TWI276607B - Cerium-based polish and cerium-based polish slurry - Google Patents

Cerium-based polish and cerium-based polish slurry Download PDF

Info

Publication number: TWI276607B
Authority: TW; Taiwan
Prior art keywords: honing; honing material; cerium; slurry; mass
Prior art date: 2001-11-16

Application number

TW91133539A

Other languages

English (en)

Chinese (zh)

Other versions

TW200300404A (en

Inventor

Naoki Bessho

Original Assignee

Showa Denko Kk

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2001-11-16

Filing date

2002-11-15

Publication date

2007-03-21

2002-11-15 Application filed by Showa Denko Kk filed Critical Showa Denko Kk

2003-06-01 Publication of TW200300404A publication Critical patent/TW200300404A/zh

2007-03-21 Application granted granted Critical

2007-03-21 Publication of TWI276607B publication Critical patent/TWI276607B/zh

Links

239000002002 slurry Substances 0.000 title claims abstract description 31
229910052684 Cerium Inorganic materials 0.000 title claims abstract description 16
GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 title claims abstract description 16
229910000420 cerium oxide Inorganic materials 0.000 claims abstract description 15
BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims abstract description 15
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 13
239000011164 primary particle Substances 0.000 claims abstract description 9
239000000463 material Substances 0.000 claims description 81
229910052746 lanthanum Inorganic materials 0.000 claims description 18
-1 alkyl phenol ether Chemical compound 0.000 claims description 16
238000004062 sedimentation Methods 0.000 claims description 16
239000004094 surface-active agent Substances 0.000 claims description 11
229920003171 Poly (ethylene oxide) Polymers 0.000 claims description 8
239000002736 nonionic surfactant Substances 0.000 claims description 8
BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 claims description 8
239000003945 anionic surfactant Substances 0.000 claims description 7
239000002270 dispersing agent Substances 0.000 claims description 7
239000003960 organic solvent Substances 0.000 claims description 7
229910052797 bismuth Inorganic materials 0.000 claims description 6
JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims description 6
229910019142 PO4 Inorganic materials 0.000 claims description 5
150000001298 alcohols Chemical class 0.000 claims description 5
239000010452 phosphate Substances 0.000 claims description 5
150000005215 alkyl ethers Chemical class 0.000 claims description 4
230000002079 cooperative effect Effects 0.000 claims description 4
235000014113 dietary fatty acids Nutrition 0.000 claims description 4
239000000194 fatty acid Substances 0.000 claims description 4
229930195729 fatty acid Natural products 0.000 claims description 4
QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 claims description 3
150000007942 carboxylates Chemical class 0.000 claims description 3
150000002576 ketones Chemical class 0.000 claims description 3
NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 claims description 2
FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 claims 3
239000004593 Epoxy Substances 0.000 claims 1
229920005862 polyol Polymers 0.000 claims 1
150000003077 polyols Chemical class 0.000 claims 1
238000005498 polishing Methods 0.000 abstract 1
239000002244 precipitate Substances 0.000 abstract 1
239000011521 glass Substances 0.000 description 43
239000000758 substrate Substances 0.000 description 22
210000003298 dental enamel Anatomy 0.000 description 18
QJWDYDSKKWMXSO-UHFFFAOYSA-N lanthanum Chemical compound [La].[La] QJWDYDSKKWMXSO-UHFFFAOYSA-N 0.000 description 18
239000002245 particle Substances 0.000 description 12
150000001875 compounds Chemical class 0.000 description 9
230000000052 comparative effect Effects 0.000 description 8
OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 7
229910052799 carbon Inorganic materials 0.000 description 7
230000000694 effects Effects 0.000 description 7
239000004973 liquid crystal related substance Substances 0.000 description 7
ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
239000000843 powder Substances 0.000 description 6
WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical class C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 5
239000007788 liquid Substances 0.000 description 5
SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 5
LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
239000003082 abrasive agent Substances 0.000 description 4
229910052747 lanthanoid Inorganic materials 0.000 description 4
150000002602 lanthanoids Chemical class 0.000 description 4
150000003839 salts Chemical class 0.000 description 4
CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 3
LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
239000002253 acid Substances 0.000 description 3
239000000654 additive Substances 0.000 description 3
230000000996 additive effect Effects 0.000 description 3
238000001354 calcination Methods 0.000 description 3
239000013078 crystal Substances 0.000 description 3
230000007547 defect Effects 0.000 description 3
239000006185 dispersion Substances 0.000 description 3
238000005259 measurement Methods 0.000 description 3
238000000034 method Methods 0.000 description 3
239000000203 mixture Substances 0.000 description 3
230000003287 optical effect Effects 0.000 description 3
150000003013 phosphoric acid derivatives Chemical class 0.000 description 3
238000007639 printing Methods 0.000 description 3
238000010298 pulverizing process Methods 0.000 description 3
239000002994 raw material Substances 0.000 description 3
239000000126 substance Substances 0.000 description 3
230000003746 surface roughness Effects 0.000 description 3
239000004215 Carbon black (E152) Substances 0.000 description 2
RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
YKTSYUJCYHOUJP-UHFFFAOYSA-N [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] Chemical compound [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] YKTSYUJCYHOUJP-UHFFFAOYSA-N 0.000 description 2
150000008051 alkyl sulfates Chemical class 0.000 description 2
SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 2
229940092714 benzenesulfonic acid Drugs 0.000 description 2
230000002925 chemical effect Effects 0.000 description 2
239000002612 dispersion medium Substances 0.000 description 2
POULHZVOKOAJMA-UHFFFAOYSA-N dodecanoic acid Chemical compound CCCCCCCCCCCC(O)=O POULHZVOKOAJMA-UHFFFAOYSA-N 0.000 description 2
IPCSVZSSVZVIGE-UHFFFAOYSA-N hexadecanoic acid Chemical compound CCCCCCCCCCCCCCCC(O)=O IPCSVZSSVZVIGE-UHFFFAOYSA-N 0.000 description 2
229930195733 hydrocarbon Natural products 0.000 description 2
PAZHGORSDKKUPI-UHFFFAOYSA-N lithium metasilicate Chemical compound [Li+].[Li+].[O-][Si]([O-])=O PAZHGORSDKKUPI-UHFFFAOYSA-N 0.000 description 2
229910052912 lithium silicate Inorganic materials 0.000 description 2
238000004519 manufacturing process Methods 0.000 description 2
229920000642 polymer Polymers 0.000 description 2
229910001404 rare earth metal oxide Inorganic materials 0.000 description 2
239000011163 secondary particle Substances 0.000 description 2
VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
239000000344 soap Substances 0.000 description 2
APSBXTVYXVQYAB-UHFFFAOYSA-M sodium docusate Chemical group [Na+].CCCCC(CC)COC(=O)CC(S([O-])(=O)=O)C(=O)OCC(CC)CCCC APSBXTVYXVQYAB-UHFFFAOYSA-M 0.000 description 2
YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
LDMOEFOXLIZJOW-UHFFFAOYSA-N 1-dodecanesulfonic acid Chemical compound CCCCCCCCCCCCS(O)(=O)=O LDMOEFOXLIZJOW-UHFFFAOYSA-N 0.000 description 1
TWJNQYPJQDRXPH-UHFFFAOYSA-N 2-cyanobenzohydrazide Chemical compound NNC(=O)C1=CC=CC=C1C#N TWJNQYPJQDRXPH-UHFFFAOYSA-N 0.000 description 1
WBIQQQGBSDOWNP-UHFFFAOYSA-N 2-dodecylbenzenesulfonic acid Chemical compound CCCCCCCCCCCCC1=CC=CC=C1S(O)(=O)=O WBIQQQGBSDOWNP-UHFFFAOYSA-N 0.000 description 1
QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
238000004438 BET method Methods 0.000 description 1
LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
229920002134 Carboxymethyl cellulose Polymers 0.000 description 1
208000032544 Cicatrix Diseases 0.000 description 1
YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
239000005639 Lauric acid Substances 0.000 description 1
235000021360 Myristic acid Nutrition 0.000 description 1
TUNFSRHWOTWDNC-UHFFFAOYSA-N Myristic acid Natural products CCCCCCCCCCCCCC(O)=O TUNFSRHWOTWDNC-UHFFFAOYSA-N 0.000 description 1
239000004988 Nematic liquid crystal Substances 0.000 description 1
235000021314 Palmitic acid Nutrition 0.000 description 1
239000004372 Polyvinyl alcohol Substances 0.000 description 1
235000021355 Stearic acid Nutrition 0.000 description 1
ULUAUXLGCMPNKK-UHFFFAOYSA-N Sulfobutanedioic acid Chemical compound OC(=O)CC(C(O)=O)S(O)(=O)=O ULUAUXLGCMPNKK-UHFFFAOYSA-N 0.000 description 1
HVWGGPRWKSHASF-UHFFFAOYSA-N Sulfuric acid, monooctadecyl ester Chemical compound CCCCCCCCCCCCCCCCCCOS(O)(=O)=O HVWGGPRWKSHASF-UHFFFAOYSA-N 0.000 description 1
238000002441 X-ray diffraction Methods 0.000 description 1
QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
150000004996 alkyl benzenes Chemical class 0.000 description 1
125000000217 alkyl group Chemical group 0.000 description 1
PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
239000002280 amphoteric surfactant Substances 0.000 description 1
159000000009 barium salts Chemical class 0.000 description 1
238000004364 calculation method Methods 0.000 description 1
239000001768 carboxy methyl cellulose Substances 0.000 description 1
235000010948 carboxy methyl cellulose Nutrition 0.000 description 1
239000008112 carboxymethyl-cellulose Substances 0.000 description 1
239000003093 cationic surfactant Substances 0.000 description 1
229920002678 cellulose Polymers 0.000 description 1
238000006243 chemical reaction Methods 0.000 description 1
239000003795 chemical substances by application Substances 0.000 description 1
238000001816 cooling Methods 0.000 description 1
230000001186 cumulative effect Effects 0.000 description 1
125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
QKIUAMUSENSFQQ-UHFFFAOYSA-N dimethylazanide Chemical compound C[N-]C QKIUAMUSENSFQQ-UHFFFAOYSA-N 0.000 description 1
MOTZDAYCYVMXPC-UHFFFAOYSA-N dodecyl hydrogen sulfate Chemical compound CCCCCCCCCCCCOS(O)(=O)=O MOTZDAYCYVMXPC-UHFFFAOYSA-N 0.000 description 1
229940043264 dodecyl sulfate Drugs 0.000 description 1
229940060296 dodecylbenzenesulfonic acid Drugs 0.000 description 1
238000005516 engineering process Methods 0.000 description 1
LRMHFDNWKCSEQU-UHFFFAOYSA-N ethoxyethane;phenol Chemical compound CCOCC.OC1=CC=CC=C1 LRMHFDNWKCSEQU-UHFFFAOYSA-N 0.000 description 1
125000005313 fatty acid group Chemical group 0.000 description 1
150000004665 fatty acids Chemical class 0.000 description 1
239000010408 film Substances 0.000 description 1
239000011737 fluorine Substances 0.000 description 1
229910052731 fluorine Inorganic materials 0.000 description 1
238000005187 foaming Methods 0.000 description 1
229930195712 glutamate Natural products 0.000 description 1
235000011187 glycerol Nutrition 0.000 description 1
239000008187 granular material Substances 0.000 description 1
238000000227 grinding Methods 0.000 description 1
229940005740 hexametaphosphate Drugs 0.000 description 1
150000002500 ions Chemical class 0.000 description 1
229910003002 lithium salt Inorganic materials 0.000 description 1
159000000002 lithium salts Chemical class 0.000 description 1
230000005923 long-lasting effect Effects 0.000 description 1
230000007774 longterm Effects 0.000 description 1
239000002609 medium Substances 0.000 description 1
229920000609 methyl cellulose Polymers 0.000 description 1
239000001923 methylcellulose Substances 0.000 description 1
235000010981 methylcellulose Nutrition 0.000 description 1
229940023607 myristic acid Drugs 0.000 description 1
WQEPLUUGTLDZJY-UHFFFAOYSA-N n-Pentadecanoic acid Natural products CCCCCCCCCCCCCCC(O)=O WQEPLUUGTLDZJY-UHFFFAOYSA-N 0.000 description 1
125000001624 naphthyl group Chemical group 0.000 description 1
229910000484 niobium oxide Inorganic materials 0.000 description 1
URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 description 1
QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
239000003921 oil Substances 0.000 description 1
230000001590 oxidative effect Effects 0.000 description 1
229920002635 polyurethane Polymers 0.000 description 1
239000004814 polyurethane Substances 0.000 description 1
229920002451 polyvinyl alcohol Polymers 0.000 description 1
XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 1
108090000765 processed proteins & peptides Proteins 0.000 description 1
BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
239000010453 quartz Substances 0.000 description 1
231100000241 scar Toxicity 0.000 description 1
230000037387 scars Effects 0.000 description 1
238000006748 scratching Methods 0.000 description 1
230000002393 scratching effect Effects 0.000 description 1
229910052814 silicon oxide Inorganic materials 0.000 description 1
URLJMZWTXZTZRR-UHFFFAOYSA-N sodium myristyl sulfate Chemical compound CCCCCCCCCCCCCCOS(O)(=O)=O URLJMZWTXZTZRR-UHFFFAOYSA-N 0.000 description 1
159000000000 sodium salts Chemical class 0.000 description 1
238000001228 spectrum Methods 0.000 description 1
239000008117 stearic acid Substances 0.000 description 1
125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
238000003756 stirring Methods 0.000 description 1
RWSOTUBLDIXVET-UHFFFAOYSA-O sulfonium Chemical compound [SH3+] RWSOTUBLDIXVET-UHFFFAOYSA-O 0.000 description 1
150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
CSMFSDCPJHNZRY-UHFFFAOYSA-N sulfuric acid monodecyl ester Natural products CCCCCCCCCCOS(O)(=O)=O CSMFSDCPJHNZRY-UHFFFAOYSA-N 0.000 description 1
229910052715 tantalum Inorganic materials 0.000 description 1
GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
TUNFSRHWOTWDNC-HKGQFRNVSA-N tetradecanoic acid Chemical compound CCCCCCCCCCCCC[14C](O)=O TUNFSRHWOTWDNC-HKGQFRNVSA-N 0.000 description 1
239000010409 thin film Substances 0.000 description 1
239000002966 varnish Substances 0.000 description 1
229920003169 water-soluble polymer Polymers 0.000 description 1
229910052726 zirconium Inorganic materials 0.000 description 1
239000004711 α-olefin Substances 0.000 description 1

Landscapes

Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Surface Treatment Of Glass (AREA)
Glass Compositions (AREA)

TW91133539A 2001-11-16 2002-11-15 Cerium-based polish and cerium-based polish slurry TWI276607B (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP2001350968		2001-11-16

Publications (2)

Publication Number	Publication Date
TW200300404A TW200300404A (en)	2003-06-01
TWI276607B true TWI276607B (en)	2007-03-21

Family

ID=34308251

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
TW91133539A TWI276607B (en)	2001-11-16	2002-11-15	Cerium-based polish and cerium-based polish slurry

Country Status (5)

Country	Link
CN (1)	CN1289626C (de)
AT (1)	ATE495229T1 (de)
DE (1)	DE60238935D1 (de)
MY (1)	MY136167A (de)
TW (1)	TWI276607B (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
CN101648360B (zh) *	2008-08-15	2011-05-18	广东科达机电股份有限公司	一种陶瓷砖抛光方法
JPWO2013065491A1 (ja) *	2011-11-01	2015-04-02	旭硝子株式会社	ガラス基板の製造方法
CN106479374A (zh) *	2016-10-28	2017-03-08	扬州翠佛堂珠宝有限公司	一种碧玉抛光液
CN110639693A (zh) *	2019-10-22	2020-01-03	中国恩菲工程技术有限公司	氟碳铈矿纯矿物提取的系统和方法

2002
- 2002-11-15 DE DE60238935T patent/DE60238935D1/de not_active Expired - Lifetime
- 2002-11-15 AT AT02785937T patent/ATE495229T1/de not_active IP Right Cessation
- 2002-11-15 MY MYPI20024279 patent/MY136167A/en unknown
- 2002-11-15 TW TW91133539A patent/TWI276607B/zh not_active IP Right Cessation
- 2002-11-15 CN CN 02811936 patent/CN1289626C/zh not_active Expired - Lifetime

Also Published As

Publication number	Publication date
MY136167A (en)	2008-08-29
DE60238935D1 (de)	2011-02-24
CN1520449A (zh)	2004-08-11
ATE495229T1 (de)	2011-01-15
TW200300404A (en)	2003-06-01
CN1289626C (zh)	2006-12-13

Legal Events

Date	Code	Title	Description
2022-12-21	MK4A	Expiration of patent term of an invention patent

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