TWI292814B - - Google Patents

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Publication number
TWI292814B
TWI292814B TW093107503A TW93107503A TWI292814B TW I292814 B TWI292814 B TW I292814B TW 093107503 A TW093107503 A TW 093107503A TW 93107503 A TW93107503 A TW 93107503A TW I292814 B TWI292814 B TW I292814B
Authority
TW
Taiwan
Prior art keywords
objective lens
measured
light
displacement
unit
Prior art date
Application number
TW093107503A
Other languages
English (en)
Chinese (zh)
Other versions
TW200506316A (en
Inventor
Yuji Akishiba
Original Assignee
Keyence Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Keyence Co Ltd filed Critical Keyence Co Ltd
Publication of TW200506316A publication Critical patent/TW200506316A/zh
Application granted granted Critical
Publication of TWI292814B publication Critical patent/TWI292814B/zh

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/22Optical, image processing or photographic arrangements associated with the tube
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/02Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/026Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness by measuring distance between sensor and object
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0875Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more refracting elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Measurement Of Optical Distance (AREA)
TW093107503A 2003-03-20 2004-03-19 Displacement gauge and displacement measuring method TW200506316A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003079122A JP4209709B2 (ja) 2003-03-20 2003-03-20 変位計

Publications (2)

Publication Number Publication Date
TW200506316A TW200506316A (en) 2005-02-16
TWI292814B true TWI292814B (2) 2008-01-21

Family

ID=33293332

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093107503A TW200506316A (en) 2003-03-20 2004-03-19 Displacement gauge and displacement measuring method

Country Status (5)

Country Link
US (1) US7242485B2 (2)
JP (1) JP4209709B2 (2)
KR (1) KR100890986B1 (2)
CN (1) CN100401013C (2)
TW (1) TW200506316A (2)

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JP5314239B2 (ja) * 2006-10-05 2013-10-16 株式会社キーエンス 光学式変位計、光学式変位測定方法、光学式変位測定プログラム及びコンピュータで読み取り可能な記録媒体並びに記録した機器
RU2009119425A (ru) * 2006-10-24 2010-11-27 Конинклейке Филипс Электроникс Н.В. (Nl) Система для формирования изображения объекта
US7990545B2 (en) * 2006-12-27 2011-08-02 Cambridge Research & Instrumentation, Inc. Surface measurement of in-vivo subjects using spot projector
JP5307459B2 (ja) * 2008-06-30 2013-10-02 株式会社 デクシス 透明容器内粉末中の異物検査方法及び異物検査装置
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TWI452296B (zh) * 2011-07-28 2014-09-11 Chroma Ate Inc The Operation System and Operation Method of LED Grain Scanning and Spotting
CN102324395B (zh) * 2011-08-09 2013-06-19 致茂电子(苏州)有限公司 Led晶粒扫描与点测的运作系统及运作方法
EP2865003A1 (en) * 2012-06-26 2015-04-29 Kla-Tencor Corporation Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrology
JP5674050B2 (ja) * 2012-08-28 2015-02-18 横河電機株式会社 光学式変位計
CN103592454B (zh) * 2013-11-20 2016-07-06 沈阳工业大学 光栅速度测量方法及装置
JP6335495B2 (ja) * 2013-12-09 2018-05-30 パナソニック デバイスSunx株式会社 変位センサ
JP2015125177A (ja) 2013-12-25 2015-07-06 ソニー株式会社 顕微鏡システムおよびその画像データ転送方法
US9689892B2 (en) * 2014-03-20 2017-06-27 Shimadzu Corporation Scanning probe microscope
CN103940334B (zh) * 2014-04-08 2016-09-21 天津大学 动态二维光电显微镜
KR101692152B1 (ko) * 2015-05-22 2017-01-04 안동대학교 산학협력단 비점수차를 이용한 변위 센서 및 그 변위 측정방법
TWI563240B (en) * 2015-08-06 2016-12-21 Optical inspection apparatus
JP6588278B2 (ja) * 2015-09-01 2019-10-09 株式会社日立ハイテクサイエンス 走査プローブ顕微鏡および走査プローブ顕微鏡の光軸調整方法
WO2017110837A1 (ja) * 2015-12-25 2017-06-29 株式会社キーエンス 共焦点変位計
US10341550B2 (en) 2016-11-28 2019-07-02 Anritsu Corporation End face inspection apparatus and focused image data acquisition method
JP6600292B2 (ja) * 2016-11-28 2019-10-30 アンリツ株式会社 端面検査装置とその合焦画像データ取得方法
JP6829992B2 (ja) 2016-12-28 2021-02-17 株式会社キーエンス 光走査高さ測定装置
JP6829993B2 (ja) 2016-12-28 2021-02-17 株式会社キーエンス 光走査高さ測定装置
JP7143057B2 (ja) 2016-12-28 2022-09-28 株式会社キーエンス 三次元測定装置
JP6859098B2 (ja) * 2016-12-28 2021-04-14 株式会社キーエンス 光走査高さ測定装置
CN108663353B (zh) 2017-03-31 2020-10-30 苏州星帆华镭光电科技有限公司 振动光路组件及具有该组件的激光诱导击穿光谱仪
JP6380622B2 (ja) * 2017-07-05 2018-08-29 ソニー株式会社 制御装置および制御方法
CN109211130B (zh) * 2018-09-18 2020-03-31 昆明北方红外技术股份有限公司 透镜中心厚度及透镜间隔的测量装置及方法
JP7219059B2 (ja) * 2018-11-09 2023-02-07 株式会社キーエンス 変位測定装置
JP7219057B2 (ja) * 2018-11-09 2023-02-07 株式会社キーエンス 変位測定装置
JP7219058B2 (ja) * 2018-11-09 2023-02-07 株式会社キーエンス 変位測定装置
CN109974832B (zh) * 2019-04-03 2021-04-02 浙江华章科技有限公司 一种高速摇振系统振幅的算法
JP7799983B2 (ja) * 2021-02-17 2026-01-16 株式会社島津製作所 フーリエ変換赤外分光光度計

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Also Published As

Publication number Publication date
CN100401013C (zh) 2008-07-09
KR100890986B1 (ko) 2009-03-27
CN1550754A (zh) 2004-12-01
JP4209709B2 (ja) 2009-01-14
TW200506316A (en) 2005-02-16
US20050030553A1 (en) 2005-02-10
US7242485B2 (en) 2007-07-10
KR20040083012A (ko) 2004-09-30
JP2004286598A (ja) 2004-10-14

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MM4A Annulment or lapse of patent due to non-payment of fees