TWI366706B - Semiconductor substrate defects detection device and method of detection of defects - Google Patents

Semiconductor substrate defects detection device and method of detection of defects

Info

Publication number
TWI366706B
TWI366706B TW096123471A TW96123471A TWI366706B TW I366706 B TWI366706 B TW I366706B TW 096123471 A TW096123471 A TW 096123471A TW 96123471 A TW96123471 A TW 96123471A TW I366706 B TWI366706 B TW I366706B
Authority
TW
Taiwan
Prior art keywords
defects
detection
semiconductor substrate
detection device
substrate defects
Prior art date
Application number
TW096123471A
Other languages
Chinese (zh)
Other versions
TW200809316A (en
Inventor
Takaaki Onishi
Original Assignee
Olympus Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Olympus Corp filed Critical Olympus Corp
Publication of TW200809316A publication Critical patent/TW200809316A/en
Application granted granted Critical
Publication of TWI366706B publication Critical patent/TWI366706B/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/958—Inspecting transparent materials or objects, e.g. windscreens
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1306—Details
    • G02F1/1309—Repairing; Testing
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8854—Grading and classifying of flaws
    • G01N2021/8858—Flaw counting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Biochemistry (AREA)
  • Immunology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Pathology (AREA)
  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Nonlinear Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Signal Processing (AREA)
  • Optics & Photonics (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • General Factory Administration (AREA)
TW096123471A 2006-07-03 2007-06-28 Semiconductor substrate defects detection device and method of detection of defects TWI366706B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006183112 2006-07-03

Publications (2)

Publication Number Publication Date
TW200809316A TW200809316A (en) 2008-02-16
TWI366706B true TWI366706B (en) 2012-06-21

Family

ID=39035649

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096123471A TWI366706B (en) 2006-07-03 2007-06-28 Semiconductor substrate defects detection device and method of detection of defects

Country Status (3)

Country Link
KR (1) KR100882252B1 (en)
CN (1) CN101101266A (en)
TW (1) TWI366706B (en)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012073558A1 (en) 2010-11-29 2012-06-07 大日本印刷株式会社 Substrate for evaluation, defect inspection method and defect inspection apparatus
JP6165658B2 (en) 2014-03-20 2017-07-19 株式会社東芝 Manufacturing apparatus management system and manufacturing apparatus management method
JP2015190890A (en) * 2014-03-28 2015-11-02 シャープ株式会社 Defect determination apparatus and defect determination method
JP6641093B2 (en) * 2015-03-20 2020-02-05 住友化学株式会社 Defect inspection method for optical film and laminated optical film
JP6749894B2 (en) * 2015-04-09 2020-09-02 住友化学株式会社 Defect inspection method for laminated optical film, optical film defect inspection method, and laminated optical film manufacturing method
CN104730217B (en) * 2015-04-16 2016-09-07 京东方科技集团股份有限公司 The defect distribution display methods of a kind of glass substrate and display device
KR102007959B1 (en) * 2015-09-08 2019-08-06 주식회사 엘지화학 Method of Analyzing Polarizer Defect Through Projection Analysis
JP6010674B1 (en) 2015-09-18 2016-10-19 住友化学株式会社 Film manufacturing method and film manufacturing apparatus
CN109387961B (en) * 2018-11-07 2020-11-24 惠科股份有限公司 Detection method and detection equipment for display panel
CN110095590A (en) * 2019-04-23 2019-08-06 深圳市华星光电半导体显示技术有限公司 Glass substrate residual material method for detecting and device
CN110441501B (en) * 2019-06-27 2023-03-21 北海惠科光电技术有限公司 Detection method and detection system
CN111261078A (en) * 2020-03-24 2020-06-09 深圳市华星光电半导体显示技术有限公司 Detection method and detection device for display panel
CN115360111A (en) * 2022-08-24 2022-11-18 厦门士兰集科微电子有限公司 Wafer abnormity early warning method
CN115360112A (en) * 2022-08-24 2022-11-18 厦门士兰集科微电子有限公司 Wafer abnormity early warning method

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05126755A (en) * 1991-10-31 1993-05-21 Toshiba Corp Pattern defect inspection system
KR100315915B1 (en) * 1999-01-05 2001-12-12 윤종용 an auto system of detecting glass defect and a control method thereof
JP2002303587A (en) 2001-04-03 2002-10-18 Nec Kansai Ltd Visual inspection method and device

Also Published As

Publication number Publication date
CN101101266A (en) 2008-01-09
KR100882252B1 (en) 2009-02-06
KR20080003719A (en) 2008-01-08
TW200809316A (en) 2008-02-16

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees