TWI410184B - - Google Patents

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Publication number
TWI410184B
TWI410184B TW99120423A TW99120423A TWI410184B TW I410184 B TWI410184 B TW I410184B TW 99120423 A TW99120423 A TW 99120423A TW 99120423 A TW99120423 A TW 99120423A TW I410184 B TWI410184 B TW I410184B
Authority
TW
Taiwan
Prior art keywords
board
cathode
backboard
unit
frame
Prior art date
Application number
TW99120423A
Other languages
English (en)
Chinese (zh)
Other versions
TW201101937A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to TW99120423A priority Critical patent/TW201101937A/zh
Publication of TW201101937A publication Critical patent/TW201101937A/zh
Application granted granted Critical
Publication of TWI410184B publication Critical patent/TWI410184B/zh

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  • Plasma Technology (AREA)
TW99120423A 2010-06-23 2010-06-23 High-density electrode device for plasma surface treatment TW201101937A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW99120423A TW201101937A (en) 2010-06-23 2010-06-23 High-density electrode device for plasma surface treatment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW99120423A TW201101937A (en) 2010-06-23 2010-06-23 High-density electrode device for plasma surface treatment

Publications (2)

Publication Number Publication Date
TW201101937A TW201101937A (en) 2011-01-01
TWI410184B true TWI410184B (de) 2013-09-21

Family

ID=44837171

Family Applications (1)

Application Number Title Priority Date Filing Date
TW99120423A TW201101937A (en) 2010-06-23 2010-06-23 High-density electrode device for plasma surface treatment

Country Status (1)

Country Link
TW (1) TW201101937A (de)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200732505A (en) * 2005-11-25 2007-09-01 Sharp Kk Plasma processing apparatus and plasma processing method
TW200943364A (en) * 2008-04-03 2009-10-16 Tes Co Ltd Plasma processing apparatus
TW201010519A (en) * 2008-08-21 2010-03-01 Atomic Energy Council RF hollow cathode plasma generator

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200732505A (en) * 2005-11-25 2007-09-01 Sharp Kk Plasma processing apparatus and plasma processing method
TW200943364A (en) * 2008-04-03 2009-10-16 Tes Co Ltd Plasma processing apparatus
TW201010519A (en) * 2008-08-21 2010-03-01 Atomic Energy Council RF hollow cathode plasma generator

Also Published As

Publication number Publication date
TW201101937A (en) 2011-01-01

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