TW522054B - System for cleaning boxes, box cleaner, and method for cleaning a container, boxes, and box doors - Google Patents

System for cleaning boxes, box cleaner, and method for cleaning a container, boxes, and box doors Download PDF

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Publication number
TW522054B
TW522054B TW090116614A TW90116614A TW522054B TW 522054 B TW522054 B TW 522054B TW 090116614 A TW090116614 A TW 090116614A TW 90116614 A TW90116614 A TW 90116614A TW 522054 B TW522054 B TW 522054B
Authority
TW
Taiwan
Prior art keywords
box
door
spray
cleaning
rotor
Prior art date
Application number
TW090116614A
Other languages
English (en)
Chinese (zh)
Inventor
Daniel P Bexten
Jerry R Norby
James Bryer
Original Assignee
Semitool Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/611,642 external-priority patent/US6412502B1/en
Priority claimed from US09/658,395 external-priority patent/US6797076B1/en
Application filed by Semitool Inc filed Critical Semitool Inc
Application granted granted Critical
Publication of TW522054B publication Critical patent/TW522054B/zh

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H10P72/0414—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto
    • B08B9/08—Cleaning containers, e.g. tanks
    • B08B9/0861—Cleaning crates, boxes or the like
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto
    • B08B9/08—Cleaning containers, e.g. tanks
    • B08B9/20—Cleaning containers, e.g. tanks by using apparatus into or on to which containers, e.g. bottles, jars, cans are brought
    • B08B9/28—Cleaning containers, e.g. tanks by using apparatus into or on to which containers, e.g. bottles, jars, cans are brought the apparatus cleaning by splash, spray, or jet application, with or without soaking
    • B08B9/30—Cleaning containers, e.g. tanks by using apparatus into or on to which containers, e.g. bottles, jars, cans are brought the apparatus cleaning by splash, spray, or jet application, with or without soaking and having conveyors
    • B08B9/32—Rotating conveyors

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
TW090116614A 2000-07-07 2001-07-06 System for cleaning boxes, box cleaner, and method for cleaning a container, boxes, and box doors TW522054B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/611,642 US6412502B1 (en) 1999-07-28 2000-07-07 Wafer container cleaning system
US09/658,395 US6797076B1 (en) 1998-07-10 2000-09-08 Spray nozzle system for a semiconductor wafer container cleaning aparatus

Publications (1)

Publication Number Publication Date
TW522054B true TW522054B (en) 2003-03-01

Family

ID=27086559

Family Applications (1)

Application Number Title Priority Date Filing Date
TW090116614A TW522054B (en) 2000-07-07 2001-07-06 System for cleaning boxes, box cleaner, and method for cleaning a container, boxes, and box doors

Country Status (5)

Country Link
EP (1) EP1313573A4 (fr)
JP (1) JP2004507102A (fr)
AU (1) AU2002216646A1 (fr)
TW (1) TW522054B (fr)
WO (1) WO2002017355A2 (fr)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106206248A (zh) * 2015-03-20 2016-12-07 家登精密工业股份有限公司 半导体容器清洗机的运作方法
CN106540917A (zh) * 2015-09-16 2017-03-29 泰科电子(上海)有限公司 超声波清洗系统
CN110125065A (zh) * 2018-02-09 2019-08-16 系统科技公司 前开式晶圆传送盒清洁装置及前开式晶圆传送盒清洁方法

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1614150B1 (fr) 2003-04-11 2007-08-29 Dynamic Microsystems Semiconductor Equipment GmbH Dispositif et procede de nettoyage et de sechage d'objets utilises au cours de la fabrication de semiconducteurs, en particulier, de recipients de transport et de nettoyage pour plaquettes
EP1503401A1 (fr) * 2003-08-01 2005-02-02 Vlaamse Instelling Voor Technologisch Onderzoek (Vito) Methode et appareillage pour le nettoyage d'un substrat grace à un fluide supercritique
FR2886456B1 (fr) * 2005-05-26 2007-08-17 Soitec Silicon On Insulator Dispositif de sechage post-nettoyage d'un contenant de plaques semiconductrices
DE102005030275A1 (de) 2005-06-21 2006-12-28 Dynamic Microsystems Semiconductor Equipment Gmbh Verfahren und Vorrichtung zum Reinigen oder Trocknen von topfartigen Hohlkörpern, insbesondere von Transportbehältern für Halbleiterwafer
DE102009040978A1 (de) * 2009-09-11 2011-03-17 Krones Ag Magazinvorrichtung für Blasformen mit Reinigungseinrichtung
KR101022014B1 (ko) * 2010-05-18 2011-03-16 (주) 디바이스이엔지 웨이퍼 보관용기 세정장치
KR100987323B1 (ko) * 2010-05-18 2010-10-12 (주) 디바이스이엔지 웨이퍼 보관용기 세정장치
KR101601600B1 (ko) * 2015-05-22 2016-03-09 조창현 기판 보관 및 이송용기의 청정 유지를 위한 퍼지 장치
CN113843235B (zh) * 2021-08-06 2022-11-04 徐州鑫晶半导体科技有限公司 晶圆盒清洗装置及其控制方法
CN114308835B (zh) * 2022-01-05 2022-12-16 张卫英 一种妇产科用仪器清洗装置
CN117206242B (zh) * 2023-10-03 2024-08-13 上海芯畀科技有限公司 半自动离心式晶圆传送盒清洗机

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5221824Y2 (fr) * 1973-01-09 1977-05-19
JP2528741Y2 (ja) * 1991-08-13 1997-03-12 株式会社内山商会 野菜皮剥き洗浄用ノズル装置
US5224503A (en) * 1992-06-15 1993-07-06 Semitool, Inc. Centrifugal wafer carrier cleaning apparatus
US5672212A (en) * 1994-07-01 1997-09-30 Texas Instruments Incorporated Rotational megasonic cleaner/etcher for wafers
JP4095722B2 (ja) * 1998-03-27 2008-06-04 株式会社藤森技術研究所 半導体ウエハのポッド洗浄装置
US6432214B2 (en) * 1998-07-10 2002-08-13 Semitool, Inc. Cleaning apparatus

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106206248A (zh) * 2015-03-20 2016-12-07 家登精密工业股份有限公司 半导体容器清洗机的运作方法
CN106540917A (zh) * 2015-09-16 2017-03-29 泰科电子(上海)有限公司 超声波清洗系统
CN106540917B (zh) * 2015-09-16 2020-03-31 泰科电子(上海)有限公司 超声波清洗系统
CN110125065A (zh) * 2018-02-09 2019-08-16 系统科技公司 前开式晶圆传送盒清洁装置及前开式晶圆传送盒清洁方法

Also Published As

Publication number Publication date
JP2004507102A (ja) 2004-03-04
AU2002216646A1 (en) 2002-03-04
EP1313573A2 (fr) 2003-05-28
EP1313573A4 (fr) 2005-11-30
WO2002017355A3 (fr) 2002-05-02
WO2002017355A9 (fr) 2003-02-06
WO2002017355A2 (fr) 2002-02-28

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Legal Events

Date Code Title Description
GD4A Issue of patent certificate for granted invention patent
MM4A Annulment or lapse of patent due to non-payment of fees