TWI514510B - - Google Patents
Info
- Publication number
- TWI514510B TWI514510B TW103141956A TW103141956A TWI514510B TW I514510 B TWI514510 B TW I514510B TW 103141956 A TW103141956 A TW 103141956A TW 103141956 A TW103141956 A TW 103141956A TW I514510 B TWI514510 B TW I514510B
- Authority
- TW
- Taiwan
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/72—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using electrostatic chucks
- H10P72/722—Details of electrostatic chucks
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310718868.0A CN104733364B (zh) | 2013-12-23 | 2013-12-23 | 一种静电夹盘 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201535580A TW201535580A (zh) | 2015-09-16 |
| TWI514510B true TWI514510B (fr) | 2015-12-21 |
Family
ID=53457146
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW103141956A TW201535580A (zh) | 2013-12-23 | 2014-12-03 | 靜電夾盤 |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN104733364B (fr) |
| TW (1) | TW201535580A (fr) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20070215282A1 (en) * | 2006-03-15 | 2007-09-20 | Hitachi High-Technologies Corporation | Plasma processing apparatus |
| TW200913122A (en) * | 2007-04-02 | 2009-03-16 | Sosul Co Ltd | Apparatus for supporting substrate and plasma etching apparatus having the same |
| WO2011001978A1 (fr) * | 2009-07-02 | 2011-01-06 | 株式会社クリエイティブ テクノロジー | Structure d'attraction électrostatique et son procédé de fabrication |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4131533A (en) * | 1977-12-30 | 1978-12-26 | International Business Machines Corporation | RF sputtering apparatus having floating anode shield |
| US5708250A (en) * | 1996-03-29 | 1998-01-13 | Lam Resarch Corporation | Voltage controller for electrostatic chuck of vacuum plasma processors |
| US5737177A (en) * | 1996-10-17 | 1998-04-07 | Applied Materials, Inc. | Apparatus and method for actively controlling the DC potential of a cathode pedestal |
| US6492612B1 (en) * | 1998-12-28 | 2002-12-10 | Tokyo Electron Limited | Plasma apparatus and lower electrode thereof |
| CN101160014B (zh) * | 2002-07-12 | 2011-12-28 | 东京毅力科创株式会社 | 等离子体处理装置和可变阻抗装置的校正方法 |
| US7777152B2 (en) * | 2006-06-13 | 2010-08-17 | Applied Materials, Inc. | High AC current high RF power AC-RF decoupling filter for plasma reactor heated electrostatic chuck |
| CN101872713B (zh) * | 2009-04-24 | 2012-03-28 | 中微半导体设备(上海)有限公司 | 静电夹盘装置、等离子处理装置和制造静电夹盘装置的方法 |
| CN103227091B (zh) * | 2013-04-19 | 2016-01-27 | 中微半导体设备(上海)有限公司 | 等离子体处理装置 |
-
2013
- 2013-12-23 CN CN201310718868.0A patent/CN104733364B/zh active Active
-
2014
- 2014-12-03 TW TW103141956A patent/TW201535580A/zh unknown
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20070215282A1 (en) * | 2006-03-15 | 2007-09-20 | Hitachi High-Technologies Corporation | Plasma processing apparatus |
| TW200913122A (en) * | 2007-04-02 | 2009-03-16 | Sosul Co Ltd | Apparatus for supporting substrate and plasma etching apparatus having the same |
| WO2011001978A1 (fr) * | 2009-07-02 | 2011-01-06 | 株式会社クリエイティブ テクノロジー | Structure d'attraction électrostatique et son procédé de fabrication |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201535580A (zh) | 2015-09-16 |
| CN104733364B (zh) | 2017-11-03 |
| CN104733364A (zh) | 2015-06-24 |