TWI447948B - - Google Patents

Info

Publication number
TWI447948B
TWI447948B TW100131300A TW100131300A TWI447948B TW I447948 B TWI447948 B TW I447948B TW 100131300 A TW100131300 A TW 100131300A TW 100131300 A TW100131300 A TW 100131300A TW I447948 B TWI447948 B TW I447948B
Authority
TW
Taiwan
Application number
TW100131300A
Other languages
Chinese (zh)
Other versions
TW201310692A (zh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to TW100131300A priority Critical patent/TW201310692A/zh
Priority to CN2012103141089A priority patent/CN102969409A/zh
Publication of TW201310692A publication Critical patent/TW201310692A/zh
Application granted granted Critical
Publication of TWI447948B publication Critical patent/TWI447948B/zh

Links

TW100131300A 2011-08-31 2011-08-31 Led之基板重製方法 TW201310692A (zh)

Priority Applications (2)

Application Number Priority Date Filing Date Title
TW100131300A TW201310692A (zh) 2011-08-31 2011-08-31 Led之基板重製方法
CN2012103141089A CN102969409A (zh) 2011-08-31 2012-08-30 Led的基板重制方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW100131300A TW201310692A (zh) 2011-08-31 2011-08-31 Led之基板重製方法

Publications (2)

Publication Number Publication Date
TW201310692A TW201310692A (zh) 2013-03-01
TWI447948B true TWI447948B (fr) 2014-08-01

Family

ID=47799425

Family Applications (1)

Application Number Title Priority Date Filing Date
TW100131300A TW201310692A (zh) 2011-08-31 2011-08-31 Led之基板重製方法

Country Status (2)

Country Link
CN (1) CN102969409A (fr)
TW (1) TW201310692A (fr)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6706636B2 (en) * 2002-02-13 2004-03-16 Renesas Technology Corp. Method of regenerating semiconductor wafer
JP3605927B2 (ja) * 1996-02-28 2004-12-22 株式会社神戸製鋼所 ウエハーまたは基板材料の再生方法
TW200524031A (en) * 2003-09-19 2005-07-16 Mimasu Semiconductor Ind Co Silicon wafer reclamation method and reclaimed wafer
TW200537611A (en) * 2004-02-09 2005-11-16 Mitsubishi Chem Corp Substrate cleaning liquid for semiconductor device and cleaning method
TW200805464A (en) * 2006-07-12 2008-01-16 Kinik Co Manufacturing process of recycled wafer
TW200913044A (en) * 2007-09-03 2009-03-16 Matsushita Electric Industrial Co Ltd Method for reworking a wafer and apparatus for reworking a wafer

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5923946A (en) * 1997-04-17 1999-07-13 Cree Research, Inc. Recovery of surface-ready silicon carbide substrates
CN101471403A (zh) * 2007-12-27 2009-07-01 深圳市方大国科光电技术有限公司 Led报废片再利用方法
JP2011066355A (ja) * 2009-09-18 2011-03-31 Showa Denko Kk 再生基板の製造方法、再生基板、窒化物半導体素子及びランプ

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3605927B2 (ja) * 1996-02-28 2004-12-22 株式会社神戸製鋼所 ウエハーまたは基板材料の再生方法
US6706636B2 (en) * 2002-02-13 2004-03-16 Renesas Technology Corp. Method of regenerating semiconductor wafer
TW200524031A (en) * 2003-09-19 2005-07-16 Mimasu Semiconductor Ind Co Silicon wafer reclamation method and reclaimed wafer
TW200537611A (en) * 2004-02-09 2005-11-16 Mitsubishi Chem Corp Substrate cleaning liquid for semiconductor device and cleaning method
TW200805464A (en) * 2006-07-12 2008-01-16 Kinik Co Manufacturing process of recycled wafer
TW200913044A (en) * 2007-09-03 2009-03-16 Matsushita Electric Industrial Co Ltd Method for reworking a wafer and apparatus for reworking a wafer

Also Published As

Publication number Publication date
CN102969409A (zh) 2013-03-13
TW201310692A (zh) 2013-03-01

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees