TWI257875B - Process for purifying gaseous inorganic halides - Google Patents

Process for purifying gaseous inorganic halides Download PDF

Info

Publication number: TWI257875B
Authority: TW; Taiwan
Prior art keywords: metal; reactive; crude; temperature; reactive metal
Prior art date: 1999-06-11

Application number

TW89111420A

Other languages

English (en)

Chinese (zh)

Inventor

Dalbir S Rajoria

Original Assignee

Honeywell Intellectual Propert

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1999-06-11

Filing date

2000-06-12

Publication date

2006-07-11

2000-06-12 Application filed by Honeywell Intellectual Propert filed Critical Honeywell Intellectual Propert

2006-07-11 Application granted granted Critical

2006-07-11 Publication of TWI257875B publication Critical patent/TWI257875B/zh

Links

238000000034 method Methods 0.000 title claims abstract description 51
229910001502 inorganic halide Inorganic materials 0.000 title claims abstract description 12
229910052751 metal Inorganic materials 0.000 claims abstract description 87
239000002184 metal Substances 0.000 claims abstract description 87
URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 claims abstract description 33
239000002808 molecular sieve Substances 0.000 claims abstract description 32
239000012535 impurity Substances 0.000 claims abstract description 26
238000000746 purification Methods 0.000 claims abstract description 14
WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 claims description 61
IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 36
229910015900 BF3 Inorganic materials 0.000 claims description 36
239000007789 gas Substances 0.000 claims description 34
229910010272 inorganic material Inorganic materials 0.000 claims description 29
150000002484 inorganic compounds Chemical class 0.000 claims description 27
239000000463 material Substances 0.000 claims description 25
229910052744 lithium Inorganic materials 0.000 claims description 19
229910052757 nitrogen Inorganic materials 0.000 claims description 18
WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims description 17
230000002745 absorbent Effects 0.000 claims description 16
239000002250 absorbent Substances 0.000 claims description 16
239000007788 liquid Substances 0.000 claims description 13
239000000956 alloy Substances 0.000 claims description 9
229910045601 alloy Inorganic materials 0.000 claims description 9
OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 claims description 7
229910052791 calcium Inorganic materials 0.000 claims description 7
239000011575 calcium Substances 0.000 claims description 7
238000004821 distillation Methods 0.000 claims description 7
238000002844 melting Methods 0.000 claims description 7
230000008018 melting Effects 0.000 claims description 7
150000002739 metals Chemical class 0.000 claims description 6
ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 4
229910052782 aluminium Inorganic materials 0.000 claims description 4
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 4
229910052797 bismuth Inorganic materials 0.000 claims description 4
JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims description 4
229910052796 boron Inorganic materials 0.000 claims description 4
239000000203 mixture Substances 0.000 claims description 4
-1 BC13 Chemical compound 0.000 claims description 3
150000004820 halides Chemical class 0.000 claims description 3
238000010025 steaming Methods 0.000 claims description 3
239000000126 substance Substances 0.000 claims description 3
229910052783 alkali metal Inorganic materials 0.000 claims description 2
150000001340 alkali metals Chemical class 0.000 claims description 2
229910052784 alkaline earth metal Inorganic materials 0.000 claims description 2
150000001342 alkaline earth metals Chemical class 0.000 claims description 2
230000026030 halogenation Effects 0.000 claims description 2
238000005658 halogenation reaction Methods 0.000 claims description 2
229910052920 inorganic sulfate Inorganic materials 0.000 claims description 2
ZQXCQTAELHSNAT-UHFFFAOYSA-N 1-chloro-3-nitro-5-(trifluoromethyl)benzene Chemical compound [O-][N+](=O)C1=CC(Cl)=CC(C(F)(F)F)=C1 ZQXCQTAELHSNAT-UHFFFAOYSA-N 0.000 claims 1
229910021630 Antimony pentafluoride Inorganic materials 0.000 claims 1
229910017050 AsF3 Inorganic materials 0.000 claims 1
229910001152 Bi alloy Inorganic materials 0.000 claims 1
229910006160 GeF4 Inorganic materials 0.000 claims 1
229910021180 PF3 Inorganic materials 0.000 claims 1
229910021174 PF5 Inorganic materials 0.000 claims 1
VBVBHWZYQGJZLR-UHFFFAOYSA-I antimony pentafluoride Chemical compound F[Sb](F)(F)(F)F VBVBHWZYQGJZLR-UHFFFAOYSA-I 0.000 claims 1
JCMGUODNZMETBM-UHFFFAOYSA-N arsenic trifluoride Chemical compound F[As](F)F JCMGUODNZMETBM-UHFFFAOYSA-N 0.000 claims 1
238000009833 condensation Methods 0.000 claims 1
230000005494 condensation Effects 0.000 claims 1
238000010438 heat treatment Methods 0.000 claims 1
229910052758 niobium Inorganic materials 0.000 claims 1
239000010955 niobium Substances 0.000 claims 1
GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims 1
OBCUTHMOOONNBS-UHFFFAOYSA-N phosphorus pentafluoride Chemical compound FP(F)(F)(F)F OBCUTHMOOONNBS-UHFFFAOYSA-N 0.000 claims 1
WKFBZNUBXWCCHG-UHFFFAOYSA-N phosphorus trifluoride Chemical compound FP(F)F WKFBZNUBXWCCHG-UHFFFAOYSA-N 0.000 claims 1
229910052715 tantalum Inorganic materials 0.000 claims 1
GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims 1
PPMWWXLUCOODDK-UHFFFAOYSA-N tetrafluorogermane Chemical compound F[Ge](F)(F)F PPMWWXLUCOODDK-UHFFFAOYSA-N 0.000 claims 1
150000003568 thioethers Chemical class 0.000 claims 1
RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 description 10
CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 9
150000001875 compounds Chemical class 0.000 description 7
QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 6
229910052760 oxygen Inorganic materials 0.000 description 6
239000001301 oxygen Substances 0.000 description 6
239000004065 semiconductor Substances 0.000 description 6
238000006243 chemical reaction Methods 0.000 description 5
XSOKHXFFCGXDJZ-UHFFFAOYSA-N telluride(2-) Chemical compound [Te-2] XSOKHXFFCGXDJZ-UHFFFAOYSA-N 0.000 description 5
OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 4
QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 4
239000011532 electronic conductor Substances 0.000 description 4
238000004519 manufacturing process Methods 0.000 description 4
IDYFACFOJYNFAX-UHFFFAOYSA-J tetrafluoroantimony Chemical compound F[Sb](F)(F)F IDYFACFOJYNFAX-UHFFFAOYSA-J 0.000 description 4
239000011358 absorbing material Substances 0.000 description 3
238000004458 analytical method Methods 0.000 description 3
239000001569 carbon dioxide Substances 0.000 description 3
229910002092 carbon dioxide Inorganic materials 0.000 description 3
235000011089 carbon dioxide Nutrition 0.000 description 3
239000011888 foil Substances 0.000 description 3
238000004817 gas chromatography Methods 0.000 description 3
239000011521 glass Substances 0.000 description 3
239000008188 pellet Substances 0.000 description 3
239000000843 powder Substances 0.000 description 3
238000005086 pumping Methods 0.000 description 3
150000004772 tellurides Chemical class 0.000 description 3
UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 2
238000010521 absorption reaction Methods 0.000 description 2
239000011324 bead Substances 0.000 description 2
229910002091 carbon monoxide Inorganic materials 0.000 description 2
239000000919 ceramic Substances 0.000 description 2
238000001816 cooling Methods 0.000 description 2
230000002079 cooperative effect Effects 0.000 description 2
OKZIUSOJQLYFSE-UHFFFAOYSA-N difluoroboron Chemical compound F[B]F OKZIUSOJQLYFSE-UHFFFAOYSA-N 0.000 description 2
239000011147 inorganic material Substances 0.000 description 2
229910052746 lanthanum Inorganic materials 0.000 description 2
FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 2
230000009257 reactivity Effects 0.000 description 2
239000010935 stainless steel Substances 0.000 description 2
229910001220 stainless steel Inorganic materials 0.000 description 2
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
239000002841 Lewis acid Substances 0.000 description 1
235000019738 Limestone Nutrition 0.000 description 1
ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
229910004014 SiF4 Inorganic materials 0.000 description 1
229910021536 Zeolite Inorganic materials 0.000 description 1
YZBOOASCZHGWQZ-UHFFFAOYSA-J [F-].[F-].[F-].[F-].[Cs+].[Cs+].[Cs+].[Cs+] Chemical compound [F-].[F-].[F-].[F-].[Cs+].[Cs+].[Cs+].[Cs+] YZBOOASCZHGWQZ-UHFFFAOYSA-J 0.000 description 1
YKTSYUJCYHOUJP-UHFFFAOYSA-N [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] Chemical compound [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] YKTSYUJCYHOUJP-UHFFFAOYSA-N 0.000 description 1
229910002065 alloy metal Inorganic materials 0.000 description 1
239000011230 binding agent Substances 0.000 description 1
238000009835 boiling Methods 0.000 description 1
239000003054 catalyst Substances 0.000 description 1
238000004587 chromatography analysis Methods 0.000 description 1
239000000356 contaminant Substances 0.000 description 1
238000011109 contamination Methods 0.000 description 1
238000007796 conventional method Methods 0.000 description 1
238000005260 corrosion Methods 0.000 description 1
230000007797 corrosion Effects 0.000 description 1
230000001419 dependent effect Effects 0.000 description 1
238000003795 desorption Methods 0.000 description 1
238000001514 detection method Methods 0.000 description 1
230000006866 deterioration Effects 0.000 description 1
ZGHDMISTQPRNRG-UHFFFAOYSA-N dimolybdenum Chemical compound [Mo]#[Mo] ZGHDMISTQPRNRG-UHFFFAOYSA-N 0.000 description 1
HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
239000002019 doping agent Substances 0.000 description 1
239000003814 drug Substances 0.000 description 1
230000000694 effects Effects 0.000 description 1
239000010433 feldspar Substances 0.000 description 1
PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
239000010931 gold Substances 0.000 description 1
229910052737 gold Inorganic materials 0.000 description 1
239000008187 granular material Substances 0.000 description 1
125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
239000011261 inert gas Substances 0.000 description 1
238000005468 ion implantation Methods 0.000 description 1
229910052747 lanthanoid Inorganic materials 0.000 description 1
150000002602 lanthanoids Chemical class 0.000 description 1
150000007517 lewis acids Chemical class 0.000 description 1
239000006028 limestone Substances 0.000 description 1
239000002905 metal composite material Substances 0.000 description 1
229910001507 metal halide Inorganic materials 0.000 description 1
150000005309 metal halides Chemical class 0.000 description 1
239000007769 metal material Substances 0.000 description 1
230000004048 modification Effects 0.000 description 1
238000012986 modification Methods 0.000 description 1
229910052750 molybdenum Inorganic materials 0.000 description 1
239000011733 molybdenum Substances 0.000 description 1
150000002894 organic compounds Chemical class 0.000 description 1
238000005192 partition Methods 0.000 description 1
239000003495 polar organic solvent Substances 0.000 description 1
229920000642 polymer Polymers 0.000 description 1
239000002861 polymer material Substances 0.000 description 1
239000011148 porous material Substances 0.000 description 1
238000002360 preparation method Methods 0.000 description 1
239000002994 raw material Substances 0.000 description 1
239000000376 reactant Substances 0.000 description 1
229920013730 reactive polymer Polymers 0.000 description 1
150000003839 salts Chemical class 0.000 description 1
230000011218 segmentation Effects 0.000 description 1
230000009919 sequestration Effects 0.000 description 1
ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 description 1
239000002689 soil Substances 0.000 description 1
238000001179 sorption measurement Methods 0.000 description 1
238000003786 synthesis reaction Methods 0.000 description 1
CBIYWHCPXHKZME-UHFFFAOYSA-J tetrafluororuthenium Chemical compound [F-].[F-].[F-].[F-].[Ru+4] CBIYWHCPXHKZME-UHFFFAOYSA-J 0.000 description 1
MJCYPBSRKLJZTB-UHFFFAOYSA-N trifluoroborane;dihydrate Chemical compound O.O.FB(F)F MJCYPBSRKLJZTB-UHFFFAOYSA-N 0.000 description 1
239000010457 zeolite Substances 0.000 description 1

Classifications

- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B9/00—General methods of preparing halides
- C01B9/08—Fluorides
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C01B33/10778—Purification
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B35/00—Boron; Compounds thereof
- C01B35/06—Boron halogen compounds
- C01B35/061—Halides
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B9/00—General methods of preparing halides
- C01B9/02—Chlorides

Landscapes

Chemical & Material Sciences (AREA)
Organic Chemistry (AREA)
Inorganic Chemistry (AREA)
Health & Medical Sciences (AREA)
General Health & Medical Sciences (AREA)
Silicon Compounds (AREA)
Solid-Sorbent Or Filter-Aiding Compositions (AREA)
Inorganic Compounds Of Heavy Metals (AREA)

TW89111420A 1999-06-11 2000-06-12 Process for purifying gaseous inorganic halides TWI257875B (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
US13892499P	1999-06-11	1999-06-11

Publications (1)

Publication Number	Publication Date
TWI257875B true TWI257875B (en)	2006-07-11

Family

ID=22484283

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
TW89111420A TWI257875B (en)	1999-06-11	2000-06-12	Process for purifying gaseous inorganic halides

Country Status (4)

Country	Link
EP (1)	EP1409400A4 (de)
AU (1)	AU5732800A (de)
TW (1)	TWI257875B (de)
WO (1)	WO2000076915A1 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP3909385B2 (ja)	2001-07-12	2007-04-25	昭和電工株式会社	テトラフルオロシランの製造方法およびその用途
TW200512159A (en) *	2003-09-25	2005-04-01	Showa Denko Kk	Method for producing tetrafluorosilane
CN101993088A (zh) *	2010-10-15	2011-03-30	天津市泰源工业气体有限公司	精馏与吸附组合提纯方式制备高纯三氟化硼方法的工艺技术
CN103950949B (zh) *	2014-05-20	2015-09-09	方治文	高纯三溴化硼-11的制备方法
CN103950948B (zh) *	2014-05-20	2015-11-04	方治文	高纯三氟化硼-11的制备方法
CN108821254B (zh) *	2018-09-11	2021-11-26	安徽东至广信农化有限公司	一种三氯化磷合成工艺中去除无机及有机杂质的方法
CN114525485A (zh) *	2022-01-21	2022-05-24	亚芯半导体材料(江苏)有限公司	大尺寸高熵高纯度难熔金属合金溅射靶材及其制备工艺
WO2026034610A1 (ja) *	2024-08-09	2026-02-12	関東電化工業株式会社	高純度三フッ化リンの製造方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3037337A (en) *	1955-09-06	1962-06-05	Thiokol Chemical Corp	Purification of boron trichloride
US3043665A (en) *	1955-09-06	1962-07-10	Thiokol Chemical Corp	Purification of boron trichloride
US3207581A (en) *	1961-11-14	1965-09-21	American Potash & Chem Corp	Process for purifying boron trichloride
DE1667582B2 (de) *	1968-03-09	1977-09-22	Kali-Chemie Ag, 3000 Hannover	Verfahren zur entfernung von schwefeldioxid aus bortrifluorid
US3625661A (en) *	1969-08-11	1971-12-07	Atomic Energy Commission	Separation of titanium fluoride and niobium fluoride from gaseous uranium hexafluoride containing same
US4263467A (en) *	1979-11-29	1981-04-21	Gulf Research & Development Company	Recovery of boron trifluoride from a hydrocarbon liquid
US4755370A (en) *	1982-03-18	1988-07-05	General Electric Company	Purification of silicon halides
US4564509A (en) *	1983-06-30	1986-01-14	Northeast Semiconductor Inc.	Method and apparatus for improved gettering for reactant gases
JPH01261208A (ja) *	1988-04-11	1989-10-18	Mitsui Toatsu Chem Inc	三弗化窒素ガスの精製方法
US4943423A (en) *	1988-11-29	1990-07-24	Allied-Signal Inc.	Process for recovering boron trifluoride from an impure gaseous boron trifluoride residue
US4965055A (en) *	1990-03-27	1990-10-23	The United States Of America As Represented By The Secretary Of The Navy	Preparation of ultra-pure metal halides

2000
- 2000-06-12 EP EP00942748A patent/EP1409400A4/de not_active Withdrawn
- 2000-06-12 WO PCT/US2000/016051 patent/WO2000076915A1/en not_active Ceased
- 2000-06-12 TW TW89111420A patent/TWI257875B/zh not_active IP Right Cessation
- 2000-06-12 AU AU57328/00A patent/AU5732800A/en not_active Abandoned

Also Published As

Publication number	Publication date
WO2000076915A1 (en)	2000-12-21
EP1409400A4 (de)	2004-09-15
EP1409400A1 (de)	2004-04-21
AU5732800A (en)	2001-01-02

Legal Events

Date	Code	Title	Description
2011-04-11	MM4A	Annulment or lapse of patent due to non-payment of fees

Publication	Publication Date	Title
TW572849B (en)	2004-01-21	Processes and systems for purification of boron trichloride
TWI257875B (en)	2006-07-11	Process for purifying gaseous inorganic halides
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