TWD200031S - Electric furnace for substrate processing equipment - Google Patents

Electric furnace for substrate processing equipment

Info

Publication number
TWD200031S
TWD200031S TW107302983F TW107302983F TWD200031S TW D200031 S TWD200031 S TW D200031S TW 107302983 F TW107302983 F TW 107302983F TW 107302983 F TW107302983 F TW 107302983F TW D200031 S TWD200031 S TW D200031S
Authority
TW
Taiwan
Prior art keywords
electric furnace
substrate processing
processing equipment
design
article
Prior art date
Application number
TW107302983F
Other languages
Chinese (zh)
Inventor
Tetsuya Kosugi
Hitoshi Murata
Masaaki Ueno
Original Assignee
日商國際電氣股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商國際電氣股份有限公司 filed Critical 日商國際電氣股份有限公司
Publication of TWD200031S publication Critical patent/TWD200031S/en

Links

Abstract

【物品用途】;本設計的物品是基板處理裝置用電氣爐,為一種使用在供處理半導體之類的基板的基板處理裝置,可將收容在本體內部的反應管進行昇溫的電氣爐。;【設計說明】;本設計中,用來將冷卻本體內部的氣體冷煤流通到複數個流路的閥元件,是形成突出於本體側面。[Use of the article] The article of this design is an electric furnace for a substrate processing device. It is an electric furnace that is used in a substrate processing device for processing substrates such as semiconductors and can heat the reaction tube housed inside the body. ;[Design Description];In this design, the valve element used to circulate the gas refrigerant inside the cooling body to multiple flow paths is formed to protrude from the side of the body.

TW107302983F 2018-02-27 2018-05-28 Electric furnace for substrate processing equipment TWD200031S (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JPD2018-4004F JP1611565S (en) 2018-02-27 2018-02-27

Publications (1)

Publication Number Publication Date
TWD200031S true TWD200031S (en) 2019-10-01

Family

ID=63169034

Family Applications (1)

Application Number Title Priority Date Filing Date
TW107302983F TWD200031S (en) 2018-02-27 2018-05-28 Electric furnace for substrate processing equipment

Country Status (3)

Country Link
US (1) USD860420S1 (en)
JP (1) JP1611565S (en)
TW (1) TWD200031S (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP1731672S (en) * 2022-03-15 2025-12-15 Furnace for substrate processing equipment
JP1731671S (en) * 2022-03-15 2025-12-15 Furnace for substrate processing equipment
USD1058783S1 (en) 2024-08-02 2025-01-21 Shanghai Qidian Industry and Trade Co., Ltd. Melting furnace

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD383525S (en) * 1995-11-21 1997-09-09 Purcell Steven J Insulated water heater for hydrotherapy baths, spas, and skid packs
US20130192522A1 (en) * 2010-12-30 2013-08-01 Poole Ventura, Inc. Thermal diffusion chamber with convection compressor
US20110249960A1 (en) * 2011-01-28 2011-10-13 Poole Ventura, Inc. Heat Source Door For A Thermal Diffusion Chamber
JP5702657B2 (en) * 2011-04-18 2015-04-15 東京エレクトロン株式会社 Heat treatment equipment
US9171746B2 (en) * 2011-09-06 2015-10-27 Arsalan Emami Heater elements with enhanced cooling
US9167630B2 (en) * 2011-10-17 2015-10-20 David E. Seitz Tankless water heater
US9234674B2 (en) * 2012-12-21 2016-01-12 Eemax, Inc. Next generation bare wire water heater
US10132525B2 (en) * 2013-03-15 2018-11-20 Peter Klein High thermal transfer flow-through heat exchanger
USD754066S1 (en) * 2014-03-12 2016-04-19 Mitsubishi Electric Corporation Turbine generator
USD753590S1 (en) * 2014-03-12 2016-04-12 Mitsubishi Electric Corporation Turbine generator
USD790048S1 (en) * 2015-05-15 2017-06-20 Arsalan Emami Industrial heater
JP1568552S (en) * 2016-02-12 2017-02-06
JP1568553S (en) * 2016-02-12 2017-02-06
EP3469205B1 (en) * 2016-06-13 2023-02-15 Enginuity Power Systems, Inc. Energy recovery system
WO2018027208A1 (en) * 2016-08-05 2018-02-08 Sandvik Thermal Process Inc. Thermal process device with non-uniform insulation
JP1582475S (en) 2016-10-14 2017-07-31
JP6918146B2 (en) * 2017-05-19 2021-08-11 アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated A device that collects liquid and solid emissions and later reacts them into gaseous emissions.

Also Published As

Publication number Publication date
USD860420S1 (en) 2019-09-17
JP1611565S (en) 2018-08-20

Similar Documents

Publication Publication Date Title
IN2012DN01366A (en)
WO2019036145A3 (en) High pressure and high temperature anneal chamber
TWD189312S (en) Sealing material for semiconductor manufacturing equipment
TWD187001S (en) Top-mounted heater for substrate processing equipment
TWD177997S (en) Heat insulator for substrate processing equipment
TWD200031S (en) Electric furnace for substrate processing equipment
MX2018007400A (en) An aerosol-generating component for use in an aerosol-generating article.
TWD183009S (en) Part of the heater for substrate processing equipment
TWD196950S (en) Part of electric furnace for substrate processing equipment
TWD203444S (en) Gas introduction tube for substrate processing device
TWD197467S (en) Gas introduction tube for substrate processing equipment
TWD163542S (en) Wafer boat for substrate processing equipment
WO2012104081A8 (en) Protective suit for use in a cooling chamber
EP4582755A3 (en) Vacuum adiabatic body, refrigerating or warming apparatus, and vehicle
TWD183005S (en) Thermal insulation component outer cover of semiconductor manufacturing equipment
TWD183008S (en) Heater for substrate processing equipment
TWD177998S (en) Heat insulator for substrate processing equipment
TWD177999S (en) Heat insulator for substrate processing equipment
TWD242108S (en) Heating element for semiconductor manufacturing device
TWD170400S (en) Caulking components for wafer boats
TWD225634S (en) Part of the cover of heat-insulating components for semiconductor manufacturing equipment
TWD225036S (en) Heat shield for substrate processing equipment
TWD177996S (en) Heat insulator for substrate processing equipment
TWD187000S (en) Part of the heating machine for substrate processing equipment
TW201614100A (en) Metal organic chemical vapour deposition apparatus