TWI466930B - 多孔板之製造方法及使用該方法製得之多孔板 - Google Patents

多孔板之製造方法及使用該方法製得之多孔板 Download PDF

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Publication number
TWI466930B
TWI466930B TW99118909A TW99118909A TWI466930B TW I466930 B TWI466930 B TW I466930B TW 99118909 A TW99118909 A TW 99118909A TW 99118909 A TW99118909 A TW 99118909A TW I466930 B TWI466930 B TW I466930B
Authority
TW
Taiwan
Prior art keywords
polymer resin
supercritical fluid
supercritical
resin sheet
fluid extraction
Prior art date
Application number
TW99118909A
Other languages
English (en)
Chinese (zh)
Other versions
TW201109375A (en
Inventor
Seong-Uk Jeong
Byeong-In Ahn
Young-Ji Tae
Keong-Yeon Yoon
Original Assignee
Lg Chemical Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lg Chemical Ltd filed Critical Lg Chemical Ltd
Publication of TW201109375A publication Critical patent/TW201109375A/zh
Application granted granted Critical
Publication of TWI466930B publication Critical patent/TWI466930B/zh

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C44/00—Shaping by internal pressure generated in the material, e.g. swelling or foaming ; Producing porous or cellular expanded plastics articles
    • B29C44/34—Auxiliary operations
    • B29C44/3469—Cell or pore nucleation
    • B29C44/348—Cell or pore nucleation by regulating the temperature and/or the pressure, e.g. suppression of foaming until the pressure is rapidly decreased
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18—Manufacture of films or sheets
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J9/00—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof
    • C08J9/26—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof by elimination of a solid phase from a macromolecular composition or article, e.g. leaching out
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2201/00—Foams characterised by the foaming process
    • C08J2201/04—Foams characterised by the foaming process characterised by the elimination of a liquid or solid component, e.g. precipitation, leaching out, evaporation
    • C08J2201/042—Elimination of an organic solid phase
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2203/00—Foams characterized by the expanding agent
    • C08J2203/08—Supercritical fluid
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00—Technologies relating to chemical industry
    • Y02P20/50—Improvements relating to the production of bulk chemicals
    • Y02P20/54—Improvements relating to the production of bulk chemicals using solvents, e.g. supercritical solvents or ionic liquids

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Manufacture Of Porous Articles, And Recovery And Treatment Of Waste Products (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Casting Or Compression Moulding Of Plastics Or The Like (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
TW99118909A 2009-06-10 2010-06-10 多孔板之製造方法及使用該方法製得之多孔板 TWI466930B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR20090051598 2009-06-10

Publications (2)

Publication Number Publication Date
TW201109375A TW201109375A (en) 2011-03-16
TWI466930B true TWI466930B (zh) 2015-01-01

Family

ID=43309376

Family Applications (1)

Application Number Title Priority Date Filing Date
TW99118909A TWI466930B (zh) 2009-06-10 2010-06-10 多孔板之製造方法及使用該方法製得之多孔板

Country Status (5)

Country Link
US (1) US20120085038A1 (ko)
JP (1) JP5748747B2 (ko)
KR (1) KR101234313B1 (ko)
TW (1) TWI466930B (ko)
WO (1) WO2010143899A2 (ko)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015026614A1 (en) * 2013-08-22 2015-02-26 Cabot Microelectronics Corporation Polishing pad with porous interface and solid core, and related apparatus and methods
KR102398130B1 (ko) * 2014-10-31 2022-05-13 주식회사 쿠라레 연마층용 비다공성 성형체, 연마 패드 및 연마 방법
KR102085088B1 (ko) * 2017-11-28 2020-03-05 재단법인 대구경북첨단의료산업진흥재단 다공성 생체친화성 폴리머 구조체의 제조방법 및 이에 의해 제조된 다공성 생체친화성 폴리머 구조체
KR101998309B1 (ko) * 2017-11-30 2019-07-09 서울대학교 산학협력단 초임계 또는 아임계 유체를 이용한 멀티스케일 다공성 3차원 구조체 제조방법과 그 멀티스케일 다공성 3차원 구조체
EP3670591B1 (en) 2018-12-06 2024-10-02 TSRC Corporation Polymer composition, foam and method thereof
CN114670119B (zh) * 2021-04-27 2024-01-12 宁波赢伟泰科新材料有限公司 一种提高抛光效率的化学机械抛光垫及其制备方法
CN113968034A (zh) * 2021-11-03 2022-01-25 特步(中国)有限公司 发泡编织元件的制作方法和发泡鞋面的制作方法
CN114149611A (zh) * 2021-11-09 2022-03-08 安徽省众望科希盟科技有限公司 一种使用聚酰胺酸改性膨化聚四氟乙烯的改性方法
JP7902020B2 (ja) * 2022-05-30 2026-08-07 ニッタ・デュポン株式会社 研磨パッド

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006131881A (ja) * 2004-09-13 2006-05-25 Nitto Denko Corp 多孔質体の製造方法、多孔質体、反射防止膜、反射防止シートの製造方法及び反射防止シート

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1996039456A1 (en) * 1995-06-06 1996-12-12 The University Of North Carolina At Chapel Hill Process for the preparation of polyester in carbon dioxide
US6558607B1 (en) * 1999-09-30 2003-05-06 University Of Massachusetts Crystallization of constrained polymers
JP2001323099A (ja) * 2000-05-15 2001-11-20 Nitto Denko Corp 感光性樹脂組成物、多孔質樹脂、回路基板および回路付サスペンション基板
US20050276967A1 (en) * 2002-05-23 2005-12-15 Cabot Microelectronics Corporation Surface textured microporous polishing pads
US6913517B2 (en) * 2002-05-23 2005-07-05 Cabot Microelectronics Corporation Microporous polishing pads
US7166247B2 (en) * 2002-06-24 2007-01-23 Micron Technology, Inc. Foamed mechanical planarization pads made with supercritical fluid
US7435165B2 (en) * 2002-10-28 2008-10-14 Cabot Microelectronics Corporation Transparent microporous materials for CMP
US7267607B2 (en) * 2002-10-28 2007-09-11 Cabot Microelectronics Corporation Transparent microporous materials for CMP
US7311862B2 (en) * 2002-10-28 2007-12-25 Cabot Microelectronics Corporation Method for manufacturing microporous CMP materials having controlled pore size
US6773473B2 (en) * 2002-11-12 2004-08-10 Saint-Gobain Abrasives Technology Company Supercritical fluid extraction
JP4289089B2 (ja) * 2003-09-02 2009-07-01 東洋紡績株式会社 ポリエチレン多孔体の製造方法
JP4121989B2 (ja) * 2004-09-24 2008-07-23 大日本印刷株式会社 熱転写受像シート及びその製造方法
JP4646199B2 (ja) * 2004-09-29 2011-03-09 日東電工株式会社 多孔質膜の製造方法
US20060211840A1 (en) * 2005-03-20 2006-09-21 Aspen Aerogels Inc. Polyurea aerogels
CN102292384A (zh) * 2008-11-24 2011-12-21 康宁股份有限公司 3d细胞培养制品及方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006131881A (ja) * 2004-09-13 2006-05-25 Nitto Denko Corp 多孔質体の製造方法、多孔質体、反射防止膜、反射防止シートの製造方法及び反射防止シート

Also Published As

Publication number Publication date
WO2010143899A2 (ko) 2010-12-16
TW201109375A (en) 2011-03-16
JP5748747B2 (ja) 2015-07-15
JP2012529553A (ja) 2012-11-22
US20120085038A1 (en) 2012-04-12
WO2010143899A3 (ko) 2011-03-31
WO2010143899A9 (ko) 2011-05-19
KR101234313B1 (ko) 2013-02-18
KR20100132933A (ko) 2010-12-20

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