TWI812631B - 近紅外線截止濾波器及其製造方法、固體攝像裝置以及相機模組 - Google Patents

近紅外線截止濾波器及其製造方法、固體攝像裝置以及相機模組 Download PDF

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Publication number: TWI812631B
Authority: TW; Taiwan
Prior art keywords: resin; infrared; compound; base material; group
Prior art date: 2017-07-27

Application number

TW107125901A

Other languages

English (en)

Chinese (zh)

Other versions

TW201917017A (zh

Inventor

重岡大介

長屋勝也

大月敏敬

Original Assignee

日商Ｊｓｒ股份有限公司

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2017-07-27

Filing date

2018-07-26

Publication date

2023-08-21

2018-07-26 Application filed by 日商Ｊｓｒ股份有限公司 filed Critical 日商Ｊｓｒ股份有限公司

2019-05-01 Publication of TW201917017A publication Critical patent/TW201917017A/zh

2023-08-21 Application granted granted Critical

2023-08-21 Publication of TWI812631B publication Critical patent/TWI812631B/zh

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239000004760 aramid Substances 0.000 description 1
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150000001565 benzotriazoles Chemical class 0.000 description 1
230000000903 blocking effect Effects 0.000 description 1
OVIZSQRQYWEGON-UHFFFAOYSA-N butane-1-sulfonamide Chemical group CCCCS(N)(=O)=O OVIZSQRQYWEGON-UHFFFAOYSA-N 0.000 description 1
235000010354 butylated hydroxytoluene Nutrition 0.000 description 1
229910052799 carbon Inorganic materials 0.000 description 1
230000015556 catabolic process Effects 0.000 description 1
239000003054 catalyst Substances 0.000 description 1
229910000420 cerium oxide Inorganic materials 0.000 description 1
239000011247 coating layer Substances 0.000 description 1
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238000003851 corona treatment Methods 0.000 description 1
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230000001419 dependent effect Effects 0.000 description 1
230000006866 deterioration Effects 0.000 description 1
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125000003963 dichloro group Chemical group Cl* 0.000 description 1
150000005690 diesters Chemical class 0.000 description 1
229940028356 diethylene glycol monobutyl ether Drugs 0.000 description 1
125000002147 dimethylamino group Chemical group [H]C([H])([H])N(*)C([H])([H])[H] 0.000 description 1
239000006185 dispersion Substances 0.000 description 1
150000002148 esters Chemical class 0.000 description 1
150000002168 ethanoic acid esters Chemical class 0.000 description 1
RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
150000002170 ethers Chemical class 0.000 description 1
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238000001704 evaporation Methods 0.000 description 1
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238000001125 extrusion Methods 0.000 description 1
238000010101 extrusion blow moulding Methods 0.000 description 1
239000004744 fabric Substances 0.000 description 1
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229930195733 hydrocarbon Natural products 0.000 description 1
239000001257 hydrogen Substances 0.000 description 1
229910052739 hydrogen Inorganic materials 0.000 description 1
238000005984 hydrogenation reaction Methods 0.000 description 1
239000005457 ice water Substances 0.000 description 1
238000005286 illumination Methods 0.000 description 1
125000000879 imine group Chemical group 0.000 description 1
150000002466 imines Chemical class 0.000 description 1
230000001771 impaired effect Effects 0.000 description 1
230000006872 improvement Effects 0.000 description 1
229910003437 indium oxide Inorganic materials 0.000 description 1
PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
150000002475 indoles Chemical class 0.000 description 1
239000004615 ingredient Substances 0.000 description 1
238000001746 injection moulding Methods 0.000 description 1
238000007733 ion plating Methods 0.000 description 1
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238000004898 kneading Methods 0.000 description 1
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ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
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239000006224 matting agent Substances 0.000 description 1
238000000691 measurement method Methods 0.000 description 1
239000000155 melt Substances 0.000 description 1
125000005395 methacrylic acid group Chemical group 0.000 description 1
238000002156 mixing Methods 0.000 description 1
ZKATWMILCYLAPD-UHFFFAOYSA-N niobium pentoxide Inorganic materials O=[Nb](=O)O[Nb](=O)=O ZKATWMILCYLAPD-UHFFFAOYSA-N 0.000 description 1
URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 description 1
TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 1
JCGNDDUYTRNOFT-UHFFFAOYSA-N oxolane-2,4-dione Chemical compound O=C1COC(=O)C1 JCGNDDUYTRNOFT-UHFFFAOYSA-N 0.000 description 1
BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
239000003973 paint Substances 0.000 description 1
239000008188 pellet Substances 0.000 description 1
125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 1
CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
238000009832 plasma treatment Methods 0.000 description 1
229920003023 plastic Polymers 0.000 description 1
125000003367 polycyclic group Chemical group 0.000 description 1
229920000728 polyester Polymers 0.000 description 1
229920006267 polyester film Polymers 0.000 description 1
229920013716 polyethylene resin Polymers 0.000 description 1
239000002685 polymerization catalyst Substances 0.000 description 1
150000004032 porphyrins Chemical class 0.000 description 1
229910000027 potassium carbonate Inorganic materials 0.000 description 1
LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
239000010453 quartz Substances 0.000 description 1
238000010992 reflux Methods 0.000 description 1
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230000001568 sexual effect Effects 0.000 description 1
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238000004528 spin coating Methods 0.000 description 1
238000004544 sputter deposition Methods 0.000 description 1
238000006467 substitution reaction Methods 0.000 description 1
238000004381 surface treatment Methods 0.000 description 1
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230000002194 synthesizing effect Effects 0.000 description 1
229920003051 synthetic elastomer Polymers 0.000 description 1
239000005061 synthetic rubber Substances 0.000 description 1
PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 description 1
229920006259 thermoplastic polyimide Polymers 0.000 description 1
XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
229910001887 tin oxide Inorganic materials 0.000 description 1
125000004665 trialkylsilyl group Chemical group 0.000 description 1
150000003918 triazines Chemical class 0.000 description 1
VOITXYVAKOUIBA-UHFFFAOYSA-N triethylaluminium Chemical compound CC[Al](CC)CC VOITXYVAKOUIBA-UHFFFAOYSA-N 0.000 description 1
BYMUNNMMXKDFEZ-UHFFFAOYSA-K trifluorolanthanum Chemical compound F[La](F)F BYMUNNMMXKDFEZ-UHFFFAOYSA-K 0.000 description 1
KPGXUAIFQMJJFB-UHFFFAOYSA-H tungsten hexachloride Chemical class Cl[W](Cl)(Cl)(Cl)(Cl)Cl KPGXUAIFQMJJFB-UHFFFAOYSA-H 0.000 description 1
239000006097 ultraviolet radiation absorber Substances 0.000 description 1
150000003673 urethanes Chemical class 0.000 description 1
238000001291 vacuum drying Methods 0.000 description 1
238000007738 vacuum evaporation Methods 0.000 description 1
238000005406 washing Methods 0.000 description 1
239000003643 water by type Substances 0.000 description 1
229910052727 yttrium Inorganic materials 0.000 description 1
239000011787 zinc oxide Substances 0.000 description 1
229910052984 zinc sulfide Inorganic materials 0.000 description 1
DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
229910001928 zirconium oxide Inorganic materials 0.000 description 1

Classifications

- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/281—Interference filters designed for the infrared light
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/18—Layered products comprising a layer of synthetic resin characterised by the use of special additives
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/02—Physical, chemical or physicochemical properties
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/26—Reflecting filters
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Optics & Photonics (AREA)
Chemical & Material Sciences (AREA)
Inorganic Chemistry (AREA)
Optical Filters (AREA)
Solid State Image Pick-Up Elements (AREA)
Camera Bodies And Camera Details Or Accessories (AREA)
Surface Treatment Of Optical Elements (AREA)
Laminated Bodies (AREA)
Blocking Light For Cameras (AREA)

TW107125901A 2017-07-27 2018-07-26 近紅外線截止濾波器及其製造方法、固體攝像裝置以及相機模組 TWI812631B (zh)

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JP2021009271A (ja) *	2019-07-03	2021-01-28	Jsr株式会社	カメラモジュールおよび電子機器
KR102225452B1 (ko) *	2019-07-04	2021-03-08	윤세원	재귀반사시트
CN117111195A (zh) *	2019-09-11	2023-11-24	Ａｇｃ株式会社	滤光片和成像装置
EP4043527A1 (fr) *	2019-10-07	2022-08-17	Sumitomo Chemical Company, Limited	Composition de résine colorée
JP7511107B2 (ja)	2019-11-15	2024-07-05	Ａｇｃ株式会社	光学フィルタ
JP7392412B2 (ja) *	2019-11-15	2023-12-06	Ａｇｃ株式会社	光学フィルタ、並びにこれを用いた光学装置及び指紋検出装置
CN115298580A (zh) *	2020-03-16	2022-11-04	日东电工株式会社	滤光器、其制造方法及光学模块
CN116057428B (zh) *	2020-07-27	2026-01-02	Ａｇｃ株式会社	滤光片
WO2022024941A1 (fr) *	2020-07-29	2022-02-03	Ａｇｃ株式会社	Filtre optique
WO2022044870A1 (fr) *	2020-08-27	2022-03-03	日本ゼオン株式会社	Film réducteur de lumière, procédé de fabrication de celui-ci et stratifié
CN112596140B (zh) *	2020-11-26	2022-11-01	中国航空工业集团公司洛阳电光设备研究所	一种红外长波截止滤光片及制备方法
WO2022168736A1 (fr)	2021-02-04	2022-08-11	株式会社ジャパンディスプレイ	Dispositif de détection
JPWO2022181422A1 (fr) *	2021-02-26	2022-09-01
CN113773329A (zh) *	2021-09-18	2021-12-10	哈尔滨工业大学	一种实现酞菁类有机材料近红外反射率被动调控的方法
US20240352227A1 (en) *	2021-11-29	2024-10-24	Mitsui Chemicals, Inc.	Resin composition for forming optical component, molded product, and optical component
CN220603808U (zh)	2022-05-16	2024-03-15	3M创新有限公司	用于显示系统的光学构造体
TWI896123B (zh) *	2023-09-14	2025-09-01	大根光學工業股份有限公司	感光元件模組、相機模組及電子裝置
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CN110832362B (zh)	2022-01-11
JP7163918B2 (ja)	2022-11-01
CN110832362A (zh)	2020-02-21
TW201917017A (zh)	2019-05-01
WO2019022069A1 (fr)	2019-01-31
KR102673502B1 (ko)	2024-06-11
KR20200028956A (ko)	2020-03-17
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Publication	Publication Date	Title
TWI812631B (zh)	2023-08-21	近紅外線截止濾波器及其製造方法、固體攝像裝置以及相機模組
CN107407754B (zh)	2020-02-07	光学滤波器及使用光学滤波器的装置
JP7088261B2 (ja)	2022-06-21	光学フィルターおよび光学フィルターを用いた装置
CN104364681B (zh)	2017-05-24	固体摄影组件用光学滤波器及其用途
CN112596141B (zh)	2022-11-15	光学滤波器及光学传感装置
CN105452911B (zh)	2017-06-09	光学滤波器、固体摄像装置及照相机模块
JP6331392B2 (ja)	2018-05-30	光学フィルターならびに該光学フィルターを用いた固体撮像装置およびカメラモジュール
TWI820403B (zh)	2023-11-01	光學濾波器和使用光學濾波器的裝置
CN111801606A (zh)	2020-10-20	光学滤波器、照相机模块及电子设备
TW201506462A (zh)	2015-02-16	濾光器及使用前述濾光器的裝置
CN111983743A (zh)	2020-11-24	光学滤波器、摄像装置与照相机模块
TW202242010A (zh)	2022-11-01	基材、光學濾波器、固體攝像裝置及照相機模組