經濟部中央標準局員工消費合作杜印製 五、發明説明（） 域 領 術 技 明 發 置 裝 鍍 電 子 離. 的 鎗 漿 電 數 多 有 具 關 有 俗 明 發 本 術 技 景 觜 板産的 基所上 在鎗板 可漿基 就電在 置在成 裝於形 鍍由使 電、-致 子是 ， 離但故 的 C 緣 鎗知的 漿周曲 電所杻 塱眾曹 度為束 坡實射 力 ，體 壓膜子 用質離 使良等 若成的 形生 膜厚無法均一。因此，本發明人等所提出的離子電鍍裝 置乃是提茱了在作為陽極作用的電解爐床（Hearth)週圍 設置環狀永久磁鐵，以減小等離子髏射束的扭曲。 玆擬參照第1圔及第2 _來說明此離子電鍍裝置。壓 力坡度型的電漿鎗具有陰極102、第1.中間電極103、 第2中間電極104，其中第1中間電極1Θ3内藏有永久磁 鐵，且第2中間電極104則肉藏有電磁線圈。又在電漿鎗 101的週圍設有導入線圏105。在真空容器106内的上部配 置了應處理的基板107。在真空容器106内的下部設有做 為陽極的電解爐床108。而在電解爐床108的週圍設置環 狀永久磁鐵109。 再參照第3圖；就電漿鎗101、導入線圏105、環狀永 久磁鐵1 Θ 9的磁極加以説明。而且*内藏在第2中間電極 104的電磁線圏中，將自線圈中心射出磁方線的〜邊稱之 為” N極”。 將第1中間電極103的第2中間電極104邊刨稱之為”S 極”、第2中間電極104及導入線圏105的第1中間電極（ -3- ---------1~裝-- (請先閲讀背面之注意事項再填寫本I·) 訂 本紙張尺度逋用中國國家標準（CNS ) A4規格（210x297公釐） 經濟部中央標準局員工消費合作社印製 459059 A7 _B7_ 五、發明説明（） 1 03 )邊側稱之為” S極' 環狀永久磁鐵（1 0 9 )的上面為” S 極”。又將此種型態稱之為S型。 另一方面，第1.中間電極103、第2中間電極104、導 入線圏105、及環狀永久磁鐵109等各磁極，與上述S型完 全相反的型式者即稱為N型。 依據上述的離子電鍍裝置者，使自電漿鎗（101)産生等 離子體射束時，則較諸習知未具有環狀永久磁鐵109的離 子電鍍裝置，其等離子體射束的扭曲少。但是如第2圖 所示；在S型的場合中等離子體射束勢必自電漿鎗101的 中心偏倚圖中之左側。另一方面，N型的場合者，等離子 體射束就會偏倚右側，這是因為使電流流動在磁場中的 等離子體柱時，等離子體柱會呈現扭勘變形此一電漿特 有的現象所致。The consumer cooperation of the Central Bureau of Standards of the Ministry of Economic Affairs of the People's Republic of China printed five. Description of the invention () The field gun technology is installed and plated with electronic ionization. The number of guns and electricity is related to the general technology of this technology. The base can be placed on the gun plate, and the base can be placed in the shape of the plate. The electric power is made by the electric generator, the electric generator is, and the old C-edge gun is known. The actual shooting force and the quality of the membrane used for body pressure membranes can not be uniform. Therefore, the ion plating device proposed by the present inventors has provided a ring-shaped permanent magnet around an electrolytic hearth (a hearth) serving as an anode to reduce the distortion of the plasma cross-beam. It is intended to describe this ion plating device with reference to 1st and 2nd. The pressure gradient type plasma gun has a cathode 102, a first intermediate electrode 103, and a second intermediate electrode 104. The first intermediate electrode 1Θ3 contains permanent magnets, and the second intermediate electrode 104 contains an electromagnetic coil. A lead wire 105 is provided around the plasma gun 101. A substrate 107 to be processed is arranged in the upper part of the vacuum container 106. An electrolytic hearth 108 serving as an anode is provided in the lower portion of the vacuum vessel 106. A ring-shaped permanent magnet 109 is provided around the electrolytic hearth 108. Referring again to Fig. 3, the magnetic poles of the plasma gun 101, the lead wire 105, and the ring-shaped permanent magnet 1 Θ 9 will be described. In addition, * is embedded in the electromagnetic line 圏 of the second intermediate electrode 104, and the side that emits the magnetic square wire from the center of the coil is called "N-pole". The second intermediate electrode 104 of the first intermediate electrode 103 is referred to as the "S-pole", the second intermediate electrode 104 and the first intermediate electrode of the lead wire 105 (-3- --------- 1 ~ pack-(Please read the notes on the back before filling in this I ·) The paper size of the booklet is in accordance with Chinese National Standard (CNS) A4 (210x297 mm) Printed by the Staff Consumer Cooperative of the Central Standards Bureau of the Ministry of Economic Affairs 459059 A7 _B7_ V. Explanation of the invention () 1 03) The side is called "S pole" The top of the ring-shaped permanent magnet (1 0 9) is "S pole". This type is also called S type. Another On the other hand, the magnetic poles such as the first intermediate electrode 103, the second intermediate electrode 104, the lead wire 105, and the ring-shaped permanent magnet 109, which are completely opposite to the S-type, are called N-type. According to the above-mentioned ion plating The installer, when generating a plasma beam from the plasma gun (101), has less distortion of the plasma beam than conventional ion plating apparatuses without a ring-shaped permanent magnet 109. However, as shown in FIG. 2 In the case of S type, the plasma beam is bound to deviate from the left side of the center of the plasma gun 101. On the other hand Case of N-type who plasma beam will bias the right, because the current to flow when the plasma column in the magnetic field, the plasma column twist survey will show a modification of this peculiar phenomenon caused by plasma.
有別於上述離子電鍍裝置者，如特開昭63 -47362號公 報所掲示，其離子電鍍裝置慠在一真空容器中並列配置 了多數電漿鎗。但此離子電鍍裝置的場合，其多數値電 漿鎗與導入線圏的磁力線勢必互相干擾。其結果，比起 僅設有一支電槳鎗的離子電鍍裝置其等離子束會扭曲得 較大D 因此，本發明的目的乃在於可提供一種離子電鍍裝置 ，亦卽，即使並列配置有多數電漿鎗的場合，也可減少 多數等離子體射束的扭曲。 發明之掲示 -4- 本纸张尺度適用中國國家標準（CNS ) A4規格（210X297公釐） (請先閲讀背面之注意事項再填寫本頁) /裝-Different from the above-mentioned ion plating apparatus, as shown in Japanese Patent Publication No. 63-47362, the ion plating apparatus is equipped with a plurality of plasma guns in a vacuum container in parallel. However, in the case of this ion plating apparatus, the magnetic lines of force of most of the plutonium plasma gun and the lead wire are bound to interfere with each other. As a result, the plasma beam is distorted more than an ion plating apparatus provided with only one electric paddle gun. Therefore, an object of the present invention is to provide an ion plating apparatus, and even if a plurality of plasmas are arranged in parallel In the case of guns, distortion of most plasma beams can also be reduced. Indications of the invention -4- The paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) (Please read the precautions on the back before filling this page) / Package-
、tT 459 05 9 經濟部中央標準局員工消費合作社印裝 A7 B7 五、發明説明（） 依據本發明的離子電鍍裝置者，在真空容器中設置具 有磁鐵手段的多數支電漿鎗，該多數支電漿鎗分別設有 導入線圏，在真空容器内設有對應於多數支電漿鎗的多 數锢電解嫌床。上述多數値電解爐床的週圍分別設置了 永久磁鐵，而使相鄰接的兩支電漿鎗所設置的兩儸上述 磁鐵手段的磁極方向與兩値上述導入線圈的磁棰方向、 以及兩値上述環狀永久磁鐵的磁極方向，分別互為相反 方向。 關於本離子電鍍裝置的變形例及實施型態則記載於申 請專利範圍的附屬項第2至第4項c 本發明最佳之實施形態 第4圖至第6圖為用來說明本發明的離子電鍍裝置之 適宜實施例β本離子電鍍裝置可適用於在基板上形成附 箸有蒸發粒子的膜。本實施例係就真空容器（Π)設有兩 支電漿鎗1 A、1 Β的場合加以說明。 參照第6圖而就電漿鎗1B邊側的構造加以說明，在真 空容器11的側壁所設置的筒狀部12b安装有壓力坡度型的 電漿鎗1B。電漿鎗1B具有以陰極14b閉塞一端的玻璃管 15b。在玻璃管15b内則由内藏有以La&e為材料的圖盤 16b、及鉋Ta製管17b的鉬（Mo)製圓筒18b固定於陰極14b 。管17b傺用於將氬（Ar)、氛（He)等僚氣所肜成的輸送氣 體18導人電漿鎗1B内。 在玻璃管15b的陰極14b和與其柑反側端部及筒狀部 -5- ΐ纸張尺度適用中國國家標準（CNS ) A4規格（210x297公釐） (請先聞讀背面之注意事項再填寫本頁) .裝· 訂 34 5 經濟部中央標準局貝工消費合作社印製 A7 B7 五、發明説明（） 12b之間，以同心配置了第1 、第2中間電極19b > 20b。 在第1中間電極19b(第1格）内為收斂等離子體射束而内 藏著環狀永久磁鐵2U。同樣，也在第2中間電搔20b (第 2格）内為收斂等離子體射束而内藏了電磁線圏22b。此電 磁線圏22b^由電源23b供電。 在電漿鎗1B被安裝的筒狀部12b的週圍設有為導入等離 子體射束至真空容器（11)内的導入線圈24b。此導入線圏 24b則由電源25b加以勵磁。陰極14b與第1 、第2中間電 極19t>、20b之間分別經由垂下阻抗器26b、27b連接了可 變電壓的主電源28b。 在真空容器内的底部設置有電解主爐床30b與其遇圍 所配置的環狀輔助電解嫌床31b。電解主爐床30b備有自 電漿鎗1B射入等離子體射束的凹部而容納有如ITG(絪-鍚 氣化物）小片那種蒸發物質。 電解用主爐床30b及輔助爐床31b倶以熱傳導率極佳的 導電性材料，例如以銅製成。且相對於電解主燫床30b, 其電解輔助爐床（31b)乃隔箸絕縁醍而被安裝著。又電解 主爐床30b與電解輔肋燫床31b僳隔著阻抗器U8)連接著 ,且電解主爐床30b與主電源28b的正面側連接著。從而， 電解主爐床30b卽構成著為吸收發自電漿鎗1B的等離子體 射束所需之陽極。 在電解輔肋爐床31b内收納有琛狀永久磁鐵35b與電磁 線圏36b。其中電磁線圈36b#由電解爐床線圏電源381)供 -6 — 本紙張尺度適用中國國家標準（CNS ) A4規格（210><297公釐） (請先聞讀背面之注意事項再填寫本頁) -裝· 訂 經濟部中央標準局員工消費合作社印製 A7 B7五、發明説明（） 電。在這樣的場合中，被構成為其被勵磁的電磁線圈 36b的中心倒磁場之方向，與因環狀永久磁鐵35b所産生 的中心侧磁場為同一方向。電解爐床線圏電源38b為可變 電壓型的電源。藉使電壓變化就可使供應給電磁線圈 36b的電流變化。 又在真空容器11内部，設置了為保持在電解主爐床30b 上部有蒸發粒子被蒸的基板41所需之基板支架42。此基 板支架4 2又設有電熱器43。該電熱器43像由電_器電源 44供電。 基板支架42相對於真空容器11慑以電氣絕緣被支撑箸 。在真空容器11與基板支架42間以偏壓電源45連接。藉 此，使得基板支架42對於以零電位所連接的真空容器11 A在負電位偏壓著。 電解輔助爐床31b隔著切換開關46b而與主電源28b的正 面側連接着。在此主電源28b隔著關關Sib並聯箸垂下阻 抗器29b及輔助放電電源47b。 在此離子電鍍裝置中，電漿鎗1B的陰極與臭空容器11 内的電解主爐床30b之間因放電而産生等離子束（圔中未 示）。此等離子體射束藉束因導入線圈24b與電解輔助爐 床31b内的環狀永久磁鐵35b而決定的磁場被導引至電解 主爐床30b。其收納在電解主爐床301b的蒸發物質藉由等 (請先閱讀背面之注意事項再填寫本頁) -裝. 訂 子表 離的 等41 藉板 乃基 子的 粒壓 的電 發負 蒸有 R— D "力 _!v J Lr 一 似夕 7 0於-發著 蒸附 而並 熱 * 加化 的子 束離 射而 體束 子射 離體 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 經濟部中央標準局貝工消費合作社印製 45905 9 A7 A7 _B7_ 五、發明説明（） 面，便在基板41上锻成了被膜。 由於，基板41為兩支電漿鎗ΙΑ、1B所共通的被處理構 件，故基板支架42、電熱器43、電熱器電源44及偏壓電 源45等都和兩支電漿鎗1A、1B共通，其電漿鎗⑴A邊側的 構造也與電漿鎗1B相同。 若以第3圖所示的電漿鎗（第1 、第2中間電極103、 104,瑗狀永久磁鐵189等磁極的配置如第3圖之說明為 S型時，則第1 、第2中間電極103、104及環狀永久磁鐵 109的磁極與S型相反者為N型。本發明的特擻在於將S型 的電漿鎗與N型的電漿鎗相鄰配設者。 如第4圖、第5圖所示，由於S型電漿銷與N型電漿鎗 的相異，使得導線圏24a、24b、電解輔助爐床31a、31b 的磁極都分別為相反方向。此外，電解輔助爐床31a、 31b也可只具有環狀永久磁鐵。 例如，電漿鎗1A為單一時則如第2圃的説明，當等離 子體射束射入電解饈床前，因等離子體射束的杻曲，故 一旦溘出圖中左側後再從電解爐床108的上方射入電解爐 床108内。因此，若將同一磁極方向的電漿鎗及電解爐床 並排配列兩組者，其電漿會向圖中左倒脹出後再射入到 電解嫌床。 相對的，如第5圖所示，在圔中右侧配置S型的電漿鎗 U,在圖中左側則配置Η型的電漿鎗1B,而藉使其兩磁極 互為相反，使得電漿脹出部份會呈現左右對稱，尤其是 -8 ™ 本紙張尺度適用中國國家標準（CNS ) Α4規格（2]ΟΧ297公釐） --------------、玎-----Γι,ι (請先閲讀背面之注意事項再填窝本頁) 459059 A7 B7 經濟部中央標準局員工消費合作社印製 五、發明説明 ( ) 1 1 將 電 漿 鎗 U\ 1B如 第 5 圖 所 示 般 並 排 m 列 的場 合 ί 兩 等 1 離 子 體 射 束 會 一 且 靠 近 而 互 相 在 中 央 重 疊 般擴 散 然 後 1 各 a 射 入 電 解 燫 床 3E a , 30b 〇 請 1 此 一 場 合 時 » 也 可 在 兩 等 離 子 體 射 束 間 的領 域 産 生 高 閲 I 1 .密 度 的 等 離 子 t 得 以 寬 大 面 積 使 用 高 密 度 電漿 來 施 加 離 背 面 I 之 1 子 電 鍍 〇 注 意 1 1 相 反 地 t 儘 量 欲 減 輕 電 漿 所 帶 來 傷 害 場合 5 即 以 和 項 再 1 \ ) 第 5 圖 相 的 磁 極 闘 t 亦 即 在 第 5 圖 右 側配 置 Ν蛩的電 寫 本 裝 漿 鎗 1B ， 而 在 圖 中 左 側 並 排 配 置 S型的電漿鎗（1A) c 結果 頁 1 可 使 中 央 附 近 的 電 漿 變 薄 〇 1 I 如 上 所 述 藉 由 S型、 N型 的 配 置 電 漿 之 位置 > 而 雖 可 1 I 變 化 等 離 子 體 射 束 間 的 等 離 子 體 密 度 i 但 也可 在 真 空 容 \ 訂 I 器 内 或 外 面 配 置 永 久 磁 鐵 或 鐵 4*4* 心 t 而 可 將 等離 子 體 的 密 1 1 度 加 以 控 制 〇 1 例 如 第 4 圔 > 第 5 圖 所 示 ί 在 電 解 輔 助 爐床 31 a、 31b 1 1 間 設 置 電 漿 分 離 用 的 永 久 磁 鐵 10 也 可 將 電解 輔 助 爐 床 | 31 a , 3 1 b間 的 電 漿 加 以 分 離 〇 Μ 樣 的 場 合 ，永 久 磁 鐵 10 1 I 的 磁 極 方 向 乃 被 配 設 成 電 m 輔 助 爐 床 3 1 a , 31b的 永 久 磁 1 1 鐵 1 0的 上 侧 磁 極 與 其 相 反 方 向 的 磁 極 互 為 對向 〇 1 | 此 外 9 在 上 逑 的 實 施 型 態 中 i 就 電 漿 m 1B而 言 9 即 如 1 I 第 7 圖 U)所示 在使N 極 朝 向 上 囬 的 環 狀 之久 磁 鐵 35b上 1 1 方 再 配 置 以 電 磁 線 圏 36b 〇 但如第7 圖（b)所示 Λ 也 可 在 1 I 使 S極朝1¾ 3上面的環狀永久磁鐵35 b上 方 再 配置 以 電 磁 線 I 1 9 - 1 1 1 本紙張尺度適用中國國家標準（CMS ) A4規格（2I0X297公釐） 459059 經濟部中央標準局員工消費合作社印製 A7 B7五、發明説明（） 圏（36b)。這樣的場合，其流經電磁線圏36b的電流方向 務使與第7圖（a )的場合相反。 另一方面，如第7圖（c)所示，也可在使N極朝向上面 的環狀永久磁鐵35b下方再配置電磁線圈36b。更如第7 圖（d)所示，也可在使S極朝上的環狀永久磁鐵35b的下方 再配置電磁線圏36b。這些場合即如前述，其被勵磁的電 磁線圈36b的中心側磁場方向能與由環狀永久磁鐵35b所 産生的中心側磁場同一方向般流出電流。 産業上的可利用性 依據本發明則可提供一種離子電鍍裝置，乃是藉使多 數電漿鎗中互相相鄰的兩支電漿鎗的導人線圏、電解輔 肋爐床的磁極方向互為相反，以減少各自産生的磁力線 之干擾，自可減低等離子體射束的扭曲。從而，可對寛 大面積使用高密度電發施加電鍍。 圖面說明 第1圔 為電解爐床週圍設置永久磁鐵的習知離子電鍍 裝置的縱剖面圖 第2圖 為第1圖中A -A ’線的剖面圖 第3圔 為説明第1圖所示裝置中的電漿鎗、導入線圏 、爐床側的永久磁鐵的磁極關偽圔 第4圖 為根據本發明之離子電鍍裝置的橫剖面圖 第5圖 為第4圖中B HI的剖面圔 第6圖 為第4圖中C-C_線的剖面圖 -10- (請先閲讀背面之注意事項再填寫本頁) •裝. 訂 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） Λ 5 9 Ο 5 9 Α7 Β7 五、發明説明（） 第7圖 為第5圖中所示之 組合圔例 圖中符號的簡單說明 1 A , 1 B , 1 0 1 ...電漿鎗 11.106 ......真空容器 15b.........玻璃管 17b.........管 19b, 103.....第1中間電極 21a,21b，35b,109......... 22a,22b,36b............. 23b ,25b.....電源 26b,27b,2 9b.重下阻抗器 28b.........主電源 41.107 ......基板 43..........電熱器 45..........偏壓電源 47b.........輔助放電電源 Sib.........環狀永久磁鐵 環狀永久磁鐵與電磁線圏的 (請先閲讀背面之注意事項再填寫本页) -裝- 訂 經濟部中央標準局貝工消費合作社印製 10...........永久磁鐵 14a,14b,102..陰極 16b ..........圓盤 18b..........圓筒 20b, 104......第2中間電極 環狀永久磁鐵 電磁線圈 24a,24b,105..導入線圏 30a，30b , 10S ..電解主爐床 31a , 31b......電解輔助爐床 42...........基板支架 44...........電熱容電源 46b..........切換開關 48b..........阻抗器 電磁線圏 -11 ~ 本紙張尺度適用中國國家標準（CNS ) A4规格（210X297公釐）、 TT 459 05 9 Printed by the Consumer Cooperatives of the Central Bureau of Standards of the Ministry of Economic Affairs A7 B7 V. Description of the invention () The ion plating device according to the present invention sets a plurality of plasma guns with magnet means in a vacuum container. Plasma guns are provided with lead wires, and most vacuum electrolytic beds corresponding to most plasma guns are provided in vacuum containers. Permanent magnets are set around the majority of the above-mentioned electrolysis furnace beds, and the directions of the magnetic poles of the two magnets and the directions of the magnetic coils of the lead-in coils and the two coils provided by two adjacent plasma guns are set. The magnetic pole directions of the ring-shaped permanent magnets are opposite to each other. Modifications and implementation types of the ion plating apparatus are described in the appended items 2 to 4 of the scope of the patent application. The best embodiment of the present invention. Figures 4 to 6 illustrate the ion of the present invention. Preferable Example of Electroplating Apparatus β This ion plating apparatus can be suitably used to form a film with evaporated particles on a substrate. This embodiment is described in the case where the vacuum vessel (Π) is provided with two plasma guns 1 A, 1 B. The structure of the plasma gun 1B on the side will be described with reference to Fig. 6. A pressure gradient type plasma gun 1B is attached to the cylindrical portion 12b provided on the side wall of the vacuum container 11. The plasma gun 1B has a glass tube 15b with one end closed by a cathode 14b. The glass tube 15b is fixed to the cathode 14b by a molybdenum (Mo) cylinder 18b containing La & e as a material and a Ta tube 17b. The tube 17b is used for guiding the transport gas 18 formed by the argon (Ar) and the atmosphere (He) into the plasma gun 1B. On the cathode 14b of the glass tube 15b and its opposite end and cylindrical portion -5- ΐ The paper size applies the Chinese National Standard (CNS) A4 specification (210x297 mm) (Please read the precautions on the back before filling This page). Binding · 34 34 Printed by the Central Standards Bureau of the Ministry of Economic Affairs, Shellfish Consumer Cooperative, printed A7 B7 5. Description of the invention () 12b, the first and second intermediate electrodes 19b & 20b are arranged concentrically. A ring-shaped permanent magnet 2U is embedded in the first intermediate electrode 19b (the first grid) to converge the plasma beam. Similarly, an electromagnetic coil b22b is embedded in the second intermediate coil 搔 20b (cell 2) to converge the plasma beam. This solenoid 圏 22b ^ is supplied by a power source 23b. An introduction coil 24b for introducing a plasma beam into the vacuum container (11) is provided around the cylindrical portion 12b to which the plasma gun 1B is attached. This lead-in wire 圏 24b is excited by the power source 25b. A variable voltage main power source 28b is connected between the cathode 14b and the first and second intermediate electrodes 19t > and 20b via drop resistors 26b and 27b, respectively. At the bottom of the vacuum container, a main electrolytic hearth 30b and a ring-shaped auxiliary electrolytic bed 31b arranged around it are arranged. The electrolysis main hearth 30b is provided with a concave portion that is injected into the plasma beam from the plasma gun 1B, and contains evaporative substances such as ITG (G- 钖 gaseous) chips. The main hearth 30b and the auxiliary hearth 31b for electrolysis are made of a conductive material having excellent thermal conductivity, for example, copper. And compared with the electrolytic main bed 30b, the electrolytic auxiliary hearth (31b) is installed in a state of separation. The electrolytic main hearth 30b is connected to the electrolytic auxiliary rib bed 31b through the resistor U8), and the electrolytic main hearth 30b is connected to the front side of the main power source 28b. Thus, the electrolytic main hearth 30b 卽 constitutes an anode required to absorb the plasma beam emitted from the plasma gun 1B. A chen-shaped permanent magnet 35b and an electromagnetic coil 36b are housed in the electrolytic auxiliary rib hearth 31b. Among them, the electromagnetic coil 36b # is supplied by the electrolytic hearth wire and power supply 381) -6 — This paper size applies to the Chinese National Standard (CNS) A4 specification (210 > < 297 mm) (please read the precautions on the back before filling (This page)-Binding and printing A7 B7 printed by the Consumer Cooperatives of the Central Standards Bureau of the Ministry of Economy In this case, the direction of the magnetic field reversal of the center of the electromagnetic coil 36b to be excited is the same as that of the center-side magnetic field generated by the ring-shaped permanent magnet 35b. The electrolytic hearth line power source 38b is a variable voltage type power source. When the voltage is changed, the current supplied to the electromagnetic coil 36b can be changed. Also inside the vacuum container 11, a substrate holder 42 is provided to hold a substrate 41 on the upper part of the electrolytic main hearth 30b where evaporated particles are vaporized. This substrate holder 42 is further provided with an electric heater 43. The electric heater 43 is powered by an electric power source 44 like a heater. The substrate holder 42 is supported with respect to the vacuum container 11 with electrical insulation. The vacuum container 11 and the substrate holder 42 are connected by a bias power source 45. As a result, the substrate holder 42 is biased at a negative potential with respect to the vacuum container 11 A connected at zero potential. The electrolytic auxiliary hearth 31b is connected to the front side of the main power source 28b via a change-over switch 46b. Here, the main power source 28b is connected in parallel with the drooping reactor 29b and the auxiliary discharge power source 47b via the off-Sib. In this ion plating apparatus, a plasma beam is generated by a discharge between the cathode of the plasma gun 1B and the electrolytic main hearth 30b in the odorless container 11 (not shown in Fig. 2). This plasma beam is guided to the main electrolytic hearth 30b by the magnetic field determined by the introduction coil 24b and the ring-shaped permanent magnet 35b in the electrolytic auxiliary hearth 31b. The evaporation substance stored in the electrolytic main hearth 301b is waited for (please read the precautions on the back before filling out this page). R— D " Force_! V J Lr It seems like 7 0 Yu-fat is steamed and heated * Additive sub-beams exit and body beams exit from the body. The paper size applies Chinese National Standard (CNS) A4 Specifications (210X297 mm) 45905 9 A7 A7 _B7_ printed by the Shellfish Consumer Cooperative of the Central Bureau of Standards of the Ministry of Economic Affairs 5. The surface of the invention was forged into a film on the substrate 41. Since the substrate 41 is a common component to be processed by the two plasma guns 1A and 1B, the substrate holder 42, the heater 43, the heater power source 44 and the bias power source 45 are common to the two plasma guns 1A and 1B. The structure of the side of the plasma gun ⑴A is also the same as that of the plasma gun 1B. If the configuration of the magnetic poles such as the plasma gun shown in Figure 3 (the first and second intermediate electrodes 103 and 104, and the 瑗 -shaped permanent magnet 189 is S type as described in Figure 3, the first and second intermediate electrodes The magnetic poles of the electrodes 103, 104 and the ring-shaped permanent magnet 109 are the N type opposite to the S type. The feature of the present invention is that the S type plasma gun and the N type plasma gun are arranged adjacent to each other. As shown in Figure 5 and Figure 5, due to the difference between the S-type plasma pin and the N-type plasma gun, the magnetic poles of the wires a24a, 24b, and the electrolytic-assisted hearth 31a, 31b are in opposite directions. In addition, the electrolytic auxiliary The hearths 31a and 31b may have only ring-shaped permanent magnets. For example, when the plasma gun 1A is single, as described in the second garden, before the plasma beam is injected into the electrolytic bed, the plasma beam is Since the left side of the figure is pulled out, it is shot into the electrolytic hearth 108 from above the electrolytic hearth 108. Therefore, if the plasma gun and electrolytic hearth of the same magnetic pole direction are arranged side by side, the plasma It will swell to the left in the figure, and then shoot it into the electrolytic bed. In contrast, as shown in Figure 5, an S-type battery is arranged on the right side of the middle. Gun U, with a 图 中 -type plasma gun 1B on the left side of the figure, and by making the two magnetic poles opposite each other, the bulged part of the plasma will be left and right symmetrical, especially -8 ™ This paper size is suitable for China Standard (CNS) Α4 Specification (2) 0 × 297 mm) --------------, 玎 ----- Γι, ι (Please read the precautions on the back before filling in this page ) 459059 A7 B7 Printed by the Consumer Cooperatives of the Central Standards Bureau of the Ministry of Economic Affairs 5. Description of the invention () 1 1 Plasma guns U \ 1B are arranged side by side as shown in Figure 5 ί Two-level 1 plasma beam meeting When they are close to each other and spread in an overlapping manner in the center, each 1 a is injected into the electrolytic bed 3E a, 30b 〇 Please 1 In this case »It is also possible to produce high I 1 in the area between the two plasma beams. Plasma t allows the use of high-density plasma for a wide area to apply 1 sub-plating away from the back surface. Note that 1 1 In order to reduce the harm caused by the plasma, the magnetic pole 项 t of the phase 5 in Figure 5 is the magnetic pole 闘 t of Figure 5, and the plasma gun 1B is installed on the right side of Figure 5, and on the left side of the figure. Placing the S-type plasma guns side by side (1A) c Result Page 1 can make the plasma near the center thinner. I 1 As mentioned above, by using the S and N-type Plasma Plasma Positions > The plasma density i between the plasma beams can be changed. However, a permanent magnet or iron 4 * 4 * core t can be placed inside or outside the vacuum container, and the plasma density can be controlled by 11 degrees. Fig. 4 圔 > Fig. 5 ί Placing a permanent magnet for plasma separation between the electrolytic auxiliary hearth 31 a, 31b 1 1 The electrolytic auxiliary hearth | 31 a, 3 1 b plasma When the OM sample is separated, the magnetic pole of the permanent magnet 10 1 I Xiang Nai is configured as an electric auxiliary furnace hearth 3 1 a, 31 b. The permanent magnets 1 1 and iron 10 are opposite to each other. The magnetic poles in the opposite direction are opposite to each other. 〇1 | 9 i In the case of plasma m 1B, 9 means that as shown in 1 I (Figure 7 U), 1 1 side is arranged on the ring-shaped long-time magnet 35b with the N pole facing upward, and the electromagnetic wire 圏 36b is arranged. As shown in the figure (b), Λ can also be arranged above the ring-shaped permanent magnet 35 b with 1 S so that the S pole faces 1¾ 3, and an electromagnetic wire I 1 9-1 1 1 is used in this paper. The standard of this paper is Chinese National Standard (CMS) A4 Specifications (2I0X297 mm) 459059 A7 B7 printed by the Consumer Cooperatives of the Central Standards Bureau of the Ministry of Economic Affairs 5. Description of Invention () 圏 (36b). In this case, the direction of the current flowing through the electromagnetic wire b36b should be reversed from the case shown in Fig. 7 (a). On the other hand, as shown in Fig. 7 (c), an electromagnetic coil 36b may be further disposed below the ring-shaped permanent magnet 35b with the N pole facing upward. As shown in Fig. 7 (d), an electromagnetic wire 36b may be further disposed below the ring-shaped permanent magnet 35b with the S pole facing upward. In these cases, as described above, the direction of the central magnetic field of the excited electromagnetic coil 36b can flow in the same direction as that of the central magnetic field generated by the ring-shaped permanent magnet 35b. INDUSTRIAL APPLICABILITY According to the present invention, an ion plating device can be provided, in which the guide poles of two plasma guns adjacent to each other in most plasma guns and the magnetic pole directions of the electrolytic auxiliary rib hearth are mutually On the contrary, in order to reduce the interference of the magnetic lines of force, the distortion of the plasma beam can be reduced. Therefore, it is possible to apply electroplating to a large area using high-density electric hair. Figure 1 illustrates a longitudinal sectional view of a conventional ion plating apparatus provided with a permanent magnet around an electrolytic hearth. Figure 2 is a sectional view taken along line A-A 'in Figure 1 and Figure 3 is illustrated in Figure 1. Plasma gun, lead-in wire in the device, magnetic pole closing of permanent magnets on the hearth side. Fig. 4 is a cross-sectional view of the ion plating apparatus according to the present invention. Fig. 5 is a cross-section of B HI in Fig. 4. Figure 6 is a cross-sectional view taken along the line C-C_ in Figure -10- (Please read the precautions on the back before filling out this page) • Packing. The size of the paper is applicable to the Chinese National Standard (CNS) A4 specification (210X297 (Mm) Λ 5 9 Ο 5 9 Α7 Β7 V. Description of the invention () Figure 7 shows the combination shown in Figure 5 Example of a simple explanation of the symbols in the figure 1 A, 1 B, 1 0 1 ... Mortar gun 11.106 ... Vacuum container 15b ......... Glass tube 17b ......... Pipe 19b, 103 ......... First intermediate electrodes 21a, 21b, 35b, 109 ...... 22a, 22b, 36b ......... 23b, 25b ... Power supply 26b, 27b, 2 9b. 28b ......... Main power supply 41.107 ... Substrate 43 ......... Electric heater 45 ......... Bias power supply 47b .. ....... Auxiliary Discharge power source Sib ......... Ring-shaped permanent magnet and ring-shaped permanent magnet with electromagnetic wire (please read the precautions on the back before filling this page) Cooperative printed 10 .............. Permanent magnets 14a, 14b, 102. Cathode 16b ......... Disc 18b ......... Circle Tubes 20b, 104 ... Second intermediate electrode ring-shaped permanent magnet electromagnetic coils 24a, 24b, 105 .. lead wires 30a, 30b, 10S ... main electrolytic hearths 31a, 31b ... Electrolytic auxiliary hearth 42 ............. Substrate holder 44 ........... Electric heat capacity power supply 46b ......... Switch 48b ... ....... Electromagnetic wire of the resistor 圏 -11 ~ This paper size is applicable to China National Standard (CNS) A4 specification (210X297mm)