TW202020562A - 著色感光性樹脂組成物、膜、濾色器、濾色器之製造方法、結構體、固體攝像元件及圖像顯示裝置 - Google Patents

著色感光性樹脂組成物、膜、濾色器、濾色器之製造方法、結構體、固體攝像元件及圖像顯示裝置 Download PDF

Info

Publication number
TW202020562A
TW202020562A TW108131844A TW108131844A TW202020562A TW 202020562 A TW202020562 A TW 202020562A TW 108131844 A TW108131844 A TW 108131844A TW 108131844 A TW108131844 A TW 108131844A TW 202020562 A TW202020562 A TW 202020562A
Authority
TW
Taiwan
Prior art keywords
resin composition
group
photosensitive resin
mass
compound
Prior art date
Application number
TW108131844A
Other languages
English (en)
Chinese (zh)
Inventor
奈良裕樹
Original Assignee
日商富士軟片股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商富士軟片股份有限公司 filed Critical 日商富士軟片股份有限公司
Publication of TW202020562A publication Critical patent/TW202020562A/zh

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10—Integrated devices
    • H10F39/12—Image sensors

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials For Photolithography (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Optical Filters (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
TW108131844A 2018-09-26 2019-09-04 著色感光性樹脂組成物、膜、濾色器、濾色器之製造方法、結構體、固體攝像元件及圖像顯示裝置 TW202020562A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2018180310 2018-09-26
JP2018-180310 2018-09-26

Publications (1)

Publication Number Publication Date
TW202020562A true TW202020562A (zh) 2020-06-01

Family

ID=69951836

Family Applications (1)

Application Number Title Priority Date Filing Date
TW108131844A TW202020562A (zh) 2018-09-26 2019-09-04 著色感光性樹脂組成物、膜、濾色器、濾色器之製造方法、結構體、固體攝像元件及圖像顯示裝置

Country Status (3)

Country Link
JP (2) JPWO2020066438A1 (fr)
TW (1) TW202020562A (fr)
WO (1) WO2020066438A1 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7354592B2 (ja) * 2019-05-31 2023-10-03 東洋インキＳｃホールディングス株式会社 着色組成物、カラーフィルタ、固体撮像素子および液晶表示装置
JP7707879B2 (ja) * 2021-11-29 2025-07-15 ａｒｔｉｅｎｃｅ株式会社 感光性着色組成物、それを用いた硬化膜、カラーフィルタ、画像表示装置、固体撮像素子

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI763186B (zh) * 2015-03-30 2022-05-01 日商富士軟片股份有限公司 著色感光性組成物、硬化膜、圖案形成方法、帶遮光膜的紅外線截止濾光片、固體攝像元件、圖像顯示裝置及紅外感測器
JPWO2017038708A1 (ja) * 2015-08-31 2018-02-22 富士フイルム株式会社 着色感光性組成物、硬化膜、カラーフィルタ、遮光膜、固体撮像素子、画像表示装置、および、硬化膜の製造方法
JP6858591B2 (ja) * 2016-03-01 2021-04-14 株式会社Ｄｎｐファインケミカル カラーフィルタ用着色組成物、カラーフィルタ及び表示装置
TWI736595B (zh) * 2016-03-25 2021-08-21 日商富士軟片股份有限公司 感光性組成物、彩色濾光片、圖案形成方法、固體攝像元件及圖像顯示裝置
KR20190062374A (ko) * 2016-10-14 2019-06-05 미쯔비시 케미컬 주식회사 감광성 착색 조성물, 경화물, 착색 스페이서, 화상 표시 장치
JP6878871B2 (ja) * 2016-12-20 2021-06-02 東洋インキＳｃホールディングス株式会社 カラーフィルタ用着色組成物、およびカラーフィルタ
JP6837863B2 (ja) * 2017-02-17 2021-03-03 住友化学株式会社 赤色着色組成物
JP6396523B2 (ja) * 2017-02-17 2018-09-26 旭化成株式会社 ポリエチレン系重合体及びその製造方法

Also Published As

Publication number Publication date
JP7419475B2 (ja) 2024-01-22
JPWO2020066438A1 (ja) 2021-08-30
JP2023002607A (ja) 2023-01-10
WO2020066438A1 (fr) 2020-04-02

Similar Documents

Publication Publication Date Title
JP7170732B2 (ja) 着色組成物、膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子及び画像表示装置
CN115427517B (zh) 着色组合物、膜、滤光器、固体摄像元件及图像显示装置
JP7717204B2 (ja) 着色組成物、膜、光学フィルタ、固体撮像素子及び画像表示装置
CN114424120B (zh) 着色组合物、固化膜、滤色器及显示装置
JP7344355B2 (ja) 着色組成物、膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子及び画像表示装置
CN112566985A (zh) 着色组合物、固化膜、图案形成方法、滤色器、固体摄像元件及图像显示装置
TWI811487B (zh) 著色感光性組成物、膜、濾色器、固體攝像元件及圖像顯示裝置
JP2025063188A (ja) 着色感光性組成物、硬化物、カラーフィルタ、固体撮像素子、画像表示装置、及び、非対称ジケトピロロピロール化合物
JP7419475B2 (ja) 着色感光性樹脂組成物、膜、カラーフィルタ、カラーフィルタの製造方法、構造体、固体撮像素子及び画像表示装置
TW202108703A (zh) 著色組成物、膜、濾光器、固體攝像元件及圖像顯示裝置
TW202014473A (zh) 硬化性組成物、膜、濾色器、濾色器的製造方法、固體攝像元件及圖像顯示裝置
TW202010758A (zh) 硬化性組成物、硬化性組成物的製造方法、膜、濾色器、濾色器的製造方法、固體攝像元件及圖像顯示裝置
KR102848521B1 (ko) 착색 조성물, 막, 적색 화소, 컬러 필터, 고체 촬상 소자, 화상 표시 장치 및 키트
TWI829774B (zh) 著色組成物、膜、濾色器、濾色器之製造方法、結構體、固體攝像元件及圖像顯示裝置
CN114269802B (zh) 树脂、固化性组合物、固化物、滤色器、固体成像元件、图像显示装置及高分子化合物
CN114846366B (zh) 滤色器、滤色器的制造方法、固体摄像元件及显示装置
KR102668934B1 (ko) 착색 조성물, 경화막, 구조체, 컬러 필터 및 표시 장치
TW202212260A (zh) 感光性組成物、膜、濾色器、固體攝像元件及圖像顯示裝置
TWI822873B (zh) 著色組成物、膜、濾色器、濾色器之製造方法、固體攝像元件及圖像顯示裝置
TW202338012A (zh) 著色組成物、膜、濾光器、固體攝像元件及圖像顯示裝置
TW202130745A (zh) 著色組成物、膜、濾色器、固體攝像元件及圖像顯示裝置
TW202348739A (zh) 著色組成物、膜、濾光器、固體攝像元件及圖像顯示裝置
TW202344620A (zh) 著色組成物、膜、濾色器、固體攝像元件及圖像顯示裝置
WO2022019255A1 (fr) Composition de résine, film, filtre optique, élément d'imagerie à l'état solide, dispositif d'affichage d'images et résine