320738 A7 經濟部中央橾準局員工消費合作社印製 B7__ 五'發明説明（1 ) 本發明是有關於取放光罩設備（iibrary)，特別是一種可 自動去除光罩表面可移動之微粒子（particles)，以解決重覆 缺陷（repeated defect)問題之取放光罩設備’其優點在於可 自動且快速地清除光罩表面上可移動之微粒子以解決重覆 缺陷問題。 > 一般在半導體製程中是使用光罩（reticle)來做爲圖案 的工具，藉由步進（step)以及重覆（repeat)上述具有圖案影 像的光罩，以便曝光整個晶圓區域，進而將光罩上的圖案 成像在晶圓上。而該圖案大小一般爲在晶圓上影像的2〜20 倍，但有的是和在晶圓上的影像大小一樣，其中該光罩必 須能提供高解析度和低缺陷的功能。而可控制光罩载入/ 载出的設備如第1圖所7F ’其主要設備爲一取放光罩設備 (library) 10 ’其中標準機械介面（standard meehanic^l interface box, SMIF box)12是做爲隔離外界.環境，以避免 光罩15受外界環境的污染’托載箱（carrier) 13内存放有光 罩15，升降板（elevat〇r plate)14可控制光罩的升降，並配 合握抓構件（gnpper) Π以將所要的光罩載入到外部光罩盤 18上以便做爲曝光之用或者在曝光結束後從光罩盤Μ上 將光罩载出’如此即可完成光箪的裁入/载出操作。 此外，在實施曝光過程當中，如果在光罩上有微粒子 (pamcles)的存在時，則該微粒子會隨著每次曝光而成像在 每一曝光區，此稱之爲重覆缺陷（repeateddefect)，因而造 成曝光製程中晶圓良率(yield)的嚴重損失。如第2圖所示， 光罩20上存在有微粒子26，所以在每次曝光過程中此微 (請先閱讀背面之注^^項再填寫本頁)320738 A7 Printed B7__ Five 'Invention Description printed by Employee Consumer Cooperative of Central Central Bureau of Economic Affairs of the Ministry of Economic Affairs (1) The present invention relates to pick-and-place photomask equipment (iibrary), in particular, it can automatically remove movable particles on the surface of photomask ), In order to solve the problem of repeated defects (repeated defect), the advantage of pick-and-place photomask equipment is that it can automatically and quickly remove the movable particles on the surface of the photomask to solve the problem of repeated defects. > Generally, in the semiconductor manufacturing process, a reticle is used as a pattern tool. By stepping and repeating the photomask with the pattern image, in order to expose the entire wafer area, and Image the pattern on the reticle on the wafer. The size of the pattern is generally 2 to 20 times the image on the wafer, but some are the same as the image on the wafer, and the photomask must provide high resolution and low defects. The equipment that can control the loading / unloading of the photomask is as shown in Figure 1 7F. The main equipment is a pick-and-place photomask equipment (library) 10. The standard mechanical interface (standard meehanic ^ l interface box, SMIF box) 12 It is used to isolate the environment. In order to avoid the pollution of the photomask 15 from the external environment, the photomask 15 is stored in the carrier 13 and the lifting plate (elevat〇r plate) 14 can control the lifting of the photomask, and Cooperate with the gripping member (gnpper) Π to load the desired reticle onto the external reticle disc 18 for exposure or to take out the reticle from the reticle disc M after the exposure is completed. The cut-in / load-out operation of Guang Sun. In addition, during the exposure process, if there are particles (pamcles) on the reticle, the particles will be imaged in each exposure area with each exposure, which is called repeated defect (repeated defect), As a result, the wafer yield in the exposure process is seriously lost. As shown in Figure 2, there are particles 26 on the reticle 20, so the micro-particles in each exposure process (please read the note ^^ on the back before filling this page)
X -裝-X -installed-
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經濟部中央標準局員工消費合作社印IL Α7 Β7 五、發明説明（2 ) 粒子26會經由透鏡22而成像於晶圓24上。目前所使用的 ό对光罩的石英（quartz)之厚度約爲6 35jnm，實驗發現在 光罩上方石英表面的微粒子厚度大於π〇μπι時，則微粒子 會成像在晶圓上’亦即會造成重覆缺陷的問題。 在昔知解決此重覆缺陷問，題的方法只是在使用光罩前 以人工方式清潔光罩上石英的表面，並以燈光檢視光罩表 面仁疋對於可移動之微粒子會因光罩盒（reticle pod)的開 /關或移動而掉落在光罩上，此時如果在顯影後檢查（After Development Inspection)程序中未能檢視出此重覆缺陷的 問題，則對良率將會有很大的衝擊。 有鑑於此，本發明之目的係爲了解決上述問題而提供 一可自動去除光罩表面可移動之微粒子（partides)以解決 重覆缺陷（repeated defect)問題之取放光罩設備（][ibrary)，其 包括一本體以及位於上述本體上方的一標準機械介面，而 該本體内部包含有一可放置光罩的托载箱、一位於上述托 載相下万的升降板'一位於上述托裁箱上方且可用來抓取 光罩到外部光罩盤的握抓構件，其特徵在於一光罩出入 口（亦即上逑握抓構件的出入口）外側上方按裝有一喷氣裝 —而此噴氣裝置末端上按裝有一過濾構件用以過瀘噴氣 裝置所噴出的空氣’以及在本體内部的另外一側面且和上 逨光罩出入口相對的位置上按裝有一排氣裝置。而上述本 發明 <一可自動去除光罩表面可移動之微粒子 (particles)，以解決重覆缺陷（repeated如&以）問題之取放光 τ4備，其主要操作原理在於每當上述握抓構件裁入— __ ? Α4^ -；——~ -__ -----^---,--.--裝-- (請先閲讀背面之注意事項再填寫本頁) '-° I -- M濟部中央#準局貝工消費合作杜印裝 A7 _______B7__ 五、發明説明（3 ) 軍到一外部光罩盤或從一外部光罩盤將一光罩栽出時，上 述噴氣裝置會噴出清潔乾燥的空氣(clear dry air，CDA)， 以便清潔此光革表面上的微粒子，同時上述排氣裝置會將 所吹起之含有微粒子的氣體棑放到設備外面，以避免在設 備内部產生擾流。而本發明之一可自動去除光罩表面可移 動之微粒子（particles)以解決重覆缺陷（repeated defect)問 題之取放光罩設備，由於上述噴氣裝置是與水平面成一夾 角’以及是間歇性噴出清潔乾燥的空氣，以致使得所嘴出 的空氣具有較大的動量，故可自動地將光罩表面上的微粒 子快速且輕易地清除乾淨，以避免重覆缺陷問題的產生。 圖式之簡單説明： 第1圖是是一描述可控制光罩裁入/載出之設備的立 體圖； 第2圖是一描述重覆缺陷問題如何形成的示意圖； 第3圖是一依據本發明一實施例用以解決重覆缺陷皮 題之光I載入/裁出設備的立體圖；以及 第4圖疋一依據本發明一實施例用以解決重覆缺陷問 題的簡易示意圖。 符號説明： 1〇〜取放光罩設備、12〜標準機械介面、13〜托載箱、 Μ〜升降板、15〜光罩、17〜握抓構件、18〜光罩盤、2〇〜 光罩、22〜龍、24〜晶圓、％〜微粒子、如〜取放光革設 借、31〜本體、32〜標準機械介面、33〜域箱、34〜升降 光罩盤、36〜握抓構件、Μ氣m〜排氣 n^i m* —nil I- Is I 1^1^1 (請先閱讀背面之注意事項再填寫本頁) 線 本紙張尺度適用中而?i^^yA4規格--- 520738 B7 ~ 經濟部中央標準局貝工消費合作社印製 五、發明説明（4 ) 裝置、39〜握抓構件36的移動方向、3〇1〜光罩盤、4〇光 罩、42〜噴氣裝置、43〜清潔乾燥的空氣、44〜微粒子、 45〜含有微粒子的氣體、46〜排氣裝置、47〜光罩4〇移動方 向0 實施例 、 本發明之一可自動去除光罩表面可移動之微粒子 (parties)以解決重覆缺陷（repeated defect)問題之取放光 罩設備30，如第3圖所示，其包括—本艘31以及位於上 述本體3]上方的一標準機械介面32，而該本體31内部包 含有一可放置光罩35的托裁箱33、一位於上述托載箱33 下万的升降板34、一位於上述拕載箱33上方且可用來抓 取光罩35到一外部光罩盤3〇1的握抓構件36，其特徵在 於一光罩出入口（亦即上述握抓的出入口，而此握抓構件邗 的移動方向或是光罩载入/載出的移動方向如圖中移動方 向刊所示）（未顯示於圖中）外側上方按裝有和水平面成 〜4V夾角且朝向内部的噴氣裝置（例如：至少一噴 嘴)37 ’而此嗔氣裝置37末端上按裝有一過遽構件（未顯示 於圖中）用以過Μ氣裝置37所戈出的空氣，以及在本艘 3!内部的另外—側面且和上述光罩出人口相對的位置上 按裝有-棑氣裝置（例如：—排氣管）38。而上述本發明之 一可自動去除衫表面可移蚊微粒子㈣心），以解決 重覆缺陷(repeated defeet)問題之取放光罩設備，其主要操 作原理在於每當上述握抓構件36 &入一光軍％到—外部 光罩盤3〇1或從一外部光罩盤則將-光罩35载出時，上 嶋尺度適用 tmmmTFus} (請先閱讀背面之注意事項再填寫本頁) 裝.Printed by the Ministry of Economic Affairs, Central Standards Bureau, Employee Consumer Cooperative Association IL Α7 Β7 V. Description of the invention (2) The particles 26 will be imaged on the wafer 24 through the lens 22. At present, the thickness of the quartz of the photomask is about 6 35jnm. Experiments have found that when the thickness of the particles on the quartz surface above the photomask is greater than π〇μπι, the particles will be imaged on the wafer. Repeat the defect problem. In the past, to solve this repeated defect problem, the method of the problem is only to manually clean the surface of the quartz on the photomask before using the photomask, and to inspect the surface of the photomask with light. For the movable particles, due to the photomask box ( reticle pod) on / off or moving and falling on the reticle, if the problem of this repeated defect cannot be detected in the After Development Inspection procedure, the yield will be very good Big shock. In view of this, the purpose of the present invention is to provide a pick-and-place photomask device that can automatically remove the movable particles on the surface of the photomask to solve the problem of repeated defects (] [ibrary) , Which includes a body and a standard mechanical interface located above the body, and the body contains a holding box that can hold a photomask, a lifting plate located under the holding phase, and a lifting board located above the holding box A gripping member that can be used to grab the reticle to the external reticle is characterized in that a blasting device is installed above the outside of the reticle entrance (that is, the entrance of the upper gripping member) —and the end of the jet device is pressed A filter member is installed to pass the air ejected from the lubricating device and an exhaust device is installed on the other side of the body and at a position opposite to the entrance and exit of the upper hood. The above-mentioned present invention < a mobile particle that can automatically remove the movable surface of the photomask to solve the problem of repeated defects (repeated such as &) is provided. The main operating principle is that whenever the above grips Catch component cut-in — __? Α4 ^-; —— ~ -__ ----- ^ ---, --.-- install-- (please read the precautions on the back before filling this page) '-° I-M 济 部 中央 #Public Bureau Beigong Consumer Cooperation Du Printed A7 _______B7__ V. Description of the invention (3) When the military arrives at an external reticle disc or plantes a reticle from an external reticle disc, the above air jet The device will spray clear dry air (CDA) in order to clean the particles on the surface of the leather. At the same time, the above exhaust device will blow up the gas containing particles to the outside of the device to avoid the device Turbulence occurs internally. One of the invention can automatically remove the movable particles on the surface of the reticle to solve the problem of repeated defects, because the air jet device is at an angle with the horizontal plane and is intermittently ejected The dry air is cleaned, so that the air coming out of the mouth has a large momentum, so the particles on the surface of the photomask can be automatically and quickly removed to avoid the problem of repeated defects. Brief description of the drawings: Figure 1 is a perspective view of a device that can control the cutting in / out of a photomask; Figure 2 is a schematic diagram describing how the problem of repeated defects is formed; Figure 3 is a diagram according to the present invention An embodiment is a perspective view of a light I loading / cutting device for repetitive defects; and FIG. 4 is a simplified schematic diagram for resolving repetitive defects according to an embodiment of the present invention. Explanation of symbols: 1〇 ~ pick and place mask equipment, 12 ~ standard mechanical interface, 13 ~ loading box, M ~ lifting plate, 15 ~ mask, 17 ~ gripping member, 18 ~ mask disk, 20 ~ light Cover, 22 ~ Dragon, 24 ~ Wafer,% ~ Particles, such as ~ take-out and release leather design, 31 ~ body, 32 ~ standard mechanical interface, 33 ~ domain box, 34 ~ lift mask disk, 36 ~ grip Components, Μ 气 m〜Exhaust n ^ im * —nil I- Is I 1 ^ 1 ^ 1 (Please read the precautions on the back before filling in this page) The size of the line paper is applicable and i ^^ yA4 specifications- -520738 B7 ~ Printed by Beigong Consumer Cooperative of Central Bureau of Standards of the Ministry of Economy V. Description of the invention (4) Device, 39 ~ direction of movement of gripping member 36, 301 ~ mask disk, 40 mask, 42 ~ Jet device, 43 ~ Clean dry air, 44 ~ Particles, 45 ~ Gas containing particles, 46 ~ Exhaust device, 47 ~ Photomask 4 Direction of movement 0 Example, one of the invention can automatically remove the surface of the photomask Pick and place reticle equipment 30 with moving particles to solve the problem of repeated defects, as shown in Figure 3, which includes-this ship 31 and a standard mechanical interface 32 located above the main body 3], and the main body 31 includes a holding box 33 capable of placing a photomask 35, a lifting plate 34 located below the holding box 33, and a A gripping member 36 above the carrying box 33 and which can be used to grab the reticle 35 to an external reticle disc 310, is characterized by a reticle entrance (that is, the above-mentioned gripping entrance and exit, and this gripping member is han The direction of movement or the direction of movement of the reticle loading / unloading is shown in the direction of movement in the figure) (not shown in the figure). Above the outer side, a jet device with an angle of ~ 4V from the horizontal plane and facing inward is installed (for example : At least one nozzle) 37 'and the end of the degassing device 37 is equipped with a passing member (not shown in the figure) to pass the air from the M gas device 37, and the other inside the ship 3! -The side and the position opposite to the above-mentioned light mask are equipped with a gas-venting device (for example:-exhaust pipe) 38. One of the above-mentioned inventions can automatically remove the removable mosquito particles on the surface of the shirt to solve the problem of repeated defects (repeated defeet). The main operating principle of the device is that the gripping member 36 & Into a light army% to-external mask disk 301 or from an external mask disk-the mask 35 is loaded, the upper standard applies to tmmmTFus} (please read the precautions on the back before filling this page) .
*1T 線 f 經濟部中央標準局員工消費合作杜印製 Α7 Β7 五、發明説明（5) 述嘴氣裝置37會嘴出清潔乾燥的空氣（c!ear dry aj[r ， CDA) ’以便清潔此光罩35表面上的微粒子，同時上述棑 氣裝置（排氣管）38會將所吹起之含有微粒子的氣體排放到 設備外面’以避免在設備内部產生擾流。 參考第4圖’是一依據本，發明一實施例用以解決重覆 缺陷問題的簡易示意圖，其中光罩4〇上面存在有微粒子 44，而此光罩40移動方向如移動方向47所示，當光罩4〇 载入/載出期間，在光罩出入口(未顯示於圖中）外侧上方的 噴氣裝置（例如：至少一噴嘴)42會噴出清潔乾燥的空氣43 以便將光罩表面的微粒子44清除掉，同時棑氣裝置（例如： 一棑氣管）46會將所吹起之含有微粒子的氣體45棑放到設 備外面’以避免在設備内部產生擾流。 如上所述，依據上述本發明之一可自動去除光罩表面 可移動之微粒子（partlcles)以解決重覆缺陷（repeaied defect) 問題之取放光罩設備，由於上述噴氣裝置37與水平面成 〜45°夾角以及是間歇性噴出清潔乾燥的空氣，以致使得 所嘴出的空氣具有較大的動量，故本發明可自動將光罩表 面上的微粒子快速且輕易地清除乾淨，以避免重覆缺陷問 題的產生。 雖然本發明巳以一較佳實施例揭露如上，然其並非用 以限定本發明，任何熟習此項技術者，在不脱離本發明之 精神和範圍内，當可做各種之更動與潤飾，而本發明之保 護範圍當視後附之申請專利範圍所界定者爲準。 本紙浪尺度適用中國國家棣準（CNS ) A4规格（2ίΟΧ297公釐） (锖先閱请背面之注意事項再填寫本育) 裝 線* 1T line f A7 Β7 printed by the consumer cooperation of the Central Bureau of Standards of the Ministry of Economic Affairs 5. Description of the invention (5) The mouth air device 37 will give out clean and dry air (c! Ear dry aj [r, CDA) 'for easy cleaning The fine particles on the surface of the photomask 35, and the above-mentioned air-sucking device (exhaust pipe) 38 will discharge the gas containing fine particles to the outside of the equipment to avoid turbulence inside the equipment. Refer to FIG. 4 is a simple schematic diagram for solving the problem of repeated defects according to an embodiment of the present invention, in which particles 44 are present on the photomask 40, and the moving direction of the photomask 40 is shown in the moving direction 47, During the loading / unloading of the reticle 40, the air jet device (for example: at least one nozzle) 42 above the outside of the reticle entrance (not shown in the figure) will spray clean and dry air 43 to remove the particles on the surface of the reticle 44 is cleared, at the same time, the snorkel device (for example: a snorkel) 46 will blow up the gas 45 containing particles to the outside of the equipment 'to avoid turbulence inside the equipment. As described above, according to one of the above-mentioned inventions, the movable particulates on the surface of the reticle can be automatically removed to solve the problem of repeated defects. Since the air-jet device 37 is ~ 45 from the horizontal plane ° Angle and intermittent spray of clean and dry air, so that the air from the mouth has a large momentum, so the present invention can automatically remove particles on the surface of the photomask quickly and easily to avoid repeated defects Of generation. Although the present invention has been disclosed as above with a preferred embodiment, it is not intended to limit the present invention. Anyone who is familiar with this technology can do various modifications and retouching without departing from the spirit and scope of the present invention. The scope of protection of the present invention shall be subject to the scope defined in the attached patent application. The size of this paper is applicable to China National Standard (CNS) A4 (2ίΟ297mm) (Please read the precautions on the back before filling in this education)