487964 r A7 __B7___ 五、發明說明（1 ) 【發明所屬之技術領域】 本發明，係關於在微影成像(lithography)過程所使用之 曝光裝置，用以製造例如半導體元件、顯示裝置(液晶顯示 面板等）、攝影元件、及薄膜磁氣頭等，且特別是關於掃描 型曝光裝置，用以藉由將光罩及基板同步移動，將形成於 光罩的圖案之像轉寫至基板上。 【習知技術】 近年，作爲文書處理器、個人電腦、電視等之顯示元 件，液晶顯示面板已經廣爲使用。特別是在攜帶性受重視 的筆記型文書處理器或筆記型個人電腦，作爲顯示元件， 液晶顯示面板已成爲必需品。又，近年，超過20英吋的液 晶顯示面板已被實用化且因液晶顯示面板之設置場所不佔 空間，故作爲一般家庭用的電視，所使用之液晶顯示面板 的機會亦多了。 液晶顯示面板，係在玻璃平板等基板（以下稱爲平板) 上，將透明薄膜電極以光微影成像(photolithography)的方 法成形爲所希望的形狀而成。該微影成像過程中使用利用 掃描(scan)方式(掃描型）之曝光裝置，用以將形成於光罩的 原始圖案透過投影光學系統轉寫至平板上之光阻層。該掃 描方式的曝光裝置，係利用自照明光學系統射出的狹縫狀 照明光來照明光罩，光罩之原始圖案當中將被照射光照射 的該圖案一部分之像投影於平板上。然後，相對於來自照 明光學系統之照明光，與移動光罩同步，藉由相對於已通 3 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） —·-------^--------^-------- (請先閱讀背面之注意事項再填寫本頁) 487964 r ΚΙ ______Β7_ 五、發明說明(/ ) 過投影光學系統的照明光而移動平板，經由光罩以照明光 掃描曝光平板而將光罩之原始圖案全部轉寫至平板上。 (請先閱讀背面之注意事項再填寫本頁) 又’最近，液晶顯示面板進行大型化，而平板之面積 年年加大，但現狀爲光罩之大型化無法對應平板之大面積 化。因此，利用步進且掃描的方式之曝光裝置亦正開發中 ，該曝光裝置係用以對平板之一部分進行掃描曝光，邊依 序使平板步進移動，邊在平板之不同位置上反覆進行掃描 曝光。 然而，在如上述的掃描方式之曝光裝置之情形，爲了 的掃描方式之曝光裝置之情形，爲將光罩及平板相對於狹 縫狀照明光同步移動並進行掃描曝光，狹縫狀照明光到達 光罩之圖案區域（待轉寫的圖案所形成的區域）之前以及已 通過該圖案區域之後，需要遮住照明光，以免由於通過該 圖案區域的照明光曝光平板。因此，通常在光罩之圖案區 域外側，設有以蒸鍍而形成的鉻等來構成的遮光帶域(遮光 區域）。 若不設置上述的遮光帶域，則在平板上待轉寫光罩圖 案之像的部分以外之部分將受到曝光，而使轉寫圖案的效 率降低。又，亦可考慮將該部分劃線(scdbe-line)，也就是 說，將該部分利用於在形成回路等後用來切斷各回路，但 隨著掃描速度之高速化等，劃線的寬度亦增加，結果，轉 寫圖案的效率降低。 該遮光帶域，係相較於在光罩之掃描方向上光罩上之 照明光之照射區域之寬度(利用在掃描方向上分開的複數的 4 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 487964 f A7 B7 五、發明說明（a ) 部分照明光來掃描光罩的方法上，先出發的部分照明光之 前端緣與隨後繼續的部分照明光之後端緣間之尺寸），有必 要加寬。實際上，在掃描曝光時與移動速度的關係上，因 爲也有必要考慮光罩或平板之加速及減速距離，故有必要 確保比照明光之寬度爲大的足夠的遮光帶域寬度。 然而，光罩係一般在透明的玻璃基板上蒸鍍鉻而成， 若加大蒸鍍面積，則大多產生小孔(pinhole)等點缺陷，而 若遮光帶域上有點缺陷，則將曝光本來不應曝光的部分。 如上所示，若加寬了光罩之遮光帶域，則點缺陷的機率變 高，致在進行平板的曝光上並不理想等問題發生。還有， 若加寬遮光帶域，則發生光罩之成本將上升的問題。 【發明欲解決之課題及解決課題之手段】 本發明之目的，係提供曝光方法及裝置，能用於在不 加寬形成於光罩上的遮光帶域之寬之下，僅曝光感光基板 之所望的區域。另一目的，係提供能用於以高生產量曝光 大型平板等基板的曝光方法及裝置。又，另一目的，係提 供顯示裝置之製造方法，用於能以高生產性製造液晶顯示 面板等顯示裝置。 本發明之曝光裝置，係用於對來自光源之照明光讓光 罩及感光基板做相對移動，並用照明光經由光罩來掃描曝 光感光基板。又，具備照明光學系統，用以將照明光照射 至光罩；投影光學系統，用以將光罩圖案的像投影至感光 基板上；平台裝置，用以在掃描曝光時讓光罩及感光基板 5 (請先閱讀背面之注意事項再填寫本頁) 裝 .. 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 487964 A7 五、發明說明（ϋ() (請先閱讀背面之注意事項再填寫本頁) 同步移動；及遮光構件，其可以大致朝光罩所移動的第一 方向移動，以遮斷從照明光學系統射出的照明光之光路， 遮光構件，係光罩之移動中，用以移動成至少覆蓋光罩之 一部分。 又，投影光學系統之較佳者’係具有用於形成圖案之 像之互相分開的複數個投影區域(曝光區域），而在第1方 向上，將複數個投影區域（曝光區域）彼此分開配置，並在 與第1方向直交之第2方向上，將複數個投影區域(曝光區 域)以至少在其一端上局部重疊的方式加以配置。此時，投 影光學系統之較佳者，係具有複數個光學模組，其用於將 複數個投影區域(曝光區域)分別界定成以第2方向爲長邊 方向之矩形，該複數個光學模組，係分別將圖案之一次像 再度成像於感光基板上，並將用以界定投影區域(曝光區域 )之視野光闌配置於一次像之形成面或者其附近。 又，照明光學系統之較佳者，係向包含關於投影光學 系統之與複數個投影區域共軛之複數個視野區域之光罩上 之照明區域照射照明光，該照明區域，係對應複數個視野 區域而分割成複數個區域，照明光學系統，係將照明光分 割成複數個並分別照射到複數個照明區域。此時，照明光 學系統之較佳者，係含有複數個部份光學系統及光分配器 ，前者係設於對應各個複數個照明區域之處，後者係用以 將來自光源之照明光分配至複數個部份光學系統；照明光 學系統，係亦可將從複數個光源所產生之照明光分別入射 光分配器。還有，遮光構件，係亦可設於對應各個複數個 6 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐〉 487964 A7 __ B7___ 五、發明說明（<；) n n n 11 VMM V··· MW l n (請先閱讀背面之注意事項再填寫本頁) 投影區域之處，而照明光學系統，係亦可作成對應光罩之 移動，將關於投影光學系統之與複數個投影區域共軛之複 數個視野區域用照射光進行選擇性的照射。 # 若要利用本發明之曝光裝置，則在光罩移動中（大致相 當於在掃描曝光中）要以覆蓋光罩之至少一部分的方式來移 動遮光構件。因此，例如若將光罩之圖案區域之外側部分( 相當於習知之遮光帶)用遮光帶來覆蓋，則理想上就不需要 在光罩上設置遮光帶。然而，因爲遮光構件對光罩移動之 追蹤性能的關係，希望在光罩上設置遮光帶。然而，遮光 帶之寬度，係與照明光之寬度等沒關係，而能由與遮光構 件之追蹤性能的關係來決定，故相較於習知者較能使遮光 帶之寬度變小。因此，一邊能讓圍繞光罩之圖案區域的遮 光帶寬度變爲最小，一邊利用掃描曝光而能僅曝光感光基 板上所望之區域。又，若在光罩上設置遮光帶，則即使在 遮光帶上產生小孔等缺陷，亦能防止因該缺陷以致感光基 板之不要的部分被曝光。 又，本發明之顯示裝置之製造方法，係使用如申請專 利範圍第1項〜第9項之任一項所記載之曝光裝置。又， 含有一步驟，係將光罩（其上形成有構成顯示元件之圖案) 及感光性之平板對於照明光做相對移動，並在相對移動中 讓遮光構件大致順沿光罩之移動方向移動，將圖案的像轉 寫至平板上。此時，較佳者係在投影光學系統之視野內互 相分開的複數個投影區域（曝光區域）上，形成圖案的像， 同時跟隨光罩之移動，對關於投影光學系統之與複數個投 7 本紙張尺度適用中國國家標準（CNS)A4規格（21〇 χ 297公釐） 487964 A7 ___B7____ 五、發明說明（ς ) 影區域（曝光區域）共軛的複數個視野區域，用照明光選擇 性地照射。 -n n n n n ·ϋ βϋ n n 1 · ϋ 产 (請先閱讀背面之注意事項再填寫本頁) 再者，本發明之曝光方法，係將光罩及感光基板對於 來自光源之照明光做相對移動，並透過光罩用照明光掃描 曝光感光基板。又，在投影光學系統之視野內互相分開的 複數個投影區域（曝光區域）上，形成光罩之圖案的像，並 在相對移動中，將關於投影光學系統之與複數個投影區域( 曝光區域)共軛的複數個視野區域用照明光選擇性地照射， 同時將局部遮住入射感光基板之照明光之遮光構件，大致 順沿光罩的移動方向移動。 【發明之實施例及發明之效果】 麝 以下，參考圖面來就有關本發明之實施例之曝光裝置 做詳細的說明。，圖1係採用本發明實施例之曝光裝置之立 體圖。又，在以下的說明中，設定如圖1所示的XYZ直角 座標系，並一邊參照該XYZ直角座標系，一邊就各構件之 位置關係做說明。如圖1所示的XYZ直角座標系中，將形 成有既定原圖案PA之光罩2以及在玻璃基板上塗布有光 阻之平板6所移動之方向(掃描方向)設爲X軸方向，將在 光罩2之平面內與X軸直交的方向設爲Y軸方向，將光罩 2之法線方向設爲Z軸方向。實際上係將圖1中之XYZ直 角座標系之XY平面設成與水平面平行的面，而將其Z軸 設在鉛直方向上。 圖1中，照明光學系統1，係射出具有大致均等照度 8 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 487964 A7 _一 —___B7______ 五、發明說明（5 ) 的照明光，並平均地照射圖中XY面內之光罩2。關於該 照明光學系統之較佳者係例如圖2所示之構成。圖2係表 示係表示圖1所示之照明光學系統1之具體構成之一例。 圖2中，橢圓鏡20之內部上設有用以產生照明光(例 如g線(436nm)或i線(365nm))之水銀燈等光源，來自該光 源之照明光藉由橢圓鏡20而聚焦於第2焦點。由橢圓鏡 2〇所聚焦的照明光，係經由光閘(shuttei〇20a而形成光源像 於光導向器(light guide)21上。此處，光閘20a ’係在開的 狀態將讓照明光通過，而在閉的狀態將遮斷照明光而停止 對光罩2照明。光導向器21，係在其射出端21a、21b上 形成均等光強度分布之2次光源。又，光導向器21之較佳 者，係由無規則成束之光纖所構成。 自光導向器21所射出之光束，係分別經由中繼透鏡 (relay lens)22a、22b而入射作爲光學積分器（optical integrator)之複眼透鏡（fly’s eye lens) 23a、23b。在複眼透 鏡23a、23b之射出面側，分別形成由許多光源像所構成之 面光源，亦即2次光源。來自2次光源之光，係經由聚焦 透鏡24a、24b(其前側焦點大約與2次光源之形成位置(複 眼透鏡23a、23b之射出側焦點面)一致)而平均地照射具有 矩形開口部25a、25b之視野光闌25。 通過視野光闌25之照明光，係分別經由透鏡26a、 26b，並利用鏡子27a、2%來使其光路偏向90。，而抵達 透鏡28a、28b。此處，透鏡26a與透鏡28a以及透鏡26 b 與透鏡28b，係用於讓視野光闌25及光罩2成爲共軛之中 9 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） ^ 裝--------訂--------· (請先閱讀背面之注意事項再填寫本頁) 487964 A7 _____ B7_ 五、發明說明（令） 繼(relay)光學系統，而通過透鏡28a、28b之照明光，係形 成照明領域（視野光闌25之開口部25a、25b之像)29a、 29b。 又，視野光闌25之開口部25a、25b之形狀並不局限 於矩形。該照明區域之形狀之較佳者，係儘可能相似於投 影光學系統之視野形狀。又，圖2中爲了簡單說明，用以 形成照明區域29c〜29g之照明光學系統係僅表示其光軸。 又’圖2中之光導向器21(未圖示)係，具有與光罩2上之 照明區域相同數目（本例中有7個）之射出端，並向照明區 域29c〜29g供給來自光導向器21(未圖示)之射出端之照明 光。 又，本例中雖然假設在照明光學系統內將視野光闌25 配置於與光罩2之圖案形成面共軛之面或是該面附近，但 也可以讓視野光闌25接近該圖案形成面而配置，或是在後 述的投影光學系統5內將視野光闌25配置於與光罩之圖案 形成面共軛之面或是該面附近。 還有，省略前述光閘20a，在用以形成照明區域29a〜 29g之照明光學系統之各光路途中（例如，視野光闌25及 透鏡26a、26b之間)設置光閘，也可以將照射到各照明區 域29a〜29g之照明光選擇性地遮住。 又，如圖2所示，若用一個光源而光量不足時，則應 用如圖3所示的構成也可以。圖3係代表照明光學系統之 變形例主要部分之示意圖。又，圖3中雖然視光導向器32 具有5個射出端32a〜32e，然而如圖1、圖2所明白表示 10 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） "" "" """ « m n· I— n n 1>1 —Be tmmi l I^· n ammt (請先閱讀背面之注意事項再填寫本頁) 訂· 麯 487964 A7 ____B7 _ 五、發明說明（' ) ，本例中之光導向器32係具有7個射出端，這是圖3爲方 便而將其射出端當作5個圖示。 (請先閱讀背面之注意事項再填寫本頁) 圖3中來自水銀燈等光源30a〜30c之照明光，係經由 橢圓鏡30a〜3〇c被聚集並形成光源像。又，光導向器32 係設置成其入射端位於該光源像形成位置，且經由光導向 器32的照明光係在複數個射出端32a〜32e形成具平均的 光強度分布之2次光源。希望該光導向器32係與圖2之光 導向器21相同，將光纖不規則地束起而構成。從射出端 32a〜32e至光罩2之光路，係因與圖2所示之照明光學系 統相同，故此處省略說明。 又，取代用於形成前述複數個照明區域29a〜29g之照 明光學系統，應用另一照明光學系統也可以，該照明光學 系統，係用於在一個往與掃描方向（X軸方向）直交的方向 延伸之矩形區域內照明光罩2。這樣的光學系統可以視爲 一種採用向Y軸方向延伸之棒狀光源者。又，本例（圖1、 圖2)中雖然已經視爲形成7個照明區域29a〜29g，但該個 數係任意個數就可以，且照明光學系統及投影光學系統上 同樣地只要根據照明區域之個數來設定即可。此時，對應 於2個照明區域之下至少要設置1個照明光學系統或投影 光學系統即可。又，雖然圖3中設有3個光源，且光導向 器32具有3個入射端，但是光源及入射端之個數係任意個 數即可，例如根據分歧數（光導向器之射出數的個數）、平 板上所要求之照度、及光源之功率等來決定即可。當然， 光導向器之射出端之個數也根據照明光學系統（照明區域) 11 本紙張尺度適用中國國家標'準（CNS)A4規格（210 X 297公釐） 487964 A7 __ B7 ___ 五、發明說明（V〇 ) 之個數來決定即可，也就是說，光導向器之入射端及射出 端之個數之組合係爲任意的即可。 回到圖1，光罩2係載置於能在圖中X軸方向移動之 光罩台3上。在光罩2及光罩台3之下方設有用來遮照明 光（自照明光學系統1射出並透過光罩2)之遮光物(blind)( 視野光闌、屏蔽片(masking · blade))4。 該遮光物4係以在空間內能移動的方式構成，且其移 動的動作被設定成數種類。例如以在XY平面內能平行移 動的方式構成，或以在ZX平面內能以遮光物4外的點爲 中心旋轉的方式構成。 遮光物4，係由如圖1所示的板狀體之構件所構成也 可以，例如由用未圖示之一對捲軸所捲起之能移動的可撓 薄板(flexible sheet)所構成者即可，該可撓薄板，係用於利 用具可撓性之透明材質來在既定位置形成遮光部。 又，圖1中雖然僅圖示一片遮光物4，但遮光物4由 複數片遮光物所構成也可以。 再者，圖1中雖然圖示僅由一片遮光物4來遮住通過 光罩2之照明光的場合，但是也能以將如圖1所示的照明 光學系統1之視野區域2a〜2g個別遮住的方式，在每個視 野區域2a〜2g上分別設置遮光物。該場合時，在每個視野 區域2a〜2g上分別設置複數片遮光物也可以。又，在視野 區域2a〜2d及視野區域2e〜2g設置不同的遮光物，即， 將在光罩2之掃描方向(X軸方向）上的位置相同之視野區 域視爲一群，並在每一群設置一遮光物也可以。又，遮光 12 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） (請先閱讀背面之注意事項再填寫本頁) 裝 487964 A7 _________B7_____ 五、發明說明（〇 ) --- » * (請先閱讀背面之注意事項再填寫本頁) 物4的位置，係不限於在光罩2與投影光學系統5之間， 也可以配置於投影光學系統5與平板6之間、或與投影光 學系統5中光罩之圖案形成面共軛的面、或該共軛面之附 近。 以下，參照圖4來說明投影光學系統5。又，投影光 學系統5，係由複數(本例爲7)個部分投影光學系統5a〜5g 所構成，各部分投影光學系統5a〜5g係因分別具有相同的 構成，故此處爲簡單說明，僅就部分投影光學系統5a敘述 〇 圖4係代表部分投影光學系統5a構成之槪略圖。該部 分投影光學系統5a，係由組合2組戴森型光學系統所構成 。圖4中之部分投影光學系統5a，係由第1光學系統40、 視野光闌41、及第2光學系統42所構成，其中第1光學 系統40及第2光學系統42，係分別將戴森型光學系統變 形後而成。 第1光學系統40，係具有： 具反射面之直角稜鏡43，係配置成相對於光罩2之面 成45°傾斜； 平凸透鏡構件44，係具有沿光罩2之面內方向之光軸 ，且將凸面朝向直角稜鏡43之相反側； 透鏡構件45，係其全體呈新月形，並將凹面朝向平凸 透鏡構件44側；及 具反射面之直角稜鏡46，係與直角棱鏡43之反射面 直交，且配置成相對於光罩2之面成45 β傾斜。 13 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 487964 A7 _____B7 五、發明說明（（〆） 然後，來自照明光學系統1並經由光罩2之光，係藉 直角稜鏡43，其光路偏向90°，並入射與直角稜鏡43接 合之平凸透鏡構件44。該平凸透鏡構件44上，接合著由 與平凸透鏡構件44不同之玻璃材料所構成之透鏡構件45 ，來自直角稜鏡43之光，係在平凸透鏡構件44與透鏡構 件45間之接合面44a折射，並抵達蒸鍍有反射膜之反射面 45a 〇 在反射面45a被反射的光，係在接合面44a折射，並 抵達與平凸透鏡構件4接合的直角稜鏡46。來自平凸透鏡 構件44之光，係藉直角稜鏡46，其光路偏向90。並在該 直角稜鏡46之射出面側形成光罩2之1次像（中間像）。此 處，第1光學系統4〇所形成之光罩2之1次像，係一等倍 像，其在X軸方向(光軸方向）之橫向放大率爲正，且在γ 軸方向之橫向放大率爲負。 來自1次像之光，係經由第2光學系統42而將光罩2 之2次像形成於平板6上。第2光學系統42，係與第1光 學系統40相同，具有_· 具反射面之直角稜鏡47，係配置成相對於光罩2之面 成45°傾斜； 平凸透鏡構件48，係具有沿光罩2之面內方向之光軸 ，且將凸面朝向直角稜鏡47之相反側； 透鏡構件49，係其全體呈新月形，並將凹面朝向平凸 透鏡構件48側；及 具反射面之直角稜鏡50，係與直角稜鏡47之反射面 14 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） —裝--------訂--------* (請先閱讀背面之注意事項再填寫本頁) 487964 A7 _B7 _ 五、發明說明（\3) 直交，且配置成相對於光罩2之面成45°傾斜。 然後，自直角稜鏡46之射出面側射出的光，係藉直角 稜鏡47，其光路偏向90°，並入射與直角稜鏡47接合之 平凸透鏡構件48。該平凸透鏡構件48上，接合著由與平 凸透鏡構件48不同之玻璃材料所構成之透鏡構件49，來 自直角稜鏡47之光，係在平凸透鏡構件48與透鏡構件49 間之接合面48a折射，並抵達蒸鍍有反射膜之反射面49a 〇 在反射面49a被反射的光，係在接合面48a折射，並 抵達與平凸透鏡構件48接合的直角稜鏡50。來自平凸透 鏡構件50之光，係藉直角稜鏡46，其光路偏向90°並在 平板6上形成光罩2之2次像。 該第2光學系統42，係與第1光學系統40相同，形 成一等倍像，其橫倍率係X軸方向成爲正且Y軸方向成爲 負。因此，在平板6上所形成之2次像將變成光罩2之等 倍正像（上下左右方向之橫倍率成爲正之像）。此處，部分 投影光學系統5a(第1光學系統40及第2光學系統42)係 兩側遠心光學系統(telecentric optical system)。 又，上述之第1光學系統40及第2光學系統42，係 其反射面45a、49a都以朝同一方向的方式而構成。藉此， 能謀求投影光學系統全體之小型化。本實施例之第1光學 系統40及第2光學系統42，係構成爲將平凸透鏡構件44 、48與反射面45a、49a之間的光路用玻璃材料埋住。藉 此，有平凸透鏡構件44、48與反射面45a、49a間的偏心 15 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） · ^ —裝--------訂--------» (請先閱讀背面之注意事項再填寫本頁) 487964 A7 五、發明說明（4) 將不發生的優點。 一又’弟1光學系統40及第2光學系統42，係如圖5 所^將平凸透鏡構件44、48與反射面仏、恢之間當 作空氣，即戴森型光學系統本身之構成也可以。 本實麵Φ，絲1 絲42所誠之i次像之位 置上配置_?細41。圖6 _涵野細41之例。視 野光闌41，係例如，如圖6a所示，具有台形開口部41&。 藉由該視野光闌41，平板6上之曝光區域頒明光之照射 區域)被界定成台形狀。 此處’如圖6a之虛線所示，因本實施例之戴森型光學 系統之平凸透鏡構件44、透鏡構件45、平凸透鏡構件48 、透鏡構件49之截面(YZ平面)形狀係圓形，故能取得之 最大視野區域大致呈半圓形。此時，由視野光闌41所界定 之台形狀視野區域2a之較佳者，係一對平行邊之短邊成爲 半圓狀區域之圓弧側。藉此，對於戴森型光學系統能取得 之最大視野區域，能讓視野區域之掃描方向（X軸方向）之 寬度爲最大，並能提高掃描速度。 又，視野光闌41，係如圖6c所示，構成爲具有六角 形狀之開口部41b也可以。此時，如圖6d所示，六角形狀 之開口部大小，係要在圖中虛線所示之最大視野區域之範 圍內。又，如圖6b及圖6d之虛線所示，最大視野區域， 係通過第1光學系統40及第2光學系統42之軸外光束當 中，通過最靠外側之光束包圍在光罩2上通過的點之區域 〇 16 i--------^-------- * - (請先閱讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公爱） 487964 A7 __B7_ 五、發明說明（\< ) -----------—裝— » t C請先閱讀背面之注意事項再填寫本頁) 回到圖1，就部分投影光學系統5a〜5g之配置來說明 。圖1之部分投影光學系統5a〜5§，係具有由部分投影光 學系統5a〜5g內所設之視野光闌41所界定之視野區域2a 〜2g。視野區域2a〜2g之像在平板6上之曝光區域6a〜 6g上形成爲等倍之正像。 又，部分投影光學系統5a〜5d，係設置成沿圖中Y軸 方向上排列。又，部分投影光學系統5e〜5g，係設於與視 野區域2a〜2d之圖中X軸方向上之不同位置，並且視野 區域2e〜2g沿Y軸方向上排列。此時，部分投影光學系 統5a〜5d及部分投影光學系統5e〜5g，係設置成位於與 其分別所具有之各直角稜鏡極靠近的位置。又’雖也可以 將部分投影光學系統5a〜5g以X軸方向上之視野區域2a 〜2d與視野區域2e〜2g的間隔較寬的方式配置，但此時 不佳，係因掃描曝光時之光罩2及平板6之移動量增加而 導致生產量降低的關係。 在平板6上，係藉由部分投影光學系統5a〜5d，形成 沿圖中Y軸方向上所排列之曝光區域6a〜6d，且藉由部分 投影光學系統5e〜5g，則形成與曝光區域6a〜6d不同位 置之沿Y軸方向上所排列之曝光區域〜6g。該等曝光區 域6a〜6g，係視野區域2a〜2g之等倍正像。 此處，如前述，光罩2係載置於在圖中X軸方向上能 平行移動之光罩台3上，平板6係載置於平板台7上。又 ，平板台7係載置於在XY平面內能平行移動之XY台8 上。又，光罩台3與平板台7會在圖中X軸方向上同步移 17 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 487964 A7 B7 —-- 五、發明說明（Λ) 動。藉此，照明光學系統1所照明之光罩之像將轉寫至平 板6上，即進行所謂之掃描曝光。若藉光罩2之移動’以 使視野區域2a〜2g所致之整面光罩2之掃描完成後，則光 罩2之全體像將轉寫至整面平板6上(步進且掃描方式上則 爲局部）。 平板台7上，設置有具沿Y軸上之反射面之反射構件 9、及具沿X軸上之反射面之反射構件10。又，在曝光裝 置本體側設置有： 雷射光源11，係作爲干涉計，例如用以提供氦氖（波 長633mn)等雷射光； 分束器12,係用於將來自雷射光源11之雷射光分成 X軸方向測定用雷射光及Y軸方向測定用雷射光； 稜鏡13，係用於向反射構件9投射來自分束器12之 雷射光；及 稜鏡14、15，係用於向反射構件1〇上之2點投射來 自分束器12之雷射光。 藉此即可檢測平板台7之乂軸方向位置、丫軸方向位 置、及XY平面內之又，圖1中用於檢 測由反射構件9、10所反射之雷射光與參考用雷射光之干 涉光之檢測系統而言，係省略圖示。 其次，參考圖7來說明本實施例之視野區域之配置。 圖7，係表示部分投影光學系統5a〜5g所形成之視野區域 與光罩2之平面上之位置關係。圖7中，光罩2上形成原 始圖案PA，遮光部LSA設置成包圍該原始圖案pa之區域 18 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公爱） -----------·裝--- w i (請先閱讀背面之注意事項再填寫本頁) » · 487964 A7 ______B7__ 五、發明說明（xA) 。遮光部LSA之寬度，係與習知一般所形成之寬度相同程 度之寬度，例如寬度2mm。 (請先閱讀背面之注意事項再填寫本頁) 如圖2所示之照明光學系統1，係平均地照明由圖中 虛線所圍繞之照明區域29a〜29g。在該照明區域29a〜29g 內，排列著前述視野區域2a〜2g。該等視野區域2a〜2g， 係經由部分投影光學系統5a〜5g內之視場光闌41，其形 狀將大致成爲台形狀。此處，視野區域2a〜2d之上邊(一 對平行邊中之短邊)與視野區域2e〜2g(—對平行邊中之短 邊)係排列成彼此對峙的狀態。此處，沿遮光部LSA之視 野區域2a及2d之形狀，係以遮光部LSA側之斜邊(一對 平行邊以外之邊)與原始圖案PA之區域邊緣一致的方式所 界定。又，視野區域2a及2d與光罩2之遮光部LSA重疊 之形狀也可以。 本實施例中，因部分投影光學系統5a〜5g係遠心光學 系統，故在XY平面內，部分投影光學系統5a〜5g所佔之 區域比其各個視野區域2a〜2g所佔的區域爲大。因此’視 野區域2a〜2d之排列係一定要構成爲在各區域2a〜2d間 具有間隔。此時，若僅用視野區域2a〜2d來進行掃描曝光 ，則不能將視野區域2a〜2d間之光罩上的區域投影至平板 6上。因此，本實施例中，因爲要在視野區域2a〜2d間之 區域進行掃描曝光，故構成爲根據部分投影光學系統5e〜 5g來設置視野區域2e〜2g。此時，希望沿掃描方向(X軸 方向）之視野區域2a〜2g(或曝光區域6a〜6g)之寬度總和係 在Y軸方向各位置上始終一定。 19 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 487964 A7 _______B7____ 五、發明說明（）$) -----------裝—— -- (請先閱讀背面之注意事項再填寫本頁) 其次，參考圖8a、8b說明在平板6上之曝光量。圖 8a、8b係用以說明各視野區域2a〜2g之曝光量。圖8a、 8b中，橫軸係平板6上之Y軸方向的位置，縱軸係表不曝 光量。又，圖8a係表示曝光區域6a〜6g之各曝光量，圖 8b係表示曝光區域6a〜6g之各曝光量的總和。 圖8a中，在平板6上，可獲得對應各台形曝光區域 6a〜6g之各曝光量分布Ea〜Eg。此處，掃描曝光，係因 由曝光區域6a〜6g之X軸方向寬度之總和爲一定的方式 所界定，故曝光區域6a〜6g之重疊區域始終是相同的曝光 量。例如就對應曝光區域6a之曝光量分布Ea與對應曝光 區域6e之曝光量分布Ee所重疊之區域而言，因曝光區域 6a之X軸方向寬度與曝光區域6e之X軸方向寬度之總和 爲一定，故該重疊區域之曝光量總和係與未重疊區域之曝 光量相同。因此，在平板6上可獲得如圖8b所示整面平均 的曝光量分布E。 又，上述的說明中，雖說明著曝光區域6a〜6g爲台形 的場合，但用於獲得平均的曝光量分布之曝光區域之組合 並不限於台形。例如，藉由具有如圖6c所示形狀之開口部 41b之視野光闌41來形成複數個六角形曝光區域之場合， 以各曝光區域之掃描方向寬度始終爲一定的方式界定各曝 光區域。藉此，在整面平板6上可獲得平均的曝光量分布。 其次，如前所述，因可將遮光物4作成各種構成，故 以下的說明中，將就曝光裝置之動作以遮光物4之各種構 成加以區分並說明。 20 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） ' — 487964 A7 ____B7____ 五、發明說明（) 【第1動作例】 -------------- 0*· (請先閱讀背面之注意事項再填寫本頁) 圖9a〜9d、圖10a〜10d中，係說明有關本實施例之 曝光裝置之第1動作例。又，圖9a〜9d及圖10a〜l〇d中 ，爲了容易理解，故在如圖1所示之各構件當中，僅槪略 表示形成有光罩之原始圖案PA之區域、遮光物4、投影光 學系統5、及平板6上待曝光之區域。 又，圖9a〜9d及圖10a〜10d中，在形成有光罩2之 原始圖案PA之區域上附加符號55並稱爲圖案區域，在平 板6上待曝光之區域上附加符號56並稱爲被曝光區域。又 ，圖9a〜9d及圖10a〜10d中，不圖示光罩而僅誇張圖示 該圖案區域55，在包含該圖案區域55之掃描方向SD側( 本例中，例如+X方向)及與掃描方向SD相反之方向側(-X 方向）之周圍部上形成遮光部LSA。 圖9a〜9d及圖10a〜10d中，係將說明如圖1所示之 遮光物4由2個遮光物4a、4b所形成之場合之曝光裝置之 動作。遮光物4a及遮光物4b係大致呈矩形，並以圖1中 將其位置在Z方向上錯開且與XY平面(光罩2)平行的方式 配置於光罩2與投影光學系統5之間。又，圖9a〜9d及圖 10a〜10d中，將圖1中之投影光學系統5以槪念圖的方式 呈現，在第1光學系統40 (具備投影光學系統5之部分投 影光學系統5a〜5g)、視場光闌41、及第2光學系統42(參 考圖4)上分別附加符號60、61、62並簡化後加以圖示。 自圖1中之照明光學系統1所射出的照明光EL若入射第1 光學系統60，則經由視場光闌61及第2光學系統62被曝 21 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 487964 A7 _____B7__ 五、發明說明（/) 光區域56將被曝光。 又，圖9a〜9d及圖l〇a〜l〇d中，第1光學系統6〇、 視場光闌61、及第2光學系統62在空間中靜止，且圖案 區域55、遮光物4a、4b、及被曝光區域56朝圖中之符號 SD之掃描方向（圖1中之X軸方向)移動。遮光物4a、4b 在掃描方向SD之寬度係爲了覆蓋並隱藏第1光學系統60 之上部而要設定成足夠的寬度。 曝光動作開始前，如圖9a所示，以讓自照明光學系統 1所射出的照明光EL不入射第1光學系統60的方式’將 遮光物4a配置於第1光學系統60。又，本實施例中’曝 光動作開始前，即光罩2之圖案區域55與平板6之被曝光 區域56以同步的方式往掃描方向SD移動前，照明光EL 也照射著。曝光動作一旦開始，光罩2之圖案區域55與平 板6之被曝光區域56就一邊取得同步，一邊開始往掃描方 向SD移動。 又，雖遮光物4a也往掃描方向SD開始動作，但如圖 9b所示，在圖案區域55之端部55a及被曝光區域56之端 部56a抵達位置ES之前，遮光物4a係以其端部63自位置 ES起不往掃描方向SD側前進的方式移動。即，圖案區域 55之端部55a、遮光物4a之端部63、及被曝光區域56之 端部56a配置於與掃描方向SD成垂直之同一平面上，且 自抵達位置ES的時候起對在圖案區域55上所形成之原始 圖案之被曝光區域56開始曝光。 曝光一開始，就如圖9c所示，圖案區域55、遮光物 22 尺度適用中國國家標準（CNS)A4規格（210 X 297公爱1 —裝--------訂--------* •· (請先閱讀背面之注意事項再填寫本頁) 487964 A7 ----- -B7___ 五、發明說明（/\ ) -----------^--- ···- (請先閱讀背面之注意事項再填寫本頁) 4a、及被曝光區域56以相同速度同步地往掃描方向SD移 動且進行曝光。曝光進行，然後如圖9d所示，遮光物4a 之端部63 —旦通過位置El，遮光物4a就停止移動。另一 方面，遮光物4a即使停止移動，圖案區域55及被曝光區 域56也以相同速度同步地繼續往掃描方向SD移動並進行 曝光。 圖案區域55及被曝光區域56 —邊往掃描方向SD同 步，一邊繼續移動，並如圖l〇a所示，在圖案區域55之端 部55b及被曝光區域56之端部56b抵達位置ES後，遮光 物4b要移動，以讓其端部64位於位置ES。即，圖案區域 55之端部55b —旦抵達位置55b，光罩2上所形成之遮光 部LSA就受到照明光EL之照明，若遮光部LSA上有孔洞 等點缺陷，則平板上待曝光（被曝光區域56)以外的部分 也將被曝光。爲防止此現象發生，藉由遮光物4b來將通過 圖案區域55以外的光遮住。 之後，雖圖案區域55及被曝光區域56同樣地一邊同 步，一邊以既定速度往掃描方向SD移動，但如圖10b所 示，保持在圖案區域55之端部55b、遮光物4b之端部64 、及被曝光區域56之端部56b配置於與掃描方向SD成垂 直之同一平面內之狀態下，遮光物4b係與圖案區域55及 被曝光區域56同步移動。 圖案區域55、遮光物4b、及被曝光區域56同步往掃 描方向SD前進，然後遮光物4b之端部64 —旦位於圖10c 中之位置EE，遮光物4b就覆蓋第1光學系統60之上部， 23 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 487964 A7 -— B7 ___ 五、發明說明（X>〇 並因成爲照明光EL不入射第1光學系統60的狀態，故曝 光在此狀態結束。之後，如圖l〇d所示，遮光物4b之端部 64位置EE起往掃描方向Sd前進，且在遮光物4b之端部 65位於在掃描方向SD之比位置ES爲前側之狀態，圖案 區域55、遮光物4b、及被曝光區域56之動作停止，然後 一連串之曝光動作結束。 【第2動作例】 圖11a〜lid、圖12a〜12d係說明有關本實施例之曝 光裝置之第2動作例。又，圖iia〜lid及圖12a〜12d係 與圖9a〜9d、圖10a〜l〇d相同，爲容易理解，故在如圖1 所示之各構件當中，僅槪略表示形成有光罩之原始圖案PA 之區域、遮光物4、投影光學系統5、及平板6上待曝光之 區域，並在形成有光罩2之原始圖案PA之區域上附加符 號55並稱爲圖案區域，在平板6上待曝光之區域上附加符 號56並稱爲被曝光區域。 如圖11a〜lid及圖12a〜12d所示之曝光裝置上，雖 與如圖9a〜9d及圖10a〜10d所示之曝光裝置相同，將作 爲遮光物4之2片遮光物4c、4d配置於與遮光物4a、4b 相同的位置，但將遮光物4c、4d之掃描方向SD之寬度設 定成比遮光物4a、4b爲狹窄的寬度。本例中，遮光物4c 、4d之寬度係至少具有足夠覆蓋隱藏第1光學系統60之 上部之寬度就可以。 又，本動作例中，圖1中之照明光學系統1係控制例 24 本紙張尺度適用中國國家標準（CNS)A4規格（210 χ 297公釐） I----I IAW------ ~ 訂· —------- (請先閱讀背面之注意事項再填寫本頁) 487964 A7 -_B7__________ 五、發明說明（>>) 如圖2所示之光閘20a，以控制是否射出照明光el。另外 ，如圖11a〜lid及圖12a〜12d所示之各構件之配置係與 如圖9a〜9d及圖10a〜10d所示之配置相同。 曝光動作開始前，如圖11a所示，例如使光閘20a(參 考圖2)變成閉狀態，以不射出照明光。因此，遮光物4c、 4d係如第1動作例，不需要配置於第1光學系統60之上 部。如圖11a所示之例，遮光物4c、4d位於圖案區域55 下方。曝光動作一開始，光罩2之圖案區域55、遮光物4c 、及平板6之被曝光區域56就一邊取得同步，一邊往掃描 方向SD開始移動。 此時，如圖lib所示，圖案區域55、遮光物4c、及平 板6之被曝光區域56抵達位置ES之前，讓其端部55a、 端部66、及端部56a變成配置於與掃描方向SD垂直之同 一平面內之狀態。又，圖案區域55及被曝光區域56抵達 位置ES之前，遮光物4c覆蓋第1光學系統60之上部後 ，讓光閘20a成爲開狀態，以使照明光EL自照明光學系 統1射出。 在圖案區域55之端部55a、遮光物4c之端部66、及 被曝光區域56之端部56a配置於與掃描方向SD成垂直之 同一平面內之狀態，一邊取得同步，一邊往掃描方向SD 移動，且自抵達位置ES後，對在圖案區域55上所形成之 原始圖案之被曝光區域56開始曝光(圖lie)。曝光一開始 ，圖案區域55、遮光物4c、及被曝光區域56就以相同速 度同步地往掃描方向SD移動，並進行曝光。 ^ 25 本纸張尺度適用中國國家標準（CNS)A4規格（210 x 297公釐） " "" " I I --- -- (請先閱讀背面之注意事項再填寫本頁) · 487964 A7 ___B7 ___ 五、發明說明（外） 進行曝光，並如圖lid所示，當遮光物4c之端部66 一通過位置EE，遮光物4c就停止移動。另一方面，遮光 物4c即使停止移動，圖案區域55及被曝光區域56也以相 同速度同步地往掃描方向SD繼續移動。圖案區域55及被 曝光區域56 —邊往掃描方向SD同步，一邊繼續移動，並 如圖12a所示，圖案區域55之端部55b及被曝光區域56 之端部56b抵達位置ES後，遮光物4d要移動，以讓其端 部67位於位置ES。 之後，雖圖案區域55及被曝光區域56 —邊同步，一 邊以既定速度往掃描方向SD移動，但保持在圖案區域55 之端部55b、遮光物4d之端部67、及被曝光區域56之端 部56b配置於與掃描方向SD成垂直之同一平面內之狀態 下，遮光物4d係與圖案區域55及被曝光區域56同步移動 ，然後如圖12b所示，抵達位置EE後曝光結束。如圖12c 所示，遮光物4d之端部67 —通過位置EE，就成爲遮光物 4b覆蓋第1光學系統60之上部之狀態。 在此狀態，例如讓光閘20a成爲閉狀態以停止照明光 EL之照射。然後，圖案區域55、遮光物4d、及被曝光區 域56 —旦只移動既定距離(例如變成遮光物4c及遮光物4d 在與掃描方向SD垂直的方向上重疊之狀態之距離），一連 串之曝光動作就結束。 前述第1動作例中，因遮光物4a開始移動，並進行加 速動作當中要照射照明光EL，故需要將遮光物4a之尺寸 加大’但第2動作例中，遮光物4c開始移動，並進行加速 26 本紙張尺度適用中關家標準（CNS)A4規格（210 X 297公爱) - (請先閱讀背面之注意事項再填寫本頁) 裝 · 487964 A7 ____-__B7_ 五、發明說明（〆） 動作當中，並未用光閘20a來照射照明光EL，且曝光後也 未照射照明光EL，故可讓遮光物小型化。 以上所說明之第1動作例及第2動作例中，雖就將遮 光物4a〜4d配置於光罩2與投影光學系統5之間的情形已 經舉例說明，但將遮光物4a〜4d配置於投影光學系統5與 設定有被曝光區域56之平板6之間也可得同樣的效果。又 ，雖也可將遮光物4a〜4d配置於第1光學系統60與第2 光學系統62之間，但若配置於該位置時，遮光物4a〜4d 之移動方向係變成與掃描方向SD相反方向。 又，也可配置於3個地方內，即光罩2與投影光學系 統5之間、投影光學系統5與平板6之間、或第1光學系 統60與第2光學系統62之間，也可將遮光物4a及遮光物 4b分別配置於不同的地方。此時，配置遮光物4c及遮光 物4d之情形也相同。 【第3動作例】 其次，就第3動作例說明。圖13，係說明有關本實施 例之曝光裝置之第3動作例，且與圖9a〜9d〜圖12a〜12d 所示之相同構件都附上相同的符號。前述第1動作例及第 2動作例中，雖就具備在與光罩2平行的面內會移動之遮 光物4a〜4d之情形的動作已經加以說明，但本動作例中， 係藉由具備在以旋轉軸c爲中心之圓周上所配置之彼此垂 直之平板狀遮光物4e、4f，且讓遮光物4e、4f以旋轉軸c 爲中心旋轉，即可得到與第1動作例及第2動作例相同效 27 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） -----------— - (請先閱讀背面之注意事項再填寫本頁) 言· 48/^04 A7 五、發明說明（yw ) 果之情形。 ----I-----—^9----- * J (請先閱讀背面之注意事項再填寫本頁) 該遮光物4e、4f之動作係大致如以下所述。曝光動作 —開始，圖案區域55及娜光職％就同步地朝掃描方 向SD移動’但遮光物4e、w係與該移動速度同步並以旋 轉軸c爲中心在圓周上旋轉。 圖案區域55之端部55a及被曝光區域56之端部56a 在抵達位置ES後，遮光物4e將旋轉，以慢慢地讓第丨光 學系統60之上部開放。又，曝光中，遮光物4e及遮光物 4f維持在第1光學系統60之上部完全開放之狀態，然後 當圖案區域55之端部55b及被曝光區域56之端部56b在 抵達位置ES後，遮光物4f將旋轉，以慢慢地_第丨光學 系統60之上部關閉。 第1動作例或第2動作例中，因讓遮光物4a〜4d在掃 描方向SD移動，故需要配置讓遮光物4a〜4d往掃描方向 SD移動之機構，且需要確保一空間，以在掃描方向SD上 配置該機構之至少一部分。相對地，若採用用以進行在第 3動作例中所說明之動作之遮光物4e、4f，則藉由確保用 以在與掃描方向SD成垂直的方向上配置該驅動機構之空 間’即可得與第1動作例或第2動作例相同的效果。因此 ’若在裝置之構成上不能在掃描方向SD上確保一空間， 則最好採用遮光物4e、4f。 又，若採用在第1動作例或第2動作例所說明之遮光 物4a〜4d，則因需要個別驅動遮光物4a及遮光物4b、或 遮光物4c及遮光物4d，故驅動機構有大型化之虞，但若 28 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 487964 A7 _ _B7^__—一 五、發明說明（1 ) 使用在圓周上旋轉之遮光物46、4f，則該驅動機構只要1 個就夠，且能讓裝置構成簡單化。 ----------^----1 * j (請先閱讀背面之注意事項再填寫本頁) 又，在如圖13所示之例中’雖就在圓周上配置2片遮 光物4e、4f之情形已經舉例說明，但該片數並不受限，任 意都可以。又，遮光物4e、4f之配置’係並不限制於在形 成有圖案區域55之光罩2與投影光學系統5之間，而與第 1動作例及第2動作例相同，也可以在第1光學系統60與 第2光學系統62之間、或投影光學系統5與設定有被曝光 區域56之平板6之間。但是，若將遮光物4e、4f配置於 第1光學系統60與第2光學系統62之間，旋轉方向則變 成與配置於其他場合者相反。 【第4動作例】 圖14a〜14c及圖15a〜15c係說明有關本實施例之曝 光裝置之第4動作例，且與如圖9〜圖13所示之相同構件 都附加相同之符號。前述第3動作例中，遮光物4e、4f係 以在光罩2與投影光學系統5之間所設定之旋轉軸爲中心 旋轉，但本動作例中之相異點，係使用以第1光學系統60 爲中心在圓周cl上旋轉之遮光物4g。藉由遮光物4g沿圓 周cl上旋轉，成爲覆蓋第1光學系統60之上部、或視野 光闌61及第2光學系統62之上部之狀態。用於將遮光物 4g之旋轉中心設定爲第1光學系統60者，係僅1片遮光 物4g，用於獲得與前述第1動作例、第2動作例、及第3 動作例同樣的效果。 29 本纸張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 487964 A7 _____ _B7___ 五、發明說明（>》） -----------^—裝--- - _ (請先閱讀背面之注意事項再填寫本頁) 曝光動作一開始，如圖14a所示，圖案區域55及被曝 光區域56就同步地朝掃描方向SD開始移動。又，遮光物 4g開始沿圓周cl旋轉。如圖14b所示，藉由圖案區域55 及被曝光區域56之移動，在圖案區域55之端部55a及被 曝光區域56之端部56a抵達位置ES後，遮光物4g被配 置於圓周cl之圖示位置，並控制遮光物4g之旋轉，以完 全覆蓋視野光闌61及第2光學系統62之上部。 在如圖14b所示之狀態，照明光射出，並對在圖案區 域55所形成之原始圖案之被曝光區域56上開始曝光。即 ，圖案區域55及被曝光區域56 —邊取得同步，一邊朝掃 描方向SD移動，遮光物4g —進行旋轉，第2光學系統62 及視場光闌61之上部就慢慢地打開，並藉由將照明光EL 向圖案區域55照射，·:所得到之原始圖案之像就被曝光在被 曝光區域56上。 若圖案區域55及被曝光區域56之往掃描方向SD之 移動及遮光物4g之旋轉再進一步進行，則如圖14c所示， 第2光學系統62及視場光闌61之上部就完全打開，在此 狀態，遮光物4g就停止。又，進行圖案區域55及被曝光 區域56之往掃描方向SD之移動，並在圖案區域55之端 部55b抵達位置ES後，遮光物4g將移動至如圖15a所示 之位置，且遮斷通過圖案區域55之照明光EL以外的光。 因在圖案區域55以外的部分，形成如圖7所示之遮光 部，故照明光EL —定不會透過，但若在遮光部LSA上形 成缺陷(孔洞等），則因照明光EL將透過孔洞，故用遮光物 30 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 487964 A7 -—---------B7 五、發明說明（y ) 4S來遮斷該照明光el。 若圖案區域55及被曝光區域56繼續往掃描方向SD 移動’且圖案區域55之端部55b及被曝光區域56之端部 56b —抵達位置EE，則遮光物4g就旋轉至如圖15b所示 之位置。一旦成爲該狀態，曝光就結束。在曝光結束的狀 態，係遮光物4g將第1光學系統60之上部完全覆蓋，且 照明光EL不會入射第丨光學系統60之狀態。 因此，變成該狀態時，例如讓如圖2所示之光閘20a 變成閉狀態且停止照明光EL之照射。曝光一結束，圖案 區域55及被曝光區域56就減速並停止動作。又，遮光物 4g因旋轉至如圖15c所示之位置且回到起始狀態，故一連 串之曝光動作結束。參考圖14a〜14c及圖15a〜15c來說 明之本動作例中，以第1光學系統60爲中心讓遮光物4g 旋轉的場合已說明過了，另外因第2光學系統62爲中心讓 遮光物4g旋轉的場合也進行相同的動作，故能得到與第1 動作例〜第3動作例相同之效果。 【第5動作例】 圖16a〜16c、圖17a、17b係說明有關本實施例之曝 光裝置之第5動作例。與圖9〜圖15所示之構件相同之構 件上附加相同符號。本動作例中，如圖16a〜16c、圖17a 、17b所示，在形成有圖案區域55之光罩2與投影光學系 統5之間，配置與光罩2平行之透明的可撓薄板70，藉由 該可撓薄板上形成遮光部71a、71b、71c、7Id，來設 31 本紙張尺度適用中國國家標準（CNS)A4規格（210 χ 297公釐〉 (請先閱讀背面之注意事項再填寫本頁) 裝 487964 A7 _ B7_ 五、發明說明（V) 置開口部70a、70b、70c。遮光部71a〜71d之掃描方向 SD之寬度係設定成至少夠覆蓋第1光學系統60上部之寬 度。 又，開口部70a〜70c係設定成至少夠開放第1光學系 統60上部全體之寬度。又，可撓薄板70係隔一投影光學 系統5被配置於掃描方向SD上之一對滾輪7；2、73捲起來 。滾輪72、73係構成爲能旋動，藉滾輪72及滾輪73往相 同方向旋動，在可撓薄板70上所形成之遮光部71a〜71d 及開口部70a〜70c會往掃描方向SD或其相反方向移動。 本動作例中，也與第1動作例〜第4動作例一樣，.得到相 同之效果。 曝光動作一開始，如圖16a所示，照明光EL未自圖1 中之照明光學系統1射出，開口部7〇c被配置於第1光學 系統60上部，光罩2上所形成之圖案區域55與平板6上 所形成之被曝光區域56就同步並開始向掃描方向SD動作 。又，滾輪72、73旋轉，並將可撓薄板70捲起來，以使 遮光部71a〜71d及開口部70a〜70c會往掃描方向Sd移 動。圖案區域55及被曝光區域56之移動前進，如圖i6b 所示，在圖案區域55之端部55a及被曝光區域56之端部 56a抵達位置ES後，滾輪73將可撓薄板捲起來，用以讓 開口部70b與遮光部71c之境界位於位置Es。 在如圖16b所示之狀態，照明光射出，對在圖案區域 55上所形成之原始圖案之被曝光區域56上開始曝光。即 ，圖案區域55與被曝光區域56 —邊取得同步一邊往掃描 32 ^紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐) " " (請先閱讀背面之注意事項再填寫本頁) 裝 訂·- 487964 A7 __B7 ____ 五、發明說明) 方向SD移動，滾輪73以遮光部71c也取得與其等同步的 方式一將可撓薄板70捲起，第1光學系統6〇之上部就慢 慢地打開，並在圖案區域55內受照明光EL照射之原始圖 案之一部分像被轉寫至被曝光區域56 ° 曝光一旦開始，圖案區域55、遮光部71a〜71d、及開 口部70a〜70c以及被曝光區域56就以相同速度同步地往 掃描方向SD移動，並進行曝光。曝光進行’然後如圖16c 所示，開口部70b位於第1光學系統60之上部，第1光學 系統60之上部一旦完全打開，滾輪73就暫時停止可撓薄 板70之捲起動作。在該狀態，圖案區域55及被曝光區域 56 —邊取得同步，一邊往掃描方向SD移動’並進行曝光 〇 圖案區域55及被曝光區域56往掃描方向SD —邊同 步一邊繼續移動，然後如圖16c所示，若圖案區域55之端 部55b、被曝光區域56之端部56b、及遮光部71b與開口 部70b之境界位置一被包含在與掃描方向SD垂直的同一 平面上，則圖案區域55及被曝光區域56還有遮光部71a 〜71d及開口部70a〜70c就一邊同步，一邊以既定速度往 掃描方向SD移動，然後如17a圖所示，在圖案區域55之 端部55b、被曝光區域56之端部56b、及遮光部71b與開 口部70b之境界位置抵達位置EE後，曝光結束。之後， 然後如17b圖所示，圖案區域55及被曝光區域56減速而 停止。又，滾輪73係捲起可撓薄板70直到開口部70a位 於第1光學系統60之上部爲止，藉此，一連串的曝光動作 33 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） -----------— 裝--- •* (請先閱讀背面之注意事項再填寫本頁) 訂： 487964 A7 _____B7___ 五、發明說明) 結束。 以上，說明了第5動作例，另外’除了能獲得與前述 第1動作例〜第4動作例同樣的效果，還有因使用作爲圖 1中之可撓薄板70上所形成之遮光部71a〜71d及開口部 70a〜70c，以使可撓薄板70藉由滾輪72、73而捲起並移 動，故如第1動作例及第2動作例，不需要將遮光物4a及 遮光物4b或遮光物4c及遮光物4d個別控制。因此，除了 可將掃描方向SD之裝置構成簡化，還如第3動作例及第4 動作例，能將與掃描方向SD垂直的方向上之構成簡化。 又，在上述之第5動作例中，雖舉例說明了將可撓薄 板70配置於光罩2與投影光學系統5之間的場合，但將可 撓薄板70配置於投影光學系統5與平板6之間也可獲得同 樣的效果。又，雖將可撓薄板70配置於第1光學系統60 與第2光學系統62間也可以，但若配置於該位置後，則可 撓薄板70之移動方向將成爲與掃描方向SD相反的方向。 在上述之第5動作例中，若反覆進行曝光動作，則作 爲遮光物4之可撓薄板70上所形成之遮光部71a〜71d及 開口部70a〜70c之位置受機械的誤差或電氣雜訊等影響而 變化’有可能因該變化累積以致誤差變大。尤其是將同一 批生產內之複數個平板6經長時間處理的場合，該可能性 將變大。以下，就可撓薄板70上所形成之遮光部71a〜 71d及開口部70a〜7〇c之位置誤差之補償方法加以說明。 若使用該方法，則對曝光不產生影響，且將位置檢測 器配置在能測定遮光部71a〜71d及開口部70a〜70c之境 34 本紙張尺度適用中國國家標準（CNS)A4規格（21〇 χ 297公釐） (請先閱讀背面之注意事項再填寫本頁) 裝 訂！ 487964 A7 ___ B7___ 五、發明說明（>?々） — '雔 (請先閱讀背面之注意事項再填寫本頁) 界之任一個，例如遮光部71a與開口部70a之境界位置。 此處所使用之感測器係雖從測定光量之條件上， SPD(silicon photodiode)爲最佳，但若使用如行感測器(line sensor)或 CCD(Charge Coupled Device)等，不僅光量’還 有其分布也能測定的感測器，則能將境界位置以更高的精 度檢測出來。又，預先測定境界位置及所設置之感測器之 光量資訊，並預先記憶於記憶體或硬式磁碟等記憶裝置。 又，每次曝光，檢測器之輸出値都和境界之位置一起記憶 〇 若要進行補償，則在反覆進行曝光處理之途中，根據 之前的曝光處理時所得之境界之位置資訊及光量資訊與事 先記憶於記憶裝置之位置資訊及光量資訊，以算出境界之 位置之誤差，並藉滾輪72、73將可撓薄板70捲起，以進 行補償。藉由以上之動作，得以消除每次進行曝光處理所 累積之誤差。 根據本實施例，因利用遮光物將在照射在光罩2上之 照射光EL當中，通過光罩2上所形成之圖案區域55以外 的光遮住，故如圖7所示，即使在掃描方向SD(X軸方向） 上之視野區域2a〜2g之寬度寬，也不需要將在光罩2周圍 所形成之遮光部LSA之寬度增加，就能抑制光罩2製造成 本之上升。又，即使在遮光部LSA上產生孔洞等點缺陷， 因利用遮光物4將通過該點缺陷之照明光遮住，故由於平 板6之待曝光部分以外之部分不被曝光，因此能減少曝光 不良的發生。 35 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 487964 A7 _____B7____ 五、發明說明（ 又，本實施例之第1〜第5動作例中，以在曝光開始 點讓遮光物之端部與圖案區域55之端部55a及被曝光區域 56之端部56a大約一致的方式控制遮光物之移動。然而， 光罩2上之遮光帶LSA之寬度不寬時，例如與習知光罩大 約相同（2mm)時，在該遮光帶LSA內孔洞等缺陷不會產生 。因此，若使用一光罩，其上所形成之遮光帶LSA上之孔 洞等缺陷能忽略，則在曝光開始時，不需要讓遮光物之端 部與圖案區域55之端部55a及被曝光區域56之端部56a 正確地一致，而只要以遮光物之端部不離開該遮光帶LSA 內的方式控制遮光物之移動即可。在該場合，能較不要求 遮光物之移動精度，而得以謀求遮光物之驅動機構之小型 化或簡單化等。 又’以上已說明之實施例，係爲讓本發明容易理解所 記載者’並非爲限定本發明所記載。因此，前述之實施例 所揭示之各構件，係也包含屬於本發明之技術範圍之全部 之設計變更或均等物。 例如本發明，係不僅應用於液晶顯示元件之製造上所 使用之曝光裝置，也應用於電漿顯示器、半導體元件、薄 膜磁氣頭、及攝影元件(CCD等）之製造上所使用之曝光裝 置'以及用於爲製造光柵或光罩而將電路圖案轉寫形成至 玻璃基板 '或矽晶圓等之曝光裝置。即，本發明係與曝光 裝置之用途無關而能應用。 曝光裝置之光源，係除了使用用以產生g線(436nm)或 i線(365nm)等發射頻譜(emission iine)之水銀燈，也可使用 36 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） (請先閱讀背面之注意事項再填寫本頁) 裝 -春. 487964 ____B7_ 五、發明說明（# )487964 r A7 __B7___ V. Description of the invention (1) [Technical field to which the invention belongs] The present invention relates to an exposure device used in a lithography process for manufacturing, for example, a semiconductor element, a display device (a liquid crystal display panel) Etc.), photographic elements, and thin-film magnetic heads, etc., and particularly with respect to the scanning type exposure device, for transferring the image of the pattern formed on the photomask to the substrate by moving the photomask and the substrate synchronously. [Knowledge technology] In recent years, liquid crystal display panels have been widely used as display elements for word processors, personal computers, and televisions. Especially in portable word processors or notebook personal computers where portability is important, a liquid crystal display panel has become a necessity as a display element. In addition, in recent years, more than 20 inches of liquid crystal display panels have been put into practical use, and since the installation place of the liquid crystal display panel does not take up space, there are more opportunities for the use of liquid crystal display panels as televisions for general households. The liquid crystal display panel is formed on a substrate such as a glass flat plate (hereinafter referred to as a flat plate) by forming a transparent thin-film electrode into a desired shape by a photolithography method. In the lithography imaging process, an exposure device using a scan method (scanning type) is used to transfer the original pattern formed on the photomask to a photoresist layer on a flat plate through a projection optical system. The scanning-type exposure device illuminates the photomask with slit-shaped illumination light emitted from the illumination optical system, and among the original pattern of the photomask, an image of a part of the pattern illuminated by the irradiated light is projected on a flat plate. Then, with respect to the illumination light from the illumination optical system, it is synchronized with the moving photomask, and the Chinese National Standard (CNS) A4 specification (210 X 297 mm) is applied to the 3 paper sizes already passed. --- ^ -------- ^ -------- (Please read the precautions on the back before filling out this page) 487964 r ΚΙ ______ Β7_ 5. Description of the invention (/) The plate is moved by the illumination light, and the exposure plate is scanned with the illumination light through the mask to transfer all the original patterns of the mask to the plate. (Please read the precautions on the back before filling in this page.) Also recently, the size of LCD panels has increased, and the area of flat panels has increased year by year. Therefore, an exposure device using a step and scan method is also being developed. The exposure device is used to scan and expose a part of a flat plate. While sequentially moving the flat plate in steps, it scans repeatedly at different positions on the flat plate. exposure. However, in the case of the exposure device of the scanning method as described above, and in the case of the exposure device of the scanning method, in order to synchronously move the mask and the plate relative to the slit-shaped illumination light and perform scanning exposure, the slit-shaped illumination light arrives Before the pattern area of the photomask (the area formed by the pattern to be transferred) and after it has passed through the pattern area, the illumination light needs to be blocked to prevent the flat panel from being exposed due to the illumination light passing through the pattern area. Therefore, a light-shielding band (light-shielding region) made of chromium or the like formed by vapor deposition is usually provided outside the pattern region of the photomask. If the above-mentioned light-shielding band region is not provided, a portion other than the portion of the image of the mask pattern to be transferred on the flat panel will be exposed, thereby reducing the efficiency of the transfer pattern. Also, it may be considered that the portion is scd-line, that is, the portion is used to cut off each circuit after forming a circuit or the like, but as the scanning speed becomes faster, the line is lined. The width also increases, and as a result, the efficiency of the transfer pattern decreases. The light-shielding band is wider than the width of the illuminated area of the illumination light on the mask in the scanning direction of the mask (using a plurality of 4 divided in the scanning direction. The paper size applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 487964 f A7 B7 V. Description of the invention (a) In the method of scanning the photomask with part of the illumination light, there is a gap between the front edge of the part of the illumination light that starts first and the back edge of the part of the illumination light that continues later. Size), it is necessary to widen. In fact, in terms of the relationship between the scanning exposure and the moving speed, it is necessary to consider the acceleration and deceleration distances of the mask or the plate, so it is necessary to ensure a sufficient light shielding band width that is larger than the width of the illumination light. However, the photomask is generally formed by vapor-depositing chrome on a transparent glass substrate. If the evaporation area is increased, point defects such as pinholes are mostly generated. If there is a defect in the light-shielding band, exposure will not be The part that should be exposed. As shown above, if the light-shielding band of the photomask is widened, the probability of point defects becomes high, which causes problems such as unsatisfactory plate exposure. Further, if the light-shielding band is widened, a problem arises that the cost of the photomask increases. [Problems to be Solved by the Invention and Means for Solving the Problems] The purpose of the present invention is to provide an exposure method and device that can be used to expose only the photosensitive substrate without widening the width of the light-shielding band formed on the photomask. The desired area. Another object is to provide an exposure method and apparatus that can be used to expose a large-sized flat plate or the like with a high throughput. Another object is to provide a method for manufacturing a display device for manufacturing a display device such as a liquid crystal display panel with high productivity. The exposure device of the present invention is used to relatively move the mask and the photosensitive substrate with the illumination light from the light source, and scan the exposed photosensitive substrate with the illumination light through the mask. In addition, an illumination optical system is provided to irradiate the illumination light to the photomask; a projection optical system is used to project an image of the photomask pattern onto a photosensitive substrate; a platform device is used to expose the photomask and the photosensitive substrate during scanning exposure 5 (Please read the precautions on the back before filling this page) Packing: This paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm) 487964 A7 V. Description of the invention (ϋ () (Please read first Note on the back, please fill out this page again) Synchronous movement; and light-shielding member, which can be moved substantially in the first direction of the photomask to block the light path of the illumination light emitted from the illumination optical system, the light-shielding member, and the photomask During the movement, it is used to move to cover at least a part of the mask. Also, the better one of the projection optical system has a plurality of projection areas (exposure areas) separated from each other for forming a patterned image. In the direction, a plurality of projection areas (exposure areas) are arranged separately from each other, and in a second direction orthogonal to the first direction, the plurality of projection areas (exposure areas) are at least on one end thereof. At this time, the better of the projection optical system is to have a plurality of optical modules, which are used to define the plurality of projection areas (exposure areas) respectively with the second direction as the long side direction. The rectangle, the plurality of optical modules, respectively re-images the primary image of the pattern on the photosensitive substrate, and arranges the field diaphragm that defines the projection area (exposure area) on or near the formation surface of the primary image. The better one of the illumination optical system is to illuminate the illumination area on a mask including a plurality of field-of-view areas conjugated to the plurality of projection areas with respect to the projection optical system, and the illumination area corresponds to the plurality of field-of-view areas. The illumination optical system is divided into a plurality of areas and the illumination optical system is divided into a plurality of illumination lights and irradiated to the illumination areas respectively. At this time, the better of the illumination optical system includes a plurality of partial optical systems and light distribution. The former is located at the place corresponding to each of the plurality of illumination areas, and the latter is used to distribute the illumination light from the light source to the plurality of partial optics The lighting optical system can also be used to illuminate the illumination light generated from multiple light sources into the light distributor. In addition, the light-shielding member can also be set to correspond to each of the 6 paper standards applicable to Chinese national standards (CNS ) A4 specification (210 X 297 mm) 487964 A7 __ B7___ 5. Description of the invention ( <;) nnn 11 VMM V ··· MW ln (Please read the precautions on the back before filling in this page) The area of the projection area, and the illumination optical system can also be made corresponding to the movement of the mask. The plurality of field-of-view areas conjugate to the plurality of projection areas of the system are selectively irradiated with irradiation light. # To use the exposure device of the present invention, during the mask movement (approximately equivalent to scanning exposure), the light shielding member should be moved to cover at least a part of the mask. Therefore, for example, if the outer part of the pattern area of the photomask (equivalent to a conventional light-shielding tape) is covered with a light-shielding tape, it is ideally not necessary to provide a light-shielding tape on the photomask. However, it is desirable to provide a light-shielding tape on the mask because of the tracking performance of the light-shielding member to the movement of the mask. However, the width of the light-shielding belt is not related to the width of the illumination light, and can be determined by the relationship with the tracking performance of the light-shielding member. Therefore, the width of the light-shielding belt can be made smaller than that of a conventional person. Therefore, while minimizing the width of the masking band around the pattern area of the mask, scanning exposure can be used to expose only the desired area of the photosensitive substrate. Further, if a light-shielding belt is provided on the mask, even if defects such as pinholes are generated in the light-shielding belt, it is possible to prevent unnecessary portions of the photosensitive substrate from being exposed due to the defects. The manufacturing method of the display device of the present invention uses the exposure device described in any one of the claims 1 to 9 of the scope of patent application. In addition, it includes a step of relatively moving a photomask (on which a pattern constituting a display element is formed) and a photosensitive plate relative to the illumination light, and moving the light shielding member along the movement direction of the photomask during the relative movement. , Transfer the image of the pattern to the tablet. At this time, it is better to form a pattern image on a plurality of projection areas (exposure areas) separated from each other in the field of view of the projection optical system, and at the same time follow the movement of the mask, This paper scale applies the Chinese National Standard (CNS) A4 specification (21〇χ 297 mm) 487964 A7 ___B7____ V. Description of the invention (ς) The shadow area (exposure area) is conjugated to a plurality of fields of view, and is selectively illuminated with illumination light. Irradiation. -nnnnn · ϋ βϋ nn 1 · ϋ Product (please read the precautions on the back before filling this page) Furthermore, the exposure method of the present invention is to move the photomask and the photosensitive substrate relative to the illumination light from the light source, and The photosensitive substrate is scanned and exposed by the illumination light through a photomask. In addition, an image of a pattern of a mask is formed on a plurality of projection areas (exposure areas) separated from each other in the field of view of the projection optical system, and during the relative movement, the projection optical system and the plurality of projection areas (exposure areas) are formed. A plurality of conjugated fields of view are selectively irradiated with the illumination light, and at the same time, the light shielding member that partially shields the illumination light incident on the photosensitive substrate is moved substantially along the moving direction of the photomask. [Embodiments of the Invention and Effects of the Invention] Hereinafter, the exposure device related to the embodiment of the present invention will be described in detail with reference to the drawings. Fig. 1 is a perspective view of an exposure apparatus using an embodiment of the present invention. In the following description, the XYZ rectangular coordinate system shown in Fig. 1 is set, and the positional relationship of each member will be described while referring to the XYZ rectangular coordinate system. In the XYZ rectangular coordinate system shown in FIG. 1, the moving direction (scanning direction) of the mask 2 on which the predetermined original pattern PA is formed and the flat plate 6 coated with a photoresist on the glass substrate is set as the X-axis direction. The direction orthogonal to the X-axis in the plane of the mask 2 is set as the Y-axis direction, and the normal direction of the mask 2 is set as the Z-axis direction. Actually, the XY plane of the XYZ rectangular coordinate system in FIG. 1 is set as a plane parallel to the horizontal plane, and the Z axis is set in the vertical direction. In Fig. 1, the illumination optical system 1 emits light with an approximately equal illuminance 8. The paper size is applicable to the Chinese National Standard (CNS) A4 (210 X 297 mm) 487964 A7 _ 一 —___ B7______ V. Illumination of the invention (5) Light, and evenly illuminate the mask 2 in the XY plane in the figure. A preferred example of the illumination optical system is a configuration shown in FIG. 2. Fig. 2 is a view showing an example of a specific configuration of the illumination optical system 1 shown in Fig. 1. In FIG. 2, a light source such as a mercury lamp for generating illumination light (for example, g-line (436 nm) or i-line (365 nm)) is provided inside the elliptical mirror 20. The illumination light from the light source is focused on the first through the elliptical mirror 20. 2 focus. The illumination light focused by the elliptical mirror 20 is formed as a light source image on a light guide 21 through a shutter (shuttei 〇20a. Here, the shutter 20a 'is in an open state and allows the illumination light Passing, in the closed state, the illumination light will be cut off and the illumination of the mask 2 will be stopped. The light guide 21 is a secondary light source that forms an equal light intensity distribution on its emitting ends 21a and 21b. The light guide 21 The better one is composed of irregularly bundled optical fibers. The light beams emitted from the light guide 21 are incident through relay lenses 22a and 22b as optical integrators, respectively. Fly's eye lenses 23a and 23b. On the exit surfaces of the fly's eye lenses 23a and 23b, a surface light source composed of a plurality of light source images, that is, a secondary light source is formed. The light from the secondary light source is focused. The lenses 24a and 24b (the front focal point approximately coincides with the formation position of the secondary light source (the exit-side focal surface of the fly-eye lens 23a and 23b)) and uniformly irradiates the field diaphragm 25 having the rectangular openings 25a and 25b. Illumination light of diaphragm 25 Through the lenses 26a, 26b, and using the mirrors 27a, 2%, the light path is deflected to 90 °, and reaches the lenses 28a, 28b. Here, the lenses 26a and 28a, and the lenses 26b and 28b are used to let the field of light Diaphragm 25 and reticle 2 become 9 among the conjugates. The paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm). · (Please read the precautions on the back before filling in this page) 487964 A7 _____ B7_ V. Description of the Invention (Order) Relay the optical system, and the illumination light through the lenses 28a, 28b forms the illumination field (field diaphragm) Images of the openings 25a, 25b of 25) 29a, 29b. The shape of the openings 25a, 25b of the field diaphragm 25 is not limited to rectangular. The shape of the illuminated area is preferably similar to the projection as much as possible. The shape of the field of view of the optical system. For the sake of simplicity, the illumination optical system used to form the illumination areas 29c to 29g only shows its optical axis. The light guide 21 (not shown) in FIG. 2 , Has the same number of emitting ends (7 in this example) as the illuminated area on the mask 2, and The regions 29c to 29g supply illumination light from the output end of the light guide 21 (not shown). In this example, it is assumed that the field diaphragm 25 is arranged in the illumination optical system in the same area as the pattern forming surface of the mask 2. The surface of the yoke or the vicinity of the surface, but the field diaphragm 25 may be arranged close to the pattern forming surface, or the field diaphragm 25 may be arranged in the same manner as the pattern forming surface of the mask in a projection optical system 5 described later. The surface of the yoke or its vicinity. In addition, the shutter 20a is omitted, and a shutter is provided in the middle of each optical path of the illumination optical system for forming the illumination areas 29a to 29g (for example, between the field diaphragm 25 and the lenses 26a and 26b). The illumination light of each of the illumination regions 29a to 29g is selectively blocked. In addition, as shown in Fig. 2, if a single light source is used and the amount of light is insufficient, the configuration shown in Fig. 3 may be applied. Fig. 3 is a schematic diagram showing a main part of a modification of the illumination optical system. In addition, although the light guide 32 in FIG. 3 has five emitting ends 32a to 32e, as shown in FIGS. 1 and 2, 10 paper sizes are applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm). " " " " " " " " «mn · I— nn 1 > 1 —Be tmmi l I ^ · n ammt (Please read the precautions on the back before filling this page) Order · 曲 487487964 A7 ____B7 _ 5. Description of the Invention ('), the light guide 32 in this example has 7 emission ends. This is shown in Fig. 3 for the sake of convenience. (Please read the precautions on the back before filling out this page.) The illumination light from light sources 30a to 30c such as mercury lamps in Figure 3 is collected through the elliptical mirrors 30a to 30c to form a light source image. The light guide 32 is provided such that its incident end is located at the light source image formation position, and the illumination light passing through the light guide 32 forms a secondary light source having an average light intensity distribution at a plurality of emission ends 32a to 32e. It is desirable that the light guide 32 is formed by irregularly bundling optical fibers, similarly to the light guide 21 of FIG. 2. Since the optical paths from the emission ends 32a to 32e to the mask 2 are the same as those of the illumination optical system shown in Fig. 2, description thereof is omitted here. In addition, instead of the illumination optical system for forming the plurality of illumination areas 29a to 29g, another illumination optical system may be applied. The illumination optical system is used in a direction orthogonal to the scanning direction (X-axis direction). The photomask 2 is illuminated in the extended rectangular area. Such an optical system can be regarded as a type using a rod-shaped light source extending in the Y-axis direction. In this example (Fig. 1 and Fig. 2), although it has been considered that seven illumination areas 29a to 29g are formed, the number may be an arbitrary number, and the illumination optical system and the projection optical system need only be based on the illumination. The number of zones can be set. At this time, at least one illumination optical system or projection optical system may be installed under the two illumination areas. In addition, although three light sources are provided in FIG. 3 and the light guide 32 has three incident ends, the number of the light sources and the incident ends may be any number, for example, according to the number of divergences (the number of emitted light guides) Number), the required illuminance on the panel, and the power of the light source. Of course, the number of emitting ends of the light guide is also based on the illumination optical system (illumination area). 11 This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 487964 A7 __ B7 ___ V. Invention Note that the number of (V0) can be determined, that is, the combination of the number of the incident end and the emission end of the light guide is arbitrary. Returning to Fig. 1, the photomask 2 is placed on a photomask stage 3 which can be moved in the X-axis direction in the figure. Below the reticle 2 and the reticle stage 3, a blind (viewing diaphragm, masking blade) 4 for blocking the illumination light (emitted from the illuminating optical system 1 and passing through the reticle 2) 4 . The light-shielding object 4 is configured to be movable in a space, and the movement of the light-shielding object 4 is set to several types. For example, it is configured so that it can move in parallel in the XY plane, or it is configured so that it can rotate around the point outside the light-shielding object 4 in the ZX plane. The light-shielding object 4 may be constituted by a plate-like member as shown in FIG. 1. For example, the light-shielding object 4 may be constituted by a movable flexible sheet rolled up by a pair of reels (not shown). Yes, the flexible thin plate is used to form a light shielding portion at a predetermined position by using a flexible transparent material. Although only one light-shielding object 4 is shown in FIG. 1, the light-shielding object 4 may be composed of a plurality of light-shielding objects. In addition, although FIG. 1 illustrates a case where the illumination light passing through the mask 2 is blocked by only one light-shielding object 4, it is also possible to separate the visual field areas 2 a to 2 g of the illumination optical system 1 as shown in FIG. 1. In the covering method, a light-shielding object is provided on each of the visual field areas 2a to 2g. In this case, a plurality of light-shielding objects may be provided in each of the field-of-view areas 2a to 2g. Moreover, different light-shielding objects are provided in the visual field regions 2a to 2d and the visual field regions 2e to 2g, that is, the visual field regions having the same position in the scanning direction (X-axis direction) of the photomask 2 are regarded as a group, and in each group It is also possible to provide a shade. In addition, the shading 12 paper size is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) (please read the precautions on the back before filling this page). 487964 A7 _________B7_____ 5. Description of the invention (〇) --- »* (Please read the precautions on the back before filling out this page) The position of the object 4 is not limited to between the mask 2 and the projection optical system 5, but can also be placed between the projection optical system 5 and the flat panel 6, or A surface conjugated to the pattern forming surface of the mask in the projection optical system 5, or a vicinity of the conjugate surface. Hereinafter, the projection optical system 5 will be described with reference to FIG. 4. The projection optical system 5 is composed of a plurality of (in this example, 7) partial projection optical systems 5a to 5g, and each of the partial projection optical systems 5a to 5g has the same configuration, so it is simply explained here, only The partial projection optical system 5a will be described. FIG. 4 is a schematic diagram showing the configuration of the partial projection optical system 5a. This part of the projection optical system 5a is composed of a combination of two sets of Dyson-type optical systems. A part of the projection optical system 5a in FIG. 4 is composed of a first optical system 40, a field diaphragm 41, and a second optical system 42. The first optical system 40 and the second optical system 42 are respectively Dyson Type optical system after deformation. The first optical system 40 includes: a right angle 稜鏡 43 with a reflecting surface, which is arranged to be inclined at an angle of 45 ° with respect to the surface of the mask 2; a plano-convex lens member 44 which has light in a direction in-plane of the mask 2 Axis, with the convex surface facing the opposite side of the right angle 稜鏡 43; the lens member 45, which is crescent-shaped as a whole, and the concave surface toward the plane convex lens member 44 side; and the right angle 稜鏡 46, which has a reflecting surface, is connected to a right-angle prism The reflecting surface of 43 is orthogonal to each other, and is arranged to be inclined at 45 β with respect to the surface of the mask 2. 13 This paper size is in accordance with Chinese National Standard (CNS) A4 (210 X 297 mm) 487964 A7 _____B7 V. Description of the invention ((〆) Then, the light coming from the illumination optical system 1 and passing through the mask 2 is a right-angled edge Mirror 43 whose optical path is deflected by 90 ° and is incident on a plano-convex lens member 44 joined with a right angle 稜鏡 43. The plano-convex lens member 44 is joined with a lens member 45 composed of a glass material different from the plano-convex lens member 44. The light of the right angle 稜鏡 43 is refracted at the joint surface 44a between the plano-convex lens member 44 and the lens member 45, and reaches the reflecting surface 45a where the reflective film is vapor-deposited. The light reflected at the reflecting surface 45a is bound to the joint surface 44a. Refract and reach the right-angled 稜鏡 46 joined to the plano-convex lens member 4. The light from the plano-convex lens member 44 is deflected by the right-angled 稜鏡 46, and its optical path is deflected to 90. A mask is formed on the exit surface side of the right-angled 稜鏡 46 2nd order image (intermediate image). Here, the 1st order image of the mask 2 formed by the first optical system 40 is a first-magnification image with a lateral magnification in the X-axis direction (optical axis direction). Is positive and transverse to the γ axis The magnification is negative. The light from the primary image is formed on the plate 6 by the second optical system 42 through the second optical system 42. The second optical system 42 is the same as the first optical system 40 and has _ · A right angle 稜鏡 47 with a reflecting surface is configured to be inclined at 45 ° with respect to the surface of the mask 2; a plano-convex lens member 48 has an optical axis along the in-plane direction of the mask 2 and the convex surface faces a right angle Opposite side of 稜鏡 47; lens member 49, whose entire surface is crescent shaped, with its concave surface facing the side of plano-convex lens member 48; and right-angled 具 50 with a reflecting surface, which is a reflecting surface 14 of a right-angled 稜鏡 47 Paper size applies to China National Standard (CNS) A4 (210 X 297 mm) — installed -------- order -------- * (Please read the precautions on the back before filling this page ) 487964 A7 _B7 _ V. Description of the invention (\ 3) Orthogonal and configured to be inclined at 45 ° with respect to the surface of the mask 2. Then, the light emitted from the side of the exit surface of the right angle 稜鏡 46 is a right angle 稜鏡47, whose optical path is deflected to 90 °, and enters a plano-convex lens member 48 joined with the right angle 稜鏡 47. The plano-convex lens member 48 is joined by The lens member 49 made of different glass materials of the plano-convex lens member 48 is light from the right angle 稜鏡 47, which is refracted at the joint surface 48a between the plano-convex lens member 48 and the lens member 49, and reaches the reflective surface where the reflective film is vapor-deposited. 49a 〇 The light reflected on the reflecting surface 49a is refracted at the joint surface 48a and reaches the right angle 稜鏡 50 joined to the plano-convex lens member 48. The light from the plano-convex lens member 50 is at right angle 稜鏡 46, and its optical path is deflected At 90 °, a secondary image of the photomask 2 is formed on the flat plate 6. The second optical system 42 is the same as the first optical system 40 and forms a first-magnification image. The horizontal magnification is positive in the X-axis direction and negative in the Y-axis direction. Therefore, the secondary image formed on the flat plate 6 will become an equal-magnification positive image of the mask 2 (the horizontal magnification in the vertical, horizontal, and left-right directions becomes a positive image). Here, the partial projection optical system 5a (the first optical system 40 and the second optical system 42) is a telecentric optical system on both sides. The first optical system 40 and the second optical system 42 described above are configured so that their reflection surfaces 45a and 49a are oriented in the same direction. This makes it possible to reduce the size of the entire projection optical system. The first optical system 40 and the second optical system 42 of this embodiment are configured to bury a glass material for the optical path between the plano-convex lens members 44 and 48 and the reflection surfaces 45a and 49a. As a result, there are 15 eccentricities between the plano-convex lens members 44, 48 and the reflective surfaces 45a, 49a. The paper size is in accordance with the Chinese National Standard (CNS) A4 specification (210 X 297 mm). -Order -------- »(Please read the precautions on the back before filling out this page) 487964 A7 V. Description of Invention (4) Advantages that will not occur. The “1” optical system 40 and the 2nd optical system 42 are the air between the plano-convex lens members 44 and 48 and the reflecting surface 仏, as shown in FIG. 5, that is, the structure of the Dyson-type optical system itself is also can. The real surface Φ is arranged at the position of the i-th image of the wire 1 and the wire 42. Figure 6 _ Example of Hanye Fine 41. The field diaphragm 41 has, for example, a mesa-shaped opening 41 & as shown in Fig. 6a. With the field diaphragm 41, the exposure area on the flat plate 6 (the area illuminated by the bright light) is defined into a mesa shape. Here, as shown by the dotted line in FIG. 6 a, the cross-sectional shape (YZ plane) of the plano-convex lens member 44, the lens member 45, the plano-convex lens member 48, and the lens member 49 of the Dyson-type optical system of this embodiment is circular. Therefore, the maximum field of view that can be obtained is approximately semicircular. At this time, it is preferable that the mesa-shaped field of view area 2a defined by the field stop 41 is a pair of parallel sides whose short sides become the arc sides of the semicircular area. As a result, the scanning field (X-axis direction) width of the field of view can be maximized for the maximum field of view that the Dyson type optical system can achieve, and the scanning speed can be increased. The field diaphragm 41 may have a hexagonal opening 41b as shown in Fig. 6c. At this time, as shown in FIG. 6d, the size of the hexagonal opening is within the range of the maximum field of view shown by the dotted line in the figure. As shown by the dotted lines in FIG. 6b and FIG. 6d, the maximum field of view is the light beam that passes through the first optical system 40 and the second optical system 42 and passes through the outermost light beam and surrounds the mask 2 and passes through it. The area of the dot 〇16 i -------- ^ -------- *-(Please read the notes on the back before filling this page) This paper size applies to China National Standard (CNS) A4 (210 X 297 public love) 487964 A7 __B7_ V. Description of the invention (\ <) -----------— install — »t C Please read the notes on the back before filling out this page) Back to Figure 1 to explain the configuration of some projection optical systems 5a ~ 5g. The partial projection optical systems 5a to 5§ in FIG. 1 have field of vision areas 2a to 2g defined by a field diaphragm 41 provided in the partial projection optical systems 5a to 5g. The images in the field of view 2a to 2g are formed as equal-magnification images in the exposed regions 6a to 6g on the flat plate 6. The partial projection optical systems 5a to 5d are arranged so as to be aligned in the Y-axis direction in the figure. Further, the partial projection optical systems 5e to 5g are provided at positions different from the X-axis direction in the view areas 2a to 2d, and the field-of-view areas 2e to 2g are arranged along the Y-axis direction. At this time, the partial projection optical systems 5a to 5d and the partial projection optical systems 5e to 5g are positioned so as to be in close proximity to the right angles 稜鏡 respectively. Also, although some of the projection optical systems 5a to 5g may be arranged with a wide interval between the field of view areas 2a to 2d and the field of view areas 2e to 2g in the X-axis direction, this is not good at this time due to The increase in the amount of movement of the reticle 2 and the flat plate 6 leads to a decrease in the throughput. On the flat plate 6, the exposure areas 6a to 6d arranged along the Y-axis direction in the figure are formed by the partial projection optical systems 5a to 5d, and the exposure areas 6a are formed by the partial projection optical systems 5e to 5g. ~ 6d The exposed area arranged in the Y-axis direction at different positions ~ 6g. The exposure areas 6a to 6g are equal-magnification images of the field of view areas 2a to 2g. Here, as described above, the photomask 2 is placed on the photomask stage 3 which can be moved in parallel in the X-axis direction in the figure, and the flat plate 6 is placed on the flat table 7. In addition, the flat table 7 is placed on an XY table 8 that can move in parallel in the XY plane. In addition, the reticle stage 3 and the flat stage 7 will move synchronously in the direction of the X axis in the figure. The paper size applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 487964 A7 B7 --- V. Description of the invention (Λ) move. As a result, the image of the mask illuminated by the illumination optical system 1 is transferred to the flat plate 6, that is, so-called scanning exposure is performed. If the movement of the reticle 2 is used to scan the entire reticle 2 caused by the field of view 2a to 2g, the entire image of the reticle 2 will be transferred to the entire flat plate 6 (step and scan mode). Top is partial). The flat table 7 is provided with a reflecting member 9 having a reflecting surface along the Y axis and a reflecting member 10 having a reflecting surface along the X axis. Furthermore, a laser light source 11 is provided on the main body side of the exposure device as an interferometer, for example, to provide laser light such as helium-neon (wavelength 633mn); a beam splitter 12 is used to convert the laser light from the laser light source 11 The radiation is divided into laser light for X-axis direction measurement and laser light for Y-axis direction measurement; 稜鏡 13 for projecting laser light from the beam splitter 12 onto the reflecting member 9; and 稜鏡 14, 15 for Two points on the reflecting member 10 project laser light from the beam splitter 12. In this way, the position in the y-axis direction, the y-axis direction, and the position in the XY plane of the flat table 7 can be detected. In FIG. The light detection system is not shown. Next, the arrangement of the field of view in this embodiment will be described with reference to FIG. 7. FIG. 7 shows the positional relationship between the field of view formed by the partial projection optical systems 5a to 5g and the plane of the mask 2. As shown in FIG. In FIG. 7, the original pattern PA is formed on the photomask 2, and the light-shielding portion LSA is set to surround the area of the original pattern pa. 18 The paper size is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 public love) ----- ------ · Install --- wi (Please read the precautions on the back before filling out this page) »· 487964 A7 ______B7__ 5. Description of the Invention (xA). The width of the light-shielding portion LSA is the same width as that formed by conventional methods, for example, a width of 2 mm. (Please read the precautions on the back before filling this page.) The illumination optical system 1 shown in Figure 2 illuminates the illumination area 29a ~ 29g surrounded by the dotted line in the figure evenly. Within the illuminated areas 29a to 29g, the aforementioned field of vision areas 2a to 2g are arranged. These fields of view 2a to 2g are through the field diaphragm 41 in the partial projection optical system 5a to 5g, and the shape will be approximately a mesa shape. Here, the upper sides of the field of view 2a to 2d (short sides of a pair of parallel sides) and the fields of view 2e to 2g (short sides of a pair of parallel sides) are arranged to face each other. Here, the shapes of the view areas 2a and 2d along the light-shielding portion LSA are defined such that the oblique sides (sides other than a pair of parallel sides) on the LSA side of the light-shielding portion coincide with the edge of the area of the original pattern PA. The shape of the field of view regions 2a and 2d overlapping the light shielding portion LSA of the mask 2 may be used. In this embodiment, since the partial projection optical systems 5a to 5g are telecentric optical systems, in the XY plane, the area occupied by the partial projection optical systems 5a to 5g is larger than the area occupied by each of the visual field areas 2a to 2g. Therefore, the arrangement of the 'viewing area 2a to 2d must be configured so as to have a space between each of the areas 2a to 2d. At this time, if scanning exposure is performed using only the field of view areas 2a to 2d, the area on the mask between the field of view areas 2a to 2d cannot be projected onto the flat panel 6. Therefore, in this embodiment, since scanning exposure is performed in the area between the field of view areas 2a to 2d, the field of view areas 2e to 2g are configured based on the partial projection optical systems 5e to 5g. At this time, it is desirable that the sum of the widths of the field-of-view areas 2a to 2g (or the exposed areas 6a to 6g) along the scanning direction (X-axis direction) is constant at each position in the Y-axis direction. 19 This paper size is in accordance with Chinese National Standard (CNS) A4 (210 X 297 mm) 487964 A7 _______B7____ 5. Description of the invention () $) ----------- installation--(please first (Read the notes on the back and fill in this page.) Next, the exposure on the flat panel 6 will be described with reference to FIGS. 8a and 8b. Figures 8a and 8b are used to explain the exposure amount of each field of view 2a to 2g. In Figs. 8a and 8b, the position in the Y-axis direction on the horizontal axis system plate 6 indicates the exposure amount on the vertical axis system. Fig. 8a shows the exposure amounts of the exposed areas 6a to 6g, and Fig. 8b shows the sum of the exposure amounts of the exposed areas 6a to 6g. In FIG. 8a, on the flat plate 6, each exposure amount distribution Ea to Eg corresponding to each of the mesa-shaped exposure regions 6a to 6g can be obtained. Here, the scanning exposure is defined because the sum of the widths in the X-axis direction of the exposed areas 6a to 6g is constant, so the overlapping areas of the exposed areas 6a to 6g are always the same exposure amount. For example, for the area where the exposure amount distribution Ea corresponding to the exposed area 6a and the exposure amount distribution Ee corresponding to the exposed area 6e overlap, the sum of the width in the X-axis direction of the exposed area 6a and the width in the X-axis direction of the exposed area 6e is constant. Therefore, the total exposure amount of the overlapping area is the same as that of the non-overlapping area. Therefore, an average exposure distribution E over the entire surface as shown in Fig. 8b can be obtained on the flat plate 6. In the above description, the case where the exposure areas 6a to 6g are mesa-shaped is described, but the combination of the exposure areas for obtaining an average exposure amount distribution is not limited to a mesa-shape. For example, when a plurality of hexagonal exposure areas are formed by a field diaphragm 41 having an opening 41b having a shape as shown in FIG. 6c, each exposure area is defined such that the width in the scanning direction of each exposure area is always constant. Thereby, an average exposure amount distribution can be obtained on the entire flat plate 6. Next, as described above, since the light-shielding object 4 can be made into various structures, the operation of the exposure device will be distinguished and explained by the various structures of the light-shielding object 4 in the following description. 20 This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) '— 487964 A7 ____B7____ 5. Description of the invention () [First action example] ------------- -0 * · (Please read the precautions on the back before filling out this page) Figures 9a to 9d and Figures 10a to 10d illustrate the first operation example of the exposure device of this embodiment. In addition, in FIGS. 9a to 9d and FIGS. 10a to 10d, for ease of understanding, among the components shown in FIG. 1, only the area of the original pattern PA where the photomask is formed, the shade 4, The area to be exposed on the projection optical system 5 and the flat plate 6. In FIGS. 9 a to 9 d and FIGS. 10 a to 10 d, a symbol 55 is added to an area where the original pattern PA of the photomask 2 is formed and is referred to as a pattern area, and a symbol 56 is added to an area to be exposed on the flat plate 6 and is referred to as a pattern area. The exposed area. In FIGS. 9a to 9d and FIGS. 10a to 10d, the pattern area 55 is illustrated in an exaggerated manner without showing a photomask, and on the SD side (in this example, + X direction) of the scanning direction including the pattern area 55, and A light shielding portion LSA is formed on a peripheral portion on a direction side (-X direction) opposite to the scanning direction SD. Figs. 9a to 9d and Figs. 10a to 10d illustrate the operation of the exposure apparatus in the case where the light-shielding object 4 shown in Fig. 1 is formed by two light-shielding objects 4a, 4b. The light-shielding object 4a and the light-shielding object 4b are substantially rectangular, and are arranged between the mask 2 and the projection optical system 5 so that their positions are shifted in the Z direction in FIG. 1 and parallel to the XY plane (the mask 2). In addition, in FIGS. 9a to 9d and FIGS. 10a to 10d, the projection optical system 5 in FIG. 1 is presented as a schematic diagram, and the first optical system 40 (part of the projection optical system 5a to 5g including the projection optical system 5) is shown. ), The field diaphragm 41, and the second optical system 42 (refer to FIG. 4) are respectively given symbols 60, 61, and 62, and are shown in simplified form. When the illumination light EL emitted from the illumination optical system 1 shown in FIG. 1 enters the first optical system 60, it is exposed through the field diaphragm 61 and the second optical system 62. The paper size applies the Chinese National Standard (CNS) A4 (210 X 297 mm) 487964 A7 _____B7__ 5. Explanation of the invention (/) The light area 56 will be exposed. In FIGS. 9a to 9d and FIGS. 10a to 10d, the first optical system 60, the field stop 61, and the second optical system 62 are stationary in space, and the pattern area 55, the light-shielding object 4a, 4b, and the exposed area 56 moves in the scanning direction of the symbol SD in the figure (the X-axis direction in FIG. 1). The width of the light shielding objects 4a and 4b in the scanning direction SD is set to a sufficient width so as to cover and hide the upper portion of the first optical system 60. Before the exposure operation is started, as shown in FIG. 9a, the light-shielding object 4a is arranged on the first optical system 60 so that the illumination light EL emitted from the self-illuminating optical system 1 does not enter the first optical system 60 '. In this embodiment, before the exposure operation is started, that is, before the pattern area 55 of the mask 2 and the exposed area 56 of the flat plate 6 are moved in the scanning direction SD in a synchronized manner, the illumination light EL is also irradiated. Once the exposure operation is started, the pattern area 55 of the mask 2 and the exposed area 56 of the plate 6 are synchronized, and start moving toward the scanning direction SD. Although the light-shielding object 4a also starts to move in the scanning direction SD, as shown in FIG. 9b, the light-shielding object 4a is at its end before the end portion 55a of the pattern region 55 and the end 56a of the exposed region 56 reach the position ES. The portion 63 does not move from the position ES to the scanning direction SD side. That is, the end portion 55a of the pattern area 55, the end portion 63 of the light-shielding object 4a, and the end portion 56a of the exposed area 56 are arranged on the same plane perpendicular to the scanning direction SD, and are aligned with each other when they reach the position ES. The exposed area 56 of the original pattern formed on the pattern area 55 starts to be exposed. At the beginning of the exposure, as shown in Figure 9c, the dimensions of the pattern area 55 and the shade 22 are in accordance with the Chinese National Standard (CNS) A4 specification (210 X 297 public love 1 — equipment -------- order ---- ---- * • · (Please read the precautions on the back before filling this page) 487964 A7 ----- -B7 ___ V. Description of the invention (/ \) ----------- ^- -···-(Please read the precautions on the back before filling this page) 4a, and the exposed area 56 moves to the scanning direction SD at the same speed and performs exposure. The exposure proceeds, and then as shown in Figure 9d, End portion 63 of the light-shielding object 4a — Once the position El passes, the light-shielding object 4a stops moving. On the other hand, even if the light-shielding object 4a stops moving, the pattern area 55 and the exposed area 56 continue to move in the scanning direction SD at the same speed in synchronization. Move and perform exposure. Pattern area 55 and exposed area 56 —while synchronizing in the scanning direction SD, continue to move, and as shown in FIG. 10a, at the end portion 55b of the pattern area 55 and the end portion of the exposed area 56 After 56b arrives at the position ES, the shade 4b is moved so that its end portion 64 is at the position ES. That is, the end portion 55b of the pattern area 55-once arrived At the position 55b, the light-shielding portion LSA formed on the mask 2 is illuminated by the illumination light EL. If there is a point defect such as a hole in the light-shielding portion LSA, the portion other than the plate to be exposed (exposed area 56) will also be Exposure. In order to prevent this phenomenon, the light passing through the pattern area 55 is blocked by the light-shielding object 4b. After that, although the pattern area 55 and the exposed area 56 are similarly synchronized, they are moved to the scanning direction SD at a predetermined speed. However, as shown in FIG. 10b, the end portion 55b of the pattern area 55, the end portion 64 of the light-shielding object 4b, and the end portion 56b of the exposed area 56 are arranged in the same plane perpendicular to the scanning direction SD. The shading object 4b moves in synchronization with the pattern region 55 and the exposed region 56. The pattern region 55, the shading object 4b, and the exposed region 56 advance in synchronization with the scanning direction SD, and then the end 64 of the shading object 4b is located in FIG. 10c In the middle position EE, the shade 4b covers the upper part of the first optical system 60. 23 This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 487964 A7 --- B7 ___ V. Description of the invention (X > 〇 Since the illumination light EL does not enter the first optical system 60, the exposure ends in this state. After that, as shown in FIG. 10d, the position 64 EE of the end portion 64 of the light shield 4b advances in the scanning direction Sd, and The end portion 65 of the light-shielding object 4b is in a state where the specific position ES is in the front side in the scanning direction SD, and the operations of the pattern region 55, the light-shielding object 4b, and the exposed region 56 are stopped, and then a series of exposure operations are ended. [Second operation example] Figs. 11a to 11d and Figs. 12a to 12d illustrate a second operation example of the exposure apparatus according to this embodiment. In addition, FIGS. Iia to lid and FIGS. 12a to 12d are the same as those in FIGS. 9a to 9d and FIGS. 10a to 10d. For ease of understanding, only a mask is formed among the components shown in FIG. 1. The area of the original pattern PA, the light-shielding object 4, the projection optical system 5, and the area to be exposed on the flat plate 6, and a symbol 55 is added to the area where the original pattern PA of the photomask 2 is formed and is referred to as a pattern area. The area to be exposed on 6 is given the symbol 56 and is called the exposed area. As shown in Figs. 11a to 11d and Figs. 12a to 12d, the exposure devices shown in Figs. 9a to 9d and Figs. 10a to 10d are the same as the exposure devices shown in Figs. 9a to 9d and Figs. 10a to 10d. At the same position as the light shielding objects 4a, 4b, the width of the scanning direction SD of the light shielding objects 4c, 4d is set to be narrower than the width of the light shielding objects 4a, 4b. In this example, the width of the light shielding objects 4c and 4d should be at least sufficient to cover the upper part of the first optical system 60. In this operation example, the illumination optical system 1 shown in Fig. 1 is the control example 24. The paper size is in accordance with the Chinese National Standard (CNS) A4 specification (210 x 297 mm). I ---- I IAW ----- -~ Order · —------- (Please read the precautions on the back before filling out this page) 487964 A7 -_B7 __________ V. Description of the invention (> >) The shutter 20a shown in Figure 2 Controls whether or not the illumination light el is emitted. In addition, the arrangement of the components shown in Figs. 11a to 11d and Figs. 12a to 12d is the same as that shown in Figs. 9a to 9d and Figs. 10a to 10d. Before the exposure operation is started, as shown in FIG. 11a, for example, the shutter 20a (see FIG. 2) is closed to prevent the illumination light from being emitted. Therefore, the light-shielding objects 4c and 4d are the same as the first operation example and need not be disposed on the upper portion of the first optical system 60. As shown in the example of FIG. 11 a, the light shielding objects 4 c and 4 d are located below the pattern region 55. As soon as the exposure operation is started, the pattern area 55 of the mask 2, the light-shielding object 4c, and the exposed area 56 of the flat plate 6 are synchronized while moving in the scanning direction SD. At this time, as shown in FIG. 11b, before the pattern area 55, the light-shielding object 4c, and the exposed area 56 of the flat plate 6 reaches the position ES, the end portions 55a, 66, and 56a are arranged in the scanning direction. The state of SD in the same plane. Before the pattern area 55 and the exposed area 56 reach the position ES, the light shield 4c covers the upper part of the first optical system 60, and the shutter 20a is opened so that the illumination light EL is emitted from the illumination optical system 1. The end portion 55a of the pattern area 55, the end portion 66 of the light-shielding object 4c, and the end portion 56a of the exposed area 56 are arranged in the same plane perpendicular to the scanning direction SD. While synchronizing, go to the scanning direction SD After moving, and after reaching the position ES, the exposed area 56 of the original pattern formed on the pattern area 55 starts to be exposed (Fig. Lie). As soon as the exposure is started, the pattern area 55, the light-shielding object 4c, and the exposed area 56 are synchronously moved to the scanning direction SD at the same speed and exposed. ^ 25 This paper size is in accordance with China National Standard (CNS) A4 (210 x 297 mm) " " " " II ----(Please read the precautions on the back before filling this page) · 487964 A7 ___B7 ___ 5. Description of the invention (outside) Exposure is performed, and as shown in the lid, as soon as the end portion 66 of the shade 4c passes the position EE, the shade 4c stops moving. On the other hand, even if the light blocking object 4c stops moving, the pattern area 55 and the exposed area 56 continue to move in the scanning direction SD at the same speed in synchronization. Pattern area 55 and exposed area 56 — Synchronize to the scanning direction SD while continuing to move, and as shown in FIG. 12a, after the end portion 55b of the pattern area 55 and the end portion 56b of the exposed area 56 reach the position ES, the light-shielding object 4d is moved so that its end 67 is in position ES. Thereafter, although the pattern area 55 and the exposed area 56 are synchronized with each other, they move toward the scanning direction SD at a predetermined speed, but remain at the end portion 55b of the pattern area 55, the end portion 67 of the shade 4d, and the exposed area 56. The end portion 56b is disposed in the same plane perpendicular to the scanning direction SD, and the light-shielding object 4d moves in synchronization with the pattern area 55 and the exposed area 56. Then, as shown in FIG. 12b, the exposure ends after reaching the position EE. As shown in FIG. 12c, the end portion 67 of the light-shielding object 4d passes through the position EE, and the light-shielding object 4b covers the upper portion of the first optical system 60. In this state, for example, the shutter 20a is closed to stop the irradiation of the illumination light EL. Then, the pattern area 55, the light-shielding object 4d, and the exposed area 56 are moved only a predetermined distance (for example, the distance in which the light-shielding object 4c and the light-shielding object 4d overlap in a direction perpendicular to the scanning direction SD), and a series of exposure The action ends. In the aforementioned first operation example, since the light-shielding object 4a starts to move and the illumination light EL is irradiated during the acceleration operation, it is necessary to increase the size of the light-shielding object 4a. However, in the second operation example, the light-shielding object 4c starts to move, and Acceleration 26 This paper size applies the Zhongguanjia Standard (CNS) A4 specification (210 X 297 public love)-(Please read the precautions on the back before filling out this page) Installation · 487964 A7 ____-__ B7_ V. Description of the invention (〆 ) During the operation, the shutter 20a is not used to illuminate the illumination light EL, and the illumination light EL is not irradiated after the exposure, so that the light shielding object can be miniaturized. In the first and second operation examples described above, although the case where the light shielding objects 4a to 4d are arranged between the mask 2 and the projection optical system 5 has been described as an example, the light shielding objects 4a to 4d are arranged in the The same effect can be obtained between the projection optical system 5 and the flat plate 6 provided with the exposed area 56. In addition, although the light-shielding objects 4a to 4d may be arranged between the first optical system 60 and the second optical system 62, if they are arranged at this position, the movement direction of the light-shielding objects 4a to 4d becomes opposite to the scanning direction SD. direction. Moreover, it may be arranged in three places, that is, between the mask 2 and the projection optical system 5, between the projection optical system 5 and the flat plate 6, or between the first optical system 60 and the second optical system 62, or The light-shielding object 4a and the light-shielding object 4b are respectively arranged in different places. In this case, the case where the light-shielding object 4c and the light-shielding object 4d are arranged is also the same. [Third Operation Example] Next, a third operation example will be described. Fig. 13 illustrates a third operation example of the exposure apparatus according to this embodiment, and the same components as those shown in Figs. 9a to 9d to 12a to 12d are given the same reference numerals. In the first and second operation examples described above, although the operation including the light-shielding objects 4a to 4d moving in a plane parallel to the mask 2 has been described, in this operation example, it is provided by The plate-shaped light-shielding objects 4e and 4f arranged perpendicular to each other on the circumference centered on the rotation axis c, and the light-shielding objects 4e and 4f are rotated around the rotation axis c as the center, and the first operation example and the second operation example can be obtained. Action example has the same effect. 27 This paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm) --------------(Please read the precautions on the back before filling this page) Yan · 48 / ^ 04 A7 V. The situation of the invention (yw). ---- I -----— ^ 9 ----- * J (Please read the precautions on the back before filling out this page) The operation of the light shields 4e and 4f is as follows. Exposure operation-At the beginning, the pattern area 55 and the optical fiber% are moved synchronously in the scanning direction SD ', but the light-shielding objects 4e and w are synchronized with the moving speed and rotate on the circumference around the rotation axis c. After the end portion 55a of the pattern area 55 and the end portion 56a of the exposed area 56 reach the position ES, the light shielding object 4e will rotate to slowly open the upper portion of the first optical system 60. Moreover, during the exposure, the light-shielding object 4e and the light-shielding object 4f are maintained in a fully opened state above the first optical system 60. After the end portion 55b of the pattern area 55 and the end portion 56b of the exposed area 56 reach the position ES, The shutter 4f will rotate to close the upper part of the optical system 60 slowly. In the first operation example or the second operation example, since the light-shielding objects 4a to 4d are moved in the scanning direction SD, a mechanism for moving the light-shielding objects 4a to 4d to the scanning direction SD needs to be provided, and a space is required to be scanned during scanning. At least a part of the mechanism is arranged in the direction SD. In contrast, if the light-shielding objects 4e and 4f for performing the operations described in the third operation example are used, it is sufficient to secure a space for disposing the driving mechanism in a direction perpendicular to the scanning direction SD '. The same effect as that of the first operation example or the second operation example can be obtained. Therefore, if it is not possible to secure a space in the scanning direction SD in the structure of the device, it is preferable to use the light shielding objects 4e, 4f. In addition, if the light-shielding objects 4a to 4d described in the first or second operation examples are used, the light-shielding object 4a and the light-shielding object 4b, or the light-shielding object 4c and the light-shielding object 4d need to be driven individually, so the driving mechanism has a large size. However, if 28 paper sizes are applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 487964 A7 _ _B7 ^ __— 15. Description of the invention (1) Use a light-shielding object rotating on the circumference 46 , 4f, only one drive mechanism is enough, and the device structure can be simplified. ---------- ^ ---- 1 * j (Please read the precautions on the back before filling out this page) Also, in the example shown in Figure 13, 'Although it is arranged on the circumference 2 The case of the sheet light-shielding objects 4e and 4f has been exemplified, but the number of the sheet-shielding objects 4e and 4f is not limited, and any number may be used. The arrangement of the light-shielding objects 4e and 4f is not limited to between the mask 2 and the projection optical system 5 in which the pattern area 55 is formed, and is the same as the first operation example and the second operation example. Between the first optical system 60 and the second optical system 62, or between the projection optical system 5 and the flat plate 6 on which the exposed area 56 is set. However, if the light-shielding objects 4e and 4f are arranged between the first optical system 60 and the second optical system 62, the direction of rotation is reversed from that in other cases. [Fourth operation example] Figs. 14a to 14c and Figs. 15a to 15c illustrate the fourth operation example of the exposure device according to this embodiment, and the same components as those shown in Figs. 9 to 13 are given the same reference numerals. In the aforementioned third operation example, the light-shielding objects 4e and 4f are rotated around the rotation axis set between the mask 2 and the projection optical system 5. However, the difference in this operation example uses the first optical The system 60 is a light shield 4g which rotates on the circumference cl in the center. By rotating the light-shielding object 4g along the circumference cl, a state covering the upper part of the first optical system 60 or the upper part of the field diaphragm 61 and the second optical system 62 is obtained. The person who sets the center of rotation of the light-shielding object 4g to the first optical system 60 is only one light-shielding object 4g, and obtains the same effects as the first, second, and third operation examples. 29 This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) 487964 A7 _____ _B7___ V. Description of the invention (>) ----------- ^-packing-- --_ (Please read the precautions on the back before filling in this page) As soon as the exposure operation starts, as shown in Figure 14a, the pattern area 55 and the exposed area 56 will start to move in the scanning direction SD synchronously. In addition, the shade 4g starts to rotate around the circumference cl. As shown in FIG. 14b, after the pattern area 55 and the exposed area 56 are moved, after the end portion 55a of the pattern area 55 and the end portion 56a of the exposed area 56 reach the position ES, the light shielding object 4g is disposed on the circumference cl. In the position shown in the figure, the rotation of the shade 4g is controlled to completely cover the upper part of the field diaphragm 61 and the second optical system 62. In the state shown in Fig. 14b, the illumination light is emitted, and exposure is started on the exposed area 56 of the original pattern formed in the pattern area 55. That is, the pattern area 55 and the exposed area 56 are moved in the scanning direction SD while being synchronized, and the light shielding object 4g is rotated, and the upper part of the second optical system 62 and the field stop 61 is slowly opened, and By irradiating the illumination light EL to the pattern area 55, the image of the original pattern obtained is exposed on the exposed area 56. If the movement of the pattern area 55 and the exposed area 56 in the scanning direction SD and the rotation of the light shield 4g are further performed, as shown in FIG. 14c, the upper part of the second optical system 62 and the field stop 61 is completely opened. In this state, 4 g of the light-shielding object stops. After the pattern area 55 and the exposed area 56 are moved to the scanning direction SD, and the end portion 55b of the pattern area 55 reaches the position ES, the light shielding object 4g will move to the position shown in FIG. 15a and be blocked. Light other than the illumination light EL passing through the pattern area 55. Since the light-shielding portion shown in FIG. 7 is formed in a portion other than the pattern area 55, the illumination light EL cannot be transmitted. However, if a defect (hole, etc.) is formed in the light-shielding portion LSA, the illumination light EL will transmit. Holes, so use light-shielding material 30 This paper size applies Chinese National Standard (CNS) A4 specification (210 X 297 mm) 487964 A7 ------------- B7 V. Description of invention (y) 4S to cover Turn off the illumination light el. If the pattern area 55 and the exposed area 56 continue to move in the scanning direction SD 'and the end portion 55b of the pattern area 55 and the end portion 56b of the exposed area 56 reach the position EE, the light shielding object 4g is rotated as shown in FIG. 15b. Its location. Once this state is reached, the exposure ends. In the state where the exposure is completed, the light shielding object 4g completely covers the upper portion of the first optical system 60, and the illumination light EL does not enter the first optical system 60. Therefore, when this state is reached, for example, the shutter 20a shown in FIG. 2 is closed and the irradiation of the illumination light EL is stopped. As soon as the exposure is completed, the pattern area 55 and the exposed area 56 decelerate and stop. In addition, since the light-shielding object 4g is rotated to the position shown in Fig. 15c and returned to the initial state, a series of exposure operations are ended. In the present operation example described with reference to Figs. 14a to 14c and Figs. 15a to 15c, the case where the light-shielding object 4g is rotated around the first optical system 60 has been described, and the light-shielding object is centered on the second optical system 62 In the case of 4g rotation, the same operation is performed, so the same effects as those in the first to third operation examples can be obtained. [Fifth operation example] Figs. 16a to 16c and Figs. 17a and 17b illustrate a fifth operation example of the exposure apparatus according to this embodiment. The same components as those shown in Figs. 9 to 15 are given the same reference numerals. In this operation example, as shown in FIGS. 16a to 16c, FIGS. 17a, and 17b, a transparent flexible sheet 70 parallel to the mask 2 is disposed between the mask 2 and the projection optical system 5 in which the pattern area 55 is formed. By forming the light-shielding portions 71a, 71b, 71c, and 7Id on the flexible thin plate, 31 paper sizes are applicable to the Chinese National Standard (CNS) A4 specification (210 x 297 mm) (Please read the precautions on the back before filling in (This page) 487964 A7 _ B7_ 5. Description of the invention (V) The openings 70a, 70b, 70c are set. The width of the scanning direction SD of the light shielding sections 71a to 71d is set to cover at least the upper part of the first optical system 60. In addition, the openings 70a to 70c are set to be wide enough to open at least the entire upper part of the first optical system 60. The flexible thin plate 70 is arranged on a pair of rollers 7 in the scanning direction SD via a projection optical system 5; 2 And 73 are rolled up. The rollers 72 and 73 are configured to be able to rotate, and the rollers 72 and 73 are rotated in the same direction, and the light shielding portions 71a to 71d and the openings 70a to 70c formed on the flexible thin plate 70 are moved toward The scanning direction SD or the opposite direction moves. The first to fourth operation example of the operation of the same embodiment. Get the same effect. At the beginning of the exposure operation, as shown in FIG. 16a, the illumination light EL is not emitted from the illumination optical system 1 in FIG. 1, and the opening 70c is arranged on the upper part of the first optical system 60. The pattern area formed on the mask 2 55 is synchronized with the exposed area 56 formed on the flat plate 6 and starts to move in the scanning direction SD. In addition, the rollers 72 and 73 are rotated and the flexible thin plate 70 is rolled up so that the light shielding portions 71a to 71d and the opening portions 70a to 70c are moved in the scanning direction Sd. The pattern area 55 and the exposed area 56 move forward, as shown in Figure i6b. After the end portion 55a of the pattern area 55 and the end portion 56a of the exposed area 56 reach the position ES, the roller 73 rolls the flexible sheet, The boundary between the opening portion 70b and the light shielding portion 71c is located at the position Es. In the state shown in FIG. 16b, the illumination light is emitted, and exposure is started on the exposed region 56 of the original pattern formed on the pattern region 55. That is, the pattern area 55 and the exposed area 56 are scanned simultaneously while achieving synchronization. ^ The paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) " " (Please read the precautions on the back before Fill in this page) Binding · -487964 A7 __B7 ____ V. Description of the invention) Move in direction SD, the roller 73 rolls up the flexible sheet 70 in such a way that the light-shielding portion 71c is synchronized with it, and the first optical system 60 Open it slowly, and a part of the original pattern illuminated by the illumination light EL in the pattern area 55 is transferred to the exposed area 56 ° Once the exposure starts, the pattern area 55, the light-shielding portions 71a to 71d, and the opening portion 70a ~ 70c and the exposed area 56 move synchronously in the scanning direction SD at the same speed and perform exposure. After the exposure is performed, as shown in Fig. 16c, the opening 70b is located above the first optical system 60. Once the upper portion of the first optical system 60 is fully opened, the roller 73 temporarily stops the rolling operation of the flexible sheet 70. In this state, the pattern area 55 and the exposed area 56 are synchronized while moving in the scanning direction SD and exposed. The pattern area 55 and the exposed area 56 are synchronized while moving in the scanning direction SD. Then, as shown in FIG. As shown in 16c, if the end portion 55b of the pattern area 55, the end portion 56b of the exposed area 56, and the boundary position of the light shielding portion 71b and the opening portion 70b are included on the same plane perpendicular to the scanning direction SD, the pattern area 55 and the exposed area 56 and the light-shielding portions 71a to 71d and the openings 70a to 70c are synchronized with each other and moved toward the scanning direction SD at a predetermined speed. Then, as shown in FIG. 17a, at the end portion 55b of the pattern area 55, the After the edge portion 56b of the exposure area 56 and the boundary positions of the light shielding portion 71b and the opening portion 70b reach the position EE, the exposure ends. Thereafter, as shown in Fig. 17b, the pattern area 55 and the exposed area 56 are decelerated and stopped. In addition, the roller 73 rolls up the flexible thin plate 70 until the opening 70a is located above the first optical system 60, and thereby a series of exposure operations are performed. The paper size is in accordance with the Chinese National Standard (CNS) A4 (210 X 297). (Li) ------------- Install --- • * (Please read the precautions on the back before filling this page) Order: 487964 A7 _____B7___ 5. Description of the invention) End. The fifth operation example has been described above. In addition to the same effects as those of the first to fourth operation examples described above, the light-shielding portion 71a to be formed on the flexible thin plate 70 in FIG. 1 is used. 71d and the openings 70a to 70c, so that the flexible thin plate 70 is rolled and moved by the rollers 72 and 73. Therefore, as in the first operation example and the second operation example, it is not necessary to shield the light-shielding object 4a, the light-shielding object 4b, or the light-shielding object. The object 4c and the light-shielding object 4d are individually controlled. Therefore, in addition to simplifying the device configuration in the scanning direction SD, the configuration in the direction perpendicular to the scanning direction SD can be simplified as in the third and fourth operation examples. In the fifth operation example described above, the flexible thin plate 70 is arranged between the mask 2 and the projection optical system 5 by way of example. However, the flexible thin plate 70 is arranged between the projection optical system 5 and the flat plate 6. The same effect can be obtained between them. The flexible thin plate 70 may be disposed between the first optical system 60 and the second optical system 62. However, if the flexible thin plate 70 is disposed at this position, the moving direction of the flexible thin plate 70 will be opposite to the scanning direction SD. . In the fifth operation example described above, if the exposure operation is repeatedly performed, the positions of the light shielding portions 71a to 71d and the openings 70a to 70c formed on the flexible thin plate 70 serving as the light shielding object 4 are subject to mechanical errors or electrical noise. Changes due to such effects may cause errors to accumulate due to the accumulation of the changes. In particular, when a plurality of flat plates 6 in the same batch are processed for a long period of time, this possibility becomes larger. Hereinafter, a method for compensating the positional errors of the light shielding portions 71a to 71d and the opening portions 70a to 70c formed on the flexible thin plate 70 will be described. If this method is used, it will not affect the exposure, and the position detector is placed in a position where it can measure the light-shielding sections 71a to 71d and the openings 70a to 70c. 34 This paper size applies the Chinese National Standard (CNS) A4 standard (21〇 χ 297 mm) (Please read the notes on the back before filling this page) Binding! 487964 A7 ___ B7___ 5. Explanation of the invention (>?) — '雔 (Please read the precautions on the back before filling this page) One of the boundaries, such as the boundary position of the light shielding portion 71a and the opening portion 70a. Although the sensor used here is based on the conditions for measuring light quantity, SPD (silicon photodiode) is the best. However, if a line sensor or CCD (Charge Coupled Device) is used, not only the light quantity but also the With sensors that can measure its distribution, the realm position can be detected with higher accuracy. In addition, the position of the realm and the light quantity information of the sensors installed are measured in advance and stored in advance in a memory or a storage device such as a hard disk. In addition, each time the output of the detector is memorized with the position of the realm. If compensation is to be performed, the position information and light quantity information of the realm obtained during the previous exposure processing are used to repeatedly perform the exposure processing. The position information and light quantity information stored in the memory device are used to calculate the positional error of the realm, and the flexible thin plate 70 is rolled up by the rollers 72 and 73 to compensate. With the above operations, the error accumulated during each exposure process can be eliminated. According to this embodiment, since the light irradiated on the mask 2 among the irradiation light EL is shielded by light other than the pattern area 55 formed on the mask 2, as shown in FIG. 7, even when scanning, The width of the field of view 2a to 2g in the direction SD (X-axis direction) is wide, and it is not necessary to increase the width of the light-shielding portion LSA formed around the mask 2 to suppress an increase in the manufacturing cost of the mask 2. In addition, even if a point defect such as a hole occurs in the light-shielding portion LSA, the illuminating light passing through the point defect is blocked by the light-shielding object 4, so that the portion other than the portion to be exposed of the flat plate 6 is not exposed, so that the exposure failure can be reduced happened. 35 This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 487964 A7 _____B7____ 5. Description of the invention (Also, in the first to fifth action examples of this embodiment, the light is shielded at the exposure start point. The end of the object controls the movement of the shade in a manner that is approximately the same as the end 55a of the pattern area 55 and the end 56a of the exposed area 56. However, when the width of the light shielding strip LSA on the photomask 2 is not wide, for example, with the conventional light When the mask is about the same (2mm), defects such as holes in the light-shielding band LSA will not occur. Therefore, if a mask is used, defects such as holes in the light-shielding band LSA formed on it can be ignored, at the beginning of exposure , It is not necessary to make the end of the light shielding object exactly coincide with the end 55 a of the pattern region 55 and the end 56 a of the exposed area 56, and only need to control the light shielding object in such a manner that the end of the light shielding object does not leave the light shielding band LSA In this case, it is possible to reduce the size or simplification of the driving mechanism of the shading object without requiring the movement precision of the shading object. Also, the embodiment described above is to make the present invention easier. Reason The "documented" is not intended to limit the present invention. Therefore, the components disclosed in the foregoing embodiments also include all design changes or equivalents belonging to the technical scope of the present invention. For example, the present invention is not only applied to The exposure device used in the manufacture of liquid crystal display elements is also used in the exposure devices used in the manufacture of plasma displays, semiconductor elements, thin-film magnetic heads, and photographic elements (CCD, etc.), and for the manufacture of gratings or Mask, and an exposure device that transfers circuit patterns to glass substrates or silicon wafers. That is, the present invention is applicable regardless of the use of the exposure device. The light source of the exposure device is used in addition to the G-line. (436nm) or i-line (365nm) mercury lamp with emission spectrum (emission iine), 36 paper sizes are also applicable to Chinese National Standard (CNS) A4 (210 X 297 mm) (Please read the precautions on the back first (Fill in this page again) 487964 ____B7_ V. Description of the invention (#)
KrF準分子雷射(248nm)、ArF準分子雷射（193nm)、F2雷射 (157nm)、Kn 雷射（146nm)、KrAr 雷射（134nm)、或 An 雷射 (126nm)等，又，也能使用含有 EUV(Extreme Ultraviolet，極 遠紫外光)光等之X線，或電子束或離子束等帶電粒子束。 又，除了 F2雷射或Ai*F準分子雷射等之外，也可使用 例如由DFB半導體雷射或光纖雷射所振盪之紅外線區域或 高次諧波(利用摻雜有餌(或餌及鏡)將可見光區域之單波長 雷射放大，並用非線性光學結晶加以轉換波長爲紫外光）。 例如假設單波長雷射之振盪波長在1.51〜1.59/zm之 範圍內，則將輸出波長爲189〜199nm範圍內之8倍高次諧 波，或波長爲151〜159nm範圍內之10倍高次諧波。尤其 是若假設振盪波長在1.544〜1.553 /zm之範圍內，則可獲得 193〜194nm範圍內之8倍高次諧波，即與ArF準分子雷射 大致相同波長之紫外光，而若假設振盪波長在L57〜1.58 //m之範圍內，則可獲得157〜158nm範圍內之1〇倍高次 諧波，即與F2雷射大致相同波長之紫外光。 又，若假設振盪波長在1.03〜1.12/zm之範圍內，則 將輸出140〜160nm範圍內之7倍高次諧波，尤其是若假設 振盪波長在1.099〜U06//m之範圍內，則可獲得157〜 158nm範圍內之7倍高次諧波，即與f2雷射大致相同波長 之紫外光。又，使用鏡•摻雜•光纖雷射作爲單波長之振盪 雷射。 投影光學系統，係不僅等倍系統，縮小系統或放大系 統皆可。又，投影光學系統，係折射系統、反射折射系統 37 ΐ紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐) 一 · " -----------— I (請先閱讀背面之注意事項再填寫本頁) 丄=0 · 487964 A7 ___________B7 五、發明說明（>7 h ) 、及反射系統中之任一種皆可。若使用準分子雷射等遠紫 外線或真空紫外線，則採用具有折射元件(如使用石英或登 石等作爲玻璃材料)之折射系統或反射折射系統，而若使用 An雷射或X線，則採用反射系統。又，若使用電子束，貝[J 使用由電子透鏡及偏向器所構成之電子光學系統作爲光學 系統也可。 藉將由複數個透鏡等光學元件所構成之照明光學系統 1及投影光學系統5裝入曝光裝置本體並進行光學調整、 將由許多機械零件所構成之光罩平台或平板平台安裝在曝 光裝置本體上並加以連接配線或配管、以及設置與本發明 有關之遮光物4或其驅動裝置並加以做綜合調整(電氣調整 、動作確認等），得以製造上述實施例之曝光裝置。又，曝 光裝置之製造係希望在溫度及潔淨度等受控制下來進行。 又，含有顯示裝置等之微型裝置，係經由進行電路之 功能•性能之設計步驟、根據該設計步驟以製作光罩之步 驟、製作矽晶圓或玻璃平板之步驟、使用前述實施例所說 明之曝光裝置以將圖案轉寫至基板上之步驟、組裝步驟(含 有切割製成、封裝製成等）、及檢查步驟等所製造而成。 【圖式之簡單說明】 圖1，係有關本發明實施例之曝光裝置之立體圖。 圖2，係表示如圖1所示之照明光學系統之具體構成 例之一。 圖3，係表示照明光學系統之變形例之主要部分。 38 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） ----------—-裝--- (請先閲讀背面之注意事項再填寫本頁) 約· · 487964 A7 _______ B7_ ---- 五、發明說明（>ll ) 圖4，係表示投影光學系統之部分構成。 --------------- (請先閱讀背面之注意事項再填寫本頁} 圖5，係表示如圖4所示之第一光學系統及第二光學 系統之變形例。 圖6a〜6d，係表示視野光闌之構成例。 圖7，係表示使用局部投影光學系統之視野光闌及光 罩間之平面上之位置關係。 圖8a、8b，係用以說明各視野區域之曝光量。 圖9a〜9d，係說明有關本發明實施例之曝光裝置之第 1動作例。 圖10a〜10d，係說明有關本發明實施例之曝光裝置之 第1動作例。 圖1 la〜1 Id ’係說明有關本發明實施例之曝光裝置之 第2動作例。 圖12a〜12d，係說明有關本發明實施例之曝光裝置之 第2動作例。 圖13，係說明有關本發明實施例之曝光裝置之第3動 作例。 圖14a〜14c，係說明有關本發明實施例之曝光裝置之 第4動作例。 圖15a〜15c，係說明有關本發明實施例之曝光裝置之 第4動作例。 圖16a〜16c，係說明有關本發明實施例之曝光裝置之 第5動作例。 圖17a、17b，係說明有關本發明實施例之曝光裝置之 39 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 487964 A7 B7 五、發明說明) 第5動作例。 【符號說明】 C 旋轉軸 cl 圓周 E、Ea〜Eg 曝光量分布 El、E2、EE、EL、ES 位置 LSA、71a〜71d 遮光部 PA 原始圖案 SD 掃描方向 1 照明光學系統 2 光罩 2a〜2g 視野區域 3 光罩台 4、4a〜4g 遮光物 5 投影光學系統 5a〜5g 部分投影光學系統 6 平板 6a〜6g 曝光區域 7 平板台 8 XY台 9、10 反射構件 11 雷射光源 12 分束器 40 I-----· I I (請先閱讀背面t注意事項再填寫本頁) 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 487964 A7 ^___B7 五、發明說明（々/) 13 、 14 、 15 棱鏡 20 、 31a〜31c 橢圓鏡 20a 光閘 21、32 光導向器 21a、21b、32a〜32e 射出端 22a 、 22b 中繼透鏡 23a、23b 複眼透鏡 24a、24b 聚焦透鏡 25 、 41 、 61 視野光闌 25a、25b、41a、41b、70a〜70c 開口部 26a、26b、28a、28b 透鏡 27a > 27b 鏡子 29a〜29g 照明區域 30a〜30c 光源 40、60 第1光學系統 42、62 第2光學系統 43 、 46 、 47 直角稜鏡 44 、 48 、 50 平凸透鏡構件 44a、48a 接合面 45、49 透鏡構件 45a、49a 反射面 55 圖案區域 55a、55b 圖案區域之端部 56 被曝光區域 41 ---I---------裝--- < - (請先閱讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 487964 A7 _B7___ 五、發明說明（U。） 56a、56b 被曝光區域之端部 63、64、65、66、67 遮光物之端部 2 7 3 7 輪滾 ---1 I---------- 鳥 I (請先閱讀背面之注意事項再填寫本頁) 42 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐）KrF excimer laser (248nm), ArF excimer laser (193nm), F2 laser (157nm), Kn laser (146nm), KrAr laser (134nm), or An laser (126nm), etc., and, X-rays containing EUV (Extreme Ultraviolet) light, or charged particle beams such as electron beams or ion beams can also be used. In addition to the F2 laser or Ai * F excimer laser, etc., for example, an infrared region or a higher harmonic wave oscillated by a DFB semiconductor laser or an optical fiber laser may be used (doped with a bait (or bait And mirror) amplify the single-wavelength laser in the visible light region, and convert the wavelength to ultraviolet light with a nonlinear optical crystal). For example, if the oscillation wavelength of a single-wavelength laser is in the range of 1.51 to 1.59 / zm, the output wavelength is 8 times higher harmonics in the range of 189 to 199 nm, or the wavelength is 10 times higher harmonics in the range of 151 to 159 nm. harmonic. In particular, if the oscillation wavelength is assumed to be in the range of 1.544 to 1.553 / zm, 8 times higher harmonics in the range of 193 to 194 nm can be obtained, that is, ultraviolet light having a wavelength substantially the same as that of the ArF excimer laser. If the wavelength is in the range of L57 ~ 1.58 // m, 10 times higher harmonics in the range of 157 ~ 158nm can be obtained, that is, ultraviolet light with the same wavelength as F2 laser. In addition, if it is assumed that the oscillation wavelength is in the range of 1.03 to 1.12 / zm, it will output 7 times higher harmonics in the range of 140 to 160 nm. Especially if it is assumed that the oscillation wavelength is in the range of 1.099 to U06 // m, then It can obtain 7 times higher harmonics in the range of 157 ~ 158nm, that is, ultraviolet light with approximately the same wavelength as f2 laser. In addition, mirror, doped, and fiber lasers are used as single-wavelength lasers. The projection optical system is not only an equal magnification system, but also a reduction system or an enlargement system. In addition, the projection optical system is a refracting system and a reflective refracting system. 37 ΐ The paper size is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm). I. " ------------- I (Please read the precautions on the back before filling in this page) 丄 = 0 · 487964 A7 ___________B7 V. Description of the invention (> 7 h) and any of the reflection systems are acceptable. If you use far-ultraviolet or vacuum ultraviolet rays such as excimer laser, use a refracting system or reflective refracting system with a refractive element (such as quartz or stonite as a glass material), and use An laser or X-ray, then Reflection system. If an electron beam is used, it may be possible to use an electron optical system including an electron lens and a deflector as an optical system. The illumination optical system 1 and the projection optical system 5 composed of optical elements such as a plurality of lenses are incorporated into the exposure device body and optical adjustment is performed. A mask platform or a flat plate platform composed of many mechanical parts is mounted on the exposure device body and By connecting wiring or piping, and installing the light-shielding object 4 or its driving device related to the present invention and performing comprehensive adjustments (electrical adjustment, operation confirmation, etc.), the exposure device of the above embodiment can be manufactured. In addition, it is desirable to manufacture the exposure device under controlled conditions such as temperature and cleanliness. In addition, a micro device containing a display device or the like is a step of designing a function and performance of a circuit, a step of manufacturing a photomask according to the design step, a step of manufacturing a silicon wafer or a glass flat plate, and using the steps described in the foregoing embodiment. The exposure device is manufactured by a step of transferring a pattern onto a substrate, an assembling step (including cutting and packaging, and the like), and an inspection step. [Brief description of the drawings] FIG. 1 is a perspective view of an exposure device according to an embodiment of the present invention. Fig. 2 shows an example of a specific configuration of the illumination optical system shown in Fig. 1. FIG. 3 shows a main part of a modification example of the illumination optical system. 38 This paper size applies to China National Standard (CNS) A4 specification (210 X 297 mm) ------------- install --- (Please read the precautions on the back before filling this page) · · 487964 A7 _______ B7_ ---- V. Description of the Invention (> ll) Figure 4 shows part of the structure of the projection optical system. --------------- (Please read the precautions on the back before filling this page} Figure 5 shows the deformation of the first optical system and the second optical system shown in Figure 4 For example, Figures 6a to 6d show examples of the structure of the field diaphragm. Figure 7 shows the positional relationship between the field diaphragm and the mask using a local projection optical system. Figures 8a and 8b are used to explain The exposure amount of each field of view. Figs. 9a to 9d illustrate the first operation example of the exposure device according to the embodiment of the present invention. Figs. 10a to 10d are the first operation example of the exposure device according to the embodiment of the present invention. 1 la ~ 1 Id 'is a second operation example of the exposure apparatus according to the embodiment of the present invention. Figs. 12a to 12d are second operation examples of the exposure apparatus according to the embodiment of the present invention. The third operation example of the exposure device according to the embodiment of the invention. Figs. 14a to 14c are illustrations of the fourth operation example of the exposure device according to the embodiment of the invention. Figs. 15a to 15c are illustrations of the third operation example of the exposure device according to the embodiment of the invention. 4 operation examples. Figs. 16a to 16c illustrate the embodiment of the present invention. The fifth operation example of the exposure device. Figures 17a and 17b illustrate 39 of the exposure devices related to the embodiment of the present invention. The paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm) 487964 A7 B7 V. Invention Explanation) The fifth operation example. [Symbol description] C Rotation axis cl Circle E, Ea ~ Eg Exposure amount distribution El, E2, EE, EL, ES position LSA, 71a ~ 71d Shading part PA Original pattern SD Scanning direction 1 Illumination optical system 2 Mask 2a ~ 2g Field of view 3 Mask stage 4, 4a to 4g Shading object 5 Projection optical system 5a to 5g Partial projection optical system 6 Flat plate 6a to 6g Exposure area 7 Flat stage 8 XY stage 9, 10 Reflecting member 11 Laser light source 12 Beam splitter 40 I ----- · II (Please read the precautions on the reverse side before filling out this page) This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) 487964 A7 ^ ___ B7 V. Description of the invention ( 々 /) 13, 14, 15, prism 20, 31a ~ 31c ellipse 20a shutter 21, 32 light guide 21a, 21b, 32a ~ 32e exit end 22a, 22b relay lens 23a, 23b fly eye lens 24a, 24b focus lens 25, 41, 61 Field diaphragms 25a, 25b, 41a, 41b, 70a ~ 70c Openings 26a, 26b, 28a, 28b Lens 27a &27; Mirror 29a ~ 29g Illumination area 30a ~ 30c Light source 40, 60 First optical system 42, 62 2 Optical system 43, 46, 47 Right angle 稜鏡 44, 48, 50 Plano-convex lens member 44a, 48a Joint surface 45, 49 Lens member 45a, 49a Reflective surface 55 Pattern area 55a, 55b End of the pattern area 56 Exposed area 41 --- I --------- Loading --- &<;-(Please read the notes on the back before filling this page) This paper size is applicable to China National Standard (CNS) A4 (210 X 297) (Centi) 487964 A7 _B7___ V. Description of the invention (U.) 56a, 56b Ends of the exposed area 63, 64, 65, 66, 67 Ends of the shade 2 7 3 7 Rolling --- 1 I --- ------- Bird I (Please read the precautions on the back before filling out this page) 42 This paper size applies to China National Standard (CNS) A4 (210 X 297 mm)