TW595272B - Plasma producing system - Google Patents

Abstract

This invention relates to plasma producing system. High frequency supplier is connected to hollow negative pole. A metal layer is applied to two sides of insulation material of hollow negative pole. The hollow negative pole has micro-holes for being passed by air. By above system, there could be stable plasma for cleaning plating and eroding. Above system wouldn't over erode and have no pollution improving high efficiency.

Description

595272 __ Case No. 92119620 ___ Year You π: __ V. Description of the invention (1) [Technical field to which the invention belongs]

The invention relates to a plasma generation system, that is, a plasma generation source design, a plasma device and method designed with a high-frequency power supply and a micro-hol low-cathode pole, and more particularly, a plasma device and method Device and method for generating large-area uniform cold plasma under normal atmospheric pressure. It can generate plasma under normal pressure, does not need vacuum equipment, shortens processing time, and has excellent uniformity. When applied to the surface cleaning, there will be no over-etching damage to the object to be cleaned; moderate ion energy will not cause pollution to the object to be cleaned; therefore, the process window (process windQW) can be increased. When applied to plasma plasma membranes, moderate ion energy will not cause substrate damage due to ion bombardment. Applied to plasma etching, due to the high concentration of activated materials, including ions, excited molecules and free radical particles, etc., there is a large L without W technology for the etching rate] Press, the plasma device is used to generate in the gas phase It has a substrate to provide the object to be cleaned [that is, the so-called clear, the deposited film material [that is, the supply of the field, leaning], J π ^ that is the coating, the composition], and tender η surface chemical composition [ That is, the god's fake product is squeezed, and the solid is changed—ification] and: modified 'SUrface square + KJ and selective reaction to remove solid materials [ie God from the moment, etchlng]. For example: Bamboo L is the etched 2i integrated circuit silicon wafer. In the component packaging process, the contaminants may be caused by the manufacturing process. This contaminant may cause contaminants to adhere to the two-substrate substrates, which will cause subsequent packaging. In the process, when gold thread or seal is hit 595272 9211QR90

JL. V. Description of the invention (2) f. Poor adhesion of oxygen resin, severely reduced yield, and removal of contaminants on the substrate. This silicon wafer or (2) is coated or surface modified on a solid surface. For the semiconductor process, the number of wafers to be manufactured on a 6 to 8 inch wafer is equal to /. First make the wafer table: clean a small component to increase the adhesion between the coating and the substrate, and then pass in ;; plasma treatment Shi Xiyuan [SiHO mixed oxygen reacts to the basic object such as [Si02] through the electric paddle. (3) For the formation of silicon oxide on the surface, and (3) for etching on a solid surface, you need to pass the disk f :: If you want to etch silicon #, you can pass gas containing: The chaos [F2] or carbon tetrafluoride [CF4] is decomposed into f: radicals and ions by plasma, and the particles react chemically with the silicon material to form gaseous chaos silicon [SiF4], which diffuses into the gas and is carried away. Plasma manufacturing has become an indispensable technology in the semiconductor industry. m At present, the commonly used plasma device is produced by discharging in a vacuum environment. Capaci ty_coupled Plasma is often used. The principle of plasma generation is in the electrode (丄Power) (DC) power supply (1 2) or high frequency [Radi〇 Frequency 'RF] power supply (1 3)' This electrode (1 1) and another ground electrode (14) [usually a vacuum cavity ( 1) The cavity wall] generates a capacitive discharge [as shown in the first and second figures] 'The electrons gain energy in the negative electrode dark area (Cathode Sheath) and catch and collide with neutral gas molecules to dissociate it [such as e- + Ar-- > Ar ++ 2e-] 'The dissociated electrons are accelerated again, dissociating more neutral gas molecules, and forming a plasma. The concentration of the plasma is related to electricity 595272 _ Case No. 92119620_ year and month amended __ V. Description of the invention (3) The generation of the daughter and its survival time [L ifetime], this capacitive plasma electrons are accelerated linearly by the negative electrode Accelerating toward the positive electrode, the electrons can easily hit the positive electrode and disappear. Therefore, the capacitance density of the capacitor type is low. In the industry, there is another Inductively-Coupled-Plasma (ICP). The substrate is inserted into the support frame, and the support frame is on the carrier. An antenna is placed above the carrier, and a south frequency is applied to the antenna. Radio Freciuency (RF) power supply. After the antenna induces the plasma, the plasma reaches the surface of the substrate by diffusion. Inductively coupled plasma is suitable for generating plasma under extremely low pressure. The plasma density is high and charged particles will not The substrate is directly bombarded, but the plasma is easily concentrated near the antenna, and the uniformity is not good. In the industry, the principle of hollow cathode (15) is also used to generate low-voltage plasma [as shown in the second figure]. As a design of the plasma device, the hollow cathode effect generated at low voltage cannot be operated in parallel. A single hollow cathode discharges It will be near the hollow cathode in the electrical aggregation, and homogeneity is a major disadvantage. At present, there are also devices that generate plasma under normal pressure. The method of generating it is to apply a high current power to two metal materials. The discharge area on the cathode electrode will be reduced to a small point, which is called an arc spot [Sp〇t ], Under the influence of momentum and electric field, the arc spot will move on the electrode, this is called arc discharge [Arc discharge]. There is also a system. The method of forming a tubular electrode, forming a flame-like discharge through a gas, is called a tubular torch discharge. The above discharges use heating to provide high-energy electrons to maintain the plasma in a thermal equilibrium state. [Thermal Equilibrium] Or Local Thermal Equilibrium discharge, the gas temperature is usually as high as tens of thousands of degrees Celsius.

595272

In addition, there are currently devices for generating cold plasma under normal pressure. The method of generating them is to apply high voltage power to the two electrodes. As long as one or both of the two electrodes need to be covered with an insulating material such as glass or When the oxidation nameplate is passed through a high-voltage power supply, many small discharges are formed between the electrodes, called microdischarge channels, and electrical destruction occurs here. In order to maintain a high electric field, the electrode spacing of this plasma device is actually very narrow, in the range of about 2-10 mm, and the plasma uniformity is poor, which is not suitable for applications such as coating and etching. Also, the use of hollow cathodes to generate normal piezoelectric plasma has only just begun in some foreign research groups. By reducing the hollow cathode holes to tens of microns [from melon], plasma can be uniformly generated in the holes, but its disadvantages It is hollow, and the hole diameter is too small, which may cause the deposition of the coating and plug the holes. In addition, the research of ^ uses a direct current power supply (dc ρ 〇wer) and a pulsed power supply; [pulse power], which is not conducive to the stability of the plasma, Plasma is operated in parallel and discharge is performed in a large area, so most of the current researches focus on using its light. ', Health [Content of the invention] The present invention relates to a plasma generation system, which is mainly connected to the cross-pan, high-frequency power supply and the electrode of the micro-hollow cathode, the two sides of the insulating material using the micro- $ ^ $ are attached A metal conductive layer, and set up small holes filled with dioxin for gas to pass, so that under normal pressure, it can produce a plasma with uniformity and stability, and form a uniform cold plasma with a large area. Become a kind. As processing operations such as cleaning, coating, surface modification, and etching of the object to be cleaned, it can be achieved without excessive erosion, and the ion energy is moderate, and it will not cause pollution.

595272

A plasma generation system that can increase the process window without causing damage to the substrate and can effectively increase the remaining rate. [Embodiment] In order to make the technical means and effect achieved by the present invention easy to understand, the illustrations and figure numbers are described as follows: First, referring to the third figure, the plasma of the atmospheric cold plasma of the present invention generates 糸System (2) includes:

_Evil upper and lower electrodes (2l) and (22) generate plasma independently. You can choose to operate only one electrode or both sides to generate electricity to process single-sided or two-sided substrates (3). Since the present invention does not require a vacuum device and an air extraction device, the substrate to be processed can be continuously processed in an electrically damaged area, as shown in the third figure. Eight, two electrodes (21), (22), as shown in the fourth to twenty-seventh figure = i = made of metal plate or metal mesh or insulation, high frequency can be provided by high frequency power supply (2 3) power supply. = Or multiple high-frequency power supplies (23), such as fourth to twenty-seven strings, *. The frequency of the two-frequency power supply is between 1kHz and 100MHz, and the waveform can be positive. [Sin wave], square wave, triangle wave or the combination of the aforementioned various waveforms% 'for the corresponding set of two magnets (2 4) located outside the electrode =' to provide a radial magnetic field relative to the electrode (21), ( 'As shown in Figures 28 and 29. a spleen' The plasma operating method steps of the present invention are as follows: • Remove the dust particles on the surface of the object to be treated in advance.

595272 Case No. 92119620 January, said amendments should all go forward. Source double 2 things. . Into electricity or C. At the end of the current pole and at the surface pole, the field gas power is set to be a single magnet to be used as the surface of the pendulum. The control and control of the dual-direction direction of the power source worker is based on the electric power or the area diameter, and the reason is that 2 pairs of surface poles or body frequencies are to be passed. The source of the electric power is shown in Figure 1. The electric power transmission of the electric power shown in the figure is based on the matching of the output of the entire picture. The power rate is as the time frequency of the biological production area. (6) Rieyuan District Sources > Management} The magnetic response of the bright place is from 3 places 2 | Standby reaction once the 2 rows 2 '#Yu Li to Kai Jing C into C 5 bcdef device can be 2 extension of the small two points to ct} is the body pressure of the main, electricity 2, out of the air} cut 2 into 2 and hit the type 1 C system 1 can be set to 2 sides, first 2 Desizing is C connection} Off} {sub-plasma pole connected lj l material to get electricity} 2 fields and 2 material speeds to produce 2 poles on the 3C electric C edge to produce 2 poles ^^ pole absolute field for positioning < electricity } Electricity in electricity, the stable device is used in 2 groups, and the bioreactor 2 supplies the profit and plasma production, C, is the source area of the electric power generation and the power generation zone of the electric power generation. Use the diagram in Figure 1 to divide the middle part of the poles. 2 The four negative electrical parts are evenly distributed, and then the C part is distributed to the second part. The electrodes are made from the middle part, and the head part is made of electricity. The productive insights are integrated. } Go to the eye of the law, the big standard 2 shows

1 gas electricity 2 supply poles

Page 11 595272 _Case No. 92119620_Year Month__ V. Description of the invention (7) 1 1) Reduced to less than 1 mm [about 0 · 5-0 · 3 mm], which can produce a uniform height under normal pressure Density plasma, and using AC power, the entire electrode (21) is made of two pieces of metal conductive layer (213) and (2 1 4) with opposite holes (211) as electrodes and the corresponding insulating material (212) ), The electrodes of the metal conductive layers (213), (214) can be attached to the insulating material (2 1 2) by using a commercially available metal punching net, coating or screen printing. The insulating material (2 1 2) is made of refractory material, which can prolong the electrode life, such as ceramic materials such as alumina and boron nitride. The traditional hollow cathode (1 5) discharge uses a DC power supply to achieve the function of continuous dissociation gas. The hollow cathode (15) will form a plasma with a high dissociation rate and a high plasma density. However, the DC power supply is prone to cause unstable arc discharge. , Which in turn causes damage to the object to be processed or the electrode, which has many restrictions on its application, especially in high pressure and normal pressure environments. Therefore, in this case, an alternating-current micro-hollow cathode (2) is used to avoid the formation of unstable discharges. As shown in the five pictures [the connection between all the electrodes and the power supply can be adopted in this way, that is, one of the power supply (2 3) is terminated with two electrodes (2 1), (2), and the other end is grounded], The high-potential electrode of the AC power supply is connected in parallel to the two electrodes (21) and (22), so the two electrodes (21) and (2 2) maintain an equipotential state, and because the AC electric field is a positive-negative exchange, when the two electrodes (2 1 ) And (2 2) are negative potentials, forming a hollow cathode plasma has the effect of increasing the dissociation rate. When both electrodes (21) and (2 2) are positive potentials, they will attract electrons and push ions to the electrodes. (twenty one ) , ( 2 2) The outside helps plasma to be generated in the processing area.

Page 12 595272

As described in the fourth 'plasma generation field control as described in the fourth figure 2 2), choose a supplier, such as current, AC, or cover a layer of insulating power supply material (2 5 charge is conducted away, bit [Floati' and immediately after the electricity It will cause electricity to form a local electrode. When the surface density of one or two cathodes is positive, it is responsible for the moment in the middle of the electrode. The hollow cathode that was originally intended to reach the electrode in order to achieve the density of the slurry can be shown in the figure. The optimal position of the electricity is adjusted. The micro-hollow hollow cathode is grounded as shown in the sixth figure. The shield of the pulsed power edge material (2 must be selected) is used as the vibration of the transformer connected to the plasma density and the density of the plasma. The plasma is pushed between the hollow cathode and the hollow cathode in the support frame, so that the plasma is stably shaped on both sides of the electrode to choose the pole (2 1). The pole device can be shown by the fifth figure of the power supply, and the fifth figure of the right As shown, 'The above number of suppliers. When 5) [such as the current or pulse type. Since the absolute contact will be shown in Table a 1], the inside of the electrochemical 'trench is actually hollow. For a moment, the opposite electric electrode is negatively charged, and the other high-density forming effective electrode is turned into positive, positive and negative potentials to form the electrode on the left side of the electrode (21), the eighth picture, and (2 2) of the electrode. Gold can also be connected to the second and second metal electrodes. Figure 7] Power supply edge material (the principle of forming a layer of slurry on both sides shows that the effect field of this layer of insulation cathode is connected to the metal on the side when it is in place. The electric potential generated by the degree of electrons towards this collision will be exchanged back to the nearest interval. (2 3) The production wiring method is two pieces of metal and gas flow 2 1) as the first electrode (a AC power source to choose a straight (2 2 ), Be | J the second to cross the insulation 5) can not be floating charge electricity this potential is negative on the negative potential is the same, point two metal mesh electrodes to form the mesh electrode opposite the electrode pull, and slurry; in the next power The separation in the slurry makes Gaomi Symmetric Electricity use two high

Page 13 595272 — Case No. 119620 _Year Month and Day 佟 1 V. Description of the invention (9) ~-Frequency power supply (2 3) individually controlled or a high frequency power supply for crying (2 3) parallel operation, It can make the atmospheric pressure micro-hollow cathode plasma to be symmetrical, which is beneficial for the simultaneous processing of both sides of the substrate. Atmospheric pressure micro hollow cathodes can also be produced in the form of grooves, as shown in the ninth figure, the holes (2 1 1) shown in the fourth figure are changed into grooves (2 1 5) 'for the electrode (2 1 The preparation of) and (2 2) can be greatly simplified. The way to connect the power supply can be the way as shown in Figures 9 to 12 and the reason is as described in Figures 5 to 8. The second improvement method is to use the hollow cathode principle to add a cone-shaped metal (216). As shown in Figure 13, the field emission effect of the cone-shaped metal (2ΐβ) can make the electrons easily escape from the cone. The tip of the metal (2 16) further reduces the starting voltage. When the cone-shaped chapter (2 1 6) passes in a negative electric field, the electrons leave the tip and are attracted by the corresponding hollow anode. At the next instant of the AC electric field, the hollow anode becomes Hollow cathodes cause electrons to oscillate back and forth between the hollow cathodes, which increases the probability of electrons effectively colliding with gas molecules; the plasma dissociation rate is greatly increased; the plasma is stabilized and the range of plasma operation is expanded. In addition to lowering the start-up voltage, it also has the function of increasing the plasma dissociation rate of the hollow cathode. Add this principle to the above-mentioned method of matching power connection to obtain uniform large-area discharge, as shown in Figures 14-17. In the same way, it is also possible to use implanted columnar or dendritic microstructures (2 1 7). As shown in Figure 18, microstructures such as carbon nanotubes or carbon nanotubes with excellent field emission effects M-pillar structure [nano-r〇d], implanted in the electrode as a component that emits electrons, cooperates with a micro-hollow cathode electrode and high-frequency power wiring to achieve a large area

595272 Case No. 92] 〖qr9〇 (10), such as the first improvement method is to replace the general electrode, such as the twenty-three hollowed out part 8), (2 1 preparation and life of fourteen to twenty-seven , Relative to the graph. Due to the rotation of electrons to the Lorentz force line, such as the magnetic field line grasping degree, on the other hand, ions, ions will not be moved by the speed of the magnetic line, so adding a larger magnet is effective The behavior of the clear plasma, can avoid the magnetic field of electrons in the direction of the plasma potential, so the positive twelve figures are generated. Nets (2 1 8), (2 1 9) Hollow cathodes can generate metal nets at normal pressure. (2 1 8), (2 A hollow cathode, a group of micro-hollow cathode arrays of the entire metal, Lei. The principle of connecting different electrodes to the power source is as described above. The magnetic field in the direction, such as the twenty-eighth and the mass is very small, the electrons are in The magnetic field force] F = q · νχ β. So the electrons in the plasma will be improved by the electron survival rate, which is limited by the magnetic field, leaving only the mass', so it is not affected by the mass of ions due to the Lorentz force. Bigger than electronics The deep layers of the skin that have almost no electromagnetic shielding thickness, and the direction of the magnetic field is different, will also be on the electrode as shown in Figures 28 and 29. Therefore, the opposite 'if applied perpendicular to the line of magnetic force Guidance and loss are left in large quantities for the loss of electrons. Page 15 595272 SS92U9620 Modification V. Explanation of the invention (11) Positive charge, so the higher plasma ion hits the same plasma state, which is characteristic of the invention. Cathode electrode structure. The plasma density of the structure is relatively high. At the same time, the starting voltage of the plasma can be increased by greatly prolonging the electrode life. At high frequencies, it can avoid damage to the stability of the electrode caused by DC electrical discharge. At the same time, it is low to increase the plasma density. The following is the present invention. The third aspect of the present invention is the three voltages (V)-current (the potential will be due to energy, so do not deal with it in combination with the other one, and anger at Gas flow; due to the reduction, the electric AC power source's' needs to be used and is easy to put on, raising several hundred volts, so it can produce a design in the direction of the magnetic field, which can lead to different The substrate to be processed is relatively easy. Compared with the micro-electrode structure of the high-frequency AC power supply, the micro-hollow cathode body can completely flow through the plasma area. The dissociation rate of the electrode has the effect of cooling the electrode, and the distance between the positive and negative electrodes of the electrode. It can be shortened, the stability of 襞 is improved, and the life of the electrode is also combined with the micro-hollow cathode electrode design or the pulse power supply. It is easy to limit the current-limiting resistance of the tip. Therefore, it can increase the large electrode area and make the starting voltage drop. Results ·· Example (1): As shown in the twelfth figure, the embodiment (a) of the present invention 1) The relationship diagram and the plasma generation situation [Top view] The high-definition version RF3 is stable. That is, 2 C pressure Uniform gas and electricity are all high-pass. ”¾ degree micro-piezoelectricity is added and seen when the electricity is generated. The device can produce products for this current source. The electricity source is helium as the body gas. Compared with Mingfa

Page 595272 Case No. 92119620 Amendment V. Description of the invention (12) The voltage (V) -current (I) applied to the hollow cathode electrode by the DC power supply and Pulse power supply as shown in Figure 33 ) Relation diagram: From this diagram, it can be seen that the plasma is prone to tip discharge, and the voltage-current relationship is unstable. 3. Example (II) of the present invention: As shown in Figure 34, it can be seen that the plasma generation of Example (II) of the present invention shows that the plasma is very uniform and stable. 4 · Some related studies of the present invention are published in the sentence of imprisonment as shown in Annex 1.

In summary, the embodiments of the present invention can indeed achieve the expected use effect, and the specific structure disclosed has not only been found in similar products, nor has it been disclosed before the application. It has fully complied with the provisions of the Patent Law. In accordance with the law, the application for an invention patent was submitted in accordance with the law, and it is imperative that it be examined and the patent granted.

Page 17 595272 _Case No. 92119620_Year Month Day_Modified diagram simple explanation simple explanation] The first diagram is a conventional low-voltage capacitor plasma ri-n. Θ is also prepared. The second diagram is a conventional low-voltage hollow cathode plasma equipment diagram. Fig. 1 Schematic diagram of the device of the present invention. Fig. 4 Schematic diagram of the embodiment of the electrode design (1) of the present invention and the power supply and electrode connection method (1). Fifth diagram of the electrode design of the present invention (2). The schematic diagram of the method (2); Figure 6 • The electrode design (3) of the present invention and the electrode connection method (3) The seventh diagram • The electrode design (4) of the present invention The eighth diagram; Electrode design (5) schematic diagram and electrode connection method (4) Schematic diagram ninth: electrode design of the present invention (6) schematic diagram and power supply and electrode connection method (2) tenth Figure • Schematic diagram of electrode design (6) and electrode connection method (3) of the present invention. Figure 11 Schematic diagram of electrode design (7) of the present invention. Figure 12 Schematic diagram of electrode design (8) of the present invention. The schematic diagram of the connection method (4). Tenth reference picture • The electrode design of the invention (9) The schematic diagram and the power supply and electrode connection method (1) The schematic diagram of the fourteenth figure 1 The electrode design of the invention (9) and electrode connection method (2) Unintentional

Page 18

595272 _Case No. 92119620_Year Month__ Brief description of the drawing Figure 15: Schematic diagram of the electrode design (10) and electrode connection method (3) of the present invention Figure 16: The electrode design of the present invention (11 ) Schematic Figure 17: Schematic diagram of the power supply and electrode connection method (4) of the present invention Figure 18: Schematic diagram of the electrode design (1 2) and power supply and electrode connection method (1) of the present invention Figure 19: The intention of the electrode design (13) and electrode connection method (2) of the present invention. Figure 20: The schematic diagram of the electrode design (14) and electrode connection method (3) of the present invention. : Schematic diagram of the electrode design (15) of the present invention Figure 22: Schematic diagram of the electrode design (16) of the present invention and schematic diagram of the power supply and electrode connection method (4) Figure 23: Electrode of the invention Design (1 7) schematic diagram and schematic diagram of power supply and electrode connection (1) Figure 24: schematic diagram of electrode design (18) of the present invention and schematic diagram of power supply and electrode connection (2) twentieth Figure 5: The electrode design (19) of the present invention Schematic diagram of the connection to the power supply and the electrode (3) Figure 26: Schematic diagram of the electrode design (20) of the present invention Figure 27: Schematic diagram of the electrode design (2 1) of the present invention and power supply and electrodes Unintended connection (4) Figure 28: Schematic diagram of the assembly of the installed magnetic field of the present invention (1)

595272 Case No. 92119620 Brief description of the modified diagram Second, third, third, and third diagrams: Schematic diagram of the assembly of the installed magnetic field of the present invention (II): Plasma generation situation and device diagram of the embodiment (I) of the present invention: this Inventive Example (1) Plasma Emission Spectrum: Example (I) of the present invention (1) The voltage-current relationship diagram of a micro-hollow cathode with an RF power supply: Comparative Example (1) of the present invention with a DC power supply and The relationship between the voltage and current of the Pulsembwu power supply applied to the hollow cathode electrode is shown in Figure 14: the plasma generation situation in the embodiment (II) of the present invention] 1: APPLIED PHYSICE LETTERS VOLUME 82, NUMVER 3 20 JAUNARY 20 0 3 Punishment nineteen figure eleven twelve thirty-third third [Refer to the attached drawings [Refer to the number]] (1) Vacuum cavity (1 1) Electrode (1 2) DC power supply (1 3) High frequency power supply (1 4) Ground electrode (1 5) Hollow cathode (2) Plasma generation system (2 1) Electrode (2 1 1) Hole (2 1 2) Insulation material (2 1 3) Metal conductive sheet (2 1 4) metal Electric sheet (2 1 5) Groove (2 1 6) Cone metal (2 1 7) Columnar or tree microstructure (2 1 8) Metal mesh (2 1 9) Metal mesh (2 2) Electrode (2 3) Power supply

Page 20 595272 Case No. 92119620 Amendment Brief description of drawings (24) Magnet (25) Insulation material

II Round Page 21

Claims (1)

^ y ^ z / z βΜ ^ 92Π902〇 ^ 6. Application for patent scope 1. A plasma generation system, including two electrodes, two poles, distant daggers, and two ^ connected to a power supply; power supply; a magnetic “%” Corresponds to the electrode. It is characterized by: The two magnets generated by the bu yi, the electrode is the metal conductive sound of the micro hollow descent, and the insulating material is covered with holes on both sides. It is connected to the micro hollow descent. ^ Stream high-frequency power. " " The power supply provides ΙΟΟΚΗζ ~ 100MHz AC! • -A kind of plasma generation system, including two electrodes, 磕 社 & L 祜 has a connection power supply test · Power supply; σ, a magnetic field, f + Α & It is characterized by two magnets on the outer side of the pole; The electrode is made of a metal conductive layer in the middle * Γ ΐ 彳 ° 'is filled with holes on both sides of the insulating material. It is connected to the hollow Risk Μ ΙΟΟΚΗζ AC high-frequency power supply. The power supply of β 11 provides 1 KHz 3. A plasma generating system includes: ❿: an electrode connected to a power supply; yes. a power supply; a magnetic field corresponding to the electrode is characterized by two magnets The produced; ,,,,,, and materials have micro-hollow cathodes with tapered metal electrodes attached to both sides, 595272 It consists of a metal conductive layer; The power supply of Shiyi connected to the micro-hollow cathode provides 100KHz ~ 100MHz AC south frequency power supply. 4 · A plasma generating system includes: two electrodes connected to a power supply; a power supply; a magnetic field corresponding to two magnets generated outside the electrode; characterized in that the electrode is a micro hollow cathode and is made of bismuth Crushing people It consists of a metal conductive layer; a cone-shaped metal high-frequency 5 ^ micro-electrode cathode power supply is attached to both sides of the s-edge material and provides 1KHz ~ 100KHz AC b · —a plasma generation system, including: two Electrode connected to power supply; power supply; generated by two magnets A magnetic field, corresponding to the outside of the electrode, is characterized in that: a source and a supplier with a metal mesh attached to both sides of the insulating material are provided with a 100 KHz to 100 MHz cross electrode as a micro-hollow cathode and a metal conductive layer; and a high-frequency current source connected to the micro-hollow cathode . : Two types of electrical suspect generation systems, including: two electrodes connected to a power supply; a power supply; Page 23 No. 92119620 VI. Scope of patent application Correcting a magnetic field, corresponding to the outside of the electrode, is characterized by: generated by two magnets on the outside, · the electrode is a micro-hollow cathode, composed of a conductive metal layer, and is a high-frequency power supply with metal mesh attached to both sides of the insulating material 7 * ,,, ΪWeizhonggong cathode power supply provides IKHz ~ ΙΟΟΚΗζ AC • A plasma generation system includes: two electrodes connected to the power supply; power supply; in: generated by two magnets that should be outside the electrode; structure ; For the power supply with columnar micro-junction high hollow cathodes attached to both sides of the insulating material, 1 () ° KΗζ ~ 1 ° MΗζ two kinds of plasma generation system, including: two electrodes, connected to the power supply Power supply; two on; produced by two magnets on the outside of the electrode; structured metal ί JJ J :: Provides ΙΚΗζ for power supply with cylindrical micro-junction high-frequency power connection on both sides of the insulating material connected to the micro-hollow cathode ~ 100KKZ exchange Page 24 595272 η Amendment & Case No. 92119620 6. Scope of Patent Application 9. A plasma generating system includes: two electrodes connected to a power supply; a power supply; a magnetic field corresponding to the outside of the electrode It is produced by two magnets; It is characterized by: ^ # ^ f Ϊ is a micro-hollow cathode, which is composed of a metal conductive layer with a tree-like microstructure attached to both sides of an insulating material; a power supply connected to the micro-hollow cathode provides 100 kHz ~ 100MHz AC high-frequency power supply. 1 〇 · A plasma generation system, including: two electrodes connected to a power supply; a power supply; a magnetic field corresponding to the two magnets generated outside the electrode; its characteristics are: ΐ is a micro-hollow cathode 'is composed of a metal conductive layer with a tree-like microstructure attached to both sides of an insulating material; a π micro-hollow cathode power supply provides UHZ ~ 100KZZ AC high-frequency power supply. Zhong i i Please refer to the plasma generating system described in item 1 of the patent scope, where the holes of the electrodes of the micro-middle cathode are less than 1 mm. The plasma generation system described in item 2 of the second range has a hole with an electrode of τ that is slightly smaller than 0.5 mm. 7 ″ 3 · As described in the patent application scope item 1, 2, 3, 4, 5, 6, 9, or 10, the electrode can be Page 25 595272 _ Case No. 92119620_ Year Month Date _i ± ^ _ VI. Scope of Patent Application One micro-hollow cathode electrode and the other a metal electrode. 1 4 · According to the plasma generating system described in item 1, 2, 3, 4, 5, 6, 7, 8, 9, or 10 of the scope of patent application, the electrodes can be two micro-hollow cathode electrodes. 1 5 · According to the plasma generation system described in item 1, 2, 3, 4, 5, 6, 6, 7, 8, 9 or 10 of the scope of patent application, one of the electrodes may be a micro hollow cathode and the other is a metal Electrodes with insulating material attached to the metal plate 6 materials, 5 materials, 4 materials, 4 materials, 3 materials, 2 materials, 1 product, 1 material, 1 battery, 6 materials, 6 materials, 1 material, 6 materials, materials For 5 special projects, 4 of them, 3 of them, 2 departments of the Department of Health, and 1 of the 1st company, please refer to ο 1 for the special projects. For example, aluminum alloys, chemical compounds, oxygen compounds, chemical compounds, materials, materials, materials, materials, materials, materials, materials, materials, etc. Please refer to the special projects. IX. For example, if you want to use a battery, you can use a gas, a gas, a gas, a gas, a gas, a gas, a gas, a gas, a gas, a metal, a metal, a metal, a metal, or a metal. For example, 0 · 9 magnetic 9 and pottery 1 8 are, can 7, electric 6 conductance, 5 gold, 4 of them, 3 of them. 1. The 2 raw materials, raw materials, and raw materials are produced in the first place. The special formula attached to the fan is required. Fang Shen 1 Films such as or plated · 9 to ο, to 2 8 may, layer 7 Paste. The item above 8 material or edge 7 must be enclosed in the Fan Fuli style. Please apply for printing as the version. Net 1 is 2 layers. Page 26 595272 _ Case No. 92119620_ year month day __ VI. Application The scope of the patent, in which the columnar microstructure can be a nano carbon tube. 2 2 · The plasma generation system described in item 7 or 8 of the scope of patent application, wherein the columnar microstructure may be a nanocolumnar structure. 2 3 · The plasma generating system according to item 9 or 10 of the scope of patent application, wherein the tree-like microstructure may be a nano carbon tube. 24. The plasma generating system according to item 9 or 10 of the scope of patent application, wherein the tree-like microstructure may be a nano-columnar structure. Page 27