TWI323041B - - Google Patents
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- Publication number
- TWI323041B TWI323041B TW093117111A TW93117111A TWI323041B TW I323041 B TWI323041 B TW I323041B TW 093117111 A TW093117111 A TW 093117111A TW 93117111 A TW93117111 A TW 93117111A TW I323041 B TWI323041 B TW I323041B
- Authority
- TW
- Taiwan
- Prior art keywords
- bonding
- metal layer
- layer
- semiconductor
- convex portion
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P90/00—Preparation of wafers not covered by a single main group of this subclass, e.g. wafer reinforcement
- H10P90/19—Preparing inhomogeneous wafers
- H10P90/1904—Preparing vertically inhomogeneous wafers
- H10P90/1906—Preparing SOI wafers
- H10P90/1914—Preparing SOI wafers using bonding
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
- H10H20/011—Manufacture or treatment of bodies, e.g. forming semiconductor layers
- H10H20/018—Bonding of wafers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P90/00—Preparation of wafers not covered by a single main group of this subclass, e.g. wafer reinforcement
- H10P90/19—Preparing inhomogeneous wafers
- H10P90/1904—Preparing vertically inhomogeneous wafers
- H10P90/1906—Preparing SOI wafers
- H10P90/1914—Preparing SOI wafers using bonding
- H10P90/1916—Preparing SOI wafers using bonding with separation or delamination along an ion implanted layer, e.g. Smart-cut
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W10/00—Isolation regions in semiconductor bodies between components of integrated devices
- H10W10/10—Isolation regions comprising dielectric materials
- H10W10/181—Semiconductor-on-insulator [SOI] isolation regions, e.g. buried oxide regions of SOI wafers
Landscapes
- Led Devices (AREA)
- Die Bonding (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003201005A JP4114566B2 (ja) | 2003-07-24 | 2003-07-24 | 半導体貼り合わせ結合体及びその製造方法、並びに発光素子及びその製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200505060A TW200505060A (en) | 2005-02-01 |
| TWI323041B true TWI323041B (ja) | 2010-04-01 |
Family
ID=34100470
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW093117111A TW200505060A (en) | 2003-07-24 | 2004-06-15 | Semiconductor-pasted bonding body and its manufacturing method, light-emitting device and its manufacturing method |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP4114566B2 (ja) |
| TW (1) | TW200505060A (ja) |
| WO (1) | WO2005010957A1 (ja) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102709204A (zh) * | 2012-05-30 | 2012-10-03 | 杭州士兰明芯科技有限公司 | 一种led芯片的键合方法 |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5041653B2 (ja) * | 2004-04-21 | 2012-10-03 | シャープ株式会社 | 窒化物半導体発光素子およびその製造方法 |
| JP4933130B2 (ja) * | 2006-02-16 | 2012-05-16 | 昭和電工株式会社 | GaN系半導体発光素子およびその製造方法 |
| JP5123573B2 (ja) * | 2007-06-13 | 2013-01-23 | ローム株式会社 | 半導体発光素子およびその製造方法 |
| JP2010192701A (ja) * | 2009-02-18 | 2010-09-02 | Showa Denko Kk | 発光ダイオード、発光ダイオードランプ及び発光ダイオードの製造方法 |
| JP6058897B2 (ja) * | 2012-02-21 | 2017-01-11 | スタンレー電気株式会社 | 半導体素子の製造方法 |
| US9887155B2 (en) | 2012-09-28 | 2018-02-06 | Taiwan Semiconductor Manufacturing Company, Ltd. | Multiple metal layer semiconductor device and low temperature stacking method of fabricating the same |
| JP5396526B2 (ja) * | 2012-10-23 | 2014-01-22 | ローム株式会社 | 半導体発光素子 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06314644A (ja) * | 1993-04-30 | 1994-11-08 | Canon Inc | シリコン基板、シリコン基板のアライメント方法及びそれを適用した記録再生装置 |
| JPH11186120A (ja) * | 1997-12-24 | 1999-07-09 | Canon Inc | 同種あるいは異種材料基板間の密着接合法 |
| JP2002185080A (ja) * | 2000-12-15 | 2002-06-28 | Fujitsu Ltd | 半導体装置及びその製造方法 |
-
2003
- 2003-07-24 JP JP2003201005A patent/JP4114566B2/ja not_active Expired - Fee Related
-
2004
- 2004-06-15 TW TW093117111A patent/TW200505060A/zh not_active IP Right Cessation
- 2004-07-08 WO PCT/JP2004/009721 patent/WO2005010957A1/ja not_active Ceased
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102709204A (zh) * | 2012-05-30 | 2012-10-03 | 杭州士兰明芯科技有限公司 | 一种led芯片的键合方法 |
| CN102709204B (zh) * | 2012-05-30 | 2015-01-21 | 杭州士兰明芯科技有限公司 | 一种led芯片的键合方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2005044887A (ja) | 2005-02-17 |
| WO2005010957A1 (ja) | 2005-02-03 |
| TW200505060A (en) | 2005-02-01 |
| JP4114566B2 (ja) | 2008-07-09 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |