TW370573B - A composition for cleaning and etching electronic display and substrate - Google Patents
A composition for cleaning and etching electronic display and substrateInfo
- Publication number
- TW370573B TW370573B TW087100999A TW87100999A TW370573B TW 370573 B TW370573 B TW 370573B TW 087100999 A TW087100999 A TW 087100999A TW 87100999 A TW87100999 A TW 87100999A TW 370573 B TW370573 B TW 370573B
- Authority
- TW
- Taiwan
- Prior art keywords
- composition
- cleaning
- substrate
- electronic display
- contaminants
- Prior art date
Links
- 239000000203 mixture Substances 0.000 title abstract 4
- 238000004140 cleaning Methods 0.000 title abstract 3
- 239000000758 substrate Substances 0.000 title abstract 3
- 238000005530 etching Methods 0.000 title abstract 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 3
- 239000000356 contaminant Substances 0.000 abstract 2
- 235000012239 silicon dioxide Nutrition 0.000 abstract 2
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 239000000843 powder Substances 0.000 abstract 1
- 239000010453 quartz Substances 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 238000003860 storage Methods 0.000 abstract 1
- 230000003746 surface roughness Effects 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
Landscapes
- Detergent Compositions (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
This invention relates to a composition for cleaning and etching the surface in fabricating electronic displays and the substrates. Specifically this invention relates to a composition to effectively remove the contaminants by cleaning, to remove any contaminants on the surface, and to etch SiO2 and Si substrate in the fabrication process of electronic displays, quartz devices, wafer, and semiconductor wafer. According to this invention, it is possible to clean and etch more efficiently and conveniently. Also the surface roughness is improved. Further the composition of this invention can be made available in powder type for preparing a defined amount of solution. It provides the conveniences in transportation, handling and storage.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR19970001539 | 1997-01-21 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW370573B true TW370573B (en) | 1999-09-21 |
Family
ID=57941478
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW087100999A TW370573B (en) | 1997-01-21 | 1998-01-23 | A composition for cleaning and etching electronic display and substrate |
Country Status (1)
| Country | Link |
|---|---|
| TW (1) | TW370573B (en) |
-
1998
- 1998-01-23 TW TW087100999A patent/TW370573B/en active
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