line 13 is described, it is also possible to cut the processed workpiece 11 along multiple planned machining lines 13 After that, get the correction value. Before obtaining the correction value, the number of planned processing lines 13 to be cut (that is, the number of planned processing lines to be cut in the first cutting step), etc., can be adjusted according to the state of wear of the cutting blade 42 and the like.

圖5(B)為表示使切割刀片42當場切入時(即,不使切割刀片42在X軸方向上做相對移動時),所形成之接觸痕跡的深度D的概念圖。從圖5(B)所示的幾何學上的關係來看,切割刀片42當場切入時,所形成之接觸痕跡的深度D可作為切割刀片42的直徑d,此接觸痕跡的長度(X軸方向的長度)則作為L0 ,並以算式(1)表示。FIG. 5(B) is a conceptual diagram showing the depth D of the contact trace formed when the cutting blade 42 is cut in the field (that is, when the cutting blade 42 is not relatively moved in the X-axis direction). From the geometric relationship shown in FIG. 5(B), when the cutting blade 42 cuts in on the spot, the depth D of the contact trace formed can be used as the diameter d of the cutting blade 42, and the length of the contact trace (X-axis direction) The length of) is regarded as L 0 and expressed by formula (1).

【數學式1】

Figure 02_image001
【Mathematical Formula 1】
Figure 02_image001

如上述,在本實施方式中,為了形成接觸痕跡21b,將切割刀片42相對移動的距離設定為x0 。因此,若設接觸痕跡21b的長度(X軸方向的長度)為L1 ,則L0 成為L1 -x0 。即,接觸痕跡21b的深度D1 (≒D)可變成用接觸痕跡21b的長度L1 ,以算式(2)表示。As described above, in the present embodiment, in order to form the contact mark 21b, the relative movement distance of the cutting blade 42 is set to x 0 . Therefore, if the length of the contact trace 21b (the length in the X-axis direction) is L 1 , L 0 becomes L 1 -x 0 . That is, the depth D 1 (≒D) of the contact mark 21b can be expressed by the formula (2) using the length L 1 of the contact mark 21b.

【數學式2】

Figure 02_image003
【Mathematical Formula 2】
Figure 02_image003

因此,要取得修正值時,首先,取得接觸痕跡21b的長度L1 。在本實施方式中,以攝影機44拍攝接觸痕跡21b而形成圖像,基於映現於此圖像上的接觸痕跡21b,控制單元50算出長度L1 。再者,接觸痕跡21b的影像以及長度L1 的取得也可以與上述工件11的切割加工同時進行。於此情況,就變成修正值取得步驟的一部分與第一切割步驟同時進行。Therefore, to obtain the correction value, first, the length L 1 of the contact mark 21b is obtained. In this embodiment, the camera 44 captures the contact trace 21b to form an image, and based on the contact trace 21b reflected on the image, the control unit 50 calculates the length L 1 . In addition, the image of the contact mark 21b and the length L 1 may be acquired simultaneously with the cutting process of the workpiece 11 described above. In this case, it becomes part of the correction value acquisition step and the first cutting step is performed simultaneously.

切割刀片42的直徑d以及切割刀片42相對移動的距離x0 為已知。因此,利用算出接觸痕跡21b之長度L1 ,可從上述算式(2)算出接觸痕跡21b的深度D1 。由於磨損等所造成之切割刀片42的直徑d的減少,對接觸痕跡21b的深度D1 幾乎沒有影響,所以可以忽略不計。The diameter d of the cutting blade 42 and the relative moving distance x 0 of the cutting blade 42 are known. Therefore, by calculating the length L 1 of the contact mark 21b, the depth D 1 of the contact mark 21b can be calculated from the above formula (2). The reduction in the diameter d of the cutting blade 42 due to wear or the like has little effect on the depth D 1 of the contact mark 21b, so it can be ignored.

控制單元50算出接觸痕跡21b的深度D1 後,基於此深度D1 取得修正值。在本實施方式中,在算出目標高度H1 時,將所使用的深度D0 與接觸痕跡21b的深度D1 之差D0 -D1 作為修正值。控制單元50取得修正值後,使其記憶於控制單元50內的記憶部。After calculating the depth D 1 of the contact mark 21b, the control unit 50 obtains a correction value based on the depth D 1 . In the present embodiment, when the target height H 1 is calculated, the difference D 0 -D 1 between the used depth D 0 and the depth D 1 of the contact mark 21 b is used as a correction value. After the control unit 50 obtains the correction value, it stores it in the memory unit in the control unit 50.

取得修正值後,將切割單元18定位於依據此修正值修正目標高度H1 後而得到之高度,切割加工工件11(第二切割步驟)。圖6(A)為表示切割加工工件11之情況的局部剖面側視圖,圖6(B)為表示被切割加工後之工件11等的俯視圖。After obtaining the correction value, the cutting unit 18 is positioned at the height obtained by correcting the target height H 1 according to the correction value, and the workpiece 11 is cut (second cutting step). FIG. 6(A) is a partial cross-sectional side view showing a state where the work 11 is cut, and FIG. 6(B) is a plan view showing the work 11 and the like after being cut.

具體的切割加工程序與上述第一切割步驟相同。具體而言,首先,使卡盤台14以及切割單元18做相對移動,使切割刀片42的位置與對象的加工預定線13的延長線上方一致。再者,剛被切割加工完之加工預定線13的方向與對象之加工預定線13的方向不同時,必須旋轉卡盤台14,使對象的加工預定線13與切割裝置2的X軸方向一致。The specific cutting process is the same as the above-mentioned first cutting step. Specifically, first, the chuck table 14 and the cutting unit 18 are relatively moved so that the position of the cutting blade 42 coincides with the extension of the target processing line 13. Moreover, when the direction of the planned processing line 13 just after the cutting process is different from the direction of the target planned processing line 13, the chuck table 14 must be rotated so that the target planned processing line 13 and the X axis direction of the cutting device 2 coincide .

其次,如圖6(A)所示,一面使切割刀片42旋轉,一面使切割單元18下降到預定的高度H2 。在本實施方式中,例如,將目標高度H1 與修正值D0 -D1 之差H1 -(D0 -D1 )當作預定的高度H2 使用。此為只有因切割刀片42的磨損而切入變淺的部分,意味著將切割單元18定位於較低的位置。Next, as shown in FIG. 6(A), while rotating the cutting blade 42, the cutting unit 18 is lowered to a predetermined height H 2 . In this embodiment, for example, the difference H 1 -(D 0 -D 1 ) between the target height H 1 and the correction values D 0 -D 1 is used as the predetermined height H 2 . This is a portion where only the cut-in becomes shallow due to the wear of the cutting blade 42, which means that the cutting unit 18 is positioned at a lower position.

然後,使卡盤台14在X軸方向上移動。藉此,工件11會沿著對象的加工預定線13而被切割加工。圖6(B)為表示被切割加工後之工件11等的俯視圖。上述切割加工的結果,工件11上會形成沿著對象的加工預定線13切斷工件11之態樣的切口(kerf)11d。Then, the chuck table 14 is moved in the X-axis direction. As a result, the workpiece 11 is cut and processed along the planned processing line 13 of the object. FIG. 6(B) is a plan view showing the workpiece 11 etc. after being cut. As a result of the above-mentioned cutting process, a kerf 11d is formed on the workpiece 11 along the line to be processed 13 of the object to cut the workpiece 11.

此處,由於按照上述程序取得之修正值來修正了目標高度H1 ,即使在切割刀片42磨損時,也可以使此切割刀片42切入到適當的高度來切割加工工件11。再者,在之後的切割刀片42磨損等之場合,於再次進行修正值取得步驟而取得修正值後,進行更進一步的切割步驟即可。Here, since the target height H 1 is corrected according to the correction value obtained by the above procedure, even when the cutting blade 42 is worn, the cutting blade 42 can be cut to an appropriate height to cut the workpiece 11. In addition, when the cutting blade 42 is worn later, etc., after performing the correction value acquisition step again to obtain the correction value, a further cutting step may be performed.

如以上,在關於本實施方式之工件加工方法中,基於藉由切割刀片42於切割膠膜21上形成之接觸痕跡21b的長度,取得用於修正切割單元18的作為目標的高度的修正值,其後,將切割單元18定位於依據此修正值修正後之高度來切割加工工件11。As described above, in the workpiece processing method of the present embodiment, based on the length of the contact mark 21b formed on the dicing film 21 by the cutting blade 42, a correction value for correcting the target height of the cutting unit 18 is obtained, Thereafter, the cutting unit 18 is positioned at the height corrected according to this correction value to cut the workpiece 11.

因此,每當切割刀片42磨損時,即使不用刀片位置檢測單元(設定單元)46等檢測切割刀片42外周前端的高度,也可以適當地調整切割單元18的高度。即,當調整切割刀片42的高度時,切割刀片42相對移動的距離不需要如以往那麼大即可完成,所以可以不使產量大幅降低而適當地調整切割刀片42的高度。Therefore, whenever the cutting blade 42 is worn, the height of the cutting unit 18 can be adjusted appropriately even without using the blade position detection unit (setting unit) 46 or the like to detect the height of the front end of the outer periphery of the cutting blade 42. That is, when the height of the cutting blade 42 is adjusted, the relative moving distance of the cutting blade 42 does not need to be as large as in the past, so the height of the cutting blade 42 can be adjusted appropriately without greatly reducing the output.

再者,本發明不受上述實施方式的記載限制,可進行各種變更而實施。例如,在上述實施方式中,雖然在切割加工工件11的第一切割步驟中,於工件11上形成切口(kerf)11c的同時,在切割膠膜21上形成接觸痕跡21b,但也可以在第一切割步驟後,以不同的步驟形成接觸痕跡(接觸痕跡形成步驟)。In addition, the present invention is not limited by the description of the above embodiment, and can be implemented with various changes. For example, in the above embodiment, in the first cutting step of cutting the work piece 11, while forming a cut (kerf) 11 c on the work piece 11, a contact mark 21 b is formed on the dicing film 21, but it may be After a cutting step, contact marks are formed in different steps (contact mark forming step).

圖7為表示用與上述實施方式不同的步驟形成接觸痕跡21c的切割膠膜21等的俯視圖。要形成如這種接觸痕跡21c時,例如,在第一切割步驟中,沿著對象的加工預定線13切割加工工件11後,使切割刀片42切入比第二區域更外側(即框架23側)的第三區域。FIG. 7 is a plan view showing the dicing adhesive film 21 and the like in which the contact marks 21c are formed in different steps from the above-described embodiment. When such contact marks 21c are to be formed, for example, in the first cutting step, after cutting the workpiece 11 along the planned processing line 13 of the object, the cutting blade 42 is cut to the outside of the second area (ie, the frame 23 side) The third area.

即,在第一切割步驟中,切割加工工件11後,使切割單元18上升,再使卡盤台14在X軸方向上移動。具體而言,以切割刀片42相對移動至第三區域上方為止之方式,使卡盤台14在X軸方向上移動。That is, in the first cutting step, after the workpiece 11 is cut, the cutting unit 18 is raised, and then the chuck table 14 is moved in the X-axis direction. Specifically, the chuck table 14 is moved in the X-axis direction so that the cutting blade 42 relatively moves above the third area.

然後,例如,在卡盤台14未移動的狀態下,使切割單元18下降至目標高度H1 。其結果,切割刀片42在工件11與框架23之間的切割膠膜21露出的第三區域,切入切割膠膜21。Then, for example, in a state where the chuck table 14 is not moved, the cutting unit 18 is lowered to the target height H 1 . As a result, the cutting blade 42 cuts into the cutting film 21 in the third area where the cutting film 21 between the workpiece 11 and the frame 23 is exposed.

藉此,在切割膠膜21上形成接觸痕跡21c。如此,藉由使切割刀片42當場切入的程序,所形成之切割痕跡21c的長度(X軸方向的長度)L2 等於上述算式(1)之接觸痕跡的長度L0 。因此,控制單元50可從算式(1)算出接觸痕跡21c的深度D2 (=D))。With this, a contact mark 21c is formed on the dicing film 21. In this way, by the procedure of cutting the cutting blade 42 on the spot, the length (length in the X-axis direction) L 2 of the formed cutting mark 21 c is equal to the length L 0 of the contact mark in the above formula (1). Therefore, the control unit 50 can calculate the depth D 2 (=D) of the contact mark 21c from the formula (1).

其他,關於上述實施方式的構造、方法等,只要不脫離本發明目的的範圍,就可以適當變更而實施。In addition, the structure, method, and the like of the above-described embodiment can be appropriately modified and implemented without departing from the scope of the object of the present invention.

11‧‧‧工件 11a‧‧‧正面 11b‧‧‧背面 11c、11d‧‧‧切口(kerf) 13‧‧‧加工預定線(切割道) 15‧‧‧元件 21‧‧‧切割膠膜 21a‧‧‧第一面 21b、21c接觸痕跡 23‧‧‧框架 23a‧‧‧開口 2‧‧‧切割裝置 4‧‧‧基台 4a、4b、4c‧‧‧開口 6‧‧‧卡匣升降機 8‧‧‧卡匣 10‧‧‧X軸移動機構(加工進給機構) 10a‧‧‧工作台罩蓋 12‧‧‧波紋狀罩蓋 14‧‧‧卡盤台(保持台) 14a‧‧‧保持面 14b‧‧‧吸引通路 16‧‧‧夾具 18‧‧‧切割單元 20‧‧‧支撐構造 22‧‧‧切割單元移動機構(分度進給機構、切入進給機構) 24‧‧‧Y軸導軌 26‧‧‧Y軸移動板 28‧‧‧Y軸滾珠螺桿 30‧‧‧Z軸導軌 32‧‧‧Z軸移動板 34‧‧‧Z軸滾珠螺桿 36‧‧‧Z軸脈衝馬達 38‧‧‧主軸外殼 40‧‧‧主軸 42‧‧‧切割刀片 44‧‧‧攝影機(攝影單元) 46‧‧‧刀片位置檢測單元(設定單元) 48‧‧‧清洗單元 50‧‧‧控制單元(設定單元) 54‧‧‧檢測器 54a‧‧‧支撐部 54b‧‧‧檢測部 54c‧‧‧刀片侵入部 56‧‧‧發光部 58‧‧‧受光部 60‧‧‧空氣供給噴嘴 62‧‧‧液體供給噴嘴 64‧‧‧連結器 66‧‧‧罩蓋11‧‧‧Workpiece 11a‧‧‧Front 11b‧‧‧Back 11c, 11d‧‧‧cut (kerf) 13‧‧‧Scheduled processing line (cutting path) 15‧‧‧ Components 21‧‧‧Cutting film 21a‧‧‧The first side 21b, 21c contact marks 23‧‧‧Frame 23a‧‧‧ opening 2‧‧‧Cutting device 4‧‧‧Abutment 4a, 4b, 4c‧‧‧ opening 6‧‧‧ cassette elevator 8‧‧‧Cassette 10‧‧‧X axis moving mechanism (processing feed mechanism) 10a‧‧‧Workbench cover 12‧‧‧Corrugated cover 14‧‧‧Chuck table (holding table) 14a‧‧‧Keep 14b‧‧‧Attraction 16‧‧‧Fixture 18‧‧‧Cutting unit 20‧‧‧Support structure 22‧‧‧Moving mechanism of cutting unit (indexing feed mechanism, cutting feed mechanism) 24‧‧‧Y axis guide 26‧‧‧Y axis moving board 28‧‧‧Y-axis ball screw 30‧‧‧Z axis guide 32‧‧‧Z moving plate 34‧‧‧Z-axis ball screw 36‧‧‧Z-axis pulse motor 38‧‧‧spindle housing 40‧‧‧spindle 42‧‧‧Cutting blade 44‧‧‧Camera (Photography unit) 46‧‧‧Blade position detection unit (setting unit) 48‧‧‧cleaning unit 50‧‧‧Control unit (setting unit) 54‧‧‧Detector 54a‧‧‧Support 54b‧‧‧Detection Department 54c‧‧‧Blade intrusion 56‧‧‧Lighting Department 58‧‧‧Receiving Department 60‧‧‧Air supply nozzle 62‧‧‧Liquid supply nozzle 64‧‧‧Connector 66‧‧‧Cover

圖1表示工件等構成例的立體圖。 圖2表示切割裝置之構成例的立體圖。 圖3為切割單元以及刀片位置檢測單元的放大立體圖。 圖4的圖4(A)以及圖4(B)表示切割加工工件之情況的局部剖面側視圖。 圖5的圖5(A)表示被切割加工後之工件等的俯視圖,圖5(B)表示接觸痕跡之深度的概念圖。 圖6的圖6(A)表示切割加工工件之情況的局部剖面側視圖,圖6(B)表示被切割加工後之工件等的俯視圖。 圖7表示用不同的步驟形成接觸痕跡之切割膠膜等的俯視圖。FIG. 1 shows a perspective view of a configuration example of a workpiece and the like. 2 is a perspective view showing a configuration example of a cutting device. 3 is an enlarged perspective view of a cutting unit and a blade position detection unit. 4(A) and 4(B) of FIG. 4 show a partial cross-sectional side view of a state where a workpiece is cut and processed. 5(A) of FIG. 5 shows a plan view of a workpiece and the like after being cut, and FIG. 5(B) shows a conceptual view of the depth of contact marks. 6(A) of FIG. 6 shows a partial cross-sectional side view of a state where a workpiece is cut and processed, and FIG. 6(B) shows a plan view of the workpiece and the like after being cut and processed. FIG. 7 shows a plan view of a dicing film or the like that forms contact marks in different steps.

11‧‧‧工件 11‧‧‧Workpiece

11a‧‧‧正面 11a‧‧‧Front

11c‧‧‧切口 11c‧‧‧Notch

13‧‧‧加工預定線 13‧‧‧Scheduled processing line

15‧‧‧元件 15‧‧‧ Components

21‧‧‧切割膠膜 21‧‧‧Cutting film

21a‧‧‧第一面 21a‧‧‧The first side

21b‧‧‧接觸痕跡 21b‧‧‧Contact marks

23‧‧‧框架 23‧‧‧Frame

23a‧‧‧開口 23a‧‧‧ opening

42‧‧‧切割刀片 42‧‧‧Cutting blade

L1‧‧‧長度 L 1 ‧‧‧ length

Claims (4)

一種工件加工方法,係使用切割裝置對黏貼切割膠膜的工件進行切割加工,該切割膠膜貼在環狀框架開口上,該切割裝置包含:保持工件之卡盤台;切割單元,安裝有切割刀片,該切割刀片對保持在該卡盤台上的該工件進行切割加工;以及設定單元,基於該切割刀片外周前端的高度,設定該切割單元的作為基準的高度;其特徵在於包含以下步驟: 基準設定步驟,基於該切割刀片外周前端的高度,設定該切割單元的作為該基準的高度; 目標設定步驟,以使該切割刀片切入到該切割膠膜的預定深度的方式,來設定該切割單元的作為目標的高度; 第一切割步驟,在將該切割單元定位在作為該目標的高度的狀態下,藉由使該切割單元與該卡盤台做相對移動來切割加工該工件; 修正值取得步驟,與該第一切割步驟同時,或在該第一切割步驟之後,基於該切割刀片在該切割膠膜上形成之接觸痕跡的長度,取得用於修正該切割單元的作為該目標的高度的修正值;以及, 第二切割步驟,在將該切割單元定位於依據該修正值修正作為該目標的高度後而得到的高度之狀態下,藉由使該切割單元與該卡盤台做相對移動來切割加工該工件。A workpiece processing method, which uses a cutting device to cut a workpiece adhered with a cutting film. The cutting film is attached to an opening of a ring frame. The cutting device includes: a chuck table that holds the workpiece; a cutting unit, which is equipped with a cutting A cutting blade that cuts the workpiece held on the chuck table; and a setting unit that sets the height of the cutting unit as a reference based on the height of the front end of the outer periphery of the cutting blade; it is characterized by including the following steps: The reference setting step is to set the height of the cutting unit as the reference based on the height of the front end of the outer periphery of the cutting blade; The target setting step is to set the target height of the cutting unit in such a manner that the cutting blade cuts into the predetermined depth of the cutting film; In the first cutting step, in a state where the cutting unit is positioned at the height of the target, the workpiece is cut and processed by relatively moving the cutting unit and the chuck table; The correction value obtaining step, at the same time as the first cutting step, or after the first cutting step, based on the length of the contact trace formed on the cutting adhesive film by the cutting blade, obtains the target for correcting the cutting unit as the target The corrected value of the height; and, In the second cutting step, the workpiece is cut and processed by relatively moving the cutting unit and the chuck table in a state where the cutting unit is positioned at a height obtained by correcting the height as the target according to the correction value . 如申請專利範圍第1項所述之工件加工方法,其中,在該第一切割步驟中,使該切割單元在該工件與該框架之間的該切割膠膜露出的第一區域下降,下降到作為該目標的高度後,以使該切割刀片相對於該工件移動,移動至與該第一區域相反側之該切割膠膜露出的第二區域為止的方式,藉由使該切割單元與該卡盤台做相對移動,於切割加工該工件的同時,在該切割膠膜上形成該接觸痕跡。The workpiece processing method as described in item 1 of the patent application scope, wherein, in the first cutting step, the cutting unit is caused to descend to the first area exposed by the cutting glue film between the workpiece and the frame to As the height of the target, the cutting unit and the card are moved in such a manner that the cutting blade moves relative to the workpiece to the second area where the cutting adhesive film is exposed on the side opposite to the first area The pallet moves relatively, forming the contact mark on the cutting adhesive film while cutting the workpiece. 如申請專利範圍第1項所述之工件加工方法,其中更包含接觸痕跡形成步驟,其在該第一切割步驟之後,該修正值取得步驟之前,使該切割單元在該工件與該框架之間的該切割膠膜之露出區域下降,藉由下降到作為該目標的高度,在該切割膠膜上形成該接觸痕跡。The workpiece processing method as described in item 1 of the patent application scope, which further includes a contact mark forming step, after the first cutting step and before the correction value obtaining step, the cutting unit is placed between the workpiece and the frame The exposed area of the dicing film decreases, and by dropping to the height as the target, the contact mark is formed on the dicing film. 如申請專利範圍第1至3項中任一項所述之工件加工方法,其中,該修正值取得步驟中,基於由該接觸痕跡的長度與該切割刀片的外徑算出之接觸痕跡的深度,取得該修正值。The workpiece processing method according to any one of claims 1 to 3, wherein in the correction value obtaining step, based on the depth of the contact mark calculated from the length of the contact mark and the outer diameter of the cutting blade, Obtain the correction value.
TW108116990A 2018-05-21 2019-05-16 Workpiece processing method TWI779194B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2018097231A JP2019202356A (en) 2018-05-21 2018-05-21 Processing method for work piece
JP2018-097231 2018-05-21

Publications (2)

Publication Number Publication Date
TW202003183A true TW202003183A (en) 2020-01-16
TWI779194B TWI779194B (en) 2022-10-01

Family

ID=68622443

Family Applications (1)

Application Number Title Priority Date Filing Date
TW108116990A TWI779194B (en) 2018-05-21 2019-05-16 Workpiece processing method

Country Status (3)

Country Link
JP (1) JP2019202356A (en)
CN (1) CN110509444B (en)
TW (1) TWI779194B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7463037B2 (en) * 2020-08-26 2024-04-08 株式会社ディスコ Testing board and testing method
JP7539813B2 (en) * 2020-10-22 2024-08-26 株式会社ディスコ Detection Method
JP7660973B2 (en) * 2021-04-21 2025-04-14 株式会社ディスコ Wafer cutting method
CN117790294B (en) * 2023-12-29 2026-02-06 沈阳和研科技股份有限公司 Cutting blade height adjusting method and device for dicing saw and dicing saw

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2662703B2 (en) * 1988-10-28 1997-10-15 住友電気工業株式会社 Semiconductor wafer dicing equipment
JPH0767692B2 (en) * 1989-09-07 1995-07-26 株式会社東京精密 Cutting method of slicing machine
JP3157751B2 (en) * 1997-09-03 2001-04-16 山口日本電気株式会社 Dicing method for semiconductor substrate
JP5858684B2 (en) * 2011-08-15 2016-02-10 株式会社ディスコ Cutting method
JP6251574B2 (en) * 2014-01-14 2017-12-20 株式会社ディスコ Cutting method
JP2015214002A (en) * 2014-05-13 2015-12-03 株式会社ディスコ Cutting method
JP2016192494A (en) * 2015-03-31 2016-11-10 株式会社ディスコ Wafer dividing method
JP6727699B2 (en) * 2016-04-19 2020-07-22 株式会社ディスコ How to set up cutting equipment

Also Published As

Publication number Publication date
JP2019202356A (en) 2019-11-28
CN110509444B (en) 2022-10-18
CN110509444A (en) 2019-11-29
TWI779194B (en) 2022-10-01

Similar Documents

Publication Publication Date Title
TWI653677B (en) Alignment method
TWI657494B (en) Wafer processing method
CN107210206B (en) Cutting device and method of manufacturing a plurality of products by cutting objects to be cut
JP7282461B2 (en) Inspection equipment and processing equipment
TWI606549B (en) Suction cup table
JP7062449B2 (en) How to cut the workpiece
CN111834254B (en) Processing device and processing method of processed object
TWI779194B (en) Workpiece processing method
CN105702627B (en) Cutting device
JP6415349B2 (en) Wafer alignment method
US9569852B2 (en) Alignment method
TWI713706B (en) How to install the cutting device
JP2018078145A (en) Cutting equipment
CN110893574B (en) Edge trimming device
CN103659002B (en) Processing unit (plant)
TW202234492A (en) Method of processing workpiece
CN110039674A (en) The management method and cutting apparatus of cutting tool
JP2012151225A (en) Method for measuring cut groove
TW202138114A (en) Cutting apparatus
CN110076917B (en) Method for setting cutting device
TWI754742B (en) Processing method of fan-shaped wafer
JP5356803B2 (en) Wafer processing equipment
CN105914164B (en) Processing device
JP7300938B2 (en) Kerf recognition method
JP2009206362A (en) Method of cutting plate-like material

Legal Events

Date Code Title Description
GD4A Issue of patent certificate for granted invention patent