TWI426295B - 反射折射投影光學系統、投影光學裝置以及掃描型曝光裝置 - Google Patents

反射折射投影光學系統、投影光學裝置以及掃描型曝光裝置 Download PDF

Info

Publication number: TWI426295B
Authority: TW; Taiwan
Prior art keywords: projection optical; optical system; lens group; lens; mask
Prior art date: 2007-03-05

Application number

TW096148966A

Other languages

English (en)

Chinese (zh)

Other versions

TW200844674A (en

Inventor

畑田仁志

熊澤雅人

Original Assignee

尼康股份有限公司

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2007-03-05

Filing date

2007-12-20

Publication date

2014-02-11

2007-12-20 Application filed by 尼康股份有限公司 filed Critical 尼康股份有限公司

2008-11-16 Publication of TW200844674A publication Critical patent/TW200844674A/zh

2014-02-11 Application granted granted Critical

2014-02-11 Publication of TWI426295B publication Critical patent/TWI426295B/zh

Links

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239000011248 coating agent Substances 0.000 description 3
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239000010409 thin film Substances 0.000 description 3
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Classifications

- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0892—Catadioptric systems specially adapted for the UV
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Optics & Photonics (AREA)
Lenses (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Lens Barrels (AREA)
Microscoopes, Condenser (AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

TW096148966A 2007-03-05 2007-12-20 反射折射投影光學系統、投影光學裝置以及掃描型曝光裝置 TWI426295B (zh)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP2007054882		2007-03-05

Publications (2)

Publication Number	Publication Date
TW200844674A TW200844674A (en)	2008-11-16
TWI426295B true TWI426295B (zh)	2014-02-11

Family

ID=39738019

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
TW096148966A TWI426295B (zh)	2007-03-05	2007-12-20	反射折射投影光學系統、投影光學裝置以及掃描型曝光裝置

Country Status (3)

Country	Link
JP (1)	JP5110076B2 (ja)
TW (1)	TWI426295B (ja)
WO (1)	WO2008108123A1 (ja)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US8130364B2 (en) *	2007-01-04	2012-03-06	Nikon Corporation	Projection optical apparatus, exposure method and apparatus, photomask, and device and photomask manufacturing method
JP2013219089A (ja) *	2012-04-04	2013-10-24	Canon Inc	光学系、露光装置、およびデバイス製造方法
WO2017191777A1 (ja) *	2016-05-06	2017-11-09	株式会社ニコン	ビーム走査装置および描画装置
CN111279244B (zh) *	2017-10-25	2022-03-18	株式会社尼康	图案描绘装置
EP4125165B1 (de) *	2021-07-28	2023-11-01	TRUMPF Lasersystems for Semiconductor Manufacturing GmbH	Fokussiereinrichtung mit einer parallel oder deckungsgleich zu einer targetebene verlaufenden bildebene
JP7623915B2 (ja) *	2021-09-14	2025-01-29	株式会社アドテックエンジニアリング	直描式露光装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH06242379A (ja) *	1992-12-24	1994-09-02	Nikon Corp	反射屈折縮小投影光学系
JPH0821955A (ja) *	1994-07-07	1996-01-23	Nikon Corp	反射屈折縮小投影光学系
JPH08188298A (ja) *	1995-01-10	1996-07-23	Brother Ind Ltd	光学式センサの駆動回路
JPH11265848A (ja) *	1997-12-20	1999-09-28	Carl Zeiss:Fa	投影露光装置及び露光方法
JP2006184709A (ja) *	2004-12-28	2006-07-13	Nikon Corp	結像光学系、露光装置及びマイクロデバイスの製造方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH05188298A (ja) *	1991-08-05	1993-07-30	Nikon Corp	反射屈折縮小投影光学系

2007
- 2007-12-20 TW TW096148966A patent/TWI426295B/zh active
2008
- 2008-01-30 WO PCT/JP2008/051358 patent/WO2008108123A1/ja not_active Ceased
- 2008-01-30 JP JP2009502481A patent/JP5110076B2/ja active Active

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH06242379A (ja) *	1992-12-24	1994-09-02	Nikon Corp	反射屈折縮小投影光学系
JPH0821955A (ja) *	1994-07-07	1996-01-23	Nikon Corp	反射屈折縮小投影光学系
JPH08188298A (ja) *	1995-01-10	1996-07-23	Brother Ind Ltd	光学式センサの駆動回路
JPH11265848A (ja) *	1997-12-20	1999-09-28	Carl Zeiss:Fa	投影露光装置及び露光方法
JP2006184709A (ja) *	2004-12-28	2006-07-13	Nikon Corp	結像光学系、露光装置及びマイクロデバイスの製造方法

Also Published As

Publication number	Publication date
WO2008108123A1 (ja)	2008-09-12
TW200844674A (en)	2008-11-16
JP5110076B2 (ja)	2012-12-26
JPWO2008108123A1 (ja)	2010-06-10

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