TWI772406B - 正型阻劑膜積層體及圖型形成方法 - Google Patents
正型阻劑膜積層體及圖型形成方法 Download PDFInfo
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- TWI772406B TWI772406B TW107112859A TW107112859A TWI772406B TW I772406 B TWI772406 B TW I772406B TW 107112859 A TW107112859 A TW 107112859A TW 107112859 A TW107112859 A TW 107112859A TW I772406 B TWI772406 B TW I772406B
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- resist film
- nqd
- novolak resin
- positive resist
- film
- Prior art date
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Abstract
本發明之課題在於提供可對於具有階差的支持體，沒有空隙的發生地轉印正型阻劑膜之正型阻劑膜積層體及圖型形成方法。 本發明之解決手段為一種酚醛清漆樹脂-NQD系正型阻劑膜積層體，其係具備作為第1支持體的熱塑性薄膜與酚醛清漆樹脂-萘醌二疊氮(NQD)系正型阻劑膜之酚醛清漆樹脂-NQD系正型阻劑膜積層體，前述酚醛清漆樹脂-NQD系正型阻劑膜包含(A)酚醛清漆樹脂-NQD系樹脂組成物、(B)聚酯及(C)3～30質量%的有機溶劑。
Description
本發明關於酚醛清漆樹脂-萘醌二疊氮(NQD)系正型阻劑膜積層體及圖型形成方法。
近年來，隨著半導體製程中的大型基板化，檢討使用烘箱的基板之加熱處理。於如此之中，指出有化學增幅正型阻劑材料係因庫內溫度的不均勻性之影響，而圖型尺寸的變動大之問題，比較不易受到溫度變動所致之影響之酚醛清漆樹脂-NQD系正型阻劑材料開始受到注目。
通常，於半導體製程中，在薄膜、薄片、金屬基板、陶瓷基板等的支持體上，使用阻劑材料形成阻劑膜，但由於該支持體之表面係隨著電路形成而形成有階差，而對於半導體製程後半程序中使用的阻劑材料，要求在具有階差的表面上之均勻塗膜性或無空隙等的缺陷發生者。於如此的不均勻階差支持體上之表面上塗佈液狀的阻劑材料時，難以得到均勻塗膜的厚度，由於在階差附近，容易發生空隙，而以液狀阻劑材料滿足前述要求者為困難，阻劑膜為適合。
另一方面，關於正型阻劑膜的報告例少，可舉出專利文獻1，但為主要著眼於浮渣之抑制的乾膜阻劑，階差支持體上的空隙抑制能力不充分。此係因為乾膜阻劑的可撓性不足，薄膜無法完全追隨支持體表面的階差而發生者，期盼於轉印到前述支持體表面上時，無空隙發生的正型阻劑膜積層體。 [先前技術文獻] [專利文獻]
[專利文獻1] 國際公開第2005/036268號
[發明所欲解決的課題]
本發明係鑒於前述情事而完成者，其目的在於提供可對於具有階差的支持體，沒有空隙的發生地轉印正型阻劑膜之正型阻劑膜積層體及圖型形成方法。 [解決課題的手段]
本發明者們為了達成前述目的而進行專心致力的檢討，結果得知具備熱塑性薄膜與指定的酚醛清漆樹脂-NQD系正型阻劑膜之酚醛清漆樹脂-NQD系正型阻劑膜積層體係有用，而完成本發明。
因此，本發明提供下述酚醛清漆樹脂-NQD系正型阻劑膜積層體及圖型形成方法。 1.一種酚醛清漆樹脂-NQD系正型阻劑膜積層體，其係具備作為第1支持體的熱塑性薄膜與酚醛清漆樹脂-萘醌二疊氮(NQD)系正型阻劑膜之酚醛清漆樹脂-NQD系正型阻劑膜積層體， 前述酚醛清漆樹脂-NQD系正型阻劑膜包含 (A)酚醛清漆樹脂-NQD系樹脂組成物， (B)聚酯，及 (C)3～30質量%的有機溶劑； 前述(A)酚醛清漆樹脂-NQD系樹脂組成物包含 (A-1)一部分或全部的酚性羥基之氫原子經1,2-萘醌二疊氮磺醯基取代之酚醛清漆樹脂， (A-2)一部分或全部的酚性羥基之氫原子經1,2-萘醌二疊氮磺醯基取代之酚醛清漆樹脂及酚性羥基之氫原子未經取代之酚醛清漆樹脂， (A-3)一部分或全部的酚性羥基之氫原子經1,2-萘醌二疊氮磺醯基取代之酚醛清漆樹脂及1,2-萘醌二疊氮磺酸酯化合物， (A-4)一部分或全部的酚性羥基之氫原子經1,2-萘醌二疊氮磺醯基取代的酚醛清漆樹脂、酚性羥基之氫原子未經取代之酚醛清漆樹脂及1,2-萘醌二疊氮磺酸酯化合物，或 (A-5)酚性羥基之氫原子未經取代之酚醛清漆樹脂及1,2-萘醌二疊氮磺酸酯化合物。 2.如1之積層體，其中(B)聚酯係具有2～6個羧基的多元羧酸系聚酯。 3.一種圖型形成方法，其包含 (1)於第2支持體上，轉印如請1或2之積層體的酚醛清漆樹脂-NQD系正型阻劑膜之步驟， (2)以紫外線將前述阻劑膜予以曝光之步驟， (3)以鹼水溶液將前述阻劑膜予以顯像之步驟。 4.如3之圖型形成方法，其中於步驟(1)中，進行轉印後加熱處理。 5.如3或4之圖型形成方法，其中於步驟(2)中，進行曝光後加熱處理。 6.如3～5中任一項之圖型形成方法，其中於步驟(3)之後，包含(4)藉由電解鍍敷或無電解鍍敷，在基板上形成金屬鍍敷層之步驟。 [發明的效果]
根據本發明之酚醛清漆樹脂-NQD系正型阻劑膜積層體，即使為具有階差的支持體，也可沒有空隙的發生地對於其上轉印酚醛清漆樹脂-NQD系正型阻劑膜。
[實施發明的形態]
[酚醛清漆樹脂-NQD系正型阻劑膜積層體] 本發明之酚醛清漆樹脂-NQD系正型阻劑膜積層體係具備作為第1支持體的熱塑性薄膜與可在第2支持體上轉印的酚醛清漆樹脂-NQD系正型阻劑膜者。
[熱塑性薄膜] 作為第1支持體的熱塑性薄膜係成為脫模基材，只要不損害前述酚醛清漆樹脂-NQD系正型阻劑膜之形態，可從前述酚醛清漆樹脂-NQD系正型阻劑膜剝離者，則沒有特別的限定。作為如此的薄膜，可使用由單一的聚合物薄膜所構成之單層薄膜或積層有複數的聚合物薄膜之多層薄膜。具體而言，可舉出尼龍薄膜、聚乙烯(PE)薄膜、聚對苯二甲酸乙二酯(PET)薄膜、聚萘二甲酸乙二酯薄膜、聚苯硫(PPS)薄膜、聚丙烯(PP)薄膜、聚苯乙烯薄膜、聚甲基戊烯(TPX)薄膜、聚碳酸酯薄膜、含氟的薄膜、特殊聚乙烯醇(PVA)薄膜、施有脫模處理的聚酯薄膜等之塑膠薄膜等。
此等之中，作為第1支持體，較佳為具有適度的可撓性、機械強度及耐熱性之PET薄膜或PP薄膜。又，對於此等之薄膜，亦可進行電暈處理或如塗佈剝離劑之各種處理。此等係可使用市售品，例如可舉出Cerapeel WZ(RX)、Cerapeel BX8(R)(以上，東麗薄膜加工(股)製)、E7302、E7304(以上，東洋紡(股)製)、Purex G31、Purex G71T1(以上，帝人杜邦薄膜(股)製)、PET38´1-A3、PET38´1-V8、PET38´1-X08(以上，NIPPA(股)製)等。還有，於本發明中所謂的可撓性，就是意指薄膜在常溫常壓下顯示柔軟性，於變形時不發生裂痕之性質。
[酚醛清漆樹脂-NQD系正型阻劑膜] 前述酚醛清漆樹脂-NQD系正型阻劑膜包含(A)酚醛清漆樹脂-NQD系樹脂組成物、(B)聚酯及(C)3～30質量%的有機溶劑。
[(A)酚醛清漆樹脂-NQD系樹脂組成物] 作為前述酚醛清漆樹脂-NQD系正型阻劑膜之基礎而使用的酚醛清漆樹脂-NOD系樹脂組成物係包含以下之成分： (A-1)一部分或全部的酚性羥基之氫原子經1,2-萘醌二疊氮磺醯基取代之酚醛清漆樹脂， (A-2)一部分或全部的酚性羥基之氫原子經1,2-萘醌二疊氮磺醯基取代之酚醛清漆樹脂及酚性羥基之氫原子未經取代之酚醛清漆樹脂， (A-3)一部分或全部的酚性羥基之氫原子經1,2-萘醌二疊氮磺醯基取代之酚醛清漆樹脂及1,2-萘醌二疊氮磺酸酯化合物， (A-4)一部分或全部的酚性羥基之氫原子經1,2-萘醌二疊氮磺醯基取代的酚醛清漆樹脂、酚性羥基之氫原子未經取代之酚醛清漆樹脂及1,2-萘醌二疊氮磺酸酯化合物，或 (A-5)酚性羥基之氫原子未經取代之酚醛清漆樹脂及1,2-萘醌二疊氮磺酸酯化合物。
前述酚醛清漆樹脂係可藉由使酚類與醛類，在酸性觸媒之存在下以眾所周知的方法縮合聚合而製造。作為前述酸性觸媒，可使用鹽酸、硫酸、甲酸、草酸、對甲苯磺酸等。如此所得之縮合物係可使用藉由施予分餾等之處理，而切割低分子範圍者。
作為前述酚類，可舉出苯酚，間甲酚、鄰甲酚、對甲酚、2,3-二甲苯酚、2,5-二甲苯酚、3,5-二甲苯酚、3,4-二甲苯酚等之二甲苯酚類，間乙基苯酚、對乙基苯酚、鄰乙基苯酚、2,3,5-三甲基苯酚、2,3,5-三乙基苯酚、4-第三丁基苯酚、3-第三丁基苯酚、2-第三丁基苯酚、2-第三丁基-4-甲基苯酚、2-第三丁基-5-甲基苯酚、6-第三丁基-3-甲基苯酚等之烷基酚類，對甲氧基苯酚、間甲氧基苯酚、對乙氧基苯酚、間乙氧基苯酚、對丙氧基苯酚、間丙氧基苯酚等之烷氧基酚類，鄰異丙烯基苯酚、對異丙烯基苯酚、2-甲基-4-異丙烯基苯酚、2-乙基-4-異丙烯基苯酚等之異丙烯基酚類；4,4’-二羥基聯苯、雙酚A、苯基苯酚、間苯二酚、氫醌、焦棓酚等之多羥基酚類，a-萘酚、β-萘酚、二羥基萘等之羥基萘類等。於此等之酚類中，較佳為以苯酚、鄰甲酚、間甲酚、對甲酚、2,3-二甲苯酚、2,5-二甲苯酚及/或3,5-二甲苯酚作為原料，更佳為以間甲酚及/或對甲酚作為原料。
又，視需要，亦可使用具有烯丙基的酚類作為原料。作為具有烯丙基的酚類，可舉出2-烯丙基苯酚、4-烯丙基苯酚、6-甲基-2-烯丙基苯酚、4-烯丙基-2-甲氧基苯酚等，其中可較宜使用2-烯丙基苯酚。此具有烯丙基的苯酚係在構成酚醛清漆樹脂的全部酚類中，較佳為0～40質量%。
作為前述醛類，可舉出甲醛、多聚甲醛、三
烷、乙醛、丙醛、丁醛、三甲基乙醛、丙烯醛、巴豆醛、環己醛、糠醛、呋喃基丙烯醛、苯甲醛、對苯二甲醛、苯基乙醛、a-苯基丙醛、β-苯基丙醛、鄰羥基苯甲醛、間羥基苯甲醛、對羥基苯甲醛、鄰甲基苯甲醛、間甲基苯甲醛、對甲基苯甲醛、鄰氯苯甲醛、間氯苯甲醛、對氯苯甲醛等。此等係可以單獨使用1種，也可組合2種以上使用。於此等之醛類中，從取得的容易度來看，宜為甲醛。
前述酚醛清漆樹脂係在作為原料的酚類，較佳為在該酚類中使用40莫耳%以上對甲酚而得者，更佳為使用45莫耳%以上而得者。此時，對甲酚之使用量的上限為該酚類中的100莫耳%，但除了對甲酚還使用其他的酚類時，對甲酚之使用量的上限較佳為80莫耳%，更佳為70莫耳%。作為前述其他的酚類，較佳為間甲酚、2,5-二甲苯酚、3,5-二甲苯酚，更佳為間甲酚。
前述酚醛清漆樹脂之藉由凝膠滲透層析術(GPC)所致的聚苯乙烯換算質量平均分子量(Mw)較佳為2,000～50,000，更佳為3,000～20,000。
前述酚醛清漆樹脂係可以單獨使用1種，也可組合2種以上使用。
作為藉由1,2-萘醌二疊氮磺醯鹵將前述酚醛清漆樹脂的酚性羥基予以酯化之方法，可為眾所周知之方法(例如日本特開平6-242602號公報)。
作為前述1,2-萘醌二疊氮磺醯鹵，可舉出1,2-萘醌-2-二疊氮-5-磺醯氯、1,2-萘醌-2-二疊氮-4-磺醯氯、1,2-萘醌-2-二疊氮-5-磺醯溴等。此等之中，較佳為1,2-萘醌-2-二疊氮-5-磺醯氯、1,2-萘醌-2-二疊氮-4-磺醯氯。
藉由1,2-萘醌二疊氮磺醯鹵將前述酚醛清漆樹脂的酚性羥基予以酯化時，較佳為酯化該酚性羥基的2莫耳%以上。還有，所酯化的酚性羥基之上限係沒有特別的限定，但較佳為20莫耳%左右，更佳為10莫耳%左右。
再者，視需要，為了控制酚醛清漆樹脂對於鹼顯像液的親水性，亦可將未酯化的酚性羥基之一部分或全部予以醯化。醯化係可使用眾所周知的手法。例如，可使苯甲醯氯、乙醯氯、丙醯氯等在鹼性觸媒下與酚醛清漆樹脂反應，藉此得到經醯化的酚醛清漆樹脂。
作為前述1,2-萘醌二疊氮磺酸酯化合物，可舉出具有2個以上的羥基及2個以上的芳香環之化合物的該羥基之氫原子的一部分或全部經1,2-萘醌二疊氮磺醯基取代者。作為前述具有2個以上的羥基及2個以上的芳香環之化合物，可舉出三羥基二苯基酮、四羥基二苯基酮等之具有複數的羥基之二苯基酮化合物、以下述式(1)或(2)所示的化合物等。
作為前述三羥基二苯基酮，可舉出2,3,4-三羥基二苯基酮、2,4,5-三羥基二苯基酮、2,4,6-三羥基二苯基酮、2,2’,4-三羥基二苯基酮、2,2’,5-三羥基二苯基酮、2,3,4’-三羥基二苯基酮、2,4,4’-三羥基二苯基酮、2,4’,5-三羥基二苯基酮等。作為前述四羥基二苯基酮，可舉出2,3,4,4’-四羥基二苯基酮、2,2’,4,4’-四羥基二苯基酮、2,2’,3,4-四羥基二苯基酮、2,2’,4,5’-四羥基二苯基酮、2,3’,4,4’-四羥基二苯基酮、2,3’,4,6-四羥基二苯基酮、2,6,3’,5’-四羥基二苯基酮、3,4,5,3’-四羥基二苯基酮等。
作為前述1,2-萘醌二疊氮磺酸，可舉出1,2-萘醌-2-二疊氮-5-磺酸、1,2-萘醌-2-二疊氮-4-磺酸、1,2-萘醌-2-二疊氮-6-磺酸等，較佳為1,2-萘醌-2-二疊氮-5-磺酸、1,2-萘醌-2-二疊氮-4-磺酸。
前述1,2-萘醌二疊氮磺酸酯化合物較佳為前述具有複數的羥基之化合物的該羥基之氫原子的一部分或全部經1,2-萘醌二疊氮磺醯基取代者，此時較佳為該羥基之氫原子的30莫耳%以上經取代者，更佳為50莫耳%以上經取代者。
又，對於1,2-萘醌二疊氮磺酸酯化合物中之未反應的羥基，視需要亦可進行醯化。醯化係可以眾所周知的方法進行。
於本發明中，添加1,2-萘醌二疊氮磺酸酯化合物時，其含量相對於(A)成分的酚醛清漆樹脂100質量份較佳為1～55質量份，更佳為10～50質量份，最佳為20～45質量份。前述1,2-萘醌二疊氮磺酸酯化合物係可以單獨使用1種，也可組合2種以上使用。作為前述1,2-萘醌二疊氮磺酸酯化合物，可使用市售品。
[(B)聚酯] (B)成分之聚酯係多元羧酸與多元醇的縮合物，或多元羧酸酐與多元醇的縮合物。
作為前述多元羧酸，較佳為具有2～6個羧基者，具體而言，可舉出草酸、琥珀酸、丙二酸、戊二酸、己二酸、庚二酸、辛二酸、壬二酸、癸二酸、巴西二酸、甲基丙二酸、檸康酸、富馬酸、馬來酸、甲基馬來酸、中康酸、戊烯二酸、伊康酸、烯丙基丙二酸、雲康酸、黏康酸、丁炔二酸、烏頭酸、蘋果酸、酒石酸、葡萄酸、檸檬酸、氧代丙二酸、氧代琥珀酸、硫代蘋果酸、麩胺酸、乙二胺四乙酸、1,2-環丙烷二羧酸、吐昔酸、樟腦酸、鄰苯二甲酸、間苯二甲酸、對苯二甲酸、苯基琥珀酸、2-(3-羧基苯基)-2-氧代乙酸、罌粟酸、環丁烷二羧酸等。再者，可使用此等之酸酐。此等之中，較佳為二元羧酸。前述多元羧酸係可以單獨使用1種，也可組合2種以上使用。
又，作為多元醇，可舉出1,2-丙二醇、1,3-丙二醇、1,2-丁二醇、1,3-丁二醇、3-甲基-1,3-丁二醇、1,4-丁二醇、1,4-環己烷甲烷二醇、1,2-戊二醇、1,3-戊二醇、1,5-戊二醇、1,6-己二醇、2-甲基-2,4-戊二醇、3-甲基-1,5-戊二醇、乙二醇、丙二醇、新戊二醇、丙三醇、季戊四醇等。此等之中，較佳為二元醇。前述多元醇係可以單獨使用1種，也可組合2種以上使用。
使用前述原料，依照眾所周知之方法，進行縮合聚合而得到聚酯。原料之使用量只要視所得的聚合物之分子量而適宜調整即可，但通常相對於多元羧酸1莫耳，多元醇為0.5～3莫耳左右。
又，酯化係可為眾所周知的方法，只要使用硫酸等的酸性觸媒、鈦化合物、錫化合物、鋅化合物、鍺化合物、銻化合物等之金屬，視需要加熱150～300℃左右，進行縮合反應即可。
從正型阻劑薄膜的構成成分來看，(B)成分較佳為鹼可溶性，特別是溶解於氫氧化四甲銨(TMAH)水溶液中者。
(B)成分的聚酯之Mw較佳為700～50,000，更佳為1,500～45,000。若Mw為前述範圍，則無在顯像中未曝光部膜損失之虞，顯像速度良好故較宜。
相對於(A)成分中的酚醛清漆樹脂100質量份，(B)成分之含量較佳為5～100質量份，更佳為10～60質量份，特佳為15～50質量份。若含量為前述範圍，則無在轉印到基板上時，發生空隙之虞，亦無在顯像中未曝光部膜損失之虞。(B)成分之聚酯可以單獨使用1種，也可組合2種以上使用。
[(C)有機溶劑] 作為(C)成分的有機溶劑，只要對於其他成分，具有充分的溶解性，具有良好的塗膜性，則沒有特別的限定。作為如此的有機溶劑，可舉出甲基溶纖劑、乙基溶纖劑、甲基溶纖劑乙酸酯、乙基溶纖劑乙酸酯等之溶纖劑系溶劑，丙二醇、二丙二醇等之丙二醇系溶劑，丙二醇單甲基醚、丙二醇單丁基醚等之丙二醇烷基醚系溶劑；丙二醇單甲基醚乙酸酯、丙二醇二甲基醚、丙二醇單乙基醚乙酸酯等之丙二醇烷基醚乙酸酯系溶劑，醋酸丁酯、醋酸戊酯、乳酸甲酯、乳酸乙酯、3-甲氧基丙酸乙酯、3-乙氧基丙酸乙酯等之酯系溶劑，甲醇、乙醇、異丙醇、丁醇、己醇、二丙酮醇等之醇系溶劑，丙酮、環己酮、環戊酮、甲基乙基酮、甲基戊基酮、甲基異丁基酮等之酮系溶劑；甲基苯基醚、二乙二醇二甲基醚等之醚系溶劑，N,N-二甲基甲醯胺、N-甲基吡咯啶酮、二甲亞碸等之高極性溶劑，及此等之混合溶劑。
特佳的有機溶劑為丙二醇烷基醚乙酸酯系溶劑、乳酸烷酯、烷基酮。此等之溶劑係可以單獨1種或組合2種以上使用。前述丙二醇烷基醚乙酸酯之烷基可舉出碳數1～4者，例如甲基、乙基、丙基等，宜為甲基及乙基。又，於丙二醇烷基醚乙酸酯中有1,2取代物與1,3取代物，且有藉由取代位置之組合所致之3種異構物，但此等亦可為混合物。另外，乳酸烷酯之烷基可舉出碳數1～4者，例如甲基、乙基、丙基等，宜為甲基及乙基。烷基酮之烷基可舉出碳數1～10者，例如甲基、乙基、丙基、異丁基、環戊基、環己基等，特宜為異丁基、環戊基、環己基。
(C)有機溶劑之含量係在前述阻劑膜中為3～30質量%，較佳為5～25質量%。若有機溶劑之含量超過30質量%，則會不形成薄膜。若有機溶劑之含量未達3質量%，則由於有機溶劑成分過少，會發生裂痕，或薄膜的可撓性不充分。(C)有機溶劑係可以單獨1種或組合2種以上使用。又，於本發明中，前述阻劑膜之特徵為將(C)有機溶劑在薄膜中於常溫保持2小時以上，較佳為1星期以上，更佳為1個月以上。
[(D)界面活性劑] 前述阻劑膜亦可進一步包含(D)界面活性劑。作為(D)界面活性劑，可舉出聚氧乙烯月桂基醚、聚氧乙烯硬脂基醚、聚氧乙烯鯨蠟基醚、聚氧乙烯油酸醚等之聚氧乙烯烷基醚類、聚氧乙烯辛基苯酚醚、聚氧乙烯壬基苯酚醚等之聚氧乙烯烷基烯丙基醚類、聚氧乙烯聚氧丙烯嵌段共聚物類、山梨醇酐單月桂酸酯、山梨醇酐單棕櫚酸酯、山梨醇酐單硬脂酸酯等之山梨醇酐脂肪酸酯類、聚氧乙烯山梨醇酐單月桂酸酯、聚氧乙烯山梨醇酐單棕櫚酸酯、聚氧乙烯山梨醇酐單硬脂酸酯、聚醚聚矽氧、聚氧乙烯山梨醇酐三油酸酯、聚氧乙烯山梨醇酐三硬脂酸酯等之聚氧乙烯山梨醇酐脂肪酸酯的非離子系界面活性劑、Eftop EF301、EF303、EF352((股)TOHKEM PRODUCTS製)、Megafac F171、F172、F173(DIC(股)製)、Fluorad FC-4430、FC-430、FC-431(住友3M(股)製)、Surfynol E1004(日信化學工業(股)製)、Asahi Guard AG710、Surflon S-381、S-382、SC101、SC102、SC103、SC104、SC105、SC106、KH-10、KH-20、KH-30、KH-40(AGC Seimi Chemical(股)製)等之氟系界面活性劑、有機矽氧烷聚合物KP-341、X-70-092、X-70-093(信越化學工業(股)製)、丙烯酸系或甲基丙烯酸系Polyflow No.75、No.95(共榮社化學(股)製)等。其中，較佳為FC-4430、KP-341、X-70-093。此等係可以單獨1種或組合2種以上使用。
相對於(A)成分中的酚醛清漆樹脂100質量份，(D)界面活性劑之含量為0～5質量份，當含有時，較佳為0.01～2質量份。
[其他成分] 又，於本發明之酚醛清漆樹脂-NQD系正型阻劑膜中，在不妨礙本發明的效果之範圍內，可進一步添加其他的眾所周知之添加劑。作為其他成分，例如可舉出各種光酸產生劑或光鹼產生劑、增感劑、三聚氰胺化合物或環氧化合物等之交聯劑、水溶性纖維素等之溶解促進劑、聚乙烯醇或聚乙烯基烷基醚化合物等之應力緩和劑、偶氮化合物或薑黃素等之染料、苯并三唑系化合物或咪唑系化合物等之密著提高劑、草酸等之形狀改善劑。
[酚醛清漆樹脂-NQD系正型阻劑膜積層體之製造方法] 陳述本發明之酚醛清漆樹脂-NQD系正型阻劑膜積層體之製造方法。首先，同時或以任意之順序使前述(A)成分及(B)成分以及視需要的(D)成分或其他成分溶解於(C)有機溶劑中，調製均勻的正型阻劑溶液。視需要，亦可對於所得之均勻溶液，使用過濾器進行過濾。
調製前述正型阻劑溶液時，相對於(A)成分中的酚醛清漆樹脂100質量份，(C)有機溶劑之使用量較佳為20～400質量份，更佳為30～200質量份。若有機溶劑之使用量為前述範圍，則可以均勻的膜厚製造薄膜，無在薄膜中發生缺陷之虞。於本發明中，為了暫時在過剩的有機溶劑中，以使構成成分成為均勻的方式溶解，經過後述的乾燥步驟，製作作為目的之正型阻劑膜積層體，在構成成分之溶解時，可視製作的薄膜之膜厚，適宜調整所使用的有機溶劑之量。
將前述正型阻劑溶液，在潔淨度1000以下的無塵室中，使用被設置在經管理成溫度5～45℃，較佳為15～35℃，且濕度5～90%，較佳為10～70%的區域中的順向輥塗佈機、反向輥塗佈機、缺角輪塗佈機、模塗機、唇塗機、凹版塗佈機、浸塗機、空氣刀塗佈機、毛細管塗佈機、提起＆上升(R&R)塗佈機、刮板塗佈機、棒塗機、塗抹機、擠壓成形機等，塗佈於作為第1支持體的熱塑性薄膜(脫模基材)之上。此時，塗佈速度較佳為0.05～1,000m/ min，更佳為0.1～500m/min。然後，將塗佈有正型阻劑溶液的熱塑性薄膜，在串聯式乾燥機(熱風循環烘箱)中，以40～130℃、1～40分鐘，較佳為50～120℃、2～30分鐘，去除有機溶劑及揮發分，使其乾燥而形成酚醛清漆樹脂-NQD系正型阻劑膜積層體。還有，代替串聯式乾燥機，亦可使用紅外線照射等所致的溶劑去除、同時使用串聯式乾燥機與紅外線照射之方法等，複數的乾燥手法進行溶劑去除，而形成酚醛清漆樹脂-NQD系正型阻劑膜積層體。又，視需要，可使用輥式層合機，將保護膜(脫模基材)壓接於前述酚醛清漆樹脂-NQD系正型阻劑膜積層體上，進行積層。
還有，於本發明中，設為使用特定的成形條件及成形機而將阻劑溶液製造成熱塑性薄膜之生產線，藉此可製造連續地捲膜化，且可處理成所欲形狀的捲膜，另外於酚醛清漆樹脂-NQD系正型阻劑膜積層體上形成保護膜時亦同樣。
作為前述保護膜，與熱塑性薄膜同樣地，只要在不損害酚醛清漆樹脂-NQD系正型阻劑膜之形態下，可從酚醛清漆樹脂-NQD系正型阻劑膜剝離者，則沒有特別的限定，可使用積層有單一或複數的聚合物薄膜之多層薄膜。具體而言，可舉出尼龍薄膜、聚乙烯(PE)薄膜、聚對苯二甲酸乙二酯(PET)薄膜、聚萘二甲酸乙二酯薄膜、聚苯硫(PPS)薄膜、聚丙烯(PP)薄膜、聚苯乙烯薄膜、聚甲基戊烯(TPX)薄膜、聚碳酸酯薄膜、含氟的薄膜、特殊聚乙烯醇(PVA)薄膜、施有脫模處理的聚酯薄膜等之塑膠薄膜。
此等之中，作為保護膜，較佳為具有適度的可撓性之PET薄膜或PE薄膜。此等係可使用市售品，作為PET薄膜，可舉出前述者，作為PE薄膜，例如可舉出GF-8(TAMAPOLY(股)製)、PE薄膜0型(NIPPA(股)製)、Toretec 7332、Toretec 7111、Toretec 7721(以上，東麗薄膜加工(股)製)等。
前述熱塑性薄膜及保護膜之厚度，從製造的安定性及防止對於捲芯的捲繞瑕疵之所謂的捲曲來看，較佳為皆10～150μm，更佳為25～100μm。
前述酚醛清漆樹脂-NQD系正型阻劑膜係在前述熱塑性薄膜上，形成為可轉印到第2支持體上。前述酚醛清漆樹脂-NQD系正型阻劑膜之厚度較佳為5～250μm，更佳為10～180μm。還有，作為第2支持體，可舉出塑膠薄膜或薄片、Si、Cu、SiO2
、SiN、SiON、TiN、WSi、BPSG、SOG等之半導體基板、Au、Ti、W、Cu、Ni-Fe、Ta、Zn、Co、Pb等之金屬基板、有機抗反射膜等之基板、有機基板等。於第2支持體表面，可形成有藉由鍍敷或濺鍍等所形成的電路、藉由絕緣性樹脂的形成等所造成的階差(凹凸)。前述階差較佳為0～200μm左右之範圍，更佳為3～100μm左右之範圍，特佳為10～50μm左右之範圍。
保護膜對於以前述步驟製造的酚醛清漆樹脂-NQD系正型阻劑膜之剝離力通常為0.1～500gf/24mm之範圍，以下記載其測定方法。試驗方法係依據JIS Z 0237中記載的「對於膠帶黏著面，將剝離襯裡撕下的黏著力試驗方法」進行。試驗環境為標準狀態(溫度為23±1℃，相對濕度為50±5%)。試驗所用的薄膜寬度為24mm，若薄膜寬度變動，則剝離力變化故不宜。製作指定尺寸的薄膜後，使用試驗機進行測定時，保護膜的撕下角度為180°，剝離速度為5.0±0.2mm/秒。還有，作為測定值，將最初的25mm之測定值排除在外，使用接下來的50mm之平均值作為試驗值。
[圖型形成方法] 使用真空層合機、輥式層合機等之各種層合機，將本發明之酚醛清漆樹脂-NQD系正型阻劑膜積層體之阻劑膜貼附於第2支持體特別是半導體基板上，剝離熱塑性薄膜，藉此可轉印阻劑膜。前述基板亦可具有階差構造，藉由視階差的高度，使用適當的酚醛清漆樹脂-NQD系正型阻劑膜厚，成為可將酚醛清漆樹脂-NQD系正型阻劑膜埋入於階差內，可對於具有0～200μm左右的階差之支持體，適宜使用。轉印後，即使不特別進行加熱也無問題，但視需要亦可進行加熱處理，當進行加熱處理時，可在熱板上或烘箱中，於60～150℃預烘烤1～30分鐘，較佳為於80～130℃預烘烤1～10分鐘。
接著，以由紫外線、遠紫外線、EB等所選出的放射線，較佳為波長300nm以上、更佳為波長350～500 nm的放射線，通過指定的遮罩進行曝光。曝光量較佳為10～5,000mJ/cm2
左右，更佳為30～2,000mJ/cm2
左右。曝光後視需要於熱板上，較佳為於60～150℃進行後曝光烘烤(PEB)1～10分鐘，更佳為於80～120℃進行後曝光烘烤1～5分鐘。
再者，使用0.1～5質量%、較佳2～3質量%的TMAH等之鹼水溶液的顯像液，較佳為0.1～60分鐘，更佳為0.5～15分鐘，以浸漬(dip)法、覆液(puddle)法、噴霧(spray)法等眾所周知之方法進行顯像，藉此在基板上形成目的之圖型。
再者，於本發明中，於顯像步驟後，可藉由電解鍍敷或無電解鍍敷，在第2支持體特別是基板上形成金屬鍍敷層，形成鍍敷圖型。還有，鍍敷步驟係藉由眾所周知的方法，以電解鍍敷法或無電解鍍敷法被覆形成導體圖型，然後去除阻劑圖型。
作為電解鍍敷或無電解鍍敷，可舉出電解Cu鍍敷、無電解Cu鍍敷、電解Ni鍍敷、無電解Ni鍍敷、電解Au鍍敷等，可以眾所周知的鍍敷浴、鍍敷條件，進行鍍敷。還有，鍍敷厚度一般係以阻劑圖型厚度之80～100%形成。例如，種子層為Cu，於其上形成厚度1μm的阻劑圖型後，藉由電解Cu鍍敷，形成厚度0.8～1μm的Cu鍍敷圖型。 [實施例]
以下，顯示合成例、調製例、實施例及比較例，更具體地說明本發明，惟本發明不受下述實施例所限定。
[1]感光性酚醛清漆樹脂之合成 [合成例1] 於具備攪拌機、氮氣置換裝置及溫度計的燒瓶中，加入對甲酚單位為55莫耳%及間甲酚單位為45莫耳%，其樹脂熔融溫度為145℃，且Mw為4,500之甲酚酚醛清漆樹脂(旭有機材(股)製)120g、1,2-萘醌-2-二疊氮-5-磺醯氯(東洋合成工業(股)製)8.1g(相對於樹脂的酚性羥基為3莫耳%)及1,4-二烷500g，混合至成為均勻為止。於所得之溶液中，在室溫滴下添加三乙胺10.6g。添加結束後，持續攪拌10小時，然後，將反應溶液投入至大量的0.1mol/L鹽酸水溶液中，回收所析出的樹脂。以減壓乾燥機來乾燥所回收的樹脂，得到130g作為目的之感光性樹脂，其為部分地經1,2-萘醌-2-二疊氮-5-磺醯化之感光性酚醛清漆樹脂1(PAP1)。
[合成例2] 依照合成例1之方法，使對甲酚單位為45莫耳%及間甲酚單位為55莫耳%，其樹脂熔融溫度為143℃，且Mw為6,000之甲酚酚醛清漆樹脂(旭有機材(股)製)120g與1,2-萘醌-2-二疊氮-5-磺醯氯(東洋合成工業(股)製)32.2g(相對於樹脂的酚性羥基為12莫耳%)反應，得到感光性酚醛清漆樹脂2(PAP2)。
[2]酚醛清漆樹脂-NQD系正型阻劑膜積層體之製作 [實施例1～9、比較例1～5] 以下述表1所示的組成，混合(A)～(D)成分及其他成分，調製溶液後，以1.0μm的薄膜過濾器進行過濾，調製阻劑溶液1～13。還有，表1中的各成分係如以下。 (A)酚醛清漆樹脂-NQD系樹脂組成物 PAP1：以合成例1合成的感光性酚醛清漆樹脂 PAP2：以合成例2合成的感光性酚醛清漆樹脂 EP：EP6050G(甲酚酚醛清漆樹脂，旭有機材(股)製) NT：NT-200(1,2-萘醌二疊氮磺酸酯化合物，東洋合成工業(股)製) (B)聚酯 PE1：Polycizer W-230-H(Mw=1,000)己二酸系聚酯(DIC(股)製) PE2：W-2050(Mw=3,900)己二酸系聚酯(DIC(股)製) PE3：Adekacizer P-300(Mw=4,900)己二酸系聚酯((股)ADEKA製) PE4：D645(Mw=5,600)己二酸系聚酯((股)J-PLUS製) (C)有機溶劑 EL：乳酸乙酯 CP：環戊酮 PMA：丙二醇單甲基醚乙酸酯 (D)界面活性劑 SF1：X-70-093(信越化學工業(股)製) SF2：KP-341(信越化學工業(股)製) 其他成分 OA：草酸 BTA：苯并三唑 M40：Lutonal M40(聚乙烯基甲基醚，BASF公司製) UC：UC-3510(丙烯酸樹脂，東亞合成(股)製)
將阻劑溶液1～13，於潔淨度1000、濕度40～45%、溫度22～26℃之無塵室中，使用模塗機作為薄膜塗佈機，塗佈於作為熱塑性薄膜的PET薄膜(厚度38μm)上，於熱風循環烘箱中，以表2記載之烘箱溫度，乾燥5分鐘，製作具有膜厚20μm的正型阻劑膜之積層體1～13。
然後，於所製作的正型阻劑膜之表面，以壓力1MPa貼合作為保護膜之PE薄膜(厚度50μm)。從所製作的積層薄膜，採集正型阻劑膜0.1g，以乙腈10mL進行萃取，離心分離後回收上清成分，進行氣相層析術測定，算出有機溶劑含量。還有，實施例之阻劑膜係在23℃將有機溶劑保持7日，含有表2中記載之量。
[3]空隙(void)的發生評價 對於所製作的正型阻劑膜積層體，首先剝離保護膜，使用真空層合機TEAM-300M((股)TAKATORI製)，將真空室內設定為真空度80Pa，將熱塑性薄膜上的正型阻劑膜轉印到具有最大50μm的階差之300mm的Cu基板上。此時的溫度條件為60℃。回到常壓後，從真空層合機取出前述基板，剝離熱塑性薄膜後，使用光學顯微鏡((股)NIKON製)，評價在基板上是否發生氣泡。對於各實施例及比較例，進行5次評價，以其平均值進行判定。將無氣泡之發生者判定為○，將氣泡平均發生1～10個者判定為△，將平均發生11個以上者判定為×。表3中顯示評價結果。
又，代替前述Cu基板，使用已進行5μm的L/S圖型之Cu鍍敷的200mm矽基板，以與前述方法同樣之方法，對於以實施例1～9製作的正型阻劑膜積層體，評價空隙之發生。 實施例1～9之正型阻劑膜係未發生氣泡。
[4]圖型形成評價 [實施例10] 與前述薄膜積層體之製造方法同樣地，從使用阻劑溶液9，以烘箱溫度100℃、成為殘存溶劑量12%之方式所製作的正型阻劑膜積層體，將正型阻劑膜轉印到200mm的Cu基板上，藉由熱板在100℃進行1分鐘軟烘烤。藉由光干涉式膜厚測定機(M6100，NANOMETRICS公司製)確認軟烘烤後的薄膜之厚度，結果為18μm。接著，對於所形成的阻劑膜，隔著標線片，使用i線用步進曝光機((股)NIKON製NSR-2205i11D)進行曝光，於110℃、90秒的PEB後，使用2.38質量%TMAH水溶液，進行150秒的覆液顯像後，純水沖洗，進行乾燥。 關於所得之圖型，使用掃描型電子顯微鏡((股)日立先端科技製S-4700)進行確認，結果20μm的線與間隙之重複圖型係以200mJ/cm2
之曝光量解析成矩形。 再者，製作前述圖型後，使用乾蝕刻裝置(日電ANELVA(股)製DEM-451)，將阻劑圖型及基板表面以100W氧電漿進行灰化30秒，接著浸於Cu鍍敷液(田中貴金屬工業(股)製，Microfab Cu200)，在25℃流動5分鐘的定電流，進行Cu鍍敷，積層約5μm的膜厚之Cu。最後，於鍍敷後，將表面以純水進行流水洗淨，以光學顯微鏡觀察阻劑表面，觀察對於鍍敷的成長應力，阻劑有無變形及耐裂痕性。於耐裂痕性中，觀察圖1所示之阻劑圖型上的特別是裂痕容易發生的角落部分900點，但未看到裂痕之發生，具有充分的耐鍍敷性。還有，於圖1中，1為裂痕確認部分，於1射域中為50μm且6×5=30點，於晶圓全面(30射域)確認30×30=900點。又，2為圖型放大圖，3為晶圓全體圖。
1‧‧‧裂痕確認部分2‧‧‧圖型放大圖3‧‧‧晶圓全體圖
圖1係實施例10中之阻劑圖型上的裂痕確認部分之說明圖。
Claims (5)
- 一種酚醛清漆樹脂-NQD系正型阻劑膜積層體，其係具備作為第1支持體的熱塑性薄膜與酚醛清漆樹脂-萘醌二疊氮(NQD)系正型阻劑膜之酚醛清漆樹脂-NQD系正型阻劑膜積層體，前述酚醛清漆樹脂-NQD系正型阻劑膜包含：(A)酚醛清漆樹脂-NQD系樹脂組成物，(B)Mw為700~45,000且具有2~6個羧基的多元羧酸系聚酯，及(C)3~30質量%的有機溶劑；前述(A)酚醛清漆樹脂-NQD系樹脂組成物包含：(A-1)一部分或全部的酚性羥基之氫原子經1,2-萘醌二疊氮磺醯基取代之酚醛清漆樹脂，(A-2)一部分或全部的酚性羥基之氫原子經1,2-萘醌二疊氮磺醯基取代之酚醛清漆樹脂及酚性羥基之氫原子未經取代之酚醛清漆樹脂，(A-3)一部分或全部的酚性羥基之氫原子經1,2-萘醌二疊氮磺醯基取代之酚醛清漆樹脂及1,2-萘醌二疊氮磺酸酯化合物，(A-4)一部分或全部的酚性羥基之氫原子經1,2-萘醌二疊氮磺醯基取代的酚醛清漆樹脂、酚性羥基之氫原子未經取代之酚醛清漆樹脂及1,2-萘醌二疊氮磺酸酯化合物，或(A-5)酚性羥基之氫原子未經取代之酚醛清漆樹脂及 1,2-萘醌二疊氮磺酸酯化合物；其中，相對於(A)成分中的酚醛清漆樹脂100質量份，(B)成分之含量為5~100質量份。
- 一種圖型形成方法，其包含(1)於第2支持體上，轉印如請求項1之積層體的酚醛清漆樹脂-NQD系正型阻劑膜之步驟，(2)以紫外線將前述阻劑膜予以曝光之步驟，(3)以鹼水溶液將前述阻劑膜予以顯像之步驟。
- 如請求項2之圖型形成方法，其中於步驟(1)中，進行轉印後加熱處理。
- 如請求項2或3之圖型形成方法，其中於步驟(2)中，進行曝光後加熱處理。
- 如請求項2或3之圖型形成方法，其中於步驟(3)之後，包含(4)藉由電解鍍敷或無電解鍍敷，在基板上形成金屬鍍敷層之步驟。
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| KR20180116757A (ko) | 2018-10-25 |
| JP2018180349A (ja) | 2018-11-15 |
| JP6702251B2 (ja) | 2020-05-27 |
| US10719015B2 (en) | 2020-07-21 |
| CN108732868A (zh) | 2018-11-02 |
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