TWI486307B - 用於製造矽烷之方法及系統 - Google Patents

用於製造矽烷之方法及系統 Download PDF

Info

Publication number: TWI486307B
Authority: TW; Taiwan
Prior art keywords: alkaline earth; earth metal; alkali metal; halide; decane
Prior art date: 2010-12-23

Application number

TW102114091A

Other languages

English (en)

Chinese (zh)

Other versions

TW201332893A (zh

Inventor

Puneet Gupta

Henry Frank Erk

Alexis Grabbe

Original Assignee

Memc Electronic Materials

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2010-12-23

Filing date

2011-12-20

Publication date

2015-06-01

2010-12-23 Priority claimed from US12/978,209 external-priority patent/US8821825B2/en

2010-12-23 Priority claimed from US12/978,189 external-priority patent/US8388914B2/en

2011-12-20 Application filed by Memc Electronic Materials filed Critical Memc Electronic Materials

2013-08-16 Publication of TW201332893A publication Critical patent/TW201332893A/zh

2015-06-01 Application granted granted Critical

2015-06-01 Publication of TWI486307B publication Critical patent/TWI486307B/zh

Links

238000000034 method Methods 0.000 title claims description 126
BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 title description 2
229910000077 silane Inorganic materials 0.000 title description 2
DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 claims description 297
229910052784 alkaline earth metal Inorganic materials 0.000 claims description 220
150000001340 alkali metals Chemical class 0.000 claims description 211
150000001342 alkaline earth metals Chemical class 0.000 claims description 181
239000007789 gas Substances 0.000 claims description 164
229910052783 alkali metal Inorganic materials 0.000 claims description 163
-1 ruthenium halide Chemical class 0.000 claims description 146
229910052707 ruthenium Inorganic materials 0.000 claims description 113
229910052736 halogen Inorganic materials 0.000 claims description 97
150000002367 halogens Chemical class 0.000 claims description 97
KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 92
UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 82
229910052739 hydrogen Inorganic materials 0.000 claims description 81
239000001257 hydrogen Substances 0.000 claims description 81
239000002904 solvent Substances 0.000 claims description 78
150000003839 salts Chemical class 0.000 claims description 57
229910001615 alkaline earth metal halide Chemical class 0.000 claims description 55
239000012433 hydrogen halide Substances 0.000 claims description 50
229910000039 hydrogen halide Inorganic materials 0.000 claims description 50
229910001508 alkali metal halide Inorganic materials 0.000 claims description 48
239000002994 raw material Substances 0.000 claims description 47
239000000203 mixture Substances 0.000 claims description 42
239000003513 alkali Substances 0.000 claims description 37
150000004678 hydrides Chemical class 0.000 claims description 37
238000006243 chemical reaction Methods 0.000 claims description 25
GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 25
229910052735 hafnium Inorganic materials 0.000 claims description 25
238000004519 manufacturing process Methods 0.000 claims description 25
YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 24
229910052732 germanium Inorganic materials 0.000 claims description 24
230000008569 process Effects 0.000 claims description 22
239000012535 impurity Substances 0.000 claims description 21
239000000460 chlorine Substances 0.000 claims description 20
238000005658 halogenation reaction Methods 0.000 claims description 19
230000026030 halogenation Effects 0.000 claims description 18
229910052787 antimony Inorganic materials 0.000 claims description 17
239000011734 sodium Substances 0.000 claims description 17
DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 15
229910052801 chlorine Inorganic materials 0.000 claims description 15
150000001875 compounds Chemical class 0.000 claims description 15
229910052708 sodium Inorganic materials 0.000 claims description 15
ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 14
CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 claims description 12
239000003054 catalyst Substances 0.000 claims description 12
239000011541 reaction mixture Substances 0.000 claims description 12
DIOQZVSQGTUSAI-NJFSPNSNSA-N decane Chemical group CCCCCCCCC[14CH3] DIOQZVSQGTUSAI-NJFSPNSNSA-N 0.000 claims description 11
239000002184 metal Substances 0.000 claims description 11
VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 claims description 10
229910052751 metal Inorganic materials 0.000 claims description 10
229910001507 metal halide Inorganic materials 0.000 claims description 10
238000007323 disproportionation reaction Methods 0.000 claims description 9
238000005868 electrolysis reaction Methods 0.000 claims description 9
238000002844 melting Methods 0.000 claims description 9
230000008018 melting Effects 0.000 claims description 9
150000005309 metal halides Chemical class 0.000 claims description 9
150000003303 ruthenium Chemical class 0.000 claims description 9
239000011575 calcium Substances 0.000 claims description 7
UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 claims description 6
PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims description 6
239000002841 Lewis acid Substances 0.000 claims description 6
WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims description 6
239000001110 calcium chloride Substances 0.000 claims description 6
229910001628 calcium chloride Inorganic materials 0.000 claims description 6
238000001816 cooling Methods 0.000 claims description 6
SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 claims description 6
239000011737 fluorine Substances 0.000 claims description 6
229910052731 fluorine Inorganic materials 0.000 claims description 6
150000007517 lewis acids Chemical class 0.000 claims description 6
229910000029 sodium carbonate Inorganic materials 0.000 claims description 6
WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 5
OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 claims description 5
WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims description 5
FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 5
ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims description 5
GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 5
229910052794 bromium Inorganic materials 0.000 claims description 5
229910052791 calcium Inorganic materials 0.000 claims description 5
PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 claims description 5
229910052744 lithium Inorganic materials 0.000 claims description 5
239000011777 magnesium Substances 0.000 claims description 5
229910052749 magnesium Inorganic materials 0.000 claims description 5
239000002245 particle Substances 0.000 claims description 5
229910052700 potassium Inorganic materials 0.000 claims description 5
239000011591 potassium Substances 0.000 claims description 5
VOITXYVAKOUIBA-UHFFFAOYSA-N triethylaluminium Chemical compound CC[Al](CC)CC VOITXYVAKOUIBA-UHFFFAOYSA-N 0.000 claims description 5
150000004820 halides Chemical class 0.000 claims description 4
239000002585 base Substances 0.000 claims description 3
229910052792 caesium Inorganic materials 0.000 claims description 3
TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 claims description 2
229910052703 rhodium Inorganic materials 0.000 claims description 2
239000010948 rhodium Substances 0.000 claims description 2
MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims description 2
LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 claims 10
238000001704 evaporation Methods 0.000 claims 7
229910052684 Cerium Inorganic materials 0.000 claims 4
229910052788 barium Inorganic materials 0.000 claims 4
DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 claims 4
229910052797 bismuth Inorganic materials 0.000 claims 4
230000008020 evaporation Effects 0.000 claims 4
239000010887 waste solvent Substances 0.000 claims 4
GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 claims 3
238000007599 discharging Methods 0.000 claims 3
229910052747 lanthanoid Inorganic materials 0.000 claims 2
150000002602 lanthanoids Chemical class 0.000 claims 2
239000007810 chemical reaction solvent Substances 0.000 claims 1
239000013078 crystal Substances 0.000 claims 1
150000002290 germanium Chemical class 0.000 claims 1
VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims 1
230000002140 halogenating effect Effects 0.000 claims 1
229910052987 metal hydride Inorganic materials 0.000 claims 1
150000004681 metal hydrides Chemical class 0.000 claims 1
230000001172 regenerating effect Effects 0.000 claims 1
OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 18
FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 12
150000002431 hydrogen Chemical class 0.000 description 11
229910052799 carbon Inorganic materials 0.000 description 9
239000007788 liquid Substances 0.000 description 7
239000011780 sodium chloride Substances 0.000 description 6
238000012546 transfer Methods 0.000 description 6
XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 5
238000004821 distillation Methods 0.000 description 5
239000007787 solid Substances 0.000 description 5
OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
229910021420 polycrystalline silicon Inorganic materials 0.000 description 4
229920005591 polysilicon Polymers 0.000 description 4
238000000926 separation method Methods 0.000 description 4
RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
229910003902 SiCl 4 Inorganic materials 0.000 description 3
XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
238000013019 agitation Methods 0.000 description 3
229910045601 alloy Inorganic materials 0.000 description 3
239000000956 alloy Substances 0.000 description 3
239000001307 helium Substances 0.000 description 3
229910052734 helium Inorganic materials 0.000 description 3
SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 3
229910052742 iron Inorganic materials 0.000 description 3
239000000463 material Substances 0.000 description 3
229920000642 polymer Polymers 0.000 description 3
238000000746 purification Methods 0.000 description 3
238000004064 recycling Methods 0.000 description 3
229910052710 silicon Inorganic materials 0.000 description 3
239000010703 silicon Substances 0.000 description 3
239000000126 substance Substances 0.000 description 3
238000005979 thermal decomposition reaction Methods 0.000 description 3
HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
229910000831 Steel Inorganic materials 0.000 description 2
229910052782 aluminium Inorganic materials 0.000 description 2
238000009835 boiling Methods 0.000 description 2
229910052796 boron Inorganic materials 0.000 description 2
239000006227 byproduct Substances 0.000 description 2
239000007795 chemical reaction product Substances 0.000 description 2
229960001701 chloroform Drugs 0.000 description 2
238000010924 continuous production Methods 0.000 description 2
238000010586 diagram Methods 0.000 description 2
239000000374 eutectic mixture Substances 0.000 description 2
238000001914 filtration Methods 0.000 description 2
239000003960 organic solvent Substances 0.000 description 2
239000011574 phosphorus Substances 0.000 description 2
229910052698 phosphorus Inorganic materials 0.000 description 2
238000012545 processing Methods 0.000 description 2
239000000047 product Substances 0.000 description 2
238000010926 purge Methods 0.000 description 2
239000010453 quartz Substances 0.000 description 2
239000004065 semiconductor Substances 0.000 description 2
239000002002 slurry Substances 0.000 description 2
239000010959 steel Substances 0.000 description 2
238000003860 storage Methods 0.000 description 2
ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
229910000975 Carbon steel Inorganic materials 0.000 description 1
VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 description 1
229920002449 FKM Polymers 0.000 description 1
239000005909 Kieselgur Substances 0.000 description 1
OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
229910004298 SiO 2 Inorganic materials 0.000 description 1
239000004809 Teflon Substances 0.000 description 1
229920006362 Teflon® Polymers 0.000 description 1
229920006172 Tetrafluoroethylene propylene Polymers 0.000 description 1
150000001335 aliphatic alkanes Chemical class 0.000 description 1
229910001413 alkali metal ion Inorganic materials 0.000 description 1
229910001420 alkaline earth metal ion Inorganic materials 0.000 description 1
238000013459 approach Methods 0.000 description 1
238000010923 batch production Methods 0.000 description 1
230000003139 buffering effect Effects 0.000 description 1
150000001722 carbon compounds Chemical class 0.000 description 1
239000010962 carbon steel Substances 0.000 description 1
238000005119 centrifugation Methods 0.000 description 1
SLLGVCUQYRMELA-UHFFFAOYSA-N chlorosilicon Chemical compound Cl[Si] SLLGVCUQYRMELA-UHFFFAOYSA-N 0.000 description 1
238000009833 condensation Methods 0.000 description 1
230000005494 condensation Effects 0.000 description 1
239000000470 constituent Substances 0.000 description 1
238000010276 construction Methods 0.000 description 1
239000000498 cooling water Substances 0.000 description 1
238000005260 corrosion Methods 0.000 description 1
230000007797 corrosion Effects 0.000 description 1
230000001419 dependent effect Effects 0.000 description 1
238000013461 design Methods 0.000 description 1
238000011161 development Methods 0.000 description 1
230000018109 developmental process Effects 0.000 description 1
238000004090 dissolution Methods 0.000 description 1
239000000428 dust Substances 0.000 description 1
238000011234 economic evaluation Methods 0.000 description 1
238000005265 energy consumption Methods 0.000 description 1
230000007613 environmental effect Effects 0.000 description 1
239000012467 final product Substances 0.000 description 1
239000011521 glass Substances 0.000 description 1
239000010439 graphite Substances 0.000 description 1
229910002804 graphite Inorganic materials 0.000 description 1
230000005484 gravity Effects 0.000 description 1
150000002366 halogen compounds Chemical class 0.000 description 1
229910000856 hastalloy Inorganic materials 0.000 description 1
150000002430 hydrocarbons Chemical class 0.000 description 1
229910001026 inconel Inorganic materials 0.000 description 1
229910052500 inorganic mineral Inorganic materials 0.000 description 1
150000008040 ionic compounds Chemical class 0.000 description 1
239000002608 ionic liquid Substances 0.000 description 1
229910052746 lanthanum Inorganic materials 0.000 description 1
229910001510 metal chloride Inorganic materials 0.000 description 1
239000007769 metal material Substances 0.000 description 1
150000002739 metals Chemical class 0.000 description 1
239000011707 mineral Substances 0.000 description 1
239000002808 molecular sieve Substances 0.000 description 1
229910052759 nickel Inorganic materials 0.000 description 1
239000003921 oil Substances 0.000 description 1
230000008520 organization Effects 0.000 description 1
239000007800 oxidant agent Substances 0.000 description 1
230000003647 oxidation Effects 0.000 description 1
238000007254 oxidation reaction Methods 0.000 description 1
238000005192 partition Methods 0.000 description 1
238000006116 polymerization reaction Methods 0.000 description 1
238000002360 preparation method Methods 0.000 description 1
238000000066 reactive distillation Methods 0.000 description 1
230000009467 reduction Effects 0.000 description 1
230000008929 regeneration Effects 0.000 description 1
238000011069 regeneration method Methods 0.000 description 1
238000006798 ring closing metathesis reaction Methods 0.000 description 1
IREVRWRNACELSM-UHFFFAOYSA-J ruthenium(4+);tetrachloride Chemical compound Cl[Ru](Cl)(Cl)Cl IREVRWRNACELSM-UHFFFAOYSA-J 0.000 description 1
239000004576 sand Substances 0.000 description 1
URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 1
238000001179 sorption measurement Methods 0.000 description 1
239000010935 stainless steel Substances 0.000 description 1
229910001220 stainless steel Inorganic materials 0.000 description 1
239000007858 starting material Substances 0.000 description 1
229910052712 strontium Inorganic materials 0.000 description 1
CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
230000000153 supplemental effect Effects 0.000 description 1
230000009469 supplementation Effects 0.000 description 1
230000001502 supplementing effect Effects 0.000 description 1
XSOKHXFFCGXDJZ-UHFFFAOYSA-N telluride(2-) Chemical compound [Te-2] XSOKHXFFCGXDJZ-UHFFFAOYSA-N 0.000 description 1
BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical compound FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
CBIYWHCPXHKZME-UHFFFAOYSA-J tetrafluororuthenium Chemical compound [F-].[F-].[F-].[F-].[Ru+4] CBIYWHCPXHKZME-UHFFFAOYSA-J 0.000 description 1
239000010455 vermiculite Substances 0.000 description 1
229910052902 vermiculite Inorganic materials 0.000 description 1
235000019354 vermiculite Nutrition 0.000 description 1
235000012431 wafers Nutrition 0.000 description 1

Classifications

- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/04—Hydrides of silicon
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/021—Preparation
- C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
- C01B33/03—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition of silicon halides or halosilanes or reduction thereof with hydrogen as the only reducing agent
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/04—Hydrides of silicon
- C01B33/043—Monosilane
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B6/00—Hydrides of metals including fully or partially hydrided metals, alloys or intermetallic compounds ; Compounds containing at least one metal-hydrogen bond, e.g. (GeH3)2S, SiH GeH; Monoborane or diborane; Addition complexes thereof
- C01B6/04—Hydrides of alkali metals, alkaline earth metals, beryllium or magnesium; Addition complexes thereof
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B1/00—Electrolytic production of inorganic compounds or non-metals
- C25B1/01—Products
- C25B1/14—Alkali metal compounds
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B1/00—Electrolytic production of inorganic compounds or non-metals
- C25B1/01—Products
- C25B1/18—Alkaline earth metal compounds or magnesium compounds
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B1/00—Electrolytic production of inorganic compounds or non-metals
- C25B1/01—Products
- C25B1/24—Halogens or compounds thereof

Landscapes

Chemical & Material Sciences (AREA)
Organic Chemistry (AREA)
Inorganic Chemistry (AREA)
Metallurgy (AREA)
Electrochemistry (AREA)
Materials Engineering (AREA)
Chemical Kinetics & Catalysis (AREA)
Engineering & Computer Science (AREA)
Life Sciences & Earth Sciences (AREA)
General Life Sciences & Earth Sciences (AREA)
Geology (AREA)
Silicon Compounds (AREA)
Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

TW102114091A 2010-12-23 2011-12-20 用於製造矽烷之方法及系統 TWI486307B (zh)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
US12/978,209 US8821825B2 (en)	2010-12-23	2010-12-23	Methods for producing silane
US12/978,189 US8388914B2 (en)	2010-12-23	2010-12-23	Systems for producing silane

Publications (2)

Publication Number	Publication Date
TW201332893A TW201332893A (zh)	2013-08-16
TWI486307B true TWI486307B (zh)	2015-06-01

Family

ID=45464866

Family Applications (3)

Application Number	Title	Priority Date	Filing Date
TW102114091A TWI486307B (zh)	2010-12-23	2011-12-20	用於製造矽烷之方法及系統
TW102148315A TW201414674A (zh)	2010-12-23	2011-12-20	用於製造矽烷之方法及系統
TW100147557A TWI429588B (zh)	2010-12-23	2011-12-20	用於製造矽烷之方法及系統

Family Applications After (2)

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TW102148315A TW201414674A (zh)	2010-12-23	2011-12-20	用於製造矽烷之方法及系統
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EP (1)	EP2655247A1 (de)
KR (1)	KR101949542B1 (de)
CN (2)	CN105668573A (de)
BR (1)	BR112013015955A2 (de)
TW (3)	TWI486307B (de)
WO (1)	WO2012087653A1 (de)

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- 2011-12-13 CN CN201610065439.1A patent/CN105668573A/zh active Pending
- 2011-12-13 BR BR112013015955A patent/BR112013015955A2/pt not_active IP Right Cessation
- 2011-12-13 WO PCT/US2011/064545 patent/WO2012087653A1/en not_active Ceased
- 2011-12-13 CN CN201180068094.0A patent/CN103384640B/zh active Active
- 2011-12-13 EP EP11806053.2A patent/EP2655247A1/de not_active Withdrawn
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- 2011-12-20 TW TW102148315A patent/TW201414674A/zh unknown
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Also Published As

Publication number	Publication date
KR20140006835A (ko)	2014-01-16
TWI429588B (zh)	2014-03-11
EP2655247A1 (de)	2013-10-30
TW201332893A (zh)	2013-08-16
CN103384640A (zh)	2013-11-06
KR101949542B1 (ko)	2019-02-18
TW201414674A (zh)	2014-04-16
BR112013015955A2 (pt)	2018-11-21
CN105668573A (zh)	2016-06-15
TW201231394A (en)	2012-08-01
CN103384640B (zh)	2016-03-02
WO2012087653A1 (en)	2012-06-28

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