TWI379620B - - Google Patents

Abstract

The invention relates to a high-frequency plasma beam source with a plasma chamber for a plasma, electrical means for applying an electrical voltage to the high-frequency plasma beam source to ignite and maintain the plasma, extraction means for extracting a plasma beam (I) from the plasma chamber as well as an exit opening, which is separated from the vacuum chamber by an extraction grid. The plasma beam (I) exits with a substantially divergent radiation characteristic from the high-frequency plasma beam source. The invention furthermore relates to a method for the irradiation of a surface with a plasma beam (I) of a high-frequency plasma beam source, the plasma beam (I) being divergent.

Description

/-4 years Y 厶曰 厶曰 替换 替换 替换 替换 替换 杂 杂 杂 杂 杂 杂 杂 杂 杂 杂 杂 杂 杂 杂 杂 杂 杂 杂 杂 杂 杂 杂 杂 杂 杂 杂 杂 杂 杂 杂 杂 杂 杂 杂 杂 杂 杂 杂 杂The concentrating (1), the extraction grid (4) has a mesh, and the width of the mesh is at least as large as the thickness of the space charge region between the extraction grid (4) and the plasma of the chamber (3). 10. According to the scope of the patent application, the fennel will be «A frequency plasma radiation source, wherein the extraction grid (4) has a mesh, and the upper limit of the width of the mesh must basically make electricity The slurry remains in the plasma chamber (3). 11. The high frequency electro-polymerization source according to claim 9 or claim 10, wherein a shutter is applied with a potential to enable neutralization of the (I) 〇12. The high frequency electro-optical source according to claim 9 or claim 1, wherein in the coating to (7), a bend is provided substantially opposite to the outlet. The surface contains a substrate (10.1, 10.2, 10.3, 1〇4, 1〇5, 1〇6). 13. The high frequency plasma radiation source according to claim 9 or claim 10, wherein a steaming source is provided in addition to the frequency collecting radiation source (1). M. The high-frequency plasma radiation source according to claim 9 or claim 10, wherein the extraction grid (4) is composed of a tungsten wire network having a thickness of 〇 2 to 3 mm. The invention relates to a high-frequency concentrating radiation source according to claim 9 or claim 10, wherein (at least one magnet (5) is provided for shutting off the plasma in the plasma chamber (3) 16. A vacuum chamber having a housing (2), a high frequency plasma radiation source, and a surface for performing illumination, wherein the high frequency plasma radiation source (丨) is according to the foregoing The invention provides a vacuum chamber according to claim 16 wherein the surface for performing the illumination is curved and includes one or more Substrate (1〇丨, 1〇2, 1〇3, 1〇4, 10.5, 10.6) 〇18. A method of using a high-frequency plasma radiation source as a surface irradiation method, 17

V 19. The characteristic is that a divergent electro-lighting (1) is used, and the ancient 匕 更 更 : : : : : : 据 据 据 据 据 据 据 据 据 据 据 据 据 据 据 据 申 申 申 申 申 申 申 申 申 申 申The method described in the patent _18, "'. The divergence measure has an H-shooting characteristic of n = 4, and the helium radiation (1) has an index of the cloth function. The 11th is a cosine score. 20 According to the radiation characteristics of (1) mentioned in Item 18 or Item 19 of the patent application scope, it is achieved by the radiation and the extraction of the thumb. ) A precise interaction between the 21st and the lion's material _ 丨 8 items of material I9 (1) of the radiation characteristics, at least with the - part of the radiant surface 2 'electrical damage light on a part of the surface The above can enable the plasma radiation density to reach 1 J' for at least 22. The uniformity of the crucible according to the 18th or 19th item of the patent application. Curved surface. ', where the setting is - 23. According to the method described in claim 18 or 19, the irradiation of the dragon can achieve the coating of the surface. , /, medium, by surface 24. According to the method described in claim 18 or 19, the complex irradiation can achieve surface improvement. / , , , by surface 25. - high-frequency plasma ray _, which has - set the electrical equipment to ignite and maintain the plasma (8, 9), from the plasma chamber 3) The extraction grid (4) extracted by the slurry radiation (I), and an outlet, and the neutral electricity is placed in the range of the outlet, which is characterized by _ formation = taking the grid (4: The radiation (I), the extraction grid (4) seen by the electric chamber (3) is the shape of the second neutral = and / or the width of the extraction grid (4) mesh, than the extraction grid (4) And the thickness of the space charge region between the plasmas of the = structure is as large as ^ (3) 26. A method of plasma radiation sprayed surface of a frequency-frequency plasma radiation source, equipped with six · Dan has _ for mine _ Set the plasma chamber (3), some electrical tools for igniting and maintaining the plasma (=9 plasma 18 1379620 /a year ι ι correction correction page from the plasma chamber (3) neutral plasma Radiation (I) extracts the extraction grid (4), and an outlet, and the extraction grid (4) is disposed within the outlet, which is characterized by the formation of dispersed neutral plasma radiation (I) ), to pump Neutral plasma radiation (I), the extraction grid (4) seen from the plasma chamber (3) is a raised structure and/or has a mesh width of the extraction grid (4) The width is greater than the thickness of the extraction grid (4) and the space charge region of the plasma.

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