TW426218U - Mask box having a mask protection function - Google Patents

Mask box having a mask protection function

Info

Publication number
TW426218U
TW426218U TW88219580U TW88219580U TW426218U TW 426218 U TW426218 U TW 426218U TW 88219580 U TW88219580 U TW 88219580U TW 88219580 U TW88219580 U TW 88219580U TW 426218 U TW426218 U TW 426218U
Authority
TW
Taiwan
Prior art keywords
mask
protection function
box
mask box
mask protection
Prior art date
Application number
TW88219580U
Other languages
Chinese (zh)
Inventor
Meng-Jiun Li
Original Assignee
Taiwan Semiconductor Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiwan Semiconductor Mfg filed Critical Taiwan Semiconductor Mfg
Priority to TW88219580U priority Critical patent/TW426218U/en
Publication of TW426218U publication Critical patent/TW426218U/en

Links

TW88219580U 1999-11-18 1999-11-18 Mask box having a mask protection function TW426218U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW88219580U TW426218U (en) 1999-11-18 1999-11-18 Mask box having a mask protection function

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW88219580U TW426218U (en) 1999-11-18 1999-11-18 Mask box having a mask protection function

Publications (1)

Publication Number Publication Date
TW426218U true TW426218U (en) 2001-03-11

Family

ID=21656240

Family Applications (1)

Application Number Title Priority Date Filing Date
TW88219580U TW426218U (en) 1999-11-18 1999-11-18 Mask box having a mask protection function

Country Status (1)

Country Link
TW (1) TW426218U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110928135A (en) * 2019-12-20 2020-03-27 武汉新芯集成电路制造有限公司 A photomask for preventing electrostatic damage and a method for preventing electrostatic damage to a photomask

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110928135A (en) * 2019-12-20 2020-03-27 武汉新芯集成电路制造有限公司 A photomask for preventing electrostatic damage and a method for preventing electrostatic damage to a photomask
CN110928135B (en) * 2019-12-20 2023-09-08 武汉新芯集成电路制造有限公司 A photomask for preventing electrostatic damage and a method for preventing electrostatic damage to the photomask

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Legal Events

Date Code Title Description
GD4K Issue of patent certificate for granted utility model filed before june 30, 2004
MK4K Expiration of patent term of a granted utility model