TWI296957B - - Google Patents

Download PDF

Info

Publication number: TWI296957B
Authority: TW; Taiwan
Prior art keywords: nozzle; substrate; liquid; mask; pattern
Prior art date: 2005-10-25

Application number

TW94137382A

Other languages

English (en)

Chinese (zh)

Other versions

TW200716309A (de

Inventor

Wataru Okase

Eiichiro Takanabe

Shinichi Kawaguchi

Original Assignee

Tokyo Electron Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2005-10-25

Filing date

2005-10-25

Publication date

2008-05-21

2005-10-25 Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd

2005-10-25 Priority to TW94137382A priority Critical patent/TWI296957B/zh

2007-05-01 Publication of TW200716309A publication Critical patent/TW200716309A/zh

2008-05-21 Application granted granted Critical

2008-05-21 Publication of TWI296957B publication Critical patent/TWI296957B/zh

Links

239000007788 liquid Substances 0.000 claims description 98
239000000758 substrate Substances 0.000 claims description 78
238000000034 method Methods 0.000 claims description 24
239000000843 powder Substances 0.000 claims description 22
PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 19
230000007246 mechanism Effects 0.000 claims description 18
RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 16
229910052802 copper Inorganic materials 0.000 claims description 13
239000010949 copper Substances 0.000 claims description 13
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 13
239000003082 abrasive agent Substances 0.000 claims description 12
238000003672 processing method Methods 0.000 claims description 10
239000002245 particle Substances 0.000 claims description 8
GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 6
239000010419 fine particle Substances 0.000 claims description 6
238000003754 machining Methods 0.000 claims description 6
238000002156 mixing Methods 0.000 claims description 6
229910017604 nitric acid Inorganic materials 0.000 claims description 6
238000000059 patterning Methods 0.000 claims description 5
239000004575 stone Substances 0.000 claims description 3
238000005507 spraying Methods 0.000 claims description 2
229910000831 Steel Inorganic materials 0.000 claims 1
239000010959 steel Substances 0.000 claims 1
229920005989 resin Polymers 0.000 description 12
239000011347 resin Substances 0.000 description 12
239000002699 waste material Substances 0.000 description 11
238000005530 etching Methods 0.000 description 9
239000010408 film Substances 0.000 description 9
238000004140 cleaning Methods 0.000 description 8
238000005498 polishing Methods 0.000 description 6
238000011084 recovery Methods 0.000 description 6
239000000463 material Substances 0.000 description 5
238000003860 storage Methods 0.000 description 5
238000010586 diagram Methods 0.000 description 4
238000001312 dry etching Methods 0.000 description 4
230000000694 effects Effects 0.000 description 4
239000007789 gas Substances 0.000 description 4
239000010409 thin film Substances 0.000 description 4
239000006061 abrasive grain Substances 0.000 description 3
239000011889 copper foil Substances 0.000 description 3
238000002347 injection Methods 0.000 description 3
239000007924 injection Substances 0.000 description 3
230000001681 protective effect Effects 0.000 description 3
IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
230000015572 biosynthetic process Effects 0.000 description 2
238000000227 grinding Methods 0.000 description 2
238000004519 manufacturing process Methods 0.000 description 2
238000001556 precipitation Methods 0.000 description 2
230000002829 reductive effect Effects 0.000 description 2
230000000717 retained effect Effects 0.000 description 2
238000005488 sandblasting Methods 0.000 description 2
238000007711 solidification Methods 0.000 description 2
230000008023 solidification Effects 0.000 description 2
238000003756 stirring Methods 0.000 description 2
229920002803 thermoplastic polyurethane Polymers 0.000 description 2
238000001039 wet etching Methods 0.000 description 2
241000287828 Gallus gallus Species 0.000 description 1
KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
238000010521 absorption reaction Methods 0.000 description 1
239000002253 acid Substances 0.000 description 1
QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
229910052797 bismuth Inorganic materials 0.000 description 1
JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
238000005422 blasting Methods 0.000 description 1
239000003795 chemical substances by application Substances 0.000 description 1
230000005611 electricity Effects 0.000 description 1
239000003822 epoxy resin Substances 0.000 description 1
239000001307 helium Substances 0.000 description 1
229910052734 helium Inorganic materials 0.000 description 1
SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
238000007689 inspection Methods 0.000 description 1
230000014759 maintenance of location Effects 0.000 description 1
238000005459 micromachining Methods 0.000 description 1
229910052757 nitrogen Inorganic materials 0.000 description 1
239000001301 oxygen Substances 0.000 description 1
229910052760 oxygen Inorganic materials 0.000 description 1
230000036961 partial effect Effects 0.000 description 1
229920002120 photoresistant polymer Polymers 0.000 description 1
238000007517 polishing process Methods 0.000 description 1
229920000647 polyepoxide Polymers 0.000 description 1
229920002635 polyurethane Polymers 0.000 description 1
239000004814 polyurethane Substances 0.000 description 1
QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
239000002994 raw material Substances 0.000 description 1
230000009257 reactivity Effects 0.000 description 1
238000007788 roughening Methods 0.000 description 1
229910052707 ruthenium Inorganic materials 0.000 description 1
239000004576 sand Substances 0.000 description 1
239000004065 semiconductor Substances 0.000 description 1
239000002002 slurry Substances 0.000 description 1
239000002689 soil Substances 0.000 description 1
239000007921 spray Substances 0.000 description 1
230000003068 static effect Effects 0.000 description 1
230000007723 transport mechanism Effects 0.000 description 1
238000005406 washing Methods 0.000 description 1

Landscapes

ing And Chemical Polishing (AREA)

TW94137382A 2005-10-25 2005-10-25 TWI296957B (de)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
TW94137382A TWI296957B (de)	2005-10-25	2005-10-25

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
TW94137382A TWI296957B (de)	2005-10-25	2005-10-25

Publications (2)

Publication Number	Publication Date
TW200716309A TW200716309A (de)	2007-05-01
TWI296957B true TWI296957B (de)	2008-05-21

Family

ID=45068931

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
TW94137382A TWI296957B (de)	2005-10-25	2005-10-25

Country Status (1)

Country	Link
TW (1)	TWI296957B (de)

2005
- 2005-10-25 TW TW94137382A patent/TWI296957B/zh not_active IP Right Cessation

Also Published As

Publication number	Publication date
TW200716309A (de)	2007-05-01

Similar Documents

Publication	Publication Date	Title
KR101940571B1 (ko)	2019-04-10	블라스트 가공에 의한 연마 방법 및 동 연마 방법을 이용한 블라스트 가공 장치의 노즐 구조
KR100259702B1 (ko)	2000-11-01	표면연마가공방법 및 그 장치
US8845393B2 (en)	2014-09-30	Cutting method by sandblasting
TW201519995A (zh)	2015-06-01	具有磨蝕粒於其中的印刷化學機械硏磨墊
TW202140246A (zh)	2021-11-01	製造研磨墊之研磨層的設備及用於形成化學機械研磨墊之研磨層之方法
TW201945129A (zh)	2019-12-01	拋光物和用於製造化學機械拋光物的整合系統
JP2015046550A (ja)	2015-03-12	研磨パッドおよびウエーハの加工方法
KR20100051626A (ko)	2010-05-17	슬러리의 수동적 제거를 제공하는 연마 어셈블리들을 구비한 ｃｍｐ 장치들
CN107662083A (zh)	2018-02-06	靶材溅射面的加工方法
US20040110451A1 (en)	2004-06-10	Apparatuses for conditioning surfaces of polishing pads
JP2001332517A (ja)	2001-11-30	基板の化学機械研磨方法
TWI595974B (zh)	2017-08-21	A jet processing apparatus for processing a peripheral portion of a substrate, and a jet processing method using the apparatus
TWI569946B (zh)	2017-02-11	圓柱狀奈米壓印用模具的製造方法以及奈米壓印用再生模具的製造方法
CN113953988B (zh)	2023-01-06	一种磨粒间距可控的有序排布砂轮及其制备方法
JP2014046392A (ja)	2014-03-17	スクライブ加工方法及びスクライブ加工用のブラスト加工装置
JP5172457B2 (ja)	2013-03-27	研削装置及び研削方法
JP2000343407A (ja)	2000-12-12	ドレッシング装置
JP4369307B2 (ja)	2009-11-18	パターン加工方法及びパターン加工装置
WO2007046143A1 (ja)	2007-04-26	パターン加工方法及びパターン加工装置
JP2005349513A5 (de)	2007-07-05
KR20150104936A (ko)	2015-09-16	슬러리 분사노즐 및 이를 이용한 기판 처리장치
CN109789531B (zh)	2021-09-10	金属制立体结构物的表面处理方法
Li et al.	2005	Material removal model for abrasive jet precision finishing restricted by abrasive wheel.
TW534855B (en)	2003-06-01	Polishing material for dry blast processing
JP4936443B2 (ja)	2012-05-23	液体ホーニング加工方法

Legal Events

Date	Code	Title	Description
2015-02-21	MM4A	Annulment or lapse of patent due to non-payment of fees