TWI342407B - Anti-reflection coating structure and method of making the same - Google Patents
Anti-reflection coating structure and method of making the same Download PDFInfo
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- TWI342407B TWI342407B TW96124766A TW96124766A TWI342407B TW I342407 B TWI342407 B TW I342407B TW 96124766 A TW96124766 A TW 96124766A TW 96124766 A TW96124766 A TW 96124766A TW I342407 B TWI342407 B TW I342407B
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- 238000000576 coating method Methods 0.000 title claims description 210
- 239000011248 coating agent Substances 0.000 title claims description 201
- 238000004519 manufacturing process Methods 0.000 title claims description 15
- 239000011247 coating layer Substances 0.000 claims description 96
- 239000006117 anti-reflective coating Substances 0.000 claims description 46
- 239000010410 layer Substances 0.000 claims description 41
- 239000000203 mixture Substances 0.000 claims description 30
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 28
- 239000000758 substrate Substances 0.000 claims description 28
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 24
- 239000010936 titanium Substances 0.000 claims description 24
- 229910052719 titanium Inorganic materials 0.000 claims description 24
- 229910052751 metal Inorganic materials 0.000 claims description 23
- 239000002184 metal Substances 0.000 claims description 23
- -1 carbonium compound Chemical class 0.000 claims description 22
- 238000000034 method Methods 0.000 claims description 18
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 17
- 239000002344 surface layer Substances 0.000 claims description 12
- 229910052709 silver Inorganic materials 0.000 claims description 9
- 239000004332 silver Substances 0.000 claims description 9
- 150000001875 compounds Chemical class 0.000 claims description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 7
- 229910052799 carbon Inorganic materials 0.000 claims description 7
- 239000011521 glass Substances 0.000 claims description 7
- 239000004408 titanium dioxide Substances 0.000 claims description 6
- NLMBNVBBHYNBQY-UHFFFAOYSA-N [C].[Ru] Chemical compound [C].[Ru] NLMBNVBBHYNBQY-UHFFFAOYSA-N 0.000 claims description 5
- NFFIWVVINABMKP-UHFFFAOYSA-N methylidynetantalum Chemical compound [Ta]#C NFFIWVVINABMKP-UHFFFAOYSA-N 0.000 claims description 5
- 239000000126 substance Substances 0.000 claims description 5
- 229910003468 tantalcarbide Inorganic materials 0.000 claims description 5
- 239000004575 stone Substances 0.000 claims description 4
- 239000002985 plastic film Substances 0.000 claims description 3
- 229920006255 plastic film Polymers 0.000 claims description 3
- 230000003287 optical effect Effects 0.000 description 8
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 7
- 239000004973 liquid crystal related substance Substances 0.000 description 6
- 239000004033 plastic Substances 0.000 description 4
- 229920003023 plastic Polymers 0.000 description 4
- 238000003466 welding Methods 0.000 description 4
- 230000004888 barrier function Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 230000000149 penetrating effect Effects 0.000 description 3
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 239000005328 architectural glass Substances 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- 230000035515 penetration Effects 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 150000003304 ruthenium compounds Chemical class 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- DHNCFAWJNPJGHS-UHFFFAOYSA-J [C+4].[O-]C([O-])=O.[O-]C([O-])=O Chemical compound [C+4].[O-]C([O-])=O.[O-]C([O-])=O DHNCFAWJNPJGHS-UHFFFAOYSA-J 0.000 description 1
- 230000003667 anti-reflective effect Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 125000005626 carbonium group Chemical group 0.000 description 1
- 150000001785 cerium compounds Chemical class 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 229910052747 lanthanoid Inorganic materials 0.000 description 1
- 150000002602 lanthanoids Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- SOQBVABWOPYFQZ-UHFFFAOYSA-N oxygen(2-);titanium(4+) Chemical class [O-2].[O-2].[Ti+4] SOQBVABWOPYFQZ-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 230000002085 persistent effect Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
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Description
1342407 • · Γ-""~ 1' · — 100年2月23曰修正替換頁 九、發明說明： 【發明所屬之技術領域】 , 本發明係爲一種塗層結構及其製作方法，尤其係指一 種抗反射塗層結構（二）及其製作方法（二 【先前技術】 習知的抗反射光學塗層的多層系統皆利用一通則，該 φ 通則爲該光學塗層的表層的物質具有一低折射率，例如1342407 • · Γ-""~ 1' · - February 2014 23曰 Revision replacement page IX, invention description: [Technical field of invention], the present invention is a coating structure and a manufacturing method thereof, especially Means an anti-reflective coating structure (2) and a manufacturing method thereof (2) [Prior Art] A multilayer system of the conventional anti-reflective optical coating utilizes a general rule, and the φ general is a substance of the surface layer of the optical coating a low refractive index, such as
Si〇2，折射率爲1.46，或MgF2 ’折射率爲138。然而，當 將該抗反射塗層運用于顯示器工業時，例如具抗靜電效果 之電腦螢幕或用於液晶顯示器或電漿顯示器之低反射玻璃 時，在大量生産的過程中，存在一些瓶頸，其原因是該光 . 學塗層結構的導電層係由一絕緣層（例如Si02或MgF2)所 燒製而成。 一抗反射塗層的基本設計規則爲，佈置於一基板表面 的第一層爲具高折射率之物質所構成（標示爲H)，其後接 ® 著一具低折射率之物質所構成（標示爲L·)的第二層，因 此’習知的抗反射塗層的多層結構之規則爲HLHL或 HLHLHL ’以高折射率（Η )之物質爲ιτο而低折射率（L) 之物質爲Si〇2爲例子’該四層結構分別爲 Glass/ITO/SiCVITO/Si〇2。因爲汀〇是一透明的導電物質， 該多層結構的塗層的導電性低於每平方1〇〇歐姆（Ω)，而 且當該導電塗層連結至地時’可用於電磁干擾（ΕΜΙ)屏障 或靜電放電。然而’問題是該習知的光學多層結構的表面 5 1342407 100年2月23日修正替換頁 物質”〇2，且其厚度爲嶋埃⑷，該⑽的物質特 性爲㈣、度、具有雜和—良好之電絕緣層傳先 之抗反射塗層於顯示器工業的過程中，電性接觸由夕卜= Si〇2層所隔離之該燒製的⑽層是_的 =0層中，需要使用-超音波焊二 打破遠s1〇2層，以確保錫球與該IT〇層産生良好接觸，此 一製程爲大量生産抗反射塗層的瓶頸。 另-方面，由於液態錫和超音波的曝露能量的緣故， 該超音波焊接製程微細的污染物，此外，該超音波焊接製 程亦會於每—匯流線上産生非持久性的賴阻抗，這是因 ，起a波焊接製私無法保證能夠均勾的以相同的深度打破 δ亥絕緣層而得到一均勻的接觸阻抗。 、上述之缺點會降低在運用習知的抗電磁干擾和抗反射 塗層的製程的良率和可靠度。 【發明内容】 二本發明之主要目的是提供一種抗反射塗層結構（二）， 鲁 忒虹反射塗層可運用於半導體、光學頭、液晶顯示器、陰 極射線管、建築玻璃、觸控式感測器、螢幕濾波器、塑膠 網板塗層等工業。 本發明之另一目的是提供一種抗反射塗層結構（二）， δ亥抗反射塗層之表層的物質爲一可穿透的表面導電層，而 ^ έ亥可穿透的表面導電層的光反射率低於〇 5%，該抗反射塗 層的阻抗介於每平方0.5Ω與0.7Ω之間，而其穿透率爲55% 6 100年2月23曰修正替換頁 至 70%。 本發明之另一目的是提供一種抗反射塗層結構（二）， 本啦明之塗層結構其具有高導電性之特性，當其運用於電 漿顯不器之製造時，其具有電磁干擾屏障、光學視角低反 射、咼表面硬度抗到性、適度的光衰減效應等優點。例如， 本發明之塗層結構之表面阻抗介於每平方〇.5Q與〇,7Ω之 間，以及具有足夠硬度去通過軍事標準MIL-C-48497之耐 到測試。 本發明之另一目的是提供一種抗反射塗層結構（二）， 於完成塗層模組之製作後，首先，設置一遮板於該塗層模 組之上表面’其中該遮板的尺寸係小於該塗層模組，以使 得該塗層模組的上表面之邊緣曝露出來；然後，塗佈一層 導電層於該塗層模組的上表面之邊緣，以供接地，而達到 良好的電性接觸a其中，該導電層係可為銀漿。 為了達成上述目的，本發明係提供一種抗反射塗層結 構（二），其包括有：一基板及一塗層模組。其中，該塗層 模組係形成於該基板之一前表面上，並且該塗層模組係由 複數層碳矽化合物與含鈦氧化物的混合物塗層與複數層金 屬塗層交替相疊而組成。 為了達成上述目的，本發明係提供一種抗反射塗層結 構之製作方法（二）’其步驟包括有：首先，提供一基板； 然後，形成一塗層模組於該基板之一前表面上’其中該塗 層模組係由複數層碳矽化合物與含鈦氧化物的混合物塗層 與複數層金屬塗層交替相疊而組成。 1342407Si〇2 has a refractive index of 1.46 or a refractive index of 138 of MgF2'. However, when the antireflective coating is applied to the display industry, such as a computer screen with an antistatic effect or a low reflection glass for a liquid crystal display or a plasma display, there are some bottlenecks in mass production. The reason is that the conductive layer of the coating structure is fired from an insulating layer such as SiO 2 or MgF 2 . The basic design rule for an anti-reflective coating is that the first layer disposed on the surface of a substrate is composed of a material having a high refractive index (labeled as H), followed by a substance having a low refractive index ( The second layer labeled L·), so the rule of the multilayer structure of the conventional anti-reflective coating is HLHL or HLHLHL. The substance with high refractive index (Η) is ιτο and the low refractive index (L) is Si〇2 is an example 'The four-layer structure is respectively Glass/ITO/SiCVITO/Si〇2. Because Ting is a transparent conductive material, the coating of the multilayer structure has a conductivity of less than 1 ohm (Ω) per square, and can be used for electromagnetic interference (ΕΜΙ) barrier when the conductive coating is bonded to the ground. Or electrostatic discharge. However, the problem is that the surface of the conventional optical multilayer structure 5 1342407 revised the replacement page material 〇 2 on February 23, 100, and its thickness is 嶋 (4), and the material properties of the (10) are (four), degree, and impurity. - good electrical insulation layer of the anti-reflective coating in the display industry, the electrical contact is separated by the layer = Si 〇 2 layer of the fired (10) layer is _ =0 layer, need to use - Ultrasonic welding 2 breaks the far s1〇2 layer to ensure good contact between the solder ball and the IT layer. This process is the bottleneck for mass production of anti-reflective coatings. In addition, due to the exposure of liquid tin and ultrasonic waves For the sake of energy, the ultrasonic welding process produces fine contaminants. In addition, the ultrasonic welding process also produces non-persistent impedance on each-bus line. This is because the a-wave welding system cannot guarantee the uniformity. The hook breaks the δ hai insulation layer at the same depth to obtain a uniform contact resistance. The above disadvantages reduce the yield and reliability of the process using conventional anti-electromagnetic interference and anti-reflective coatings. 】 Two inventions The purpose is to provide an anti-reflective coating structure (2), Lu Xunhong reflective coating can be applied to semiconductors, optical heads, liquid crystal displays, cathode ray tubes, architectural glass, touch sensors, screen filters, plastics Another aspect of the present invention is to provide an anti-reflective coating structure (2). The surface layer of the anti-reflective coating is a penetrable surface conductive layer, and ^ έ 可The light transmittance of the penetrating surface conductive layer is less than 〇5%, the impedance of the anti-reflective coating is between 0.5Ω and 0.7Ω per square, and the penetration rate is 55%. 6 February 23曰Correcting the replacement page to 70%. Another object of the present invention is to provide an anti-reflective coating structure (2), which has the characteristics of high electrical conductivity when it is used in the manufacture of a plasma display device. When it has the advantages of electromagnetic interference barrier, optical viewing angle low reflection, 咼 surface hardness resistance, moderate light attenuation effect, etc. For example, the surface resistance of the coating structure of the present invention is between 55·〇 and 7 Ω per square inch. Between, and with enough hardness to go It has been tested by the military standard MIL-C-48497. Another object of the present invention is to provide an anti-reflective coating structure (2). After completing the fabrication of the coating module, first, a shielding plate is disposed on the coating. The upper surface of the layer module, wherein the size of the shutter is smaller than the coating module to expose the edge of the upper surface of the coating module; and then coating a conductive layer on the coating module The edge of the upper surface is provided for grounding to achieve a good electrical contact a. The conductive layer may be a silver paste. To achieve the above object, the present invention provides an anti-reflective coating structure (2) including a substrate and a coating module, wherein the coating module is formed on a front surface of the substrate, and the coating module is coated with a mixture of a plurality of layers of carbonium compound and titanium oxide. It is composed of alternating layers of metal coatings. In order to achieve the above object, the present invention provides a method for fabricating an anti-reflective coating structure (2) 'the steps of which include: first, providing a substrate; and then forming a coating module on a front surface of the substrate' The coating module is composed of a coating of a mixture of a plurality of layers of a carbonium compound and a titanium oxide and a plurality of metal coatings. 1342407
100年2月23日修正替換頁 在一實施例中，該抗反射塗層結構（二）包括有9層， 第一塗層、第二塗層、第三塗層、第四塗層、第五塗層、 第六塗層、第七塗層、第八塗層和第九塗層依序排列在基 板上，每一層將以物理厚度或光學厚度來描述’光學厚度 係爲層厚度與折射率之數學乘積，而爲設計波長的分數， 在本發明中，該設計波長爲52〇nm。 第一塗層或稱爲表面層係為可穿透的碳矽化合物與含 鈦氧化物的混合物塗層，該碳矽化合物塗層爲碳化矽，該 含鈦氧化物係為二氧化鈦，並且該碳矽化合物與含鈦氧化 物的比例係為40% : 60%，該混合物僅吸收些微的可見光， 當波長爲520nm時，該表面層之折射率係為2.5之間，而 物理厚度爲30nm。 第二塗層係為一金屬塗層，該金屬塗層為銀，其僅吸 收些微的可見光，當波長爲520nm時，其折射率介於 至0.5之間，而物理厚度爲15nm。 第三塗層係為可穿透的碳石夕化合物與含鈦氧化物的混 合物塗層，該碳矽化合物塗層爲碳化矽，該含鈦氧化物係 為二氧化鈦’並且該碳砍化合物與含鈦氧化物的比例係為 40%: 60%’該混合物僅吸收些微的可見光，當波長爲52〇nm 時，該表面層之折射率係為2.5之間，而物理厚度爲66nm。 第四塗層係為一金屬塗層，該金屬塗層為銀，其僅吸 收些微的可見光’當波長爲520nm時’其折射率介於 至0.5之間，而物理厚度爲15nm。 第五塗層係為可穿透的碳矽化合物與含鈦氧化物的混 1342407 100年2月23曰修正替換頁 合物塗層’該碳矽化合物塗層爲碳化矽，該含鈦氧化物係 為二氧化鈦’並且該碳矽化合物與含鈦氧化物的比例係為 40%: 60%，該混合物僅吸收些微的可見光，當波長爲52〇nm 時，戎表面層之折射率係為2 5之間，而物理厚度爲 60nm ° 第六塗層係為一金屬塗層，該金屬塗層為銀，其僅吸 收些微的可見光，當波長爲52〇nm時，其折射率介於〇1 至0.5之間，而物理厚度爲15nm。Modified Replacement Page, February 23, 100. In one embodiment, the anti-reflective coating structure (2) comprises 9 layers, a first coating, a second coating, a third coating, a fourth coating, and a The five coating, the sixth coating, the seventh coating, the eighth coating, and the ninth coating are sequentially arranged on the substrate, and each layer will be described by physical thickness or optical thickness. 'Optical thickness is layer thickness and refraction. The mathematical product of the rate, which is the fraction of the design wavelength, is in the present invention, the design wavelength is 52 〇 nm. The first coating layer or surface layer is a coating of a mixture of a penetrable carbonium compound and a titanium-containing oxide, the carbonium compound coating is tantalum carbide, the titanium-containing oxide is titanium dioxide, and the carbon The ratio of the cerium compound to the titanium-containing oxide is 40%: 60%, and the mixture absorbs only a small amount of visible light. When the wavelength is 520 nm, the surface layer has a refractive index of 2.5 and a physical thickness of 30 nm. The second coating is a metallic coating which is silver which absorbs only a small amount of visible light. When the wavelength is 520 nm, the refractive index is between 0.5 and the physical thickness is 15 nm. The third coating is a coating of a mixture of a penetrating carbon stone compound and a titanium-containing oxide, the carbonium compound coating is tantalum carbide, the titanium-containing oxide is titanium dioxide and the carbon-cut compound and The ratio of titanium oxide is 40%: 60% 'The mixture absorbs only a small amount of visible light. When the wavelength is 52 〇 nm, the surface layer has a refractive index of 2.5 and a physical thickness of 66 nm. The fourth coating is a metallic coating which is silver which absorbs only a small amount of visible light 'at a wavelength of 520 nm' having a refractive index between 0.5 and a physical thickness of 15 nm. The fifth coating is a mixture of a penetrable carbon ruthenium compound and a titanium-containing oxide 1342407. The replacement of the palladium coating by the February 23 100 'the carbon ruthenium compound coating is tantalum carbide, the titanium-containing oxide It is made of titanium dioxide' and the ratio of the carbonium compound to the titanium-containing oxide is 40%: 60%. The mixture absorbs only a small amount of visible light. When the wavelength is 52〇nm, the refractive index of the surface layer of the tantalum is 2 5 . Between the physical thickness and the thickness of 60 nm °, the sixth coating is a metal coating, which is silver, which absorbs only a small amount of visible light. When the wavelength is 52 〇 nm, the refractive index is between 〇1 and Between 0.5 and a physical thickness of 15 nm.
第七塗層係為可穿透的碳矽化合物與含鈦氧化物的混 合物，層’該切化合物塗層爲碳切，該含鈦氧化物係 為一氧化鈦，並且該碳矽化合物與含鈦氧化物的比例係為 40%: 60〇/〇 ’該混合物僅吸收些微的可見光，當波長爲 時4表面層之折射率係為2 5之間，而物理厚度爲川nm。 第八塗層係、為—金屬塗層，該金屬塗層為銀，其僅吸 收些微的可見光，當波長爲520nm時，其折射率介於〇1 至0.5之間，而物理厚度爲】5nm。The seventh coating is a mixture of a penetrable carbon ruthenium compound and a titanium-containing oxide, the layer of the dicing compound is carbon cut, the titanium-containing oxide is titanium oxide, and the carbon ruthenium compound and The proportion of titanium oxide is 40%: 60 〇 / 〇 'The mixture absorbs only a small amount of visible light, when the wavelength is 4, the surface layer has a refractive index of 25, and the physical thickness is 川 nm. The eighth coating system is a metal coating, which is silver, which absorbs only a small amount of visible light. When the wavelength is 520 nm, the refractive index is between 〇1 and 0.5, and the physical thickness is 5 nm. .
第九塗層係為可穿透的碳石夕化合物與含鈦氧化物的混 ^物塗層’該碳錢合物塗層爲碳切，該含鈦氧化物係 1 鈦’並且該碳較合物與含鈦氧化物的比例係為 合物伽收些微的可认當波長爲別⑽ 夺以表層之折射率係為2·5之間，而物理厚度爲4〇nm。 因爲本發明之塗層結構的表層有良好 ==可以降低接地製程所需的工作負二增加 和可靠度，其可運用於液晶顯示器或電激 ‘，，，貝不為之玻璃基板或塑膠基板上。 9 1342407 1〇〇年2月23日修正替換頁 術、= 縣賴狀目的龍取之技 目糊町細本發明謂細卿與附圖，相 ^柄明之目的、特徵與特點，當可由此得-深人且且體之瞭 解’然而所關式健供參考與說_，並_ 限制者。 【實施方式】 請參考第-圖所示，其係為本發明抗反射塗廣結構 (二）之結構示意圖。由圖中可知，本發明所揭露之抗反 射塗層結構（二）係、包括有：一基板S及一塗層模組M。 其中，δ玄基板S係可為一塑膠薄膜或一玻璃。而該塗 層模組Μ係可為電漿顯示器（piasma diSpiay)或液晶顯示 器（liquid crystal display)之基本塗層。 再者，該塗層模組Μ係包括：一第一塗層1，其形成 於該基板S之一前表面上；一第二塗層2，其形成於該第 一塗層1上；一第三塗層3，其形成於該第二塗層2上； 一第四塗層4，其形成於該第三塗層3上；一第五塗層5， 其形成於該第四塗層4上；一第六塗層6，其形成於該第 五塗層5上；一第七塗層7，其形成於該第六塗層6上； 一第八塗層8，其升> 成於該第七塗層7上；以及一第九塗 層9，其形成於該第八塗層8上。 此外，該第一塗層1、該第三塗層3、該第五塗層5、 該第七塗層7、及該第九塗層9皆為碳矽化合物與含鈦氧 化物的混合物塗層，並且該第二塗層2、該第四塗層4、 10 1342407 • · — - 100年2月23日修正替換頁 1第六塗層6、及該第八塗層8皆為金屬塗層。其中，該 石反矽化合物係為碳化矽 ，該含鈦氧化物係為二氧化鈦，該 ’ 反夕化&物與該含鈦氧化物的比例係為40% : 60%。並且該 ，. 等至屬塗層係為銀。該等混合物塗層的折射率係高於該等 金屬塗層。 因此’該塗層模組Μ係形成於該基板S之一前表面 上’並且該塗層模組Μ係由複數層碳矽化合物與含鈦氧化 φ 物的混合物塗層與複數層金屬塗層交替相疊而組成。 再者’該第一塗層、該第三塗層、該第五塗層、該第 七塗層、及該第九塗層的折射率皆為2.5’並且該第二塗層、 該第四塗層、該第六塗層、及該第八塗層的折射率皆介於 0.1〜0.5之間。另外，該第一塗層的厚度係為3〇nm ;該第二 塗層的厚度係介於15nm ;該第三塗層的厚度係為66nm ; 該第四塗層的厚度係介於15nm;該第五塗層的厚度係為 60nm ;該第六塗層的厚度係介於i5nm ;該第七塗層的厚度 係為70nm，該第八塗層的厚度係介於15nm ;以及該第九 鲁塗層的厚度係為40nm。 此外，該第一塗層1、該第三塗層3、該第五塗層5、 該第七塗層7、及該第九塗層9之混合物塗層皆由直流或 脈衝直流濺鑛法（DC or AC magnetron sputtering method) 所形成，並且該第二塗層2、該第四塗層4、該第六塗層 6、及該第八塗層8之金屬塗層皆由直流或脈衝直流濺鍍 法（DC or AC magnetron sputtering method )所形成。並且， 該第一塗層1至該第九塗層9係由同軸或滾子對滾子真空 1342407 _ 100年2月23曰修正替換頁 系統之蒸鍍或藏鍍製程（in-line or roll-to-roll vacuum evaporation/sputtering method )戶斤升j 成。 請參閱第二圖所示，其係為本發明抗反射塗層結構 (二）之上視示意圖。由圖中可知，本發明之抗反射塗層 結構更進一步包括：一塗佈於該塗層模組Μ上表面的四周 邊緣之導電層C ’以供接地。亦即，該用於接地之導電層 C係塗佈於該塗層模組Μ之第九塗層9之上表面的四周邊 緣。換言之，於完成該塗層模組Μ之製作後，首先，設置 一遮板Β於該塗層模組Μ之上表面，其中該遮板Β的尺寸 係小於該塗層模組Μ，以使得該塗層模組μ的上表面之邊 緣曝露出來；然後，塗佈一層導電層C於該塗層模組μ的 上表面之邊緣，以供接地，而達到良好的電性接觸。最後， 移除該遮板Β。其中，該導電層◦係可為銀漿。 請參閱第三圖所示，其係為本發明抗反射塗層結構之 製作方法（二）之流程圖。由流程圖可知，本發明之抗反 射塗層結構之製作方法，其步驟包括有： S200 .提供一基板s ; S202 .形成一第一塗層丄於該基板3之該前表面上， 其中該第一塗層1係為碳矽化合物與含鈦氧化 物的混合物塗層； S204 :形成一第二塗層2於該第一塗層1上，其中該 第二塗層2係為金屬塗層； S206 .形成一第三塗層3於該第二塗層2上，其中該 第三塗層3係為碳矽化合物與含鈦氧化物的混 12 1342407 - • « 100年2月23曰修正替換頁 合物塗層； S208 :形成一第四塗層4於該第三塗層3上，其中該 第四塗層4係為金屬塗層； S210 :形成一第五塗層5於該第四塗層4上，其中該 第五塗層5係為碳矽化合物與含鈦氧化物的混 合物塗層； S212 :形成一第六塗層6於該第五塗層5上，其中該 第六塗層6係為金屬塗層； S214 :形成一第七塗層7於該第六塗層6上，其中該 第七塗層7係為碳矽化合物與含鈦氧化物的混 合物塗層； S216 :形成一第八塗層8於該第七塗層7上，其中該 第八塗層8係為金屬塗層；以及 S218 :形成一第九塗層9於該第八塗層8上，其中該 第九塗層9係為碳矽化合物與含鈦氧化物的混 合物塗層。 綜上所述，該抗反射塗層可運用於半導體、光學頭、 液晶顯示器、陰極射線管、建築玻璃、觸控式感測器、螢 幕濾波器、塑膠網板塗層等工業。 此外，該抗反射塗層之表層的物質爲一可穿透的表面 導電層，而該可穿透的表面導電層的光反射率低於0.5%， 該抗反射塗層的阻抗介於每平方0.5Ω與0.7Ω之間，而其 穿透率爲55%至70%。 再者，本發明之塗層結構其具有高導電性之特性，當 13 Ή42407 100年2月23日修正替換頁 其運用於電漿顯示器之製造時， 學視角低反射、高表面硬度彳;；具有電磁干擾屏障、光 優點。例如，本發明之塗層^之“適度的光衰減效應等 與㈣之間，以面阻抗介於每平方咖 MIL-C-48497之耐㈣試、。°硬度去通過軍事標準 因爲本發明之塗層結構的表層有良好 抗反射塗層結構可以降低接地製程 ^生’该 ===可靠度’其可運用於液晶 顯不益之玻璃基板或塑膠基板上。 电水 惟，以上所述，僅為本發明最佳之一 詳細說明與圖式，惟本發明之赖並不侷限ς此實 以限制本發明’本發明之所有範下狀直 ===圍可_及之變化或修心=The ninth coating is a mixture of a penetrating carbon stone compound and a titanium oxide-containing coating. The carbon-carbonate coating is carbon cut, and the titanium-containing oxide is 1 titanium and the carbon is compared. The ratio of the composition to the titanium-containing oxide is such that the identifiable wavelength of the compound is slightly different (10), the refractive index of the surface layer is between 2.5 and the physical thickness is 4 〇 nm. Because the surface layer of the coating structure of the present invention has good == can reduce the negative work increase and reliability required for the grounding process, and can be applied to a liquid crystal display or an electro-excitation, a glass substrate or a plastic substrate on. 9 1342407 On February 23, 1st, the revised replacement page technique, = the county's lama-like purpose, the dragon's skill, the eye-catching town, the fines, the invention, the fine and the drawings, the purpose, characteristics and characteristics of the Get-deep people and understand the body 'however, the closed health reference and say _, and _ limit. [Embodiment] Please refer to the figure - figure, which is a schematic structural view of the anti-reflective coating structure (2) of the present invention. As can be seen from the figure, the anti-reflective coating structure (2) disclosed in the present invention comprises: a substrate S and a coating module M. Wherein, the δ Xuan substrate S system can be a plastic film or a glass. The coating module can be a basic coating of a plasma display (piasma diSpiay) or a liquid crystal display. Furthermore, the coating module comprises: a first coating 1 formed on a front surface of the substrate S; a second coating 2 formed on the first coating 1; a third coating 3 formed on the second coating 2; a fourth coating 4 formed on the third coating 3; a fifth coating 5 formed on the fourth coating 4; a sixth coating 6, formed on the fifth coating 5; a seventh coating 7, formed on the sixth coating 6; an eighth coating 8, which rises > Formed on the seventh coating layer 7; and a ninth coating layer 9 formed on the eighth coating layer 8. In addition, the first coating layer 1, the third coating layer 3, the fifth coating layer 5, the seventh coating layer 7, and the ninth coating layer 9 are all coated with a mixture of a carbonium compound and a titanium oxide. a layer, and the second coating layer 2, the fourth coating layer 4, 10 1342407 • - - February 23, 2014 revised replacement page 1 sixth coating 6, and the eighth coating layer 8 are all metal coated Floor. The stone ruthenium compound is ruthenium carbide, and the titanium-containing oxide is titanium dioxide, and the ratio of the ruthenium compound to the titanium-containing oxide is 40%: 60%. And this, etc. until the coating system is silver. The coatings of the mixtures have a higher refractive index than the metal coatings. Therefore, the coating module is formed on one of the front surfaces of the substrate S and the coating module is coated with a mixture of a plurality of layers of carbonium compounds and titanium oxides and a plurality of metal coatings. They are alternately stacked to form. Further, the first coating layer, the third coating layer, the fifth coating layer, the seventh coating layer, and the ninth coating layer each have a refractive index of 2.5' and the second coating layer, the fourth coating layer The refractive index of the coating, the sixth coating layer, and the eighth coating layer are all between 0.1 and 0.5. In addition, the thickness of the first coating layer is 3 〇 nm; the thickness of the second coating layer is 15 nm; the thickness of the third coating layer is 66 nm; the thickness of the fourth coating layer is 15 nm; The thickness of the fifth coating layer is 60 nm; the thickness of the sixth coating layer is between i5 nm; the thickness of the seventh coating layer is 70 nm, the thickness of the eighth coating layer is 15 nm; and the ninth The thickness of the Lu coating is 40 nm. In addition, the first coating layer 1, the third coating layer 3, the fifth coating layer 5, the seventh coating layer 7, and the ninth coating layer 9 are coated by a direct current or pulsed direct current sputtering method. (DC or AC magnetron sputtering method), and the metal coating of the second coating layer 2, the fourth coating layer 4, the sixth coating layer 6, and the eighth coating layer 8 is formed by direct current or pulsed direct current It is formed by a DC or AC magnetron sputtering method. And, the first coating layer 1 to the ninth coating layer 9 are replaced by a coaxial or roller-to-roller vacuum 1342407_February 23, 100. Replacement page system evaporation or Tibetan plating process (in-line or roll -to-roll vacuum evaporation/sputtering method ) Please refer to the second figure, which is a top view of the anti-reflective coating structure (2) of the present invention. As can be seen from the figure, the anti-reflective coating structure of the present invention further comprises: a conductive layer C' coated on the peripheral edge of the upper surface of the coating module for grounding. That is, the conductive layer C for grounding is applied to the four peripheral edges of the upper surface of the ninth coating layer 9 of the coating module. In other words, after the fabrication of the coating module is completed, first, a shutter is disposed on the upper surface of the coating module, wherein the size of the shutter is smaller than the coating module, so that The edge of the upper surface of the coating module μ is exposed; then, a conductive layer C is applied to the edge of the upper surface of the coating module μ for grounding to achieve good electrical contact. Finally, remove the visor Β. Wherein, the conductive layer lanthanide can be a silver paste. Please refer to the third figure, which is a flow chart of the method (2) for fabricating the anti-reflective coating structure of the present invention. The method for fabricating the anti-reflective coating structure of the present invention includes the steps of: providing a substrate s; S202. forming a first coating layer on the front surface of the substrate 3, wherein The first coating 1 is a coating of a mixture of a carbonium compound and a titanium oxide; S204: forming a second coating 2 on the first coating 1, wherein the second coating 2 is a metal coating S206. Forming a third coating layer 3 on the second coating layer 2, wherein the third coating layer 3 is a mixture of a carbonium compound and a titanium-containing oxide 12 1342407 - • «Corrigated by February 23, 2014 Substituting a page coating; S208: forming a fourth coating 4 on the third coating 3, wherein the fourth coating 4 is a metal coating; S210: forming a fifth coating 5 a fourth coating layer 4, wherein the fifth coating layer 5 is a coating of a mixture of a carbonium compound and a titanium oxide; S212: forming a sixth coating layer 6 on the fifth coating layer 5, wherein the sixth coating layer The coating 6 is a metal coating; S214: forming a seventh coating 7 on the sixth coating 6, wherein the seventh coating 7 is a carbonium compound and titanium-containing oxygen a coating of the mixture; S216: forming an eighth coating 8 on the seventh coating 7, wherein the eighth coating 8 is a metal coating; and S218: forming a ninth coating 9 On the eight coat layer 8, wherein the ninth coat layer 9 is a coating of a mixture of a carbonium compound and a titanium oxide. In summary, the anti-reflective coating can be applied to industries such as semiconductors, optical heads, liquid crystal displays, cathode ray tubes, architectural glass, touch sensors, screen filters, and plastic screen coatings. In addition, the surface layer of the anti-reflective coating is a penetrable surface conductive layer, and the transmissive surface conductive layer has a light reflectance of less than 0.5%, and the anti-reflective coating has an impedance of between Between 0.5Ω and 0.7Ω, and its penetration rate is 55% to 70%. Furthermore, the coating structure of the present invention has high conductivity characteristics, and when the film is applied to the manufacture of a plasma display on February 23, 2014, the correction angle is low reflection, high surface hardness 彳; It has the advantage of electromagnetic interference barrier and light. For example, between the "moderate light attenuation effect and the like" of the coating of the present invention, and the (4) resistance of the surface impedance of MIL-C-48497 per square gram, the hardness is passed through the military standard because the present invention The surface layer of the coating structure has a good anti-reflective coating structure, which can reduce the grounding process, which can be applied to a glass substrate or a plastic substrate which is not suitable for liquid crystal display. The present invention is not limited to the details of the present invention, but the invention is not limited thereto, so as to limit the present invention, all the inventions of the present invention can be changed or corrected. =
(—)之結構示意圖； (二）之上视示意圖； 【圖式簡單說明】 第一圖係爲本發明抗反射塗層結構 第二圖係為本發明抗反射塗層結構 以及(-) Schematic diagram of the structure; (2) Schematic diagram of the top view; [Simplified description of the drawings] The first figure is the anti-reflective coating structure of the present invention. The second figure is the anti-reflective coating structure of the present invention and
第三圖係爲本發明抗反射塗層結構之製作方法 程圖。 14 1342407 - 备 . 100年2月23曰修正替換頁 【主要元件符號說明】The third figure is a process diagram for fabricating the anti-reflective coating structure of the present invention. 14 1342407 - Preparation . February 2014 23曰 Correction replacement page [Main component symbol description]
基板 S 塗層模組 Μ 第一塗層 1 第二塗層 2 第三塗層 3 第四塗層 4 第五塗層 5 第六塗層 6 第七塗層 7 第八塗層 8 第九塗層 9 遮板 Β 導電層 CSubstrate S coating module Μ first coating 1 second coating 2 third coating 3 fourth coating 4 fifth coating 5 sixth coating 6 seventh coating 7 eighth coating 8 ninth coating Layer 9 Β Β Conductive layer C
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| TW96124766A TWI342407B (en) | 2007-07-06 | 2007-07-06 | Anti-reflection coating structure and method of making the same |
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| TW96124766A TWI342407B (en) | 2007-07-06 | 2007-07-06 | Anti-reflection coating structure and method of making the same |
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| TW200903019A TW200903019A (en) | 2009-01-16 |
| TWI342407B true TWI342407B (en) | 2011-05-21 |
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