TWI256995B - Detector and stage device - Google Patents

Detector and stage device

Info

Publication number
TWI256995B
TWI256995B TW094113496A TW94113496A TWI256995B TW I256995 B TWI256995 B TW I256995B TW 094113496 A TW094113496 A TW 094113496A TW 94113496 A TW94113496 A TW 94113496A TW I256995 B TWI256995 B TW I256995B
Authority
TW
Taiwan
Prior art keywords
light
detector
stage device
stage
reference lattice
Prior art date
Application number
TW094113496A
Other languages
English (en)
Other versions
TW200604493A (en
Inventor
Wei Gao
Satoshi Kiyono
Yoshiyuki Tomita
Toru Hirata
Yoji Watanabe
Original Assignee
Sumitomo Heavy Industries
Tohoku Technoarch Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2004131886A external-priority patent/JP2005315649A/ja
Priority claimed from JP2004191828A external-priority patent/JP2006010645A/ja
Application filed by Sumitomo Heavy Industries, Tohoku Technoarch Co Ltd filed Critical Sumitomo Heavy Industries
Publication of TW200604493A publication Critical patent/TW200604493A/zh
Application granted granted Critical
Publication of TWI256995B publication Critical patent/TWI256995B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
    • G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
    • G01D5/26—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light
    • G01D5/28—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with deflection of beams of light, e.g. for direct optical indication
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
    • G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
    • G01D5/26—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light
    • G01D5/32—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light
    • G01D5/34—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light the beams of light being detected by photocells
    • G01D5/36—Forming the light into pulses
    • G01D5/38—Forming the light into pulses by diffraction gratings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
    • G01D2205/00—Indexing scheme relating to details of means for transferring or converting the output of a sensing member
    • G01D2205/90—Two-dimensional encoders, i.e. having one or two codes extending in two directions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW094113496A 2004-04-27 2005-04-27 Detector and stage device TWI256995B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004131886A JP2005315649A (ja) 2004-04-27 2004-04-27 検出装置及びステージ装置
JP2004191828A JP2006010645A (ja) 2004-06-29 2004-06-29 検出装置及びステージ装置

Publications (2)

Publication Number Publication Date
TW200604493A TW200604493A (en) 2006-02-01
TWI256995B true TWI256995B (en) 2006-06-21

Family

ID=35241771

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094113496A TWI256995B (en) 2004-04-27 2005-04-27 Detector and stage device

Country Status (4)

Country Link
US (1) US7502127B2 (zh)
KR (1) KR100854265B1 (zh)
TW (1) TWI256995B (zh)
WO (1) WO2005106385A1 (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI395921B (zh) * 2007-12-03 2013-05-11 Kobelco Res Inst Inc Shape measuring device
US9891428B2 (en) 2015-12-07 2018-02-13 Metal Industries Research & Development Centre Optical measurement system, measurement method for errors of rotating platform, and two dimensional sine wave annulus grating

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JP2007178281A (ja) * 2005-12-28 2007-07-12 Sendai Nikon:Kk チルトセンサ及びエンコーダ
US7999918B2 (en) * 2006-09-29 2011-08-16 Nikon Corporation Movable body system, pattern formation apparatus, exposure apparatus and exposure method, and device manufacturing method
US8084896B2 (en) * 2008-12-31 2011-12-27 Electro Scientific Industries, Inc. Monolithic stage positioning system and method
JP5500716B2 (ja) * 2010-02-17 2014-05-21 富士フイルム株式会社 レリーフ製造装置およびレリーフ製造方法
DE202010003152U1 (de) * 2010-03-04 2011-09-07 Dmg Microset Gmbh Vorrichtung zum Vermessen und/oder Einstellen eines Werkzeugs
CN103033129B (zh) * 2011-10-07 2015-10-21 财团法人工业技术研究院 光学设备及光学定址方法
GB201205491D0 (en) * 2012-03-28 2012-05-09 Ucl Business Plc Measuring surface curvature
TWI482400B (zh) * 2013-01-14 2015-04-21 Prec Machinery Res & Dev Ct Location detection method for linear motors
CN103453854B (zh) * 2013-09-11 2016-02-24 南京东利来光电实业有限责任公司 平行度检测装置及检测方法
US9779872B2 (en) * 2013-12-23 2017-10-03 Kla-Tencor Corporation Apparatus and method for fine-tuning magnet arrays with localized energy delivery
NL2016688A (en) * 2015-07-09 2017-01-17 Asml Netherlands Bv Movable support and lithographic apparatus
CN106405753B (zh) * 2015-08-03 2020-05-08 住友电气工业株式会社 制作光学组件的方法及光学组件
WO2019158448A1 (en) * 2018-02-14 2019-08-22 Asml Netherlands B.V. Substrate positioning device and electron beam inspection tool
US10302826B1 (en) * 2018-05-30 2019-05-28 Applied Materials, Inc. Controlling etch angles by substrate rotation in angled etch tools
CN110552123B (zh) * 2018-05-30 2022-07-05 浙江众邦机电科技有限公司 布料检测系统、方法、计算机可读存储介质、及电子终端
US11480685B2 (en) * 2019-05-05 2022-10-25 Apple Inc. Compact optical packaging of LiDAR systems using diffractive structures behind angled interfaces
JP7182522B2 (ja) * 2019-06-27 2022-12-02 Dmg森精機株式会社 検出装置
US10921721B1 (en) * 2019-09-13 2021-02-16 Applied Materials, Inc. Measurement system and grating pattern array
KR102297415B1 (ko) * 2020-03-17 2021-09-02 주식회사 로보스타 보빈 자동로딩언로딩장비
US11487058B2 (en) 2020-08-13 2022-11-01 Applied Materials, Inc. Method for manufacturing optical device structures
TW202225642A (zh) * 2020-12-29 2022-07-01 財團法人工業技術研究院 反射式光編碼器

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US4621926A (en) * 1985-04-30 1986-11-11 Lasercon Corporation Interferometer system for controlling non-rectilinear movement of an object
JPH07119574B2 (ja) * 1988-09-12 1995-12-20 富士通株式会社 二次元位置検出方法
JP3015962B2 (ja) * 1990-07-25 2000-03-06 株式会社ソキア 光学式エンコーダの目盛板及びこの目盛板を用いた光学式エンコーダ
EP0482224B1 (de) * 1990-10-20 1994-01-12 Dr. Johannes Heidenhain GmbH Interferentielle Messeinrichtung für wenigstens eine Messrichtung
US5424833A (en) * 1992-09-21 1995-06-13 Dr. Johannes Heidenhain Gmbh Interferential linear and angular displacement apparatus having scanning and scale grating respectively greater than and less than the source wavelength
JP3082516B2 (ja) * 1993-05-31 2000-08-28 キヤノン株式会社 光学式変位センサおよび該光学式変位センサを用いた駆動システム
JPH06347291A (ja) * 1993-06-11 1994-12-20 Ono Sokki Co Ltd ロータリエンコーダ
US5784168A (en) 1995-07-03 1998-07-21 U.S. Philips Corporation Position detection system for an object with at least five degrees of freedom
JP2960013B2 (ja) * 1996-07-29 1999-10-06 慧 清野 移動物体の検出用目盛及びこれを用いた移動物体の検出装置
JPH1073424A (ja) 1996-08-29 1998-03-17 Nikon Corp 欠陥検査装置
JP3483452B2 (ja) * 1998-02-04 2004-01-06 キヤノン株式会社 ステージ装置および露光装置、ならびにデバイス製造方法
US20030173833A1 (en) * 2000-04-21 2003-09-18 Hazelton Andrew J. Wafer stage with magnetic bearings
JP4798911B2 (ja) * 2001-05-18 2011-10-19 株式会社東京精密 回折干渉式リニアスケール
JP4198338B2 (ja) 2001-07-09 2008-12-17 株式会社 東北テクノアーチ ステージ装置
WO2004059346A2 (en) * 2002-12-16 2004-07-15 Microe Systems Corp. Rotary position sensor with offset beam generating element and elliptical detector array
US7102729B2 (en) * 2004-02-03 2006-09-05 Asml Netherlands B.V. Lithographic apparatus, measurement system, and device manufacturing method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI395921B (zh) * 2007-12-03 2013-05-11 Kobelco Res Inst Inc Shape measuring device
US9891428B2 (en) 2015-12-07 2018-02-13 Metal Industries Research & Development Centre Optical measurement system, measurement method for errors of rotating platform, and two dimensional sine wave annulus grating

Also Published As

Publication number Publication date
US20070041024A1 (en) 2007-02-22
KR20070034988A (ko) 2007-03-29
TW200604493A (en) 2006-02-01
US7502127B2 (en) 2009-03-10
WO2005106385A1 (ja) 2005-11-10
KR100854265B1 (ko) 2008-08-26

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