TWI317852B - Positive-tone photosensitivity resin composition - Google Patents
Positive-tone photosensitivity resin compositionInfo
- Publication number
- TWI317852B TWI317852B TW94103993A TW94103993A TWI317852B TW I317852 B TWI317852 B TW I317852B TW 94103993 A TW94103993 A TW 94103993A TW 94103993 A TW94103993 A TW 94103993A TW I317852 B TWI317852 B TW I317852B
- Authority
- TW
- Taiwan
- Prior art keywords
- tone
- positive
- resin composition
- photosensitivity resin
- photosensitivity
- Prior art date
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW94103993A TWI317852B (en) | 2005-02-05 | 2005-02-05 | Positive-tone photosensitivity resin composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW94103993A TWI317852B (en) | 2005-02-05 | 2005-02-05 | Positive-tone photosensitivity resin composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200628982A TW200628982A (en) | 2006-08-16 |
| TWI317852B true TWI317852B (en) | 2009-12-01 |
Family
ID=45073418
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW94103993A TWI317852B (en) | 2005-02-05 | 2005-02-05 | Positive-tone photosensitivity resin composition |
Country Status (1)
| Country | Link |
|---|---|
| TW (1) | TWI317852B (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI782241B (en) * | 2019-11-12 | 2022-11-01 | 臺灣永光化學工業股份有限公司 | Polyimide positive photoresist composition |
-
2005
- 2005-02-05 TW TW94103993A patent/TWI317852B/en not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| TW200628982A (en) | 2006-08-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP1923406A4 (en) | Resin composition | |
| EP2088467A4 (en) | Radiation-sensitive resin composition | |
| EP2056163A4 (en) | Positive photosensitive resin composition | |
| EP1861749A4 (en) | Novel photosensitive resin compositions | |
| EP2036949A4 (en) | Polyacetal resin composition | |
| DE602006009810D1 (en) | Resin composition | |
| EP1746136A4 (en) | Biodegradable resin composition | |
| IL229521A0 (en) | Novel composition | |
| IL185901A0 (en) | Novel composition | |
| EP2067821A4 (en) | Polyacetal resin composition | |
| GB0418581D0 (en) | Polymer composition | |
| EP2123709A4 (en) | Polyacetal resin composition | |
| EP1746461A4 (en) | Negative radiation-sensitive resin composition | |
| SG122900A1 (en) | Photosensitive resin composition | |
| EP2110708A4 (en) | Positive-type photosensitive resin composition | |
| SG124382A1 (en) | Photosensitive resin composition | |
| EP1923742A4 (en) | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION | |
| DE602005026303D1 (en) | Resin composition | |
| EP1886187A4 (en) | Novel photosensitive resin compositions | |
| PL1637557T3 (en) | Polyacetal resin composition | |
| TWI366586B (en) | Polyacetal resin composition | |
| EP1710279A4 (en) | Curing composition | |
| EP1953595A4 (en) | Radiation-sensitive resin composition | |
| EP1925630A4 (en) | Thermosetting resin composition | |
| SG124383A1 (en) | Photosensitive resin composition |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |