TWI451585B - 用於網板印刷圖案對準之強化視覺系統 - Google Patents

用於網板印刷圖案對準之強化視覺系統 Download PDF

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Publication number
TWI451585B
TWI451585B TW099120279A TW99120279A TWI451585B TW I451585 B TWI451585 B TW I451585B TW 099120279 A TW099120279 A TW 099120279A TW 99120279 A TW99120279 A TW 99120279A TW I451585 B TWI451585 B TW I451585B
Authority
TW
Taiwan
Prior art keywords
substrate
solar cell
doped region
forming process
cell forming
Prior art date
Application number
TW099120279A
Other languages
English (en)
Chinese (zh)
Other versions
TW201121086A (en
Inventor
卡立亞魯馬可
韋德曼堤摩西
巴西尼安德立亞
朴善欽
方洪斌
張震華
Original Assignee
應用材料股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 應用材料股份有限公司 filed Critical 應用材料股份有限公司
Publication of TW201121086A publication Critical patent/TW201121086A/zh
Application granted granted Critical
Publication of TWI451585B publication Critical patent/TWI451585B/zh

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Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/20Electrodes
    • H10F77/206Electrodes for devices having potential barriers
    • H10F77/211Electrodes for devices having potential barriers for photovoltaic cells
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501Semiconductor wafers
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956Inspecting patterns on the surface of objects
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F10/00Individual photovoltaic cells, e.g. solar cells
    • H10F10/10Individual photovoltaic cells, e.g. solar cells having potential barriers
    • H10F10/14Photovoltaic cells having only PN homojunction potential barriers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00Manufacture or treatment of devices covered by this subclass
    • H10F71/121The active layers comprising only Group IV materials
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/50Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for positioning, orientation or alignment
    • H10P72/53Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for positioning, orientation or alignment using optical controlling means
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M1/00Inking and printing with a printer's forme
    • B41M1/12Stencil printing; Silk-screen printing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41NPRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00Printing plates or foils; Materials therefor
    • B41N1/24Stencils; Stencil materials; Carriers therefor
    • B41N1/248Mechanical details, e.g. fixation holes, reinforcement or guiding means; Perforation lines; Ink holding means; Visually or otherwise detectable marking means; Stencil units
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/547Monocrystalline silicon PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Photovoltaic Devices (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Screen Printers (AREA)
TW099120279A 2009-06-22 2010-06-22 用於網板印刷圖案對準之強化視覺系統 TWI451585B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
ITUD2009A000119A IT1394647B1 (it) 2009-06-22 2009-06-22 Sistema di visione migliorato per l'allineamento di uno schema di stampa serigrafica

Publications (2)

Publication Number Publication Date
TW201121086A TW201121086A (en) 2011-06-16
TWI451585B true TWI451585B (zh) 2014-09-01

Family

ID=42110952

Family Applications (1)

Application Number Title Priority Date Filing Date
TW099120279A TWI451585B (zh) 2009-06-22 2010-06-22 用於網板印刷圖案對準之強化視覺系統

Country Status (2)

Country Link
IT (1) IT1394647B1 (it)
TW (1) TWI451585B (it)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI476874B (zh) * 2011-07-29 2015-03-11 Hon Hai Prec Ind Co Ltd 具有導電線路的玻璃板及其製造方法
TWI424584B (zh) * 2011-11-30 2014-01-21 友達光電股份有限公司 製作太陽能電池之方法
CN108674010B (zh) * 2018-06-28 2024-06-28 无锡奥特维科技股份有限公司 丝网印刷设备、叠片机及丝网印刷方法
CN113905561B (zh) * 2021-10-11 2023-02-24 Oppo广东移动通信有限公司 具有纹理图案的壳体及其加工方法、电子设备

Citations (10)

* Cited by examiner, † Cited by third party
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US5709905A (en) * 1997-01-28 1998-01-20 Motorola, Inc. Apparatus and method for automatic monitoring and control of stencil printing
JP2003197932A (ja) * 2001-12-25 2003-07-11 Kyocera Corp 太陽電池素子およびその製造方法
US6815001B1 (en) * 1999-02-08 2004-11-09 Canon Kabushiki Kaisha Electronic device, method for producing electron source and image forming device, and apparatus for producing electronic device
JP2005011886A (ja) * 2003-06-17 2005-01-13 Sharp Corp 太陽電池および太陽電池の製造方法
US7171897B2 (en) * 2003-06-05 2007-02-06 Georgia Tech Research Corporation System and methods for data-driven control of manufacturing processes
TW200818526A (en) * 2006-10-04 2008-04-16 Gigastorage Corp Method for forming a solar cell
TW200818527A (en) * 2006-10-04 2008-04-16 Gigastorage Corp Solar cell
JP2008139251A (ja) * 2006-12-05 2008-06-19 Toshiba Corp イオン注入パターン検出方法
TW200903820A (en) * 2007-05-11 2009-01-16 Jusung Eng Co Ltd Method, apparatus and system of manufacturing solar cell
US7547362B2 (en) * 2002-12-18 2009-06-16 Lg Display Co., Ltd. Dispenser for liquid crystal display panel and method for controlling gap between substrate and nozzle using the same

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Publication number Priority date Publication date Assignee Title
JPH10284359A (ja) * 1997-04-11 1998-10-23 Mitsubishi Electric Corp ウエハの認識装置及びウエハの認識方法
DE10146879A1 (de) * 2001-09-26 2003-04-17 Thermosensorik Gmbh Verfahren zum Nachweis und zur Lokalisierung von Rissen in Silizium-Solarzellen und Silizium-Scheiben
DE102005061785B4 (de) * 2005-12-23 2008-04-03 Basler Ag Verfahren und Vorrichtung zum Erkennen von Rissen in Silizium-Wafern
DE102007006525B4 (de) * 2007-02-06 2009-05-14 Basler Ag Verfahren und Vorrichtung zur Detektierung von Defekten
DE102007057011B4 (de) * 2007-11-23 2011-04-28 Pi Photovoltaik-Institut Berlin Ag Erfassungsvorrichtung und Verfahren zum Erfassen einer Beschädigung einer Solarzelle mittels Photolumineszenz
US8215473B2 (en) * 2008-05-21 2012-07-10 Applied Materials, Inc. Next generation screen printing system
WO2010009297A2 (en) * 2008-07-16 2010-01-21 Applied Materials, Inc. Hybrid heterojunction solar cell fabrication using a doping layer mask

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5709905A (en) * 1997-01-28 1998-01-20 Motorola, Inc. Apparatus and method for automatic monitoring and control of stencil printing
US6815001B1 (en) * 1999-02-08 2004-11-09 Canon Kabushiki Kaisha Electronic device, method for producing electron source and image forming device, and apparatus for producing electronic device
JP2003197932A (ja) * 2001-12-25 2003-07-11 Kyocera Corp 太陽電池素子およびその製造方法
US7547362B2 (en) * 2002-12-18 2009-06-16 Lg Display Co., Ltd. Dispenser for liquid crystal display panel and method for controlling gap between substrate and nozzle using the same
US7171897B2 (en) * 2003-06-05 2007-02-06 Georgia Tech Research Corporation System and methods for data-driven control of manufacturing processes
JP2005011886A (ja) * 2003-06-17 2005-01-13 Sharp Corp 太陽電池および太陽電池の製造方法
TW200818526A (en) * 2006-10-04 2008-04-16 Gigastorage Corp Method for forming a solar cell
TW200818527A (en) * 2006-10-04 2008-04-16 Gigastorage Corp Solar cell
JP2008139251A (ja) * 2006-12-05 2008-06-19 Toshiba Corp イオン注入パターン検出方法
TW200903820A (en) * 2007-05-11 2009-01-16 Jusung Eng Co Ltd Method, apparatus and system of manufacturing solar cell

Also Published As

Publication number Publication date
IT1394647B1 (it) 2012-07-05
TW201121086A (en) 2011-06-16
ITUD20090119A1 (it) 2010-12-23

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