TW359769B - Multidensity photomask and production process therefor - Google Patents

Multidensity photomask and production process therefor

Info

Publication number
TW359769B
TW359769B TW087105391A TW87105391A TW359769B TW 359769 B TW359769 B TW 359769B TW 087105391 A TW087105391 A TW 087105391A TW 87105391 A TW87105391 A TW 87105391A TW 359769 B TW359769 B TW 359769B
Authority
TW
Taiwan
Prior art keywords
photomask
photo
multidensity
filtering layer
production process
Prior art date
Application number
TW087105391A
Other languages
Chinese (zh)
Inventor
Jiun-Shiang Wen
Shu-Huei Jeng
Hua-Chi Jeng
Chau-Huei Tzeng
Jia-Ming Liou
Original Assignee
Ind Tech Res Inst
Au Optronics Corp
Quanta Display Inc
Hannstar Display Corp
Chunghwa Picture Tubes Ltd
Chi Mei Optoelectronics Corp
Toppoly Optoelectronics Corp
Prime View Int Corp Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ind Tech Res Inst, Au Optronics Corp, Quanta Display Inc, Hannstar Display Corp, Chunghwa Picture Tubes Ltd, Chi Mei Optoelectronics Corp, Toppoly Optoelectronics Corp, Prime View Int Corp Ltd filed Critical Ind Tech Res Inst
Priority to TW087105391A priority Critical patent/TW359769B/en
Priority to JP24253998A priority patent/JPH11295876A/en
Application granted granted Critical
Publication of TW359769B publication Critical patent/TW359769B/en

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

The invention provides a multidensity photomask and a production process therefor, which comprises forming a photo-filtering layer having different patterns formed thereon and with different UV transmittance on a transparent substrate as a photomask by using photolithographic techniques. The photo-filtering layer is a coating containing a UV-absorbing composition, such as a photoresist or other material without photoresist functions that can be etched off. The control on the different UV transmittance of the photo-filtering layer can be achieved by altering the composition, concentration of the UV-absorbing composition, or the thickness of the photo-filtering layer.
TW087105391A 1998-04-09 1998-04-09 Multidensity photomask and production process therefor TW359769B (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
TW087105391A TW359769B (en) 1998-04-09 1998-04-09 Multidensity photomask and production process therefor
JP24253998A JPH11295876A (en) 1998-04-09 1998-08-12 Multi-layer photomask and manufacturing method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW087105391A TW359769B (en) 1998-04-09 1998-04-09 Multidensity photomask and production process therefor

Publications (1)

Publication Number Publication Date
TW359769B true TW359769B (en) 1999-06-01

Family

ID=21629839

Family Applications (1)

Application Number Title Priority Date Filing Date
TW087105391A TW359769B (en) 1998-04-09 1998-04-09 Multidensity photomask and production process therefor

Country Status (2)

Country Link
JP (1) JPH11295876A (en)
TW (1) TW359769B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI415123B (en) * 2008-11-21 2013-11-11 Sony Disc & Digital Solutions Developing method and developing apparatus

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000045222A1 (en) * 1999-01-27 2000-08-03 Citizen Watch Co., Ltd. Photolithography mask and method of manufacturing thereof
JP5163602B2 (en) * 2009-07-06 2013-03-13 大日本印刷株式会社 Method for producing high and low pattern layer formed body

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI415123B (en) * 2008-11-21 2013-11-11 Sony Disc & Digital Solutions Developing method and developing apparatus

Also Published As

Publication number Publication date
JPH11295876A (en) 1999-10-29

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